JP2975452B2 - Test circuit for ESD protection circuit - Google Patents

Test circuit for ESD protection circuit

Info

Publication number
JP2975452B2
JP2975452B2 JP3111080A JP11108091A JP2975452B2 JP 2975452 B2 JP2975452 B2 JP 2975452B2 JP 3111080 A JP3111080 A JP 3111080A JP 11108091 A JP11108091 A JP 11108091A JP 2975452 B2 JP2975452 B2 JP 2975452B2
Authority
JP
Japan
Prior art keywords
circuit
protection circuit
terminal
test
signal application
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3111080A
Other languages
Japanese (ja)
Other versions
JPH04317367A (en
Inventor
良彦 小池
英好 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3111080A priority Critical patent/JP2975452B2/en
Publication of JPH04317367A publication Critical patent/JPH04317367A/en
Application granted granted Critical
Publication of JP2975452B2 publication Critical patent/JP2975452B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Semiconductor Integrated Circuits (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は半導体集積回路の入力信
号印加端子に接続されている静電破壊保護回路の試験回
路に関する。従来半導体集積回路の入力信号印加端子に
静電破壊保護回路を接続し、取扱者に帯電した静電気が
放電したときに、半導体集積回路などの内部回路を保護
することは実行されている。しかしその保護回路自体は
入力信号印加端子の内部に接続されているから、接続の
後に集積回路の外部から保護回路自体の動作正常性をテ
ストすることが出来なかった。そのため簡易な構成によ
りテスト出来る技術を開発することが要望された。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a test circuit for an electrostatic discharge protection circuit connected to an input signal application terminal of a semiconductor integrated circuit. 2. Description of the Related Art Conventionally, an electrostatic discharge protection circuit is connected to an input signal application terminal of a semiconductor integrated circuit to protect an internal circuit such as a semiconductor integrated circuit when static electricity charged to an operator is discharged. However, since the protection circuit itself is connected to the inside of the input signal application terminal, it is not possible to test the normal operation of the protection circuit itself from outside the integrated circuit after the connection. Therefore, it has been desired to develop a technology that can be tested with a simple configuration.

【0002】[0002]

【従来の技術】半導体を使用するデバイスは静電破壊の
現象により、容易に障害を起こすことが知られていて、
静電破壊耐量を高くとることが必要となる。人体は帯電
し易く環境によっては数千Vに達することがあり、その
帯電エネルギーが人体とデバイスの抵抗を通して瞬間的
に放電するとき、半導体素子の電極の溶断または酸化膜
破壊が起こる。MOS型大規模集積回路は静電破壊に特
に弱く、耐圧は数十Vである。そのため集積回路の入力
信号印加端子と内部回路間に保護回路を挿入し、過電圧
を吸収している。保護回路としての従来技術を図5と図
6に示す。図5は抵抗とMOS FETを組合せたもの
で、1は入力信号印加端子、例えば入力パッド、2は内
部回路との接続端子、3はFET、4は抵抗素子を示
す。したがって端子1より左側はデバイスの外部とな
る。図4において、端子1に負の高電圧が印加されたと
き、ドレイン・ソース間が導通状態となり、接地から抵
抗素子4とFET3を介して端子1と瞬間的に電流が流
れ、端子1の高電圧を吸収する。図4の場合は端子1に
印加された高電圧が正のとき、保護回路としての動作が
できない。
2. Description of the Related Art Devices using semiconductors are known to easily fail due to the phenomenon of electrostatic breakdown.
It is necessary to increase the electrostatic breakdown strength. The human body is easily charged and can reach several thousands of volts depending on the environment. When the charging energy is discharged instantaneously through the human body and the resistance of the device, fusing of the electrodes of the semiconductor element or destruction of the oxide film occurs. MOS large-scale integrated circuits are particularly vulnerable to electrostatic breakdown, and have a withstand voltage of several tens of volts. Therefore, a protection circuit is inserted between the input signal application terminal of the integrated circuit and the internal circuit to absorb overvoltage. FIGS. 5 and 6 show a conventional technique as a protection circuit. FIG. 5 shows a combination of a resistor and a MOS FET. Reference numeral 1 denotes an input signal application terminal, for example, an input pad, 2 denotes a connection terminal to an internal circuit, 3 denotes an FET, and 4 denotes a resistance element. Therefore, the left side of the terminal 1 is outside the device. In FIG. 4, when a high negative voltage is applied to the terminal 1, the drain-source state becomes conductive, a current flows instantaneously from the ground to the terminal 1 via the resistor 4 and the FET 3, and Absorbs voltage. In the case of FIG. 4, when the high voltage applied to the terminal 1 is positive, the operation as the protection circuit cannot be performed.

【0003】また図6は図5の回路を改良したもので、
図示する3と5は導電形式の異なるFETを示してい
る。即ち、FET3はN型、FET5はP型であって、
図6の場合は端子1に印加された高電圧が正であって
も、負の場合と同様に吸収動作が出来る。即ち、端子1
の高電圧が負の場合と、正の場合とで、FETが個別に
動作するためである。
FIG. 6 shows a modification of the circuit shown in FIG.
Reference numerals 3 and 5 show FETs having different conductive types. That is, FET3 is N-type, FET5 is P-type,
In the case of FIG. 6, even if the high voltage applied to the terminal 1 is positive, the absorbing operation can be performed as in the case of the negative voltage. That is, terminal 1
This is because the FET operates individually when the high voltage is negative and when it is positive.

【0004】保護回路の構成としては、図5・図6以外
に単に抵抗を挿入するもの、pnダイオードを使用する
もの、抵抗とpnダイオードの組合せなどがあった。
In addition to the configurations shown in FIGS. 5 and 6, the protection circuit includes a configuration in which a resistor is simply inserted, a configuration using a pn diode, and a combination of a resistor and a pn diode.

【0005】[0005]

【発明が解決しようとする課題】図5・図6に示す回路
は、デバイスが出来上ったとき、入力端子1が外部と接
続されているのみであるから、製品出荷時に保護回路そ
れ自体の動作の正常性を試験して評価することが出来な
い。ユーザにおいて、半導体を使用するデバイスが入力
端子に近く接続されていると、若し保護回路が不良であ
れば、たとえ瞬間的な高電圧であってもデバイスが破壊
される。保護回路が不良となることは、製造時トランジ
スタの構造が不良のためトランジスタとして製造されて
ないとき、または電極と接続線とのコンタクトが不良の
ため動作不完全である場合などの例がある。
In the circuits shown in FIGS. 5 and 6, when the device is completed, only the input terminal 1 is connected to the outside. Test normality cannot be evaluated. For a user, if a device using a semiconductor is connected close to an input terminal, if the protection circuit is defective, the device will be destroyed even at a momentary high voltage. The protection circuit may be defective when the transistor is not manufactured as a transistor due to a defective transistor structure at the time of manufacture, or when the operation of the transistor is incomplete due to a defective contact between an electrode and a connection line.

【0006】図5・図6以外の保護回路の構成例は、極
めて単純ではあるが、静電破壊保護回路としての動作が
不十分となることがあった。
Although the configuration examples of the protection circuit other than those shown in FIGS. 5 and 6 are extremely simple, the operation as the electrostatic breakdown protection circuit may be insufficient.

【0007】本発明の目的は前述の欠点を改善し、静電
破壊保護回路付きのデバイスが出来上がった後であって
も、簡易な構成により、その保護回路の動作状態を試験
して、不良品を排斥できるような試験回路を提供するこ
とにある。
An object of the present invention is to improve the above-mentioned drawbacks, and to test the operation state of the protection circuit with a simple configuration even after a device with an electrostatic breakdown protection circuit is completed, by using a simple configuration. It is an object of the present invention to provide a test circuit capable of rejecting the above.

