JP2691774B2 - Rubbing device - Google Patents

Rubbing device

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Publication number
JP2691774B2
JP2691774B2 JP15265489A JP15265489A JP2691774B2 JP 2691774 B2 JP2691774 B2 JP 2691774B2 JP 15265489 A JP15265489 A JP 15265489A JP 15265489 A JP15265489 A JP 15265489A JP 2691774 B2 JP2691774 B2 JP 2691774B2
Authority
JP
Japan
Prior art keywords
rubbing
electric field
liquid crystal
crystal display
display substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP15265489A
Other languages
Japanese (ja)
Other versions
JPH0317623A (en
Inventor
敏男 飛田
滋 谷内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP15265489A priority Critical patent/JP2691774B2/en
Publication of JPH0317623A publication Critical patent/JPH0317623A/en
Application granted granted Critical
Publication of JP2691774B2 publication Critical patent/JP2691774B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、液晶デイスプレイ基板の配向膜をラビン
グする装置に関するものである。
The present invention relates to a device for rubbing an alignment film on a liquid crystal display substrate.

〔従来の技術〕[Conventional technology]

第3図は例えば市販されている液晶デイスプレイ基板
用ラビング装置の構成を示す断面図、第4図は液晶デイ
スプレイ基板とラビング部の位置関係を示す平面図、第
5図は液晶デイスプレイ基板の電気的等価回路を示す平
面図である。第3図〜第5図において(1)はX−Yテ
ーブル(2)に載せられた液晶デイスプレイ基板で、ガ
ラス基板(3)上に形成された薄膜トランジスタ(4)
と配線(5)及びポリイミド等の高分子材料から成る配
向膜(6)等から構成される。薄膜トランジスタ(4)
はゲート電極(41)、ソース電極(42)及びドレイン電
極(43)を持ち、各薄膜トランジスタ(4)をつなぐ配
線はシヨートリング(7)で一括して接地されている。
(8)は金属製の回転ローラ(81)とその外周に巻き付
けたナイロン繊維等から成るラビング布(82)から構成
されるラビング部で、回転ローラ(81)はこの装置本体
を介して接地されている。(9)はラビング部(8)に
近接してラビング部(8)の両側に設けられたイオン発
生器である。(a)は回転ローラ(81)の回転方向、
(b)はX−Yテーブル(2)の移動方向を示す。
FIG. 3 is a sectional view showing the structure of a commercially available liquid crystal display substrate rubbing device, FIG. 4 is a plan view showing the positional relationship between the liquid crystal display substrate and the rubbing portion, and FIG. 5 is an electrical diagram of the liquid crystal display substrate. It is a top view which shows an equivalent circuit. 3 to 5, (1) is a liquid crystal display substrate mounted on an XY table (2), and a thin film transistor (4) formed on the glass substrate (3).
And the wiring (5) and the alignment film (6) made of a polymer material such as polyimide. Thin film transistor (4)
Has a gate electrode (41), a source electrode (42) and a drain electrode (43), and the wiring connecting the thin film transistors (4) is collectively grounded by a short ring (7).
Reference numeral (8) is a rubbing portion composed of a metallic rotating roller (81) and a rubbing cloth (82) wound around the outer periphery of the rotating roller (81), and the rotating roller (81) is grounded through the main body of the apparatus. ing. Reference numeral (9) denotes ion generators provided on both sides of the rubbing portion (8) close to the rubbing portion (8). (A) is the rotating direction of the rotating roller (81),
(B) shows the moving direction of the XY table (2).

