JP2692854B2 - Automatic exposure control device - Google Patents

Automatic exposure control device

Info

Publication number
JP2692854B2
JP2692854B2 JP63123679A JP12367988A JP2692854B2 JP 2692854 B2 JP2692854 B2 JP 2692854B2 JP 63123679 A JP63123679 A JP 63123679A JP 12367988 A JP12367988 A JP 12367988A JP 2692854 B2 JP2692854 B2 JP 2692854B2
Authority
JP
Japan
Prior art keywords
frame
photometric
photometric frame
outside
exposure control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63123679A
Other languages
Japanese (ja)
Other versions
JPH01293077A (en
Inventor
北洋 金田
英雄 本間
昭広 藤原
浩史 須田
邦彦 山田
克二 吉村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP63123679A priority Critical patent/JP2692854B2/en
Priority to GB8909403A priority patent/GB2219461B/en
Priority to DE3913803A priority patent/DE3913803A1/en
Publication of JPH01293077A publication Critical patent/JPH01293077A/en
Priority to US08/190,226 priority patent/US5677733A/en
Priority to US08/483,561 priority patent/US6570620B1/en
Application granted granted Critical
Publication of JP2692854B2 publication Critical patent/JP2692854B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明はビデオカメラ等に用いて好適な自動露光制御
装置に関するものである。
The present invention relates to an automatic exposure control device suitable for use in a video camera or the like.

(従来の技術) 従来よりビデオカメラ等の映像機器においては、自動
露光制御が行われており、ビデオカメラのように常時露
光制御を行うものでは、映像信号レベルが常に一定とな
るように光学系の絞り及びAGC回路をフイードバツク制
御するような構成となっている。
(Prior Art) In video equipment such as video cameras, automatic exposure control has been conventionally performed, and in the case of constant exposure control such as video cameras, an optical system is used so that the video signal level is always constant. The aperture and the AGC circuit are controlled by feedback control.

第9図はビデオカメラに用いられている従来の自動露
光制御装置の一般的構成を示すブロツク図である。
FIG. 9 is a block diagram showing a general configuration of a conventional automatic exposure control device used in a video camera.

同図において、1は撮影レンズ、2は撮影レンズ1を
介して入射される入射光量を制御する絞りを含む露光制
御部、3が撮影レンズ1によってその撮像面上に結像さ
れた画像情報を光電変換して画像信号を出力するたとえ
ばCCD等の撮像素子、4は撮像素子3の出力側に設けら
れたバツフアアンプ,AGC回路等を含むアンプ、5はバツ
フアアンプ4より出力された映像信号にガンマ補正,ブ
ランキング処理,同期信号の付加等の信号処理を行っ
て、たとえば規格化されたNTSC方式の信号に変換し、ビ
デオ出力端子より図示しないモニタデイスプレイあるい
はビデオレコーダに供給するのに適した信号にする信号
処理回路である。6はアンプ4の出力信号レベルを検出
し、この信号レベルが予め設定された一定レベルとなる
よう、露光制御部2およびアンプ4内のAGC回路等へ制
御信号としてフイードバツクする信号レベル検出回路で
ある。
In the figure, 1 is a taking lens, 2 is an exposure control unit including a diaphragm for controlling the amount of incident light incident through the taking lens 1, and 3 is image information formed by the taking lens 1 on its imaging surface. An image pickup device such as a CCD for photoelectrically converting and outputting an image signal, 4 is a buffer amplifier provided on the output side of the image pickup device 3, an amplifier including an AGC circuit, and 5 is a gamma correction for the video signal output from the buffer amplifier 4. , Signal processing such as blanking processing and addition of synchronization signal is performed to convert it to a standardized NTSC signal, for example, and a signal suitable for supply to a monitor display (not shown) or a video recorder from the video output terminal. Signal processing circuit. A signal level detection circuit 6 detects the output signal level of the amplifier 4 and feeds back a control signal to the exposure control unit 2 and the AGC circuit in the amplifier 4 so that the signal level becomes a preset constant level. .

これによって映像信号レベルが常に一定の目標値とな
り、自動露光制御を行うことができる。
As a result, the video signal level always becomes a constant target value, and automatic exposure control can be performed.

しかしながら上述の構成ではこの場合、被写体と背景
部との輝度差が大きい場合、逆光であれば被写体が黒く
つぶれ、また、順光時には、被写体が白くとび、画像が
不自然となる現象が生じる。
However, in the above-described configuration, in this case, when the brightness difference between the subject and the background portion is large, the subject is crushed in black when the subject is backlit, and when the subject is normally illuminated, the subject becomes white and the image becomes unnatural.

この現象を改善するために、撮影画面の一部分を重点
的に測光する重点測光方式が用いられている。
In order to improve this phenomenon, a weighted metering method is used in which light is focused on a part of the shooting screen.

この重点測光方式は、撮影画面の中央部に測光枠を設
定し、その内部を測光領域として、測光領域内にとらえ
た被写体に対して常に適正露光となるように制御を行う
ようにしたものである。
This weighted metering system is a system that sets a metering frame in the center of the shooting screen, sets the inside as a metering area, and controls so that the subject captured in the metering area is always exposed properly. is there.

第10図はこの重点測光方式の構成を説明するためのブ
ロック図で、第7図の構成と異なる点は、画面の中央部
の測光枠内部分に相当する映像信号のみを信号レベル検
出回路6へと供給するため、アンプ4より信号レベル検
出回路6へ供給される信号を開閉するためのゲート回路
30と、同期信号SYNCにしたがってこのゲート回路30を制
御し、測光枠内信号のみを通過させるゲートパルスを発
生させるゲートパルス発生回路31を設けたことである。
FIG. 10 is a block diagram for explaining the configuration of this priority photometry method. The difference from the configuration of FIG. 7 is that only the video signal corresponding to the inside of the photometry frame at the center of the screen is detected by the signal level detection circuit 6 Circuit for opening and closing the signal supplied from the amplifier 4 to the signal level detection circuit 6 in order to supply
30 and a gate pulse generation circuit 31 for controlling the gate circuit 30 in accordance with the synchronizing signal SYNC and generating a gate pulse for passing only the signal within the photometric frame.

これによって背景の影響を受けずに測光枠内の被写体
に対して常に適正露光となるよう、自動露光制御が行わ
れる。
As a result, automatic exposure control is performed so that the subject within the photometric frame is always exposed properly without being affected by the background.

