JP2660108B2 - Photoinitiator composition - Google Patents
Photoinitiator compositionInfo
- Publication number
- JP2660108B2 JP2660108B2 JP1947891A JP1947891A JP2660108B2 JP 2660108 B2 JP2660108 B2 JP 2660108B2 JP 1947891 A JP1947891 A JP 1947891A JP 1947891 A JP1947891 A JP 1947891A JP 2660108 B2 JP2660108 B2 JP 2660108B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- atom
- substituent
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 title claims description 30
- 150000001875 compounds Chemical class 0.000 claims description 67
- -1 olefin compound Chemical class 0.000 claims description 48
- 125000001424 substituent group Chemical group 0.000 claims description 43
- 125000005843 halogen group Chemical group 0.000 claims description 17
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 239000003054 catalyst Substances 0.000 claims description 8
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 125000004429 atom Chemical group 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- PXBRQCKWGAHEHS-UHFFFAOYSA-N dichlorodifluoromethane Chemical compound FC(F)(Cl)Cl PXBRQCKWGAHEHS-UHFFFAOYSA-N 0.000 claims description 6
- 150000003839 salts Chemical class 0.000 claims description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 3
- 125000004434 sulfur atom Chemical group 0.000 claims description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 36
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 33
- 230000015572 biosynthetic process Effects 0.000 description 19
- 238000003786 synthesis reaction Methods 0.000 description 19
- 239000012299 nitrogen atmosphere Substances 0.000 description 9
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000010992 reflux Methods 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 150000003254 radicals Chemical class 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- TXNWMICHNKMOBR-UHFFFAOYSA-N 1,2-dimethylcyclohexene Chemical class CC1=C(C)CCCC1 TXNWMICHNKMOBR-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000004440 column chromatography Methods 0.000 description 5
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 206010034972 Photosensitivity reaction Diseases 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 125000004104 aryloxy group Chemical group 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 230000036211 photosensitivity Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000741 silica gel Substances 0.000 description 4
- 229910002027 silica gel Inorganic materials 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- NNQWYGKROBKYQC-UHFFFAOYSA-N 2,9,16,23-tetra-tert-butyl-29h,31h-phthalocyanine Chemical compound C12=CC(C(C)(C)C)=CC=C2C(N=C2NC(C3=CC=C(C=C32)C(C)(C)C)=N2)=NC1=NC([C]1C=CC(=CC1=1)C(C)(C)C)=NC=1N=C1[C]3C=CC(C(C)(C)C)=CC3=C2N1 NNQWYGKROBKYQC-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 125000004414 alkyl thio group Chemical group 0.000 description 3
- 125000005110 aryl thio group Chemical group 0.000 description 3
- 150000007942 carboxylates Chemical group 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 125000001476 phosphono group Chemical group [H]OP(*)(=O)O[H] 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- HYZQBNDRDQEWAN-LNTINUHCSA-N (z)-4-hydroxypent-3-en-2-one;manganese(3+) Chemical compound [Mn+3].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O HYZQBNDRDQEWAN-LNTINUHCSA-N 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 2
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 125000002843 carboxylic acid group Chemical group 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- XSWKLHINRKWMTD-UHFFFAOYSA-L cobalt(2+);3-(3-ethylcyclopentyl)propanoate Chemical compound [Co+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)C1 XSWKLHINRKWMTD-UHFFFAOYSA-L 0.000 description 2
- AMFIJXSMYBKJQV-UHFFFAOYSA-L cobalt(2+);octadecanoate Chemical compound [Co+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O AMFIJXSMYBKJQV-UHFFFAOYSA-L 0.000 description 2
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical compound [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- SZINCDDYCOIOJQ-UHFFFAOYSA-L manganese(2+);octadecanoate Chemical compound [Mn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O SZINCDDYCOIOJQ-UHFFFAOYSA-L 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 150000004032 porphyrins Chemical class 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 2
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 2
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000005415 substituted alkoxy group Chemical group 0.000 description 2
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 2
- 125000002130 sulfonic acid ester group Chemical group 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- JABYJIQOLGWMQW-UHFFFAOYSA-N undec-4-ene Chemical compound CCCCCCC=CCCC JABYJIQOLGWMQW-UHFFFAOYSA-N 0.000 description 2
- 229920006305 unsaturated polyester Polymers 0.000 description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- CCHRVFZBKRIKIX-UHFFFAOYSA-N 1-nitro-3-(3-nitrophenyl)benzene Chemical compound [O-][N+](=O)C1=CC=CC(C=2C=C(C=CC=2)[N+]([O-])=O)=C1 CCHRVFZBKRIKIX-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- VAPQAGMSICPBKJ-UHFFFAOYSA-N 2-nitroacridine Chemical compound C1=CC=CC2=CC3=CC([N+](=O)[O-])=CC=C3N=C21 VAPQAGMSICPBKJ-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- OFLRJMBSWDXSPG-UHFFFAOYSA-N 3,4,5,6-tetrafluorobenzene-1,2-dicarbonitrile Chemical compound FC1=C(F)C(F)=C(C#N)C(C#N)=C1F OFLRJMBSWDXSPG-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- RZVCEPSDYHAHLX-UHFFFAOYSA-N 3-iminoisoindol-1-amine Chemical class C1=CC=C2C(N)=NC(=N)C2=C1 RZVCEPSDYHAHLX-UHFFFAOYSA-N 0.000 description 1
- GZEFZLXJPGMRSP-UHFFFAOYSA-N 37,38,39,40-tetrazanonacyclo[28.6.1.13,10.112,19.121,28.04,9.013,18.022,27.031,36]tetraconta-1(37),2,4,6,8,10,12(39),13,15,17,19,21,23,25,27,29,31,33,35-nonadecaene Chemical compound c1ccc2c3cc4[nH]c(cc5nc(cc6[nH]c(cc(n3)c2c1)c1ccccc61)c1ccccc51)c1ccccc41 GZEFZLXJPGMRSP-UHFFFAOYSA-N 0.000 description 1
- KOQNKGAHXMCXKZ-UHFFFAOYSA-N 4,5-dicyanopyridine-3-carboxylic acid Chemical compound OC(=O)C1=CN=CC(C#N)=C1C#N KOQNKGAHXMCXKZ-UHFFFAOYSA-N 0.000 description 1
- LMYMCJFAGUMNDC-UHFFFAOYSA-N 4-(dimethylamino)pyridine-2,3-dicarbonitrile Chemical compound CN(C)C1=CC=NC(C#N)=C1C#N LMYMCJFAGUMNDC-UHFFFAOYSA-N 0.000 description 1
- KJSPQADDJXQTBU-UHFFFAOYSA-N 4-nonylbenzene-1,2-dicarbonitrile Chemical compound CCCCCCCCCC1=CC=C(C#N)C(C#N)=C1 KJSPQADDJXQTBU-UHFFFAOYSA-N 0.000 description 1
- YYHDQJIZNYJKEG-UHFFFAOYSA-N 5,6-dibromopyrazine-2,3-dicarbonitrile Chemical compound BrC1=NC(C#N)=C(C#N)N=C1Br YYHDQJIZNYJKEG-UHFFFAOYSA-N 0.000 description 1
- PHOMZPDKLWBFJI-UHFFFAOYSA-N 5,6-dicyanopyridine-2-carboxylic acid Chemical compound OC(=O)C1=CC=C(C#N)C(C#N)=N1 PHOMZPDKLWBFJI-UHFFFAOYSA-N 0.000 description 1
- UDVNSDRJSCRDAC-UHFFFAOYSA-N 5,6-dipropoxypyrazine-2,3-dicarbonitrile Chemical compound CCCOC1=NC(C#N)=C(C#N)N=C1OCCC UDVNSDRJSCRDAC-UHFFFAOYSA-N 0.000 description 1
- DMBXBPQXFZRCIT-UHFFFAOYSA-N 5-tert-butylpyrazine-2,3-dicarbonitrile Chemical compound CC(C)(C)C1=CN=C(C#N)C(C#N)=N1 DMBXBPQXFZRCIT-UHFFFAOYSA-N 0.000 description 1
- HVUIKMKTMNXPGJ-UHFFFAOYSA-N 6-methylsulfanylpyridine-3,4-dicarbonitrile Chemical compound CSC1=CC(C#N)=C(C#N)C=N1 HVUIKMKTMNXPGJ-UHFFFAOYSA-N 0.000 description 1
- KOHXAINBRPASTK-UHFFFAOYSA-N 6-phenoxypyridine-3,4-dicarbonitrile Chemical compound C1=C(C#N)C(C#N)=CN=C1OC1=CC=CC=C1 KOHXAINBRPASTK-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- XJWZGCDDTAIBQC-UHFFFAOYSA-N C(#N)C1=NC2=C(C=C1C#N)OCCO2 Chemical compound C(#N)C1=NC2=C(C=C1C#N)OCCO2 XJWZGCDDTAIBQC-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 229910021551 Vanadium(III) chloride Inorganic materials 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- KQNKJJBFUFKYFX-UHFFFAOYSA-N acetic acid;trihydrate Chemical compound O.O.O.CC(O)=O KQNKJJBFUFKYFX-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229940011182 cobalt acetate Drugs 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- QAHREYKOYSIQPH-UHFFFAOYSA-L cobalt(II) acetate Chemical compound [Co+2].CC([O-])=O.CC([O-])=O QAHREYKOYSIQPH-UHFFFAOYSA-L 0.000 description 1
