JP2973850B2 - Method of manufacturing magnetoresistive thin film magnetic head - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an MR (magnetoresistive) head used for a reproducing head for a hard disk or the like.
It relates to a manufacturing method .

[0002]

2. Description of the Related Art An MR head is a read-only magnetic head for reproducing recorded information by detecting a magnetic field generated from a magnetic pole of a magnetic recording medium using an MR element. There is an advantage that the recording density can be improved. For example, it is used in combination with an inductive magnetic head for recording as an inductive / MR composite magnetic head for a hard disk.

FIG. 2 shows a conventional inductive / MR composite magnetic head for a hard disk. 2A is a sectional side view taken along the center line of the pole, and FIG. 2B is a perspective view seen from the recording medium facing surface side. The inductive / MR composite magnetic head 10 is configured by laminating an inductive magnetic head 14 on an MR magnetic head 12. Both heads 12, 1
All four are made using thin film formation technology.

[0004] The MR type magnetic head 12 comprises a slider substrate 1.
A lower shield 18 is formed on the rear end face 6 via a protective film 17, and a lower gap 20 forming an insulating layer is laminated thereon. On the lower gap 20, a magnetic sensor film 28 in which an MR film 46, a spacer 48, and a SAL (Soft Adjacent Layer: proximity soft magnetic layer) bias film 50 are laminated has its front end facing the recording medium facing surface (slider surface) 24. Not configured. On the magnetic sensor film 28, an alumina film is formed as a track width determining insulating film 29 at the center thereof, and leads (lead conductors) 30, 31 are formed on the left and right sides of the magnetic sensor film 28 from above. Are joined. In the MR film 46, a portion where the leads 30 and 31 are not joined becomes a sensitive portion, and a portion where the leads 30 and 31 are joined becomes a non-sensitive portion. An upper gap 32 constituting an insulating layer is formed on the magnetic sensor film 28 and the leads 30 and 31, and an upper shield 34 is formed thereon.

The inductive magnetic head 14 uses the upper shield 34 of the MR magnetic head 12 as a lower core, and further includes a write gap 36, a coil 37, and an insulating layer 3 thereon.
8, an upper core 40, and a protective film 42 are sequentially laminated.

An inductive / MR composite magnetic head 10 shown in FIG.
During recording, a recording magnetic field is generated in the gap 36 between the upper and lower cores 40 and 34 by passing a recording signal through the coil 37 of the induction type magnetic head 14, and recording on the recording medium is performed with this magnetic field. At the time of reproduction, a current is supplied to the SAL bias film 50 through the leads 30 and 31 of the MR type magnetic head 12 to apply a bias magnetic field to the MR film 46, and a sense current is supplied to the MR film 46 through the leads 30 and 31. By tracing the track on the recording medium, the voltage across the MR film 46 is modulated according to the information on the track, and reproduction is performed.

The inductive / MR composite magnetic head 10 shown in FIG.
Will be described with reference to FIGS. (1) substrate (AlTiC _{(Al 2} O 3 -TiC)
The lower shield 1 is formed on a protective film (alumina (Al ₂ O ₃ ) or the like) 17 formed on a ceramic material 16 or the like.
8 is formed. The lower shield 18 is made of permalloy (NiF
e), a soft magnetic film such as sendust is deposited on the substrate 16 by sputtering, vapor deposition or plating.
A lower gap 20 is formed on the lower shield 18 with a nonmagnetic material such as alumina.

(2) Next, the MR film 46 (NiFe or the like) and the spacer 4
8 (Ti etc.), SAL bias film 50 (CoZrM (M
, Nb, Mo, etc.) are stacked to form the magnetic sensor film 28. (3) The magnetic sensor film 28 is cut into a rectangle. In addition,
The MR film 46 has an easy axis of magnetization in its longitudinal direction (a direction parallel to the surface of the recording medium and perpendicular to the track). Then, a track width determining insulating film 29 for determining the width (reproducing track width Tw) of the active portion (sensitive portion) of the MR film 46 is formed on the magnetic sensor film 28 using alumina or the like.

(4) High conductive film leads 30 and 31 (W, Ta, etc.) for extracting electrodes are formed on both ends of the magnetic sensor film 28. The leads 30 and 31 are separated from each other on the track width determining insulating film 29. (5) An upper gap 32 (alumina or the like) film is formed on the entire surface of the magnetic sensor film 28 and the leads 30 and 31. (6) The upper shield 34 is formed. Upper shield 34
Also serves as the lower core of the write head.

(7) A write gap 36 (alumina or the like) for writing is formed on the upper shield / lower core 34. (8) The coil 37 and the insulating layer 38 are formed. (9) The upper core 40 is formed so as to straddle the coil 37 and the insulating layer 38, and the write head (inductive magnetic head)
And Finally, a protective film 42 (FIG. 2A) is formed to complete the process.

