JP2623265B2 - Manufacturing method of quartz glass - Google Patents
Manufacturing method of quartz glassInfo
- Publication number
- JP2623265B2 JP2623265B2 JP62297417A JP29741787A JP2623265B2 JP 2623265 B2 JP2623265 B2 JP 2623265B2 JP 62297417 A JP62297417 A JP 62297417A JP 29741787 A JP29741787 A JP 29741787A JP 2623265 B2 JP2623265 B2 JP 2623265B2
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- crucible
- raw material
- material powder
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/02—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating
- C03B5/021—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating by induction heating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
Description
【発明の詳細な説明】 産業上の利用分野 この発明は石英ガラスの製造方法に関する。Description: TECHNICAL FIELD The present invention relates to a method for producing quartz glass.
従来の技術 石英ガラス原料粉をルツボに入れて石英ガラス原料粉
全体をとりまく加熱源で石英ガラス原料粉を加熱して溶
融して石英ガラスを製造する場合、気泡をにがすのが難
しく多数の気泡の混入がさけられない。Conventional technology Quartz glass raw material powder is put into a crucible, and the quartz glass raw material powder is heated and melted by a heating source surrounding the whole quartz glass raw material powder to produce quartz glass. Bubbles cannot be mixed.
発明が解決しようとする課題 したがって、石英ガラスの品質の向上が図れない。Therefore, the quality of quartz glass cannot be improved.
この発明は、このような問題点を解決するためになさ
れたものであり、気泡の混入をさけることができる石英
ガラスの製造方法を提供することを目的とする。The present invention has been made in order to solve such a problem, and an object of the present invention is to provide a method for manufacturing quartz glass that can prevent air bubbles from being mixed.
問題点を解決するための手段 この発明は、真空中、H2ガス中、Heガス中、H2とHeの
混合ガス中のいずれかにおいて、ルツボ中の石英ガラス
原料粉をその下方から上方に順次局所的に加熱して溶融
することを特徴とする石英ガラスの製造方法を要旨とし
ている。The means for solving the problems present invention, in a vacuum, H 2 gas, in He gas, in any of the mixed gas of H 2 and He, the upper quartz glass raw material powder in the crucible from below A gist of the present invention is a method for manufacturing quartz glass, which is sequentially heated and melted locally.
作 用 加熱されて溶融した石英部分からまだ溶融していない
石英ガラス原料粉側に気泡が移り、溶融石英部分から気
泡が消失しやすい。Function Bubbles are transferred from the heated and fused quartz portion to the unmelted quartz glass powder, and the bubbles are easily lost from the fused quartz portion.
実施例 第１図はこの発明を実施するための製造装置を示して
いる。この製造装置の炉１内は、真空状態にできるよう
になっている。炉１内にはルツボ２が収容されている。
炉１の上部には石英ガラス原料粉３の収容部４が設けら
れている。M0製のルツボ２内には石英ガラス原料粉３が
収容部４から連続的に落下できる。高周波加熱源５は炉
１の外周に位置しているが、この高周波加熱源５は矢印
で示すように上方向に移動可能である。高周波加熱源５
の軸方向長は、炉１の高さに比べて短かい。Embodiment FIG. 1 shows a manufacturing apparatus for carrying out the present invention. The inside of the furnace 1 of this manufacturing apparatus can be made vacuum. A crucible 2 is housed in the furnace 1.
In the upper part of the furnace 1, a storage part 4 for the raw material powder 3 of quartz glass is provided. Into the crucible 2 made of M 0 , the raw material powder 3 of quartz glass can be continuously dropped from the storage section 4. The high-frequency heating source 5 is located on the outer periphery of the furnace 1, and the high-frequency heating source 5 can move upward as indicated by an arrow. High frequency heating source 5
Is shorter than the height of the furnace 1.
この製造装置により次のように石英ガラスを製造す
る。Quartz glass is manufactured by this manufacturing apparatus as follows.
当初ルツボ２には石英ガラス原料粉３は収容されてお
らず、炉１内は真空となっている。高周波加熱源５はも
っとも下、すなわち、ルツボ２の下部に対応する位置に
ある。At first, the crucible 2 does not contain the quartz glass raw material powder 3, and the inside of the furnace 1 is evacuated. The high-frequency heating source 5 is located at the lowest position, that is, at a position corresponding to the lower part of the crucible 2.
高周波加熱源５を作動して炉１内のルツボ２の下部に
熱をかけて石英ガラス原料粉３を収容部４から所定量ず
つルツボ２内に落下させる。この石英ガラス原料粉３は
しだいにルツボ２内で堆積していくが、その堆積高さも
しくは堆積量に対応して高周波加熱源５も上昇してい
く。The high-frequency heating source 5 is operated to apply heat to the lower part of the crucible 2 in the furnace 1 so that the quartz glass raw material powder 3 is dropped into the crucible 2 by a predetermined amount from the storage part 4. The quartz glass raw material powder 3 gradually accumulates in the crucible 2, and the high-frequency heating source 5 also rises in accordance with the height or amount of the accumulation.
したがって石英ガラス原料粉３は堆積しながらその堆
積上部が高周波加熱源５の熱により溶融する。この際、
堆積高さに合せて局部的に加熱して溶融してゆくので、
気泡が消失しやすく、溶融石英６には気泡が残らない。Therefore, while the quartz glass raw material powder 3 is being deposited, the deposited upper portion is melted by the heat of the high frequency heating source 5. On this occasion,
Since it is locally heated and melted according to the pile height,
The bubbles are easily lost, and no bubbles remain in the fused quartz 6.
このようにして石英ガラス原料粉３から溶融石英６が
できる。これを冷やすことで石英ガラスを作る。Thus, fused quartz 6 is formed from quartz glass raw material powder 3. Cooling this produces quartz glass.
第２図はこの発明を実施するための別の製造装置を示
している。FIG. 2 shows another manufacturing apparatus for carrying out the present invention.
この製造装置の炉21内は真空状態にできるようになっ
ている。炉21内にはルツボ22が収容されている。ルツボ
22内には石英粉23が収容されている。ルツボ22と高周波
加熱源25は炉21に固定されている。M0製のルツボ22には
M0製の移動部材29が挿入されている。この移動部材29
は、石英ガラス原料粉23を支えて図示しない手段により
第２図の状態から下方に動かせるようになっている。The inside of the furnace 21 of this manufacturing apparatus can be made vacuum. A crucible 22 is housed in the furnace 21. Crucible
Quartz powder 23 is stored in 22. The crucible 22 and the high-frequency heating source 25 are fixed to the furnace 21. To M 0 crucible 22
M 0 made of the moving member 29 is inserted. This moving member 29
Is designed to support the quartz glass raw material powder 23 and to be moved downward from the state shown in FIG. 2 by means not shown.
この製造方法により次のようにして石英ガラスを製造
する。By this manufacturing method, quartz glass is manufactured as follows.
ルツボ22には所定量の石英ガラス原料粉23が入ってい
る。炉21内は真空である。高周波加熱源25を作動してル
ツボ22内の石英ガラス原料粉23に局所的に熱をかける。
移動部材29は所定の速度で下げて、石英ガラス原料粉23
の層の下側から徐々に上側加熱していく。The crucible 22 contains a predetermined amount of silica glass raw material powder 23. The inside of the furnace 21 is in a vacuum. The high-frequency heating source 25 is operated to locally apply heat to the quartz glass raw material powder 23 in the crucible 22.
The moving member 29 is lowered at a predetermined speed to
Is gradually heated from the lower side to the upper side.
このようにすると、気泡が溶融石英26から非溶融部分
に移って徐々に消失していき、できた石英ガラスには気
泡が残らない。In this way, bubbles move from the fused quartz 26 to the non-melted portion and gradually disappear, leaving no bubbles in the formed quartz glass.
上述の実施例では石英ガラス原料粉全体を１度に加熱
するのに比べて溶融スピードも早くできる。In the above-described embodiment, the melting speed can be increased as compared to heating the whole quartz glass raw material powder at one time.
ところでこの発明は上述した実施例に限定されるもの
ではない。The present invention is not limited to the embodiment described above.
たとえば第１図と第２図において、ルツボ2,22および
移動部材29は、M0の他にＷで作ってもよい。In Figure 1 and Figure 2 for example, a crucible 2, 22 and the moving member 29 may be made of addition to W of M 0.
また、第１図と第２図の炉1,21内は、真空のみでなく
H2ガスやHeガスなどのガスを単独あるいは混合して所定
圧力で流すようにしてもよい。H2ガスやHeガスは石英ガ
ラス中を拡散できるので石英ガラス体内に気泡が残りに
くい。さらに加熱源は高周波形のものに限らない。In addition, the insides of the furnaces 1 and 21 shown in FIGS.
A gas such as an H 2 gas or a He gas may be used alone or as a mixture and flow at a predetermined pressure. Since H 2 gas and He gas can diffuse in quartz glass, bubbles are less likely to remain in the quartz glass body. Further, the heating source is not limited to the high frequency type.
発明の効果 以上説明したように、この発明によれば、気泡をとり
除くことができる。したがって、石英ガラス体の品質を
向上することができる。Effect of the Invention As described above, according to the present invention, bubbles can be removed. Therefore, the quality of the quartz glass body can be improved.
石英ガラス原料粉全体を１度に加熱するのに比べて溶
融スピードも早くできる。The melting speed can be increased as compared to heating the whole quartz glass raw material powder at one time.
第１図は、本発明の方法を実施するための製造装置例を
示す図、第２図は別の製造装置の例を示す図である。 ２……ルツボ ３……石英ガラス原料粉 ５……高周波加熱源FIG. 1 is a view showing an example of a manufacturing apparatus for carrying out the method of the present invention, and FIG. 2 is a view showing an example of another manufacturing apparatus. 2 Crucible 3 Quartz glass raw material powder 5 High frequency heating source
───────────────────────────────────────────────────── フロントページの続き (72)発明者 斉藤 正行 山形県西置賜郡小国町大字小国町378番 地 東芝セラミックス株式会社小国製造 所内 (56)参考文献 特公 昭46−42914（ＪＰ，Ｂ１) ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Masayuki Saito 378 Oguni-machi, Oguni-machi, Oguni-machi, Nishiokitama-gun, Yamagata Pref.
Claims (4)
合ガス中のいずれかにおいて、ルツボ中の石英ガラス原
料粉をその下方から上方に順次局所的に加熱して溶融す
ることを特徴とする石英ガラスの製造方法。In a vacuum, H 2 gas, He gas, or a mixed gas of H 2 and He, quartz glass raw material powder in a crucible is locally heated sequentially from below to above in a crucible. A method for producing quartz glass, characterized by melting.
に落下させることによりルツボ中に供給することを特徴
とする特許請求の範囲第１項に記載の石英ガラスの製造
方法。2. The method for producing quartz glass according to claim 1, wherein the quartz glass raw material powder is supplied into the crucible by being dropped into the crucible during heating and melting.
熱源が下方から上方に移動することを特徴とする特許請
求の範囲第２項に記載の石英ガラスの製造方法。3. The method for producing quartz glass according to claim 2, wherein the heating source moves upward from below according to the deposition height of the raw material powder of quartz glass.
いる特許請求の範囲第１項に記載の石英ガラスの製造方
法。4. The method for producing quartz glass according to claim 1, wherein the quartz glass raw material powder is contained in a crucible.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62297417A JP2623265B2 (en) | 1987-11-27 | 1987-11-27 | Manufacturing method of quartz glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62297417A JP2623265B2 (en) | 1987-11-27 | 1987-11-27 | Manufacturing method of quartz glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01141824A JPH01141824A (en) | 1989-06-02 |
| JP2623265B2 true JP2623265B2 (en) | 1997-06-25 |
Family
ID=17846239
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62297417A Expired - Lifetime JP2623265B2 (en) | 1987-11-27 | 1987-11-27 | Manufacturing method of quartz glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2623265B2 (en) |
-
1987
- 1987-11-27 JP JP62297417A patent/JP2623265B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01141824A (en) | 1989-06-02 |
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