JP2774765B2 - Solvent composition - Google Patents
Solvent compositionInfo
- Publication number
- JP2774765B2 JP2774765B2 JP5336283A JP33628393A JP2774765B2 JP 2774765 B2 JP2774765 B2 JP 2774765B2 JP 5336283 A JP5336283 A JP 5336283A JP 33628393 A JP33628393 A JP 33628393A JP 2774765 B2 JP2774765 B2 JP 2774765B2
- Authority
- JP
- Japan
- Prior art keywords
- compounds
- group
- compound
- solvent
- silane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002904 solvent Substances 0.000 title claims description 21
- 239000000203 mixture Substances 0.000 title claims description 16
- -1 ketone compounds Chemical class 0.000 claims description 23
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 18
- 125000004428 fluoroalkoxy group Chemical group 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 125000001153 fluoro group Chemical group F* 0.000 claims description 8
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 150000001298 alcohols Chemical class 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 4
- 150000002430 hydrocarbons Chemical class 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 150000002170 ethers Chemical class 0.000 claims description 3
- 150000002897 organic nitrogen compounds Chemical class 0.000 claims description 3
- 150000002898 organic sulfur compounds Chemical class 0.000 claims description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- 150000003377 silicon compounds Chemical class 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 description 23
- 238000001228 spectrum Methods 0.000 description 11
- 238000004140 cleaning Methods 0.000 description 10
- 229910052801 chlorine Inorganic materials 0.000 description 8
- 125000001309 chloro group Chemical group Cl* 0.000 description 7
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 7
- 239000012459 cleaning agent Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 238000009835 boiling Methods 0.000 description 5
- 238000002329 infrared spectrum Methods 0.000 description 5
- 229910000077 silane Inorganic materials 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000006378 damage Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003599 detergent Substances 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 150000008282 halocarbons Chemical class 0.000 description 3
- 239000010721 machine oil Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- PSQZJKGXDGNDFP-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropan-1-ol Chemical compound OCC(F)(F)C(F)(F)F PSQZJKGXDGNDFP-UHFFFAOYSA-N 0.000 description 2
- JNYLMODTPLSLIF-UHFFFAOYSA-N 6-(trifluoromethyl)pyridine-3-carboxylic acid Chemical group OC(=O)C1=CC=C(C(F)(F)F)N=C1 JNYLMODTPLSLIF-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 2
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000000806 fluorine-19 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 2
- 238000001819 mass spectrum Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- DWAWYEUJUWLESO-UHFFFAOYSA-N trichloromethylsilane Chemical compound [SiH3]C(Cl)(Cl)Cl DWAWYEUJUWLESO-UHFFFAOYSA-N 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- XZNOAVNRSFURIR-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoro-2-(trifluoromethyl)propan-2-ol Chemical compound FC(F)(F)C(O)(C(F)(F)F)C(F)(F)F XZNOAVNRSFURIR-UHFFFAOYSA-N 0.000 description 1
- BOSAWIQFTJIYIS-UHFFFAOYSA-N 1,1,1-trichloro-2,2,2-trifluoroethane Chemical compound FC(F)(F)C(Cl)(Cl)Cl BOSAWIQFTJIYIS-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- 125000004778 2,2-difluoroethyl group Chemical group [H]C([H])(*)C([H])(F)F 0.000 description 1
- 125000004777 2-fluoroethyl group Chemical group [H]C([H])(F)C([H])([H])* 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Chemical class 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- LIXBBKGSQZZHCN-UHFFFAOYSA-N bis(2,2,3,3,4,4,4-heptafluorobutoxy)-dimethylsilane Chemical compound C[Si](C)(OCC(C(C(F)(F)F)(F)F)(F)F)OCC(C(C(F)(F)F)(F)F)(F)F LIXBBKGSQZZHCN-UHFFFAOYSA-N 0.000 description 1
- WYVCGEPVIHOSKR-UHFFFAOYSA-N bis(2,2,3,4,4,4-hexafluorobutoxy)-dimethylsilane Chemical compound C[Si](C)(OCC(C(C(F)(F)F)F)(F)F)OCC(C(C(F)(F)F)F)(F)F WYVCGEPVIHOSKR-UHFFFAOYSA-N 0.000 description 1
- PHEZBELCYRANTA-UHFFFAOYSA-N bis[[1,1,1,3,3,3-hexafluoro-2-(trifluoromethyl)propan-2-yl]oxy]-dimethylsilane Chemical compound FC(F)(F)C(C(F)(F)F)(C(F)(F)F)O[Si](C)(C)OC(C(F)(F)F)(C(F)(F)F)C(F)(F)F PHEZBELCYRANTA-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- MZZUDQYDUDJGHV-UHFFFAOYSA-N diethyl-bis(2,2,2-trifluoroethoxy)silane Chemical compound C(C)[Si](OCC(F)(F)F)(OCC(F)(F)F)CC MZZUDQYDUDJGHV-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- MZHZDQGNWOFXCV-UHFFFAOYSA-N dimethyl-bis(2,2,2-trifluoroethoxy)silane Chemical compound FC(F)(F)CO[Si](C)(C)OCC(F)(F)F MZHZDQGNWOFXCV-UHFFFAOYSA-N 0.000 description 1
