JP2997185B2 - Magnetic metal film forming apparatus for forming magnetic metal film for detecting core wire connection - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a core wire having a predetermined thickness and a predetermined width coated on a joint so that the joint between the core wires can be magnetically detected from above an insulating coating in a wire manufacturing process. The present invention relates to a magnetic metal film forming apparatus for forming a magnetic metal film for detecting a connection portion.

[0002]

2. Description of the Related Art In a manufacturing process of a covered electric wire, in order to unwind a core wound on a drum and to continuously supply the same over a plurality of drums, the core wound on the drum and the next drum are wound. It is performed by joining the ends of the twisted wires (formation of a joint portion). The coated electric wire is obtained by extruding and coating a resin (insulator) on the outer periphery of the continuously fed core wire. An electric wire having such a joint part in the middle thereof lacks electrical reliability, and if mixed into a product (bundled wire), a product having non-uniform electrical characteristics can be produced in a subsequent process (harness process). For this reason, the joint part is removed before the product is sent to the manufacturing process. Conventionally, as a method of detecting the joint portion from above after insulation coating, when joining core wires, φ0.18 is attached to the outer periphery of the end of the Cu wire (core wire).
Twist the Fe (magnetic metal wire) metal wire, wrap the Cu wire with twisted Fe wire around the tip of the Cu wire to prevent loosening, cut the tip with scissors, etc. The same unraveling prevention treatment is applied, the ends of the two Cu wires are butted together and joined to each other by resistance welding or the like. And from above the insulating coating,
The e-line is detected magnetically.

Further, as disclosed in Japanese Patent Application Laid-Open No. Hei 6-217436, an electrode 2 is used as an anode, and a core wire connection part 3 is connected to the core wire connection part 3 using a commercially available cobalt plating solution 4 as shown in JP-A-6-217436. A method of plating (forming a magnetic metal film) is employed (see FIG. 5). The cobalt plating solution 4 used for plating the core wire connection portion 3 is of a reservoir type, and becomes diluted each time the plating process is performed. In addition, the number of times that a desired film width can be plated is limited, and if the limit is exceeded, the desired film thickness and the desired film width cannot be plated, and sufficient detection cannot be performed from above the insulator. Therefore, conventionally, the number of times of plating the core wire connection portion 3 with one cobalt plating solution 4 is manually counted, and when the number of plating times of the cobalt plating solution 4 reaches the use limit, the cobalt plating solution 4 is replaced. .

[0004]

In such a conventional magnetic metal film forming apparatus, since the number of times of plating of the core wire connecting portion 3 with the cobalt plating solution 4 is manually performed, the number of times of plating is reduced. Erroneous counting may occur, and 1
If the number of times that plating can be performed with the cobalt plating solution 4 is exceeded, the plating formed on the surface of the core wire connecting portion 3 becomes uneven, and plating cannot be performed to a desired film thickness and a desired film width. As a result, sufficient detection cannot be performed from above the insulator, and a joint part is present on the way, and an electric wire lacking electrical reliability is mixed into the product (bundled wire).

It is an object of the present invention to detect the state of a cobalt plating solution so that plating can be performed to a desired film thickness and a desired film width at all times, and to perform plating on the surface of a core wire connecting portion in the best condition. Is to make it possible.

The object of the invention according to claim 2 of the present application is to stop the plating operation when the state of the cobalt plating solution cannot be plated to a desired film thickness and a desired film width, and to optimize the state of the cobalt plating solution. The purpose of the present invention is to inform the user of the fact that the state is invulnerable to plating on the surface of the core wire connecting portion.

[0007]

The inventor of the present invention has proposed that, when plating a core wire connecting portion by dipping it in a cobalt plating solution, a magnetic metal film is formed on the surface of the core wire connecting portion unless the electric resistance value of the cobalt plating solution is 10Ω or more. The inventor has found that the desired film thickness and the desired film width cannot be formed, and has found that the electric resistance value of the cobalt plating solution decreases with an increase in the number of times of plating. According to an experiment by the inventor, the electric resistance value of the cobalt plating solution was about 20Ω at the time of initializing, but as shown in FIG. 3, plating was performed once every 10 minutes (length: 3 times).
0 mm, immersion time t: 50 μm, supply current: 0.3 A), and the electric resistance of the cobalt plating solution was measured in units of 100 minutes (10 times). Elucidated.

