JP2603765Y2 - Electron beam irradiation device - Google Patents

Description

[Detailed description of the invention]

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam irradiating apparatus for irradiating an object to be processed with a curtain-shaped electron beam, and more particularly to an improvement of a reflector for reflecting an electron beam.

[0002]

2. Description of the Related Art FIG. 3 is a schematic front view of a conventional electron beam irradiation apparatus, and FIG. 4 is a schematic cross-sectional view of the conventional electron beam irradiation apparatus in a direction perpendicular to the direction in which a workpiece is transported. The electron beam irradiation device includes a terminal 2 inside a cylindrical electron beam generator 21.
2. A gun structure 23 and a filament 24 are arranged, and the thermoelectrons 25 emitted from the filament are accelerated by heating the filament 24 by passing an electric current to generate a curtain-shaped electron beam. Further, the inside of the electron generating section 21 is kept in a vacuum by a diffusion pump or the like in order to prevent electrons from colliding with gas molecules and losing energy. The irradiation window 27 has a window foil made of a metal foil, and the electron beam generator 21 and the irradiation space 26 are partitioned by the window foil, and the object to be processed 29 is irradiated with an electron beam penetrating the window foil.

[0003]

In the conventional electron beam irradiation apparatus, as shown in FIG. 4, the surface of the object 29 to be irradiated with the electron beam has only one surface from the upper side. The width of the window is wider than the width of the workpiece so that the electron beam is uniformly irradiated on the workpiece, and the electron beam passing through both ends of the window is irradiated on the workpiece. Instead, the beam reaches the beam damper 29. Since the beam current of the electron beam irradiation device is also used, the irradiation efficiency is low. Further, since irradiation is performed only on one surface of the object to be processed, there is a problem that if the ink is to be cured on the side of a thick object to be processed, for example, woodwork, the side cannot be irradiated.

The present invention has been made based on the above-mentioned circumstances, and has a simple structure which has a high electron beam irradiation efficiency and easily irradiates the side surface of a thick workpiece such as woodwork. It is an object of the present invention to provide an electron beam irradiation device capable of performing the following.

[0005]

In order to achieve the above object, an electron beam irradiation apparatus according to the present invention comprises an electron beam generating section having a filament held in a terminal, and a window formed on a lower surface of the electron beam generating section. An irradiation window portion made of foil, and a transfer chamber having a beam damper through which the workpiece is transported, configured to irradiate the electron beam vertically to a thick workpiece to be moved in the transport chamber, A pair of reflectors are arranged at both ends in the longitudinal direction of the window that is perpendicular to the transport direction in the transport chamber, and the reflectors reflect electron beams passing through both ends of the workpiece. Features. Further, the shape of the pair of reflectors is elliptical, semicircular or planar.

[0006]

According to the present invention, the electron beams at both ends of the irradiation window can be reflected inward by the reflection plate by the above-mentioned structure, and almost the entire amount of electron beams can be irradiated to the object. Further, the electron beam can be efficiently reflected by a reflection plate made of lead or the like having a high atomic number or an elliptical reflection plate. Furthermore, the reflecting plate can be made movable according to the shape, dimensions, and the like of the irradiation object.

[0007]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic cross-sectional view of an electron beam irradiation apparatus according to an embodiment of the present invention, as viewed from a direction perpendicular to a conveying direction of an object to be processed. In the figure, reference numeral 1 denotes a cylindrical electron beam generating unit, in which a terminal 2 for generating an electron beam is disposed, and the terminal 2 supports a filament 3 as a linear cathode for emitting thermoelectrons and a filament 3. Consisting of a gun structure 4.
The inside of the electron beam generator 1 is maintained at a vacuum of 10 ^-6 to 10 ^-7 Torr in order to prevent the electron beam 5 generated at the terminal 2 from colliding with gas molecules and losing energy. I have. In the drawing, reference numeral 6 denotes a transfer chamber, which is an object 7 to be moved by a conveyor or the like in the direction of the magazine surface of the drawing (perpendicular to the transfer direction)
Is transported. The irradiation window 8 has a window foil 9 made of a metal foil. The window foil separates the vacuum atmosphere in the electron beam generator 1 from the irradiation space 10 and extracts the electron beam 5 to the irradiation space through the window foil.

The window foil 9 is mainly made of a titanium foil having mechanical strength enough to maintain a vacuum atmosphere in the electron beam generating section 1 and having excellent heat resistance. Further, at both ends of the irradiation window 8 in the irradiation space 10, elliptical reflectors 11 are provided. Then, the electron beam that has passed through the window foil 9 is first irradiated onto the upper surface of the processing object 7, and the electron beams at both ends of the irradiation window portion 8, which are deviated from the processing object, are reflected inward by the reflection plate 11, and The side of the object 7 can be irradiated. Reference numeral 12 denotes a beam damper having a cooling mechanism.

In the above embodiment, the reflecting plate is elliptical, but may be semicircular. Also, as shown in FIG. 2, by using a flat reflecting plate 13 and using an angle adjusting bracket 14,
The angle of the reflecting plate is adjusted according to the width of the object to be processed and the like, and the reflecting plate is movable. The reflector is made of a material having a large atomic number, such as lead, in order to efficiently reflect electrons.

[0010]

As described above, in the present invention, the reflectors are provided at both ends of the irradiation space in the direction perpendicular to the transport direction of the object to be processed, so that the beam is displayed as the beam current of the electron beam irradiation apparatus. Actually, the electrons at both ends of the window portion which are absorbed by the beam damper without being irradiated to the object to be processed can be reflected and irradiated, so that the electron beam irradiation efficiency is high.
In addition, there is an advantage that a side surface of a thick workpiece can be processed in the same process.

[Brief description of the drawings]

FIG. 1 is a schematic side view of an electron beam irradiation apparatus according to an embodiment of the present invention in a direction perpendicular to a transport direction.

FIG. 2 is a schematic side view showing another embodiment.

FIG. 3 is a schematic front view of a conventional electron beam irradiation apparatus.

FIG. 4 is a schematic cross-sectional view of the electron beam irradiation apparatus in a direction perpendicular to the transport direction.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Electron beam generation part 9 Window foil 2 Terminal 10 Irradiation space 3 Filament 11 Reflector 4 Gun structure 12 Beam damper 5 Electron beam 13 Reflector 6 Transfer chamber 14 Angle adjustment fitting 7 Processing object 8 Irradiation window

Claims (2)

(57) [Scope of request for utility model registration] 1. A transfer chamber having an electron beam generating portion holding a filament in a terminal, an irradiation window portion formed of a window foil formed on a lower surface of the electron beam generating portion, and a beam damper for transferring an object to be processed. In an electron beam irradiation apparatus configured to vertically irradiate the electron beam to a thick workpiece to be moved in the transfer chamber, a longitudinal direction of a window portion that is perpendicular to a transfer direction in the transfer chamber. An electron beam irradiation apparatus in which a pair of reflectors are arranged at both ends of the object, and the reflectors reflect electron beams passing through both ends of the object to be processed. 2. The electron beam irradiation apparatus according to claim 1, wherein said pair of reflectors have an elliptical shape, a semicircular shape, or a planar shape.