- TZGJEZQPIRMTPE-UHFFFAOYSA-N dimethyl-bis(2,2,2-trifluoroethoxy)silane 2,2,2-trifluoroethanol Chemical compound FC(CO)(F)F.C[Si](OCC(F)(F)F)(OCC(F)(F)F)C TZGJEZQPIRMTPE-UHFFFAOYSA-N 0.000 description 1
- BTJLUPVOOANFLA-UHFFFAOYSA-N dimethyl-bis(2,2,3,3,3-pentafluoropropoxy)silane Chemical compound C[Si](OCC(C(F)(F)F)(F)F)(OCC(C(F)(F)F)(F)F)C BTJLUPVOOANFLA-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005108 dry cleaning Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- PSLSGJVBYDKIME-UHFFFAOYSA-N ethyl-tris(2,2,2-trifluoroethoxy)silane Chemical compound CC[Si](OCC(F)(F)F)(OCC(F)(F)F)OCC(F)(F)F PSLSGJVBYDKIME-UHFFFAOYSA-N 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- VBZWSGALLODQNC-UHFFFAOYSA-N hexafluoroacetone Chemical compound FC(F)(F)C(=O)C(F)(F)F VBZWSGALLODQNC-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- WFIGRLRSZIPCQR-UHFFFAOYSA-N methyl-tris(2,2,2-trifluoroethoxy)silane Chemical compound FC(F)(F)CO[Si](C)(OCC(F)(F)F)OCC(F)(F)F WFIGRLRSZIPCQR-UHFFFAOYSA-N 0.000 description 1
- VBTXHVSHBNHQHL-UHFFFAOYSA-N methyl-tris(2,2,3,3,3-pentafluoropropoxy)silane Chemical compound FC(F)(F)C(F)(F)CO[Si](C)(OCC(F)(F)C(F)(F)F)OCC(F)(F)C(F)(F)F VBTXHVSHBNHQHL-UHFFFAOYSA-N 0.000 description 1
- YLPPUENBBJOTGZ-UHFFFAOYSA-N methyl-tris(2,2,3,3-tetrafluoropropoxy)silane Chemical compound C[Si](OCC(C(F)F)(F)F)(OCC(C(F)F)(F)F)OCC(C(F)F)(F)F YLPPUENBBJOTGZ-UHFFFAOYSA-N 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 150000002828 nitro derivatives Chemical class 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- NFHCKGYNEPGFPD-UHFFFAOYSA-N propyl-tris(2,2,2-trifluoroethoxy)silane Chemical compound C(CC)[Si](OCC(F)(F)F)(OCC(F)(F)F)OCC(F)(F)F NFHCKGYNEPGFPD-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000013020 steam cleaning Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- VCZQFJFZMMALHB-UHFFFAOYSA-N tetraethylsilane Chemical compound CC[Si](CC)(CC)CC VCZQFJFZMMALHB-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- MRBWGPMSUYEXDQ-UHFFFAOYSA-N tetrakis(2,2,2-trifluoroethyl) silicate Chemical compound FC(F)(F)CO[Si](OCC(F)(F)F)(OCC(F)(F)F)OCC(F)(F)F MRBWGPMSUYEXDQ-UHFFFAOYSA-N 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 231100000167 toxic agent Toxicity 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229930195735 unsaturated hydrocarbon Chemical class 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Description
【0001】[0001]
【産業上の利用分野】本発明は、フルオロアルコキシ基
を有する有機ケイ素化合物を含む溶剤の組成物、並びに
該有機ケイ素化合物に関するものである。The present invention relates to a composition of a solvent containing an organosilicon compound having a fluoroalkoxy group, and to the organosilicon compound.
【0002】[0002]
【従来の技術】従来よりハロゲン化炭化水素は、プラス
チックやゴム製品、電子部品等の洗浄用溶剤として知ら
れており、それらは塩素原子、または塩素原子とフッ素
原子を有する炭化水素群としての特徴を有している。こ
れらのハロゲン化炭化水素は、不燃性で、安定であっ
て、ワックスや油脂類を溶解することができることから
各種の産業分野に広く使用されている。2. Description of the Related Art Halogenated hydrocarbons are conventionally known as solvents for cleaning plastics, rubber products, electronic parts, etc., and are characterized as a chlorine atom or a hydrocarbon group having a chlorine atom and a fluorine atom. have. These halogenated hydrocarbons are widely used in various industrial fields because they are nonflammable, stable, and can dissolve waxes and oils.
【0003】例えば前記塩素原子を有するものとしては
1,1,1−トリクロロエタン、トリクロロエチレン、
テトラクロロエチレンが、また塩素原子とフッ素原子を
有するもの(以下CFCと称す)としては、トリフルオ
ロトリクロロエタン(以下CFC113と称す)等が知
られており、特に後者のCFC113は低毒性で、しか
もプラスチックやゴム等の表面を侵食しないので広く用
いられている。しかしながら、このように優れた特徴を
有するハロゲン化炭化水素は、この構成元素の1つであ
る塩素原子が触媒となり、地球を取り巻くオゾン層を破
壊することが明らかになったことから、CFC113や
1,1,1−トリクロロエタンは全廃されることが国際
的に決められた。For example, those having a chlorine atom include 1,1,1-trichloroethane, trichloroethylene,
As tetrachloroethylene having a chlorine atom and a fluorine atom (hereinafter, referred to as CFC), trifluorotrichloroethane (hereinafter, referred to as CFC113) and the like are known. Etc. are widely used because they do not erode the surface. However, halogenated hydrocarbons having such excellent characteristics have been shown to destroy the ozone layer surrounding the earth by using a chlorine atom as one of the constituent elements as a catalyst. , 1,1-Trichloroethane has been internationally decided to be abolished.
【0004】このような問題に対処するためにはこれら
に代わる新しい洗浄溶剤の開発が不可欠であるが、例え
ば洗浄溶剤であるCFC113に代わる物質が具体的に
種々検討されているものの、未だ有効な代替物が見いだ
されていない状況にある。例えば米国特許第36682
33号によれば、ジメチルビス(ノナフルオロ−t−ブ
トキシ)シランが溶剤として有用であると記載されてい
る。しかしながら該化合物は分子内にトリフルオロメチ
ル基を6個も有するため、溶解性が著しく低下する。こ
の例ではさらに、該化合物の原料であり分解生成物でも
あるノナフルオロ−t−ブチルアルコールが極めて毒性
の強い化合物であり、該化合物を洗浄剤として用いた場
合には、作業者に害を及ぼす危険性がある。To cope with such problems, it is essential to develop new cleaning solvents to replace them. For example, although various substances in place of CFC113, which is a cleaning solvent, have been specifically studied, they are still effective. No alternative has been found. For example, US Pat.
No. 33 describes that dimethyl bis (nonafluoro-t-butoxy) silane is useful as a solvent. However, since the compound has as many as 6 trifluoromethyl groups in the molecule, its solubility is significantly reduced. Further, in this example, nonafluoro-t-butyl alcohol, which is a raw material and a decomposition product of the compound, is an extremely toxic compound, and when this compound is used as a cleaning agent, there is a danger of harm to workers. There is.
【0005】[0005]
【発明が解決しようとする課題】本発明は、以上の状況
に鑑みてなされたものであり、CFC113等からなる
これまでの洗浄用溶剤がオゾン層の破壊を引き起こすと
いう欠点を解消し、洗浄作用に優れた新規な洗浄溶剤の
組成物を提供するものである。SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and eliminates the disadvantage that a conventional cleaning solvent such as CFC113 causes destruction of the ozone layer. The present invention is to provide a novel cleaning solvent composition excellent in water resistance.
【0006】[0006]
【課題を解決するための手段】本発明は、上記従来技術
の現状に鑑みて鋭意研究を重ねた結果、特定の構造を有
する有機ケイ素化合物、即ち酸素原子と隣接した炭素原
子上にフッ素原子を持たないフルオロアルコキシ基を有
する下記一般式Iの有機ケイ素化合物を含む組成物が、
分子中に塩素を含有しないのでオゾン層を破壊する恐れ
が全くなく、油脂類、塵埃等の洗浄効果に優れ、従来使
用されていたCFC113と同様の適度な溶解力を持つ
ので各種の汚れのみを選択的に溶解除去し、金属、プラ
スチック、エラストマー等からなる複合部品を侵さない
ことを見いだし、本発明を完成するに至った。即ち、本
発明は下記一般式Iで表され、且つ分子内に含まれるト
リフルオロメチル基の数が5個以下である、フルオロア
ルコキシ基を有する有機ケイ素化合物の1種または2種
以上を含んでなる溶剤の組成物を提供するものである。SUMMARY OF THE INVENTION The present invention has been made by conducting intensive studies in view of the state of the prior art, and as a result, an organosilicon compound having a specific structure, that is, a fluorine atom on a carbon atom adjacent to an oxygen atom. A composition comprising an organosilicon compound of the following general formula I having a fluoroalkoxy group not having,
Since there is no chlorine in the molecule, there is no danger of destroying the ozone layer, and it has an excellent cleaning effect on oils and fats, dust, etc., and has the same appropriate dissolving power as CFC113, which has been conventionally used. The present invention has been found to be selectively dissolved and removed, and not to attack composite parts made of metal, plastic, elastomer and the like, and have completed the present invention. That is, the present invention includes one or more organosilicon compounds having a fluoroalkoxy group, represented by the following general formula I, wherein the number of trifluoromethyl groups contained in the molecule is 5 or less. A solvent composition.
【0007】一般式IThe general formula I
【0008】[0008]
【化4】 Embedded image
【0009】本発明において提示される一般式I中で、
R1,R2及びR3で表される、酸素原子と隣接した炭素
原子上にフッ素原子を持たない炭素原子数2〜8の直鎖
または分岐を有するフルオロアルキル基としては、例え
ば、2−フルオロエチル基、2,2−ジフルオロエチル
基、2,2,2−トリフルオロエチル基、3−フルオロ
プロピル基、3,3−ジフルオロプロピル基、3,3,
3−トリフルオロプロピル基、2,2,3,3−テトラ
フルオロプロピル基、2,2,3,3,3−ペンタフル
オロプロピル基、1,1,1,3,3,3−ヘキサフル
オロイソプロピル基、1,1,3,3−テトラフルオロ
イソプロピル基、2−トリフルオロメチル−3,3,3
−トリフルオロプロピル基、2,2,3,4,4,4−
ヘキサフルオロブチル基、ノナフルオロ−t−ブチル
基、2,2,3,3,4,4,4−ヘプタフルオロブチ
ル基、2,2,3,3,4,4,5,5,5−ノナフル
オロペンチル基、2,2,3,3,4,4,5,5,
6,6,6−ウンデカフルオロヘキシル基等が挙げられ
る。これらの基のうち、フッ素原子が2個以上の、炭素
原子数2〜4の直鎖または分岐を有するフルオロアルキ
ル基が好ましく、特にフッ素原子が5個以上のフルオロ
アルキル基を有する化合物は加水分解しにくいのでさら
に好ましい。In the general formula I presented in the present invention,
Examples of the fluoroalkyl group represented by R 1 , R 2 and R 3 having a straight or branched chain of 2 to 8 carbon atoms having no fluorine atom on the carbon atom adjacent to the oxygen atom include 2- Fluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, 3-fluoropropyl group, 3,3-difluoropropyl group, 3,3
3-trifluoropropyl group, 2,2,3,3-tetrafluoropropyl group, 2,2,3,3,3-pentafluoropropyl group, 1,1,1,3,3,3-hexafluoroisopropyl Group, 1,1,3,3-tetrafluoroisopropyl group, 2-trifluoromethyl-3,3,3
-Trifluoropropyl group, 2,2,3,4,4,4-
Hexafluorobutyl group, nonafluoro-t-butyl group, 2,2,3,3,4,4,4-heptafluorobutyl group, 2,2,3,3,4,4,5,5,5-nona Fluoropentyl group, 2,2,3,3,4,4,5,5
6,6,6-undecafluorohexyl group and the like. Among these groups, a linear or branched fluoroalkyl group having 2 or more fluorine atoms and 2 to 4 carbon atoms is preferred, and a compound having a fluoroalkyl group having 5 or more fluorine atoms is preferably hydrolyzed. It is more preferable because it is difficult to perform.
