JP2023015137A - Filter, filter manufacturing method, filtering device, and chemical solution manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide: a filter the allows manufacture of a chemical solution excellent in preventing defects; and a filter manufacturing method, a filtering device, and a chemical solution manufacturing method.

SOLUTION: The filter is used for filtering and contains a filter body and one or more first organic compounds selected from the group consisting of: compounds represented by general formulas (I) to (V); alkanes represented by general formula (X); and alkenes represented by general formulas (XI) and (XII). The total content of the first organic compounds is 0.10 to 10000 ppt by mass with respect to the mass of the filter.

SELECTED DRAWING: None

COPYRIGHT: (C)2023,JPO&INPIT

Description

The present invention relates to a filter, a filter manufacturing method, a filtering device, and a chemical liquid manufacturing method.

During the manufacture of semiconductor devices, as a pre-wet liquid, a resist liquid (resist composition), a developer, a rinse liquid, a stripper, a chemical mechanical polishing (CMP) slurry, and a cleaning liquid after CMP, Alternatively, a chemical liquid containing water and/or an organic solvent is used as a diluent thereof.
In recent years, with the sophistication of semiconductor products, the above chemicals used in semiconductor manufacturing are required to have further defect suppression properties.

As a chemical solution used in the conventional manufacturing process of semiconductor products, Patent Document 1 describes a method for manufacturing an organic processing solution for patterning a chemically amplified resist film that can reduce the generation of particles in pattern forming technology (paragraph [0010])” is disclosed, and in the above manufacturing method, a “filtration device having a filtration filter membrane (claim 1)” is used.

JP 2015-84122 A

The present inventors have found room for improvement in terms of defect suppression using the patterning organic treatment liquid (chemical liquid) produced by the above production method.
Accordingly, an object of the present invention is to provide a filter capable of producing a chemical liquid with excellent defect suppressing properties. Another object of the present invention is to provide a method for manufacturing a filter, a filtering device, and a method for manufacturing a chemical solution.

As a result of intensive studies aimed at solving the above problems, the inventors of the present invention have found that the above problems can be solved by the following configuration.

[1]
A filter for filtration,
a filter body;
selected from the group consisting of compounds represented by general formulas (I) to (V), alkanes represented by general formula (X), and alkenes represented by general formulas (XI) and (XII) containing one or more first organic compounds,
A filter, wherein the total content of the first organic compound is 0.10 to 10000 ppt by mass relative to the mass of the filter.
[2]
The filter according to [1], wherein the filter further contains one or more second organic compounds selected from the group consisting of compounds represented by general formulas (VI) to (VIII).
[3]
The total content of the first organic compound is 5.0 mass ppt or more with respect to the mass of the filter, and
Compounds selected from the group consisting of compounds represented by general formulas (I) to (VIII), alkanes represented by general formula (X), and alkenes represented by general formulas (XI) and (XII) The filter according to [2], wherein the total content of is 6500 mass ppt or less with respect to the mass of the filter.
[4]
The filter above
one or more compounds selected from Group A consisting of compounds represented by general formulas (I) to (VIII);
[2] or The filter according to [3].
[5]
The filter according to [4], wherein the total content of the compounds selected from Group A is 0.10 to 3200 ppt by mass relative to the mass of the filter.
[6]
The filter according to [4] or [5], wherein the total content of the compounds selected from Group B is 1.0 to 1200 ppt by mass relative to the mass of the filter.
[7]
Further, a metal component selected from the group consisting of Al, Ca, Cr, Cu, Fe, K, Mg, Na, Ni, Zn, and Pb is added in an amount of 0.10 to 5000 mass with respect to the mass of the filter. The filter according to any one of [1] to [6], containing ppt.
[8]
The filter body contains nylon,
The filter according to any one of [4] to [6], containing one or more compounds selected from Group A and two or more compounds selected from Group B.
[9]
containing an alkane represented by the general formula (X) and an alkene represented by the general formula (XI),
The alkane content A represented by the general formula (X), the alkene content B represented by the general formula (XI), and the alkene content C represented by the general formula (XII) are based on mass. , C<A, and C<B.
[10]
The filter body contains polyethylene or polytetrafluoroethylene,
The filter according to any one of [4] to [7], containing one or more compounds selected from Group A above and an alkane represented by general formula (X).
[11]
The filter according to any one of [1] to [10], wherein the filter has a pore size of 10 nm or less.
[12]
The filter according to any one of [1] to [11], wherein the filter body contains ion exchange groups.
[13]
The filter according to any one of [1] to [12], wherein the filter body contains two or more layers each made of a different material.
[14]
The filter according to any one of [1] to [13], wherein the filter body contains an asymmetric porous membrane.
[15]
The filter according to [1] to [14], wherein the filter body is made of a material other than a fluorine-based material.
[16]
A method for manufacturing a filter according to any one of [1] to [15],
1 selected from the group consisting of compounds represented by general formulas (I) to (VIII), alkanes represented by general formula (X), and alkenes represented by general formulas (XI) and (XII) A method of manufacturing a filter comprising the step of pretreating an untreated filter containing seeds or more with an organic cleaning solution.
[17]
The above organic cleaning solution is propylene glycol monomethyl ether acetate, isopropanol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, ethyl lactate, methyl methoxypropionate, cyclopentanone, cyclohexanone, γ-butyrolactone, diisoamyl. ether, butyl acetate, isoamyl acetate, 4-methyl-2-pentanol, dimethylsulfoxide, N-methylpyrrolidone, diethylene glycol, ethylene glycol, dipropylene glycol, propylene glycol, ethylene carbonate, propylene carbonate, sulfolane, cycloheptanone, 2 -heptanone, butyl butyrate, isobutyl isobutyrate, undecane, pentyl propionate, isopentyl propionate, ethylcyclohexane, mesitylene, decane, 3,7-dimethyl-3-octanol, 2-ethyl-1-hexanol, 1-octanol, 2 - The method for producing a filter according to [16], containing one or more selected from the group consisting of octanol, ethyl acetoacetate, dimethyl malonate, methyl pyruvate, and dimethyl oxalate.
[18]
The method for producing a filter according to [16] or [17], wherein the pretreatment includes a step of immersing the untreated filter in the organic cleaning solution for 3 days or more.
[19]
The method for producing a filter according to any one of [16] to [18], comprising a step of subjecting the untreated filter immersed in the organic cleaning liquid to ultrasonic treatment to perform the pretreatment.
[20]
The pretreatment includes passing the organic cleaning liquid through the untreated filter, which is hollow cylindrical,
The filter manufacturing method according to any one of [16] to [19], wherein the amount of the organic cleaning liquid to be passed is 10 kg or more per 1 inch cylinder length of the untreated filter.
[21]
Compounds represented by general formulas (I) to (VIII), alkanes represented by general formula (X), and alkenes represented by general formulas (XI) and (XII) in the untreated filter For the total content of compounds selected from the group consisting of
Compounds represented by general formulas (I) to (VIII), alkanes represented by general formula (X), and general formulas (XI) and (XII) in the filter after the above pretreatment The method for producing a filter according to any one of [16] to [20], wherein the mass ratio of the total content of compounds selected from the group consisting of alkenes is 0.5000 or less.
[22]
[16] to [16] to [16]-[ 21].
[23]
an inflow section, an outflow section, and
2 or more filters according to any one of [1] to [15],
two or more of said filters are arranged in series between said inlet and said outlet;
A filtration device for purifying a liquid to be purified to obtain a chemical solution, comprising a flow path from the inflow part to the outflow part.
[24]
Filtration according to [23], wherein among the two or more filters, the filter with the largest pore size has a pore size of 10 to 200 nm, and the filter with the smallest pore size has a pore size of 1 to 10 nm. Device.
[25]
The filtering device according to [23] or [24], containing the filter according to [12].
[26]
The filtering device according to any one of [23] to [25], containing the filter according to [9].
[27]
The filtering device according to any one of [23] to [26], containing the filter according to [10].
[28]
A chemical liquid manufacturing method for obtaining a chemical liquid by purifying a liquid to be purified,
A method for producing a chemical liquid, comprising a step of obtaining a chemical liquid by filtering a liquid to be purified using the filter according to any one of [1] to [15].
[29]
The liquid to be purified is propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monopropyl ether, cyclohexanone, methyl methoxypropionate, butyl acetate, γ-butyrolactone, 4-methyl-2-pentanol, propylene glycol monoethyl. ether, ethyl lactate, cyclopentanone, diisoamyl ether, isoamyl acetate, isopropanol, dimethylsulfoxide, N-methylpyrrolidone, diethylene glycol, ethylene glycol, dipropylene glycol, propylene glycol, ethylene carbonate, propylene carbonate, sulfolane, cycloheptanone, 2-heptanone, butyl butyrate, isobutyl isobutyrate, undecane, pentyl propionate, isopentyl propionate, ethylcyclohexane, mesitylene, decane, 3,7-dimethyl-3-octanol, 2-ethyl-1-hexanol, 1-octanol, 2-octanol, ethyl acetoacetate, dimethyl malonate, methyl pyruvate, and the method for producing a chemical solution according to [28], containing one or more selected from the group consisting of dimethyl oxalate.

ADVANTAGE OF THE INVENTION According to this invention, the filter which can manufacture the chemical|medical solution which is excellent in defect suppression property can be provided. Moreover, it is possible to provide a method for manufacturing a filter, a filtering device, and a method for manufacturing a chemical solution.

It is a mimetic diagram showing a filter concerning a first embodiment of the present invention.

The present invention will be described in detail below.
Although the description of the constituent elements described below may be made based on representative embodiments of the present invention, the present invention is not limited to such embodiments.
In this specification, a numerical range represented by "-" means a range including the numerical values before and after "-" as lower and upper limits.
In the present invention, "ppm" means "parts-per-million (10 ^-6 )", "ppb" means "parts-per-billion (10 ^-9 )", and "ppt" means means "parts-per-trillion (10 ^-12 )" and "ppq" means "parts-per-quadrillion (10 ^-15 )".
In addition, in the notation of a group (atom group) in the present invention, a notation that does not describe substituted or unsubstituted includes a group containing a substituent as well as a group not containing a substituent within a range that does not impair the effect of the present invention. contain. For example, the term “hydrocarbon group” includes not only hydrocarbon groups containing no substituents (unsubstituted hydrocarbon groups) but also hydrocarbon groups containing substituents (substituted hydrocarbon groups). This point is the same for each compound.
Moreover, "radiation" in the present invention means, for example, deep ultraviolet rays, extreme ultraviolet rays (EUV), X-rays, electron beams, or the like. Moreover, in the present invention, light means actinic rays or radiation. Unless otherwise specified, the term "exposure" in the present invention includes not only exposure with far ultraviolet rays, X-rays, EUV, etc., but also drawing with particle beams such as electron beams and ion beams.

[filter]
The filter of the present invention is a filter for filtering liquids.
The filter includes a filter body and a first organic compound.
The first organic compound includes compounds represented by general formulas (I) to (V), alkanes represented by general formula (X), and general formulas (XI) and (XII). It is a general term for compounds selected from the group consisting of compounds represented by alkenes.
The total content of the first organic compound is 0.10-10000 ppt by weight relative to the weight of the filter.

Although the mechanism by which the problems of the present invention are solved by using a filter having such a configuration is not necessarily clear, the inventors presume the mechanism as follows. In addition, the following mechanism is speculation, and even if the effect of the present invention is obtained by a different mechanism, it is included in the scope of the present invention.
In the semiconductor manufacturing process, even minute amounts of impurities contained in chemical solutions are likely to cause various defects.
The various defects are, for example, defects that occur when chemical solutions are applied to the manufacturing process of semiconductor devices. More specific examples are metal residue defects, particulate organic residue defects, and spot-like defects when the chemical solution is used as a pre-wet liquid or rinse liquid, and all of these defects can be suppressed. Desired. As another specific example, in the case where a chemical solution is used as a pipe cleaning solution, the above defect occurs when pre-wetting or rinsing is performed after transferring the pre-wetting solution or rinsing solution through the cleaned pipe. Therefore, it is required that all of the above defects can be suppressed. Other specific examples include poor development defects, residue defects, and uniformity defects (an example of defects when a pattern is formed by ArF exposure) when a chemical solution is used as a pattern developer and/or rinse solution. ), and a PLOT defect that is a protruding defect, a BRIDGE defect that is a bridging defect between patterns, and a GEL defect that is a defect based on a film-like residue (defects when patterns are formed by EUV exposure An example), etc., and it is required that all of these defects can be suppressed.
In the filter of the present invention, since the content of the first organic compound is less than or equal to the predetermined amount, the first organic compound is less likely to be mixed in the chemical liquid produced using the filter of the present invention as an impurity. is improved.
In addition, since the filter of the present invention contains a predetermined amount or more of the first organic compound, it is possible to suppress adhesion of other trace components (especially impurities that are likely to cause defects) to the filter. can be suppressed from causing defects in the pattern due to the trace components of mixing into the chemical liquid produced using the filter of the present invention.
Based on this mechanism, the present inventors presume that the resist process using the chemical liquid produced using the filter of the present invention was able to suppress the occurrence of defects in the finally obtained pattern. .

[Specific organic compound]
The filter of the present invention includes compounds represented by general formulas (I) to (V), alkanes represented by general formula (X), and alkenes represented by general formulas (XI) and (XII), which will be described later. containing a first organic compound selected from the group consisting of
The first organic compound and the compounds represented by general formulas (VI) to (VIII) described later are collectively referred to as a specific organic compound.
The specific organic compound is usually liquid or solid at normal temperature and normal pressure.

<First organic compound>
The first organic compound consists of compounds represented by general formulas (I) to (V), alkanes represented by general formula (X), and alkenes represented by general formulas (XI) and (XII). One or more selected from the group.
Each first organic compound will be described below.

・General formula (I)
The compounds represented by general formula (I) are shown below.

In general formula (I), R ^1a and R ^1c each independently represent an optionally substituted alkyl group.
The alkyl group may be linear or branched, and may contain a cyclic structure.
The number of carbon atoms in the alkyl group is preferably 1-50, more preferably 10-20. The number of carbon atoms in the alkyl group does not include the number of carbon atoms contained in the substituents that the alkyl group may contain.
R ^1b represents an optionally substituted alkylene group. The number of carbon atoms in the alkylene group does not include the number of carbon atoms contained in the substituents that the alkylene group may contain.
The alkylene group may be linear or branched, and may contain a cyclic structure.
The alkylene group preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms.

When the filter contains the compound represented by formula (I), the content thereof is preferably 0.10 to 3000 ppt by mass, more preferably 1.0 to 1000 ppt by mass, relative to the mass of the filter. 1.0 to 200 mass ppt is more preferred, and 1.0 to 80 mass ppt is particularly preferred.
The compounds represented by general formula (I) are exemplified.

・ General formula (II)
The compounds represented by general formula (II) are shown below.
The compound represented by general formula (II) is a specific organic compound different from the compound represented by general formula (I).

In general formula (II), a benzene ring group optionally containing a substituent, a cyclohexene ring group optionally containing a substituent, or a cyclohexane ring group containing a cycloalkyloxy group as a substituent represents The cyclohexane ring group may further contain another substituent.
Examples of the substituent that the benzene ring group may contain include an alkyl group, an alkoxy group, and an arylcarbonyl group that may contain a substituent.
Examples of the substituent that the cyclohexene ring group may contain include an alkenyloxy group and a cyclohexene ring group that may contain a substituent.

When the filter contains the compound represented by the general formula (II), the content is preferably 0.10 to 6000 ppt by mass, more preferably 1.0 to 2000 ppt by mass, relative to the mass of the filter, 1.0 to 400 mass ppt is more preferred, and 1.0 to 160 mass ppt is particularly preferred.
Compounds represented by general formula (II) are exemplified.

・ General formula (III)
The compounds represented by general formula (III) are shown below.
The compound represented by general formula (III) is a specific organic compound different from the specific organic compounds described above.

・ General formula (III)
In general formula (III), R ^3a to R ^3h each independently represent an optionally substituted alkyl group.
R ^3b and R ^3e may combine with each other to form a ring, and the group formed by combining R ^3b and R ^3e with each other is -O-(-Si(R ³ⁱ ) ₂ -O- ) _a- .
a represents an integer of 1 or more. Although the upper limit of a is not particularly limited, it is often 10 or less.
R ³ⁱ represents an optionally substituted alkyl group.
Multiple R ³ⁱ may be the same or different.
The alkyl groups represented by R ^3a to R ³ⁱ may be linear or branched, and may contain a cyclic structure.
The number of carbon atoms in the alkyl group is preferably 1-10, more preferably 1-5. The number of carbon atoms in the alkyl group does not include the number of carbon atoms contained in the substituents that the alkyl group may contain.
The alkyl groups represented by R ^3a to R ³ⁱ are each independently preferably an unsubstituted alkyl group, more preferably a methyl group.
It is also preferred that one of R ^3g and R ^3h is an alkyl group containing a substituent. The above substituent is preferably a group containing one or more oxyalkylene groups (the alkylene group portion preferably has 2 to 4 carbon atoms, may be linear or branched, and may contain a cyclic structure). .

When the filter contains the compound represented by the general formula (III), the content is preferably 0.10 to 5000 mass ppt, more preferably 1.0 to 1500 mass ppt, relative to the mass of the filter, 1.0 to 400 mass ppt is more preferred, and 1.0 to 110 mass ppt is particularly preferred.
Compounds represented by general formula (III) are exemplified.

・General formula (IV)
Compounds represented by general formula (IV) are shown below.
The compound represented by general formula (IV) is a specific organic compound different from the specific organic compounds described above.

In general formula (IV), R ^4a represents -N(R ^4c )R ^4d or -SR ^4e .
R ^4c , R ^4d and R ^4e each independently represent a hydrogen atom or a substituent.
R ^4b represents -NH- or -S-.
Examples of R ^4e include aromatic thio groups.
The aromatic ring group in the aromatic thio group may or may not contain a heteroatom (such as a sulfur atom, a nitrogen atom, and/or an oxygen atom), and preferably contains a heteroatom. . The above aromatic ring group may be monocyclic or polycyclic, and is preferably polycyclic.
The above aromatic ring is preferably a benzothiazole ring group.

When the filter contains the compound represented by formula (IV), the content thereof is preferably 0.10 to 2000 ppt by mass, more preferably 1.0 to 1000 ppt by mass, relative to the mass of the filter. 1.0 to 600 ppt by weight is more preferred.
Compounds represented by general formula (IV) are exemplified.

・General formula (V)
Compounds represented by general formula (V) are shown below.
The compound represented by formula (V) is a specific organic compound different from the specific organic compounds described above.

In general formula (V), Y represents a benzene ring group optionally substituted with an alkyl group, or a group represented by formula (A). In formula (A), * represents a bonding position.

When Y represents a benzene ring group, s represents 1, L represents a single bond, and ^R5a represents an optionally substituted alkyl group. The alkyl group may contain a heteroatom (preferably an oxygen atom).
The alkyl group of R ^5a may be linear or branched and may contain a cyclic structure.
The number of carbon atoms in the alkyl group of R ^5a is preferably 1-20, more preferably 1-10. The number of carbon atoms in the alkyl group of R ^5a above does not include the number of carbon atoms contained in the substituents that the alkyl group of R ^5a may contain.
The substituent that the alkyl group of R ^5a may contain preferably contains an aromatic ring group (preferably a benzene ring group, which may further contain a substituent). The above substituent is more preferably an aromatic ester group.
When the benzene ring group represented by Y is substituted with an alkyl group, the alkyl group and R ^5a may combine with each other to form a ring. Moreover, when the benzene ring group represented by Y is substituted with a plurality of alkyl groups, the alkyl groups may be bonded to each other to form a ring.

When Y represents a group represented by formula (A), s represents 3, L represents a methylene group, and each R ^5a independently represents an alkyl group.
In this case, the number of carbon atoms in the alkyl group of R ^5a is preferably 1-15, more preferably 1-10.

When the filter contains the compound represented by the general formula (V), the content is preferably 0.10 to 2000 ppt by mass, more preferably 1.0 to 1500 ppt by mass, relative to the mass of the filter. 5.0 to 250 mass ppt is more preferred, and 5.0 to 60 mass ppt is particularly preferred.
Compounds represented by general formula (V) are exemplified.

・General formula (X)
The alkane represented by general formula (X) is shown below.
The alkane represented by the general formula (X) is a specific organic compound different from the specific organic compounds described above.

In general formula (X), j represents an integer of 12-50. Two j's have the same value. The alkane may be linear or branched. On the other hand, the alkanes do not contain cyclic structures. That is, the above alkanes are not cycloalkanes.

When the filter contains an alkane represented by the general formula (X), the content is preferably 0.10 to 3000 ppt by mass, more preferably 1.0 to 600 ppt by mass, relative to the mass of the filter. 1.0 to 315 mass ppt is more preferred, and 1.0 to 90 mass ppt is particularly preferred.

・General formula (XI)
Alkenes represented by general formula (XI) are shown below.
The alkene represented by formula (XI) is a specific organic compound different from the specific organic compounds described above.

In general formula (XI), k represents an integer of 12-50. Two k are the same value.
Alkenes represented by general formula (XI) are alkenes containing one C=C double bond in the molecule.
The above alkenes may be linear or branched. On the other hand, the alkenes do not contain cyclic structures.

When the filter contains an alkene represented by the general formula (XI), the content is preferably 0.10 to 9000 mass ppt, more preferably 0.10 to 3000 mass ppt, relative to the mass of the filter, 1.0 to 600 mass ppt is more preferred, and 1.0 to 250 mass ppt is particularly preferred.

- general formula (XII)
Alkenes represented by general formula (XII) are shown below.
The alkene represented by formula (XII) is a specific organic compound different from the specific organic compounds described above.

n represents an integer of 30-50.
m represents an integer of 20 to 90 and 2n-2 or less.
Alkenes represented by general formula (XII) are alkenes containing two or more C=C double bonds in the molecule.
When the alkene represented by the general formula (XII) contains x C═C double bonds, m takes the value “2n+2−2x”.
The above alkenes may be linear or branched. On the other hand, the alkenes do not contain cyclic structures.

When the filter contains an alkene represented by the general formula (XII), the content is preferably 0.10 to 4000 mass ppt, more preferably 1.0 to 1000 mass ppt, relative to the mass of the filter, 1.0 to 350 mass ppt is more preferred, and 1.0 to 70 mass ppt is particularly preferred.
Examples of alkenes represented by the general formula (XII) include squalene ( _C30H50 ), lycopene ( _C40H56 ), _neurosporene ( _C40H58 ), _phytoene ( _C40H64 ), or _phytoene ( _C40H64 ). Fluene (C ₄₀ H ₆₂ ) may be mentioned.

