JP2983932B2 - Polishing equipment - Google Patents

Polishing equipment

Info

Publication number
JP2983932B2
JP2983932B2 JP9210906A JP21090697A JP2983932B2 JP 2983932 B2 JP2983932 B2 JP 2983932B2 JP 9210906 A JP9210906 A JP 9210906A JP 21090697 A JP21090697 A JP 21090697A JP 2983932 B2 JP2983932 B2 JP 2983932B2
Authority
JP
Japan
Prior art keywords
polishing
cloth
members
medals
zigzag
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP9210906A
Other languages
Japanese (ja)
Other versions
JPH1147426A (en
Inventor
年久 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MEISEI KK
Original Assignee
MEISEI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MEISEI KK filed Critical MEISEI KK
Priority to JP9210906A priority Critical patent/JP2983932B2/en
Publication of JPH1147426A publication Critical patent/JPH1147426A/en
Application granted granted Critical
Publication of JP2983932B2 publication Critical patent/JP2983932B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Pinball Game Machines (AREA)
  • Cleaning In General (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、メダル、コイン、
のいずれかを研磨する研磨装置に関する。
The present invention relates to a medal, a coin,
It relates to a polishing equipment you polish one of the sphere.

【0002】[0002]

【従来の技術】多数のメダル遊技機が設置された遊技場
では、使用後のメダルを研磨もしくは洗浄したのちメダ
ル遊技機に補給することがなされている。このメダルの
研磨もしくは洗浄の方法としては、1)ペレットと称さ
れるプラスチック粒の吸着を利用してメダルを磨く方
法、2)湯中でメダルをブラッシングする方法、3)洗
浄液中でメダルをパーツフィーダによって振動させて汚
れを浮き出させる方法等がある。このうち一般的な方法
である1)の方法では、一度ペレットと混ぜるため、研
磨ないしは清浄化後にメダルとペレットとを分離するた
めの特別な装置を必要とした。又2)、3)の方法で
は、液を多量に扱うので煩わしく、又乾燥工程も必要と
なって装置が大きくなってしまうと言う問題があった。
一方、球を布で研磨する方法が知られており、これをメ
ダルに応用しようとする方法も提案されて来ている。例
えば特開平8ー19658「コイン・球研磨装置」に開
示されているように、ロール状に巻かれた2本の研磨布
間を押圧板で押さえつけ、この部分にメダルを回転駆動
させながら送ってゆき研磨するものがある。この方法で
はメダルを1枚づつ移行させるための装置を必要とし、
又メダルに負荷(力)を掛けるのでメダルが傷つき易い
ということがあった。一方2本の研磨布を間隔を開けて
並行に配しその間にメダルを通ししかも該研磨布にメダ
ルを擦り付けるようにしてメダルを磨く方法も提案され
ている。例えば特開平5ー49750には、対向面上に
それぞれ研磨布が敷かれた2枚の板を、研磨布間の間隙
がメダルの厚みより幾分広い間隙となるようにして垂直
かつ並行的に設けるとともにこの板を駆動手段によって
並行的(上下方向)に相対変位させ、しかして研磨布間
に投入したメダルを上記間隙を通して重力により降下さ
せる間に、上記2枚の板の相対変位によって生起させる
メダル表面と研磨面との摺動によって研磨もしくは清浄
化する方法が開示されている。この方法では板を上下方
向に相対変位させる駆動装置を必要とする上に間隙の調
整が必要となり、又メダルにはかなり大きい負荷(力)
が加えられるのでメダルが傷つき易いものであった。
2. Description of the Related Art In a game arcade where a large number of medal gaming machines are installed, used medals are polished or washed and then supplied to the medal gaming machines. The method of polishing or cleaning the medals is 1) a method of polishing medals by using the adsorption of plastic particles called pellets, 2) a method of brushing medals in hot water, and 3) a parting of medals in a cleaning solution. There is a method of vibrating by a feeder to lift dirt. Of these methods, the general method 1) requires a special device for separating medals and pellets after polishing or cleaning because they are once mixed with pellets. In the methods 2) and 3), a large amount of liquid is used, so that the method is troublesome, and a drying step is required.
On the other hand, a method of polishing a ball with a cloth is known, and a method of applying the method to a medal has been proposed. For example, as disclosed in Japanese Unexamined Patent Publication No. Hei 8-19658 "Coin / ball polishing device", a pressing plate presses between two polishing cloths wound in a roll shape, and a medal is sent to this portion while being rotationally driven. Some are polished. This method requires a device for transferring medals one by one,
In addition, since a load (force) is applied to the medal, the medal may be easily damaged. On the other hand, there has been proposed a method of polishing medals by arranging two polishing cloths in parallel at an interval, passing a medal therebetween, and rubbing the medals against the polishing cloth. For example, in Japanese Patent Application Laid-Open No. 5-49750, two plates, each having an abrasive cloth laid on the opposing surface, are vertically and parallelly arranged so that the gap between the abrasive cloths is slightly larger than the thickness of the medal. In addition, the plates are relatively displaced in parallel (vertical direction) by the driving means, and while the medals inserted between the polishing pads are lowered by gravity through the gap, the plates are caused by the relative displacement of the two plates. A method of polishing or cleaning by sliding between a medal surface and a polishing surface is disclosed. In this method, a driving device for relatively displacing the plate in the vertical direction is required, and the gap needs to be adjusted, and a considerable load (force) is applied to the medal.
Was added, so that the medal was easily damaged.

【0003】[0003]

【発明が解決しようとする課題】本発明は、メダル、コ
イン、球のいずれか(以下、メダル等と言う)を上下方
向に並行状に配した2枚の布状研磨部材間に上端からメ
ダル等を投入し下端から落下放出させ、その間にメダル
等を研磨もしくは清浄化するようにする研磨装置であっ
て、装置の機械要素が簡単、小型、かつ安価にでき、し
かもメダル等を傷つける恐れのない新規なメダル等の研
磨装置を提供することを課題とする。
SUMMARY OF THE INVENTION According to the present invention, a medal, coin, or ball (hereinafter referred to as a medal, etc.) is provided between two cloth-shaped polishing members arranged in parallel in the vertical direction from the top to the medal. This is a polishing device that throws in and drops from the lower end, and polishes or cleans medals etc. during that time, and the mechanical elements of the device can be simple, small and inexpensive, and there is a risk of damaging medals etc. No new medals
It is an object of the present invention to provide a MigakuSo location.

