JP2785042B2 - Vibration processing machine - Google Patents

Vibration processing machine

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Publication number
JP2785042B2
JP2785042B2 JP1165340A JP16534089A JP2785042B2 JP 2785042 B2 JP2785042 B2 JP 2785042B2 JP 1165340 A JP1165340 A JP 1165340A JP 16534089 A JP16534089 A JP 16534089A JP 2785042 B2 JP2785042 B2 JP 2785042B2
Authority
JP
Japan
Prior art keywords
tank
polishing
product
processing machine
vibration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1165340A
Other languages
Japanese (ja)
Other versions
JPH0332567A (en
Inventor
昭夫 丸山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tsukishima Kikai Co Ltd
Original Assignee
Tsukishima Kikai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tsukishima Kikai Co Ltd filed Critical Tsukishima Kikai Co Ltd
Priority to JP1165340A priority Critical patent/JP2785042B2/en
Publication of JPH0332567A publication Critical patent/JPH0332567A/en
Application granted granted Critical
Publication of JP2785042B2 publication Critical patent/JP2785042B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、金属製、プラスチック製、セラミック製等
の製品あるいは部品の振動加工機に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a vibration processing machine for products or parts made of metal, plastic, ceramic or the like.

〔従来の技術〕[Conventional technology]

各種の産業分野では金属、プラスチック、セラミック
等を材料とした製品あるいは部品(以下、単に製品と称
する)が使用されているが、従来、これらの製品の表面
研磨(バリ取り、スケール落とし、カエリ取り、荒研
磨、精密研磨、光沢研磨、つや出し)のために振動研磨
機が使用されている。
In various industrial fields, products or parts made of metals, plastics, ceramics, and the like (hereinafter, simply referred to as products) are used. Conventionally, surface polishing (burr removal, scale removal, burrs removal) of these products is performed. A vibration polishing machine is used for rough polishing, precision polishing, gloss polishing, and polishing.

第3図は、従来の研磨機の一例を示すものであり、こ
の研磨機は、センターチューブaを中心にして平面ドー
ナツ型とした断面U字型の研磨槽bと、円筒状のベース
cと、振動発生機dとからなっている。研磨槽bはベー
スc上に載せ、研磨槽bとベースcとは、研磨槽bの周
方向にそって環状に複数配設した高張力スプリングやゴ
ムスプリング等の弾性支持部材eを介して連結してあ
り、また、上下の軸端にアンバランスウエイトf、gを
有する振動発生機dは、ベースc内に設置して研磨槽b
に直結した構造となっている。
FIG. 3 shows an example of a conventional polishing machine. This polishing machine comprises a polishing vessel b having a U-shaped cross section and a flat donut shape centered on a center tube a, and a cylindrical base c. , A vibration generator d. The polishing tank b is placed on the base c, and the polishing tank b and the base c are connected via an elastic support member e such as a high tension spring or a rubber spring arranged in a plurality of rings along the circumferential direction of the polishing tank b. A vibration generator d having unbalanced weights f and g at the upper and lower shaft ends is installed in a base c and a polishing tank b
It has a structure directly connected to.

この振動発生機dは、研磨槽bに特殊な三次元の高振
動を発生させるものであり、上部のウエイトfは水平運
動を調節し、下部のウエイトgは垂直運動を調節するよ
うになっている。
The vibration generator d generates a special three-dimensional high vibration in the polishing tank b. The upper weight f adjusts the horizontal movement, and the lower weight g adjusts the vertical movement. I have.

上記する構成において、研磨槽b内に研磨すべき製品
を、用途によって選定した研磨材(メディア)とともに
投入し、振動発生機dにより研磨槽bを高振動で振動さ
せれば、製品や研磨材等は研磨槽b内をU字断面にそっ
て垂直方向に回転しつつ研磨槽bにそって周方向に旋回
を続け、研磨作業を行う。尚、研磨に際しては、研磨材
とともに必要に応じて水や特殊な薬品添加物(コンパウ
ンド)等を使用することがある。
In the above configuration, a product to be polished is put into the polishing tank b together with an abrasive (media) selected according to the application, and the polishing tank b is vibrated at high vibration by the vibration generator d. And the like, while rotating in the vertical direction along the U-shaped cross section in the polishing tank b, continues turning in the circumferential direction along the polishing tank b to perform the polishing operation. At the time of polishing, water or a special chemical additive (compound) may be used together with the abrasive, if necessary.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

上記する従来の振動研磨機は、次のような問題点を有
していた。
The conventional vibration polishing machine described above has the following problems.

