JP2730318B2 - Manufacturing method of glass magnetic disk - Google Patents

Manufacturing method of glass magnetic disk

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Publication number
JP2730318B2
JP2730318B2 JP3125268A JP12526891A JP2730318B2 JP 2730318 B2 JP2730318 B2 JP 2730318B2 JP 3125268 A JP3125268 A JP 3125268A JP 12526891 A JP12526891 A JP 12526891A JP 2730318 B2 JP2730318 B2 JP 2730318B2
Authority
JP
Japan
Prior art keywords
surface roughness
disk
layer
magnetic disk
adjusting layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3125268A
Other languages
Japanese (ja)
Other versions
JPH04328317A (en
Inventor
俊郎 安部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP3125268A priority Critical patent/JP2730318B2/en
Publication of JPH04328317A publication Critical patent/JPH04328317A/en
Application granted granted Critical
Publication of JP2730318B2 publication Critical patent/JP2730318B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、基板としてガラスを用
い、低摩擦係数と高CSS(コンタクト・スタート・ス
トップ)耐久性を有するガラス磁気ディスクの製造方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a glass magnetic disk using glass as a substrate and having a low coefficient of friction and high CSS (contact start / stop) durability.

【0002】[0002]

【従来の技術】近年、磁気ディスクの基板としてガラス
が注目されている。ガラス基板は、平面性に優れている
ので、ヘッドの低浮上が可能になり、結果として高密度
化を達成することができる。しかしながら、平面性が優
れているとヘッドがディスクに吸着するので、これを防
止するため、かつ低摩擦係数と高CSS耐久性を実現す
るためにディスクの表面を適度に粗く形成しなければな
らない。
2. Description of the Related Art In recent years, glass has attracted attention as a substrate of a magnetic disk. Since the glass substrate is excellent in flatness, low flying of the head is possible, and as a result, high density can be achieved. However, if the flatness is excellent, the head will be attracted to the disk. Therefore, in order to prevent this, and to realize a low friction coefficient and high CSS durability, the surface of the disk must be formed appropriately rough.

【0003】従来、この種の磁気ディスクとしては、特
開昭62−26623号公報に示すように、ガラス基板
の表面粗度が50〜200オングストロームになるよう
に、表面をフッ酸水溶液、ケイフッ酸水溶液等の浸漬に
よる化学的腐食方法や、この化学的腐食方法と機械的研
磨方法を併用した化学研磨方法により加工する方法が知
られている。また、類似の磁気ディスクとしては、特開
昭63−160010号公報に示すように、研磨砥粒が
付着したテープ等によりガラス素板をこする機械的な方
法により加工する方法が知られている。さらに、特開平
2−9016号公報に記載されいているように、ガラス
基板上に非磁性金属膜を形成した後、その表面に機械加
工により円周方向に同心円状に研磨処理を施す方法が知
られている。
Conventionally, as a magnetic disk of this type, as shown in Japanese Patent Application Laid-Open No. 62-26623, the surface of a glass substrate is treated with a hydrofluoric acid aqueous solution, There are known a chemical corrosion method by immersion in an aqueous solution or the like, and a method of processing by a chemical polishing method using a combination of the chemical corrosion method and the mechanical polishing method. Further, as a similar magnetic disk, as disclosed in Japanese Patent Application Laid-Open No. 63-160010, a method is known in which a glass substrate is rubbed with a tape or the like to which abrasive grains are attached by a mechanical method. . Further, as described in Japanese Patent Application Laid-Open No. 2-9016, a method is known in which after a non-magnetic metal film is formed on a glass substrate, the surface thereof is polished concentrically in the circumferential direction by machining. Have been.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、上記従
来の磁気ディスクでは、ガラス基板の表面を加工するこ
とにより、ヘッドがディスクの表面に吸着しないように
粗く形成するので、加工工程が増加して高価となり、ま
た、ガラス基板の表面粗さのコントロールが困難となっ
て量産性が悪化するという問題点がある。
However, in the above-mentioned conventional magnetic disk, the head is roughened by processing the surface of the glass substrate so that the head is not attracted to the surface of the disk. In addition, there is a problem that it is difficult to control the surface roughness of the glass substrate and mass productivity is deteriorated.

【0005】したがって本発明は、安価な構成及び製造
方法でヘッドが表面に吸着しないように表面を粗く形成
することができるガラス磁気ディスクの製造方法を提供
することを目的とする。
Accordingly, it is an object of the present invention to provide a method of manufacturing a glass magnetic disk capable of forming a rough surface so that a head does not stick to the surface with an inexpensive configuration and manufacturing method.

【0006】[0006]

【課題を解決するための手段】本発明では上記目的を達
成するために、ガラス基板にて磁気ディスクを製造する
にあたり、ガラス基板上に、アルゴンのガス圧が25乃
至60mTorrで層の厚さが0.5乃至0.75μm
になるようにスパッタリングによりディスクの表面粗度
を調整するための層を成膜するステップを設け、その後
記表面粗度を調整するための層の上に非磁性下地層を形
成し、さらに非磁性下地層の上に磁性層を形成するよう
にしている。
According to the present invention, in order to achieve the above object, in manufacturing a magnetic disk on a glass substrate, the gas pressure of argon is 25 to 60 mTorr and the thickness of the layer is reduced on the glass substrate. 0.5 to 0.75 μm
A step of forming a layer for adjusting the surface roughness of the disk by sputtering so that a non-magnetic underlayer is formed on the layer for adjusting the surface roughness, The magnetic layer is formed on the underlayer.

【0007】[0007]

【作用】本発明は上記構成を有するので、ディスクの表
面粗度を調整するための層の厚さや表面粗度を適宜調整
して成膜することにより、表面粗度が2次元的に等方性
を有し、安価な構成及び製造方法でヘッドが表面に吸着
しないように表面を粗く形成することができる。
Since the present invention has the above-mentioned structure, the surface roughness is adjusted two-dimensionally by appropriately adjusting the thickness and the surface roughness of the layer for adjusting the surface roughness of the disk. The head can be formed with a rough surface so that the head is not attracted to the surface by an inexpensive configuration and manufacturing method.

【0008】[0008]

【実施例】以下、図面を参照して本発明の実施例を説明
する。図1は、本発明に係るガラス磁気ディスクの一実
施例を示す側面断面図、図2は、図1の表面粗度調整層
の膜厚及びガス圧とその表面粗度の関係を示すグラフ、
図3は、図1の表面粗度調整層の膜厚及び基板温度とそ
の表面粗度の関係を示すグラフ、図4は、図1の表面粗
度調整層の膜厚と動摩擦係数の関係を示すグラフ、図5
は、図1の表面粗度調整層の膜厚とディスクの表面粗度
の関係を示すグラフ、図6〜図8はそれぞれ、本実施例
のディスクの3例のCSSサイクルと動摩擦係数変化の
関係を示すグラフである。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a side sectional view showing one embodiment of a glass magnetic disk according to the present invention, FIG. 2 is a graph showing the relationship between the thickness and gas pressure of the surface roughness adjusting layer of FIG. 1 and the surface roughness,
FIG. 3 is a graph showing the relationship between the film thickness of the surface roughness adjusting layer and the substrate temperature and the surface roughness of FIG. 1, and FIG. 4 is a graph showing the relationship between the film thickness of the surface roughness adjusting layer and the dynamic friction coefficient of FIG. Graph showing, FIG.
Is a graph showing the relationship between the film thickness of the surface roughness adjusting layer of FIG. 1 and the surface roughness of the disk, and FIGS. 6 to 8 are the relationships between the CSS cycle and the change of the dynamic friction coefficient of three examples of the disk of this embodiment, respectively. FIG.

【0009】図1において、本実施例のガラス磁気ディ
スクは、ガラス基板1の上に表面粗度調整層2、非磁性
下地層3、磁性層4、保護層5、潤滑剤層6が順次積層
されて形成されている。表面粗度調整層2と非磁性下地
層3は、例えばクロム(Cr)で形成され、磁性層4
は、例えばCoCrTaで形成され、保護層5は、例え
ば炭素(C)で形成され、潤滑剤層6は、例えばモンテ
ジソン社製フォンブリンAM2001が用いられてい
る。
In FIG. 1, the glass magnetic disk of this embodiment has a surface roughness adjusting layer 2, a non-magnetic underlayer 3, a magnetic layer 4, a protective layer 5, and a lubricant layer 6 sequentially laminated on a glass substrate 1. It has been formed. The surface roughness adjusting layer 2 and the nonmagnetic underlayer 3 are formed of, for example, chromium (Cr), and the magnetic layer 4
Is formed of, for example, CoCrTa, the protective layer 5 is formed of, for example, carbon (C), and the lubricant layer 6 is, for example, Fomblin AM2001 manufactured by Montezison.

【0010】表面粗度調整層2は、図2に示すように、
アルゴン(Ar)のガス圧力25、45、60mTor
rでそれぞれ、クロムの膜厚が0.1、0.3、0.
5、0.6、0.75、0.9、1.0μmになるよう
にDCマクネトロンスパッタリング法で形成したとこ
ろ、表面粗度調整層2の表面粗度(中心線の平均粗さ)
Raは、膜厚0.5μm以上に形成すると極端に大きく
なり、また、アルゴン(Ar)のガス圧が高い程大きく
なった。
[0010] As shown in FIG.
Argon (Ar) gas pressure 25, 45, 60 mTorr
r, the chromium film thickness is 0.1, 0.3, 0.
When formed by DC magnetron sputtering so as to have a thickness of 5, 0.6, 0.75, 0.9, and 1.0 μm, the surface roughness of the surface roughness adjusting layer 2 (the average roughness of the center line).
Ra became extremely large when formed to a film thickness of 0.5 μm or more, and became larger as the gas pressure of argon (Ar) was higher.

【0011】また、図3に示すように、アルゴン(A
r)のガス圧力を60mTorrに固定してガラス基板
1の温度を加熱しない状態、250°Cでそれぞれ、ク
ロムの膜厚が0.5、0.75、1.0μmになるよう
に形成したところ、表面粗度調整層2の表面粗度Ra
は、ガラス基板1の温度が250°Cの場合に大きくな
った。したがって、表面粗度調整層2の表面粗度Ra
は、表面粗度調整層2としてクロムを用い、アルゴン
(Ar)のガス圧が高く、ガラス基板1の温度が高い程
大きくなることが判明した。
As shown in FIG. 3, argon (A)
r) The gas pressure was fixed at 60 mTorr and the temperature of the glass substrate 1 was not heated, and the chromium film thickness was formed at 250 ° C. so as to be 0.5, 0.75 and 1.0 μm, respectively. , The surface roughness Ra of the surface roughness adjustment layer 2
Increased when the temperature of the glass substrate 1 was 250 ° C. Therefore, the surface roughness Ra of the surface roughness adjusting layer 2
It was found that chromium was used as the surface roughness adjusting layer 2, and that the larger the gas pressure of argon (Ar) and the higher the temperature of the glass substrate 1, the larger the surface roughness.

【0012】このような表面粗度調整層2の上に同じく
クロムの非磁性下地層3を積層する場合、非磁性下地層
3は、表面粗度調整層2と区別するためにアルゴン(A
r)のガス圧力を低くして形成することが望ましい。そ
して、図4に示すように、ガス圧力が25mTorr
(△印)、60mTorr(○印)であって膜厚が0.
3、0.5、0.7μmの表面粗度調整層2の上に非磁
性下地層3、磁性層4、保護層5を順次積層した磁気デ
ィスクを形成し、保護層5の表面の動摩擦係数を測定し
たところ、表面粗度調整層2の膜厚が0.5μm以上の
場合には動摩擦係数が0.3以下であった。
When a chromium nonmagnetic underlayer 3 is also laminated on the surface roughness adjusting layer 2, the nonmagnetic underlayer 3 is formed of argon (A) in order to distinguish it from the surface roughness adjusting layer 2.
It is desirable to form the film by lowering the gas pressure of r). Then, as shown in FIG. 4, the gas pressure is 25 mTorr.
(△ mark), 60 mTorr (印 mark) and a film thickness of 0.
A magnetic disk is formed by sequentially laminating a nonmagnetic underlayer 3, a magnetic layer 4, and a protective layer 5 on a surface roughness adjusting layer 2 having a thickness of 3, 0.5, and 0.7 μm, and a dynamic friction coefficient of the surface of the protective layer 5 is formed. Was measured, the dynamic friction coefficient was 0.3 or less when the thickness of the surface roughness adjusting layer 2 was 0.5 μm or more.

【0013】また、潤滑剤層6を付加して積層した磁気
ディスクを形成して表面の動摩擦係数を測定したとこ
ろ、図4の●印及び黒三角印で示すように、動摩擦係数
に大きな差は発生しなかった。尚、表面粗度調整層2が
介在しない場合のディスクの表面の動摩擦係数は1.0
以上であり、また、ヘッドの浮上量が0.075μmの
場合、ヘッドとディスクは接触しない。
Further, when a magnetic disk laminated with the lubricant layer 6 added thereto was formed and the kinetic friction coefficient of the surface was measured, a large difference was found in the kinetic friction coefficient as shown by a black circle and a black triangle in FIG. Did not occur. The dynamic friction coefficient of the disk surface when the surface roughness adjusting layer 2 is not interposed is 1.0.
When the flying height of the head is 0.075 μm, the head does not contact the disk.

【0014】また、このように各層1〜6を積層したデ
ィスクの表面粗度Raを測定したところ、図5に示すよ
うに、表面粗度調整層2の膜厚が大きいほどディスクの
表面粗度Raが大きく測定された。尚、このディスクの
表面粗度Raは、図3に示す表面粗度調整層2の表面粗
度Raよりかなり大きいが、表面粗度調整層2の表面粗
度Raがディスクの表面粗度Raに大きな影響を与える
ことは、図5から明白である。
When the surface roughness Ra of the disk on which the layers 1 to 6 were laminated was measured, as shown in FIG. 5, as the thickness of the surface roughness adjusting layer 2 increased, the surface roughness Ra of the disk increased. Ra was greatly measured. The surface roughness Ra of the disk is considerably larger than the surface roughness Ra of the surface roughness adjusting layer 2 shown in FIG. 3, but the surface roughness Ra of the surface roughness adjusting layer 2 is smaller than the surface roughness Ra of the disk. The significant effect is apparent from FIG.

【0015】ここで、表面粗度調整層2の表面粗度Ra
は、表面粗度調整層2の上に良好な磁気特性を有する層
3、4を形成するためには適度に小さいほうが望まし
い。すなわち、ディスクの表面粗度Raは、表面粗度調
整層2の膜厚が大きいほど大きくなるが、ディスク上の
ヘッドの低浮上性を考慮すると、表面粗度調整層2の膜
厚及び表面粗度Raは、適度に小さいほうが望ましい。
Here, the surface roughness Ra of the surface roughness adjusting layer 2
In order to form the layers 3 and 4 having good magnetic properties on the surface roughness adjusting layer 2, it is desirable that the thickness be appropriately small. That is, the surface roughness Ra of the disk increases as the film thickness of the surface roughness adjustment layer 2 increases, but considering the low flying height of the head on the disk, the film thickness and surface roughness of the surface roughness adjustment layer 2 are considered. It is desirable that the degree Ra is appropriately small.

【0016】図6〜図8はそれぞれ、表面粗度調整層2
の膜厚が0.3、0.5、0.75μm、成膜時のガス
圧が60、60、25mTorr、ガラス基板1の温度
が共に250°C、ディスクの表面粗度Raが6.8、
17.2、18.8オングストロームのディスクA〜C
のCSSサイクルと動摩擦係数変化の関係を示す。
FIGS. 6 to 8 show the surface roughness adjusting layer 2 respectively.
Are 0.3, 0.5, 0.75 μm, the gas pressure during film formation is 60, 60, 25 mTorr, the temperature of the glass substrate 1 is 250 ° C., and the surface roughness Ra of the disk is 6.8. ,
17.2 and 18.8 Angstrom Discs AC
2 shows the relationship between the CSS cycle and the dynamic friction coefficient change.

