JP2553736B2 - Optical recording medium and method of manufacturing optical recording medium - Google Patents

Optical recording medium and method of manufacturing optical recording medium

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Publication number
JP2553736B2
JP2553736B2 JP2113380A JP11338090A JP2553736B2 JP 2553736 B2 JP2553736 B2 JP 2553736B2 JP 2113380 A JP2113380 A JP 2113380A JP 11338090 A JP11338090 A JP 11338090A JP 2553736 B2 JP2553736 B2 JP 2553736B2
Authority
JP
Japan
Prior art keywords
recording medium
layer
optical recording
recording
gete
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2113380A
Other languages
Japanese (ja)
Other versions
JPH0410979A (en
Inventor
惠昭 古川
正美 内田
威夫 太田
一己 ▲吉▼岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2113380A priority Critical patent/JP2553736B2/en
Priority to US07/559,166 priority patent/US5194363A/en
Priority to US07/573,246 priority patent/US5230973A/en
Priority to KR1019910006821A priority patent/KR950006840B1/en
Publication of JPH0410979A publication Critical patent/JPH0410979A/en
Application granted granted Critical
Publication of JP2553736B2 publication Critical patent/JP2553736B2/en
Priority to US08/904,983 priority patent/USRE36383E/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 産業上の利用分野 本発明はレーザービーム等により、情報を高密度、大
容量で記録再生及び消去できる光記録媒体に関するもの
である。
Description: TECHNICAL FIELD The present invention relates to an optical recording medium capable of recording / reproducing and erasing information with high density and large capacity by using a laser beam or the like.

従来の技術 大容量で高密度なメモリとして光記録媒体が注目され
ており、現在、情報の消去・再記録が可能である書換え
型と呼ばれるものの開発が進められている。この書換え
型の光記録媒体のひとつとして、Te−Ge−Sb合金薄膜を
記録層として用い、レーザ光の照射により記録層を加熱
し、溶融し、急冷することにより非晶質化して情報を記
録し、またこれを加熱し徐冷することにより結晶化して
情報を消去するものがある。第3図は従来の書換え型光
記録媒体を示した断面図である。第3図において、中心
穴を有する円盤上の透明樹脂材料からなる基板11に誘電
体からなる第1の保護層12、記録層13、誘電体からなる
第2の保護層14、金属薄膜からなる反射層15を形成し、
その上に接着剤16を介して保護板17を設けたものであ
る。ここで、記録層13にTe−Ge−Sb合金薄膜を用いれ
ば、この結晶化速度が速いため、単一のレーザの強度を
変調して照射するだけで非晶質化及び結晶化ができる。
従って、この書換え型光記録媒体は、一般にオーバライ
トと呼ばれる単一のレーザ光による情報の書換えが可能
である。
2. Description of the Related Art Optical recording media have attracted attention as large-capacity and high-density memories, and currently, a rewritable type capable of erasing and re-recording information is under development. As one of the rewritable optical recording media, a Te-Ge-Sb alloy thin film is used as a recording layer, and the recording layer is heated by laser irradiation, melted, and rapidly cooled to record information by amorphizing. In some cases, information is erased by crystallization by heating and gradually cooling this. FIG. 3 is a sectional view showing a conventional rewritable optical recording medium. In FIG. 3, a first protective layer 12 made of a dielectric material, a recording layer 13, a second protective layer 14 made of a dielectric material, and a metal thin film are provided on a substrate 11 made of a transparent resin material on a disk having a central hole. Forming the reflective layer 15,
A protective plate 17 is provided on top of this with an adhesive 16. Here, if a Te—Ge—Sb alloy thin film is used for the recording layer 13, this crystallization speed is high, so that it is possible to amorphize and crystallize only by modulating and irradiating the intensity of a single laser.
Therefore, this rewritable optical recording medium is capable of rewriting information by a single laser beam generally called overwrite.

発明が解決しょうとする課題 記録薄膜を加熱昇温し、溶融急冷非晶質化および加熱
昇温徐冷結晶化の手段を用いる情報記録および消去可能
な光記録媒体においては、記録・消去の多数回の繰り返
しに対応して信号品質が変動する場合がある。この変動
要因としては、レーザ光による400℃以上の急速な加熱
・冷却の繰り返しによって記録層自信が熱的損傷を受け
たり、ディスク基板あるいは保護層の熱的な損傷が考え
られる。さらに、記録層については、その構成組成によ
っては、層中の組成・成分の局所的な変化、いわゆる偏
析が発生する場合もある。以上のような変化を生じた場
合、記録・再生・消去の繰り返しにおいてノイズの増大
等の劣化が生じる。これらの対策としては、例えば記録
層の材料として、GeTe,Sb2Te3,Sbの混合体を用いれば、
Sbの量を適当にすることによって記録・消去の多数回の
繰り返しによる信号品質の変動を阻止していた。これ
は、Sbが結晶化,非晶質化の過程において、GeTe成分と
Sb2Te3分の相分離に対する阻止効果を有しているからで
ある。このような構想によって、記録・消去を105回以
上の繰り返しにおいても安定な信号を得ていた。しか
し、さらに106回オーダーの繰り返しにおいては、記録
・消去の繰り返しに伴う加熱・冷却の繰り返しによって
保護層の熱膨張・収縮に対応して保護層に挟まれた記録
層材料が脈動し、ディスク回転方向の案内溝に沿って移
動する場合がある。このようなことが発生すると記録層
の厚さむらが発生し、信号品質が劣化するという課題が
あった。
DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention In an optical recording medium capable of recording and erasing information by using means for heating and heating a recording thin film to melt and amorphize it, and to heat and anneal slowly cooling and crystallization, many recording and erasing operations are performed. The signal quality may fluctuate corresponding to the repetition of times. Possible causes of this change are thermal damage to the recording layer itself and thermal damage to the disk substrate or protective layer due to rapid heating and cooling at 400 ° C. or higher due to laser light. Further, in the recording layer, a so-called segregation, which is a local change in the composition and components in the layer, may occur depending on the constituent composition. When the above changes occur, deterioration such as increase in noise occurs during repeated recording / reproduction / erasing. As a measure against these, for example, if a mixture of GeTe, Sb 2 Te 3 , and Sb is used as the material of the recording layer,
By adjusting the amount of Sb appropriately, fluctuations in signal quality due to a large number of recording / erasing repetitions were prevented. This is due to the fact that Sb becomes
This is because it has a blocking effect on the phase separation of Sb 2 Te 3 minutes. With this concept, a stable signal was obtained even when recording / erasing was repeated 10 5 times or more. However, when the order of 10 6 times is repeated, the recording layer material sandwiched between the protective layers pulsates in response to thermal expansion / contraction of the protective layer due to repeated heating / cooling associated with repeated recording / erasing, and It may move along the guide groove in the rotational direction. When such a phenomenon occurs, there is a problem in that the recording layer is uneven in thickness and the signal quality is deteriorated.

消去特性についてはTeを含む非晶質膜は、その融点は
代表的なもので400〜900℃と広い温度範囲にあり、これ
らの記録薄膜にレーザ光を照射し、昇温徐冷することに
より結晶化が行える。この温度は一般的に融点より低い
結晶化温度領域にある。またこの結晶化した膜に高いパ
ワーレベルのレーザ光をあて、その融点以上に加熱する
とその部分は溶融し急冷し、再び非晶質化してマークが
形成できる。記録マークとして非晶質化を選ぶと、この
マークは記録薄膜が溶融し急冷されて形成されるもので
あるから、冷却速度が速いほど非晶質状態の均一なもの
が得られ信号振幅が向上する。冷却速度が遅い場合はマ
ークの中心と周辺で非晶質化の程度に差が発生する。次
に結晶化消去に際しては、レーザ光の照射により既に記
録が行われている非晶質マーク部を、結晶化温度以上に
昇温し徐冷して、結晶化させてこのマークを消去する。
この時、マークが均一に結晶化するときは消去特性が向
上する。しかし、記録マークの状態が不均一な場合は、
記録マーク部の反射率や吸収率にむらが発生しやすく、
消去した時に、結晶化の状態が不均一となり、記録マー
クの消し残りが発生し、消去特性が劣化するという課題
があった。本発明の目的は、サイクル特性が安定であ
り、記録消去特性の良好な光ディスクを提供することで
ある。
Regarding the erasing characteristics, the amorphous film containing Te has a typical melting point in a wide temperature range of 400 to 900 ° C. By irradiating these recording thin films with laser light and gradually increasing the temperature by cooling. Can be crystallized. This temperature is generally in the crystallization temperature range below the melting point. When the crystallized film is irradiated with laser light of a high power level and heated to a temperature higher than its melting point, that part is melted and rapidly cooled, and then amorphized again to form marks. When amorphization is selected as the recording mark, this mark is formed by melting and rapidly cooling the recording thin film, so the faster the cooling rate, the more uniform the amorphous state is obtained and the signal amplitude is improved. To do. When the cooling rate is slow, a difference occurs in the degree of amorphization between the center and the periphery of the mark. Next, at the time of crystallization erasing, the amorphous mark portion which has already been recorded by the irradiation of laser light is heated to a crystallization temperature or higher and gradually cooled to be crystallized to erase the mark.
At this time, when the marks are crystallized uniformly, the erasing property is improved. However, if the recording marks are not uniform,
The reflectance and absorptance of the recording marks are likely to be uneven,
When erasing, there was a problem that the crystallization state became non-uniform, unerased recording marks occurred, and the erasing characteristics deteriorate. An object of the present invention is to provide an optical disc having stable cycle characteristics and good recording / erasing characteristics.

課題を解決するための手段 本発明は、レーザ光等の照射により、状態の変化がな
され、GeTeとSb2Te3とSbの混合体に窒素を含ませた材料
からなる記録層を基板上に形成したものである。
Means for Solving the Problems The present invention is one in which a state is changed by irradiation with laser light or the like, and a recording layer made of a material containing nitrogen in a mixture of GeTe, Sb2Te3, and Sb is formed on a substrate. Is.

作用 本発明は上記した構成、すなわちGeTe−Sb2Te3−Sbの
混合体に、窒素を含ませた材料を基板上に形成すること
で、記録・再生・消去の繰り返しに伴う加熱・冷却の繰
り返しにより記録層材料が脈動し案内溝に沿って移動す
る現象を抑制することができ、これによって記録・消去
の繰り返し特性を向上することができるものである。
Function The present invention has the above-described structure, that is, by forming a material containing nitrogen in a mixture of GeTe-Sb2Te3-Sb on a substrate, recording by repeating heating / cooling accompanying repeated recording / reproduction / erasing. The phenomenon in which the layer material pulsates and moves along the guide groove can be suppressed, and thereby the repetitive recording / erasing characteristics can be improved.

また基板上に第1の保護層と、GaTeとSb2Te3とSbの混
合体に窒素を含ませた材料からなる記録層と、第2の誘
電体層と、反射層とを備え、第2の誘電体層を第1の保
護層より薄くし30nm以下にしているので、金属からなる
反射層と記録層を近づけることになり、記録層が急冷さ
れ、記録マークが均一な非晶質状態となる。その結果、
記録・消去が向上する。
A first protective layer, a recording layer made of a material containing nitrogen in a mixture of GaTe, Sb 2 Te 3, and Sb, a second dielectric layer, and a reflective layer are provided on the substrate. Since the second dielectric layer is thinner than the first protective layer and has a thickness of 30 nm or less, the reflective layer made of metal and the recording layer are brought close to each other, the recording layer is rapidly cooled, and the recording mark is in an amorphous state. Becomes as a result,
Recording / erasing is improved.

実施例 以下、本発明の一実施例の光記録媒体を図面に基づい
て説明する。第1図は本発明の一実施例を示す断面図で
ある。第1図において、中心孔を有する円盤上の透明な
基板1上にあらかじめ耐熱性の優れたZnS−SiO2からな
る第1の保護層2を形成する。組成比はSiO2含有量が約
20モル%であり、膜厚は約150nmである。3は記録層でG
eTe,Sb2Te3,Sbに窒素を混合した薄膜であり、膜厚は約2
0nmである。4は第2の保護層で第1の保護層2と同じ
材料からなっており、膜厚は約20nmである。5はAl合金
からなる反射層で膜厚は約100nmである。6は保護板で
接着剤7によって基板1に貼り合わせている。記録層3
を構成する材料のうちのGeTe,Sb2Te3,Sbの組成として
は、第2図のGeTe,Sb2Te3,Sbからなる三角ダイアグラム
において、b=Sb/Sb2Te3=0及びb=1.0の両ラインの
内側に選ぶ。bが0よりも少ない組成領域、すなわち余
剰のTeを含む組成領域では、本実施例の組成である余剰
のSbを含む組成のものに比べ、局所的な偏析に対する阻
止効果が低かった。また、b=1.0を越える組成領域で
は、記録・消去の繰り返しにおいて非晶質化劣化が生じ
やすい。ゆえに、0≦b≦1.0の組成領域が繰り返し特
性が良好であり好ましい。
Example An optical recording medium according to an example of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view showing an embodiment of the present invention. In FIG. 1, a first protective layer 2 made of ZnS—SiO 2 having excellent heat resistance is previously formed on a transparent substrate 1 on a disk having a central hole. The composition ratio is about SiO 2 content
20 mol% and the film thickness is about 150 nm. 3 is a recording layer G
eTe, Sb 2 Te 3 , Sb is a thin film mixed with nitrogen, and the film thickness is about 2
It is 0 nm. The second protective layer 4 is made of the same material as the first protective layer 2 and has a film thickness of about 20 nm. Reference numeral 5 is a reflective layer made of an Al alloy and has a film thickness of about 100 nm. A protective plate 6 is attached to the substrate 1 with an adhesive 7. Recording layer 3
As the composition of GeTe, Sb2Te3, Sb among the materials constituting the above, the inside of both lines of b = Sb / Sb2Te3 = 0 and b = 1.0 is selected in the triangular diagram of GeTe, Sb2Te3, Sb in FIG. . In the composition region in which b was less than 0, that is, in the composition region containing excess Te, the effect of preventing local segregation was lower than that of the composition containing excess Sb, which is the composition of this example. Further, in the composition region exceeding b = 1.0, amorphization deterioration is likely to occur during repeated recording / erasing. Therefore, the composition region of 0 ≦ b ≦ 1.0 is preferable because of good repeatability.

g=GeTe/Sb2Te3については、gが0.5以下になると、
結晶化転移温度が低下し、耐熱安定性が小さくなる。g
=2.3を越える組成領域では熱的安定性が良好であるが
感度が低下する。ゆえに、0.5≦g≦2.3が良好であり好
ましい。
For g = GeTe / Sb 2 Te 3 , when g is 0.5 or less,
The crystallization transition temperature decreases, and the heat resistance stability decreases. g
In the composition region exceeding 2.3, the thermal stability is good but the sensitivity decreases. Therefore, 0.5 ≦ g ≦ 2.3 is good and preferable.

第1及び第2の保護層、記録層、反射層の形成方法と
しては、一般的には真空蒸着あるいはスパッタ法が使用
できる。本実施例では記録層の形成方法としてアルゴン
と窒素の混合ガスによるスパッタ法を用いている。この
時、窒素の分圧が特性あるいは膜質を決定する上で重要
であるが、記録薄膜のスパッタ時の窒素分圧は10-5〜1.
0×10-4Torrの範囲が適当である。この理由は窒素分圧
を10-5Torrよりも小さくすると、GeTe,Sb2Te3,Sbに含ま
れる窒素が少なくなり、記憶層3の材料が脈動して、案
内溝に添って移動する現象を阻止する効果が小さくな
る。逆に窒素分圧を10-4Torrよりもを大きくすると、記
録層の屈折率等、光学的な特性の変化、あるいは結晶化
速度、非晶質化速度等、記録消去にかかわる基本的な特
性が変化してしまう。ゆえに、窒素分圧は10-5〜1.0×1
0-4Torrの範囲が適当である。
As a method of forming the first and second protective layers, the recording layer and the reflective layer, generally, vacuum deposition or sputtering can be used. In this embodiment, the sputtering method using a mixed gas of argon and nitrogen is used as the method of forming the recording layer. At this time, the partial pressure of nitrogen is important for determining the characteristics or film quality, but the partial pressure of nitrogen during sputtering of the recording thin film is 10 -5 to 1.
A range of 0 × 10 -4 Torr is suitable. The reason for this is that when the nitrogen partial pressure is smaller than 10 -5 Torr, the amount of nitrogen contained in GeTe, Sb2Te3, Sb decreases, and the material of the memory layer 3 pulsates and prevents the phenomenon of moving along the guide groove. The effect becomes smaller. On the other hand, if the nitrogen partial pressure is higher than 10 -4 Torr, changes in optical characteristics such as the refractive index of the recording layer, or crystallization speed, amorphization speed, and other basic characteristics related to recording / erasing Will change. Therefore, the nitrogen partial pressure is 10 -5 to 1.0 × 1
A suitable range is 0 -4 Torr.

第1、第2の保護層2,4のZnS−SiO2混合膜はSiO2の比
率を20モル%にしているがこれに限定するものではな
い。しかしながらSiO2の比率を5モル%以下にすると、
ZnSにSiO2を混合した時に得られる効果、すなわち結晶
粒径を小さくするという効果が小さくなり、40モル%を
越えるとと、SiO2膜の性質が大きくなるものであるか
ら、SiO2の比率は5〜40モル%の範囲にするのが適当で
ある。
In the ZnS—SiO 2 mixed film of the first and second protective layers 2 and 4, the SiO 2 ratio is set to 20 mol%, but the present invention is not limited to this. However, if the ratio of SiO 2 is 5 mol% or less,
Effect obtained when a mixture of SiO 2 to ZnS, ie the effect of reducing the crystal grain size becomes small, and when it exceeds 40 mol%, since those properties of the SiO 2 film is increased, the SiO 2 ratio Is appropriately in the range of 5 to 40 mol%.

さらに、第2の保護層4の膜厚を約30nmと薄くしてい
るが、これによって熱拡散層となる反射層5と記録層3
が近くなり、記録・消去時の記録層3の熱が急速に反射
層5に伝達されることになって、記録層3を急冷し、記
録マークが均一な非晶質状態となる。その結果、記録・
消去が向上する。
Further, the film thickness of the second protective layer 4 is made as thin as about 30 nm. By this, the reflective layer 5 and the recording layer 3 to be the heat diffusion layer are formed.
And the heat of the recording layer 3 at the time of recording / erasing is rapidly transferred to the reflective layer 5, so that the recording layer 3 is rapidly cooled and the recording mark becomes a uniform amorphous state. As a result,
Erasure is improved.

本実施例のディスク構成で、外径130mm、1800rpm回
転、線速度8m/secでf1=3.43MHzの信号、f2=1.25MHzの
オーバーライト特性を測定した。この結果、記録信号の
C/N比としては、55dB以上が得られ、オーバライト消去
率30dB以上が得られた。オーバライトのサイクル特性に
ついては、特にビットエラーレイトの特性を測定した結
果、106サイクル以上劣化が見られなかった。
With the disk configuration of this embodiment, an outer diameter of 130 mm, a rotation of 1800 rpm, a linear velocity of 8 m / sec, a signal of f1 = 3.43 MHz, and an overwrite characteristic of f2 = 1.25 MHz were measured. As a result, the recording signal
The C / N ratio was 55 dB or higher, and the overwrite erase rate was 30 dB or higher. Regarding the overwrite cycle characteristics, the bit error rate characteristics were measured, and as a result, no deterioration was found for 10 6 cycles or more.

発明の効果 以上のように本発明によればGeTe,Sb2Te3,Sbに窒素を
混合した記録層を基板上に形成することによって記録・
消去の繰り返しに伴い、記録層材料が案内溝に沿って移
動する現象を抑制し、これによって記録・消去の繰り返
し特性を向上することができる。また、記録層と反射層
の間の保護層を薄くした急冷構成にすることによって、
均一な非晶質化が可能となり、記録・消去特性が良好
で、かつ106回以上の書換えが可能な光記録媒体を提供
することができる。
As described above, according to the present invention, recording is performed by forming a recording layer in which GeTe, Sb2Te3, and Sb are mixed with nitrogen on the substrate.
It is possible to suppress the phenomenon that the recording layer material moves along the guide groove with the repetition of erasing, thereby improving the repetitive characteristics of recording and erasing. Also, by using a quenching structure in which the protective layer between the recording layer and the reflective layer is thin,
It is possible to provide an optical recording medium in which uniform amorphization is possible, recording / erasing characteristics are good, and rewriting is possible 10 6 or more times.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の実施例における光記録媒体の断面図、
第2図は本発明の実施例における光記録媒体の記録層の
うちGeTe,Sb2Te3,Sbの組成を示した三角ダイアグラム、
第3図は従来の光記録媒体の断面図である。 1……基板、2……第1の保護層、3……記録層、4…
…第2の保護層、5……反射層、6……保護板、7……
接着剤。
FIG. 1 is a sectional view of an optical recording medium according to an embodiment of the present invention,
FIG. 2 is a triangular diagram showing the composition of GeTe, Sb2Te3, Sb in the recording layer of the optical recording medium in the example of the present invention,
FIG. 3 is a sectional view of a conventional optical recording medium. 1 ... Substrate, 2 ... First protective layer, 3 ... Recording layer, 4 ...
… Second protective layer, 5 …… Reflective layer, 6 …… Protective plate, 7 ……
adhesive.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 ▲吉▼岡 一己 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (56)参考文献 特開 昭63−228433(JP,A) 特開 平1−290135(JP,A) 特開 平1−302549(JP,A) 特開 昭61−44693(JP,A) 特開 平2−56746(JP,A) 特開 平1−116937(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor ▲ Yoshi ▼ Kazumi Oka 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (56) Reference JP-A-63-228433 (JP, A) JP JP-A-1-290135 (JP, A) JP-A-1-302549 (JP, A) JP-A-61-44693 (JP, A) JP-A-2-56746 (JP, A) JP-A-1-116937 (JP , A)

Claims (9)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】レーザ光等の照射により、状態の変化がな
され、GeTeとSb2Te3とSbの混合体に窒素を含ませた材料
からなる記録層を基板上に形成した光記録媒体。
1. An optical recording medium in which a state is changed by irradiation with laser light or the like, and a recording layer made of a material containing nitrogen in a mixture of GeTe, Sb 2 Te 3 and Sb is formed on a substrate.
【請求項2】GeTeとSb2Te3とSbの混合体に、窒素を含ま
せてなる記録層を、アルゴンと窒素の混合ガスを用いた
スパッタ法で形成することを特徴とする光記録媒体の製
造方法。
2. An optical recording medium, characterized in that a recording layer made of a mixture of GeTe, Sb 2 Te 3 and Sb containing nitrogen is formed by a sputtering method using a mixed gas of argon and nitrogen. Manufacturing method.
【請求項3】記録層を形成する時の窒素分圧を10-5〜10
-4Torrの範囲にすることを特徴とする請求項2記載の光
記録媒体の製造方法。
3. The nitrogen partial pressure when forming the recording layer is 10 -5 to 10
3. The method for manufacturing an optical recording medium according to claim 2, wherein the range is −4 Torr.
【請求項4】記録層の組成がGeTe/Sb2Te3のモル比をg
として、0.5≦g≦2.3である請求項1記載の光記録媒
体。
4. The composition of the recording layer has a GeTe / Sb 2 Te 3 molar ratio of g.
The optical recording medium according to claim 1, wherein 0.5 ≦ g ≦ 2.3.
【請求項5】記録層の組成がSb/Sb2Te3のモル比をbと
して、0≦b≦1.0である請求項1記載の光記録媒体。
5. The optical recording medium according to claim 1, wherein the composition of the recording layer is 0 ≦ b ≦ 1.0, where the molar ratio of Sb / Sb 2 Te 3 is b.
【請求項6】記録層の組成がGeTe/Sb2Te3のモル比をg
として、0.5≦g≦2.3の範囲でかつ、Sb/Sb2Te3のモル
比をbとして、0.1≦b≦1.0である請求項1記載の光記
録媒体。
6. The composition of the recording layer has a molar ratio of GeTe / Sb 2 Te 3 of g.
2. The optical recording medium according to claim 1, wherein the range is 0.5 ≦ g ≦ 2.3, and 0.1 ≦ b ≦ 1.0, where b is the molar ratio of Sb / Sb 2 Te 3 .
【請求項7】基板上に第1の保護層と、GeTeとSb2Te3
Sbの混合体に窒素を含ませた材料からなる記録層と、第
2の保護層と、反射層とを順次形成した光記録媒体。
7. A first protective layer, GeTe and Sb 2 Te 3 on the substrate.
An optical recording medium in which a recording layer made of a material containing nitrogen in a mixture of Sb, a second protective layer, and a reflective layer are sequentially formed.
【請求項8】基板上に第1の誘電体層と、GeTeとSb2Te3
とSbの混合体に窒素を含ませた材料からなる記録層と、
第2の保護層と、反射層とを備え、第2の保護層を第1
の保護層より薄くし、第2の保護層の薄膜を30nm以下に
した請求項7記載の光、録媒体。
8. A first dielectric layer, GeTe and Sb 2 Te 3 on a substrate.
A recording layer made of a material containing nitrogen in a mixture of Sb and Sb,
A second protective layer and a reflective layer are provided, and the second protective layer is the first
The optical recording medium according to claim 7, wherein the second protective layer has a thickness of 30 nm or less.
【請求項9】第1及び、第2の保護層を、ZnSとSiO2
混合体とし、SiO2比が5〜40モル%とした請求項7記載
の光記録媒体。
9. The optical recording medium according to claim 7, wherein the first and second protective layers are a mixture of ZnS and SiO 2 , and the SiO 2 ratio is 5 to 40 mol%.
JP2113380A 1990-04-27 1990-04-27 Optical recording medium and method of manufacturing optical recording medium Expired - Lifetime JP2553736B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2113380A JP2553736B2 (en) 1990-04-27 1990-04-27 Optical recording medium and method of manufacturing optical recording medium
US07/559,166 US5194363A (en) 1990-04-27 1990-07-30 Optical recording medium and production process for the medium
US07/573,246 US5230973A (en) 1990-04-27 1990-08-24 Method of recording and erasing information in an erasible optical recording medium
KR1019910006821A KR950006840B1 (en) 1990-04-27 1991-04-27 Optical recording medium & production process for the medium
US08/904,983 USRE36383E (en) 1990-04-27 1997-08-01 Optical recording medium and production process for the medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2113380A JP2553736B2 (en) 1990-04-27 1990-04-27 Optical recording medium and method of manufacturing optical recording medium

Publications (2)

Publication Number Publication Date
JPH0410979A JPH0410979A (en) 1992-01-16
JP2553736B2 true JP2553736B2 (en) 1996-11-13

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Country Status (1)

Country Link
JP (1) JP2553736B2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5587216A (en) * 1992-10-16 1996-12-24 Matsushita Electric Industrial Co., Ltd. Optical recording medium
US6319368B1 (en) 1995-03-31 2001-11-20 Ricoh Company, Ltd. Sputtering target, method of producing the target, optical recording medium fabricated by using the sputtering target, and method of forming recording layer for the optical recording medium
TW337017B (en) * 1996-09-06 1998-07-21 Ricoh Kk Optical recording medium
JP3570169B2 (en) 1997-08-22 2004-09-29 松下電器産業株式会社 Optical information recording medium
DE60030703T2 (en) 1999-03-15 2007-09-13 Matsushita Electric Industrial Co., Ltd., Kadoma INFORMATION RECORDING ELEMENT AND MANUFACTURING METHOD
JP5029232B2 (en) 2007-08-31 2012-09-19 富士通株式会社 Connector and information processing apparatus

Also Published As

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