(発明が解決しようとする問題点) しかしながら、上記枠重点測光方式によれば、測光領
域(測光枠)が画面上において位置的に固定されている
とともに、露光制御も所謂逆光補正と白とび補正のみで
あったため、枠重点測光を行っているとき、 i) 被写体とカメラが相対的に移動して被写体が測光
領域から外れると、測光領域内の明るさが変化するた
め、これにしたがって露光補正が行われ、画面全体の明
るさが変化され、同時に被写体の明るさも変化して撮影
者に対してきわめて不自然な印象を与える。
(Problems to be Solved by the Invention) However, according to the frame-weighted photometry method, the photometry area (photometry frame) is positionally fixed on the screen, and the exposure control is also called so-called backlight compensation and overexposure compensation. Therefore, when performing frame-weighted metering, i) If the subject and the camera move relative to each other and the subject moves out of the metering area, the brightness in the metering area will change. The brightness of the entire screen is changed, and at the same time, the brightness of the subject is changed, giving a very unnatural impression to the photographer.

ii) 被写体を誤認識して誤動作する危険がある。ii) There is a risk of erroneously recognizing the subject and causing malfunction.

等の問題があり、常に画面内における画像の状態に応じ
て適正な露光制御を行う装置の実現が望まれていた。
Therefore, it has been desired to realize an apparatus that always performs appropriate exposure control according to the state of the image on the screen.

(問題点を解決するための手段) 本発明は、上述した問題点を解決することを目的とし
てなされたもので、その特徴とするところは、撮影画面
内において、被写体に重点測光するための測光枠の設定
位置を移動可能な測光枠設定手段と、前記測光枠内外に
相当する輝度レベルをそれぞれ検出し、それらの輝度レ
ベルの差が所定のしきい値以上であるか否かを判別する
判別手段と、前記判別手段の判別結果にもとづいて露光
状態を制御し、前記測光枠内外の輝度レベルの差が前記
しきい値を越えていた場合には、前記測光枠内に相当す
る輝度レベルに対する重み付けを大きくして前記測光枠
内の輝度レベルに対して重点測光を行い、前記測光枠内
外の輝度レベルの差が前記しきい値以下であった場合
は、前記測光枠内外の輝度レベルの平均測光を行う露光
制御手段と、前記露光制御手段を動作させながら、前記
測光枠の設定位置を前記被写体像の動きに追尾させるべ
く前記測光枠設定手段を制御する測光枠追尾手段とを備
え、前記測光枠追尾手段による前記測光枠の設定位置の
移動に伴う露光状態の変化を前記露光制御手段により並
行して補正し得るようにした自動露光制御装置にある。
(Means for Solving Problems) The present invention has been made for the purpose of solving the above-mentioned problems, and is characterized in that it is a photometric device for performing intensive photometry on a subject in a shooting screen. A photometric frame setting means capable of moving the set position of the frame and a brightness level corresponding to the inside and outside of the photometric frame are respectively detected, and it is determined whether or not the difference between the brightness levels is a predetermined threshold value or more. Means and the exposure state is controlled based on the determination result of the determination means, and when the difference between the brightness levels inside and outside the photometric frame exceeds the threshold value, the brightness level corresponding to the brightness level inside the photometric frame is determined. When the weighting is increased to perform the intensive photometry on the brightness level inside the photometry frame, and the difference between the brightness levels inside and outside the photometry frame is less than or equal to the threshold value, the average brightness level inside and outside the photometry frame. Photometry And an exposure control unit for controlling the photometry frame setting unit so as to track the set position of the photometry frame with the movement of the subject image while operating the exposure control unit. The automatic exposure control device is such that a change in the exposure state due to the movement of the set position of the photometric frame by the frame tracking means can be corrected in parallel by the exposure control means.

(作用) これにより、被写体とその背景の状態を判別して、逆
光補正、白飛び補正等の露出補正を自動的に行うことが
できるとともに、常時適性露光状態を保持することがで
き、また被写体が移動しても、被写体に測光枠を追尾さ
せ、適性露光制御をリアルタイムで連続して行うことが
できる。
(Operation) As a result, the state of the subject and its background can be discriminated, and exposure compensation such as backlight compensation and whiteout compensation can be automatically performed, and an appropriate exposure state can be maintained at all times. Even if is moved, the subject can be tracked by the photometric frame, and appropriate exposure control can be continuously performed in real time.

(実施例) 以下、本発明における自動露光制御装置を各図を用い
てその一実施例について詳細に説明する。尚、第9図,
第10図に示す従来例と同一構成部分については同一符号
を用いて説明する。
(Embodiment) An embodiment of the automatic exposure control apparatus according to the present invention will be described in detail below with reference to the drawings. Incidentally, FIG.
The same components as those of the conventional example shown in FIG. 10 will be described using the same reference numerals.

撮影レンズ1,露光制御部2,撮像素子3,アンプ4,信号処
理装置5の個々の構成は第9図,第10図と同一のもので
ある。またMDは信号処理回路5の映像出力のモニタデイ
スプレイである。
The individual configurations of the photographing lens 1, the exposure control unit 2, the image pickup device 3, the amplifier 4, and the signal processing device 5 are the same as those in FIGS. 9 and 10. MD is a monitor display of the video output of the signal processing circuit 5.

6は、第2図に示すように、撮影画面100上に測光枠1
01を設定し、その内部領域EAとその外側の外部領域EBを
設定する測光枠設定回路である。7a,7bはゲートパルス
発生回路14より出力されるゲートパルスにしたがって、
撮影画面100上の指定領域に対応する映像信号(輝度信
号)を通過させるゲート回路で、ゲート回路7aは撮影画
面100上における測光枠101内の枠内領域EAに対応する映
像信号を通過させる。一方、ゲート回路7bは、ゲートパ
ルス発生回路14より出力するゲートパルスをインバータ
NOTで反転させた信号を供給されており、したがって撮
影画面100上の測光枠101外部の背景に枠外領域EBに対応
する映像信号を通過させることになる。8a,8bはそれぞ
れゲート回路7a,7bより出力された測光枠内外の映像信
号を1フイールド期間で積分する積分回路、9a,9bは、
積分回路8a,8bより出力された積分値をそれぞれの領域
の面積で正規化するための面積補正回路である。面積補
正回路9a,9bは、測光枠101の内外の領域Ea,Ebの面積が
それぞれ異ることから、積分回路8a,8bの積分出力をそ
のまま比較することができないため、各積分値をその抽
出された領域の面積によって正規化し、その平均輝度レ
ベルとして比較できるようにするために設けられている
ものである。ここで各領域の平均輝度レベルをそれぞれ
Ea,Ebとする。
As shown in FIG. 2, 6 indicates a photometric frame 1 on the shooting screen 100.
This is a photometry frame setting circuit for setting 01 and setting the inner area EA and the outer area EB outside thereof. 7a, 7b, according to the gate pulse output from the gate pulse generation circuit 14,
The gate circuit 7a is a gate circuit for passing a video signal (luminance signal) corresponding to a designated area on the photographing screen 100, and the gate circuit 7a allows a video signal corresponding to an in-frame area EA in the photometric frame 101 on the photographing screen 100 to pass. On the other hand, the gate circuit 7b is an inverter for the gate pulse output from the gate pulse generation circuit 14.
Since the signal inverted by NOT is supplied, the video signal corresponding to the outside-frame area EB is passed through the background outside the photometric frame 101 on the photographic screen 100. 8a and 8b are integrating circuits for integrating the video signals inside and outside the photometric frame output from the gate circuits 7a and 7b in one field period, and 9a and 9b are
It is an area correction circuit for normalizing the integrated values output from the integrating circuits 8a and 8b by the area of each region. Since the area correction circuits 9a and 9b cannot compare the integrated outputs of the integration circuits 8a and 8b as they are because the areas Ea and Eb inside and outside the photometric frame 101 are different from each other, each integrated value is extracted. It is provided in order to normalize by the area of the created region and to make comparison as the average brightness level. Here, the average brightness level of each area
Ea and Eb.