5. The total content of the first organic compound is 0.10 to 10000 mass ppt, preferably 1.0 to 8000 mass ppt, more preferably 5.0 to 2500 mass ppt, relative to the mass of the filter. 0 to 850 ppt by weight is particularly preferred.
If the total content of the first organic compound is 1.0 mass ppt or more (preferably 5.0 mass ppt or more) with respect to the mass of the filter, the filter will release the second organic compound described later in the environment ( Atmosphere, etc.), it is difficult to adsorb excessively moderately, and it is considered that the defect suppression property of the chemical solution to be manufactured is superior. If the total content of the first organic compound is 8000 mass ppt or less (preferably 2500 mass ppt or less, more preferably 850 mass ppt or less) relative to the mass of the filter, the produced chemical solution contains the first organic compound derived from the filter. 2. It is considered that organic compounds are less likely to be mixed in, and the defect suppression property of the manufactured chemical solution is superior.
When the filter contains a plurality of types of first organic compounds represented by different general formulas, at least one of the first organic compounds represented by each general formula has the preferred content range described above. More preferably, two or more of them satisfy the preferred content range.

<Second organic compound>
Further, the filter preferably contains, as the specific organic compound, one or more second organic compounds selected from the group consisting of compounds represented by general formulas (VI) to (VIII).
Each second organic compound will be described below.

・General formula (VI)
The compounds represented by general formula (VI) are shown below.
The compound represented by general formula (VI) is a specific organic compound different from the specific organic compounds described above.

In general formula (VI), ^R6a represents an optionally substituted alkyl group or a hydrogen atom.
R ^6b and R ^6c each independently represent a hydrogen atom, -AL-OR ^6d , -CO-R ^6e or -C(OH)-R ^6f .
AL represents an optionally substituted alkylene group (preferably having 1 to 6 carbon atoms).
Each of R ^6d , R ^6e and R ^6f independently represents a substituent (preferably an alkyl group which may further contain a substituent).
The optionally substituted alkyl groups represented by R ^6a , R ^6d , R ^6e and R ^6f may each independently be linear or branched and contain a cyclic structure. may
The number of carbon atoms in the alkyl group is preferably 1-50, more preferably 1-20. The number of carbon atoms in the alkyl group does not include the number of carbon atoms contained in the substituents that the alkyl group may contain.
Examples of substituents that the alkyl group may contain include a hydroxyl group, an alkylester group, and an alkylvinyl group (preferably, the alkyl group portion has 3 to 12 carbon atoms).
When multiple R ^6d are present, each of the multiple R ^6d may be the same or different. When multiple R ^6e are present, each of the multiple R ^6e may be the same or different. When there are multiple R ^6f 's, each of the multiple R ^6f 's may be the same or different.
a combination of two selected from the group consisting of substituents that the alkyl group represented by R ^6a may contain, R ^6d , R ^6e and R ^6f , two R ^6d together, and two R ^6e together , or two R ^6f may be joined together to form a ring.
a combination of two selected from the group consisting of substituents that the alkyl group represented by R ^6a may contain, R ^6d , R ^6e and R ^6f , two R ^6d together, and two R ^6e together , or the group formed by bonding two R ^6f to each other is one or more selected from the group consisting of —O—, —NR ^6g — (R ^6g is a substituent), and —NHCO— preferably contains a linking group of
At least one of R ^6a , R ^6b and R ^6c is other than a hydrogen atom.

When the filter contains a compound represented by general formula (VI), the content is preferably 0.10 to 20000 ppt by mass, more preferably 1.0 to 4000 ppt by mass, relative to the mass of the filter, 1.0 to 1000 mass ppt is more preferred, and 1.0 to 300 mass ppt is particularly preferred.
Compounds represented by general formula (VI) are exemplified.
In the examples below, AL represents an optionally substituted alkylene group having 1 to 10 carbon atoms, and q represents an integer of 4 to 6.

・General formula (VII)
Compounds represented by general formula (VII) are shown below.
The compound represented by general formula (VII) is a specific organic compound different from the specific organic compounds described above.

In general formula (VII), ^R7a and ^R7b each independently represent an optionally substituted alkyl group.
The alkyl group may be linear or branched, and may contain a cyclic structure.
The number of carbon atoms in the alkyl group is preferably 1-20, more preferably 2-10. The number of carbon atoms in the alkyl group does not include the number of carbon atoms contained in the substituents that the alkyl group may contain.
As the substituent, for example, an aromatic ring group (which may further contain a substituent, preferably a phenyl group) is preferable.

When the filter contains the compound represented by the general formula (VII), the content is preferably 0.10 to 30000 ppt by mass, more preferably 1.0 to 5000 ppt by mass, relative to the mass of the filter, 1.0 to 395 mass ppt is more preferred, and 1.0 to 90 mass ppt is particularly preferred.
Compounds represented by general formula (VII) are exemplified.

・General formula (VIII)
Compounds represented by general formula (VIII) are shown below.
The compound represented by formula (VIII) is a specific organic compound different from the specific organic compounds described above.

一般式（ＶＩＩＩ）中、Ｒ^８ａ～Ｒ^８ｃは、それぞれ独立に、水素原子、置換基を含有していてもよいアルキル基、又は、置換基を含有していてもよいベンゼン環基を表す。
Ｒ^８ａ～Ｒ^８ｃのうち、１つ以上（好ましくは２つ以上は）置換基を含有していてもよいアルキル基、又は、置換基を含有していてもよいベンゼン環基であるのが好ましい。
上記アルキル基は、直鎖状でも分岐鎖状でもよく、環状構造を含有していてもよい。
上記アルキル基の炭素数は１～２０が好ましく、１～５がより好ましい。なお、上記アルキル基の炭素数は、アルキル基が含有していてもよい置換基が含有する炭素原子の数を含まない。上記置換基としては、アルコキシ基（好ましくは炭素数２～６）又はハロゲン原子（フッ素原子、塩素原子、臭素原子、又は、ヨウ素原子等）が好ましい。
上記ベンゼン環基が含有していてもよい置換基としては、アルキル基（好ましくは炭素数２～１０）が好ましい。

In general formula (VIII), R ^8a to R ^8c each independently represent a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted benzene ring group.
Of R ^8a to R ^8c , one or more (preferably two or more) optionally substituted alkyl groups or optionally substituted benzene ring groups are preferred. .
The alkyl group may be linear or branched, and may contain a cyclic structure.
The number of carbon atoms in the alkyl group is preferably 1-20, more preferably 1-5. The number of carbon atoms in the alkyl group does not include the number of carbon atoms contained in the substituents that the alkyl group may contain. As the substituent, an alkoxy group (preferably having 2 to 6 carbon atoms) or a halogen atom (fluorine atom, chlorine atom, bromine atom, iodine atom, etc.) is preferable.
As the substituent which the benzene ring group may contain, an alkyl group (preferably having 2 to 10 carbon atoms) is preferable.

When the filter contains the compound represented by the general formula (VIII), the content is preferably 0.10 to 20000 ppt by mass, more preferably 1.0 to 10000 ppt by mass, relative to the mass of the filter, 1.0 to 8000 weight ppt is more preferred, 1.0 to 1000 weight ppt is particularly preferred, and 1.0 to 300 weight ppt is most preferred.
Compounds represented by general formula (VIII) are exemplified.

The total content of the second organic compound is preferably 0.10 to 200000 mass ppt, more preferably 1.0 to 9000 mass ppt, particularly preferably 1.0 to 3000 mass ppt, relative to the mass of the filter. 0 to 750 mass ppt is most preferred.
When the filter contains a plurality of types of second organic compounds each represented by a different general formula, at least one of the first organic compounds represented by each general formula has the preferred content range described above. More preferably, two or more of them satisfy the preferred content range.

<Group A, Group B>
The specific organic compound can be classified into a group A specific organic compound and a group B specific organic compound, in addition to the first organic compound and the second organic compound.
The specific organic compound of group A is a compound selected from the group consisting of compounds represented by general formulas (I) to (VIII), and the specific organic compound of group B is represented by general formula (X). A compound selected from the group consisting of alkanes and alkenes represented by general formulas (XI) and (XII).
The filter preferably contains both one or more of the Group A specific organic compounds and one or more of the Group B specific organic compounds.

When the filter contains a group A specific organic compound, the total content is preferably 0.10 to 100000 mass ppt, more preferably 0.10 to 10000 mass ppt, more preferably 0.1 ~3200 mass ppt is more preferred, 1.0 to 1000 mass ppt is particularly preferred, and 1.0 to 1200 mass ppt is most preferred.
When the filter contains the specific organic compound of Group B, the total content is preferably 0.10 to 50000 mass ppt, more preferably 0.10 to 10000 mass ppt, more preferably 1.0 ~1200 mass ppt is more preferred, 1.0 to 1000 mass ppt is particularly preferred, and 1.0 to 500 mass ppt is particularly preferred.

In the filter, the total content of the specific organic compound of group A and the specific organic compound of group B (that is, the compounds represented by general formulas (I) to (VIII), the alkane represented by general formula (X), and , the total content of compounds selected from the group consisting of alkenes represented by general formulas (XI) and (XII)) is preferably 0.1 ppt by mass or more, and 1 It is more preferably 5 ppt by mass or more, and even more preferably 5 ppt by mass or more. The upper limit is preferably 1000000 mass ppt or less, more preferably 170000 mass ppt or less, even more preferably 10000 mass ppt or less, particularly preferably 6500 mass ppt or less, and most preferably 1600 mass ppt or less.

In addition, in this specification, the content of the specific organic compound in the filter is measured by the following method.
First, the dried filter is immersed in PGMEA (propylene glycol monomethyl ether acetate) heated under reflux conditions for 1 hour to elute the specific organic compound in the filter into PGMEA (elution treatment).
At this time, the PGMEA to be immersed uses a high-purity grade (and the amount of impurities contained at this time is defined as zero). The amount (mass) of PGMEA in which the filter is immersed is 10 to 30 times the mass of the filter to be measured.
Before and after elution treatment, the amount and type of specific organic compounds contained in each PGMEA were measured by GC/MS (gas chromatography mass spectrometry) method, and the amount of each specific organic compound in PGMEA increased by elution treatment was calculated. , is defined as the amount of each specific organic compound contained in the filter to be measured. More specifically, "(content of each specific organic compound in PGMEA after being subjected to treatment) - (content of each specific organic compound in PGMEA before being subjected to treatment)" is the filter specified in the present application is the content of each specific organic compound in

[Metal component]
The filter may contain metal components.
In the present invention, the metal component includes metal particles and metal ions. For example, the content of the metal component indicates the total content of the metal particles and metal ions.
The filter may contain either one of metal particles and metal ions, or may contain both. The filter preferably contains both metal particles and metal ions.

Metal elements in the metal component include, for example, Al (aluminum), B (boron), Ba (barium), Ca (calcium), Cd (cadmium), Co (cobalt), Cr (chromium), Cu (copper), Fe (iron), K (potassium), Li (lithium), Mg (magnesium), Mn (manganese), Mo (molybdenum), Na (sodium), Ni (nickel), P (phosphorus), Pb (lead), Sb (antimony), Si (silicon), Ti (titanium), V (vanadium), and Zn (zinc).
Among them, the metal element in the metal component is preferably one or more selected from the group consisting of Al, Ca, Cr, Cu, Fe, K, Mg, Na, Ni, Zn, and Pb. Hereinafter, these metal elements are also specifically referred to as specific metal elements. A metal component, a metal particle, and a metal ion containing a specific metal element are also referred to as a specific metal component, a specific metal particle, and a specific metal ion, respectively.

The metal particles may be a single substance, an alloy, or other metal compounds, and may exist in a form in which a metal (including a metal compound) is associated with an organic substance.
The metal component may be a metal component that is unavoidably contained in the filter, a metal component that is unavoidably contained during the production, storage and/or transfer of the treatment liquid, or may be intentionally added. good.

When the filter contains a specific metal component, the content thereof is preferably 0.10 to 30,000 ppt by mass relative to the total mass of the chemical solution, and 0.10 to 0.10 mass ppt. 5000 mass ppt is more preferred, 1.0 to 5000 mass ppt is more preferred, 1.0 to 1500 mass ppt is particularly preferred, and 1.0 to 300 mass ppt is most preferred.
When the content of the specific metal component is 0.1 ppt by mass or more, the metal forms coarse aggregates that are repelled by centrifugal force, and as a result, the defect suppressing property can be further improved.
Moreover, when the content of the specific metal component is less than 30000 ppt by mass, it is easy to avoid an increase in the occurrence of defects derived from the metal component.

When the filter contains specific metal ions, the content is preferably 0.10 to 20,000 ppt by mass, more preferably 0.10 to 2,500 ppt, based on the mass of the filter, because the resulting chemical solution has better defect suppression properties. Weight ppt is more preferred, 1.0 to 2500 weight ppt is even more preferred, and 1.0 to 800 weight ppt is particularly preferred.
When the filter contains specific metal particles, the content is preferably 0.10 to 5000 ppt by mass, more preferably 0.10 to 1000 ppt, based on the mass of the filter, because the resulting chemical solution has better defect suppression properties. Weight ppt is more preferred, 1.0 to 1000 weight ppt is more preferred, and 1.0 to 400 weight ppt is particularly preferred.

The types and contents of metal ions and metal particles in the filter are determined by the same method as the elution treatment in which the specific organic compound in the filter is eluted into PGMEA, and the metal component in the filter is transferred to PGMEA. .
SNP-ICP/MS (single nano-particle inductively coupled plasma mass spectrometry. For example, Agilent 8900) for each PGMEA before and after the treatment. , is defined as the amount of each metal component contained in the filter to be measured.

[Structure of filter body]
The filter contains a filter body. The filter body is typically porous and the liquid to be purified that is processed by the filter of the invention passes through the pores it contains.

<Pore diameter of filter (pore diameter of filter body)>
The pore size of the filter is not particularly limited, and a filter having a pore size generally used for filtering the substance to be purified, which will be described later, can be used. Among them, the pore diameter of the filter is preferably 200 nm or less, more preferably 20 nm or less, and even more preferably 10 nm or less, in that the number of particles (metal particles, etc.) contained in the chemical solution can be easily controlled within a desired range. The lower limit is not particularly limited, but generally 1 nm or more is preferable from the viewpoint of productivity.
When multiple filters are used, at least one filter preferably satisfies the above range.
In this specification, the pore size and pore size distribution of the filter refer to isopropanol (IPA) or HFE-7200 (“Novec 7200”, manufactured by 3M, hydrofluoroether, C ₄ F ₉ OC ₂ H ₅ ) means pore size and pore size distribution as determined by the bubble point.
Generally, the pore size of the filter body and the pore size of the filter are the same.

<Material of filter body>
The material component of the filter body is not particularly limited. Materials contained in the filter body include polyamides such as nylon (e.g., 6-nylon and 6,6-nylon); polyolefins such as polyethylene and polypropylene; polystyrene; polyimide (including polyamideimide). poly(meth)acrylate; polytetrafluoroethylene, perfluoroalkoxyalkane, perfluoroethylene propene copolymer, ethylene-tetrafluoroethylene copolymer, ethylene-chlorotrifluoroethylene copolymer, polychlorotrifluoroethylene, polyvinylidene fluoride, and , polyfluorocarbon such as polyvinyl fluoride; polyvinyl alcohol; polyester; cellulose; Among them, nylon (among them, 6,6-nylon is preferable), polyolefin (among them, polyethylene is preferable), and It preferably contains at least one selected from the group consisting of poly(meth)acrylates and polyfluorocarbons (preferably polytetrafluoroethylene (PTFE) and perfluoroalkoxyalkane (PFA)). These polymers can be used alone or in combination of two or more.
In addition to resin, diatomaceous earth, glass, and the like may also be used.

The polyimide (including polyamide-imide) that the filter body may contain preferably has an imidization rate of 1.0, more preferably 1.4 or more. The upper limit is not particularly limited, but generally 2.0 or less is preferable.
The value obtained by dividing the area of the peak representing the imide bond measured by the FT-IR (Fourier transform infrared spectrometer) device by the area of the peak representing the benzene measured by the same FT-IR device is defined as the "imidization rate". .

It is preferable that the polyimide contains continuous pores having a B value of 15 nm or less as determined by the method described later. do.
First, adsorption isotherms are obtained by adsorbing and desorbing adsorbed molecules on polyimide. Then, from the obtained adsorption isotherm, [P/{V _a (P ₀ −P)}] is calculated based on the following formula (1) and plotted against the equilibrium relative pressure (P/P ₀ ). Considering this plot as a straight line, the slope s (=[(C-1)/(V _m C)]) and intercept i (=[1/(V _m C)]) Calculate Then, _Vm and C are calculated from the calculated slope s and intercept i based on formulas (2-1) and (2-2). Furthermore, from _Vm , the specific surface area A is calculated based on the formula (3).
Next, the obtained adsorption data of the adsorption isotherm are linearly interpolated to obtain the adsorption amount at the relative pressure set by the pore volume calculation relative pressure. A total pore volume V is calculated from this amount of adsorption.
This is generally based on the theory of a series of specific surface area calculation methods called the "BET (Brunauer, Emmett, Teller) method". In carrying out the above method, matters not described in this specification conform to JIS R 1626-1996 "Method for measuring specific surface area of fine ceramic powder by gas adsorption BET method".

[P/{V _a (P ₀ −P)}]
= [1/(V _m C)] + [(C-1)/(V _m C)] (P/P ₀ ) (1)
V _m =1/(s+i) (2−1)
C=(s/i)+1 (2-2)
A=(V _m L σ)/22414 (3)

however,
V _a : adsorption amount V _m : adsorption amount of monomolecular layer P: equilibrium pressure of adsorbed molecule P ₀ : saturated vapor pressure of adsorbed molecule L: Avogadro's number σ: adsorption cross section of adsorbed molecule.

The B value (nm) is calculated from the formula [4V / A] based on the obtained specific surface area A and total pore volume V after calculating the specific surface area A and total pore volume V based on the above method. value. The B value (nm) has significance as a pore size estimated from the measurement results of the BET method.

It is also preferred that the filter body contains a copolymer containing repeating units based on tetrafluoroethylene and other repeating units.
The copolymer containing repeating units based on tetrafluoroethylene and other repeating units is not particularly limited, but examples thereof include tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer (Poly(PTFE-CO-PFVAE )), tetrafluoroethylene-hexafluoropropylene copolymer (FEP), and mixtures thereof. PFA Teflon® is an example of a tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer in which the alkyls are predominantly or wholly propyl groups. FEP Teflon® is an example of a tetrafluoroethylene-hexafluoropropylene copolymer. Both are manufactured by DuPont. Neoflon® PFA (Daikin Industries) is a polymer similar to DuPont's PFA Teflon®. US Pat. No. 5,463,006 describes tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymers in which the alkyl groups are predominantly methyl. Also preferred is Hyflon® poly(PTFE-CO-PFVAE) 620 available from Ausimont USA, Inc. of Thorofare, NJ.

The filter body containing a copolymer containing repeating units based on tetrafluoroethylene and other repeating units should contain a copolymer containing repeating units based on tetrafluoroethylene and other repeating units. , pore size, pore structure, etc. are not particularly limited, and it is preferably a membrane formed using hollow fibers (hollow fiber membrane).

The outer or inner surface of the hollow fiber membrane can be skinned or unskinned. A skin is a thin, dense surface layer integral with the base of the membrane. In the case of skinned membranes, most of the flow resistance by the membrane is in the thin skin. The surface skin may contain pores that render the substrate a continuous porous structure, or it may be a non-porous integral film. Asymmetry relates to the uniformity of pore size across the thickness of the membrane, and for hollow fibers this corresponds to the porous walls of the fiber. Asymmetric membranes have structures in which the pore size is a function of position in the cross section. Another way of defining asymmetry is the ratio of the pore size on one side to the pore size on the opposite side.
A method for producing a material component composed of a hollow fiber membrane using a copolymer containing such a repeating unit based on tetrafluoroethylene and another repeating unit is described in, for example, Japanese Patent Application Laid-Open No. 2015-61727. can refer to.

When the filter body contains nylon, the filter preferably contains one or more of the above-mentioned group A specific organic compounds and two or more of the above group B specific compounds.
In this case, the filter body preferably contains at least an alkane represented by general formula (X) and an alkene represented by general formula (XI). Furthermore, in the filter, the content of alkane represented by general formula (X) is A, the content of alkene represented by general formula (XI) is B, and the content of alkene represented by general formula (XII) is is C, it is preferable to satisfy the relationships C<A and C<B on a mass basis.

When the filter body contains polyethylene or PTFE, the filter preferably contains one or more of the specific organic compounds of Group A and an alkane represented by the general formula (X).

Moreover, the filter body may be surface-treated. The surface treatment method is not particularly limited, and known methods can be used. Examples of surface treatment methods include chemical modification treatment, plasma treatment, hydrophobic treatment, coating, gas treatment, and sintering.

Plasma treatment is preferred because the surface of the filter body is rendered hydrophilic. The water contact angle on the surface of the filter body hydrophilized by plasma treatment is not particularly limited, but the static contact angle at 25 ° C. measured with a contact angle meter is preferably 60 ° or less, more preferably 50 ° or less. , 30° or less.

As the chemical modification treatment, a method of introducing an ion exchange group into the base material is preferable.
That is, the filter main body may be formed by using each of the above-mentioned materials as a base material, and ion-exchange groups being introduced into the base material. Typically, a filter body containing a layer containing a substrate containing ion-exchange groups on the surface of the substrate is preferable (such a form is also simply referred to as "the filter body contains ion-exchange groups". Hereinafter, based on the same intent in expression). The surface-modified base material is not particularly limited, and it is preferable to introduce an ion exchange group into the above polymer from the viewpoint of easier production.

Examples of ion exchange groups include sulfonic acid groups, carboxyl groups, phosphoric acid groups and the like as cation exchange groups, and quaternary ammonium groups and the like as anion exchange groups. The method of introducing the ion-exchange group into the polymer is not particularly limited, but typically includes a method of grafting by reacting a compound containing an ion-exchange group and a polymerizable group with the polymer.

The method for introducing the ion-exchange group is not particularly limited, but the fibers of the above resin are irradiated with ionizing radiation (α-rays, β-rays, γ-rays, X-rays, electron beams, etc.) to introduce active moieties ( radicals). The irradiated resin is immersed in a monomer-containing solution to graft polymerize the monomer onto the substrate. As a result, a polymer is produced in which this monomer is attached to the polyolefin fiber as a grafted side chain. The resulting resin containing the polymer as a side chain is contacted with a compound containing an anion-exchange group or a cation-exchange group to introduce an ion-exchange group into the graft-polymerized side chain polymer to obtain a final product. can get.

Further, the filter body may be configured by combining a woven fabric or non-woven fabric on which ion exchange groups are formed by a radiation graft polymerization method and a conventional filter material of glass wool, woven fabric or non-woven fabric.

The use of a filter body containing ion-exchange groups makes it easier to control the content of particles containing metal atoms in the chemical solution within a desired range. The material of the filter containing ion-exchange groups is not particularly limited, but examples thereof include polyfluorocarbons and materials obtained by introducing ion-exchange groups into polyolefin. Materials obtained by introducing ion-exchange groups into polyfluorocarbon are more preferable.
The pore size of the filter containing the filter body containing ion exchange groups is not particularly limited, but is preferably 1 to 30 nm, more preferably 5 to 20 nm. When a plurality of filters are used, the filter using the filter body containing ion exchange groups may also serve as the filter containing the smallest pore size, or may be used separately from the filter containing the smallest pore size. may Among them, in the point that the defect suppression property of the obtained chemical solution is more excellent, when using a plurality of filters in the filtration step described later, a filter using a filter body containing an ion exchange group and a filter containing no ion exchange group, the minimum A preferred embodiment uses a filter that uses a filter body containing pore sizes.