【0004】[0004]

【課題を解決するための手段及び発明の作用・効果】
ず、本発明の研磨装置において採用した研磨方法につい
て説明する。この研磨方法は、垂れ下がりの状態で吊し
た相対する布状研磨部材を、メダル、コイン、球のいず
れかである研磨対象物(以下の説明では、これら研磨対
象物のことをメダル等ともいう)が該相対する布状研磨
部材間に上方から投入されたときに該相対する布状研磨
部材間を押し分けて自由落下し得る大きさの押圧力を以
って相互に接触させておき、しかして上記研磨対象物
上記相対する布状研磨部材間を自由落下させることによ
り上記布状研磨部材で研磨することを特徴とする。
[Operation and effect of the means and the invention to solve the problems] or
First, the polishing method employed in the polishing apparatus of the present invention is described.
Will be explained. In this polishing method, an opposing cloth-like polishing member hung in a hanging state is attached to any of a medal, a coin, and a ball.
The object to be polished (hereinafter, these polishing objects
When an elephant is also referred to as a medal or the like) when it is thrown from above between the opposing cloth-like polishing members, the pressing force is large enough to separate the opposing cloth-like polishing members so that they can fall freely. The polishing object is polished by the cloth polishing member by freely falling between the opposing cloth polishing members.

【0005】この研磨方法を、その原理的な構成を示す
図1と図4とに基づくとともに、その基本的な構成例を
示した図2と図3とにも基づいて説明する。この研磨方
法によれば、図1に示したように、相対する2つの布状
研磨部材1、2が実質的に静止状態で重力による垂れ下
がりの状態で吊されるとともに両布状研磨部材1、2を
相互に接触する状態に保持するために押圧力3が布状研
磨部材面に沿ってできるだけ均一に加えられる。上記押
圧力3の大きさは、メダル等が上端側から布状研磨部材
間に投入されたときに該2つの布状研磨部材1、2間を
押し分けて自由落下して途中で滞ることが生じないよう
に比較的小さくされる。かくしてメダル等4を上記2枚
の相互に接触した布状研磨部材間を自由落下させること
により該メダル等の表面を上記2つの布状研磨部材で擦
って研磨もしくは清浄化するものである。このように単
に布状研磨部材1、2間を静的に押圧するための押圧手
段を用いる外は、2つの布状研磨部材のための駆動装置
等の特別の装置を用いることを要せず、この方法を実施
する際の装置の機械要素は簡単で、小型かつ安価に作製
でき、しかもメダル等を傷つける恐れがなく、光沢のあ
る研磨が容易に行える。又布状研磨部材1、2は図1に
示したようにほぼ垂直に垂れ下げられてメダル等がほぼ
垂直に自由落下する場合だけでなく、例えば図2に示し
たように布状研磨部材1、2を該垂直線を含み該布状研
磨部材面と直交する面(図2の紙面)内で傾斜する傾斜
面提供体5の傾斜面5aに沿うように垂れ下げることに
より、上記押圧力を布状研磨部材自体の重力を利用して
加えることができる。即ち上記傾斜面提供体5を押圧手
段として用いることで、特別な押圧力印可装置をも設け
ることなく上記押圧力を得ることができる。なお、上記
傾斜面は螺旋状に下る傾斜面であってもよい。なお又こ
の場合メダル等の傾斜面を向く側の面の研磨がより多く
行われる傾向があるが、メダル等をランダムに繰り返し
投入することにより両面は均等に研磨されるようにな
る。又、押圧手段として図3に示したように垂直に垂れ
下げられた布状研磨部材1、2の一方の布状研磨部材1
に沿って台板6を配するととともに、布状研磨部材2の
側からほぼ一定圧力に調整された流体、より好ましくは
気体が詰められた流体バッグ7を例えば間隔をおいて多
数配置したものも好ましく用いることができる。メダル
等が布状研磨部材間で多数詰まりかけたときでも、やが
て多数のメダル等の重量によって流体バッグ7が押し退
けられて一挙に落下させるようにするので、メダル等の
詰まりがよく防止される。又図4に示したように布状研
磨部材1、2の幅の一方の端縁に沿ってメダル等4の落
下通路の側壁面8aを提供する側壁提供体8を配すると
ともに該側壁提供体8ともども上記布状研磨部材1、2
を、該布状研磨部材面を含む面内で上記側壁提供体8側
に傾斜させることにより、図4(ロ)に示したようにメ
ダル等4の側面は上記傾斜された側壁面8a(必要に応
じ該側壁面8a上には布状研磨部材が貼られる)に接し
ながら落下してメダル等に回転運動が与えられるととも
に該メダル等の側面も研磨されるようにすることができ
る。なお、2つの布状研磨部材1、2の重力によって垂
下した先端は完全な自由終端とする以外に、メダル等が
布状研磨部材1、2間を自由落下する間に滞ることがな
いようにする限りは該終端を補助的に、重りを付けて引
っ張ったりばねを介して引っ張ったりしてもよい。又、
相対する布状研磨部材1、2は、それぞれ独立の2枚の
布状研磨部材を用いる場合に限られず、例えば長い袋状
に形成されたものを押し潰して扁平状としたものの相対
する2面で与えられるようにしてもよいし、或は又相対
する布状研磨部材1もしくは2又は1と2のそれぞれを
複数枚の布状研磨部材で構成するようにしてもよい。
又、上記布状研磨部材1、2には洗浄液や抗菌剤を滴下
し又は含浸させてメダル等の研磨の際の清浄化効果や抗
菌効果を高めるようにすることもできる。又、研磨もし
くは清浄化対象としてのメダル等の大きさには制限がな
く、又厚みがほぼ一定なら異なる大きさのメダル等が混
在していてもよく、又メダル等の形状自体もペレット状
であろうと球体であろうとかまわない。
[0005] This polishing method will be described with reference to FIGS. 1 and 4 showing the principle configuration thereof, and also to FIGS. 2 and 3 showing the basic configuration examples. According to this polishing method, as shown in FIG. 1, two opposed cloth-like polishing members 1 and 2 are suspended in a state of being suspended by gravity in a substantially stationary state, and both cloth-like polishing members 1 and 2 are suspended. A pressing force 3 is applied as uniformly as possible along the surface of the cloth-like polishing member in order to keep the two in contact with each other. The magnitude of the pressing force 3 is such that when a medal or the like is thrown between the cloth-like polishing members from the upper end side, the two cloth-like polishing members 1 and 2 are pushed apart, fall freely, and are stuck halfway. Not to be relatively small. Thus, the surface of the medal or the like 4 is polished or cleaned by free-falling the medal or the like 4 between the two cloth-like polishing members in contact with each other by the two cloth-like polishing members. As described above, except for using the pressing means for simply pressing the cloth-like polishing members 1 and 2 statically, there is no need to use a special device such as a driving device for the two cloth-like polishing members. The mechanical elements of the apparatus for implementing this method are simple, small and inexpensive to manufacture, and can be easily polished with gloss without damaging medals and the like. Further, the cloth-like polishing members 1 and 2 are not only hung down substantially vertically as shown in FIG. 1 and the medals and the like freely fall substantially vertically, but also, for example, as shown in FIG. 2 is hung down along the inclined surface 5a of the inclined surface providing body 5 which is inclined in a plane (the paper plane of FIG. 2) including the vertical line and orthogonal to the cloth-like polishing member surface, thereby reducing the pressing force. It can be added using the gravity of the cloth-like polishing member itself. That is, by using the inclined surface providing body 5 as a pressing means, the above pressing force can be obtained without providing any special pressing force applying device. The inclined surface may be a spirally descending inclined surface. In this case, the surface of the side of the medal or the like facing the inclined surface tends to be polished more often. However, by repeatedly and repeatedly inserting medals or the like, both surfaces are uniformly polished. Further, one of the cloth-like polishing members 1 of the cloth-like polishing members 1 and 2 which is vertically suspended as shown in FIG.
And a plurality of fluid bags 7 filled with a fluid, preferably a gas, more preferably adjusted to a substantially constant pressure from the cloth-like polishing member 2 at intervals, for example. It can be preferably used. Even when a large number of medals or the like are clogged between the cloth-shaped polishing members, the fluid bags 7 are eventually pushed away by the weight of the large number of medals and dropped at once, so that the clogging of the medals and the like is well prevented. Further, as shown in FIG. 4, a side wall providing body 8 for providing a side wall surface 8a of a fall passage for medals 4 is arranged along one edge of the width of the cloth-like polishing members 1 and 2 and the side wall providing body. 8 and the cloth-like polishing members 1 and 2
Is inclined toward the side wall providing body 8 in the plane including the cloth-like polishing member surface, so that the side surface of the medal etc. 4 has the inclined side wall surface 8a (necessary as shown in FIG. (A cloth-like polishing member is stuck on the side wall surface 8a in accordance with the above), so that the medals and the like are dropped while being in contact with the medals and the like, and the side surfaces of the medals and the like can be polished. The tips of the two cloth-like polishing members 1 and 2 which are suspended by gravity are completely free ends, and so that medals and the like do not stay while freely falling between the cloth-like polishing members 1 and 2. As far as possible, the end may be supplementarily pulled with a weight or pulled through a spring. or,
The opposing cloth-like polishing members 1 and 2 are not limited to the case where two independent cloth-type polishing members are used, and for example, two flat surfaces formed by crushing a long bag-shaped member into a flat shape are used. Or each of the opposed cloth-like polishing members 1 or 2 or 1 and 2 may be constituted by a plurality of cloth-like polishing members.
Further, a cleaning solution or an antibacterial agent can be dropped or impregnated on the cloth-like polishing members 1 and 2 to enhance the cleaning effect and the antibacterial effect when polishing medals and the like. Also, there is no limitation on the size of medals or the like to be polished or cleaned, and medals or the like of different sizes may be mixed if the thickness is almost constant, and the medals or the like themselves are pellet-shaped. It doesn't matter if it's a sphere or not.