- BKFAZDGHFACXKY-UHFFFAOYSA-N cobalt(II) bis(acetylacetonate) Chemical compound [Co+2].CC(=O)[CH-]C(C)=O.CC(=O)[CH-]C(C)=O BKFAZDGHFACXKY-UHFFFAOYSA-N 0.000 description 1
- FJDJVBXSSLDNJB-LNTINUHCSA-N cobalt;(z)-4-hydroxypent-3-en-2-one Chemical compound [Co].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O FJDJVBXSSLDNJB-LNTINUHCSA-N 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 125000002592 cumenyl group Chemical group C1(=C(C=CC=C1)*)C(C)C 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000005520 diaryliodonium group Chemical group 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000010017 direct printing Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- AQBLLJNPHDIAPN-LNTINUHCSA-K iron(3+);(z)-4-oxopent-2-en-2-olate Chemical compound [Fe+3].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O AQBLLJNPHDIAPN-LNTINUHCSA-K 0.000 description 1
- 125000000400 lauroyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940046892 lead acetate Drugs 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- XDKQUSKHRIUJEO-UHFFFAOYSA-N magnesium;ethanolate Chemical compound [Mg+2].CC[O-].CC[O-] XDKQUSKHRIUJEO-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000002696 manganese Chemical class 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 229940071125 manganese acetate Drugs 0.000 description 1
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- SGGOJYZMTYGPCH-UHFFFAOYSA-L manganese(2+);naphthalene-2-carboxylate Chemical compound [Mn+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 SGGOJYZMTYGPCH-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 1
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 125000006216 methylsulfinyl group Chemical group [H]C([H])([H])S(*)=O 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000005186 naphthyloxy group Chemical group C1(=CC=CC2=CC=CC=C12)O* 0.000 description 1
- 125000005029 naphthylthio group Chemical group C1(=CC=CC2=CC=CC=C12)S* 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002811 oleoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])/C([H])=C([H])\C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- 239000003444 phase transfer catalyst Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 125000000587 piperidin-1-yl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- GHFGOVUYCKZOJH-UHFFFAOYSA-N pyridine-2,3-dicarbonitrile Chemical compound N#CC1=CC=CN=C1C#N GHFGOVUYCKZOJH-UHFFFAOYSA-N 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- AWIJRPNMLHPLNC-UHFFFAOYSA-N thiocarboxylic acid group Chemical group C(=S)O AWIJRPNMLHPLNC-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- HQYCOEXWFMFWLR-UHFFFAOYSA-K vanadium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[V+3] HQYCOEXWFMFWLR-UHFFFAOYSA-K 0.000 description 1
- 125000005287 vanadyl group Chemical group 0.000 description 1
- UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、重合性の不飽和化合物
を光重合する時の、新規な光開始剤組成物に関し、さら
に詳しくは、600nmから720nmまでの波長の光
に対して低光量で感光する高感度光過酸化物形成性ラジ
カル発生剤とを含有してなる光開始剤組成物に関するも
のである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel photoinitiator composition for photopolymerizing a polymerizable unsaturated compound, and more particularly, to a low light quantity for light having a wavelength of from 600 nm to 720 nm. And a high-sensitivity photo-peroxide-forming radical generator sensitive to the above.
【0002】[0002]
【従来の技術】エチレン性不飽和結合を分子内に含むモ
ノマー、オリゴマー、ポリマーが光開始剤の存在下で光
重合する事は良く知られており、この現象は、印刷製
版、プリント基板、インキ、塗料、ワニス、フォトレジ
スト等に広く利用されている。またレーザー光を用いた
画像形成材料、例えばホログラム記録などや銀塩に代わ
る非銀塩タイプの感光材料等としても注目されている。2. Description of the Related Art It is well known that monomers, oligomers and polymers containing an ethylenically unsaturated bond in a molecule undergo photopolymerization in the presence of a photoinitiator. , Paints, varnishes, photoresists, etc. Attention has also been focused on image forming materials using laser light, such as hologram recording and non-silver-salt type photosensitive materials that replace silver salts.
【0003】このような材料として用いられる感光材料
においては、感光速度をできるだけ高める事が、その性
能にとって重要で多くの研究がなされている。In photosensitive materials used as such materials, increasing the photosensitive speed as much as possible is important for its performance, and much research has been conducted.
【0004】しかしながら、これまでの研究は多くが紫
外光ないし600nmより短波長の光に活性な光開始剤
組成物に関するものであって、より長波長(600nm
以上)の光に対する感光特性は従来のものでは不充分で
あったため、小型で光源が安定している点で有利なHe
−Neレーザー(発振波長633nm)やKr+ レーザ
ー(発振波長647nm)、半導体レーザー等の光源を
利用できないという欠点を有している。However, much of the work to date has been directed to photoinitiator compositions that are active in ultraviolet light or light at wavelengths shorter than 600 nm, and have been studied for longer wavelengths (600 nm).
The above-described light sensitivity characteristics of conventional light sources were insufficient, so that He is advantageous in that it is small and the light source is stable.
There is a drawback that a light source such as a -Ne laser (oscillation wavelength 633 nm), a Kr + laser (oscillation wavelength 647 nm), and a semiconductor laser cannot be used.
【0005】また近年になって、より短波長(670n
m以下)に発振波長をもった高出力(数十mW以上)の
半導体レーザーも開発されてきており、従来のものより
長波長(600nm以上)の光に対して低光量で感光す
る高感度な感光材料の開発が望まれる。In recent years, shorter wavelengths (670 n
m), a high-power (several tens of mW or more) semiconductor laser having an oscillation wavelength has been developed. The development of photosensitive materials is desired.
【0006】一方、He−Neレーザーに対して、高い
感光性を示すメチレンブルー、p−トルエンスルホン酸
及びアクリル酸バリウムから成る光硬化性組成物が提案
されているが[「フォトグラフィック・アンド・サイエ
ンティフィク・エンジニアリング(Photogr.Sci.En
g.)」第12巻、第177ページ(1968年)]、こ
のものは親水性であって親油性の樹脂組成物には適さな
いという欠点がある。On the other hand, there has been proposed a photocurable composition comprising methylene blue, p-toluenesulfonic acid and barium acrylate exhibiting high photosensitivity to a He-Ne laser [see "Photographic and Science". Tifik Engineering (Photogr.Sci.En
g.), Vol. 12, p. 177 (1968)], which has the disadvantage that it is hydrophilic and not suitable for lipophilic resin compositions.
【0007】また、He−NeレーザーやKr+ レーザ
ー、半導体レーザーのような長波長光源に対して感光性
をもつ親油性の光硬化性樹脂組成物として、ポルフィリ
ン類、アザポルフィリン類、フタロシアニン類またはそ
の金属錯体とジアリールヨードニウム塩との組合せを光
重合開始剤とする組成物が提案されているが(特開昭6
0−78442号公報)、該ポルフィリン類では600
nm以上の長波長光に対する感光性が低いこと、またア
ザポルフィリン類では増感効率が低いこと、フタロシア
ニン類では、種々の有機溶媒への溶解性が低いことが問
題として残っている。Further, as a lipophilic photocurable resin composition having photosensitivity to a long wavelength light source such as a He—Ne laser, a Kr + laser, and a semiconductor laser, porphyrins, azaporphyrins, phthalocyanines or There has been proposed a composition using a combination of the metal complex and a diaryliodonium salt as a photopolymerization initiator (Japanese Patent Application Laid-open No. Sho.
0-78442), and 600 porphyrins
The problem remains that photosensitivity to long-wavelength light of nm or more is low, azaporphyrins have low sensitizing efficiency, and phthalocyanines have low solubility in various organic solvents.
【0008】また、テトラベンゾポルフィリン類と電子
受容性ラジカル発生剤との組合せから成る光硬化性樹脂
組成物も提案されているが(特開昭63−243102
号公報)、テトラベンゾポルフィリン類はその工業的規
模での合成法はまだ確立されていないという問題があ
る。A photocurable resin composition comprising a combination of a tetrabenzoporphyrin and an electron-accepting radical generator has also been proposed (JP-A-63-243102).
), There is a problem that the synthesis method of tetrabenzoporphyrins on an industrial scale has not been established yet.
【0009】また一方では、特公昭58−42459号
公報にて、光酸化性組成物と光酸化性増感剤とから成る
感光性組成物を用いる印刷版の製造方法が提案されてい
る。On the other hand, Japanese Patent Publication No. Sho 58-42459 proposes a method for producing a printing plate using a photosensitive composition comprising a photo-oxidizable composition and a photo-oxidizable sensitizer.