In an inductive / MR composite magnetic head, the MR
When the off-track characteristic (reproduction output level change characteristic when the pole moves in the track width direction) when reproducing with the magnetic head is measured, it becomes asymmetric with respect to the track center as shown by the solid line in FIG. Small bumps called lobes form. This is because when a track shift occurs, the MR film 4 affected by the magnetic field from the track
This is because the magnetization of the non-active portion 6 (the portion outside the active portion (that is, the portion outside the track width Tw)) acts to rotate the magnetization of the active portion. The side lobe increases as the width of the active portion (track width Tw) decreases. In addition, this relationship is reversed when the direction of the current is reversed, and a side lobe is generated on the left side. The occurrence of such side lobes causes a serious obstacle to the tracking servo and makes it impossible to perform servo control on a narrow track, which has been an obstacle in realizing high-density recording.

As a method of reducing side lobes, MR
Magnetization of the uniaxial anisotropic bias magnet film (not shown) disposed on the left and right non-sensitive portions (the portion where the leads 30 and 31 are joined) of the film 46 (the anisotropic magnetic field of the MR film 46) The same direction as above) can be considered. However, in this case, in order to maintain the magnetization direction of the MR film 46 at 45 °, S
The bias magnetic field by the AL bias film 50 must be increased, and the change in the direction of magnetization of the MR film 46 with respect to the magnetic field from the recording medium (that is, the change in resistance of the MR film 46) is reduced, and the reproduction sensitivity is reduced. This is particularly noticeable for narrow tracks.

Therefore, the present invention relates to an inductive / MR type magnetic head in which the off-track characteristic of the MR reproducing head in the conventional inductive / MR type composite magnetic head is improved to enable high-density recording / reproducing with a narrow track. There are inventions invented by the present inventors and described in the specification and drawings of a patent application (Japanese Patent Application No. 6-340503 ) filed by the present applicant on the same date as the present application. The MR film has a linear portion formed substantially linearly when viewed from the side facing the recording medium, and inclined portions formed on both sides of the linear film so as to be inclined with respect to the linear portion. It is. FIG. 7 shows a specific example described in the specification and the drawings. In FIG. 7, (a) is a perspective view seen from the recording medium facing surface side, (b)
Is a front view thereof. Induction type / MR type composite magnetic head 4
Reference numeral 1 denotes an induction type magnetic head 1 on an MR type magnetic head 12.
4 are laminated. Both heads 12 and 14 are made using a thin film forming technique.

The MR type magnetic head 12 is provided on the slider substrate 1.
The lower shield 18 is formed in two layers (18-1 and 18-2) on the rear end face 6 via a protective film 17. The lower shield 18-2 is dug into a trapezoidal shape (an inverted trapezoidal shape). On the lower shield 18, a lower gap 20 constituting an insulating layer is laminated along this trapezoidal shape. Lower gap 2
A magnetic sensor film 28 in which an MR film 46, a spacer 48, and a SAL bias film 50 are stacked is formed on the zero.
As a result, the MR film 46 has a substantially straight linear portion 46-1 disposed substantially parallel to the magnetization reversal boundary line of the recording signal of the track at the time of reproduction, and the linear portions 4 on both sides thereof.
Inclined portions 46-2, 46-3 formed to be inclined at an angle θ with respect to 6-1 (therefore, with respect to the magnetization reversal boundary line of the recording signal of the track), and the top surface of the lower shield 18 outside thereof. The outer edge portion 46-4 formed on the top,
46-5 is constituted.

Between lower shields 18-1 and 18-2,
On both sides of the linear portion 46-1 of the MR film 46 and on substantially the same plane as the linear portion 46-1, a permanent magnet 54 for a fixed bias (longitudinal bias) for forming a single magnetic domain (uniaxial anisotropic bias) (Magnet film) is disposed in a state sandwiched by the magnetic spacers 56 and 58. The permanent magnet 54 for forming a single magnetic domain includes a linear portion 46-1 and an inclined portion 46-of the MR film 56.
The function of improving (enhancing) the uniaxial anisotropy of the MR film 46 by reducing the shape anisotropic effect generated by the step between the second and the second films 46-3. The single magnetic domain forming permanent bias magnet 54 is
(In the direction of the easy axis of the MR film 46). The inclined portion 46-2 of the MR film 46,
Reference numeral 46-3 extends in the track width direction so as to straddle the fixed bias magnet 54.