According to a first aspect of the present invention, there is provided a magnetic metal film forming apparatus for forming a magnetic metal film for detecting a core wire connection, comprising: a constant current supply circuit for supplying a constant current between an electrode plate immersed in a plating solution and the core wire connection. A plating solution resistance measuring circuit that measures a plating solution resistance between the electrode plate and the core wire connection and outputs a voltage value, and a plating solution resistance value output from the plating solution resistance measurement circuit is lower than a reference resistance value. And a plating current control circuit for stopping the supply of the constant current supplied from the constant current supply circuit to the plating solution.

According to a second aspect of the present invention, there is provided a magnetic metal film forming apparatus for forming a magnetic metal film for detecting a core wire connection, comprising: a constant current supply circuit for supplying a constant current between the electrode plate immersed in a plating solution and the core wire connection. A plating solution resistance measuring circuit that measures a plating solution resistance between the electrode plate and the core wire connection and outputs a voltage value, and a plating solution resistance value output from the plating solution resistance measurement circuit is lower than a reference resistance value. A plating current control circuit for stopping supply of a constant current supplied to the plating solution from the constant current supply circuit, and an alarm when a plating solution resistance value output from the plating solution resistance measurement circuit falls below a reference resistance value. And an alarm generating circuit for issuing a warning.

[0010]

According to the first aspect of the present invention, the liquid resistance of the cobalt plating solution is measured using the electrode plate and the core wire connecting portion, and the state of the cobalt plating solution is adjusted to a desired metal film thickness and a desired metal film width. Always monitor so that plating can be performed, and when the plating solution resistance value falls below the reference resistance value, judge that the plating is no longer in the proper plating state, stop supplying the constant current supplied to the plating solution and prevent the plating process from being performed Therefore, the surface of the core wire connection portion can be always plated in the best condition.

According to the second aspect of the present invention, the liquid resistance of the cobalt plating solution is measured using the electrode plate and the core wire connecting portion, and the state of the cobalt plating solution is adjusted to a desired metal film thickness and a desired metal film width. Always monitor so that plating can be performed, and when the plating solution resistance value falls below the reference resistance value, judge that the plating is no longer in the proper plating state, stop supplying the constant current supplied to the plating solution and prevent the plating process from being performed Then, to issue an alarm, the cobalt plating solution can be appropriately replaced at an appropriate time, and the surface of the core wire connection portion can always be plated in the best condition.

[0012]

Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 is an overall circuit diagram showing an embodiment of a magnetic metal film forming apparatus for forming a magnetic metal film for detecting a core wire connection according to the first aspect of the present invention. In the figure, reference numeral 10 denotes a magnetic metal film forming apparatus for forming a magnetic metal film used for detecting a core wire connecting portion where a core wire is spliced at a core wire connecting portion. DC stabilized power supply 12 that converts a power supply into a DC power supply and outputs a stable DC power supply
A constant current supply circuit 13 for supplying a constant current between the electrode plate 2 immersed in the plating solution and the core wire connection portion 3, and converting a plating solution resistance measured between the electrode plate 2 and the core wire connection portion 3 into a voltage value. And a constant current supply circuit 13 for supplying the plating solution from the constant current supply circuit 13 when the plating solution resistance value output from the plating solution resistance measurement circuit 14 falls below the reference resistance value. Current control circuit 1 to stop
5 is provided.

