JP2759270B2 - Photometer for electronic imaging camera - Google Patents

Photometer for electronic imaging camera

Info

Publication number
JP2759270B2
JP2759270B2 JP63255640A JP25564088A JP2759270B2 JP 2759270 B2 JP2759270 B2 JP 2759270B2 JP 63255640 A JP63255640 A JP 63255640A JP 25564088 A JP25564088 A JP 25564088A JP 2759270 B2 JP2759270 B2 JP 2759270B2
Authority
JP
Japan
Prior art keywords
light
beam splitter
electronic imaging
optical system
aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63255640A
Other languages
Japanese (ja)
Other versions
JPH02101877A (en
Inventor
和宣 増沢
徹 吉沢
和男 石川
淳一 氏井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP63255640A priority Critical patent/JP2759270B2/en
Publication of JPH02101877A publication Critical patent/JPH02101877A/en
Application granted granted Critical
Publication of JP2759270B2 publication Critical patent/JP2759270B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電子撮像カメラ、特に固定撮像素子を用いた
スチルカメラ用の測光装置に関する。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic imaging camera, and more particularly to a photometric device for a still camera using a fixed imaging device.

〔従来の技術〕[Conventional technology]

従来、光学画像を固体撮像素子により映像信号に変換
して磁気媒体に記録するビデオカメラや電子スチルカメ
ラの自動露出制御方式において、撮像光学系の光路内に
あって入射光をファインダ光学系へ反射し電子撮像部か
らの反射光を測光系へ反射するビームスプリッタを設け
たTTLダイレクト測光方式が提案されている。
Conventionally, in an automatic exposure control system of a video camera or an electronic still camera that converts an optical image into a video signal by a solid-state imaging device and records it on a magnetic medium, the incident light is reflected in a light path of an imaging optical system to a finder optical system. A TTL direct photometry system provided with a beam splitter that reflects light reflected from an electronic imaging unit to a photometry system has been proposed.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

従来の測光方式の一例を第4図に示す。図において絞
り3を絞り込んでビームスプリッタのハーフミラー部よ
りも絞り開口部が小さくなると、絞り羽根からの反射光
が測光系に入り、撮像素子7の表面からの反射光に重畳
するため適正な測光値が得られないという問題点があっ
た。
FIG. 4 shows an example of a conventional photometry method. In the figure, when the stop 3 is stopped down and the aperture opening becomes smaller than the half mirror portion of the beam splitter, the reflected light from the aperture blade enters the photometric system and is superimposed on the reflected light from the surface of the image sensor 7 so that proper photometry is performed. There was a problem that a value could not be obtained.

本発明は固体撮像素子を用いた電子カメラのTTLダイ
レクト測光方式の改良であって、撮像素子からの主とし
て正反射光をビームスプリッタ裏面で測光系へ反射する
測光装置において、絞り羽根からの反射光が測光系に入
ることを減少させて測光精度を向上させた測光装置を提
供することを目的としている。
The present invention is an improvement of a TTL direct photometry system of an electronic camera using a solid-state imaging device.In a photometry device that mainly reflects regular reflection light from an imaging device to a photometry system on the back surface of a beam splitter, the reflection light from an aperture blade is used. It is an object of the present invention to provide a photometric device in which the amount of light entering the photometric system is reduced and the photometric accuracy is improved.

〔課題を解決するための手段〕[Means for solving the problem]

上記目的を達成するためには、副絞りの開口径がビー
ムスプリッターの後方に配置した絞り機構の開口径より
等しいかやや大きめにしてやることが必要である。本発
明の第1の構成(第1図の発明)では、被写体の光を通
し光像を形成する撮像光学系と、光像を受けこれを電気
信号に変換する電子撮像部と、前記撮像光学系の光路内
にあって入射光をファインダ光学系へ反射し前記電子撮
像部からの反射光を測光系へ反射するビームスプリッタ
とを具備する電子撮像カメラの測光装置において、前記
ビームスプリッタの前記電子撮像部側に絞り機構を設
け、前記ビームスプリッタの被写体側に前記撮像光学系
に出入りする副絞り機構を設ける。
In order to achieve the above object, it is necessary to make the aperture diameter of the sub-aperture equal to or slightly larger than the aperture diameter of the aperture mechanism arranged behind the beam splitter. According to a first configuration of the present invention (the invention of FIG. 1), an imaging optical system that forms an optical image through light of a subject, an electronic imaging unit that receives the optical image and converts the optical image into an electric signal, and the imaging optical system A beam splitter that is in the optical path of the system and reflects incident light to a finder optical system and reflects light reflected from the electronic imaging unit to a photometric system. An aperture mechanism is provided on the imaging unit side, and a sub-aperture mechanism that enters and exits the imaging optical system is provided on the subject side of the beam splitter.

次に第2の構成(第2図の発明)は、被写体の光を通
し光像を形成する撮像光学系と、光像を受けこれを電気
信号に変換する電子撮像部と、前記撮像光学系の光路内
にあって入射光をファインダ光学系へ反射し前記電子撮
像部からの反射光を測光系へ反射するビームスプリッタ
とを具備する電子撮像カメラの測光装置において、前記
ビームスプリッタの前記電子撮像部側に絞り機構を設
け、前記ビームスプリッタの被写体側に副絞り(光束制
御)素子を光軸上に固定して設ける。
Next, a second configuration (the invention of FIG. 2) includes an imaging optical system that forms an optical image through light of a subject, an electronic imaging unit that receives the optical image and converts it into an electric signal, and the imaging optical system. A beam splitter that reflects incident light to a finder optical system and reflects reflected light from the electronic imaging unit to a photometric system in the optical path of the electronic imaging camera, wherein the electronic imaging of the beam splitter is performed. An aperture mechanism is provided on the unit side, and a sub-aperture (light flux control) element is fixedly provided on the optical axis on the object side of the beam splitter.

〔作用〕[Action]

上記構成によれば、副絞り機構により入射光を絞るこ
とにより、絞り機構3の羽根からの反射光を減少させ、
固体撮像素子表面からの反射光を簡易、高精度に測光で
きる。
According to the above configuration, by reducing the incident light by the sub-aperture mechanism, the reflected light from the blades of the aperture mechanism 3 is reduced,
The light reflected from the surface of the solid-state image sensor can be measured simply and with high accuracy.

〔実施例〕〔Example〕

実施例について図面を参照して説明する。第1図は本
発明を適用した電子カメラ用測光装置の一実施例を示
す。レンズ系1の後方には光学ファインダ用のビームス
プリッタ2が配置されており、ファインダ光学系により
被写体(不図示)を目視できるものとなっている。ビー
ムスプリッタ2の後方には絞り機構3、マスターレンズ
4、光学フィルタ5が配置され、入射光はそれらを通っ
て固体撮像素子7に入射する。入射光の一部は固体撮像
素子7の表面で反射され、主として正反射分がビームス
プリッタ2の表面で反射され測光レンズ8を通って測光
素子9に導びかれる。測光素子9は入射光の強さに応じ
た電気信号を測光信号として出力し、測光回路11にて演
算し、シャッタ制御回路12および絞り制御回路13によっ
て制御して適正露光を得る。ここで絞り機構3がビーム
スプリッタ2のハーフミラー部よりも小さく絞られると
絞り機構3の絞り羽根からの反射光が測光系へ入ってし
まう。そこでビームスプリッタ2の前へ副絞り10を挿入
して入射光を絞ることにより上記絞り羽根からの反射光
を減少させる。次に第2図の実施例では、第1図の副絞
り10を出し入れする方式では機構が複雑となるので、液
晶板の光束制御素子10′を副絞り10の代りに光軸上に固
定設置して、絞り制御することにより、簡易な副絞り機
能を達成できる。
Embodiments will be described with reference to the drawings. FIG. 1 shows an embodiment of a photometer for an electronic camera to which the present invention is applied. A beam splitter 2 for an optical finder is disposed behind the lens system 1 so that a subject (not shown) can be viewed by the finder optical system. An aperture mechanism 3, a master lens 4, and an optical filter 5 are arranged behind the beam splitter 2, and the incident light passes through them and enters the solid-state imaging device 7. Part of the incident light is reflected on the surface of the solid-state imaging device 7, and mainly specular reflection is reflected on the surface of the beam splitter 2, and is guided to the photometric device 9 through the photometric lens 8. The photometric element 9 outputs an electric signal according to the intensity of the incident light as a photometric signal, calculates the photometric circuit 11, and controls the shutter control circuit 12 and the aperture control circuit 13 to obtain an appropriate exposure. Here, if the aperture mechanism 3 is stopped down smaller than the half mirror portion of the beam splitter 2, the light reflected from the aperture blades of the aperture mechanism 3 enters the photometric system. Therefore, the sub-aperture 10 is inserted in front of the beam splitter 2 to reduce the incident light, thereby reducing the reflected light from the aperture blade. Next, in the embodiment shown in FIG. 2, since the mechanism is complicated in the method of taking in and out the sub-aperture 10 shown in FIG. By controlling the aperture, a simple auxiliary aperture function can be achieved.

第3図は本実施例における絞り機構3の絞り値と測光
素子の出力との関係を示す測定例である。副絞りがない
場合は小絞り側で測光出力が高くなり直線性が悪くなっ
ている。本発明の場合の副絞りがある場合は小絞り側で
も良好な直線性が得られる。
FIG. 3 is a measurement example showing the relationship between the aperture value of the aperture mechanism 3 and the output of the photometric element in the present embodiment. When there is no sub-aperture, the photometric output increases on the small aperture side, and the linearity is deteriorated. In the case of the present invention, when there is a sub-aperture, good linearity can be obtained even on the small aperture side.

〔発明の効果〕〔The invention's effect〕

以上により本発明によれば、撮像素子表面からの反射
光をビームスプリッタ裏面で反射して測光する、簡単な
構造で、高精度なTTLダイレクト測光が可能となる。
As described above, according to the present invention, it is possible to perform TTL direct photometry with high accuracy using a simple structure in which the reflected light from the front surface of the image sensor is reflected by the back surface of the beam splitter and photometry is performed.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の第1の実施例の構成を示すブロック
図。第2図は本発明の第2の実施例の構成を示すブロッ
ク図。第3図は第1図の実施例の場合の測定例。第4図
は従来の測光装置の一例の構成を示すブロック図であ
る。 1……レンズ系、2……ビームスプリッタ 3……絞り機構、4……マスターレンズ 5……光学フィルタ、7……固体撮像素子 8……測光レンズ、9……測光素子 10……副絞り、10′……光束制御素子、11……測光回路 12……シャッタ制御回路、13……絞り制御回路
FIG. 1 is a block diagram showing a configuration of a first embodiment of the present invention. FIG. 2 is a block diagram showing a configuration of a second embodiment of the present invention. FIG. 3 shows a measurement example in the case of the embodiment of FIG. FIG. 4 is a block diagram showing a configuration of an example of a conventional photometric device. DESCRIPTION OF SYMBOLS 1 ... Lens system, 2 ... Beam splitter 3 ... Aperture mechanism 4, ... Master lens 5 ... Optical filter, 7 ... Solid-state image sensor 8 ... Photometric lens, 9 ... Photometric element 10 ... Sub-aperture , 10 ': light flux control element, 11: photometry circuit 12: shutter control circuit, 13: aperture control circuit

───────────────────────────────────────────────────── フロントページの続き 審査官 加藤 恵一 (56)参考文献 実開 昭63−141932(JP,U) ──────────────────────────────────────────────────続 き Continuing from the front page Examiner Keiichi Kato (56) References Jikai Sho 63-141932 (JP, U)

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】被写体の光を通し光像を形成する撮像光学
系と、光像を受けこれを電気信号に変換する電子撮像部
と、前記撮像光学系の光路内にあって入射光をファイン
ダ光学系へ反射し前記電子撮像部からの反射光を測光系
へ反射するビームスプリッタとを具備する電子撮像カメ
ラの測光装置において、 前記ビームスプリッタの前記電子撮像部側に絞り機構を
設け、前記ビームスプリッタの被写体側に前記撮像光学
系に出入りする副絞り機構を設けたことを特徴とする電
子撮像カメラの測光装置。
An image pickup optical system for forming a light image through light of a subject, an electronic image pickup unit for receiving the light image and converting the image into an electric signal, and a finder for detecting incident light in an optical path of the image pickup optical system. A beam splitter that reflects light to an optical system and reflects light reflected from the electronic imaging unit to a photometry system, wherein the beam splitter is provided with a diaphragm mechanism on the electronic imaging unit side of the beam splitter; A photometric device for an electronic imaging camera, further comprising a sub-aperture mechanism that enters and exits the imaging optical system on the subject side of the splitter.
【請求項2】被写体の光を通し光像を形成する撮像光学
系と、光像を受けこれを電気信号に変換する電子撮像部
と、前記撮像光学系の光路内にあって入射光をファイン
ダ光学系へ反射し前記電子撮像部からの反射光を測光系
へ反射するビームスプリッタとを具備する電子撮像カメ
ラの測光装置において、 前記ビームスプリッタの前記電子撮像部側に絞り機構を
設け、前記ビームスプリッタの被写体側に副絞り素子を
光軸上に固定して設けたことを特徴とする電子撮像カメ
ラの測光装置。
2. An imaging optical system for forming a light image by passing light of a subject, an electronic imaging unit for receiving the light image and converting the light image into an electric signal, and a finder for detecting incident light in an optical path of the imaging optical system. A beam splitter that reflects light to an optical system and reflects light reflected from the electronic imaging unit to a photometry system, wherein the beam splitter is provided with a diaphragm mechanism on the electronic imaging unit side of the beam splitter; A photometric device for an electronic imaging camera, wherein a sub-aperture element is fixedly provided on an optical axis on a subject side of a splitter.
JP63255640A 1988-10-11 1988-10-11 Photometer for electronic imaging camera Expired - Fee Related JP2759270B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63255640A JP2759270B2 (en) 1988-10-11 1988-10-11 Photometer for electronic imaging camera

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63255640A JP2759270B2 (en) 1988-10-11 1988-10-11 Photometer for electronic imaging camera

Publications (2)

Publication Number Publication Date
JPH02101877A JPH02101877A (en) 1990-04-13
JP2759270B2 true JP2759270B2 (en) 1998-05-28

Family

ID=17281554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63255640A Expired - Fee Related JP2759270B2 (en) 1988-10-11 1988-10-11 Photometer for electronic imaging camera

Country Status (1)

Country Link
JP (1) JP2759270B2 (en)

Also Published As

Publication number Publication date
JPH02101877A (en) 1990-04-13

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