JP2858776B2 - Beam irradiation device - Google Patents
Beam irradiation deviceInfo
- Publication number
- JP2858776B2 JP2858776B2 JP1055866A JP5586689A JP2858776B2 JP 2858776 B2 JP2858776 B2 JP 2858776B2 JP 1055866 A JP1055866 A JP 1055866A JP 5586689 A JP5586689 A JP 5586689A JP 2858776 B2 JP2858776 B2 JP 2858776B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- hole
- irradiation device
- beam irradiation
- holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 238000010894 electron beam technology Methods 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 3
- 230000007935 neutral effect Effects 0.000 claims description 3
- 230000001133 acceleration Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、イオンビームや中性粒子ビーム、または電
子ビームを広い面積に照射するための改良されたビーム
照射装置に関する。Description: TECHNICAL FIELD The present invention relates to an improved beam irradiation apparatus for irradiating an ion beam, a neutral particle beam, or an electron beam to a wide area.
(従来の技術) イオンビームや中性粒子ビーム、または電子ビームを
長尺の物体に照射する方法として、(1)第1a図に示す
ように、粒子源1で発生されたイオンや電子などの荷電
粒子2を単一の電極孔3を有する加速電極4によって加
速したのち、そのビーム5を磁場や偏向電極6によって
偏向し、広い面積を掃引する方法と、(2)第2a図に示
すように、複数の電極孔8をもつ多孔型の加速電極9
(以下、単に多孔型電極と呼ぶ)を用いて、それぞれの
孔からビーム5を引出し、それらの集合体として大面積
のビームを得る方法がある。大きな照射強度が必要な場
合には、後者の方法が用いられるが、この場合の問題点
として、それぞれの孔からのビーム5は完全には直進せ
ず、空間的に発散しているために、それらの集合体とし
てのビームも第2b図に示すような空間的分布7を持つこ
とがある。すなわち、集合ビームの中心部の照射強度は
大きく、周辺にいくに従って照射強度が下がるという問
題である。この問題を解決するために、従来は、第3a図
に示すように、多孔型電極9の中心部の孔のいくつかを
閉止板10によって塞ぎ、中心部のビーム強度を下げるこ
とによって、空間的に一様なビーム分布7を得る方法が
あった。しかし、この方法では孔を塞いだ分だけビーム
強度が下がり、照射装置としての効率が低下してしまう
欠点があった。(Prior Art) As a method of irradiating a long object with an ion beam, a neutral particle beam, or an electron beam, (1) As shown in FIG. After the charged particles 2 are accelerated by an accelerating electrode 4 having a single electrode hole 3, the beam 5 is deflected by a magnetic field or a deflecting electrode 6 to sweep a wide area, and (2) As shown in FIG. A porous acceleration electrode 9 having a plurality of electrode holes 8
There is a method of extracting a beam 5 from each hole by using a porous electrode (hereinafter, simply referred to as a porous electrode) and obtaining a large-area beam as an aggregate thereof. When a large irradiation intensity is required, the latter method is used. However, a problem in this case is that the beams 5 from the respective holes do not go straight, but diverge spatially. The beam as an aggregate of them may have a spatial distribution 7 as shown in FIG. 2b. That is, there is a problem that the irradiation intensity at the central portion of the collective beam is large and the irradiation intensity decreases toward the periphery. In order to solve this problem, conventionally, as shown in FIG. 3a, some holes at the center of the porous electrode 9 are closed with a closing plate 10 to lower the beam intensity at the center, thereby reducing the spatial intensity. There is a method for obtaining a uniform beam distribution 7. However, this method has a drawback that the beam intensity is reduced by an amount corresponding to closing the hole, and the efficiency of the irradiation device is reduced.
(発明が解決しようとする課題) 本発明は、かかる問題および欠点を解決しようとする
ものであって、多孔型電極を用いて大面積のビームを発
生した場合にも、空間的に一様なビームを発生させ、ま
た、電極孔を塞ぐことによる照射装置における如き効率
の低下を防ごうとするものである。(Problems to be Solved by the Invention) The present invention is intended to solve such problems and disadvantages, and even when a large-area beam is generated using a porous electrode, a spatially uniform beam is generated. The purpose of the present invention is to prevent a reduction in efficiency as in an irradiation device caused by generating a beam and closing an electrode hole.