【0017】図6に示すように、表面粗度調整層2の膜
厚が0.3μm、ディスクの表面粗度Raが6.8オン
グストロームのディスクAは、CSSサイクルが増加す
るにつれて動摩擦係数が大きく上昇し、図7及び図8に
示すように、表面粗度調整層2の膜厚が0.5、0.7
5μm、ディスクの表面粗度Raが17.2、18.8
オングストロームのディスクB、Cの動摩擦係数は殆ど
変化しなかった。
As shown in FIG. 6, a disk A having a surface roughness adjusting layer 2 having a thickness of 0.3 μm and a disk surface roughness Ra of 6.8 Å has a large dynamic friction coefficient as the CSS cycle increases. As shown in FIGS. 7 and 8, the surface roughness adjusting layer 2 has a thickness of 0.5, 0.7
5 μm, disk surface roughness Ra 17.2, 18.8
The dynamic friction coefficients of Angstroms disks B and C hardly changed.

【0018】したがって、上記実施例によれば、表面粗
度調整層2としてクロムが効果的であり、また、図5に
示すように表面粗度調整層2の膜厚として0.5〜0.
75μmが効果的であり、ディスクの表面粗度Raが1
5〜25オングストロームが効果的である。
Therefore, according to the above embodiment, chromium is effective as the surface roughness adjusting layer 2, and as shown in FIG.
75 μm is effective, and the surface roughness Ra of the disc is 1
5 to 25 angstroms is effective.

【0019】尚、特開昭62−293511号公報に
は、基板と金属下地層の間に、Ti、Zr、Hf、V、
Nb、Ta、Cr、Mo、W、Mnのうち少なくとも1
種の元素を含む金属酸化物から成る中間層を介在させ、
基板と金属下地層の剥離を防止してコンタクトスタート
ストップ(CSS)特性を向上したものが知られてい
る。しかしながら、この従来例では、基板と金属下地層
の剥離を防止するためにCr酸化物等の中間層を介在さ
せるので、ディスクの表面粗度が粗くならず、 ヘッド
がディスクの表面に吸着するが、本実施例では、ディス
クの表面粗度が粗くなるように表面粗度調整層2を形成
するので、ヘッドがディスクの表面に吸着しないという
効果がある。
Japanese Patent Application Laid-Open No. 62-293511 discloses that Ti, Zr, Hf, V,
At least one of Nb, Ta, Cr, Mo, W, and Mn
Interposing an intermediate layer made of a metal oxide containing a kind of element,
It is known that a contact start stop (CSS) characteristic is improved by preventing peeling of a substrate and a metal base layer. However, in this conventional example, an intermediate layer of Cr oxide or the like is interposed to prevent separation of the substrate and the metal underlayer, so that the surface roughness of the disk does not become rough, and the head is adsorbed on the surface of the disk. In this embodiment, since the surface roughness adjusting layer 2 is formed so that the surface roughness of the disk becomes rough, there is an effect that the head does not stick to the surface of the disk.

【0020】[0020]

【発明の効果】以上詳細に説明したところから明らかな
ように、本発明によれば、ディスクの表面粗度を調整す
るための層の厚さや表面粗度を適宜調整して成膜するこ
とにより、表面粗度が2次元的に等方性を有し、安価な
構成及び製造方法でヘッドが表面に吸着しないように表
面を粗く形成することができる。
As is apparent from the above description, according to the present invention, the film is formed by appropriately adjusting the thickness and the surface roughness of the layer for adjusting the surface roughness of the disk. In addition, the surface roughness is two-dimensionally isotropic, and the surface can be formed coarsely with an inexpensive configuration and manufacturing method so that the head does not stick to the surface.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るガラス磁気ディスクの一実施例を
示す側面断面図である。
FIG. 1 is a side sectional view showing one embodiment of a glass magnetic disk according to the present invention.

【図2】図1の表面粗度調整層の膜厚及びガス圧とその
表面粗度の関係を示すグラフである。
FIG. 2 is a graph showing the relationship between the thickness and the gas pressure of the surface roughness adjusting layer of FIG. 1 and the surface roughness.

【図3】図1の表面粗度調整層の膜厚及び基板温度とそ
の表面粗度の関係を示すグラフである。
FIG. 3 is a graph showing the relationship between the film thickness of the surface roughness adjusting layer of FIG. 1, the substrate temperature, and the surface roughness.

【図4】図1の表面粗度調整層の膜厚と動摩擦係数の関
係を示すグラフである。
FIG. 4 is a graph showing the relationship between the film thickness of the surface roughness adjusting layer of FIG. 1 and the dynamic friction coefficient.

【図5】図1の表面粗度調整層の膜厚とディスクの表面
粗度の関係を示すグラフである。
5 is a graph showing the relationship between the thickness of the surface roughness adjusting layer of FIG. 1 and the surface roughness of the disk.

【図6】本実施例のディスクのCSSサイクルと動摩擦
係数変化の関係を示すグラフである。
FIG. 6 is a graph showing a relationship between a CSS cycle and a change in dynamic friction coefficient of the disk of the embodiment.

【図7】本実施例のディスクのCSSサイクルと動摩擦
係数変化の関係を示すグラフである。
FIG. 7 is a graph showing a relationship between a CSS cycle and a change in dynamic friction coefficient of the disk of the present embodiment.

【図8】本実施例のディスクのCSSサイクルと動摩擦
係数変化の関係を示すグラフである。
FIG. 8 is a graph showing a relationship between a CSS cycle of the disk of the present embodiment and a change in dynamic friction coefficient.

【符号の説明】[Explanation of symbols]

1 ガラス基板 2 表面粗度調整層 3 非磁性下地層 1 glass substrate 2 surface roughness adjusting layer 3 non-magnetic underlayer

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ガラス基板にて磁気ディスクを構成する
ガラス磁気ディスクの製造方法であって、前記ガラス基
板上に、アルゴンのガス圧が25乃至60mTorrで
層の厚さが0.5乃至0.75μmになるようにスパッ
タリングによりディスクの表面粗度を調整するための層
を成膜するステップと、 前記表面粗度を調整するための層の上に非磁性下地層を
形成するステップと、 前記非磁性下地層の上に磁性層を形成するステップと
を、 有するガラス磁気ディスクの製造方法。
1. A method of manufacturing a glass magnetic disk comprising a magnetic disk on a glass substrate, wherein a gas pressure of argon is 25 to 60 mTorr and a thickness of a layer is 0.5 to 0. Forming a layer for adjusting the surface roughness of the disk by sputtering so as to have a thickness of 75 μm; forming a non-magnetic underlayer on the layer for adjusting the surface roughness; Forming a magnetic layer on the magnetic underlayer.
【請求項2】 前記ガラス磁気ディスクの表面の中心線
平均粗さが15乃至25オングストロームとなるよう前
記表面粗度を調整するための層を設ける請求項1記載の
ガラス磁気ディスクの製造方法。
2. The method of manufacturing a glass magnetic disk according to claim 1, wherein a layer for adjusting the surface roughness is provided so that the center line average roughness of the surface of the glass magnetic disk is 15 to 25 Å.
JP3125268A 1991-04-26 1991-04-26 Manufacturing method of glass magnetic disk Expired - Fee Related JP2730318B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3125268A JP2730318B2 (en) 1991-04-26 1991-04-26 Manufacturing method of glass magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3125268A JP2730318B2 (en) 1991-04-26 1991-04-26 Manufacturing method of glass magnetic disk

Publications (2)

Publication Number Publication Date
JPH04328317A JPH04328317A (en) 1992-11-17
JP2730318B2 true JP2730318B2 (en) 1998-03-25

Family

ID=14905879

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3125268A Expired - Fee Related JP2730318B2 (en) 1991-04-26 1991-04-26 Manufacturing method of glass magnetic disk

Country Status (1)

Country Link
JP (1) JP2730318B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06215345A (en) * 1993-01-20 1994-08-05 Fuji Electric Co Ltd Magnetic recording medium and production thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2621358B2 (en) * 1988-06-06 1997-06-18 富士通株式会社 Magnetic recording media
JPH029016A (en) * 1988-06-28 1990-01-12 Victor Co Of Japan Ltd Thin film magnetic disk

Also Published As

Publication number Publication date
JPH04328317A (en) 1992-11-17

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