JP2023083023A - Cleaning method of vacuum treatment apparatus - Google Patents

Abstract

To provide a cleaning method for a vacuum treatment apparatus Pc, the cleaning method being capable of detecting an endpoint of cleaning without too much or too little cleaning time without determining an absolute value to be a guide for the endpoint of cleaning.SOLUTION: A cleaning method includes the steps of: introducing a cleaning gas to a vacuum chamber 1 in a vacuum atmosphere, the cleaning gas being selected depending on an attachment attached to an internal part of a vacuum chamber; generating a plasma by exciting the cleaning gas; reacting ions and radicals in a plasma with an attachment to produce a reaction product gas; and detecting an endpoint of cleaning while the chamber is evacuated through a vacuum pump Pu. A status quantity in the vacuum chamber is measured, the status quantity changing according to a reaction of the ions and the radicals in the plasma with the attachment. Each regression curve R1 is calculated from a first specimen Y that is a status quantity measured per unit time. A second specimen is calculated as a gradient a of the regression curve calculated in order. The endpoint of cleaning is determined when each gradient of the second specimen satisfies a predetermined endpoint condition.SELECTED DRAWING: Figure 1

Description

The present invention relates to a cleaning method for a vacuum processing apparatus, and more particularly to a cleaning end point that can be detected without excessive or short cleaning time.

For example, in a vacuum processing device such as a thermal CVD device, a plasma CVD device, an etching device, or an ashing device, if vacuum processing (especially film formation processing using plasma, etching processing, etc.) is repeated on an object to be processed in a vacuum chamber, , Reaction products and by-products (hereinafter referred to as "deposits") adhere to the parts inside the vacuum chamber, including the surfaces of parts inside the vacuum chamber such as the anti-adhesion plate, stage and shower plate other than the object to be processed. , accumulates. Since such deposits may become, for example, a source of particle generation and hinder good vacuum processing, cleaning is usually performed to remove the deposits in a vacuum atmosphere. As a cleaning method, a cleaning gas selected according to the deposit is introduced into a vacuum chamber having a vacuum atmosphere, and the cleaning gas is excited to generate plasma. In general, the ions and radicals in the plasma react with the deposits to form a reaction product gas, which is then evacuated through a vacuum pump to be removed from the vacuum chamber.

Here, the cleaning is performed periodically for the purpose of temporarily stopping the vacuum processing (production) and restoring the optimum processing environment in the vacuum chamber, and thus has a great influence on the productivity. If the cleaning time is shorter than necessary, the deposits may not be removed enough to restore the processing environment in the vacuum chamber, which may hinder good vacuum processing thereafter. On the other hand, if the cleaning time is longer than necessary, not only will production efficiency deteriorate, but depending on the type of gas used during cleaning, the parts inside the vacuum chamber may be corroded, leading to premature deterioration. . For this reason, it is desirable to detect the end point of cleaning without excessive or short cleaning time.

Conventionally, a method for detecting the end point of cleaning is known, for example, from Patent Document 1. In this device, a first vacuum gauge whose sensitivity does not change regardless of the cleaning gas type and a second vacuum gauge (Pirani vacuum gauge) whose sensitivity changes according to the gas type are attached to the vacuum chamber. While the measured value of the vacuum gauge is constant, the second vacuum gauge detects the change in gas composition in the processing chamber due to cleaning, and the end point of cleaning is detected based on the detected change in gas composition. Specifically, an index that serves as a guideline for the cleaning end point, that is, an absolute value, is determined based on performance data in the past cleaning and change data of the indicated value of the second vacuum gauge obtained experimentally in advance. The end point of cleaning is detected based on the absolute value and the actual value measured by each vacuum gauge.

In the above end point detection method, for example, in the initial period when the vacuum processing apparatus is started to be used, if an attempt is made to detect the end point without running out of cleaning time, the end point is detected at a time when the amount of cleaning perturbation is sufficiently taken into consideration. There is an unavoidable problem. This is because, for example, vacuum processing has not been performed sufficiently many times in the new vacuum chamber, and the relationship between the reaction product to be removed in the vacuum chamber and the cleaning time, that is, the cleaning end point. This is because the relationship between the absolute value and the measured value does not necessarily match. In addition, when the user of the vacuum processing apparatus performs cleaning by a method other than the initially assumed cleaning method (that is, by changing the cleaning conditions), such as by changing the gas type, the absolute value of the cleaning end point also changes. As a result, there is a problem that the above-described conventional example cannot cope with the problem.

Japanese Patent Application Laid-Open No. 2003-303777

In view of the above points, it is an object of the present invention to provide a cleaning method for a vacuum processing apparatus in which the end point of cleaning can be detected in a proper cleaning time without setting an absolute value that serves as a guideline for the end point of cleaning. This is an issue.

In order to solve the above-mentioned problems, the present invention introduces a cleaning gas selected according to deposits adhering to a portion within the vacuum chamber into a vacuum chamber having a vacuum atmosphere, and excites the cleaning gas to generate plasma. and reacting ions and radicals in the plasma with the deposits to form a reaction product gas, and detecting the end point of cleaning while the ions and radicals in the plasma are evacuated through a vacuum pump, wherein the ions in the plasma are , the state quantity in the vacuum chamber that changes with the reaction between the radical and the deposit is measured, and the state quantity measured per unit time is used as the first sample, and regression lines are obtained from the first sample, and successively obtained. The inclination of the obtained regression line is used as a second sample, and when each inclination in this second sample satisfies a preset end point detection condition, it is determined as the cleaning end point. In this case, the pressure measured by a vacuum gauge (for example, a Pirani vacuum gauge or an ionization vacuum gauge) attached to the vacuum chamber can be used as the state quantity. It is not limited to this, as long as it is a state quantity that changes with an event. For example, the emission intensity of the reaction product gas in the plasma, the total light intensity of the plasma, the plasma potential during cleaning, and the like can also be used.

According to the above, cleaning of the vacuum chamber is started by introducing the cleaning gas at a predetermined flow rate while the pumping speed of the vacuum pump is kept constant. At the beginning, for example, the indicated pressure value of the vacuum gauge is substantially constant, and thereafter, the indicated pressure value continuously drops as the evacuation of the reaction product gas progresses. Then, when the reaction product gas is mostly exhausted, the pressure becomes substantially constant at a predetermined pressure lower than that at the start of cleaning. At this time, instead of using an absolute value to detect the end point of cleaning as in the conventional example, a configuration is adopted in which the end point of cleaning is determined from the inclination of the regression line, that is, the tendency of change in the state quantity. The end point of cleaning can be detected without excessive or short cleaning time, regardless of the usage conditions (period from the start of use, etc.) and cleaning conditions in the vacuum chamber. Also, if the pressure measured by the vacuum gauge is used as the state quantity, the end point of cleaning can be detected using the equipment originally installed in the vacuum processing apparatus, so there is an advantage that cost can be reduced.

In the present invention, the end point detection condition includes a tilt condition indicating a tendency toward the cleaning end point and a number of times condition that the cleaning end point can be determined when the tilt condition is detected a predetermined number of times, and at least the number of times condition is arbitrary. The end point detection condition includes an additional time from the time when the cleaning end point is determined, and when the additional time is reached, it is detected as the cleaning end point, and the additional time is arbitrarily set. A changeable configuration may be employed. According to this, the user of the vacuum processing apparatus who intends to perform cleaning can set the conditions for detecting the cleaning end point in consideration of the perturbation amount of the cleaning, for example, according to the usage state of the vacuum processing apparatus, the cleaning conditions, and the like. Optimized and advantageous.

By the way, when the vacuum processing apparatus is, for example, a plasma CVD apparatus, deposits in the vacuum chamber of the vacuum processing apparatus may become porous. In such a case, when cleaning the vacuum chamber, there is a possibility that an event such as a temporary stagnation of the amount of gas released per unit time may occur and the endpoint detection condition may be satisfied. Therefore, in the present invention, if the end point detection condition includes the fluctuation range of the state quantity until the cleaning end point is determined, the cleaning end point can be reliably detected without depending on the type of adhered matter. can do.

1 is a schematic cross-sectional view of a plasma CVD apparatus capable of carrying out the cleaning method of the present embodiment; FIG. Graph illustrating cleaning endpoint detection A display screen of an example of a display showing the implementation status of cleaning. FIG. 10 is a flowchart of cleaning end point detection; The graph of the experimental result which shows the effect of this invention.

Hereinafter, with reference to the drawings, the vacuum processing apparatus is a plasma CVD apparatus, the state quantity is the pressure (Pa) measured by a vacuum gauge (Pirani vacuum gauge), and the case of cleaning the inside of the vacuum chamber of the plasma CVD apparatus is taken as an example. An embodiment of a cleaning method of the invention will be described. Hereinafter, terms indicating directions such as up and down are based on FIG. 1 showing the installation posture of the plasma CVD apparatus.

Referring to FIG. 1, Pc is a plasma CVD apparatus to be cleaned by applying the present invention, and has a vacuum chamber 1 to which a vacuum pump Pu is connected. A vacuum gauge Vg such as a Pirani vacuum gauge, a diaphragm vacuum gauge, or an ionization vacuum gauge is attached to the vacuum chamber 1 to measure the pressure when the inside thereof is evacuated by a vacuum pump Pu at a constant evacuation speed. A cathode electrode 2 having a disc-shaped outline is also provided on the upper wall of the vacuum chamber 1, and a predetermined high frequency power is supplied from a high frequency power source Ps. An annular standing wall portion 21 protruding into the vacuum chamber 1 is provided on the outer peripheral edge portion of the cathode electrode 2, and a large number of through holes 31 are formed vertically through the lower end of the standing wall portion 21. A shower plate 3 is attached.

A first gas pipe 4 is connected to the cathode electrode 2 , and a diffusion space 32 partitioned by the cathode electrode 2 and the shower plate 3 is supplied with a film-forming gas whose flow rate is controlled via a mass flow controller 41 interposed therein. can be introduced into In the vacuum chamber 1, a stage 5 for holding a substrate Sw as an object to be film-formed is disposed so as to face the cathode electrode 2. The stage 5 is grounded and functions as an anode electrode during film formation. Since a well-known plasma CVD apparatus Pc is used, further explanation including the film forming method thereof is omitted. Then, when the film formation process by the plasma CVD method is repeated on the substrate Sw in the vacuum chamber 1, deposits (not shown) such as reaction products and by-products are deposited on, for example, an anti-adhesion plate (not shown) other than the substrate Sw. (not shown), it adheres and accumulates on the surfaces of components in the vacuum chamber 1 such as the shower plate 3 and the stage 5 and on the inner wall surfaces thereof. Therefore, cleaning is performed periodically for the purpose of restoring the optimum processing environment within the vacuum chamber 1 .

A second gas pipe 6 for introducing a cleaning gas is connected to the side wall of the vacuum chamber 1 . In the second gas pipe 6, an on-off valve 61, a microwave generator 7, and a mass flow controller 62 for controlling the flow rate of the cleaning gas supplied to the microwave generator 7 are interposed from the downstream side thereof. The cleaning gas is excited by 7 to generate plasma, and ions and radicals in the plasma are introduced into the vacuum chamber 1 . The cleaning gas _is appropriately selected according to the film _- forming gas. A halogen gas-containing gas (including a halogen gas) such as is used. In this case, argon gas, nitrogen gas, or the like may be included at a predetermined flow rate. As a result, mainly the fluorine radicals react with deposits on the surface of the shower plate 3 in the vacuum chamber 1 to etch the deposits of Si, and SiF ₄ gas is generated as a reaction product gas. Then, the SiF ₄ gas is evacuated to the vacuum pump Pu together with the cleaning gas that is not used in the reaction, and the cleaning is completed. In this embodiment, the end point of cleaning is detected from the tendency of change in the pressure indication value during cleaning.

The plasma CVD apparatus Pc has a microcomputer, a memory, and the like, and includes parts necessary for film formation by the plasma CVD method, such as a vacuum gauge Vg, a vacuum pump Pu, a high-frequency power supply Ps, and a mass flow controller 41, as well as a vacuum gauge Vg and a vacuum pump. A control unit Cu is provided for integrally controlling parts necessary for cleaning the inside of the vacuum chamber 1, such as Pu, the microwave generator 7, the on-off valve 61, and the mass flow controller 62. FIG. Input means Kb such as a keyboard and display means Ds such as a display are connected to the control unit Cu. Here, as shown in FIG. 2, when cleaning inside the vacuum chamber 1 is started with the exhaust speed of the vacuum pump Pu and the introduction flow rate of the cleaning gas being constant, the pressure indicated by the vacuum gauge Vg is initially is substantially constant, and thereafter, the pressure indication value drops continuously as the evacuation of the reaction product gas progresses. Then, when the reaction product gas is mostly exhausted, the pressure becomes substantially constant at a predetermined pressure lower than that at the start of cleaning (the slope of the regression line becomes substantially zero (substantially horizontal)).

In this embodiment, the indicated pressure value of the vacuum gauge Vg as the state quantity measured per unit time is used as the first sample, and the regression line Rl is obtained from the first sample by arithmetic processing. The slope a of the regression line Rl that is sequentially obtained is used as a second sample, and whether or not each slope a in this second sample satisfies the end point detection condition, specifically, the number of evaluation recordings obtained by arithmetic processing, the cleaning end point The number of pressure drop tendency determinations as a slope condition indicating a tendency toward toward , and the number of end point trend determination times to determine whether the slope condition has been achieved a predetermined number of times are obtained by arithmetic processing, and determined as the cleaning end point (cleaning end point detection step). . For example, the average value (Xa) of the measurement time X and the average value (Ya) of the pressure indication value Y per unit time (for example, 10 seconds) are obtained. The slope a and the intercept b of the regression line in the measurement interval are calculated by obtaining the values and the covariance values of the average values of the measurement times. Note that a known method can be used as the arithmetic processing of the variance value, the covariance value, the slope a and the intercept b of the regression line in the control unit, so detailed description thereof will be omitted here. Then, when each inclination a in the second sample satisfies the end point detection condition number of times, it is determined as the cleaning end point, and the cleaning ends. In this case, in order to optimize the conditions for detecting the end point of cleaning by considering the perturbation amount of cleaning, the additional time to be added after determining the end point of cleaning and the pressure until the end point of cleaning is determined as described above. It is preferable that the fluctuation range (pressure differential pressure threshold value) can be appropriately set as a parameter.

Referring to FIG. 3, during cleaning, the display means Ds displays, in a graph, changes in the indicated pressure value of, for example, a vacuum gauge Vg (in this embodiment, a Pirani vacuum gauge) through communication with the control unit Cu. 1st screen 8a, 2nd screen 8b showing values measured during cleaning, 3rd screen 8c showing results of arithmetic processing values, 4th screen 8d for arbitrarily setting and changing parameters, and A start button 8e for instructing the start of cleaning to the control unit Cu can be displayed on the same screen. Items displayed on the second screen 8b include the elapsed time (sec) from the start of cleaning, the input power (W) of the microwave generator 7, the controlled flow rate (sccm) of the mass flow controller 62, and the pressure indication value ( Pa). In addition, the items displayed on the third screen 8c include: 1) the slope a of the regression line Rl; pressure differential pressure threshold) and additional time. The values displayed on the fourth screen 8d are the values related to the above 2) on the third screen 8c, and the parameters of the third screen 8c can be arbitrarily set and changed via the input means Kb. In the present embodiment, the control unit Cu, a measuring device such as a vacuum gauge Vg attached to the vacuum chamber 1 that measures the state quantity in the vacuum chamber 1 that changes during cleaning in the vacuum chamber 1, the control unit Cu, and an interface are provided. A cleaning system for cleaning the inside of the vacuum chamber 1 is composed of devices such as the display means Ds and the input means Kb which are connected via. An example of the cleaning end point detection control flow will be described in more detail below with reference to FIG.

When the cleaning start is instructed, the microwave generator 7 is operated, and the cleaning gas is supplied to the microwave generator 7 by the mass flow controller 62 at a predetermined flow rate. Then, the on-off valve 61 is opened to introduce the plasma-excited cleaning gas (ions, radicals) into the vacuum chamber 1, and the cleaning end point detection flow is started. After confirming that the microwave generator 7 and the mass flow controller 62 are operating normally, the process proceeds to STEP 1, where the pressure in the vacuum chamber 1 is measured by the (Pirani) vacuum gauge Vg. In FIG. 4, PiGcur is the pressure indication value of the vacuum gauge Vg at the time of measurement, y[ii] is the array (trend) of the pressure indication value, TIMEcur is the recording time, x[ii] is the recording time array (trend), ii is the number of records. Next, in STEP 2, the number of recordings ii and the number of evaluation recordings SETsmp are compared to determine the number of evaluation recordings. If the number of recordings ii is greater than the number of evaluation recordings SETsmp, the process proceeds to STEP 3 to determine the average value of the number of latest evaluation recordings. As calculations, an average value Yave of the pressure instruction values y[ii] of the latest evaluation recording times and an average value Xave of the recording times x[ii] are calculated. Sy is the total sum of pressure indication values y[ii] of the latest evaluation record counts, and Sx is the total sum of recording times x[ii] of the latest evaluation record counts. Then, proceeding to STEP 4, the variance value XX[ii] of the recording time x[ii] of the latest evaluation recording number and the covariance between the recording time x[ii] of the latest evaluation recording number and the pressure indication value y[ii] A value XY[ii] is calculated. When the variance value XX[ii] and the covariance value XY[ii] are calculated, proceed to STEP 5 to calculate a regression line with the number of latest evaluation recordings, and regression from this regression line and the recording time x[ii]. The most recent pressure reading c on the straight line is identified. a is the slope of the regression line, and b is the intercept of the regression line.

Next, in STEP 6, the latest pressure indication value c is compared with the maximum value Ymax of the pressure indication values on the regression line after the start of evaluation to determine the maximum value of the pressure indication value, and the latest pressure indication value If c is equal to or larger than the maximum value Ymax, the process proceeds to STEP7 to update this pressure indication value c as the maximum value Ymax, and returns to STEP1. On the other hand, when the latest pressure indication value c is equal to or less than the maximum value Ymax, the process proceeds to STEP 8, and the slope a of the regression line is compared with the pressure rise tendency determination evaluation value Rup to determine the pressure increase trend. If it is larger than the pressure rising tendency determination evaluation value Rup, the process proceeds to STEP9, the pressure decreasing tendency counter CNTdown is initialized (=0), and the process returns to STEP1. On the other hand, if the slope a is equal to or less than the pressure rising tendency determination evaluation value Rup, the process proceeds to STEP 10, where the pressure decreasing tendency counter CNTdown is incremented by one.

Next, in STEP 11, the pressure decreasing tendency counter CNTdown is compared with the pressure decreasing tendency determination count SETdown to determine whether the pressure decreasing tendency counter has been reached. back to On the other hand, if the pressure decrease tendency counter CNTdown is equal to or greater than the pressure decrease tendency determination count SETdown, the process proceeds to STEP 12, where the pressure decrease tendency determination is performed by comparing the slope a with the pressure end point trend determination evaluation value Rend. If it is greater than the end point tendency determination evaluation value Rend, proceed to STEP13, initialize (=0) the determination counters (pressure decreasing tendency counter CNTdown and pressure end point tendency counter CNTend), and return to STEP1.

When the slope a is smaller than the pressure end point tendency judgment evaluation value Rend, the process proceeds to STEP 14, and the difference Ymax-c between the maximum value Ymax and the pressure indicated value c and the pressure differential pressure threshold SETdif are used as the pressure differential pressure threshold judgment. are compared, and if the difference Ymax-c is smaller than the differential pressure threshold value SETdif, the process returns to STEP1. On the other hand, if the difference Ymax-c is greater than the pressure differential pressure threshold value SETdif, the process proceeds to STEP 15, where the slope a is compared with the pressure end point tendency determination evaluation value Rend to determine the cleaning end point tendency. If it is greater than the value Rend, proceed to STEP16, initialize (=0) the end point tendency counter (CNTend), and return to STEP1. On the other hand, if the slope a is smaller than the pressure end point tendency determination evaluation value Rend, the process proceeds to STEP 17, where the pressure end point tendency counter CNTend is incremented by one. Finally, in STEP 18, the pressure end point tendency counter CNTend is compared with the pressure end point tendency determination count SETend. End the flow. On the other hand, when the pressure end point tendency counter CNTend is smaller than the pressure end point tendency determination count SETend, the process returns to STEP1.

According to the above-described embodiment, the cleaning end point is determined from the slope a of the regression line Rl, that is, the pressure change tendency, instead of using the absolute value to detect the cleaning end point as in the conventional example. is used, the end point of cleaning can be detected without excessive or short cleaning time, regardless of the usage status (period from start of use, etc.) and cleaning conditions in the vacuum chamber 1 to be cleaned. In addition, since the end point of cleaning can be detected using a device (vacuum gauge Vg) installed in the plasma CVD apparatus Pc, there are advantages such as cost reduction. Furthermore, since the setting of the additional time can be arbitrarily changed, the user of the vacuum processing apparatus Pc who intends to perform cleaning can adjust the amount of cleaning perturbation according to, for example, the usage state of the vacuum processing apparatus Pc and the cleaning conditions. Advantageously, the conditions for detecting the end point of cleaning can be optimized. Moreover, even if an event such as a temporary stagnation of the amount of gas released per unit time occurs during cleaning of the vacuum chamber 1 and there is a risk that the end point detection condition may be satisfied, cleaning Since the range of pressure fluctuations until the end point is determined is included, the end point of cleaning can be reliably detected without depending on the type of adhered matter.

In order to confirm the above effect, the following experiment was conducted using the plasma CVD apparatus Pc shown in FIG. That is, after forming a Si film on a plurality of substrates Sw using a plasma CVD apparatus Pc and using SiH ₄ gas as a film forming gas, the vacuum gauge Vg is a Pirani vacuum gauge and NF ₃ gas is used according to the above. A cleaning was performed and the results are shown in FIG. According to this, the end point of cleaning was determined by the control unit Cu 65 seconds after the start. Further, it was confirmed that the pressure hardly changes when the pressure measurement of the vacuum chamber 1 is continued while the exhaust speed of the vacuum pump Pu and the introduction flow rate of the cleaning gas are kept constant. After that, the inside of the vacuum chamber 1 was opened to the atmosphere, and it was confirmed by visual inspection that the processing environment inside the vacuum chamber 1 had been restored.

Although the embodiments of the present invention have been described above, various modifications are possible without departing from the scope of the technical idea of the present invention. In the above embodiment, the pressure indication value of the vacuum gauge Vg was explained as an example of the state quantity. not a thing For example, the emission intensity of the reaction product gas in the plasma, the total light intensity of the plasma, the plasma potential during cleaning, and the like can also be used. In the above embodiment, the vacuum processing apparatus is the plasma CVD apparatus Pc, and the cleaning gas excited by the microwave generator 7 is introduced. For example, in place of the film forming gas, a cleaning gas is introduced through the first gas pipe 4 having a mass flow controller 41 interposed therein, and a predetermined high frequency power is supplied to the cathode electrode 2 from the high frequency power supply Ps, thereby filling the vacuum chamber 1 with a cleaning gas. Plasma can be generated. In other words, any vacuum processing apparatus having a plasma generating means and capable of reacting ions and radicals in the plasma with deposits to remove the deposits corresponds to the vacuum processing apparatus of the present invention.

In the above embodiment, the pressure indication value of a single vacuum gauge Vg was explained as an example of the state quantity. or from the pressure readings obtained with the vacuum gauge Vg, the emission intensity of the reaction product gas in the plasma as a state quantity measured with a measuring instrument other than the vacuum gauge Vg, the plasma The end point of cleaning may be determined by combining the total amount of light and the plasma potential during cleaning. In this case, for example, the control unit Cu of the vacuum processing apparatus Pc is configured so that one can be selected from each vacuum gauge Vg or from each measuring device, and the selection is made by the input means Kb and the display means Ds. A man-machine interface is provided to allow By making it possible to select the state quantity measured as the first sample in this way, there are the following advantages.

That is, a) For example, by adopting a configuration that allows selection from among a plurality of types or a plurality of vacuum gauges Vg, a redundant configuration can be realized as compared with the above embodiment. With such a configuration, if the operator determines that the initially selected vacuum gauge Vg has fallen into a situation (becomes abnormal) in which the end point cannot be detected due to sudden contamination or the like, By switching to another normal vacuum gauge or another measuring instrument, the control unit Cu can reliably detect the cleaning end point. In this case, it is assumed that the end point detection condition for the inclination a obtained from each sample obtained from another vacuum gauge Vg or the like is preset in the control unit Cu.

b) In the above a), the operator makes an abnormality judgment regarding the detection of the cleaning end point, but this may be made by the control unit Cu of the vacuum processing apparatus Pc. That is, the pressure indication values are always measured by a plurality of types of vacuum gauges Vg, and the pressure indication values thus measured are used as the first sample for processing. For example, the first vacuum gauge Vg is a Pirani vacuum gauge, the second vacuum gauge Vg is a diaphragm vacuum gauge, and the pressure indication value measured by the Pirani vacuum gauge is the first sample, the pressure indication measured by the ionization vacuum gauge Vg The value may be the other first sample, and from each first sample, the determination result may be obtained from each endpoint detection condition according to the above procedure. As a result, for example, when the AND condition of two end point detection conditions is not satisfied within a preset time, it is possible to output as an end point detection abnormality. By adopting such a configuration, it becomes possible to make the endpoint detection method more robust against abnormal situations. Moreover, since two vacuum gauges, a Pirani vacuum gauge and a diaphragm vacuum gauge, are generally attached to the vacuum chamber 1 for the purpose of vacuum film formation, there is no need to add a new measuring device.

Furthermore, c) when there are a plurality of types of measuring instruments for measuring state quantities that change during cleaning, and a configuration is adopted in which selection can be made from among them, the measuring instruments can transmit different responses to the control unit Cu depending on the type of gas to be measured. desirable. This is because the first samples obtained from each instrument show different trends, ie produce different slopes, so that the slopes can be compared with each other in the control unit Cu. By comparing the slopes with each other, for example, it is possible to confirm the amount of reaction product gas relative to the total pressure. Specifically, one measuring instrument is the total light intensity of the plasma to obtain one first sample of the total pressure, and the other measuring instrument is a Pirani vacuum gauge calibrated for nitrogen. If the other first sample is obtained by measuring the pressure in the vacuum chamber 1, the other first sample must be converted to (nitrogen) for the partial pressure of the reaction product gas species with respect to the one first sample. A considerable amount of error will be included. That is, by comparing the slopes of the regression lines with each other, the slope with respect to the partial pressure of the reaction product gas species is obtained, and by applying a preset end point detection condition to this slope, the cleaning end point is calibrated. be able to. By adopting such a configuration, it becomes possible to carry out a more rigorous determination.

Further, in the above embodiment, the variance and covariance were used to derive the regression line Rl, but if the slope a can be obtained, it is not limited to this, and other statistical or mathematical methods can be used. may In other words, as a technical idea, the first step is to conceptualize the first sample as a function, and the second step is to obtain the value of the slope of the derivative of the function, that is, the differential coefficient, and plot this value over time. As long as it is an evaluation and judgment system similar to the above embodiment, there is no problem.

Pc... Plasma CVD apparatus (vacuum processing apparatus), 1... Vacuum chamber, Pu... Vacuum pump, Vg... Vacuum gauge, Y... Pressure indication value of vacuum gauge Vg (first sample), Rl... Regression line, a... Regression line Slope of Rl (second sample).

In order to solve the above-mentioned problems, the present invention continuously introduces a cleaning gas selected according to deposits adhering to a portion inside the vacuum chamber into a vacuum chamber having a vacuum atmosphere at a constant flow rate. is excited to generate plasma, and the ions and radicals in the plasma react with the deposits to form a reaction product gas . In a vacuum processing apparatus cleaning method including a step of detecting the end point of, the state quantity in the vacuum chamber that changes with the reaction between ions and radicals in the plasma and deposits is measured and measured per unit time With the state quantity as the first sample, the regression line is obtained from the first sample, and the slope of the successively obtained regression line is the second sample. The cleaning end point is determined, and the end point detection conditions include a tilt condition indicating a tendency toward the cleaning end point, a number of times condition that the cleaning end point can be determined when the tilt condition is detected a predetermined number of times, and a period until the cleaning end point is determined. It is characterized by including the fluctuation width of the state quantity .

In order to solve the above-mentioned problems, the present invention continuously introduces a cleaning gas selected according to deposits adhering to a portion inside the vacuum chamber into a vacuum chamber having a vacuum atmosphere at a constant flow rate. is excited to generate plasma, and the ions and radicals in the plasma react with the deposits to form a reaction product gas. measuring a state quantity in the vacuum chamber that changes due to reactions between ions and radicals in the plasma and deposits, and transferring the state quantity to the vacuum chamber; The state quantity measured per unit time as the pressure indication value of the provided Pirani vacuum gauge is taken as the first sample, and the regression line is obtained from this first sample. When each slope of two samples satisfies a preset end point detection condition, it is determined as a cleaning end point. The end point detection conditions include a slope condition indicating a tendency toward the cleaning end point, and cleaning when the slope condition is detected a predetermined number of times. and a fluctuation range of the state quantity until the end point of cleaning is determined.

Claims (5)

A cleaning gas selected according to the deposits adhering to the part in the vacuum chamber is introduced into the vacuum chamber in a vacuum atmosphere, the cleaning gas is excited to generate plasma, and ions and radicals in the plasma are removed as deposits. A cleaning method for a vacuum processing apparatus comprising a step of detecting the end point of cleaning while reacting to form a reaction product gas and evacuating through a vacuum pump,
The state quantity in the vacuum chamber that changes with the reaction between ions and radicals in the plasma and the attached matter is measured. a slope of a regression line that is obtained in sequence as a second sample; and when each slope in the second sample satisfies a preset end point detection condition, it is determined as a cleaning end point. . 2. The method of cleaning a vacuum processing apparatus according to claim 1, wherein the state quantity is a pressure measured by a vacuum gauge attached to the vacuum chamber. The end point detection conditions include a tilt condition indicating a tendency toward the end point of cleaning, and a number of times condition by which the end point of cleaning can be determined when the tilt condition is detected a predetermined number of times, and at least the number of times condition can be arbitrarily set and changed. 3. The method of cleaning a vacuum processing apparatus according to claim 1 or 2, characterized by: The end point detection condition includes an additional time from the time when the end point of cleaning is determined, the end point of cleaning is detected when the additional time is reached, and the setting of the additional time can be arbitrarily changed. A cleaning method for a vacuum processing apparatus according to any one of claims 1 to 3. 5. The cleaning method for a vacuum processing apparatus according to claim 1, wherein the end point detection condition includes a fluctuation range of the state quantity until the cleaning end point is determined.

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