【0010】また本発明においてR4及びR5のアルキル
基としては、メチル基、エチル基、プロピル基、イソプ
ロピル基、ブチル基、イソブチル基、2−ブチル基、t
−ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オ
クチル基等が挙げられる。この中で、R4及びR5は、炭
素原子数1〜4の直鎖または分岐を有するアルキル基で
あることが、該有機ケイ素化合物が適当な沸点範囲にあ
るので好ましい。フルオロアルコキシ基を有する有機ケ
イ素化合物の中でもフルオロアルコキシ基の数が4個で
ある化合物、もしくは上記一般式Iで表わされるフルオ
ロアルコキシ基を有する有機ケイ素化合物の中でも分子
内に含まれるトリフルオロメチル基の数が6個以上の化
合物は、洗浄剤として必要な特性である溶解性が乏しい
か、あるいは水分によって容易に分解して不揮発性の物
質を生成する。従って、分子内に含まれるトリフルオロ
メチル基の数は5個以下であることが必要で、4個以下
であることがより好ましい。In the present invention, the alkyl group of R 4 and R 5 includes a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a 2-butyl group and a t-group.
-Butyl group, pentyl group, hexyl group, heptyl group, octyl group and the like. Among them, R 4 and R 5 are preferably a straight-chain or branched alkyl group having 1 to 4 carbon atoms, since the organosilicon compound has an appropriate boiling point range. Among the organosilicon compounds having a fluoroalkoxy group, compounds having four fluoroalkoxy groups, or among the organosilicon compounds having a fluoroalkoxy group represented by the above general formula I, the trifluoromethyl group contained in the molecule Compounds with a number of 6 or more have poor solubility, which is a property required as a detergent, or are easily decomposed by moisture to form a non-volatile substance. Therefore, the number of trifluoromethyl groups contained in the molecule needs to be 5 or less, and more preferably 4 or less.
【0011】本発明の上記一般式Iで表され、且つ分子
内に含まれるトリフルオロメチル基の数が5個以下であ
る、フルオロアルコキシ基を有する有機ケイ素化合物と
しては、具体的には、ジメチルビス(2,2,2−トリ
フルオロエトキシ)シラン、メチルトリス(2,2,2
−トリフルオロエトキシ)シラン、エチルトリス(2,
2,2−トリフルオロエトキシ)シラン、プロピルトリ
ス(2,2,2−トリフルオロエトキシ)シラン、ジエ
チルビス(2,2,2−トリフルオロエトキシ)シラ
ン、ジメチルビス(1,1,1,3,3,3−ヘキサフ
ルオロイソプロポキシ)シラン、ジエチルビス(1,
1,1,3,3,3−ヘキサフルオロイソプロポキシ)
シラン、メチルトリス(2,2,3,3−テトラフルオ
ロプロポキシ)シラン、ジメチルビス(1,1,3,3
−テトラフルオロプロポキシ)シラン、ジメチルビス
(2,2,3,4,4,4−ヘキサフルオロブトキシ)
シラン、ジメチルビス(2,2,3,3,4,4,4−
ヘプタフルオロブトキシ)シラン、ジメチル(1,1,
1,3,3,3−ヘキサフルオロプロポキシ)(2,
2,2−トリフルオロエトキシ)シラン等が挙げられ
る。The organosilicon compound having a fluoroalkoxy group of the present invention represented by the above general formula I and having no more than 5 trifluoromethyl groups in the molecule is specifically exemplified by dimethyl Bis (2,2,2-trifluoroethoxy) silane, methyltris (2,2,2
-Trifluoroethoxy) silane, ethyltris (2,
2,2-trifluoroethoxy) silane, propyltris (2,2,2-trifluoroethoxy) silane, diethylbis (2,2,2-trifluoroethoxy) silane, dimethylbis (1,1,1,3,3) 3,3-hexafluoroisopropoxy) silane, diethyl bis (1,
1,1,3,3,3-hexafluoroisopropoxy)
Silane, methyltris (2,2,3,3-tetrafluoropropoxy) silane, dimethylbis (1,1,3,3
-Tetrafluoropropoxy) silane, dimethylbis (2,2,3,4,4,4-hexafluorobutoxy)
Silane, dimethyl bis (2,2,3,3,4,4,4-
Heptafluorobutoxy) silane, dimethyl (1,1,
1,3,3,3-hexafluoropropoxy) (2
2,2-trifluoroethoxy) silane and the like.
【0012】[0012]
【0013】これらのフルオロアルコキシ基を有する有
機ケイ素化合物は、公知の方法により製造することがで
きる。例えば、含フッ素アルコール(例えば、ROH:
Rは前記R1,R2またはR3と同じ)をジクロロシラン
またはトリクロロシランと反応させるだけで極めて容易
に得られる(例えば、J.Polaら、Collec
t.Czech.Chem.Commun.、44巻、
750〜755ページ、1979年)。また、ジメチル
ビス(1,1,1,3,3,3−ヘキサフルオロイソプ
ロポキシ)シランのようにジメチルシランとヘキサフル
オロアセトンとの光反応により合成する方法も知られて
いる(A.F.Janzenら、Can.J.Che
m.、43巻、3063〜3068ページ、1965
年)。These organosilicon compounds having a fluoroalkoxy group can be produced by a known method. For example, a fluorinated alcohol (for example, ROH:
R can be obtained very easily only by reacting R 1 , R 2 or R 3 with dichlorosilane or trichlorosilane (for example, J. Pola et al., Collec).
t. Czech. Chem. Commun. , 44 volumes,
750-755, 1979). A method of synthesizing by photoreaction between dimethylsilane and hexafluoroacetone, such as dimethylbis (1,1,1,3,3,3-hexafluoroisopropoxy) silane, is also known (A.F. Janzen et al., Can. J. Che.
m. 43, 3063-3068, 1965
Year).