【0010】[0010]
【発明が解決しようとする課題】しかしながら、上記試
みにおける、これら光重合開始剤を用いた感光性組成物
の感度特性を高くするためには、光重合反応を抑制する
酸素を光照射時に遮断する必要があり、ドライフィルム
状にするか、あるいは感光層上に酸素阻害層、例えばポ
リビニルアルコール皮膜を設けて使う必要があり、取扱
性、経済性に難点があった。However, in order to enhance the sensitivity characteristics of the photosensitive composition using these photopolymerization initiators in the above-mentioned attempts, oxygen which suppresses the photopolymerization reaction is cut off at the time of light irradiation. It is necessary to use a dry film or an oxygen-inhibiting layer, for example, a polyvinyl alcohol film, on the photosensitive layer, which is difficult to handle and economic.
【0011】また、後者の光酸化性組成物と光酸化性増
感剤とから成る感光性組成物においては、光酸化性増感
剤の種々溶媒に対する溶解性、光酸化性組成物を光酸化
して過酸化物を生成せしめる能力、またはレーザー光源
との波長マッチング性などの何れかあるいは全てにおい
て必ずしも満足できるものではなく、そのため感度特性
において不十分であり、レーザーの高速走査露光に耐え
るものではなかった。In the latter photosensitive composition comprising a photo-oxidizable composition and a photo-oxidizable sensitizer, the solubility of the photo-oxidizable sensitizer in various solvents and the photo-oxidizable composition It is not always satisfactory in any or all of the ability to generate peroxide or the wavelength matching property with the laser light source, so that the sensitivity characteristics are insufficient, and those that can withstand laser high-speed scanning exposure. Did not.
【0012】本発明は、このような従来の光開始剤組成
物や光重合性組成物が有する欠点を克服し、600nm
〜720nmの波長の光に対して優れた感光性を有する
高感度な光過酸化物形成型光開始剤組成物を提供するこ
とを目的としてなされたものである。The present invention overcomes the disadvantages of the conventional photoinitiator compositions and photopolymerizable compositions and has a 600 nm
The object of the present invention is to provide a highly sensitive photoperoxide-forming photoinitiator composition having excellent photosensitivity to light having a wavelength of up to 720 nm.
【0013】[0013]
【課題を解決するための手段】本発明者らは、以上の諸
点を考慮し、上記目的を達成すべく鋭意検討した結果、
特定の構造を有するポルフィラジン系化合物(A)、少
なくとも一種以上の光酸化性化合物(B)、及び少なく
とも一種以上の酸化還元触媒(C)とを組み合わせるこ
とにより、前記目的を達成することを見いだし、この知
見に基づいて本発明を完成するに至った。Means for Solving the Problems The present inventors have made intensive studies in order to achieve the above object in consideration of the above points, and
It has been found that the object can be achieved by combining a porphyrazine-based compound (A) having a specific structure, at least one or more photo-oxidizable compounds (B), and at least one or more redox catalysts (C). The present invention has been completed based on this finding.
【0014】すなわち、第一の発明は、少なくとも一種
以上の下記一般式(I)一般式(I)That is, the first invention comprises at least one of the following general formulas (I) and (I)
【0015】[0015]
【化4】 Embedded image
【0016】(式(I)中、環A1 〜A4 は、それぞれ
独立に、(In the formula (I), rings A 1 to A 4 are each independently
【0017】[0017]
【化5】 Embedded image
【0018】を表わすが、環A1 〜A4 すべてが同時
に、Wherein all of the rings A 1 to A 4 are simultaneously
【0019】[0019]
【化6】 Embedded image
【0020】となることはない。Does not occur.
【0021】R1 〜R12はそれぞれ独立に、水素原子、
ハロゲン原子ならびに水素原子およびハロゲン原子以外
の有機残基を表わし、R1 とR2 、R3 とR4 、R4 と
R5 、R6 とR7 、R9 とR10、R10とR11、R11とR
12がそれぞれ一体となった環状構造であってもよい。R 1 to R 12 each independently represent a hydrogen atom,
R 1 and R 2 , R 3 and R 4 , R 4 and R 5 , R 6 and R 7 , R 9 and R 10 , R 10 and R 10 represent a halogen atom and an organic residue other than a hydrogen atom and a halogen atom. 11 , R 11 and R
12 may have an annular structure integrally formed.
【0022】Mは、2つの水素原子あるいは置換基を持
っていてもよい2価以上の価数をもつ原子を表わす。M represents two hydrogen atoms or atoms having a valence of 2 or more which may have a substituent.
【0023】YおよびZは、それぞれ独立に、ハロゲン
原子、酸素原子ならびにハロゲン原子、酸素原子以外の
有機残基を表わすが、このうち、Mと直接結合している
有機残基中の原子は、酸素原子、窒素原子、炭素原子ま
たは硫黄原子に限られる。Y and Z each independently represent a halogen atom, an oxygen atom, or an organic residue other than a halogen atom and an oxygen atom. Of these, the atoms in the organic residue directly bonded to M are: Limited to oxygen, nitrogen, carbon or sulfur atoms.
【0024】lおよびmは、それぞれ独立に0または1
の整数を表わす。)で表わされるポルフィラジン系化合
物(A)、少なくとも一種以上の光酸化性化合物
(B)、及び少なくとも一種以上の酸化還元触媒(C)
とから成る光過酸化物形成性ラジカル発生剤を含有して
なる光開始剤組成物である。L and m are each independently 0 or 1
Represents an integer. ), At least one or more photo-oxidizable compounds (B), and at least one or more redox catalysts (C)
A photoinitiator composition comprising a photoperoxide-forming radical generator comprising:
【0025】第二の発明は上記光酸化性化合物(B)
が、一重項酸素と反応して光過酸化物を形成することの
できる、二重結合炭素上に少なくとも1つ以上のメチル
基を有するオレフィン化合物である。The second invention relates to the above photooxidizable compound (B)
Is an olefin compound having at least one or more methyl groups on a double bond carbon, which can react with singlet oxygen to form a photoperoxide.
【0026】第三の発明は、上記酸化還元触媒(C)
が、2以上の原子価状態で存在することのできる金属の
塩または錯体である。The third invention relates to the redox catalyst (C)
Is a metal salt or complex that can exist in more than one valence state.
【0027】以下詳細に本発明を説明する。Hereinafter, the present invention will be described in detail.
【0028】一般式(I)における置換基について説明
すると、R1 〜R12は、それぞれ独立に、水素原子、ハ
ロゲン原子、および水素原子ならびにハロゲン原子以外
の有機残基を表わす。このうち、ハロゲン原子として
は、フッ素原子、塩素原子、臭素原子、ヨウ素原子等で
あり、また水素原子ならびにハロゲン原子以外の有機残
基としては、置換基を持っていてもよいアルキル基、置
換基を持っていてもよいアリール基、置換基を持ってい
てもよいビニル基、ニトロ基、水酸基、置換基を持って
いてもよいアルコキシ基、置換基を持っていてもよいア
リールオキシ基、置換基を持っていてもよいアシルオキ
シ基、置換基を持っていてもよいアシル基、カルボン酸
基、カルボン酸エステル基、カルバモイル基、メルカプ
ト基、置換基を持っていてもよいアルキルチオ基、置換
基を持っていてもよいアリールチオ基、置換スルフィニ
ル基、置換スルホニル基、スルホン酸基、スルホン酸エ
ステル基、チオカルボン酸基、ジチオカルボン酸基、チ
オカルバモイル基、シアノ基、置換基を持っていてもよ
いアミノ基、置換アゾ基、置換基を持っていてもよいホ
スフィノ基、置換基を持っていてもよいホスホノ基、置
換シリル基、置換シロキシ基、置換基を持っていてもよ
い複素環基等であるが、これらの置換基に限定されるも
のではない。The substituents in the general formula (I) will be described. R 1 to R 12 each independently represent a hydrogen atom, a halogen atom, and an organic residue other than a hydrogen atom and a halogen atom. Among them, a halogen atom is a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like, and an organic residue other than a hydrogen atom and a halogen atom is an alkyl group which may have a substituent, An aryl group which may have a substituent, a vinyl group which may have a substituent, a nitro group, a hydroxyl group, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, and a substituent An acyloxy group which may have a substituent, an acyl group which may have a substituent, a carboxylic acid group, a carboxylate group, a carbamoyl group, a mercapto group, an alkylthio group which may have a substituent, Arylthio group, substituted sulfinyl group, substituted sulfonyl group, sulfonic acid group, sulfonic ester group, thiocarboxylic acid group, dithiocal Acid group, thiocarbamoyl group, cyano group, amino group optionally having a substituent, substituted azo group, phosphino group optionally having a substituent, phosphono group optionally having a substituent, substituted silyl Groups, substituted siloxy groups, heterocyclic groups which may have a substituent, and the like, but are not limited to these substituents.
【0029】さらに、上記の有機残基について詳細に説
明すると、置換基を持っていてもよいアルキル基として
は、メチル基、エチル基、n-ブチル基、tert- ブチル
基、オクチル基、ステアリル基、シクロヘキシル基、メ
ンチル基、ボルニル基、アリル基、ベンジル基、トリフ
ルオロメチル基、トリクロロメチル基、メトキシメチル
基、カルボキシメチル基、ヒドロキシメチル基等であ
り、Further, the above organic residue will be described in detail. Examples of the alkyl group which may have a substituent include a methyl group, an ethyl group, an n-butyl group, a tert-butyl group, an octyl group and a stearyl group. , Cyclohexyl group, menthyl group, bornyl group, allyl group, benzyl group, trifluoromethyl group, trichloromethyl group, methoxymethyl group, carboxymethyl group, hydroxymethyl group and the like,
【0030】置換基を持っていてもよいアリール基とし
ては、フェニル基、トリル基、ナフチル基、クメニル
基、トリクロロフェニル基、ヒドロキシフェニル基、メ
シチル基、カルボキシフェニル基等であり、Examples of the aryl group which may have a substituent include a phenyl group, a tolyl group, a naphthyl group, a cumenyl group, a trichlorophenyl group, a hydroxyphenyl group, a mesityl group and a carboxyphenyl group.
【0031】置換基を持っていてもよいビニル基として
は、ビニル基、ブテニル基、2-ブロモエテニル基、2-カ
ルボキシエテニル基等であり、Examples of the optionally substituted vinyl group include a vinyl group, a butenyl group, a 2-bromoethenyl group and a 2-carboxyethenyl group.
【0032】置換基を持っていてもよいアルコキシ基と
しては、メトキシ基、エトキシ基、tert- ブトキシ基、
ベンジルオキシ基、2-ヒドロキシエトキシ基等であり、Examples of the optionally substituted alkoxy group include a methoxy group, an ethoxy group, a tert-butoxy group,
Benzyloxy group, 2-hydroxyethoxy group and the like,
【0033】置換基を持っていてもよいアリールオキシ
基としてはフェノキシ基、2,4,6-トリメチルフェノキシ
基、4-ブロモフェノキシ基、ナフチルオキシ基等であ
り、The aryloxy group which may have a substituent includes a phenoxy group, a 2,4,6-trimethylphenoxy group, a 4-bromophenoxy group, a naphthyloxy group and the like.
【0034】置換基を持っていてもよいアシルオキシ基
としては、アセトキシ基、ベンゾイルオキシ基、フォル
ミルオキシ基、アクリロイルオキシ基、メタクリロイル
オキシ基等であり、The acyloxy group which may have a substituent includes an acetoxy group, a benzoyloxy group, a formyloxy group, an acryloyloxy group and a methacryloyloxy group.
【0035】置換基を持っていてもよいアシル基として
は、ホルミル基、アセチル基、ブチロイル基、ラウロイ
ル基、アクリロイル基、メタクリロイル基、オレオイル
基、ベンゾイル基、シンナモイル基等であり、Examples of the acyl group which may have a substituent include a formyl group, an acetyl group, a butyroyl group, a lauroyl group, an acryloyl group, a methacryloyl group, an oleoyl group, a benzoyl group and a cinnamoyl group.
【0036】カルボン酸エステル基としては、メトキシ
カルボニル基、エトキシカルボニル基、フェノキシカル
ボニル基等であり、Examples of the carboxylate group include a methoxycarbonyl group, an ethoxycarbonyl group and a phenoxycarbonyl group.
【0037】置換基を持っていてもよいアルキルチオ基
としてはメチルチオ基、エチルチオ基、ヒドロキシメチ
ルチオ基等であり、Examples of the alkylthio group which may have a substituent include a methylthio group, an ethylthio group and a hydroxymethylthio group.
【0038】置換基を持っていてもよいアリールチオ基
としては、フェニルチオ基、4-メトキシフェニルチオ
基、ナフチルチオ基等であり、The arylthio group which may have a substituent includes a phenylthio group, a 4-methoxyphenylthio group, a naphthylthio group and the like.
【0039】置換スルフィニル基としては、メチルスル
フィニル基、フェニルスルフィニル基、ヒドロキシエチ
ルスルフィニル基等であり、Examples of the substituted sulfinyl group include a methylsulfinyl group, a phenylsulfinyl group and a hydroxyethylsulfinyl group,
【0040】置換スルホニル基としては、メチルスルフ
ォニル基、ベンゼンスルフォニル基、トシル基、スルフ
ァモイル基等であり、Examples of the substituted sulfonyl group include a methylsulfonyl group, a benzenesulfonyl group, a tosyl group and a sulfamoyl group.
【0041】スルホン酸エステル基としては、メトキシ
スルフォニル基、エトキシスルフォニル基、フェノキシ
スルフォニル基等であり、Examples of the sulfonic acid ester group include a methoxysulfonyl group, an ethoxysulfonyl group and a phenoxysulfonyl group.
【0042】置換基を持っていてもよいアミノ基として
は、アミノ基、メチルアミノ基、ジメチルアミノ基、ア
ニリノ基、トルイジノ基等であり、Examples of the amino group which may have a substituent include an amino group, a methylamino group, a dimethylamino group, an anilino group and a toluidino group.
【0043】置換アゾ基としては、フェニルアゾ基、ナ
フチルアゾ基等であり、Examples of the substituted azo group include a phenylazo group and a naphthylazo group.
【0044】置換基を持っていてもよいホスフィノ基と
しては、ジメチルホスフィノ基、ジフェニルホスフィノ
基等であり、Examples of the phosphino group which may have a substituent include a dimethylphosphino group and a diphenylphosphino group.
【0045】置換基を持っていてもよいホスホノ基とし
ては、ホスホノ基、ジメチルホスホノ基、ジフェニルホ
スホノ基等であり、Examples of the phosphono group which may have a substituent include a phosphono group, a dimethylphosphono group and a diphenylphosphono group.
【0046】置換シリル基としては、トリメチルシリル
基、トリエチルシリル基等であり、Examples of the substituted silyl group include a trimethylsilyl group and a triethylsilyl group.
【0047】置換シロキシ基としては、トリメチルシロ
キシ基、トリエチルシロキシ基等であり、Examples of the substituted siloxy group include a trimethylsiloxy group and a triethylsiloxy group.
【0048】置換基を持っていてもよい複素環基として
は、フリル基、チエニル基、ピリジル基、ピロリル基、
ピペリジノ基、モルホリノ基、メチルキノリル基、フェ
ニルチアゾリル基、クロロベンゾチアゾリル基、メチル
オキサゾリル基、メチルイミダゾリル基等であるが、こ
れらの置換基に限定されるものではない。The heterocyclic group which may have a substituent includes a furyl group, a thienyl group, a pyridyl group, a pyrrolyl group,
Examples thereof include a piperidino group, a morpholino group, a methylquinolyl group, a phenylthiazolyl group, a chlorobenzothiazolyl group, a methyloxazolyl group, and a methylimidazolyl group, but are not limited to these substituents.
【0049】また、一般式(I)において、R1 と
R2 、R3 とR4 、R4 とR5 、R6 とR7 、R9 とR
10、R10とR11、R11とR12がそれぞれ一体となった環
状構造であってもよく、例えば、トリメチレン基、テト
ラメチレン基等のアルキレン基、エチレンジオキシ基、
エチレンジアミノ基等の他に、In the general formula (I), R 1 and R 2 , R 3 and R 4 , R 4 and R 5 , R 6 and R 7 , R 9 and R
10 , R 10 and R 11 , and R 11 and R 12 may each be a united cyclic structure, for example, an alkylene group such as a trimethylene group, a tetramethylene group, an ethylenedioxy group,
Other than ethylenediamino group, etc.
【0050】[0050]
【化7】 Embedded image
【0051】等があるが、これらの置換基に限定される
ものではない。The substituents are not limited to these.
【0052】また、一般式(I)において、Mは、2つ
の水素原子あるいは置換基を持っていてもよい2価以上
の原子を表わし、Zn、Pd、Cd、Mg、Al、T
i、Ge、Sn、V、Si等が挙げられる。In the general formula (I), M represents two hydrogen atoms or divalent or higher valent atoms which may have a substituent, and represents Zn, Pd, Cd, Mg, Al, T
i, Ge, Sn, V, Si and the like.
【0053】また、YおよびZは、それぞれ独立に、ハ
ロゲン原子、酸素原子ならびにハロゲン原子、酸素原子
以外の有機残基を表わすが、例えばハロゲン原子として
は、フッ素原子、塩素原子、臭素原子、ヨウ素原子等で
あり、Further, Y and Z each independently represent a halogen atom, an oxygen atom and an organic residue other than the halogen atom and the oxygen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom. Atom, etc.
【0054】また、ハロゲン原子、酸素原子以外の有機
残基としては、置換基を持っていてもよいアルキル基、
置換基を持っていてもよいアリール基、水酸基、置換基
を持っていてもよいアルコキシ基、置換基を持っていて
もよいアリールオキシ基、カルボン酸基、カルボン酸エ
ステル基、カルバモイル基、メルカプト基、置換基を持
っていてもよいアルキルチオ基、置換基を持っていても
よいアリールチオ基、置換スルホニル基、スルホン酸
基、スルホン酸エステル基、スルファモイル基、置換基
を持っていてもよいアミノ基、置換基を持っていてもよ
い複素環基、−OSO2 R13基、−0−PR14R15基、
−0(P=O)R16R17基(ただし、R13〜R17は置換
基を持っていてもよいアルキル基、置換基を持っていて
もよいアリール基、水酸基、置換基を持っていてもよい
アルコキシ基、置換基を持っていてもよいアリールオキ
シ基、置換基を持っていてもよい複素環基である)等で
あるが、これらの置換基に限定されるものではない。As the organic residue other than the halogen atom and the oxygen atom, an alkyl group which may have a substituent,
Aryl group which may have a substituent, hydroxyl group, alkoxy group which may have a substituent, aryloxy group which may have a substituent, carboxylic acid group, carboxylate group, carbamoyl group, mercapto group An alkylthio group which may have a substituent, an arylthio group which may have a substituent, a substituted sulfonyl group, a sulfonic acid group, a sulfonic acid ester group, a sulfamoyl group, an amino group which may have a substituent, have a substituent heterocyclic group, -OSO 2 R 13 group, -0-PR 14 R 15 group,
—0 (P = O) R 16 R 17 group (where R 13 to R 17 are an alkyl group which may have a substituent, an aryl group which may have a substituent, a hydroxyl group, An optionally substituted alkoxy group, an optionally substituted aryloxy group, and an optionally substituted heterocyclic group), but are not limited to these substituents.
【0055】ただし、このうちMと直接結合している有
機残基中の原子は、酸素原子、窒素原子、炭素原子また
は硫黄原子に限られる。光過酸化物形成性ラジカル発生
剤の内、(B)光酸化性化合物としては、式(II)However, the atoms in the organic residue directly bonded to M are limited to oxygen, nitrogen, carbon and sulfur atoms. Among the photo peroxide-forming radical generators, the photo-oxidizable compound (B) is represented by the formula (II)
【0056】式(II)Formula (II)
【化8】 Embedded image
【0057】(式中R18は水素原子あるいは塩素、臭素
などのハロゲン原子を、式中R19はメチル基あるいはト
リフルオロメチル基を表わす。)(In the formula, R 18 represents a hydrogen atom or a halogen atom such as chlorine or bromine, and R 19 represents a methyl group or a trifluoromethyl group.)
【0058】で表わされるジメチルシクロヘキセン化合
物(特公昭58−42459号公報)、または式(II
I)A dimethylcyclohexene compound represented by the formula (JP-B-58-42459) or a compound represented by the formula (II)
I)
【0059】式(III)Formula (III)
【化9】 Embedded image
【0060】(式中R18及びR19は、式(II)におけ
る、それと同様の意味を示す)で表わされるトリメチル
シクロヘキサジエン化合物、または、式(IV)(Wherein R 18 and R 19 have the same meanings as in formula (II)) or a compound of formula (IV)
【0061】式(IV)Formula (IV)
【化10】 Embedded image
【0062】(式中R18及びR19は、式(III)にお
ける、それと同様の意味を示す)で表わされるジメチル
フラン化合物及び、式(V)(Wherein R 18 and R 19 have the same meanings as in formula (III)) represented by formula (V):
【0063】式(V)Equation (V)
【化11】 Embedded image
【0064】(式中R18及びR19は、式(III) に
おけるそれと同様の意味を示す)で表わされるトリメチ
ルエチレン化合物などが挙げられる。(Wherein R 18 and R 19 have the same meanings as in formula (III)), and the like.
【0065】これらの化合物は二重結合を形成する炭素
上に少なくとも1つ以上のメチル基を持っており、この
メチル基が一重項酸素と反応して過酸化物を生成する。These compounds have at least one methyl group on carbon forming a double bond, and this methyl group reacts with singlet oxygen to form a peroxide.
【0066】光過酸化物形成性ラジカル発生剤の内、
(C)酸化還元触媒としては、2以上の原子価状態で存
在できる金属の塩または錯体が好ましく、例えば、オキ
シアセチルアセトンバナジウム、オキシ硫酸バナジウ
ム、オキシナフテン酸バナジウム、オキシテトラフェニ
ルポルフィリナトバナジル、オキシオクタエチルポルフ
ィリナトバナジル、オキシテトラ-t- ブチルフタロシア
ニンバナジル、などのオキシバナジウム塩あるいは錯
体、Among the photo peroxide-forming radical generators,
(C) The redox catalyst is preferably a metal salt or complex that can exist in two or more valence states, for example, vanadium oxyacetylacetone, vanadium oxysulfate, vanadium oxynaphthenate, oxytetraphenylporphyrinatovanadyl, oxyocta. Oxyvanadium salts or complexes such as ethylporphyrinatovanadyl, oxytetra-t-butylphthalocyanine vanadyl,
【0067】第1コバルトアセチルアセトナト、第2コ
バルトアセチルアセトナト、ナフテン酸第1コバルト、
ナフテン酸第2コバルト、ステアリン酸第1コバルト、
ステアリン酸第2コバルト、酢酸コバルト、テトラフェ
ニルポルフィリナトコバルト、オクタエチルポルフィリ
ナトコバルト、テトラ-t- ブチルフタロシアニンコバル
トなどのコバルトの塩あるいは錯体、Cobalt acetylacetonate, cobaltous acetylacetonate, cobaltous naphthenate,
Cobaltous naphthenate, cobaltous stearate,
Cobalt salts or complexes of cobalt stearate, cobalt acetate, tetraphenylporphyrinatocobalt, octaethylporphyrinatocobalt, tetra-t-butylphthalocyanine cobalt,
【0068】ステアリン酸第1マンガン、ステアリン酸
第2マンガン、第1マンガンアセチルアセトナト、第2
マンガンアセチルアセトナト、酢酸マンガン、ナフテン
酸マンガン、テトラフェニルポルフィリナトマンガン、
オクタエチルポルフィリナトマンガン、テトラ-t- ブチ
ルフタロシアニンマンガンなどのマンガンの塩または錯
体、Manganese stearate, manganese stearate, manganese acetylacetonate,
Manganese acetylacetonate, manganese acetate, manganese naphthenate, manganese tetraphenylporphyrinato,
Manganese salts or complexes such as octaethylporphyrinatomanganese, tetra-t-butylphthalocyanine manganese,
【0069】鉄(III)アセチルアセトナト、鉄(I
II)ベンゾイルアセトナト、テトラフェニルポルフィ
リナト鉄(III)クロライド、オクタエチルポルフィ
リナト鉄(III)クロライド、テトラ-t- ブチルフタ
ロシアニン鉄(III)クロライド、ナフテン酸鉄(I
II)、フェロセン、シクロペンタジエニル−クメン鉄
ヘキサフルオロフォスフェート、鉄(II)O-フェナン
トロリンなどの鉄塩あるいは錯体、Iron (III) acetylacetonate, iron (I
II) Benzoylacetonato, tetraphenylporphyrinatoiron (III) chloride, octaethylporphyrinatoiron (III) chloride, tetra-t-butylphthalocyanine iron (III) chloride, iron naphthenate (I)
II) iron salts or complexes such as ferrocene, cyclopentadienyl-cumene iron hexafluorophosphate, iron (II) O-phenanthroline,
【0070】チタニルアセチルアセトナト、チタノセ
ン、ジシクロペンタジエニルチタニウム(II)ジクロ
リド、オキシチタニウムアセチルアセトナト、などのチ
タン塩あるいは錯体などが挙げられる。Titanium salts or complexes of titanylacetylacetonato, titanocene, dicyclopentadienyltitanium (II) dichloride, oxytitanium acetylacetonato and the like can be mentioned.
【0071】本発明で使用する上記一般式(I)で表わ
されるポルフィラジン系化合物は、一般には下記式(V
I)〜(IX)で表わされるニトリル類((IX)のみ
の単独使用では目的物は得られない)と各種金属塩(無
金属ポルフィラジンの場合は使用しないかもしくはアル
カリ金属塩が用いられる)とを好ましくは有機溶媒中で
加熱することにより製造することができる[「ジャーナ
ル・オブ・ジェネラル・ケミストリー・イン・USSR
(J. Gen. Chem. USSR)」、第39巻、第2477ペー
ジ(1969)、 特開昭64−34791号公報]。The porphyrazine compound represented by the above general formula (I) used in the present invention is generally represented by the following formula (V)
The nitriles represented by I) to (IX) (the desired product cannot be obtained by using only (IX) alone) and various metal salts (in the case of non-metallic porphyrazine, it is not used or an alkali metal salt is used) Is preferably heated in an organic solvent [see Journal of General Chemistry in USSR
(J. Gen. Chem. USSR) ", vol. 39, p. 2477 (1969), JP-A-64-34791].
【0072】式(VI)Formula (VI)
【化12】 Embedded image
【0073】式(VII)Formula (VII)
【化13】 Embedded image
【0074】式(VIII)Formula (VIII)
【化14】 Embedded image
【0075】式(IX)Formula (IX)
【化15】 Embedded image
【0076】また、上記式(VI)〜(IX)で示され
る置換基の異なるニトリル類を混合して反応させること
によって種々のポルフィラジン系化合物を得ることもで
きる。Various porphyrazine compounds can also be obtained by mixing and reacting nitriles having different substituents represented by the above formulas (VI) to (IX).
【0077】また一般式(I)のポルフィラジン系化合
物は、下記式(X)〜(XIII)で表わされるイソイ
ンドリンジイミン誘導体((XIII)のみの単独使用
では目的物は得られない)からも製造することができる
[「ジャーナル・オブ・ヘテロサイクリック・ケミスト
リー(J. Heterocycl. Chem )」、第7巻、第1403
ページ(1970)、日本化学会誌、第219ページ
(1990年)]。The porphyrazine compounds of the general formula (I) can be obtained from the isoindolinediimine derivatives represented by the following formulas (X) to (XIII) (the desired product cannot be obtained by using only (XIII) alone). [Journal of heterocyclic chemistry (J. Heterocycl. Chem)], Vol. 7, No. 1403
Page (1970), Journal of the Chemical Society of Japan, page 219 (1990)].
【0078】式(X)〜(XIII)Formulas (X) to (XIII)
【化16】 Embedded image
【0079】本発明で使用する一般式(I)で表わされ
るポルフィラジン系化合物の代表例(化合物(a)〜
(i))を以下に示す。Representative examples of the porphyrazine compounds represented by the general formula (I) used in the present invention (compounds (a) to
(I)) is shown below.
【0080】化合物(a)Compound (a)
【化17】 Embedded image
【0081】化合物(b)Compound (b)
【化18】 Embedded image
【0082】化合物(c)Compound (c)
【化19】 Embedded image
【0083】化合物(d)Compound (d)
【化20】 Embedded image
【0084】化合物(e)Compound (e)
【化21】 Embedded image
【0085】化合物(f)Compound (f)
【化22】 Embedded image
【0086】化合物(g)Compound (g)
【化23】 Embedded image
【0087】化合物(h)Compound (h)
【化24】 Embedded image
【0088】化合物(i)Compound (i)
【化25】 Embedded image
【0089】ただし、上記化合物(a)〜(i)中の略
号はそれぞれt Buがtert- ブチル基を、Meがメチル
基を、Phがフェニル基を、Prがn−プロピル基を、
n C9 H19がn−ノニル基を表わす。In the above compounds (a) to (i), t Bu represents a tert-butyl group, Me represents a methyl group, Ph represents a phenyl group, Pr represents an n-propyl group, and
n C 9 H 19 represents a n- nonyl.
【0090】本発明の光開始剤組成物は、少なくとも一
種以上の前記一般式(I)で表わされるポルフィラジン
系化合物(A)、少なくとも一種以上の光酸化性化合物
(B)、及び少なくとも一種以上の酸化還元触媒(C)
とから成る光過酸化物形成性ラジカル発生剤を有効成分
として含有するものであり、これら三者の配合比率は重
量比で(ポルフィラジン系化合物(A)):(光酸化性
化合物(B))が10〜90:90〜10であり、さら
に好ましくは25〜75:75〜25であり、また酸化
還元触媒(C)は、光酸化性化合物(B)に対して重量
比で0.01〜90%、さらに好ましくは0.1〜20
%の範囲で添加することが望ましい。The photoinitiator composition of the present invention comprises at least one porphyrazine-based compound (A) represented by the general formula (I), at least one or more photo-oxidizable compounds (B), and at least one or more Redox catalyst (C)
And a photoperoxide-forming radical generator consisting of: (porphyrazine-based compound (A)) :( photo-oxidizable compound (B)) ) Is from 10 to 90:90 to 10, more preferably from 25 to 75:75 to 25, and the redox catalyst (C) is 0.01% by weight with respect to the photo-oxidizable compound (B). ~ 90%, more preferably 0.1 ~ 20
% Is desirably added.
【0091】本発明の光開始剤組成物は、ほとんどすべ
ての重合性不飽和化合物を極短時間の内に600nm以
上の長波長光によって光重合させることができる。これ
らの不飽和化合物としては例えば、アクリル酸、メタク
リル酸、イタコン酸、マレイン酸およびそのエステルや
無水物、アクリルアミド、スチレン、アクリロニトリ
ル、N−ビニルピロリドン、酢酸ビニル、さらに種々の
不飽和ポリエステル、不飽和ポリエーテル、不飽和ポリ
ウレタン等の化合物が挙げられる。In the photoinitiator composition of the present invention, almost all polymerizable unsaturated compounds can be photopolymerized in a very short time by long-wavelength light of 600 nm or more. Examples of these unsaturated compounds include acrylic acid, methacrylic acid, itaconic acid, maleic acid and its esters and anhydrides, acrylamide, styrene, acrylonitrile, N-vinylpyrrolidone, vinyl acetate, various unsaturated polyesters, and unsaturated polyesters. Examples include compounds such as polyethers and unsaturated polyurethanes.
【0092】これらの不飽和化合物の1種もしくは2種
以上の混合物に本発明の光開始剤組成物を添加し必要に
応じて通常の染料、顔料、オリゴマー、ポリマー等や適
当な希釈溶媒を加えて光重合組成物とすることができ
る。The photoinitiator composition of the present invention is added to one or a mixture of two or more of these unsaturated compounds, and if necessary, ordinary dyes, pigments, oligomers, polymers and the like and an appropriate diluting solvent are added. To obtain a photopolymerizable composition.
【0093】光開始剤組成物の添加量は不飽和化合物の
100重量部に対して0.1〜30重量部、好ましくは
0.5〜20重量部である。The addition amount of the photoinitiator composition is 0.1 to 30 parts by weight, preferably 0.5 to 20 parts by weight, per 100 parts by weight of the unsaturated compound.
【0094】また、適当な希釈溶媒としては、本発明の
光開始剤組成物および使用する不飽和化合物を溶解また
は分散するものならすべて使用可能であり、例えば、
水、メタノール、エタノール、プロパノール、アセト
ン、メチルエチルケトン、メチルセロソルブ、エチルセ
ロソルブ、ベンゼン、トルエン、キシレン、テトラヒド
ロフラン、ジオキサン、酢酸エチル、ジクロロメタン、
クロロホルム、トリクロロエチレン、ジメチルホルムア
ミド、ジメチルスルホキシド、ピリジン等が挙げられ
る。As a suitable diluting solvent, any solvent which dissolves or disperses the photoinitiator composition of the present invention and the unsaturated compound to be used can be used.
Water, methanol, ethanol, propanol, acetone, methyl ethyl ketone, methyl cellosolve, ethyl cellosolve, benzene, toluene, xylene, tetrahydrofuran, dioxane, ethyl acetate, dichloromethane,
Chloroform, trichloroethylene, dimethylformamide, dimethylsulfoxide, pyridine and the like can be mentioned.
【0095】[0095]
【実施例】次に、実施例により本発明をさらに詳細に説
明するが、本発明はこれらの例によってなんら限定され
るものではない。尚、例中部は重量部である。実施例に
先だち化合物(a)〜(i)の合成例を説明する。Next, the present invention will be described in more detail by way of examples, but the present invention is not limited to these examples. The middle part in the examples is part by weight. The examples of the synthesis of the compounds (a) to (i) will be described first.
【0096】合成例1:化合物(a)の合成 2-tert- ブチルー5、6ー ジシアノピラジン5.00 gと無水塩
化亜鉛0.955gとをキノリン30mlに溶解し窒素雰囲気下、
180 ℃にて4時間加熱撹拌後、放冷、反応液を水100ml
で希釈、濾別し、クロロホルムにて抽出、クロロホルム
/メタノールにて再結晶し化合物(a)1.14 gを得た。Synthesis Example 1 Synthesis of Compound (a) 5.00 g of 2-tert-butyl-5,6-dicyanopyrazine and 0.955 g of anhydrous zinc chloride were dissolved in 30 ml of quinoline, and the mixture was dissolved in a nitrogen atmosphere.
Heat and stir at 180 ° C for 4 hours.
, Filtered off, extracted with chloroform, and recrystallized with chloroform / methanol to obtain 1.14 g of compound (a).
【0097】合成例2:化合物(b)の合成 下記に示す化合物(j)25.00gに2ー(ジメチルアミノ)
エタノール150 mlを加え窒素雰囲気下、撹拌しながら8
時間加熱還流後、放冷、反応液を水300 mlで希釈、濾別
し、クロロホルムにて抽出、クロロホルム/メタノール
にて再結晶し化合物(b)30.0 gを得た。Synthesis Example 2: Synthesis of compound (b) 2- (dimethylamino) was added to 25.00 g of the following compound (j).
Add 150 ml of ethanol and stir under nitrogen atmosphere.
After heating under reflux, the reaction solution was allowed to cool, diluted with 300 ml of water, filtered, extracted with chloroform, and recrystallized with chloroform / methanol to obtain 30.0 g of compound (b).
【0098】化合物(j)Compound (j)
【化26】 合成例3:化合物(c)の合成 2,3-ジシアノ-5,6- エチレンジオキシピリジン32 gと無
水塩化カドミウム7.84g、1、8ージアザビシクロ[5.4.0]
ウンデク-7- エン(DBU)20 gとをn−アミルアルコ
ール150 mlに溶解し窒素雰囲気下、4時間加熱還流後、
放冷、反応液を水300ml)で希釈、濾別し、クロロホルム
にて抽出、メタノールにて再結晶し化合物(c)9.67 g
を得た。Embedded image Synthesis Example 3: Synthesis of compound (c) 2,3-dicyano-5,6-ethylenedioxypyridine 32 g and anhydrous cadmium chloride 7.84 g, 1,8-diazabicyclo [5.4.0]
20 g of undec-7-ene (DBU) was dissolved in 150 ml of n-amyl alcohol, and heated under reflux in a nitrogen atmosphere for 4 hours.
The reaction solution was allowed to cool, diluted with water (300 ml), filtered, extracted with chloroform, and recrystallized from methanol to give 9.67 g of compound (c).
I got
【0099】合成例4:化合物(d)の合成 4,5-ジシアノ-2- フェノキシピリジン13.3 gおよび2,6-
ジメチル-3,4- ジシアノピリジン3.14 g、マグネシウム
ジエトキシド4.58 gをn−アミルアルコール100 mlに溶
解し窒素雰囲気下、9時間加熱還流後、放冷、反応液を
水300ml)で希釈、濾別し、クロロホルムにて抽出、カラ
ムクロマトグラフィー(シリカゲル/クロロホルム)に
て分離、精製し、クロロホルム/メタノールにて再結晶
し化合物(d)3.44 gを得た。Synthesis Example 4: Synthesis of compound (d) 13.3 g of 4,5-dicyano-2-phenoxypyridine and 2,6-
3.14 g of dimethyl-3,4-dicyanopyridine and 4.58 g of magnesium diethoxide were dissolved in 100 ml of n-amyl alcohol, heated and refluxed for 9 hours under a nitrogen atmosphere, allowed to cool, diluted with 300 ml of water, and filtered. Separately, the mixture was extracted with chloroform, separated and purified by column chromatography (silica gel / chloroform), and recrystallized from chloroform / methanol to obtain 3.44 g of compound (d).
【0100】合成例5:化合物(e)の合成 2,3-ジブロモ-5,6- ジシアノピラジン17.3 gおよび1,2-
ジシアノ-4- ノニルベンゼン5.08 g、酢酸パラジウム4.
49 g、DBU10 gをn−アミルアルコール100ml に溶解
し窒素雰囲気下、12時間加熱還流後、放冷、反応液を
水300 mlで希釈、濾別し、クロロホルムにて抽出、カラ
ムクロマトグラフィー(シリカゲル/クロロホルム)に
て分離、精製し、クロロホルム/メタノールにて再結晶
し化合物(e)3.62 gを得た。Synthesis Example 5: Synthesis of compound (e) 17.3 g of 2,3-dibromo-5,6-dicyanopyrazine and 1,2-
5.08 g of dicyano-4-nonylbenzene, palladium acetate 4.
49 g and 10 g of DBU were dissolved in 100 ml of n-amyl alcohol, heated under reflux in a nitrogen atmosphere for 12 hours, allowed to cool, diluted with 300 ml of water, filtered off, extracted with chloroform, and extracted by column chromatography (silica gel). / Chloroform) and recrystallized from chloroform / methanol to obtain 3.62 g of compound (e).
【0101】合成例6:化合物(f)の合成 下記で示す化合物(k)14.3 gおよび2,3-ジシアノピリ
ジン2.58 g、三塩化バナジウム3.15 g、DBU7.0gをキ
ノリン100 mlに溶解し窒素雰囲気下、11時間加熱還流
後、放冷、反応液をメタノール300 mlで希釈、濾別し、
クロロホルムにて抽出、カラムクロマトグラフィー(シ
リカゲル/クロロホルム)にて分離、精製し、クロロホ
ルム/メタノールにて再結晶し化合物(f)2.80 gを得
た。Synthesis Example 6: Synthesis of compound (f) 14.3 g of the compound (k) shown below, 2.58 g of 2,3-dicyanopyridine, 3.15 g of vanadium trichloride and 7.0 g of DBU were dissolved in 100 ml of quinoline, and a nitrogen atmosphere was used. After heating under reflux for 11 hours, the reaction solution was allowed to cool, diluted with 300 ml of methanol, filtered and filtered.
Extraction with chloroform, separation and purification by column chromatography (silica gel / chloroform), and recrystallization with chloroform / methanol gave 2.80 g of compound (f).
【0102】化合物(k)Compound (k)
【化27】 Embedded image
【0103】合成例7:化合物(g)の合成 2,3-ジシアノ-5,6- ジプロポキシピラジン14.28gおよび
4,5-ジシアノ-2- メチルチオピリジン3.5g、塩化アルミ
ニウム5.34 g、DBU8gをキノリン100 mlに溶解し窒素
雰囲気下、8時間加熱還流後、放冷、反応液をメタノー
ル300mlで希釈、濾別し、クロロホルムにて抽出、カラ
ムクロマトグラフィー(シリカゲル/クロロホルム)に
て分離、精製し、クロロホルム/メタノールにて再結晶
し化合物(g)2.64 gを得た。Synthesis Example 7: Synthesis of compound (g) 14.28 g of 2,3-dicyano-5,6-dipropoxypyrazine and
3.5 g of 4,5-dicyano-2-methylthiopyridine, 5.34 g of aluminum chloride and 8 g of DBU were dissolved in 100 ml of quinoline, heated under reflux in a nitrogen atmosphere for 8 hours, allowed to cool, diluted with 300 ml of methanol and filtered. The mixture was extracted with chloroform, separated and purified by column chromatography (silica gel / chloroform), and recrystallized from chloroform / methanol to obtain 2.64 g of a compound (g).
【0104】合成例8:化合物(h)の合成 4,5-ジシアノニコチン酸5.13 gおよび2-カルボキシル-
5,6- ジシアノピリジン1.71 g、酢酸鉛三水和物7.59
g、1,4-ジアザビシクロ[2.2.2] オクタン3gをニトロベ
ンゼン100 mlに溶解し窒素雰囲気下、15時間加熱還流
後、放冷、反応液をヘキサン100 mlで希釈、濾別し、メ
タノールにて抽出、逆相カラムクロマトグラフィー(オ
クタデシル化学修飾シリカゲル/エタノール)にて分
離、精製し、メタノールにて再結晶し化合物(h)11.7
gを得た。Synthesis Example 8 Synthesis of Compound (h) 5.13 g of 4,5-dicyanonicotinic acid and 2-carboxyl-
5,6-dicyanopyridine 1.71 g, lead acetate trihydrate 7.59
g, 1,4-diazabicyclo [2.2.2] octane (3 g) dissolved in nitrobenzene (100 ml), heated to reflux for 15 hours under a nitrogen atmosphere, allowed to cool, diluted with 100 ml of hexane, filtered, and filtered. Extraction, separation and purification by reversed-phase column chromatography (octadecyl chemically modified silica gel / ethanol), recrystallization from methanol to give compound (h) 11.7
g was obtained.
【0105】合成例9:化合物(i)の合成 2,3-ジシアノ-4- ジメチルアミノピリジン15.5 gおよび
1,2-ジシアノ-3,4,5,6- テトラフルオロベンゼン12.61
g 、酢酸ナトリウム12 gをn−アミルアルコール200 ml
に溶解し窒素雰囲気下、12時間加熱還流後、放冷、反
応液を水400 mlで希釈、濾別し化合物(i)2.31 gを得
た。Synthesis Example 9 Synthesis of Compound (i) 15.5 g of 2,3-dicyano-4-dimethylaminopyridine and
1,2-dicyano-3,4,5,6-tetrafluorobenzene 12.61
g, 12 g of sodium acetate in 200 ml of n-amyl alcohol
After heating under reflux in a nitrogen atmosphere for 12 hours, the reaction solution was allowed to cool, diluted with 400 ml of water, and separated by filtration to obtain 2.31 g of compound (i).
【0106】クロロメチルスチレンとメタクリル酸メチ
ルをモル比1:1の割合で有する共重合体と、アクリル
酸カリウム塩とを、ジメチルホルムアミド40ml中
で、テトラブチルアンモニウムクロライドと炭酸カリウ
ムとを相間移動触媒として酸素ガスバブリング下、40
℃で12時間反応させ、アクリロイル基を側鎖に有する
ポリマーを得た。得られたポリマーをジオキサン中に溶
解して、5重量%濃度の溶液に調製し、以後感度特性評
価用の樹脂として用いた。A copolymer having chloromethylstyrene and methyl methacrylate in a molar ratio of 1: 1 and potassium acrylate were mixed in 40 ml of dimethylformamide with tetrabutylammonium chloride and potassium carbonate as a phase transfer catalyst. Under oxygen gas bubbling, 40
The reaction was carried out at 12 ° C. for 12 hours to obtain a polymer having an acryloyl group in a side chain. The obtained polymer was dissolved in dioxane to prepare a solution having a concentration of 5% by weight, and thereafter used as a resin for evaluating sensitivity characteristics.
【0107】実施例1〜9 本実施例は下記の、ジメチルシクロヘキセンのビスフェ
ノール誘導体(XIV)を光酸化性化合物として使用す
る場合の例である。Examples 1 to 9 In this example, the following bisphenol derivative of dimethylcyclohexene (XIV) is used as a photo-oxidizable compound.
【0108】ビスフェノール誘導体(XIV)Bisphenol derivative (XIV)
【化28】 Embedded image
【0109】上記ポリマーのジオキサン溶液2gにペン
タエリスリトールトリアクリレートをポリマーに対して
50重量部、第1表に示したポルフィラジン系化合物を
10重量部、ジメチルシクロヘキセン誘導体(XIV)
を10重量部、オキシバナジウムアセチルアセトナトを
0.1重量部をそれぞれ添加して調製した感光液をスピ
ンコーターを用いて約2μmの厚みにガラス板上に塗布
した感光板に、ビーム径2mmのHe−Neレーザー
(633nm光)を照射時間を変えて露光し1mmHg
以上の真空下で60℃、3分の加熱処理を行なった後、
トルエンにて現像を行いレーザービーム径と同等の大き
さの硬化スポット径を与える露光量を感度として第1表
に示した。尚、表中のポルフィラジン系化合物は前に示
した化合物(a)〜化合物(i)と同一物質である。In 2 g of a dioxane solution of the above polymer, 50 parts by weight of pentaerythritol triacrylate based on the polymer, 10 parts by weight of a porphyrazine compound shown in Table 1, and a dimethylcyclohexene derivative (XIV)
Was added on a glass plate to a thickness of about 2 μm using a spin coater, and a photosensitive solution prepared by adding 10 parts by weight of oxyvanadium acetylacetonate and 0.1 part by weight of oxyvanadium acetylacetonate was applied to a photosensitive plate. Exposure with a He-Ne laser (633 nm light) for different irradiation times and 1 mmHg
After performing the heat treatment at 60 ° C. for 3 minutes under the above vacuum,
Table 1 shows, as sensitivity, the amount of exposure which gave development with toluene and gave a cured spot diameter equivalent to the laser beam diameter. The porphyrazine compounds in the table are the same as the compounds (a) to (i) shown above.
【0110】実施例10〜12 前記実施例1〜9における組成で、色素として 実施例
1に示したポルフィラジン系化合物(a)を、光酸化性
化合物として(XIV)の代わりに以下に示す(XV)
〜(XVII)のオレフィン誘導体を用いた時の感度特
性を、第2表に示した。Examples 10 to 12 In the compositions of Examples 1 to 9, the porphyrazine-based compound (a) shown in Example 1 was used as a dye instead of (XIV) as a photo-oxidizable compound. XV)
Table 2 shows the sensitivity characteristics when the olefin derivatives of (XVII) to (XVII) were used.
【0111】[0111]
【表1】 [Table 1]
【0112】[0112]
【表2】 [Table 2]
【0113】式(XV)Formula (XV)
【化29】 Embedded image
【0114】式(XVI)Formula (XVI)
【化30】 Embedded image
【0115】式(XVII)Formula (XVII)
【化31】 Embedded image
【0116】[0116]
【発明の効果】本発明における光開始剤組成物は、カー
ボンアーク、キセノンランプ、メタルハライドランプ、
蛍光ランプ、タングステンランプなどを用いることがで
きるほか、600nmから720nmまでの波長の光に
対して高い感度(0.1mJ/cm2 〜数mJ/c
m2 )を示すことから、He−Ne、Kr+ レーザーな
どのガスレーザーや、半導体レーザーを用いることがで
きる。The photoinitiator composition of the present invention comprises a carbon arc, a xenon lamp, a metal halide lamp,
A fluorescent lamp, a tungsten lamp, or the like can be used, and a high sensitivity (0.1 mJ / cm 2 to several mJ / c) to light having a wavelength of 600 nm to 720 nm can be used.
m 2 ), a gas laser such as a He—Ne or Kr + laser or a semiconductor laser can be used.
【0118】また、レーザービーム走査による高速スキ
ャニング露光においても相反則不軌挙動を示さないの
で、レーザービーム走査による画像形成材料、例えばダ
イレクト刷版、プリント配線板用フォトレジスト、非銀
塩画像形成材料などに応用可能であり、また、微妙な干
渉縞形成のため高感度であることが要求されるリップマ
ン型ホログラムや、大面積化が困難であったレインボー
ホログラムにおけるレリーフ型ホログラム記録における
ホログラム記録用材料などとして幅広い分野に応用可能
である。Also, since reciprocity failure behavior is not exhibited even in high-speed scanning exposure by laser beam scanning, image forming materials by laser beam scanning, such as direct printing plates, photoresists for printed wiring boards, non-silver salt image forming materials, etc. Lip hologram, which is required to have high sensitivity to form subtle interference fringes, and hologram recording material for relief hologram recording in rainbow holograms, for which it was difficult to increase the area. It can be applied to a wide range of fields.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平2−135351(JP,A) 特開 平2−972(JP,A) 特開 昭61−278506(JP,A) 特開 昭60−78442(JP,A) 特開 昭50−83103(JP,A) 特開 平4−113361(JP,A) ──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-2-135351 (JP, A) JP-A-2-972 (JP, A) JP-A-61-278506 (JP, A) JP-A-60-1985 78442 (JP, A) JP-A-50-83103 (JP, A) JP-A-4-113361 (JP, A)
Claims (3)
で表わされるポルフィラジン系化合物(A)、少なくと
も一種以上の光酸化性化合物(B)、及び少なくとも一
種以上の酸化還元触媒(C)とから成る光過酸化物形成
性ラジカル発生剤とを含有してなる光開始剤組成物。一
般式(I) 【化1】 (式(I)中、環A1 〜A4 は、それぞれ独立に、 【化2】 を表わすが、環A1 〜A4 すべてが同時に、 【化3】 となることはない。R1 〜R12はそれぞれ独立に、水素
原子、ハロゲン原子ならびに水素原子およびハロゲン原
子以外の有機残基を表わし、R1 とR2 、R3 とR4 、
R4 とR5 、R6 とR7 、R9 とR10、R10とR11、R
11とR12がそれぞれ一体となった環状構造であってもよ
い。Mは、2つの水素原子あるいは置換基を持っていて
もよい2価以上の価数をもつ原子を表わす。YおよびZ
は、それぞれ独立に、ハロゲン原子、酸素原子ならびに
ハロゲン原子、酸素原子以外の有機残基を表わすが、こ
のうち、Mと直接結合している有機残基中の原子は、酸
素原子、窒素原子、炭素原子または硫黄原子に限られ
る。lおよびmは、それぞれ独立に0または1の整数を
表わす。)1. At least one kind of the following general formula (I)
A porphyrazine-based compound represented by the formula (A), at least one or more photo-oxidizable compounds (B), and at least one or more redox catalysts (C). A photoinitiator composition comprising: General formula (I) (In the formula (I), the rings A 1 to A 4 are each independently: Wherein all of the rings A 1 to A 4 are simultaneously Will not be. R 1 to R 12 each independently represent a hydrogen atom, a halogen atom, or an organic residue other than a hydrogen atom and a halogen atom, and R 1 and R 2 , R 3 and R 4 ,
R 4 and R 5, R 6 and R 7, R 9 and R 10, R 10 and R 11, R
An annular structure in which 11 and R 12 are each integrated may be used. M represents two hydrogen atoms or atoms having a valence of 2 or more which may have a substituent. Y and Z
Independently represent a halogen atom, an oxygen atom, and an organic residue other than a halogen atom and an oxygen atom. Of these, the atoms in the organic residue directly bonded to M are an oxygen atom, a nitrogen atom, Limited to carbon or sulfur atoms. l and m each independently represent an integer of 0 or 1. )
と反応して光過酸化物を形成することのできる、二重結
合炭素上に少なくとも1つ以上のメチル基を有するオレ
フィン化合物であることを特徴とする請求項1記載の光
開始剤組成物。2. An olefin compound having at least one methyl group on a double bond carbon, wherein the photooxidizable compound (B) is capable of reacting with singlet oxygen to form a photoperoxide. The photoinitiator composition according to claim 1, wherein:
状態で存在することのできる金属の塩または錯体である
ことを特徴とする請求項1記載の光開始剤組成物。3. The photoinitiator composition according to claim 1, wherein the redox catalyst (C) is a metal salt or complex capable of existing in two or more valence states.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1947891A JP2660108B2 (en) | 1991-01-18 | 1991-01-18 | Photoinitiator composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1947891A JP2660108B2 (en) | 1991-01-18 | 1991-01-18 | Photoinitiator composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04243261A JPH04243261A (en) | 1992-08-31 |
JP2660108B2 true JP2660108B2 (en) | 1997-10-08 |
Family
ID=12000450
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1947891A Expired - Lifetime JP2660108B2 (en) | 1991-01-18 | 1991-01-18 | Photoinitiator composition |
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Country | Link |
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JP (1) | JP2660108B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2004299235A1 (en) * | 2003-12-12 | 2005-06-30 | Syngenta Participations Ag | Novel herbicides |
-
1991
- 1991-01-18 JP JP1947891A patent/JP2660108B2/en not_active Expired - Lifetime
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JPH04243261A (en) | 1992-08-31 |
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