JP2767052B2 - Automatic polishing device for piezoelectric pieces - Google Patents

Automatic polishing device for piezoelectric pieces

Info

Publication number
JP2767052B2
JP2767052B2 JP1047855A JP4785589A JP2767052B2 JP 2767052 B2 JP2767052 B2 JP 2767052B2 JP 1047855 A JP1047855 A JP 1047855A JP 4785589 A JP4785589 A JP 4785589A JP 2767052 B2 JP2767052 B2 JP 2767052B2
Authority
JP
Japan
Prior art keywords
polishing
plate
conductive
electrode
disposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1047855A
Other languages
Japanese (ja)
Other versions
JPH02224969A (en
Inventor
俊夫 林
純史 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Dempa Kogyo Co Ltd
Original Assignee
Nihon Dempa Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Dempa Kogyo Co Ltd filed Critical Nihon Dempa Kogyo Co Ltd
Priority to JP1047855A priority Critical patent/JP2767052B2/en
Publication of JPH02224969A publication Critical patent/JPH02224969A/en
Application granted granted Critical
Publication of JP2767052B2 publication Critical patent/JP2767052B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、圧電片の板面の研磨を所望の共振周波数に
対して自動的に行うことができる圧電片の自動研磨装置
に関する。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an automatic piezoelectric piece polishing apparatus capable of automatically polishing a plate surface of a piezoelectric piece at a desired resonance frequency.

(発明の技術的背景) 従来、たとえば水晶振動子の製造工程では、原石を結
晶軸に対して所定角度に切断した後、表面層の加工傷、
加工歪を除去するとともに所望の共振周波数を得るよう
に所定の厚みまで研磨するようにしている。特に厚み滑
り振動系の振動子では共振周波数は厚みによって決定さ
れるために、極めて正確に制御されなければならない。
(Technical Background of the Invention) Conventionally, for example, in a manufacturing process of a quartz oscillator, after cutting a rough at a predetermined angle with respect to a crystal axis, processing scratches on a surface layer,
Polishing is performed to a predetermined thickness so as to remove a processing strain and obtain a desired resonance frequency. In particular, in a vibrator of a thickness-shear vibration system, the resonance frequency is determined by the thickness, and therefore must be controlled very accurately.

したがって、このような研磨を行う研磨装置では、水
晶片の外形形状が特性に与える影響が大きく、特に厚み
が周波数を決定することから欠損等を生じることなく精
密な研磨を行えることが要求されている。
Therefore, in a polishing apparatus for performing such polishing, it is required that the external shape of the quartz piece has a large effect on characteristics, and in particular, since the thickness determines the frequency, it is required to be able to perform precise polishing without causing defects or the like. I have.

また、このような研磨作業は、鋳鉄製の上、下定盤を
用いて比較的、粒子の荒い研磨材によって研磨を行う、
いわゆるラッピングといわれる工程と、上記定盤の対向
面エポキシ樹脂等を固化した研磨板を設け、比較的粒子
の細かい研磨材を用いて研磨を行う、いわゆるポリッシ
ングといわれる工程がある。
In addition, such a polishing operation, using a cast iron upper and lower stool, relatively polished with an abrasive having a coarse particle,
There is a process called so-called lapping, and a process called so-called polishing in which a polishing plate in which an epoxy resin or the like on the opposite surface of the surface plate is solidified and polishing is performed using an abrasive having relatively fine particles.

第3図は圧電片をポリッシング研磨する従来の4輪駆
動の研磨装置の一例を示す斜視図で、本体1に図示しな
い遊星運動機構部を設けて、同軸に中心から第1、第
2、第3および第4の駆動軸2、3、4、5を設けてい
る。
FIG. 3 is a perspective view showing an example of a conventional four-wheel drive polishing apparatus for polishing and polishing a piezoelectric piece. Third and fourth drive shafts 2, 3, 4, and 5 are provided.