【0014】これらの化合物は、必要に応じてその他の
成分を更に添加混合することができる。例えば、炭化水
素化合物、アルコール化合物、エーテル化合物、ケトン
化合物、エステル化合物、有機窒素化合物、有機硫黄化
合物および有機ケイ素化合物からなる群から選ばれた1
種または2種以上を、一般式Iで表されるフルオロアル
コキシ基を有する有機ケイ素化合物の重量の1〜50%
を含有してもよい。該炭化水素化合物としては、具体的
にはペンタン、ヘキサン、ヘプタン、オクタン、シクロ
ヘキサン、ベンゼン、トルエン等の脂肪族あるいは芳香
族炭化水素類が挙げられる。またアルコール化合物とし
ては、メタノール、エタノール、プロパノール、イソプ
ロパノール、ブタノール、カルビトール等が挙げられ
る。エーテル化合物としては、ジエチルエーテル、ジイ
ソプロピルエーテル、ジブチルエーテル、ジオキサン、
テトラヒドロフラン、モノグリム、ジグリム等が挙げら
れる。ケトン化合物としては、アセトン、メチルエチル
ケトン、2−ペンタノン、3−ペンタノン、シクロペン
タノン、シクロヘキサノン等が挙げられる。エステル化
合物としては、カルボン酸エステル、例えばギ酸エステ
ル、酢酸エステル等が挙げられる。有機窒素化合物とし
ては、アセトニトリル、ニトロベンゼン、ジメチルホル
ムアミド、N−メチルピロリドン等が挙げられる。有機
硫黄化合物としては、ジメチルスルホキシド、スルホラ
ン等が挙げられる。有機ケイ素化合物としては、具体的
にはテトラメチルシラン、テトラエチルシラン、メトキ
シトリメチルシラン、エトキシトリメチルシラン、ヘキ
サメチルジシロキサン、オクタメチルシクロテトラシロ
キサン等が挙げられる。また、本発明の溶剤の組成物
は、必要により安定化剤を用いてもよい。該安定化剤と
しては、ニトロ化合物、不飽和炭化水素、エポキシ化合
物、フェノール化合物、アルケニルアミン、環状窒素化
合物、不飽和アルコール等が挙げられる。その他、各種
界面活性剤を添加してもよい。These compounds can be further mixed with other components, if necessary. For example, one selected from the group consisting of hydrocarbon compounds, alcohol compounds, ether compounds, ketone compounds, ester compounds, organic nitrogen compounds, organic sulfur compounds and organic silicon compounds
1 or 50% by weight of the organosilicon compound having a fluoroalkoxy group represented by the general formula I
May be contained. Specific examples of the hydrocarbon compound include aliphatic or aromatic hydrocarbons such as pentane, hexane, heptane, octane, cyclohexane, benzene, and toluene. Examples of the alcohol compound include methanol, ethanol, propanol, isopropanol, butanol, carbitol and the like. As ether compounds, diethyl ether, diisopropyl ether, dibutyl ether, dioxane,
Examples include tetrahydrofuran, monoglyme, diglyme and the like. Examples of the ketone compound include acetone, methyl ethyl ketone, 2-pentanone, 3-pentanone, cyclopentanone, cyclohexanone and the like. Examples of the ester compound include carboxylate esters such as formate ester and acetate ester. Examples of the organic nitrogen compound include acetonitrile, nitrobenzene, dimethylformamide, N-methylpyrrolidone and the like. Examples of the organic sulfur compound include dimethyl sulfoxide, sulfolane and the like. Specific examples of the organosilicon compound include tetramethylsilane, tetraethylsilane, methoxytrimethylsilane, ethoxytrimethylsilane, hexamethyldisiloxane, octamethylcyclotetrasiloxane, and the like. In the solvent composition of the present invention, a stabilizer may be used if necessary. Examples of the stabilizer include nitro compounds, unsaturated hydrocarbons, epoxy compounds, phenol compounds, alkenylamines, cyclic nitrogen compounds, unsaturated alcohols and the like. In addition, various surfactants may be added.
【0015】本発明の組成物は、分子内にフッ素原子を
多く有する化合物を含むため不燃性もしくは難燃性であ
り、表面張力が小さいために浸透性に優れている上、蒸
発潜熱が小さいことから乾燥性にも優れ、従来のCFC
113と同程度の溶解力を有することから溶剤として好
適に用いることができる。溶剤としての具体的な用途
は、洗浄剤、水切り剤、ドライクリーニング用溶剤、塗
料用溶剤、抽出用溶剤等である。洗浄剤は、フラック
ス、グリース、油、ワックス、インキ等をガラス、セラ
ミックス、プラスチック、ゴム、金属製各種物品、特に
IC部品、電気機器、精密機械、光学レンズ等の表面か
ら取り除くために用いられる。また、水切り剤は前記物
品を水洗浄した後に、水を表面から取り除くために用い
られる。洗浄方法としては、手拭き、浸漬、スプレー、
揺動、超音波洗浄、蒸気洗浄等を採用すればよい。本発
明の上記有機ケイ素化合物を含む組成物は、洗浄性が良
好で、各種汚れのみを選択的に溶解し、素材、特にプラ
スチックに与える影響も少ない。また、塩素原子を持た
ないため、オゾン層の破壊問題を生じることはない。The composition of the present invention is nonflammable or flame-retardant because it contains a compound having a large number of fluorine atoms in the molecule, has excellent surface permeability due to low surface tension, and has low latent heat of vaporization. Excellent drying properties from conventional CFCs
Since it has the same dissolving power as 113, it can be suitably used as a solvent. Specific uses as a solvent are a detergent, a drainer, a solvent for dry cleaning, a solvent for paint, a solvent for extraction, and the like. The cleaning agent is used to remove flux, grease, oil, wax, ink, and the like from the surface of various articles made of glass, ceramics, plastic, rubber, and metal, particularly, IC parts, electric equipment, precision instruments, optical lenses, and the like. A drainer is used to remove water from the surface after washing the article with water. Cleaning methods include hand wiping, dipping, spraying,
Oscillation, ultrasonic cleaning, steam cleaning, or the like may be employed. The composition containing the above-mentioned organosilicon compound of the present invention has good cleaning properties, selectively dissolves only various stains, and has little effect on materials, especially plastics. Further, since there is no chlorine atom, there is no problem of destruction of the ozone layer.