The switch circuit 11 is configured as shown in FIG. That is, to the AC power supply, a switch P1 which is normally open with a manual operation automatic return contact, a switch P2 which is normally closed with a manual operation automatic return contact, and one end of a relay contact RY21 are connected via a main switch PSW and a fuse F. ing. The switch P1 is normally open and closed when pressed, and the other end of the switch P1 is connected to an AC power supply via a relay coil Ry2. The other end of the switch P2 is connected to a relay coil Ry.
2 is connected to an AC power supply. The switch P2 is a normally closed circuit, and is a switch that is opened when pressed. The other end of the switch P2 is connected to one end of a relay contact RY21 via a normally open timer contact T0. One end of a relay coil Ry2 is connected to the other end of the relay contact RY21. A relay is configured by the relay coil Ry2 and the relay contacts RY21 and RY22. Also, the relay contact RY22
Is connected to a timer T via a normally closed relay contact RY11. The timer T is activated after a predetermined time (1-2 seconds) after being energized, and the timer contact T
Time set by turning on 0 and T1 (for example, 180 seconds)
When it comes, the timer contacts T0 and T1 are turned off.
During the operation of the timer T, the operation state is maintained as long as the current is supplied to the timer T, and the timer contacts T0 and T1 are kept ON as long as the timer T is operated and the current is supplied. I have. When the timer T is turned off during operation (specifically, the coil is energized to be excited to close the timer contacts T0 and T1), the timer T is turned off.
F.

[0014] A DC stabilized power supply 12 is
The DC stabilized power supply 12 converts a commercial AC 100 V power supply to a predetermined DC voltage and outputs the DC voltage stably, and stabilizes the power voltage Vp and the drive voltage VR for driving the circuit. And output it. The drive voltage VR is output from the stabilized DC power supply 12, and the drive voltage V
The output terminal of R is supplied with a voltage V0 obtained by dividing the drive voltage VR by a resistor R1 and a Zener diode ZD, into a resistor R2 and a resistor R
3 to generate a reference voltage Vref1.
This reference voltage Vref1 is input to the (-) input terminal of the operational amplifier OP1. The output terminal of the operational amplifier OP1 is connected to one end of the resistor R6 and the (−) input terminal of the operational amplifier OP2. The base of the transistor Tr1 is connected to the other end of the resistor R6 via a resistor R7.
The collector of the transistor Tr1 has a timer contact T1
DC voltage V output from DC stabilized power supply 12 through
p is applied. The emitter of the transistor Tr1 is connected to one terminal A of two terminals A and B provided in the low current supply circuit 13, and the terminal A is connected to the electrode plate 2. A core wire connection 3 is connected to the other terminal B, and the resistance RL of the cobalt plating solution 4 is detected by the core wire connection 3 and the electrode plate 2. The (+) input terminal of the operational amplifier OP1 is connected to the other terminal B via a resistor R5. This operational amplifier OP2 outputs when the voltage value corresponding to the resistance RL of the cobalt plating solution 4 is higher than the reference voltage Vref1.

C1, C2, C3 and C4 are capacitors, R
8, R9 are resistors, V is a voltmeter, and A is an ammeter. These resistors R4, R5, R6, R9, capacitors C1, C3,
A plating solution resistance measuring circuit 14 is operated by the operational amplifier OP1.
Is configured. Further, the constant current supply circuit 13 is provided by the resistors R7 and R8, the capacitor C4, and the timer contact T1.
Is configured.

On the other hand, from the drive voltage VR output from the stabilized DC power supply 12, the resistance R1 and the Zener diode ZD
The reference voltage Vref2 is generated by dividing the voltage V0 divided by the resistors R10 and R11. The reference voltage Vref2 is configured to be input to the (+) input terminal of the operational amplifier OP2 via the resistor R12. One end of a resistor R14 is connected to the output terminal of the operational amplifier OP2. The output terminal of the operational amplifier OP2 compares the reference voltage Vref2 with the voltage output from the operational amplifier OP1, and outputs a signal when the output voltage from the operational amplifier OP1 is smaller than the reference voltage Vref2. The other end of the resistor R14 is connected to the base of a transistor Tr2 via a resistor R15.
The relay coil Ry1 is connected to the collector 2. The emitter of the transistor Tr2 is grounded. In the figure, C5 and C6 are capacitors, R13 and R16.
Is a resistor, and D is a diode. This relay coil Ry
1 and a relay contact RY11 constitute a relay.

The resistors R12, R13, R14, R1
5, R16, capacitors C5 and C6, operational amplifier OP
2. A plating current control circuit 15 is constituted by the transistor Tr2, the relay coil Ry1, and the diode D.

