JP2850161B2 - Photosensitive material processing equipment - Google Patents

Photosensitive material processing equipment

Info

Publication number
JP2850161B2
JP2850161B2 JP1365191A JP1365191A JP2850161B2 JP 2850161 B2 JP2850161 B2 JP 2850161B2 JP 1365191 A JP1365191 A JP 1365191A JP 1365191 A JP1365191 A JP 1365191A JP 2850161 B2 JP2850161 B2 JP 2850161B2
Authority
JP
Japan
Prior art keywords
amount
photosensitive material
processing
humidity
material processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1365191A
Other languages
Japanese (ja)
Other versions
JPH04235552A (en
Inventor
裕美 野崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP1365191A priority Critical patent/JP2850161B2/en
Publication of JPH04235552A publication Critical patent/JPH04235552A/en
Application granted granted Critical
Publication of JP2850161B2 publication Critical patent/JP2850161B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、感光材料処理装置に関
し、更に詳しくは、処理槽からの処理液(水)の蒸発に
対応して処理液濃度を一定に保つために水補充を行う際
に利用される新規な水補充量の制御機構を有する感光材
料処理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material processing apparatus, and more particularly, to a method for replenishing water to maintain a constant processing solution concentration in response to evaporation of a processing solution (water) from a processing tank. The present invention relates to a photosensitive material processing apparatus having a novel water replenishment amount control mechanism used in the apparatus.

【0002】[0002]

【従来の技術】各処理液を連続的に配置される処理槽に
それぞれ貯溜しておき、この処理液中に感光材料を浸漬
させながら搬送して処理する方式の感光材料処理装置に
おいては、一般に処理時間の短縮のために処理液を高温
に維持する傾向があり、このため処理槽の上面から処理
液、主として水分の蒸発量が多く、処理液が濃縮され処
理性能が変化するので何らかの対策が必要である。殊に
処理液量が少量である小型の装置では、上記した蒸発補
正は重要な課題になっている。
2. Description of the Related Art In a photosensitive material processing apparatus of the type in which each processing solution is stored in a processing tank arranged continuously, and the photosensitive material is transported while being immersed in the processing solution, the processing is generally performed. The processing liquid tends to be maintained at a high temperature in order to shorten the processing time.Therefore, a large amount of the processing liquid, mainly water, evaporates from the upper surface of the processing tank, and the processing liquid is concentrated to change the processing performance. is necessary. In particular, in the case of a small apparatus in which the amount of the processing liquid is small, the above-described evaporation correction is an important issue.

【0003】従来の対策法として、定期的に蒸発水量を
予測した水補充を行う外、例えば、処理液の上面に浮き
蓋などを配置したり、或いは、処理槽の上方開口面積の
比率を小さくしたりして蒸発量を規制することが行われ
ている。
As a conventional countermeasure, water replenishment is periodically performed by estimating the amount of evaporating water. For example, a floating lid or the like is placed on the upper surface of the processing liquid, or the ratio of the area of the upper opening of the processing tank is reduced. In some cases, the amount of evaporation is regulated.

【0004】[0004]

【発明が解決しようとする課題】上記した蒸発量規制方
式は、処理液の空気酸化の防止の点でも機能するもので
はあるが、感光材料は搬送系の必要から、次工程の処理
槽に案内する、所謂渡りが不可欠であり、この渡り部分
を通しての蒸発は防ぐことができない。
Although the above-mentioned evaporation amount control method also functions in preventing air oxidation of the processing solution, the photosensitive material is guided to the processing tank in the next process because of the necessity of a transport system. In other words, a so-called crossover is indispensable, and evaporation through this crossover cannot be prevented.

【0005】他方、処理液の蒸発は、環境温度や湿度な
どによって差があり、画一的な水補充を行うと、逆に処
理液濃度の低下も考えられ、安定した処理性能を得るた
めには、過不足のない適正な量の水補充が必要である。
[0005] On the other hand, the evaporation of the processing solution varies depending on the environmental temperature, humidity, and the like. If uniform water replenishment is performed, the concentration of the processing solution may be reduced. Requires an adequate amount of water replenishment without excess or deficiency.

【0006】本発明は、上記に鑑み、水補充量の制御機
構を有する改良された感光材料処理装置を明らかにする
ことを目的とするものである。
In view of the above, it is an object of the present invention to clarify an improved photosensitive material processing apparatus having a mechanism for controlling the amount of water replenishment.

【0007】[0007]

【課題を解決するための手段】本発明の感光材料処理装
置は、処理液の蒸発を補う水補充量が、環境温度・湿度
と、装置内部空間の全部又は一部から外部に排出される
空気の移動量の検出データに従って規制される水補充量
の規制機構を有すること、環境温度・湿度と空気移動量
の検出データが、記憶回路に入力されている当該温度・
湿度における基準蒸発量をもとにした比較データと比較
されて水補充量の制御が行われること、を特徴とするも
のである。
In the light-sensitive material processing apparatus of the present invention, the amount of replenishing water for compensating the evaporation of the processing solution is determined by the environmental temperature and humidity and the air discharged from all or a part of the internal space of the apparatus to the outside. Has a water replenishment amount regulation mechanism regulated in accordance with the detection data of the movement amount of the ambient temperature / humidity and the detection data of the air movement amount.
The water replenishment amount is controlled by comparison with comparison data based on the reference evaporation amount in humidity.

【0008】[0008]

【実施例】次に、本発明の感光材料処理装置を、添付の
図面に示す実施例に従って更に詳細に説明する。
Next, the photosensitive material processing apparatus of the present invention will be described in more detail with reference to the embodiments shown in the accompanying drawings.

【0009】図において、符号1は感光材料であり、矢
符方向に搬送され、各処理槽2中に貯溜されている処理
液中に浸漬されて処理される。
In FIG. 1, reference numeral 1 denotes a photosensitive material, which is conveyed in the direction of the arrow and is immersed in the processing liquid stored in each processing tank 2 for processing.

【0010】処理槽2の上部空間3の空気は、乾燥槽の
空気と共に、又は、これと独立して装置外に排出され、
排出される空気の量は、空気移動量センサ5により検出
される。
The air in the upper space 3 of the processing tank 2 is discharged out of the apparatus together with or independently of the air in the drying tank.
The amount of discharged air is detected by the air movement amount sensor 5.

【0011】空気移動量によってセンサ5、温度センサ
6及び湿度センサ7によって検出される環境データと共
に比較回路8に入力され、前もって記憶回路9に入力さ
れている空気移動量データ及び環境データと比較され、
その比較データに従って制御回路10が働き、水の供給
管の途中に配置されるバルブ11の開閉が制御され、水
の補充量が調整される。
The air movement amount is input to the comparison circuit 8 together with the environmental data detected by the sensor 5, the temperature sensor 6 and the humidity sensor 7, and is compared with the air movement amount data and the environmental data previously input to the storage circuit 9. ,
The control circuit 10 operates in accordance with the comparison data to control the opening and closing of the valve 11 disposed in the middle of the water supply pipe, thereby adjusting the amount of water replenishment.

【0012】記憶回路9に入力されているデータは、水
補充量を、環境温度・湿度及び空気移動量センサ5の検
出データの関数として制御するものである。記憶データ
は、当初は標準データが入力されるが、刻々と検出され
るデータにより更新された、所謂学習データとすること
が好ましい。
The data input to the storage circuit 9 controls the amount of water replenishment as a function of the environmental temperature / humidity and the data detected by the air movement amount sensor 5. It is preferable that the stored data is so-called learning data in which standard data is initially input, but is updated with data that is detected every moment.

【0013】空気移動量センサ5としては、現在知られ
ている各種タイプの流量センサの外、今後開発されるで
あろう新規なタイプのものの利用を排除するものではな
い。
The air movement sensor 5 does not exclude the use of new types which will be developed in the future, in addition to various types of flow sensors known at present.

【0014】なお、バルブ11による水補充量の制御
は、ポンプの作動時間の制御に代えることもできる。
The control of the amount of water replenishment by the valve 11 can be replaced with the control of the operation time of the pump.

【0015】[0015]

【発明の効果】本発明の感光材料処理装置によれば、水
補充量を、環境温度・湿度及び空気移動量の関数値で自
動制御することができ、従って、常に適正な濃度に処理
液を維持することができるので頭記した課題が解決され
る。
According to the photosensitive material processing apparatus of the present invention, the amount of water replenishment can be automatically controlled by a function value of the environmental temperature / humidity and the amount of air movement, so that the processing solution is always adjusted to an appropriate concentration. The problem mentioned above is solved because it can be maintained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の1実施例を示す概略図である。FIG. 1 is a schematic diagram showing one embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 感光材料 2 処理槽 5 空気移動量センサ 6 温度センサ 7 湿度センサ 8 比較回路 9 記憶回路 10 制御回路 11 バルブ DESCRIPTION OF SYMBOLS 1 Photosensitive material 2 Processing tank 5 Air movement amount sensor 6 Temperature sensor 7 Humidity sensor 8 Comparison circuit 9 Storage circuit 10 Control circuit 11 Valve

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】処理液の蒸発を補う水補充量が、環境温度
・湿度と、装置内部空間の全部又は一部から外部に排出
される空気の移動量の検出データに従って規制される水
補充量の規制機構を有することを特徴とする感光材料処
理装置。
An amount of water replenishment for compensating for evaporation of a processing liquid is regulated in accordance with environmental temperature and humidity and detection data of a movement amount of air discharged from all or a part of the internal space of the apparatus to the outside. A photosensitive material processing apparatus having a regulating mechanism.
【請求項2】環境温度・湿度と空気移動量の検出データ
が、記憶回路に入力されている当該温度・湿度における
基準蒸発量をもとにした比較データと比較されて水補充
量の制御が行われることを特徴とする請求項1に記載の
感光材料処理装置。
The detected data of the environmental temperature / humidity and the amount of air movement are compared with comparison data input to a storage circuit based on a reference evaporation amount at the temperature / humidity to control the amount of water replenishment. The photosensitive material processing apparatus according to claim 1, wherein the processing is performed.
JP1365191A 1991-01-11 1991-01-11 Photosensitive material processing equipment Expired - Lifetime JP2850161B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1365191A JP2850161B2 (en) 1991-01-11 1991-01-11 Photosensitive material processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1365191A JP2850161B2 (en) 1991-01-11 1991-01-11 Photosensitive material processing equipment

Publications (2)

Publication Number Publication Date
JPH04235552A JPH04235552A (en) 1992-08-24
JP2850161B2 true JP2850161B2 (en) 1999-01-27

Family

ID=11839128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1365191A Expired - Lifetime JP2850161B2 (en) 1991-01-11 1991-01-11 Photosensitive material processing equipment

Country Status (1)

Country Link
JP (1) JP2850161B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2710506B2 (en) * 1991-12-27 1998-02-10 富士写真フイルム株式会社 Watering method for photosensitive material processing equipment

Also Published As

Publication number Publication date
JPH04235552A (en) 1992-08-24

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