JP2996735B2 - Abstract printing plate making method for printing building materials - Google Patents

Abstract

PURPOSE:To facilitate production of a miniature plate and to effect production thereof in a short time, in printing of an abstract pattern building material. CONSTITUTION:Picture data of a unit raw material is first read by means of an input scanner 1 and secondly, the read picture data of the unit raw material is vertically and laterally arranged, and watermark synthesis is made on the patterns of the adjoining unit raw materials. In a pattern on which watermark synthesis is applied, trimming is effected at P1-P4 so that picture data at an upper end is made same as that at a lower end and picture data at left and right ends are made same as each other to produce picture data having an endless pattern. Picture data of an endless pattern are vertically and laterally arranged in a manner to leave no space therebetween to produce picture data of a miniature plate used for executing proof print.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plate making system for printing building materials, and more particularly to a plate making system for printing building materials having an abstract pattern.

[0002]

2. Description of the Related Art In recent years, the shortage of natural materials such as wood has been called out, and various building materials such as plywood and gypsum board have been developed as substitutes for such materials. As a result, the role played by building material printing has become important.

[0003] Printing patterns for building materials include a wood grain pattern imitating a pattern of a natural product such as wood grain or stone grain, a geometric pattern, a grain pattern,
Abstract patterns related to human creation, such as a tint block and a floral pattern, are known. However, since the present invention relates to the latter abstract pattern, plate making of the abstract pattern will be described below.

FIG. 18 schematically shows a conventional plate making process for an abstract pattern.

[0005] As shown in FIG. 18A, first, when a material sample of an abstract pattern including a design image, a photograph, and the like is submitted, the material sample is photographed with a plate-making camera, and a separation film is created. In order to eliminate a step between adjacent material samples, a suitable mask is applied and a film is successively printed and repeated by film synthesis, and a plate for proof printing (hereinafter, this plate is referred to as a baby plate) is created. The film taken from the material sample is usually about 3 to 5 cm square, but as shown in FIG. 18B, the film 101 is repeated nine times each in the vertical and horizontal directions to create a plate about 1 m square. be able to. This is the baby version 102.

Next, gravure engraving is performed based on the baby plate to prepare a printing plate for gravure printing and proof printing is performed. When a desired abstract pattern is obtained, the baby plate is repeated and the book is printed. A plate for the plate is created, a printing plate is created based on the plate, proof printing is performed again, and when a desired abstract pattern is obtained, printing is performed by this machine.

[0007] The above is a process for producing a baby plate by film synthesis, and all of the processes are performed manually by an operator. In recent years, a layout scanner has been used, for example, to shoot a film sample of a material sample. Attempts have been made to digitize a part of the above process by performing the steps of reading the image data, repeating the image data, outputting the film as a film, and creating a baby plate with a layout scanner. However, also in this case, the step of repeating the baby version to create the main version is performed by manually combining the baby version photographically.

[0008]

However, as described above, in the past, the plate making process of printing a building material with an abstract pattern is usually performed manually, which is not only problematic in that it is extremely expensive. There were also the following problems.
In other words, the material sample may have uneven density or an uneven pattern. The unevenness of density and the unevenness of the pattern do not cause any problems in the material sample itself, but when a baby plate is created by repeating, the unevenness of the density or the unevenness of the pattern is emphasized and the creation is performed. It appears as a repetition pattern that is not intended by the creator or designer, and the repetition pattern is more prominent than the original abstract pattern, which is a major problem. Name). For example, as shown in FIG. 19A, it is assumed that density unevenness as shown by 104 has occurred in a material sample 103 having a fine pattern (not shown), and as shown in FIG. If the baby plate 105 is created four times in the vertical direction and a baby plate 105 is created, a printing plate is created based on the baby plate 105, and when gravure printing is performed, the density unevenness is reduced as shown in FIG. The repetitive pattern is emphasized, resulting in a pattern. On the other hand, when joints are added as shown in FIG. D, the pattern is relatively inconspicuous because the lattice pattern of the joints is conspicuous. There is no problem.

[0009] Since the occurrence of pattern distortion is a fatal defect in the construction material of the abstract pattern, an operation for confirming the presence or absence of pattern distortion is performed in the course of the printing process of this plate. Conventionally, means for confirming by proof printing has been adopted. Of course, it is conceivable to check the pattern on the plate making film, but since the pattern changes depending on the color, it is not possible to reliably grasp whether the pattern is black and white on the plate making film which is a black and white film. Very difficult,
In the end, although the cost was high, it had to be confirmed by proof printing using a baby version.

[0010] Also, the work of removing the pattern habit is called a retouching work, in which a mask is re-created, the pattern is rearranged, or the pattern is rotated to synthesize a film, and the baby is reprinted. The retouching work is performed, but the retouching work requires not only a great skill but also a large work load, and it takes a long time since all the work is performed manually, and as a result, it takes a long time until the delivery date Plate making cost was high.

In addition, there are not a few patterns that cannot be removed by manual retouching, and in such a case, the planning itself is stopped, and the plate-making process ends up in vain.