The material used for the filter body of the filter containing the smallest pore size is not particularly limited, but from the viewpoint of solvent resistance and the like, generally at least one selected from the group consisting of polyfluorocarbons and polyolefins is preferable, Polyolefins are more preferred.

Therefore, when a plurality of filters are used, the filter body of the filter may be made of a different material for each filter. Two or more types of filters using a filter body using a material selected from the group may be used.

The filter (filter body) may contain a coating layer.
The filter body containing the coating layer includes, for example, a porous substrate made of polyfluorocarbon, and a coating layer containing a resin containing a hydrophilic group arranged so as to cover the porous substrate. Filter main body A is mentioned. Although it is preferable that the entire surface of the porous substrate is covered with the coating layer, there may be a part of the surface that is not covered with the coating layer. The surface also includes the surface of the pores of the porous substrate.
Polyfluorocarbons include polytetrafluoroethylene, perfluoroalkoxyalkanes, perfluoroethylenepropene copolymers, ethylene-tetrafluoroethylene copolymers, ethylene-chlorotrifluoroethylene copolymers, polychlorotrifluoroethylene, polyvinylidene fluoride, and polyfluoride. Examples thereof include vinyl and the like, and polytetrafluoroethylene (PTFE) is preferred. As the polyfluorocarbon, a polyfluorocarbon commercially available as a porous substrate made of PTFE can be appropriately used.
The method for producing the filter body A is not particularly limited, but typically, a composition for forming a coating layer containing a resin containing a hydrophilic group on a porous substrate made of polyfluorocarbon (for example, PTFE) and the above porous A method of contacting (eg, coating and/or spraying) a porous substrate to form a coating layer on the surface (including the surface inside the pores) of the porous substrate is preferred.

The coating layer contains a resin containing a hydrophilic group. The resin is not particularly limited, and known resins can be used. Among them, polynorbornene or a copolymer thereof is preferable from the viewpoint of solvent resistance and the like.
Examples of hydrophilic groups include, but are not limited to, hydroxyl groups, ether groups, oxyalkylene groups, polyoxyalkylene groups, carboxylic acid groups, ester groups, carbonate ester groups, thiol groups, thioether groups, phosphoric acid groups, and phosphoric acid groups. Examples include an ester group, an amide group, an imide group, and groups in which these are combined (e.g., a group containing a thioether group and a hydroxyl group), and the like, and a polyoxyalkylene group is preferred in that the effects of the present invention are more excellent. .
As for the manufacturing method of the filter body A, for example, the descriptions in JP-A-2016-194038 and JP-A-2016-199733 can be referred to.

The filter body containing the coating layer includes, for example, a porous substrate made of polyfluorocarbon and a coating layer containing a resin containing an adsorptive group arranged so as to cover the porous substrate. It may be the filter main body B. It is preferable that the entire surface of the porous substrate is covered with the coating layer, but there may be a part of the surface that is not covered with the coating layer. The surface also includes the surface of the pores of the porous substrate.
Examples of the polyfluorocarbon include the same examples as described above.
The method for producing the filter body B is not particularly limited, but typically, a coating layer-forming composition containing a resin containing an adsorptive group is used on a porous substrate made of polyfluorocarbon (e.g., PTFE). , a method of contacting (for example, coating and/or spraying) a coating layer-forming composition on the porous substrate to form a coating layer on the surface of the porous substrate (including the surface inside the pores). preferable.

The coating layer contains a resin containing an adsorptive group. The resin is not particularly limited, and known resins can be used. Adsorptive groups include, but are not limited to, ether groups, hydroxyl groups, thioether groups, thiol groups, quaternary ammonium groups (quaternary ammonium bases), carboxylic acid groups, sulfonic acid groups, phosphoric acid groups, sulfonium groups, and diester groups. , and groups containing these, among others, ether group, hydroxyl group, thioether group, thiol group, quaternary ammonium group, carboxylic acid group, and sulfonic acid group in that the effect of the present invention is more excellent A group containing at least one selected from the group consisting of is preferred. Among them, a group containing a thioether group and further containing at least one selected from the group consisting of an ether group, a hydroxyl group, a thiol group, a quaternary ammonium group, a carboxylic acid group, and a sulfonic acid group is preferred.
The resin may contain one type of adsorptive group alone, or may contain two or more types.

Although the adsorptive group is not particularly limited, a group represented by *-SL(R ¹ ) _m (R ² ) _nm-1 is more preferable. In the above formula, L is an n-valent linking group (where n is an integer of 2 or more), and R ¹ is a group consisting of a hydroxyl group, a thiol group, a quaternary ammonium group, a carboxylic acid group, and a sulfonic acid group. is at least one group selected from the above, and R ² represents a hydrogen atom or a monovalent organic group; Also, * represents a bonding position, and m represents an integer of 0 or more and n−1 or less.
As a method for manufacturing the filter body B, for example, the descriptions in JP-A-2017-002273, JP-A-2016-29146, JP-A-2016-196625, and JP-A-2016-194040 can be referred to.

The filter body containing the coating layer includes, for example, a polytetrafluoroethylene porous substrate and a coating layer containing a fluorinated ionomer disposed so as to cover the porous substrate. The fluorinated ionomer may be a filter body C containing at least two types of monomer units described below and at least one selected from the group consisting of an iodine atom and a bromine atom.
The two types of monomer units are an ethylene group and a functional group convertible to a hydrophilic group selected from the group consisting of —SO ₂ F, —COOR, —COF, and combinations thereof, and R is a C ₁ -C ₂₀ alkyl radical or a C ₆ -C ₂₀ aryl radical functional group; and formula (OF-1), formula (OF-2) below , and monomer units derived from at least one bis-olefin selected from the group consisting of formula (OF-3).

In formula (OF-1), j is an integer of 2 to 10, R1, R2, R3, and R4 may be the same or different, H, F, or a C ₁ to C ₅ alkyl group, It is a perfluoroalkyl group or a fluoroalkyl group.

式（ＯＦ－２）中、複数あるＡは、それぞれ、同一又は互いに異なってもよく、それぞれ独立に、Ｆ、Ｃｌ、及び、Ｈからなる群より選択され、複数あるＢは、同一又は互いに異なってもよく、それぞれ独立して、Ｆ、Ｃｌ、Ｈ、及び、ＯＲＢからなる群より選択され、ここで、ＲＢは、少なくとも部分的に、フッ素化又は塩素化され得る分枝状若しくは直鎖状のアルキルラジカルであり、Ｅは、エーテル結合で挿入され得る、必要に応じてフッ素化されている、２～１０個の炭素原子を含有する二価の基である。

In formula (OF-2), a plurality of A's may be the same or different from each other, and are each independently selected from the group consisting of F, Cl, and H, and a plurality of B's are the same or different from each other. each independently selected from the group consisting of F, Cl, H, and ORB, wherein RB is at least partially a branched or linear chain that can be fluorinated or chlorinated; and E is an optionally fluorinated divalent group containing 2 to 10 carbon atoms that can be inserted with an ether linkage.

In formula (OF-3), E, A, and B are the same as defined for each symbol in formula (OF-2), R5, R6, and R7 may be the same or different, and H , F, or a C ₁ -C ₅ alkyl group, perfluoroalkyl group, or fluoroalkyl group.
As for the manufacturing method of the filter main body C, for example, the description in Japanese Patent Application Laid-Open No. 2012-522882 can be referred to.

The filter body containing the coating layer includes a PTFE porous substrate and a non-crosslinked coating layer containing a perfluorosulfone (PFSA) acid polymer formed to cover the porous substrate. It may be D.
The porous substrate contained in the filter body D may have a region not covered with the non-crosslinked coating layer, but the surface (including the surface of the pores communicating with the outermost surface of the porous membrane) The whole is preferably covered with a non-crosslinked coating layer.

The porous substrate made of polytetrafluoroethylene is not particularly limited, and a commercially available porous substrate made of PTFE can be used as appropriate.

PFSA polymer dispersions for forming the coating layer include, but are not limited to, AQUIVION® PFSA (e.g., Aquivion PFSA D83-24B, Aquivion PFSA D83-06A, from Solvay Specialty Polymers, Borger, Texas). , and _{Aquivion PFSA D79-20BS} ), which is a short _side chain (SSC ) copolymers. The ionomer dispersion contains its sulfonic acid form. Also preferred as the PFSA polymer dispersion is DuPont® Nafion® PFSA polymer dispersion.

When forming the coating, the content of PFSA in the coating solution can be adjusted as appropriate. In general, the content is preferably in the range of 0.10-3% by weight, more preferably in the range of 0.12-2.2% by weight, relative to the total weight of the coating solution.

The method of forming the coating on the base material is not particularly limited, and includes a method of immersing the base material in the coating liquid and a method of spraying the base material with the coating liquid.

It is also preferred that the filter body contains two or more layers. Two or more layers may be the same or different.
As a specific example of a combination of two or more layers, a first layer made of a PTFE porous substrate containing a first hydrophilic group on the surface and a first hydrophilic group disposed on the first layer are and a second layer comprising a PTFE porous substrate containing different second hydrophilic groups on the surface thereof.

The method for forming the PTFE porous substrate (membrane) containing hydrophilic groups on the surface is not particularly limited, and the first hydrophilic group and/or the second hydrophilic group is formed on the surface of the unmodified PTFE porous membrane. A method of bonding a hydrophilic group can be mentioned.
Although the method for introducing hydrophilic groups into an unmodified PTFE porous substrate is not particularly limited, a method of introducing hydrophilic groups into the substrate using unmodified PTFE as a substrate is preferred.
The method for introducing hydrophilic groups is not particularly limited, but ionizing radiation (α-rays, β-rays, γ-rays, X-rays, electron beams, etc.) is applied to the PTFE porous membrane to activate it in the PTFE resin. Generate moieties (radicals). The irradiated PTFE resin is immersed in a solution containing a compound containing a predetermined functional group to bond the compound to the substrate. At this time, in the form in which the resin is immersed in the monomer containing the functional group, the monomer containing the functional group is graft-polymerized to the main chain of the resin. As a result, this monomer is attached to the polyolefin fiber as a graft polymerization side chain.

In addition to the above, there are cases where hydrophilic groups can be introduced into the PTFE porous substrate by plasma treatment, flame treatment, or the like.

Although the first hydrophilic group and the second hydrophilic group are not particularly limited, for example, hydroxyl group, (poly)ether group, oxyalkylene group, polyoxyalkylene group, carboxylic acid group, boronic acid group, phosphonic group , sulfonic acid group, amino group, quaternary ammonium group, imidazolium group, pyridinyl group, ester group, carbonate ester group, thiol group, thioether group, phosphate group, phosphate ester group, amide group, imide group, (per ) fluoroalkyl groups, and groups combining these, among others, polyether groups, hydroxyl groups, thioether groups, thiol groups, quaternary ammonium groups, carboxylic acid groups, sulfonic acid groups, and combinations thereof It is preferably at least one selected from the group consisting of groups.

<Pore structure of filter body>
The pore structure of the filter body (in other words, the pore structure of the material component contained in the filter body) is not particularly limited, and may be appropriately selected according to the components in the substance to be purified, which will be described later. In this specification, the pore structure of the filter body means the pore size distribution, the positional distribution of the pores in the filter body, the shape of the pores, etc. Typically, the filter body (or It can be controlled by the manufacturing method of the material components contained in the filter body.
For example, a porous membrane can be obtained by sintering a powder such as a resin, and a fiber membrane can be obtained by electrospinning, electroblowing, meltblowing, or the like. These have different pore structures.

A "porous membrane" is a membrane that retains components in an object to be purified, such as gels, particles, colloids, cells, and poly-oligomers, but allows components that are substantially smaller than the pores to pass through the pores. means Retention of components in the product to be purified by porous membranes can depend on operating conditions such as surface velocity, surfactant usage, pH, and combinations thereof, and the pore size of the porous membrane , structure, and size and structure of the particles to be removed (hard particles or gels, etc.).

If the material to be purified contains negatively charged particles, the polyamide acts as a non-sieving membrane for the removal of such particles. Typical non-sieving membranes include, but are not limited to, nylon membranes such as nylon-6 and nylon-6,6 membranes.
As used herein, "non-sieving" retention mechanisms refer to retention caused by mechanisms such as obstruction, diffusion and adsorption that are not related to filter pressure drop or pore size.

Non-sieving retention includes retention mechanisms such as blockage, diffusion and adsorption that remove particles of interest in the product to be purified regardless of filter pressure drop or filter pore size. Adsorption of particles to material component surfaces can be mediated, for example, by intermolecular van der Waals forces, electrostatic forces, and the like. A jamming effect occurs when particles traveling in a non-sieving membrane layer containing a tortuous path are not able to change direction fast enough to avoid contact with the non-sieving membrane. Particle transport by diffusion results primarily from random or Brownian motion of small particles, which creates a certain probability of particles colliding with the filter media. A non-sieve retention mechanism can be active if there is no repulsive force between the particles and the filter.

The UPE (ultra high molecular weight polyethylene) membrane that the filter body may contain is typically a sieve membrane. A sieve membrane means a membrane that traps particles primarily via a sieve retention mechanism or a membrane that is optimized for trapping particles via a sieve retention mechanism.
Typical examples of sieve membranes include, but are not limited to, polytetrafluoroethylene (PTFE) membranes and UPE membranes.
In addition, the "sieve retention mechanism" refers to the retention of results due to the particles to be removed being larger than the pore diameter of the porous membrane. Sieve retention is enhanced by forming a filter cake (a clump of particles to be removed on the surface of the membrane). The filter cake effectively performs the function of a secondary filter.

The material of the fiber membrane is not particularly limited as long as it is a polymer capable of forming a fiber membrane. Examples of polymers include polyamides. Polyamides include, for example, nylon 6 and nylon 6,6. The polymer forming the fiber membrane may be poly(ethersulfone). When the fiber membrane is on the primary side of the porous membrane, the surface energy of the fiber membrane is preferably higher than the polymer from which the porous membrane is made on the secondary side. Such combinations include, for example, the fiber membrane material being nylon and the porous membrane being polyethylene (UPE).

The method for producing the fiber membrane is not particularly limited, and known methods can be used. Examples of methods for producing fiber membranes include electrospinning, electroblowing, and meltblowing.

The pore structure of the porous membrane (for example, a porous membrane containing UPE, PTFE, etc.) is not particularly limited, but examples of the shape of the pores include lace, string, and node. be done.
The size distribution of pores in the porous membrane and the distribution of their positions in the membrane are not particularly limited. The size distribution may be smaller and the distribution position in the membrane may be symmetrical. It is also preferred that the filter body contains a membrane with a larger size distribution and an asymmetrical distribution position in the membrane (the above membrane is also referred to as an "asymmetric porous membrane"). In an asymmetric porous membrane, the pore size varies throughout the membrane. Among them, the asymmetric porous membrane preferably has an asymmetric pore size distribution with respect to the thickness direction (filtration direction). Typically, the pore size increases from one surface of the membrane to the other surface of the membrane. At this time, the surface on the side with many pores with large pore diameters is called "open side", and the surface on the side with many pores with small pore diameters is also called "tight side".
An example of an asymmetric porous membrane is a membrane in which the pore size is minimized at a certain position within the thickness of the membrane (this is also referred to as an "hourglass shape").
Using an asymmetric porous membrane with larger sized pores on the primary side, in other words an open side on the primary side, can create a pre-filtration effect.

The asymmetric porous membrane is preferably a membrane comprising, for example, an asymmetric porous membrane made of UPE and grafted chains attached to the surface of the asymmetric porous membrane. At least a portion of the graft chain preferably contains a neutral group or an ion-exchange group.
For the membrane containing the asymmetric porous membrane made of UPE and the graft chains bonded to the surface of the asymmetric porous membrane, for example, reference may be made to the description of JP-A-2017-536232.

The porous membrane may comprise a thermoplastic polymer such as PESU (polyethersulfone), PFA (perfluoroalkoxyalkane, copolymer of ethylene tetrafluoride and perfluoroalkoxyalkane), polyamide, and polyolefin. , polytetrafluoroethylene, and the like.
Among them, ultra-high molecular weight polyethylene is preferable as the material for the porous membrane. Ultra high molecular weight polyethylene means a thermoplastic polyethylene containing very long chains and preferably has a molecular weight of one million or more, typically 2-6 million.

<Support layer>
The material containing the composition and structure as described above preferably constitutes a member (also referred to as a "filtration layer") used to exert the filtering ability of the filter body, and the filter body as described above is this In addition to such a filtration layer, it preferably contains a support layer.
For example, when it is difficult to process a filter body consisting of only a filter layer into a desired shape, the support layer is laminated with the filter layer to impart appropriate rigidity to the filter and improve workability.
Moreover, the filter main body may contain only one layer of filtration layers, and may contain two or more layers. Similarly, the filter body may contain only one support layer, or may contain two or more layers. The support layer may be provided on only one side (primary side or secondary side of filtration) or on both sides of the filtration layer. When the filter body contains two or more filtration layers, the filtration layers and the support layers may be alternately provided.
As a material for the support layer, for example, polyolefin (polyethylene (including UPE), polypropylene, etc.), PTFE, PFA, or polyester can be used.

It is also preferred that the filter body contains two or more layers of different materials.
Examples of the filter body containing two or more layers made of different materials include, for example, a filter where the filter body has a filtration layer and a support layer, and the filtration layer and the support layer are made of different materials.
In addition, in the filter body containing two or more layers each made of different materials, the filter body has a filtration layer and a support layer, the filtration layer and the support layer are both made of the same material, and the surface of the filtration layer is grafted. It may be a filter formed with a graft layer made of a material different from that of the filtration layer and the support layer.
Alternatively, a filter body containing two or more layers of different materials may have a layer that serves both as a filtration layer and a support layer, the surface of which may be grafted to serve as both a filtration layer and a support layer. A filter having a graft layer made of a material different from that of the layer that also serves as a filter may be used.

Moreover, it is also preferable that the filter main body is made of a material other than a fluorine-based material.
When the filter body is made of a material other than a fluorine-based material, for example, the filter layer and the support layer of the filter body are both made of a material other than a fluorine-based material (PTFE, PFA, and a fluorine resin such as PESU). mentioned.
In other words, the filter body made of a material other than a fluorine-based material, for example, the filter layer and the support layer are both made of a material other than a fluorine-based material (polyolefin (polyethylene (including UPE), polypropylene, etc.), polyester, and /or preferably polyamide (nylon 6, nylon 6,6, etc.). Filtration layers of filter bodies made of materials other than fluoro-based materials may be grafted (preferably using non-fluoro-based repeating units).
In a filter body made of a material other than a fluorine-based material, the elution of components from the filter is likely to be reduced, and the defect suppression property of the manufactured chemical solution (especially pattern defect suppression property when a pattern is formed by EUV exposure) is more excellent. .

[Method for manufacturing filter]
The method for producing the filter of the present invention preferably includes, for example, a step of pretreating an untreated filter containing one or more specific organic compounds with an organic cleaning liquid.
An untreated filter is, for example, a filter available on the market, and usually contains the first organic compound in excess of the content allowed by the present invention on the surface and/or inside of the untreated filter.
Hereinafter, a filter to which preprocessing is applied (unprocessed filter) is also referred to as a processed filter.

The processed filters may be obtained commercially, as described above. When such a filter to be treated is distributed, the filter to be treated is often packed in a packing material such as a packing bag and sealed in order to avoid contamination. At this time, if the portion (contact portion) of the packing material that can come into contact with the filter to be treated in the packed state is made of polyolefin (polyethylene including high-density polyethylene, etc.), the contact portion is made of fluorine-based resin or stainless steel. Compared with the case of steel, the above-mentioned specific organic compound and/or other impurity components are likely to adhere to the filter to be treated and cause contamination.
Therefore, the filter to be treated before being pretreated reduces the cost required for pretreatment and / or the defect suppression property of the chemical solution manufactured using the finally obtained filter is superior. It is preferable that at least part of the contacting portion with respect to the filter to be treated is packed with a packing material made of fluororesin or stainless steel.
If at least a part of the contact portion is made of fluorine-based resin or stainless steel, contamination to the filter to be treated can be reduced, and the present invention obtained by pre-treating the filter to be treated that has been packed in such a packing material. The effect of the present invention realized by the filter of is also more excellent.
In other words, the filter of the present invention is a filter obtained by subjecting the filter to be treated, which is packed in a packing material in which at least a part of the contacting portion to the filter to be treated is made of fluorine-based material or stainless steel, to pretreatment. It is also preferable to have

Examples of the fluororesin in the contact portion include fluororesins such as PTFE and PFA.
As the stainless steel in the contact portion, stainless steel described later as a corrosion-resistant material can be mentioned, and among them, it is preferable that the contact portion is electropolished stainless steel (EP-SUS).
The area of the contact portion made of fluororesin and/or stainless steel is preferably 50 to 100%, more preferably 90 to 100%, and even more preferably 99 to 100% of the total area of the contact portion.
The form of the packing material is not particularly limited, and may be a bag form or a capsule form.
As for the packing material, at least a part of the contact portion may be made of fluororesin and/or stainless steel, and the entire packing material may be made of fluororesin and/or stainless steel, or may be mixed with other materials. It may be a composite material of For example, a layered composite material may be used in which the contact portion is made of fluororesin and/or stainless steel, and the portion other than the contact portion is made of fluororesin and/or stainless steel.
When the filter of the present invention (for example, the filter to be treated after pretreatment) is packed in a packing material for storage or distribution, the packing material having the structure of the contact portion as described above is used. It is preferably packaged.
It should be noted that the filter to be treated, which is packed in a packing material, may be appropriately subjected to cleaning treatment or the like before being packed.

The type of organic cleaning liquid used for pretreatment is not particularly limited, and a known organic solvent can be used as a main component. In the present specification, the main component means a component contained in an amount of 99.9% by mass or more, more preferably 99.99% by mass or more, relative to the total mass of the organic cleaning liquid.
Organic solvents include, for example, alkylene glycol monoalkyl ether carboxylates, alkylene glycol monoalkyl ethers, lactic acid alkyl esters, alkyl alkoxypropionates, cyclic lactones (preferably having 4 to 10 carbon atoms), monoketones which may contain a ring. compounds (preferably having 4 to 10 carbon atoms), alkylene carbonates, alkyl alkoxyacetates, alkyl pyruvates, dialkyl sulfoxides, cyclic sulfones, dialkyl ethers, monohydric alcohols, glycols, alkyl acetates, and N-alkylpyrrolidones, etc. be done.

Among them, organic cleaning solutions include propylene glycol monomethyl ether acetate, isopropanol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, ethyl lactate, methyl methoxypropionate, cyclopentanone, cyclohexanone, γ-butyrolactone, di isoamyl ether (isoamyl ether), butyl acetate, isoamyl acetate, 4-methyl-2-pentanol, dimethylsulfoxide, N-methylpyrrolidone, diethylene glycol, ethylene glycol, dipropylene glycol, propylene glycol, ethylene carbonate, propylene carbonate, sulfolane, cycloheptanone, 2-heptanone, butyl butyrate, isobutyl isobutyrate, undecane, pentyl propionate, isopentyl propionate, ethylcyclohexane, mesitylene, decane, 3,7-dimethyl-3-octanol, 2-ethyl-1-hexanol, It preferably contains one or more selected from the group consisting of 1-octanol, 2-octanol, ethyl acetoacetate, dimethyl malonate, methyl pyruvate, and dimethyl oxalate.

The pretreatment preferably includes, for example, a step of immersing the filter to be treated in an organic cleaning liquid and/or a step of passing an organic cleaning liquid through the filter to be treated.

In the case where the pretreatment includes a step of immersing the filter to be treated in the organic cleaning liquid, the method for immersing the filter to be treated in the organic cleaning liquid is to fill the immersion container with the organic cleaning liquid, and immerse the filter in the organic cleaning liquid. A method of immersion can be mentioned.
As the container for immersion, a housing containing a filter unit can also be used in a filtering device to be described later. That is, there is a method in which a filter to be treated (preferably in a state contained in a cartridge with a filter described later) is accommodated in a housing contained in a filtration device, the housing is filled with an immersion liquid, and left in that state. mentioned.
In addition to the above, an immersion container is prepared separately from the housing containing the refining device (that is, the immersion container is prepared outside the refining device), the separately prepared immersion container is filled with an organic cleaning liquid, and the A method of soaking the treated filter is also included.
Among them, a method of filling an immersion container prepared outside the filter device with an organic cleaning liquid and immersing the filter to be processed in the organic cleaning liquid is preferred in that impurities eluted from the filter to be treated do not enter the filtration device.

The shape and size of the immersion container can be appropriately selected according to the number and size of filters to be immersed, and are not particularly limited.
Although the material of the immersion container is not particularly limited, it is preferable that at least the liquid-contacting portion is made of a corrosion-resistant material, which will be described later.
In addition, as materials for the immersion container, polyfluorocarbon (PTFE, PFA: perfluoroalkoxyalkane, PCTFE: polychlorotrifluoroethylene, etc.), PPS (polyphenylene sulfide), POM (polyoxymethylene), and polyolefin It preferably contains at least one selected from the group consisting of (PP, PE, etc.), and more preferably contains at least one selected from the group consisting of polyfluorocarbons, PPS, and POM. , polyfluorocarbon, particularly preferably at least one selected from the group consisting of PTFE, PFA, and PCTFE, and most preferably PTFE.
The immersion container is preferably washed before use, and preferably washed with an organic washing solution (so-called co-washing).

The immersion time is, for example, preferably 1 day or longer, more preferably 3 days or longer, even more preferably 1 week or longer, and particularly preferably 1 month or longer. Although the upper limit is not particularly limited, it is usually less than one year.
The temperature of the organic cleaning liquid during the immersion treatment is preferably room temperature (23° C.) or higher, more preferably 35° C. or higher. Although the upper limit is not particularly limited, it is usually lower than the boiling point of the organic cleaning liquid used.

Also, the filter to be treated may be subjected to ultrasonic treatment continuously or temporarily during the immersion.
For example, when the filter body is used in a hollow cylindrical form (for example, when the filter is used in a state contained in a cartridge with a filter described later), the output of ultrasonic waves is the filter (to be processed) of the cartridge with a filter. 50 kw or more is preferable, 80 kw or more is more preferable, and 100 kw or more is still more preferable with respect to 1 inch of cylinder length of filter). Although the upper limit is not particularly limited, it is usually 200 kw.
The ultrasonic treatment time is, for example, preferably 5 minutes or longer, more preferably 15 minutes or longer, still more preferably 1 hour or longer, and particularly preferably 3 hours or longer. Although the upper limit is not particularly limited, it is usually less than 10 hours.

When the pretreatment includes a step of passing an organic cleaning liquid through the filter to be treated, for example, the filter (preferably contained in a cartridge with a filter) is housed in the housing of the filter unit of the filtration device described later. and a method of introducing an organic cleaning liquid into the housing and passing the organic cleaning liquid through the filter body to be treated.

During cleaning, the specific organic compound or the like contained in the filter to be treated migrates (typically dissolves) into the organic cleaning liquid. Therefore, it is preferable that the organic cleaning liquid that has been passed through the filter once is not used for cleaning again and is discharged outside the filtering device described later. In other words, it is preferable not to carry out circulation cleaning.

As another form of the method of cleaning the filter by passing the organic cleaning liquid through the filter to be treated, there is a method of cleaning the filter to be treated using a cleaning apparatus. As used herein, the cleaning device means a device different from the filtering device provided outside the filtering device. The form of the cleaning device is not particularly limited, but a device having the same configuration as the filtering device can be used.

In the case where the pretreatment includes a step of passing an organic cleaning liquid through the filter body to be treated, the flow rate of the liquid is, for example, when the filter body to be treated is in the form of a hollow cylinder (typically, a filter unit (when a filter-equipped cartridge containing a filter to be treated is housed in the housing of (2) and an organic cleaning liquid is passed through), the weight is preferably 10 kg or more, more preferably 50 kg or more, with respect to 1 inch of the cylinder length of the filter body to be treated, 300 kg or more is more preferable, and 500 kg or more is particularly preferable.
The temperature of the organic cleaning liquid to be passed is preferably room temperature (23° C.) or higher, more preferably 35° C. or higher. Although the upper limit is not particularly limited, it is usually lower than the boiling point of the organic cleaning liquid used.

In pretreatment, the ratio of the content of specific organic compounds contained in the filter after pretreatment to the total content of specific organic compounds contained in the filter to be treated (untreated filter) (also referred to as "cleanliness") , is preferably 0.5000 or less, more preferably 0.1000 or less, still more preferably 0.0300 or less, and 0.0100 or less. It is particularly preferred to do so. Although the lower limit is not particularly limited, it is usually 0.00001 or more.

[Filtration device]
It is preferable to use the filter of the present invention by installing it in a filtering device.
The filtering device preferably includes the filter of the present invention and is used for purifying a liquid to be purified to produce a chemical solution.
For example, the filtration device comprises an inflow part, an outflow part, and one or more (preferably two or more, more preferably 2 to 6, even more preferably 3 to 4, particularly preferably 4) filters of the present invention. Preferably, however, each filter is arranged in series between the inlet and the outlet and contains a flow path from the inlet to the outlet.
The filtering device may have a plurality of filters arranged in parallel. In this case, the liquid to be purified is 1 or more (preferably 2 or more, more preferably 2 to 6, still more preferably 3 to 4, particularly preferably 3 to 4, especially Preferably, it is configured to pass through the filter of the present invention of 4). That is, the filtering device may combine both parallel and serial arrangements of multiple filters.

In the filtration device, when two or more filters are arranged in series, at least one of the two or more filters arranged in series (preferably the filter with the largest pore diameter) has a pore size of 10 to 200 nm. , and the filter having the smallest pore size preferably has a pore size of 1 to 10 nm.

Moreover, the filter body of at least one of the two or more filters arranged in series preferably contains ion exchange groups.
Further, among the two or more filters arranged in series, the filter body of at least one filter is a filter body containing nylon, and the at least one filter is an alkane represented by the general formula (X) , and an alkene represented by the general formula (XI), the alkane content A represented by the general formula (X), the alkene content B represented by the general formula (XI), and It is also preferable that the content C of the alkene represented by the general formula (XII) satisfies C<A and C<B on a mass basis.
Further, among the two or more filters arranged in series, the filter body of at least one filter contains polyethylene or polytetrafluoroethylene, and the at least one filter is one or more selected from the above group A It is also preferable to contain a compound and an alkane represented by general formula (X).
Further, among the two or more filters arranged in series, the filter body of at least one (preferably half or more of the two or more filters, more preferably more than half of the two or more filters) is a fluorine-based It is also preferred that the filter body is made of a material other than the material.

A filtration device containing the filter of the present invention will be described below. In the following description, at least filter A is the filter of the present invention, and other filters (for example, filter BU) may be filters other than the filter of the present invention.
However, the filtering device preferably has at least two or more filters of the present invention arranged in series between the inflow portion and the outflow portion, and more preferably, the filters in the filtering device are all the filters of the present invention. preferable.

<First Embodiment>
FIG. 1 is a schematic diagram showing a filtering device according to a first embodiment of the present invention.
The filtering device 100 is a filtering device in which a filter 103 (filter A) and a filter 104 (also referred to as a filter BU) different from the filter 103 are arranged in series between an inflow portion 101 and an outflow portion 102 via a pipe 105. is.
The inflow part 101, the filter 104, the pipe 202, the filter 103, and the outflow part 102 are configured so that the liquid to be purified can be circulated therein. flow path) is formed.

The inflow part 101 and the outflow part 102 are not particularly limited as long as the liquid to be purified can be introduced into and discharged from the filtering device, but they are typically hollow structures containing an inflow port and an outflow port. Cylindrical pipes (inflow part and outflow part) and the like are included. An embodiment in which the outflow part and the inflow part are pipes will be described below as an example.
The shapes of the inflow portion 101, the pipe 105, and the outflow portion 102 are not particularly limited, but typically include a hollow cylindrical shape through which the liquid to be purified can flow. Although these materials are not particularly limited, the wetted part (the part that may come into contact with the liquid to be purified when filtering the liquid to be purified) is made of the corrosion-resistant material described later as a material component (constituent component). It is preferably contained. In other words, it is preferably formed using a corrosion-resistant material, which will be described later.

The liquid to be purified introduced from the inflow part 101 of the filter device 100 flows through the filter device 100 along the flow path S1, and is sequentially filtered by the filter 103 (filter A) and the filter 104 (filter BU) in the meantime. and discharged from the outflow part 102 to the outside of the filtering device 100 . The form of the liquid to be purified will be described later.
In addition, the filtration device 100 has a pump (not shown), a It may contain dampers, valves, and the like. The method of circulating the liquid to be purified through the flow path in the filter device 100 is not limited to the above, and a method of introducing the liquid to be purified under pressure into the inflow portion may be used.

The form of the filter 103 (filter A) and the filter 104 (filter BU) is not particularly limited. Examples of shapes of the filter A and the filter BU include planar, pleated, spiral, and hollow cylindrical shapes. Among them, in terms of excellent handleability, typically, a core material made of a material permeable to the liquid to be purified and / or having a structure permeable to the liquid to be purified, and a wound around the core material It preferably constitutes a cartridge with a filter (filter cartridge) containing a filter arranged on a core in a twisted manner. In this case, the material of the core material is not particularly limited, but it is preferably made of a corrosion-resistant material, which will be described later.
Note that the core material is not a component of the filter.

Although the method of arranging the filter is not particularly limited, it is typically in a housing (not shown) that includes at least one inlet and at least one outlet, and at least one flow path is formed between the inlet and the outlet. It preferably constitutes a filter unit arranged in the . In that case, the filter is positioned across the flow passage within the housing. The flow path formed in the housing forms part of the flow path S1, and the liquid to be purified is filtered by a filter arranged across the flow path S1 when flowing through the flow path S1.

The material of the housing is not particularly limited, but includes any suitable hard impermeable material including any impermeable thermoplastic material compatible with the liquid to be purified. For example, the housing can be made from metal, such as stainless steel, or from a polymer. In some embodiments, the housing is a polymer such as polyacrylate, polypropylene, polystyrene, or polycarbonate.
In addition, at least part of the liquid contacting portion of the housing, preferably 90% of the surface area of the liquid contacting portion, more preferably 90% of the surface area of the liquid contacting portion, more preferably the liquid contacting portion is Preferably, 99% of the surface area is made of the corrosion-resistant material described below. In this specification, the wetted portion means a portion (excluding the filter itself) that may come into contact with the liquid to be purified, and means an inner wall of a unit such as a housing.

(Filter BU)
Filter BU is a filter arranged in series on the flow path. Filter BU is a filter arranged in series with filter A on the upstream side of filter A on the flow path.
Filter A and filter BU are preferably different filters. In this specification, a filter different from filter A means a filter different from filter A in at least one selected from the group consisting of material, pore size, and pore structure.
Among them, the filter BU preferably differs from the filter A in at least one selected from the group consisting of the pore size and the material, and at least the material is different in that a filtering device containing the effects of the present invention can be obtained. is preferred.
In this specification, the term "filter A and filter BU are made of different materials" means that the components (material components) contained in the respective filters are different; A case where the types of substituents arranged in are different is typically included.

The pore size of the filter BU is not particularly limited as long as it contains an arbitrary pore size as a filter used in a filtering device. Filter BU preferably contains a larger pore size than filter A in that a chemical solution containing more excellent defect suppressing properties can be obtained. Among them, the pore diameter of the filter BU is preferably 200 nm or less, preferably 10 nm or more, and more preferably 20 nm or more.
According to the studies of the present inventors, when using a filtration device in which a filter BU having a pore size of 20 nm or more is arranged on the upstream side of the filter A on the flow path S1, the filter A is less likely to clog, It has been found that filter A can have a longer life. As a result, it is possible to obtain a filtration device that can stably provide a chemical solution containing more excellent defect suppressing properties.

In particular, when the filtration device contains a plurality of filter BUs, the pore size of the filter BU arranged on the most upstream side in the flow path is preferably 20 nm or more, more preferably 50 nm or more, and preferably 200 nm or less. When the pore diameter of the filter BU (which may be the filter C described later) arranged on the most upstream side of the flow path is within the above range, the life of the filter is further improved, resulting in excellent defect suppression properties. It is preferable because the containing chemical solution can be stably produced.

Although the filtering device in FIG. 1 contains one filter BU, the filtering device according to this embodiment may contain a plurality of filter BUs. In that case, the relationship between the pore diameters of the plurality of filter BUs is not particularly limited. is preferably maximized. In this way, the life of the filters (including filter A) arranged downstream of the most upstream filter BU can be extended, and as a result, a filtration that can stably provide a chemical solution containing superior defect suppression properties. A device is obtained.

When at least one of the one or more filter BUs contained in the filtration device contains a resin containing an ion exchange group as a material component, metal impurities contained in the liquid to be purified (for example, metal ions, etc.), as a result, the content of metal ions in the resulting chemical solution can be reduced, and the resulting chemical solution contains better pattern width uniformity performance.

[Method for producing chemical solution]
A method for producing a chemical solution according to an embodiment of the present invention is a method for producing a chemical solution by purifying a liquid to be purified to obtain a chemical solution, and includes the already described filter of the present invention (filtration device containing the filter of the present invention). is used to filter the liquid to be purified to obtain a chemical solution.

<Liquid to be purified>
The liquid to be purified to which the method for producing a chemical solution according to the embodiment of the present invention can be applied is not particularly limited, but preferably contains a solvent. Examples of the solvent include organic solvents, water, and the like, and it is preferable to contain an organic solvent. Below, the content of the organic solvent (the total content when multiple organic solvents are contained) is more than 50% by mass with respect to the total mass of the solvent contained in the liquid to be purified. The purification liquid and the water-based liquid to be purified having a water content of more than 50% by mass with respect to the total mass of the solvent contained in the liquid to be purified will be described separately.

(Organic solvent-based liquid to be purified)
- Organic solvent The organic solvent-based liquid to be purified contains a solvent, and the content of the organic solvent is more than 50% by mass with respect to the total mass of the solvent contained in the liquid to be purified.
The organic solvent-based liquid to be purified contains an organic solvent. The content of the organic solvent in the organic solvent-based liquid to be purified is not particularly limited, but is generally preferably 99.0% by mass or more relative to the total mass of the organic solvent-based liquid to be purified. Although the upper limit is not particularly limited, it is generally preferably 99.99999% by mass or less.
An organic solvent may be used individually by 1 type, or may use 2 or more types together. When two or more organic solvents are used in combination, the total content is preferably within the above range.

In this specification, the organic solvent means a liquid organic compound contained in a content exceeding 10000 ppm by mass per component with respect to the total mass of the liquid to be purified. That is, in the present specification, the liquid organic compound contained in an amount exceeding 10000 ppm by mass with respect to the total mass of the liquid to be purified corresponds to the organic solvent.
In this specification, the term "liquid" means liquid at 25°C under atmospheric pressure.

The volume resistivity of the organic solvent-based liquid to be purified (or the chemical liquid to be produced) may be 500,000,000 Ωm or more.
The volume resistivity of the organic solvent-based liquid to be purified (or the chemical solution to be produced) can be measured using, for example, a volume resistance meter SME-8310 or a super megohmmeter SM-8220 manufactured by Hioki Electric Co., Ltd.

The type of organic solvent used as the liquid to be purified is not particularly limited, and known organic solvents can be used. Organic solvents include, for example, alkylene glycol monoalkyl ether carboxylates, alkylene glycol monoalkyl ethers, lactic acid alkyl esters, alkyl alkoxypropionates, cyclic lactones (preferably having 4 to 10 carbon atoms), and monoketone compounds which may contain a ring. (preferably having 4 to 10 carbon atoms), alkylene carbonates, alkyl alkoxyacetates, alkyl pyruvates, dialkyl sulfoxides, cyclic sulfones, dialkyl ethers, monohydric alcohols, glycols, alkyl acetates, and N-alkylpyrrolidones. .
Further, as the organic solvent, for example, the organic solvent described in JP-A-2016-57614, JP-A-2014-219664, JP-A-2016-138219, and JP-A-2015-135379. good too.

Organic solvents include, for example, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monopropyl ether, cyclohexanone, methyl methoxypropionate, butyl acetate, γ-butyrolactone, 4-methyl-2-pentanol, propylene glycol monoethyl. ether, ethyl lactate, cyclopentanone, diisoamyl ether (isoamyl ether), isoamyl acetate, isopropanol, dimethyl sulfoxide, N-methylpyrrolidone, diethylene glycol, ethylene glycol, dipropylene glycol, propylene glycol, ethylene carbonate, propylene carbonate, sulfolane, cycloheptanone, 2-heptanone, butyl butyrate, isobutyl isobutyrate, undecane, pentyl propionate, isopentyl propionate, ethylcyclohexane, mesitylene, decane, 3,7-dimethyl-3-octanol, 2-ethyl-1-hexanol, At least one selected from the group consisting of 1-octanol, 2-octanol, ethyl acetoacetate, dimethyl malonate, methyl pyruvate, and dimethyl oxalate is preferred.

The type and content of the organic solvent in the liquid to be purified can be measured using a gas chromatograph-mass spectrometer.

The organic solvent as the liquid to be purified preferably has a Hansen solubility parameter distance of 3 to 20 MPa ^0.5 (more preferably 5 to 20 MPa ^0.5 ) with respect to eicosene.
When two or more organic solvents are used, at least one preferably satisfies the Hansen solubility parameter range.
When two or more organic solvents are used, the weighted average value of the Hansen Solubility Parameters based on the molar ratio of the content of each organic solvent preferably satisfies the range of the Hansen Solubility Parameters.

For example, it is preferable that the organic solvent-based liquid to be purified is only an organic solvent that substantially satisfies the Hansen solubility parameter range, from the viewpoint that the defect suppression property of the chemical solution is superior. The organic solvent-based liquid to be purified is substantially only an organic solvent that satisfies the range of the Hansen solubility parameters, when the content of the organic solvent that satisfies the range of the Hansen solubility parameters is It means 99% by mass or more (preferably 99.9% by mass or more).

Further, for example, the organic solvent-based liquid to be purified is preferably a mixed solvent containing both an organic solvent that satisfies the Hansen solubility parameter range and an organic solvent that does not satisfy the Hansen solubility parameter range.
In this case, the organic solvent-based liquid to be purified (mixed solvent) has an organic solvent that satisfies the range of the Hansen solubility parameter, based on the total mass of the organic solvent-based liquid to be purified. 20 to 80% by mass (preferably 30 to 70% by mass) of the organic solvent that does not satisfy the range of the Hansen solubility parameter is 20 to 80% by mass (preferably 30 to 70% by mass) is preferably contained.
If the content of the organic solvent that satisfies the Hansen solubility parameter range and the content of the organic solvent that does not satisfy the Hansen solubility parameter range are each equal to or greater than a certain amount, the organic solvent that does not satisfy the Hansen solubility parameter range is specified. Compared to the case where the amount is outside the range (for example, 1% by mass or more and less than 20% by mass or more than 80% by mass with respect to the total mass of the mixed solvent), the chemical solution has an affinity for metallic materials and organic materials. It is considered that the effect of the present invention is more excellent because it can be adjusted within a suitable range.
In this case, the total content of the organic solvent satisfying the Hansen solubility parameter range and the organic solvent not satisfying the Hansen solubility parameter range is 99.0 with respect to the total mass of the organic solvent-based liquid to be purified. % by mass or more is preferable. Although the upper limit is not particularly limited, it is generally preferably 99.99999% by mass or less.
In addition, in the organic solvent that does not satisfy the range of the Hansen solubility parameter, the distance of the Hansen solubility parameter to eicosene is 0 MPa ^0.5 or more and 3 MPa less than ^0.5 (preferably 0 MPa ^0.5 or more and 3 MPa less than ^0.5 ), or , more than 20 MPa ^0.5 (preferably more than 20 MPa ^0.5 and 50 MPa ^0.5 or less).

As used herein, the term "Hansen Solubility Parameters" refers to the Hansen Solubility Parameters described in "Hansen Solubility Parameters: A Users Handbook, Second Edition" (pp. 1-310, CRC Press, 2007). That is, the Hansen solubility parameters represent solubility in a multidimensional vector (dispersion term (δd), interdipole term (δp), and hydrogen bonding term (δh)), and these three parameters are expressed in Hansen space can be thought of as the coordinates of a point in a three-dimensional space called
The distance of the Hansen solubility parameter is the distance in the Hansen space of two compounds, and the distance of the Hansen solubility parameter is obtained by the following formula.
(Ra) ² = 4 (δd2-δd1) ² + (δp2-δp1) ² + (δh2-δh1) ²
Ra: Hansen solubility parameter distance between the first compound and the second compound (unit: MPa ^0.5 )
δd1: dispersion term of the first compound (unit: MPa ^0.5 )
δd2: dispersion term of the second compound (unit: MPa ^0.5 )
δp1: inter-dipole term of the first compound (unit: MPa ^0.5 )
δp2: Interdipole term of the second compound (unit: MPa ^0.5 )
δh1: hydrogen bond term of the first compound (unit: MPa ^0.5 )
δh2: hydrogen bond term of the second compound (unit: MPa ^0.5 )
As used herein, the Hansen Solubility Parameter of a compound is specifically calculated using HSPiP (Hansen Solubility Parameter in Practice).

- Other components The liquid to be purified may contain components other than those described above. Examples of other components include inorganic substances (metal ions, metal particles, metal oxide particles, etc.), resins, organic substances other than resins, and water.

.. Inorganic substances The liquid to be purified may contain inorganic substances. The inorganic substance is not particularly limited, and examples thereof include metal ions and metal-containing particles.

The metal-containing particles are not particularly limited as long as they contain metal atoms. For example, a simple substance of a metal atom, a compound containing a metal atom (hereinafter also referred to as a “metal compound”), and a composite of these may be mentioned. Also, the metal-containing particles may contain a plurality of metal atoms.

The complex is not particularly limited, but includes so-called core-shell type particles containing a single metal atom and a metal compound covering at least a part of the single metal atom, and metal atoms and other atoms. Solid solution particles, eutectic particles containing metal atoms and other atoms, aggregate particles of simple metal atoms and metal compounds, aggregate particles of different types of metal compounds, and continuous particles from the particle surface toward the center Alternatively, a metal compound or the like whose composition changes intermittently can be used.

Atoms other than metal atoms contained in the metal compound are not particularly limited, and examples thereof include carbon atoms, oxygen atoms, nitrogen atoms, hydrogen atoms, sulfur atoms, and phosphorus atoms.

Metal atoms are not particularly limited, but Al (aluminum), B (boron), Ba (barium), Ca (calcium), Cd (cadmium), Co (cobalt), Cr (chromium), Cu (copper), Fe (iron), K (potassium), Li (lithium), Mg (magnesium), Mn (manganese), Mo (molybdenum), Na (sodium), Ni (nickel), P (phosphorus), Pb (lead), Sb (antimony), Si (silicon), Ti (titanium), V (vanadium), and Zn (zinc). The metal-containing particles may contain the above metal atoms singly or in combination of two or more.

Although the particle size of the metal-containing particles is not particularly limited, it is generally 1 to 100 nm in many cases.

The inorganic substance may be added to the liquid to be purified, or may be unintentionally mixed with the liquid to be purified during the manufacturing process. Examples of unintentional mixing in the manufacturing process of the chemical solution include the case where the inorganic substance is contained in the raw material (e.g., organic solvent) used in the manufacturing of the chemical solution, and mixing in the chemical solution manufacturing process (e.g., , contamination), etc., but are not limited to the above.

..Resin The liquid to be purified may contain a resin.
The chemical solution may further contain a resin. As the resin, a resin P containing a group that is decomposed by the action of an acid to form a polar group is more preferable.

As the resin P, a resin containing a repeating unit represented by formula (AI) described later, which is a resin whose solubility in a developer containing an organic solvent as a main component is reduced by the action of an acid, is more preferable. A resin containing a repeating unit represented by formula (AI) described later contains a group that is decomposed by the action of an acid to generate an alkali-soluble group (hereinafter also referred to as an "acid-decomposable group").
Polar groups include alkali-soluble groups. Alkali-soluble groups include, for example, carboxy groups, fluorinated alcohol groups (preferably hexafluoroisopropanol groups), phenolic hydroxyl groups, and sulfo groups.

In the acid-decomposable group, the polar group is protected by an acid-leaving group (acid-leaving group). Examples of acid-leaving groups include -C(R ₃₆ )(R ₃₇ )(R ₃₈ ), -C(R ₃₆ )(R ₃₇ )(OR ₃₉ ) and -C(R ₀₁ )(R ₀₂ ) (OR ₃₉ ) and the like.

In the formula, R ₃₆ to R ₃₉ each independently represent an alkyl group, cycloalkyl group, aryl group, aralkyl group or alkenyl group. R ₃₆ and R ₃₇ may combine with each other to form a ring.

R ₀₁ and R ₀₂ each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or an alkenyl group.

Hereinafter, the resin P whose solubility in a developer containing an organic solvent as a main component is reduced by the action of an acid will be described in detail.

Formula (AI): Repeating unit containing an acid-decomposable group The resin P preferably contains a repeating unit represented by the formula (AI).

In formula (AI),
Xa ₁ represents a hydrogen atom or an optionally substituted alkyl group.
T represents a single bond or a divalent linking group.
Ra ₁ to Ra ₃ each independently represent an alkyl group (linear or branched) or a cycloalkyl group (monocyclic or polycyclic).
Two of Ra ₁ to Ra ₃ may combine to form a cycloalkyl group (monocyclic or polycyclic).

Examples of the optionally substituted alkyl group represented by Xa ₁ include a methyl group and a group represented by -CH ₂ -R ₁₁ . R ₁₁ represents a halogen atom (such as a fluorine atom), a hydroxyl group, or a monovalent organic group.
Xa ₁ is preferably a hydrogen atom, a methyl group, a trifluoromethyl group or a hydroxymethyl group.

Examples of the divalent linking group for T include an alkylene group, -COO-Rt- group, and -O-Rt- group. In the formula, Rt represents an alkylene group or a cycloalkylene group.
T is preferably a single bond or a -COO-Rt- group. Rt is preferably an alkylene group having 1 to 5 carbon atoms, more preferably -CH ₂ -, -(CH ₂ ) ₂ - or -(CH ₂ ) ₃ -.

The alkyl groups of Ra ₁ to Ra ₃ are preferably alkyl groups having 1 to 4 carbon atoms.

The cycloalkyl groups of Ra ₁ to Ra ₃ include monocyclic cycloalkyl groups such as cyclopentyl group or cyclohexyl group, or polycyclic groups such as norbornyl group, tetracyclodecanyl group, tetracyclododecanyl group and adamantyl group. Ring cycloalkyl groups are preferred.
The cycloalkyl group formed by combining two of Ra ₁ to Ra ₃ includes a monocyclic cycloalkyl group such as a cyclopentyl group or a cyclohexyl group, a norbornyl group, a tetracyclodecanyl group, and a tetracyclododecanyl group. or a polycyclic cycloalkyl group such as an adamantyl group. A monocyclic cycloalkyl group having 5 to 6 carbon atoms is more preferred.

The cycloalkyl group formed by combining two of Ra ₁ to Ra ₃ is, for example, a group in which one of the methylene groups constituting the ring contains a heteroatom such as an oxygen atom or a heteroatom such as a carbonyl group may be replaced with

In the repeating unit represented by formula (AI), for example, it is preferable that Ra ₁ is a methyl group or an ethyl group, and Ra ₂ and Ra ₃ combine to form the above-mentioned cycloalkyl group.

Each of the above groups may contain a substituent, and examples of the substituent include an alkyl group (having 1 to 4 carbon atoms), a halogen atom, a hydroxyl group, an alkoxy group (having 1 to 4 carbon atoms), a carboxy group, and an alkoxycarbonyl group (having 2 to 6 carbon atoms) and the like, preferably having 8 or less carbon atoms.

The content of the repeating unit represented by formula (AI) is preferably 20 to 90 mol%, more preferably 25 to 85 mol%, and further preferably 30 to 80 mol%, based on the total repeating units in the resin P. preferable.

...Repeating Unit Containing a Lactone Structure Moreover, the resin P preferably contains a repeating unit Q containing a lactone structure.

The repeating unit Q containing a lactone structure preferably contains a lactone structure in its side chain, and is more preferably a repeating unit derived from a (meth)acrylic acid derivative monomer.
The repeating unit Q containing a lactone structure may be used singly or in combination of two or more, but it is preferable to use one kind alone.
The content of the repeating unit Q containing a lactone structure is preferably 3 to 80 mol %, more preferably 3 to 60 mol %, relative to all repeating units in the resin P.

As the lactone structure, a 5- to 7-membered lactone structure is preferable, and a structure in which another ring structure is fused to the 5- to 7-membered lactone structure to form a bicyclo structure or a spiro structure is more preferable.
As the lactone structure, it preferably contains a repeating unit containing a lactone structure represented by any one of the following formulas (LC1-1) to (LC1-17). The lactone structure is preferably a lactone structure represented by formula (LC1-1), formula (LC1-4), formula (LC1-5), or formula (LC1-8), represented by formula (LC1-4) is more preferred.

The lactone structure portion may contain a substituent (Rb ₂ ). Preferred substituents (Rb ₂ ) include an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 4 to 7 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkoxycarbonyl group having 2 to 8 carbon atoms, and a carboxy group. , a halogen atom, a hydroxyl group, a cyano group, an acid-decomposable group, and the like. n2 represents an integer from ₀ to 4; When n ₂ is 2 or more, the multiple substituents (Rb ₂ ) may be the same or different, and the multiple substituents (Rb ₂ ) may combine to form a ring. .

... Repeating unit containing phenolic hydroxyl group The resin P may contain a repeating unit containing a phenolic hydroxyl group.
Repeating units containing a phenolic hydroxyl group include, for example, repeating units represented by the following general formula (I).

During the ceremony,
R ₄₁ , R ₄₂ and R ₄₃ each independently represent a hydrogen atom, an alkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group. However, _R42 may combine with _Ar4 to form a ring, in which case _R42 represents a single bond or an alkylene group.

X ₄ represents a single bond, -COO- or -CONR ₆₄ -, and R ₆₄ represents a hydrogen atom or an alkyl group.
_L4 represents a single bond or an alkylene group.
Ar ₄ represents an (n+1)-valent aromatic ring group, and when combined with R ₄₂ to form a ring, represents an (n+2)-valent aromatic ring group.
n represents an integer of 1 to 5;

The alkyl groups for R ₄₁ , R ₄₂ and R ₄₃ in general formula (I) include optionally substituted methyl, ethyl, propyl, isopropyl, n-butyl and sec-butyl groups. An alkyl group having 20 or less carbon atoms such as a group, a hexyl group, a 2-ethylhexyl group, an octyl group and a dodecyl group is preferable, an alkyl group having 8 or less carbon atoms is more preferable, and an alkyl group having 3 or less carbon atoms is even more preferable.

The cycloalkyl groups represented by R ₄₁ , R ₄₂ and R ₄₃ in general formula (I) may be monocyclic or polycyclic. The cycloalkyl group is preferably a monocyclic cycloalkyl group having 3 to 8 carbon atoms, such as a cyclopropyl group, a cyclopentyl group and a cyclohexyl group, which may contain a substituent.

The halogen atoms of R ₄₁ , R ₄₂ and R ₄₃ in general formula (I) include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, with a fluorine atom being preferred.

As the alkyl group contained in the alkoxycarbonyl group represented by R ₄₁ , R ₄₂ and R ₄₃ in formula (I), the same alkyl groups as those represented by R ₄₁ , R ₄₂ and R ₄₃ are preferable.

Examples of substituents on the above groups include alkyl groups, cycloalkyl groups, aryl groups, amino groups, amido groups, ureido groups, urethane groups, hydroxy groups, carboxy groups, halogen atoms, alkoxy groups, thioether groups, and acyl groups. , an acyloxy group, an alkoxycarbonyl group, a cyano group, a nitro group, etc., and the carbon number of the substituent is preferably 8 or less.

Ar ₄ represents an (n+1)-valent aromatic ring group. The divalent aromatic ring group when n is 1 may contain a substituent, for example, an arylene group having 6 to 18 carbon atoms such as a phenylene group, a tolylene group, a naphthylene group and an anthracenylene group, and , thiophene, furan, pyrrole, benzothiophene, benzofuran, benzopyrrole, triazine, imidazole, benzimidazole, triazole, thiadiazole and thiazole.

Specific examples of the (n+1)-valent aromatic ring group where n is an integer of 2 or more include the above specific examples of the divalent aromatic ring group, with (n−1) any hydrogen atoms removed. A group formed by
The (n+1)-valent aromatic ring group may further contain a substituent.

Examples of substituents that may be contained in the alkyl group, cycloalkyl group, alkoxycarbonyl group, alkylene group and (n+1)-valent aromatic ring group described above include R ₄₁ , R ₄₂ and R ₄₃ in general formula (I). alkoxy groups such as the methoxy group, ethoxy group, hydroxyethoxy group, propoxy group, hydroxypropoxy group and butoxy group; and aryl groups such as phenyl group.

The alkyl group for R ₆₄ in —CONR ₆₄ — (R ₆₄ represents a hydrogen atom or an alkyl group) represented by X ₄ is a methyl group, an ethyl group, or a propyl group which may contain a substituent. , isopropyl group, n-butyl group, sec-butyl group, hexyl group, 2-ethylhexyl group, octyl group and dodecyl group.

X ₄ is preferably a single bond, -COO- or -CONH-, more preferably a single bond or -COO-.

The alkylene group for L ₄ is preferably an optionally substituted alkylene group having 1 to 8 carbon atoms such as a methylene group, ethylene group, propylene group, butylene group, hexylene group and octylene group.

Ar ₄ is preferably an optionally substituted aromatic ring group having 6 to 18 carbon atoms, more preferably a benzene ring group, a naphthalene ring group or a biphenylene ring group.

The repeating unit represented by general formula (I) preferably has a hydroxystyrene structure. That is, Ar ₄ is preferably a benzene ring group.

The content of repeating units containing a phenolic hydroxyl group is preferably 0 to 50 mol%, more preferably 0 to 45 mol%, still more preferably 0 to 40 mol%, relative to all repeating units in the resin P.

... a repeating unit containing an organic group containing a polar group The resin P is a repeating unit containing an organic group containing a polar group, particularly a repeating unit containing an alicyclic hydrocarbon structure substituted with a polar group. may further contain. This improves the adhesion to the substrate and the compatibility with the developer.
The alicyclic hydrocarbon structure of the alicyclic hydrocarbon structure substituted with a polar group is preferably an adamantyl group, a diamantyl group or a norbornane group. A hydroxyl group or a cyano group is preferable as the polar group.

When the resin P contains a repeating unit containing an organic group containing a polar group, the content thereof is preferably 1 to 50 mol%, preferably 1 to 30 mol%, based on the total repeating units in the resin P. is more preferred, 5 to 25 mol % is even more preferred, and 5 to 20 mol % is particularly preferred.

...Repeating unit represented by general formula (VI) The resin P may contain a repeating unit represented by the following general formula (VI).

In general formula (VI),
R ₆₁ , R ₆₂ and R ₆₃ each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group. However, _R62 may combine with _Ar6 to form a ring, in which case _R62 represents a single bond or an alkylene group.
X ₆ represents a single bond, -COO- or -CONR ₆₄ -. _R64 represents a hydrogen atom or an alkyl group.
_L6 represents a single bond or an alkylene group.
Ar ₆ represents an (n+1)-valent aromatic ring group, and when combined with R ₆₂ to form a ring, represents an (n+2)-valent aromatic ring group.
Each Y ₂ independently represents a hydrogen atom or a group that leaves by the action of an acid when n≧2. However, at _least one of Y2 represents a group that leaves under the action of an acid.
n represents an integer of 1-4.

As the group Y ₂ that is eliminated by the action of an acid, a structure represented by the following general formula (VI-A) is preferred.

L ₁ and L ₂ each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a combination of an alkylene group and an aryl group.
M represents a single bond or a divalent linking group.
Q represents an alkyl group, an optionally heteroatom-containing cycloalkyl group, an optionally heteroatom-containing aryl group, an amino group, an ammonium group, a mercapto group, a cyano group, or an aldehyde group.
At least two of Q, M and L ₁ may combine to form a ring (preferably a 5- or 6-membered ring).

The repeating unit represented by the general formula (VI) is preferably a repeating unit represented by the following general formula (3).

In general formula (3),
Ar ₃ represents an aromatic ring group.
R3 represents a hydrogen atom _, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, an alkoxy group, an acyl group or a heterocyclic group.
_M3 represents a single bond or a divalent linking group.
_Q3 represents an alkyl group, a cycloalkyl group, an aryl group or a heterocyclic group.
At least two of Q ₃ , M ₃ and R ₃ may combine to form a ring.

The aromatic ring group represented by Ar ₃ is the same as Ar ₆ in the general formula (VI) when n in the general formula (VI) is 1, preferably a phenylene group or a naphthylene group, more preferably a phenylene group. preferable.

Recurring Unit Containing Silicon Atom in Side Chain The resin P may further contain a repeating unit containing a silicon atom in its side chain. Examples of repeating units containing silicon atoms in side chains include (meth)acrylate repeating units containing silicon atoms and vinyl repeating units containing silicon atoms. A repeating unit containing a silicon atom in a side chain is typically a repeating unit containing a group containing a silicon atom in a side chain. a triphenylsilyl group, a tricyclohexylsilyl group, a tritrimethylsiloxysilyl group, a tritrimethylsilylsilyl group, a methylbistrimethylsilylsilyl group, a methylbistrimethylsiloxysilyl group, a dimethyltrimethylsilylsilyl group, a dimethyltrimethylsiloxysilyl group, and the following and a cyclic or linear polysiloxane such as, or a cage-type, ladder-type or random-type silsesquioxane structure. In the formula, R and ^R1 each independently represent a monovalent substituent. * represents a bond.

As the repeating unit containing the above group, for example, a repeating unit derived from an acrylate compound or a methacrylate compound containing the above group, or a repeating unit derived from a compound containing the above group and a vinyl group is preferable. .

When the resin P contains a repeating unit containing a silicon atom in the side chain, the content thereof is preferably 1 to 30 mol%, more preferably 5 to 25 mol%, based on the total repeating units in the resin P. More preferably, it is 5 to 20 mol %.

The weight average molecular weight of the resin P is preferably 1,000 to 200,000, more preferably 3,000 to 20,000, and more preferably 5,000 to 15,000 as a polystyrene equivalent value by GPC (Gel permeation chromatography). More preferred. When the weight-average molecular weight is 1,000 to 200,000, deterioration of heat resistance and dry etching resistance can be prevented, and deterioration of developability and deterioration of film formability due to high viscosity can be prevented. Prevent.

The degree of dispersion (molecular weight distribution) is generally 1 to 5, preferably 1 to 3, more preferably 1.2 to 3.0, and even more preferably 1.2 to 2.0.

Known components can be used for other components (eg, acid generator, basic compound, quencher, hydrophobic resin, surfactant, solvent, etc.) contained in the chemical solution.

(Water-based liquid to be purified)
The aqueous liquid to be purified contains more than 50% by mass of water, preferably 51 to 95% by mass, based on the total mass of the solvent contained in the aqueous liquid to be purified.
The water is not particularly limited, but it is preferable to use ultrapure water used in semiconductor manufacturing, and the ultrapure water is further purified to reduce inorganic anions, metal ions, etc. is more preferred. The purification method is not particularly limited, but purification using a filtration membrane or ion exchange membrane and purification by distillation are preferred. Further, for example, it is preferable to perform purification by the method described in JP-A-2007-254168.

Oxidizing agent The aqueous liquid to be purified may contain an oxidizing agent. The oxidizing agent is not particularly limited, and known oxidizing agents can be used. Examples of oxidizing agents include hydrogen peroxide, peroxides, nitric acid, nitrates, iodates, periodates, hypochlorites, chlorites, chlorates, perchlorates, and persulfates. salts, dichromates, permanganates, ozone water, silver (II) salts, iron (III) salts, and the like.

Although the content of the oxidizing agent is not particularly limited, it is preferably 0.1% by mass or more and preferably 99.0% by mass or less with respect to the total mass of the aqueous liquid to be purified. In addition, an oxidizing agent may be used individually by 1 type, or may use 2 or more types together. When two or more oxidizing agents are used in combination, the total content is preferably within the above range.

- Inorganic acid The aqueous liquid to be purified may contain an inorganic acid. The inorganic acid is not particularly limited, and known inorganic acids can be used. Examples of inorganic acids include sulfuric acid, phosphoric acid, and hydrochloric acid. In addition, an inorganic acid is not included in the oxidizing agent mentioned above.
The content of the inorganic acid in the aqueous liquid to be purified is not particularly limited, but is preferably 0.01% by mass or more and preferably 99.0% by mass or less with respect to the total mass of the aqueous liquid to be purified.
An inorganic acid may be used individually by 1 type, or may use 2 or more types together. When two or more inorganic acids are used in combination, the total content is preferably within the above range.

· Anticorrosive agent The aqueous liquid to be purified may contain an anticorrosive agent. The anticorrosive agent is not particularly limited, and known anticorrosive agents can be used. Examples of anticorrosive agents include 1,2,4-triazole (TAZ), 5-aminotetrazole (ATA), 5-amino-1,3,4-thiadiazole-2-thiol, 3-amino-1H-1,2 ,4-triazole, 3,5-diamino-1,2,4-triazole, tolyltriazole, 3-amino-5-mercapto-1,2,4-triazole, 1-amino-1,2,4-triazole, 1 -amino-1,2,3-triazole, 1-amino-5-methyl-1,2,3-triazole, 3-mercapto-1,2,4-triazole, 3-isopropyl-1,2,4-triazole , naphthotriazole, 1H-tetrazole-5-acetic acid, 2-mercaptobenzothiazole (2-MBT), 1-phenyl-2-tetrazoline-5-thione, 2-mercaptobenzimidazole (2-MBI), 4-methyl- 2-phenylimidazole, 2-mercaptothiazoline, 2,4-diamino-6-methyl-1,3,5-triazine, thiazole, imidazole, benzimidazole, triazine, methyltetrazole, bismuthiol I, 1,3-dimethyl-2 -imidazolidinone, 1,5-pentamethylenetetrazole, 1-phenyl-5-mercaptotetrazole, diaminomethyltriazine, imidazolinethione, 4-methyl-4H-1,2,4-triazole-3-thiol, 5-amino -1,3,4-thiadiazole-2-thiol, benzothiazole, tritolyl phosphate, indazole, adenine, cytosine, guanine, thymine, phosphate inhibitors, amines, pyrazoles, propanethiol, silanes, secondary amines benzohydroxamic acids, heterocyclic nitrogen inhibitors, ascorbic acid, thiourea, 1,1,3,3-tetramethylurea, urea, urea derivatives, uric acid, potassium ethylxanthate, glycine, dodecylphosphonic acid, iminodiacetic acid, boric acid, malonic acid, succinic acid, nitrilotriacetic acid, sulfolane, 2,3,5-trimethylpyrazine, 2-ethyl-3,5-dimethylpyrazine, quinoxaline, acetylpyrrole, pyridazine, histadine , pyrazine, glutathione (reduced form), cysteine, cystine, thiophene, mercaptopyridine N-oxide, thiamine HCl, tetraethylthiuram disulfide, 2,5-dimercapto-1,3-thiadiazole ascorbic acid, ascorbic acid acid, catechol, t-butylcatechol, phenol, and pyrogallol.

The anticorrosive agents include aliphatic carboxylic acids such as dodecanoic acid, palmitic acid, 2-ethylhexanoic acid, and cyclohexanoic acid; citric acid, malic acid, oxalic acid, malonic acid, succinic acid, itaconic acid, maleic acid, glycol acid, mercaptoacetic acid, thioglycolic acid, salicylic acid, sulfosalicylic acid, anthranilic acid, N-methylanthranilic acid, 3-amino-2-naphthoic acid, 1-amino-2-naphthoic acid, 2-amino-1-naphthoic acid , 1-aminoanthraquinone-2-carboxylic acid, tannic acid, and carboxylic acids having chelating ability such as gallic acid;

Examples of the anticorrosive agent include coconut fatty acid salt, castor sulfate oil salt, lauryl sulfate salt, polyoxyalkylene allylphenyl ether sulfate salt, alkylbenzenesulfonic acid, alkylbenzenesulfonate, alkyldiphenyletherdisulfonate, and alkylnaphthalenesulfone. Anionic surfactants such as acid salts, dialkyl sulfosuccinate salts, isopropyl phosphate, polyoxyethylene alkyl ether phosphate salts, polyoxyethylene allylphenyl ether phosphate salts; oleylamine acetate, laurylpyridinium chloride, cetylpyridinium chloride, lauryltrimethylammonium cationic surfactants such as chloride, stearyltrimethylammonium chloride, behenyltrimethylammonium chloride, didecyldimethylammonium chloride; coconut alkyldimethylamine oxide, fatty acid amidopropyldimethylamine oxide, alkylpolyaminoethylglycine hydrochloride, amidobetaine type active agent, Amphoteric surfactants such as alanine-type active agents and lauryliminodipropionic acid; Styryl phenyl ether, polyoxyalkylene polystyryl phenyl ether, etc., polyoxyalkylene primary alkyl ether or polyoxyalkylene secondary alkyl ether nonionic surfactant, polyoxyethylene dilaurate, polyoxyethylene laurate, polyoxyethylenated castor oil , polyoxyethylenated hydrogenated castor oil, sorbitan laurate, polyoxyethylene sorbitan laurate, other polyoxyalkylene-based nonionic surfactants such as fatty acid diethanolamide; octyl stearate, trimethylolpropane tridecanoate, etc. and polyether polyols such as polyoxyalkylene butyl ether, polyoxyalkylene oleyl ether, and trimethylolpropane tris(polyoxyalkylene) ether.
Examples of the commercial products include Nucalgen FS-3PG (manufactured by Takemoto Yushi Co., Ltd.) and Phosten HLP-1 (manufactured by Nikko Chemicals Co., Ltd.).

Moreover, you may use a hydrophilic polymer as an anticorrosive agent.
Hydrophilic polymers include, for example, polyglycols such as polyethylene glycol, alkyl ethers of polyglycols, polyvinyl alcohol, polyvinylpyrrolidone, polysaccharides such as alginic acid, carboxylic acid-containing polymers such as polymethacrylic acid and polyacrylic acid, Examples include polyacrylamide, polymethacrylamide, and polyethyleneimine. Specific examples of such hydrophilic polymers include water-soluble polymers described in paragraphs 0042 to 0044 of JP-A-2009-88243 and paragraph 0026 of JP-A-2007-194261.

Moreover, you may use a cerium salt as an anticorrosive.
The cerium salt is not particularly limited, and known cerium salts can be used.
Cerium salts include, for example, trivalent cerium salts such as cerium acetate, cerium nitrate, cerium chloride, cerium carbonate, cerium oxalate, and cerium sulfate. Examples of tetravalent cerium salts include cerium sulfate, cerium ammonium sulfate, cerium ammonium nitrate, diammonium cerium nitrate, and cerium hydroxide.

Corrosion inhibitors may include substituted or unsubstituted benzotriazoles. Suitable substituted benzotriazoles include, but are not limited to, benzotriazoles substituted with alkyl, aryl, halogen, amino, nitro, alkoxy, or hydroxyl groups. Substituted benzotriazoles also include compounds fused with one or more aryl (eg, phenyl) or heteroaryl groups.

The content of the anticorrosive agent in the aqueous liquid to be purified is preferably adjusted to 0.01 to 5% by mass with respect to the total mass of the chemical solution. An anticorrosive may be used individually by 1 type, or may use 2 or more types together. When two or more anticorrosive agents are used in combination, the total content is preferably within the above range.

• Organic solvent The aqueous liquid to be purified may contain an organic solvent. Although the organic solvent is not particularly limited, it is as already described as the organic solvent contained in the organic solvent-based liquid to be purified. When an organic solvent is contained, the content of the organic solvent is preferably 5 to 35% by mass with respect to the total mass of the solvent contained in the aqueous liquid to be purified.

<Filtration process>
The method for producing a chemical solution according to the present embodiment includes a filtration step of obtaining a chemical solution by filtering the liquid to be purified using the filter of the present invention (typically, a filtration device equipped with the filter of the present invention). contains.
The supply pressure of the liquid to be purified to each filter in the filtration device is not particularly limited, but is generally preferably 0.00010 to 1.0 MPa.
Among them, the supply pressure P2 is preferably _0.00050 to 0.090 MPa, more preferably 0.0010 to 0.050 MPa, and more preferably 0.0050 to 0 0.040 MPa is more preferred.
Moreover, since the filtration pressure affects the filtration accuracy, it is preferable that the pressure pulsation during filtration be as small as possible.

Although the filtration rate is not particularly limited, it is preferably 1.0 L/min/m ² or more, more preferably 0.75 L/min/m ² or more, in terms of easily obtaining a chemical solution containing superior defect suppression properties. 0.6 L/min/m ² or more is more preferable.
The filter is set with a differential pressure resistance that guarantees filter performance (the filter does not break), and if this value is large, the filtration pressure can be increased to increase the filtration speed. In other words, although the upper limit of filtration rate usually depends on the differential pressure resistance of the filter, it is usually preferably 10.0 L/min/m ² or less.

Although the temperature at which the liquid to be purified is passed through the filter is not particularly limited, it is generally preferably below room temperature.

In addition, it is preferable to implement a filtration process in a clean environment. Specifically, it is preferable to carry out in a clean room that satisfies Class 1000 (ISO14644-1:2015, Class 6) of the US federal standard (Fed.Std.209E), and a clean room that satisfies Class 100 (ISO14644-1:2015, Class 5). More preferably, a clean room that meets Class 10 (ISO14644-1: 2015, Class 4) is more preferable, and Class 1 (ISO14644-1: 2015, Class 3) or higher cleanliness (Class 2 or Class 1) Clean rooms are particularly preferred.
In addition, each step to be described later is also preferably performed in the clean environment.

Also, if the filtration device contains a return flow path, the filtration step may be a circulation filtration step. The circulating filtration process is a process in which the liquid to be purified is filtered at least by the filter A, the liquid to be purified after being filtered by the filter A is returned to the upstream of the filter A with respect to the flow path, and filtered by the filter A again. .
The number of circulating filtrations is not particularly limited, but is generally preferably 2 to 10 times. In the circulation filtration, the liquid to be purified may be returned to the upstream of the filter A so that the filtration by the filter A is repeated. You may adjust a flow path.

<Other processes>
The method for manufacturing a chemical solution according to this embodiment may include steps other than those described above. Processes other than those described above include, for example, an apparatus cleaning process, a static elimination process, and the like. Below, each process is explained in full detail.

(Equipment washing process)
The device cleaning step is a step of cleaning the wetted part of the filtering device before the filtering step. The method for cleaning the wetted part of the filtration device before the filtration step is not particularly limited, but in the following, the filter is contained in a filter-equipped cartridge, and the filter-equipped cartridge is in a housing arranged on the flow path. A filtering device housed in the is explained as an example.

The device cleaning step includes a step A of cleaning the wetted part of the filtration device with a cleaning liquid in a state in which the cartridge with the filter is removed from the housing, and after the step A, housing the cartridge with the filter in the housing, and further cleaning with the cleaning liquid. It is preferable to include a step B of washing the wetted part of the filtration device with.

・Process A
Step A is a step of washing the wetted part of the filter device with a washing liquid in a state in which the cartridge with the filter is removed from the housing. With the filter removed from the housing, it is meant that the wetted parts of the filtration device are cleaned with a cleaning liquid prior to removing the filter cartridge from the housing or placing the filter cartridge in the housing.
There is no particular limitation on the method of cleaning the liquid-contacting part of the filtering device with the filter removed from the housing (hereinafter also referred to as "filter not housed") using the cleaning liquid. A method of introducing the cleaning liquid from the inflow part and recovering it from the outflow part can be mentioned.

Among them, in terms of obtaining a more excellent effect of the present invention, as a method for cleaning the wetted part of the filtration device without a filter using a cleaning liquid, there is a method of filling the inside of the filtration device without a filter with a cleaning liquid. mentioned. The interior of the filtering device without a filter is filled with a cleaning liquid, and the wetted part of the filtering device without a filter comes into contact with the cleaning liquid. As a result, impurities adhering to the wetted part of the filtration device are transferred (typically eluted) into the cleaning liquid. After washing, the washing liquid may be discharged outside the filtering device (typically, it may be discharged from the outflow part).

- Washing liquid The washing liquid is not particularly limited, and a known washing liquid can be used. Among them, the cleaning liquid preferably contains water or an organic solvent as a main component, and more preferably contains an organic solvent as a main component, in order to obtain a more excellent effect of the present invention. In the present specification, the main component means a component that is contained in an amount of 99.9% by mass or more, more preferably 99.99% by mass or more, relative to the total mass of the cleaning liquid.

The organic solvent is not particularly limited, and for example, water and organic solvents already described as the organic solvent contained in the chemical solution can be used. As the organic solvent, PGMEA, cyclohexanone, ethyl lactate, butyl acetate, MIBC (4-methyl-2-pentanol), and MMP (3-methylmethoxypropionate) are used in that the effects of the present invention are more excellent. , MAK (2-heptanone), n-pentyl acetate, ethylene glycol, isopentyl acetate, PGME (propylene glycol monoethyl ether), MEK (methyl ethyl ketone), 1-hexanol, and at least one selected from the group consisting of decane is preferred.

・Process B
Process B is a method of cleaning the filtering device with a cleaning liquid while the filter is housed in the housing.
As a method for cleaning the filtering device using the cleaning liquid, in addition to the cleaning method in step A already described, a method of passing the cleaning liquid through the filtering device can also be used. The method of passing the cleaning liquid through the filtration device is not particularly limited, but the cleaning liquid may be introduced from the inflow section and discharged from the outflow section. The cleaning liquid that can be used in this step is not particularly limited, and the cleaning liquid described in step A can be used.

(Static elimination process)
The static elimination step is a step of eliminating static electricity from the liquid to be purified to reduce the charge potential of the liquid to be purified. The static elimination method is not particularly limited, and a known static elimination method can be used. Examples of the static elimination method include a method of bringing the liquid to be purified into contact with a conductive material.
The contact time for contacting the liquid to be purified with the conductive material is preferably 0.001 to 60 seconds, more preferably 0.001 to 1 second, and even more preferably 0.01 to 0.1 seconds. Conductive materials include stainless steel, gold, platinum, diamond, glassy carbon, and the like.
As a method for bringing the liquid to be purified into contact with the conductive material, for example, a grounded mesh made of a conductive material is placed across the flow path, and the liquid to be purified is distributed through the mesh.

[Corrosion resistant material]
Next, the corrosion resistant material will be explained. It is preferable that at least a part of the liquid contacting part of the filtration device and the purification device according to the embodiments of the present invention described so far is made of a corrosion-resistant material, and 90% or more of the liquid contacting part is made of a corrosion-resistant material. It is more preferably made of a corrosive material, and more preferably 99% or more of the wetted part is made of a corrosion resistant material.

The state in which the wetted part is formed of a corrosion-resistant material is not particularly limited, but typically the state in which each member (for example, the tank described above) is formed of a corrosion-resistant material, and the state in which each member For example, the member includes a base material and a coating layer disposed on the base material, and the coating layer is made of a corrosion-resistant material.

Corrosion resistant materials are non-metallic materials and electropolished metallic materials. Examples of the non-metallic material include, but are not limited to, polyethylene resin, polypropylene resin, polyethylene-polypropylene resin, tetrafluoroethylene resin, tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer, tetrafluoroethylene-hexafluoroethylene. Propylene fluoride copolymer resin, ethylene tetrafluoride-ethylene copolymer resin, ethylene trifluoride chloride-ethylene copolymer resin, vinylidene fluoride resin, ethylene trifluoride chloride copolymer resin, vinyl fluoride resin, etc. include, but are not limited to.

The metal material is not particularly limited, but includes, for example, a metal material in which the total content of Cr and Ni is more than 25% by mass with respect to the total mass of the metal material, and more preferably 30% by mass or more. . The upper limit of the total content of Cr and Ni in the metal material is not particularly limited, but is generally preferably 90% by mass or less.
Metal materials include, for example, stainless steel and Ni--Cr alloys.

Stainless steel is not particularly limited, and known stainless steel can be used. Among them, an alloy containing 8% by mass or more of Ni is preferable, and an austenitic stainless steel containing 8% by mass or more of Ni is more preferable. Examples of austenitic stainless steel include SUS (Steel Use Stainless) 304 (Ni content 8% by mass, Cr content 18% by mass), SUS304L (Ni content 9% by mass, Cr content 18% by mass), SUS316 ( Ni content of 10% by mass, Cr content of 16% by mass), SUS316L (Ni content of 12% by mass, Cr content of 16% by mass), and the like.

The Ni--Cr alloy is not particularly limited, and known Ni--Cr alloys can be used. Among them, a NiCr alloy having a Ni content of 40 to 75% by mass and a Cr content of 1 to 30% by mass is preferable.
Examples of Ni—Cr alloys include Hastelloy (trade name, hereinafter the same), Monel (trade name, the same hereinafter), and Inconel (trade name, the same hereinafter). More specifically, Hastelloy C-276 (Ni content 63% by mass, Cr content 16% by mass), Hastelloy-C (Ni content 60% by mass, Cr content 17% by mass), Hastelloy C-22 ( Ni content of 61% by mass, Cr content of 22% by mass) and the like.
In addition, the Ni--Cr alloy may further contain B, Si, W, Mo, Cu, Co, etc., in addition to the alloys described above, if necessary.

A method for electropolishing a metal material is not particularly limited, and a known method can be used. For example, the methods described in paragraphs 0011 to 0014 of JP-A-2015-227501 and paragraphs 0036-0042 of JP-A-2008-264929 can be used.

It is presumed that the metal material has a higher Cr content in the passivation layer on the surface than the Cr content in the matrix due to electropolishing. For this reason, it is presumed that metal impurities containing metal atoms are less likely to flow out into the liquid to be purified when a refining apparatus in which the liquid-contacting portion is formed of an electropolished metal material is used.
Note that the metal material may be buffed. The buffing method is not particularly limited, and any known method can be used. The size of the abrasive grains used for the buffing finish is not particularly limited, but #400 or less is preferable in that the irregularities on the surface of the metal material are likely to be smaller. Buffing is preferably performed before electropolishing.

[Use of chemical solution]
The chemical solution produced using the filter of the present invention (preferably a filtering device containing the filter) is preferably used in the production of semiconductor substrates. In particular, it is more preferably used for forming a fine pattern with a node of 10 nm or less (for example, a process including pattern formation using extreme ultraviolet rays).
In other words, the filtering apparatus is preferably used for manufacturing chemical solutions for manufacturing semiconductor substrates. In the manufacturing process, it is preferably used for manufacturing chemical solutions used for treating inorganic substances and/or organic substances after each step or before proceeding to the next step.
Specifically, the filtering device includes a developer, a rinse liquid, a wafer cleaning liquid, a line cleaning liquid (for example, a pipe cleaning liquid), a prewetting liquid, a wafer rinse liquid, a resist liquid, a lower layer film forming liquid, an upper layer film forming liquid, and It is preferably at least one liquid selected from the group consisting of hard coat forming liquids (chemical liquid obtained by purifying an organic liquid to be purified). At least one selected from the group consisting of stripping solution, remover, etchant, acidic cleaning solution, phosphoric acid, phosphoric acid-hydrogen peroxide mixture (SPM: Sulfuric acid-Hydrogen Peroxide Mixture) (aqueous liquid to be purified) is preferably used for the production of a chemical solution obtained by purifying the

In addition, the filter of the present invention (preferably a filtering device containing a filter) can also be used to manufacture a chemical solution used for rinsing edge lines of semiconductor substrates before and after resist coating.
Further, the filter of the present invention (preferably a filtering device containing a filter) can also be used for producing a diluent of a resin contained in a resist solution and a solvent contained in a resist solution.

In addition, the filter of the present invention (preferably a filtering device containing a filter) can be used for the production of chemicals used for other applications other than the production of semiconductor substrates, such as polyimides, sensor resists, lens resists, and the like. It can also be used for manufacturing developer and rinse solution.
The filters of the invention (preferably filtration devices containing filters) can also be used in the manufacture of solvents for medical or cleaning applications. In particular, it can be used to manufacture a chemical liquid used for cleaning containers, pipes, substrates (eg, wafers, glass, etc.).
Among them, the filter of the present invention (preferably a filtering device containing a filter) is selected from the group consisting of a pre-wetting liquid, a developing liquid, a rinse liquid, and a pipe cleaning liquid for cleaning a device that transfers these liquids in pattern formation. It is preferably used for the production of at least one selected.

When the chemical solution to be produced mainly contains an organic solvent (for example, the content of the organic solvent is 80% by mass or more (preferably 99% by mass or more, more preferably 99.9% by mass or more) relative to the total mass of the chemical solution When the upper limit is, for example, 100% by mass or less), the drug solution preferably contains a Hansen solubility parameter distance of 3 to 20 MPa ^0.5 (more preferably 5 to 20 MPa ^0.5 ) to eicosene.
When two or more organic solvents are used, at least one preferably satisfies the Hansen solubility parameter range.
When two or more organic solvents are used, the weighted average value of the Hansen Solubility Parameters based on the molar ratio of the content of each organic solvent preferably satisfies the range of the Hansen Solubility Parameters.
Examples of the organic solvent include the same organic solvents as the organic solvent for the liquid to be purified.

For example, it is also preferable that the chemical liquid is only an organic solvent that substantially satisfies the range of the Hansen solubility parameter, from the viewpoint of more excellent defect suppressing properties. The fact that the chemical solution is substantially only an organic solvent that satisfies the range of the Hansen solubility parameters means that the content of the organic solvent that satisfies the range of the Hansen solubility parameters is 99% by mass or more with respect to the total mass of the organic solvent ( preferably 99.9% by mass or more).

Further, for example, it is also preferable that the chemical solution is a mixed solvent containing both an organic solvent that satisfies the Hansen solubility parameter range and an organic solvent that does not satisfy the Hansen solubility parameter range.
In this case, the chemical solution (mixed solvent) contains 20 to 80% by mass (preferably 30 to 70% by mass), and preferably 20 to 80% by mass (preferably 30 to 70% by mass) of the organic solvent that does not satisfy the Hansen solubility parameter range.
If the content of the organic solvent that satisfies the Hansen solubility parameter range and the content of the organic solvent that does not satisfy the Hansen solubility parameter range are each equal to or greater than a certain amount, the organic solvent that does not satisfy the Hansen solubility parameter range is specified. Compared to the case where the amount is outside the range (for example, 1% by mass or more and less than 20% by mass or more than 80% by mass with respect to the total mass of the mixed solvent), the chemical solution has an affinity for metallic materials and organic materials. It is considered that the effect of the present invention is more excellent because it can be adjusted within a suitable range.
In this case, the total content of the organic solvent satisfying the Hansen solubility parameter range and the organic solvent not satisfying the Hansen solubility parameter range is preferably 99.0% by mass or more with respect to the total mass of the chemical solution. . Although the upper limit is not particularly limited, it is generally preferably 99.99999% by mass or less.
In addition, in the organic solvent that does not satisfy the range of the Hansen solubility parameter, the distance of the Hansen solubility parameter to eicosene is 0 MPa ^0.5 or more and 3 MPa less than ^0.5 (preferably 0 MPa ^0.5 or more and 3 MPa less than ^0.5 ), or , more than 20 MPa ^0.5 (preferably more than 20 MPa ^0.5 and 50 MPa ^0.5 or less).

[Medicine container]
The chemical solution produced by the filtering device may be stored in a container and stored until use. Such a container and the drug solution stored in the container are collectively referred to as a drug solution container. The drug solution is taken out from the stored drug solution container and used.

As the container for storing the chemical solution, it is preferable to use a container for manufacturing semiconductor substrates, which has a high degree of cleanliness in the container and in which impurities are hardly eluted from the chemical solution while the chemical solution is being stored.
Usable containers are not particularly limited, and examples thereof include, but are not limited to, the "Clean Bottle" series manufactured by Aicello Chemical Co., Ltd. and the "Pure Bottle" manufactured by Kodama Resin Industry.

For the container, a multi-layer bottle with a 6-layer structure made of 6 types of resin for the inner wall, or a multi-layer bottle with a 7-layer structure made of 6 types of resin, is used for the purpose of preventing contamination of the chemical solution. is also preferred. Examples of these containers include containers described in JP-A-2015-123351.

At least a portion of the liquid-contacting portion of the container is preferably made of the corrosion-resistant material already described. From the point of view of obtaining more excellent effects of the present invention, it is preferable that 90% or more of the area of the wetted portion is made of the above material.

The present invention will be described in more detail based on examples below. The materials, amounts used, proportions, processing details, processing procedures, etc. shown in the following examples can be changed as appropriate without departing from the gist of the present invention. Therefore, the scope of the present invention should not be construed as limited by the examples shown below.

Further, in preparing the chemical solutions of Examples and Comparative Examples, handling of the container, preparation, filling, storage and analysis of the chemical solution were all performed in a clean room satisfying ISO class 2 or 1. In order to improve the measurement accuracy, when measuring the content of organic compounds and the content of metal components, when measuring components below the detection limit in normal measurement, the chemical solution should be concentrated and measured. The content was calculated by converting to the concentration of the solution before concentration.
Unless otherwise specified, the equipment used in the test was sufficiently cleaned in advance.

[Production of filter]
[Filter packing material]
A filter to be treated packed with the following packing material was obtained.
The abbreviations for the packing material of the filter to be treated are as follows.

・HDPE: A bag made of HDPE whose contact part with the filter to be treated is HDPE (high density polyethylene) ・Fluororesin: A bag made of fluororesin whose part in contact with the filter to be treated is fluororesin ・EP-SUS: To be treated A capsule made of stainless steel in which the part that contacts the filter is electropolished stainless steel

[Filter to be processed]
A filter containing a filtration layer containing the materials shown below and a filter body containing a support layer was subjected to pretreatment as a filter to be treated.
The abbreviations for the material of the filter body of each filter (filter to be treated) are as follows.

・PP: Polypropylene ・IEX (PTFE): PTFE with cation exchange group introduced
・PTFE: Polytetrafluoroethylene ・Nylon: Nylon ・UPE: Ultra-high molecular weight polyethylene ・PFA: Perfluoroalkoxyalkane ・Polyester: Polyester ・Graft Nylon: Nylon grafted with a nylon-based polymer

・A1:
First, a bis-olefin of formula CH ₂ CH—C ₆ F ₁₂ —CHCH ₂ as pre-crosslinker, IC ₄ F ₈ —I as chain transfer agent, and potassium persulfate as radical initiator. was used to emulsion polymerize TFE and a vinyl ether of the formula CF ₂ =CF-O-CF ₂ CF ₂ -SO ₂ F.
The emulsion polymerization conditions were set according to the conditions shown in Table 2 of paragraph 0121 of JP-A-2012-522882 to synthesize the copolymer C1 shown in Table 2 above.
Next, a fluorocarbon composition S1 described in paragraphs 0123 to 0125 (particularly Table 3 of paragraph 0123) of JP-A-2012-522882 was prepared.
Next, the above fluorocarbon composition was adjusted so that the ionomer content was 1.3% by mass. The fluorocarbon composition after preparation contains a cross-linking agent and a radical initiator. A membrane obtained by forming a coating layer on the surface of a PTFE porous substrate using the prepared fluorocarbon composition.

A2: A membrane prepared by preparing hollow fibers of a tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer and using the fibers, referring to the description in paragraph 0058 of JP-A-2015-61727.

A3: A porous substrate made of polytetrafluoroethylene, a first layer containing a sulfonic acid group bonded to the surface of the porous substrate, and polytetrafluoroethylene disposed on the first layer and a second layer containing amide groups bound to the surface of said porous substrate.

Anion-exchange group: A grafted ultra-high molecular weight polyethylene membrane (containing a quaternary ammonium group as an anion-exchange group), referring to paragraph 0099 of JP-T-2017-536232.
This membrane is an asymmetric porous membrane.

· Cation exchange group: Ultra high molecular weight polyethylene membrane (containing a sulfonic acid group as a cation exchange group) grafted with reference to paragraphs 0130 to 0132 of JP-T-2017-536232.
This membrane is an asymmetric porous membrane.

- Neutral graft UPE1: Grafted ultra-high molecular weight polyethylene membrane (as a neutral group, containing a hydroxy group derived from hydroxymethylacrylamide are doing).
This membrane is an asymmetric porous membrane.

・Neutral graft UPE2: Ultra high molecular weight polyethylene membrane (as a neutral group, containing hydroxy groups derived from hydroxymethylacrylamide).
This membrane is an asymmetric porous membrane.

- PFSA/PTFE: commercially available Entegris, inc. , manufactured by Fluoroguard AT, a 0.25% PFSA solution (Aquivion PFSA 24: D83-24B Solvay Plastics) was immersed in a polymer solution prepared in a methanol water solvent until sufficiently wet, drained, and then dried. Washed for 24 hours using ultrapure water.

・PTFE-a1:
A membrane obtained by forming a coating layer of poly(M8-b-NPF6) on the surface of a PTFE porous membrane with reference to the descriptions in paragraphs 0124 and 0125 of JP-A-2016-194038.
The pore size was adjusted by the coating amount of poly(M8-b-NPF6).
The resin forming the coating layer of PTFE-1 contains a polyoxyalkylene group as a hydrophilic group.

・PTFE-a2:
Poly(M8-b-NPF6)-S(CH ₂ )SO ₃ Na described in paragraph 0023 of JP-A-2016-194038 was synthesized. Specifically, the above copolymer was synthesized with reference to paragraphs 0103 to 0109 of JP-A-2016-194038. A porous PTFE membrane containing a coating layer produced in the same manner as PTFEa-1 using the synthesized copolymer.
The resin forming the coating layer of PTFE-2 contains polyoxyalkylene groups and sulfonic acid (salt) groups as hydrophilic groups.

・PTFE-a3:
Poly(M8-b-NPF6)-S-CH ₂ COOH described in paragraph 0023 of JP-A-2016-194038 was synthesized. Specifically, the above copolymer was synthesized with reference to paragraphs 0103 to 0109 of JP-A-2016-194038. A porous PTFE membrane containing a coating layer produced in the same manner as PTFE-a1 using the synthesized copolymer.
The resin forming the coating layer of PTFE-a3 contains a polyoxyalkylene group and a carboxylic acid (salt) group as hydrophilic groups.

・PTFE-a4:
Poly(NTEG-b-NPF6)/thioglycerol was synthesized as described in paragraph 0014 of JP-A-2016-199733. Specifically, the copolymer was synthesized with reference to paragraphs 0106 to 0108 of JP-A-2016-199733. A porous PTFE membrane containing a coating layer produced in the same manner as PTFE-a1 using the synthesized copolymer.
The resin forming the coating layer of PTFE-a4 contains a polyoxyalkylene group as a hydrophilic group and a group containing a thioether group and a hydroxyl group.

・PTFE-b1:
Second generation Grubbs catalyst (3.0 mg, 0.004 mmol), 2-butene-1,4-diol (10.0 mg, 0.12 mmol), and 1,5- Cyclooctadiene (490 mg, 4.54 mmol) was combined, degassed with argon for 5 minutes and transferred to a 40° C. oil bath. Heating was continued for 1 hour and the remaining 1,5-cyclooctadiene (4.5 mg, 4.2 mmol) in 5 mL of DCM was added to the mixture and heating was continued for a further 6 hours. Hydroxyl-terminated polymer (PCOD) was isolated by precipitation in methanol. ¹ H-NMR (300 MHz, CDCl ₃ ): δ (ppm) 5.3-5.5 (s, broad, 1H), 1.75-2.5 (s, broad).

The above PCOD homopolymer was post-functionalized with 1H,1H,2H,2H-perfluorodecanethiol in the presence of a photoinitiator under UV irradiation to give fluorinated PCOD.
The porous PTFE membrane is made of fluorinated PCOD (1-10% mass concentration) THF solution, photoinitiator (Irgacure, 1-15 mass%), 3-mercaptoethanesulfonic acid sodium salt (1-15 mass%, homogeneous The membrane is immersed in a solution containing THF and neutralized with an aqueous solution of dilute hydrochloric acid (1N) until a THF solution is obtained, and is coated with fluorinated PCOD, modified through a thiolene reaction, The membrane is crosslinked with this mixture using UV irradiation (300-480 nm, 150-250 milliwatts, 60-180 seconds). The film obtained was then washed with water and dried at 100° C. for 10 minutes.

PTFE-b1 obtained by the above method is a group containing a thioether group as an adsorptive group, with PCOD as a main chain, disposed so as to cover the porous substrate made of PTFE, and covering the porous substrate. It contained a coating layer with a copolymer containing (-SCH ₂ CH ₂ (CF ₂ ) ₇ CF ₃ ).

・PTFE-b2:
With reference to the description in paragraphs 0018 to 0032 of JP-A-2017-002273, a coating resin was obtained in which carboxylic acid groups were introduced into side chains by a thiolene reaction between mercaptoacetic acid and allyl groups. Furthermore, a film obtained by forming a coating layer of the above resin on a PTFE porous film with reference to the description in paragraphs 0070 to 0071 of JP-A-2017-002273.

PTFE-b2 obtained by the above method is a copolymer of formula (I) disposed on a PTFE porous substrate so as to cover the porous substrate, and has a thioether group as an adsorptive group. , and a coating layer with a copolymer containing groups containing carboxylic acid groups (--SCH ₂ COOH).

The copolymers of formula (I) are random or block copolymers, Rf is a perfluoro substituent, Rh is an adsorptive group, Ra is a methyl or ethyl group, m and n are independently 10 ˜1000, X is an alkyl group and Y is a reactive functional group.

・PTFE-b3:
With reference to the description in paragraphs 0018 to 0032 of JP-A-2017-002273, after introducing an aminoethyl group by a thiolene reaction between mercaptoethyldiethylamine and an allyl group, a quaternary ammonium group is formed by a quaternization reaction with ethyl bromide. was introduced into the side chain to obtain a coating resin. Furthermore, a film obtained by forming a coating layer of the above resin on a PTFE porous film with reference to the description in paragraphs 0070 to 0071 of JP-A-2017-002273.

PTFE-b3 obtained by the above method is a copolymer of formula (I) disposed on a PTFE porous substrate so as to cover the porous substrate, and has a thioether group as an adsorptive group. and a coating layer with a copolymer containing groups containing quaternary ammonium groups.

・PTFE-b4:
With reference to paragraphs 0018 to 0032 of JP-A-2017-002273, a coating resin in which thioether groups were introduced was obtained by a thiolene reaction between 2-ethylhexylthiopropylmercaptan and allyl groups. A membrane obtained by forming a coating layer of the above resin on a PTFE porous membrane with reference to paragraphs 0070 to 0071 of JP-A-2017-002273.

PTFE-b4 obtained by the above method is a copolymer of formula (I) disposed on a PTFE porous substrate so as to cover the porous substrate, and has a thioether group as an adsorptive group. It contained a coating layer with a copolymer containing groups containing

・PTFE-b5:
With reference to paragraphs 0018 to 0032 of JP-A-2017-002273, a coating resin in which a phosphoricoxy group was introduced was obtained by a thiolene reaction between tripropyloxyphosphoricoxypropylmercaptan and an allyl group. A membrane obtained by forming a coating layer of the above resin on a PTFE porous membrane with reference to paragraphs 0070 to 0071 of JP-A-2017-002273.

PTFE-b5 obtained by the above method is a copolymer of formula (I) disposed on a PTFE porous substrate so as to cover the porous substrate, and has a thioether group as an adsorptive group. , and a coating layer with a copolymer containing groups containing phosphate groups.

・PTFE-b6:
A porous PTFE membrane coated with PFDT-PG-AGE, to which perfluorodecanethiol is bound, with reference to the description in paragraphs 0068 to 0082 of JP-A-2016-29146.

PTFE-b6 obtained by the above method is a fluorinated polymer containing a structure of "PFDT-PG-AGE" arranged on a PTFE porous substrate so as to cover the porous substrate. and contained a coating layer of a copolymer containing groups containing thioether groups as adsorptive groups.

・PTFE-b7:
A PTFE porous membrane coated with poly(SZNB-b-NPF6)-2, referring to paragraphs 0085 to 0088 of JP-A-2016-194040.
The PTFE-7 obtained by the above method has a structure of "poly (SZNB-b-NPF6)-2" arranged on a PTFE porous substrate so as to cover the porous substrate. and a coating layer of a copolymer containing sulfonic acid groups as adsorptive groups and groups containing quaternary ammonium groups.

・PTFE-b8
Synthesize poly(C2 diacid-r-NPF6) with reference to paragraphs 0110 to 0112 of JP-A-2016-196625, and coat it on a PTFE porous membrane with reference to paragraph 0109 of the same. Layered and obtained membrane.

The PTFE-b8 obtained by the above method has a structure of "poly(C2 diacid-r-NPF6)" arranged on a PTFE porous substrate so as to cover the porous substrate. and a coating layer of a copolymer containing a carboxylic acid group and an oxyalkylene group as adsorptive groups.

・PTFE-b9:
Synthesize poly(C4-r-NPF6-r-NHS) with reference to the description in paragraphs 0120 to 0124 of JP-A-2016-196625, and on the PTFE porous membrane with reference to the description in paragraph 0109 of the same. A film obtained by forming a coating layer on the
¹ H-NMR (300 MHz, CDCl3): δ (ppm) 6 (s wide), 5.9-5.0 (m wide), 5.1-4.6 (m wide), 4.6-4. 1 (m wide), 4.0-3.0 (m wide), 3.0-2.4 (m wide), 2.3-1.4 (m wide), 1.25 (s wide).

The PTFE-9 obtained by the above method is arranged on a PTFE porous substrate so as to cover the porous substrate, "poly (C4-r-NPF6-r-NHS)". and contained a thioether group as an adsorptive group and a coating layer with a copolymer containing groups containing diester groups.

- Filter Y1:
A porous film containing a polyimide resin produced with reference to paragraphs 0223, 0234 to 0239 of JP-A-2017-68262.
The pore size was controlled by adjusting the particle size of the fine particles used, and the imidization rate was controlled by adjusting the firing temperature and/or the re-baking temperature. The imidization rate was 1.85. Pore diameters are shown in the table below.

・Filters Y2 to Y6:
A film produced in the same manner as filter Y1, except that the particle size of the fine particles used, the firing temperature and/or the re-baking temperature, etc. were adjusted so that the pore size and imidization ratio were the desired values. .
The imidization rates are 1.82, 1.60, 1.93, 1.68 and 0.88 in order from filter Y2. Pore diameters are shown in the table below.

・R:
A porous film containing a polyimide-based resin, produced with reference to paragraphs 0019 to 0027 of JP-T-2016-538122.
The imidization rate was 1.45. Although the porous membrane contained a structure in which the imidization rate varied in the film thickness direction, the imidization rate was determined as an average value for the entire porous membrane.

・S:
A porous membrane containing a polyimide-based resin produced with reference to the description in paragraphs 202 to 203 of JP-A-2018-20301.
The produced porous membrane is the membrane described as Example 1 of JP-A-2018-20301. The B value and imidization rate were 8 nm and 1.43, respectively.

・T:
A porous membrane containing a polyimide-based resin produced with reference to the description in paragraphs 202 to 203 of JP-A-2018-20301.
The produced porous membrane is the membrane described as Example 2 of JP-A-2018-20301. The B value and imidization rate were 10 nm and 1.54, respectively.

[Organic cleaning solution]
The organic washing liquid used for the pretreatment is shown below. All organic washings were of high purity grade.
・PGMEA: propylene glycol monomethyl ether acetate ・IPA: isopropanol ・CyHe: cyclohexane ・nBA: butyl acetate

〔Preprocessing〕
The filter to be treated was pretreated by the cleaning method shown below.
The filter to be treated was subjected to pretreatment while contained in a cartridge with a filter having a filter cylinder length of 1 inch, and then subjected to the test described later.

<Immersion treatment>
The treated filter was immersed in 20 liters of organic cleaning solution. The type of organic cleaning liquid, liquid temperature, and immersion period are shown in the table below.

<Ultrasonic treatment>
Ultrasonic treatment was performed while the filter to be treated was immersed in 20 liters of an organic cleaning solution (PGMEA). Sonication was continued for 1 hour. Ultrasonic power is shown in the table below.

<Liquid passing treatment>
An organic cleaning liquid was passed through a filter unit in which a filter-equipped cartridge containing a filter to be treated was housed and installed. The types and amounts of the organic washing liquids are shown in the table below.

When the pretreatment included two or more treatments, the following treatment was performed immediately after one treatment was completed in the order of immersion treatment, ultrasonic treatment, and liquid treatment.
After the pretreatment, the filter (filter-equipped cartridge) was housed in a housing to be used in the test of [manufacture of chemical solution] described later.
When the last organic washing liquid and the liquid to be purified used in [manufacture of chemical solution] were different, 400 kg of the liquid to be purified was passed through and then subjected to the test of [manufacture of chemical solution].

〔analysis〕
Analysis of the pretreated filters was performed.
In addition, in the analysis, in order to avoid that the content of the specific organic compound in the filter is affected by the treatment for analysis (elution treatment, etc.), each filter is used for the manufacture of the chemical solution described later. In addition, two filters were prepared and used for the analysis before pretreatment and the analysis after pretreatment, respectively.
Specifically, when fabricating the filter 1 shown in the table below, it was obtained on the same occasion with the same structure as the filter to be treated, which was pretreated and used for the production test of the chemical solution. Two more filters (filters to be treated) that had been distributed and stored under the conditions were prepared. One of the two filters is analyzed before pretreatment, and the content of the analyzed specific organic compound, etc. It is assumed that it is the content of the compound or the like. In addition, the other one of the two filters is analyzed after being subjected to the same pretreatment as the filter 1, and the content of the analyzed specific organic compound, etc. It is assumed that it is the content of the specific organic compound contained in the obtained filter 1 and the like.

<Specific organic compound>
The specific organic compound content in each filter was measured by the method described above in the specification.
The compounds detected as specific organic compounds are as follows.

- A compound represented by the general formula (I)

- A compound represented by the general formula (II)

- A compound represented by the general formula (III)

- A compound represented by the general formula (IV)

- A compound represented by the general formula (V)

- A compound represented by the general formula (VI)

- A compound represented by the general formula (VII)

- A compound represented by the general formula (VIII)

- Compound Represented by General Formula (X) Compounds having j of 12 to 50 when applied to general formula (X) were detected.

- Compound Represented by General Formula (XI) Compounds with k of 12 to 50 when applied to general formula (XI) were detected.

- The compound squalene represented by general formula (XII) was detected.

<Specific metal component>
The content of specific metal components (specific metal ions and specific metal particles) in various filters was measured using Agilent 8900 by the method described above in the specification.

Table 1 below shows the pretreatment conditions and the contents of specific organic compounds and specific metal components in the filter after treatment.

[Manufacturing of chemicals]
Four preprocessed filters were selected as first to fourth filters. A filtration device was produced in which the first to fourth filters were arranged in series in this order between the inflow part and the outflow part. Each filter contained in a cartridge with a filter was housed in a housing to form a filter unit.
The liquid to be purified was purified using the above filtering device. In addition, the name of the chemical|medical solution called henceforth corresponds with the number of each Example. For example, the chemical solution manufactured and tested in Example A001 described later is referred to as chemical solution A001.

[Liquid to be purified]
The liquids to be purified that were subjected to purification are shown below. All of the liquids to be purified are of high purity grade. The value in parentheses is the distance (MPa ^0.5 ) of the Hansen solubility parameter to eicosene of each liquid to be purified (organic solvent).
・PGMEA: propylene glycol monomethyl ether acetate (9.5)
PGME: propylene glycol monoethyl ether (11.0)
・PGMEA/PGME (v/v=7/3): 7:3 (by volume) mixture of PGMEA and PGME (10.2)
・PGMP: propylene glycol monopropyl ether (10.6)
- MPM: methyl methoxypropionate (8.8)
- CHN: cyclohexanone (5.1)
- nBA: butyl acetate (4.6)
・γBL: γ-butyrolactone (8.5)
- MIBC: 4-methyl-2-pentanol (12.1)
- iAA: isoamyl acetate (6.0)
・Butyl butyrate (4.6)
・Isobutyl isobutyrate (3.6)
- Isoamyl ether (2.1)
・Undecane (1.8)
・Dimethyl malonate/isoamyl ether = 9/1 (9:1 (by mass) mixture of dimethyl malonate and isoamyl ether) (9.4)
・Dimethyl malonate/isoamyl ether = 5/5 (5:5 (by mass) mixture of dimethyl malonate and isoamyl ether) (5.9)
・Dimethyl malonate/isoamyl ether = 1/9 (1:9 (by mass) mixture of dimethyl malonate and isoamyl ether) (2.7)
The distance of the Hansen solubility parameter to eicosene in the case of dimethyl malonate alone is 10.3 MPa ^0.5 .

[test]
[Pre-wet liquid, rinse liquid]
By the method shown below, the defect suppressing properties of the manufactured chemical liquid were evaluated when used as a pre-wet liquid and a rinse liquid.
First, a chemical solution was spin-discharged onto a silicon substrate having a diameter of 300 mm, and 0.5 cc of each chemical solution was discharged onto the surface of the substrate while rotating the substrate. The substrate was then spun dry. Next, the number of defects existing on the substrate after the chemical solution coating was measured using a wafer inspection apparatus "SP-5" manufactured by KLA-Tencor.
Next, using EDAX (energy-dispersive X-ray spectroscopy), among the defects of this wafer, particulate foreign matter is classified into "metal residue defects" mainly composed of metals and "particle defects" mainly composed of organic substances. The defects were classified into "organic residue defects" and measured respectively. Further, non-particulate spot-like defects were counted as "spot-like defects".
In addition, if any evaluation of metal residue defects, particulate organic residue defects, and stain-like residue defects is C or higher, it can be suitably used as a pre-wet liquid and a rinse liquid.

<Metal Residue Defect, Particulate Organic Residue Defect, Stain-like Residue Defect>
A: The number of corresponding defects was 20 or less per wafer.
B: The number of corresponding defects exceeded 20/wafer and was 50/wafer or less.
C: The number of corresponding defects exceeded 50/wafer and was 100/wafer or less.
D: The number of corresponding defects exceeded 100/wafer.

[Pipe cleaning solution]
By the method shown below, the defect performance suppressing property of the manufactured chemical liquid when used as a pipe cleaning liquid was evaluated.
Immediately after purchase, 5000 ml of the chemical solution to be evaluated was passed through the piping (liquid contact part: made of PTFE, φ: 50 mm, length: 5 m) at 500 ml/min to wash the piping.
Next, the same test as the evaluation of the performance as the prewet liquid or the rinse liquid was performed except that the chemical liquid A021 (the chemical liquid obtained by the purification treatment of Example A021) was discharged onto the wafer through this pipe. was performed and evaluated according to the same criteria. If the chemical solution A021 that has passed through the pipes after cleaning can be suitably used as a pre-wet solution or a rinse solution, defects will not occur when such a pipe cleaning solution is applied to the resist process to clean equipment. It can be judged that it can be suppressed.

[Developer/Rinse]
By the method shown below, the defect performance suppressing property was evaluated when the manufactured chemical solution was used as a developer or a rinse solution.

<<Test 1 (ArF exposure)>>
First, a resist pattern was formed by the operation described below.
A silicon substrate having a diameter of 300 mm was coated with an organic antireflection film forming composition ARC29SR (manufactured by Nissan Chemical Industries, Ltd.) and baked at 205° C. for 60 seconds to form an antireflection film having a thickness of 78 nm.
In order to improve coatability, a pre-wet liquid (chemical solution A021 was used) was dripped onto the antireflection film side surface of the silicon wafer on which the antireflection film was formed, and spin coating was performed.
Then, an actinic ray-sensitive or radiation-sensitive resin composition (the following actinic ray- or radiation-sensitive resin composition 1) is applied onto the antireflection film after the prewetting step, and the temperature is maintained at 100°C for 60 seconds. A resist film having a thickness of 150 nm was formed by pre-baking (PB).

(Actinic ray-sensitive or radiation-sensitive resin composition 1)
Acid-decomposable resin (resin represented by the following formula (weight average molecular weight (Mw): 7500): the numerical value described in each repeating unit means mol %): 100 parts by mass

Photoacid generator shown below: 8 parts by mass

Quencher shown below: 5 parts by mass (mass ratio was 0.1:0.3:0.3:0.2 from left to right). Among the quenchers below, the polymer type quencher has a weight average molecular weight (Mw) of 5,000. Moreover, the numerical value described in each repeating unit means a molar ratio.

Hydrophobic resin shown below: 4 parts by mass (mass ratio was 0.5:0.5 in order from the left). (Mw) is 7,000, and the weight average molecular weight (Mw) of the hydrophobic resin on the right is 8,000. In addition, in each hydrophobic resin, the numerical value described in each repeating unit means a molar ratio.

solvent:
PGMEA (propylene glycol monomethyl ether acetate): 3 parts by mass Cyclohexanone: 600 parts by mass γ-BL (γ-butyrolactone): 100 parts by mass

The wafer on which the resist film was formed was subjected to pattern exposure at 25 mJ/cm ² using an ArF excimer laser scanner (Numerical Aperture: 0.75). After that, it was heated at 120° C. for 60 seconds. Then, it was developed by puddling with developer for 30 seconds, and then developed by puddling with rinse for 30 seconds. Then, the wafer was rotated at 4000 rpm for 30 seconds to form a negative resist pattern. After that, the obtained negative pattern was heated at 200° C. for 300 seconds. Through the above steps, an L/S pattern (average pattern width: 45 nm) with a line/space ratio of 1:1 was obtained. Each pattern was evaluated for developability and defect suppression.
Here, when the developer was evaluated, the developer to be evaluated was used as the developer, and the chemical solution B049 (chemical solution obtained by the purification treatment of Example B049) was used as the rinse solution.
When the rinsing solution was evaluated, the chemical solution B018 was used as the developing solution, and the rinsing solution to be evaluated was used as the rinsing solution.

<Defect Suppression>
Using a pattern defect device (Multi-purpose SEM (Scanning Electron Microscope) "Inspago" RS6000 series manufactured by Hitachi High-Technology Co., Ltd.), the pattern of the formed wafer was observed to measure the number of the following defects.
・Development failure defect: A defect in which a space is not formed to the bottom of the pattern ・Residue defect: A defect in which foreign matter exists on the pattern ・Uniformity defect: A defect in which the pattern width is larger than the target (45 nm) by 3 nm or more , poor development defect, residue defect, and uniformity defect, it can be suitably used as a pre-wet liquid and a rinse liquid if it is evaluated as C or higher.

<Development failure defect, residue defect, uniformity defect>
A: The number of corresponding defects was 5 or less per wafer.
B: The number of corresponding defects exceeded 5/wafer and was 10/wafer or less.
C: The number of corresponding defects exceeded 10/wafer and was 30/wafer or less.
D: The number of corresponding defects exceeded 30/wafer.

<<Test 2 (EUV exposure)>>
(Actinic ray-sensitive or radiation-sensitive resin composition (resist composition 1))
First, a resist composition 1 was obtained by mixing each component with the following composition.
・Resin (A-1): 0.77 g
- Photoacid generator (B-1): 0.03 g
- Basic compound (E-3): 0.03 g
・ PGMEA (commercial product, high purity grade): 67.5 g
・ Ethyl lactate (commercially available, high purity grade): 75 g

- Resin As resin, the following resins were used.

- Photo-acid generator As a photo-acid generator, the following compounds were used.

- Basic compound As a basic compound, the following compounds were used.

(Pattern formation and evaluation)
Residual defect suppression performance, bridge defect suppression performance, and spot-like defect suppression performance of the chemical solution were evaluated by the following methods. For the test, a SOKUDO coater developer " ^RF3S " was used.
First, AL412 (manufactured by Brewer Science) was coated on a silicon wafer with a diameter of 300 mm and baked at 200° C. for 60 seconds to form a resist underlayer film with a thickness of 20 nm. A pre-wet solution (chemical solution A021) was applied thereon, and a resist composition was applied thereon, followed by baking (PB: Prebake) at 100° C. for 60 seconds to form a resist film having a thickness of 30 nm.

This resist film was exposed through a reflective mask using an EUV exposure machine (manufactured by ASML; NXE3350, NA 0.33, Dipole 90°, outer sigma 0.87, inner sigma 0.35). Then, it was heated at 85° C. for 60 seconds (PEB: Post Exposure Bake). Next, a developing solution was sprayed for 30 seconds by a spray method for development, and a rinse solution was discharged onto the silicon wafer for 20 seconds by a spin coating method for rinsing. Subsequently, the silicon wafer was rotated at a rotational speed of 2000 rpm for 40 seconds to form a line-and-space pattern with a space width of 20 nm and a pattern line width of 15 nm.
Here, when the developer was evaluated, the developer to be evaluated was used as the developer, and the chemical solution B049 (chemical solution obtained by the purification treatment of Example B049) was used as the rinse solution.
When the rinsing solution was evaluated, the chemical solution B018 was used as the developing solution, and the rinsing solution to be evaluated was used as the rinsing solution.

Observe the above pattern with a pattern defect device (multipurpose SEM (Scanning Electron Microscope) “Inspago” RS6000 series manufactured by Hitachi High-Technology Co., Ltd.) to detect “PLOT defects”, which are protruding defects, and bridging-like defects between patterns. and the number of "GEL defects", which are film-like residue defects, were counted and evaluated according to the following criteria.

(Evaluation criteria for PLOT defects)
A: The number of defects was 20 or less per wafer.
B: The number of defects was 21 or more/wafer and 50 or less/wafer.
C: The number of defects was 51/wafer or more and 100/wafer or less.
D: The number of defects was 101/wafer or more.

(Evaluation criteria for BRIDGE defects)
A: The number of defects was 20 or less per wafer.
B: The number of defects was 21 or more/wafer and 50 or less/wafer.
C: The number of defects was 51/wafer or more and 100/wafer or less.
D: The number of defects was 101/wafer or more.

(Evaluation criteria for GEL defects)
A: The number of defects was 20 or less per wafer.
B: The number of defects was 21 or more/wafer and 50 or less/wafer.
C: The number of defects was 51/wafer or more and 100/wafer or less.
D: The number of defects was 101/wafer or more

[result]
Tables 2 and 3 below show the types of liquids to be purified and filters used in the purification process, and the results of evaluation of the obtained chemical solutions.
In Table 2, "P/R" described in the application column is an evaluation of defect inhibition when the chemical solution is used as a pre-wet liquid and a rinse liquid by the method shown in the item [pre-wet liquid, rinse liquid]. indicates that the "Pipe" indicates that evaluation of the defect suppression property when used as a pipe cleaning liquid was performed by the method shown in the item [Piping cleaning liquid].
Table 3 shows the results of evaluation of the defect inhibition properties when the chemicals were used as developers or rinses according to the method shown in the item [Developer/Rinse]. Tables 3a1 and 3a2 respectively show the treatment conditions of the liquid to be purified (the liquid to be purified and the filter used) and the test results using the manufactured chemical solution in the same example. The same applies to the relationship between Table 3a2 and Table 3a2.

From the results shown in the table, it was confirmed that the use of the filter of the present invention enables production of a chemical liquid with excellent defect suppressing properties.

Furthermore, it was confirmed that when the pore size of the filter was 10 nm or less, the chemical solution produced tended to have more excellent defect suppression properties (comparison of Examples A003 and A019, etc.).

Filters containing less than 5.0 ppt by mass of the first organic compound tended to adsorb the second organic compound during cleaning and in the environment. Therefore, the chemical liquid manufactured using the filter having the first organic compound content of 5.0 mass ppt or more has a stain-like defect suppressing property when the chemical liquid is used as a pre-wet liquid or a rinse liquid, and the chemical liquid as a developer, it was confirmed that the uniformity defect suppression property tended to be more excellent (comparison between Example A013 and Examples A003, A012, and A018; Example B008, and Examples B001, B007, and B013 comparison, etc.).

The total content of the first organic compound is 5.0 mass ppt or more with respect to the mass of the filter, and the compound represented by general formulas (I) to (VIII), represented by general formula (X) Using a filter in which the total content of compounds selected from the group consisting of alkanes and alkenes represented by general formulas (XI) and (XII) is 6500 mass ppt or less with respect to the mass of the filter It was confirmed that the produced chemical solution tends to be more excellent in suppressing stain defects when the chemical solution is used as a pre-wet liquid or a rinse solution, and in suppressing uniformity defects when the chemical solution is used as a developer (implementation Comparison between Example A013 and Examples A003, A012 and A018, comparison between Examples A014, A015 and A017 and Examples A012 and A018, comparison between Example B008 and Examples B001, B007 and B013, and the like. Examples B009, B010, B012 and Examples B007, B013, etc.).

The total content of the compounds selected from Group A is 0.10 to 3200 ppt by mass with respect to the mass of the filter, and the chemical liquid is manufactured using the chemical liquid as a pre-wet liquid or a rinse liquid. It was confirmed that the suppression of stain-like defects in the case and the suppression of uniformity defects in the case of using a chemical solution as a developer tend to be more excellent (comparison between Example A013 and Examples A003, A012, and A018. Comparison between Examples A014, A015 and A017 and Examples A012 and A018 Comparison between Example B008 and Examples B001, B007 and B013, etc. Comparison between Examples B009, B010 and B012 and Examples B007 and B013 comparison, etc.).

The total content of the compounds selected from Group B is 1.0 to 1200 ppt by mass with respect to the mass of the filter, and the chemical solution is manufactured using the chemical solution as a pre-wet liquid or a rinse liquid. It was confirmed that the suppression of stain-like defects in the case and the suppression of uniformity defects in the case of using a chemical solution as a developer tend to be more excellent (comparison between Example A013 and Examples A003, A012, and A018. Comparison between Examples A014, A015 and A017 and Examples A012 and A018 Comparison between Example B008 and Examples B001, B007 and B013, etc. Comparison between Examples B009, B010 and B012 and Examples B007 and B013 comparison, etc.).

It was confirmed that the chemical solution produced using a filter containing 0.10 to 5000 ppt by mass of the specific metal component with respect to the mass of the filter tends to be more excellent in defect suppression (results of Example A016, etc.). .

It was confirmed that when the filter body contained ion-exchange groups, the produced chemical liquid tended to exhibit more excellent defect-suppressing properties (comparison with Examples A023 to A027, etc.).

It was confirmed that when the filter main body was made of a material other than a fluorine-based material, the produced chemical solution tended to have more excellent defect suppression properties (results of Examples B018 and B019, etc.).

When the chemical solution to be manufactured is an organic solvent, and the distance of the Hansen solubility parameter to eicosene is an organic solvent having a distance of 3 to 20 MPa ^0.5 , the effect of the present invention (especially, the pattern is formed by EUV exposure and the chemical solution is rinsed It was confirmed that the defect suppressing property when used as a (comparison of Examples B048, B051, B054, B057, etc.).

In addition, when the chemical solution to be manufactured contains an organic solvent whose distance of the Hansen solubility parameter to eicosene is 3 to 20 MPa ^0.5 and an organic solvent whose distance of the Hansen solubility parameter to eicosene is not 3 to 20 MPa ^0.5 , the mixing ratio If the (mass ratio) is 20/80 to 80/20, the effect of the present invention (in particular, defect suppression when a pattern is formed by EUV exposure and a chemical solution is used as a rinse solution) is confirmed to be more excellent. (results of Examples B060, B063, B066, etc.).

Furthermore, in the filters to be treated used for manufacturing "filter 79, filter 80, filter 81, filter 82", the same filters to be treated were prepared, except that the packing material was a fluororesin. 79, filter 80, filter 81, filter 82", respectively, to obtain "filter 79b, filter 80b, filter 81b, filter 82b".
The analysis results of the content of the specific organic compound and the specific metal compound in "filter 79b, filter 80b, filter 81b, filter 82b" were equivalent to those in "filter 79, filter 80, filter 81, filter 82".
Using the obtained "filter 79b, filter 80b, filter 81b, filter 82b", the same test as the test using "filter 79, filter 80, filter 81, filter 82" was performed. The same result as the test using "Filter 79, Filter 80, Filter 81, Filter 82" was obtained.
By comparing these results with the results of Examples B045 and B046, etc., pretreatment was carried out on the filter to be treated, which was packed in a packing material in which the part in contact with the filter to be treated was made of fluororesin or stainless steel. It was confirmed that the effect of the present invention is more excellent when the filter of the present invention is obtained by

100 filter device 101 inflow part 102 outflow part 103, 104 filter 105 pipe

Claims (29)

A filter for filtration,
a filter body;
selected from the group consisting of compounds represented by general formulas (I) to (V), alkanes represented by general formula (X), and alkenes represented by general formulas (XI) and (XII) containing one or more first organic compounds,
A filter, wherein the total content of the first organic compound is 0.10 to 10000 ppt by mass relative to the mass of the filter.

In general formula (I), R ^1a and R ^1c each independently represent an optionally substituted alkyl group.
R ^1b represents an optionally substituted alkylene group.

In general formula (II), X is a benzene ring group optionally containing a substituent, a cyclohexene ring group optionally containing a substituent, or a cycloalkyloxy group as a substituent represents a cyclohexane ring group. The cyclohexane ring group may further contain another substituent.

In general formula (III), R ^3a to R ^3h each independently represent an optionally substituted alkyl group.
R ^3b and R ^3e may combine with each other to form a ring.
The group formed by combining R ^3b and R ^3e together is —O—(—Si(R ³ⁱ ) ₂ —O—) _a —.
a represents an integer of 1 or more.
R ³ⁱ represents an optionally substituted alkyl group.
Multiple R ³ⁱ may be the same or different.

In general formula (IV), R ^4a represents -N(R ^4c )R ^4d or -SR ^4e .
R ^4c , R ^4d and R ^4e each independently represent a hydrogen atom or a substituent.
R ^4b represents -NH- or -S-.

In general formula (V), Y represents a benzene ring group optionally substituted with an alkyl group, or a group represented by formula (A).

When Y represents a benzene ring group, s represents 1, L represents a single bond, and ^R5a represents an optionally substituted alkyl group. In addition, the said alkyl group may contain a hetero atom. When the benzene ring group is substituted with an alkyl group, the alkyl group and R ^5a may combine with each other to form a ring. Moreover, when the benzene ring group is substituted with a plurality of alkyl groups, the alkyl groups may be bonded to each other to form a ring.
When Y represents a group represented by formula (A), s represents 3, L represents a methylene group, and each R ^5a independently represents an alkyl group.

In general formula (X), j represents an integer of 12-50. two j have the same value

In general formula (XI), k represents an integer of 12-50. Two k are the same value.

n represents an integer of 30-50.
m represents an integer of 20 to 90 and 2n-2 or less. 2. The filter according to claim 1, wherein said filter further contains one or more second organic compounds selected from the group consisting of compounds represented by general formulas (VI) to (VIII).

^R6a represents an optionally substituted alkyl group or hydrogen atom.
R ^6b and R ^6c each independently represent a hydrogen atom, -AL-OR ^6d , -CO-R ^6e or -C(OH)-R ^6f .
AL represents an optionally substituted alkylene group.
R ^6d , R ^6e or R ^6f each independently represents a substituent.
When there are multiple R ^6d 's, the multiple R ^6d 's may be the same or different. When multiple R ^6e are present, the multiple R ^6e may be the same or different. When there are multiple R ^6f 's, the multiple R ^6f 's may be the same or different.
a combination of two selected from the group consisting of substituents that the alkyl group represented by R ^6a may contain, R ^6d , R ^6e and R ^6f , two R ^6d together, and two R ^6e together , or two R ^6f may be joined together to form a ring.
At least one of R ^6a , R ^6b and R ^6c is other than a hydrogen atom.

In general formula (VII), ^R7a and ^R7b each independently represent an optionally substituted alkyl group.

In general formula (VIII), R ^8a to R ^8c each independently represent a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted benzene ring group. The total content of the first organic compound is 5.0 mass ppt or more with respect to the mass of the filter, and
Compounds selected from the group consisting of compounds represented by general formulas (I) to (VIII), alkanes represented by general formula (X), and alkenes represented by general formulas (XI) and (XII) is less than or equal to 6500 ppt by mass based on the mass of the filter. the filter is
one or more compounds selected from Group A consisting of compounds represented by general formulas (I) to (VIII);
and one or more compounds selected from Group B consisting of alkanes represented by general formula (X) and alkenes represented by general formulas (XI) and (XII). 3. The filter according to 3. 5. The filter according to claim 4, wherein the total content of compounds selected from group A is 0.10-3200 ppt by weight relative to the weight of the filter. A filter according to claim 4 or 5, wherein the total content of compounds selected from group B is 1.0 to 1200 ppt by weight relative to the weight of the filter. Furthermore, a metal component containing a metal element selected from the group consisting of Al, Ca, Cr, Cu, Fe, K, Mg, Na, Ni, Zn, and Pb is added to the mass of the filter at 0 A filter according to any one of the preceding claims, containing from .10 to 5000 ppt by weight. The filter body contains nylon,
The filter according to any one of claims 4 to 7, comprising one or more compounds selected from said group A and two or more compounds selected from said group B. containing an alkane represented by the general formula (X) and an alkene represented by the general formula (XI),
The alkane content A represented by the general formula (X), the alkene content B represented by the general formula (XI), and the alkene content C represented by the general formula (XII) are based on mass. 9. The filter of claim 8, wherein , C<A, and C<B. The filter body contains polyethylene or polytetrafluoroethylene,
The filter according to any one of claims 4 to 7, comprising at least one compound selected from Group A and an alkane represented by general formula (X). The filter according to any one of claims 1 to 10, wherein the filter has a pore size of 10 nm or less. The filter according to any one of claims 1 to 11, wherein the filter body contains ion exchange groups. A filter according to any one of the preceding claims, wherein the filter body contains two or more layers of different materials. A filter according to any preceding claim, wherein the filter body contains an asymmetric porous membrane. 15. The filter according to any one of claims 1 to 14, wherein said filter body is made of a material other than a fluorine-based material. A method for manufacturing a filter according to any one of claims 1 to 15,
1 selected from the group consisting of compounds represented by general formulas (I) to (VIII), alkanes represented by general formula (X), and alkenes represented by general formulas (XI) and (XII) A method of manufacturing a filter comprising the step of pretreating an untreated filter containing seeds or more with an organic cleaning solution.

In general formula (I), R ^1a and R ^1c each independently represent an optionally substituted alkyl group.
R ^1b represents an optionally substituted alkylene group.

In general formula (II), X is a benzene ring group optionally containing a substituent, a cyclohexene ring group optionally containing a substituent, or a cycloalkyloxy group as a substituent represents a cyclohexane ring group. The cyclohexane ring group may further contain another substituent.

In general formula (III), R ^3a to R ^3h each independently represent an optionally substituted alkyl group.
R ^3b and R ^3e may combine with each other to form a ring.
The group formed by combining R ^3b and R ^3e together is —O—(—Si(R ³ⁱ ) ₂ —O—) _a —.
a represents an integer of 1 or more.
R ³ⁱ represents an optionally substituted alkyl group.
Multiple R ³ⁱ may be the same or different.

In general formula (IV), R ^4a represents -N(R ^4c )R ^4d or -SR ^4e .
R ^4c , R ^4d and R ^4e each independently represent a hydrogen atom or a substituent.
R ^4b represents -NH- or -S-.

In general formula (V), Y represents a benzene ring group optionally substituted with an alkyl group, or a group represented by formula (A).

When Y represents a benzene ring group, s represents 1, L represents a single bond, and ^R5a represents an optionally substituted alkyl group. In addition, the said alkyl group may contain a hetero atom. When the benzene ring group is substituted with an alkyl group, the alkyl group and R ^5a may combine with each other to form a ring. Moreover, when the benzene ring group is substituted with a plurality of alkyl groups, the alkyl groups may be bonded to each other to form a ring.
When Y represents a group represented by formula (A), s represents 3, L represents a methylene group, and each R ^5a independently represents an alkyl group.

In general formula (X), j represents an integer of 12-50. two j have the same value

In general formula (XI), k represents an integer of 12-50. Two k are the same value.

n represents an integer of 30-50.
m represents an integer of 20 to 90 and 2n-2 or less.

^R6a represents an optionally substituted alkyl group or hydrogen atom.
R ^6b and R ^6c each independently represent a hydrogen atom, -AL-OR ^6d , -CO-R ^6e or -C(OH)-R ^6f .
AL represents an optionally substituted alkylene group.
R ^6d , R ^6e or R ^6f each independently represents a substituent.
When there are multiple R ^6d 's, the multiple R ^6d 's may be the same or different. When multiple R ^6e are present, the multiple R ^6e may be the same or different. When there are multiple R ^6f 's, the multiple R ^6f 's may be the same or different.
a combination of two selected from the group consisting of substituents that the alkyl group represented by R ^6a may contain, R ^6d , R ^6e and R ^6f , two R ^6d together, and two R ^6e together , or two R ^6f may be joined together to form a ring.
At least one of R ^6a , R ^6b and R ^6c is other than a hydrogen atom.

In general formula (VII), ^R7a and ^R7b each independently represent an optionally substituted alkyl group.

In general formula (VIII), R ^8a to R ^8c each independently represent a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted benzene ring group. The organic cleaning solution is propylene glycol monomethyl ether acetate, isopropanol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, ethyl lactate, methyl methoxypropionate, cyclopentanone, cyclohexanone, γ-butyrolactone, diisoamyl. ether, butyl acetate, isoamyl acetate, 4-methyl-2-pentanol, dimethylsulfoxide, N-methylpyrrolidone, diethylene glycol, ethylene glycol, dipropylene glycol, propylene glycol, ethylene carbonate, propylene carbonate, sulfolane, cycloheptanone, 2 -heptanone, butyl butyrate, isobutyl isobutyrate, undecane, pentyl propionate, isopentyl propionate, ethylcyclohexane, mesitylene, decane, 3,7-dimethyl-3-octanol, 2-ethyl-1-hexanol, 1-octanol, 2 17. The method for producing a filter according to claim 16, containing one or more selected from the group consisting of - octanol, ethyl acetoacetate, dimethyl malonate, methyl pyruvate, and dimethyl oxalate. 18. The method for manufacturing a filter according to claim 16 or 17, wherein said pretreatment includes a step of immersing said untreated filter in said organic cleaning liquid for 3 days or longer. The method for manufacturing a filter according to any one of claims 16 to 18, comprising a step of subjecting the untreated filter immersed in the organic cleaning liquid to ultrasonic treatment to perform the pretreatment. The pretreatment includes passing the organic cleaning liquid through the untreated filter having a hollow cylindrical shape,
The method for manufacturing a filter according to any one of claims 16 to 19, wherein the organic cleaning liquid to be passed is 10 kg or more per 1 inch cylinder length of the untreated filter. Compounds represented by general formulas (I) to (VIII), alkanes represented by general formula (X), and alkenes represented by general formulas (XI) and (XII) in the untreated filter For the total content of compounds selected from the group consisting of
Compounds represented by general formulas (I) to (VIII), alkanes represented by general formula (X), and general formulas (XI) and (XII) in the filter after the pretreatment The method for producing a filter according to any one of claims 16 to 20, wherein the mass ratio of the total content of compounds selected from the group consisting of alkenes is 0.5000 or less. Claims 16 to 21, wherein said untreated filter before being subjected to said pretreatment is packed with a packing material in which at least a part of the contact portion with respect to said untreated filter is made of fluororesin or stainless steel. A method for manufacturing a filter according to any one of Claims 1 to 3. an inflow section, an outflow section, and
2 or more filters according to any one of claims 1 to 15,
two or more of said filters are arranged in series between said inlet and said outlet;
A filtration device for purifying a liquid to be purified to obtain a chemical solution, comprising a flow path from the inflow part to the outflow part. Filtration according to claim 23, wherein among the two or more filters, the filter with the largest pore size has a pore size of 10 to 200 nm, and the filter with the smallest pore size has a pore size of 1 to 10 nm. Device. 25. A filtering device according to claim 23 or 24, comprising a filter according to claim 12. 26. A filtration device according to any one of claims 23-25, comprising a filter according to claim 9. A filtering device according to any one of claims 23 to 26, comprising a filter according to claim 10. A chemical liquid production method for obtaining a chemical liquid by purifying a liquid to be purified,
A method for producing a chemical liquid, comprising a step of obtaining a chemical liquid by filtering a liquid to be purified using the filter according to any one of claims 1 to 15. The liquid to be purified is propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monopropyl ether, cyclohexanone, methyl methoxypropionate, butyl acetate, γ-butyrolactone, 4-methyl-2-pentanol, propylene glycol monoethyl. ether, ethyl lactate, cyclopentanone, diisoamyl ether, isoamyl acetate, isopropanol, dimethylsulfoxide, N-methylpyrrolidone, diethylene glycol, ethylene glycol, dipropylene glycol, propylene glycol, ethylene carbonate, propylene carbonate, sulfolane, cycloheptanone, 2-heptanone, butyl butyrate, isobutyl isobutyrate, undecane, pentyl propionate, isopentyl propionate, ethylcyclohexane, mesitylene, decane, 3,7-dimethyl-3-octanol, 2-ethyl-1-hexanol, 1-octanol, 29. The method for producing a chemical solution according to claim 28, containing one or more selected from the group consisting of 2-octanol, ethyl acetoacetate, dimethyl malonate, methyl pyruvate, and dimethyl oxalate.

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