10は面積補正回路9a,9bより出力された、それぞれ測
光枠内外の輝度信号の積分値を引算してその差を演算す
る引算器、11は引算した結果すなわち測光枠内外の領域
EA,EBにおける平均輝度レベルEa,Ebの差の絶対値をもと
めるための絶対値回路、12は絶対値回路11の出力をデジ
タル値に変換するA/D変換器、13はA/D変換器12によって
デジタル値に変換された測光領域EA,EBの輝度差の絶対
値及び後述する判別回路15の判別結果にもとづいて、こ
の輝度差が最大となるようにゲートパルス発生回路14を
制御し、撮影画面上における測光枠101の位置を制御す
るための制御用マイクロコンピユータである。そしてゲ
ートパルス発生回路14は制御用マイクロコンピユータ13
の指令にしたがって、ゲートパルスの発生タイミングを
可変し、映像信号中の通過部分すなわち撮影画面100上
に測光枠101を設定する位置を可変するものである。ま
た制御用マイクロコンピユータ13からは、モニタデイス
プレイMDに測光枠101の位置を表示するための測光枠表
示信号GDが信号処理回路5へと供給されている。
10 is a subtracter that subtracts the integrated value of the luminance signal inside and outside the photometric frame output from the area correction circuits 9a and 9b to calculate the difference, and 11 is the result of the subtraction, that is, the area inside and outside the photometric frame
Absolute value circuit for obtaining the absolute value of the difference between the average brightness levels Ea and Eb in EA and EB, 12 is an A / D converter that converts the output of absolute value circuit 11 into a digital value, and 13 is an A / D converter Based on the absolute value of the brightness difference of the photometric area EA, EB converted into a digital value by 12 and the determination result of the determination circuit 15 described later, the gate pulse generation circuit 14 is controlled so that this brightness difference is maximized, This is a control microcomputer for controlling the position of the photometric frame 101 on the shooting screen. The gate pulse generation circuit 14 is a control microcomputer 13
The gate pulse generation timing is changed in accordance with the command (1), and the position where the photometric frame 101 is set on the passing portion in the video signal, that is, on the photographic screen 100 is changed. Further, a photometric frame display signal GD for displaying the position of the photometric frame 101 on the monitor display MD is supplied from the control microcomputer 13 to the signal processing circuit 5.

一般に撮影画面内においては、主要被写体部分がその
背景に比較して輝度レベルが高い(高周波成分が多い)
ため、測光枠101で被写体をとらえている状態で、常に
測光枠内外の輝度差が最大となるように測光枠を移動す
れば、測光枠は常に被写体を追尾し、常に最もよく被写
体をとらえることができる。
Generally, in the shooting screen, the main subject has a higher brightness level than the background (there are many high-frequency components).
Therefore, if you move the metering frame so that the brightness difference between the inside and outside of the metering frame is always maximized while the object is being captured by the metering frame 101, the metering frame will always track the subject and always capture the best subject. You can

尚、測光枠内外の領域EA,EBの輝度差Ea,Ebが最大とな
るように測光枠の位置を制御する追尾アルゴリズムにつ
いては後述する。
A tracking algorithm for controlling the position of the photometric frame so that the brightness differences Ea and Eb between the areas EA and EB inside and outside the photometric frame are maximized will be described later.

15は上述の引算回路10より出力された測光枠101内外
の領域の輝度差すなわちEa-Ebを予め設定されているス
レシヨルドレベル、TH1,TH2(TH1<TH2)と比較し、画
面の状態、すなわち逆光補正が必要か、白とび補正が必
要か、平均測光とすべきか等を判別するための判別回路
で、判別結果にもとづいて後述するアナログスイツチSW
を開閉制御するための制御信号Cを出力する。
Reference numeral 15 is a luminance difference between the area inside and outside the photometric frame 101 output from the subtraction circuit 10, that is, Ea-Eb is compared with a preset threshold level TH1, TH2 (TH1 <TH2), and A determination circuit for determining the state, that is, whether backlight compensation is required, overexposure compensation is required, or average photometry should be performed.The analog switch SW to be described later is based on the determination result.
A control signal C for controlling the opening and closing of is output.

そして判別回路は、測光枠101内の領域EAの平均輝度
レベルEaが測光枠101外の領域EBの輝度レベルEbよりも
小さく、且つEa-Eb<TH1のとき、または測光枠内領域EA
の平均輝度レベルEaが測光枠外領域EBの輝度レベルEbよ
りも大きく、且つTH2<Ea-Ebのとき制御信号CをHレベ
ルとし、測光枠内外の領域EA,EBそれぞれの平均輝度レ
ベルEa,Ebの関係がTH1≦Ea-Eb≦TH2のとき制御信号Cを
Lレベルにするよう動作する。
When the average luminance level Ea of the area EA inside the photometric frame 101 is lower than the luminance level Eb of the area EB outside the photometric frame 101 and Ea-Eb <TH1, or the area EA inside the photometric frame is present.
When the average brightness level Ea of the area is larger than the brightness level Eb of the area EB outside the photometric frame and TH2 <Ea-Eb, the control signal C is set to the H level, and the average brightness level Ea, Eb of the areas EA and EB inside and outside the photometric frame is set. When the relationship of TH1 ≦ Ea−Eb ≦ TH2 is satisfied, the control signal C is operated to be at L level.