[0012] Such a situation is the same when a layout scanner is used. Although the creation of a baby plate pattern is automated, the retouching operation still relies on manual work. Is something that has not been resolved. Of course, the pattern of the material sample read by the input scanner can be displayed on the monitor screen and rotated, or repeated using an appropriate mask pattern. The operation was the same as the operation, and instead of using an optical operation using a film, the operation was merely performed on a monitor using a pointing device such as a mouse or a stylus pen, and the time and effort were exactly the same. In addition, since the entire pattern of the baby plate having a size of about 1 m square cannot be displayed on the screen as described above, whether the pattern has been removed even if the retouching work is performed on the display screen. Could not be confirmed. In other words, it is not possible to know whether pattern habits will occur from the pattern of the material sample alone, but it is possible to confirm the occurrence of pattern habits only after repeating the material sample and creating a baby version, Therefore, in order to be able to confirm the presence or absence of the pattern, it is necessary to be able to display the entire baby plate pattern on the monitor screen, but the monitor of the conventional layout scanner cannot display it.

[0013] Furthermore, even if the entire pattern of the baby version could be displayed, even though the pattern could not be confirmed in the baby version, the pattern was not obtained when the baby version was repeated and the main version was created. In some cases, such a situation cannot be handled by a conventional abstract pattern plate making system using a layout scanner.

An object of the present invention is to solve the above-mentioned problems, and in particular, to provide a method for making an abstract pattern for printing a building material, which can easily produce a baby version.

[0015]

In order to achieve the above-mentioned object, a first method for making an abstract pattern for building material printing according to the present invention is to perform watermark synthesis of unit material image data read by an input scanner up and down and left and right a predetermined number of times. A pattern pattern of a predetermined size is created, and trimming is performed so that the upper end and the lower end and the left end and the right end of the pattern pattern have the same data. A unit pattern image data read by the scanner is watermark-combined up, down, left, and right a predetermined number of times to create a first pattern having a predetermined size, and trimmed so that the upper and lower ends and the left and right ends of the pattern become the same data. Creating a second pattern, and arranging the second pattern in an up, down, left, and right space without any gap to create a third pattern for proof printing. And it features.

[0016]

In the abstract pattern making method for building material printing according to the present invention, first, the image data of the unit material is read by the input scanner, and then the read image data of the unit material is arranged vertically and horizontally, and the pattern of the adjacent unit material is formed. Are synthesized by watermark synthesis. Next, the synthesized pattern is trimmed so that the image data at the upper end and the lower end and the image data at the left end and the right end are the same image data. Thereby, image data corresponding to the endless pattern of the following embodiment is created.
Then, by arranging the trimmed image data vertically and horizontally without any gap, image data for proof printing corresponding to the baby plate of the following embodiment is obtained.

[0017]

Embodiments will be described below with reference to the drawings.

FIG. 1 is a diagram showing the configuration of an embodiment of an abstract pattern making system for building material printing according to the present invention, in which 1 is an input scanner, 2 is an output scanner, 3 is control means, and 4 is an input. Means 5, storage means 6, gravure engraving machine 6, color hard copy 7, abstract pattern plate making processing means 9, endless processing section 10, pattern checking processing section 10, pattern removal processing section 11, 12 is a repeat processing unit, 13 is a display processing means, and 14 is a monitor.

In FIG. 1, an input scanner 1 scans a color film obtained by photographing a material sample, and converts each pixel into four colors of cyan (C), magenta (M), yellow (Y), and black (K). This is output as digital image data of a predetermined number of bits, for example, 1 byte, and has the same configuration as an input scanner used in a conventional layout scanner.

The output scanner 2 outputs color separations of C, M, Y, and K as a film, and has the same configuration as the output scanner used in a conventional layout scanner.

The control means 3 manages the operation of the abstract printing plate making system for building material printing, and comprises a microcomputer, ROM, RAM and the like.

The input means 4 comprises an input device such as a keyboard and a pointing device.

The storage means 5 is composed of a storage device such as a RAM and / or a hard disk.

The gravure engraving machine 6 performs engraving of a baby version and engraving of a main version.

The color hard copy 7 is composed of a sublimation transfer printer, an ink jet printer, or the like, and is capable of outputting a color hard copy of at least the size of a baby plate, and more preferably outputs a color hard copy of the size of the main plate. What is possible is good.

The abstract pattern prepress processing means 8 includes an endless processing section 9, a pattern correction confirmation processing section 10, and a pattern reduction processing section 11.
And a repeat processing unit 12. The operation of each of these units will be described later.

The display processing means 12 controls the display of the monitor 14, and includes a video RAM having a predetermined capacity corresponding to the number of pixels of the monitor 14.

The monitor 14 is composed of a display device such as a color CRT, but it is desirable that the monitor 14 can display with high definition.

Next, the operation of the configuration of FIG. 1 will be described with reference to FIG. FIG. 2 is a flowchart showing an example of a plate making process when the construction material printing abstract pattern plate making system having the configuration shown in FIG. 1 is used. The unit material is set on the input scanner 1 and read (step S1). The reading of the unit material can be performed in the same manner as the conventional layout scanner. If the unit material is a film, it can be set in the input scanner 1 as it is. However, in the case of a design image other than a film, it is photographed and read using a color film, or a plate-making camera as necessary. To create a separation film and read it.

The image data of the unit material read in step S 1 is stored in the storage means 5.