【0006】又、布状研磨部材1、2の素材としては、
例えば綿布等の各種織物や場合によっては紙製品等の、
一般布地様の柔らかくてかつある程度の強度と耐摩耗性
のあるものであれば何でも使用可能である。そのうち綿
織物であってタオル地において見られるように毛羽立ち
繊維が伸びた柔らかいものでかつほこりの発生が少ない
ものは特に好ましい。
[0006] The material of the cloth-like polishing members 1 and 2 is as follows.
For example, various woven fabrics such as cotton cloth, and in some cases, paper products, etc.
Any material can be used as long as it is soft and has a certain degree of strength and abrasion resistance like a general cloth. Among them, a cotton fabric which is soft and has a small amount of dust as the fluffy fiber is stretched as seen in a toweling fabric is particularly preferable.

【0007】次に、本発明の研磨装置について説明す
る。 本発明の請求項1に記載の研磨装置は、垂れ下げら
れた相対する布状研磨部材と、メダル、コイン、球のい
ずれかである研磨対象物が該相対する布状研磨部材間に
上方から投入されたときに該研磨対象物が該相対する布
状研磨部材間を押し分けて自由落下し得る大きさの押圧
力を以って該相対する布状研磨部材を相互に接触させる
ための押圧手段とを備え、上記研磨対象物を上記相対す
る布状研磨部材間を自由落下させることにより上記布状
研磨部材で研磨する研磨装置であって、上記押圧手段
は、少なくとも一方の布状研磨部材を押圧するための一
定圧力の流体が詰められた流体バッグであることを特徴
とする。
Next, the polishing apparatus of the present invention will be described.
You. The polishing apparatus according to claim 1 of the present invention includes a hanging cloth-like polishing member, a medal, a coin, and a ball.
When the object to be polished is displaced from above between the opposing cloth-like polishing members, the pressing force of such a magnitude that the object to be polished can separate freely between the opposing cloth-like polishing members and fall freely. And a pressing means for bringing the opposed cloth-like polishing members into contact with each other, and polishing the object to be polished with the cloth-like polishing members by freely falling between the opposed cloth-like polishing members. A polishing apparatus, wherein the pressing means
Is one for pressing at least one cloth-like polishing member.
It is a fluid bag filled with a fluid at a constant pressure .

【0008】この請求項1に記載の研磨装置において
は、例えば、押圧手段として図3に示したように垂直に
垂れ下げられた布状研磨部材1、2の一方の布状研磨部
材1に沿って台板6を配するととともに、布状研磨部材
2の側からほぼ一定圧力に調整された流体、より好まし
くは気体が詰められた流体バッグ7を例えば間隔をおい
て多数配置したものを好ましく用いることができる。こ
のような研磨装置によれば、メダル等が布状研磨部材間
で多数詰まりかけたときでも、やがて多数のメダル等の
重量によって流体バッグ7が押し退けられて一挙に落下
させるようにするので、メダル等の詰まりがよく防止さ
れる。
In the polishing apparatus according to the first aspect ,
Is, for example, vertically as shown in FIG.
One cloth-like polishing part of the hanging cloth-like polishing members 1 and 2
A base plate 6 is arranged along the material 1 and a cloth-like polishing member
Fluid adjusted to almost constant pressure from side 2, more preferred
Or a fluid bag 7 filled with gas, for example,
And those arranged in large numbers can be preferably used. This
According to such a polishing apparatus, medals and the like are placed between the cloth-like polishing members.
Even when a lot of medals are getting clogged,
Fluid bag 7 is pushed away by weight and falls at once
To prevent medals and other clogging.
It is.

【0009】[0009]

【0010】[0010]

【0011】請求項2に記載の研磨装置は、垂れ下げら
れた相対する布状研磨部材と、メダル、コイン、球のい
ずれかである研磨対象物が該相対する布状研磨部材間に
上方から投入されたときに該研磨対象物が該相対する布
状研磨部材間を押し分けて自由落下し得る大きさの押圧
力を以って該相対する布状研磨部材を相互に接触させる
ための押圧手段とを備え、上記研磨対象物を上記相対す
る布状研磨部材間を自由落下させることにより上記布状
研磨部材で研磨する研磨装置であって、上記押圧手段
は、上記相対する布状研磨部材をジグザグに曲げながら
通すための挿通路を供するジグザグ曲がり挿通路提供体
であることを特徴とする。
[0011] The polishing apparatus according to claim 2, dripping down al
Opposing cloth-like polishing members and medals, coins and balls
The object to be polished is a gap between the opposed cloth-like polishing members.
The cloth to be polished is opposed to the cloth when
Pressing large enough to be able to fall freely by pressing between the abrasive members
Force the opposing cloth-like polishing members into contact with each other with force
For pressing the object to be polished relative to each other.
Free fall between the cloth-like polishing members
A polishing apparatus for polishing with a polishing member, wherein the pressing means is a zigzag bent insertion path providing body which provides an insertion path for passing the opposed cloth-shaped polishing member while bending the zigzag.

【0012】布状研磨部材1、2を傾斜させるのに図2
に示したように一方向に傾斜させるだけでは該傾斜面と
布状研磨部材1又は2を介して接するメダル等の下側表
面だけがメダル等自体の自重が加算されたより大きい圧
力で布状研磨部材1又は2と接するためランダムに何回
か布状研磨部材1、2間を自由落下させてメダル等の両
面が均等に研磨されるようにする必要がある。この発明
の研磨装置では、布状研磨部材1、2がジグザグに方向
を変えて繰り返し傾斜するようにするためにジグザグ曲
がり挿通路提供体が用いられ、一回の自由落下でメダル
等の両面は上記布状研磨部材1又は2との間で均等な接
触圧力で接っすることになり、該両面は均等に研磨され
るようになる。
FIG. 2 shows how the cloth-like polishing members 1 and 2 are tilted.
As shown in the above, only the lower surface of a medal or the like that comes into contact with the inclined surface via the cloth-like polishing member 1 or 2 by simply inclining in one direction is cloth-like polishing with a greater pressure to which the own weight of the medal or the like itself is added. In order to come into contact with the member 1 or 2, it is necessary to drop freely between the cloth-like polishing members 1 and 2 several times at random so that both surfaces of medals and the like are evenly polished. In the polishing apparatus of the present invention, a zigzag bent insertion path providing body is used to change the direction of the cloth-shaped polishing members 1 and 2 in a zigzag manner and repeatedly incline. The cloth-like polishing member 1 or 2 comes into contact with a uniform contact pressure, so that both surfaces are uniformly polished.

【0013】請求項3に記載の研磨装置は、請求項2
記載のメダル等の研磨装置において、上記ジグザグ曲が
り挿通路提供体は、上記相対する布状研磨部材をジグザ
グに曲げながら通すための挿通路が複数段に形成された
梯子型枠体であることを特徴とする。
According to a third aspect of the present invention, in the polishing apparatus for a medal or the like according to the second aspect , the zigzag bent insertion path providing body is used for passing the opposed cloth-like polishing member in a zigzag manner while bending it. The insertion passage is a ladder form body formed in a plurality of stages.

【0014】この発明のメダル等の研磨装置では、図5
に、より具体的な研磨装置の構成例として示したよう
に、1回以上の布状研磨部材1、2のジグザグが、複数
段の挿通路9a、9bが形成された梯子型枠体9によっ
て形成される。図5の梯子型枠体9は、ここでは長い布
状研磨部材からなる袋10を押し潰してできる相対する
2つの布状研磨部材1、2を、挿通路9a、9bに通す
ことによって、1回のジグザグを与えるものである。全
体としては垂直方向に垂れ下げられたジグザグの布状研
磨部材からなる袋10によって与えられた布状研磨部材
1、2に、図6(イ)に示したように上方からメダル等
を投入すると、図6(ロ)に示したように最初に斜め下
方に向かう挿通路9a内でメダル等の一方の面が主とし
て布状研磨部材1で研磨され、続いて図6(ハ)に示し
たように次ぎの戻しの斜め下方に向かう挿通路9bに向
かう間に反対側の面が布状研磨部材2に触れ始め、図6
(ニ)に示したように戻しの挿通路9b内でメダル等の
反対側の面が布状研磨部材2で主として研磨されたの
ち、図(ホ)に示したように相対する2つの布状研磨部
材1、2の下方から排出される。この梯子型枠体9を縦
に重ねることによって布状研磨部材1、2に多数のジグ
ザグ曲がりを与える梯子型枠体を得ることができる。図
7はそのようにして構成された、布状研磨部材1、2に
多数のジグザグを与えるようにする梯子型枠体11を例
示する。この梯子型枠体11には、布状研磨部材1、2
をジグザグに挿通するための挿通路11a,11bが多
段に繰り返し設けられている。なお、梯子型枠体11は
面12で2つ割にされていて各部分は図示しない蝶番で
開閉自由とされた例を示しており、布状研磨部材1、2
(ここでは長い布状研磨部材の袋10)を挟んでから閉
じることによって一度に多数のジグザグ曲がりに曲がっ
た相対する2つの布状研磨部材1、2が得られるように
している。なお、多数のジグザグ曲がりを有する布状研
磨部材1、2を形成するための梯子型枠体としてはもっ
と単純に、長い長方形の板の長手方向に、布状研磨部材
1、2を繰り返しジグザグに通すための挿通路として、
断面が四辺形の窓孔(該板の面に対して垂直な孔)を間
隔をおいて多数段に穿っただけのものであってもよい。
In the polishing apparatus for medals and the like according to the present invention, FIG.
Further, as shown as a more specific configuration example of the polishing apparatus, the zigzag of the cloth-like polishing members 1 and 2 at least once is formed by the ladder form frame 9 in which a plurality of stages of the insertion passages 9a and 9b are formed. It is formed. The ladder form body 9 in FIG. 5 is configured such that two cloth-like polishing members 1 and 2 formed by crushing a bag 10 made of a long cloth-like polishing member are passed through the insertion passages 9a and 9b. Gives a zigzag of times. As shown in FIG. 6A, when medals or the like are thrown into the cloth-like polishing members 1 and 2 provided by the bag 10 made of a zig-zag cloth-like polishing member that is vertically suspended as a whole, as shown in FIG. First, as shown in FIG. 6 (b), one surface of a medal or the like is first mainly polished by the cloth-like polishing member 1 in the obliquely downward insertion passage 9a, and then as shown in FIG. 6 (c). In the next return, the opposite surface starts to touch the cloth-like polishing member 2 while heading toward the obliquely downward insertion passage 9b.
After the opposite surface of the medal or the like in the return insertion passage 9b is mainly polished by the cloth-like polishing member 2 as shown in (d), as shown in FIG. It is discharged from below the polishing members 1 and 2. By laminating the ladder form frames 9 vertically, a ladder form body that gives the cloth-like polishing members 1 and 2 a large number of zigzag bends can be obtained. FIG. 7 exemplifies the ladder form body 11 configured so as to provide a large number of zigzags to the cloth-like polishing members 1 and 2. The ladder form member 11 includes cloth-like polishing members 1 and 2.
Are inserted in a zigzag manner and are repeatedly provided in multiple stages. The ladder form 11 is divided into two parts by a surface 12 and each part is freely opened and closed by a hinge (not shown).
By sandwiching (in this case, the bag 10 of a long cloth-like polishing member) and closing it, two opposite cloth-like polishing members 1 and 2 which are bent in a large number of zigzags at a time can be obtained. In addition, as a ladder-type frame body for forming the cloth-like polishing members 1 and 2 having a large number of zigzag bends, the cloth-like polishing members 1 and 2 are repeatedly zigzag in the longitudinal direction of a long rectangular plate. As an insertion passage for passing
It may be one in which a large number of window holes (holes perpendicular to the surface of the plate) having a quadrangular cross section are formed at intervals.