(1) 研磨槽bは、単槽構造であるため、研磨によっ
て生じたバリのような切削屑や研磨材屑等(以下、単に
製品屑と称する)も製品とともに攪拌されることにな
る。従って、製品屑により製品表面が傷つけられること
があり、不良品が発生する。
(1) Since the polishing tank b has a single tank structure, cutting chips such as burrs generated by polishing and abrasive chips (hereinafter, simply referred to as product chips) are also stirred together with the product. Therefore, the product surface may be damaged by product dust, and defective products are generated.

(2) 研磨が終了した製品は、研磨槽bの側面に設け
た取出口(図示せず)から研磨材とともに取り出される
が、この時、製品屑も一緒に排出されるため、製品と製
品屑とを選り分ける作業が煩わしいものであった。
(2) The finished product is taken out together with the abrasive from an outlet (not shown) provided on the side surface of the polishing tank b. At this time, the product waste is discharged together with the product. The task of selecting between them was cumbersome.

(3) 研磨に際して水や薬品等の液体を使用した場
合、液体は、研磨槽bの側面に設けた図示しない排液口
から排出されるが、製品や製品屑等が排液口から排出さ
れないように排液口を小さくしてあり、かつ、排液口は
複数の板体によって簀の子状に閉じてあるので、液体の
抜き出しに時間がかかり、製品屑の流出を完全に防ぐこ
とはできないものであった。
(3) When a liquid such as water or a chemical is used for polishing, the liquid is discharged from a drain port (not shown) provided on the side surface of the polishing tank b, but products and product debris are not discharged from the drain port. The drain outlet is made small as described above, and the drain outlet is closed like a cage by a plurality of plates, so it takes time to extract the liquid and it is not possible to completely prevent the outflow of product waste Met.

(4) 水や薬品等の液体を使用した場合、研磨して表
面が滑らかになった製品と研磨槽bの内壁間に液体が入
って両者を密着させるので、製品が取り出されないこと
があり、このような場合には人手によって取り出すか、
取り出すために特殊な装置を必要としていた。
(4) When a liquid such as water or a chemical is used, the product may not be taken out because the liquid enters between the inner wall of the polishing tank b and the product whose surface has been polished to be smooth and adheres to each other. In such cases,
Special equipment was required to take it out.

(5) 研磨すべき製品に切削油等の不純物が付着して
いる場合、研磨する前に脱脂処理する必要があるが、脱
脂すべき装置や脱脂剤等に多大の費用を必要としてい
た。研磨槽b内に研磨促進を兼ねた脱脂用コンパウンド
を投入し、研磨加工を行うこともあるが、コンパウンド
の消費量が多くなり、また、コンパウンドの付着を新た
に洗浄、除去する工程を必要としていた。
(5) When impurities such as cutting oil are attached to a product to be polished, it is necessary to perform a degreasing treatment before polishing, but a great deal of expense is required for a device and a degreasing agent to be degreased. In some cases, a degreasing compound is added to the polishing tank b to promote polishing, and polishing is performed.However, the consumption of the compound increases, and a process of newly cleaning and removing the adhesion of the compound is required. Was.

本発明は、上記する従来の振動研磨機の種々の問題点
に鑑み、研磨槽を内外二槽構造とし、研磨加工中、研磨
すべき製品と製品屑(切削屑や研磨材屑等)とを内槽に
おいて分離し、製品のみを研磨可能とした振動加工機を
提供することを目的とする。
In view of the above-mentioned various problems of the conventional vibration polishing machine, the present invention has a polishing tank having two inner and outer tanks, and a product to be polished and product chips (such as cutting chips and abrasive material chips) are removed during polishing. It is an object of the present invention to provide a vibration processing machine which is separated in an inner tank and is capable of polishing only a product.