Next, the operation of this embodiment will be described with reference to a time chart shown in FIG. << At the start of operation >> First, one side (+) of the constant current supply open circuit 13
The electrode plate 2 is connected to the terminal A, and the core wire connecting portion 3 is connected to the other (-) terminal B of the constant current supply open circuit 13, and immersed in the cobalt plating solution 4. Thereafter, the ON time of the timer T (specifically, for example, 180 seconds) is set, and FIG.
(A), at time t1, the main switch PSW
Turn ON. After the main switch PSW is turned on, the switch P1 is manually turned on (specifically, a push button switch is pressed) at time t2 as shown in FIG.
The ON state is maintained for a predetermined time until time t4 shown in FIG. 2B (the time from t2 to t4 is a time sufficient for the timer T to start operating and may be about 2 to 3 seconds).
At this time, the switch P2 is turned ON as shown in FIG.
It is in the N (closed) state. When the switch P1 is turned on, a current flows through the relay coil Ry2 to excite the relay coil Ry2, and as shown in FIGS. 2D and 2E,
The relay contacts RY21 and RY22 are closed. When the timer T starts to operate (specifically, energizes the coil) at time t3 while the switch P1 is ON, as shown in FIGS. 2 (F) and 2 (G), the timer contact T
0 and T1 are turned ON, and the ON is continued for the time (180 seconds for baking) set by the timer T.

The ON of the timer contact T0 is determined by the switch P
2. Close the circuit of the timer contact T0, the relay contact RY21, and the relay coil Ry2, and determine the route in which the current is supplied to the relay coil Ry2 in the flow of the switch P2 → the timer contact T0 → the relay contact RY21 → the relay coil Ry2. . Therefore, by turning ON the timer contact T0,
The current is supplied to the relay coil Ry2 via the switch P2, the timer contact T0, and the relay contact RY21. The current is supplied to the relay coil Ry2 by turning the switch P1 off.
F is secured even if F, switch P2 → timer contact T0 →
Relay contact RY21, relay contact RY unless the current flow from relay contact RY21 to relay coil Ry2 is interrupted.
The ON state of 22 will be maintained. Relay contact RY
Maintaining the ON state of 22 keeps the power supply path to the timer T from the relay contact RY22 → the relay contact RY11 → the timer T, and continues to operate the timer T.

On the other hand, when the main switch PSW is turned on, the stabilized DC power supply 12 outputs the power voltage Vp.
, A driving voltage VR is output. The operational amplifier OP1 is operated by the drive voltage VR, the liquid resistance RL of the cobalt plating solution 4 is measured, and the measured voltage is input to the (+) input terminal of the operational amplifier OP1. When the main switch PSW is turned on, there is no current flowing through the cobalt plating solution 4, so that the (+) side input terminal of the operational amplifier OP1 has a (-)
A voltage higher than the reference voltage Vref1 input to the side input terminal is applied, and the output terminal of the operational amplifier OP1
As shown in (H), when the main switch PSW is turned on, High is output at about the same time t1. The high level output of the operational amplifier OP1 causes the transistor T
As shown in FIG. 2 (I), r1 is turned on at time t1 substantially at the same time when the main switch PSW is turned on. Here, when the timer contact T1 is turned on at time t3 as shown in FIG. 2 (G), the cobalt plating solution 4 is applied from the collector side of the transistor Tr1 which is turned on via the electrode plate 2 connected to the emitter. A constant current is supplied.

The value of the liquid resistance RL of the cobalt plating solution 4 is:
As shown in the characteristic graph of the cobalt solution-number of plating times shown in FIG. 3, it initially has about 20 Ω, and the value of the liquid resistance RL decreases as the number of plating times increases. The graph of the cobalt solution-plating number characteristic shown in FIG. 3 shows that a current of 0.3 A is supplied to the plating solution, immersed in the plating solution for 10 minutes, and having a thickness of 5 mm over a length of 30 mm.
The plating was performed to 0 μm, and this was repeated 10 times, and the liquid resistance was measured every 10 times when sampling was performed. When the measurement of the liquid resistance RL of the cobalt plating solution 4 is started, since the value of the liquid resistance RL is 20Ω, the operational amplifier O
Since a voltage higher than the reference voltage Vref1 input to the (−) side input terminal of the operational amplifier OP1 is input to the (+) side input terminal of P1, the output of the operational amplifier OP1 is as shown in (H) of FIG. As shown, the transistor Tr1 remains at the high level, and the transistor Tr1 maintains the ON state. Then, FIG.
(B), at time t4, the switch P1 is turned off.
Even when F, the output of the operational amplifier OP1 does not become Low, and the ON state of the transistor Tr1 is maintained.