【0016】[0016]
【実施例】以下、本発明の実施例を示すが、本発明はこ
れに限定されるものではない。 参考例1 ジメチルビス(2,2,3,3,3−ペンタフルオロプ
ロポキシ)シランの合成2,2,3,3,3−ペンタフ
ルオロプロパノール60g(0.4モル)に、ジクロロ
ジメチルシラン26g(0.2モル)を0℃で滴下し
た。徐々に温度を上げ、100℃で13時間、さらに1
40℃で2日間撹拌した。反応液を、精留管を付けて蒸
留して標記化合物を得た。生成物の構造はNMR、IR
スペクトル、マススペクトルにより確認した。収量5
5.1g(収率77.4%)。沸点140℃。The present invention will now be described by way of examples, which should not be construed as limiting the invention. Reference Example 1 Synthesis of dimethylbis (2,2,3,3,3-pentafluoropropoxy) silane In 60 g (0.4 mol) of 2,2,3,3,3-pentafluoropropanol, 26 g of dichlorodimethylsilane ( 0.2 mol) was added dropwise at 0 ° C. Gradually raise the temperature, 100 ° C for 13 hours, 1 more
Stirred at 40 ° C. for 2 days. The reaction solution was distilled by attaching a rectification tube to obtain the title compound. The structure of the product is NMR, IR
Confirmed by spectrum and mass spectrum. Yield 5
5.1 g (77.4% yield). Boiling point 140 ° C.
【0017】1H−NMRスペクトル;δ(CDC
l3):0.24ppm(s,3H),4.10ppm
(t,J=12.9Hz,2H).スペクトルは図1に
示す。19F−NMRスペクトル;δ(CDCl3):−
83.87ppm(s,3F),−125.93ppm
(t,J=12.9Hz,2F).スペクトルは図2に
示す。IRスペクトル;1270,1201,114
8,1100,1031,870,813cm-1.スペ
クトルは図3に示す。GC−MS(CI);(M+H)
+357 参考例2 メチルトリス(2,2,3,3,3−ペンタフルオロプ
ロポキシ)シランの合成2,2,3,3,3−ペンタフ
ルオロプロパノール45g(0.3モル)に、トリクロ
ロメチルシラン15g(0.1モル)を0℃で滴下し
た。室温で3時間撹拌した後、徐々に温度を上げ、14
0℃で13時間、さらに180℃で2時間撹拌した。反
応液を、精留管を付けて蒸留して標記化合物を得た。生
成物の構造はNMR、IRスペクトル、マススペクトル
により確認した。収量39.4g(収率80.4%)。
沸点171℃。 1 H-NMR spectrum; δ (CDC
l 3 ): 0.24 ppm (s, 3H), 4.10 ppm
(T, J = 12.9 Hz, 2H). The spectrum is shown in FIG. 19 F-NMR spectrum; δ (CDCl 3 ):-
83.87 ppm (s, 3F), -125.93 ppm
(T, J = 12.9 Hz, 2F). The spectrum is shown in FIG. IR spectrum; 1270, 1201, 114
8, 1100, 1031, 870, 813 cm -1 . The spectrum is shown in FIG. GC-MS (CI); (M + H)
+357 Reference Example 2 Synthesis of methyltris (2,2,3,3,3-pentafluoropropoxy) silane To 45 g (0.3 mol) of 2,2,3,3,3-pentafluoropropanol and 15 g of trichloromethylsilane (0.1 mol) was added dropwise at 0 ° C. After stirring at room temperature for 3 hours, the temperature was gradually increased to 14
The mixture was stirred at 0 ° C for 13 hours and further at 180 ° C for 2 hours. The reaction solution was distilled by attaching a rectification tube to obtain the title compound. The structure of the product was confirmed by NMR, IR spectrum and mass spectrum. Yield 39.4g (80.4% yield).
Boiling point 171 ° C.
【0018】1H−NMRスペクトル;δ(CDC
l3):0.31ppm(s,1H),4.18ppm
(t,J=12.7Hz,2H).スペクトルは図4に
示す。19 F−NMRスペクトル;δ(CDCl3):−83.
61ppm(s,3F),−125.79ppm(t,
J=12.9Hz,2F).スペクトルは図5に示す。 1 H-NMR spectrum; δ (CDC
l 3 ): 0.31 ppm (s, 1H), 4.18 ppm
(T, J = 12.7 Hz, 2H). The spectrum is shown in FIG. 19 F-NMR spectrum; δ (CDCl 3 ): -83.
61 ppm (s, 3F), -125.79 ppm (t,
J = 12.9 Hz, 2F). The spectrum is shown in FIG.
【0019】IRスペクトル;1279,1206,1
148,1099,1033,870cm-1.スペクト
ルは図6に示す。 GC−MS(CI);(M+H)+491 参考例3 ジメチルビス(2,2,2−トリフルオロエトキシ)シ
ランの合成2,2,2−トリフルオロエタノール200
g(2.0モル)に、ジクロロジメチルシラン129g
(1.0モル)を0℃で1時間かけて滴下した。さらに
室温で19時間、50℃で6時間撹拌した後、1時間加
熱還流した。反応液を、精留管を付けて蒸留して標記化
合物を得た。収量228g(収率89%)。沸点12
0.5〜121.5℃。IR spectrum; 1279, 1206, 1
148, 1099, 1033, 870 cm -1 . The spectrum is shown in FIG. GC-MS (CI); (M + H) +491 Reference Example 3 Synthesis of dimethylbis (2,2,2-trifluoroethoxy) silane 2,2,2-trifluoroethanol 200
g (2.0 mol), 129 g of dichlorodimethylsilane
(1.0 mol) was added dropwise at 0 ° C. over 1 hour. After stirring at room temperature for 19 hours and at 50 ° C. for 6 hours, the mixture was heated under reflux for 1 hour. The reaction solution was distilled by attaching a rectification tube to obtain the title compound. Yield 228 g (89% yield). Boiling point 12
0.5-121.5 ° C.
【0020】参考例4 メチルトリス(2,2,2−トリフルオロエトキシ)シ
ランの合成2,2,2−トリフルオロエタノール305
g(3.05モル)に、トリクロロメチルシラン14
9.5g(1.0モル)を0℃で4時間かけて滴下し
た。さらに室温で24時間撹拌した後、2時間加熱還流
した。反応液を、精留管を付けて蒸留して標記化合物を
得た。収量265g(収率78%)。沸点146.5〜
147.5℃。Reference Example 4 Synthesis of methyltris (2,2,2-trifluoroethoxy) silane 2,2,2-trifluoroethanol 305
g (3.05 moles) with trichloromethylsilane 14
9.5 g (1.0 mol) was added dropwise at 0 ° C. over 4 hours. After further stirring at room temperature for 24 hours, the mixture was heated under reflux for 2 hours. The reaction solution was distilled by attaching a rectification tube to obtain the title compound. Yield 265 g (78% yield). Boiling point 146.5-
147.5 ° C.