Next, when the endless processing is instructed from the input means 4, the control means 3 activates the endless processing section 9 of the abstract pattern making process means 8 to execute the endless processing (step S2). .

The endless process referred to in the present invention is a process in which mask data is applied to a unit material and the vertically adjacent unit materials are watermarked and synthesized to obtain pattern data having a size about four times or nine times as large as an area (hereinafter, referred to as a pattern data). The pattern obtained by the endless processing is referred to as an endless pattern.) The image data for the baby version is created by simply repeating the endless pattern data a predetermined number of times. That is,
The endless pattern is located at an intermediate stage between the unit material and the baby version, thereby greatly reducing the workload of the operator. In other words, in the past, a baby version was directly created by repeating a unit material while performing a mask process, but as described above, the unit material is about 3 to 5 cm square, and the baby version is about 1 m square. Because it is large, it takes a lot of time to create a baby version, whereas the endless pattern in the present invention is
Although mask processing is applied, it is only necessary to synthesize the unit material at most about nine times, and the synthesis is performed automatically. For the baby version, the endless pattern created in this way is simply applied without mask processing Since only the repeat is performed, the workload is greatly reduced as compared with the related art.

Hereinafter, the endless processing will be described in detail with reference to FIG. Now, assuming that an instruction to create an endless pattern by combining the unit materials three times in the horizontal and vertical directions is given, the endless processing unit 9 combines the unit materials three times in the horizontal direction and three times in the vertical direction. At this time, FIG.
As shown in FIG. 3A, when performing the horizontal composition, the superposition is performed with the width of WY, and when performing the vertical composition, WT is used.
, And the second row is horizontal W
Shift by O. Then, the watermark synthesis in the proportions indicated by a region R ₂ in FIG. 3B is a transverse overlapping area and vertical overlap region. For example, taking the synthesis of a unit material 15 ₁ and the unit elements 15 ₂ as an example, although the handle region R ₁ in the unit material 15 ₁ in FIG. 3B is 100%, the region R ₂ in the unit material 15 ₁ of the handle is while linearly decreasing to 0%, the unit material 15 ₂ of the handle increases from 0% linearly to 100%, the handle region R ₃ in the unit material 15 ₂ is 100%.
The same applies to the vertical composition.

As described above, the unit materials can be automatically synthesized. However, when it is expected that a step will occur in the overlapping portion of the unit materials, or when a pattern having a relatively large area exists in the overlapping portion. When it is predicted that the pattern is destroyed by the composition, the above-described automatic composition is not appropriate. Therefore, in addition to the above-described mode of performing the automatic synthesis, the endless processing unit 9 also includes a mode in which a mask for synthesis can be arbitrarily set. In this mode, for example, as shown in FIG. , Two masks M ₁ and M ₂ are set in the overlapped area, and watermark synthesis can be performed in a region sandwiched between these two masks at a rate indicated by a region R ₂ in FIG. 3B. The same applies to the vertical direction. However, it is natural that a mask is separately set at the time of vertical composition.

The horizontal overlap width WY, the vertical overlap width WT, and the shift amount WO of the second stage may be set in advance in the endless processing unit 9 as fixed values, or the operator may use an input means. 4 may be set each time. For setting two mask patterns, for example, a pattern of a horizontal overlapping portion and a pattern of a vertical overlapping portion are displayed on the monitor 14, and a mask line is traced with a mouse or a stylus pen on the screen. The traced pattern data may be taken in as mask pattern data. The mask set for the horizontal synthesis is used in common in the horizontal synthesis, and the mask set for the vertical synthesis is common in the vertical synthesis. Used.

When the synthesis of the unit materials is completed as described above, the endless processing section 9 displays the synthesis result on the screen of the mode 14. Therefore, for example, a unit material 15 arbitrary point P ₁ on ₁ located in the upper left corner (FIG. 3A) is assumed to be indicated, the endless processing unit 9, the unit material 15 ₃ located in the upper right corner of the synthetic pattern, Unit material 1 located in the lower left corner
5 _7, the unit material 15 ₉ located in the lower right corner, obtains a coordinate value on the synthesis pattern of the designated point P ₁ P ₂ points having the same address and, P _3, P ₄ on each unit material, these 4 A rectangle defined by points P ₁ , P ₂ , P ₃ , and P ₄ is cut out and registered as an endless pattern. The reason for performing such cutting is to prevent a step from occurring when a baby version is created. That is, as will be described later, the baby version is created by simply repeating the endless pattern, but if the above-described cutout is performed, the two points P _{1 in} FIG. 3A are obtained.
Both sides of the handle of a straight line connecting P ₂ is because it is exactly the same as a straight line on both sides of the handle connecting two points P ₃ and P _4, since there is no difference in level occurs even repeat the endless pattern vertically is there. The same applies to the horizontal direction.

The above is the processing in step S2 in FIG.
In this way, by creating a pattern located at an intermediate stage between the unit material called the endless pattern and the baby plate, the workload can be significantly reduced as compared with the related art.

When the endless processing is completed, it is next determined whether or not the endless pattern has a pattern (step S3). Conventionally, as described above, proof printing was performed to check for the presence or absence of pattern distortion, but the abstract pattern plate making system for building material printing shown in FIG. 1 includes a pattern distortion confirmation processing unit 10, This makes it possible to quickly and easily confirm the presence or absence of the pattern.

The pattern change confirmation processing unit 10 is activated by the control means 3 when a predetermined menu is selected by the input means 4, and calls the registered endless pattern created and registered in step S2 to display the image of the endless pattern. The data is thinned out to reduce the data to a predetermined magnification, for example, 1/4 of the original size. For example, if the endless pattern is as shown in FIG. 4A, the pattern checking processing section 10 thins out the pixels of the endless pattern 16 at a predetermined interval at a predetermined interval, and as shown in FIG. To shrink. Next, the pattern change confirmation processing unit 10 performs a repeat process of arranging the reduced endless pattern without any gaps in the vertical and horizontal directions. As a result, a pattern in which the endless pattern is repeated as shown in FIG. 4C is obtained. The pattern change confirmation processing unit 10 passes this to the display processing unit 13 and displays it on the screen of the monitor 14.

The reason why the endless pattern is reduced and displayed in a repeated manner is as follows. Patterning may occur during the baby version as described above,
Although it may occur at the stage of this version although it cannot be confirmed at the stage of the baby version, it is better to check the pattern appearance with a pattern as close as possible to this version. Therefore, instead of displaying only the endless pattern as described above, the endless pattern is reduced, and the pattern is easily displayed by repeating and displaying the pattern.

The extent to which the endless pattern is reduced and the number of times of repetition in the vertical and horizontal directions are arbitrary. If the amount of thinning of the endless pattern is increased, the number of repetitions can be increased. It is conceivable that the state of the pattern is changed by the thinning of
It is preferable to repeat the pattern twice or three times in the vertical and horizontal directions, as shown in Fig. 7, and it has been confirmed that the pattern can be actually confirmed with this.

If the appearance of the pattern is not confirmed on the screen shown in FIG. 4C, the data of the baby version is created (step S5). If the appearance of the pattern is confirmed, the pattern is generated. Perform removal. For this purpose, the building material printing abstract pattern prepress system according to the present invention removes pattern distortion by replacing a pattern located at a predetermined address of an endless pattern with a pattern located at another address based on a predetermined mask pattern. (Hereinafter, referred to as a scramble method), a method of removing a pattern by moving or rotating a predetermined pattern to another desired position (hereinafter, a pixel copy method) ,
And a pattern removal processing unit 11 that removes pattern distortion by a method of removing pattern distortion by removing density unevenness of a unit material (hereinafter, this method is referred to as Fourier transform method).

First, a description will be given of pattern removal by the scramble method. The scramble method is a method suitable for removing a pattern of an abstract pattern having a fine pattern such as a grain pattern and a tint block. The display mode includes a configuration shown in FIG. And a batch mode for removal.

Now, the pattern removal processing section 11 controls the control means 3 when the pattern removal processing is instructed by the input means 4.
, The scramble method display mode is first activated when the scramble pattern removal is instructed. In display mode,
First, in order to finish the simulation in a short time,
Endless pattern image data with 2K bits x 2K pixels
Image memory 2
At the same time, the data is sent to the display processing means 13 and displayed on the monitor 14. Then, the pixels of the endless pattern from which the image data has been thinned out have a predetermined size, for example, 200 pixels × 20
Divide into blocks of about 0 pixels in size.

The random address generator 21 is instructed from the input means 4 by the number of executions of the pixel replacement specified by the operator. By generating a random number, an address pair indicating two different pixel blocks is executed by the number of executions. It is generated for each pixel and sent to the pixel block transfer unit 22. Various mask patterns as shown in FIGS. 7A to 7E are registered in the mask data section 23, and a mask pattern having a shape designated by the input means 4 is called from the mask patterns and is transmitted to the pixel block transfer section 22. Sent. The pixel block transfer unit 22 includes a random address generation unit 21
The pixel data of the block located at the address pair AD ₁ , AD ₂ of the pixel block generated in step ₂ is fetched, and the pixels in these blocks are replaced in accordance with the mask shape generated in the mask data section 23 to return to the original address position. Write.
Thus, the inside of the block of the mask pattern of the address AD ₁ pixels within the mask pattern of the block address AD ₂ is written inside the mask of the block address AD ₁ of the mask pattern of the address AD ₂ blocks Pixels inside the pattern are written. The above operation is repeated for the instructed number of times. Now, for example, as shown in FIG.
Is divided into 9 (horizontal) × 8 (vertical) blocks, and a mask pattern having the shape shown in FIG. 7A is selected. Then, assuming that the random address generation unit 21 generates an address pair of BL ₁ and BL ₂ as the _first replacement, the pixel block transfer unit 22 determines that the block having the address BL ₁
Captures the pixel block of L _2, replacing the pixels included in the circular mask. Next, assuming that the address pair BL ₃ , BL ₄ is generated as the second replacement, the pixel block transfer unit 22 captures the pixels of the block of the address BL _{3 and} the block of the address BL ₄ and extracts the pixels included in the circular mask. Replace Hereinafter, this operation is performed by the number of times of execution.

When the pixels in the block are replaced by the specified number of executions, the image data in the image memory 20 is sent to the display processing means 13 and displayed on the monitor 14. This allows the operator to confirm whether or not the pattern has been removed on the monitor 14. If the pattern has been removed, the display mode ends, and the batch mode is executed. If not, the number of executions is subsequently input and the above operation is repeated.

