JP2961392B2 - Method for manufacturing diaphragm unit in microphone or the like - Google Patents

Method for manufacturing diaphragm unit in microphone or the like

Info

Publication number
JP2961392B2
JP2961392B2 JP21574392A JP21574392A JP2961392B2 JP 2961392 B2 JP2961392 B2 JP 2961392B2 JP 21574392 A JP21574392 A JP 21574392A JP 21574392 A JP21574392 A JP 21574392A JP 2961392 B2 JP2961392 B2 JP 2961392B2
Authority
JP
Japan
Prior art keywords
substrate
film material
spacer
area
small holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP21574392A
Other languages
Japanese (ja)
Other versions
JPH0646498A (en
Inventor
正彦 酒井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ONO SOTSUKI KK
Original Assignee
ONO SOTSUKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ONO SOTSUKI KK filed Critical ONO SOTSUKI KK
Priority to JP21574392A priority Critical patent/JP2961392B2/en
Publication of JPH0646498A publication Critical patent/JPH0646498A/en
Application granted granted Critical
Publication of JP2961392B2 publication Critical patent/JP2961392B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は、コンデンサマイクロ
ホン、特にコンデンサマイクロホンにおける振動膜ユニ
ットの製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a condenser microphone, and more particularly to a method for manufacturing a diaphragm unit in a condenser microphone.

【0002】[0002]

【従来の技術】従来の技術におけるコンデンサマイクロ
ホンの製造方法は、図4に示すように、通常、プレス加
工で成形されたカップ状のケース21の開口側から順次、
ダイフラムのテンション保持リング22、ダイヤフラム2
3、ダイヤフラムと背極との間隙を確保するスペーサリ
ング24、背極25、背極を保持するホルダー26を層状に嵌
め込み、開口周縁部21aを内側にかしめて全部品を一体
化するのである。
2. Description of the Related Art As shown in FIG. 4, a method of manufacturing a condenser microphone according to the prior art is usually performed from the opening side of a cup-shaped case 21 usually formed by press working.
Diaphragm tension retaining ring 22, diaphragm 2
3. A spacer ring 24 for securing a gap between the diaphragm and the back electrode, a back electrode 25, and a holder 26 for holding the back electrode are fitted in layers, and the opening peripheral edge 21a is crimped inward to integrate all parts.

【0003】[0003]

【発明が解決しようとする課題】上記の従来の技術にお
けるコンデンサマイクロホンの製造方法は、ケース21、
テンション保持リング22、ダイヤフラム23、スペーサリ
ング24及び背極25は、プレス加工部品であり、ホルダー
26は、合成樹脂成形部品であるために、夫々の小型化に
は寸法限界があるので、それらの組立て製品であるコン
デンサマイクロホンの小型化が困難である。
The method of manufacturing a condenser microphone according to the prior art described above includes a case 21,
The tension retaining ring 22, the diaphragm 23, the spacer ring 24, and the back electrode 25 are stamped parts, and the holder
Since 26 is a synthetic resin molded part, each of them has a dimensional limit in miniaturization, so that it is difficult to miniaturize a condenser microphone as an assembled product of them.

【0004】又、上記の製造方法は、個々の部品を順次
組込んで組立てるため、量産性が悪い。その上、コンデ
ンサマイクロホンにおいては、音響特性上、ダイヤフラ
ムの面のフラッシュサーフェース化が要求される場合が
多い。しかし、上記の製造方法による製品のコンデンサ
マイクロホンにおいては、ケース21及びテンション保持
リング22によりダイヤフラム23の前面に空間が形成さ
れ、その空間が共鳴管となってしまう。
[0004] In addition, the above-mentioned manufacturing method is inferior in mass productivity because individual parts are sequentially assembled and assembled. In addition, the condenser microphone is often required to have a flash surface on the surface of the diaphragm due to its acoustic characteristics. However, in the condenser microphone manufactured by the above-described manufacturing method, a space is formed on the front surface of the diaphragm 23 by the case 21 and the tension retaining ring 22, and the space becomes a resonance tube.