【0021】実施例1〜7及び比較例1 SUS−304のテストピースを機械油(日本石油製C
Q−30)中に浸漬した後、本発明の種々の洗浄剤に5
分間浸漬した。目視によって、機械油の除去された程度
を観察した。結果を一括して表1に示した。なお、比較
のため、従来機械油の洗浄剤であるCFC113を溶剤
とした場合を併記した。Examples 1 to 7 and Comparative Example 1 A test piece of SUS-304 was used as a machine oil (C
Q-30) After immersion in various cleaning agents of the present invention,
Soak for minutes. The extent to which the machine oil was removed was visually observed. The results are collectively shown in Table 1. For comparison, a case where CFC113, which is a conventional cleaning agent for machine oil, was used as a solvent is also shown.
【0022】[0022]
【表1】 [Table 1]
【0023】但し、表1中、○は肉眼で見える洗浄残り
がないことを示し、×は、肉眼で見える洗浄残りがある
ことを示す。 実施例8〜12及び比較例2〜3 各プラスチックのテストピースを、本発明の種々の洗浄
剤に45℃で1時間浸漬し、重量変化率は室温で2時間
放置後に、寸法変化率は取り出し直後に測定した。また
比較のため、CFC113、1,1,1−トリクロロエ
タンについても同様の試験を行った。結果はまとめて表
2に示した。In Table 1, ○ indicates that there is no cleaning residue visible to the naked eye, and X indicates that there is cleaning residue visible to the naked eye. Examples 8 to 12 and Comparative Examples 2 to 3 Test pieces of each plastic were immersed in various cleaning agents of the present invention at 45 ° C. for 1 hour, and the weight change rate was left at room temperature for 2 hours, and the dimensional change rate was taken out. Measured immediately. For comparison, a similar test was performed for CFC113, 1,1,1-trichloroethane. The results are summarized in Table 2.
【0024】[0024]
【表2】 [Table 2]
【0025】実施例13〜17及び比較例4〜5 本発明の種々の洗浄剤の有機ケイ素化合物を、水ととも
に室温で1時間、または80℃で4時間振とうし、GC
分析により分解の有無を測定した。また比較のため、フ
ルオロアルコキシ基の数が4個の化合物であるテトラキ
ス(2,2,2−トリフルオロエトキシ)シラン、及び
トリフルオロメチル基の数が6個の化合物物であるトリ
ス(1,1,1,3,3,3−ヘキサフルオロイソプロ
ポキシ)メチルシランについても同様の試験を行った。
結果はまとめて表3に示した。Examples 13 to 17 and Comparative Examples 4 to 5 The organosilicon compounds of various cleaning agents of the present invention were shaken with water for 1 hour at room temperature or 4 hours at 80 ° C.
The presence or absence of decomposition was determined by analysis. For comparison, tetrakis (2,2,2-trifluoroethoxy) silane, which is a compound having four fluoroalkoxy groups, and tris (1,1), which is a compound having six trifluoromethyl groups, are provided. A similar test was conducted for (1,1,3,3,3-hexafluoroisopropoxy) methylsilane.
The results are summarized in Table 3.
【0026】[0026]
【表3】 [Table 3]
【0027】実施例18〜22及び比較例6〜7 本発明の種々の洗浄剤の有機ケイ素化合物50重量部
と、n−ヘキサン50重量部またはカルビトール50重
量部を室温で混合し、溶解性を調べた。結果はまとめて
表4に示した。また比較のため、フルオロアルコキシ基
の数が4個の化合物であるテトラキス(2,2,3,
3,3−ペンタフルオロプロポキシ)シランについて同
様の試験を行ったが、n−ヘキサンとは2層分離し、溶
解性は低かった(比較例6)。またトリフルオロメチル
基の数が6個の化合物であるビス(ノナフルオロ−t−
ブトキシ)ジメチルシランについても同様の試験を行っ
たが、カルビトールとは2層分離し、溶解性は低かった
(比較例7)。Examples 18 to 22 and Comparative Examples 6 to 7 50 parts by weight of an organosilicon compound of various detergents of the present invention and 50 parts by weight of n-hexane or 50 parts by weight of carbitol were mixed at room temperature. Was examined. The results are summarized in Table 4. For comparison, tetrakis (2, 2, 3, 3), which is a compound having 4 fluoroalkoxy groups,
A similar test was conducted for 3,3-pentafluoropropoxy) silane. However, two layers were separated from n-hexane, and the solubility was low (Comparative Example 6). Bis (nonafluoro-t-) which is a compound having 6 trifluoromethyl groups
The same test was carried out for butoxy) dimethylsilane, but it was separated into two layers from carbitol and the solubility was low (Comparative Example 7).
【0028】[0028]
【表4】 [Table 4]
【0029】[0029]
【発明の効果】以上、説明したように、本発明のフルオ
ロアルコキシ基を有する有機ケイ素化合物を含む組成物
は、洗浄性が良好で、素材、特にプラスチックに影響を
与えず、さらに塩素原子を持たないため、オゾン層の破
壊問題を生じることはなく、従来のCFC系溶剤と同じ
使い方ができ、既存装置の大幅な変更を必要とせず、そ
のまま適用できるなど極めて価値の高いものである。As described above, the composition containing the organosilicon compound having a fluoroalkoxy group of the present invention has good detergency, does not affect materials, especially plastics, and has a chlorine atom. Therefore, it does not cause a problem of destruction of the ozone layer, can be used in the same manner as a conventional CFC-based solvent, does not require a significant change in existing equipment, and can be applied as it is.