また本発明は、研磨後の製品が研磨槽の内壁に付着す
ることがなく、容易に取り出し可能とした振動加工機を
提供することを目的とする。
Another object of the present invention is to provide a vibrating machine capable of easily removing a product after polishing without adhering to the inner wall of the polishing tank.

更に本発明は、研磨後の製品の洗浄、防錆、コーテイ
ング等の各種の加工処理を行うことができる振動加工機
を提供することを目的とする。
Another object of the present invention is to provide a vibration processing machine capable of performing various processing processes such as cleaning, rust prevention, and coating of a product after polishing.

更にまた本発明は、研磨製品以外の一般的な製品のコ
ーテイング処理ができる振動加工機を提供することを目
的とする。
Still another object of the present invention is to provide a vibration processing machine capable of performing a coating process on general products other than abrasive products.

〔課題を解決するための手段〕[Means for solving the problem]

上記の目的を達成するために本発明は、センターチュ
ーブを中心にして平面ドーナツ型とした断面U字型の研
磨槽を円筒状のベース上に載せて弾性支持部材により連
結し、上下の軸端にアンバランスウエイトを設けた振動
発生機により研磨槽を振動させ、研磨槽内において製品
を研磨する振動加工機において、研磨槽2を所定の相対
間隔を有して同形状とした内槽2aと外槽2bの二槽構造と
し、製品取出口9を設けた内槽2aは、製品と切削屑や研
磨材屑等の製品屑とを分離し、製品屑を内槽2aと外槽2b
との間に排出可能としてある。
In order to achieve the above object, the present invention provides a polishing vessel having a U-shaped cross section having a flat donut centered on a center tube, mounted on a cylindrical base, connected by an elastic support member, and provided with upper and lower shaft ends. In a vibration processing machine that vibrates a polishing tank by a vibration generator provided with an unbalanced weight and polishes a product in the polishing tank, an inner tank 2a having the same shape with the polishing tank 2 at a predetermined relative interval is provided. The inner tank 2a, which has a two-tank structure of the outer tank 2b and is provided with the product outlet 9, separates the product from product chips such as cutting chips and abrasive chips, and separates the product chips into the inner tank 2a and the outer tank 2b.
It can be discharged between.

また、本発明は、センターチューブを中心にして平面
ドーナツ型とした断面U字型の研磨槽を円筒状のベース
上に載せて弾性支持部材により連結し、上下の軸端にア
ンバランスウエイトを設けた振動発生機により研磨槽を
振動させ、研磨槽内において製品を研磨する振動加工機
において、所定の相対間隔を有して同形状とした内槽2
a、外槽2bの二槽構造とするとともに製品取出口9を有
する内槽2aは製品と製品屑とを分離して製品屑を外槽2b
との間に排出可能とした研磨槽2と、洗浄剤や防錆剤、
コーテイング剤等を収容可能なタンク10とからなり、タ
ンク10のポンプ11と外槽2bの液体入口12をパイプで連結
するとともに外槽2bに設けたオーバーフロー口13とタン
ク10とを連結してある。
In addition, the present invention places a U-shaped polishing tank having a flat donut shape around a center tube on a cylindrical base and connects them by an elastic support member, and provides unbalanced weights at upper and lower shaft ends. In a vibration processing machine that vibrates the polishing tank by the vibration generator and polishes the product in the polishing tank, the inner tank 2 having a predetermined relative interval and the same shape.
a, an inner tank 2a having a two-tank structure of an outer tank 2b and having a product take-out port 9 separates the product and the product waste into an outer tank 2b.
Between the polishing tank 2 and the cleaning agent or rust inhibitor,
It comprises a tank 10 capable of containing a coating agent and the like, and a pump 11 of the tank 10 and a liquid inlet 12 of the outer tank 2b are connected by a pipe, and an overflow port 13 provided in the outer tank 2b is connected to the tank 10. .