16は判別回路15の判別結果にもとづいて、露光制御装
置2にフイードバツクする測光用映像信号レベルを出力
する測光回路で、17はゲート回路7bより出力された測光
枠101外の領域Ebにおける映像信号を所定の期間(1フ
イールド)で積分して平均化する積分回路、18はゲート
回路7aより出力された測光枠101内の領域Eaにおける映
像信号を同じ期間で積分して平均化する積分回路、19は
バツフアアンプ、SWは判別回路15の制御信号Cによって
開閉制御され、制御信号CがHレベルのときON、Lレベ
ルのときOFFとなるアナログスイツチ、R1〜R3はバツ
フアアンプ19を介して露光制御装置2へとフイードバツ
クする映像信号レベルを制御するにあたり、測光枠内外
に応じた各信号の重み付けを行うための抵抗、20は加算
器である。
Reference numeral 16 is a photometric circuit that outputs a video signal level for photometry to the exposure control device 2 based on the determination result of the determination circuit 15, and 17 is a video signal in the area Eb outside the photometric frame 101 output from the gate circuit 7b. Is an integrating circuit for integrating and averaging over a predetermined period (1 field), 18 is an integrating circuit for integrating and averaging the video signals in the region Ea in the photometric frame 101 output from the gate circuit 7a during the same period, 19 is a buffer amplifier, SW is an open / close control by the control signal C of the discrimination circuit 15, and is an analog switch which is ON when the control signal C is H level and OFF when the control signal C is L level, and R 1 to R 3 are exposed via the buffer amplifier 19. In controlling the video signal level fed back to the control device 2, a resistor for weighting each signal according to the inside and outside of the photometric frame, and 20 is an adder.

以上の構成により、アンプ4より出力された映像信号
すなわち輝度信号はそれぞれゲート回路7a,7bにより、
測光枠内領域EAに対応する信号Eaと測光枠外領域EBに対
応する信号Ebとに、別々に取り出され、前述のように積
分回路8a,8b、面積補正回路9a,9bを介してその平均輝度
レベルが求められ、引算回路10でそのレベル差が演算さ
れる。そして各領域EA,Ebの平均輝度レベルの差Ea-Ebが
判別回路15へと入力され、画面の状態が判別される。
With the above configuration, the video signal, that is, the luminance signal output from the amplifier 4 is respectively supplied by the gate circuits 7a and 7b.
The signal Ea corresponding to the area EA inside the photometric frame and the signal Eb corresponding to the area EB outside the photometric frame are separately taken out, and as described above, the average luminance thereof via the integrating circuits 8a and 8b and the area correction circuits 9a and 9b. The level is obtained, and the subtraction circuit 10 calculates the level difference. Then, the difference Ea-Eb between the average luminance levels of the areas EA and Eb is input to the determination circuit 15, and the state of the screen is determined.

いま第3図(c)に示すように、測光枠内領域EAと測
光枠外領域EBとの平均輝度レベルに大きな差がなく、全
画面においてほぼ一様である場合、すなわち予め設定さ
れたスレシヨルドレベルTH1,TH2に対し、 TH1≦Ea-Eb≦TH2 であった場合には、判別回路15は制御信号CをLレベル
とし、測光回路16内のアナログスイツチSWを開放にす
る。
Now, as shown in FIG. 3 (c), when there is no large difference in the average brightness level between the area EA inside the photometric frame and the area EB outside the photometric frame, and it is almost uniform over the entire screen, that is, the preset threshold value is set. If TH1≤Ea-Eb≤TH2 with respect to the threshold levels TH1 and TH2, the discrimination circuit 15 sets the control signal C to L level and opens the analog switch SW in the photometry circuit 16.

これによってそれぞれゲート回路7a,7bによって別々
に抽出された測光枠内外の領域EA,EB内に相当する映像
信号は、それぞれ積分回路17,18で積分されて平均化さ
れ、それぞれ抵抗R1,R2によって所定の重み付けを付与
された後(実際は測光枠内の重み付けが大きい)加算器
20で加算され、バツフアアンプ19を介して露光制御部2
へ露光制御信号が供給される。これによって露光制御部
2は撮像画面100全画面における平均輝度レベルにもと
づいてフイードバツク制御され、平均測光モードとなる
(ただし、本発明の平均測光モードとは、測光枠重点モ
ードに対して枠内外の重み付けの差を小さくするが、実
際、測光枠内の重み付けを大きくして枠内重点的に設定
しておいてもよい)。
As a result, the video signals respectively extracted by the gate circuits 7a and 7b and corresponding to the areas EA and EB inside and outside the photometric frame are integrated and averaged by the integrating circuits 17 and 18, respectively, and the resistors R 1 and R After being given a predetermined weight by 2 (actually, the weight in the photometric frame is large)
20 is added, and the exposure control unit 2 is passed through the buffer amplifier 19.
An exposure control signal is supplied to. As a result, the exposure controller 2 is feedback-controlled on the basis of the average brightness level of the entire screen of the image pickup screen 100, and becomes the average photometry mode (however, the average photometry mode of the present invention is within and outside the frame relative to the photometry frame priority mode). Although the difference in weighting is reduced, in practice, the weighting in the photometric frame may be increased to set the focus within the frame).

また第3図(a)に示すように、判別回路15におい
て、測光枠外の領域Ebに相当する平均輝度レベルが測光
枠内の領域EAに相当する平均輝度レベルEaよりも大きい
逆光画面で、且つ Ea-Eb<TH1 であることが判別された場合は、制御信号CがHレベル
となってアナログスイツチSWが閉成される。
Further, as shown in FIG. 3 (a), in the discrimination circuit 15, a backlight screen in which the average luminance level corresponding to the area Eb outside the photometric frame is higher than the average luminance level Ea corresponding to the area EA inside the photometric frame, and When it is determined that Ea-Eb <TH1, the control signal C becomes H level and the analog switch SW is closed.

これによって測光枠内領域EAに相当する輝度信号に重
み付けを行う抵抗R2にさらに抵抗R3が並列接続され、
上述の全画面平均測光時と比較して抵抗値が小さくな
り、積分回路18の出力の電圧降下が小さくなり、測光枠
内領域EAにおける信号の測光枠外領域EBに対する電圧加
算の重み付けが大きくなり、測光枠内領域EAの輝度信号
レベルが大きく繁栄され測光枠内重点測光モードとな
る。したがって背景に対して暗い被写体の部分の露出が
補正され、所謂逆光補正が行われる。
As a result, the resistor R 2 for weighting the luminance signal corresponding to the area EA in the photometric frame is further connected in parallel with the resistor R 3 ,
The resistance value is smaller than that in the above-described full-screen average photometry, the voltage drop of the output of the integrating circuit 18 is small, and the weighting of the voltage addition to the photometry frame outside area EB of the signal in the photometry frame inside area EA is large, The brightness signal level of the area EA within the photometry frame is greatly prospered, and the weighted photometry mode within the photometry frame is set. Therefore, the exposure of the portion of the dark subject against the background is corrected, and so-called backlight correction is performed.