The above is the operation in the display mode. At the end of the display mode, the number of executions and the mask shape data are stored in a predetermined file.

Next, the operation in the batch mode will be described. If the removal of the pattern is confirmed by the display mode, the batch mode is instructed. In the batch mode, the original endless pattern image data is written into the image memory 20 and the random address generation unit 2
The number of times of execution and the mask shape in the display mode are loaded into 1 and the mask data section 23, respectively, and the replacement of the pixels in the block described above is performed.

The image data of the endless pattern from which the pattern has been removed is registered in a predetermined file in the storage means 5. When the image data of the endless pattern is classified into four colors of Y, M, C, and K, one pixel of the data of one color is 8 bits. In order to perform the above-described scramble processing on a color, about 8K × 8K × 8 × 4 (bits) is required.

In the above description, the case where only one mask pattern is used has been described. However, the mask pattern to be used may be changed for each replacement by generating a random number or the like. In addition, addresses of two mask patterns to be replaced without being blocked may be generated as described above. Furthermore, in the above embodiment, the pixel replacement is displayed on the monitor 14 after the instructed number of executions has been performed, but the image is displayed every time pixel replacement is performed 100 times without instructing the number of executions. Alternatively, the replacement operation may be forcibly stopped when the operator determines that the pattern has been removed.

In the manner described above, the work of removing the pattern distortion, which has been conventionally performed manually, can be automatically performed.

The above is the pattern removal by the scramble method. Next, the pattern removal by the pixel copy method will be described. The pixel copy method is applied to pattern removal of an abstract pattern having a relatively large characteristic pattern such as a stone pattern. That is, as shown in FIG. 8, relatively large patterns 26 ₁ to 26
If the 6 ₄ are arranged in islands-like, although such archipelago pattern may become cause of handle habit, in removing by scrambling method the handle habit caused by this, the scrambling method Since the endless pattern image is blocked, these characteristic patterns may be destroyed. Therefore, pattern removal by a pixel copy method is provided for removing the pattern removal of an abstract pattern having such a characteristic pattern.

The pixel copy method is performed by the configuration shown in FIG. 9, and includes an interactive mode in which pixel copy is simulated interactively on the screen of the monitor 14, and a batch in which the same processing as performed in the interactive mode is automatically performed. There is a mode.

When the pattern removal by the pixel copy method is instructed, the interactive mode is activated. As a result, the image data of the endless pattern has 2K bits × 2 pixels.
The data is thinned out so as to be less than about K bits and is developed in the image memory 30. The image data on the image memory 30 is also sent to the display processing means 13 and displayed on the monitor 14.

The operator observes the screen of the mode 14 and designates a pattern to be moved (hereinafter, this pattern is referred to as a source pattern). The designation of the source pattern is performed by designating the diagonal vertices of the area surrounding the source pattern with a mouse or the like. At this time, the movement of the mouse is sent to the command control unit 35, and the cursor generation unit 36 changes the cursor pattern. is generated is written to the mouse position on the image memory 30, the results on the screen of the monitor 14 together with the cursor 38 _{1-38 4} as shown in FIG. 10 is displayed, the address of the cursor command recording section 3
7 recorded. Note that 39 in FIG. 10 indicates a source pattern.

When a rectangular area is designated in this way,
The pixel block transfer unit 31 transfers the pixel data in the rectangular area to the source buffer unit 32. The contents of the source buffer unit 32 are further transferred to an automatic mask generation unit 34, and a mask of a source pattern is generated by the following processing.
That is, first, the mask automatic generation unit 34 performs an operation of 0.3R + 0.59G + 0.11B on the image data of the three primary colors R, G, and B transferred from the source buffer unit 32, and converts the image into monochrome. Then, the monochrome image data is subjected to the smoothing filter processing a predetermined number of times, for example, about 20 times. As a result, the fine pattern is erased, and only the large area pattern remains. The smoothing filter processing may employ a well-known method such as taking an average value of nine neighboring pixels.

After the smoothing filter processing, the mask automatic generation section 34 calculates a histogram of the density values of the pixels, and calculates a density value at which the cumulative frequency from the density 0 is about 50% and the frequency is minimal as a threshold value, A binarization direction is determined based on the representative values of the peripheral portion and the central portion of the rectangular region, and the binarization process is performed to generate a source pattern mask. Specifically, for example, the frequency of the level value of each pixel and the cumulative frequency are respectively shown in FIG.
Assuming that it is indicated by 40 and 41 of 1, ND ₀ is calculated as a density value at which the cumulative frequency is about 50% and the frequency is minimal, and this is determined as a threshold value. Then, assuming that the contour indicated by 42 in FIG. 12 is obtained by the threshold value,
The inside of the outline 42 is set to “1” and the peripheral part is set to “0” to be binarized to generate a source pattern mask. Thus, the periphery of the contour 42 is always masked. The threshold value may be set arbitrarily by the input means 4.

The removal of the pattern is performed using the mask generated as described above. The operation is basically performed by copying the source pattern to another position. The following commands are provided.

