JP2743707B2 - Glass with mixed coating and method for producing the same - Google Patents

Glass with mixed coating and method for producing the same

Info

Publication number
JP2743707B2
JP2743707B2 JP4130838A JP13083892A JP2743707B2 JP 2743707 B2 JP2743707 B2 JP 2743707B2 JP 4130838 A JP4130838 A JP 4130838A JP 13083892 A JP13083892 A JP 13083892A JP 2743707 B2 JP2743707 B2 JP 2743707B2
Authority
JP
Japan
Prior art keywords
mixed
glass
film
carbon
mixed coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4130838A
Other languages
Japanese (ja)
Other versions
JPH05319871A (en
Inventor
正次 中西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Priority to JP4130838A priority Critical patent/JP2743707B2/en
Publication of JPH05319871A publication Critical patent/JPH05319871A/en
Application granted granted Critical
Publication of JP2743707B2 publication Critical patent/JP2743707B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/29Mixtures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、ガラス基材上に形成さ
れる、撥水性被膜に関するものであり、例えば、撥水ガ
ラスとして用いることができる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a water-repellent film formed on a glass substrate and can be used, for example, as a water-repellent glass.

【0002】[0002]

【従来の技術】従来、ガラスや反応管等に撥水性を持た
せる場合に、炭素やフッ素をガラス表面に被覆させてい
た。例えば特開平2−188447号公報においては、
ガラス表面を水素ガスで還元処理した後に、炭素膜形成
原料を含むキャリアガスをガラス表面に供給して、炭素
被膜を形成する方法を開示している。
2. Description of the Related Art Conventionally, carbon and fluorine have been coated on the surface of glass in order to impart water repellency to glass and reaction tubes. For example, in JP-A-2-18847,
It discloses a method of forming a carbon coating by supplying a carrier gas containing a carbon film forming raw material to the glass surface after reducing the glass surface with hydrogen gas.

【0003】[0003]

【発明が解決する課題】しかし、上記方法においてはガ
ラス基材と炭素被膜の密着性が十分ではなく、炭素被膜
が剥離しやすいという欠点がある。密着性が優れないの
は、ガラス基材と炭素が分子間力で結合しているためで
あると考えられる。そこで本発明においては、ガラス基
材と混合被膜を分子間力より大きい結合力を有する共有
結合で結合することにより、ガラス基材と混合被膜との
密着性を向上させることを目的とする。
However, in the above method, there is a disadvantage that the adhesion between the glass substrate and the carbon coating is not sufficient, and the carbon coating is easily peeled off. It is considered that the reason why the adhesion is not excellent is that the glass substrate and carbon are bonded by an intermolecular force. Therefore, an object of the present invention is to improve the adhesion between the glass substrate and the mixed coating by bonding the glass substrate and the mixed coating with a covalent bond having a bonding force larger than the intermolecular force.

【0004】[0004]

【課題を解決するための手段】本発明の混合被膜付きガ
ラスは、ガラス基材表面に、少なくとも金属酸化物と炭
素、もしくは、少なくとも金属酸化物と炭素とフッ素が
混合してなる撥水性を有する混合被膜を形成させ、前記
ガラス基材と前記混合被膜の界面において、前記混合被
膜における前記金属酸化物のモル分率が5%以上である
ことを特徴とし、さらに本発明に係る製造方法は蒸着法
であることを特徴とする。ここでガラス基材というの
は、成分中に金属酸化物を有するものとし、例えばホウ
ケイ酸ガラス、ソーダライムガラス等からなるものを採
用することができる。また、混合被膜中の金属酸化物と
しては、SiO2 、TiO2 、ZrO2 、Y 2 3 、A
2 3 、PbO、CaO、MgO、B2 3 、Fe2
3 、Na2O 、K2 O、Li2 O等の一種または二
種以上を採用することができる。なお、モル分率は物質
系の組成を表す量で、1成分のモル数と全成分のモル数
との比をその1成分のモル分率という。各成分のモル分
率の総和は1(100%)に等しい。また、蒸着法と
は、化学蒸着法(CVD)や、イオンプレーティングや
真空蒸着等の物理蒸着法(PVD)である。
According to the present invention, there is provided a gas coated with a mixed film according to the present invention.
The glass has at least a metal oxide and charcoal on the glass substrate surface.
Element or at least metal oxide, carbon and fluorine
Forming a mixed coating having water repellency by mixing,
At the interface between the glass substrate and the mixed coating, the mixed coating
The mole fraction of the metal oxide in the film is 5% or more
Wherein the production method according to the present invention further comprises a vapor deposition method.
It is characterized by being. Here, the glass substrate
Shall have a metal oxide in the component.
Use a glass made of silicate glass, soda lime glass, etc.
Can be used. In addition, with the metal oxide in the mixed coating
For example, SiOTwo, TiOTwo, ZrOTwo, Y TwoOThree, A
lTwoOThree, PbO, CaO, MgO, BTwoOThree, FeTwo
OThree, NaTwoO, KTwoO, LiTwoOne or two such as O
More than species can be employed. The mole fraction is the substance
Amount representing the composition of the system, the number of moles of one component and the number of moles of all components
Is referred to as the mole fraction of one component. Molar amount of each component
The sum of the rates is equal to 1 (100%). In addition,
Are chemical vapor deposition (CVD), ion plating,
It is a physical vapor deposition method (PVD) such as vacuum vapor deposition.

