JP2546123B2 - Lead-free frit glaze - Google Patents
Lead-free frit glazeInfo
- Publication number
- JP2546123B2 JP2546123B2 JP5027221A JP2722193A JP2546123B2 JP 2546123 B2 JP2546123 B2 JP 2546123B2 JP 5027221 A JP5027221 A JP 5027221A JP 2722193 A JP2722193 A JP 2722193A JP 2546123 B2 JP2546123 B2 JP 2546123B2
- Authority
- JP
- Japan
- Prior art keywords
- lead
- glaze
- frit glaze
- free frit
- frit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は，鉛を含有することな
く，かつ光沢性，耐急冷性に優れた無鉛フリット釉に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lead-free frit glaze containing no lead and having excellent gloss and quenching resistance.
【０００２】[0002]
【従来技術】磁器は，天然の粘土，陶石等から作られ，
高温で焼成することにより得られる。即ち，上記粘土等
に水を加えて粉砕混練し，濾過機により水分を減少させ
た後，素地を成形する。次に，この成形素地を締焼し
て，締焼素地を得る。その後，該締焼素地にフリット釉
を施釉し，釉焼きを行う。これにより上記磁器を得る。2. Description of the Related Art Porcelain is made from natural clay, porcelain stone, etc.
It is obtained by firing at a high temperature. That is, water is added to the clay and the like to be pulverized and kneaded, and the water content is reduced by a filter, and then the green body is formed. Next, the compacted body is fired to obtain a fired body. After that, the frit glazing is applied to the sinter-baked body, and glazing is performed. Thereby, the above porcelain is obtained.
【０００３】上記釉焼き工程においては，磁器の表面に
フリット釉が塗布される。該フリット釉は，磁器におけ
る表面光沢，耐水性，及び耐急冷性等を向上させるもの
である。そして，このようなフリット釉の多くは，鉛を
数％〜数１０％含有している。鉛は，溶融温度が低く，
ガラス化が容易である。また，鉛は，流動性に優れてお
り，製造工程における作業性を容易にする。更に，焼成
後においては，磁器の表面の発色性及び光沢性を向上さ
せる。In the glaze baking process, frit glaze is applied to the surface of the porcelain. The frit glaze improves surface gloss, water resistance, quenching resistance and the like of porcelain. Most of such frit glazes contain lead of several percent to several tens of percent. Lead has a low melting temperature,
Vitrification is easy. In addition, lead has excellent fluidity and facilitates workability in the manufacturing process. Furthermore, after firing, it improves the coloring and glossiness of the surface of the porcelain.
【０００４】[0004]
【解決しようとする課題】しかしながら，上記フリット
釉の原料配合に当たっては，鉛丹或いは鉛白等を用いる
ため，鉛害のおそれがある。また，施釉時のスプレーや
排水中への微量混入等による汚染のおそれがある。その
ため，鉛を含まないフリット釉の開発が切望されてい
る。本発明は，かかる問題点に鑑み，鉛を含有すること
なく，かつ光沢性，耐急冷性に優れた無鉛フリット釉を
提供しようとするものである。[Problems to be Solved] However, when the raw materials for the frit glaze are blended, since lead tin or lead white is used, there is a risk of lead damage. In addition, there is a risk of contamination due to spraying during glaze and a small amount of contamination in the wastewater. Therefore, the development of frit glaze that does not contain lead has been earnestly desired. In view of such a problem, the present invention aims to provide a lead-free frit glaze that does not contain lead and is excellent in glossiness and quenching resistance.
【０００５】[0005]
【課題の解決手段】本発明は，磁器の表面に塗布し，焼
成することにより，磁器表面に光沢性，耐急冷性に優れ
た釉面を形成するための無鉛フリット釉であって， 上記
無鉛フリット釉は，モル％で表現してＳｉ０２が６１％
以上，Ａｌ２Ｏ３が８〜１０％，ＣａＯが０．１〜３
％，ＭｇＯが０．１〜２％，Ｌｉ２Ｏが２〜５％，Ｋ２
Ｏが１〜４％，Ｎａ２Ｏが２〜６％，Ｂ２Ｏ３が１０〜
１５％よりなることを特徴とする無鉛フリット釉にあ
る。The present invention is applied to the surface of porcelain and baked.
By making it, the porcelain surface has excellent gloss and quenching resistance.
A lead-free frit glaze for forming the釉面, the
Unleaded frit glaze, expressed in mole% Si0 2 61%
As described above, Al 2 O 3 is 8 to 10%, CaO is 0.1 to 3
%, MgO 0.1-2%, Li 2 O 2-5%, K 2
O is 1 to 4%, Na 2 O is 2 to 6%, B 2 O 3 is 10
It is a lead-free frit glaze characterized by comprising 15%.
【０００６】本発明の無鉛フリット釉においては，Ｓｉ
Ｏ2 （二酸化ケイ素），Ａｌ2 Ｏ3（アルミナ），Ｃａ
Ｏ（酸化カルシウム），ＭｇＯ（酸化マグネシウム），
Ｌｉ2 Ｏ（酸化リチウム），Ｋ2 Ｏ（酸化カリウム），
Ｎａ2 Ｏ（酸化ナトリウム），Ｂ2 Ｏ3 （酸化ホウ素）
を用い，上記のごとき配合比（モル％）で含有してい
る。In the lead-free frit glaze of the present invention, Si
O 2 (silicon dioxide), Al 2 O 3 (alumina), Ca
O (calcium oxide), MgO (magnesium oxide),
Li 2 O (lithium oxide), K 2 O (potassium oxide),
Na 2 O (sodium oxide), B 2 O 3 (boron oxide)
Is used in the above-mentioned compounding ratio (mol%).
【０００７】ＳｉＯ2 は，６１％（以下，特記しない限
りモル％を示す。）未満の場合は，耐薬品性が弱くな
る。但し，表面平滑性の点より６５％以下とすることが
好ましい。Ａｌ2 Ｏ3 は，８％未満の場合は，大きな気
泡が発生しやすく，１０％を越える場合は，グレーズ溶
融時の粘性が高くなり，表面光沢が悪くなる。If the SiO 2 content is less than 61% (hereinafter, mol% unless otherwise specified), the chemical resistance becomes poor. However, it is preferably 65% or less from the viewpoint of surface smoothness. If Al 2 O 3 is less than 8%, large bubbles are likely to be generated, and if it exceeds 10%, the viscosity during glaze melting becomes high and the surface gloss deteriorates.
【０００８】ＣａＯは，０．１％未満の場合は，破裂気
泡（ぶく）が発生しやすく，３％を越える場合は，梨肌
になる。ＭｇＯは，０．１％未満或いは２％を越える場
合は，破裂気泡（ぶく）が発生しやすい。If the content of CaO is less than 0.1%, burst bubbles are likely to occur, and if it exceeds 3%, pear skin is formed. If MgO is less than 0.1% or more than 2%, burst bubbles are likely to occur.
【０００９】Ｌｉ2 Ｏは，２％未満の場合は，梨肌にな
り，５％を越える場合は，破裂気泡（ぶく）が発生しや
すい。Ｋ2 Ｏは，１％未満或いは４％を越える場合は，
梨肌になる。Ｎａ2 Ｏは，２％未満或いは６％を越える
場合は，梨肌になる。Ｂ2 Ｏ3 は，１０％未満の場合
は，粘性が高く表面の平滑性が悪くなり，表面光沢も悪
くなり，１５％を越える場合は，破裂気泡（ぶく）が発
生しやすい。When Li 2 O is less than 2%, pear skin is formed, and when it exceeds 5%, burst bubbles are easily generated. If K 2 O is less than 1% or more than 4%,
It becomes pear skin. If Na 2 O is less than 2% or more than 6%, it becomes pearskin. When B 2 O 3 is less than 10%, the viscosity is high and the surface smoothness is poor, and the surface gloss is also poor, and when it exceeds 15%, burst bubbles (blister) are likely to occur.
【００１０】本発明にかかるフリット釉は，例えばガラ
スフリットと天然原料とを用い，両者を上記の成分配合
比になるように調整混合することにより作製する。上記
ガラスフリットは，カオリン，石灰石，マグネサイト，
炭酸リチウム，炭酸カリウム，炭酸ナトリウム，硼酸，
珪粉などを用いて調製される。これらを適量混合し，焼
成し，次いで水中急冷してガラスを得る。その後，該ガ
ラスを乾燥させ，粉砕する。これによりガラスフリット
が得られる。The frit glaze according to the present invention is produced, for example, by using glass frit and a natural raw material and adjusting and mixing both so as to have the above-mentioned component mixture ratio. The above glass frit is kaolin, limestone, magnesite,
Lithium carbonate, potassium carbonate, sodium carbonate, boric acid,
It is prepared using silica powder or the like. These are mixed in appropriate amounts, fired, and then rapidly cooled in water to obtain glass. Then, the glass is dried and crushed. This gives a glass frit.
【００１１】一方，上記天然原料は，粘土等よりなる。
無鉛フリット釉を磁器の表面に被覆させる際には，ま
ず，上記ガラスフリットと天然原料とを上記組成範囲と
なるように混合し，これに水を添加して泥漿状とする。
次に，これを締焼素地に塗布し，その後焼成する。上記
塗布方法としては，スプレーガンによる吹き付け，或い
は締焼素地をフリット釉溶液に浸漬する方法などがあ
る。また，刷毛などを用いて締焼素地に塗布してもよ
い。On the other hand, the natural raw material is made of clay or the like.
When coating the surface of the porcelain with the lead-free frit glaze, first, the glass frit and the natural raw material are mixed so as to have the above composition range, and water is added to the mixture to form a sludge form.
Next, this is applied to a sinter body and then fired. Examples of the coating method include spraying with a spray gun or immersing the fired body in a frit glaze solution. Alternatively, a brush or the like may be used to apply it to the sinter body.
【００１２】[0012]
【作用及び効果】本発明の無鉛フリット釉においては，
鉛を用いることなく，ＳｉＯ2 ，Ａｌ2Ｏ3 ，ＣａＯ，
ＭｇＯ，Ｌｉ2 Ｏ，Ｋ2 Ｏ，Ｎａ2 Ｏ，Ｂ2 Ｏ3 を用
い，これらは前記のごとき配合比で含有している。その
ため，本発明の無鉛フリット釉は鉛を含有しない。ま
た，本発明の無鉛フリット釉は，磁器の表面に塗布し，
焼成することにより，表面光沢性及び耐急冷性共に優れ
た効果を発揮する。それ故，本発明によれば，鉛を含有
することなく，かつ光沢性，耐急冷性に優れた無鉛フリ
ット釉を提供することができる。[Operation and Effect] In the lead-free frit glaze of the present invention,
Without using lead, SiO 2 , Al 2 O 3 , CaO,
MgO, Li 2 O, K 2 O, Na 2 O and B 2 O 3 are used, and these are contained in the above-mentioned compounding ratio. Therefore, the lead-free frit glaze of the present invention does not contain lead. The lead-free frit glaze of the present invention is applied to the surface of porcelain,
By firing, it exhibits excellent effects on both surface gloss and quenching resistance. Therefore, according to the present invention, it is possible to provide a lead-free frit glaze that does not contain lead and is excellent in gloss and quenching resistance.
【００１３】[0013]
実施例１ 本発明にかかる無鉛フリット釉の成分は，モル％で表現
してＳｉＯ2 が６４．３％，Ａｌ2 Ｏ3 が９．４％，Ｃ
ａＯが２．２％，ＭｇＯが１．１％，Ｌｉ2 Ｏが２．３
％，Ｋ2 Ｏが３．０％，Ｎａ2 Ｏが４．６％，Ｂ2 Ｏ3
が１３．１％（合計１００％）である。上記無鉛フリッ
ト釉を調製するに当たっては，８５重量％のガラスフリ
ットと１５重量％の天然原料とを混合し，これに水を添
加して泥漿状とする。Example 1 The components of the lead-free frit glaze according to the present invention are expressed in mol%: SiO 2 64.3%, Al 2 O 3 9.4%, C
2.2% aO, 1.1% MgO, 2.3 Li 2 O
%, K 2 O 3.0%, Na 2 O 4.6%, B 2 O 3
Is 13.1% (total 100%). In preparing the lead-free frit glaze, 85% by weight of glass frit and 15% by weight of natural raw material are mixed, and water is added to the mixture to form a slurry.
【００１４】上記ガラスフリットは，カオリン２０．９
重量％，石灰石２．９重量％，マグネサイト１．７重量
％，炭酸リチウム２．３重量％，炭酸カリウム５．７重
量％，炭酸ナトリウム６．７重量％，硼酸２２．４重量
％，珪粉３７．４重量％（合計１００％）の原料からな
る。The above glass frit is made of kaolin 20.9.
Wt%, limestone 2.9 wt%, magnesite 1.7 wt%, lithium carbonate 2.3 wt%, potassium carbonate 5.7 wt%, sodium carbonate 6.7 wt%, boric acid 22.4 wt%, silica It is composed of 37.4% by weight of powder (100% in total).
【００１５】ガラスフリットの調製に当たっては，ま
ず，上記原料を混合する。次に，この粉末混合物を１３
５０℃〜１４００℃で焼成し，次いで水中急冷してガラ
スを得る。その後，該ガラスを乾燥し，粉砕する。これ
によりガラスフリットが得られる。上記天然原料として
は粘土を用いる。In preparing the glass frit, the above raw materials are first mixed. Then mix this powder mixture with 13
Firing at 50 ° C to 1400 ° C, followed by quenching in water to obtain glass. Then, the glass is dried and crushed. This gives a glass frit. Clay is used as the natural raw material.
【００１６】次に，上記のように調製した無鉛フリット
釉は，スプレーガンを用いて焼結素地に吹き付けること
により，磁器の表面に塗布する。その後，１１５０℃で
焼成する。尚，本例の磁器としては，ボーンチャイナを
用いる。上記のごとく，磁器の表面に塗布，焼成された
無鉛フリット釉は，屈折率が１．５１７であり，熱膨張
係数は６．５×１０-6／℃（０°〜４００℃）であっ
た。また，上記無鉛フリット釉は，表面光沢性，耐急冷
性に優れていた。Next, the lead-free frit glaze prepared as described above is applied to the surface of the porcelain by spraying it onto the sintered body using a spray gun. Then, it is baked at 1150 ° C. A bone china is used as the porcelain in this example. As described above, the lead-free frit glaze applied and fired on the surface of the porcelain had a refractive index of 1.517 and a thermal expansion coefficient of 6.5 × 10 −6 / ° C. (0 ° to 400 ° C.). . Further, the lead-free frit glaze was excellent in surface gloss and quenching resistance.
【００１７】実施例２ 本発明にかかる無鉛フリット釉の成分は，モル％で表現
してＳｉＯ2 が６４．３％，Ａｌ2 Ｏ3 が８．５％，Ｃ
ａＯが２．０％，ＭｇＯが１．４％，Ｌｉ2 Ｏが４．２
％，Ｋ2 Ｏが２．７％，Ｎａ2 Ｏが２．９％，Ｂ2 Ｏ3
が１４．０％（合計１００％）である。Example 2 The components of the lead-free frit glaze according to the present invention are expressed in mol%: SiO 2 64.3%, Al 2 O 3 8.5%, C
2.0% aO, 1.4% MgO, 4.2 Li 2 O
%, K 2 O 2.7%, Na 2 O 2.9%, B 2 O 3
Is 14.0% (total 100%).
【００１８】上記無鉛フリット釉を調製するに当たって
は，９１重量％のガラスフリットと９重量％の天然原料
とを混合し，これに水を添加して泥漿状とする。上記ガ
ラスフリットは，カオリン２２．５重量％，石灰石２．
６重量％，マグネサイト１．６重量％，炭酸リチウム
４．２重量％，炭酸カリウム５．０重量％，炭酸ナトリ
ウム４．２重量％，硼酸２３．３重量％，珪粉３６．６
重量％（合計１００％）の原料からなる。In preparing the lead-free frit glaze, 91% by weight of glass frit and 9% by weight of natural raw material are mixed, and water is added to the mixture to form a slurry. The glass frit is made of kaolin 22.5% by weight, limestone 2.
6% by weight, magnesite 1.6% by weight, lithium carbonate 4.2% by weight, potassium carbonate 5.0% by weight, sodium carbonate 4.2% by weight, boric acid 23.3% by weight, silica powder 36.6.
It is composed of weight% (total 100%) of raw materials.
【００１９】ガラスフリットの調製に当たっては，ま
ず，上記原料を混合する。次に，この粉末混合物を１３
５０°Ｃ〜１４００°Ｃで焼成し，溶融し，次いで水中
急冷してガラスを得る。その後，該ガラスを乾燥させ，
粉砕する。これによりガラスフリットが得られる。In preparing the glass frit, first, the above raw materials are mixed. Then mix this powder mixture with 13
Firing at 50 ° C to 1400 ° C, melting, and quenching in water to obtain glass. After that, the glass is dried,
Smash. This gives a glass frit.
【００２０】次に，上記のように調製した無鉛フリット
釉は，スプレーガンを用いて締焼素地に吹きつけること
により，無鉛フリット釉を磁器の表面に塗布する。その
後，１１５０°Ｃで焼成する。尚，本例の磁器として
は，ボーンチャイナが用いられている。上記のごとく，
磁器の表面に塗布，焼成された無鉛フリット釉は，屈折
率が１．５１３であり，熱膨張係数は６．３×１０-6／
°Ｃ（０°〜４００°Ｃ）であった。また，上記無鉛フ
リット釉は，表面光沢性，耐急冷性に優れていた。Next, the lead-free frit glaze prepared as described above is applied to the surface of the porcelain by spraying the lead-free frit glaze onto the sinter body using a spray gun. Then, it is baked at 1150 ° C. A bone china is used as the porcelain in this example. As mentioned above,
The lead-free frit glaze coated and fired on the surface of porcelain has a refractive index of 1.513 and a thermal expansion coefficient of 6.3 × 10 -6 /
The temperature was ° C (0 ° to 400 ° C). Further, the lead-free frit glaze was excellent in surface gloss and quenching resistance.
【００２１】実施例３〜８，比較例Ｃ１〜Ｃ６ 本発明にかかる種々の無鉛フリット釉を製造し，実施例
３〜８とした。次に，該無鉛フリット釉を磁器に塗布
し，焼成した。そして，焼成後の無鉛フリット釉の熱膨
張係数を測定した。その結果を表１に示す。更に，上記
無鉛フリット釉の表面光沢，耐急冷性を評価した。無鉛
フリット釉の調製及びその塗布方法は，実施例１と同様
である。Examples 3 to 8 and Comparative Examples C1 to C6 Various lead-free frit glazings according to the present invention were manufactured to obtain Examples 3 to 8. Next, the lead-free frit glaze was applied to a porcelain and fired. Then, the thermal expansion coefficient of the lead-free frit glaze after firing was measured. Table 1 shows the results. Furthermore, the surface gloss and quenching resistance of the above-mentioned lead-free frit glaze were evaluated. The preparation of the lead-free frit glaze and its coating method are the same as in Example 1.
【００２２】尚，本発明の無鉛フリット釉と比較するた
め，比較例Ｃ１〜比較例Ｃ６として，表２に示すごと
く，成分の配合比を種々に変化させた無鉛フリット釉を
調製した。いずれの比較例においても，本発明の配合比
の範囲外にある成分を数種類含有する。その他は，実施
例３〜８と同様である。For comparison with the lead-free frit glaze of the present invention, as shown in Table 2, lead-free frit glazes having various component mixing ratios were prepared as Comparative Examples C1 to C6. In each of the comparative examples, several kinds of components outside the range of the compounding ratio of the present invention are contained. Others are the same as in Examples 3 to 8.
【００２３】上記の比較無鉛フリット釉について，上記
と同様に測定，評価した。その結果を表２に示す。な
お，表２において，成分の配合比の範囲外にある組成に
ついて，その範囲未満の成分についてはマイナス（─）
で，範囲を越える組成についてはプラス（＋）で示し
た。The above comparative lead-free frit glaze was measured and evaluated in the same manner as above. The results are shown in Table 2. In addition, in Table 2, for compositions outside the range of the compounding ratio of the components, components below the range are minus (-).
The composition exceeding the range is indicated by plus (+).
【００２４】表１より知られるごとく，実施例３〜８に
おいて，焼成後の無鉛フリット釉の熱膨張係数は，５．
７６〜７．１３×１０-6／℃（０°〜４００℃）と低い
値を示した。そのため，急冷温度差による割れの発生は
ない。また，上記無鉛フリット釉は，いずれも鉛を含有
することなく，かつ表面光沢性，耐急冷性共に優れてい
た。As is known from Table 1, in Examples 3 to 8, the coefficient of thermal expansion of the lead-free frit glaze after firing was 5.
It showed a low value of 76 to 7.13 × 10 −6 / ° C. (0 ° to 400 ° C.). Therefore, there is no cracking due to the difference in quenching temperature. Further, none of the lead-free frit glazes described above contained lead and had excellent surface gloss and quenching resistance.
【００２５】次に，表２より知られるように，比較例に
関しては，比較例Ｃ１は，焼成後の無鉛フリット釉の光
沢は良好であったが，該釉が溜まって厚い部分が形成さ
れ，その部分から気泡が発生した。比較例Ｃ２は，釉の
表面が梨肌状となり，光沢が悪いものであった。比較例
Ｃ３は，釉の溶けが悪かった。また，焼成後における釉
の表面には，サザ波状の皺が発生した。Next, as is known from Table 2, in Comparative Example C1, the gloss of the lead-free frit glaze after firing was good, but the glaze accumulated to form a thick portion, Bubbles were generated from that part. In Comparative Example C2, the glaze had a pear-like surface and had poor gloss. Comparative Example C3 had poor melting of the glaze. Moreover, wrinkled wrinkles occurred on the surface of the glaze after firing.
【００２６】比較例Ｃ４は，釉の表面に気泡が発生し
た。比較例Ｃ５は，釉の表面には滑らかな光沢がみられ
た。しかし，熱膨張係数が７．８０×１０-6／℃（０°
〜４００°Ｃ）となり，１００℃の急冷温度差で割れが
発生した。比較例Ｃ６は，釉が溶けにくく，焼成後にお
ける釉の表面に皺が生じた。In Comparative Example C4, bubbles were generated on the surface of the glaze. In Comparative Example C5, the glaze had a smooth gloss. However, the coefficient of thermal expansion is 7.80 × 10 -6 / ° C (0 °
Up to 400 ° C) and cracking occurred due to the difference in quenching temperature of 100 ° C. In Comparative Example C6, the glaze was difficult to melt, and wrinkles were formed on the surface of the glaze after firing.
【００２７】[0027]
【表１】 [Table 1]
【００２８】[0028]
【表２】 [Table 2]
【００２９】実施例９ 本例においては，実施例２にかかる，磁器の表面に塗
布，焼成された無鉛フリット釉について，その光沢の状
態を見るため，拡散反射率を測定した。また，比較のた
め他社製品の「ビスマスを含有する無鉛フリット釉」
（試料Ａ１，Ａ２）及び鉛を含有する自社製品の有鉛フ
リット釉（試料Ａ３，Ａ４）についても同様に測定を行
った。上記試料Ａ１〜Ａ４は，従来にかかるフリット釉
である。Example 9 In this example, the diffuse reflectance was measured for the lead-free frit glaze coated and fired on the surface of the porcelain according to Example 2 in order to see the gloss state. In addition, for comparison, the product of another company, “Bismuth-containing lead-free frit glaze”
(Samples A1 and A2) and lead-containing frit glazes (Samples A3 and A4) of in-house products containing lead were similarly measured. The samples A1 to A4 are conventional frit glazes.
【００３０】その結果を表３に示す。同表より知られる
ごとく，本例の無鉛フリット釉は，試料Ａ１〜Ａ４と同
様の拡散反射率であった。このことから，本例の無鉛フ
リット釉は，従来のものと同様に，優れた光沢を放つも
のであることがわかる。The results are shown in Table 3. As is known from the table, the lead-free frit glaze of this example had a diffuse reflectance similar to that of the samples A1 to A4. From this, it can be seen that the lead-free frit glaze of this example has an excellent luster like the conventional one.
【００３１】[0031]
【表３】 [Table 3]
Claims (1)
り，磁器表面に光沢性，耐急冷性に優れた釉面を形成す
るための無鉛フリット釉であって， 上記無鉛フリット釉は，モル％で表現してＳｉＯ２が６
１％以上，Ａｌ２Ｏ３が８〜１０％，ＣａＯが０．１〜
３％，ＭｇＯが０．１〜２％，Ｌｉ２Ｏが２〜５％，Ｋ
２Ｏが１〜４％，Ｎａ２Ｏが２〜６％，Ｂ２Ｏ３が１０
〜１５％よりなることを特徴とする無鉛フリット釉。1. A method of applying the composition to the surface of porcelain and firing it.
Form a glazed surface with excellent gloss and quenching resistance on the porcelain surface.
A lead-free frit glaze because, upper Symbol unleaded frit glaze, SiO 2 expressed in mol% 6
1% or more, Al 2 O 3 8-10%, CaO 0.1-
3%, MgO 0.1-2%, Li 2 O 2-5%, K
2 O is 1 to 4%, Na 2 O is 2 to 6%, and B 2 O 3 is 10%.
Lead-free frit glaze characterized by consisting of ~ 15%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/012,871 US5362687A (en) | 1992-02-04 | 1993-02-03 | Lead-free frit glaze |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4-54270 | 1992-02-04 | ||
| JP5427092 | 1992-02-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05279081A JPH05279081A (en) | 1993-10-26 |
| JP2546123B2 true JP2546123B2 (en) | 1996-10-23 |
Family
ID=12965888
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5027221A Expired - Fee Related JP2546123B2 (en) | 1992-02-04 | 1993-01-22 | Lead-free frit glaze |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2546123B2 (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5217506A (en) * | 1975-07-31 | 1977-02-09 | Matsushita Electric Works Ltd | Composite of glass |
| JPH03193638A (en) * | 1989-12-22 | 1991-08-23 | Mitsubishi Materials Corp | Frit glaze for red color having low thermal expandability |
| GB9012533D0 (en) * | 1990-06-05 | 1990-07-25 | Johnson Matthey Plc | Glass composition |
| JPH04349144A (en) * | 1991-05-24 | 1992-12-03 | Inax Corp | Ultra-glossy glaze |
-
1993
- 1993-01-22 JP JP5027221A patent/JP2546123B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05279081A (en) | 1993-10-26 |
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