JP2024002087A - metal oxide dispersion - Google Patents
metal oxide dispersion Download PDFInfo
- Publication number
- JP2024002087A JP2024002087A JP2022101069A JP2022101069A JP2024002087A JP 2024002087 A JP2024002087 A JP 2024002087A JP 2022101069 A JP2022101069 A JP 2022101069A JP 2022101069 A JP2022101069 A JP 2022101069A JP 2024002087 A JP2024002087 A JP 2024002087A
- Authority
- JP
- Japan
- Prior art keywords
- metal oxide
- carboxylic acid
- oxide dispersion
- aromatic
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 124
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 124
- 239000006185 dispersion Substances 0.000 title claims abstract description 101
- 239000002105 nanoparticle Substances 0.000 claims abstract description 47
- 239000002904 solvent Substances 0.000 claims abstract description 38
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 35
- 125000003118 aryl group Chemical group 0.000 claims abstract description 25
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims abstract description 24
- 150000001735 carboxylic acids Chemical class 0.000 claims abstract description 14
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 11
- 125000004423 acyloxy group Chemical group 0.000 claims abstract description 9
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 6
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims abstract description 6
- -1 Aromatic carboxylic acids Chemical class 0.000 claims description 23
- 239000007788 liquid Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 239000007787 solid Substances 0.000 claims description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 229910052733 gallium Inorganic materials 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 4
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 229910052684 Cerium Inorganic materials 0.000 claims description 2
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 2
- 229910052689 Holmium Inorganic materials 0.000 claims description 2
- 229910052765 Lutetium Inorganic materials 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- 229910052779 Neodymium Inorganic materials 0.000 claims description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052787 antimony Inorganic materials 0.000 claims description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 2
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims description 2
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052746 lanthanum Inorganic materials 0.000 claims description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 2
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 239000010955 niobium Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- 229910052702 rhenium Inorganic materials 0.000 claims description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- 239000010948 rhodium Substances 0.000 claims description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 229910052716 thallium Inorganic materials 0.000 claims description 2
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052727 yttrium Inorganic materials 0.000 claims description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- 230000035939 shock Effects 0.000 abstract description 17
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 42
- 239000011550 stock solution Substances 0.000 description 18
- 238000000576 coating method Methods 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 239000004094 surface-active agent Substances 0.000 description 11
- 239000002253 acid Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 125000004429 atom Chemical group 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- IEQWWMKDFZUMMU-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethyl)butanedioic acid Chemical compound OC(=O)CC(C(O)=O)CCOC(=O)C=C IEQWWMKDFZUMMU-UHFFFAOYSA-N 0.000 description 5
- UXTGJIIBLZIQPK-UHFFFAOYSA-N 3-(2-prop-2-enoyloxyethyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(CCOC(=O)C=C)=C1C(O)=O UXTGJIIBLZIQPK-UHFFFAOYSA-N 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 238000009736 wetting Methods 0.000 description 3
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical group CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- QIBUBNNYBJRUAV-UHFFFAOYSA-N 2-(2-ethylimidazol-1-yl)acetic acid Chemical compound CCC1=NC=CN1CC(O)=O QIBUBNNYBJRUAV-UHFFFAOYSA-N 0.000 description 2
- OXOWWPXTTOCKKU-UHFFFAOYSA-N 2-propoxybenzoic acid Chemical compound CCCOC1=CC=CC=C1C(O)=O OXOWWPXTTOCKKU-UHFFFAOYSA-N 0.000 description 2
- VRGQQLFRUKMDSW-UHFFFAOYSA-N 4-(4-pentylphenyl)benzoic acid Chemical compound C1=CC(CCCCC)=CC=C1C1=CC=C(C(O)=O)C=C1 VRGQQLFRUKMDSW-UHFFFAOYSA-N 0.000 description 2
- LAUFPZPAKULAGB-UHFFFAOYSA-N 4-butoxybenzoic acid Chemical compound CCCCOC1=CC=C(C(O)=O)C=C1 LAUFPZPAKULAGB-UHFFFAOYSA-N 0.000 description 2
- HBQUXMZZODHFMJ-UHFFFAOYSA-N 4-hexoxybenzoic acid Chemical compound CCCCCCOC1=CC=C(C(O)=O)C=C1 HBQUXMZZODHFMJ-UHFFFAOYSA-N 0.000 description 2
- CPEPWESLFZVUEP-UHFFFAOYSA-N 4-hexylbenzoic acid Chemical compound CCCCCCC1=CC=C(C(O)=O)C=C1 CPEPWESLFZVUEP-UHFFFAOYSA-N 0.000 description 2
- ZEYHEAKUIGZSGI-UHFFFAOYSA-N 4-methoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1 ZEYHEAKUIGZSGI-UHFFFAOYSA-N 0.000 description 2
- CWYNKKGQJYAHQG-UHFFFAOYSA-N 4-pentylbenzoic acid Chemical compound CCCCCC1=CC=C(C(O)=O)C=C1 CWYNKKGQJYAHQG-UHFFFAOYSA-N 0.000 description 2
- ATZHGRNFEFVDDJ-UHFFFAOYSA-N 4-propylbenzoic acid Chemical compound CCCC1=CC=C(C(O)=O)C=C1 ATZHGRNFEFVDDJ-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical group CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- FFOPEPMHKILNIT-UHFFFAOYSA-N Isopropyl butyrate Chemical compound CCCC(=O)OC(C)C FFOPEPMHKILNIT-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical group CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 125000005577 anthracene group Chemical group 0.000 description 2
- 230000003254 anti-foaming effect Effects 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N caprylic alcohol Chemical group CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical group CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000002296 dynamic light scattering Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical group CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- XOSNGXNHDRYFEF-UHFFFAOYSA-N monohexyl phthalate Chemical compound CCCCCCOC(=O)C1=CC=CC=C1C(O)=O XOSNGXNHDRYFEF-UHFFFAOYSA-N 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical group CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- GDFUWFOCYZZGQU-UHFFFAOYSA-N p-propyloxybenzoic acid Natural products CCCOC1=CC=C(C(O)=O)C=C1 GDFUWFOCYZZGQU-UHFFFAOYSA-N 0.000 description 2
- LPNBBFKOUUSUDB-UHFFFAOYSA-N p-toluic acid Chemical compound CC1=CC=C(C(O)=O)C=C1 LPNBBFKOUUSUDB-UHFFFAOYSA-N 0.000 description 2
- SVHOVVJFOWGYJO-UHFFFAOYSA-N pentabromophenol Chemical compound OC1=C(Br)C(Br)=C(Br)C(Br)=C1Br SVHOVVJFOWGYJO-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 229920003196 poly(1,3-dioxolane) Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical group COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 description 1
- OWSKJORLRSWYGK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) propanoate Chemical compound CCC(=O)OCCC(C)(C)OC OWSKJORLRSWYGK-UHFFFAOYSA-N 0.000 description 1
- ALSTYHKOOCGGFT-KTKRTIGZSA-N (9Z)-octadecen-1-ol Chemical compound CCCCCCCC\C=C/CCCCCCCCO ALSTYHKOOCGGFT-KTKRTIGZSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- WMDZKDKPYCNCDZ-UHFFFAOYSA-N 2-(2-butoxypropoxy)propan-1-ol Chemical compound CCCCOC(C)COC(C)CO WMDZKDKPYCNCDZ-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 1
- XYVAYAJYLWYJJN-UHFFFAOYSA-N 2-(2-propoxypropoxy)propan-1-ol Chemical compound CCCOC(C)COC(C)CO XYVAYAJYLWYJJN-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- FMVOPJLFZGSYOS-UHFFFAOYSA-N 2-[2-(2-ethoxypropoxy)propoxy]propan-1-ol Chemical compound CCOC(C)COC(C)COC(C)CO FMVOPJLFZGSYOS-UHFFFAOYSA-N 0.000 description 1
- YHBWXWLDOKIVCJ-UHFFFAOYSA-N 2-[2-(2-methoxyethoxy)ethoxy]acetic acid Chemical compound COCCOCCOCC(O)=O YHBWXWLDOKIVCJ-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- LBNDGEZENJUBCO-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethyl]butanedioic acid Chemical compound CC(=C)C(=O)OCCC(C(O)=O)CC(O)=O LBNDGEZENJUBCO-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- GCYHRYNSUGLLMA-UHFFFAOYSA-N 2-prop-2-enoxyethanol Chemical compound OCCOCC=C GCYHRYNSUGLLMA-UHFFFAOYSA-N 0.000 description 1
- BQKZEKVKJUIRGH-UHFFFAOYSA-N 2-prop-2-enoxypropan-1-ol Chemical compound OCC(C)OCC=C BQKZEKVKJUIRGH-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- DWTKNKBWDQHROK-UHFFFAOYSA-N 3-[2-(2-methylprop-2-enoyloxy)ethyl]phthalic acid Chemical compound CC(=C)C(=O)OCCC1=CC=CC(C(O)=O)=C1C(O)=O DWTKNKBWDQHROK-UHFFFAOYSA-N 0.000 description 1
- NTKBNCABAMQDIG-UHFFFAOYSA-N 3-butoxypropan-1-ol Chemical compound CCCCOCCCO NTKBNCABAMQDIG-UHFFFAOYSA-N 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- BEASLOLLYBRXSO-UHFFFAOYSA-N 4-(2-ethoxyethyl)benzoic acid Chemical compound CCOCCC1=CC=C(C(O)=O)C=C1 BEASLOLLYBRXSO-UHFFFAOYSA-N 0.000 description 1
- LKVFCSWBKOVHAH-UHFFFAOYSA-N 4-Ethoxyphenol Chemical compound CCOC1=CC=C(O)C=C1 LKVFCSWBKOVHAH-UHFFFAOYSA-N 0.000 description 1
- ZQVKTHRQIXSMGY-UHFFFAOYSA-N 4-Ethylbenzoic acid Chemical compound CCC1=CC=C(C(O)=O)C=C1 ZQVKTHRQIXSMGY-UHFFFAOYSA-N 0.000 description 1
- TXGWXGNDXYPWLF-UHFFFAOYSA-N 6-triethoxysilylhex-1-en-3-one Chemical compound CCO[Si](OCC)(OCC)CCCC(=O)C=C TXGWXGNDXYPWLF-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- XWHJQTQOUDOZGR-CMDGGOBGSA-N [(e)-hex-1-enyl]-trimethoxysilane Chemical compound CCCC\C=C\[Si](OC)(OC)OC XWHJQTQOUDOZGR-CMDGGOBGSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- BTMVHUNTONAYDX-UHFFFAOYSA-N butyl propionate Chemical compound CCCCOC(=O)CC BTMVHUNTONAYDX-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- YGUFXEJWPRRAEK-UHFFFAOYSA-N dodecyl(triethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OCC)(OCC)OCC YGUFXEJWPRRAEK-UHFFFAOYSA-N 0.000 description 1
- SCPWMSBAGXEGPW-UHFFFAOYSA-N dodecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OC)(OC)OC SCPWMSBAGXEGPW-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- FJAKCEHATXBFJT-UHFFFAOYSA-N ethyl 2-oxobutanoate Chemical compound CCOC(=O)C(=O)CC FJAKCEHATXBFJT-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- RSKGMYDENCAJEN-UHFFFAOYSA-N hexadecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OC)(OC)OC RSKGMYDENCAJEN-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- CXHHBNMLPJOKQD-UHFFFAOYSA-M methyl carbonate Chemical compound COC([O-])=O CXHHBNMLPJOKQD-UHFFFAOYSA-M 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Chemical group CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 229940055577 oleyl alcohol Drugs 0.000 description 1
- XMLQWXUVTXCDDL-UHFFFAOYSA-N oleyl alcohol Natural products CCCCCCC=CCCCCCCCCCCO XMLQWXUVTXCDDL-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical group O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid group Chemical group C(C=1C(C(=O)O)=CC=CC1)(=O)O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical group CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- OYGYKEULCAINCL-UHFFFAOYSA-N triethoxy(hexadecyl)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC OYGYKEULCAINCL-UHFFFAOYSA-N 0.000 description 1
- SDIRFAFFHXXYEL-UHFFFAOYSA-N triethoxy(oct-1-enyl)silane Chemical compound CCCCCCC=C[Si](OCC)(OCC)OCC SDIRFAFFHXXYEL-UHFFFAOYSA-N 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- DVFZJTWMDGYBCD-VAWYXSNFSA-N triethoxy-[(e)-hex-1-enyl]silane Chemical compound CCCC\C=C\[Si](OCC)(OCC)OCC DVFZJTWMDGYBCD-VAWYXSNFSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- ZYMHKOVQDOFPHH-UHFFFAOYSA-N trimethoxy(oct-1-enyl)silane Chemical compound CCCCCCC=C[Si](OC)(OC)OC ZYMHKOVQDOFPHH-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical compound CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Oxygen, Ozone, And Oxides In General (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Abstract
Description
本発明は、金属酸化物分散液に関する。 The present invention relates to metal oxide dispersions.
ハードマスク等に用いられる金属酸化物膜は、金属酸化物分散液をスピンコート法、インクジェット法等の液相塗布法により成膜することで形成することができる。金属酸化物分散液としては、例えば、有機溶剤、この有機溶剤中に分散した金属酸化物ナノ粒子、この溶剤中に溶解した特定構造の高炭素ポリマーを含むコーティング組成物が公知である(特許文献1を参照)。 A metal oxide film used for a hard mask or the like can be formed by forming a metal oxide dispersion liquid by a liquid phase coating method such as a spin coating method or an inkjet method. As metal oxide dispersions, coating compositions containing, for example, an organic solvent, metal oxide nanoparticles dispersed in this organic solvent, and a high carbon polymer with a specific structure dissolved in this solvent are known (Patent Document 1).
金属酸化物分散液を塗布する装置では、酢酸ブチル又はγ-ブチロラクトン等の溶媒が配管洗浄や、プリウェット等のプロセスで使用される。その際、金属酸化物分散液は、上記溶媒の添加により、経時で、白濁したり沈殿を発生させたりする現象、即ち、ソルベントショックの発生が抑制されていることが求められる。一方で、金属酸化物分散液は、それ自体の経時安定性に優れることも求められる。 In devices that apply metal oxide dispersions, solvents such as butyl acetate or γ-butyrolactone are used in processes such as pipe cleaning and pre-wetting. In this case, the metal oxide dispersion is required to be prevented from becoming cloudy or forming a precipitate over time due to the addition of the above-mentioned solvent, that is, the occurrence of solvent shock. On the other hand, the metal oxide dispersion itself is also required to have excellent stability over time.
本発明は、このような従来の実情に鑑みてなされたものであり、優れた経時安定性を有し、ソルベントショックの発生が抑制された金属酸化物分散液を提供することを目的とする。 The present invention has been made in view of such conventional circumstances, and an object of the present invention is to provide a metal oxide dispersion having excellent stability over time and suppressing the occurrence of solvent shock.
本発明者らは、上記課題を解決するため鋭意研究を重ねた。その結果、所定の芳香族カルボン酸である第1のカルボン酸と、キャッピング剤で表面処理された金属酸化物ナノ粒子と、溶剤と、を含有する金属酸化物分散液であって、前記キャッピング剤は、エステル結合及び重合性二重結合を有する第2のカルボン酸を含み、前記第2のカルボン酸は、前記第1のカルボン酸とは異なる金属酸化物分散液により上記課題を解決できることを見出し、本発明を完成するに至った。具体的には、本発明は以下のものを提供する。 The present inventors have conducted extensive research to solve the above problems. As a result, a metal oxide dispersion containing a first carboxylic acid that is a predetermined aromatic carboxylic acid, metal oxide nanoparticles whose surface has been treated with a capping agent, and a solvent, the metal oxide dispersion containing the capping agent has found that the above problem can be solved by a metal oxide dispersion containing a second carboxylic acid having an ester bond and a polymerizable double bond, the second carboxylic acid being different from the first carboxylic acid. , we have completed the present invention. Specifically, the present invention provides the following.
本発明の一態様は、
アルキル基で置換された芳香環を有する芳香族カルボン酸、アルコキシ基で置換された芳香環を有する芳香族カルボン酸、アルコキシカルボニル基で置換された芳香環を有する芳香族カルボン酸、及びアシルオキシ基で置換された芳香環を有する芳香族カルボン酸からなる群より選択される少なくとも1種の芳香族カルボン酸である第1のカルボン酸と、
キャッピング剤で表面処理された金属酸化物ナノ粒子と、
溶剤と、
を含有する金属酸化物分散液であって、
前記キャッピング剤は、エステル結合及び重合性二重結合を有する第2のカルボン酸を含み、
前記第2のカルボン酸は、前記第1のカルボン酸とは異なる
金属酸化物分散液である。
One aspect of the present invention is
Aromatic carboxylic acids having aromatic rings substituted with alkyl groups, aromatic carboxylic acids having aromatic rings substituted with alkoxy groups, aromatic carboxylic acids having aromatic rings substituted with alkoxycarbonyl groups, and acyloxy groups. a first carboxylic acid that is at least one aromatic carboxylic acid selected from the group consisting of aromatic carboxylic acids having a substituted aromatic ring;
metal oxide nanoparticles surface-treated with a capping agent;
solvent and
A metal oxide dispersion containing,
The capping agent includes a second carboxylic acid having an ester bond and a polymerizable double bond,
The second carboxylic acid is a metal oxide dispersion liquid different from the first carboxylic acid.
本発明によれば、優れた経時安定性を有し、ソルベントショックの発生が抑制された金属酸化物分散液を提供することができる。 According to the present invention, it is possible to provide a metal oxide dispersion that has excellent stability over time and suppresses the occurrence of solvent shock.
<金属酸化物分散液>
本発明に係る金属酸化物分散液は、アルキル基で置換された芳香環を有する芳香族カルボン酸、アルコキシ基で置換された芳香環を有する芳香族カルボン酸、アルコキシカルボニル基で置換された芳香環を有する芳香族カルボン酸、及びアシルオキシ基で置換された芳香環を有する芳香族カルボン酸からなる群より選択される少なくとも1種の芳香族カルボン酸である第1のカルボン酸と、キャッピング剤で表面処理された金属酸化物ナノ粒子と、溶剤と、を含有し、前記キャッピング剤は、エステル結合及び重合性二重結合を有する第2のカルボン酸を含み、前記第2のカルボン酸は、前記第1のカルボン酸とは異なる。本発明に係る金属酸化物分散液は、優れた経時安定性を有し、ソルベントショックの発生が抑制されている。
<Metal oxide dispersion>
The metal oxide dispersion according to the present invention includes an aromatic carboxylic acid having an aromatic ring substituted with an alkyl group, an aromatic carboxylic acid having an aromatic ring substituted with an alkoxy group, and an aromatic ring substituted with an alkoxycarbonyl group. and an aromatic carboxylic acid having an aromatic ring substituted with an acyloxy group. the capping agent contains a second carboxylic acid having an ester bond and a polymerizable double bond, and the second carboxylic acid contains treated metal oxide nanoparticles and a solvent. It is different from the carboxylic acid in No. 1. The metal oxide dispersion according to the present invention has excellent stability over time and suppresses the occurrence of solvent shock.
前記金属酸化物分散液の固形分において、無機分質量と有機分質量との合計に対する無機分質量の割合は、25質量%以上であり、好ましく30質量%以上であり、より好ましく40質量%以上である。当該割合が上記の範囲内であると、無機分質量の割合を高く設定でき、その結果、金属酸化物分散液において、無機分質量の割合を向上させやすい。当該割合の上限は、特に限定されず、90質量%でよく、80質量%でも75質量%でもよい。 In the solid content of the metal oxide dispersion, the ratio of the inorganic mass to the total of the inorganic mass and the organic mass is 25% by mass or more, preferably 30% by mass or more, and more preferably 40% by mass or more. It is. When the ratio is within the above range, the ratio of the inorganic component mass can be set high, and as a result, the ratio of the inorganic component mass can be easily increased in the metal oxide dispersion. The upper limit of the ratio is not particularly limited, and may be 90% by mass, 80% by mass, or 75% by mass.
[第1のカルボン酸]
第1のカルボン酸は、アルキル基で置換された芳香環を有する芳香族カルボン酸、アルコキシ基で置換された芳香環を有する芳香族カルボン酸、アルコキシカルボニル基で置換された芳香環を有する芳香族カルボン酸、及びアシルオキシ基で置換された芳香環を有する芳香族カルボン酸からなる群より選択される少なくとも1種の芳香族カルボン酸である。第1のカルボン酸は、1種単独で用いても、2種以上を併用してもよい。
[First carboxylic acid]
The first carboxylic acid is an aromatic carboxylic acid having an aromatic ring substituted with an alkyl group, an aromatic carboxylic acid having an aromatic ring substituted with an alkoxy group, and an aromatic carboxylic acid having an aromatic ring substituted with an alkoxycarbonyl group. At least one aromatic carboxylic acid selected from the group consisting of carboxylic acid and aromatic carboxylic acid having an aromatic ring substituted with an acyloxy group. The first carboxylic acid may be used alone or in combination of two or more.
第1のカルボン酸に属する芳香族カルボン酸が有する芳香環としては、特に限定されず、例えば、ベンゼン環、ナフタレン環、アントラセン環、ビフェニル環等が挙げられ、経時安定性の向上、ソルベントショックの発生抑制等の観点から、ベンゼン環が好ましい。 The aromatic ring possessed by the aromatic carboxylic acid belonging to the first carboxylic acid is not particularly limited, and includes, for example, a benzene ring, a naphthalene ring, an anthracene ring, a biphenyl ring, etc., which improves stability over time and prevents solvent shock. From the viewpoint of suppressing generation, etc., a benzene ring is preferred.
上記アルキル基は、直鎖状であっても、分岐鎖状であってもよく、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、tert-ブチル基、n-ペンチル基、イソペンチル基、sec-ペンチル基、tert-ペンチル基、n-ヘキシル基、イソヘキシル基、sec-ヘキシル基、及びtert-ヘキシル基等の炭素原子数1以上18以下のアルキル基が挙げられ、炭素原子数2以上8以下のアルキル基が好ましく、炭素原子数3以上6以下のアルキル基がより好ましい。 The alkyl group may be linear or branched, and includes, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a tert-butyl group, an n-pentyl group, and an isopentyl group. Examples include alkyl groups having 1 to 18 carbon atoms, such as sec-pentyl group, tert-pentyl group, n-hexyl group, isohexyl group, sec-hexyl group, and tert-hexyl group; An alkyl group having 8 or more carbon atoms is preferable, and an alkyl group having 3 or more and 6 or less carbon atoms is more preferable.
上記アルコキシ基に含まれるアルキル基は、上記と同様である。 The alkyl group contained in the alkoxy group is the same as above.
上記アルコキシカルボニル基に含まれるアルキル基は、上記と同様である。 The alkyl group contained in the alkoxycarbonyl group is the same as above.
上記アシルオキシ基としては、例えば、ホルミルオキシ基、アセチルオキシ基、プロピオニルオキシ基、n-ブチリルオキシ基、イソブチリルオキシ基、ベンゾイルオキシ基等の炭素原子数1以上18以下のアシルオキシ基が挙げられ、炭素原子数2以上8以下のアシルオキシ基が好ましく、炭素原子数3以上6以下のアシルオキシ基がより好ましい。 Examples of the acyloxy group include acyloxy groups having 1 to 18 carbon atoms such as formyloxy group, acetyloxy group, propionyloxy group, n-butyryloxy group, isobutyryloxy group, and benzoyloxy group, An acyloxy group having 2 to 8 carbon atoms is preferred, and an acyloxy group having 3 to 6 carbon atoms is more preferred.
第1のカルボン酸の具体例としては、4-メチル安息香酸、4-エチル安息香酸、4-n-プロピル安息香酸、4-n-ブチル安息香酸、4-n-ペンチル安息香酸、4-n-ヘキシル安息香酸、4-メトキシ安息香酸、4-エトキシエチル安息香酸、4-n-プロポキシ安息香酸、2-n-プロポキシ安息香酸、4-n-ブトキシ安息香酸、4-(n-ヘキシルオキシ)安息香酸、4-n-ペンチル-4’-ビフェニルカルボン酸、フタル酸モノn-ヘキシルが挙げられ、経時安定性の向上、ソルベントショックの発生抑制等の観点から、4-n-プロピル安息香酸、4-n-ブチル安息香酸、4-n-ペンチル安息香酸、4-n-ヘキシル安息香酸、4-n-プロポキシ安息香酸、2-n-プロポキシ安息香酸、4-n-ブトキシ安息香酸、4-(n-ヘキシルオキシ)安息香酸、4-n-ペンチル-4’-ビフェニルカルボン酸、及びフタル酸モノn-ヘキシルが好ましい。 Specific examples of the first carboxylic acid include 4-methylbenzoic acid, 4-ethylbenzoic acid, 4-n-propylbenzoic acid, 4-n-butylbenzoic acid, 4-n-pentylbenzoic acid, 4-n- -Hexylbenzoic acid, 4-methoxybenzoic acid, 4-ethoxyethylbenzoic acid, 4-n-propoxybenzoic acid, 2-n-propoxybenzoic acid, 4-n-butoxybenzoic acid, 4-(n-hexyloxy) Examples include benzoic acid, 4-n-pentyl-4'-biphenylcarboxylic acid, and mono-n-hexyl phthalate.From the viewpoint of improving stability over time and suppressing the occurrence of solvent shock, 4-n-propylbenzoic acid, 4-n-butylbenzoic acid, 4-n-pentylbenzoic acid, 4-n-hexylbenzoic acid, 4-n-propoxybenzoic acid, 2-n-propoxybenzoic acid, 4-n-butoxybenzoic acid, 4- (n-hexyloxy)benzoic acid, 4-n-pentyl-4'-biphenylcarboxylic acid, and mono-n-hexyl phthalate are preferred.
第1のカルボン酸の使用量は特に限定されず、金属酸化物分散液における溶剤以外の成分の合計に対して、好ましくは1~20質量%であり、より好ましくは3~15質量%であり、更により好ましくは5~10質量%である。第1のカルボン酸の使用量が上記の範囲内であると、金属酸化物分散液は、経時安定性が向上しやすく、ソルベントショックの発生が抑制されやすい。 The amount of the first carboxylic acid used is not particularly limited, and is preferably 1 to 20% by mass, more preferably 3 to 15% by mass, based on the total of components other than the solvent in the metal oxide dispersion. , even more preferably 5 to 10% by weight. When the amount of the first carboxylic acid used is within the above range, the stability of the metal oxide dispersion liquid over time is likely to be improved, and the occurrence of solvent shock is likely to be suppressed.
第1のカルボン酸は、前記金属酸化物ナノ粒子とは別個に前記金属酸化物分散液中に存在し、かつ/又は、前記キャッピング剤中に存在している。即ち、第1のカルボン酸は、キャッピング剤と同様に金属酸化物ナノ粒子を覆っていてもよいし、遊離した状態で金属酸化物分散液中に存在していてもよい。 A first carboxylic acid is present in the metal oxide dispersion separately from the metal oxide nanoparticles and/or in the capping agent. That is, the first carboxylic acid may cover the metal oxide nanoparticles like the capping agent, or may exist in a free state in the metal oxide dispersion.
金属酸化物分散液の固形分の質量に対して、金属酸化物ナノ粒子とは別個に前記金属酸化物分散液中に存在している第1のカルボン酸の質量の割合は、10質量以下であることが好ましく、1~9質量%であることがより好ましく、3~8質量%であることが更により好ましい。上記割合が上記の範囲内であると、金属酸化物分散液は、経時安定性が向上しやすく、ソルベントショックの発生が抑制されやすい。 The ratio of the mass of the first carboxylic acid present in the metal oxide dispersion separately from the metal oxide nanoparticles to the mass of the solid content of the metal oxide dispersion is 10 mass or less. The amount is preferably 1 to 9% by weight, more preferably 1 to 9% by weight, and even more preferably 3 to 8% by weight. When the ratio is within the above range, the metal oxide dispersion liquid tends to have improved stability over time, and the occurrence of solvent shock is likely to be suppressed.
[キャッピング剤で表面処理された金属酸化物ナノ粒子]
金属酸化物分散液は、キャッピング剤で表面処理された金属酸化物ナノ粒子を含む。本明細書において、金属酸化物ナノ粒子は、金属酸化物からなり、キャッピング剤は含まない。前記キャッピング剤は、エステル結合及び重合性二重結合を有する第2のカルボン酸を含み、前記第2のカルボン酸は、前記第1のカルボン酸とは異なる。キャッピング剤で表面処理された金属酸化物ナノ粒子は、1種単独で用いても、2種以上を併用してもよい。金属酸化物分散液が、キャッピング剤で表面処理された金属酸化物ナノ粒子を含有すると、金属酸化物分散液は、経時安定性が向上しやすく、ソルベントショックの発生が抑制されやすい。
[Metal oxide nanoparticles surface treated with capping agent]
The metal oxide dispersion includes metal oxide nanoparticles that are surface treated with a capping agent. As used herein, metal oxide nanoparticles consist of a metal oxide and do not contain a capping agent. The capping agent includes a second carboxylic acid having an ester bond and a polymerizable double bond, and the second carboxylic acid is different from the first carboxylic acid. The metal oxide nanoparticles surface-treated with a capping agent may be used alone or in combination of two or more. When the metal oxide dispersion liquid contains metal oxide nanoparticles that have been surface-treated with a capping agent, the stability of the metal oxide dispersion liquid over time is likely to improve, and the occurrence of solvent shock is likely to be suppressed.
金属酸化物ナノ粒子の平均粒子径は、好ましくは5nm以下であり、より好ましくは4nm以下であり、更により好ましくは3nm以下である。金属酸化物ナノ粒子の平均粒子径の下限は、特に限定されず、例えば、0.5nm以上でよく、1nm以上でも2nm以上でもよい。金属酸化物ナノ粒子の平均粒子径が上記範囲内であると、金属酸化物分散液は、経時安定性がより向上しやすく、ソルベントショックの発生が抑制されやすい。本明細書において、金属酸化物ナノ粒子の平均粒子径とは、X線回折装置(SmartLab、株式会社リガク製)により、XRD測定を行い、得られた結果を付属ソフトウェアのPDXLで解析し、Halder-Wagner法にて求めた値をいう。 The average particle diameter of the metal oxide nanoparticles is preferably 5 nm or less, more preferably 4 nm or less, and even more preferably 3 nm or less. The lower limit of the average particle diameter of the metal oxide nanoparticles is not particularly limited, and may be, for example, 0.5 nm or more, 1 nm or more, or 2 nm or more. When the average particle diameter of the metal oxide nanoparticles is within the above range, the stability of the metal oxide dispersion liquid over time is more likely to be improved, and the occurrence of solvent shock is more likely to be suppressed. In this specification, the average particle diameter of metal oxide nanoparticles refers to XRD measurement performed using an X-ray diffraction device (SmartLab, manufactured by Rigaku Co., Ltd.), and the obtained results are analyzed using the attached software PDXL. - Refers to the value determined using the Wagner method.
キャッピング剤で表面処理された金属酸化物ナノ粒子の平均粒子径は、好ましくは10nm以下であり、より好ましくは8nm以下であり、更により好ましくは6nm以下である。下限は、特に限定されず、例えば、0.5nm以上でよく、1nm以上でも2nm以上でもよい。本明細書において、キャッピング剤で表面処理された金属酸化物ナノ粒子の平均粒子径とは、Malvern Zetasizer Nano S等の動的光散乱(DLS)装置により測定された値をいう。 The average particle diameter of the metal oxide nanoparticles surface-treated with a capping agent is preferably 10 nm or less, more preferably 8 nm or less, and even more preferably 6 nm or less. The lower limit is not particularly limited, and may be, for example, 0.5 nm or more, 1 nm or more, or 2 nm or more. As used herein, the average particle diameter of metal oxide nanoparticles surface-treated with a capping agent refers to a value measured using a dynamic light scattering (DLS) device such as Malvern Zetasizer Nano S.
金属酸化物ナノ粒子に含まれる金属としては、特に限定されず、例えば、亜鉛、イットリウム、ハフニウム、ジルコニウム、ランタン、セリウム、ネオジム、ガドリニウム、ホルミウム、ルテチウム、タンタル、チタン、ケイ素、アルミニウム、アンチモン、錫、インジウム、タングステン、銅、バナジウム、クロム、ニオブ、モリブデン、ルテニウム、ロジウム、レニウム、イリジウム、ゲルマニウム、ガリウム、タリウム、マグネシウムが挙げられ、製膜性、安定性等の観点から、ハフニウム、ジルコニウム、チタン、及び錫が好ましく、ジルコニウムがより好ましい。上記金属は、1種単独で用いても、2種以上を併用してもよい。 The metals contained in the metal oxide nanoparticles are not particularly limited, and include, for example, zinc, yttrium, hafnium, zirconium, lanthanum, cerium, neodymium, gadolinium, holmium, lutetium, tantalum, titanium, silicon, aluminum, antimony, and tin. , indium, tungsten, copper, vanadium, chromium, niobium, molybdenum, ruthenium, rhodium, rhenium, iridium, germanium, gallium, thallium, and magnesium.From the viewpoint of film formability and stability, hafnium, zirconium, titanium , and tin are preferred, and zirconium is more preferred. The above metals may be used alone or in combination of two or more.
金属酸化物ナノ粒子は、金属原子と酸素原子とからなるものであってもよいし、金属原子と酸素原子と金属原子及び酸素原子以外の原子とからなるものであってもよい。金属原子及び酸素原子以外の原子としては、例えば、窒素原子が挙げられる。よって、金属酸化物ナノ粒子は、金属酸化物からなるものであっても、金属酸窒化物等からなるものであってもよい。 The metal oxide nanoparticles may be composed of metal atoms and oxygen atoms, or may be composed of metal atoms, oxygen atoms, and atoms other than metal atoms and oxygen atoms. Examples of atoms other than metal atoms and oxygen atoms include nitrogen atoms. Therefore, the metal oxide nanoparticles may be made of a metal oxide, a metal oxynitride, or the like.
本発明に係る金属酸化物分散液において、金属酸化物ナノ粒子の表面の一部又は全部は、キャッピング剤に覆われているものと推測される。キャッピング剤は、エステル結合及び重合性二重結合を有する第2のカルボン酸を含み、前記第2のカルボン酸は、前記第1のカルボン酸とは異なる。本発明に係る金属酸化物分散液において、金属酸化物ナノ粒子が上記キャッピング剤で表面処理されていると、金属酸化物ナノ粒子は、溶剤への分散性が安定しやすく、また、金属酸化物分散液は、経時安定性がより向上しやすく、ソルベントショックの発生が抑制されやすい。 In the metal oxide dispersion according to the present invention, it is presumed that part or all of the surfaces of the metal oxide nanoparticles are covered with a capping agent. The capping agent includes a second carboxylic acid having an ester bond and a polymerizable double bond, and the second carboxylic acid is different from the first carboxylic acid. In the metal oxide dispersion according to the present invention, when the metal oxide nanoparticles are surface-treated with the above-mentioned capping agent, the metal oxide nanoparticles tend to have stable dispersibility in a solvent, and The stability of the dispersion liquid over time is more likely to be improved, and the occurrence of solvent shock is more likely to be suppressed.
前記第2のカルボン酸は、エステル結合及び重合性二重結合を有する限り、特に限定されず、例えば、ポリオール中の1個のヒドロキシ基とポリカルボン酸中の1個のカルボキシ基とがエステル結合を形成し、かつ、前記ポリオール中の他の1個のヒドロキシ基と(メタ)アクリル酸中のカルボキシ基とがエステル結合を形成しているカルボン酸が挙げられ、より具体的には、エチレングリコール等のジオール中の1個のヒドロキシ基とコハク酸、フタル酸等のジカルボン酸中の1個のカルボキシ基とがエステル結合を形成し、かつ、前記ジオール中のもう1個のヒドロキシ基と(メタ)アクリル酸中のカルボキシ基とがエステル結合を形成しているカルボン酸が挙げられる。上記第2のカルボン酸は、1種単独で用いても、2種以上を併用してもよい。 The second carboxylic acid is not particularly limited as long as it has an ester bond and a polymerizable double bond. For example, one hydroxy group in the polyol and one carboxy group in the polycarboxylic acid form an ester bond. and in which another hydroxy group in the polyol and a carboxy group in (meth)acrylic acid form an ester bond; more specifically, ethylene glycol One hydroxy group in a diol such as succinic acid, one carboxy group in a dicarboxylic acid such as phthalic acid forms an ester bond, and another hydroxy group in the diol (meth) forms an ester bond. ) Examples include carboxylic acids in which the carboxy group in acrylic acid forms an ester bond. The second carboxylic acid may be used alone or in combination of two or more.
前記第2のカルボン酸は、芳香環を有してもよい。前記第2のカルボン酸が芳香環を有すると、金属酸化物分散液は、ソルベントショックの発生が抑制されやすい。芳香環としては、特に限定されず、例えば、ベンゼン環、ナフタレン環、アントラセン環、ビフェニル環等が挙げられ、キャッピング剤と金属酸化物ナノ粒子と反応性等の観点から、ベンゼン環が好ましい。 The second carboxylic acid may have an aromatic ring. When the second carboxylic acid has an aromatic ring, the occurrence of solvent shock in the metal oxide dispersion is likely to be suppressed. The aromatic ring is not particularly limited, and includes, for example, a benzene ring, a naphthalene ring, an anthracene ring, a biphenyl ring, etc., and a benzene ring is preferred from the viewpoint of reactivity with the capping agent and metal oxide nanoparticles.
前記第2のカルボン酸の具体例としては、2-アクリロイルオキシエチルフタル酸、2-メタクリロイルオキシエチルフタル酸、2-アクリロイルオキシエチルコハク酸、2-メタクリロイルオキシエチルコハク酸等が挙げられ、キャッピング剤と金属酸化物ナノ粒子と反応性等の観点から、2-アクリロイルオキシエチルフタル酸及び2-アクリロイルオキシエチルコハク酸が好ましい。 Specific examples of the second carboxylic acid include 2-acryloyloxyethyl phthalic acid, 2-methacryloyloxyethyl phthalic acid, 2-acryloyloxyethylsuccinic acid, 2-methacryloyloxyethylsuccinic acid, etc. From the viewpoint of reactivity with metal oxide nanoparticles and metal oxide nanoparticles, 2-acryloyloxyethyl phthalic acid and 2-acryloyloxyethyl succinic acid are preferred.
キャッピング剤は、その他のキャッピング剤を含んでもよい。その他のキャッピング剤としては、例えば、アルコキシシラン、フェノール、アルコール、第2のカルボン酸以外のカルボン酸、及びカルボン酸ハライドからなる群から選択される少なくとも1種が挙げられる。その他のキャッピング剤の具体例としては、n-プロピルトリメトキシシラン、n-プロピルトリエトキシシラン、n-オクチルトリメトキシシラン、n-オクチルトリエトキシシラン、n-ドデシルトリメトキシシラン、n-ドデシルトリエトキシシラン、n-ヘキサデシルトリメトキシシラン、n-ヘキサデシルトリエトキシシラン、n-オクタデシルトリメトキシシラン、n-オクタデシルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、フェネチルフェニルトリメトキシシラン、フェネチルエチルトリエトキシシラン、3-{2-メトキシ[ポリ(エチレンオキシ)]}プロピルトリメトキシシラン、3-{2-メトキシ[ポリ(エチレンオキシ)]}プロピルトリエトキシシラン、3-{2-メトキシ[トリ(エチレンオキシ)]}プロピルトリメトキシシラン、3-{2-メトキシ[トリ(エチレンオキシ)]}プロピルトリエトキシシラン、ビニルトリメトキシラン、ビニルトリエトキシシラン、アリルトリメトキシシラン、アリルトリエトキシシラン、1-ヘキセニルトリメトキシシラン,1-ヘキセニルトリエトキシシラン、1-オクテニルトリメトキシシラン、1-オクテニルトリエトキシシラン、3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、3-メルカプトプロピルトリメトキシシラン、3-メルカプトプロピルトリエトキシシラン、3-アクリロイルオキシプロピルトリメトキシシラン、3-アクリロイルプロピルトリエトキシシラン、3-メタクリロイルオキシプロピルトリメトキシシラン、3-メタクリロイルオキシプロピルトリエトキシシラン、3-イソシアナトプロピルトリメトキシシラン、3-イソシアナトプロピルトリエトキシシラン、3-グリシドキシプロピルトリメトキシシラン、及び3-グリシドキシプロピルトリエトキシシラン等のアルコキシシラン;フェノール等のフェノール類;エタノール、n-プロパノール、イソプロパノール、n-ブタノール、n-ヘプタノール、n-ヘキサノール、n-オクタノール、n-ドデシルアルコール、n-オクタデカノール、ベンジルアルコール、及びトリエチレングリコールモノメチルエーテル等の不飽和基非含有アルコール類;2-ヒドロキシエチル(メタ)アクリレート、3-ヒドロキシプロピル(メタ)アクリレート、アリルアルコール、オレイルアルコール、エチレングリコールモノアリルエーテル、プロピレングリコールモノアリルエーテル、及び3-アリルオキシプロパノール等の不飽和基含有アルコール類;オクタン酸、酢酸、プロピオン酸、2-[2-(メトキシエトキシ)エトキシ]酢酸、オレイン酸、ラウリン酸、安息香酸等の酸類;及びこれらの酸類の酸クロライド等の、これらの酸類の酸ハライド類が挙げられ、好ましくは、アルコキシシラン、不飽和基含有アルコール類、又は酸類として挙げた化合物である。上記その他のキャッピング剤は、1種単独で用いても、2種以上を併用してもよい。 The capping agent may also include other capping agents. Examples of other capping agents include at least one selected from the group consisting of alkoxysilanes, phenols, alcohols, carboxylic acids other than the second carboxylic acid, and carboxylic acid halides. Specific examples of other capping agents include n-propyltrimethoxysilane, n-propyltriethoxysilane, n-octyltrimethoxysilane, n-octyltriethoxysilane, n-dodecyltrimethoxysilane, and n-dodecyltriethoxysilane. Silane, n-hexadecyltrimethoxysilane, n-hexadecyltriethoxysilane, n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenethylphenyltrimethoxysilane, phenethyl ethyl Triethoxysilane, 3-{2-methoxy[poly(ethyleneoxy)]}propyltrimethoxysilane, 3-{2-methoxy[poly(ethyleneoxy)]}propyltriethoxysilane, 3-{2-methoxy[trimethoxysilane] (ethyleneoxy)]}propyltrimethoxysilane, 3-{2-methoxy[tri(ethyleneoxy)]}propyltriethoxysilane, vinyltrimethoxylane, vinyltriethoxysilane, allyltrimethoxysilane, allyltriethoxysilane, 1-hexenyltrimethoxysilane, 1-hexenyltriethoxysilane, 1-octenyltrimethoxysilane, 1-octenyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-mercaptopropyl Trimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-acryloyloxypropyltrimethoxysilane, 3-acryloylpropyltriethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-methacryloyloxypropyltriethoxysilane, 3-isocyane Alkoxysilanes such as natopropyltrimethoxysilane, 3-isocyanatopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, and 3-glycidoxypropyltriethoxysilane; Phenols such as phenol; ethanol, n- Alcohols without unsaturated groups such as propanol, isopropanol, n-butanol, n-heptanol, n-hexanol, n-octanol, n-dodecyl alcohol, n-octadecanol, benzyl alcohol, and triethylene glycol monomethyl ether; Alcohols containing unsaturated groups such as 2-hydroxyethyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, allyl alcohol, oleyl alcohol, ethylene glycol monoallyl ether, propylene glycol monoallyl ether, and 3-allyloxypropanol ; Acids such as octanoic acid, acetic acid, propionic acid, 2-[2-(methoxyethoxy)ethoxy]acetic acid, oleic acid, lauric acid, benzoic acid; and acid halides of these acids, such as acid chlorides of these acids; Preferred examples include alkoxysilanes, unsaturated group-containing alcohols, and the compounds listed as acids. The other capping agents mentioned above may be used alone or in combination of two or more.
金属酸化物ナノ粒子をキャッピング剤で表面処理する際のキャッピング剤の使用量は特に限定されない。好ましくは、金属酸化物ナノ粒子の表面のヒドロキシ基のほぼ全てと反応するのに十分な量のキャッピング剤が使用される。 The amount of capping agent used when surface treating metal oxide nanoparticles with a capping agent is not particularly limited. Preferably, a sufficient amount of capping agent is used to react with substantially all of the hydroxy groups on the surface of the metal oxide nanoparticles.
金属酸化物分散液中の金属酸化物ナノ粒子の含有量は、本発明の目的を阻害しない範囲で特に限定されず、金属酸化物分散液における溶剤以外の成分の合計に対して、5質量%以上99質量%以下が好ましく、30質量%以上98質量%以下がより好ましく、60質量%以上97質量%以下が更により好ましい。当該含有量が上記の範囲内であると、金属酸化物分散液は、経時安定性が向上しやすく、ソルベントショックの発生が抑制されやすい。なお、金属酸化物ナノ粒子の上記含有量は、金属酸化物ナノ粒子の表面に存在するキャッピング剤の含有量を含む。 The content of metal oxide nanoparticles in the metal oxide dispersion is not particularly limited as long as it does not impede the object of the present invention, and is 5% by mass based on the total of components other than the solvent in the metal oxide dispersion. The content is preferably 99% by mass or less, more preferably 30% by mass or more and 98% by mass or less, and even more preferably 60% by mass or more and 97% by mass or less. When the content is within the above range, the metal oxide dispersion liquid tends to have improved stability over time, and the occurrence of solvent shock is likely to be suppressed. Note that the above content of the metal oxide nanoparticles includes the content of the capping agent present on the surface of the metal oxide nanoparticles.
[溶剤]
本発明に係る金属酸化物分散液は、塗布性や粘度の調整の目的で、溶剤を含有する。溶剤としては、典型的には有機溶剤が用いられる。有機溶剤の種類は、金属酸化物分散液に含まれる成分を均一に溶解又は分散させることができれば、特に限定されない。
[solvent]
The metal oxide dispersion according to the present invention contains a solvent for the purpose of adjusting coating properties and viscosity. As the solvent, typically an organic solvent is used. The type of organic solvent is not particularly limited as long as it can uniformly dissolve or disperse the components contained in the metal oxide dispersion.
溶剤として使用し得る有機溶剤の好適な例としては、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコール-n-プロピルエーテル、エチレングリコールモノ-n-ブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノ-n-プロピルエーテル、ジエチレングリコールモノ-n-ブチルエーテル、トリエチレングリコールモノメチルエーテル、トリエチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノ-n-プロピルエーテル、プロピレングリコールモノ-n-ブチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノ-n-プロピルエーテル、ジプロピレングリコールモノ-n-ブチルエーテル、トリプロピレングリコールモノメチルエーテル、トリプロピレングリコールモノエチルエーテル等の(ポリ)アルキレングリコールモノアルキルエーテル類;エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート等の(ポリ)アルキレングリコールモノアルキルエーテルアセテート類;ジエチレングリコールジメチルエーテル、ジエチレングリコールメチルエチルエーテル、ジエチレングリコールジエチルエーテル、テトラヒドロフラン等の他のエーテル類;メチルエチルケトン、シクロヘキサノン、2-ヘプタノン、3-ヘプタノン等のケトン類;2-ヒドロキシプロピオン酸メチル、2-ヒドロキシプロピオン酸エチル等の乳酸アルキルエステル類;2-ヒドロキシ-2-メチルプロピオン酸エチル、3-メトキシプロピオン酸メチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、エトキシ酢酸エチル、ヒドロキシ酢酸エチル、2-ヒドロキシ-3-メチル部炭酸メチル、3-メチル-3-メトキシブチルアセテート、3-メチル-3-メトキシブチルプロピオネート、酢酸エチル、酢酸n-プロピル、酢酸イソプロピル、酢酸n-ブチル、酢酸イソブチル、蟻酸n-ペンチル、酢酸イソペンチル、プロピオン酸n-ブチル、酪酸エチル、酪酸n-プロピル、酪酸イソプロピル、酪酸n-ブチル、ピルビン酸メチル、ピルビン酸エチル、ピルビン酸n-プロピル、アセト酢酸メチル、アセト酢酸エチル、2-オキソブタン酸エチル等の他のエステル類;トルエン、キシレン等の芳香族炭化水素類;N-メチルピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド類等が挙げられる。これらの有機溶剤は、単独又は2種以上組み合わせて用いることができる。 Suitable examples of organic solvents that can be used as the solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, Diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol Mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether (Poly)alkylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, etc. (Poly)alkylene glycol monoalkyl ether acetates; Other ethers such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, and tetrahydrofuran; Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, and 3-heptanone; 2-hydroxy Lactic acid alkyl esters such as methyl propionate and ethyl 2-hydroxypropionate; ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3 - Ethyl ethoxypropionate, ethyl ethoxy acetate, ethyl hydroxy acetate, 2-hydroxy-3-methyl moiety methyl carbonate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-pentyl formate, isopentyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, Other esters such as ethyl pyruvate, n-propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, and ethyl 2-oxobutanoate; Aromatic hydrocarbons such as toluene and xylene; N-methylpyrrolidone, N,N- Examples include amides such as dimethylformamide and N,N-dimethylacetamide. These organic solvents can be used alone or in combination of two or more.
本発明に係る金属酸化物分散液における溶剤の使用量は特に限定されない。金属酸化物分散液の塗布性の点等から、溶剤の使用量は、金属酸化物分散液全体に対して、例えば、30~99.9質量%であり、好ましくは50~98質量%である。 The amount of solvent used in the metal oxide dispersion according to the present invention is not particularly limited. From the viewpoint of coating properties of the metal oxide dispersion, the amount of the solvent used is, for example, 30 to 99.9% by mass, preferably 50 to 98% by mass, based on the entire metal oxide dispersion. .
[界面活性剤]
本発明に係る金属酸化物分散液は、塗布性、消泡性、レベリング性等を向上させるため、更に界面活性剤(表面調整剤)を含有してもよい。界面活性剤は、1種単独で用いても、2種以上を併用してもよい。界面活性剤としては、例えば、シリコーン系界面活性剤、フッ素系界面活性剤、高分子湿潤分散剤が挙げられる。
[Surfactant]
The metal oxide dispersion according to the present invention may further contain a surfactant (surface conditioner) in order to improve coating properties, antifoaming properties, leveling properties, and the like. The surfactants may be used alone or in combination of two or more. Examples of the surfactant include silicone surfactants, fluorine surfactants, and polymer wetting and dispersing agents.
シリコーン系界面活性剤としては、具体的には、BYK-077、BYK-085、BYK-300、BYK-301、BYK-302、BYK-306、BYK-307、BYK-310、BYK-320、BYK-322、BYK-323、BYK-325、BYK-330、BYK-331、BYK-333、BYK-335、BYK-341、BYK-344、BYK-345、BYK-346、BYK-348、BYK-354、BYK-355、BYK-356、BYK-358、BYK-361、BYK-370、BYK-371、BYK-375、BYK-380、BYK-390(BYK Chemie社製)等が挙げられる。 Specifically, the silicone surfactants include BYK-077, BYK-085, BYK-300, BYK-301, BYK-302, BYK-306, BYK-307, BYK-310, BYK-320, BYK -322, BYK-323, BYK-325, BYK-330, BYK-331, BYK-333, BYK-335, BYK-341, BYK-344, BYK-345, BYK-346, BYK-348, BYK-354 , BYK-355, BYK-356, BYK-358, BYK-361, BYK-370, BYK-371, BYK-375, BYK-380, BYK-390 (manufactured by BYK Chemie).
フッ素系界面活性剤としては、具体的には、F-114、F-177、F-410、F-411、F-450、F-493、F-494、F-443、F-444、F-445、F-446、F-470、F-471、F-472SF、F-474、F-475、F-477、F-478、F-479、F-480SF、F-482、F-483、F-484、F-486、F-487、F-172D、MCF-350SF、TF-1025SF、TF-1117SF、TF-1026SF、TF-1128、TF-1127、TF-1129、TF-1126、TF-1130、TF-1116SF、TF-1131、TF-1132、TF-1027SF、TF-1441、TF-1442(DIC社製);ポリフォックスシリーズのPF-636、PF-6320、PF-656、PF-6520(オムノバ社製)等が挙げられる。 Specifically, the fluorine-based surfactants include F-114, F-177, F-410, F-411, F-450, F-493, F-494, F-443, F-444, -445, F-446, F-470, F-471, F-472SF, F-474, F-475, F-477, F-478, F-479, F-480SF, F-482, F-483 , F-484, F-486, F-487, F-172D, MCF-350SF, TF-1025SF, TF-1117SF, TF-1026SF, TF-1128, TF-1127, TF-1129, TF-1126, TF -1130, TF-1116SF, TF-1131, TF-1132, TF-1027SF, TF-1441, TF-1442 (manufactured by DIC); Polyfox series PF-636, PF-6320, PF-656, PF- 6520 (manufactured by Omnova) and the like.
高分子湿潤分散剤としては、具体的には、BYK-140、BYK-145、BYK-161、BYK-162、BYK-163、BYK-164、BYK-167、BYK-168、BYK-170、BYK-171、BYK-174、BYK-180、BYK-182、BYK-184、BYK-185、BYK-2050、BYK-2055、BYK-2015、BYK-9077(BYK Chemie社製)等が挙げられる。 Specifically, the polymer wetting and dispersing agent includes BYK-140, BYK-145, BYK-161, BYK-162, BYK-163, BYK-164, BYK-167, BYK-168, BYK-170, BYK -171, BYK-174, BYK-180, BYK-182, BYK-184, BYK-185, BYK-2050, BYK-2055, BYK-2015, BYK-9077 (manufactured by BYK Chemie), and the like.
界面活性剤の使用量は特に限定されず、金属酸化物分散液の塗布性、消泡性、レベリング性の点等から、金属酸化物分散液における溶剤以外の成分の合計に対して、例えば、0.01~2質量%であり、好ましくは0.05~1質量%である。 The amount of surfactant used is not particularly limited, and from the viewpoint of coating properties, antifoaming properties, leveling properties, etc. of the metal oxide dispersion, the amount of surfactant used is, for example, based on the total of components other than the solvent in the metal oxide dispersion. The amount is 0.01 to 2% by weight, preferably 0.05 to 1% by weight.
[その他の成分]
本発明に係る金属酸化物分散液には、必要に応じて、分散剤、熱重合禁止剤、消泡剤、シランカップリング剤、着色剤(顔料、染料)、架橋剤、酸発生剤等の添加剤を含有させることができる。いずれの添加剤も、従来公知のものを用いることができる。界面活性剤としては、アニオン系、カチオン系、ノニオン系等の化合物が挙げられ、熱重合禁止剤としては、ヒドロキノン、ヒドロキノンモノエチルエーテル等が挙げられ、消泡剤としては、シリコーン系、フッ素系化合物等が挙げられる。
[Other ingredients]
The metal oxide dispersion according to the present invention may contain a dispersant, a thermal polymerization inhibitor, an antifoaming agent, a silane coupling agent, a coloring agent (pigment, dye), a crosslinking agent, an acid generator, etc., as necessary. Additives can be included. Conventionally known additives can be used for any of the additives. Examples of surfactants include anionic, cationic, and nonionic compounds; thermal polymerization inhibitors include hydroquinone and hydroquinone monoethyl ether; and antifoaming agents include silicone and fluorine compounds. Examples include compounds.
本発明に係る金属酸化物分散液の製造方法は、特に限定されず、例えば、上記第1のカルボン酸と、キャッピング剤で表面処理された金属酸化物ナノ粒子と、溶剤と、任意に界面活性剤と、任意にその他の成分とを均一に混合する方法が挙げられる。 The method for producing the metal oxide dispersion according to the present invention is not particularly limited. For example, the first carboxylic acid, metal oxide nanoparticles surface-treated with a capping agent, a solvent, and optionally a surface-active Examples include a method of uniformly mixing the agent and optionally other components.
<金属酸化物膜の製造方法>
金属酸化物膜の製造方法としては、例えば、本発明に係る金属酸化物分散液からなる塗膜を形成する塗膜形成工程を含む製造方法が挙げられる。
<Method for manufacturing metal oxide film>
Examples of the method for producing a metal oxide film include a production method including a coating film forming step of forming a coating film made of the metal oxide dispersion according to the present invention.
前記塗膜は、例えば、半導体基板等の基板上に金属酸化物分散液を塗布することにより、形成することができる。塗布方法としては、ロールコータ、リバースコーター、バーコーター等の接触転写型塗布装置や、スピンナー(回転式塗布装置、スピンコーター)、ディップコーター、スプレーコーター、スリットコーター、カーテンフローコーター等の非接触型塗布装置を用いる方法が挙げられる。 The coating film can be formed, for example, by applying a metal oxide dispersion onto a substrate such as a semiconductor substrate. Coating methods include contact transfer coating devices such as roll coaters, reverse coaters, and bar coaters, and non-contact coating devices such as spinners (rotary coating devices, spin coaters), dip coaters, spray coaters, slit coaters, and curtain flow coaters. A method using a coating device may be mentioned.
基板としては、金属膜、金属炭化膜、金属酸化膜、金属窒化膜、又は金属酸化窒化膜を含むものであることが好ましい。前記基板を構成する金属は、ケイ素、チタン、タングステン、ハフニウム、ジルコニウム、クロム、ゲルマニウム、銅、アルミニウム、インジウム、ガリウム、ヒ素、パラジウム、鉄、タンタル、イリジウム、モリブデン、又はこれらの合金等が挙げられるが、ケイ素、ゲルマニウム、ガリウムを含むことが好ましい。また、基板表面は凹凸形状を有していてもよく、凹凸形状はパターン化された有機系材料であってもよい。 The substrate preferably includes a metal film, a metal carbide film, a metal oxide film, a metal nitride film, or a metal oxynitride film. Examples of the metal constituting the substrate include silicon, titanium, tungsten, hafnium, zirconium, chromium, germanium, copper, aluminum, indium, gallium, arsenic, palladium, iron, tantalum, iridium, molybdenum, and alloys thereof. However, it is preferable that silicon, germanium, and gallium are included. Further, the surface of the substrate may have an uneven shape, and the uneven shape may be a patterned organic material.
次いで、必要に応じて、溶剤等の揮発成分を除去して塗膜を乾燥させる。乾燥方法は特に限定されず、例えば、ホットプレートにて80℃以上140℃以下、好ましくは90℃以上130℃以下の温度にて60秒以上150秒以下の範囲内の時間乾燥する方法が挙げられる。ホットプレートによる加熱の前に、真空乾燥装置(VCD)を用いて室温にて減圧乾燥を行ってもよい。 Then, if necessary, volatile components such as solvents are removed and the coating film is dried. The drying method is not particularly limited, and examples include a method of drying on a hot plate at a temperature of 80° C. or higher and 140° C. or lower, preferably 90° C. or higher and 130° C. or lower, for a period of 60 seconds or more and 150 seconds or less. . Before heating with a hot plate, vacuum drying may be performed at room temperature using a vacuum drying device (VCD).
以下、本発明を実施例により更に詳細に説明するが、本発明はこれらの実施例に限定されるものではない。 EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to these Examples.
[金属酸化物分散液の調製]
以下の各分散原液の調製は、特開2018-193481号公報の段落[0223]の記載を参照して行った。
[Preparation of metal oxide dispersion]
The following dispersion stock solutions were prepared with reference to the description in paragraph [0223] of JP 2018-193481A.
・Z-1分散原液の調製
特開2018-193481号公報の段落[0223]の記載に基づき、室温まで冷却して得たZrO2のスラリーを遠心分離しウェットケーキAを得た。ウェットケーキAの重量の0.25倍の2-アクリロイルオキシエチルフタル酸をウェットケーキAに加えて撹拌した。再沈殿後、遠心分離によりウェットケーキBを得た。ウェットケーキBを一晩減圧乾燥し、粉末を得た。得られた乾燥粉末に対して、固形分濃度48質量%になるように、プロピレングリコールモノメチルエーテルアセテート(以下、「PGMEA」という。)を加えて再分散した後、濾過し、Z-1分散原液を得た。
- Preparation of Z-1 dispersion stock solution Based on the description in paragraph [0223] of JP 2018-193481A, a slurry of ZrO 2 obtained by cooling to room temperature was centrifuged to obtain wet cake A. 2-acryloyloxyethylphthalic acid in an amount of 0.25 times the weight of wet cake A was added to wet cake A and stirred. After reprecipitation, wet cake B was obtained by centrifugation. Wet cake B was dried under reduced pressure overnight to obtain a powder. To the obtained dry powder, propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA") was added and redispersed so that the solid content concentration was 48% by mass, and then filtered to obtain the Z-1 dispersion stock solution. I got it.
・Z-1分散原液に含まれる金属酸化物ナノ粒子のサイズの測定
Z-1分散原液を試料として用いて、X線回折装置(SmartLab、株式会社リガク製)により、XRD測定を行った。得られた結果を付属ソフトウェアのPDXLで解析し、Halder-Wagner法にて金属酸化物ナノ粒子のサイズ(結晶子サイズ)を求めたところ、2.5nmであった。
-Measurement of the size of metal oxide nanoparticles contained in the Z-1 dispersion stock solution Using the Z-1 dispersion stock solution as a sample, XRD measurement was performed using an X-ray diffraction device (SmartLab, manufactured by Rigaku Co., Ltd.). The obtained results were analyzed using the attached software PDXL, and the size (crystallite size) of the metal oxide nanoparticles was determined using the Halder-Wagner method, and was found to be 2.5 nm.
・Z-2分散原液の調製
2-アクリロイルオキシエチルフタル酸を2-アクリロイルオキシエチルコハク酸(下記式参照)に変更した以外は、上述の「Z-1分散原液の調製」と同様に操作を行って、Z-2分散原液を得た。
・Preparation of Z-2 dispersion stock solution Perform the same procedure as in "Preparation of Z-1 dispersion stock solution" above, except that 2-acryloyloxyethyl phthalic acid was changed to 2-acryloyloxyethylsuccinic acid (see the formula below). A Z-2 dispersion stock solution was obtained.
・Z-2分散原液に含まれる金属酸化物ナノ粒子のサイズの測定
Z-1分散原液に代えてZ-2分散原液を用いた以外は、上述の「Z-1分散原液に含まれる金属酸化物ナノ粒子のサイズの測定」と同様に操作を行ったところ、金属酸化物ナノ粒子のサイズ(結晶子サイズ)は、2.5nmであった。
・Measurement of the size of metal oxide nanoparticles contained in the Z-2 dispersion stock solution Except for using the Z-2 dispersion stock solution in place of the Z-1 dispersion stock solution, When the same operation as in "Measurement of Size of Metal Oxide Nanoparticles" was performed, the size of metal oxide nanoparticles (crystallite size) was 2.5 nm.
・Z-3分散原液の調製
ウェットケーキAの重量の0.25倍の2-アクリロイルオキシエチルコハク酸をウェットケーキAの重量の0.125倍の2-アクリロイルオキシエチルフタル酸及びウェットケーキAの重量の0.125倍の4-(n-ヘキシルオキシ)安息香酸に変更した以外は、上述の「Z-1分散原液の調製」と同様に操作を行って、Z-3分散原液を得た。
・Preparation of Z-3 dispersion stock solution 2-acryloyloxyethylsuccinic acid in an amount of 0.25 times the weight of wet cake A, 2-acryloyloxyethyl phthalic acid in an amount of 0.125 times the weight of wet cake A, and 2-acryloyloxyethyl succinic acid in an amount of 0.25 times the weight of wet cake A A Z-3 dispersion stock solution was obtained by performing the same procedure as in "Preparation of Z-1 dispersion stock solution" above, except for changing the amount of 4-(n-hexyloxy)benzoic acid to 0.125 times the weight. .
・Z-3分散原液に含まれる金属酸化物ナノ粒子のサイズの測定
Z-1分散原液に代えてZ-3分散原液を用いた以外は、上述の「Z-1分散原液に含まれる金属酸化物ナノ粒子のサイズの測定」と同様に操作を行ったところ、金属酸化物ナノ粒子のサイズ(結晶子サイズ)は、2.5nmであった。
・Measurement of the size of metal oxide nanoparticles contained in the Z-3 dispersion stock solution. When the same operation as in "Measurement of Size of Metal Oxide Nanoparticles" was performed, the size of metal oxide nanoparticles (crystallite size) was 2.5 nm.
・カルボン酸溶液の調製
表1に示すカルボン酸0.40質量部と、PGMEA99.60質量部とを混合して、カルボン酸溶液A~Kを得た。
- Preparation of carboxylic acid solutions 0.40 parts by mass of the carboxylic acids shown in Table 1 and 99.60 parts by mass of PGMEA were mixed to obtain carboxylic acid solutions A to K.
表2又は3に示す割合(単位:質量部)で、Z-1分散原液、Z-2分散原液、又はZ-3分散原液に、順次、カルボン酸溶液及び溶剤PGMEAを加えて、撹拌し、Φ0.2μmのメンブレンフィルターで濾過して、金属酸化物分散液を得た。 The carboxylic acid solution and the solvent PGMEA are sequentially added to the Z-1 dispersion stock solution, Z-2 dispersion stock solution, or Z-3 dispersion stock solution at the proportions shown in Table 2 or 3 (unit: parts by mass) and stirring, A metal oxide dispersion was obtained by filtration with a membrane filter having a diameter of 0.2 μm.
[無機分質量の割合]
表2又は3において、「無機分質量の割合」は、金属酸化物分散液の固形分について、無機分質量と有機分質量との合計に対する無機分質量の割合を示す。具体的には、カルボン酸溶液中のカルボン酸の質量と、Z-1分散液、Z-2分散液、又はZ-3分散液の固形分質量との合計に対するZ-1分散液、Z-2分散液、又はZ-3分散液の無機分質量の割合(質量%)を算出した。
[Ratio of inorganic mass]
In Table 2 or 3, the "ratio of inorganic mass" indicates the ratio of the inorganic mass to the total of the inorganic mass and the organic mass of the solid content of the metal oxide dispersion. Specifically, the Z-1 dispersion liquid, Z- The proportion (mass %) of the inorganic content of the 2 dispersion liquid or the Z-3 dispersion liquid was calculated.
[遊離芳香族カルボン酸の割合]
表2又は3において、「遊離芳香族カルボン酸の割合」は、金属酸化物分散液の固形分の質量に対して、金属酸化物ナノ粒子とは別個に金属酸化物分散液中に存在している芳香族カルボン酸の割合を示す。具体的には、カルボン酸溶液中のカルボン酸の質量と、Z-1分散液、Z-2分散液、又はZ-3分散液の固形分質量との合計に対するカルボン酸溶液中のカルボン酸の質量の割合(質量%)を算出した。
[Ratio of free aromatic carboxylic acid]
In Table 2 or 3, the "proportion of free aromatic carboxylic acid" refers to the percentage of free aromatic carboxylic acid that exists in the metal oxide dispersion separately from the metal oxide nanoparticles, based on the mass of the solid content of the metal oxide dispersion. It shows the proportion of aromatic carboxylic acids in Specifically, the amount of carboxylic acid in the carboxylic acid solution relative to the sum of the mass of carboxylic acid in the carboxylic acid solution and the solid mass of the Z-1 dispersion, Z-2 dispersion, or Z-3 dispersion The mass ratio (mass %) was calculated.
[経時安定性]
容器内にて室温で6ヵ月静置した金属酸化物分散液を注意深く目視し、下記の基準で評価した。結果を表2又は3に示す。
+(良好):分散液全体の白濁も、容器底における沈殿も観察されなかった。
-(不良):分散液全体の白濁、容器底における沈殿、又はこれら両方が観察された。
[Stability over time]
The metal oxide dispersion that was allowed to stand still in the container at room temperature for 6 months was carefully visually observed and evaluated using the following criteria. The results are shown in Table 2 or 3.
+ (Good): Neither cloudiness of the entire dispersion nor precipitation at the bottom of the container was observed.
- (Poor): White turbidity of the entire dispersion, precipitation at the bottom of the container, or both were observed.
[ソルベントショック]
金属酸化物分散液の質量に対して、9倍の質量の酢酸ブチル又は9倍の質量のγ-ブチロラクトンを加えて室温で1週間静置した後、分散液を注意深く目視し、下記の基準で評価した。結果を表2又は3に示す。
+(良好):分散液全体の白濁も、容器底における沈殿も観察されなかった。
-(不良):分散液全体の白濁、容器底における沈殿、又はこれら両方が観察された。
[Solvent shock]
After adding 9 times the mass of butyl acetate or 9 times the mass of γ-butyrolactone to the mass of the metal oxide dispersion and leaving it to stand at room temperature for one week, the dispersion was carefully visually observed and evaluated according to the following criteria. evaluated. The results are shown in Table 2 or 3.
+ (Good): Neither cloudiness of the entire dispersion nor precipitation at the bottom of the container was observed.
- (Poor): White turbidity of the entire dispersion, precipitation at the bottom of the container, or both were observed.
表2及び3から分かる通り、実施例の金属酸化物分散液は、優れた経時安定性を有し、ソルベントショックの発生が抑制されているのに対し、比較例の金属酸化物分散液は、経時安定性、ソルベントショック発生の抑制効果、又はこれら両方に劣ることが確認された。 As can be seen from Tables 2 and 3, the metal oxide dispersions of Examples have excellent stability over time and the occurrence of solvent shock is suppressed, whereas the metal oxide dispersions of Comparative Examples have It was confirmed that the stability over time, the effect of suppressing the occurrence of solvent shock, or both were poor.
Claims (6)
キャッピング剤で表面処理された金属酸化物ナノ粒子と、
溶剤と、
を含有する金属酸化物分散液であって、
前記キャッピング剤は、エステル結合及び重合性二重結合を有する第2のカルボン酸を含み、
前記第2のカルボン酸は、前記第1のカルボン酸とは異なる
金属酸化物分散液。 Aromatic carboxylic acids having aromatic rings substituted with alkyl groups, aromatic carboxylic acids having aromatic rings substituted with alkoxy groups, aromatic carboxylic acids having aromatic rings substituted with alkoxycarbonyl groups, and acyloxy groups. a first carboxylic acid that is at least one aromatic carboxylic acid selected from the group consisting of aromatic carboxylic acids having a substituted aromatic ring;
metal oxide nanoparticles surface-treated with a capping agent;
solvent and
A metal oxide dispersion containing,
The capping agent includes a second carboxylic acid having an ester bond and a polymerizable double bond,
The second carboxylic acid is a metal oxide dispersion liquid different from the first carboxylic acid.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022101069A JP2024002087A (en) | 2022-06-23 | 2022-06-23 | metal oxide dispersion |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022101069A JP2024002087A (en) | 2022-06-23 | 2022-06-23 | metal oxide dispersion |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2024002087A true JP2024002087A (en) | 2024-01-11 |
Family
ID=89473172
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022101069A Pending JP2024002087A (en) | 2022-06-23 | 2022-06-23 | metal oxide dispersion |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2024002087A (en) |
-
2022
- 2022-06-23 JP JP2022101069A patent/JP2024002087A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI343902B (en) | Titania sol, method of preparing the same, and coating composition comprising the same | |
US8124230B2 (en) | Non-aggregating nanoparticles and the use thereof | |
WO2016121845A1 (en) | Near-infrared ray absorbing microparticle dispersion solution and production method thereof | |
KR100909976B1 (en) | Transparent color coating composition with nanosize dispersed pigments, coated substrates and method thereof | |
JP2008094972A (en) | Coating liquid and manufacturing method of titanic acid-based ceramic film using the coating liquid | |
JP6226104B1 (en) | Colored resin composition | |
WO2018181170A1 (en) | Oily inkjet ink | |
JP5424591B2 (en) | Black pigment dispersion, its production method and use | |
CN117715871A (en) | Strontium titanate fine particle powder, method for producing same, dispersion, and resin composition | |
US20230049429A1 (en) | Metal oxide film-forming composition and method of producing metal oxide film using the composition | |
US20080176986A1 (en) | Zinc Oxide Nanoparticle Dispersions | |
JP2024002087A (en) | metal oxide dispersion | |
JP7000097B2 (en) | Oil-based inkjet ink | |
JP5401849B2 (en) | Pigment dispersion for color filters | |
JP2010275580A (en) | Method for producing low-temperature-sinterable metal nanoparticle, metal nanoparticle and method for producing dispersion liquid using the same | |
TWI381022B (en) | Pigment dispersion composition for producing color filter and color filter for color imaging device produced using the same | |
WO2023248996A1 (en) | Metal oxide disperson and method for manufacturing metal oxide film using same | |
WO2007138972A1 (en) | Process for producing loading pigment dispersion for oil-based-ink printing, loading pigment dispersion for oil-based-ink printing obtained by the process, and use thereof | |
CN111095047B (en) | Photothermal conversion layer, donor sheet using photothermal conversion layer, and methods for producing these | |
JP7224767B2 (en) | Titania nanoparticles and UV shielding material using the same | |
TWI512054B (en) | Composition of inkjet containing nickel particles | |
JP2006124264A (en) | Calcium oxide dispersion liquid and its manufacturing method | |
EP4257644A1 (en) | Metal oxide film-forming composition, method for producing metal oxide films using same, and method for reducing volume shrinkage ratio of metal oxide films | |
JP2024002089A (en) | Metal oxide film-forming composition | |
JP2024002088A (en) | Metal oxide film-forming composition |