JP2616797B2 - Method of forming plasma polymerized film - Google Patents
Method of forming plasma polymerized filmInfo
- Publication number
- JP2616797B2 JP2616797B2 JP63055597A JP5559788A JP2616797B2 JP 2616797 B2 JP2616797 B2 JP 2616797B2 JP 63055597 A JP63055597 A JP 63055597A JP 5559788 A JP5559788 A JP 5559788A JP 2616797 B2 JP2616797 B2 JP 2616797B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- plasma
- polymerized film
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Description
【発明の詳細な説明】 (発明の目的) 産業上の利用分野 本発明は、プラズマを用いて基板上に水素あるいはフ
ッ素を含むアモルファス炭素膜をコーティングするプラ
ズマ重合膜の形成法に関する。The present invention relates to a method for forming a plasma polymerized film in which an amorphous carbon film containing hydrogen or fluorine is coated on a substrate by using plasma.
従来の技術 表面が親水性の基板に疎水性の膜を着膜する場合、そ
の基板と膜の接着力は必ずしも充分なものではない。2. Description of the Related Art When a hydrophobic film is deposited on a substrate having a hydrophilic surface, the adhesive force between the substrate and the film is not always sufficient.
このような場合、密着性を強化するために従来から基
板上にヘキサメチルジシラザンのような界面活性剤を塗
布することによって親水性の表面を疎水化したのち、疎
水性の膜を着膜する方法が用いられている。In such a case, a hydrophilic surface is hydrophobized by applying a surfactant such as hexamethyldisilazane on a substrate in order to enhance adhesion, and then a hydrophobic film is deposited. A method is used.
しかし、ヘキサメチルジシラザンのような界面活性剤
の使用は、OH基、NH3基、COOH基のような置換型水素を
持つ基板には優れた接着力の向上を示すが、このような
官能基を持たない基板、金属基板、セラミックス基板、
ガラス基板、等にはそれ程有効ではない。However, the use of surfactants such as hexamethyldisilazane shows excellent adhesion to substrates with substituted hydrogens such as OH, NH3, and COOH groups, but such functional groups Substrates, metal substrates, ceramic substrates,
It is not very effective for glass substrates and the like.
一方、炭化水素、フッ化炭素あるいはフッ化炭化水
素、あるいはこれらの混合物をプラズマ重合させた水素
あるいはフッ素を含むアモルファス炭素膜を基板上にコ
ーティングする方法では、この炭素膜が著しく疎水性の
ためどのような基板を用いても基板と膜の間の接着力は
非常に弱いものである。On the other hand, in the method of coating a hydrocarbon, fluorocarbon or fluorohydrocarbon, or an amorphous carbon film containing hydrogen or fluorine obtained by plasma polymerization of a mixture thereof onto a substrate, which for this carbon film is considerably hydrophobic Even when such a substrate is used, the adhesive force between the substrate and the film is very weak.
この場合、接着力の強化のためにヘキサメチルジシラ
ザンのような界面活性剤を用いても上記のような理由で
有効には作用しない。In this case, even if a surfactant such as hexamethyldisilazane is used to enhance the adhesive force, it does not work effectively for the reasons described above.
解決しようとする問題点 本発明は、基板上に炭化水素、フッ化炭素あるいはフ
ッ化炭化水素、あるいはこれらの混合物をプラズマ重合
させた水素あるいはフッ素を含むアモルファス炭素膜を
形成する場合、極めて基板との接着力の強いプラズマ重
合膜を形成する方法を提供しようとするものである。Problems to be Solved The present invention relates to a method for forming an amorphous carbon film containing hydrogen or fluorine obtained by plasma-polymerizing hydrocarbon, fluorocarbon or fluorohydrocarbon, or a mixture thereof on a substrate. It is an object of the present invention to provide a method for forming a plasma polymerized film having a strong adhesive force.
(発明の構成) 問題を解決するための手段 本発明は、基板上に上記のアモルファス炭素膜を形成
する場合、あらかじめ基板上にカルボキシル基を含む有
機化合物、あるいは、アミノ基あるいはイミノ基を含む
有機化合物をプラズマ重合させた膜(以下、下層膜とい
う)を形成したのち、アモルファス炭素膜(以下、上層
膜という)を形成することを特徴とする。(Means for Solving the Problems) The present invention provides a method for forming an amorphous carbon film on a substrate, the method comprising the steps of: forming an organic compound containing a carboxyl group or an organic compound containing an amino group or an imino group on the substrate in advance; A film is formed by plasma-polymerizing a compound (hereinafter, referred to as a lower film), and then an amorphous carbon film (hereinafter, referred to as an upper film) is formed.
このように下層膜を基板と上層膜の媒体とすることに
よって、著しくその接着強度を増大させることができ
る。By using the lower layer film as a medium between the substrate and the upper layer film, the adhesive strength can be remarkably increased.
カルボキシル基を含む有機化合物およびアミノ基ある
いはイミノ基を含む有機化合物には種類に特に制限はな
いが、好ましくは分子中に不飽和結合を有する化合物が
適している。The kind of the organic compound containing a carboxyl group and the organic compound containing an amino group or an imino group are not particularly limited, but a compound having an unsaturated bond in a molecule is preferable.
上層膜の原料には、メタン、エタン、プロパン、エチ
レン、ブチレン、プロピレン、アセチレン、ブタジエ
ン、イソプレン、ベンゼン、トルエンあるいはキシレン
のような炭化水素、あるいは四フツ化炭素、六フツ化二
炭素あるいは八フツ化四炭素のようなフツ化炭素、ある
いは一フツ化炭化水素(FH3C)、二フツ化炭化水素(F2
H2C)あるいは三フツ化炭化水素(F3HC)のようなフッ
化炭化水素等を用いることができる。Raw materials for the upper layer film include hydrocarbons such as methane, ethane, propane, ethylene, butylene, propylene, acetylene, butadiene, isoprene, benzene, toluene and xylene, or carbon tetrafluoride, carbon difluoride or octafluorocarbon Fluorinated carbon such as fluorinated tetracarbon, or monofluorinated hydrocarbon (FH3C), difluorinated hydrocarbon (F2
H2C) or a fluorinated hydrocarbon such as trifluorinated hydrocarbon (F3HC) can be used.
あるいはこれらの炭化水素、フッ化炭素あるいはフツ
化炭化水素等の混合物を用いてもよい。Alternatively, a mixture of these hydrocarbons, fluorocarbons, fluorinated hydrocarbons and the like may be used.
好ましくは分子中に不飽和結合を有する原料が重合反
応に適している。Preferably, a raw material having an unsaturated bond in the molecule is suitable for the polymerization reaction.
基板には金属、セラミックス、ガラス、樹脂等を用い
ることができる。For the substrate, metal, ceramics, glass, resin, or the like can be used.
以下、本発明の実施例を詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail.
実施例1 アルミニウム基板を密閉容器に入れ、流量10cc/minの
水素を流しながら200KHz、電力100Wの高周波でプラズマ
による表面処理を30秒間行なった。Example 1 An aluminum substrate was placed in an airtight container, and surface treatment was performed with plasma at a high frequency of 200 KHz and power of 100 W for 30 seconds while flowing hydrogen at a flow rate of 10 cc / min.
そののち、メタアクリル酸の蒸気を密閉容器内に導入
して200KHz、電力100Wの高周波で10秒間、メタアクリル
酸のプラズマ処理を行ない、基板上に下層膜を形成し
た。Thereafter, methacrylic acid vapor was introduced into the closed container, and plasma treatment of methacrylic acid was performed at a high frequency of 200 KHz and power of 100 W for 10 seconds to form a lower layer film on the substrate.
さらに、流量10cc/minのブタジェンと流量5cc/minの
水素との混合ガスをながしながら、200KHz、電力100Wの
高周波で5分間、ブタジェンのプラズマ処理を行ない基
板上に疎水性の上層膜を形成した。Further, while flowing a mixed gas of butadiene at a flow rate of 10 cc / min and hydrogen at a flow rate of 5 cc / min, a butadiene plasma treatment was performed at a high frequency of 200 KHz and power of 100 W for 5 minutes to form a hydrophobic upper layer film on the substrate. .
実施例2 クロム基板を密閉容器に入れ、流量10cc/minの水素を
流しながら200KHz、電力100Wの高周波でプラズマによる
表面処理を30秒間行なった。Example 2 A chromium substrate was placed in an airtight container, and surface treatment was performed with plasma at a high frequency of 200 kHz and a power of 100 W for 30 seconds while flowing hydrogen at a flow rate of 10 cc / min.
そののち、ビニルアミンの蒸気を密閉容器内に導入し
て200KHz、電力100Wの高周波で10秒間、ビニルアミンの
プラズマ処理を行ない基板上に下層膜を形成した。After that, vinylamine vapor was introduced into the closed container, and vinylamine plasma treatment was performed at a high frequency of 200 KHz and power of 100 W for 10 seconds to form a lower layer film on the substrate.
さらに、流量10cc/minのブタジェンと流量5cc/minの
水素との混合ガスを流しながら、200KHz、電力100Wの高
周波で5分間、ブタジェンのプラズマ処理を行ない基板
上に疎水性の上層膜を形成した。Further, while flowing a mixed gas of butadiene at a flow rate of 10 cc / min and hydrogen at a flow rate of 5 cc / min, a butadiene plasma treatment was performed at a high frequency of 200 KHz and a power of 100 W for 5 minutes to form a hydrophobic upper layer film on the substrate. .
以上の二つの実施例の方法で形成された疎水性の上層
膜は、アルミニウム基板あるいはクロム基板に直接に形
成されたブタジェンのプラズマ処理による重合膜に比較
し、基板との接着力が飛躍的に増大することがわかっ
た。The hydrophobic upper film formed by the method of the above two embodiments has a remarkable adhesive strength with the substrate as compared with a polymerized film formed by plasma treatment of butadiene directly formed on an aluminum substrate or a chromium substrate. It was found to increase.
(発明の効果) 本発明によれば、基板上に炭化水素、フッ化炭素ある
いはフッ化炭化水素あるいはこれらの混合物をプラズマ
重合させアモルファス炭素膜を形成する場合、中間層を
形成することによって基板と極めて接着強度の強い膜を
形成できる特徴がある。(Effects of the Invention) According to the present invention, when an amorphous carbon film is formed by plasma-polymerizing hydrocarbon, fluorocarbon, fluorocarbon or a mixture thereof on a substrate, an intermediate layer is formed to form an amorphous carbon film. There is a feature that a film having extremely strong adhesive strength can be formed.
本発明は実用的にはICのパッシベーション膜として有
効に利用できるが、その他、サビ止めとしての金属の疎
水化処理および膜厚を種々に変えることによって金属の
装飾用着色膜等にも利用できる特徴がある。Although the present invention can be effectively used as a passivation film for ICs, it can also be used as a rust-stopping metal hydrophobic treatment and variously changing the film thickness so that it can be used as a decorative color film for metal. There is.
Claims (1)
ッ化炭化水素、あるいはこれらの混合物をプラズマ重合
させた膜を形成する場合、基板とこの膜の中間層として
カルボキシル基を含む有機化合物、あるいは、アミノ基
あるいはイミノ基を含む有機化合物をプラズマ重合させ
た膜を形成することを特徴とするプラズマ重合膜の形成
法。When a film formed by plasma polymerization of hydrocarbon, fluorocarbon, fluorocarbon, or a mixture thereof is formed on a substrate, an organic compound containing a carboxyl group as an intermediate layer between the substrate and the film; Alternatively, a method for forming a plasma-polymerized film, comprising forming a film obtained by plasma-polymerizing an organic compound containing an amino group or an imino group.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63055597A JP2616797B2 (en) | 1988-03-09 | 1988-03-09 | Method of forming plasma polymerized film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63055597A JP2616797B2 (en) | 1988-03-09 | 1988-03-09 | Method of forming plasma polymerized film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01230777A JPH01230777A (en) | 1989-09-14 |
JP2616797B2 true JP2616797B2 (en) | 1997-06-04 |
Family
ID=13003181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63055597A Expired - Fee Related JP2616797B2 (en) | 1988-03-09 | 1988-03-09 | Method of forming plasma polymerized film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2616797B2 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5443455A (en) * | 1993-07-27 | 1995-08-22 | Target Therapeutics, Inc. | Guidewire and method of pretreating metal surfaces for subsequent polymer coating |
US6213604B1 (en) | 1999-05-20 | 2001-04-10 | Bausch & Lomb Incorporated | Plasma surface treatment of silicone hydrogel contact lenses with a flexible carbon coating |
US6630243B2 (en) * | 1999-05-20 | 2003-10-07 | Bausch & Lomb Incorporated | Surface treatment of silicone hydrogel contact lenses comprising hydrophilic polymer chains attached to an intermediate carbon coating |
US6200626B1 (en) * | 1999-05-20 | 2001-03-13 | Bausch & Lomb Incorporated | Surface-treatment of silicone medical devices comprising an intermediate carbon coating and graft polymerization |
EP1205302B1 (en) | 2000-05-22 | 2010-11-10 | Seiko Epson Corporation | Head member and ink repellence treating method |
DE10026477A1 (en) | 2000-05-27 | 2001-11-29 | Abb Patent Gmbh | Protective cover for metallic components |
PL2623215T3 (en) * | 2012-02-01 | 2014-09-30 | Bioenergy Capital Ag | Hydrophilic plasma coating |
CN107587120B (en) * | 2017-08-23 | 2018-12-18 | 江苏菲沃泰纳米科技有限公司 | A kind of preparation method of the high insulating nano protective coating with modulated structure |
CN113413932B (en) * | 2021-06-29 | 2023-03-14 | 郑州大学 | Hydrophobic modification method of microfluidic chip material |
-
1988
- 1988-03-09 JP JP63055597A patent/JP2616797B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH01230777A (en) | 1989-09-14 |
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Legal Events
Date | Code | Title | Description |
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Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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