【0015】なお、これまでの図に基づいた説明では、
2つの布状研磨部材1、2の垂れ下がった先は自由終端
とされた場合を示しているが、例えば図8に示したよう
に、布状研磨部材1、2は実質的には静止状態と変わら
ないが該布状研磨部材1、2を、それぞれ巻きもの1
3、14から少しづつ巻き取り芯15、16dの周りに
巻き上げて行くようにして布状研磨部材の交換の手間を
省くようにしてもよい。ただしその際には、布状研磨部
材1、2は、巻きもの13、14によって余り強く引っ
張られて上記押圧力が過大となり、メダル等が布状研磨
部材間で滞ることがないようにする。
In the description based on the above figures,
Although the hanging ends of the two cloth-like polishing members 1 and 2 are shown as free ends, for example, as shown in FIG. 8, the cloth-like polishing members 1 and 2 are substantially in a stationary state. The cloth-like polishing members 1 and 2 are not wound,
It is also possible to wind up the winding cores 15 and 16d little by little from 3 and 14 so as to save the trouble of replacing the cloth-like polishing member. However, at this time, the cloth-like polishing members 1 and 2 are pulled so strongly by the winding materials 13 and 14 that the pressing force becomes excessively large so that medals and the like do not stay between the cloth-like polishing members.

【0016】請求項4に記載の研磨装置は、請求項2
記載のメダル等の研磨装置において、上記ジグザグ曲が
り挿通路提供体は、ジグザグに曲げられた弾力的撓み性
の2枚のベルトを間隔をおいて並行状に配することによ
り該2つのベルト間にジグザグの挿通路を形成するもの
であることを特徴とする。
According to a fourth aspect of the present invention, in the polishing apparatus for a medal or the like according to the second aspect , the zigzag bent insertion path providing body includes two elastically flexible belts bent in a zigzag manner. A zigzag insertion path is formed between the two belts by arranging them in parallel at an interval.

【0017】この発明のメダル等の研磨装置は、弾力的
撓み性を具えるベルト2本を同じようにジグザグに曲げ
るとともに相互に間隔をおいて並行状に配置することに
より、相対する2つの布状研磨部材1、2を通す挿通路
を形成するようにしたので、これによってジグザグに曲
げられた布状研磨部材間をメダル等が落下する間にメダ
ル等が滞って複数のメダル等が集まりかけても、メダル
等の重力でベルトが撓んで退き、集まりかけたメダル等
を一気に排出するので、メダル等の詰まりが生じ難いジ
グザグ曲がり挿通路提供体となる。
In the polishing apparatus for medals and the like according to the present invention, two belts having elastic flexibility are similarly bent in a zigzag manner and are arranged in parallel at an interval from each other, so that two opposing cloths are provided. Since the insertion passages through which the abrasive members 1 and 2 pass are formed, medals and the like are stagnated while the medals and the like fall between the cloth-like abrasive members bent in a zigzag pattern, and a plurality of medals and the like are gathered. However, since the belt flexes due to the gravity of medals or the like and retreats, and the medals or the like that have gathered are discharged at a stroke, a zigzag bent insertion passage providing body in which clogging of medals and the like is unlikely to occur is obtained.

【0018】請求項5に記載の研磨装置は、請求項1か
までのいずれかに記載のメダル等の研磨装置におい
て、上記相対する布状研磨部材の幅の少なくとも一方を
限界するとともにメダル等の自由落下通路の側壁面を形
成する側壁部材を配し、しかして上記相対する布状研磨
部材の全体としての垂れ下げ方向を、該布状研磨部材の
面を含む面内で上記隔壁部材のある側に傾斜させたこと
を特徴とする。
A polishing apparatus according to a fifth aspect of the present invention is the polishing apparatus for medals or the like according to any one of the first to fourth aspects, wherein at least one of the widths of the cloth-like polishing members facing each other is adjusted. A side wall member which forms a side wall surface of a free fall passage for medals or the like is provided so as to limit the hanging direction of the opposing cloth-like polishing member as a whole in a plane including the surface of the cloth-like polishing member. In this case, the partition wall is inclined to the side where the partition member is located.

【0019】この発明のメダル等の研磨装置は、上記図
4に示したように2つの布状研磨部材間に投入したメダ
ル等は落下通路内を自由落下する間に該落下通路の上記
側壁部材の側壁面に接しながら落ちるようにするのでメ
ダル等は回転しながらその側面も均一に研磨される。
In the polishing apparatus for medals and the like according to the present invention, as shown in FIG. 4, the medals and the like inserted between the two cloth-like polishing members are free-falling in the fall passage while the side wall member of the fall passage is provided. The medals and the like are rotated and their side surfaces are polished evenly because the medals and the like are made to fall while being in contact with the side wall surfaces.

