JP2568883C - - Google Patents
Info
Publication number
JP2568883C
JP2568883C
JP2568883C
JP 2568883 C
JP2568883 C
JP 2568883C
JP 2568883 C
JP2568883 C
JP 2568883C
Authority
JP
Japan
Prior art keywords
novolak resin
resin
alkali
resist
present
Prior art date
1998-10-30
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
Other languages
English (en )
Japanese (ja )
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Publication date
1998-10-30
Links
229920005989
resin
Polymers
0.000
claims
description
61
239000011347
resin
Substances
0.000
claims
description
61
229920003986
novolac
Polymers
0.000
claims
description
47
239000000203
mixture
Substances
0.000
claims
description
30
229920002120
photoresistant polymer
Polymers
0.000
claims
description
22
-1
quinonediazide compound
Chemical class
0.000
claims
description
19
239000000539
dimer
Substances
0.000
claims
description
17
XLYOFNOQVPJJNP-UHFFFAOYSA-N
water
Substances
O
XLYOFNOQVPJJNP-UHFFFAOYSA-N
0.000
claims
description
10
150000001875
compounds
Chemical class
0.000
claims
description
9
239000002798
polar solvent
Substances
0.000
claims
description
7
125000003118
aryl group
Chemical group
0.000
claims
description
5
150000002148
esters
Chemical class
0.000
claims
description
5
239000002253
acid
Substances
0.000
claims
description
4
125000002887
hydroxy group
Chemical group
[H]O*
0.000
claims
description
4
239000011342
resin composition
Substances
0.000
claims
description
3
230000001376
precipitating
Effects
0.000
claims
1
238000005292
vacuum distillation
Methods
0.000
claims
1
MUBZPKHOEPUJKR-UHFFFAOYSA-N
oxalic acid
Chemical compound
OC(=O)C(O)=O
MUBZPKHOEPUJKR-UHFFFAOYSA-N
0.000
description
24
WSFSSNUMVMOOMR-UHFFFAOYSA-N
formaldehyde
Chemical compound
O=C
WSFSSNUMVMOOMR-UHFFFAOYSA-N
0.000
description
14
230000000052
comparative effect
Effects
0.000
description
13
239000000463
material
Substances
0.000
description
13
IWDCLRJOBJJRNH-UHFFFAOYSA-N
P-Cresol
Chemical compound
CC1=CC=C(O)C=C1
IWDCLRJOBJJRNH-UHFFFAOYSA-N
0.000
description
10
230000035945
sensitivity
Effects
0.000
description
10
239000007864
aqueous solution
Substances
0.000
description
8
239000000178
monomer
Substances
0.000
description
8
235000006408
oxalic acid
Nutrition
0.000
description
8
230000000694
effects
Effects
0.000
description
7
239000000758
substrate
Substances
0.000
description
7
SVONRAPFKPVNKG-UHFFFAOYSA-N
2-ethoxyethyl acetate
Chemical compound
CCOCCOC(C)=O
SVONRAPFKPVNKG-UHFFFAOYSA-N
0.000
description
6
239000004793
Polystyrene
Substances
0.000
description
6
CSCPPACGZOOCGX-UHFFFAOYSA-N
acetone
Chemical compound
CC(C)=O
CSCPPACGZOOCGX-UHFFFAOYSA-N
0.000
description
6
238000004519
manufacturing process
Methods
0.000
description
6
OKKJLVBELUTLKV-UHFFFAOYSA-N
methanol
Chemical compound
OC
OKKJLVBELUTLKV-UHFFFAOYSA-N
0.000
description
6
229920002223
polystyrene
Polymers
0.000
description
6
230000002194
synthesizing
Effects
0.000
description
6
230000004304
visual acuity
Effects
0.000
description
6
ISWSIDIOOBJBQZ-UHFFFAOYSA-N
Phenol
Natural products
OC1=CC=CC=C1
ISWSIDIOOBJBQZ-UHFFFAOYSA-N
0.000
description
5
XUIMIQQOPSSXEZ-UHFFFAOYSA-N
silicon
Chemical compound
[Si]
XUIMIQQOPSSXEZ-UHFFFAOYSA-N
0.000
description
5
229910052710
silicon
Inorganic materials
0.000
description
5
239000010703
silicon
Substances
0.000
description
5
239000002904
solvent
Substances
0.000
description
5
ZWEHNKRNPOVVGH-UHFFFAOYSA-N
2-butanone