【0008】[0008]

【課題を解決するための手段】図1は本発明の原理構成
を示す図である。図1において、1は入力信号印加端
子、6は静電破壊保護回路に対する導通制御回路、7-1,
7-2 は制御信号印加端子、8は半導体集積回路、9は接
地、10は静電破壊保護回路、11は電源を示す。半導
体集積回路8の入力信号印加端子1と接地9及び電源1
1間に挿入され、トランジスタ回路により構成した静電
破壊保護回路10において、本発明は下記の構成とす
る。即ち、前記静電破壊保護回路10に対する導通・非
導通制御回路6を具備し、該制御回路6に制御信号7-1,
7-2 を印加した時の前記入力信号印加端子1の電位を測
定し、静電破壊保護回路10の正常性を試験することで
構成する。
FIG. 1 is a diagram showing the principle configuration of the present invention. In FIG. 1, 1 is an input signal application terminal, 6 is a conduction control circuit for an electrostatic discharge protection circuit,
7-2 is a control signal application terminal, 8 is a semiconductor integrated circuit, 9 is ground, 10 is an electrostatic breakdown protection circuit, and 11 is a power supply. Input signal application terminal 1 of semiconductor integrated circuit 8, ground 9 and power supply 1
The present invention has the following configuration in the electrostatic breakdown protection circuit 10 that is inserted between the two and is configured by a transistor circuit. That is, a conduction / non-conduction control circuit 6 for the electrostatic breakdown protection circuit 10 is provided.
7-2, the potential of the input signal application terminal 1 is measured, and the normality of the electrostatic discharge protection circuit 10 is tested.

【0009】[0009]

【作用】図1に示す回路では制御信号印加端子7-1,7-2
に印加する信号により、導通制御回路6が制御され、静
電破壊保護回路10のトランジスタ素子について導通・
非導通の制御を行う。保護回路10の制御がなされたと
き、端子1における電位を図示しない手段で測定すれ
ば、保護回路10が正常な回路となっているかどうかを
判断することができる。即ち、静電破壊保護回路10の
正常性を試験することが出来る。静電破壊保護回路10
に対し導通制御回路6を予め設けておくのみで、制御信
号は他の回路に対して使用する信号を流用できるから、
試験回路として簡潔に実現できる。静電破壊保護回路1
0が正常に動作すれば、端子1に異常高電圧が印加され
ても、半導体集積回路8を破壊から防止することが出来
る。
In the circuit shown in FIG. 1, the control signal application terminals 7-1 and 7-2
The conduction control circuit 6 is controlled by the signal applied to
Controls non-conduction. When the protection circuit 10 is controlled, if the potential at the terminal 1 is measured by means (not shown), it can be determined whether the protection circuit 10 is a normal circuit. That is, the normality of the electrostatic discharge protection circuit 10 can be tested. ESD protection circuit 10
However, since only the continuity control circuit 6 is provided in advance, a signal used for another circuit can be used as the control signal.
It can be simply implemented as a test circuit. ESD protection circuit 1
If 0 operates normally, the semiconductor integrated circuit 8 can be prevented from being destroyed even if an abnormally high voltage is applied to the terminal 1.

【0010】[0010]

【実施例】図2は本発明の実施例として、図1における
導通・非導通制御回路6・静電破壊保護回路10・制御
信号印加端子7-1,7-2 を詳細に示す図である。図2にお
いて、3はN型FET、5はP型FET、6は導通・非
導通制御回路、7-1 は制御信号として試験信号の印加端
子、7-2 は制御信号としてデータの印加端子、10は静
電破壊保護回路、11は電源、12,14はNAND回
路、13はインバータを示す。また図3は図2に示す回
路の動作波形図を示す。図2において、テスト信号端子
7-1 にテスト信号“L”を印加し、データ信号端子7-2
に“H”“L”どちらを印加しても、FET3,5が共
にオフとなる。図3の波形図Aに示すようにFET3,
5の接続点の電位は不定状態Zである。この接続点が即
ち、入力信号印加端子であるから、入力信号印加端子の
電位を別の測定器で測定すると、電位は“L”または
“H”ではなく不定の状態となっている。このようにし
て、FET3,5で構成する静電破壊保護回路10の試
験の一方ができる。従来技術の図6に示す状態となって
いる。
FIG. 2 is a diagram showing in detail a conduction / non-conduction control circuit 6, an electrostatic breakdown protection circuit 10, and control signal application terminals 7-1 and 7-2 in FIG. 1 as an embodiment of the present invention. . 2, 3 is an N-type FET, 5 is a P-type FET, 6 is a conduction / non-conduction control circuit, 7-1 is a test signal application terminal as a control signal, 7-2 is a data application terminal as a control signal, Reference numeral 10 denotes an electrostatic discharge protection circuit, 11 denotes a power supply, 12 and 14 denote NAND circuits, and 13 denotes an inverter. FIG. 3 shows an operation waveform diagram of the circuit shown in FIG. In FIG. 2, test signal terminals
Apply a test signal “L” to the data signal terminal 7-2.
No matter which of “H” and “L” is applied to the FETs, both the FETs 3 and 5 are turned off. As shown in the waveform diagram A of FIG.
The potential at the connection point of No. 5 is in the undefined state Z. Since this connection point is the input signal application terminal, when the potential of the input signal application terminal is measured by another measuring instrument, the potential is not "L" or "H" but in an indeterminate state. In this manner, one of the tests of the electrostatic discharge protection circuit 10 constituted by the FETs 3 and 5 is performed. This is the state shown in FIG. 6 of the prior art.

【0011】次いで、図3の波形図Bに示すように、テ
スト信号を“H”レベルとして、データ信号端子7-2 に
“L”を印加すれば、P型FET5がオン、N型FET
3がオフとなり、端子1は“H”となる。次にデータ信
号端子7-2 に“H”を印加すれば、FET3,5の導通
が逆になって、端子1は“L”となる。
Next, as shown in a waveform diagram B of FIG. 3, when the test signal is set at "H" level and "L" is applied to the data signal terminal 7-2, the P-type FET 5 is turned on, and the N-type FET is turned on.
3 is turned off, and the terminal 1 becomes "H". Next, when "H" is applied to the data signal terminal 7-2, the conduction of the FETs 3 and 5 is reversed, and the terminal 1 becomes "L".

【0012】図4は、本発明の他の実施例の構成とし
て、図5に示す回路に適用した場合である。図4におい
て、15はN型FETで、電源11と接地9への接続を
切換えるスイッチとなっている。端子7-1 にテスト信号
として“L”が印加されたとき、オフとなったFET1
5は、FET3がゲートを“H”としてオンに変わる。
次にFET15のゲートに“H”が印加されオンしたと
き、FET3のゲートは“L”、したがってオフとな
る。端子1においてFET3のオン・オフ変化を電位変
化として観察すれば、FET3について試験が出来る。
FIG. 4 shows a case where the configuration of another embodiment of the present invention is applied to the circuit shown in FIG. In FIG. 4, reference numeral 15 denotes an N-type FET, which is a switch for switching connection between the power supply 11 and the ground 9. FET1 turned off when "L" is applied as a test signal to terminal 7-1
5 turns on the FET 3 with the gate at “H”.
Next, when “H” is applied to the gate of the FET 15 and the FET 15 is turned on, the gate of the FET 3 is “L” and thus turned off. By observing the on / off change of the FET 3 at the terminal 1 as a potential change, the FET 3 can be tested.

【0013】[0013]

【発明の効果】このようにして本発明によると、静電破
壊保護回路に対する導通・非導通の制御回路を試験回路
として組込んでおくことにより、静電破壊保護回路の動
作の正常性を入力信号印加端子からチェックすることが
可能となる。試験回路のテスト信号は、他の回路に使う
信号を流用して使うことで良いため、試験回路として僅
かの回路を設けて置くのみで良い。したがって半導体集
積回路のような内部回路の信頼性を大いに向上させるこ
とが出来る。
As described above, according to the present invention, the normality of the operation of the electrostatic breakdown protection circuit can be input by incorporating a control circuit for conducting / non-conducting the electrostatic breakdown protection circuit as a test circuit. It is possible to check from the signal application terminal. Since a test signal of the test circuit can be used by diverting a signal used for another circuit, only a small number of circuits may be provided as the test circuit. Therefore, the reliability of an internal circuit such as a semiconductor integrated circuit can be greatly improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の原理構成を示す図である。FIG. 1 is a diagram showing a principle configuration of the present invention.

【図2】本発明の実施例の構成を示す図である。FIG. 2 is a diagram showing a configuration of an embodiment of the present invention.

【図3】図2の回路の動作波形図である。FIG. 3 is an operation waveform diagram of the circuit of FIG. 2;

【図4】本発明の他の実施例の構成を示す図である。FIG. 4 is a diagram showing a configuration of another embodiment of the present invention.

【図5】従来技術の構成を示す図である。FIG. 5 is a diagram showing a configuration of a conventional technique.

【図6】他の従来技術の構成を示す図である。FIG. 6 is a diagram showing a configuration of another conventional technique.

【符号の説明】[Explanation of symbols]

1 入力信号印加端子 6 静電破壊保護回路に対する制御回路 7-1,7-2 制御信号印加端子 8 半導体集積回路 9 接地 10 静電破壊保護回路 11 電源 DESCRIPTION OF SYMBOLS 1 Input signal application terminal 6 Control circuit for electrostatic breakdown protection circuit 7-1, 7-2 Control signal application terminal 8 Semiconductor integrated circuit 9 Ground 10 Electrostatic breakdown protection circuit 11 Power supply

フロントページの続き (56)参考文献 特開 平2−105074(JP,A) 特開 昭62−268143(JP,A) 特開 平1−171239(JP,A) 特開 昭62−149162(JP,A) 特開 平3−19359(JP,A) (58)調査した分野(Int.Cl.6,DB名) H01L 27/04 G01R 31/28 H01L 21/66 H01L 21/822 Continuation of the front page (56) References JP-A-2-105074 (JP, A) JP-A-62-268143 (JP, A) JP-A-1-171239 (JP, A) JP-A-62-149162 (JP, A) (A) JP-A-3-19359 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) H01L 27/04 G01R 31/28 H01L 21/66 H01L 21/822

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 半導体集積回路(8) の入力信号印加端子
(1) と接地(9) 及び電源(11)間に挿入され、トランジス
タ回路により構成した静電破壊保護回路(10)において、
前記静電破壊保護回路(10)に対する導通・非導通制御回
路(6) を具備し、該制御回路(6) に制御信号(7-1)(7-2)
を印加した時の前記入力信号印加端子(1) の電位を測定
し、静電破壊保護回路(10)の正常性を試験することを特
徴とする静電破壊保護回路の試験回路。
An input signal application terminal of a semiconductor integrated circuit (8)
In the ESD protection circuit (10), which is inserted between (1) and the ground (9) and the power supply (11) and is composed of a transistor circuit,
A conduction / non-conduction control circuit (6) for the electrostatic breakdown protection circuit (10) is provided, and control signals (7-1) (7-2) are provided to the control circuit (6).
A test circuit for an electrostatic discharge protection circuit, comprising: measuring a potential of the input signal application terminal (1) when a voltage is applied, and testing the normality of the electrostatic discharge protection circuit (10).
JP3111080A 1991-04-16 1991-04-16 Test circuit for ESD protection circuit Expired - Fee Related JP2975452B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3111080A JP2975452B2 (en) 1991-04-16 1991-04-16 Test circuit for ESD protection circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3111080A JP2975452B2 (en) 1991-04-16 1991-04-16 Test circuit for ESD protection circuit

Publications (2)

Publication Number Publication Date
JPH04317367A JPH04317367A (en) 1992-11-09
JP2975452B2 true JP2975452B2 (en) 1999-11-10

Family

ID=14551880

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3111080A Expired - Fee Related JP2975452B2 (en) 1991-04-16 1991-04-16 Test circuit for ESD protection circuit

Country Status (1)

Country Link
JP (1) JP2975452B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4828493B2 (en) * 2007-09-05 2011-11-30 富士通セミコンダクター株式会社 Static electricity evaluation circuit and semiconductor integrated circuit device

Also Published As

Publication number Publication date
JPH04317367A (en) 1992-11-09

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