【0020】[0020]

【発明の実施の形態】本発明の1つの実施形態としての
メダル連続研磨装置を図9から図12までに基づいて説
明する。この実施形態は上記弾力的撓み性のベルトをジ
グザグ曲がり挿通路提供体として用いた場合の例であ
る。なお、図9はこの実施形態のメダル連続研磨装置の
研磨機(本発明の研磨装置)の垂直断面図(正面面)で
あり、図10はメダルが連続的に投入されているときの
上記研磨機の垂直断面図(正面図)であり、図11はこ
の実施形態のメダル連続研磨装置の全体の正面図であ
り、図12は上記メダル連続研磨装置の全体の側面図で
ある。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A medal continuous polishing apparatus as one embodiment of the present invention will be described with reference to FIGS. This embodiment is an example in which the elastic flexible belt is used as a zigzag bend insertion path providing body. FIG. 9 is a vertical sectional view (front view) of a polishing machine (polishing device of the present invention) of the medal continuous polishing device of this embodiment, and FIG. 10 shows the above polishing when medals are continuously inserted. FIG. 11 is a vertical sectional view (front view) of the machine, FIG. 11 is an overall front view of the medal continuous polishing device of this embodiment, and FIG. 12 is a side view of the entire medal continuous polishing device.

【0021】メダル連続研磨装置20において、後述す
る空検知センサ(43)によってメダル量の不足が検知
されたときは一定量の汚れたメダル4が、塗りつぶしの
矢印で示すように、タンク21から送出コンベア22に
よって研磨機用りフター23の下部に置かれた研磨機用
リフター下部ホッパー24内へ流され補給される。一
方、メダル遊技機で使用済みの汚れたメダルが後述する
回収コンベア(39)に乗って回収されてきて、上記研
磨機用リフター下部ホッパー24内へ流される。そこか
ら研磨機用リフター23で上端まで持ち上げられる。持
ち上げられた汚れたメダル4は、投入用排出口25から
排出されて、研磨機26上部の投入口27から扁平な布
袋28内へ向けて投入される。
In the continuous medal polishing device 20, when a shortage of a medal amount is detected by a later-described empty detection sensor (43), a certain amount of dirty medal 4 is sent out from the tank 21 as shown by a solid arrow. The conveyer 22 flows into the lower hopper 24 for the polisher lifter placed below the polisher footer 23 to be replenished. On the other hand, dirty medals that have been used in the medal gaming machine are collected on a collecting conveyor (39), which will be described later, and flow into the lower hopper 24 of the lifter for the polishing machine. From there, it is lifted to the upper end by the lifter 23 for the polishing machine. The lifted dirty medal 4 is ejected from the ejection outlet 25, and is thrown into the flat cloth bag 28 from the insertion port 27 at the upper part of the polishing machine 26.

【0022】研磨機26の対向する縦に長い2枚の板2
9の間には、ほぼ同じようにジグザグに曲げられた2本
の弾力的撓み性の長いベルト30、30が、該2本のベ
ルト間にジグザグの通路が形成されるように間隔を置い
て上下方向に長く配設されている。上記2本のベルト3
0、30はそれぞれその上下両端において取り付け金具
31によって固定されている。なお、上記ジグザグ通路
の、メダルの自由落下の際に落下方向を変える部分の幅
W(図8)は、メダルの詰まりを防止するためにメダル
の外径よりも充分大きくしてある。しかして上記布袋2
8は上記ジグザグのベルト30、30間に形成されたジ
グザグ通路内にジグザグの垂れ下り状態で配置されてい
る。上部投入口27から布袋28内に多量に、又時に重
なりあって投入された上記汚れたメダルは程なく相対す
る布部1、2によって1枚づつに分離されて布部(1、
2)間に分散し自由落下する。そしてその自由落下の間
にメダルの両表面が上記2つの布部1又は2と交互に摺
れて研磨され、傷のない光沢性の表面状態が特徴的な清
浄メダルが排出口32から放出される。もし、メダルが
上記布部1、2間を自由落下する間にメダルが滞ること
が起こりかけてもそのときは上記ベルト30、30が滞
ったメダルの重力によって自然に撓んで上記滞って溜ま
りかけたメダルを放出するので、メダルの詰まりは未然
に防止される。なお、布袋の素材としてここでは綿布が
好適に用いられている。
Two vertically long plates 2 opposed to each other by the polishing machine 26
9, two resiliently flexible long belts 30, 30 bent in substantially the same zig-zag manner are spaced apart such that a zig-zag path is formed between the two belts. It is arranged vertically long. The above two belts 3
The reference numerals 0 and 30 are fixed at both upper and lower ends by mounting brackets 31. The width W (FIG. 8) of the zigzag passage that changes the drop direction when the medal falls freely is sufficiently larger than the outer diameter of the medal in order to prevent clogging of the medal. And then the cloth bag 2
Numeral 8 is disposed in a zigzag passage formed between the zigzag belts 30 in a zigzag manner. The dirty medals, which are inserted in large quantities into the cloth bag 28 from the upper slot 27 and sometimes overlapped with each other, are soon separated by the opposing cloth parts 1 and 2 into individual cloth parts (1,
2) It is dispersed and falls freely. During the free fall, both surfaces of the medal are alternately rubbed and polished with the two cloth portions 1 or 2, and a clean medal having a glossy surface state without flaws is discharged from the outlet 32. You. If the medals tend to stay while the medals freely fall between the cloth portions 1 and 2, in that case, the belts 30 and 30 naturally bend due to the gravity of the stalled medals and the medals tend to stay and accumulate. Since the medals are released, clogging of the medals is prevented. Here, a cotton cloth is suitably used as a material of the cloth bag.

