JP2717172B2 - Ion neutralizer - Google Patents
Ion neutralizerInfo
- Publication number
- JP2717172B2 JP2717172B2 JP63195130A JP19513088A JP2717172B2 JP 2717172 B2 JP2717172 B2 JP 2717172B2 JP 63195130 A JP63195130 A JP 63195130A JP 19513088 A JP19513088 A JP 19513088A JP 2717172 B2 JP2717172 B2 JP 2717172B2
- Authority
- JP
- Japan
- Prior art keywords
- oil
- ion
- speed
- vacuum
- oil reservoir
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001816 cooling Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 description 20
- 239000007789 gas Substances 0.000 description 19
- 238000010884 ion-beam technique Methods 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 241000270295 Serpentes Species 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Particle Accelerators (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 「産業上の利用分野」 本発明は、高速原子線発生装置に適用して好適なイオ
ン中和器に関するものである。Description: TECHNICAL FIELD The present invention relates to an ion neutralizer suitable for application to a high-speed atomic beam generator.
「従来の技術」 第２図は、従来のガスセル形イオン中和器を備えた高
速原子線発生装置の概要図である。図中、１はイオン
源、２はイオンビーム、３はガスセル、４はガスノズ
ル、５はガス、６は高速原子線、７は真空容器、８は真
空ポンプ、９はイオンビーム入射孔、10は高速原子線放
出孔である。[Prior Art] FIG. 2 is a schematic view of a conventional high-speed atomic beam generator equipped with a gas cell type ion neutralizer. In the figure, 1 is an ion source, 2 is an ion beam, 3 is a gas cell, 4 is a gas nozzle, 5 is a gas, 6 is a fast atom beam, 7 is a vacuum vessel, 8 is a vacuum pump, 9 is an ion beam entrance hole, 10 is It is a fast atom beam emission hole.
この装置において、高速原子線を発生させるには、ま
ずイオン源１、ガスセル３、ガスノズル４を真空容器７
に収め、真空ポンプ８で充分に排気する。次いで、イオ
ン源１からイオンビーム２を放射させる。そして、ガス
ノズル４を通して、例えばアルゴンガス５をガスセル３
の内部に注入する。イオンビーム入射孔９からガスセル
３に入ったイオンビーム２は、アルゴンガスと衝突して
電荷を失い、高速原子線６となって、高速原子線放出孔
10から放出する。In this apparatus, in order to generate a high-speed atomic beam, first, the ion source 1, the gas cell 3, and the gas nozzle 4 are connected to a vacuum vessel
And evacuated sufficiently with a vacuum pump 8. Next, an ion beam 2 is emitted from the ion source 1. Then, for example, an argon gas 5 is supplied through the gas nozzle 4 to the gas cell 3.
Inject inside. The ion beam 2 entering the gas cell 3 from the ion beam incident hole 9 collides with the argon gas and loses electric charge, becomes a fast atom beam 6, and becomes a fast atom beam emission hole.
Release from 10.
「発明が解決しようとする課題」 上記のガスセル形イオン中和器は、イオンの中和効率
が優れてはいるものの、ガスセル３に注入されたアルゴ
ンガスが、イオンビーム入射孔９、高速原子線放出孔10
から噴射するために、真空容器７内部のガス圧が上昇
し、高い真空度での高速原子線の取り出しが難しかっ
た。特に、大量の高速原子線を得ようとすれば、ガスセ
ルに多量のアルゴンガスを注入しなくてはならないため
に、真空容器７内を高真空に維持することは、ますます
困難となる。それを実現するには、真空ポンプ８の容量
を非常に大きくしたり、差動排気の機構を付加するなど
の工夫が必要で、装置の大型化を招き、経済的にも負担
増となるなどの問題があった。[Problems to be Solved by the Invention] Although the gas cell type ion neutralizer described above has excellent ion neutralization efficiency, the argon gas injected into the gas cell 3 uses the ion beam incident hole 9 and the high-speed atomic beam. Release hole 10
As a result, the gas pressure inside the vacuum vessel 7 increased, and it was difficult to extract a high-speed atomic beam at a high degree of vacuum. Particularly, in order to obtain a large amount of high-speed atomic beams, it is increasingly difficult to maintain a high vacuum in the vacuum vessel 7 because a large amount of argon gas must be injected into the gas cell. To achieve this, it is necessary to devise measures such as making the capacity of the vacuum pump 8 very large or adding a mechanism for differential pumping, which results in an increase in the size of the apparatus and an increase in the economic load. There was a problem.
本発明は上記の事情に鑑みてなされたもので、高速原
子線発生装置に適用した場合に、高い真空度で高速原子
線を取り出すことができ、装置の大型化を招くことがな
く大量の高速原子線を得ることができ、かつ装置を安価
に得ることのできるイオン中和器を提供することを目的
としている。The present invention has been made in view of the above circumstances, and when applied to a high-speed atomic beam generator, can extract a high-speed atomic beam at a high degree of vacuum, and can perform a large amount of high-speed operation without increasing the size of the apparatus. It is an object of the present invention to provide an ion neutralizer capable of obtaining an atomic beam and inexpensively obtaining an apparatus.
「課題を解決するための手段」 本発明は、オイルリザーバーと、このオイルリザーバ
ーを加熱するヒーターと、同オイルリザーバー内に発生
したオイル蒸気を噴出するノズルと、噴出したオイル蒸
気を内壁に衝突させてこれを冷却液化する円筒冷却器か
ら構成されることを特徴とするものである。Means for Solving the Problems The present invention provides an oil reservoir, a heater for heating the oil reservoir, a nozzle for ejecting oil vapor generated in the oil reservoir, and causing the ejected oil vapor to collide with the inner wall. And a cylindrical cooler for cooling and liquefying it.
本発明は、従来のガスセルの替わりに、オイルの加熱
蒸気・冷却液化を行う容器にイオンビームを入射させる
ものであって、イオンと気化したオイル分子との衝突
で、効率良くイオンの中和が進行するとともに、オイル
蒸気が真空容器中に噴出することがないために、高真空
での高速原子線の放出が可能であることが主な特徴であ
る。In the present invention, instead of a conventional gas cell, an ion beam is made incident on a vessel for heating and cooling and liquefying oil, and collision of ions with vaporized oil molecules efficiently neutralizes ions. The main feature is that high-speed emission of atomic beams in a high vacuum is possible because oil vapor does not squirt into the vacuum vessel as it proceeds.
「実施例」 以下、第１図を参照して本発明の一実施例について説
明する。Embodiment An embodiment of the present invention will be described below with reference to FIG.
第１図は本発明によるイオン中和器を備えた高速原子
線発生装置の構成を示す図である。図中、１、２、６〜
10は、第２図の対応する番号の要素と同一の動作、機能
を有する。21は円筒冷却器、22は水冷蛇管、23は熱絶縁
板、24はオイルリザーバー、25はヒーター、26はオイ
ル、27はノズルである。FIG. 1 is a diagram showing the configuration of a high-speed atomic beam generator equipped with an ion neutralizer according to the present invention. In the figure, 1, 2, 6-
Numeral 10 has the same operation and function as the correspondingly numbered elements in FIG. 21 is a cylindrical cooler, 22 is a water-cooled snake tube, 23 is a heat insulating plate, 24 is an oil reservoir, 25 is a heater, 26 is oil, and 27 is a nozzle.
円筒冷却器21は、外観円筒形に形成されたもので、そ
の上端にテーパ部21aを有する。テーパ部21aの上端はイ
オンビーム入射孔９となっている。この円筒冷却器21の
外壁面には水冷蛇管22が巻回されている。熱絶縁板23は
環状に形成されたもので、その内壁面を円筒冷却器21の
内壁面に合致させて該円筒冷却器の下側に配置されてい
る。オイルリザーバー24は外観円筒状に形成されたもの
で、その内壁面24aを円筒冷却器21および熱絶縁板23の
内壁面に合致させて熱絶縁板23の下側に配置されてい
る。このオイルリザーバー24はその内部にオイル26が注
入されるオイル室24bを有し、オイル室24bにはその先端
が内壁面24aに開口するノズル27が設けられている。ま
た、このオイルリザーバー24の外壁面にはヒーター25が
巻回されている。The cylindrical cooler 21 is formed in an external cylindrical shape, and has a tapered portion 21a at an upper end thereof. The upper end of the tapered portion 21a is an ion beam incident hole 9. A water-cooled snake tube 22 is wound around the outer wall surface of the cylindrical cooler 21. The heat insulating plate 23 is formed in a ring shape, and is disposed below the cylindrical cooler 21 such that its inner wall surface matches the inner wall surface of the cylindrical cooler 21. The oil reservoir 24 is formed in a cylindrical shape in appearance, and is disposed below the heat insulating plate 23 with its inner wall surface 24a coinciding with the inner wall surfaces of the cylindrical cooler 21 and the heat insulating plate 23. The oil reservoir 24 has an oil chamber 24b into which the oil 26 is injected, and the oil chamber 24b is provided with a nozzle 27 having a tip opening on the inner wall surface 24a. A heater 25 is wound around the outer wall surface of the oil reservoir 24.
この装置においては高速原子線を発生させるには、
１、21〜27の要素を真空容器７に収め、真空ポンプ８で
充分に排気する。そして水冷蛇管22に水を流して円筒冷
却器21を冷却する。また、ヒーター25によってオイルリ
ザーバー24を加熱して、内部のオイル26を蒸発させる。
オイル26の蒸気はノズル27からビームとなって噴出し、
円筒冷却器21の内壁に衝突して冷却液化する。液化した
オイルは、円筒冷却器の21の管壁、熱絶縁板23の内壁、
ノズル27の壁面を伝わってオイルリザーバー24に戻る。
熱絶縁板23は、オイルリザーバー24と円筒冷却器21の間
を熱的に遮断するものである。このオイルの循環過程に
おいて、円筒冷却器21の内部の空間は、密度の高いオイ
ル蒸気で満たされている。ここにイオン源１から放出さ
れたイオンビーム２が入射し、イオンとオイル蒸気との
衝突でイオンの電荷が失われて、総則原子線６となって
放出する。結局、21〜27の要素で、一つのイオン中和器
が形成されていることになる。このようにオイルが、オ
イルリザーバー24と円筒冷却器21の間を循環しているか
ら、オイルの蒸気が、イオンビーム入射孔９、高速原子
線放出孔10から噴出することはなく、真空容器７の内部
の真空度が低下することもない。In this device, to generate fast atomic beams,
The elements 1, 21 to 27 are housed in a vacuum vessel 7 and sufficiently evacuated by a vacuum pump 8. Then, water is caused to flow through the water-cooled snake tube 22 to cool the cylindrical cooler 21. The oil reservoir 24 is heated by the heater 25 to evaporate the oil 26 inside.
The steam of the oil 26 gushes out of the nozzle 27 as a beam,
It collides with the inner wall of the cylindrical cooler 21 and is cooled and liquefied. The liquefied oil is supplied to the tube wall of the cylindrical cooler 21, the inner wall of the heat insulating plate 23,
It travels down the wall of the nozzle 27 and returns to the oil reservoir 24.
The heat insulating plate 23 is for thermally shutting off the space between the oil reservoir 24 and the cylindrical cooler 21. In this oil circulation process, the space inside the cylindrical cooler 21 is filled with dense oil vapor. Here, the ion beam 2 emitted from the ion source 1 is incident, the charge of the ions is lost due to the collision between the ions and the oil vapor, and the ions are emitted as a general atomic beam 6. As a result, one ion neutralizer is formed by the elements 21 to 27. Since the oil circulates between the oil reservoir 24 and the cylindrical cooler 21 in this manner, the vapor of the oil does not erupt from the ion beam entrance hole 9 and the high-speed atom beam emission hole 10, and the vacuum vessel 7 The degree of vacuum inside is not reduced.
「発明の効果」 本発明によれば、これを高速原子線発生装置に適用し
た場合に、真空容器内の真空度の低下を抑えることがで
きるので、高い真空度で高速原子線を取り出すことがで
き、装置の大型化を招くことなく大量の高速原子線を得
ることができ、かつ装置を安価に得ることができるとい
う効果が得られる。[Effects of the Invention] According to the present invention, when this is applied to a high-speed atomic beam generator, a decrease in the degree of vacuum in a vacuum vessel can be suppressed, so that a high-speed atomic beam can be taken out at a high degree of vacuum. This makes it possible to obtain a large amount of high-speed atomic beams without increasing the size of the device, and to obtain the effect that the device can be obtained at low cost.
高速原子線は、高速のイオンビームと同様に、スパッ
タ蒸着による薄膜形成、スパッタエッチングによる微細
パターン加工、二次イオン質量分析による材料評価に利
用することができる。特に、高速原子線は非常荷電性で
あるために、金属、半導体ばかりでなく、イオンビーム
法が不得意とするプラスチックス、セラミックスなどの
絶縁物を対象とする場合にも威力がある。その意味にお
いて、高真空中での大量の高速原子を発生することが出
来るイオン中和器が得られることは、加工、分析の能率
向上に非常に有益である。Like a high-speed ion beam, a high-speed atomic beam can be used for thin film formation by sputter deposition, fine pattern processing by sputter etching, and material evaluation by secondary ion mass spectrometry. In particular, a fast atomic beam is very chargeable, and is therefore useful not only for metals and semiconductors but also for insulators such as plastics and ceramics, which are not good at the ion beam method. In that sense, obtaining an ion neutralizer capable of generating a large amount of high-speed atoms in a high vacuum is very useful for improving the efficiency of processing and analysis.
第１図は本発明の一実施例を示す図であって、本発明に
よるイオン中和器を備えた高速原子線発生装置の概略構
成図、第２図は従来のガスセル形イオン中和器を備えた
高速原子線発生装置の概略構成図である。 １……イオン源、21……円筒冷却器、22……水冷蛇管、
23……熱絶縁板、24……オイルリザーバー、25……ヒー
ター、26……オイル、27……ノズル。FIG. 1 is a view showing one embodiment of the present invention, and is a schematic configuration diagram of a high-speed atom beam generator provided with an ion neutralizer according to the present invention. FIG. 2 is a diagram showing a conventional gas cell type ion neutralizer. 1 is a schematic configuration diagram of a high-speed atomic beam generator provided. 1 ... Ion source, 21 ... Cylinder cooler, 22 ... Water-cooled snake tube,
23 ... heat insulating plate, 24 ... oil reservoir, 25 ... heater, 26 ... oil, 27 ... nozzle.
Claims (1)
ーを加熱するヒーターと、同オイルリザーバー内に発生
したオイル蒸気を噴出するノズルと、噴出したオイル蒸
気を内壁に衝突させてこれを冷却液化する円筒冷却器か
ら構成されることを特徴とするイオン中和器。An oil reservoir, a heater for heating the oil reservoir, a nozzle for jetting oil vapor generated in the oil reservoir, and a cylindrical cooling unit for colliding the jetted oil vapor with an inner wall to liquefy the oil. An ion neutralizer comprising a vessel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63195130A JP2717172B2 (en) | 1988-08-04 | 1988-08-04 | Ion neutralizer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63195130A JP2717172B2 (en) | 1988-08-04 | 1988-08-04 | Ion neutralizer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0244300A JPH0244300A (en) | 1990-02-14 |
| JP2717172B2 true JP2717172B2 (en) | 1998-02-18 |
Family
ID=16335979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63195130A Expired - Lifetime JP2717172B2 (en) | 1988-08-04 | 1988-08-04 | Ion neutralizer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2717172B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL92477A (en) * | 1989-11-28 | 1993-08-18 | Israel State | Electrothermic projectile launching device |
| KR100834466B1 (en) * | 2006-10-18 | 2008-06-05 | (주)선재하이테크 | A bar type ionizer using Piezo and nozzle |
-
1988
- 1988-08-04 JP JP63195130A patent/JP2717172B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0244300A (en) | 1990-02-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Milani et al. | Improved pulsed laser vaporization source for production of intense beams of neutral and ionized clusters | |
| Hoffmann et al. | Energy loss of heavy ions in a plasma target | |
| Ursu et al. | Al 2 O 3 ceramics under high-fluence irradiation: plasma plume dynamics through space-and time-resolved optical emission spectroscopy | |
| JP2009542900A (en) | Electron beam evaporator | |
| JP2717172B2 (en) | Ion neutralizer | |
| Amoruso et al. | High fluence laser ablation of aluminum targets: Time-of-flight mass analysis of plasmas produced at wavelengths 532 and 355 nm | |
| JP2002522212A (en) | ESRF chamber cooling system and method | |
| US3395302A (en) | Vapor target for particle accelerators | |
| US5055672A (en) | Fast atom beam source | |
| US5243189A (en) | Ion neutralizer | |
| JPH06108236A (en) | Thin film forming device | |
| Bennett et al. | Separating thermal, electronic, and topographic effects in pulsed laser melting and sputtering of gold | |
| Focsa et al. | Na/K (H2O) n clusters produced by laser desorption of Na/K salt doped ice | |
| Rai et al. | Some studies on picosecond laser produced plasma expanding across a uniform external magnetic field | |
| JPS63238264A (en) | Device for ejecting vapor and cluster of material to be deposited by evaporation | |
| JP2575375B2 (en) | Thin film forming equipment | |
| JPS6297242A (en) | Ion gun for focus ion beam apparatus | |
| Katorov et al. | Discharge initiation by a laser pulse in a vacuum gap | |
| Kapadia et al. | The theory of radiative transfer in the plasma of the keyhole in penetration laser welding | |
| JPH03158458A (en) | Cluster ion beam device | |
| Tisone et al. | Laser formation of lithium plasma ion sources for applied-B ion diodes on the PBFA-II accelerator | |
| Kasuya et al. | Collision Enhanced Decomposition of Microclusters Ablated from Si Surface by Excimer Laser Irradiation in Gas Environment | |
| JPH05125525A (en) | Organic thin film forming device | |
| Pashchina et al. | Pulsed plasma jet interaction with a metal targets | |
| Newton et al. | Laser and microwave interferometric study of recombination in a highly ionised helium plasma |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20071114 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081114 Year of fee payment: 11 |
|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081114 Year of fee payment: 11 |