【0005】[0005]

【作用】本発明において、基材となるガラスと、ガラス
基材表面に形成される混合被膜は、金属酸化物を含有し
ており、ガラス基材と混合被膜の界面における結合状態
は、混合被膜中の金属と、基材中の金属が酸素を介して
共有結合をしていると考えられる。よってガラス基材と
混合被膜は強い結合力を示すのである。
In the present invention, the glass serving as the base material and the mixed film formed on the surface of the glass base material contain a metal oxide. It is considered that the metal in the base material and the metal in the base material have a covalent bond via oxygen. Therefore, the glass substrate and the mixed film show a strong bonding force.

【0006】[0006]

【実施例】以下本発明を具体化した実施例を図面を参照
しつつ説明する。 (実施例1)2元RFマグネトロンスパッタリング装置
の真空槽にSiO2 とCの2つのターゲットを備えると
ともに、被膜基材としてソーダライムガラスも装備し
た。そして、その真空槽を2×10-3Pa以下まで真空
引きし、ソーダライムガラスを300℃まで加熱した。
次いでArガスを真空槽内の圧力が0.1Paになるよ
うに導入し、各ターゲットに電圧を図2に示すように印
加し、スパッタリング成膜を行った。このようにして図
1に示すように、ソーダライムガラス1上にSi、O、
C、混合被膜2を得た。
Embodiments of the present invention will be described below with reference to the drawings. (Example 1) In a vacuum chamber of a binary RF magnetron sputtering apparatus, two targets of SiO 2 and C were provided, and soda lime glass was also provided as a coating substrate. Then, the vacuum chamber was evacuated to 2 × 10 −3 Pa or less, and the soda lime glass was heated to 300 ° C.
Next, Ar gas was introduced so that the pressure in the vacuum chamber became 0.1 Pa, and a voltage was applied to each target as shown in FIG. 2 to perform sputtering film formation. In this way, as shown in FIG. 1, Si, O,
C, mixed film 2 was obtained.