Dragging Command In the pixel copy method, a source pattern is moved to another position and copied. In this case, a dragging command performs an operation of moving the source pattern to a desired position while dragging the source pattern. . When the dragging command is specified and the destination of the source pattern is specified by the cursor, the pixel block transfer unit 31 transfers the pixel block at the target position to the target buffer unit 33 with the specified position as the target position. An operation of copying the contents of the source buffer unit 32 to the target position while referring to the mask pattern created by the automatic mask generation unit 34 is performed. Note that the target buffer unit 33
Is used to return the old target position to the original state when the target position is changed by the next cursor instruction.

[0060] Specifically, now, for example, in FIG. 13, the source of the source pattern S Assuming that moved to the target position T _1, the operator of the source pattern S Pick a mouse, to the position of T ₁ in that state Move the pattern. This allows the pixel block transfer unit 3
1 is the source pattern S at the position of the target T _1.
The pixel is fetched in a rectangular area having the same size as the rectangular area when is designated, and written into the target buffer unit 33. Next, the pixel block transfer unit 31 refers to the mask pattern generated by the automatic mask generation unit 34 and, in the contents of the source buffer unit 32, sets the pixels in the area where the mask pattern is “1” to the target position T Write to ₁ . As a result, the source pattern located at the position indicated by S in FIG. 13 is copied to the target position T ₁ , and the result is sent to the display processing means 13 and displayed on the monitor 14.

Next, when the target position changes from T ₁ to T ₂ , the contents of the target buffer section 33 are returned to T ₁ , and the same processing as above is performed with T ₂ as a new target position.

Rotation Command In the pixel copy method, the source pattern is moved at the same angle as it is, and the source pattern is rotated by a predetermined unit angle, for example, 90 ° clockwise or counterclockwise up to 360 ° for copying. It has been made possible. This operation is performed by a rotation command. When the rotation command indicates a rotation angle, the pixel block transfer unit 31 copies the contents of the target buffer unit 33 to the original position of the target pattern while referring to the mask data. Then, the contents of the source buffer unit 32 and the mask data generated by the mask automatic generation unit 34 are rotated by the designated angle, and the target position contents are copied to the target buffer unit 33 with the rotation being applied, The contents of the source buffer unit 32 are copied to the target position while referring to the mask data.

For example, the target position T ₂ shown in FIG.
Assuming that the pattern shown by the dotted line in FIG. 9 is rotated clockwise by 90 °, the pixel block transfer unit 31 firstly sets a pixel at a target position T ₂ in a rectangular area having the same size as the rectangular area when the source pattern S is specified. Is written from the target buffer unit 33. Next, the contents of the source buffer unit 32 and the mask data inside the mask automatic generation unit 34 are rotated clockwise by 90 °, and the contents of the target position T ₂ are rotated and the contents of the target position T ₂ are stored in the target buffer unit 33.
And the pixels in the area where the mask data is “1” in the contents of the source buffer unit 32 are stored in the target position T.
Write to ₂ . As a result, the pattern at the position indicated by the dotted line at the position T ₂ in FIG. 13 is rotated to the position indicated by the solid line at the same position, and the result is sent to the display processing means 13 and displayed on the monitor 14. Is done.

Source Pattern Erasing Command When removing a pattern in the pixel copy method, it is necessary to erase the pattern at the original position when moving the source pattern to another position. This operation is performed by the source pattern erase command. When this command is specified and the target position is specified, the pixel block transfer unit 31 refers to the mask data in the contents of the target buffer unit 32 and reads the source pattern. Copy to location.

For example, if the source pattern S in FIG. 13 is erased and the pattern at the target position T ₃ is to be copied at that position, the pixel block transfer unit 31
In the target position T _3, of the contents written in the target buffer 33 takes in the pixel in the rectangular area of the same size as the rectangular region when the source pattern S is designated by dragging operations up T _3, the mask Pixels in an area where data is “1” are defined as source patterns S
Write to the location. Thus the source pattern S in FIG. 13 is deleted, the target position T ₃ is in its position
Is copied, and the result is displayed on the monitor 14.

This command is a command for copying a pixel at a certain first target position to another second target position by using mask data of a source pattern.
When the target and the command are instructed, the pixel block transfer unit 31 returns the contents of the target buffer unit 33 to the first target position, and the first block including the pixel to be copied.
The pixel block at the target position of
Copy to 2. Next, when the second target position is specified, the pixel block at the second target position to be copied is transferred to the target buffer unit 33, and the contents of the source buffer unit 32 are referred to the second data by referring to the mask data. Copy to target location.

For example, in FIG.
Picked pixels in the _first position, when it is instructed to copy the position of the target T _3, a pixel block transfer section 3
1 returns the contents of the target buffer 33 to the target position T _1, write each pixel block in the target position T ₁ in the source buffer 32 and the pixel blocks in the target position T ₃ in the target buffer 33, Next, in the contents of the source buffer unit 32, pixels in an area where the mask data is “1” are set in the target T _3.
Write to the location. As a result, the pixel of the target T ₁ is copied to the position of the target T ₃ in FIG. 13, and the result is displayed on the monitor 14. The reason why the pixel block at the position of the target to be copied is temporarily transferred to the target buffer unit 33 is so that the original state can be immediately restored when the result of the copy is not desirable.

The four types of commands have been described in detail above. In addition, the command for clearing the old target position data and the contents of the target buffer unit 33, returning to the initial state, executing the pixel copy, and the target An exit command or the like for copying the contents of the buffer unit 33 to the original target position while referring to the mask data to restore the image and exiting from the pixel copy is prepared, and these commands are used in various combinations. Thereby, the pattern can be removed.

The above is the operation in the interactive mode.
The command specified in the interactive mode, the coordinates of the cursor, and the like are stored in the command recording unit 3 in the order in which they were operated by the input unit 4.
7 recorded.

When the interactive mode ends, the batch mode is started next. In the batch mode, image data of the original endless pattern is written in the image memory 30, and commands or cursor coordinate values recorded in the command recording unit 37 are sequentially read out and input to the command control unit 35. Will be executed. As a result, the same processing as that performed by the operator in the interactive mode is performed on the original endless pattern data, and the pattern is removed.

As described above, in the pixel copy method, it is possible to easily remove a pattern habit occurring in an abstract pattern having a relatively large pattern by a simple operation.

Next, a Fourier transform method will be described as a third pattern removal method.

As described above, pattern distortion also occurs when the unit material has uneven density. The pattern removal by the Fourier transform method is intended to remove the density unevenness present in the unit material causing the pattern distortion at the stage of the endless pattern, usually the scramble method and the pixel copy method described above. This is performed prior to the removal of the pattern.

The pattern removal processing unit 11 has the configuration shown in FIG. 14 for performing pattern removal by the Fourier transform method. When the pattern removal by the Fourier transform method is instructed, the image data of the endless pattern is transferred to the normalizing section 44, and the value of the nearest power of 2 exceeding the number of pixels in the vertical and horizontal directions of the endless pattern is sourced. FIG. 15 shows the number of pixels.
Repeat and fill in the excess as shown in. This is a so-called FFT (Fast Fourier Transform) that performs a fast Fourier transform on an image having a number of pixels of a power of two.
This is because the algorithm can be applied.

The source image converted into image data having the number of pixels of the power of 2 by the normalization processing unit 44 is written to the source image memory 45 as it is, while a predetermined number of pixels are thinned out and written to the frame memory 46. . This is used for testing with a small number of pixels, since the Fourier transform takes processing time in proportion to the number of pixels. Then, the contents of the frame memory 46 are sent to the display processing means 13 and displayed on the monitor 14. The memory capacity of the source image memory 45 is 1 for each of Y, M, C, and K colors.
Since bytes / pixel, about 8K × 8K × 4 (bytes) is required, and the frame memory 46 may be about 1K × 1K (bytes) for each of the R, G, B color components.

The contents of the source image memory 45 and the frame memory 46 are stored in a Walsh converter 47, respectively.
Performs a two-dimensional Fourier transform, and writes the result to the Fourier transform memory 48. Then, as shown in FIG.
Of the contents written in the Fourier transform memory 48, the low frequency component elimination unit 49 removes components having a predetermined wave number W or less, for example, 10 wave numbers or less, of the horizontal frequency F _h and the vertical frequency F _v except for the DC component DC. The two-dimensional inverse Fourier transform is performed by the Walsh inverse transform unit 50, and the image data related to the source image memory 45 is written to the inverse transformed source image memory 51, and the thinned image data related to the frame memory 46 is written to the frame memory 52. It is. The image data written in the frame memory 52 is displayed on the monitor 14 via the display processing means 13, and the operator can confirm whether or not the density unevenness has been removed by observing the screen of the monitor 14.

Normally, processing for outputting from the frame memory 46 to the frame memory 52 is performed first, and after confirming on the monitor 14, processing is performed on the image in the source image memory 45.

According to the experiment conducted by the applicant, it has been confirmed that the unevenness of density can be almost completely eliminated by eliminating 10 or less wave numbers in both the horizontal and vertical directions as described above. Although the component is removed, it is apparent that the input means 4 may be used to specify a wave number component to be deleted.

Conventionally, when density unevenness is present in the unit material or the baby plate, the unit material is photographed again. However, according to the present invention, the density unevenness can be easily removed from the image data. , Cost and work load can be reduced.

Although the three types of pattern removal methods have been described, most of the pattern removal can be removed by appropriately combining these methods.

The above is the step S4 in FIG.
When the pattern is removed at the stage of the endless pattern, baby version data is created (step S5). Figure 17 for the baby version
As shown in (1), the endless pattern is created by simply repeating it vertically and horizontally. For this purpose, a repeat processing unit 12 is provided. That is, when the creation of the baby version is instructed by the input means 4, the repeat processing unit 12 is activated, and the endless pattern image data is arranged in the vertical direction and the horizontal direction a predetermined number of times.

The baby version data thus created is registered in the storage means 5.

When the creation of the baby version is completed, it is confirmed again whether or not the pattern has occurred at the stage of the baby version (step S6). In this case, the presence / absence of the pattern may be confirmed by thinning out the baby version data and displaying it on the monitor 14, but the size of the baby version is large and the presentation is made to the user. Therefore, the baby version data is supplied from the storage unit 5 to the color hard copy 7 and hard copy is performed.

If the occurrence of pattern distortion is confirmed in step S6, the flow returns to step S4 to perform the pattern distortion removal described above. If the pattern distortion is not recognized, baby version data is output. (Step S7). There are two ways to output this baby version. One method is to directly supply the baby plate data to the gravure engraving machine 6 to directly produce a printing plate, and the other is to output the baby plate data to the output scanner 2 as a film and print the plate data via the film. How to create Which method is adopted is arbitrary.

After the printing plate of the baby version is prepared as described above, the proof printing is performed using the printing plate, and it is confirmed whether or not the pattern is generated again (step S).
8). If the pattern has occurred, the process returns to step S1 to start over from reading a new unit material, or returns to step S4 to remove the pattern at the endless pattern stage. When returning to step S1, the steps up to that point are completely wasted, but the costs are reduced and the workload is reduced because the steps are automated compared to the prior art, so that the waste is minimized. Can be fastened.

If there is no pattern change in the proof printing using the baby plate, the data of the plate is output (step S).
9). This is performed by arranging the baby version data in the vertical and horizontal directions by the repeat processing unit 12 a predetermined number of times, and the created main version data is registered in the storage means 5 and output. The output of the plate data may be directly supplied to the gravure engraving machine 6 to create the plate directly, or may be output to a film by the output scanner 2 and printed out through the film, similarly to the output of the baby plate data. May be created.

After outputting the main plate data as described above, proof printing (step S10) is performed again. If the final check is received and the printing is acceptable, the main printing is performed using the main plate (step S11). , The process ends. If it is confirmed that the pattern is proofed as a result of the proof printing, the process returns to step S1 or step S4 to start over.

Although the embodiment of the present invention has been described above, the present invention is not limited to the above embodiment, and it will be apparent to those skilled in the art that various modifications are possible.

[0089]

As is clear from the above description, the endless pattern is created by watermark synthesis of the unit material, but since the synthesis is performed automatically, the work load can be greatly reduced. In addition, the production accuracy is improved, and thus the plate making cost can be reduced, leading to a shortened delivery time.

Further, since it is possible to confirm the occurrence of pattern distortion at the stage of the endless pattern, even if pattern distortion occurs, it can be improved at an early stage.

[Brief description of the drawings]

FIG. 1 is a diagram showing the configuration of an embodiment of an abstract pattern prepress system for building material printing according to the present invention.

FIG. 2 is a diagram showing an example of a plate making process when the building material printing abstract pattern plate making system according to the present invention is used.

FIG. 3 is a diagram for explaining watermark synthesis when creating an endless pattern.

FIG. 4 is a diagram for explaining an operation of a pattern checking processing unit;

FIG. 5 is a diagram illustrating a configuration example for performing pattern removal by a scramble method.

FIG. 6 is a diagram illustrating replacement of pixels in a block in a scramble method.

FIG. 7 is a diagram illustrating an example of a mask shape used for replacing pixels in a block.

FIG. 8 is a diagram for explaining the effectiveness of the pixel copy method.

FIG. 9 is a diagram showing a configuration example for performing pattern removal by a pixel copy method.

FIG. 10 is a diagram showing an example of a display screen when a source pattern is selected.

FIG. 11 is a diagram for explaining how to obtain a threshold value for creating mask data in the pixel copy method.

FIG. 12 is a diagram illustrating a binarization process for creating mask data.

FIG. 13 is a diagram for explaining the operation of the pixel copy method.

FIG. 14 is a diagram showing a configuration example for performing pattern removal by a Fourier transform method.

FIG. 15 is a diagram illustrating the operation of a normalization processing unit.

FIG. 16 is a diagram for explaining the operation of the low-frequency component elimination unit.

FIG. 17 is a diagram for explaining creation of a baby version.

FIG. 18 is a view showing an example of a conventional plate making process for an abstract pattern for printing on building materials.

FIG. 19 is a diagram for explaining a pattern habit.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Input scanner 2 Output scanner 3 Control means 4 Input means 5 Storage means 6 Gravure engraving machine 7 Color hard copy 8 Abstract pattern plate making processing means 9 Endless processing processing part 10 Pattern distortion check processing part 11 Pattern distortion removal processing part 12 Repeat processing part 13 display processing means 14 monitor

────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Eisuke Arai 311 Takemazawa, Miyoshi-cho, Iruma-gun, Saitama (56) References JP-A-59-95536 (JP, A) JP-A-3-210559 (JP, A) JP-B-62-45978 (JP, B2) (58) Fields investigated (Int. Cl. ⁷ , DB name) B41C 1/00-1/18 B41M 3/06 G03F 3/08 G06T 1/00

Claims (2)

(57) [Claims] 1. A pattern pattern having a predetermined size is created by watermarking unit material image data read by an input scanner up, down, left, and right a predetermined number of times, and the upper end and lower end and the left end and right end of the pattern pattern become the same data. Abstract: A method for making an abstract pattern for printing a building material, the method comprising: 2. A unit pattern image data read by an input scanner is watermark-synthesized vertically, horizontally, and a predetermined number of times to create a first pattern having a predetermined size, and the upper and lower ends and the left and right ends of the pattern are the same. A second pattern is created by trimming to become data, and the second pattern is arranged vertically and horizontally without any gap to create a third pattern for proof printing. Abstract printing plate making method for building material printing.