また、第3図(b)に示すように、判別回路15におい
て、測光枠内の領域EAに相当する平均輝度レベルEaが測
光枠外の領域EBに相当する平均輝度レベルEbよりも大き
く、且つ、 TH2<Ea-Eb で、所謂白とびを生じている場合は、第3図(a)の逆
光補正のときと同様に制御信号CがHレベルとなってア
ナログスイツチSWが閉成され、測光枠内領域EA内に相当
する信号の重み付けが大きくなり、測光枠内重点測光モ
ードとなる。したがって背景に対して高輝度で白とびを
起こしている被写体に対する露出が補正され、所謂白と
び補正を行うことができる。
Further, as shown in FIG. 3B, in the discrimination circuit 15, the average luminance level Ea corresponding to the area EA inside the photometric frame is higher than the average luminance level Eb corresponding to the area EB outside the photometric frame, and When TH2 <Ea-Eb and so-called blown-out highlights occur, the control signal C becomes the H level and the analog switch SW is closed, as in the case of backlight compensation shown in FIG. The weighting of the signal corresponding to the inside of the inner area EA is increased, and the weighted metering mode in the metering frame is set. Therefore, the exposure of an object that has high-brightness overexposure against the background is corrected, and so-called overexposure correction can be performed.

以上のように、測光枠内外の領域における輝度差が所
定の範囲内であるときには枠内外の輝度レベルの大小関
係にかかわらず、平均測光され、ほぼ全画面の平均輝度
レベルにもとづいて露出制御が行われる。
As described above, when the brightness difference between the area inside and outside the photometric frame is within the predetermined range, the average photometry is performed regardless of the size relationship of the brightness level inside and outside the frame, and the exposure control is performed based on the average brightness level of almost the entire screen. Done.

そして測光枠内外の輝度差が大きく、逆光補正または
白とび補正の必要な画面に対しては測光枠内重点測光を
行い、主要被写体に重点的に露光補正し、不自然な画面
を補正することができる。
If the brightness difference between the inside and outside of the metering frame is large and backlight compensation or overexposure compensation is required for the screen, priority metering within the metering frame is performed to focus the exposure compensation on the main subject and correct the unnatural screen. You can

さて、本発明の自動露光制御装置の露光制御手段につ
いては上述の説明の通りであるが、最初に述べたよう
に、本発明の装置によれば、被写体が移動したり、カメ
ラを移動したりして被写体が測光枠内から枠外へと移動
しても、被写体と背景との輝度差から被写体の位置を検
出して測光枠を追尾させる自動追尾機能が備えられてい
るため、測光枠101の内外領域EA,EBとの間に輝度差があ
れば、その輝度差が大きくなる方に、すなわち主要の被
写体を測光枠101内へととらえる如く測光枠101の位置を
被写体に追尾させることができる。これによって第3図
(a)の逆光画面の補正、及び第3図(b)に示す白と
び画面の補正については被写体が移動しても、露光状態
に急激な不自然な画面の変化を生じることなく自然な補
正を行うことができる。また測光枠内外領域EA,EBの輝
度差が小さくなって測光枠の追尾動作ができなくなつた
状態では、第3図(c)に示すように、画面もその全体
の平均輝度レベルにもとづく平均測光状態となるため、
測光枠を被写体に追従させる必要はない。
Now, the exposure control means of the automatic exposure control device of the present invention is as described above, but as described at the beginning, according to the device of the present invention, the object or camera can be moved. Even if the subject moves from inside the metering frame to outside the frame, it has an automatic tracking function that detects the position of the subject from the brightness difference between the subject and the background and tracks the metering frame. If there is a brightness difference between the inner and outer areas EA, EB, the position where the metering frame 101 is located can be tracked by the object so that the brightness difference becomes larger, that is, the main object is captured within the metering frame 101. . As a result, regarding the backlight screen correction shown in FIG. 3A and the overexposed screen correction shown in FIG. 3B, even if the subject moves, a sudden unnatural screen change occurs in the exposure state. Natural correction can be performed without any Also, in the state where the brightness difference between the inner and outer areas EA and EB of the photometric frame becomes small and the tracking operation of the photometric frame cannot be performed, as shown in FIG. 3 (c), the screen also averages based on the average brightness level of the entire screen. Since it is in the photometric state,
It is not necessary for the metering frame to follow the subject.

このとき測光枠は、その追尾動作を停止した直前の位
置に保持してもよいし、またたとえば画面中央の初期位
置に強制的に移動させてもよく、その設計に応じて適宜
選択することができる。
At this time, the photometric frame may be held at the position immediately before the tracking operation is stopped, or may be forcibly moved to, for example, the initial position in the center of the screen, and can be appropriately selected according to its design. it can.

次に測光枠101の内外の領域EA,EBの輝度差にもとづい
て測光枠101を被写体に自動追尾させるための制御用マ
イクロコンピユータ13による追尾アルゴリズムについ
て、第4図,第5図を用いて説明する。
Next, a tracking algorithm by the control microcomputer 13 for automatically tracking the photometric frame 101 to the subject based on the brightness difference between the areas EA and EB inside and outside the photometric frame 101 will be described with reference to FIGS. 4 and 5. To do.

本発明によれば測光枠101の位置変化の単位変化量を
設定するため、第4図に示すように撮影画面をm×n個
のブロツクに分割して設定、上,下,左,右に1ブロツ
ク単位で移動制御されるようになっており、その制御ア
ルゴリズムは次のように設定されている。
According to the present invention, since the unit change amount of the position change of the photometric frame 101 is set, as shown in FIG. 4, the photographing screen is divided into m × n blocks and set, and the upper, lower, left and right are set. The movement is controlled in 1-block units, and its control algorithm is set as follows.

第5図(a)はそのフローチヤートを示す。 FIG. 5 (a) shows the flow chart.

追尾動作をスタートすると、制御用マイクロコンピユ
ータ13は判別回路15の制御信号Cを調べ(step1)、C
がLレベルであれば、測光枠内外の輝度差が小さく輝度
差による追尾は困難と判断し、step2に進んで測光枠101
をその時の位置に保持、あるいはたとえば画面中央の初
期位置に復帰させてstep1へと戻る。またstep1で制御信
号CがHレベルであれば、測光枠内外の輝度差が十分得
られる状態であると判断し、以後測光枠101の位置制御
動作に入る。
When the tracking operation is started, the control microcomputer 13 checks the control signal C of the discrimination circuit 15 (step 1), and C
Is at the L level, it is determined that the brightness difference between the inside and outside of the photometric frame is small and tracking due to the brightness difference is difficult.
Is held at that position, or is returned to the initial position in the center of the screen, for example, and the process returns to step 1. If the control signal C is at the H level in step 1, it is determined that a sufficient brightness difference between the inside and outside of the photometric frame is obtained, and the position control operation of the photometric frame 101 is subsequently performed.

step3で変数e1に絶対値回路11の出力|Ea-Hb|の値を格
納し、step4で測光枠101を第4図で見て1ブロツク右に
シフトする。続いてstep5に移行して、変数e2に測光枠1
01の移動後の位置における絶対値回路11の出力|Ea-Eb|
を格納し、step6でe2とe1の内容を比較する。e2>e1で
あれば測光枠101を右にシフトしたことによって輝度差
が大きくなったことを意味するものであり、測光枠がよ
り被写体を適確にとらえたことと同じであるため、step
8へと移行して、その位置において測光し、その結果に
もとづいて露光制御部2を駆動して絞り、AGC回路等を
制御して露光制御する。
In step 3, the value of the output | Ea-Hb | of the absolute value circuit 11 is stored in the variable e1, and in step 4, the photometric frame 101 is shifted to the right by one block as seen in FIG. Then move to step 5 and set the variable e2 to the photometric frame 1
Output of absolute value circuit 11 at the position after 01 is moved | Ea-Eb |
Is stored, and the contents of e2 and e1 are compared in step 6. If e2> e1, it means that the brightness difference is increased by shifting the metering frame 101 to the right, and this is the same as the metering frame more accurately capturing the subject.
The process shifts to 8 and the light is measured at that position. Based on the result, the exposure control unit 2 is driven to stop the aperture, and the AGC circuit and the like are controlled to perform exposure control.

一方、step6でe2>e1でなければ、測光枠101を左に1
ブロツク分シフトしてモードの位置へ戻してからstep8
へと進み、その位置で測光した結果にもとづいて露光制
御部2を駆動して露光制御を行う。
On the other hand, if e2> e1 is not found in step 6, move the photometry frame 101 to the left by 1
After shifting by block and returning to the mode position, step8
Then, the exposure control unit 2 is driven based on the result of photometry at that position to perform exposure control.

続いてstep9〜step14においては、測光枠101を第4図
に示す撮影画面上において1ブロツク上にシフトしてst
ep3〜step8で行ったと同様に測光枠内外の輝度差が大き
くなればその位置に、増加しなければ元の位置へと戻し
て測光し、露光制御を行う。
Then, in steps 9 to 14, the photometric frame 101 is shifted up one block on the shooting screen shown in FIG.
As in ep3 to step8, if the brightness difference between the inside and outside of the photometric frame increases, that position is measured, and if it does not increase, the photometering is performed by returning to the original position, and exposure control is performed.

以下同様にしてstep15〜step20で測光枠101を1ブロ
ツク左にシフト、step21〜step26で測光枠101を1ブロ
ツク下にシフトし、それぞれ輝度差が大きくなる方の位
置に測光枠を合わせ、露光制御を行った後step1に戻
り、輝度差が所定レベル以上の間上述の動作を繰り返し
行う。
Similarly, shift the photometric frame 101 one block to the left in steps 15 to 20 and shift the photometric frame 101 to one block down in steps 21 to 26, align the photometric frame to the position where the brightness difference increases and control the exposure. After performing, the process returns to step 1 and the above operation is repeated while the brightness difference is equal to or higher than a predetermined level.

このようにして測光枠101の内外の輝度差が所定レベ
ル以上あれば、被写体が移動しても測光枠101を被写体
に合わせ続けることができ、それぞれ測光枠101内の映
像信号レベルを重点的に測光することができる。
In this way, if the brightness difference between the inside and outside of the photometric frame 101 is equal to or greater than the predetermined level, the photometric frame 101 can continue to be aligned with the subject even when the subject moves, and the video signal level in each photometric frame 101 is focused. Can be metered.

尚、上述の実施例では、測光枠と追尾枠を共用してい
るが、別個に設定しても良く、本発明を達成する上で何
等支障はない。
Although the photometric frame and the tracking frame are shared in the above-mentioned embodiment, they may be set separately, and there is no problem in achieving the present invention.

また、第5図(a)のフローチヤートにおいて、step
1で画面判別を行う際、測光枠101内外の輝度差の過度的
な変動、ノイズに対して誤動作を生じないよう、step1
とstep3との間、及びstep1とstep2との間に第5図
(b)に示すstep1−1,step1−2をそれぞれ挿入し、そ
れぞれ同じモードがmフイールド期間(たとえば数フイ
ールド期間)以上続いたときに始めて追尾モードの変更
を行い、mフイールド未満のときは瞬間的なノイズとし
て、モードの変更を行わないようにすれば、さらに安定
性が増加する。
Also, in the flow chart of FIG. 5 (a), step
When screen discrimination is performed in step 1, step1 is performed so that malfunction does not occur due to excessive fluctuations in brightness difference inside and outside the photometric frame 101 and noise.
Steps 1-1 and 1-2 shown in Fig. 5 (b) are inserted between step 3 and step 3, and between step 1 and step 2, respectively, and the same mode continues for m field periods (for example, several field periods) or more. When the tracking mode is changed for the first time, and when the m-field is less than m field, a momentary noise is generated, and the mode is not changed, the stability is further increased.

また上述の実施例では、露光制御において、白とび補
正時及び逆光補正時、測光枠内の重み付けを2段階に可
変する場合について説明したが、第3図(a)の逆光の
場合、及び第3図(b)の白とび補正それぞれについ
て、第6図に示すように、Ea-Ebの値をTH1−1,TH1−2,
…,TH1−n、TH2−1,TH2−2,…,TH2−nのn個のしきい
値と比較し、その結果に応じてn段階に測光回路の補正
量を細かく制御するようにしてもよい。
Further, in the above-described embodiment, the case where the weighting in the photometry frame is changed in two steps at the time of overexposure correction and at the time of backlight correction in the exposure control has been described, but in the case of backlight at the time of FIG. For each of the overexposure corrections in FIG. 3B, as shown in FIG. 6, the values of Ea-Eb are set to TH1-1, TH1-2,
, TH1-n, TH2-1, TH2-2, ..., TH2-n are compared with n threshold values, and the correction amount of the photometric circuit is finely controlled in n steps according to the result. Good.

第7図はその場合の測光回路16′の構成を示すもの
で、第1図と同一構成部分については同一符号をもって
示すものとする。
FIG. 7 shows the configuration of the photometric circuit 16 'in that case, and the same components as those in FIG. 1 are designated by the same reference numerals.

測光枠内領域EAの輝度信号に重み付けを行う抵抗R2
に、抵抗とスイツチの直列回路(R3-1,R3-2,…,
R3-n、SW2,…,SWn)がn個それぞれ並列接続されてい
る。各抵抗の値は重み付けの変化の度合に応じてそのと
きの設計に応じて適宜設定すればよい。
Resistor R 2 for weighting the luminance signal of the area EA within the photometric frame
In addition, a series circuit of resistors and switches (R 3-1 , R 3-2 , ...,
R 3-n , SW 2 , ..., SW n ) are respectively connected in parallel. The value of each resistor may be appropriately set according to the degree of change in weighting and the design at that time.

そしてこれらのスイツチSW1,SW2,…,SWnを開閉制御
する判別回路15′は、引算回路10から出力されたEa-Eb
を、第3図(a)の逆光補正の場合(Ea-Eb<TH1)、第
3図(b)の白とび補正の場合(Ea-Eb>TH2)につい
て、それぞれスレシヨルドレベルTH1,TH1−1,TH1−2,
…,TH1−n、TH2,TH2−1,TH2−2,…,TH2−nとn段階に
比較し、その結果に応じて制御信号C1〜Cn中の対応す
る制御信号をHレベルとし、抵抗R2に並列接続される
抵抗を制御する。これによって測光枠内領域の信号に対
する重み付けがn段階に制御され、高精度、高感度の露
光制御が可能となる。
The discriminating circuit 15 ′ for controlling the opening and closing of these switches SW 1 , SW 2 , ..., SW n is provided by the Ea-Eb output from the subtraction circuit 10.
For the backlight correction (Ea-Eb <TH1) in FIG. 3 (a) and the overexposure correction (Ea-Eb> TH2) in FIG. 3 (b), the threshold levels TH1, TH1 respectively. -1, TH1-2,
..., TH1-n, TH2, TH2-1, TH2-2, ..., compared to the TH2-n and n steps, the corresponding control signal in the control signal C 1 -C n is the H level in accordance with the result , And controls the resistance connected in parallel with the resistance R 2 . As a result, the weighting of the signal in the area within the photometric frame is controlled in n steps, and exposure control with high accuracy and high sensitivity becomes possible.

第8図は本発明の自動露光制御装置の他の実施例を示
すもので、測光枠101によって被写体を追尾する機能に
着目し、移動する被写体に対する焦点追尾機能を付加し
たものである。
FIG. 8 shows another embodiment of the automatic exposure control apparatus of the present invention, focusing on the function of tracking a subject by the photometric frame 101, and adding a focus tracking function to a moving subject.

第8図において、第1図と異なる部分のみ説明する
と、21は自動焦点調節装置で、撮影レンズ1を移動して
焦点調節を行うためのモータ22、ゲート回路7aを通過し
た測光枠101内の領域EAに相当する輝度信号中からその
高周波成分を抽出するバンドパスフイルタ23、バンドパ
スフイルタ23の出力信号の1フイールド期間におけるピ
ークを検出してホールドするピーク検出回路24、ピーク
検出回路24の出力を1フイールド遅延させる遅延回路2
5、ピーク検出回路24より出力された現フイールドのピ
ーク値と遅延回路25を介して出力された前フイールドの
ピーク値とを比較し、その変位を打ち消す方向にモータ
22を駆動して撮影レンズを移動するモータ駆動回路26か
ら構成されている。
In FIG. 8, only parts different from those in FIG. 1 will be described. Reference numeral 21 denotes an automatic focus adjustment device, which is a motor 22 for moving the taking lens 1 to perform focus adjustment, and a photometric frame 101 inside the photometry frame 101 that has passed through the gate circuit 7a. Output of the band pass filter 23 that extracts high frequency components from the luminance signal corresponding to the area EA, the peak detection circuit 24 that detects and holds the peak of the output signal of the band pass filter 23 during one field period, and the peak detection circuit 24 Delay circuit that delays 1 field by 2
5.Compare the peak value of the current field output from the peak detection circuit 24 with the peak value of the previous field output via the delay circuit 25, and move the motor in the direction to cancel the displacement.
It is composed of a motor drive circuit 26 that drives 22 to move the taking lens.

この構成により、フイールドごとに測距枠と兼用され
る測光枠101内の領域に相当する輝度信号の高周波成分
のピーク値を検出し、これが最大となるように撮影レン
ズを駆動して所謂山登り制御を行う。
With this configuration, the peak value of the high frequency component of the luminance signal corresponding to the area in the photometry frame 101 that also serves as the distance measurement frame is detected for each field, and the so-called hill climbing control is performed by driving the taking lens so that this peak value is maximized. I do.

これによって測距枠に共用される測光枠101内の被写
体に常に焦点を合わせ続けることができ、被写体が移動
しても、これを追尾し、常に最適な露光制御且つ焦点制
御を行うことができる。
As a result, it is possible to always keep the focus on the subject in the photometry frame 101 which is shared by the range-finding frame, and even when the subject moves, it can be tracked and always perform optimum exposure control and focus control. .

尚、本実施例においても、測距枠と測光枠、さらに追
尾枠を兼用せず別個に設けても良い。
Also in this embodiment, the distance measuring frame, the photometric frame, and the tracking frame may be separately provided without being combined.

また、上述の各実施例において、制御用マイクロコン
ピユータ13からの指令にもとづいてゲートパルス発生回
路14を制御する際、枠内外の領域EA,EB間の輝度差が大
きくなるように枠の大きさを変更することにより、被写
体の撮影画面上に占める大きさが変化しても、正確に被
写体をとらえることができ、より適切な露光、焦点制御
を行うことができる。
Further, in each of the above-described embodiments, when controlling the gate pulse generation circuit 14 based on a command from the control microcomputer 13, the size of the frame is increased so that the brightness difference between the areas EA and EB inside and outside the frame becomes large. Even if the size of the subject on the photographing screen changes, the subject can be accurately captured, and more appropriate exposure and focus control can be performed.

(発明の効果) 以上述べたように、本発明における自動露光制御装置
によれば、画面内に測光枠を設けるとともに、この枠内
外の輝度信号をもって被写体が、逆光補正としているの
か、白とび補正を必要としているのかを自動的に判断
し、かつ、この測光枠を逆光補正時には黒い被写体に、
白とび補正時には白い被写体に追尾させ、常に最適露光
となるように露光制御を行うことができる。
(Effects of the Invention) As described above, according to the automatic exposure control apparatus of the present invention, the photometry frame is provided in the screen, and whether the subject is subject to backlight compensation or luminance compensation inside and outside of the frame, or overexposure compensation is performed. Automatically determines whether or not is needed, and this metering frame is applied to a black subject during backlight compensation.
During whiteout correction, it is possible to track a white subject and perform exposure control so that optimum exposure is always achieved.