<< Stop during operation >> As described above, the timer T
When it is necessary to temporarily stop the apparatus for some reason during the operation and the plating, the switch P2 is used. Now, as shown in FIG. 2C, when the switch P2 is turned on at time t5 during plating, and the circuit is opened, the switch P2 → the timer contact T
0 → the relay contact RY21 → the current flow from the relay coil Ry2 is cut off, no current is supplied to the relay coil Ry2, and the excitation of the relay coil Ry2 is released.
When the excitation of the relay coil Ry2 is released, the relay contact RY21 and the relay contact RY22 are changed to (D) and (E) in FIG.
At time t5 when the switch P2 is turned on, as shown in FIG.
F.

Even if the switch P2 is released from the switch P2 and the switch P2, which is a manual operation automatic return contact, returns to the closed state,
Since the switch P1 is OFF, the route for supplying current to the relay coil Ry2 is cut off, the relay coil Ry2 is not excited, and the relay contact RY21 does not turn on again. That is, when the relay contact RY21 is turned off, the switch P
The current flow of 2 → timer contact T0 → relay contact RY21 → relay coil Ry2 does not return again. The relay contact RY22 is turned off by a power supply path to the timer T, the relay contact RY22 → the relay contact RY11.
→ The timer T is cut off. Thus, the timer T is turned off, and the timer contacts T0 and T1 are turned off. This timer contact T0 is turned off by the switch P2 →
Timer contact T0 → relay contact RY21 → relay coil R
The current supply path for y2 is opened, and the path for supplying current to the relay coil Ry2 is cut off. Once the timer T is turned off, it does not restart unless the current is supplied again unless the timer T is reset, and the timer contacts T0, T
1 is never turned on. Therefore, the timer contact T
By turning OFF 0, the hand is released from the switch P2, and after the switch 2, which is a manual operation automatic return contact, returns to the closed state, the switch 1 is turned on, the relay coil Ry2 is excited, and the relay contacts RY21, RY22 are turned on. However, the timer T does not operate, and the timer contact T0 is
It remains at F. Here, if the switch P1 is turned off, the switch P2 which is a route for supplying current to the relay coil Ry2 after the switch P1 is turned off → the timer contact T0 →
Since the timer contact T0 of the relay contact RY21 → the relay coil Ry2 is OFF, the relay coil Ry
2 is interrupted when the switch P1 is turned off, the relay contacts RY21 and RY22 are turned off again, and the current is supplied to the relay coil Ry2 via the switch P2 → the timer contact T0 → the relay contact RY21. Absent.
That is, even if the switch P2 is returned (closed), the timer T is turned off even if the current is supplied to the relay coil Ry2.
This is not performed because the timer contact T0 is open.

When the timer contact T1 is turned off, the current circuit for supplying current from the collector of the transistor Tr1 is shut off. That is, the constant current supplied by the electrode plate 2 and the core wire connecting portion 3 into the cobalt plating solution 4 is cut off. As described above, when the switch P2 is turned on, the constant current to the cobalt plating solution 4 is cut off, so that the (+) input terminal of the operational amplifier OP1 is input to the (−) input terminal of the operational amplifier OP1. A voltage higher than the reference voltage Vref1 is applied, and the operational amplifier OP
The output of No. 1 is maintained at High as shown in FIG. Therefore, a voltage higher than the reference voltage Vref2 input to the (+) side input terminal of the operational amplifier OP2 is applied to the (−) side input terminal of the operational amplifier OP2, and the transistor Tr1 maintains the OFF state. . To restart the device from this stage, the timer T is set and the switch P1 is turned on.

<< Decrease in liquid resistance during operation >> Next, a timer T is set, and the switch P1 is turned on at time t6 as shown in FIG. 2 (B). The timer contacts T0 and T1 are closed at time t7 as shown in FIGS. 2 (F) and 2 (G). After a while, switch P
As shown in FIG. 2 (B), even if 1 is turned off at time t8, the timer T has the relay contact RY22 → the relay contact RY
Since the electric current is supplied through 11, the operation state is continued. Then, as the number of times of the plating process increases, the liquid resistance RL which was about 20Ω at the beginning decreases, and the operational amplifier O
The voltage value corresponding to the measured resistance value input to the (+) input terminal of P1 is lower than the reference voltage value Vref1 (liquid resistance RL: equivalent to 10Ω) input to the (−) input terminal of the operational amplifier OP1. Then, the output of the operational amplifier OP1 changes from High to Low at time t9, as shown in FIG. The output (Low) of the operational amplifier OP1 turns off the transistor Tr1 and stops the supply of the constant current to the cobalt plating solution 4. Also, the (−) of the operational amplifier OP2
A voltage lower than the reference voltage Vref2 input to the (+) input terminal of the operational amplifier OP2 is input to the side input terminal from the output terminal of the operational amplifier OP1. Accordingly, from the output terminal of the operational amplifier OP2, as shown in (I) of FIG. 2, the output changes from Low to High at a time t10, which is a fixed time after the time t9 when the output of the operational amplifier OP1 becomes Low. Due to the High of the output of the operational amplifier OP1, as shown in FIG.
2 turns ON. From the time point (t9) when the output of the operational amplifier OP1 is Low (t9), the time point when the transistor Tr2 turns ON (t
The time lag up to 10) is due to the action of the capacitor C5 inserted between the (+) input terminal of the operational amplifier OP2 and the (-) input terminal of the operational amplifier OP1.

The output (High) of the operational amplifier OP2 turns on the transistor Tr2 to excite the relay coil Ry1 connected to the collector of the transistor Tr2, and the normally closed contact RY11 is shown in FIG. 2K. Thus, it is opened (OFF) at time t10. This relay contact R
By the opening (OFF) of Y11, the current supply route from the relay contact RY22 → the relay contact RY11 → the timer T is cut off and the current supply to the timer T is stopped, so that the timer T is turned off. When the timer T is turned off, the timer contacts T0 and T1 are changed as shown in FIGS. 2 (F) and 2 (G).
Open (OFF) at time t10.

When the timer contact T1 is turned off, the current circuit for supplying current from the collector of the transistor Tr1 is shut off. That is, when the liquid resistance RL of the cobalt plating solution 4 falls below a predetermined resistance value, the constant current supplied by the electrode plate 2 and the core wire connecting portion 3 into the cobalt plating solution 4 is interrupted to stop the plating process. Become. Therefore, the fact that the output of the operational amplifier OP2 becomes High means that the liquid resistance RL of the cobalt plating solution 4 has a predetermined resistance value (10Ω).
, Which means that it is time to replace the cobalt plating solution itself, which urges the replacement of the cobalt plating solution. When the liquid resistance of the cobalt plating liquid 4 falls below a predetermined resistance value (10Ω), the output of the operational amplifier OP2 becomes High and the timer contacts T0, T
When 1 is turned off, the device cannot be restarted unless the cobalt plating solution 4 is replaced. After replacing the cobalt plating solution 4 with a new one, the operation can be restarted by setting the timer T and turning on the switch P1.

<< Stop by plating end >> Timer T
The plating time is set, and the plating process is performed while the timer T operates and the timer contacts T0 and T1 are turned on. Since the main switch PSW is still ON after the replacement of the cobalt plating solution 4 with a new one, the operation can be restarted by setting the timer T and turning on the switch P1 in order to start up the equipment. That is, first, the timer T is set, and the switch P1 is manually turned on at time t11 as shown in FIG.
(Specifically, the push button switch is pressed), and the ON state is maintained for a predetermined time until time t13 shown in FIG. At this time, the switch P2 is in the ON (closed) state as shown in FIG. When the switch P1 is turned on, a current flows through the relay coil Ry2 to excite the relay coil Ry2, and as shown in FIGS. 2D and 2E, the relay contacts RY21 and RY22 are closed at time t12. .

Further, t while the switch P1 is ON
When the timer T starts to operate at 12 (specifically, the coil is excited), as shown in (F) and (G) of FIG.
The timer contacts T0 and T1 are turned ON, and are kept ON for the time set by the timer T (180 seconds for baking). The ON of the timer contact T0 is determined by the switch P2 → the timer contact T0 →
The circuit of the relay contact RY21 → the relay coil Ry2 is closed, and the current flows to the relay coil Ry2 through the switch P2, the timer contact T0, and the relay contact RY21.
Even if the switch P1 is turned off, the current supply route of the switch P2 → the timer contact T0 → the relay contact RY21 → the relay coil Ry2 is secured, and the switch P2 → the timer contact T
As long as the current flow from 0 → relay contact RY21 → relay coil Ry2 is not interrupted, the ON state of the relay contacts RY21 and RY22 is maintained. Maintaining the ON state of the relay contact RY22 maintains the power supply path to the timer T from the relay contact RY22 → the relay contact RY11 → the timer T, and the timer T is continuously operated.

On the other hand, since the main switch PSW has been turned on from the beginning of the restart of the equipment, the DC stabilized power supply 1
2, the power voltage Vp and the drive voltage VR are output, and the operational amplifier OP1 is in an activated state.
Before the timer T operates, the timer contact T1 is turned off.
Since it is in the (open) state, there is no supply of a constant current to the cobalt plating solution 4 and no plating is performed. For this reason, the (+) input terminal of the operational amplifier OP1 has the reference voltage Vref1 input to the (−) input terminal.
A higher measurement voltage corresponding to the measured value of the liquid resistance RL of the cobalt plating solution 4 is applied, and High is output from the output terminal of the operational amplifier OP1 before the switch P1 is turned on, as shown in FIG. ing. This operational amplifier O
As shown in FIG. 2I, the transistor Tr1 is turned ON before the switch P1 is turned on by the output of High of P1.
It is in a state.

The set time of the timer T (for example, 180
(Second) has elapsed and when the plating of one core wire connection portion 3 is completed, the timer T is turned off. When the timer T is turned off, as shown in FIGS. 2F and 2G, the timer contact T
0 and T1 are turned off (open). Timer contact T1 is OF
When F (open), the collector of the transistor Tr1 is opened, the constant current supplied to the cobalt plating solution 4 is cut off, and the plating process ends. When the timer contact T0 is turned off (open), the current supply route of the switch P2 → the timer contact T0 → the relay contact RY21 → the relay coil Ry2 is cut off, and the excitation of the relay coil Ry2 is released. As shown in (E), the relay contact RY21 and the relay contact RY22 are turned off (open). The turning off of the relay contact RY22 interrupts the current supply route to the timer T. When the supply of the constant current is stopped due to the end of the plating process, a timer T is set and the switch P1 is turned on at t15 as shown in FIG. ON at the time
(Closed) to excite the relay coil Ry2, and as shown in FIGS.
Y21 and the relay contact RY22 are turned on (closed). Thereafter, the timer T operates and the timer contacts T0 and T1 are turned on (closed) at time t16 as shown in FIGS. 2 (F) and 2 (G).
I do. Thereafter, as shown in FIG. 2B, even if the switch P1 is turned off at time t17, the timer T is supplied with current from the relay contact RY22 to the relay contact RY11, so that the operation state is continued. You.

FIG. 4 shows an embodiment of the present invention according to claim 2 of the present invention, which is output from a plating solution resistance measuring circuit 14 of a magnetic metal film forming apparatus for forming a magnetic metal film for detecting a core wire connection. FIG. 3 is an overall circuit configuration diagram of an alarm generation circuit 16 that issues an alarm when a plating solution resistance value falls below a reference resistance value. The alarm generation circuit 16 has a relay contact R which is a normally open contact.
The alarm 17 is connected via Y12. The alarm 17 is a bell, a speaker for notifying the decrease of the liquid resistance by a synthesized voice, or the like. The voltage value corresponding to the liquid resistance RL of the cobalt plating solution 4 input to the (+) input terminal of the operational amplifier OP1 is the reference voltage value Vref1 (liquid resistance RL :) input to the (−) input terminal of the operational amplifier OP1. (Equivalent to 10Ω)
If the output voltage of the operational amplifier OP1 is lower than that of the operational amplifier OP2, the output of the operational amplifier OP1 becomes Low as shown at the time t9 in FIG. 2H, and the output of the operational amplifier OP1 is input to the (-) side input terminal. (−) When the input voltage of the input terminal decreases and becomes lower than the reference voltage Vref2, the operational amplifier O
The output of P2 is H as shown at time t10 in FIG.
igh. The high level output of the operational amplifier OP2 turns on the transistor Tr2 at time t10 in FIG. 2 (L), energizes the relay coil Ry1 connected to the collector of the transistor Tr2, and is a normally open contact shown in FIG. Close (ON) the relay contact RY12. When the relay contact RY12 is closed (ON), the alarm generation circuit 16
Is powered and an alarm is issued.

[0033]

According to the first aspect of the present invention, when the plating solution resistance value is lower than the reference resistance value, it is determined that the plating state is not proper, and the supply of the constant current supplied to the plating solution is stopped. To prevent plating.
It can be plated on the surface of the core wire connection in the best condition,
Halfway plating can be prevented from being performed.

According to the second aspect of the present invention, when the plating solution resistance value is lower than the reference resistance value, it is determined that the plating state is not proper, and the supply of the constant current supplied to the plating solution is stopped to perform plating. Since a warning is issued in such a manner, the cobalt plating solution can be appropriately replaced at an appropriate time, and the surface of the core wire connection portion can always be plated in the best condition.

[Brief description of the drawings]

FIG. 1 is an overall configuration diagram showing an embodiment of a magnetic metal film forming apparatus for forming a magnetic metal film for detecting a core wire connection portion according to the first aspect of the present invention.

FIG. 2 is a time chart of the magnetic metal film forming apparatus shown in FIG.

FIG. 3 is a characteristic diagram of a liquid resistance with respect to a use elapsed time of the cobalt plating solution shown in FIG. 1;

FIG. 4 is a circuit configuration diagram of an alarm circuit of a magnetic metal film forming apparatus for forming a magnetic metal film for detecting a core wire connection portion according to the second aspect of the present invention.

FIG. 5 is a schematic view showing a conventional magnetic metal film forming apparatus.

[Explanation of symbols]

1 ……………………………………………………………………………………………………………………… Electrode 3 ………………………… ...... Core wire connection part 4 ... Cobalt plating liquid 10 ... Magnetic metal film forming apparatus 11 ... ……………………………………………………………………………………………………………… Stabilized DC power supply 13 …………………………………………………………………………………………………………………………………………………………………………… ……………………… Plating solution resistance measurement circuit 15 …………………………… Plating current control circuit 16 …………………………… ……… Alarm generation circuit

Claims (2)

(57) [Claims] 1. A constant current supply circuit for supplying a constant current between an electrode plate immersed in a plating solution and a core wire connection portion, and measuring a plating solution resistance between the electrode plate and the core wire connection portion to output a voltage value. A plating solution resistance measuring circuit, and a plating current for stopping supply of a constant current supplied to the plating solution from the constant current supply circuit when a plating solution resistance value output from the plating solution resistance measurement circuit falls below a reference resistance value. A magnetic metal film forming apparatus for forming a magnetic metal film for core wire connection detection, comprising: a control circuit. 2. A constant current supply circuit for supplying a constant current between an electrode plate immersed in a plating solution and a core wire connection portion, and measuring a plating solution resistance between the electrode plate and the core wire connection portion and outputting a voltage value. A plating solution resistance measurement circuit, and plating for stopping supply of a constant current supplied to the plating solution from the constant current supply circuit when a plating solution resistance value output from the plating solution resistance measurement circuit falls below a reference resistance value. A magnet for detecting a core wire connection portion, comprising: a current control circuit; and an alarm generation circuit that issues an alarm when a plating solution resistance value output from the plating solution resistance measurement circuit falls below a reference resistance value. A magnetic metal film forming apparatus for forming a metal film.