On the magnetic sensor film 28, the leads 30,
31 are inclined portions 46-2 and 46-3 from near both ends of the linear portion 46-1 just before the inclined portions 46-2 and 46-3 start.
And the outer edges 46-4 and 46-5. As a result, the MR film 46 has an active portion (sensitive portion) 46c in which the linear portion 46-1 (more precisely, the section between the leads 30 and 31 in the linear portion 46-1) participates in signal reproduction. , The inclined portion 46 in which the leads 30 and 31 are formed.
2, 46-3 and outer edges 46-4, 46-5 are the leads 46 a, 46 into which current from the leads 30, 31 flows.
b (non-responsive part). An upper gap 32 constituting an insulating layer is formed on the magnetic sensor film 28 and the leads 30 and 31, and an upper shield 34 is formed thereon.

The induction type magnetic head 14 also uses the upper shield 34 of the MR type magnetic head 12 as a lower core, on which a write gap 36, a coil 37 and an insulating layer 3 are formed.
8, an upper core 40, and a protective film 42 are sequentially laminated.

The inductive / MR composite magnetic head 41 shown in FIG.
During recording, a recording magnetic field is generated in the gap 36 between the upper and lower cores 40 and 34 by passing a recording signal through the coil 37 of the induction type magnetic head 14, and recording on the recording medium is performed with this magnetic field. At the time of reproduction, a current is supplied to the SAL bias film 50 through the leads 30 and 31 of the MR type magnetic head 12 to apply a bias magnetic field to the MR film 46, and a sense current is supplied to the MR film 46 through the leads 30 and 31. By tracing the track on the recording medium, the voltage across the MR film 46 is modulated according to the information on the track, and reproduction is performed. The write track width Tw of the inductive magnetic head 14 is defined by the pole width of the upper core 40, and the width of the active portion 46c of the MR film 46 (the distance between the leads 30 and 31) is set substantially equal to the track width Tw. .

According to the above structure, at the time of reproduction, as shown in FIG.
(At azimuth angle 0 °) in parallel with the magnetization reversal boundary line 60 of the recording signal (at the time of on-track). On the other hand, the inclined portions 46- constituting the lead portions 46a and 46b
Nos. 2 and 46-3 trace the azimuth angle θ (θ is, for example, about 40 °) with respect to the magnetization reversal boundary line 60 of the recording signal (at the time of off-track). Therefore, the active section 46c can obtain a high sensitivity to the track recording signal as before, and the lead sections 46a and 46b can greatly reduce the amount of signals picked up. Therefore, track 5
Even if 2 is shifted to the left or right from the active portion 46c, the influence of signals from portions other than the active portion 46c is reduced, and the off-track characteristic is such that the center shift and the occurrence of side lobes are suppressed as shown in FIG. . As a result, tracking servo becomes possible even in a narrow track, and high-density recording / reproduction becomes possible. Also, crosstalk from adjacent tracks is reduced. In addition, the outer edge portion 46 outside the lead portions 46a and 46b
Although -4 and 46-5 are parallel to the magnetization reversal boundary line 60 of the recording signal, they are far from the active portion 46c and do not affect the reproduction output.

[0020]

The inductive type M shown in FIG.
According to the R-type composite magnetic head 41, it is necessary to cut the positions of the inner ends of the leads 30, 31 with high precision so that the active portion 46c is formed at a desired position. In addition, the manufacturing process is complicated because it is necessary to form the lower shield 18 in two layers (18-1 and 18-2).

The present invention has been made in view of the above points, and in a magnetoresistive thin film magnetic head of a type in which an MR film has a parallel portion and inclined portions on both sides thereof, the position of an active portion is defined with high precision. And a novel structure of a magnetoresistive thin-film magnetic head that can simplify the manufacturing process.
It is intended to provide a method for manufacturing a semiconductor device.

[0022]

According to the method of manufacturing a magnetoresistive thin-film magnetic head of the present invention, a lower gap constituting an insulating film is formed on a lower shield, and a lead film is formed on the lower gap. And forming a substantially inverted trapezoidal groove to reach the lower gap by cutting the lead film to form a divided right and left lead, and electrically connecting the divided right and left leads. A magnetic sensor film having an MR film is formed along the groove, an upper gap forming an insulating film is formed on the magnetic sensor film, and an upper shield is formed on the upper gap. , after the step of forming a groove of substantially inverted trapezoidal shape by cutting the lead layer it reaches the lower gap has a recess the lead film was cut vertically, ion
This is performed by vertically irradiating a beam and ion-milling the entire surface.

[0023]

According to the magnetoresistive thin-film magnetic head manufactured by the manufacturing method of the present invention , a lead is formed on the upper gap, and a substantially trapezoidal groove reaching the lower gap is formed in the lead. Is divided into right and left, and M
Since the magnetic sensor film having the R film is formed, the positional relationship between the lead and the magnetic sensor film can be uniquely determined, and the position of the active portion can be defined with high accuracy. Further, since the leads are arranged under the magnetic sensor film in place of the lower shield 18-2 in FIG. 7, the lower shield does not need to be formed in two layers, the configuration is simplified, and the manufacturing process is simplified. Can be In the conventional structure shown in FIG. 2, since the track width is determined by laminating the track width determining insulating materials 29, the effective gap g (the distance between the upper and lower shields; see FIG. 2A) is increased. Although the reproducing resolution was reduced, the magnetoresistance produced by the production method of the present invention was used.
According to the thin-film magnetic head , since the track width can be defined by the width of the bottom surface of the groove, an insulating material for determining the track width can be eliminated, and the effective gap can be narrowed to improve the reproducing resolution.

Further , this magnetoresistive thin film magnetic head has:
The lead is formed of a stack of electrically conductive film and the magnet film, that the magnet film constitutes a permanent bias magnet films for single domain formed for the MR film located at the bottom of the groove
Wear.

According to this magnetoresistive thin film magnetic head,
Since the magnet film constitutes the permanent bias magnet film for forming a single magnetic domain with respect to the MR film, the shape anisotropic effect due to the step at the boundary between the trapezoidal bottom surface portion and the inclined surface portion of the MR film is reduced.
The uniaxial anisotropy of the film is improved. According to the conventional structure of FIG. 2, when the permanent bias magnet film for forming a single magnetic domain with respect to the MR film 46 is disposed on both sides of the active portion of the MR film 46, the track width determining insulating material 29 is formed. After performing the track width determining cut (FIG. 3 (3)), the permanent bias magnet film for forming a single magnetic domain is formed and cut, and the leads 30 and 31 are formed and cut. Matching is required. The slight displacement at this time causes a change in the right and left characteristics of the head active portion. In particular, the smaller the width of the head active portion, the greater this effect. On the other hand, according to this magnetic head,
Since the lead is formed by laminating an electric conductive film and a magnet film, and a groove is formed in the laminate, the relative position between the head active portion and the magnet material on both sides thereof is determined with high accuracy, and the left and right sides of the head active portion are determined. Imbalance can be avoided.

[0026] and, according to the manufacturing method of the present invention, above
The magnetoresistive thin-film magnetic head can be easily manufactured.

[0027]

An embodiment of the present invention will be described below. Embodiment 1 FIG. 1 shows an embodiment in which a lead has a laminated structure of an electric conductive film and a magnet film, a magnet film is arranged below, and an electric conductive film is arranged above. In FIG. 1, (a) is a perspective view as viewed from the recording medium facing surface side, and (b) is a front view thereof. Inductive type
The MR-type composite magnetic head 60 is configured by laminating the induction-type magnetic head 14 on the MR-type magnetic head 12.
Both heads 12 and 14 are made using a thin film forming technique.

The MR type magnetic head 12 is provided on the slider substrate 1.
A lower shield 18 is formed on the rear end face 6 via a protective film 17. The lower shield 18 is dug into a trapezoidal shape (an inverted trapezoidal shape). On the lower shield 18, a lower gap 20 constituting an insulating layer is laminated along the inverted trapezoidal shape. Leads 30 and 31 are formed on the lower gap 20. The leads 30 and 31 are made of a magnet film (CoCr).
Hard magnetic film such as Ta) 62 and electric conductive film (W, Ta, Nb)
, Etc.). These laminates have trapezoidal grooves 6 reaching the lower gap 20.
6 to form leads 30 and 31.

On the leads 30 and 31, a magnetic sensor film 28 having an MR film 46, a spacer 48, and a SAL bias film 50 laminated along the groove 66 is formed. As a result, the linear portion 46-arranged in the MR film 46 substantially in parallel with the magnetization reversal boundary line of the recording signal of the track during reproduction (in other words, arranged substantially in parallel with the write gap 38). 1 (the trapezoidal bottom portion) and the inclined portions 46-2, 46 formed on both sides thereof at an angle θ with respect to the linear portion 46-1 (therefore, with respect to the magnetization reversal boundary line of the recording signal of the track). -3, and outer edges 46-4, 46-5 formed on the top surfaces of the leads 31, 30 on the outside thereof. Straight section 46
-1 is in contact with the lower gap 20. Inclined portion 46-2,
46-3 and the outer edges 46-4 and 46-5 are the leads 3
0 and 31 are electrically connected. Thereby, MR
In the film 46, a linear portion 46-1, which is sharply distinguished at the inner lower end portion of each of the leads 30 and 31, forms an active portion 46 c to define a track width Tw, and an inclined portion connected to the leads 30 and 31. 46-2, 46-3 and outer edges 46-4, 4
6-5 constitute the lead portions 46a and 46b and
Supply current to -1.

The angle θ between the inclined portions 46-2 and 46-3
Is preferably about 20 ° <θ <75 °. That is, the larger the angle θ, the greater the azimuth effect is obtained. However, if the angle θ is too large, the deposited film (by sputtering or the like) of the magnetic sensor film 28 at the inclined portions 46-2, 46-3 becomes thin. Also, the inclined portions 46-2,
A lamination failure (crevasse) occurs in the magnetic sensor film 28 at the boundary portion (step portion) between the line 46-3 and the linear portion 46-1. Therefore, the magnetic sensor film 28
In order to stack the layers uniformly and eliminate the stacking fault, the upper limit of the angle θ is desirably about 75 °.

On the other hand, if the angle θ is too small,
The boundary between 6-2 and 46-3 and the straight line portion 46-1 is not clear. Also, the azimuth effect decreases. Therefore, the lower limit of the angle θ is desirably about 20 °.

The magnet films 62 of the leads 30 and 31 serve as a permanent magnet for forming a single magnetization (uniaxially anisotropic bias magnet film).
−2, 46-3 to reduce the anisotropic shape effect caused by the step between the layers and to improve the uniaxial anisotropy. The magnet film 62
It is magnetized in a direction parallel to the track width of the MR film 46 (the easy axis direction of the MR film 46). An upper gap 32 constituting an insulating layer is formed on the magnetic sensor film 28 and the leads 30 and 31, and an upper shield 34 is further formed thereon.
Is configured.

In the structure shown in FIG. 7, the permanent magnet film 54 for forming a single magnetic domain is sandwiched between the lower shields 18-1 and 18-2 made of permalloy or the like. And the lower shields 18-1 and 18-2 are directly joined, the magnet film 54 and the lower shields 18-1 and 18-1
18-2 are magnetically coupled, and the generation of a magnetic field to the outside is almost eliminated. In order to prevent this, nonmagnetic magnetic spacers 56 and 58 need to be interposed between the magnet film 54 and the lower shields 18-1 and 18-2. On the other hand, according to the structure of FIG. 1, the single magnetic domain forming permanent bias magnet film 62 is interposed between the lower non-magnetic gap 20 and the non-magnetic electric conductive film 64. There is no need to intervene, and the configuration and process are simple.

The inductive magnetic head 14 also uses the upper shield 34 of the MR magnetic head 12 as a lower core, on which a write gap 36, a coil and an insulating layer 38, an upper core 40, and a protective film 42 are sequentially laminated. It is configured.

The inductive / MR composite magnetic head 60 shown in FIG.
During recording, a recording magnetic field is generated in the gap 36 between the upper and lower cores 40 and 34 by passing a recording signal through the coil 37 of the induction type magnetic head 14, and recording on the recording medium is performed with this magnetic field. At the time of reproduction, a current is supplied to the SAL bias film 50 through the leads 30 and 31 of the MR type magnetic head 12 to apply a bias magnetic field to the MR film 46, and a sense current is supplied to the MR film 46 through the leads 30 and 31. By tracing the track on the recording medium, the voltage across the MR film 46 is modulated according to the information on the track, and reproduction is performed. The write track width Tw of the inductive magnetic head 14 is defined by the pole width of the upper core 40, and the width of the sensitive portion 46c of the MR element 46 (the distance between the tips of the leads 30, 31) is the track width Tw.
Is set approximately equal to

The inductive / MR composite magnetic head 60 shown in FIG.
Will be described with reference to FIGS. (1) substrate (AlTiC _{(Al 2} O 3 -TiC)
The lower shield 18 and the lower gap 20 are formed on a protective film (alumina (Al ₂ O ₃ ) or the like) formed on the ceramic material 16 or the like. The lower shield 18 is formed by depositing a soft magnetic film such as permalloy (NiFe) or sendust on the substrate 16 by sputtering, vapor deposition, plating or the like. The lower gap 20 is formed by depositing an insulating material such as alumina.

(2) A hard magnetic film 62 and an electric conductive film 64 are stacked on the lower gap 20 by sputtering, vapor deposition, plating, or the like. At this time, the upper conductive film 64 is formed to be thicker in anticipation of the amount to be cut by the entire surface milling (4) described later. As an example, 100 to 1000 angstroms of CoCrTa is formed as the hard magnetic film 62, and 1500 to 4500 angstroms of W or Ta is formed as the electric conductive film 64.

(3) In order to determine the width of the active portion 46 c of the magnetic sensor film 28, the electric conductive film 64 and the magnet film 62 are cut vertically to form a concave portion 66. The width of the concave portion 66 to be cut is slightly smaller than the width of the active portion 46c to be formed. In order to form the concave portion 66, for example, a resist is applied on the electric conductive film 64 to a thickness of three times or more the thickness of the laminated films 62 and 64, and the resist is cut vertically to a desired width of the active portion 46c. This is realized by exposing the surface of the electric conductive film 64 and performing anisotropic etching such as milling on the surface, thereby vertically digging the electric conductive film 64 and the magnet film 62 with the exposed width. At this time, digging is stopped while leaving the magnet film 62 for the amount to be cut by the entire surface milling (4) described later. When the digging is completed, the resist is removed.

(4) The entire surface is milled by vertically irradiating an ion beam from above the electric conductive film 64. The entire milling process will be described with reference to FIG. i) Pre-vertical cut pattern ii) Milling particles are applied vertically from the top. At this time, since the edge of the upper opening of the concave portion 67 is inclined with respect to the milling particles, the edge is cut at the fastest angle (about three times as fast as when cutting a plane). ), Resulting in an inclined surface 68.

Iii) Milling proceeds, and the lower gap 20 is exposed. At this time, a step d is slightly left on the inclined surface 68, and milling is continued (additional milling) to eliminate the step d. Lower gap 20 (alumina)
The milling speed of the electric conductive film 64 (W, Ta, Nb)
Etc.) and the milling speed of the magnet film 62 (CoCrTa) is lower (about １ ／), so that even if additional milling is performed, the lower gap 20 will not be cut much.

Iv) When the additional milling is performed for a predetermined time, the step d is eliminated, and the inclined surface 68 is formed on the entire inner wall surface of the concave portion 67. Once the inclined surface 68 is completed, the width of the bottom surface 70 gradually increases while maintaining the same inclined surface shape. Then, when the width of the bottom surface 70 reaches a desired width of the active portion (that is, the track width Tw), the entire surface milling is stopped.
The trapezoidal groove 66 is completed.

In the experiment, in the step (3), the magnet film 62
The concave portion 67 is dug vertically until the surface of the conductive film 64 is exposed. Then, in the step (4), the whole surface milling is performed to reduce the time required for removing the entire electric conductive film 64 and the magnet film 62 to 1/3 to 1/5. When the operation was performed for a long time, a complete inclined surface without a step was formed in the whole wafer (many heads were formed on one wafer at a time). At this time, the lower gap 20 was exposed without being cut much.
Further, the width of the bottom 70 was accurately formed to a desired width of the active portion (that is, the track width Tw).

(5) After the trapezoidal groove 66 is formed, the MR film 46 (NiFe) is formed on the entire surface of the wafer as the magnetic sensor film 28.
Etc.), spacer 48 (Ti etc.), SAL bias film 50
(A soft magnetic film such as CoZrM (Nb, Mo, etc.)). (6) The magnetic sensor film 28 is cut into a rectangle.

(7) An inorganic insulating film of alumina is formed on the entire surface for insulation between the upper shield 34 and the magnetic sensor film 28 and a shield gap between the upper shield 34 and the leads 30 and 31. To form At this time, there is no equivalent to the track width determining insulating material 29 in FIG. 2 and there is no step at the inner ends of the leads 30 and 31 as shown in FIG. 2 and FIG. It is possible to minimize the thickness.

(8) The upper shield 34 is formed by depositing a soft magnetic film (NiFe, sendust, etc.) by plating, vapor deposition, sputtering or the like. The upper shield 34 also serves as a lower core of the write head. (9) In order to eliminate unevenness on the surface of the upper shield / lower core 34, the upper shield / lower core 34 is mechanically polished with a lap or the like.
Flatten the surface.

(10) A write gap 36 (alumina or the like) for writing is formed on the upper shield / lower core 34. (11) The coil 37 and the insulating layer 38 are formed. (12) The upper core 40 is formed so as to straddle the coil 37 and the insulating layer 38, and the write head (inductive magnetic head)
14 is formed. And finally, it is completed by covering with a protective film.

The inductive type M shown in FIG.
According to the R-type thin film magnetic head 60, the following effects can be obtained. (A) A part of the leads 30 and 31 formed of a laminate of the electric conductive film 64 and the magnet film 62 is collectively processed into a groove having an inclined surface 68, and the leads 30 and 31 cut into the groove are formed.
Since the track width Tw is determined by the distance between the pointed portions of the inner lower end portions, there is no need to stack a track width determining insulating material (FIG. 2B), and the process is simplified. In addition, since an insulating material for determining the track width is not required, the steps of the respective portions when the leads 30 and 31 are stacked are different from the steps due to the inclined surface 68 and the steps between the outer ends of the magnetic sensor films 28 on the upper surfaces of the leads 30 and 31. However, the thickness of the upper gap 32 can be reduced without impairing the coverage (coverability) of these steps (the thinner the gap films 20 and 32, the smaller the effective gap g, and the higher the reproduction resolution). To increase the density.

(B) Since the leads 30 and 31 are formed instead of the lower shield second layer 18-2 of the structure of FIG. 7, the lower shield second layer 18-2 becomes unnecessary, and the process is simplified. You.

(C) When forming the leads 30 and 31 by forming the trapezoidal grooves 66, the track width Tw and the disposition position of the magnet film 62 are determined at the same time, so that the leads 30 and 31 and the magnet film 62 (single magnetic domain) are formed. The relative positional relationship of the forming permanent bias magnets can be aligned with high accuracy at both ends of the magnetically responsive portion (active portion) 46c. As a result, a track profile of the MR magnetic head 12 having good symmetry at all positions in the wafer can be obtained, and a narrow track MR head for high recording density can be realized with a high yield.

(D) In the whole surface milling (details are shown in FIG. 14) in the step (4) in FIG. 10, the time until the inclined surface 68 is completed is short (about three times as fast as when a flat surface is cut). Progress). However, once the inclined surface 68 is completed, the width of the bottom surface 70 gradually increases while maintaining the same inclined surface shape. Therefore, fine adjustment of the width of the trapezoidal groove 70 can be easily performed by additional excessive milling during the entire surface milling.

(Embodiment 2) FIG. 15 shows another embodiment of the present invention. This has a two-layer structure in which the leads 30 and 31 have an electric conductive film 64 disposed below and a magnet film 62 disposed thereon. FIG.
FIGS. 16 to 19 show the steps of manufacturing the inductive / MR type composite magnetic head 72 of FIG. In the step of forming the lead film shown in FIG. 16B, first, W or Ta is used as the electric conductive film 64.
Is formed into a film having a thickness of 1500 to 4500 angstroms, and a CoCrTa film is formed thereon as a magnet film 62 in a thickness of 100 to 1000 angstroms. In the vertical milling of (3), the electric conductive film 64 is dug to such an extent that the electric conductive film 64 slightly remains, and in the entire milling of (4), the time required to cut all the magnet film 62 and the electric conductive film 64 is reduced. 3 to 1/5
When the time of is executed, a complete inclined surface 68 is obtained,
The lower gap 20 was exposed at the bottom surface 70 of the groove 66. Other steps are the same as in the first embodiment. According to the second embodiment, the effects (a) to (d) described in the first embodiment can be similarly obtained.

(Embodiment 3) FIG. 20 shows still another embodiment of the present invention. this is,
A three-layer laminated structure in which the first magnet film 62-1 is disposed below the leads 30 and 31, the electric conductive film 64 is disposed thereon, and the second magnet film 62-2 is further disposed thereon. It is what it was. The inductive / MR composite magnetic head 74 of FIG.
21 to 24 are shown in FIGS. In the lead film forming process shown in FIG. 21B, first, the first magnet film 62-1 is formed.
100 to 1000 Å of CoCrTa is formed thereon, and W or T is formed thereon as an electric conductive film 64.
a is deposited to a thickness of 2000 to 4000 angstroms, and 100 Cr of CoCrTa is formed thereon as a second magnet film 62-2.
１０００1000 angstrom film is formed. In addition, (3)
In the vertical milling of (4), the surface is dug to the extent that the surface of the first magnet film 62-1 comes out.
1/3 to 1/5 of the time required to remove all of the magnet film 62-2 and the electric conductive film 64,
A complete inclined surface 68 was obtained, and the lower gap 20 was exposed on the bottom surface 70 of the groove 66. Other steps are the same as in the first embodiment. According to the third embodiment, the effects (a) to (d) described in the first embodiment can be obtained similarly.

The lead may have a three-layer structure of an electric conductive film, a magnet film, and an electric conductive film, or may have another laminated structure. Further, the configuration of the magnetic sensor film is not limited to the configuration described in the above embodiment. Further, in each of the above embodiments, the lead has a laminated structure of the magnet film and the electric conductive film. However, according to the first and third aspects of the present invention, the lead can be constituted only by the magnet film. Further, the present invention can be applied to MR heads other than the SAL bias type. The present invention can also be applied to MR heads other than those for hard disks.

[0053]

【The invention's effect】

As described above, according to the manufacturing method of the present invention,
According to the magnetoresistive thin-film magnetic head manufactured according to the present invention, a lead is formed on the upper gap, a substantially trapezoidal groove is formed in the lead to reach the lower gap, and the lead is divided into right and left. Since the magnetic sensor film having the MR film is formed along the line, the positional relationship between the lead and the magnetic sensor film can be uniquely determined, and the position of the active portion can be defined with high accuracy. Further, since the leads are arranged under the magnetic sensor film in place of the lower shield 18-2 in FIG. 7, the lower shield does not need to be formed in two layers, the configuration is simplified, and the manufacturing process is simplified. Can be In the conventional structure shown in FIG. 2, since the track width is determined by laminating the track width determining insulating materials 29, the effective gap g (the distance between the upper and lower shields; see FIG. 2A) is increased. Although the resolving power was reduced, the production method of the present invention
According to the manufactured magnetoresistive thin-film magnetic head , the track width can be defined by the width of the bottom of the groove, so that the insulating material for determining the track width can be eliminated, the effective gap is reduced, and the reproducing resolution is reduced. Can be improved.