【0007】この混合被膜付きガラスの表面から深さ方
向のSi、O、C、をAES(オージェ電子分光分析)
により定量分析した結果を図3に示す。図3は、混合被
膜最表面からの距離(nm)と、各原子の原子濃度(a
t%)との関係を示しており、ソーダライムガラス上に
約60nmのSi、O、C混合被膜が形成されているこ
とがわかる。尚、ガラス基材と混合被膜界面において炭
素のモル分率は55%であり、SiO2 のモル分率は4
5%である。この混合被膜付きガラスに水滴を落とし、
混合被膜付きガラスと水滴との接触角を調べたところ8
0度であり、良好な撥水性能を示した。また、この混合
被膜とソーダライムガラスとの密着性を調べるために、
混合被膜付きガラスの表面を、300g/cm2 の荷重を
かけながら、乾燥したネル布で3000往復摩擦する条
件で堅牢度試験をおこなった。その結果、3000往復
の摩擦条件で、乾燥したネル布により擦った膜は、試験
前と比べ何ら変化はみられず、密着性が良好であること
が示された。ところでこの膜の可視光線透過率は85%
と非常に高い値を示している。 (試験1)実施例1は、炭素の原子濃度が20at%で
一定であるが、一定とする炭素の原子濃度を変えた種々
の混合被膜を形成するため、種々のRF電力を設定し、
いずれも膜厚を100nmにすること以外は実施例1と
同様にし、スパッタリング成膜を行った。そしてそれぞ
れの混合被膜の可視光線透過率を調べその結果を図4に
示す。図4より、本試験のような条件のもとでは、一定
とする炭素原子濃度が70%以下で、可視光線透過率が
70%以上となり、自動車における安全性の面から視認
性を確保するのに必要とされる規格値に適合する。つま
り炭素濃度が低いほど、透光性に優れることがわかる。 (実施例2)RF電力を60分間印加すること以外は実
施例1と同様にしてスパッタリング成膜を行いソーダラ
イムガラス上に約190nmのSi、O、C混合被膜を
得た。この厚膜の可視光線透過率は70%を示してい
る。本実施例のように混合被膜中に含まれる金属酸化物
が透光性を有していて、透光性に優れない炭素濃度を低
くした混合被膜を形成した場合、透光性を維持しつつ、
非常に膜厚を厚くすることができるために、耐摩耗性に
優れた撥水性を有するガラスの作製が可能となる。 (比較例)比較のため、ターゲットをCのみとすること
以外は実施例1と同様にして、スパッタリング成膜を1
0分間行い、炭素被膜付きガラスを得た。こうして得ら
れた炭素被膜付きガラスの表面から、深さ方向のC、S
i、OをAESにより定量分析したところ、図5に示す
ソーダライムガラス上にほとんど直接的に約20nmの
炭素被膜が形成されていた。この炭素被膜付きガラスと
水滴水滴との接触角を実施例1と同様にして調べたとこ
ろ、90度の接触角であり、良好な撥水性を示した。ま
た、この炭素被膜付きガラスの表面を、実施例1と同様
にして堅牢度試験を行った。その結果、50往復目に全
ての炭素被膜が剥離し、接触角は50度となった。 (試験2)ソーダライムガラスと混合被膜との界面にお
ける、混合被膜中の金属酸化物のモル濃度が異なった種
々の試料を得るために、RF電力(W)を異ならせるこ
とで、混合被膜中のC、Si、Oの存在比を変化させ、
他は実施例1と同様にして、スパッタリング成膜を行っ
た。このようにして得られた種々の試料を用いて、実施
例1と同様な堅牢度試験を行った前後の接触角を測定し
た結果を図6に示す。図6の混合被膜中のSiO2 のモ
ル分率が20%にいたるまでは、堅牢度試験の前後にお
いて接触角が小さくなっている。これは、基材と混合被
膜との密着性が十分ではなく、堅牢度試験によって混合
被膜が剥離したためと考えられる。また、混合被膜中の
SiO2 のモル分率が70%を超えても接触角が小さく
なっているが、これは混合被膜中における撥水性を有す
る元素である炭素のモル分率が低くなったためである。
よって、SiO2 つまり金属酸化物のモル分率が5%以
上で良好な密着性が得られ、さらに好ましくは20%以
上で得られ、炭素のモル分率が10%以上、さらに好ま
しくは30%以上において最も良好な撥水性を示す。 (実施例3)この混合被膜付きガラスは、実施例1のも
のとRF電力を異ならせて得たものである。他の構成は
実施例1と同様である。すなわち、この混合被膜付きガ
ラスでは、図7に示すようにRF電力(W)を時間とと
もに変化させ、スパッタリング成膜を行った。こうして
得られた混合被膜付きガラスの表面から深さ方向のC、
Si、OをAESにより定量分析したところ、図8に示
すように、ガラス基材上に約60nmのC、Si、Oの
混合被膜が形成されていた。またこの図から、混合被膜
表面に向かい炭素濃度が増加していることがわかる。
尚、ガラス基材と混合被膜界面において、炭素のモル分
率は36.3%であり、SiO2 のモル分率は63.6
%である。この混合被膜付きガラスと水滴との接触角を
実施例1と同様にして調べたところ85度であり、実施
例1より良好な撥水性能を示した。これは、混合被膜表
面に向かうにつれ撥水性を有する元素である炭素濃度が
高くなっているためである。また、密着性についても実
施例1と同様にして堅牢度試験を行い調べた結果、試験
前後において混合被膜に変化は見られず、密着性が良好
であることが示された。また、この混合被膜付きガラス
の可視光線透過率は75%と非常に高い値を示してい
る。本実施例のように、ガラス基材と混合被膜の界面で
は金属酸化物の濃度を高くし、混合被膜表面では炭素濃
度を高くするような、元素に濃度勾配をもたせる構成に
することにより、密着性に優れかつ、撥水性に優れる混
合被膜をガラス基材上に得ることができる。 (実施例4)2元RFマグネトロンスパッタリング装置
の真空層にSiO2 とCの2つのターゲットを備えると
ともに、ソーダライムガラスも装備した。そして、その
真空層を2×10-3Pa以下まで真空引きし、ソーダラ
イムガラスを300℃に加熱した。次いでArガス中に
CF4 ガスを20vol%混合させた混合ガスを真空層
内の圧力が0.1Paになるように導入し、各ターゲッ
トに電圧を図9に示すように印加し、スパッタリング成
膜を行った。このようにしてソーダライムガラス上にS
i、O、C、F混合被膜を得た。
[0007] Si, O, C in the depth direction from the surface of the glass with the mixed film is analyzed by AES (Auger electron spectroscopy).
FIG. 3 shows the results of the quantitative analysis according to the above. FIG. 3 shows the distance (nm) from the outermost surface of the mixed film and the atomic concentration (a) of each atom.
t%), which indicates that a Si, O, and C mixed film of about 60 nm is formed on soda lime glass. The mole fraction of carbon was 55% at the interface between the glass substrate and the mixed coating, and the mole fraction of SiO 2 was 4%.
5%. Drop water drops on this mixed coated glass,
When the contact angle between the glass with the mixed coating and the water droplet was examined, it was 8
0 °, indicating good water repellency. Also, to investigate the adhesion between this mixed film and soda lime glass,
A fastness test was performed on the surface of the glass with the mixed coating under a condition of rubbing 3,000 reciprocations with a dry flannel cloth while applying a load of 300 g / cm 2 . As a result, the film rubbed with the dried flannel cloth under the friction condition of 3000 reciprocations did not show any change as compared with that before the test, indicating that the adhesion was good. Incidentally, the visible light transmittance of this film is 85%.
And very high values. (Test 1) In Example 1, although the atomic concentration of carbon was constant at 20 at%, various RF powers were set in order to form various mixed coatings in which the atomic concentration of carbon was kept constant.
In each case, sputtering was performed in the same manner as in Example 1 except that the film thickness was set to 100 nm. Then, the visible light transmittance of each mixed film was examined, and the result is shown in FIG. FIG. 4 shows that under the conditions such as the present test, the visible light transmittance becomes 70% or more when the constant carbon atom concentration is 70% or less, and the visibility is ensured from the viewpoint of vehicle safety. Conforms to the standard values required for In other words, it can be seen that the lower the carbon concentration, the more excellent the light transmittance. (Example 2) Sputter deposition was performed in the same manner as in Example 1 except that RF power was applied for 60 minutes to obtain a Si, O, and C mixed film of about 190 nm on soda lime glass. The visible light transmittance of this thick film is 70%. As in the present embodiment, the metal oxide contained in the mixed film has a light-transmitting property, and when a mixed film having a low carbon concentration that is not excellent in the light-transmitting property is formed, the light-transmitting property is maintained. ,
Since the film thickness can be made extremely large, it becomes possible to produce water-repellent glass having excellent wear resistance. (Comparative Example) For comparison, a sputtering film was formed in the same manner as in Example 1 except that only the target was C.
This was performed for 0 minutes to obtain a glass with a carbon coating. From the surface of the glass with the carbon coating thus obtained, C, S in the depth direction were obtained.
When i and O were quantitatively analyzed by AES, a carbon film of about 20 nm was formed almost directly on the soda-lime glass shown in FIG. When the contact angle between the glass with the carbon coating and the water droplets was examined in the same manner as in Example 1, the contact angle was 90 degrees, indicating good water repellency. The surface of the glass with the carbon coating was subjected to a fastness test in the same manner as in Example 1. As a result, at the 50th reciprocation, all the carbon coatings peeled off, and the contact angle became 50 degrees. (Test 2) In order to obtain various samples having different molar concentrations of the metal oxides in the mixed film at the interface between the soda lime glass and the mixed film, the RF power (W) was varied to obtain various samples. Change the abundance ratio of C, Si, O
Other than that, the sputtering film formation was performed in the same manner as in Example 1. FIG. 6 shows the results of measuring the contact angles before and after performing the same robustness test as in Example 1 using the various samples thus obtained. Until the mole fraction of SiO 2 in the mixed coating of FIG. 6 reaches 20%, the contact angle becomes small before and after the fastness test. This is probably because the adhesion between the substrate and the mixed film was not sufficient, and the mixed film was peeled off in the fastness test. Although the contact angle was small even when the molar fraction of SiO 2 in the mixed coating exceeded 70%, this was because the molar fraction of carbon, which is a water-repellent element, in the mixed coating was low. It is.
Therefore, good adhesion is obtained when the mole fraction of SiO 2, that is, the metal oxide is 5% or more, more preferably 20% or more, and the carbon carbon mole fraction is 10% or more, more preferably 30% or more. The above shows the best water repellency. (Embodiment 3) This mixed-coated glass was obtained by changing the RF power from that of Embodiment 1. Other configurations are the same as in the first embodiment. That is, in the glass with the mixed film, the RF power (W) was changed with time as shown in FIG. 7, and the film was formed by sputtering. C in the depth direction from the surface of the glass with the mixed film thus obtained,
When Si and O were quantitatively analyzed by AES, as shown in FIG. 8, a mixed film of C, Si, and O having a thickness of about 60 nm was formed on the glass substrate. From this figure, it can be seen that the carbon concentration increases toward the mixed coating surface.
At the interface between the glass substrate and the mixed film, the molar fraction of carbon was 36.3%, and the molar fraction of SiO 2 was 63.6.
%. When the contact angle between the glass with the mixed coating film and the water droplets was examined in the same manner as in Example 1, the contact angle was 85 °, indicating better water repellency than Example 1. This is because the concentration of carbon, which is an element having water repellency, increases toward the surface of the mixed coating. Further, as for the adhesion, a fastness test was conducted in the same manner as in Example 1, and as a result, no change was observed in the mixed film before and after the test, indicating that the adhesion was good. The visible light transmittance of the glass with the mixed coating film is as high as 75%. As in the present embodiment, the concentration of the metal oxide is increased at the interface between the glass substrate and the mixed coating, and the carbon concentration is increased on the mixed coating surface. A mixed coating having excellent water repellency and excellent water repellency can be obtained on a glass substrate. (Example 4) Two targets of SiO 2 and C were provided in a vacuum layer of a binary RF magnetron sputtering apparatus, and soda lime glass was also provided. Then, the vacuum layer was evacuated to 2 × 10 −3 Pa or less, and the soda lime glass was heated to 300 ° C. Next, a mixed gas obtained by mixing 20 vol% of CF 4 gas in Ar gas is introduced so that the pressure in the vacuum layer becomes 0.1 Pa, and a voltage is applied to each target as shown in FIG. Was done. In this way, S
A mixed coating of i, O, C, and F was obtained.

【0008】この混合被膜付きガラスの表面から深さ方
向のSi、O、C、FをAES(オージェ電子分光分
析)により定量分析したところ、図10に示すように、
ソーダライムガラス上に約60nmのSi、O、C、F
の混合被膜が形成されていた。尚、ガラス基材と混合被
膜の界面において、炭素のモル分率は28%で、フッ素
のモル分率は50%で、SiO2 のモル分率は20%で
ある。この混合被膜付きガラスと水滴との接触角を実施
例1と同様にして調べたところ100度であり、良好な
撥水性能を示した。一般にフッ素のみでは良好な撥水性
能は得られないが、混合被膜中にフッ素と炭素を共存さ
せることで、相乗効果により撥水性能が高められるので
ある。また、密着性についても実施例1と同様にして堅
牢度試験をおこない調べた結果、試験前後において混合
被膜に変化は見られず、密着性が良好であることが示さ
れた。ところでこの膜の可視光線透過率は85%と非常
に高い値を示している。 (実施例5)RF電力を65分間印加すること以外は実
施例4と同様にしてスパッタリング成膜を行いソーダラ
イムガラス上に約200nmのSi、O、C、F混合被
膜を得た。そしてこの厚膜の可視光線透過率は70%を
示している。試験1では、炭素濃度を高くするほど透光
性が劣ることを示したが、フッ素においても同様のこと
が考えられる。本実施例のような混合被膜中に含まれる
金属酸化物が透光性を有していて、透光性に優れない炭
素及びフッ素濃度を低くした混合被膜を形成した場合、
透光性を維持しつつ、非常に膜厚を厚くすることができ
るために、耐摩耗性に優れた撥水性を有するガラスの作
製が可能となる。 (試験3)ソーダライムガラスと混合被膜との界面にお
ける、混合被膜中の金属酸化物のモル分率が異なった種
々の試料を得るために、RF電力(W)を異ならせるこ
とで、混合被膜中のC、Si、Oの存在比を変化させ、
他は実施例3と同様にして、スパッタリング成膜を行っ
た。このようにして得られた種々の試料を用いて、実施
例1と同様な堅牢度試験を行った前後の接触角を測定し
た結果を図11に示す。図11の混合被膜中のSiO2
のモル分率が20%にいたるまでは、堅牢度試験の前後
において接触角が小さくなっている。これは、基材と混
合被膜との密着性が十分ではなく、堅牢度試験によって
混合被膜が剥離したためと考えられる。また、混合被膜
中のSiO2 のモル分率が75%を超えても接触角が小
さくなっているが、これは混合被膜中における撥水性を
有する元素である炭素とフッ素のモル分率が低くなった
ためである。よって、SiO2 つまり金属酸化物のモル
分率が5%以上で良好な密着性が得られ、さらに好まし
くは20%以上で得られ、炭素とフッ素のモル分率の和
が5%以上、さらに好ましくは25%以上において最も
良好な撥水性を示す。 (実施例6)この混合被膜付きガラスは、実施例4のも
のとRF電力を異ならせて得たものである。他の構成は
実施例4と同様である。すなわち、この混合被膜付きガ
ラスでは、図12に示すようにRF電力(W)を時間と
ともに変化させ、スパッタリング成膜を行った。こうし
て得られた混合被膜付きガラスの表面から深さ方向の
C、Si、O、FをAESにより定量分析したところ、
図13に示すように、ガラス基材上に約60nmのC、
Si、O、Fの混合被膜が形成されていた。またこの図
から、混合被膜表面に向かい炭素濃度が増加しているこ
とがわかる。尚、ガラス基材と混合被膜の界面における
炭素のモル分率は10.6%で、フッ素のモル分率は3
1.9%で、SiO2 のモル分率は57.4%である。
この混合薄膜付きガラスと水滴との接触角を実施例1と
同様にして調べたところ110度であり、良好な撥水性
能を示した。これは、混合被膜表面に向かうにつれ撥水
性を有する元素である炭素濃度が高くなっているためで
ある。また、密着性についても実施例1と同様にして堅
牢度試験を行い調べた結果、試験前後において混合被膜
に変化は見られず、密着性が良好であることが示され
た。また、この混合被膜付きガラスの可視光線透過率は
80%と非常に高い値を示している。本実施例のよう
に、ガラス基材と混合被膜の界面では金属酸化物の濃度
を高くし、混合被膜表面では炭素濃度を高くするよう
な、元素に濃度勾配をもたせる構成にすることにより、
密着性に優れかつ、撥水性に優れる混合被膜をガラス基
材上に得ることができる。 (実施例7)蒸発るつぼを2個備えた2元RFイオンプ
レーティング装置の真空層にSiO 2 とCの蒸発材料を
備えるとともに、被膜基材としてソーダライムガラスも
装備した。そして、その真空槽を2×10-3Pa以下ま
で真空引きし、ソーダライムガラスを300℃まで加熱
した。次いでArガスを2×10-1Paになるように導
入し、更に、CF4 ガスを3×10-1Paになるように
導入し、RFコイルに300Wの電力を投入しプラズマ
を発生させた。次に、電子銃に10KVの電圧を印加
し、各蒸発材料に対して図14に示すようにビーム電流
を変化させ、成膜を行った。このようにしてソーダライ
ムガラス上にSi、O、C、F混合被膜を得た。この混
合被膜付きガラスの表面から深さ方向のSi、O、C、
FをAESにより定量分析したところ、図15に示すよ
うにソーダライムガラス上に約50nmのSi、O、
C、F混合被膜の混合被膜が形成されていた。尚、ガラ
ス基材と混合被膜の界面において、炭素のモル分率は2
8%で、フッ素のモル分率は50%で、SiO2 のモル
分率は22%である。この混合被膜付きガラスと水滴と
の接触角を実施例1と同様にして調べたところ100度
であり、良好な撥水性能を示した。また、密着性につい
ても実施例1と同様にして堅牢度試験をおこない調べた
結果、試験前後において混合被膜に変化は見られず、イ
オンプレーティングによって形成された混合被膜におい
ても密着性が良好であることが示された。ところでこの
膜の可視光線透過率は85%と非常に高い値を示してい
る。 (実施例8)2元RFマグネトロッスパッタリング装置
の真空槽にTiO2 とCの2つのターゲットを備えると
ともに、被膜基材として透明石英ガラスも装備した。そ
して、その真空槽を2×10-3Pa以下まで真空引き
し、透明石英を300℃まで加熱した。次いで、Arガ
ス中にCF4 ガスを20vol%混合させた混合ガスを
真空槽内の圧力が0.1Paになるように導入し、各タ
ーゲットに電圧を図16に示すように印加し、スパッタ
リング成膜を行った。このようにして透明石英上にT
i、O、C、F混合被膜を得た。この混合被膜付きガラ
スの表面から深さ方向のTi、O、C、FをAESによ
り定量分析したところ、図17に示すように、透明石英
ガラス上に約50nmのTi、O、C、Fの混合被膜が
形成されていた。尚、透明石英ガラスと混合被膜の界面
において、炭素のモル分率は25%で、フッ素のモル分
率は67%で、TiO2 のモル分率は8%である。この
混合被膜付きガラスと水滴との接触角を実施例1と同様
にして調べたところ105度であり、良好な撥水性能を
示した。また、密着性についても実施例1と同様にして
堅牢度試験をおこない調べた結果、試験前後において混
合被膜に変化は見られず、TiO2 のターゲットを用い
た場合も密着性が良好であることが示された。ところで
この膜の可視光線透過率は80%と非常に高い値を示し
ている。
[0008] From the surface of the glass with the mixed coating to the depth
Si, O, C, and F in AES (Auger electron spectroscopy
Analysis), as shown in FIG.
Approximately 60 nm of Si, O, C, F on soda lime glass
Was formed. In addition, mixed with glass substrate
At the interface of the film, the mole fraction of carbon is 28%
Is 50% and SiOTwoHas a molar fraction of 20%
is there. Implement the contact angle between the glass with the mixed coating and the water droplet
When examined in the same manner as in Example 1, it was 100 °
Water repellency was shown. Generally good water repellency with fluorine alone
Performance is not obtained, but fluorine and carbon coexist in the mixed coating.
The water repellency is enhanced by the synergistic effect
is there. Also, the adhesion was firmly fixed in the same manner as in Example 1.
As a result of conducting a fastness test, mixing before and after the test
No change was seen in the coating, indicating good adhesion
Was. By the way, the visible light transmittance of this film is very high at 85%.
Shows a high value. (Example 5) Except for applying the RF power for 65 minutes,
Sputtering film was formed in the same manner as in Example 4
Approximately 200 nm of Si, O, C, F
A membrane was obtained. And the visible light transmittance of this thick film is 70%.
Is shown. In Test 1, the higher the carbon concentration, the higher the light transmission
The same is true for fluorine.
Can be considered. Included in mixed coatings as in this example
Charcoal whose metal oxide has translucency and is not excellent in translucency
When a mixed film with a low concentration of silicon and fluorine is formed,
Extremely thick film thickness while maintaining translucency
Therefore, the production of water-repellent glass with excellent wear resistance
Can be manufactured. (Test 3) At the interface between soda lime glass and mixed film
With different mole fractions of metal oxides in the mixed coating
RF power (W) must be varied to obtain various samples.
By changing the abundance ratio of C, Si, and O in the mixed coating,
Otherwise, the sputtering film formation was performed in the same manner as in Example 3.
Was. Using various samples obtained in this way,
The contact angle was measured before and after performing the same robustness test as in Example 1.