そして、本体1の上面に下定盤6を配設している。こ
の下定盤6は、中央に透孔を有する円盤状の硬質鋼材6A
の上面にエポキシ樹脂等を固化した研磨板6Bを添設し
て、上記第3の駆動軸4によって回転駆動するようにし
ている。
The lower surface plate 6 is provided on the upper surface of the main body 1. The lower platen 6 is a disc-shaped hard steel material 6A having a through hole in the center.
A polishing plate 6B in which an epoxy resin or the like is solidified is attached to the upper surface of the device, and is rotated by the third drive shaft 4.

そして、この下定盤6の中心部を貫通して内周に太陽
ギア7、外周にインターナルギア8をそれぞれ配設して
いる。この太陽ギア7は上記第2の駆動軸3で回転駆動
し、インターナルギア8は上記第4の駆動軸5で回転駆
動するようにしている。
A sun gear 7 is provided on the inner periphery and an internal gear 8 is provided on the outer periphery through the center of the lower platen 6. The sun gear 7 is rotationally driven by the second drive shaft 3, and the internal gear 8 is rotationally driven by the fourth drive shaft 5.

そして、上記下定盤6に対面して上定盤9を設けてい
る。この上定盤9も円盤状の硬質鋼材9Aの下面にエポキ
シ樹脂等を固化した研磨板9Bを添設し、第1の駆動軸2
および駆動ギア10を介して回転駆動するようにしてい
る。
An upper surface plate 9 is provided facing the lower surface plate 6. The upper surface plate 9 also has a polishing plate 9B in which epoxy resin or the like is solidified on the lower surface of a disk-shaped hard steel material 9A.
In addition, the driving gear 10 is driven to rotate.

そして、たとえば第2図に示すように上定盤9は、本
体1から突設した支柱10の先端部のエアシリンダ11によ
って昇降自在に保持している。
For example, as shown in FIG. 2, the upper platen 9 is held by an air cylinder 11 at the tip of a column 10 protruding from the main body 1 so as to be able to move up and down.

さらに上・下定盤6、9の間に配設したキャリア13
は、研磨すべき被研磨材14、たとえば水晶片を保持する
ための複数の保持孔13Aを形成した遊星歯車であり、太
陽ギア7およびインターナルギア8の双方に歯合して遊
星運転を行う。
Further, the carrier 13 arranged between the upper and lower platens 6, 9
Is a planetary gear formed with a plurality of holding holes 13A for holding a workpiece 14 to be polished, for example, a crystal piece, and meshes with both the sun gear 7 and the internal gear 8 to perform a planetary operation.

そして、太陽ギア7とインターナルギア8は同方向
に、上定盤9と下定盤6とは互いに反対方向に図示しな
い駆動機構により回転駆動するようにしている。
The sun gear 7 and the internal gear 8 are driven to rotate in the same direction, and the upper surface plate 9 and the lower surface plate 6 are driven in opposite directions by a drive mechanism (not shown).

したがって、水晶片14をキャリア13の保持孔13Aに保
持して上定盤9を下降させ、太陽ギア7、インターナル
ギア8、上・下定盤9、6を回転させると、水晶片14は
上・下定盤9、6に押圧されて両主面を研磨することが
できる。
Therefore, when the crystal blank 14 is held in the holding hole 13A of the carrier 13 and the upper platen 9 is lowered, and the sun gear 7, the internal gear 8, and the upper and lower platens 9 and 6 are rotated, the crystal plate 14 becomes upper and lower. Both main surfaces can be polished by being pressed by the lower stools 9 and 6.

なお、キャリア13の厚みは水晶片14の厚みよりも薄く
設定し、かつ上・下定盤9、6の間には研磨剤を投入し
て研磨作業を行うようにしている。
The thickness of the carrier 13 is set to be smaller than the thickness of the crystal blank 14, and an abrasive is supplied between the upper and lower platens 9 and 6 to perform a polishing operation.

(従来技術の問題点) しかしながら、このようなものでは、水晶片の厚みは
研磨時間あるいは定盤の回転数から推定することにな
り、目的の厚みに近くなるとたびたび運転を停止して研
磨中の水晶片の共振周波数を測定する必要があり運転効
率を低下させ、コストの上昇する原因となっている。
(Problems of the prior art) However, in such a device, the thickness of the crystal blank is estimated from the polishing time or the number of revolutions of the platen. It is necessary to measure the resonance frequency of the crystal blank, which lowers the operation efficiency and raises the cost.

一方近時、作業効率を向上し品質の安定化を図るため
に研磨作業を自動化することが望まれ、所望の厚みにお
いて研磨作業を自動的に終了することが考えられてい
る。
On the other hand, recently, it is desired to automate the polishing operation in order to improve the operation efficiency and stabilize the quality, and it has been considered that the polishing operation is automatically terminated at a desired thickness.

しかしながら、第3図に示すような従来の研磨装置で
は、研磨中の水晶片に対して電気的な結合を得られない
ので、その共振周波数を測定することができず研磨作業
の終了時点を自動的に知ることはできなかった。
However, the conventional polishing apparatus as shown in FIG. 3 cannot obtain electrical coupling to the quartz piece being polished, so that its resonance frequency cannot be measured and the end point of the polishing operation is automatically determined. Could not be known.

(発明の目的) 本発明は、上記の事情に鑑みてなされたもので、研磨
中の圧電片の厚みをその共振周波数から正確に把握する
ことができ研磨作業を自動的に行うことができる圧電片
の研磨装置を提供することを目的とするものである。
(Purpose of the Invention) The present invention has been made in view of the above circumstances, and a piezoelectric material capable of accurately grasping the thickness of a piezoelectric piece being polished from its resonance frequency and automatically performing a polishing operation. It is an object of the present invention to provide a piece polishing apparatus.

(発明の概要) 本発明は、回転中心に太陽ギアを配設し、この太陽ギ
アの外周にインターナルギアを設けて、研磨すべき圧電
片を保持する多数の保持孔を有するキャリアを上記太陽
ギアおよびインターナルギアに歯合して遊星運動させ、
このキャリアの上面および下面に金属製の円盤の対向面
に非導電性の研磨板を添設した上定盤および下定盤を配
設し、この上定盤および下定盤の各研磨板に透孔を穿設
して導電性物質を充填して固化させた第1の電極および
誘電体からなる第2の電極を設け、この電極を介して接
続した上記圧電片の共振周波数を制御部で目的とする周
波数と比較して研磨作業を制御することを特徴とするも
のである。
(Summary of the Invention) According to the present invention, a sun gear is provided at the center of rotation, an internal gear is provided around the sun gear, and the carrier having a large number of holding holes for holding the piezoelectric pieces to be polished is provided by the sun gear. And mesh with the internal gear to make planetary motion,
An upper platen and a lower platen having a non-conductive polishing plate attached to a metal disk on the upper and lower surfaces of the carrier are provided on each of the upper platen and the lower platen. A first electrode solidified by filling a conductive substance with a conductive material, and a second electrode made of a dielectric material. The resonance frequency of the piezoelectric piece connected via this electrode is determined by the control unit as an object. The polishing operation is controlled in comparison with the frequency of the polishing.

(実施例) 以下、本発明の一実施例を、第1図に示す要部の断面
図、第2図に示す全体の斜視図を参照して詳細に説明す
る。なお第3図と同一部材には同一符号を付与してその
説明を省略する。
(Example) Hereinafter, an example of the present invention will be described in detail with reference to a cross-sectional view of a main part shown in FIG. 1 and an overall perspective view shown in FIG. Note that the same members as those in FIG. 3 are denoted by the same reference numerals, and description thereof is omitted.

図中6は下定盤で、この上面にエポキシ樹脂等を固化
した研磨板6Bを設け、この研磨板6Bに回転軸を中心とし
てリング状に溝を穿設してここに導電性物質、たとえば
導電性接着剤、高分子誘電体、鉛、錫あるいはこれらの
合金等の柔らかい金属を充填して固化させリング状の第
1の電極21を形成し、この第1の電極21を下定盤6の硬
質鋼材6Aに電気的に導通させている。
In the drawing, reference numeral 6 denotes a lower surface plate, on which a polishing plate 6B in which epoxy resin or the like is solidified is provided, and a groove is formed in the polishing plate 6B in a ring shape around the rotation axis. A ring-shaped first electrode 21 is formed by filling and solidifying a soft metal such as a conductive adhesive, a polymer dielectric, lead, tin, or an alloy thereof. It is electrically connected to the steel material 6A.

また9は上定盤で、この研磨板9Bに透孔を穿設して強
誘電体からなる第2の電極22を設けている。なおこの第
2の電極22は下定盤6に対向する先端部を除いて周囲に
絶縁材23を配設して上定盤9の硬質鋼材9Aに対して電気
的な絶縁を確保するようにしている。
Reference numeral 9 denotes an upper surface plate, which is provided with a second electrode 22 made of a ferroelectric material by forming a through hole in the polishing plate 9B. The second electrode 22 is provided with an insulating material 23 around the lower platen 6 except for a tip portion facing the lower platen 6 so as to secure electrical insulation from the hard steel material 9A of the upper platen 9. I have.

そして、上記上定盤9の第2の電極22をケーブルを介
して制御部24に接続して第1の電極21、第2の電極22の
間にはさまれた研磨中の圧電片の共振周波数を測定する
ことができるようにしている。
Then, the second electrode 22 of the upper platen 9 is connected to the control unit 24 via a cable, and the resonance of the piezoelectric piece during polishing sandwiched between the first electrode 21 and the second electrode 22 is performed. The frequency can be measured.

なおこの場合、雑音成分および電極21、22と圧電片と
の不完全な接触等により圧電片の共振周波数を正確に測
定できないことがある。このような場合、たとえば共振
周波数の測定を同一の圧電片に対して複数回行って、そ
の測定値が全て一致したときにのみ真値とみなし、異な
る測定値が含まれるときは雑音と見なすようにすればよ
い。
In this case, the resonance frequency of the piezoelectric piece may not be accurately measured due to a noise component, incomplete contact between the electrodes 21 and 22 and the piezoelectric piece, or the like. In such a case, for example, measurement of the resonance frequency is performed a plurality of times on the same piezoelectric piece, and when all the measured values match, it is regarded as a true value, and when different measured values are included, it is regarded as noise. What should I do?

このような構成であれば、各キャリア13の保持孔13A
に圧電片14を保持して図示しない駆動源により各駆動軸
2、3、4、5を回転駆動すれば、キャリヤ13はそれぞ
れ自転しつつ太陽ギア7の周りを公転する。そして圧電
片14は上定盤9および下定盤6の間で摺動するのでその
主面を平行かつ精密に研磨することができる。
With such a configuration, the holding holes 13A of each carrier 13
When the driving shafts 2, 3, 4, and 5 are rotationally driven by a driving source (not shown) while holding the piezoelectric piece 14, the carrier 13 revolves around the sun gear 7 while rotating. Since the piezoelectric piece 14 slides between the upper surface plate 9 and the lower surface plate 6, the main surfaces thereof can be polished parallel and precisely.

しかして、第1の電極21を形成する導電性接着剤はエ
ポキシ系接着剤に、たとえば薄片状の銀等の金属を混練
して導電性をもたせるようにしているので硬化時の硬度
が研磨板6Bを構成するエポキシ系の接着剤にほぼ等し
く、研磨作業時に圧電片14を損傷することなく電気的な
導通を得ることができる。
The conductive adhesive for forming the first electrode 21 is made of an epoxy-based adhesive, for example, by kneading a metal such as flaky silver so that the conductive material has conductivity. It is almost equal to the epoxy-based adhesive constituting 6B, so that electrical conduction can be obtained without damaging the piezoelectric piece 14 during the polishing operation.

また第1の電極21に柔らかい金属等を用いる場合も、
その硬度を研磨板6Bに略等しくする必要がある。
Also, when a soft metal or the like is used for the first electrode 21,
It is necessary to make its hardness substantially equal to that of the polishing plate 6B.

なお第2の電極22に用いる強誘電体もその硬度が硬化
したエポキシ樹脂に略等しい材料を用いるようにしてい
る。したがって、第1の電極21と同一材料の導電製接着
剤を固化したもの、あるいは鉛、銀等の柔らかい金属を
前面に配置し、この背部に高誘電体を設ける様にしても
よいし、研磨板9Bに硬度の近い高分子誘電体を柱状に成
形して用いるようにしてもよい。
The ferroelectric used for the second electrode 22 is also made of a material whose hardness is substantially equal to that of the hardened epoxy resin. Therefore, a solidified conductive adhesive made of the same material as the first electrode 21 or a soft metal such as lead or silver may be disposed on the front surface, and a high dielectric substance may be provided on the back, or the polishing may be performed. The plate 9B may be formed by molding a polymer dielectric having close hardness into a column shape.

なお本発明は、上記実施例に限定されるものではな
く、たとえば上記実施例では4軸を駆動して研磨を行う
ものについて説明したが、2軸を駆動して研磨を行うも
のにも同様に適用できることは勿論である。
The present invention is not limited to the above-described embodiment. For example, in the above-described embodiment, a description has been given of a case in which polishing is performed by driving four axes. Of course, it can be applied.

(発明の効果) 以上詳述したように、本発明によれば研磨作業中の圧
電片の共振周波数を測定することによってその厚みを正
確に制御することができ研磨作業の自動化を図ることが
可能な研磨装置を提供することができる。
(Effects of the Invention) As described in detail above, according to the present invention, by measuring the resonance frequency of the piezoelectric piece during the polishing operation, its thickness can be accurately controlled, and the polishing operation can be automated. It is possible to provide a simple polishing apparatus.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の一実施例を示す要部の断面図、第2図
は上記実施例の全体の斜視図、第3図は従来の研磨装置
の要部の一例を示す断面図である。 1……本体 6……下定盤 6B、9B……研磨板 7……太陽ギア 8……インターナルギア 9……上定盤 13……キャリア 14……被研磨材 21……第1の電極 22……第2の電極 23……絶縁材 24……制御部
FIG. 1 is a sectional view of a main part showing an embodiment of the present invention, FIG. 2 is a perspective view of the whole of the above embodiment, and FIG. 3 is a cross-sectional view showing an example of a main part of a conventional polishing apparatus. . 1 Body 6 Lower plate 6B, 9B Polishing plate 7 Sun gear 8 Internal gear 9 Upper plate 13 Carrier 14 Material to be polished 21 First electrode 22 ... Second electrode 23... Insulation material 24.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】回転中心に配設した太陽ギアと、この太陽
ギアの外周に配設したインターナルギアと、研磨すべき
圧電片を保持する多数の保持孔を有し上記太陽ギアおよ
びインターナルギアに歯合して遊星運動するキャリア
と、このキャリアの上面および下面に配設した金属製の
円盤の対向面にエポキシ樹脂を固化した非導電性の研磨
板を添設した上定盤および下定盤と、この上定盤および
下定盤の研磨板の一方に穿設した透孔に充填して固化し
該定盤に電気的に導通させた導電性接着剤または鉛、錫
あるいはこれらの合金である導電性物質からなる第1の
電極と、上記上定盤および下定盤の研磨盤の他方に穿設
した透孔に該研磨盤に対して電気的に絶縁して配設した
上記研磨盤に略等しい硬度の誘電体または上記研磨盤に
略等しい硬度の導電性物質を前面に配設した誘電体から
なる第2の電極と、この第2の電極を介して接続された
上記圧電片の共振周波数を目的とする周波数と比較して
研磨作業を制御する制御部と、を具備することを特徴と
する圧電片の自動研磨装置。
1. A sun gear disposed at the center of rotation, an internal gear disposed around the sun gear, and a plurality of holding holes for holding piezoelectric pieces to be polished. A carrier that meshes with the planetary motion, an upper surface plate and a lower surface plate in which a non-conductive polishing plate obtained by solidifying epoxy resin is attached to a facing surface of a metal disk disposed on an upper surface and a lower surface of the carrier; A conductive adhesive or a conductive adhesive, such as a lead, tin, or an alloy thereof, which is filled in a through hole formed in one of the polishing plates of the upper and lower lapping plates and solidified to be electrically conducted to the lapping plate. A first electrode made of a conductive material, and substantially the same as the above-mentioned polishing plate disposed in a through hole formed in the other of the polishing plates of the upper platen and the lower platen so as to be electrically insulated from the polishing plate. Hardness dielectric or conductive with hardness almost equal to the above polishing machine A second electrode made of a dielectric material disposed on a front surface thereof, and a control unit for controlling a polishing operation by comparing a resonance frequency of the piezoelectric piece connected via the second electrode with a target frequency. An automatic polishing apparatus for a piezoelectric piece, comprising:
JP1047855A 1989-02-28 1989-02-28 Automatic polishing device for piezoelectric pieces Expired - Fee Related JP2767052B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1047855A JP2767052B2 (en) 1989-02-28 1989-02-28 Automatic polishing device for piezoelectric pieces

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1047855A JP2767052B2 (en) 1989-02-28 1989-02-28 Automatic polishing device for piezoelectric pieces

Publications (2)

Publication Number Publication Date
JPH02224969A JPH02224969A (en) 1990-09-06
JP2767052B2 true JP2767052B2 (en) 1998-06-18

Family

ID=12786985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1047855A Expired - Fee Related JP2767052B2 (en) 1989-02-28 1989-02-28 Automatic polishing device for piezoelectric pieces

Country Status (1)

Country Link
JP (1) JP2767052B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009090897A1 (en) * 2008-01-18 2009-07-23 Toyo Tire & Rubber Co., Ltd. Electropolishing pad manufacturing method
CN106625117A (en) * 2016-11-02 2017-05-10 上海复合材料科技有限公司 Satellite bearing cylinder stringer online measuring and grinding device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4197676A (en) * 1978-07-17 1980-04-15 Sauerland Franz L Apparatus for automatic lapping control
JPS58851U (en) * 1981-06-26 1983-01-06 株式会社日立製作所 Double-sided polishing device

Also Published As

Publication number Publication date
JPH02224969A (en) 1990-09-06

Similar Documents

Publication Publication Date Title
WO2006126302A1 (en) Cutting tool and cutting device that have disk-like cutting blade
US2799789A (en) Piezoelectric crystal apparatus and method of making the same
JP2767052B2 (en) Automatic polishing device for piezoelectric pieces
JP5155620B2 (en) Manufacturing method of thickness sliding vibration piece
JP4155872B2 (en) Lapping machine manufacturing method
JP2013151040A (en) Wafer polishing device and polishing pad
US4418500A (en) Grinding apparatus
CN110429175B (en) Torsional vibration wafer and manufacturing method
JP4705971B2 (en) Lapping machine manufacturing equipment
US2454777A (en) Method of manufacturing piezo crystals
JPS63185556A (en) Polishing device
JPS62193777A (en) Linear abrasive body and polishing method
JPH07288440A (en) Manufacture of piezoelectric ceramic oscillator
JP2001179624A (en) Dressing, honing and grinding tool
JP2002025951A (en) Double-sided machining apparatus and truing method of grinding means
JP7501889B2 (en) Method for manufacturing bonded wafer and method for manufacturing acoustic wave device
JP4235682B2 (en) Method for producing polishing object whose surface is polished
JP2000317782A (en) Piezoelectric element and its machining method
JP2000317815A (en) Piezoelectric element and machining method therefor
JP2000317781A (en) Piezo electric element and its machining method
JPH06297304A (en) Polishing device, cutting/grinding device, and cutting device for solid material
JP3233052B2 (en) Polishing device for piezoelectric wafer
JP2021094686A (en) Work-piece processing method
JP2717872B2 (en) Polishing control device for piezoelectric material
US2748032A (en) Method of coating thin flat dielectric plates

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees