JP2532690Y2 - Gas absorber - Google Patents

Description

[Detailed description of the invention]

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas absorbing device for absorbing gases at different pressures.

[0002]

2. Description of the Related Art A gas absorbing apparatus 101 shown in FIG.
A gas is introduced into the gas supply source 105 from a gas supply source 105 such as a chemical plant. The storage tank 103 is filled with a filler 108 such as Raschig ring or Berl saddle.
The circulating pump 106 circulates the absorbing liquid 102 through the pipe 107 so that the absorbing liquid 102 falls from above the upper part 8 to promote the gas absorption. As a result, the harmful components of the gas introduced into the storage
To absorb the waste gas, or to absorb and reuse the necessary components of the gas by the absorbing liquid 102. Further, an exhaust pipe 109 is attached to the upper portion of the storage tank 103 in order to discharge the gas not absorbed by the absorbing liquid 102 from the storage tank 103, and the gas discharged from the exhaust pipe 109 is reused or discarded. You. In addition,
A demister 1 is provided inside the storage tank 103 in order to prevent the absorbing liquid from being scattered due to entrainment in the exhaust pipe 109.
11 are provided.

[0003]

There are cases where gases at different pressures are discharged from a chemical plant or the like, and it is necessary to simultaneously absorb the gases at different pressures. In such a case, conventionally, the gas absorbing device 101 is required for each gas having a different pressure. That is, two gas absorbers 101 were required to absorb high-pressure gas and low-pressure gas. This is because, as shown in FIG. 3, when gas is introduced into the storage tank 103 of the single gas absorbing device 101 from both the high-pressure gas supply source 105a and the low-pressure gas supply source 105b, the high-pressure gas flows back into the low-pressure gas line. This is because

However, when a plurality of gas absorbing devices 101 are used, when the gas-absorbed absorbing liquid 102 is reused, it is necessary to manage the physical properties of the absorbing liquid 102 for each storage tank 103, and the operation is complicated. Met. Further, even when the absorbing liquid 102 in the storage tank 103 can be reused for each gas absorbing device 101, the physical property management is performed only for the absorbing liquid 102 of a gas at a certain pressure, and the absorbing liquid 102 is reused. When the liquid 102 is discarded, there is a problem of waste of the reusable absorbent and pollution.

If the gas absorption rate of the absorbing liquid 102 is not large, a plurality of circulation pumps 106 are required as described above, so that the equipment cost also increases.

Therefore, the absorption liquid 10 in the storage tank 103 is
In order to facilitate the management of the method 2, it is conceivable to make the components of the gas discharged from the plant or the like uniform regardless of the pressure, but it is difficult to control such gas components. It is also conceivable to prevent the high pressure gas from flowing back into the low pressure gas line by setting the inside of the storage tank 103 to atmospheric pressure. However, if the inside of the storage tank 103 is set to atmospheric pressure, the absorption liquid 102 absorbs the gas. The pressure of the unreacted gas also decreases and cannot be recirculated to a plant or the like, so that it cannot be reused.

An object of the present invention is to provide a gas absorbing device which can solve the above-mentioned problems of the prior art with a simple structure.

[0008]

A feature of the present invention is to provide a gas absorbing liquid storage tank and a partition member for partitioning the storage tank into a plurality of processing chambers. The opening is formed below the liquid level of the absorbing liquid, and the point is that gases having different pressures are introduced into each processing chamber.

[0009]

According to the structure of the present invention, since the inside of the storage tank is partitioned into a plurality of processing chambers, even if the pressures of the gases introduced into the processing chambers are different from each other, the high-pressure gas is generated. There is no backflow into the low pressure gas line. In addition, since the communication port communicating each processing chamber is formed below the liquid level of the absorbing liquid, the absorbing liquid of the high-pressure gas and the absorbing liquid of the low-pressure gas are mixed. Thereby, even if the components of the high-pressure gas and the components of the low-pressure gas are different, the physical properties of the absorbing liquid after gas absorption are uniformed.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the drawings.

A gas absorbing device 1 shown in FIG. 1 has a storage tank 3 for a gas absorbing liquid 2. This storage tank 3 has a main body 3a.
And a pair of processing towers 7 provided on the upper part of the main body 3a,
The inside is divided into two processing chambers 5a and 5b by a plate-shaped partition member 4. The communication port 6 that connects the two processing chambers 5a and 5b is
Is formed below the liquid level 2a. In the present embodiment, the upper and lower spaces between the partition member 4 and the bottom wall of the storage tank 3 are the communication ports 6. Absorbent liquid 2 stored in this storage tank 3
Is supplied from the supply source 15 and discharged from the discharge pipe 18. Examples of the absorbing liquid 2 include acidic liquids such as hydrochloric acid and sulfuric acid, alkaline liquids such as caustic soda and caustic potash,
A neutral liquid such as water can be used.

One processing tower 7 communicates with one processing chamber 5a, and the other processing tower 8 communicates with the other processing chamber 5b. Raschig rings, pole rings,
The filling material 9 such as a Berl saddle, a teralet, and a tray is filled. The absorption liquid 2 in the storage tank 3 is circulated through the pipe 11 by the circulation pump 10 so that the absorption liquid 2 flows down from above the filling 9. Exhaust pipes 14 a and 14 b are attached to the upper portions of the processing towers 7 and 8, and the gas not absorbed by the absorbent 2 is exhausted. The exhaust pipe 14
A demister 13 of mesh type or the like is provided inside each of the processing towers 7 and 8 in order to prevent the absorbing liquid 2 from being scattered due to entrainment on the a and b.

A low-pressure gas is introduced from a low-pressure gas supply source 16 such as a chemical plant into one processing chamber 5a, and a high-pressure gas is introduced from a high-pressure gas supply source 17 such as a chemical plant into the other processing chamber 5b. The introduced gas pressure is usually about 10 to 10000 mmAq as a gauge pressure. For example, a 200 mmAq gas is introduced as a low pressure gas, and a 600 mmAq gas is introduced as a high pressure gas. The flow rate of the introduced gas is, for example, about several thousand m ³ / h. The introduced gas may be acidic, alkaline, or neutral.

In the storage tank 3, the pressure gauges 20a and 20b of the processing chambers 5a and 5b and the level gauges 19a and 19 of the absorbent 2 are provided.
b is attached. The pressure gauges 20a, 20b
As the liquid level gauges 19a and 19b, a direct-view type, a differential pressure type, or the like is used.

According to the gas absorbing device 1 having the above-described structure, the storage tank 3 is divided into the processing chamber 5a into which the low-pressure gas is introduced and the processing chamber 5b into which the high-pressure gas is introduced. No backflow to the line.

Also, one processing chamber 5a and the other processing chamber 5a
Since the communication port 6b is formed below the liquid level of the absorbing liquid 2, the high-pressure gas absorbing liquid 2 and the low-pressure gas absorbing liquid 2 are mixed. Thereby, even if the components of the high-pressure gas and the components of the low-pressure gas are different, the physical properties of the absorbing liquid 2 after gas absorption become uniform, and the physical property management is individually performed on the high-pressure gas side and the low-pressure gas side. You do not need to do this. Further, since only one circulation pump 10 is required, an increase in equipment cost can be prevented. In this embodiment, the absorption liquid 2 inside the storage tank 3 is used.
Control of the physical properties of the absorbent 2 by controlling the liquid level of
When the liquid level of the absorbing liquid 2 reaches a predetermined constant value, the absorbing liquid 2 is discharged from the discharge pipe 18 and reused, and a new absorbing liquid 2 is supplied from the supply source 15 to the storage tank 3.

The present invention is not limited to the above embodiment.

For example, in the above embodiment, the inside of the storage tank is 2
Divided into three processing rooms, but divided into three or more processing rooms,
A different pressure gas may be introduced into each processing chamber. Further, in the above embodiment, the absorbing liquid after gas absorption is reused, but the absorbing liquid absorbing harmful components of the gas is discarded, and the gas exhausted from the exhaust pipe without being absorbed by the absorbing liquid is reused. You may do so.

[0019]

According to the gas absorbing device of the present invention, even if the pressures of the gases introduced into the respective processing chambers of the storage tank are different from each other, the high pressure gas does not flow back to the low pressure gas line. In addition, even if the components of the gas introduced into each processing chamber are not uniform, the physical properties of the absorbing solution are made uniform, the physical properties of the absorbing solution can be easily managed, and the absorbing solution and exhaust gas can be reused. Can be promoted. In addition, a single circulating pump for absorbing liquid may be used, and the equipment cost can be reduced. In addition, such an effect can be achieved with a simple structure, which is extremely practical.

[Brief description of the drawings]

FIG. 1 is a configuration diagram of a gas absorbing device according to an embodiment of the present invention.

FIG. 2 is a configuration explanatory view of a gas absorbing device according to a conventional example.

FIG. 3 is a configuration explanatory view of a gas absorbing device showing a conventional problem.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Gas absorption apparatus 2 Absorbing liquid 3 Storage tank 4 Partition member 5a, 5b Processing chamber 6 Communication port

Claims (1)

(57) [Scope of request for utility model registration] 1. A storage tank for a gas absorbing liquid, and a partition member for partitioning the storing tank into a plurality of processing chambers, and a communication port communicating each processing chamber is formed below the liquid level of the absorbing liquid. A gas absorbing device, wherein gases having different pressures are introduced into each processing chamber.