これによって、画面内の被写体を黒い被写体か白い被
写体か常に認識しつつ追尾し露光を制御することによ
り、被写体が画面内を移動したり逆光シーンから順光シ
ーンへ変化したりしても、常に最適に露光が制御され自
然な画像を得ることができる。
As a result, by always recognizing whether the subject in the screen is a black subject or a white subject, by tracking and controlling the exposure, even if the subject moves in the screen or changes from the backlit scene to the frontlit scene, The exposure is optimally controlled and a natural image can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明における自動露光制御装置の一実施例を
示すブロツク図、 第2図は撮影画面上における測光枠内外の領域を示す
図、 第3図は撮影画面の異なる状態を示す図、 第4図は測光枠の追尾動作を説明するための撮影画面の
図、 第5図は追尾動作を説明するためのフローチヤート、 第6図は本発明の測光回路の他の実施例を説明するため
の図、 第7図は本発明の測光回路の他の実施例を示すブロツク
図、 第8図は本発明の自動露光制御装置に自動焦点調節装置
を組み合わせた実施例を示すブロツク図、 第9図,第10図は従来の自動露光制御回路を示すブロツ
ク図である。 6……測光枠設定回路 7a,7b……ゲート回路 10……引算回路 13……(測光枠設定用)制御用マイクロコンピユータ 15……(画面モード)判別回路 16……測光回路 21……自動焦点調節回路
FIG. 1 is a block diagram showing an embodiment of an automatic exposure control device according to the present invention, FIG. 2 is a diagram showing areas inside and outside a photometric frame on a photographing screen, and FIG. 3 is a diagram showing different states of the photographing screen, FIG. 4 is a diagram of a photographing screen for explaining the tracking operation of the photometric frame, FIG. 5 is a flow chart for explaining the tracking operation, and FIG. 6 is another embodiment of the photometric circuit of the present invention. FIG. 7 is a block diagram showing another embodiment of the photometric circuit of the present invention, and FIG. 8 is a block diagram showing an embodiment in which the automatic exposure control device of the present invention is combined with an automatic focusing device. 9 and 10 are block diagrams showing a conventional automatic exposure control circuit. 6 …… Metering frame setting circuit 7a, 7b …… Gate circuit 10 …… Subtraction circuit 13 …… (for setting the metering frame) Controlling microcomputer 15 …… (Screen mode) discrimination circuit 16 …… Metering circuit 21 …… Automatic focus adjustment circuit

───────────────────────────────────────────────────── フロントページの続き (72)発明者 須田 浩史 神奈川県川崎市高津区下野毛770番地 キヤノン株式会社玉川事業所内 (72)発明者 山田 邦彦 神奈川県川崎市高津区下野毛770番地 キヤノン株式会社玉川事業所内 (72)発明者 吉村 克二 神奈川県川崎市高津区下野毛770番地 キヤノン株式会社玉川事業所内 (56)参考文献 特開 昭56−119820(JP,A) 特開 昭62−203486(JP,A) 特開 昭63−254871(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Hiroshi Suda, Hiroshi Suda, 770 Shimonoge, Takatsu-ku, Kawasaki-shi, Kanagawa Canon Inc., Tamagawa Plant (72) Kunihiko Yamada, 770, Shimonoge, Takatsu-ku, Kawasaki, Kanagawa Canon Inc. In-house (72) Inventor Katsuji Yoshimura, 770 Shimonoge, Takatsu-ku, Kawasaki-shi, Kanagawa Canon Inc. Tamagawa Plant (56) References JP-A-56-119820 (JP, A) JP-A-62-203486 (JP, A) ) JP-A-63-254871 (JP, A)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】撮影画面内において、被写体に重点測光す
るための測光枠の設定位置を移動可能な測光枠設定手段
と、 前記測光枠内外に相当する輝度レベルをそれぞれ検出
し、それらの輝度レベルの差が所定のしきい値以上か否
かを判別する判別手段と、 前記判別手段の判別結果にもとづいて露光状態を制御
し、前記測光枠内外の輝度レベルの差が前記しきい値を
越えていた場合には、前記測光枠内に相当する輝度レベ
ルに対する重み付けを大きくして前記測光枠内の輝度レ
ベルに対して重点測光を行い、前記測光枠内外の輝度レ
ベルの差が前記しきい値以下であった場合は、前記測光
枠内外の輝度レベルの平均測光を行う露光制御手段と、 前記露光制御手段を動作させながら、前記測光枠の設定
位置を前記被写体像の動きに追尾させるべく前記測光枠
設定手段を制御する測光枠追尾手段と、 を備え、前記測光枠追尾手段による前記測光枠の設定位
置の移動に伴う露光状態の変化を前記露光制御手段によ
り並行して補正し得るようにしたことを特徴とする自動
露光制御装置。
1. A photometric frame setting means capable of moving a set position of a photometric frame for intensive photometry on a subject within a photographing screen, and brightness levels corresponding to inside and outside of the photometry frame are respectively detected, and the brightness levels thereof are detected. Discriminating means for discriminating whether or not the difference is equal to or more than a predetermined threshold value, and controlling the exposure state based on the discrimination result of the discriminating means, and the difference between the brightness levels inside and outside the photometric frame exceeds the threshold value. In this case, the weighting for the brightness level corresponding to the inside of the photometric frame is increased to perform the priority photometry for the brightness level inside the photometric frame, and the difference between the brightness levels inside and outside the photometric frame is the threshold value. In the case of the following, the exposure control means for performing average photometry of the brightness levels inside and outside the photometric frame, and operating the exposure control means, in order to track the set position of the photometric frame to the movement of the subject image. A photometric frame tracking means for controlling the photometric frame setting means, and a change in the exposure state due to the movement of the set position of the photometric frame by the photometric frame tracking means, so that the exposure control means can correct it in parallel. The automatic exposure control device characterized in that
JP63123679A 1988-05-02 1988-05-20 Automatic exposure control device Expired - Lifetime JP2692854B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP63123679A JP2692854B2 (en) 1988-05-20 1988-05-20 Automatic exposure control device
GB8909403A GB2219461B (en) 1988-05-02 1989-04-25 Exposure control device
DE3913803A DE3913803A1 (en) 1988-05-02 1989-04-26 EXPOSURE CONTROL DEVICE
US08/190,226 US5677733A (en) 1988-05-02 1994-02-01 Exposure control device having a plurality of light detecting areas
US08/483,561 US6570620B1 (en) 1988-05-02 1995-06-06 Exposure control device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63123679A JP2692854B2 (en) 1988-05-20 1988-05-20 Automatic exposure control device

Publications (2)

Publication Number Publication Date
JPH01293077A JPH01293077A (en) 1989-11-27
JP2692854B2 true JP2692854B2 (en) 1997-12-17

Family

ID=14866624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63123679A Expired - Lifetime JP2692854B2 (en) 1988-05-02 1988-05-20 Automatic exposure control device

Country Status (1)

Country Link
JP (1) JP2692854B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101352349B1 (en) 2006-01-30 2014-01-15 소니 주식회사 Exposure control apparatus and image pickup apparatus
CN108810422A (en) * 2018-06-11 2018-11-13 北京小米移动软件有限公司 Light compensation method, device and the computer readable storage medium of shooting environmental

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101352349B1 (en) 2006-01-30 2014-01-15 소니 주식회사 Exposure control apparatus and image pickup apparatus
CN108810422A (en) * 2018-06-11 2018-11-13 北京小米移动软件有限公司 Light compensation method, device and the computer readable storage medium of shooting environmental

Also Published As

Publication number Publication date
JPH01293077A (en) 1989-11-27

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