(課題を解決するための手段) 上記課題を解決すべく、本発明のビーム照射装置にお
いては、複数の多孔型電極のうちの1若しくは2以上の
電極における中心部の孔の位置を、他の電極における対
応する孔の位置に対して変位させている。その結果、本
発明の装置においては、照射効率を低下させることなく
空間的に一様なビームを発生することができる。変位さ
せる孔の数、位置(すなわち変位させる中心部の孔の範
囲)及び変位の大きさは、装置の出力、ビームの種類等
に応じて適宜選ばれる。(Means for Solving the Problems) In order to solve the above problems, in the beam irradiation apparatus of the present invention, the position of the hole at the center of one or more of the plurality of porous electrodes is changed. It is displaced relative to the position of the corresponding hole in the electrode. As a result, in the device of the present invention, a spatially uniform beam can be generated without lowering the irradiation efficiency. The number and position of holes to be displaced (that is, the range of holes in the center to be displaced) and the magnitude of the displacement are appropriately selected according to the output of the apparatus, the type of beam, and the like.
(実施例) 本発明の一具体例を第4a図、第4b図及び第5図により
説明する。第4a図はイオンビームを照射する装置であ
る。プラズマ源11で発生したイオン12を多孔型電極9に
よって加速する。多孔型電極9はプラズマ電極13、負電
極14、接地電極15の3枚の電極より構成され、プラズマ
電極13に加速電圧源16からの正の加速電圧を印加し、負
電極14に減速電圧源17からの負の減速電圧を印加するこ
とによってイオンビームを加速する。このとき、電極の
中心部の孔18について、第5図に示すように負電極14の
孔を他の2枚の電極の孔に対して変位させると、電界レ
ンズの作用によってビーム5は、負電極の孔の変位方向
と反対方向に偏向される。これにより、中心部の孔18か
らのビーム(第4図の19)を外側に偏向することができ
る。従って、第4b図に示すように、一様なビーム分布を
得ることができる。Example A specific example of the present invention will be described with reference to FIGS. 4a, 4b, and 5. FIG. FIG. 4a shows an apparatus for irradiating an ion beam. The ions 12 generated by the plasma source 11 are accelerated by the porous electrode 9. The porous electrode 9 is composed of three electrodes: a plasma electrode 13, a negative electrode 14, and a ground electrode 15. A positive acceleration voltage from an acceleration voltage source 16 is applied to the plasma electrode 13, and a deceleration voltage source is applied to the negative electrode 14. The ion beam is accelerated by applying a negative deceleration voltage from 17. At this time, as shown in FIG. 5, when the hole of the negative electrode 14 is displaced with respect to the holes of the other two electrodes with respect to the hole 18 at the center of the electrode, the beam 5 becomes negative by the action of the electric field lens. It is deflected in the direction opposite to the direction of displacement of the electrode hole. Thereby, the beam (19 in FIG. 4) from the central hole 18 can be deflected outward. Therefore, a uniform beam distribution can be obtained as shown in FIG. 4b.
(発明の効果) 以上の如く、本発明に従って変位させる孔の数、位
置、及び変位の大きさを適当に選ぶことによって、多孔
型電極を用いた場合でも広い面積に亘って一様なビーム
分布を得ることができる。また、多孔型電極を用いた従
来のビーム照射装置のように電極の孔を塞ぐことがない
ため、ビーム強度の低下がなく、照射装置の効率を低下
させることがない。(Effect of the Invention) As described above, by appropriately selecting the number, position, and magnitude of displacement of the holes to be displaced according to the present invention, a uniform beam distribution over a wide area even when a porous electrode is used. Can be obtained. Further, since the hole of the electrode is not blocked unlike the conventional beam irradiation device using the porous electrode, the beam intensity does not decrease and the efficiency of the irradiation device does not decrease.
第1a図は単一孔のビーム照射装置の断面模式図であり、 第1b図は第1a図の装置におけるビーム分布を示すグラフ
であり、 第2a図は多孔型電極を用いたビーム照射装置の断面模式
図であり、 第2b図は第2a図の装置におけるビーム分布を示すグラフ
であり、 第3a図は多孔型電極からのビーム分布を改善された従来
のビーム照射装置の断面模式図であり、 第3b図は第3a図の装置におけるビーム分布を示すグラフ
であり、 第4a図は本発明のイオンビーム照射装置の断面模式図で
あり、 第4b図は第4a図の装置におけるビーム分布を示すグラフ
であり、 第5図は、第4a図の多孔型電極の一つの孔の断面とビー
ム偏向を示す部分断面図である。 図において 1……粒子源、2……荷電粒子 3……単一の電極孔、4……加速電極 5……ビーム、6……偏向電極 7……ビーム分布、8……複数の電極孔 9……多孔型電極、10……閉止板 11……プラズマ源、12……イオン 13……プラズマ電極、14……負電極 15……接地電極、16……加速電圧源 17……減速電圧源、18……中心部の電極孔 19……中心部の孔からの偏向されたビーム1a is a schematic cross-sectional view of a single-hole beam irradiation device, FIG. 1b is a graph showing a beam distribution in the device of FIG. 1a, and FIG. 2a is a beam irradiation device using a porous electrode. FIG. 2b is a schematic diagram showing a beam distribution in the apparatus of FIG. 2a, and FIG. 3a is a schematic sectional view of a conventional beam irradiation apparatus in which the beam distribution from a porous electrode is improved. FIG. 3b is a graph showing a beam distribution in the apparatus of FIG. 3a, FIG. 4a is a schematic sectional view of an ion beam irradiation apparatus of the present invention, and FIG. 4b is a graph showing a beam distribution in the apparatus of FIG. 4a. FIG. 5 is a partial sectional view showing a cross section of one hole and a beam deflection of the porous electrode of FIG. 4a. In the figure, 1 ... a particle source, 2 ... a charged particle 3 ... a single electrode hole, 4 ... an acceleration electrode 5 ... a beam, 6 ... a deflection electrode 7 ... a beam distribution, 8 ... a plurality of electrode holes 9: Perforated electrode, 10: Closing plate 11: Plasma source, 12: Ion 13: Plasma electrode, 14: Negative electrode 15: Ground electrode, 16: Acceleration voltage source 17: Deceleration voltage Source 18 central electrode hole 19 deflected beam from central hole
フロントページの続き (58)調査した分野(Int.Cl.6,DB名) H01J 27/00 - 27/26 H01J 37/08 H01J 37/06 H01J 37/04Continuation of the front page (58) Field surveyed (Int. Cl. 6 , DB name) H01J 27/00-27/26 H01J 37/08 H01J 37/06 H01J 37/04
Claims (1)
ンまたは電子を加速し、イオンビームや中性粒子ビー
ム、または電子ビームを広い面積に照射するビーム照射
装置において、前記複数の電極のうちの1もしくは2以
上の電極における中心部の孔の位置を、他の電極におけ
る対応する孔の位置に対して変位させることによって、
電極の中心部の孔からのビームを外側に偏向させること
を特徴とするビーム照射装置。1. A beam irradiation apparatus for accelerating ions or electrons by using a plurality of electrodes having a plurality of holes and irradiating an ion beam, a neutral particle beam, or an electron beam to a large area. By displacing the position of the center hole in one or more of the electrodes with respect to the position of the corresponding hole in the other electrode,
A beam irradiation device for deflecting a beam from a hole at the center of an electrode to the outside.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1055866A JP2858776B2 (en) | 1989-03-08 | 1989-03-08 | Beam irradiation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1055866A JP2858776B2 (en) | 1989-03-08 | 1989-03-08 | Beam irradiation device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02236933A JPH02236933A (en) | 1990-09-19 |
JP2858776B2 true JP2858776B2 (en) | 1999-02-17 |
Family
ID=13010997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1055866A Expired - Fee Related JP2858776B2 (en) | 1989-03-08 | 1989-03-08 | Beam irradiation device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2858776B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6721486B2 (en) * | 2016-10-18 | 2020-07-15 | 東京エレクトロン株式会社 | Ion beam irradiation device and substrate processing device |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0145068Y2 (en) * | 1985-09-20 | 1989-12-26 |
-
1989
- 1989-03-08 JP JP1055866A patent/JP2858776B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH02236933A (en) | 1990-09-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |