JP2507795B2 - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JP2507795B2 JP2507795B2 JP1007413A JP741389A JP2507795B2 JP 2507795 B2 JP2507795 B2 JP 2507795B2 JP 1007413 A JP1007413 A JP 1007413A JP 741389 A JP741389 A JP 741389A JP 2507795 B2 JP2507795 B2 JP 2507795B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- recording medium
- optical recording
- alkyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 31
- -1 naphthalocyanine compound Chemical group 0.000 claims description 27
- 125000001424 substituent group Chemical group 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 239000010409 thin film Substances 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 7
- 239000004721 Polyphenylene oxide Chemical group 0.000 claims description 5
- 125000002252 acyl group Chemical group 0.000 claims description 5
- 125000000623 heterocyclic group Chemical group 0.000 claims description 5
- 229920000570 polyether Chemical group 0.000 claims description 5
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 229910052711 selenium Inorganic materials 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000005336 allyloxy group Chemical group 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- 125000005842 heteroatom Chemical group 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 26
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical class N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 239000000975 dye Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000000706 filtrate Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229920005668 polycarbonate resin Polymers 0.000 description 4
- 239000004431 polycarbonate resin Substances 0.000 description 4
- 229920005596 polymer binder Polymers 0.000 description 4
- 239000002491 polymer binding agent Substances 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- JHKWXZZEBNEOAE-UHFFFAOYSA-N dihydroxysilicon Chemical compound O[Si]O JHKWXZZEBNEOAE-UHFFFAOYSA-N 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- DIHHYXHEFLWGGP-UHFFFAOYSA-N 3-iminobenzo[g]isoindol-1-amine Chemical compound C1=CC2=CC=CC=C2C2=C1C(=N)NC2=N DIHHYXHEFLWGGP-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- ZTQHJLXIUQQVST-UHFFFAOYSA-N trityl thiohypochlorite Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(SCl)C1=CC=CC=C1 ZTQHJLXIUQQVST-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Description
【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 本発明は,レーザー光線によって,情報を書込んだ
り,読み取ったりすることが可能な光学記録媒体に関す
る。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Field of Industrial Application) The present invention relates to an optical recording medium capable of writing and reading information by a laser beam.
(従来の技術) 従来,レーザー光線を用いて,情報を記録し読み取る
光学記録媒体としては,種々のものが知られている。そ
の一つに,レーザー光線を基板上の記録層に照射して,
照射部分に融解,蒸発,分解などの変化を生じさせて記
録を行なうものがある。(Prior Art) Conventionally, various types of optical recording media are known for recording and reading information using a laser beam. One of them is to irradiate the recording layer on the substrate with a laser beam,
Some recording is performed by causing changes such as melting, evaporation, and decomposition in the irradiated area.
このような光学記録媒体の記録層としては,As,Te,Se,
Tiなどの金属や合金の薄膜層が用いられてきた。これら
金属や合金の薄膜層を記録層とする光学記録媒体は,一
般に,書込み感度が高く,記録再生光学系を小型化でき
る半導体レーザーを適用できると言う特長があるが,熱
伝導率が大であるなどの理由により,記録時にレーザー
光線のエネルギーを効率よく利用できないという欠点が
あった。また,これらの記録層は,化学的に不安定であ
り,劣化することがあった。As the recording layer of such an optical recording medium, As, Te, Se,
Thin film layers of metals and alloys such as Ti have been used. An optical recording medium having a thin film layer of these metals or alloys as a recording layer is generally characterized by high writing sensitivity and application of a semiconductor laser capable of downsizing a recording / reproducing optical system, but has a large thermal conductivity. For some reason, the energy of the laser beam cannot be used efficiently during recording. In addition, these recording layers are chemically unstable and may deteriorate.
このため,特開昭57-82093号公報,特開昭58-56892号
公報,特開昭60-89842号公報,特開昭60-150243号公
報,特開昭61-177287号公報,特開昭61-25886号公報,
米国特許第4492750号公報などにより,記録層として有
機薄膜層を用い,比較的長波長の例えば780nm以上のレ
ーザー光線により情報の書込みや読取りを行なう光学記
録媒体が提案された。このような光学記録媒体では,記
録再生光学系の小型化が可能な半導体レーザーによる融
解,蒸発,分解などによって,有機薄膜層に容易に微小
な凹部(ビット)を形成させることができるものの,半
導体レーザー光線に対する吸光係数が小さく,記録感度
が十分ではないなどの欠点があった。Therefore, JP-A-57-82093, JP-A-58-56892, JP-A-60-89842, JP-A-60-150243, JP-A-61-177287, and JP-A-61-177287 Sho 61-25886 bulletin,
U.S. Pat. No. 4,492,750 has proposed an optical recording medium in which an organic thin film layer is used as a recording layer and information is written or read by a laser beam having a relatively long wavelength, for example, 780 nm or more. In such an optical recording medium, although minute recesses (bits) can be easily formed in the organic thin film layer by melting, evaporation, or decomposition with a semiconductor laser capable of miniaturizing the recording / reproducing optical system, It has drawbacks such as a low absorption coefficient for laser light and insufficient recording sensitivity.
(発明が解決しようとする課題) 本発明は,従来の有機薄膜記録層を有する光学記録媒
体の種々の欠点を改良し,化学的,物理的に安定で,レ
ーザー光線により高感度で記録・再生ができる。特定の
ナフタロシアニン系化合物を用いた光学記録媒体を提供
するものである。(Problems to be Solved by the Invention) The present invention improves various drawbacks of the conventional optical recording medium having an organic thin film recording layer, is chemically and physically stable, and can record and reproduce with high sensitivity by a laser beam. it can. An optical recording medium using a specific naphthalocyanine compound is provided.
(課題を解決するための手段) 本発明は,基板上に,下記一般式〔I〕で示されるナ
フタロシアン系化合物の少なくとも1種以上を含有する
有機薄膜層を設けてなる光学記録媒体である。(Means for Solving the Problems) The present invention is an optical recording medium in which an organic thin film layer containing at least one kind of naphthalocyanine compound represented by the following general formula [I] is provided on a substrate. .
一般式〔I〕 〔式中,MはAl,Ga,In,Si,Ge,またはSnを表わす。General formula [I] [In the formula, M represents Al, Ga, In, Si, Ge, or Sn.
Xは,互いに同一であっても異なっていてもよく,置
換基を有していてもよいアルキル基,置換基を有しても
よいアリール基,置換基を有してもよい複素環残基,ハ
ロゲン原子,ニトロ基,シアノ基,スルホン酸基,−OR
1,−SR2,−COOR3,−NR4R5,−SO2NR6R7,−CONR
8R9,−CH2NHCOCH2NR10R11,−NHCOR12,−N=NR13,
または−N=CHR14を表わす。X may be the same as or different from each other, and may be an alkyl group which may have a substituent, an aryl group which may have a substituent, or a heterocyclic residue which may have a substituent. , Halogen atom, nitro group, cyano group, sulfonic acid group, -OR
1 , -SR 2 , -COOR 3 , -NR 4 R 5 , -SO 2 NR 6 R 7 , -CONR
8 R 9 , -CH 2 NHCOCH 2 NR 10 R 11 , -NHCOR 12 , -N = NR 13 ,
Alternatively, it represents -N = CHR 14 .
R1,R2,R3,R4,R5,R6,R8,R9,R10およびR11は,
互いに同一であっても異なっていてもよく,水素原子,
置換基を有していてもよいアルキル基,アリール基,ア
シル基,シクロアルキル基,またはポリエーテル基を表
わし,または,R6とR7とで,R8とR9とで,あるいはR10
とR11とで,4〜7員環を形成していてもよく,これらの
4〜7員環はちっ素原子などのヘテロ原子を含む複素環
であってもよい。R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 8 , R 9 , R 10 and R 11 are
Hydrogen atoms, which may be the same or different from each other,
Represents an alkyl group, an aryl group, an acyl group, a cycloalkyl group, or a polyether group which may have a substituent, or R 6 and R 7 , R 8 and R 9 , or R 10
And R 11 may form a 4- to 7-membered ring, and these 4- to 7-membered ring may be a heterocycle containing a hetero atom such as a nitrogen atom.
R12,R13およびR14は,互いに同一であっても異なっ
ていてもよく,置換基を有するアルキル基,シクロアル
キル基,またはアリール基を表わす。R 12 , R 13 and R 14, which may be the same or different, each represents an alkyl group having a substituent, a cycloalkyl group or an aryl group.
Yは,−OSR15, を表わす。Y is -OSR 15 , Represents
Zは,水素原子,ハロゲン原子,水酸基,置換基,を
有してもよいアルキル基,−OSR18, を表わす。Z is a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group which may have a substituent, -OSR 18 , Represents
R15,R16,R17,R18,R19,およびR20は,互いに同一
であっても異なっていてもよく,置換基を有してもよい
アルキル基,アリール基,アシル基,シクロアルキル
基,アルコキシ基,アリロキシ基,ポリエーテル基,水
酸基,またはハロゲン原子を表わす。R 15 , R 16 , R 17 , R 18 , R 19 , and R 20 may be the same or different from each other and may have a substituent, such as an alkyl group, an aryl group, an acyl group or a cyclo group. It represents an alkyl group, an alkoxy group, an allyloxy group, a polyether group, a hydroxyl group, or a halogen atom.
Wは,O,S,Se,またはTeを表わす。 W represents O, S, Se, or Te.
k,l,m,nは,それぞれ独立に0〜8の整数を表わす。 k, l, m, and n each independently represent an integer of 0-8.
pは,0または1を表わす。〕 本発明にかかわる一般式〔I〕で示されるナフタロシ
アニン系化合物において,X,Z,およびR1ないしR20を構成
する原子および基の代表例として,ハロゲン原子として
は,塩素原子,臭素原子,よう素原子,およびふっ素原
子を,置換基を有してもよいアルキル基としては,メチ
ル基,n−ブチル基,tert−ブチル基,ステアリル基,ト
リクロロメチル基,2−メトキシエチル基などを,置換基
を有してもよいアリール基としては,フェニル基,クロ
ロフェニル基,トルイル基,ナフチル基,アントリル
基,ジメチルアミノフェニル基,ヒドロキシフェニル
基,ジエチルアミノナフチル基,ヒドロキシナフチル基
などを,シクロアルキル基としては,シクロヘキシル
基,シクロブチル基などを,置換基を有してもよいアシ
ル基としては,アセチル基,トリフルオロアセチル基な
どを,ポリエーテル基としては,ジエチレングリコール
モノエチル基,トリエチレングリコールモノブチル基な
どを,また,複素環基としては,ピリジル基,フリル
基,チアゾリル基,ピペラジニル基,モルホリル基など
をあげることができるが,これらの原子や基に限定され
るものではない。p represents 0 or 1. In the naphthalocyanine compound represented by the general formula [I] according to the present invention, typical examples of the atoms and groups forming X, Z, and R 1 to R 20 include halogen atoms such as chlorine atom and bromine atom. , Iodine atom, and fluorine atom, as the alkyl group which may have a substituent, methyl group, n-butyl group, tert-butyl group, stearyl group, trichloromethyl group, 2-methoxyethyl group, etc. As the aryl group which may have a substituent, a phenyl group, chlorophenyl group, toluyl group, naphthyl group, anthryl group, dimethylaminophenyl group, hydroxyphenyl group, diethylaminonaphthyl group, hydroxynaphthyl group, etc. Examples of the group include a cyclohexyl group and cyclobutyl group, and examples of the acyl group which may have a substituent include an acetyl group and a tol group. Lifluoroacetyl groups, etc., polyether groups such as diethylene glycol monoethyl group, triethylene glycol monobutyl group, etc., and heterocyclic groups such as pyridyl group, furyl group, thiazolyl group, piperazinyl group, morpholyl group, etc. Can be mentioned, but is not limited to these atoms and groups.
本発明において,一般式〔I〕で示される化合物は,
例えば,以下の方法により製造することができる。In the present invention, the compound represented by the general formula [I] is
For example, it can be manufactured by the following method.
すなわち,下記一般式〔II〕で示されるイソインドレ
ニン化合物と各種金属塩とから,あるいは,カルボン酸
無水物類,イミド類,またはニトリル類を出発原料とし
て常法により,一般式〔III〕で示されるナフタロシア
ニン系化合物を製造する。That is, from the isoindolenin compound represented by the following general formula [II] and various metal salts, or by a conventional method using carboxylic acid anhydrides, imides, or nitriles as starting materials, The indicated naphthalocyanine compound is prepared.
一般式〔II〕 〔式中,X,k,l,m,およびnは,一般式〔I〕における意
味と同じ意味を表わす。〕 一般式〔III〕 〔式中,M,X,k,l,m,nおよびpは,一般式〔I〕における
意味と同じ意味を表わす。〕 次に,得られた一般式〔III〕で示されるナフタロシ
アニン系化合物に,種々のいおう化合物を反応させるこ
とにより,一般式〔I〕で示されるナフタロシアニン系
化合物を製造することができる。General formula (II) [In the formula, X, k, l, m, and n have the same meanings as in the general formula [I]. ] General formula [III] [In the formula, M, X, k, l, m, n and p have the same meanings as in the general formula [I]. Next, the naphthalocyanine compound represented by the general formula [I] can be produced by reacting the obtained naphthalocyanine compound represented by the general formula [III] with various sulfur compounds.
本発明において用いられる一般式〔I〕で示されるナ
フタロシアニン系化合物の代表例としては,下記のナフ
タロシアニン系化合物(a)〜(i)をあげることがで
きる。Typical examples of the naphthalocyanine compound represented by the general formula [I] used in the present invention include the following naphthalocyanine compounds (a) to (i).
本発明において用いられる基板としては,信号の書き
込みや読み出しを行なうための光の透過率が,好ましく
は85%以上であり,かつ光学異方性の小さいものが望ま
しい。例えば,ガラス,またはアルクル樹脂,ポリカー
ボネート樹脂,ポリエステル樹脂,ポリアミド樹脂,塩
化ビニル系樹脂,酢酸ビニル系樹脂,ポリスチレン系樹
脂,ポリオレフィン樹脂(ポリ−4−メチルペンテンな
ど),ポリエーテルスルホン樹脂などの熱可塑性樹脂や
エポキシ樹脂,アリル樹脂などの熱硬化樹脂からなる基
板があげられる。これらの中で,成形のしやすさ,案内
溝やアドレス信号などの付与のしやすさなどから熱可塑
性樹脂からなるものが好ましく,さらに光学特性や機械
的特性からアクリル樹脂やポリカーボネート樹脂からな
るものが特に望ましい。 The substrate used in the present invention preferably has a light transmittance for writing or reading a signal of 85% or more and a small optical anisotropy. For example, heat of glass or alkule resin, polycarbonate resin, polyester resin, polyamide resin, vinyl chloride resin, vinyl acetate resin, polystyrene resin, polyolefin resin (poly-4-methylpentene etc.), polyether sulfone resin, etc. Substrates made of thermosetting resins such as plastic resins, epoxy resins, and allyl resins are examples. Of these, those made of thermoplastic resin are preferable because of their ease of molding and the ease of providing guide grooves and address signals, and those made of acrylic resin or polycarbonate resin because of their optical and mechanical properties. Is especially desirable.
本発明において,これらの透明な基板の厚さは,特に
制限がなく,板状でもフィルム状でもよい。また,その
形状は,円形状やカード状でもよく,その大きさには特
に制限はない。In the present invention, the thickness of these transparent substrates is not particularly limited and may be plate-like or film-like. The shape thereof may be circular or card-like, and the size thereof is not particularly limited.
また,基板には,通常,記録および読み出しの際の位
置制御のための案内溝やアドレス信号や各種マークなど
のプリフォーマット用の凹凸を有するが,これらの凹凸
は前記したような熱可塑性樹脂を成形(射出成形,圧縮
成形など)する際にスタンパーなどを用いて付与するこ
とが,好ましい。Further, the substrate usually has guide grooves for position control during recording and reading and unevenness for preformatting such as address signals and various marks. These unevenness are formed by the thermoplastic resin as described above. It is preferable to use a stamper or the like when molding (injection molding, compression molding, etc.).
本発明の光学記録媒体において,ナフタロシアニン系
化合物を含有する有機層薄膜層を基板上に形成する方法
としては,真空蒸着法,スパッタリング法,イオンプレ
ート法およびLB法(ラングミュアブロジェット法)など
の方法があるが,これらの方法は,操作が煩雑であり,
生産性が低く,また,一般式〔I〕で示される,中心金
属に,少なくとも1個の−OSR21, 〔式中,R21は一般式〔I〕におけるR15またはR18と,R
22は一般式〔I〕におけるR16またはR19と,また,R23
は一般式〔I〕におけるR17またはR20と,それぞれ同じ
意味を表わす。〕 で示される基を有するナフタロシアニン系化合物は,従
来の有機薄膜層を有する光学記録媒体に用いられている
有機色素に較べ,通常の有機溶媒に対する融解性がはる
かに高いので,スピンコーターなどを用いる塗布法が最
も有利である。塗布法によって記録層である有機薄膜層
を形成する場合には,ナフタロシアニン系化合物をアル
コール類,ケトン類,アミド類,スルホキシド類,エー
テル類,エステル類,脂肪族ハロゲン化炭化水素類,芳
香族炭化水素類など通常の有機溶媒に分散または溶解し
て塗布する。このとき,必要に応じて,高分子バインダ
ーを加えてもよい。高分子バインダーとしては,塩化ビ
ニル系樹脂,アクリル樹脂,ポリエステル樹脂,ポリア
ミド樹脂,ポリカーボネート樹脂,エポキシ樹脂,メタ
クリル樹脂,酢酸ビニル系樹脂,ニトロセルロース,フ
ェノール樹脂などがあげられる。高分子バインダーを用
いる場合,ナフタロシアニン系化合物に対する高分子バ
インダーの比率は10重量%以下が好ましい。In the optical recording medium of the present invention, as a method of forming an organic layer thin film layer containing a naphthalocyanine-based compound on a substrate, a vacuum deposition method, a sputtering method, an ion plate method, an LB method (Langmuir-Blodgett method) or the like can be used. There are methods, but these methods are complicated in operation,
The productivity is low, and the central metal represented by the general formula [I] contains at least one -OSR 21 , [Wherein R 21 is R 15 or R 18 in the general formula [I], and
22 is R 16 or R 19 in the general formula [I], and R 23
Represents the same meaning as R 17 or R 20 in the general formula [I]. The naphthalocyanine-based compound having a group represented by is much more soluble in ordinary organic solvents than organic dyes used in optical recording media having a conventional organic thin film layer. The coating method used is most advantageous. When an organic thin film layer which is a recording layer is formed by a coating method, a naphthalocyanine compound is used as an alcohol, a ketone, an amide, a sulfoxide, an ether, an ester, an aliphatic halogenated hydrocarbon, an aromatic compound. It is applied after being dispersed or dissolved in an ordinary organic solvent such as hydrocarbons. At this time, a polymer binder may be added if necessary. Examples of the polymer binder include vinyl chloride resin, acrylic resin, polyester resin, polyamide resin, polycarbonate resin, epoxy resin, methacryl resin, vinyl acetate resin, nitrocellulose, and phenol resin. When the polymer binder is used, the ratio of the polymer binder to the naphthalocyanine compound is preferably 10% by weight or less.
また,本発明において,ナフタロシアニン系化合物
に,他の色素を混合分散あるいは混合溶解して使用する
こともできる。混合して使用できる色素としては,すで
に公知の例えば,芳香族または不飽和脂肪族ジアミン系
金属錯体,芳香族または不飽和脂肪族ジチオール系金属
錯体,フタロシアニン系錯体,ナフタロシアニン系錯
体,スクアリウム系色素,ナフトキノン系錯体,アント
ラキノン系色素やポリメチン系色素などがあげられる。Further, in the present invention, other dyes may be mixed and dispersed or mixed and dissolved in the naphthalocyanine compound to be used. Examples of dyes that can be mixed and used include known aromatic or unsaturated aliphatic diamine-based metal complexes, aromatic or unsaturated aliphatic dithiol-based metal complexes, phthalocyanine-based complexes, naphthalocyanine-based complexes, and squarylium-based dyes. , Naphthoquinone-based complexes, anthraquinone-based dyes and polymethine-based dyes.
基板上に形成するナフタロシアニン系化合物を含有す
る記録層の厚さは,10μm以下,好ましくは500Å〜2μ
mである。また,塗布した後,クロロホルム,テトラヒ
ドロフラン,トルエンなどの有機溶媒の蒸気にさらすこ
とによって,有機薄膜層の吸収波長が長波長側にシフト
し,半導体レーザーの発振波長域の光に対する感度をい
ちじるしく向上させることができる場合もある。The thickness of the recording layer containing the naphthalocyanine compound formed on the substrate is 10 μm or less, preferably 500 Å to 2 μm.
m. Also, after coating, by exposing to vapor of an organic solvent such as chloroform, tetrahydrofuran, or toluene, the absorption wavelength of the organic thin film layer shifts to the long wavelength side, and the sensitivity of the semiconductor laser to light in the oscillation wavelength range is significantly improved. Sometimes you can.
また,これらの記録層を保護するために,Al2O3,SiO
2,SiO,SnOなどの無機化合物を蒸着して保護層としても
よい。また,保護層として,高分子を塗布してもよい。In addition, in order to protect these recording layers, Al 2 O 3 , SiO
An inorganic compound such as 2 , SiO or SnO may be vapor-deposited to form a protective layer. Further, a polymer may be applied as the protective layer.
上記のようにして得られた記録媒体への記録は,基板
上に設けた記録層に1μm程度に集束したレーザー光,
好ましくは半導体レーザー光を照射することにより行な
われる。記録層のレーザー光の照射された部分は,レー
ザーエネルギーの吸収による分解,蒸発,溶融などの熱
的な状態変化が生じる。再生は,熱的な変化を生じた部
分と生じていない部分との反射率の差を読み取ることに
よって行なわれる。一般式〔I〕で示されるナフタロシ
アニン系化合物は,従来の有機薄膜層を有する光学記録
媒体に用いられている有機色素に較べ,記録前後の反射
率の差がきわめて大きいので,きわめて有利である。Recording on the recording medium obtained as described above is performed by using a laser beam focused to about 1 μm on the recording layer provided on the substrate,
It is preferably performed by irradiating a semiconductor laser beam. The portion of the recording layer irradiated with laser light undergoes thermal state changes such as decomposition, evaporation, and melting due to absorption of laser energy. The reproduction is performed by reading the difference in reflectance between the portion where the thermal change is generated and the portion where the thermal change is not generated. The naphthalocyanine compound represented by the general formula [I] is extremely advantageous as compared with an organic dye used in an optical recording medium having a conventional organic thin film layer because the difference in reflectance before and after recording is extremely large. .
また,レーザーとしてはHe-Neレーザー,Arレーザー,
半導体レーザーなどの各種レーザーを用いることができ
るが,価格,大きさの点で半導体レーザーが特に好まし
い。半導体レーザーとしては,中心波長830nm,780nmお
よびそれより短波長のレーザーを使用することができ
る。He-Ne laser, Ar laser,
Various lasers such as a semiconductor laser can be used, but the semiconductor laser is particularly preferable in terms of price and size. Lasers with central wavelengths of 830 nm and 780 nm and shorter wavelengths can be used as the semiconductor laser.
つぎに,本発明を実施例によりさらに具体的に説明す
るが,本発明は,以下の実施例に限定されるものではな
い。なお,例中,部とは重量部を表わす。Next, the present invention will be described more specifically by way of examples, but the present invention is not limited to the following examples. In the examples, “part” means “part by weight”.
製造例1:ナフタロシアニン系化合物(a)〜(d)の製
造 キノリン50部に,1,3−ジイミノベンゾイソインドリン
7.8部および四塩化けい素5.0部を加え,180〜200℃で3
時間加熱撹拌した後,冷却し,メタノール500部で希釈
し,ろ過し,メタノールおよびジメチルホルムアミドで
洗浄し,乾燥して,ジヒドロキシシリコンナフタロシア
ニン7.0部を得た。Production Example 1: Production of naphthalocyanine compounds (a) to (d) 50 parts of quinoline and 1,3-diiminobenzisoindoline
Add 7.8 parts and 5.0 parts of silicon tetrachloride, and add 3 at 180-200 ℃.
After heating and stirring for an hour, the mixture was cooled, diluted with 500 parts of methanol, filtered, washed with methanol and dimethylformamide, and dried to obtain 7.0 parts of dihydroxysilicon naphthalocyanine.
得られたジヒドロキシシリコンナフタロシアニン5.0
部,トリフェニルメタンスルフェニルクロリド50部,ト
リ−n−ブチルアミン50部,およびピリジン300部を110
℃で2時間加熱攪拌した後,冷却し,メタノール1000部
で希釈し,ろ過し,ろ液を得,得られたろ液からメタノ
ールを減圧下加熱留去した。Obtained dihydroxysilicon naphthalocyanine 5.0
Parts, triphenylmethanesulfenyl chloride 50 parts, tri-n-butylamine 50 parts, and pyridine 300 parts 110 parts
After heating and stirring at 2 ° C. for 2 hours, the mixture was cooled, diluted with 1000 parts of methanol and filtered to obtain a filtrate, and methanol was distilled off from the obtained filtrate under reduced pressure.
得られた生成物全量を希塩酸500部に注ぎ,析出した
沈殿をろ過し,水洗し,80℃で乾燥して,ナフタロシア
ニン系化合物(a)3.0部を得た。The total amount of the obtained product was poured into 500 parts of dilute hydrochloric acid, and the deposited precipitate was filtered, washed with water, and dried at 80 ° C. to obtain 3.0 parts of naphthalocyanine compound (a).
ナフタロシアニン系化合物(b)〜(d)は,ナフタ
ロシアニン系化合物(a)の製造法に準じた方法により
得た。The naphthalocyanine compounds (b) to (d) were obtained by a method similar to the method for producing the naphthalocyanine compound (a).
製造例2:ナフタロシアニン系化合物(e)〜(i)の製
造 ジヒドロキシシリコンナフタロシアニン5.0部,p−ト
ルエンスルホニルクロリド50部,トリ−n−ブチルアミ
ン50部,およびピリジン300部を110℃で2時間加熱攪拌
した後,冷却し,メタノール1000部で希釈し,ろ過し,
ろ液を得,得られたろ液からメタノールを減圧下加熱留
去した。Production Example 2: Production of Naphthalocyanine Compounds (e) to (i) Dihydroxysilicon naphthalocyanine 5.0 parts, p-toluenesulfonyl chloride 50 parts, tri-n-butylamine 50 parts, and pyridine 300 parts at 110 ° C. for 2 hours. After heating and stirring, cool, dilute with 1000 parts of methanol, filter,
A filtrate was obtained, and methanol was distilled off from the obtained filtrate by heating under reduced pressure.
得られた生成物全量を希釈塩500部に注ぎ,析出した
沈殿をろ過し,水洗し,80℃で乾燥して,ナフタロシア
ニン系化合物(e)2.5部を得た。The total amount of the obtained product was poured into 500 parts of diluted salt, and the deposited precipitate was filtered, washed with water, and dried at 80 ° C. to obtain 2.5 parts of naphthalocyanine compound (e).
ナフタロシアニン系化合物(f)〜(i)は,ナフタ
ロシアニン系化合物(e)の製造法に準じた方法により
得た。The naphthalocyanine compounds (f) to (i) were obtained by a method similar to the method for producing the naphthalocyanine compound (e).
実施例1. ガラス製基板上に,ナフタロシアニン系化合物(a)
3.0部とクロロホルム97.0部とからなる溶液を滴下した
後,1200rpmの速度で20秒間回転させ,80℃で20分間乾燥
させて光学記録媒体を得た。得られた光学記録媒体は,
記録層の厚さ780Å,最大吸収波長が805nm,波長830nmの
光に対する反射率が43%であった。Example 1. A naphthalocyanine compound (a) was formed on a glass substrate.
A solution consisting of 3.0 parts and 97.0 parts of chloroform was added dropwise, followed by rotation at 1200 rpm for 20 seconds and drying at 80 ° C for 20 minutes to obtain an optical recording medium. The obtained optical recording medium is
The thickness of the recording layer was 780Å, the maximum absorption wavelength was 805 nm, and the reflectance for light with a wavelength of 830 nm was 43%.
得られた光学記録媒体をターンテーブル上に取り付
け,ターンテーブルを1800rpmで回転させながら,1.0μ
mに集束した830nmのレーザー光を5.0mW,8.0MHzで照射
して記録を行なった。The obtained optical recording medium was mounted on a turntable, and while rotating the turntable at 1800 rpm, 1.0 μ
Recording was performed by irradiating a 830 nm laser beam focused on m at 5.0 mW and 8.0 MHz.
記録後の光学記録媒体の表面を走査型電子顕微鏡で観
察したところ,鮮明なピットの形成が認められた。ま
た,得られた光学記録媒体に830nm,0.4mWのレーザー光
を照射し,反射光の検出を行なったところ,C/N比が53dB
であった。When the surface of the optical recording medium after recording was observed with a scanning electron microscope, clear pit formation was observed. Moreover, when the obtained optical recording medium was irradiated with laser light of 830 nm and 0.4 mW and the reflected light was detected, the C / N ratio was 53 dB.
Met.
実施例2. ポリカーボネート樹脂製基板上に,ナフタロシアニン
系化合物(e)2.5部とメチルセロソルブ97.5部とから
なる溶液を滴下した後,800rpmの速度で30秒間回転さ
せ,減圧下80℃で15分間乾燥させて光学記録媒体を得
た。Example 2. After dropping a solution of 2.5 parts of naphthalocyanine compound (e) and 97.5 parts of methyl cellosolve onto a polycarbonate resin substrate, the solution was rotated at a speed of 800 rpm for 30 seconds, and the pressure was reduced to 80 ° C. for 15 minutes. An optical recording medium was obtained by drying.
得られた光学記録媒体は,記録層の厚さ850Å,最大
吸収波長が800nm,波長830nmの光に対する反射率が40%
であった。The obtained optical recording medium has a recording layer thickness of 850Å, a maximum absorption wavelength of 800 nm, and a reflectance of 40% for light with a wavelength of 830 nm.
Met.
また,得られた光学記録媒体に,実施例1と同様にし
て記録を行なったところ,記録層表面に鮮明なピット形
状が認められ,また,C/N比は51dBであった。When recording was performed on the obtained optical recording medium in the same manner as in Example 1, a clear pit shape was recognized on the surface of the recording layer, and the C / N ratio was 51 dB.
実施例3〜9. 実施例1と同様にして,ガラス製基板上に,ナフタロ
シアニン系化合物(b)〜(d)および(f)〜(i)
を塗布し,乾燥させて光学記録媒体を得た。Examples 3 to 9. In the same manner as in Example 1, naphthalocyanine compounds (b) to (d) and (f) to (i) were formed on a glass substrate.
Was applied and dried to obtain an optical recording medium.
得られた光学記録媒体の記録層の最大吸収波長および
波長830nmの光に対する反射率,および得られた光学記
録媒体に実施例1と同様な記録再生を行なったときのC/
N比を表1に示す。The maximum absorption wavelength and reflectance of light having a wavelength of 830 nm of the recording layer of the obtained optical recording medium, and C / when recording / reproducing was performed on the obtained optical recording medium in the same manner as in Example 1.
The N ratio is shown in Table 1.
〔発明の効果〕 本発明の光学記録媒体に用いられるナフタロシアニン
系化合物は,前記のような通常の有機溶媒への溶解性が
きわめて高いので,これらの有機溶媒に溶解させて,生
産性や作業性のよい塗布法により基板上に有機薄膜層と
して設けることができ,本発明の光学記録媒体は,レー
ザー光線による記録前後の反射率の差がきわめて大きい
ため感度が高く,高感度の記録再生が可能であり,ま
た,化学的,物理的にも安定である。 [Effects of the Invention] Since the naphthalocyanine compound used in the optical recording medium of the present invention has extremely high solubility in the above-mentioned ordinary organic solvents, it is possible to dissolve it in these organic solvents to improve productivity and workability. It can be provided as an organic thin film layer on a substrate by a coating method having good properties, and the optical recording medium of the present invention has a very large difference in reflectance before and after recording by a laser beam, so that the sensitivity is high and recording / reproducing with high sensitivity is possible. It is also chemically and physically stable.
Claims (1)
フタロシアニン系化合物の少なくとも1種以上を含有す
る有機薄膜層を設けてなる光学記録媒体。 一般式〔I〕 〔式中,MはAl,Ga,In,Si,Ge,またはSnを表わす。 Xは,互いに同一であっても異なっていてもよく,置換
基を有してもよいアルキル基,置換基を有してもよいア
リール基,置換基を有してもよい複素環残基,ハロゲン
原子,ニトロ基,シアノ基,スルホン酸基,−OR1,−S
R2,−COOR3,−NR4R5,−SO2NR6R7,−CONR8R9,−CH2
NHCOCH2NR10R11,−NHCOR12,−N=NR13,または−N
=CHR14を表わす。 R1,R2,R3,R4,R5,R6,R8,R9,R10およびR11は,互
いに同一であっても異なっていてもよく,水素原子,置
換基を有していてもよいアルキル基,アリール基,アシ
ル基,シクロアルキル基,またはポリエーテル基を表わ
し,または,R6とR7とで,R8とR9とで,あるいはR10とR
11とで,4〜7員環を形成していてもよく,これらの4〜
7員環はちっ素原子などのヘテロ原子を含む複素環であ
ってもよい。 R12,R13およびR14は,互いに同一であっても異なって
いてもよく,置換基を有するアルキル基,シクロアルキ
ル基,またはアリール基を表わす。 Yは,−OSR15, を表わす。 Zは,水素原子,ハロゲン原子,水酸基,置換基,を有
してもよいアルキル基,−OSR18, を表わす。 R15,R16,R17,R18,R19,およびR20は,互いに同一で
あっても異なっていてもよく,置換基を有してもよいア
ルキル基,アリール基,アシル基,シクロアルキル基,
アルコキシ基,アリロキシ基,ポリエーテル基,水酸
基,またはハロゲン原子を表わす。 Wは,O,S,Se,またはTeを表わす。 k,l,m,nは,それぞれ独立に0〜8の整数を表わす。 pは,0または1を表わす。〕1. An optical recording medium comprising a substrate and an organic thin film layer containing at least one naphthalocyanine compound represented by the following general formula [I]. General formula [I] [In the formula, M represents Al, Ga, In, Si, Ge, or Sn. X's may be the same or different from each other, and may have an alkyl group which may have a substituent, an aryl group which may have a substituent, a heterocyclic residue which may have a substituent, Halogen atom, nitro group, cyano group, sulfonic acid group, -OR 1 , -S
R 2 , -COOR 3 , -NR 4 R 5 , -SO 2 NR 6 R 7 , -CONR 8 R 9 , -CH 2
NHCOCH 2 NR 10 R 11 , -NHCOR 12 , -N = NR 13 , or -N
= Represents CHR 14 . R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 8 , R 9 , R 10 and R 11 may be the same or different from each other and have a hydrogen atom or a substituent. Represents an alkyl group, an aryl group, an acyl group, a cycloalkyl group, or a polyether group which may be substituted, or R 6 and R 7 , R 8 and R 9 , or R 10 and R
11 and 11 may form a 4- to 7-membered ring.
The 7-membered ring may be a heterocycle containing a hetero atom such as a nitrogen atom. R 12 , R 13 and R 14, which may be the same or different, each represents an alkyl group having a substituent, a cycloalkyl group or an aryl group. Y is -OSR 15 , Represents Z is a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group which may have a substituent, -OSR 18 , Represents R 15 , R 16 , R 17 , R 18 , R 19 , and R 20 may be the same or different from each other and may have a substituent, such as an alkyl group, an aryl group, an acyl group or a cyclo group. Alkyl group,
Represents an alkoxy group, an allyloxy group, a polyether group, a hydroxyl group, or a halogen atom. W represents O, S, Se, or Te. k, l, m, and n each independently represent an integer of 0-8. p represents 0 or 1. ]
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1007413A JP2507795B2 (en) | 1989-01-13 | 1989-01-13 | Optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1007413A JP2507795B2 (en) | 1989-01-13 | 1989-01-13 | Optical recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02187391A JPH02187391A (en) | 1990-07-23 |
JP2507795B2 true JP2507795B2 (en) | 1996-06-19 |
Family
ID=11665180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1007413A Expired - Fee Related JP2507795B2 (en) | 1989-01-13 | 1989-01-13 | Optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2507795B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102803409A (en) * | 2009-06-26 | 2012-11-28 | 惠普发展公司,有限责任合伙企业 | Ink-jet inks having polymers and near-infrared absorbing dyes |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006015415A1 (en) | 2004-08-09 | 2006-02-16 | Silverbrook Research Pty Ltd | Synthetically expedient water-dispersible ir dyes having improved lightfastness |
US7122076B2 (en) | 2004-08-09 | 2006-10-17 | Silverbrook Research Pty Ltd | Synthetically expedient water-dispersible IR dyes |
US7658792B2 (en) * | 2006-07-10 | 2010-02-09 | Silverbrook Research Pty Ltd | Gallium naphthalocyanine salts for use as improved infrared dyes |
US7709633B2 (en) * | 2006-07-10 | 2010-05-04 | Silverbrook Research Pty Ltd | Ink formulations comprising gallium naphthalocyanines |
-
1989
- 1989-01-13 JP JP1007413A patent/JP2507795B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102803409A (en) * | 2009-06-26 | 2012-11-28 | 惠普发展公司,有限责任合伙企业 | Ink-jet inks having polymers and near-infrared absorbing dyes |
CN102803409B (en) * | 2009-06-26 | 2014-06-11 | 惠普发展公司,有限责任合伙企业 | Ink-jet inks having polymers and near-infrared absorbing dyes |
US9133344B2 (en) | 2009-06-26 | 2015-09-15 | Hewlett-Packard Development Company, L.P. | Ink-jet inks having polymers and near-infrared absorbing dyes |
Also Published As
Publication number | Publication date |
---|---|
JPH02187391A (en) | 1990-07-23 |
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