【0005】[0005]

【課題を解決するための手段】この発明のコンデンサマ
イクロホン、特にコンデンサマイクロホンにおける振動
膜ユニットの製造方法は、絶縁体又は絶縁体被覆の基板
に適宜数の小孔を穿設する工程、基板の小孔の穿設域を
囲繞する域及びその外側域に所定厚さのスペーサ部を形
成する工程、基板両面の小孔の穿設域及び小孔の内周面
に金属膜を被覆して電極・背極を形成する工程、内側の
スペーサ部の外側においての基板上に熱圧着材を載置
し、更に振動膜フイルム材を熱圧着材の上に載置する工
程、振動膜フイルム材の表面から熱プレスにより押圧し
て振動膜フイルム材を基板に圧着し、振動膜フイルム材
をスペーサ部の厚みの接着剤層を介して基板の表面に平
行に固着する工程及び接着部位より外側域の余分な振動
膜フイルム材を切除し、電極に信号線を接続する工程か
ら構成されている。
SUMMARY OF THE INVENTION A method of manufacturing a condenser microphone of the present invention, particularly a vibrating membrane unit in a condenser microphone, comprises the steps of forming an appropriate number of small holes in an insulator or an insulator-coated substrate; Forming a spacer portion having a predetermined thickness in an area surrounding the hole drilling area and an outer area thereof; coating a metal film on the hole drilling area and the inner peripheral surface of the hole on both surfaces of the substrate to form electrodes and Forming the back electrode, placing the thermocompression bonding material on the substrate outside the inner spacer portion, and further mounting the diaphragm film material on the thermocompression bonding material, from the surface of the diaphragm film material A step of pressing the vibrating film material to the substrate by pressing with a hot press, and fixing the vibrating film material in parallel to the surface of the substrate through an adhesive layer having a thickness of the spacer portion, and an extra area outside the bonding site. Cutting off the diaphragm material , And a step of connecting the signal line to the electrode.

【0006】又、別に絶縁体又は絶縁体被覆の基板に適
宜数の小孔を穿設する工程、基板の小孔の穿設域を囲繞
する域及びその外側域に所定厚さのスペーサ部を形成す
る工程、基板両面の小孔の穿設域及び小孔の内周面に金
属膜を被覆して電極・背極を形成する工程、エッチング
が施され、基板の小孔の穿設域を囲繞するスペーサ片を
基板の表面に載置する工程、スペーサ片の上に熱圧着シ
ートを載置し、更に熱圧着シートの上に振動膜フイルム
材を載置する工程、振動膜フイルム材の表面から熱プレ
スにより押圧して振動膜フイルム材をスペーサ片共々基
板に圧着し、スペーサ片の厚みを介して基板の表面に平
行に固着するする工程及び接着部位より外側域の余分な
振動膜フイルム材を切除し、電極に信号線を接続する工
程から構成してもよい。
[0006] Also, a step of separately drilling an appropriate number of small holes in an insulator or an insulator-coated substrate, and a spacer portion having a predetermined thickness in an area surrounding the area where the holes are drilled in the substrate and an outer area thereof. The step of forming, the step of forming electrodes and back electrodes by coating a metal film on the inner peripheral surface of the small holes and the inner peripheral surface of the small holes on both surfaces of the substrate, Placing the surrounding spacer piece on the surface of the substrate, placing the thermocompression-bonded sheet on the spacer piece, and further placing the vibrating film material on the thermocompression sheet, the surface of the vibrating film material A process of pressing the vibrating film material together with the spacer pieces together with the substrate by pressing with a hot press from above, and fixing the vibrating film material in parallel to the surface of the substrate through the thickness of the spacer pieces, and an extra vibrating film material outside the bonding site And connecting the signal lines to the electrodes There.

【0007】更に、適宜寸法の方眼となった大形の基板
素材の各方眼に上記の各工程を同時に施した後、基板素
材を各方眼に分断して多数の振動膜ユニットを同時に製
造してもよい。その際、振動膜フイルム材及び熱圧着材
は、基板素材の全域に亘るように載置されるものであ
る。
Further, after the above-described steps are simultaneously performed on each grid of a large-sized substrate material having a grid of an appropriate size, the substrate material is divided into the respective grids to simultaneously manufacture a number of diaphragm units. May be. At that time, the vibrating film material and the thermocompression bonding material are placed so as to cover the whole area of the substrate material.

【0008】[0008]

【実施例】この発明の実施例におけるマイクロホン等の
振動膜ユニットMの製造方法を図面に従って説明する。
第1実施例における振動膜ユニットMの製造方法におい
て、第1工程は、適宜の絶縁体板、例えば、アルミナや
ガラスの基板1、又は金属板に絶縁体をコーティングし
た基板1の中央域にレーザ加工、又は超音波加工により
適宜数の小孔2,2・・・をあける。アルミナ基板の場
合には、小孔2は型で予め作り込むことも可能である。
小孔2の数は、マイクロホンの特性に応じて定まり、例
えば1個乃至3個である。(図1(a)) この小孔2は、ダンピング用と電極形成用とを兼ねたも
のである。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A method for manufacturing a diaphragm unit M such as a microphone according to an embodiment of the present invention will be described with reference to the drawings.
In the method of manufacturing the vibrating membrane unit M in the first embodiment, the first step is to place a laser on a central region of an appropriate insulator plate, for example, a substrate 1 of alumina or glass, or a substrate 1 in which a metal plate is coated with an insulator. An appropriate number of small holes 2, 2,... Are formed by processing or ultrasonic processing. In the case of an alumina substrate, the small holes 2 can be formed in advance with a mold.
The number of small holes 2 is determined according to the characteristics of the microphone, and is, for example, one to three. (FIG. 1A) The small holes 2 serve both for damping and for forming electrodes.

【0009】第2工程は、基板1の表面の中央域、即ち
小孔2,2・・・の穿設域を囲繞する域及びその外側域
に厚膜印刷技術により絶縁体、又は導電体のスペーサ
部、図示の例では円環状のスペーサ部3及び平行線状の
スペーサ部4,4を形成し、ラップ仕上げによりスペー
サ部3,4,4の表面を正確に平行にすると共にスペー
サ部3,4,4の厚を所定寸法、例えば25μmに仕上
げる。(図1(b))
In the second step, a thick film printing technique is used to form an insulator or a conductor on the central area of the surface of the substrate 1, that is, the area surrounding the perforated area of the small holes 2, 2,. A spacer portion, in the illustrated example, an annular spacer portion 3 and parallel linear spacer portions 4, 4 are formed, and the surfaces of the spacer portions 3, 4, 4 are accurately parallelized by lapping, and the spacer portions 3, 4 are formed. 4 and 4 are finished to predetermined dimensions, for example, 25 μm. (FIG. 1 (b))

【0010】第3工程は、基板両面の小孔2,2・・・
の穿設域を残してマスクを施し、真空蒸着を行う。それ
により基板両面の小孔2,2・・・の穿設域及び小孔
2,2・・・の内周面が金属被膜、例えば金被膜で被覆
され、基板の表面の背極5と背面の電極6とが一体とな
って形成され、ダンピング用の貫通孔10が残存する。
(図1(c))
In the third step, small holes 2, 2,...
A mask is applied while leaving a perforated area, and vacuum deposition is performed. .. And the inner peripheral surfaces of the small holes 2, 2,... Are coated with a metal coating, for example, a gold coating. And the electrode 6 are integrally formed, and the through hole 10 for damping remains.
(Fig. 1 (c))

【0011】第4工程は、外側のスペーサ部4,4の内
側面間の幅をもち、内側のスペーサ部3が嵌入する円孔
が打抜かれ、スペーサ部3,4より厚い熱圧着テープ7
を内側のスペーサ部3と外側のスペーサ部4,4との間
に位置するように基板1上に載置し(図1(d))、更
に樹脂フイルム、例えば厚さ2μmのPET(テレフタ
ル酸ポリエチレン)フイルムに金属、例えば金、又はニ
ッケルを400オングストロームの厚さにコーティング
した振動膜フイルム材8を熱圧着テープ7の上に載置す
る。(図1(e))
In a fourth step, a thermocompression tape 7 having a width between the inner side surfaces of the outer spacer portions 4 and 4 and punching a circular hole into which the inner spacer portion 3 is to be fitted is formed.
Is placed on the substrate 1 so as to be located between the inner spacer section 3 and the outer spacer sections 4 and 4 (FIG. 1 (d)). Further, a resin film, for example, PET (terephthalic acid) having a thickness of 2 μm A vibrating film material 8 obtained by coating a metal (eg, gold or nickel) to a thickness of 400 angstroms on a (polyethylene) film is placed on the thermocompression bonding tape 7. (Fig. 1 (e))

【0012】第5工程は、振動膜フイルム材8の表面か
ら熱プレスにより押圧して振動膜フイルム材8を基板1
に圧着する。その際、スペーサ部3,4,4は熱圧着テ
ープ7、即ち接着剤が溶融流出するのを抑止し、振動膜
フイルム材8は、スペーサ部3,4,4の厚みの接着剤
層を介して基板1の表面に平行に固着される。(図1
(f))
In a fifth step, the vibrating film material 8 is pressed from the surface of the vibrating film material 8 by a hot press so that the vibrating film material 8 is
Crimp to At this time, the spacer portions 3, 4, and 4 prevent the thermocompression bonding tape 7, that is, the adhesive from melting out, and the vibrating film material 8 is interposed through the adhesive layer having the thickness of the spacer portions 3, 4, and 4. And fixed parallel to the surface of the substrate 1. (Figure 1
(F))

【0013】第6工程は、外側のスペーサ部4,4より
外側域の余分な振動膜フイルム材8を切除し、電極6に
信号線9を接続する。(図1(f))
In a sixth step, an extra vibrating film material 8 outside the outer spacer portions 4 and 4 is cut off, and a signal line 9 is connected to the electrode 6. (FIG. 1 (f))

【0014】第2実施例における振動膜ユニットMの製
造方法において、第1工程は、適宜の絶縁体板、例え
ば、アルミナやガラスの基板1、又は金属板に絶縁体を
コーティングした基板1の中央域に第1実施例と同様に
適宜数の小孔2,2・・・あける。(図2(a))
In the method of manufacturing the vibrating membrane unit M according to the second embodiment, the first step is to set a suitable insulator plate, for example, a substrate 1 of alumina or glass, or a center of the substrate 1 in which a metal plate is coated with an insulator. An appropriate number of small holes 2, 2,... Are formed in the region as in the first embodiment. (FIG. 2 (a))

【0015】第2工程は、第1実施例の第3工程と同様
に、基板両面の小孔2,2・・・の穿設域を残してマス
クを施し、真空蒸着を行う。それにより基板両面の小孔
2,2・・・の穿設域及び小孔2,2・・・の内周面が
金属被膜、例えば金被膜で被覆され、基板の表面の背極
5と背面の電極6とが一体となって形成され、ダンピン
グ用の貫通孔10が残存する。(図2(b))
In the second step, as in the third step of the first embodiment, a mask is applied while leaving the small holes 2, 2,... .. And the inner peripheral surfaces of the small holes 2, 2,... Are coated with a metal coating, for example, a gold coating. And the electrode 6 are integrally formed, and the through hole 10 for damping remains. (FIG. 2 (b))

【0016】第3工程は、基板1の表面の中央域、即ち
小孔2,2・・・の穿設域を囲繞するエッチングを施し
た絶縁体、又は導電体のスペーサ片3Aを基板の表面に
載置する。(図2(c))
In the third step, a spacer piece 3A of an insulator or a conductor, which has been etched and surrounds the central area of the surface of the substrate 1, that is, the area where the small holes 2, 2,. Place on. (FIG. 2 (c))

【0017】第4工程は、スペーサ片3Aの上にスペー
サ片3Aと略同形の熱圧着テープ7を載置し、更に樹脂
フイルム、例えばPETフイルムに金属、例えば金をコ
ーティングした振動膜フイルム材8を熱圧着テープ7の
上に載置する。(図2(d))
In the fourth step, a thermocompression bonding tape 7 having substantially the same shape as the spacer piece 3A is placed on the spacer piece 3A, and a vibrating film material 8 obtained by coating a resin film, for example, a PET film with a metal, for example, gold, is used. Is placed on the thermocompression bonding tape 7. (Fig. 2 (d))

【0018】第5工程は、振動膜フイルム材8の表面か
ら熱プレスにより押圧して振動膜フイルム材8をスペー
サ片3A共々基板1に圧着する。その際、スペーサ片3
Aのエッチング部に熱圧着テープ7の接着剤が流出し
て、振動膜フイルム材8は、スペーサ片3Aを介して基
板1の表面に平行に固着される。(図2(d))
In the fifth step, the vibrating film 8 is pressed against the substrate 1 together with the spacer pieces 3A by pressing the surface of the vibrating film 8 with a hot press. At that time, the spacer piece 3
The adhesive of the thermocompression bonding tape 7 flows out to the etched portion A, and the diaphragm film material 8 is fixed in parallel to the surface of the substrate 1 via the spacer pieces 3A. (Fig. 2 (d))

【0019】第6工程は、外側のスペーサ部4,4より
外側域の余分な振動膜フイルム材8を切除し、電極6に
信号線9を接続する。(図2(e))
In the sixth step, an extra vibrating film material 8 outside the outer spacer portions 4 and 4 is cut off, and a signal line 9 is connected to the electrode 6. (FIG. 2 (e))

【0020】上記の実施例の製造方法における振動膜ユ
ニットMは、適宜寸法の方眼となった大形の基板素材の
一つの方眼について説明したものである。適宜寸法の方
眼となった大形の基板素材の各方眼に上記の各工程が同
時に施された後、基板素材が各方眼の多数の基板1に切
断されることにより、多数の振動膜ユニットMが製造さ
れる。その際、振動膜フイルム材8は、基板素材の全面
に対応したシートである。又、熱圧着テープ7は、振動
膜ユニットMに対応して穴あけ形成された連続テープ、
又は基板素材同様のシートである。
The vibrating membrane unit M in the manufacturing method of the above-described embodiment describes one grid of a large-sized substrate material which is a grid of appropriate dimensions. After the above-described steps are simultaneously performed on each square of a large-sized substrate material having a grid of appropriate dimensions, the substrate material is cut into a large number of substrates 1 of each square, so that a large number of vibrating membranes are formed. The unit M is manufactured. At this time, the vibrating film material 8 is a sheet corresponding to the entire surface of the substrate material. Further, the thermocompression bonding tape 7 is a continuous tape formed with a hole corresponding to the diaphragm unit M,
Or a sheet similar to the substrate material.

【0021】更に、基板素材の裏面の各方眼には、マイ
クロホン等の処理回路が予め設けられる公知の加工が施
されていると一層、便利である。上記の実施例の製造方
法は、一つの方眼が3mm乃至1mm位の大きさでも加工は
可能である。
Further, it is more convenient if each grid on the back surface of the substrate material is subjected to a known processing in which a processing circuit such as a microphone is provided in advance. In the manufacturing method of the above embodiment, processing can be performed even if one grid has a size of about 3 mm to 1 mm.

【0022】上記の実施例の製造方法により製造された
振動膜ユニットMは、図1(f)又は図2(e)に示す
ようにダンピング用の貫通孔10が形成された表面に背極
5を、裏面に電極6を夫々備えた基板1の表面にスペー
サ部3,4又はスペーサ片3Aの厚さの間隔をあけて振
動膜8が接着剤層を介して背極5に対向して固着されて
おり、背極5と一体の電極6には、信号線9が接続さ
れ、又必要に応じて基板1の裏面には、マイクロホン等
の処理回路がプリントされている。そして、そのような
振動膜ユニットMは、マイクロホンや差圧式圧力センサ
ーに用いられる。
As shown in FIG. 1F or FIG. 2E, the diaphragm unit M manufactured by the manufacturing method of the above embodiment has a back electrode 5 on the surface where the through hole 10 for damping is formed. The vibration film 8 is fixed on the front surface of the substrate 1 provided with the electrodes 6 on the back surface thereof at a distance of the thickness of the spacer portions 3 and 4 or the spacer piece 3A so as to face the back electrode 5 via an adhesive layer. A signal line 9 is connected to the electrode 6 integrated with the back electrode 5, and a processing circuit such as a microphone is printed on the back surface of the substrate 1 as necessary. And such a diaphragm unit M is used for a microphone or a differential pressure type pressure sensor.

【0023】マイクロホンおいては、図3(a)に示す
ようにケーシングAの内周面に基板1が嵌着され、基板
1の裏面側に背圧室Bが形成される。又、差圧式圧力セ
ンサーにおいては、図3(b)に示すようにケーシング
Aの内周面の中間部に基板1が嵌着され、ケーシングA
の中空部を振動膜ユニットMが二室C,Dに分断し、分
室Cには、圧力P1 の気体部に連通される導入口Eが、
分室Dには、圧力P2 の気体部に連通される導入口Fが
夫々開口している。
In the microphone, as shown in FIG. 3A, a substrate 1 is fitted on the inner peripheral surface of a casing A, and a back pressure chamber B is formed on the back surface of the substrate 1. In the differential pressure type pressure sensor, as shown in FIG. 3B, the substrate 1 is fitted to an intermediate portion of the inner peripheral surface of the casing A, and the casing A
Is divided into two chambers C and D by the diaphragm unit M. In the chamber C, an inlet E communicating with the gas part at the pressure P 1 is provided.
The Branch D, inlet F in communication with the gas portion of the pressure P 2 is respectively open.

【0024】[0024]

【発明の効果】この発明のマイクロホン等における振動
膜ユニットの製造方法によれば、マイクロホン等の構成
部品としての振動膜ユニットがマイクロホンにおける材
料選択の高い自由度をもって、しかも量産性が高く、小
形化が容易に製造され、マイクロホン等は、その振動膜
ユニットを組込むだけで製造されるので、マイクロホン
等自体も量産性が高く、小形化が容易に製造され得る。
According to the method for manufacturing a diaphragm unit in a microphone or the like of the present invention, a diaphragm unit as a component part of a microphone or the like has a high degree of freedom in material selection in a microphone, and has high mass productivity and a small size. Is easily manufactured, and the microphone or the like is manufactured simply by incorporating the vibrating membrane unit. Therefore, the microphone or the like itself has high mass productivity and can be easily manufactured in a small size.

【0025】しかも、振動膜ユニットの製造において、
例えばFEP(六弗化プロピレン・四弗化エチレン共重
合体)のような材料の振動膜の使用により、マイクロホ
ン等のエレクトレット化が容易である。又、上記振動膜
ユニットを用いたマイクロホン等においては、従来の技
術における製造方法によるマイクロホン等におけるよう
な共鳴管となるダイヤフラムの前面空間が形成されない
ので、音響特性上でも優れている。
Further, in manufacturing the diaphragm unit,
For example, the use of a vibrating membrane made of a material such as FEP (propylene hexafluoride / tetrafluoroethylene copolymer) makes it easy to make a microphone or the like an electret. Further, in a microphone or the like using the above-mentioned diaphragm unit, since a space in front of a diaphragm serving as a resonance tube is not formed as in a microphone or the like according to a conventional manufacturing method, it is excellent in acoustic characteristics.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の第1実施例におけるマイクロホン等
における振動膜ユニットの製造方法の工程の説明図であ
る。
FIG. 1 is an explanatory view illustrating steps of a method for manufacturing a diaphragm unit in a microphone or the like according to a first embodiment of the present invention.

【図2】この発明の第2実施例におけるマイクロホン等
における振動膜ユニットの製造方法の工程の説明図であ
る。
FIG. 2 is an explanatory view of a process of a method of manufacturing a diaphragm unit in a microphone or the like according to a second embodiment of the present invention.

【図3】この発明のマイクロホン等における振動膜ユニ
ットを用いたマイクロホン及び差圧式圧力センサの断面
概略図である。
FIG. 3 is a schematic sectional view of a microphone using a diaphragm unit in a microphone or the like of the present invention and a differential pressure type pressure sensor.

【図4】従来の技術におけるマイクロホンの製造方法の
工程の説明図である。
FIG. 4 is an explanatory diagram of steps of a method for manufacturing a microphone according to a conventional technique.

【符号の説明】[Explanation of symbols]

1 基板 2 小孔 3,4 スペーサ部 3A スペーサ片 5 背極 6 電極 7 熱圧着テープ 8 振動膜フイル
ム材 9 信号線 10 貫通孔
DESCRIPTION OF SYMBOLS 1 Substrate 2 Small hole 3, 4 Spacer part 3A Spacer piece 5 Back electrode 6 Electrode 7 Thermocompression tape 8 Vibration film material 9 Signal line 10 Through hole

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 絶縁体又は絶縁体被覆の基板に適宜数の
小孔を穿設する工程、基板の小孔の穿設域を囲繞する域
及びその外側域に所定厚さのスペーサ部を形成する工
程、基板両面の小孔の穿設域及び小孔の内周面に金属膜
を被覆して電極・背極を形成する工程、内側のスペーサ
部の外側においての基板上に熱圧着材を載置し、更に振
動膜フイルム材を熱圧着材の上に載置する工程、振動膜
フイルム材の表面から熱プレスにより押圧して振動膜フ
イルム材を基板に圧着し、振動膜フイルム材をスペーサ
部の厚みの接着剤層を介して基板の表面に平行に固着す
る工程及び接着部位より外側域の余分な振動膜フイルム
材を切除し、電極に信号線を接続する工程から構成され
た振動膜ユニットの製造方法。
1. A process of forming an appropriate number of small holes in an insulator or an insulator-coated substrate, and forming a spacer portion having a predetermined thickness in a region surrounding a region where the small holes are formed in the substrate and an outer region thereof. A step of forming electrodes and back electrodes by coating a metal film on the perforated area of the small holes on both sides of the substrate and the inner peripheral surface of the small holes, and applying a thermocompression bonding material on the substrate outside the inner spacer portion. Placing the diaphragm film material on the thermocompression bonding material, pressing the surface of the diaphragm film material by a hot press to crimp the diaphragm film material to the substrate, and then placing the diaphragm film material in the spacer. Vibrating membrane, comprising: a step of fixing in parallel to the surface of the substrate via an adhesive layer having a thickness of a portion, and a step of cutting off excess vibrating film material outside the bonding area and connecting a signal line to an electrode. Unit manufacturing method.
【請求項2】 絶縁体又は絶縁体被覆の基板に適宜数の
小孔を穿設する工程、基板の小孔の穿設域を囲繞する域
及びその外側域に所定厚さのスペーサ部を形成する工
程、基板両面の小孔の穿設域及び小孔の内周面に金属膜
を被覆して電極・背極を形成する工程、エッチングが施
され、基板の小孔の穿設域を囲繞するスペーサ片を基板
の表面に載置する工程、スペーサ片の上に熱圧着テープ
を載置し、更に熱圧着テープの上に振動膜フイルム材を
載置する工程、振動膜フイルム材の表面から熱プレスに
より押圧して振動膜フイルム材をスペーサ片共々基板に
圧着し、スペーサ片の厚みを介して基板の表面に平行に
固着するする工程及び接着部位より外側域の余分な振動
膜フイルム材を切除し、電極に信号線を接続する工程か
ら構成された振動膜ユニットの製造方法。
2. A process of forming an appropriate number of small holes in an insulator or an insulator-coated substrate, and forming a spacer portion having a predetermined thickness in an area surrounding the area where the small holes are formed in the substrate and an outer area thereof. A step of forming an electrode and a back electrode by coating a metal film on the inner peripheral surface of the small hole and the inner peripheral surface of the small hole on both surfaces of the substrate, and performing etching to surround the small hole drilling region of the substrate. Placing a spacer piece on the surface of the substrate, placing a thermocompression tape on the spacer piece, and further placing a diaphragm film material on the thermocompression tape, from the surface of the diaphragm film material A step of pressing the vibrating film material together with the spacer pieces together with the substrate by pressing with a hot press, and fixing the vibrating film film material in parallel with the surface of the substrate through the thickness of the spacer pieces, and an extra vibrating film material in a region outside the bonding site. Cutting and connecting the signal line to the electrode Knit manufacturing method.
【請求項3】 適宜寸法の方眼となった大形の基板素材
の各方眼に適宜数の小孔を穿設する工程、各方眼の小孔
の穿設域を囲繞する域及びその外側域に所定厚さのスペ
ーサ部を基板素材全域に形成する工程、基板両面の小孔
の穿設域及び小孔の内周面に金属膜を被覆して電極・背
極を基板素材全域に形成する工程、内側のスペーサ部の
外側においての基板上に基板素材全域に亘り熱圧着材を
載置し、更に基板素材全域に亘り振動膜フイルム材を熱
圧着材の上に載置する工程、振動膜フイルム材の表面か
ら熱プレスにより押圧して振動膜フイルム材を基板に圧
着し、振動膜フイルム材をスペーサ部の厚みの接着剤層
を介して基板の表面に平行に固着する工程、接着部位よ
り外側域の余分な振動膜フイルム材を切除し、電極に信
号線を接続する工程及び基板素材を各方眼に分断する工
程から構成された振動膜ユニットの製造方法。
3. A process of perforating an appropriate number of small holes in each grid of a large-sized substrate material having a grid of an appropriate size, an area surrounding a perforated area of a small hole in each grid, and an outside thereof. Process of forming a spacer part of a predetermined thickness in the entire area of the substrate material, forming a hole in the small hole on both sides of the substrate and covering the inner peripheral surface of the small hole with a metal film to form electrodes and back electrodes in the whole material of the substrate Placing the thermocompression bonding material over the entire area of the substrate material on the substrate outside the inner spacer portion, and further placing the vibrating film material on the thermocompression bonding material over the entire substrate material area, A step of pressing the vibrating film material to the substrate by pressing the film film material from the surface with a hot press, and fixing the vibrating film material in parallel with the surface of the substrate via an adhesive layer having a thickness of a spacer portion, Step of cutting off extra vibrating film material in the outer region and connecting signal lines to electrodes And a step of dividing the substrate material into grids.
【請求項4】 適宜寸法の方眼となった大形の基板素材
の各方眼に適宜数の小孔を穿設する工程、基板両面の小
孔の穿設域及び小孔の内周面に金属膜を被覆して電極・
背極を基板素材全域に形成する工程、エッチングが施さ
れ、基板の小孔の穿設域を囲繞するスペーサ片を基板素
材全域の表面に載置する工程、 スペーサ片の上に基板素材全域に亘り熱圧着材を載置
し、更に基板素材全域に亘り振動膜フイルム材を熱圧着
材の上に載置する工程、振動膜フイルム材の表面から熱
プレスにより押圧して振動膜フイルム材をスペーサ片共
々基板に圧着し、スペーサ片の厚みを介して基板の表面
に平行に固着するする工程、接着部位より外側域の余分
な振動膜フイルム材を切除し、電極に信号線を接続する
工程及び基板素材を各方眼に分断する工程から構成され
た振動膜ユニットの製造方法。
4. A process of perforating an appropriate number of small holes in each grid of a large-sized substrate material having a grid of an appropriate size, a step of forming small holes on both sides of the substrate and an inner peripheral surface of the small holes. Cover the metal film with electrodes
A process of forming a back electrode over the entire substrate material, a process of placing a spacer piece that is etched and surrounding a perforated area of a small hole on the substrate over the entire surface of the substrate material, A step of placing the thermocompression bonding material over the entire area of the substrate material and further placing the vibrating film material on the thermocompression bonding material. A step of crimping both pieces to the substrate and fixing them in parallel to the surface of the substrate via the thickness of the spacer pieces, cutting off excess vibrating film material outside the bonding area, and connecting signal lines to the electrodes; and A method for manufacturing a vibration membrane unit, comprising a step of dividing a substrate material into each grid.
JP21574392A 1992-07-22 1992-07-22 Method for manufacturing diaphragm unit in microphone or the like Expired - Lifetime JP2961392B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21574392A JP2961392B2 (en) 1992-07-22 1992-07-22 Method for manufacturing diaphragm unit in microphone or the like

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21574392A JP2961392B2 (en) 1992-07-22 1992-07-22 Method for manufacturing diaphragm unit in microphone or the like

Publications (2)

Publication Number Publication Date
JPH0646498A JPH0646498A (en) 1994-02-18
JP2961392B2 true JP2961392B2 (en) 1999-10-12

Family

ID=16677475

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21574392A Expired - Lifetime JP2961392B2 (en) 1992-07-22 1992-07-22 Method for manufacturing diaphragm unit in microphone or the like

Country Status (1)

Country Link
JP (1) JP2961392B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009077008A (en) * 2007-09-19 2009-04-09 Audio Technica Corp Condenser microphone unit
JP2009135661A (en) * 2007-11-29 2009-06-18 Funai Electric Co Ltd Microphone unit, manufacturing method thereof and sound input device
CN106734466A (en) * 2016-12-13 2017-05-31 苏州和林微纳科技有限公司 One kind can quick volume production vibrating diaphragm support processing method

Also Published As

Publication number Publication date
JPH0646498A (en) 1994-02-18

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