[0053] Then, according to the manufacturing method of the present invention, the upper
The magnetoresistive thin-film magnetic head can be easily manufactured.

[Brief description of the drawings]

FIG. 1 is a diagram showing an example of the structure of an induction type / MR type composite magnetic head for a hard disk manufactured by a manufacturing method of the present invention, wherein (a) is a perspective view seen from a recording medium facing surface side. ,
(B) is a front view thereof.

FIG. 2 is a cross-sectional side view showing a conventional inductive / MR type composite magnetic head for a hard disk and a perspective view seen from a recording medium facing surface side.

FIG. 3 is a process diagram showing a manufacturing process of the inductive / MR composite magnetic head of FIG. 2;

FIG. 4 is a process drawing showing a continuation of FIG. 3;

FIG. 5 is a process drawing showing a continuation of FIG. 4;

FIG. 6 is a diagram showing off-track characteristics of a conventional MR magnetic head.

FIGS. 7A and 7B are views showing an induction type / MR type composite magnetic head in which a magnetic sensor film of an MR head is formed in a trapezoidal shape, wherein FIG. 7A is a perspective view seen from a recording medium facing surface side, and FIG. It is a front view.

8 is a plan view illustrating an operation at the time of reproduction by the MR element 46 of FIG. 7;

FIG. 9 is a view showing off-track characteristics of the MR element shown in FIG. 1;

FIG. 10 is a process chart showing one embodiment of a manufacturing process of the inductive / MR composite magnetic head of FIG. 1;

FIG. 11 is a process drawing showing a continuation of FIG. 10;

FIG. 12 is a process drawing showing a continuation of FIG. 11;

FIG. 13 is a process drawing showing a continuation of FIG. 12;

FIG. 14 is a process diagram showing a specific example of the digging process of FIG. 10 (4).

FIG. 15 is a perspective view showing a main part of another structure example of the induction type / MR type composite magnetic head for a hard disk manufactured by the manufacturing method of the present invention.

16 is a process chart showing one embodiment of a process of manufacturing the magnetic head of FIG.

FIG. 17 is a process drawing showing a continuation of FIG. 16;

FIG. 18 is a process drawing showing a sequel to FIG. 17;

FIG. 19 is a process drawing illustrating a sequel to FIG. 18;

FIG. 20 shows still another induction type / MR type composite magnetic head for a hard disk manufactured by the manufacturing method of the present invention.
It is a perspective view which shows the principal part of the structural example of FIG.

FIG. 21 is a process chart showing one embodiment of a process of manufacturing the magnetic head of FIG. 20;

FIG. 22 is a process drawing illustrating a sequel to FIG. 21;

FIG. 23 is a process drawing showing a sequel to FIG. 22;

FIG. 24 is a process drawing showing a sequel to FIG. 23;

[Explanation of symbols]

 12 MR type magnetic head (magnetoresistive thin film magnetic head) 18 Lower shield 20 Lower gap 28 Magnetic sensor film 30, 31 Lead 46 MR film 46-4, 46-5 Outer edge of MR film 62 Magnet film 64 Electric conductive film 66 Inverted trapezoidal groove

Claims (2)

(57) [Claims] 1. A lower gap constituting an insulating film is formed on a lower shield, a lead film is formed on the lower gap, and the lead film is scraped to substantially reverse the base to reach the lower gap. A groove having a shape is formed to form left and right divided leads, and a magnetic sensor film having an MR film is formed along the groove so as to electrically connect the left and right divided leads. An upper gap that forms an insulating film is formed on the magnetic sensor film, and an upper shield is formed on the upper gap. A substantially inverted trapezoidal shape that cuts the lead film and reaches the lower gap is formed. The step of forming a groove is performed by vertically cutting the lead film to form a concave portion, and then irradiating an ion beam vertically.
A method of manufacturing a magnetoresistive thin film magnetic head by ion milling the entire surface. 2. The method according to claim 2, wherein the lead film is formed of an electric conductive film and the MR film.
A magnet film constituting the permanent bias magnet films for single domain formed to membranes formed by laminating, production of magnetoresistive thin-film ceramic heads collectively patterned by comprising claim 1 wherein said groove relative to the stack Method.