次に動作について説明する。先ず、第4図に示す平面
図のような位置に、液晶デイスプレイ基板(1)をX−
Yテーブル(2)上に載せる。液晶デイスプレイ基板
(1)は液晶デイスプレイの視野角度の関係から、回転
ローラ(81)の回転軸に対して所定の角度傾けられてい
る。液晶デイスプレイ基板(1)の配線(5)は第5図
に示すように、シヨートリング(7)で短絡されて接地
される。次に、回転ローラ(81)を矢印方向(a)に回
転させると共に、X−Yテーブル(2)を矢印方向
(b)に数回往復運動させて、ラビング部(8)のラビ
ング布(82)で液晶デイスプレイ基板(1)の配向膜
(6)を擦る。この時、ラビング布(82)と配向膜
(6)の摩擦により両者は静電気帯電するが、X−Yテ
ーブル(2)の進行方向側のイオン発生器(9)から帯
電した配向膜(6)表面に配向膜(6)上の電荷と逆符
号のイオンを吹きつけて、配向膜(6)表面上の電荷を
中和するとともに、シヨートリング(7)を介して大地
へリークさせる。一方ラビング布(82)表面上の電荷
は、ラビング布(82)の厚み方向に移動して回転ローラ
(81)を介して大地へリークするので、電荷が減衰する
時間は長く、上記ラビング工程中にラビング布(82)表
面上に電荷が蓄積して電界を発生する。ラビング布(8
2)と配向膜(6)の接触部と配線(5)の間に形成さ
れる電界によつて、薄膜トランジスタ(4)のゲート電
極(41)とドレイン電極(43)及びソース電極(42)と
ドレイン電極(43)の間に電界が加わり、薄膜トランジ
スタ(4)の特性劣化や絶縁破壊が生じる。このような
問題を解消するために、ラビング部(8)上に別のイオ
ン発生器を設けてラビング布(82)表面上の電荷と逆符
号の電荷を持つイオンをラビング布(82)表面に吹き付
けて、ラビング布(82)表面の電荷を電気的に中和する
ようにしても、ラビング部(8)が回転するので、イオ
ンの吹きつけ時間が短く中和の効果は小さい。また、例
えば特開昭61−67022に示されるように、配向膜(6)
又はラビング布(82)の少なくとも一方に導電性を有す
る液体を付着してラビングすると、配向膜(6)とラビ
ング布(82)の摩擦により発生した電荷は瞬時にリーク
して除電の効果は大きいが、ラビング後液晶デイスプレ
イ基板(1)の洗浄及び乾燥工程が必要となる欠点があ
る。
Next, the operation will be described. First, place the liquid crystal display substrate (1) at the position shown in the plan view of FIG.
Place on the Y table (2). The liquid crystal display substrate (1) is tilted by a predetermined angle with respect to the rotation axis of the rotating roller (81) because of the viewing angle of the liquid crystal display. The wiring (5) of the liquid crystal display substrate (1) is short-circuited by a short ring (7) and grounded as shown in FIG. Next, the rotary roller (81) is rotated in the arrow direction (a) and the XY table (2) is reciprocated several times in the arrow direction (b) to make the rubbing cloth (82) of the rubbing section (8). ), The alignment film (6) of the liquid crystal display substrate (1) is rubbed. At this time, both are electrostatically charged due to friction between the rubbing cloth (82) and the alignment film (6), but the alignment film (6) charged from the ion generator (9) on the advancing direction side of the XY table (2). Ions having the opposite sign to the charges on the alignment film (6) are blown to the surface to neutralize the charges on the surface of the alignment film (6) and to leak to the ground through the short ring (7). On the other hand, the electric charge on the surface of the rubbing cloth (82) moves in the thickness direction of the rubbing cloth (82) and leaks to the ground through the rotating roller (81), so that the electric charge decays for a long time, and the rubbing step is performed during the rubbing process. Electric charges are accumulated on the surface of the rubbing cloth (82) to generate an electric field. Rubbing cloth (8
The gate electrode (41), the drain electrode (43) and the source electrode (42) of the thin film transistor (4) are generated by the electric field formed between the contact portion between the film (2) and the alignment film (6) and the wiring (5). An electric field is applied between the drain electrodes (43) to cause deterioration of the characteristics of the thin film transistor (4) and dielectric breakdown. In order to solve such a problem, another ion generator is provided on the rubbing part (8), and ions having a charge having a sign opposite to the charge on the surface of the rubbing cloth (82) are applied to the surface of the rubbing cloth (82). Even if the electric charges on the surface of the rubbing cloth (82) are electrically neutralized by spraying, the rubbing portion (8) rotates, so that the ion spraying time is short and the neutralizing effect is small. Further, as disclosed in, for example, Japanese Patent Laid-Open No. 61-67022, an alignment film (6)
Alternatively, when a liquid having conductivity is attached to at least one of the rubbing cloth (82) and rubbed, the charge generated by the friction between the alignment film (6) and the rubbing cloth (82) instantly leaks, and the effect of removing electricity is great. However, there is a drawback that cleaning and drying steps of the liquid crystal display substrate (1) are required after rubbing.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

従来のラビング装置は以上のように構成されているの
で、ラビング部に静電気帯電による電荷が蓄積して、薄
膜トランジスタの特性劣化や絶縁破壊が生じるという問
題点があつた。
Since the conventional rubbing apparatus is configured as described above, there is a problem in that electric charges due to electrostatic charging are accumulated in the rubbing portion to cause characteristic deterioration and dielectric breakdown of the thin film transistor.

この発明は上記のような課題を解決するためになされ
たもので、ラビング部の静電気帯電による薄膜トランジ
スタの特性劣化や絶縁破壊を抑制できるラビング装置を
得ることを目的とする。
The present invention has been made to solve the above problems, and an object of the present invention is to obtain a rubbing device capable of suppressing characteristic deterioration and dielectric breakdown of thin film transistors due to electrostatic charging of a rubbing portion.

〔課題を解決するための手段〕[Means for solving the problem]

この発明に係るラビング装置は、ラビング部に蓄積し
た電荷量を検出して、ラビング部の電荷がラビング部と
配向膜の接触部で形成する電界と逆の電界を、液晶デイ
スプレイ基板の配線に上記検出値に対応して加える電界
発生装置を備えたものである。
The rubbing device according to the present invention detects the amount of electric charge accumulated in the rubbing portion and applies an electric field opposite to the electric field formed by the electric charge of the rubbing portion at the contact portion of the rubbing portion and the alignment film to the wiring of the liquid crystal display substrate. It is provided with an electric field generator which is applied according to the detected value.

〔作用〕[Action]

この発明におけるラビング装置の電界発生装置は、液
晶デイスプレイ基板の配線にラビング部が形成する電界
を打ち消す電界を加える。
In the electric field generator of the rubbing device according to the present invention, an electric field for canceling the electric field formed by the rubbing portion is applied to the wiring of the liquid crystal display substrate.

〔発明の実施例〕(Example of the invention)

以下、この発明の一実施例を図について説明する。第
1図において、(6)はポリイミドから成る配向膜、
(8)はアルミニウムから成る回転ローラ(81)とナイ
ロンから成るラビング布(82)から構成されたラビング
部で、回転ローラ(81)はこの装置本体を介して接地さ
れている。(10)は検出器で、ここでは表面電位計を用
いてラビング布(82)表面上の電荷量を直接検出する。
(11)は配線(6)と電気的に接続し、検出器(10)の
検出値に対応した電界を発生する電界発生装置である。
他の構成部分は第3図の従来装置と同様である。
An embodiment of the present invention will be described below with reference to the drawings. In FIG. 1, (6) is an alignment film made of polyimide,
Reference numeral (8) is a rubbing portion composed of a rotary roller (81) made of aluminum and a rubbing cloth (82) made of nylon, and the rotary roller (81) is grounded through the main body of the apparatus. Reference numeral (10) is a detector, which directly detects the amount of electric charge on the surface of the rubbing cloth (82) by using a surface electrometer.
Reference numeral (11) is an electric field generator which is electrically connected to the wiring (6) and generates an electric field corresponding to the detection value of the detector (10).
Other components are the same as those of the conventional device shown in FIG.

次に動作について説明する。ラビング布(82)が液晶
デイスプレイ基板(1)の配向膜(6)を擦り始める
と、ラビング布(82)と配向膜(6)は帯電する。配向
膜(6)上の電荷は従来装置の場合と同様にしてイオン
発生器(9)で中和される。ラビング布(82)表面上の
電荷量は、検出器(10)を用いてラビング部(8)の幅
を含む測定単位面積当たりの電荷量を測定し、回転ロー
ラ(81)が1回転するとラビング部(8)全体の電荷量
が求められる。次に、検出器(10)の検出信号を電界発
生装置(11)に入力して、ラビング部(8)の形成する
電界と大きさが同じで向きが逆の電界を、電界発生装置
(11)から液晶デイスプレイ基板(1)の配線(5)に
加える。配向膜(6)と薄膜トランジスタ(4)の厚み
はガラス基板(3)の厚みの1/1000程度であるから無視
できるので、電界発生装置(11)が配線(5)に加えた
電界が薄膜トランジスタ(4)に及ぼす効果は、ラビン
グ部(8)の電界が及ぼす効果と向きが逆で大きさはほ
ぼ同じである。従つて、実質上薄膜トランジスタ(4)
に電界が加わらないのと同じになる。
Next, the operation will be described. When the rubbing cloth (82) starts rubbing the alignment film (6) of the liquid crystal display substrate (1), the rubbing cloth (82) and the alignment film (6) are charged. The charges on the alignment film (6) are neutralized by the ion generator (9) in the same manner as in the conventional device. The amount of charge on the surface of the rubbing cloth (82) is measured by using the detector (10) per unit area of measurement including the width of the rubbing portion (8), and the rubbing is performed when the rotating roller (81) makes one rotation. The charge amount of the entire part (8) is obtained. Next, the detection signal of the detector (10) is input to the electric field generator (11) to generate an electric field having the same magnitude and opposite direction as the electric field formed by the rubbing section (8). ) To the wiring (5) of the liquid crystal display substrate (1). Since the thicknesses of the alignment film (6) and the thin film transistor (4) are about 1/1000 of the thickness of the glass substrate (3), they can be ignored, so that the electric field applied by the electric field generator (11) to the wiring (5) is The effect on 4) is opposite in direction and substantially the same in magnitude as the effect of the electric field of the rubbing part (8). Therefore, substantially the thin film transistor (4)
It is the same as no electric field being applied to.

また、上記一実施例では、検出器(10)として表面電
位計を用いて、ラビング部(8)の電荷量を直接検出し
たが、液晶デイスプレイ基板(1)に加えられるラビン
グ電荷量を検出する荷重計を用いて間接的にラビング部
(8)の電荷量を求めることもできる。即ち、第2図に
示すように、検出器(10)としてX−Yテーブル(2)
の裏面に荷重計を設けて、ラビング工程中にラビング部
(8)が液晶デイスプレイ基板(1)に加える荷重の時
間的変化を測定する。回転ローラ(82)の回転数及びX
−Yテーブル(2)の移動速度は一定であるから、検出
器(10)で検出した荷重は、ラビング部(8)と配向膜
(6)の接触面積と比例関係にある。ラビング部(8)
と配向膜(6)の接触面積の時間的変化は、また両者の
摩擦帯電量の時間的変化と比例するので、ラビング部
(8)がラビング工程中に液晶デイスプレイ基板(1)
に加える荷重を検出して、その検出信号を電界発生装置
(11)に入力しても、上記一実施例と同様の効果を奏す
る。
Further, in the above-described embodiment, the surface electrometer is used as the detector (10) to directly detect the charge amount of the rubbing portion (8), but the rubbing charge amount applied to the liquid crystal display substrate (1) is detected. It is also possible to indirectly obtain the charge amount of the rubbing portion (8) by using a load meter. That is, as shown in FIG. 2, an XY table (2) is used as a detector (10).
A load meter is provided on the back surface of the device to measure the time change of the load applied to the liquid crystal display substrate (1) by the rubbing unit (8) during the rubbing process. Rotational speed of rotating roller (82) and X
Since the moving speed of the -Y table (2) is constant, the load detected by the detector (10) is proportional to the contact area between the rubbing part (8) and the alignment film (6). Rubbing part (8)
Since the temporal change in the contact area between the film and the alignment film (6) is proportional to the temporal change in the triboelectric charge amount of the both, the rubbing part (8) causes the liquid crystal display substrate (1) to move during the rubbing process.
Even if the load applied to the electric field generator is detected and the detection signal is input to the electric field generator (11), the same effect as that of the above-described embodiment can be obtained.

また、上記各実施例では検出器(10)で電界発生装置
(11)の出力電界を直接制御したが、ラビング部(8)
の摩擦帯電量は、温度、湿度を一定にコントロールされ
た環境では、ラビング布(82)及び配向膜(6)の材
質、回転ローラ(81)の回転数、X−Yテーブル(2)
の移動速度、ラビング部(8)が配向膜(6)に加える
単位面積当たりの押し付け圧力によつて決まるので、コ
ンピユータ(図示せず)に予め測定したラビング部
(8)の電荷量の時間的変化を入力して、電界発生装置
(11)の出力電界を制御してもよく、上記実施例と同様
の効果を奏する。
Further, in each of the above embodiments, the output electric field of the electric field generator (11) was directly controlled by the detector (10), but the rubbing section (8)
In the environment where the temperature and humidity are controlled to be constant, the amount of triboelectricity of is the material of the rubbing cloth (82) and the alignment film (6), the rotation speed of the rotating roller (81), and the XY table (2).
Moving speed, and the rubbing part (8) is determined by the pressing pressure applied to the alignment film (6) per unit area. Therefore, the charge amount of the rubbing part (8) measured in advance by a computer (not shown) is The change may be input to control the output electric field of the electric field generator (11), and the same effect as that of the above-described embodiment is obtained.