【図1】本発明の参考例1で得られた化合物の1H−N
MRスペクトル図である。 1 H-N in FIG. 1 of the compound obtained in Reference Example 1 of the present invention
It is an MR spectrum figure.
【図2】本発明の参考例1で得られた化合物の19F−N
MRスペクトル図である。FIG. 2 shows 19 FN of the compound obtained in Reference Example 1 of the present invention.
It is an MR spectrum figure.
【図3】本発明の参考例1で得られた化合物のIRスペ
クトル図である。FIG. 3 is an IR spectrum of the compound obtained in Reference Example 1 of the present invention.
【図4】本発明の参考例2で得られた化合物の1−NM
Rスペクトルである。FIG. 4 shows 1- NM of the compound obtained in Reference Example 2 of the present invention.
It is an R spectrum.
【図5】本発明の参考例2で得られた化合物の19F−N
MRスペクトル図である。FIG. 5 shows 19 FN of the compound obtained in Reference Example 2 of the present invention.
It is an MR spectrum figure.
【図6】本発明の参考例2で得られた化合物のIRスペ
クトル図である。FIG. 6 is an IR spectrum of the compound obtained in Reference Example 2 of the present invention.
───────────────────────────────────────────────────── フロントページの続き (74)上記3名の代理人 弁理士 小松 秀岳 (外3名 ) (72)発明者 関屋 章 茨城県つくば市東1丁目1番 工業技術 院物質工学工業技術研究所内 (72)発明者 星 信人 東京都文京区本郷2−40−17 本郷若井 ビル 財団法人 地球環境産業技術研究 機構内 (72)発明者 小林 勉 東京都文京区本郷2−40−17 本郷若井 ビル 財団法人 地球環境産業技術研究 機構内 審査官 唐木 以知良 (56)参考文献 米国特許2892859(US,A) (58)調査した分野(Int.Cl.6,DB名) C07F 7/12 CA(STN) REGISTRY(STN) WPIDS(STN)──────────────────────────────────────────────────続 き Continued on the front page (74) Attorney Hidetaka Komatsu (3 outside agents) (72) Inventor Akira Sekiya 1-1-1 Higashi, Tsukuba, Ibaraki Pref. (72) Inventor Nobuto Hoshi 2-40-17 Hongo Wakai Building, Bunkyo-ku, Tokyo Within the Institute for Global Environmental Technology Research (72) Inventor Tsutomu Kobayashi 2-40-17 Hongo, Bunkyo-ku, Tokyo Hongo Wakai Building Foundation Examiner at the Institute of Technology for Environmental Innovative Technology Ichiyoshi Karaki (56) Reference US Patent 2882859 (US, A) (58) Fields investigated (Int. Cl. 6 , DB name) C07F 7/12 CA (STN) REGISTRY (STN) WPIDS (STN)
Claims (3)
まれるトリフルオロメチル基の数が5個以下である、フ
ルオロアルコキシ基を有する有機ケイ素化合物の1種ま
たは2種以上を含んでなる溶剤の組成物。 一般式I 【化1】 (R1O)l(R2O)m(R3O)nSiR4rR5s (式中、R1,R2及びR3は酸素原子と隣接した炭素原
子上にフッ素原子を持たない炭素原子数2〜8の直鎖ま
たは分岐を有するフルオロアルキル基を示し、R4及び
R5はアルキル基を示し、l,m,n=0〜3、l+m
+n=2〜3、r,s=0〜2、r+s=1〜2、l+
m+n+r+s=4であることを示す)1. A composition comprising one or more kinds of organosilicon compounds having a fluoroalkoxy group, represented by the following general formula I, wherein the number of trifluoromethyl groups contained in the molecule is 5 or less. Solvent composition. Formula (I) (R 1 O) l (R 2 O) m (R 3 O) nSiR 4 rR 5 s (wherein R 1 , R 2 and R 3 are on a carbon atom adjacent to an oxygen atom Represents a linear or branched fluoroalkyl group having 2 to 8 carbon atoms having no fluorine atom, R 4 and R 5 represent alkyl groups, and l, m, n = 0 to 3, l + m
+ N = 2-3, r, s = 0-2, r + s = 1-2, l +
m + n + r + s = 4)
原子数1〜4の直鎖または分岐を有するアルキル基であ
る請求項1に記載の溶剤の組成物。2. The solvent composition according to claim 1, wherein R 4 and R 5 are the same or different and are linear or branched alkyl groups having 1 to 4 carbon atoms.
ルコール化合物、エーテル化合物、ケトン化合物、エス
テル化合物、有機窒素化合物、有機硫黄化合物および有
機ケイ素化合物からなる群から選ばれた1種または2種
以上を、一般式Iで表されるフルオロアルコキシ基を有
する有機ケイ素化合物の重量の1〜50%を含有してな
る請求項1〜2のいずれかに記載の溶剤の組成物。3. The solvent further comprises one or more selected from the group consisting of hydrocarbon compounds, alcohol compounds, ether compounds, ketone compounds, ester compounds, organic nitrogen compounds, organic sulfur compounds and organic silicon compounds. The solvent composition according to any one of claims 1 to 2, comprising 1 to 50% by weight of the organosilicon compound having a fluoroalkoxy group represented by the general formula I.
Priority Applications (1)
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JP5-153659 | 1993-06-24 | ||
JP15365993 | 1993-06-24 | ||
JP5336283A JP2774765B2 (en) | 1993-06-24 | 1993-12-28 | Solvent composition |
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JPH0770151A JPH0770151A (en) | 1995-03-14 |
JP2774765B2 true JP2774765B2 (en) | 1998-07-09 |
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JP2756410B2 (en) * | 1994-03-11 | 1998-05-25 | 工業技術院長 | Medium comprising fluorine-containing silicon compound |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2892859A (en) | 1955-05-20 | 1959-06-30 | Research Corp | Fluorine-containing alkoxyalkylsilanes |
-
1993
- 1993-12-28 JP JP5336283A patent/JP2774765B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2892859A (en) | 1955-05-20 | 1959-06-30 | Research Corp | Fluorine-containing alkoxyalkylsilanes |
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