〔実施例〕〔Example〕

以下、図面に従って、本発明の実施例を詳細に説明す
る。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

第1図は本発明振動加工機の第1の実施例を示し、セ
ンターチューブ1を中心に平面ドーナツ型とした断面U
字型の研磨槽2を円筒状のベース3上に載せ、研磨槽2
とベース3とはをその間に環状に複数配設した高張力ス
プリングやゴムスプリング等の弾性支持部材4を介して
連結し、ベース3内において研磨槽2には、上下の軸端
にアンバランスウエイト5,6を有する振動発生機7を直
結したことは従来の研磨機と同じである。
FIG. 1 shows a first embodiment of a vibration processing machine according to the present invention, in which a cross section U having a flat donut shape around a center tube 1 is shown.
The polishing tank 2 having a V-shape is placed on a cylindrical base 3 and the polishing tank 2
And the base 3 are connected via an elastic support member 4 such as a high tension spring or a rubber spring, which is annularly arranged between the base 3 and the base 3. The polishing tank 2 in the base 3 is provided with unbalanced weights at the upper and lower shaft ends. The direct connection of the vibration generator 7 having 5 and 6 is the same as that of the conventional polishing machine.

本実施例においては、研磨槽2を所定の相対間隔を有
して同形状とした内槽2aと外槽2bからなる内外二槽構造
とし、内槽2aの全面には、製品研磨によって生じた切削
屑や研磨材屑等の製品屑を外槽2bとの間に排出可能な孔
8を複数設けたことを特徴としている。各孔8の径や各
孔8の間隔、配列状態等は、研磨、加工すべき製品の大
きさや材質等に応じて選択される。また、二槽構造とし
た内槽2aと外槽2bとは、両者間に所定の間隔を形成した
一体構造であってもよく、あるいは、内槽2aを外槽2b内
に所定の間隔をおいて嵌め込んで設置するよう、内槽2a
と外槽2bとは交換できるように着脱自在な構造としても
よい。
In the present embodiment, the polishing tank 2 has an inner / outer two tank structure including an inner tank 2a and an outer tank 2b having a predetermined relative spacing and the same shape, and the entire surface of the inner tank 2a is formed by product polishing. It is characterized in that a plurality of holes 8 are provided between the outer tub 2b for discharging product chips such as cutting chips and abrasive chips. The diameter of each hole 8, the interval between the holes 8, the arrangement state, and the like are selected according to the size and material of the product to be polished and processed. Further, the inner tank 2a and the outer tank 2b having the two-tank structure may be an integral structure in which a predetermined interval is formed between them, or the inner tank 2a is provided inside the outer tank 2b with a predetermined interval. Inner tank 2a
The outer tank 2b may have a detachable structure so that it can be replaced.

尚、図面において符号9は、内槽2aに連結して外槽2b
から外部に突出する研磨が終了した製品の取出口であ
る。
In the drawing, reference numeral 9 denotes an outer tank 2b connected to the inner tank 2a.
This is the outlet for the product that has been polished and protrudes to the outside.

上記の構成において研磨すべき製品を、用途によって
選定した適量の研磨材とともに研磨槽2の内槽2a内に投
入し、振動発生機7により研磨槽2全体を振動させれ
ば、製品や研磨材等は内槽2a内をU字断面にそって垂直
方向に回転しつつセンターチューブ1を中心にして内槽
2a内を周方向に旋回し、研磨作業が行われる。
In the above configuration, the product to be polished is put into the inner tank 2a of the polishing tank 2 together with an appropriate amount of abrasive selected according to the application, and the entire polishing tank 2 is vibrated by the vibration generator 7, so that the product and the abrasive And so on, while rotating vertically inside the inner tank 2a along the U-shaped cross section while centering on the center tube 1.
The inside of 2a is turned in the circumferential direction, and the polishing operation is performed.

研磨中、製品から剥離したバリのような切削屑や研磨
材屑等の製品屑は、内槽2aに設けた多数の孔8を通して
外槽2bとの空間内に落ちて除去されるので、製品や研磨
材と製品屑とは内槽2aにおいて分離され、製品と研磨材
とが研磨槽2内で混合、攪拌しつつ研磨作業を続けるこ
とになる。
During polishing, product debris such as burrs and abrasive debris peeled off from the product fall into the space with the outer tub 2b through a number of holes 8 provided in the inner tub 2a and are removed. The abrasive and the product waste are separated in the inner tank 2a, and the polishing operation is continued while the product and the abrasive are mixed and stirred in the polishing tank 2.