〔発明の効果〕 以上のように、この発明によればラビング装置を、ラ
ビング部に蓄積した電荷量を検出する検出器と、ラビン
グ部の電荷がラビング部と配向膜の接触部で形成する電
界と逆の電界を液晶デイスプレイ基板の配線に検出器の
検出値に対応して加える電界発生装置とを備えるように
構成したので、ラビング部に蓄積した電荷を短時間で中
和することができ、液晶デイスプレイ基板に内蔵される
薄膜トランジスタの特性劣化や絶縁破壊を抑制できるラ
ビング装置が得られる効果がある。
[Advantages of the Invention] As described above, according to the present invention, the rubbing device is provided with a detector for detecting the amount of charge accumulated in the rubbing part, and an electric field formed by the charge of the rubbing part at the contact part between the rubbing part and the alignment film. Since an electric field generator for applying an electric field opposite to that to the wiring of the liquid crystal display substrate corresponding to the detection value of the detector is provided, it is possible to neutralize the charges accumulated in the rubbing portion in a short time, There is an effect that a rubbing device capable of suppressing characteristic deterioration and dielectric breakdown of a thin film transistor built in a liquid crystal display substrate can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

第1図はこの発明の一実施例によるラビング装置の構成
を示す断面図、第2図はこの発明の他の実施例を示すラ
ビング装置の構成を示す断面図、第3図は従来のラビン
グ装置の構成を示す断面図、第4図は液晶デイスプレイ
基板とラビング部の位置関係を示す平面図、第5図は液
晶デイスプレイ基板の電気的等価回路を示す平面図であ
る。 図において、(1)は液晶デイスプレイ基板、(5)は
配線、(6)は配向膜、(8)はラビング部、(10)は
検出器、(11)は電界発生装置である。 なお、図中、同一符号は同一、又は相当部分を示す。
1 is a sectional view showing the structure of a rubbing apparatus according to an embodiment of the present invention, FIG. 2 is a sectional view showing the structure of a rubbing apparatus according to another embodiment of the present invention, and FIG. 3 is a conventional rubbing apparatus. 4 is a plan view showing the positional relationship between the liquid crystal display substrate and the rubbing portion, and FIG. 5 is a plan view showing an electrically equivalent circuit of the liquid crystal display substrate. In the figure, (1) is a liquid crystal display substrate, (5) is wiring, (6) is an alignment film, (8) is a rubbing portion, (10) is a detector, and (11) is an electric field generator. In the drawings, the same reference numerals indicate the same or corresponding parts.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】液晶デイスプレイ基板表面の配向膜をラビ
ングするラビング部と、上記ラビング部に蓄積した電荷
量を検出する検出器と、上記ラビング部の電荷が上記ラ
ビング部と上記配向膜の接触部に発生する電界と逆の電
界を、上記液晶デイスプレイ基板の配線に上記検出器の
検出値に対応して加える電界発生装置とを備えたことを
特徴とするラビング装置。
1. A rubbing part for rubbing an alignment film on the surface of a liquid crystal display substrate, a detector for detecting the amount of charge accumulated in the rubbing part, and a charge for the rubbing part being a contact part between the rubbing part and the alignment film. A rubbing device, comprising: an electric field generator that applies an electric field opposite to the electric field generated in the wiring to the wiring of the liquid crystal display substrate in accordance with the detection value of the detector.
JP15265489A 1989-06-14 1989-06-14 Rubbing device Expired - Lifetime JP2691774B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15265489A JP2691774B2 (en) 1989-06-14 1989-06-14 Rubbing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15265489A JP2691774B2 (en) 1989-06-14 1989-06-14 Rubbing device

Publications (2)

Publication Number Publication Date
JPH0317623A JPH0317623A (en) 1991-01-25
JP2691774B2 true JP2691774B2 (en) 1997-12-17

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JP15265489A Expired - Lifetime JP2691774B2 (en) 1989-06-14 1989-06-14 Rubbing device

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CN1096942C (en) 1995-05-01 2002-12-25 鲍德温·格拉菲克系统有限公司 Cleaning system of soaking on the spot and soaking on press, and using method of the same
JP4581274B2 (en) * 2001-03-22 2010-11-17 コニカミノルタホールディングス株式会社 Method for producing optical compensation film

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