Chemical compound
CCC(C)=O
ZWEHNKRNPOVVGH-UHFFFAOYSA-N
0.000
description
4
VEXZGXHMUGYJMC-UHFFFAOYSA-N
HCl
Chemical compound
Cl
VEXZGXHMUGYJMC-UHFFFAOYSA-N
0.000
description
4
RLSSMJSEOOYNOY-UHFFFAOYSA-N
M-Cresol
Chemical compound
CC1=CC=CC(O)=C1
RLSSMJSEOOYNOY-UHFFFAOYSA-N
0.000
description
4
GHMLBKRAJCXXBS-UHFFFAOYSA-N
Resorcinol
Chemical compound
OC1=CC=CC(O)=C1
GHMLBKRAJCXXBS-UHFFFAOYSA-N
0.000
description
4
WGTYBPLFGIVFAS-UHFFFAOYSA-M
Tetramethylammonium hydroxide
Chemical compound
[OH-].C[N+](C)(C)C
WGTYBPLFGIVFAS-UHFFFAOYSA-M
0.000
description
4
230000015572
biosynthetic process
Effects
0.000
description
4
238000006243
chemical reaction
Methods
0.000
description
4
239000000975
dye
Substances
0.000
description
4
LFQSCWFLJHTTHZ-UHFFFAOYSA-N
ethanol
Chemical compound
CCO
LFQSCWFLJHTTHZ-UHFFFAOYSA-N
0.000
description
4
150000002989
phenols
Chemical class
0.000
description
4
239000004065
semiconductor
Substances
0.000
description
4
238000003756
stirring
Methods
0.000
description
4
238000003786
synthesis reaction
Methods
0.000
description
4
WYURNTSHIVDZCO-UHFFFAOYSA-N
tetrahydrofuran
Chemical compound
C1CCOC1
WYURNTSHIVDZCO-UHFFFAOYSA-N
0.000
description
4
ZMANZCXQSJIPKH-UHFFFAOYSA-N
triethylamine
Chemical compound
CCN(CC)CC
ZMANZCXQSJIPKH-UHFFFAOYSA-N
0.000
description
4
ZRDYULMDEGRWRC-UHFFFAOYSA-N
(4-hydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone
Chemical compound
C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C(O)=C1O
ZRDYULMDEGRWRC-UHFFFAOYSA-N
0.000
description
3
QTBSBXVTEAMEQO-UHFFFAOYSA-N
acetic acid
Chemical compound
CC(O)=O
QTBSBXVTEAMEQO-UHFFFAOYSA-N
0.000
description
3
239000003513
alkali
Substances
0.000
description
3
239000003795
chemical substances by application
Substances
0.000
description
3
238000005530
etching
Methods
0.000
description
3
BDAGIHXWWSANSR-UHFFFAOYSA-N
formic acid
Chemical compound
OC=O
BDAGIHXWWSANSR-UHFFFAOYSA-N
0.000
description
3
238000005227
gel permeation chromatography
Methods
0.000
description
3
KWYUFKZDYYNOTN-UHFFFAOYSA-M
potassium hydroxide
Chemical compound
[OH-].[K+]
KWYUFKZDYYNOTN-UHFFFAOYSA-M
0.000
description
3
VYPSYNLAJGMNEJ-UHFFFAOYSA-N
silicium dioxide
Chemical compound
O=[Si]=O
VYPSYNLAJGMNEJ-UHFFFAOYSA-N
0.000
description
3
HEMHJVSKTPXQMS-UHFFFAOYSA-M
sodium hydroxide
Chemical compound
[OH-].[Na+]
HEMHJVSKTPXQMS-UHFFFAOYSA-M
0.000
description
3
239000004094
surface-active agent
Substances
0.000
description
3
RYHBNJHYFVUHQT-UHFFFAOYSA-N
1,4-dioxane
Chemical compound
C1COCCO1
RYHBNJHYFVUHQT-UHFFFAOYSA-N
0.000
description
2
ZNQVEEAIQZEUHB-UHFFFAOYSA-N
2-Ethoxyethanol
Chemical compound
CCOCCO
ZNQVEEAIQZEUHB-UHFFFAOYSA-N
0.000
description
2
DKPFZGUDAPQIHT-UHFFFAOYSA-N
Butyl acetate
Natural products
CCCCOC(C)=O
DKPFZGUDAPQIHT-UHFFFAOYSA-N
0.000
description
2
ZMXDDKWLCZADIW-UHFFFAOYSA-N
N,N-dimethylformamide
Chemical compound
CN(C)C=O
ZMXDDKWLCZADIW-UHFFFAOYSA-N
0.000
description
2
239000004115
Sodium Silicate
Substances
0.000
description
2
NTHWMYGWWRZVTN-UHFFFAOYSA-N
Sodium silicate
Chemical compound
[Na+].[Na+].[O-][Si]([O-])=O
NTHWMYGWWRZVTN-UHFFFAOYSA-N
0.000
description
2
QIQXTHQIDYTFRH-UHFFFAOYSA-N
Stearic acid
Chemical compound
CCCCCCCCCCCCCCCCCC(O)=O
QIQXTHQIDYTFRH-UHFFFAOYSA-N
0.000
description
2
QAOWNCQODCNURD-UHFFFAOYSA-N
Sulfuric acid
Chemical compound
OS(O)(=O)=O
QAOWNCQODCNURD-UHFFFAOYSA-N
0.000
description
2
IKHGUXGNUITLKF-UHFFFAOYSA-N
acetaldehyde
Chemical compound
CC=O
IKHGUXGNUITLKF-UHFFFAOYSA-N
0.000
description
2
230000002378
acidificating
Effects
0.000
description
2
150000001299
aldehydes
Chemical class
0.000
description
2
150000001335
aliphatic alkanes
Chemical class
0.000
description
2
150000001491
aromatic compounds
Chemical class
0.000
description
2
239000003054
catalyst
Substances
0.000
description
2
230000002950
deficient
Effects
0.000
description
2
238000004090
dissolution
Methods
0.000
description
2
238000004821
distillation
Methods
0.000
description
2
238000001312
dry etching
Methods
0.000
description
2
230000002708
enhancing
Effects
0.000
description
2
150000002576
ketones
Chemical class
0.000
description
2
VNWKTOKETHGBQD-UHFFFAOYSA-N
methane
Chemical compound
C
VNWKTOKETHGBQD-UHFFFAOYSA-N
0.000
description
2
238000001393
microlithography
Methods
0.000
description
2
229920002866
paraformaldehyde
Polymers
0.000
description
2
239000004014
plasticizer
Substances
0.000
description
2
CDBYLPFSWZWCQE-UHFFFAOYSA-L
sodium carbonate
Chemical compound
[Na+].[Na+].[O-]C([O-])=O
CDBYLPFSWZWCQE-UHFFFAOYSA-L
0.000
description
2
229910052911
sodium silicate
Inorganic materials
0.000
description
2
UYBDKTYLTZZVEB-UHFFFAOYSA-N
(2,3,4,5,6-pentahydroxyphenyl)-phenylmethanone
Chemical class
OC1=C(O)C(O)=C(O)C(O)=C1C(=O)C1=CC=CC=C1
UYBDKTYLTZZVEB-UHFFFAOYSA-N
0.000
description
1
XEDWWPGWIXPVRQ-UHFFFAOYSA-N
(2,3,4-trihydroxyphenyl)-(3,4,5-trihydroxyphenyl)methanone
Chemical compound
OC1=C(O)C(O)=CC=C1C(=O)C1=CC(O)=C(O)C(O)=C1
XEDWWPGWIXPVRQ-UHFFFAOYSA-N
0.000
description
1
QWRVAXMLZCMVSL-UHFFFAOYSA-N
(2,4,6-trihydroxyphenyl)-(3,4,5-trihydroxyphenyl)methanone
Chemical compound
OC1=CC(O)=CC(O)=C1C(=O)C1=CC(O)=C(O)C(O)=C1
QWRVAXMLZCMVSL-UHFFFAOYSA-N
0.000
description
1
NFNNWCSMHFTEQD-UHFFFAOYSA-N
(2-hydroxyphenyl)-(2,3,4,5,6-pentahydroxyphenyl)methanone
Chemical class
OC1=CC=CC=C1C(=O)C1=C(O)C(O)=C(O)C(O)=C1O
NFNNWCSMHFTEQD-UHFFFAOYSA-N
0.000
description
1
XPJSWQIGULIVBS-UHFFFAOYSA-N
1,3-bis(2,3,4-trihydroxyphenyl)propane-1,3-dione
Chemical compound
OC1=C(O)C(O)=CC=C1C(=O)CC(=O)C1=CC=C(O)C(O)=C1O
XPJSWQIGULIVBS-UHFFFAOYSA-N
0.000
description
1
KJCVRFUGPWSIIH-UHFFFAOYSA-N
1-Naphthol
Chemical compound
C1=CC=C2C(O)=CC=CC2=C1
KJCVRFUGPWSIIH-UHFFFAOYSA-N
0.000
description
1
QWBBPBRQALCEIZ-UHFFFAOYSA-N
2,3-Dimethylphenol
Chemical compound
CC1=CC=CC(O)=C1C
QWBBPBRQALCEIZ-UHFFFAOYSA-N
0.000
description
1
NKTOLZVEWDHZMU-UHFFFAOYSA-N
2,5-dimethylphenol
Chemical compound
CC1=CC=C(C)C(O)=C1
NKTOLZVEWDHZMU-UHFFFAOYSA-N
0.000
description
1
KUXGUCNZFCVULO-UHFFFAOYSA-N
2-(4-nonylphenoxy)ethanol
Chemical compound
CCCCCCCCCC1=CC=C(OCCO)C=C1
KUXGUCNZFCVULO-UHFFFAOYSA-N
0.000
description
1
ISPYQTSUDJAMAB-UHFFFAOYSA-N
2-Chlorophenol
Chemical compound
OC1=CC=CC=C1Cl
ISPYQTSUDJAMAB-UHFFFAOYSA-N
0.000
description
1
LBCZOTMMGHGTPH-UHFFFAOYSA-N
2-[2-[4-(2,4,4-trimethylpentan-2-yl)phenoxy]ethoxy]ethanol
Chemical compound
CC(C)(C)CC(C)(C)C1=CC=C(OCCOCCO)C=C1
LBCZOTMMGHGTPH-UHFFFAOYSA-N
0.000
description
1
XLLIQLLCWZCATF-UHFFFAOYSA-N
2-methoxyethyl acetate
Chemical compound
COCCOC(C)=O
XLLIQLLCWZCATF-UHFFFAOYSA-N
0.000
description
1
LFSAPCRASZRSKS-UHFFFAOYSA-N
2-methylcyclohexan-1-one
Chemical compound
CC1CCCCC1=O
LFSAPCRASZRSKS-UHFFFAOYSA-N
0.000
description
1
LFMCTLLZHYCABW-UHFFFAOYSA-N
3,3,3',3'-tetramethyl-1,1'-spirobi[2H-indene]-4,4',5,5',6,6'-hexol
Chemical compound
C12=CC(O)=C(O)C(O)=C2C(C)(C)CC11C(C=C(O)C(O)=C2O)=C2C(C)(C)C1
LFMCTLLZHYCABW-UHFFFAOYSA-N
0.000
description
1
HORNXRXVQWOLPJ-UHFFFAOYSA-N
3-Chlorophenol
Chemical compound
OC1=CC=CC(Cl)=C1
HORNXRXVQWOLPJ-UHFFFAOYSA-N
0.000
description
1
ZRYCRPNCXLQHPN-UHFFFAOYSA-N
3-hydroxy-2-methylbenzaldehyde
Chemical compound
CC1=C(O)C=CC=C1C=O
ZRYCRPNCXLQHPN-UHFFFAOYSA-N
0.000
description
1
HXDOZKJGKXYMEW-UHFFFAOYSA-N
4-Ethylphenol
Chemical compound
CCC1=CC=C(O)C=C1
HXDOZKJGKXYMEW-UHFFFAOYSA-N
0.000
description
1
NBLFJUWXERDUEN-UHFFFAOYSA-N
4-[(2,3,4-trihydroxyphenyl)methyl]benzene-1,2,3-triol
Chemical class
OC1=C(O)C(O)=CC=C1CC1=CC=C(O)C(O)=C1O
NBLFJUWXERDUEN-UHFFFAOYSA-N
0.000
description
1
WXNZTHHGJRFXKQ-UHFFFAOYSA-N
4-chlorophenol
Chemical compound
OC1=CC=C(Cl)C=C1
WXNZTHHGJRFXKQ-UHFFFAOYSA-N
0.000
description
1
FCQATSRLMJRCKX-UHFFFAOYSA-N
6-phenylbenzene-1,2,3,4,5-pentol
Chemical class
OC1=C(O)C(O)=C(O)C(O)=C1C1=CC=CC=C1
FCQATSRLMJRCKX-UHFFFAOYSA-N
0.000
description
1
229920000180
Alkyd
Polymers
0.000
description
1
FFUAGWLWBBFQJT-UHFFFAOYSA-N
Bis(trimethylsilyl)amine
Chemical compound
C[Si](C)(C)N[Si](C)(C)C
FFUAGWLWBBFQJT-UHFFFAOYSA-N
0.000
description
1
FXHOOIRPVKKKFG-UHFFFAOYSA-N
DMA
Chemical compound
CN(C)C(C)=O
FXHOOIRPVKKKFG-UHFFFAOYSA-N
0.000
description
1
229960002887
Deanol
Drugs
0.000
description
1
JQVDAXLFBXTEQA-UHFFFAOYSA-N
Dibutylamine
Chemical compound
CCCCNCCCC
JQVDAXLFBXTEQA-UHFFFAOYSA-N
0.000
description
1
HPNMFZURTQLUMO-UHFFFAOYSA-N
Diethylamine
Chemical compound
CCNCC
HPNMFZURTQLUMO-UHFFFAOYSA-N
0.000
description
1
PHDPNHJFOMABOA-UHFFFAOYSA-N
Difucol
Chemical compound
OC1=CC(O)=CC(O)=C1C1=C(O)C=C(O)C=C1O
PHDPNHJFOMABOA-UHFFFAOYSA-N
0.000
description
1
LZCLXQDLBQLTDK-UHFFFAOYSA-N
Ethyl lactate
Chemical compound
CCOC(=O)C(C)O
LZCLXQDLBQLTDK-UHFFFAOYSA-N
0.000
description
1
HYBBIBNJHNGZAN-UHFFFAOYSA-N
Furfural
Chemical compound
O=CC1=CC=CO1
HYBBIBNJHNGZAN-UHFFFAOYSA-N
0.000
description
1
229940107698
Malachite green
Drugs
0.000
description
1
JFTBTTPUYRGXDG-UHFFFAOYSA-N
Methyl violet
Chemical compound
Cl.C1=CC(=NC)C=CC1=C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1
JFTBTTPUYRGXDG-UHFFFAOYSA-N
0.000
description
1
UEEJHVSXFDXPFK-UHFFFAOYSA-N
N-dimethylaminoethanol
Chemical compound
CN(C)CCO
UEEJHVSXFDXPFK-UHFFFAOYSA-N
0.000
description
1
GNVRJGIVDSQCOP-UHFFFAOYSA-N
N-ethyl-N-methylethanamine
Chemical compound
CCN(C)CC
GNVRJGIVDSQCOP-UHFFFAOYSA-N
0.000
description
1
QWVGKYWNOKOFNN-UHFFFAOYSA-N
O-Cresol
Chemical compound
CC1=CC=CC=C1O
QWVGKYWNOKOFNN-UHFFFAOYSA-N
0.000
description
1
MBCILLZHWZPDGW-UHFFFAOYSA-N
OC1=C(C(=C(C(=C1C(C1=CC=CC=C1)C1=CC=CC=C1)O)O)O)O
Chemical class
OC1=C(C(=C(C(=C1C(C1=CC=CC=C1)C1=CC=CC=C1)O)O)O)O
MBCILLZHWZPDGW-UHFFFAOYSA-N
0.000
description
1
NFQBXNQMQQQPHD-UHFFFAOYSA-N
OC1C(C(C(C=C1)(C(C1=CC=CC=C1)C1=CC=CC=C1)O)(O)O)(O)O
Chemical class
OC1C(C(C(C=C1)(C(C1=CC=CC=C1)C1=CC=CC=C1)O)(O)O)(O)O
NFQBXNQMQQQPHD-UHFFFAOYSA-N
0.000
description
1
QCDYQQDYXPDABM-UHFFFAOYSA-N
Phloroglucinol
Chemical compound
OC1=CC(O)=CC(O)=C1
QCDYQQDYXPDABM-UHFFFAOYSA-N
0.000
description
1
229960001553
Phloroglucinol
Drugs
0.000
description
1
WGYKZJWCGVVSQN-UHFFFAOYSA-N
Propylamine
Chemical compound
CCCN
WGYKZJWCGVVSQN-UHFFFAOYSA-N
0.000
description
1
REFJWTPEDVJJIY-UHFFFAOYSA-N
Quercetin
Chemical compound
C=1C(O)=CC(O)=C(C(C=2O)=O)C=1OC=2C1=CC=C(O)C(O)=C1
REFJWTPEDVJJIY-UHFFFAOYSA-N
0.000
description
1
229960001285
Quercetin
Drugs
0.000
description
1
IKGXIBQEEMLURG-BKUODXTLSA-N
Rutin
Chemical compound
O[C@H]1[C@H](O)[C@@H](O)[C@H](C)O[C@@H]1OC[C@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](OC=2C(C3=C(O)C=C(O)C=C3OC=2C=2C=C(O)C(O)=CC=2)=O)O1
IKGXIBQEEMLURG-BKUODXTLSA-N
0.000
description
1
229940081967
Rutin
Drugs
0.000
description
1
235000021355
Stearic acid
Nutrition
0.000
description
1
LSNNMFCWUKXFEE-UHFFFAOYSA-L
Sulphite
Chemical compound
[O-]S([O-])=O
LSNNMFCWUKXFEE-UHFFFAOYSA-L
0.000
description
1
GSEJCLTVZPLZKY-UHFFFAOYSA-N
Tris
Chemical compound
OCCN(CCO)CCO
GSEJCLTVZPLZKY-UHFFFAOYSA-N
0.000
description
1
QZKPXGFHHIFFTQ-UHFFFAOYSA-N
[2-(2,3,4-trihydroxybenzoyl)phenyl]-(2,3,4-trihydroxyphenyl)methanone
Chemical compound
OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1C(=O)C1=CC=C(O)C(O)=C1O
QZKPXGFHHIFFTQ-UHFFFAOYSA-N
0.000
description
1
RISQRMSSRWWBNR-UHFFFAOYSA-N
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Chemical compound
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Nutrition
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Methods
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Substances
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ammonium hydroxide
Chemical compound
[NH4+].[OH-]
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benzenes
Chemical class
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Substances
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butyl acetate
Drugs
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ceramic
Substances
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chloromethylsilane
Chemical compound
[SiH3]CCl
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Substances
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Methods
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Methods
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Methods
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Methods
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dietary fatty acids
Nutrition
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1
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dimethoxyethane
Chemical compound
COCCOC
XTHFKEDIFFGKHM-UHFFFAOYSA-N
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dimethylsulphoxide
Chemical compound
CS(C)=O
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electron beam technology
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Chemical class
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ethyl amine
Chemical compound
CCN
QUSNBJAOOMFDIB-UHFFFAOYSA-N
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229940116333
ethyl lactate
Drugs
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ethylene glycol monomethyl ether
Chemical compound
COCCO
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formic acid
Nutrition
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general anesthetics Halogenated hydrocarbons
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Chemical group
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liquid crystal related substance
Substances
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malachite green cation
Chemical compound
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Substances
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Methods
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Chemical compound
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methyl lactate
Drugs
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n-methylpyrrolidone
Chemical compound
CN1CCCC1=O
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description
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naphthalene-1,4-dione;diazide
Chemical compound
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nitrogen atmosphere
Substances
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phenolic resin
Substances
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phenoxy group
Chemical group
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phenyl-(2,3,4-trihydroxyphenyl)methanone
Chemical compound
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photosensitizing agent
Substances
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piperidine
Chemical compound
C1CCNCC1
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precipitate
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primary amines
Chemical class
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pyrrole
Chemical compound
C=1C=CNC=1
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quaternary ammonium salts
Chemical class
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quercetin
Nutrition
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quercetin
Natural products
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Natural products
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rutin
Nutrition
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rutoside
Drugs
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secondary amines
Chemical class
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silicon dioxide
Substances
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silicon dioxide
Nutrition
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silicon oxide
Inorganic materials
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sodium carbonate
Substances
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sodium carbonate
Inorganic materials
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1
235000019795
sodium metasilicate
Nutrition
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solution
Substances
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spin coating
Methods
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stearic acid
Substances
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substance
Substances
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surface layer
Substances
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swelling
Effects
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synchrotron radiation
Effects
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tertiary amines
Chemical class
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description
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229940073455
tetraethylammonium hydroxide
Drugs
0.000
description
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LRGJRHZIDJQFCL-UHFFFAOYSA-M
tetraethylazanium;hydroxide
Chemical compound
[OH-].CC[N+](CC)(CC)CC
LRGJRHZIDJQFCL-UHFFFAOYSA-M
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trichloroethylene
Drugs
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triclene
Chemical group
ClC=C(Cl)Cl
XSTXAVWGXDQKEL-UHFFFAOYSA-N
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wet etching
Methods
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