【0023】研磨機26から放出された清浄化されたメ
ダルは白抜きの矢印で示したように、機械的衝撃からメ
ダルを守るための緩衝器33に受け止められ、次いで補
給用リフター下部ホッパー34まで流れ込み、そこから
補給用リフター35によって持ち上げられ、振分器36
に送り込まれる。振分器36では、遊技場に設置された
図示しない多数のメダル遊技機からのメダル要求信号を
受けた制御装置(図示しない)の送出指令に従って所定
量のメダルが振り分けられ、メダル補給用ホッパー37
を介して補給コンベアー38上に送出される。送出され
た清浄なメダルは、上記補給コンベアー38に乗って各
メダル遊技機の補給装置にまで送られ、そこで必要量の
メダルが当該メダル遊技機に補給されるようにされる。
各遊技機で使用済みの汚されたメダル及び時に余分とな
った清浄なメダルは回収コンベアー39に乗せられて戻
され、上記研磨機用リフター下部ホッパー24内に回収
される。上記研磨機用リフター下部ホッパー24内の主
として汚れたメダルからなるメダルは再び研磨機用リフ
ター23で持ち上げられて循環する。なお振分機36で
は、メダル遊技機からのメダル要求信号がなく清浄メダ
ルが余るときは、該清浄メダルの一部又は全部を返却シ
ュート40側に振り分けらて放出し、返却シュート40
を介してタンク21内に戻される。なお、上記研磨機用
リフター下部ホッパー24には満杯検知センサ42と空
検知センサ43とが設けられていて、該センサ42、4
3からの検知信号を受けた上記制御装置が所定の必要な
動作を開始させるようになっている。又上記補給用リフ
ター下部ホッパー34には満杯センサ44が設けられて
いて、該センサ44の検知信号を受けた制御装置が所定
の必要な動作を開始させるようになっている。なお、先
に述べたように上記送出コンベアー22の起動開始は、
上記研磨機用リフター下部ホッパー24内の空検知セン
サ43の検知信号を受けて制御装置から発せられる起動
指令信号によって行われる。
The cleaned medals discharged from the polishing machine 26 are received by a shock absorber 33 for protecting the medals from mechanical impact, as indicated by white arrows, and then to a lower lifter hopper 34 for replenishment. And is lifted from there by a resupply lifter 35,
Sent to. In the sorter 36, a predetermined amount of medals is sorted according to a transmission command of a control device (not shown) which has received a medal request signal from a number of medal gaming machines (not shown) installed in the game arcade, and a medal replenishing hopper 37.
Through the supply conveyor 38. The transmitted clean medals are sent to the replenishment device of each medal gaming machine on the supply conveyor 38, where a required amount of medals is supplied to the medal gaming machine.
Soiled medals used in each of the gaming machines and clean medals that have become unnecessary at times are put back on the collection conveyor 39 and collected in the lower hopper 24 for the polishing machine lifter. The medals mainly composed of dirty medals in the lower hopper 24 for the polishing machine lifter are lifted again by the polishing machine lifter 23 and circulated. In the distributing machine 36, when there is no medal request signal from the medal gaming machine and there is a surplus of clean medals, part or all of the clean medals are distributed to the return chute 40 side and discharged, and the return chute 40 is discharged.
Is returned to the inside of the tank 21. The lifter lower hopper 24 for the polishing machine is provided with a full detection sensor 42 and an empty detection sensor 43.
The control device receiving the detection signal from the control unit 3 starts a predetermined necessary operation. The replenishment lifter lower hopper 34 is provided with a full sensor 44, and a control device that has received a detection signal from the sensor 44 starts a predetermined necessary operation. Note that, as described above, the start of the start of the above-mentioned sending conveyor 22 is as follows.
In response to a detection signal from the empty detection sensor 43 in the lower hopper 24 for the polishing machine, a start command signal is issued from the control device.

【0024】なお、研磨機26の布1、2が磨耗したり
汚れたりして交換を要するときは、上記研磨機26全体
をカートリッジ方式で間単に交換することで行うことが
できる。上記実施形態のメダル連続研磨装置20は、研
磨機26として本発明のメダル等の研磨装置を用いたこ
とに伴って、連続研磨装置全体としも機械要素が簡単で
すみ、能力の割には小型にもでき、又安価に製作でき、
しかも研磨後のメダルは傷のないきれいな光沢のあるも
のとすることができる。
When the cloths 1 and 2 of the polishing machine 26 need to be replaced due to wear or dirt, the entire polishing machine 26 can be simply replaced by a cartridge system. The medal continuous polishing device 20 of the above embodiment uses the polishing device for medals or the like of the present invention as the polishing machine 26, so that the mechanical components are simple as a whole of the continuous polishing device, and the size is small for the capability. Can also be manufactured at low cost,
Moreover, the polished medals can be made to have a clean gloss without scratches.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の研磨装置において採用した研磨方法の
最も原理的な構成を説明するための図であり、(イ)は
正面図、(ロ)は側面図である。
FIG. 1 is a view for explaining the most basic configuration of a polishing method employed in a polishing apparatus of the present invention, wherein (a) is a front view and (b) is a side view.

【図2】本発明の研磨装置において採用した研磨方法の
基本的な1つの構成を説明するための図である。
FIG. 2 is a view for explaining one basic configuration of a polishing method employed in the polishing apparatus of the present invention.

【図3】本発明の研磨装置において採用した研磨方法の
基本的な他の1つの構成を説明するための図である。
FIG. 3 is a view for explaining another basic configuration of a polishing method employed in the polishing apparatus of the present invention.

【図4】本発明の研磨装置において採用した研磨方法の
原理的な構成を補足説明するための図であり、(イ)は
正面図、(ロ)は側面図である。
FIGS. 4A and 4B are diagrams for supplementarily explaining a principle configuration of a polishing method employed in the polishing apparatus of the present invention , wherein FIG. 4A is a front view and FIG.

【図5】図2に示した研磨方法の基本的な1つの構成を
実施するためのより具体的な研磨装置の構成例を説明す
る図である。
It is a diagram illustrating a more structural example of a specific polishing apparatus for Figure 5 implementing the basic one configuration of Migaku Ken method shown in FIG.

【図6】上記構成例の研磨装置によってメダル等の研磨
を行ったときの一連の研磨動作を説明するための図であ
る。
FIG. 6 is a view for explaining a series of polishing operations when polishing medals and the like is performed by the polishing apparatus of the above configuration example.

【図7】図2に示した研磨方法の基本的な1つの構成を
実施するための更により具体的な研磨装置の構成例を説
明する図である。
7 is a further diagram for explaining a configuration example of a specific polishing apparatus than for implementing the basic one configuration of Migaku Ken method shown in FIG.

【図8】本発明の研磨装置において採用した研磨方法の
基本的な構成を補足説明するための図である。
FIG. 8 is a diagram for supplementarily explaining a basic configuration of a polishing method employed in the polishing apparatus of the present invention.

【図9】本発明の1つの実施形態としてのメダル連続研
磨装置の、研磨機(本発明の研磨装置)の垂直断面図
(正面図)である。
FIG. 9 is a vertical cross-sectional view (front view) of a polishing machine (the polishing device of the present invention) of the medal continuous polishing device as one embodiment of the present invention.

【図10】上記実施形態のメダル連続研磨装置の、研磨
機(本発明の研磨装置)の、メダルの連続的な研磨を行
っている状態の垂直断面図(正面図)である。
FIG. 10 is a vertical cross-sectional view (front view) of the polishing machine (polishing device of the present invention) of the medal continuous polishing device of the embodiment, in which medals are continuously polished.

【図11】上記実施形態のメダル連続研磨装置の全体の
正面図である。
FIG. 11 is an overall front view of the medal continuous polishing device of the embodiment.

【図12】上記実施形態のメダル連続研磨装置の全体の
側面図である。
FIG. 12 is an overall side view of the medal continuous polishing device of the embodiment.

【符号の説明】[Explanation of symbols]

1、2…相対する布状研磨部材 3…押圧力 4…メダル等(メダル、コイン、球のいずれかである研
磨対象物) 5…傾斜面提供体(押圧手段) 7…流体バッグ(押圧手段) 9、11、30…ジグザグ曲がり挿通路提供体(押圧手
段)
1, 2: opposing cloth-like polishing members 3: pressing force 4: medals, etc. (medals, coins, balls
Polishing object) 5: inclined surface providing body (pressing means) 7: fluid bag (pressing means) 9, 11, 30 ... zigzag bending insertion passage providing body (pressing means)

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 垂れ下げられた相対する布状研磨部材
と、メダル、コイン、球のいずれかである研磨対象物が
該相対する布状研磨部材間に上方から投入されたときに
該研磨対象物が該相対する布状研磨部材間を押し分けて
自由落下し得る大きさの押圧力を以って該相対する布状
研磨部材を相互に接触させるための押圧手段とを備え、
上記研磨対象物を上記相対する布状研磨部材間を自由落
下させることにより上記布状研磨部材で研磨する研磨装
置であって、上記押圧手段は、少なくとも一方の布状研
磨部材を押圧するための一定圧力の流体が詰められた流
体バッグであることを特徴とする研磨装置。
1. An opposed cloth-like polishing member which is suspended.
And the object to be polished, either a medal, coin, or ball
When thrown from above between the opposing cloth-like polishing members
The object to be polished presses between the opposed cloth-like polishing members.
The opposing cloth with a pressing force large enough to fall freely
Pressing means for bringing the polishing members into contact with each other,
The object to be polished falls freely between the opposed cloth-like polishing members.
Polishing device for polishing with the cloth-like polishing member by lowering
Wherein the pressing means comprises at least one of a cloth polishing machine.
A stream filled with a constant pressure fluid to press the polishing member
A polishing device characterized by being a body bag.
【請求項2】 垂れ下げられた相対する布状研磨部材
と、メダル、コイン、球のいずれかである研磨対象物が
該相対する布状研磨部材間に上方から投入されたときに
該研磨対象物が該相対する布状研磨部材間を押し分けて
自由落下し得る大きさの押圧力を以って該相対する布状
研磨部材を相互に接触させるための押圧手段とを備え、
上記研磨対象物を上記相対する布状研磨部材間を自由落
下させることにより上記布状研磨部材で研磨する研磨装
置であって、上記押圧手段は、上記相対する布状研磨部
材をジグザグに曲げながら通すための挿通路を供するジ
グザグ曲がり挿通路提供体であることを特徴とする研磨
装置。
2. An opposed cloth-like polishing member which is suspended.
And the object to be polished, either a medal, coin, or ball
When thrown from above between the opposing cloth-like polishing members
The object to be polished presses between the opposed cloth-like polishing members.
The opposing cloth with a pressing force large enough to fall freely
Pressing means for bringing the polishing members into contact with each other,
The object to be polished falls freely between the opposed cloth-like polishing members.
Polishing device for polishing with the cloth-like polishing member by lowering
Wherein the pressing means comprises:
A jig that provides an insertion passage for passing the material while bending it zigzag
Polishing characterized by being a zigzag insertion passage providing body
apparatus.
【請求項3】 請求項2に記載の研磨装置において、上
記ジグザグ曲がり挿通路提供体は、上記相対する布状研
磨部材をジグザグに曲げながら通すための挿通路が複数
段に形成された梯子型枠体であることを特徴とする研磨
装置。
3. The polishing apparatus according to claim 2, wherein
The zigzag bent insertion passage providing body is provided with
Multiple insertion paths for passing the polishing member while bending it zigzag
Polishing characterized by being a ladder frame formed in steps
apparatus.
【請求項4】 請求項2に記載の研磨装置において、上
記ジグザグ曲がり挿通路提供体は、ジグザグに曲げられ
た弾力的撓み性の2枚のベルトを間隔をおいて並行状に
配することにより該2つのベルト間にジグザグの挿通路
を形成するものであることを特徴とする研磨装置
4. The polishing apparatus according to claim 2, wherein
The zigzag bend insertion path provider is bent in a zigzag
Two elastically flexible belts in parallel at a distance
The zigzag insertion path between the two belts
A polishing apparatus characterized in that a polishing apparatus is formed .
【請求項5】 請求項1から4までのいずれかに記載の
研磨装置において、上記相対する布状研磨部材の幅の少
なくとも一方を限界するとともに上記研磨対象物の自由
落下通路の側壁面を形成する側壁部材を配し、しかして
上記相対する布状研磨部材の全体としての垂れ下げ方向
を、該布状研磨部材の面を含む面内で上記隔壁部材のあ
る側に傾斜させたことを特徴とする研磨装置。
5. The method according to claim 1, wherein
In the polishing apparatus, the width of the opposed cloth-shaped polishing member is small.
At least one of them is limited and the above-mentioned polishing object is free.
Arrange the side wall member that forms the side wall surface of the drop passage,
The hanging direction of the opposing cloth-like polishing member as a whole
The partition member in a plane including the surface of the cloth-like polishing member.
A polishing apparatus characterized in that the polishing apparatus is inclined to the right side.
JP9210906A 1997-08-05 1997-08-05 Polishing equipment Expired - Fee Related JP2983932B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9210906A JP2983932B2 (en) 1997-08-05 1997-08-05 Polishing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9210906A JP2983932B2 (en) 1997-08-05 1997-08-05 Polishing equipment

Publications (2)

Publication Number Publication Date
JPH1147426A JPH1147426A (en) 1999-02-23
JP2983932B2 true JP2983932B2 (en) 1999-11-29

Family

ID=16597036

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9210906A Expired - Fee Related JP2983932B2 (en) 1997-08-05 1997-08-05 Polishing equipment

Country Status (1)

Country Link
JP (1) JP2983932B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5231009B2 (en) * 2007-12-19 2013-07-10 株式会社サンエイ Guide device for collected game balls in pachinko
JP5525072B1 (en) * 2013-01-21 2014-06-18 日本金銭機械株式会社 Discoid polishing machine

Also Published As

Publication number Publication date
JPH1147426A (en) 1999-02-23

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