JP2546032B2 - TFS vertical electroplating tank for welding cans - Google Patents

TFS vertical electroplating tank for welding cans

Info

Publication number
JP2546032B2
JP2546032B2 JP2137365A JP13736590A JP2546032B2 JP 2546032 B2 JP2546032 B2 JP 2546032B2 JP 2137365 A JP2137365 A JP 2137365A JP 13736590 A JP13736590 A JP 13736590A JP 2546032 B2 JP2546032 B2 JP 2546032B2
Authority
JP
Japan
Prior art keywords
tank
tfs
plate
vertical electroplating
shielding plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2137365A
Other languages
Japanese (ja)
Other versions
JPH0432597A (en
Inventor
敬 粟屋
義高 樫山
博之 石畑
浩樹 岩佐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Engineering Corp
Original Assignee
Nippon Kokan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kokan Ltd filed Critical Nippon Kokan Ltd
Priority to JP2137365A priority Critical patent/JP2546032B2/en
Publication of JPH0432597A publication Critical patent/JPH0432597A/en
Application granted granted Critical
Publication of JP2546032B2 publication Critical patent/JP2546032B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は溶接缶用TFSの竪形電気めっき槽に関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of use] The present invention relates to a vertical electroplating tank for TFS for welding cans.

[従来の技術] TFS(ティンフリースチール)の皮膜は、下層に鋼よ
り融点の高い金属クロム層と、上層に絶縁皮膜であるク
ロム水和酸化物層とで形成しているために、そのままで
は溶接不可能である。そこで溶接可能にするために、種
々の検討が行なわれ、金属クロム層を粒状析出させるこ
とにより、溶接可能になることが知られている。この場
合断続電解において、一回目の電解処理時に生成した板
状金属クロム表面は、電解中断時間が0.3秒以上である
と、酸化クロムに変化し、再電解処理の下地は酸化クロ
ムとなる。この部分は再電解処理時に金属クロムが優先
析出して、粒状金属クロムとなることが報告されている
(金属表面処理VOL 35、No.8、P397〜401、1984年)。
[Prior Art] Since the TFS (tin-free steel) film is formed by a lower layer of a metal chrome layer having a higher melting point than steel and an upper layer of a chrome hydrate oxide layer that is an insulating film, Welding is not possible. Therefore, various studies have been conducted to enable welding, and it is known that welding can be performed by depositing a metallic chromium layer in a granular form. In this case, in the intermittent electrolysis, the surface of the plate-like metallic chromium produced during the first electrolytic treatment changes to chromium oxide when the electrolysis interruption time is 0.3 seconds or more, and chromium oxide is the base of the re-electrolytic treatment. It has been reported that metallic chromium is preferentially precipitated in this portion during re-electrolysis treatment to become granular metallic chromium (metal surface treatment VOL 35, No. 8, P397 to 401, 1984).

[発明が解決しようとする課題] しかしながらTFSの製造は一般に竪形電気めっき槽を
用いており、この電気めっき槽においては、片パス電解
を行なっても、対向する鋼板へ電解パスからの漏洩電流
が流入するため電解中断時間が得られにくく、金属クロ
ムの粒状析出が困難である。
[Problems to be Solved by the Invention] However, the manufacture of TFS generally uses a vertical electroplating tank. In this electroplating tank, even if one-pass electrolysis is performed, leakage current from the electrolytic path to the opposing steel plate is As a result, the electrolysis interruption time is difficult to obtain and the granular deposition of metallic chromium is difficult.

そこで、一般的には上記漏洩電流を遮断するために、
遮蔽板をめっき槽へ組み込んむ方法がとられる。この方
法は塩化ビニール板あるいは鉄板に絶縁物質をライニン
グした絶縁板をめっき槽の中央部に配置し、上端、下端
をめっき槽内壁に取り付けたサポートで遮蔽板を保持す
る構造のものである。
Therefore, in order to cut off the above leakage current,
A method of incorporating the shielding plate into the plating bath is adopted. This method has a structure in which an insulating plate in which an insulating material is lined on a vinyl chloride plate or an iron plate is arranged in the center of the plating tank, and the shielding plate is held by a support having upper and lower ends attached to the inner wall of the plating tank.

しかし、この方法では、遮蔽板の保守、及びめっき槽
内点検のために、層への遮蔽板の装入、抽出を容易にす
るために、遮蔽板巾はめっき槽内巾より、100mm以上小
さく設計しているのが普通である。
However, in this method, the shield plate width is 100 mm or more smaller than the plating bath inner width in order to facilitate loading and extraction of the shield plate into the layer for maintenance of the shield plate and inspection in the plating bath. It is usually designed.

そのため遮蔽板とめっき槽内壁との間に片側50mm以上
の隙間を生じ、その隙間から大量の漏洩電流が流入して
くるため、金属クロムを粒状析出させることが出来ない
という問題がある。
Therefore, a gap of 50 mm or more is formed on one side between the shield plate and the inner wall of the plating tank, and a large amount of leakage current flows in through the gap, so that there is a problem in that metallic chromium cannot be deposited in granular form.

本発明は上記のような問題点の解決を図ったものであ
り、確実に粒状金属クロムを析出させることの出来る溶
接缶用TFSの竪形電気めっき槽を提供することを目的と
する。
The present invention is intended to solve the above problems, and an object of the present invention is to provide a vertical electroplating tank for a TFS for a welding can, which can surely deposit metallic chromium particles.

[課題を解決するための手段] 上記目的を達成するために、本発明は槽下部に設置さ
れた鋼板の方向転換ロールと、槽内を降下する鋼板の両
面にめっきを施す一対以上の陽極からなる下向電解パス
と、槽内を上昇する鋼板の両面にめっきを施す一対以上
の陽極からなる上向電解パスと、前記方向転換ロールの
上部に着脱可能な状態で設置され、前記電解パスのうち
通電している電解パスから通電していない電解パスへの
電流の漏洩を遮断する遮蔽板を具備し、かつ該遮蔽板の
左右両端とめっき槽内壁との間隙を遮蔽板の表裏両側よ
り隠蔽する補助壁を、該遮蔽板の左右両端近傍のめっき
槽内壁に具備してなる溶接缶用TFSの竪形電気めっき槽
とするものである。
[Means for Solving the Problems] In order to achieve the above object, the present invention comprises a steel sheet turning roll installed at the bottom of a tank and a pair of anodes for plating both surfaces of a steel sheet descending in the tank. Downward electrolytic path consisting of, an upward electrolytic path consisting of a pair of anodes for plating on both sides of a steel plate rising in the bath, and an electrolytic path installed detachably on the upper part of the direction changing roll, A shield plate is provided to block leakage of current from the energized electrolytic path to the non-energized electrolytic path, and the gap between the left and right ends of the shielding plate and the inner wall of the plating tank is hidden from both sides of the shielding plate. The auxiliary wall is a TFS vertical electroplating tank for welding cans, which is provided on the inner wall of the plating tank near the left and right ends of the shielding plate.

[作用] 本発明は上記のような構成なので、本発明の竪形電気
めっき槽を用いて溶接缶用TFSを製造する場合に、上記
のような遮蔽板と補助壁を設けて、電解パスのうち通電
している電解パスから通電していない電解パスへの漏洩
電流流入率を十分に低下でき、通電していない電解パス
側を通板する鋼板に粒状化金属クロムを形成するための
電解中断処理をすることができる。その結果、TFSに所
定の粒状化金属クロムを均一に形成することができる。
[Operation] Since the present invention has the above-described structure, when the TFS for a welding can is manufactured using the vertical electroplating tank of the present invention, the shielding plate and the auxiliary wall as described above are provided to make the electrolytic path Of these, the leakage current inflow rate from the energized electrolytic path to the non-energized electrolytic path can be sufficiently reduced, and electrolysis is interrupted to form granulated metal chromium on the steel sheet that passes through the non-energized electrolytic path side. Can be processed. As a result, it is possible to uniformly form a predetermined granular chromium metal on the TFS.

後述するように漏洩電流流入率は金属クロムの粒状化
評価との関係から、0.1%未満に押さえることによっ
て、粒状化密(A)のものが得られる。
As will be described later, the leakage current inflow rate is controlled to be less than 0.1% in view of the relationship with the evaluation of the granularity of metallic chromium, so that the granularity (A) is obtained.

[実施例] 以下本発明の実施例を図によって説明する。[Examples] Examples of the present invention will be described below with reference to the drawings.

第1図(a)、(b)は本発明の一実施例を示す図であ
り、(a)図は平面図、(b)図は側面図である。図に
おいて1は竪形電気めっき槽、2は遮蔽板、3a、3bは補
助壁である。本発明の竪形電気めっき槽は(a)図に示
すように、竪形電気めっき槽1の中央部に配置した遮蔽
板2と、遮蔽板2の側面を挟むようにして設けた補助壁
3a、3bとを具備して構成したものである。この場合、遮
蔽板2はめっき槽1の中央部に垂直に配置し、通常用い
られているめっき槽内巾より巾の狭いものを用いてい
る。即ち、めっき槽内巾より、100mm以上小さく設計し
たものである。補助壁3aと補助壁3bとは、めっき槽1の
内壁1aと遮蔽板2の端部の隙間を完全に覆うように挟み
込んでいる。補助壁3aと補助壁3bとはめっき槽1の内壁
1aに取り付けられている。
1 (a) and 1 (b) are views showing an embodiment of the present invention, FIG. 1 (a) is a plan view, and FIG. 1 (b) is a side view. In the figure, 1 is a vertical electroplating bath, 2 is a shielding plate, and 3a and 3b are auxiliary walls. The vertical electroplating tank of the present invention is, as shown in FIG. 1 (a), a shield plate 2 arranged in the central portion of the vertical electroplating tank 1 and an auxiliary wall provided so as to sandwich the side surface of the shield plate 2.
It is configured by including 3a and 3b. In this case, the shielding plate 2 is arranged vertically in the center of the plating tank 1 and has a width narrower than the width of the plating tank that is normally used. That is, it is designed to be 100 mm or more smaller than the width of the plating tank. The auxiliary wall 3a and the auxiliary wall 3b are sandwiched so as to completely cover the gap between the inner wall 1a of the plating tank 1 and the end of the shield plate 2. The auxiliary wall 3a and the auxiliary wall 3b are the inner walls of the plating tank 1.
It is attached to 1a.

また、(b)図に示すように、補助壁3a(3b)は遮蔽
板2の垂直方向長さすべてを覆う状態に配置されてい
る。5は方向転換ロールである。この場合の好ましい位
置関係は、次のようである。
Further, as shown in FIG. 3B, the auxiliary wall 3a (3b) is arranged so as to cover the entire length of the shield plate 2 in the vertical direction. 5 is a direction change roll. The preferred positional relationship in this case is as follows.

遮蔽板と補助壁との隙間…5〜20mm 遮蔽板と補助壁との重なり部の長さ… 50〜200mm 遮蔽板と補助壁との隙間は狭すぎれば遮蔽板の装入抽出
が困難であり、広すぎると漏洩電流の遮断効果が低下す
る。
Gap between shield plate and auxiliary wall ... 5 to 20 mm Length of overlapping part between shield plate and auxiliary wall ... 50 to 200 mm If the gap between the shield plate and auxiliary wall is too narrow, it is difficult to insert and extract the shield plate. However, if it is too wide, the effect of blocking the leakage current decreases.

遮蔽板と補助壁との重なり部の長さは小さい過ぎれば
漏洩電流の遮断効果が低下し、大き過ぎてもその効果は
極端に増加しないばかりか、めっき槽内の保守点検に支
障をきたす。第2図は本発明の他の実施例を示す図であ
る。
If the length of the overlapping portion of the shielding plate and the auxiliary wall is too small, the effect of blocking the leakage current will be reduced, and if it is too large, the effect will not increase extremely and will hinder the maintenance and inspection in the plating tank. FIG. 2 is a diagram showing another embodiment of the present invention.

遮蔽板2の巾方向の延長上に、遮蔽補助板4を設け、
遮蔽板2の巾を狭くし、遮蔽板の装入抽出を第1図の遮
蔽板よりも、より容易にしている。遮蔽補助板4はめっ
き槽1の内壁1aに固定している。
A shielding auxiliary plate 4 is provided on the extension of the shielding plate 2 in the width direction,
The width of the shield plate 2 is narrowed to make it easier to insert and extract the shield plate than the shield plate of FIG. The shielding auxiliary plate 4 is fixed to the inner wall 1a of the plating tank 1.

本発明の竪形電気めっき槽を用いた溶接缶用TFSの製
造方法を第1図によって説明する。竪形電気めっき槽を
複数槽直列に配置し、その中の竪形電気めっき槽の少な
くとも一つに本発明の竪形電気めっき槽1を用いる。竪
形電気めっき槽は2パス電解を行なうのが普通である。
先の竪形電気めっき槽で下層に金属クロム層と、上層に
クロム水和酸化物層とを形成しためっき鋼板8が、負に
帯電して、本発明の竪形電気めっき槽1のめっき浴6aに
送入される。ここでは電解中断しているので、めっきさ
れることなく、方向転換ロール5によって、方向転換し
て、めっき浴6bで対極としての陽極7との間で、電解め
っきされて通過し、引き抜かれて、次の竪形電気めっき
槽に移送される。このようにして各竪形電気めっき槽で
所定のめっき付着量を得て、成品として処理される。
A method for manufacturing a TFS for a welding can using the vertical electroplating tank of the present invention will be described with reference to FIG. A plurality of vertical electroplating baths are arranged in series, and the vertical electroplating bath 1 of the present invention is used for at least one of the vertical electroplating baths. A vertical electroplating bath normally performs two-pass electrolysis.
The plated steel sheet 8 having the lower layer of the metal chromium layer and the upper layer of the chromium hydrated oxide layer formed in the above vertical electroplating tank is negatively charged, and the plating bath of the vertical electroplating tank 1 of the present invention is obtained. Delivered to 6a. Since the electrolysis is interrupted here, the direction is changed by the direction change roll 5 without being plated, and the electrolytic bath is electroplated between the anode 7 as the counter electrode in the plating bath 6b, and is withdrawn. , Transferred to the next vertical electroplating tank. In this way, each vertical electroplating tank obtains a predetermined amount of plating and is processed as a product.

第3図は本発明による鋼板巾方向の位置と、漏洩電流
流入率との関係の実験結果を示す図である。ここでは第
1図に示すような本発明の竪形電気めっき槽に対応する
導電紙を用いて、電解側の電解電流の何%が無電解側の
鋼板に流入するかを漏洩電流流入率(%)として求め
た。
FIG. 3 is a diagram showing an experimental result of the relationship between the position in the steel sheet width direction and the leakage current inflow rate according to the present invention. Here, using a conductive paper corresponding to the vertical electroplating bath of the present invention as shown in FIG. 1, the leakage current inflow rate (%) of the electrolysis current on the electrolysis side into the steel plate on the electroless side ( %).

この場合の主な条件として、遮蔽板と補助壁との隙間
を10mm、遮蔽板との補助壁との重なり部の長さを100mm
とした。なお、補助壁を除いて、他の条件を同じにした
場合を比較例とし、更に遮蔽板と補助壁を除いて、他の
条件を同じにした場合を従来例とした、図中aは本発明
例で実線で示し、bは比較例で点線で示し、cは従来例
で1点鎖線で示した。第3図から明らかなように、本発
明によれば、比較例、従来例の場合と比較して、漏洩電
流流入率が鋼板の巾方向に均一で、一様に低下している
ことがわかる。比較では鋼板のエッヂ部が漏洩電流流入
率が高くなっている。遮蔽板を用いない従来例では遮蔽
板を用いた場合よりも一層悪い結果を示している。
The main conditions in this case are: the gap between the shielding plate and the auxiliary wall is 10 mm, and the length of the overlapping portion between the shielding plate and the auxiliary wall is 100 mm.
And It should be noted that the case where the other conditions were the same except for the auxiliary wall was taken as a comparative example, and the case where the shielding plate and the auxiliary wall were removed and the other conditions were made the same as the conventional example. Inventive examples are shown by a solid line, b is a comparative example by a dotted line, and c is a conventional example by a one-dot chain line. As is clear from FIG. 3, according to the present invention, the leakage current inflow rate is uniform and decreases uniformly in the width direction of the steel sheet as compared with the comparative example and the conventional example. . In comparison, the edge portion of the steel sheet has a high leakage current inflow rate. The conventional example not using the shielding plate shows a worse result than the case using the shielding plate.

次に上記結果を実ラインに乗せて、本発明の竪形電気
めっき槽で電解中断した後、他の各竪形電解めっき槽で
所定のめっき付着量を得て、成品として処理し、第4図
に示す粒状化の評価を行なった。図において、縦軸中A
は粒状化金属クロムが密に発生した場合、Bは粒状化金
属クロムが部分的に発生した場合、Cは粒状化金属クロ
ムが全然なしの場合を示す。本発明例では◎印でプロッ
トしたが、すべてAを得た。これに対して、遮蔽板を用
いた場合は○印でプロットしたが、A−B−Cであり、
遮蔽板を用いない場合は、△印でプロットしたが、B−
Cであった。
Next, the above results are put on a real line, electrolysis is interrupted in the vertical electroplating tank of the present invention, and then a predetermined plating adhesion amount is obtained in each of the other vertical electroplating tanks and treated as a finished product. The granulation shown in the figure was evaluated. In the figure, the vertical axis A
Shows the case where the granular metal chromium is densely generated, B shows the case where the granular metal chromium is partially generated, and C shows the case where there is no granular metal chromium. In the examples of the present invention, A was obtained although all were plotted with ⊚. On the other hand, when a shielding plate was used, it was plotted with a circle, but it was ABC,
When the shielding plate is not used, it is plotted with a triangle, but B-
It was C.

[発明の効果] 本発明の竪形電気めっき槽を用いて溶接缶用TFSを製
造する場合は、粒状化金属クロムを形成するための電解
中断時間において、漏洩電流流入率を充分に低下出来る
ので、所定の粒状化金属クロムを均一に形成することが
出来、結果として、溶接缶用TFSを安定して製造するこ
とが出来る。
[Effects of the Invention] When a TFS for a welding can is manufactured using the vertical electroplating tank of the present invention, the leakage current inflow rate can be sufficiently reduced during the electrolysis interruption time for forming the granular metal chromium. As a result, it is possible to uniformly form the predetermined granular metal chromium, and as a result, it is possible to stably manufacture the TFS for a welding can.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例を示す図、第2図は本発明の
他の実施例を示す図、第3図は本発明による鋼板の巾方
向と漏洩電流流入率との関係の一実験例を示す図、第4
図は漏洩電流流入率と金属クロムの粒状化の評価を示す
図である。 1…竪形電気めっき槽、2…遮蔽板、3a、3b…補助壁、
4…遮蔽補助板。
FIG. 1 is a diagram showing an embodiment of the present invention, FIG. 2 is a diagram showing another embodiment of the present invention, and FIG. 3 is a diagram showing the relationship between the width direction of the steel sheet according to the present invention and the leakage current inflow rate. The figure which shows the example of an experiment, 4th
The figure shows the evaluation of the leakage current inflow rate and the granularity of metallic chromium. 1 ... Vertical electroplating tank, 2 ... Shielding plate, 3a, 3b ... Auxiliary wall,
4 ... Shielding auxiliary plate.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】槽下部に設置された鋼板の方向転換ロール
と、槽内を降下する鋼板の両面にめっきを施す一対以上
の陽極からなる下向電解パスと、槽内を上昇する鋼板の
両面にめっきを施す一対以上の陽極からなる上向電解パ
スと、前記方向転換ロールの上部に着脱可能な状態で設
置され、前記電解パスのうち通電している電解パスから
通電していない電解パスへの電流の漏洩を遮断する遮蔽
板を具備し、かつ該遮蔽板の左右両端とめっき槽内壁と
の間隙を遮蔽板の表裏両側より隠蔽する補助壁を、該遮
蔽板の左右両端近傍のめっき槽内壁に具備してなる溶接
缶用TFSの竪形電気めっき槽。
1. A steel sheet turning roll installed at the bottom of a tank, a downward electrolytic path consisting of a pair of anodes for plating both surfaces of a steel sheet descending in the tank, and both sides of a steel sheet rising in the tank. Upward electrolytic path consisting of a pair of more than one anode to be plated, is installed in a detachable state on the upper part of the direction change roll, from the electrolytic path which is energized among the electrolytic paths to the electrolytic path which is not energized A shielding plate for shielding the leakage of the electric current, and an auxiliary wall for concealing the gap between the left and right ends of the shielding plate and the inner wall of the plating plate from the front and back sides of the shielding plate. TFS vertical electroplating tank for welding cans equipped on the inner wall.
JP2137365A 1990-05-28 1990-05-28 TFS vertical electroplating tank for welding cans Expired - Lifetime JP2546032B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2137365A JP2546032B2 (en) 1990-05-28 1990-05-28 TFS vertical electroplating tank for welding cans

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2137365A JP2546032B2 (en) 1990-05-28 1990-05-28 TFS vertical electroplating tank for welding cans

Publications (2)

Publication Number Publication Date
JPH0432597A JPH0432597A (en) 1992-02-04
JP2546032B2 true JP2546032B2 (en) 1996-10-23

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JP2137365A Expired - Lifetime JP2546032B2 (en) 1990-05-28 1990-05-28 TFS vertical electroplating tank for welding cans

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US8012319B2 (en) * 2007-11-21 2011-09-06 Texas Instruments Incorporated Multi-chambered metal electrodeposition system for semiconductor substrates

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