研磨に際しては研磨材とともに水や薬品等の液体を使
用することも可能である。このため図示していないが外
槽2bには液体の排出口が形成してある。
At the time of polishing, a liquid such as water or a chemical can be used together with the abrasive. For this reason, although not shown, a liquid discharge port is formed in the outer tank 2b.

前記した製品屑は、内外槽2a、2bの空間を通し、液体
排出口を利用して外部に取り出すことができる。また、
研磨に際して液体を使用した場合には、製品屑や液体を
一緒に取り出し、外部のタンク内で製品屑のみを沈殿さ
せ、浄化した水や薬品等は循環使用するようにしてもよ
い。
The above-mentioned product waste can be taken out through the spaces of the inner and outer tanks 2a and 2b and through the liquid outlet. Also,
When a liquid is used for polishing, the product waste and the liquid may be taken out together, only the product waste may be precipitated in an external tank, and purified water or chemicals may be recycled.

研磨が終了した製品や研磨材は、前記の取出口9から
取り出される。
The polished product or abrasive is taken out of the outlet 9 described above.

研磨材や水、薬品等を使用した研磨以外に共摺りの場
合があるが、この場合には製品のみが研磨槽2内に投入
されるので、製品屑だけが発生し、この製品屑も研磨中
に孔8を通して液体排出口から排出すればよい。
In addition to polishing using abrasives, water, chemicals, or the like, there is a case of co-grinding. In this case, only the product is put into the polishing tank 2, so that only product debris is generated. The liquid may be discharged from the liquid discharge port through the hole 8.

従来の単槽構造の研磨槽を使用した場合と、本発明の
二槽構造の研磨槽を使用した場合の共摺りの研磨加工時
間は次の通りである。
The polishing time for co-sliding when the conventional polishing tank having a single tank structure is used and when the polishing tank having a two-tank structure according to the present invention is used are as follows.

「従来装置」 製品:M4平座金(外径8φmm)の場合. 投入量:500Kg・研磨加工時間:150min 製品:M10平座金(外径18φmm)の場合. 投入量:500Kg・研磨加工時間:180min 「本発明装置」 製品:M4平座金(外径8φmm)の場合. 投入量:500Kg・研磨加工時間:90min 製品:M10平座金(外径18φmm)の場合. 投入量:500Kg・研磨加工時間:120min 従来装置と本発明装置とを比較すると、製品により若
干の相違があるが、平均して約30%加工時間を短縮する
ことができた。
"Conventional device" Product: M4 flat washer (outer diameter 8 mm). Input amount: 500Kg ・ Polishing time: 150min Product: M10 flat washer (outer diameter 18φmm). Input amount: 500Kg ・ Polishing time: 180min “This device” Product: M4 flat washer (outer diameter 8φmm). Input amount: 500Kg ・ Polishing time: 90min Product: M10 flat washer (outer diameter 18φmm). Input amount: 500 kg / polishing processing time: 120 min When comparing the conventional apparatus and the apparatus of the present invention, although there is a slight difference depending on the product, the processing time could be reduced by about 30% on average.

第2図は本発明振動加工機の第2の実施例を示し、前
記の実施例と同じ部分は同じ符号を使用している。
FIG. 2 shows a second embodiment of the vibration processing machine of the present invention, and the same parts as those in the above-mentioned embodiment are denoted by the same reference numerals.

本実施例においても前記の実施例と同じく、センター
チューブ1を中心に平面ドーナツ型とした断面U字型の
内外二槽構造の研磨槽2と、円筒状のベース3とをその
間に環状に配設した高張力スプリングやゴムスプリング
等の弾性支持部材4を介して連結し、ベース3内におい
て研磨槽2には、上下の軸端にアンバランスウエイト5,
6を有する振動発生機7を直結してある。
In this embodiment, similarly to the above-described embodiment, a polishing tank 2 having an inner / outer two-tank structure having a U-shaped cross section and a cylindrical donut shape centered on a center tube 1 and a cylindrical base 3 are annularly arranged therebetween. It is connected via an elastic support member 4 such as a high tension spring or a rubber spring provided in the polishing tank 2 in the base 3.
A vibration generator 7 having 6 is directly connected.

本実施例においては、研磨機の外部に製品加工用液体
タンク10を設置し、タンク10のポンプ11と二槽構造研磨
槽2の外槽2bに設けた液体入口12とをパイプで連結する
とともに外槽2bに設けたオーバーフロー口13とタンク10
とをそれぞれに連結し、研磨槽2とタンク10間に液体を
循環可能にしたことを特徴としている。
In the present embodiment, a product processing liquid tank 10 is installed outside the polishing machine, and a pump 11 of the tank 10 and a liquid inlet 12 provided in an outer tank 2b of the two-tank polishing tank 2 are connected by a pipe. Overflow port 13 and tank 10 provided in outer tank 2b
Are connected to each other so that the liquid can be circulated between the polishing tank 2 and the tank 10.

タンク10内には、加工目的に応じて洗浄剤、防錆剤、
コーテイング剤等を所定量入れておき、研磨槽2の内槽
2a内にはすでに研磨を終了した製品を投入し、振動発生
機7によって研磨槽2全体を振動させつつタンク10から
液体を研磨槽2内に送り込めば、製品の洗浄、防錆加工
またはコーテイング加工が施され、汚濁液はオーバーフ
ロー口13からタンク10に循環され、浄化した液体が研磨
槽2内に送られる。
Inside the tank 10, cleaning agent, rust inhibitor,
A predetermined amount of a coating agent or the like is put in the inner tank of the polishing tank 2.
A product which has already been polished is put into 2a, and a liquid is sent from the tank 10 into the polishing tank 2 while the entire polishing tank 2 is vibrated by the vibration generator 7, so that the product can be washed, rust-proofed or coated. After the processing, the contaminated liquid is circulated from the overflow port 13 to the tank 10, and the purified liquid is sent into the polishing tank 2.

所定の加工作業が終了した後、液体は、液体入口12か
らタンク10へと逆流させるか、外槽2bに設けた液体排出
口を利用してタンク10内に採り入れる。そして、加工後
の製品は、製品取出口9を利用して取り出せばよい。
After the predetermined processing operation is completed, the liquid is made to flow backward from the liquid inlet 12 to the tank 10, or is taken into the tank 10 using the liquid outlet provided in the outer tank 2b. Then, the processed product may be taken out using the product outlet 9.

コーテイング剤としてはポリマー、タングステン粉、
色素添加剤等が使用できる。コーテイング加工の場合、
研磨製品だけでなく、その他の一般的な製品のコーテイ
ング処理を行うことも可能である。
Polymers, tungsten powders,
Dye additives and the like can be used. In the case of coating processing,
It is also possible to perform a coating process on not only the abrasive product but also other general products.

上記する第1および第2の実施例において、二槽構造
の研磨槽2のうち内槽2aは、製品屑排出のために複数の
孔8を形成した場合について説明したが、これに限定さ
れるものではなく、多数の孔8を穿設した板体に変え
て、網目状の板体を平面ドーナツ型で断面をU字型に折
り曲げて形成したものを内槽2aとして使用することも可
能である。この場合の網目の大きさも研磨、加工すべき
製品の大きさや材質等によって選択される。
In the above-described first and second embodiments, the case where the inner tank 2a of the polishing tank 2 having the two-tank structure has a plurality of holes 8 for discharging product waste has been described, but the present invention is not limited to this. Instead of a plate having a large number of holes 8 formed therein, it is also possible to use a mesh-shaped plate formed by bending a cross-section into a U-shape with a flat donut shape as the inner tank 2a. is there. The size of the mesh in this case is also selected according to the size and material of the product to be polished and processed.

〔発明の効果〕〔The invention's effect〕

以上、説明した本発明によれば、請求項1において研
磨槽2を内槽2aと外槽2bとの二槽構造と、製品を研磨す
べき内槽2aは、製品と製品屑とを分離できる構造とした
ので、製品の研磨加工(バリ取り、スケール落とし、カ
エリ取り、荒研磨、精密研磨、光沢研磨、つや出し)中
に生じたバリのような製品屑は二重の内槽2aと外槽2bと
の間に落ち、研磨すべき製品は内槽2a内に残るので、製
品の表面が製品屑により傷つけられることはない。従っ
て、不良品が生ずることがなく、研磨効果、製品価値を
高めることができる。
According to the present invention described above, the polishing tank 2 of the first embodiment has a two-tank structure of the inner tank 2a and the outer tank 2b, and the inner tank 2a for polishing the product can separate the product and the product waste. Due to the structure, product debris such as burrs generated during product polishing (burr removal, descaling, burring, rough polishing, precision polishing, gloss polishing, and polishing) are removed by double inner tank 2a and outer tank 2b, the product to be polished remains in the inner tank 2a, so that the surface of the product is not damaged by the product debris. Therefore, the polishing effect and the product value can be enhanced without producing defective products.

更に、作業時間を短縮し、作業効率が良好である。研
磨終了後においても、取り出した製品と研磨材との選り
分けを容易に行うことができる。
Furthermore, work time is shortened and work efficiency is good. Even after the polishing is completed, it is possible to easily select the product taken out and the abrasive.

内槽2aの全面は、孔8や網目によって凹凸面が形成さ
れ、平滑面を有していないので、水や薬品等の液体を使
用した時、液体を介して製品が内槽2a面に密着すること
がないので、研磨終了後の製品の取り出しを短時間で容
易に行うことができる。
The entire surface of the inner tank 2a has an uneven surface formed by holes 8 and meshes and has no smooth surface, so when a liquid such as water or chemical is used, the product adheres to the inner tank 2a surface via the liquid. Therefore, it is possible to easily take out the product after polishing is completed in a short time.

また、請求項2においては内槽2aと外槽2bとの二槽構
造からなる研磨槽2と液体タンク10とを直結したので、
前記する効果の他に研磨後の製品の洗浄、防錆、コーテ
イング等の各種の加工処理を行うことができ、研磨製品
の洗浄の他に一般製品も被覆ムラの少ない均一な防錆処
理あるいはコーテイング処理ができるもきであり、加工
表面が良く、防錆剤やコーテイング剤の節約ができ、ラ
ンニングコストが安くすることができるものである。
Further, in the second aspect, the polishing tank 2 and the liquid tank 10 having a two-tank structure of the inner tank 2a and the outer tank 2b are directly connected.
In addition to the above-mentioned effects, it is possible to perform various processing processes such as cleaning, rust prevention, and coating of products after polishing. In addition to cleaning of polished products, general products also have uniform rust prevention or coating with less coating unevenness. It can be treated, has a good processed surface, can save rust preventives and coating agents, and can reduce running costs.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明振動加工機の一実施例を示す、中央から
片側を縦断面とした正面図、第2図は本発明の他の実施
例を示す装置の正面図、第3図は従来の振動研磨機を示
す、中央から片側を縦断面とした正面図である。 1はセンターチューブ、2は研磨槽、2aは内槽、2bは外
槽、3はベース、4は弾性支持部材、5、6はアンバラ
ンスウエイト、7は振動発生機、8は孔、9は製品取出
口、aはセンターチューブ、bは研磨槽、cはベース、
dは振動発生機、eは弾性支持部材、f、gはアンバラ
ンスウエイトである。
FIG. 1 is a front view showing one embodiment of the vibration processing machine of the present invention in which one side from the center is a longitudinal section, FIG. 2 is a front view of an apparatus showing another embodiment of the present invention, and FIG. FIG. 2 is a front view of the vibration polishing machine of FIG. 1 is a center tube, 2 is a polishing tank, 2a is an inner tank, 2b is an outer tank, 3 is a base, 4 is an elastic supporting member, 5 and 6 are unbalanced weights, 7 is a vibration generator, 8 is a hole, and 9 is a hole. Product outlet, a is a center tube, b is a polishing tank, c is a base,
d is a vibration generator, e is an elastic support member, and f and g are unbalanced weights.

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】センターチューブを中心にして平面ドーナ
ツ型とした断面U字型の研磨槽を円筒状のベース上に載
せて弾性支持部材により連結し、上下の軸端にアンバラ
ンスウエイトを設けた振動発生機により研磨槽を振動さ
せ、研磨槽内において製品を研磨する振動加工機におい
て、研磨槽2を所定の相対間隔を有して同形状とした内
槽2aと外槽2bの二槽構造とし、製品取出口9を設けた内
槽2aは、製品と切削屑や研磨材屑等の製品屑とを分離
し、製品屑を内槽2aと外槽2bとの間に排出可能としたこ
とを特徴とする振動加工機。
1. A polishing vessel having a U-shaped cross section having a flat donut shape centered on a center tube is mounted on a cylindrical base and connected by an elastic support member, and unbalanced weights are provided at upper and lower shaft ends. In a vibration processing machine that vibrates a polishing tank by a vibration generator and polishes a product in the polishing tank, a two-tank structure of an inner tank 2a and an outer tank 2b in which the polishing tank 2 has the same shape with a predetermined relative interval. The inner tank 2a provided with the product outlet 9 separates the product from product chips such as cutting chips and abrasive chips, and allows the product chips to be discharged between the inner tank 2a and the outer tank 2b. A vibration processing machine characterized by the following.
【請求項2】センターチューブを中心にして平面ドーナ
ツ型とした断面U字型の研磨槽を円筒状のベース上に載
せて弾性支持部材により連結し、上下の軸端にアンバラ
ンスウエイトを設けた振動発生機により研磨槽を振動さ
せ、研磨槽内において製品を研磨する振動加工機におい
て、所定の相対間隔を有して同形状とした内槽2a、外槽
2bの二槽構造とするとともに製品取出口9を有する内槽
2aは製品と製品屑とを分離して製品屑を外槽2bとの間に
排出可能とした研磨槽2と、洗浄剤や防錆剤、コーテイ
ング剤等を収容可能なタンク10とからなり、タンク10の
ポンプ11と外槽2bの液体入口12をパイプで連結するとと
もに外槽2bに設けたオーバーフロー口13とタンク10とを
連結したことを特徴とする振動加工機。
2. A polishing vessel having a U-shaped cross section and having a flat donut shape centered on a center tube is mounted on a cylindrical base and connected by an elastic support member, and unbalanced weights are provided at upper and lower shaft ends. In a vibration processing machine that vibrates a polishing tank by a vibration generator and polishes a product in the polishing tank, an inner tank 2a and an outer tank that have the same shape with predetermined relative intervals.
Inner tank with 2b structure and product outlet 9
2a is composed of a polishing tank 2 capable of separating product and product waste and discharging the product waste to an outer tank 2b, and a tank 10 capable of storing a cleaning agent, a rust inhibitor, a coating agent, and the like. A vibration processing machine, wherein a pump 11 of a tank 10 and a liquid inlet 12 of an outer tank 2b are connected by a pipe, and an overflow port 13 provided in the outer tank 2b is connected to the tank 10.
JP1165340A 1989-06-29 1989-06-29 Vibration processing machine Expired - Lifetime JP2785042B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1165340A JP2785042B2 (en) 1989-06-29 1989-06-29 Vibration processing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1165340A JP2785042B2 (en) 1989-06-29 1989-06-29 Vibration processing machine

Publications (2)

Publication Number Publication Date
JPH0332567A JPH0332567A (en) 1991-02-13
JP2785042B2 true JP2785042B2 (en) 1998-08-13

Family

ID=15810482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1165340A Expired - Lifetime JP2785042B2 (en) 1989-06-29 1989-06-29 Vibration processing machine

Country Status (1)

Country Link
JP (1) JP2785042B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100618599B1 (en) * 2006-06-13 2006-09-06 주식회사 코아 에프앤티 Machine for recovering volatile organic compounds
CN113352226A (en) * 2021-05-28 2021-09-07 苏州市安派精密电子有限公司 Vibration grinding and polishing machine capable of quickly replacing grinding materials for electroplating products

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5783361A (en) * 1980-11-06 1982-05-25 Ietatsu Ono Circulating type vibrative barrel polishing device
JPS58177264A (en) * 1982-04-12 1983-10-17 Shintou Bureetaa Kk Annular vibrating barrel polishing machine

Also Published As

Publication number Publication date
JPH0332567A (en) 1991-02-13

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