The results are shown in FIG. SiO in the mixed coating of FIG.Two
Before and after the robustness test, until the mole fraction of
At a small contact angle. It is mixed with the substrate
The adhesion with the composite film is not enough,
It is considered that the mixed coating was peeled off. Also, mixed coating
SiO insideTwoContact angle is small even if the mole fraction of
This is to reduce the water repellency in the mixed coating.
The mole fractions of carbon and fluorine are low
That's why. Therefore, SiOTwoThat is, the mole of metal oxide
Good adhesion is obtained when the fraction is 5% or more, and more preferable.
Or the sum of the mole fractions of carbon and fluorine
Is 5% or more, more preferably 25% or more.
Shows good water repellency. (Embodiment 6) The glass with the mixed coating is the same as that of Embodiment 4.
And obtained by changing the RF power. Other configurations are
This is the same as the fourth embodiment. That is, the gas with the mixed coating
In the Lass, as shown in FIG. 12, the RF power (W) is
Both were changed, and sputtering film formation was performed. Like this
From the surface of the glass with mixed coating obtained
When C, Si, O and F were quantitatively analyzed by AES,
As shown in FIG. 13, about 60 nm of C on a glass substrate,
A mixed film of Si, O, and F was formed. Also this figure
From that the carbon concentration increases toward the mixed coating surface.
I understand. In addition, at the interface between the glass substrate and the mixed coating
The molar fraction of carbon is 10.6% and the molar fraction of fluorine is 3
1.9% SiOTwoIs 57.4%.
The contact angle between the glass with the mixed thin film and the water droplet was determined as in Example 1.
It is 110 degrees when examined in the same manner, and has good water repellency.
Noh showed. This is due to the water repellency towards the mixed coating surface
Due to the high concentration of carbon
is there. Also, the adhesion was firmly fixed in the same manner as in Example 1.
As a result of performing a fastness test, the mixed coating was observed before and after the test.
No change was observed, indicating good adhesion.
Was. The visible light transmittance of the glass with the mixed coating is
It shows a very high value of 80%. As in this embodiment
In addition, the metal oxide concentration at the interface between the glass substrate and the mixed coating
To increase the carbon concentration on the mixed coating surface.
By making the element have a concentration gradient,
A glass-based mixed coating with excellent adhesion and excellent water repellency
Can be obtained on wood. (Example 7) A binary RF ion pump equipped with two evaporation crucibles
SiO in the vacuum layer of the rating device TwoAnd the evaporation material of C
And soda lime glass as a coating substrate
Equipped. And the vacuum chamber is 2 × 10-3Up to Pa
And heat soda lime glass to 300 ° C
did. Next, 2 × 10-1Lead to Pa
And then CFFour3 × 10 gas-1To be Pa
Introduce 300W power to RF coil and plasma
Generated. Next, apply a voltage of 10 KV to the electron gun
And the beam current for each evaporating material as shown in FIG.
Was changed to form a film. In this way, soda rai
A mixed film of Si, O, C, and F was obtained on the glass. This mix
Si, O, C, in the depth direction from the surface of the glass
F was quantitatively analyzed by AES. As shown in FIG.
Approximately 50 nm of Si, O,
A mixed film of the C and F mixed films was formed. In addition, Gala
At the interface between the substrate and the mixed coating, the mole fraction of carbon is 2
8%, the mole fraction of fluorine is 50%, SiOTwoMole of
The fraction is 22%. The glass with this mixed film and the water drop
Was measured in the same manner as in Example 1.
And exhibited good water repellency. In addition,
A fastness test was conducted in the same manner as in Example 1
As a result, no change was observed in the mixed film before and after the test.
Mixed film formed by on-plating
However, it was shown that the adhesion was good. By the way
The visible light transmittance of the film is as high as 85%.
You. (Embodiment 8) Binary RF magnetron sputtering apparatus
TiO in the vacuum chamberTwoAnd two targets C
Both were also equipped with transparent quartz glass as the coating substrate. So
Then, the vacuum chamber is 2 × 10-3Vacuum to below Pa
Then, the transparent quartz was heated to 300 ° C. Next, Arga
CFFour20% by volume mixed gas
Introduce the pressure inside the vacuum chamber to 0.1 Pa, and
A voltage was applied to the target as shown in FIG.
A ring film was formed. In this way, T
A mixed coating of i, O, C, and F was obtained. Gala with this mixed film
Ti, O, C, F in the depth direction from the surface of
As a result of quantitative analysis, as shown in FIG.
About 50 nm of Ti, O, C, F mixed coating on glass
Had been formed. The interface between the transparent quartz glass and the mixed coating
, The mole fraction of carbon is 25% and the mole fraction of fluorine is
The rate is 67%, TiOTwoIs 8%. this
The contact angle between the glass with the mixed coating and the water droplet was the same as in Example 1.
It was 105 degrees when examined, and good water repellency
Indicated. In addition, the adhesion was the same as in Example 1.
As a result of conducting a robustness test and examining
No change was observed in the composite film,TwoUsing the target
It was also shown that the adhesion was good. by the way
The visible light transmittance of this film is as high as 80%.
ing.

【0009】混合被膜中の元素濃度は実施例に限られ
ず、種々に設定することにより、用途に応じた混合被膜
付きガラスが得られる。本実施例では混合被膜はいずれ
も実質的に金属酸化物と炭素、あるいは金属酸化物と炭
素とフッ素からなるが、密着性や撥水性を阻害しない限
り他の元素が添加されていても良い。
The element concentration in the mixed film is not limited to the embodiment, and by setting variously, a glass with a mixed film according to the intended use can be obtained. In this embodiment, all of the mixed coatings are substantially composed of metal oxide and carbon, or metal oxide, carbon and fluorine, but other elements may be added as long as adhesion or water repellency is not impaired.

【0010】[0010]

【発明の効果】以上詳述したように、金属酸化物と炭
素、もしくは金属酸化物と炭素とフッ素を含有する混合
被膜は、撥水性を有するうえガラス基材との密着性が優
れるため、ガラス基材はこのような混合被膜を被覆する
ことにより、剥離しにくい撥水性を有する膜を得ること
ができる。
As described in detail above, the mixed coating containing metal oxide and carbon, or the mixed coating containing metal oxide, carbon and fluorine has water repellency and excellent adhesion to the glass substrate, so that glass By coating the substrate with such a mixed film, a water-repellent film that is difficult to peel off can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 実施例1の混合被膜付きガラスの断面図であ
る。
FIG. 1 is a cross-sectional view of a glass with a mixed coating of Example 1.

【図2】 実施例1に係る成膜時間とRF電力との関係
を示すグラフである。
FIG. 2 is a graph showing a relationship between a film forming time and RF power according to Example 1.

【図3】 実施例1に係る混合被膜最表面からの距離と
原子濃度との関係を示すグラフである。
FIG. 3 is a graph showing the relationship between the distance from the outermost surface of the mixed coating film and the atomic concentration according to Example 1.

【図4】 試験1に係る炭素濃度と可視光線透過率との
関係を示すグラフである。
FIG. 4 is a graph showing the relationship between carbon concentration and visible light transmittance according to Test 1.

【図5】 比較例に係る炭素被膜最表面からの距離と原
子濃度との関係を示すグラフである。
FIG. 5 is a graph showing a relationship between a distance from an outermost surface of a carbon coating and an atomic concentration according to a comparative example.

【図6】 試験1に係り、混合被膜中におけるSiO2
のモル分率と堅牢度試験前後の接触角との関係を示すグ
ラフである。
FIG. 6 relates to SiO 2 in the mixed film in connection with Test 1.
3 is a graph showing the relationship between the mole fraction of the sample and the contact angle before and after the fastness test.

【図7】 実施例3に係る成膜時間とRF電力との関係
を示すグラフである。
FIG. 7 is a graph showing a relationship between a film forming time and RF power according to Example 3.

【図8】 実施例3に係る混合被膜最表面からの距離と
原子濃度との関係を示すグラフである。
FIG. 8 is a graph showing the relationship between the distance from the outermost surface of the mixed coating and the atomic concentration according to Example 3.

【図9】 実施例4に係る成膜時間とRF電力との関係
を示すグラフである。
FIG. 9 is a graph showing the relationship between the film formation time and RF power according to Example 4.

【図10】実施例4に係る混合被膜最表面からの距離と
原子濃度との関係を示すグラフである。
FIG. 10 is a graph showing the relationship between the distance from the outermost surface of the mixed coating and the atomic concentration according to Example 4.

【図11】試験2に係り、混合被膜中におけるSiO2
のモル分率と堅牢度試験前後の接触角との関係を示すグ
ラフである。
FIG. 11 shows SiO 2 in the mixed film according to Test 2.
3 is a graph showing the relationship between the mole fraction of the sample and the contact angle before and after the fastness test.

【図12】実施例6に係る成膜時間とRF電力との関係
を示すグラフである。
FIG. 12 is a graph showing a relationship between a deposition time and RF power according to Example 6.

【図13】実施例6に係る混合被膜最表面からの距離と
原子濃度との関係を示すグラフである。
FIG. 13 is a graph showing the relationship between the distance from the outermost surface of the mixed coating and the atomic concentration according to Example 6.

【図14】実施例7に係る成膜時間とビーム電流との関
係を示すグラフである。
FIG. 14 is a graph showing the relationship between the film formation time and the beam current according to Example 7.

【図15】実施例7に係る混合被膜最表面からの距離と
原子濃度との関係を示すグラフである。
FIG. 15 is a graph showing the relationship between the distance from the outermost surface of the mixed coating and the atomic concentration according to Example 7.

【図16】実施例8に係る成膜時間とRF電力との関係
を示すグラフである。
FIG. 16 is a graph showing the relationship between the deposition time and RF power according to Example 8.

【図17】実施例8に係る混合被膜最表面からの距離と
原子濃度との関係を示すグラフである。
FIG. 17 is a graph showing the relationship between the distance from the outermost surface of the mixed coating and the atomic concentration according to Example 8.

【符号の説明】[Explanation of symbols]

1・・・ガラス基材 2・・・混合被膜 1: Glass substrate 2: Mixed coating

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ガラス基材表面に、少なくとも金属酸化
物と炭素が混合してなる撥水性を有する混合被膜を形成
させ、前記ガラス基材と前記混合被膜の界面において、
前記混合被膜における前記金属酸化物のモル分率が5%
以上であることを特徴とする混合被膜付きガラス。
1. A water-repellent mixed coating formed by mixing at least a metal oxide and carbon on a surface of a glass substrate, and at an interface between the glass substrate and the mixed film,
The mole fraction of the metal oxide in the mixed coating is 5%
A glass with a mixed coating characterized by the above.
【請求項2】 ガラス基材表面に、少なくとも金属酸化
物と炭素とフッ素が混合してなる撥水性を有する混合被
膜を形成させ、前記ガラス基材と前記混合被膜の界面に
おいて、前記混合被膜における前記金属酸化物のモル分
率が5%以上であることを特徴とする混合被膜付きガラ
ス。
2. A water-repellent mixed coating formed by mixing at least a metal oxide, carbon, and fluorine on a surface of a glass substrate, and the mixed coating at the interface between the glass substrate and the mixed coating is formed. A glass with a mixed coating, wherein the metal oxide has a molar fraction of 5% or more.
【請求項3】 ガラス基材表面に、少なくとも金属酸化
物と炭素が混合してなる撥水性を有する混合被膜を蒸着
法により得ることを特徴とする請求項1記載の混合被膜
付きガラスの製造方法。
3. The method for producing glass with a mixed film according to claim 1, wherein a water-repellent mixed film formed by mixing at least a metal oxide and carbon is obtained on the surface of the glass substrate by vapor deposition. .
【請求項4】 ガラス基材表面に、少なくとも金属酸化
物と炭素とフッ素が混合してなる撥水性を有する混合被
膜を蒸着法により得ることを特徴とする請求項2記載の
混合被膜付きガラスの製造方法。
4. The mixed-coated glass according to claim 2, wherein a water-repellent mixed coating obtained by mixing at least a metal oxide, carbon and fluorine is obtained on the surface of the glass substrate by vapor deposition. Production method.
JP4130838A 1992-05-22 1992-05-22 Glass with mixed coating and method for producing the same Expired - Fee Related JP2743707B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4130838A JP2743707B2 (en) 1992-05-22 1992-05-22 Glass with mixed coating and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4130838A JP2743707B2 (en) 1992-05-22 1992-05-22 Glass with mixed coating and method for producing the same

Publications (2)

Publication Number Publication Date
JPH05319871A JPH05319871A (en) 1993-12-03
JP2743707B2 true JP2743707B2 (en) 1998-04-22

Family

ID=15043884

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4130838A Expired - Fee Related JP2743707B2 (en) 1992-05-22 1992-05-22 Glass with mixed coating and method for producing the same

Country Status (1)

Country Link
JP (1) JP2743707B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020190441A1 (en) * 2019-03-19 2020-09-24 Applied Materials, Inc. Hydrophobic and icephobic coating

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05221690A (en) * 1992-02-06 1993-08-31 Nippon Sheet Glass Co Ltd Water-repellent glass and its production

Also Published As

Publication number Publication date
JPH05319871A (en) 1993-12-03

Similar Documents

Publication Publication Date Title
JP2929779B2 (en) Water-repellent glass with carbon coating
EP0071865B1 (en) Glass body provided with an alkali diffusion-preventing silicon oxide layer
US3720541A (en) Transparent articles
EP0636702A1 (en) Methods for producing functional films
CN1198768C (en) Method of forming niobium doped tin oxide coatings on glass and coated glass formed thereby
JPH1171676A (en) Deposition of silicon dioxide by plasma-activated vaporization process
KR20000011482A (en) Method for coating insulating film and glass substrate for image display using the same
US2964427A (en) Ultra-violet filter
KR20010083477A (en) Method of depositing an io or ito thin film on polymer substrate
JP2743707B2 (en) Glass with mixed coating and method for producing the same
JP4106931B2 (en) Transparent gas barrier thin film coating film
Kawamata et al. KMS (keep-molecules sputtering) deposition of optical MgF2 thin films
JPH0867980A (en) Production of silicon nitride film
JPS6354788B2 (en)
JPS5826051A (en) Glass body having formed alkali diffusion preventing silicon oxide film
Tsukuma et al. Liquid phase deposition of a film of silica with an organic functional group
Yamada et al. Low-temperature deposition of optical films by oxygen radical beam-assisted evaporation
JPH05163044A (en) Method for forming fluorine-containing carbon film
EP0784714A1 (en) Low surface energy coatings
Cho et al. Enhanced adhesion between polycarbonate substrates and tin-doped indium oxide films by ion-assisted reaction
RU2165998C2 (en) Method of formation of heat-reflecting coat on glass
JP2001089844A (en) Deposition of water-repellant silicon oxide film, and glass ceramics article coated with water-repellant silicon oxide film
JPS61124902A (en) Formation of heat ray reflecting film
US20050181177A1 (en) Isotropic glass-like conformal coatings and methods for applying same to non-planar substrate surfaces at microscopic levels
CN116148960A (en) Optical medium reflecting film and preparation method and application thereof

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees