JP2022106151A - Photodetection device - Google Patents

Photodetection device Download PDF

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JP2022106151A
JP2022106151A JP2021000943A JP2021000943A JP2022106151A JP 2022106151 A JP2022106151 A JP 2022106151A JP 2021000943 A JP2021000943 A JP 2021000943A JP 2021000943 A JP2021000943 A JP 2021000943A JP 2022106151 A JP2022106151 A JP 2022106151A
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light
shielding film
view
plan
element separation
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和広 井谷
Kazuhiro Itani
賢司 小林
Kenji Kobayashi
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Sony Semiconductor Solutions Corp
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Sony Semiconductor Solutions Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith

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  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

To provide a photo detection device advantageous in reducing unintended influence and scattering of light on an element isolation part.SOLUTION: A photodetection device comprises: a plurality of photoelectric conversion elements which are two-dimensionally arranged to form a photoreception area; element isolation parts which are provided between the adjacent photoelectric conversion elements; and an inter-pixel light shielding film which defines a plurality of light transmission parts corresponding to the respective photoelectric conversion elements. A deviation amount and a deviation direction of the center location of each of the light transmission parts from the center location of the corresponding photoelectric conversion element are defined according to a distance and a direction of each of the light transmission parts from the center location of the photoreception area, a least some of shapes and sizes in plane view of the plurality of light transmission parts are different from those of the corresponding photoelectric conversion elements in plane view, and the inter-pixel light shielding film is provided so as to overlap with a plurality of crossing portions of the element isolation part in plan view.SELECTED DRAWING: Figure 4C

Description

本開示は、光検出装置に関する。 The present disclosure relates to a photodetector.

固体撮像装置においてフォトダイオードとオンチップレンズとの間の相対位置を像高に応じて最適化する瞳補正を行うことで、画角中心部と画角周辺部との間の入射光量差を低減し、シェーディング特性を改善することができる(特許文献1参照)。 By performing pupil correction that optimizes the relative position between the photodiode and the on-chip lens according to the image height in the solid-state image sensor, the difference in the amount of incident light between the center of the angle of view and the periphery of the angle of view is reduced. However, the shading characteristics can be improved (see Patent Document 1).

特開2017-59739号公報Japanese Unexamined Patent Publication No. 2017-59739

オンチップレンズとフォトダイオードとの間に画素間遮光膜が設けられる場合、瞳補正の補正量に応じて、画素間遮光膜とフォトダイオードとの間の相対位置も調整される。 When an interpixel light-shielding film is provided between the on-chip lens and the photodiode, the relative position between the pixel-to-pixel light-shielding film and the photodiode is also adjusted according to the correction amount of pupil correction.

特に、画角中央部から離れるに従って、フォトダイオードに対する画素間遮光膜のずらし量は大きくなる。そのため、フォトダイオード間に素子分離部が設けられる場合、画角周辺部では素子分離部の一部又は全部が画素間遮光膜により覆われることなく露出する。 In particular, the amount of displacement of the interpixel light-shielding film with respect to the photodiode increases as the distance from the center of the angle of view increases. Therefore, when the element separation portion is provided between the photodiodes, a part or all of the element separation portion is exposed in the peripheral portion of the angle of view without being covered by the interpixel light-shielding film.

素子分離部の露出面に入射した撮影光は、当該露出面で意図せずに反射及び散乱してしまい、混色をもたらす。特に像高が大きくなるにつれて、瞳補正による画素間遮光膜のずらし量及び素子分離部の露出面積は大きくなり、素子分離部の露出面での意図しない光の反射及び散乱の程度も増大する傾向がある。 The photographing light incident on the exposed surface of the element separation portion is unintentionally reflected and scattered on the exposed surface, resulting in color mixing. In particular, as the image height increases, the amount of shift of the interpixel light-shielding film due to pupil correction and the exposed area of the element separation portion increase, and the degree of unintended light reflection and scattering on the exposed surface of the element separation portion also tends to increase. There is.

本開示は、素子分離部での意図しない光の反射及び散乱を低減するのに有利な技術を提供する。 The present disclosure provides techniques advantageous for reducing unintended reflection and scattering of light at device separators.

本開示の一態様は、二次元配置されて受光領域を形成する複数の光電変換素子と、隣り合う光電変換素子の間に設けられる素子分離部と、複数の光電変換素子のそれぞれに対応する複数の光透過部を区画する画素間遮光膜と、を備え、各光透過部の中心位置の、対応の光電変換素子の中心位置からのずれ量及びずれ方向は、受光領域の中心からの各光透過部の距離及び方向に応じて定まっており、複数の光透過部のうちの少なくとも一部の平面視における形状及びサイズは、対応の光電変換素子の平面視における形状及びサイズとは異なっており、画素間遮光膜は、平面視において、素子分離部の複数の交差部と重なるように設けられている光検出装置に関する。 One aspect of the present disclosure is a plurality of photoelectric conversion elements arranged two-dimensionally to form a light receiving region, an element separation unit provided between adjacent photoelectric conversion elements, and a plurality of corresponding to each of the plurality of photoelectric conversion elements. A light-shielding film between pixels that partitions the light transmitting portion of the light transmitting portion is provided, and the deviation amount and deviation direction of the center position of each light transmission portion from the center position of the corresponding photoelectric conversion element can be determined by each light from the center of the light receiving region. It is determined according to the distance and direction of the transmitting portion, and the shape and size of at least a part of the plurality of light transmitting portions in the plan view are different from the shape and size in the plan view of the corresponding photoelectric conversion element. The interpixel light-shielding film relates to an optical detection device provided so as to overlap a plurality of intersections of element separation portions in a plan view.

画素間遮光膜は、平面視において、素子分離部の複数の交差部の全体と重なるように設けられていてもよい。 The inter-pixel light-shielding film may be provided so as to overlap the entire plurality of intersections of the element separation portions in a plan view.

各光透過部の平面視面積は、受光領域の中心からの各光透過部の距離が増大するに従って減少してもよい。 The planar viewing area of each light transmitting portion may decrease as the distance of each light transmitting portion from the center of the light receiving region increases.

画素間遮光膜は、格子状部と、格子状部と一体化し、平面視において素子分離部の複数の交差部と重なる複数の拡張部と、を有してもよい。 The inter-pixel light-shielding film may have a grid-like portion and a plurality of expansion portions that are integrated with the grid-like portion and overlap with a plurality of intersections of the element separation portions in a plan view.

複数の拡張部の各々は、三角形の平面視形状を有してもよい。 Each of the plurality of extensions may have a triangular plan-view shape.

複数の拡張部の各々は、四角形の平面視形状を有してもよい。 Each of the plurality of extensions may have a quadrangular plan view shape.

複数の拡張部の各々は、円形又は楕円形の平面視形状を有してもよい。 Each of the plurality of extensions may have a circular or elliptical plan view shape.

画素間遮光膜は、平面視において格子形状を有してもよい。 The interpixel light-shielding film may have a grid shape in a plan view.

画素間遮光膜のうち、平面視において素子分離部の複数の交差部と重なる部分の最小高さは、平面視において素子分離部の複数の交差部と重ならない部分の最大高さよりも小さくてもよい。 Even if the minimum height of the part of the interpixel light-shielding film that overlaps with the plurality of intersections of the element separation part in plan view is smaller than the maximum height of the part that does not overlap with the plurality of intersections of the element separation part in plan view. good.

画素間遮光膜は、第1遮光部と、少なくとも一部が第1遮光部に重ねられる第2遮光部と、を有してもよい。 The inter-pixel light-shielding film may have a first light-shielding portion and a second light-shielding portion in which at least a part thereof is overlapped with the first light-shielding portion.

画素間遮光膜のうち、平面視において素子分離部の複数の交差部と重なる部分の最小高さは、平面視において素子分離部の複数の交差部と重ならない部分の最大高さよりも小さく、画素間遮光膜のうち、平面視において素子分離部の複数の交差部と重なる部分は、少なくとも部分的に第1遮光部を含み、画素間遮光膜のうち、平面視において素子分離部の複数の交差部と重ならない部分は、少なくとも部分的に第2遮光部を含んでもよい。 The minimum height of the part of the interpixel light-shielding film that overlaps with the plurality of intersections of the element separation part in the plan view is smaller than the maximum height of the part that does not overlap with the plurality of intersections of the element separation part in the plan view. Of the inter-pixel light-shielding film, the portion that overlaps with the plurality of intersections of the element separation portions in the plan view includes at least a first light-shielding portion, and among the inter-pixel light-shielding films, the plurality of intersections of the element separation portions in the plan view. The portion that does not overlap with the portion may include a second light-shielding portion at least partially.

複数の光透過部は、透過区画部により区画されており、透過区画部は、お互いに重ねられた複数の区画積層部を有し、複数の区画積層部のうちの少なくとも1以上が画素間遮光膜であってもよい。 The plurality of light transmitting portions are partitioned by a transmitting partition portion, and the transmitting partition portion has a plurality of compartment laminated portions stacked on each other, and at least one or more of the plurality of compartment laminated portions is light-shielded between pixels. It may be a membrane.

複数の区画積層部のうち最も素子分離部側に位置する区画積層部は、平面視において、素子分離部の複数の交差部と重なる画素間遮光膜であってもよい。 The partition stacking portion located closest to the element separation portion among the plurality of partition stacking portions may be an interpixel light-shielding film that overlaps with the plurality of intersections of the element separation portions in a plan view.

素子分離部は、絶縁材料を含んでもよい。 The element separation portion may include an insulating material.

図1は、固体撮像装置(光検出装置)の一例の概略構成を示すブロック図である。FIG. 1 is a block diagram showing a schematic configuration of an example of a solid-state image sensor (photodetector). 図2は、画素アレイ部(特に画角中央部)の一例の概略構成を示す拡大断面図である。FIG. 2 is an enlarged cross-sectional view showing a schematic configuration of an example of a pixel array portion (particularly, a central portion of an angle of view). 図3Aは、第1の例の画素間遮光膜(特に画角中央部に位置する画素間遮光膜)に関する図面であり、受光領域の平面図である。FIG. 3A is a drawing relating to the inter-pixel light-shielding film of the first example (particularly, the inter-pixel light-shielding film located at the center of the angle of view), and is a plan view of a light receiving region. 図3Bは、図3Aにおいて符号「IIIB」で示される領域における画素間遮光膜及び素子分離部の平面図である。FIG. 3B is a plan view of the interpixel light-shielding film and the element separation portion in the region represented by the reference numeral “IIIB” in FIG. 3A. 図3Cは、図3Bにおいて符号「IIIC」で示される断面線に沿う画素間遮光膜、素子分離部及び光電変換素子の断面図である。FIG. 3C is a cross-sectional view of the interpixel light-shielding film, the element separation portion, and the photoelectric conversion element along the cross-sectional line indicated by the reference numeral “IIIC” in FIG. 3B. 図4Aは、第1の例の画素間遮光膜(特に画角周辺部に位置する画素間遮光膜)に関する図面であり、受光領域の平面図である。FIG. 4A is a drawing relating to the inter-pixel light-shielding film of the first example (particularly, the inter-pixel light-shielding film located in the peripheral portion of the angle of view), and is a plan view of the light receiving region. 図4Bは、図4Aにおいて符号「IVB」で示される領域(すなわち第2象限)における画素間遮光膜及び素子分離部の平面図であり、格子状部及び拡張部の境界が点線で示されている。FIG. 4B is a plan view of the interpixel light-shielding film and the element separation portion in the region (that is, the second quadrant) indicated by the reference numeral “IVB” in FIG. 4A, and the boundary between the grid-like portion and the expansion portion is shown by a dotted line. There is. 図4Cは、図4Aにおいて符号「IVB」で示される領域(すなわち第2象限)における画素間遮光膜及び素子分離部の平面図であり、格子状部及び拡張部の境界が示されていない。FIG. 4C is a plan view of the interpixel light-shielding film and the element separation portion in the region (that is, the second quadrant) indicated by the reference numeral “IVB” in FIG. 4A, and the boundary between the grid-like portion and the expansion portion is not shown. 図4Dは、図4B及び図4Cにおいて符号「IVD」で示される断面線に沿う画素間遮光膜、素子分離部及び光電変換素子の断面図である。FIG. 4D is a cross-sectional view of an interpixel light-shielding film, an element separation portion, and a photoelectric conversion element along a cross-sectional line indicated by the reference numeral “IVD” in FIGS. 4B and 4C. 図5Aは、拡張部を持たない画素間遮光膜及び素子分離部の平面図である。FIG. 5A is a plan view of an interpixel light-shielding film having no expansion portion and an element separation portion. 図5Bは、図5Aにおいて符号「VB」で示される断面線に沿う画素間遮光膜、素子分離部及び光電変換素子の断面図である。FIG. 5B is a cross-sectional view of an interpixel light-shielding film, an element separation portion, and a photoelectric conversion element along a cross-sectional line indicated by the reference numeral “VB” in FIG. 5A. 図6Aは、第1の例の画素間遮光膜(特に画角周辺部に位置する画素間遮光膜)に関する図面であり、受光領域の平面図である。FIG. 6A is a drawing relating to the inter-pixel light-shielding film of the first example (particularly, the inter-pixel light-shielding film located in the peripheral portion of the angle of view), and is a plan view of the light receiving region. 図6Bは、図6Aにおいて符号「VIB」で示される領域(すなわち第1象限)における画素間遮光膜及び素子分離部の平面図である。FIG. 6B is a plan view of the interpixel light-shielding film and the element separation portion in the region (that is, the first quadrant) indicated by the reference numeral “VIB” in FIG. 6A. 図7Aは、第1の例の画素間遮光膜(特に画角周辺部に位置する画素間遮光膜)に関する図面であり、受光領域の平面図である。FIG. 7A is a drawing relating to the inter-pixel light-shielding film of the first example (particularly, the inter-pixel light-shielding film located in the peripheral portion of the angle of view), and is a plan view of the light receiving region. 図7Bは、図7Aにおいて符号「VIIB」で示される領域(すなわち第4象限)における画素間遮光膜及び素子分離部の平面図である。FIG. 7B is a plan view of the interpixel light-shielding film and the element separation portion in the region (that is, the fourth quadrant) indicated by the reference numeral “VIIB” in FIG. 7A. 図8Aは、第1の例の画素間遮光膜(特に画角周辺部に位置する画素間遮光膜)に関する図面であり、受光領域の平面図である。FIG. 8A is a drawing relating to the inter-pixel light-shielding film of the first example (particularly, the inter-pixel light-shielding film located in the peripheral portion of the angle of view), and is a plan view of the light receiving region. 図8Bは、図8Aにおいて符号「VIIIB」で示される領域(すなわち第3象限)における画素間遮光膜及び素子分離部の平面図である。FIG. 8B is a plan view of the interpixel light-shielding film and the element separation portion in the region (that is, the third quadrant) indicated by the reference numeral “VIIIB” in FIG. 8A. 図9は、第2の例の画素間遮光膜及び素子分離部の平面図である。FIG. 9 is a plan view of the interpixel light-shielding film and the element separation portion of the second example. 図10は、第3の例の画素間遮光膜及び素子分離部の平面図である。FIG. 10 is a plan view of the interpixel light-shielding film and the element separation portion of the third example. 図11は、第4の例の画素間遮光膜及び素子分離部の平面図である。FIG. 11 is a plan view of the interpixel light-shielding film and the element separation portion of the fourth example. 図12は、第5の例の画素間遮光膜を備える画素アレイ部の一例の概略構成を示す拡大断面図であり、特に画角周辺部における素子分離部の交差部を通過する断面線(例えば図4Cの符号「IVD」参照)に沿った断面状態を示す。FIG. 12 is an enlarged cross-sectional view showing a schematic configuration of an example of a pixel array portion provided with a light-shielding film between pixels of the fifth example, and is a cross-sectional line (for example,) passing through an intersection of element separation portions in a peripheral portion of an angle of view. FIG. 4C shows a cross-sectional state along the reference numeral “IVD”). 図13Aは、第6の例の画素間遮光膜を備える画素アレイ部の一例の概略構成を示す拡大断面図であり、特に画角中央部における素子分離部の交差部を通過する断面線に沿った断面状態を示す。FIG. 13A is an enlarged cross-sectional view showing a schematic configuration of an example of a pixel array portion provided with an inter-pixel light-shielding film of the sixth example, particularly along a cross-sectional line passing through an intersection of element separation portions in the central portion of the angle of view. The cross-sectional state is shown. 図13Bは、第6の例の画素間遮光膜を備える画素アレイ部の一例の概略構成を示す拡大断面図であり、特に画角周辺部における素子分離部の交差部を通過する断面線に沿った断面状態を示す。FIG. 13B is an enlarged cross-sectional view showing a schematic configuration of an example of a pixel array portion provided with an inter-pixel light-shielding film of the sixth example, particularly along a cross-sectional line passing through an intersection of element separation portions in the peripheral portion of the angle of view. The cross-sectional state is shown.

以下、図面を参照して、本開示の技術の実施形態について説明する。なお図面間において、各要素のサイズ及び縮尺は必ずしも厳密には一致しない。 Hereinafter, embodiments of the technique of the present disclosure will be described with reference to the drawings. It should be noted that the size and scale of each element do not always exactly match between the drawings.

以下では、一例として、固体撮像装置(特にCMOSイメージセンサ)について説明するが、本開示の技術の適用対象は限定されず、光検出装置全般に対して本開示の技術を適用することが可能である。したがって本開示の技術を適用可能な固体撮像装置は、各図面に示される具体的構造とは異なる構造を有してもよい。またCMOSイメージセンサ以外のイメージセンサ(例えばCCDイメージセンサ)を用いる装置に対しても、本開示の技術を適用することが可能である。 In the following, a solid-state image sensor (particularly a CMOS image sensor) will be described as an example, but the application of the technique of the present disclosure is not limited, and the technique of the present disclosure can be applied to the entire photodetector. be. Therefore, the solid-state image sensor to which the technique of the present disclosure can be applied may have a structure different from the specific structure shown in each drawing. Further, the technique of the present disclosure can be applied to a device using an image sensor (for example, a CCD image sensor) other than the CMOS image sensor.

また本開示の技術を適用可能な光検出装置の用途や技術分野も限定されない。例えば、本開示の技術を適用可能な光検出装置は、ユーザに提供する被写体画像を取得することを主たる目的とする装置としてだけではなく、センシングを主たる目的とする装置(例えば車両向けセンサ、距離画像センサ及び偏向センサ)としても構成可能である。 Further, the application and technical field of the photodetector to which the technique of the present disclosure can be applied are not limited. For example, the optical detection device to which the technique of the present disclosure can be applied is not only a device whose main purpose is to acquire a subject image provided to a user, but also a device whose main purpose is sensing (for example, a sensor for a vehicle, a distance). It can also be configured as an image sensor and a deflection sensor).

図1は、固体撮像装置1(光検出装置)の一例の概略構成を示すブロック図である。 FIG. 1 is a block diagram showing a schematic configuration of an example of a solid-state image sensor 1 (photodetector).

図1に示される固体撮像装置1は、画素アレイ部11及び周辺回路部を備える。 The solid-state image sensor 1 shown in FIG. 1 includes a pixel array unit 11 and a peripheral circuit unit.

周辺回路部には、例えば、垂直駆動部12、AD変換部13、水平駆動部14、システム制御部15、データ格納部16及び信号処理部17が含まれる。 The peripheral circuit unit includes, for example, a vertical drive unit 12, an AD conversion unit 13, a horizontal drive unit 14, a system control unit 15, a data storage unit 16, and a signal processing unit 17.

画素アレイ部11には、複数の画素10が縦横に二次元配列される。各画素10は、受光した光量に応じた光電荷を生成して蓄積する光電変換部を有する。各画素10には、画素駆動線18を介して垂直駆動部12が接続されるとともに、出力信号線19を介してAD変換部13が接続される。 A plurality of pixels 10 are two-dimensionally arranged vertically and horizontally in the pixel array unit 11. Each pixel 10 has a photoelectric conversion unit that generates and stores a light charge according to the amount of received light. A vertical drive unit 12 is connected to each pixel 10 via a pixel drive line 18, and an AD conversion unit 13 is connected via an output signal line 19.

垂直駆動部12は、画素駆動線18を介して駆動信号を出力することで、画素アレイ部11に含まれる複数の画素10を個別画素単位で又は複数画素単位で駆動する。例えば、垂直駆動部12はシフトレジスタ及びアドレスデコーダを具備し、画素アレイ部11に含まれる複数の画素10を全画素同時に又は行単位で駆動することができる。 The vertical drive unit 12 outputs a drive signal via the pixel drive line 18 to drive a plurality of pixels 10 included in the pixel array unit 11 in units of individual pixels or in units of a plurality of pixels. For example, the vertical drive unit 12 includes a shift register and an address decoder, and can drive a plurality of pixels 10 included in the pixel array unit 11 simultaneously or row by row.

各画素10で生成された画素信号は、出力信号線19を介してAD変換部13に出力される。 The pixel signal generated by each pixel 10 is output to the AD conversion unit 13 via the output signal line 19.

AD変換部13は、各画素10から出力される画素信号に対してAD変換処理を行って画素信号をアナログ形式からデジタル形式に変換し、デジタル形式の画素信号を記憶する。 The AD conversion unit 13 performs AD conversion processing on the pixel signal output from each pixel 10 to convert the pixel signal from the analog format to the digital format, and stores the pixel signal in the digital format.

水平駆動部14は、例えばシフトレジスタ及びアドレスデコーダを具備し、AD変換部13を駆動して、デジタル形式の画素信号を所定の順番でAD変換部13から信号処理部17に出力させる。 The horizontal drive unit 14 includes, for example, a shift register and an address decoder, and drives the AD conversion unit 13 to output digital-format pixel signals from the AD conversion unit 13 to the signal processing unit 17 in a predetermined order.

システム制御部15は、垂直駆動部12、AD変換部13及び水平駆動部14を制御する。例えば、システム制御部15はタイミングジェネレータを具備し、当該タイミングジェネレータで生成されたタイミング信号が垂直駆動部12、AD変換部13及び水平駆動部14に出力される。垂直駆動部12、AD変換部13及び水平駆動部14は、システム制御部15から送られてくるタイミング信号に応じて、駆動を行う。 The system control unit 15 controls the vertical drive unit 12, the AD conversion unit 13, and the horizontal drive unit 14. For example, the system control unit 15 includes a timing generator, and the timing signal generated by the timing generator is output to the vertical drive unit 12, the AD conversion unit 13, and the horizontal drive unit 14. The vertical drive unit 12, the AD conversion unit 13, and the horizontal drive unit 14 drive according to the timing signal sent from the system control unit 15.

信号処理部17は、演算処理機能を有し、AD変換部13から出力される画素信号の信号処理を行う。信号処理部17で行われる具体的な信号処理は限定されない。信号処理部17は、例えばノイズ除去処理、黒レベル調整、列ばらつき補正及び/又はその他のデジタル信号処理を実施可能である。 The signal processing unit 17 has an arithmetic processing function and performs signal processing of the pixel signal output from the AD conversion unit 13. The specific signal processing performed by the signal processing unit 17 is not limited. The signal processing unit 17 can perform, for example, noise reduction processing, black level adjustment, column variation correction, and / or other digital signal processing.

データ格納部16は、信号処理部17で行われる信号処理に必要なデータ類を記憶する。 The data storage unit 16 stores data necessary for signal processing performed by the signal processing unit 17.

信号処理部17において信号処理を受けた画素信号は、入出力端子を介して外部に出力される。なお外部からの信号が、入出力端子を介して固体撮像装置1に入力されてもよい。 The pixel signal that has undergone signal processing in the signal processing unit 17 is output to the outside via the input / output terminals. A signal from the outside may be input to the solid-state image sensor 1 via the input / output terminal.

図2は、画素アレイ部11(特に画角中央部)の一例の概略構成を示す拡大断面図である。 FIG. 2 is an enlarged cross-sectional view showing a schematic configuration of an example of the pixel array portion 11 (particularly the central portion of the angle of view).

図2に示す画素アレイ部11は裏面照射型CMOSセンサとして構成されており、特に、裏面側(すなわち図2の上側)の画素構造例が示されている。 The pixel array unit 11 shown in FIG. 2 is configured as a back-illuminated CMOS sensor, and in particular, an example of a pixel structure on the back surface side (that is, the upper side of FIG. 2) is shown.

図2に示す各画素10は、順次積層する半導体層26、カラーフィルター層23、平坦化層22及びオンチップレンズ21を有する。 Each pixel 10 shown in FIG. 2 has a semiconductor layer 26, a color filter layer 23, a flattening layer 22, and an on-chip lens 21 which are sequentially laminated.

半導体層26は、それぞれの画素10に対応する複数の光電変換素子26aを有する。二次元配置されたこれらの光電変換素子26aは受光領域を形成し、当該受光領域の中心を固体撮像装置1の光軸が通過する。 The semiconductor layer 26 has a plurality of photoelectric conversion elements 26a corresponding to each pixel 10. These two-dimensionally arranged photoelectric conversion elements 26a form a light receiving region, and the optical axis of the solid-state image pickup device 1 passes through the center of the light receiving region.

オンチップレンズ21は、複数の光電変換素子26aのそれぞれに割り当てられる複数のマイクロレンズを有する。各マイクロレンズに入射した光は、平坦化層22及びカラーフィルター層23を介して、対応の光電変換素子26aに入射する。 The on-chip lens 21 has a plurality of microlenses assigned to each of the plurality of photoelectric conversion elements 26a. The light incident on each microlens is incident on the corresponding photoelectric conversion element 26a via the flattening layer 22 and the color filter layer 23.

隣り合う画素10の光電変換素子26aの間には、深さ方向に延びる素子分離部25が設けられる。素子分離部25は、光を遮る遮光体により構成され、隣り合う光電変換素子26a間における光の漏出を防ぐ。また素子分離部25は、画素同士を電気的に分離することが可能である。 An element separation unit 25 extending in the depth direction is provided between the photoelectric conversion elements 26a of the adjacent pixels 10. The element separation unit 25 is composed of a light-shielding body that blocks light, and prevents light from leaking between adjacent photoelectric conversion elements 26a. Further, the element separation unit 25 can electrically separate the pixels from each other.

図2に示す素子分離部25は、DTI(Deep Trench Isolation)構造を有し、半導体層26に形成されたトレンチ(溝)に遮光材料(本例ではSiO等の絶縁材料)が埋め込まれることによって形成される。図2に示す素子分離部25のトレンチは、半導体層26の裏面側(すなわち図2の上側)から掘り込まれるが、半導体層26の表面側(すなわち図2の下側)から掘り込まれてもよい。 The element separation unit 25 shown in FIG. 2 has a DTI (Deep Trench Isolation) structure, and a light-shielding material (insulating material such as SiO 2 in this example) is embedded in a trench formed in the semiconductor layer 26. Formed by. The trench of the element separation portion 25 shown in FIG. 2 is dug from the back surface side (that is, the upper side of FIG. 2) of the semiconductor layer 26, but is dug from the front surface side (that is, the lower side of FIG. 2) of the semiconductor layer 26. May be good.

素子分離部25の具体的な構成材料は限定されない。例えばタングステン(W)、アルミニウム(Al)、銅(Cu)、チタン(Ti)、窒化チタン(TiN)及びタンタル(Ta)等の金属材料、金属酸化物(SiO等)、或いは複数の材料の組み合わせによって、素子分離部25を構成することが可能である。 The specific constituent material of the element separating portion 25 is not limited. For example, a metal material such as tungsten (W), aluminum (Al), copper (Cu), titanium (Ti), titanium nitride (TiN) and tantalum (Ta), a metal oxide (SiO 2 etc.), or a plurality of materials. Depending on the combination, the element separation unit 25 can be configured.

オンチップレンズ21と半導体層26(特に各光電変換素子26a)との間には、画素間遮光膜24が設けられる。画素間遮光膜24は、光を遮る遮光体により構成され、隣り合う画素10間における光の漏出を防ぐ。 An inter-pixel light-shielding film 24 is provided between the on-chip lens 21 and the semiconductor layer 26 (particularly, each photoelectric conversion element 26a). The inter-pixel light-shielding film 24 is composed of a light-shielding body that blocks light, and prevents light from leaking between adjacent pixels 10.

画素間遮光膜24は、複数の光電変換素子26aのそれぞれに対応する複数の光透過部27を区画する。オンチップレンズ21に入射した光は、対応の光透過部27を通って、各光電変換素子26aに入射する。図2に示す例では、カラーフィルター層23中に画素間遮光膜24が位置しており、各光透過部27はカラーフィルター層23により埋められている。 The inter-pixel light-shielding film 24 partitions a plurality of light transmitting portions 27 corresponding to each of the plurality of photoelectric conversion elements 26a. The light incident on the on-chip lens 21 passes through the corresponding light transmitting portion 27 and is incident on each photoelectric conversion element 26a. In the example shown in FIG. 2, the interpixel light-shielding film 24 is located in the color filter layer 23, and each light transmitting portion 27 is filled with the color filter layer 23.

画素間遮光膜24の形成方法は限定されない。例えば、画素間遮光膜24の形状に応じたフォトマスク及びエッチングを利用したフォトリソグラフィによって、所望形状及び所望サイズの画素間遮光膜24を形成することが可能である。 The method of forming the interpixel light-shielding film 24 is not limited. For example, it is possible to form the inter-pixel light-shielding film 24 having a desired shape and a desired size by photolithography using a photomask corresponding to the shape of the inter-pixel light-shielding film 24 and etching.

画素間遮光膜24の具体的な構成材料は限定されない。例えばタングステン(W)、アルミニウム(Al)、銅(Cu)、チタン(Ti)、窒化チタン(TiN)及びタンタル(Ta)等の金属材料や金属材料の酸化物によって、画素間遮光膜24を構成することが可能である。また光吸収性を有する樹脂等の他の材料(例えばカーボンブラック顔料やチタンブラック顔料を含有する有機樹脂材料)や複数の材料の組み合わせによって、素子分離部25が構成されてもよい。 The specific constituent material of the interpixel light-shielding film 24 is not limited. For example, the interpixel light-shielding film 24 is composed of a metal material such as tungsten (W), aluminum (Al), copper (Cu), titanium (Ti), titanium nitride (TiN) and tantalum (Ta), or an oxide of the metal material. It is possible to do. Further, the element separation portion 25 may be configured by a combination of other materials such as a resin having light absorption (for example, an organic resin material containing a carbon black pigment or a titanium black pigment) or a plurality of materials.

画素アレイ部11では、瞳補正が行われ、相互に対応付けられるマイクロレンズ(特にマイクロレンズの光軸)と光電変換素子26a(特に光電変換素子26aの中心)との間の相対位置が、受光領域の中心からの距離及び方向に応じて適宜調整される。 In the pixel array unit 11, pupil correction is performed, and the relative position between the microlens (particularly the optical axis of the microlens) and the photoelectric conversion element 26a (particularly the center of the photoelectric conversion element 26a) associated with each other is received. It is appropriately adjusted according to the distance and direction from the center of the region.

なお、瞳補正のための、各光透過部27の中心位置の、対応の光電変換素子26aの中心位置からのずれ量及びずれ方向は、受光領域の中心からの各光透過部27の距離及び方向に応じて定められる。 The amount and direction of deviation of the center position of each light transmitting portion 27 for pupil correction from the center position of the corresponding photoelectric conversion element 26a are the distance of each light transmitting portion 27 from the center of the light receiving region and the deviation direction. It is determined according to the direction.

例えば、受光領域の中心部分に対応する画角中央部では、瞳補正が不要である。したがって良好な画素感度を確保する観点から、画角中央部では、図2に示すように、素子分離部25上に画素間遮光膜24が位置付けられ、各光電変換素子26aが画素間遮光膜24により覆われないようにすることが好ましい。この場合、画素間遮光膜24の平面視形状は、素子分離部25と同様の格子形状となる。 For example, pupil correction is not required in the central portion of the angle of view corresponding to the central portion of the light receiving region. Therefore, from the viewpoint of ensuring good pixel sensitivity, as shown in FIG. 2, the inter-pixel light-shielding film 24 is positioned on the element separation part 25 in the central portion of the angle of view, and each photoelectric conversion element 26a has an inter-pixel light-shielding film 24. It is preferable not to be covered with. In this case, the plan-view shape of the inter-pixel light-shielding film 24 is the same as the grid shape of the element separation portion 25.

一方、画角周辺部では瞳補正が行われ、各光透過部27の中心位置が対応の光電変換素子26aの中心位置から大きくずらされ、平面視において各光電変換素子26aが画素間遮光膜24により部分的に覆われることになる。この場合、画角周辺部における画素間遮光膜24が画角中央部における画素間遮光膜24と同じ格子状の平面視形状を有すると、画角周辺部では、素子分離部25の一部又は全部が画素間遮光膜24に覆われることなく露出する。 On the other hand, pupil correction is performed in the peripheral portion of the angle of view, the center position of each light transmitting portion 27 is largely deviated from the center position of the corresponding photoelectric conversion element 26a, and each photoelectric conversion element 26a is a light-shielding film between pixels 24 in a plan view. Will be partially covered by. In this case, if the inter-pixel light-shielding film 24 in the peripheral portion of the angle of view has the same grid-like plan view shape as the inter-pixel light-shielding film 24 in the central portion of the angle of view, a part of the element separation portion 25 or in the peripheral portion of the angle of view The whole is exposed without being covered with the inter-pixel light-shielding film 24.

このようにして生じる素子分離部25の露出面に光が入射すると、当該露出面で光が意図せずに反射及び散乱し、混色が生じうる。 When light is incident on the exposed surface of the element separating portion 25 thus generated, the light is unintentionally reflected and scattered on the exposed surface, and color mixing may occur.

そこで本実施形態では、画素間遮光膜24の平面視形状が受光領域の中心からの距離に応じて変化し、素子分離部25の露出が抑えられる。 Therefore, in the present embodiment, the plan view shape of the interpixel light-shielding film 24 changes according to the distance from the center of the light receiving region, and the exposure of the element separation portion 25 is suppressed.

具体的には、画素間遮光膜24は、平面視において、素子分離部25の複数の交差部と重なるように設けられている。したがって複数の光透過部27のうちの少なくとも一部(特に受光領域の中心から離れて位置する複数の光透過部27)の平面視における形状及びサイズは、対応の光電変換素子26aの平面視における形状及びサイズとは異なる。 Specifically, the inter-pixel light-shielding film 24 is provided so as to overlap a plurality of intersecting portions of the element separating portions 25 in a plan view. Therefore, the shape and size of at least a part of the plurality of light transmitting portions 27 (particularly, the plurality of light transmitting portions 27 located away from the center of the light receiving region) in the plan view are the shapes and sizes in the plan view of the corresponding photoelectric conversion element 26a. Different from shape and size.

以下、そのような画素間遮光膜24の具体例について説明する。 Hereinafter, a specific example of such an interpixel light-shielding film 24 will be described.

[第1の例の画素間遮光膜]
図3A~図3Cは、第1の例の画素間遮光膜24(特に画角中央部に位置する画素間遮光膜24)に関する図面である。
[Light-shielding film between pixels of the first example]
3A to 3C are drawings relating to the inter-pixel light-shielding film 24 of the first example (particularly, the inter-pixel light-shielding film 24 located at the center of the angle of view).

図3Aは、受光領域20の平面図である。図3Aにおいて受光領域20の中心が符号「O」で示されており、受光領域20の中心Oを通る直交軸(すなわち縦軸及び横軸)が一点線で示されている。 FIG. 3A is a plan view of the light receiving region 20. In FIG. 3A, the center of the light receiving region 20 is indicated by the reference numeral “O”, and the orthogonal axis (that is, the vertical axis and the horizontal axis) passing through the center O of the light receiving region 20 is indicated by a single dotted line.

図3Bは、図3Aにおいて符号「IIIB」で示される領域における画素間遮光膜24及び素子分離部25の平面図である。図3Bにおいて、十字表示は、素子分離部25の交差部25aの中心O(すなわち交差中心)を示し、点線で表される三角形は、後述の拡張部24b(図4B参照)に対応する。 FIG. 3B is a plan view of the interpixel light-shielding film 24 and the element separation portion 25 in the region represented by the reference numeral “IIIB” in FIG. 3A. In FIG. 3B, the cross display indicates the center O (that is, the intersection center) of the intersection 25a of the element separation portion 25, and the triangle represented by the dotted line corresponds to the expansion portion 24b (see FIG. 4B) described later.

図3Cは、図3Bにおいて符号「IIIC」で示される断面線に沿う画素間遮光膜24、素子分離部25及び光電変換素子26aの断面図である。 FIG. 3C is a cross-sectional view of the interpixel light-shielding film 24, the element separation portion 25, and the photoelectric conversion element 26a along the cross-sectional line indicated by the reference numeral “IIIC” in FIG. 3B.

図3B及び図3Cに示される画素間遮光膜24は、受光領域20の中心付近(図3Aの符号「IIIB」参照)に位置する。 The interpixel light-shielding film 24 shown in FIGS. 3B and 3C is located near the center of the light-receiving region 20 (see reference numeral “IIIB” in FIG. 3A).

本例の画素間遮光膜24は、全体にわたって共通の材料で一体的に構成されており、画角中央部では、平面視において、素子分離部25と同じ格子形状を有する。すなわち画角中央部における画素間遮光膜24は、平面視において、素子分離部25と同じ形状及びサイズを有し、素子分離部25と同じ位置に配置される。 The inter-pixel light-shielding film 24 of this example is integrally made of a common material throughout, and has the same lattice shape as the element separation portion 25 in a plan view at the center of the angle of view. That is, the interpixel light-shielding film 24 in the central portion of the angle of view has the same shape and size as the element separation portion 25 in a plan view, and is arranged at the same position as the element separation portion 25.

そのため、画角中央部における画素間遮光膜24は、平面視において、素子分離部25の全体を覆い且つ素子分離部25からはみ出ない。 Therefore, the interpixel light-shielding film 24 in the central portion of the angle of view covers the entire element separation portion 25 and does not protrude from the element separation portion 25 in a plan view.

図4A~図4Dは、第1の例の画素間遮光膜24(特に画角周辺部に位置する画素間遮光膜24)に関する図面である。 4A to 4D are drawings relating to the inter-pixel light-shielding film 24 of the first example (particularly, the inter-pixel light-shielding film 24 located in the peripheral portion of the angle of view).

図4Aは、受光領域20の平面図である。図4Aにおいて受光領域20の中心が符号「O」で示されており、受光領域20の中心Oを通る直交軸が一点線で示されている。 FIG. 4A is a plan view of the light receiving region 20. In FIG. 4A, the center of the light receiving region 20 is indicated by the reference numeral “O”, and the orthogonal axis passing through the center O of the light receiving region 20 is indicated by a single dotted line.

図4Bは、図4Aにおいて符号「IVB」で示される領域(すなわち第2象限)における画素間遮光膜24及び素子分離部25の平面図であり、格子状部24a及び拡張部24bの境界が点線で示されている。図4Bにおいて、十字表示は、素子分離部25の交差部25aの交差中心を示す。 FIG. 4B is a plan view of the interpixel light-shielding film 24 and the element separation portion 25 in the region (that is, the second quadrant) indicated by the reference numeral “IVB” in FIG. 4A, and the boundary between the grid-like portion 24a and the expansion portion 24b is a dotted line. Indicated by. In FIG. 4B, the cross-shaped display indicates the intersection center of the intersection portion 25a of the element separation portion 25.

図4Cは、図4Aにおいて符号「IVB」で示される領域における画素間遮光膜24及び素子分離部25の平面図であり、格子状部24a及び拡張部24bの境界が示されていない。 FIG. 4C is a plan view of the interpixel light-shielding film 24 and the element separation portion 25 in the region indicated by the reference numeral “IVB” in FIG. 4A, and the boundary between the grid-like portion 24a and the expansion portion 24b is not shown.

図4Dは、図4B及び図4Cにおいて符号「IVD」で示される断面線に沿う画素間遮光膜24、素子分離部25及び光電変換素子26aの断面図である。 FIG. 4D is a cross-sectional view of the interpixel light-shielding film 24, the element separation portion 25, and the photoelectric conversion element 26a along the cross-sectional line indicated by the reference numeral “IVD” in FIGS. 4B and 4C.

図4B~図4Dに示すように画角周辺部における画素間遮光膜24は、平面視において、各光電変換素子26aを部分的に覆うとともに、素子分離部25の複数の交差部25aの全体と重なって覆うように設けられている。 As shown in FIGS. 4B to 4D, the interpixel light-shielding film 24 in the peripheral portion of the angle of view partially covers each photoelectric conversion element 26a in a plan view, and also covers the entire plurality of intersections 25a of the element separation portions 25. It is provided so as to overlap and cover.

具体的には、画角周辺部の画素間遮光膜24は、格子状部24a及び複数の拡張部24bを有する。 Specifically, the inter-pixel light-shielding film 24 in the peripheral portion of the angle of view has a grid-like portion 24a and a plurality of expansion portions 24b.

格子状部24aの平面視形状及び平面視サイズは、素子分離部25の平面視形状及び平面視サイズと同じであり、したがって画角中央部の画素間遮光膜24(図3B参照)の平面視形状及び平面視サイズと同じである。 The planar view shape and the planar view size of the lattice-shaped portion 24a are the same as the planar view shape and the planar view size of the element separation portion 25, and therefore, the planar view of the interpixel light-shielding film 24 (see FIG. 3B) at the center of the angle of view. Same as shape and plan size.

ただし、格子状部24aの位置は、瞳補正のために素子分離部25の位置からずれている。格子状部24aの位置ずれ量及びずれ方向は、受光領域20の中心Oからの距離及び方向に応じて決められる。すなわち画角周辺部における格子状部24aは、受光領域20の中心Oに向かう方向に、素子分離部25からずらされるように位置する。 However, the position of the grid-shaped portion 24a is deviated from the position of the element separating portion 25 for pupil correction. The amount of misalignment and the direction of misalignment of the grid-shaped portion 24a are determined according to the distance and direction from the center O of the light receiving region 20. That is, the grid-like portion 24a in the peripheral portion of the angle of view is positioned so as to be displaced from the element separation portion 25 in the direction toward the center O of the light receiving region 20.

一方、複数の拡張部24bは、格子状部24a(特に格子状部24aの交差部)と一体化しており、平面視において素子分離部25の複数の交差部25aと重なる。 On the other hand, the plurality of expansion portions 24b are integrated with the grid-like portion 24a (particularly, the intersection portion of the grid-like portion 24a), and overlap with the plurality of intersection portions 25a of the element separation portion 25 in a plan view.

ここで言う「一体化」の概念には、各拡張部24bと格子状部24aとが明確な境界なく融合している場合だけではなく、各拡張部24bが格子状部24aに対して固定的に取り付けられる場合も含まれる。 The concept of "integration" here includes not only the case where each expansion portion 24b and the grid portion 24a are fused without a clear boundary, but also each expansion portion 24b is fixed to the grid portion 24a. It is also included when it is attached to.

本例の各拡張部24bは、三角形の平面視形状を有し、素子分離部25の対応の交差部25aの全体を覆う。 Each expansion portion 24b of this example has a triangular planar view shape and covers the entire corresponding intersection portion 25a of the element separation portion 25.

このように本例の画素間遮光膜24によれば、格子状部24aによって瞳補正が適切に行われつつ、拡張部24bによって素子分離部25の露出が低減される。すなわち、格子状部24aのずれ量は、受光領域20の中心Oからの距離が大きくなるに従って大きくなるが、素子分離部25の交差部25aは、受光領域20の中心Oからの距離に関わらず拡張部24bにより覆われる。 As described above, according to the inter-pixel light-shielding film 24 of this example, the pupil correction is appropriately performed by the grid-like portion 24a, and the exposure of the element separation portion 25 is reduced by the expansion portion 24b. That is, the amount of deviation of the grid-like portion 24a increases as the distance from the center O of the light receiving region 20 increases, but the intersection 25a of the element separation portion 25 does not depend on the distance from the center O of the light receiving region 20. It is covered by the extension portion 24b.

そのため受光領域20の中心Oからの距離に関わらず、素子分離部25の交差部25aに対する光の入射が拡張部24bによって防がれる。その結果、受光領域20の全体で、素子分離部25の交差部25aにおける光の意図しない反射及び散乱が防がれ、それにより混色も防がれている。 Therefore, regardless of the distance from the center O of the light receiving region 20, the incident of light on the intersecting portion 25a of the element separating portion 25 is prevented by the expansion portion 24b. As a result, unintended reflection and scattering of light at the intersection 25a of the element separation portion 25 is prevented in the entire light receiving region 20, and thereby color mixing is also prevented.

図5A及び図5Bは、拡張部24bを持たない画素間遮光膜24(特に画角周辺部に位置する画素間遮光膜24)に関する図面である。図5Aは、拡張部24bを持たない画素間遮光膜24及び素子分離部25の平面図である。図5Bは、図5Aにおいて符号「VB」で示される断面線に沿う画素間遮光膜24、素子分離部25及び光電変換素子26aの断面図である。 5A and 5B are drawings relating to the inter-pixel light-shielding film 24 having no expansion portion 24b (particularly, the inter-pixel light-shielding film 24 located in the peripheral portion of the angle of view). FIG. 5A is a plan view of the interpixel light-shielding film 24 and the element separation portion 25 having no expansion portion 24b. FIG. 5B is a cross-sectional view of the interpixel light-shielding film 24, the element separation portion 25, and the photoelectric conversion element 26a along the cross-sectional line indicated by the reference numeral “VB” in FIG. 5A.

図5A及び図5Bからも明らかなように、画素間遮光膜24が拡張部24bを持たない場合、素子分離部25の交差部25aは、瞳補正による画素間遮光膜24のずれに応じて、露出面が増大する。そのため素子分離部25の交差部25aの露出面に光が入射し、当該光が反射及び散乱することで混色がもたらされる。 As is clear from FIGS. 5A and 5B, when the inter-pixel light-shielding film 24 does not have the expansion portion 24b, the intersection 25a of the element separation unit 25 responds to the deviation of the inter-pixel light-shielding film 24 due to pupil correction. The exposed surface increases. Therefore, light is incident on the exposed surface of the intersecting portion 25a of the element separating portion 25, and the light is reflected and scattered to bring about color mixing.

なお、光の入射方向及び素子分離部25の格子状配置を考慮すると、素子分離部25の交差部25aで反射及び散乱した光が、混色の発生に比較的大きく寄与する傾向がある。 Considering the incident direction of light and the grid-like arrangement of the element separation portions 25, the light reflected and scattered at the intersection portion 25a of the element separation portions 25 tends to contribute relatively significantly to the generation of color mixing.

その一方で、画素間遮光膜24によって素子分離部25が覆われる範囲が大きくなると、各光透過部27の平面視面積が小さくなり、その結果、画素感度が低下する。 On the other hand, when the range in which the element separation portion 25 is covered by the inter-pixel light-shielding film 24 becomes large, the planar viewing area of each light transmission portion 27 becomes small, and as a result, the pixel sensitivity decreases.

そのため本例のように、素子分離部25の交差部25aを重点的に画素間遮光膜24(特に拡張部24b)により覆うことで、良好な画素感度を維持しつつ、混色を効果的に低減することができる。 Therefore, as in this example, by covering the intersection 25a of the element separation portion 25 mainly with the inter-pixel light-shielding film 24 (particularly the expansion portion 24b), color mixing is effectively reduced while maintaining good pixel sensitivity. can do.

特に、拡張部24bの平面視形状を三角形にすることによって、素子分離部25の交差部25aの露出を確実に防ぎつつ、画素間遮光膜24の平面視面積の拡大を抑え、瞳補正の効果が大幅に損なわれることを回避することができる。 In particular, by making the plan view shape of the expansion portion 24b triangular, the exposure of the intersection 25a of the element separation section 25 is surely prevented, the expansion of the plan view area of the interpixel light-shielding film 24 is suppressed, and the effect of pupil correction is achieved. Can be avoided to be significantly impaired.

このように本例の画素間遮光膜24によれば、素子分離部25の交差部25aにおける光の意図しない反射及び散乱に起因する混色の防止と、瞳補正による良好な画素感度の確保とを、バランス良く両立することができる。 As described above, according to the inter-pixel light-shielding film 24 of this example, it is possible to prevent color mixing due to unintended reflection and scattering of light at the intersection 25a of the element separation portion 25, and to secure good pixel sensitivity by pupil correction. , A good balance can be achieved.

なお、受光領域20の中心Oからの距離が大きくなるに従って、格子状部24aからの各拡張部24bの張り出し量(すなわち突出量)は大きくなる。 As the distance from the center O of the light receiving region 20 increases, the amount of protrusion (that is, the amount of protrusion) of each expansion portion 24b from the grid-like portion 24a increases.

すなわち画素間遮光膜24は、受光領域20の中心付近では格子状の平面形状を有する。言い換えれば、受光領域20の中心付近では、各拡張部24bが格子状部24aの一部として構成される(図3B参照)。 That is, the interpixel light-shielding film 24 has a grid-like planar shape near the center of the light-receiving region 20. In other words, in the vicinity of the center of the light receiving region 20, each expansion portion 24b is configured as a part of the grid-like portion 24a (see FIG. 3B).

そして受光領域20の中心Oから離れるに従って、拡張部24bは隣接する光透過部27に向かって徐々に張り出し、格子状部24aからの拡張部24bの張り出し量が徐々に増大する。そのため各光透過部27の平面視面積は、受光領域20の中心Oからの各光透過部27の距離が増大するに従って減少する。 Then, as the distance from the center O of the light receiving region 20 increases, the expansion portion 24b gradually overhangs toward the adjacent light transmitting portion 27, and the amount of the expansion portion 24b protruding from the grid-like portion 24a gradually increases. Therefore, the planar viewing area of each light transmitting portion 27 decreases as the distance of each light transmitting portion 27 from the center O of the light receiving region 20 increases.

格子状部24aからの各拡張部24bの張り出し量は、受光領域20の中心Oからの距離が大きくなるに従って、無段階的(すなわち連続可変的)に増大してもよいし、段階的に増大してもよい。 The amount of protrusion of each expansion portion 24b from the grid-shaped portion 24a may increase steplessly (that is, continuously variable) as the distance from the center O of the light receiving region 20 increases, or gradually increases. You may.

なお、各拡張部24bの平面視形状が異方的である場合、受光領域20の中心Oに対する方向によらずに均一的な瞳補正効果を実現する観点からは、受光領域20の中心Oに対する方向に応じて各拡張部24bの向きを変えることが好ましい。 When the plan view shape of each expansion portion 24b is anisotropic, from the viewpoint of realizing a uniform pupil correction effect regardless of the direction with respect to the center O of the light receiving region 20, the light receiving region 20 with respect to the center O. It is preferable to change the direction of each expansion portion 24b according to the direction.

そのため本例の画素間遮光膜24では、三角形の平面視形状を持つ各拡張部24bの向きが、受光領域20の中心Oに対する方向に応じて変えられる。 Therefore, in the interpixel light-shielding film 24 of this example, the orientation of each expansion portion 24b having a triangular planar view shape is changed according to the direction of the light receiving region 20 with respect to the center O.

図6A、図7A及び図8Aは、受光領域20の平面図である。 6A, 7A and 8A are plan views of the light receiving region 20.

図6Bは、図6Aにおいて符号「VIB」で示される領域(すなわち第1象限)における画素間遮光膜24及び素子分離部25の平面図である。図7Bは、図7Aにおいて符号「VIIB」で示される領域(すなわち第4象限)における画素間遮光膜24及び素子分離部25の平面図である。図8Bは、図8Aにおいて符号「VIIIB」で示される領域(すなわち第3象限)における画素間遮光膜24及び素子分離部25の平面図である。 FIG. 6B is a plan view of the interpixel light-shielding film 24 and the element separation portion 25 in the region (that is, the first quadrant) indicated by the reference numeral “VIB” in FIG. 6A. FIG. 7B is a plan view of the interpixel light-shielding film 24 and the element separation portion 25 in the region (that is, the fourth quadrant) indicated by the reference numeral “VIIB” in FIG. 7A. FIG. 8B is a plan view of the interpixel light-shielding film 24 and the element separation portion 25 in the region (that is, the third quadrant) indicated by the reference numeral “VIIIB” in FIG. 8A.

本例の画素間遮光膜24では、図4C、図6B、図7B及び図8Bに示すように、受光領域20のうち線対称の関係にある領域に対しては、拡張部24bの向きも当該領域間で線対称にされる。同様に、受光領域20のうち点対称の関係にある領域に対しては、拡張部24bの向きも当該領域間で点対称にされる。 In the inter-pixel light-shielding film 24 of this example, as shown in FIGS. 4C, 6B, 7B, and 8B, the orientation of the expansion portion 24b is also the direction of the light receiving region 20 having a line-symmetrical relationship. It is axisymmetric between regions. Similarly, for a region of the light receiving region 20 that has a point symmetry relationship, the orientation of the expansion portion 24b is also point symmetric between the regions.

[第2の例の画素間遮光膜]
本例の画素間遮光膜24において、上述の第1の例の画素間遮光膜24と同一又は対応の要素には同一の符号を付し、第1の例の画素間遮光膜24と共通する事項についての詳細な説明は省略する。
[Light-shielding film between pixels in the second example]
In the inter-pixel light-shielding film 24 of this example, the same or corresponding elements as the inter-pixel light-shielding film 24 of the first example described above are designated by the same reference numerals, and are common to the inter-pixel light-shielding film 24 of the first example. Detailed explanation of the matter is omitted.

図9は、第2の例の画素間遮光膜24及び素子分離部25の平面図である。図9に示される画素間遮光膜24及び素子分離部25は、図4Aにおいて符号「IVB」で示される領域(すなわち第2象限)に位置する。 FIG. 9 is a plan view of the interpixel light-shielding film 24 and the element separation portion 25 of the second example. The interpixel light-shielding film 24 and the element separation unit 25 shown in FIG. 9 are located in the region (that is, the second quadrant) indicated by the reference numeral “IVB” in FIG. 4A.

本例の画素間遮光膜24は、上述の第1の例の画素間遮光膜24と同様に、全体にわたって共通の材料で一体的に構成されており、一体化した格子状部24a及び複数の拡張部24bを含む。 The inter-pixel light-shielding film 24 of this example is integrally made of a common material throughout, like the inter-pixel light-shielding film 24 of the first example described above, and has an integrated grid-like portion 24a and a plurality of inter-pixel light-shielding films 24. Includes extension 24b.

ただし本例の画素間遮光膜24の各拡張部24bは、四角形(特に菱形)の平面視形状を有し、格子状部24a(特に格子状部24aの交差部)と部分的に重なるように設けられている。 However, each expansion portion 24b of the interpixel light-shielding film 24 of this example has a rectangular (especially rhombus) plan view shape and partially overlaps with the grid-like portion 24a (particularly the intersection of the grid-like portions 24a). It is provided.

本例においても、上述の第1の例の画素間遮光膜24と同様に、格子状部24aが、瞳補正のために受光領域20の中心Oからの距離に応じて素子分離部25からずらされ、各拡張部24bが、素子分離部25の対応の交差部25aを覆う。 Also in this example, similarly to the inter-pixel light-shielding film 24 of the first example described above, the grid-like portion 24a is displaced from the element separation portion 25 according to the distance from the center O of the light receiving region 20 for pupil correction. Each of the expansion portions 24b covers the corresponding intersection portion 25a of the element separation portion 25.

格子状部24aと素子分離部25との間の位置ずれ方向は、受光領域20の中心Oに対する方向に応じて変わる。すなわち格子状部24aは、素子分離部25に対し、受光領域20の中心Oに向かう方向へずらされる。したがって、各拡張部24bにより覆われる素子分離部25の対応の交差部25aは、格子状部24a(特に格子状部24aの交差部)に対し、受光領域20の中心Oに向かう方向とは逆方向側に位置する。 The misalignment direction between the grid-shaped portion 24a and the element separating portion 25 changes depending on the direction of the light receiving region 20 with respect to the center O. That is, the grid-like portion 24a is displaced with respect to the element separation portion 25 in the direction toward the center O of the light receiving region 20. Therefore, the corresponding intersection 25a of the element separation portion 25 covered by each expansion portion 24b is opposite to the direction toward the center O of the light receiving region 20 with respect to the grid portion 24a (particularly the intersection of the grid portions 24a). Located on the directional side.

このように本例においても、格子状部24aによって瞳補正が適切に行われつつ、拡張部24bによって素子分離部25の露出が低減され、素子分離部25の交差部25aにおける光の意図しない反射及び散乱が防がれている。 As described above, also in this example, the pupil correction is appropriately performed by the grid-shaped portion 24a, the exposure of the element separation portion 25 is reduced by the expansion portion 24b, and the unintended reflection of light at the intersection portion 25a of the element separation portion 25 is performed. And scattering is prevented.

特に、本例の拡張部24bの平面視形状(すなわち菱形)は対称性を有する。そのため本例の画素間遮光膜24は、受光領域20の中心Oに対する方向によらずに均一的な瞳補正効果を実現する観点からも有利である。また本例の画素間遮光膜24は、画素間遮光膜24の設計及び製造の点でも有利である。 In particular, the plan-view shape (that is, the rhombus) of the extension portion 24b of this example has symmetry. Therefore, the inter-pixel light-shielding film 24 of this example is also advantageous from the viewpoint of realizing a uniform pupil correction effect regardless of the direction of the light-receiving region 20 with respect to the center O. Further, the inter-pixel light-shielding film 24 of this example is also advantageous in terms of design and manufacture of the inter-pixel light-shielding film 24.

なお画素間遮光膜24が有する複数の拡張部24bは、受光領域20の全体にわたって相互に同じ平面視サイズを有してもよいし、受光領域20の中心Oからの距離に応じて平面視サイズが変わってもよい。例えば、受光領域20の中心Oからの距離の増大に応じて、各拡張部24bの平面視面積が増大してもよい。 The plurality of expansion portions 24b of the interpixel light-shielding film 24 may have the same plan view size over the entire light receiving region 20, or may have the same plan view size depending on the distance from the center O of the light receiving region 20. May change. For example, the plan-viewing area of each expansion portion 24b may increase as the distance from the center O of the light receiving region 20 increases.

[第3の例の画素間遮光膜]
本例の画素間遮光膜24において、上述の第1の例及び第2の例の画素間遮光膜24と同一又は対応の要素には同一の符号を付し、第1の例及び第2の例の画素間遮光膜24と共通する事項についての詳細な説明は省略する。
[Light-shielding film between pixels in the third example]
In the inter-pixel light-shielding film 24 of this example, the same or corresponding elements as the inter-pixel light-shielding film 24 of the first example and the second example described above are designated by the same reference numerals, and the first example and the second example have the same reference numerals. Detailed description of matters common to the example interpixel light-shielding film 24 will be omitted.

図10は、第3の例の画素間遮光膜24及び素子分離部25の平面図である。図10に示される画素間遮光膜24及び素子分離部25は、図4Aにおいて符号「IVB」で示される領域(すなわち第2象限)に位置する。 FIG. 10 is a plan view of the interpixel light-shielding film 24 and the element separation portion 25 of the third example. The interpixel light-shielding film 24 and the element separation unit 25 shown in FIG. 10 are located in the region (that is, the second quadrant) indicated by the reference numeral “IVB” in FIG. 4A.

本例の画素間遮光膜24は、上述の第1の例及び第2の例の画素間遮光膜24と同様に、全体にわたって共通の材料で一体的に構成されており、一体化した格子状部24a及び複数の拡張部24bを含む。 Similar to the above-mentioned first example and the second example, the inter-pixel light-shielding film 24 of this example is integrally made of a common material throughout, and has an integrated grid pattern. A portion 24a and a plurality of expansion portions 24b are included.

ただし本例の画素間遮光膜24の各拡張部24bは、円形又は楕円形の平面視形状を有し、格子状部24a(特に格子状部24aの交差部)と部分的に重なるように設けられている。 However, each expansion portion 24b of the interpixel light-shielding film 24 of this example has a circular or elliptical plan view shape, and is provided so as to partially overlap the grid-like portion 24a (particularly, the intersection of the grid-like portions 24a). Has been done.

本例においても、上述の第1の例及び第2の例の画素間遮光膜24と同様に、格子状部24aが、瞳補正のために受光領域20の中心Oからの距離に応じて素子分離部25からずらされ、各拡張部24bが、素子分離部25の対応の交差部25aを覆う。 Also in this example, similarly to the inter-pixel light-shielding film 24 of the first example and the second example described above, the grid-like portion 24a is an element according to the distance from the center O of the light receiving region 20 for pupil correction. Shifted from the separation section 25, each extension section 24b covers the corresponding intersection 25a of the element separation section 25.

格子状部24aと素子分離部25との間の位置ずれ方向は、受光領域20の中心Oに対する方向に応じて変わり、格子状部24aは、素子分離部25に対し、受光領域20の中心Oに向かう方向へずらされる。そして、各拡張部24bにより覆われる素子分離部25の対応の交差部25aは、格子状部24a(特に格子状部24aの交差部)に対し、受光領域20の中心Oに向かう方向とは逆方向側に位置する。 The misalignment direction between the grid-shaped portion 24a and the element separating portion 25 changes according to the direction of the light receiving region 20 with respect to the center O, and the grid-shaped portion 24a has the center O of the light receiving region 20 with respect to the element separating portion 25. It is shifted in the direction toward. The corresponding intersection 25a of the element separation portion 25 covered by each expansion portion 24b is opposite to the direction toward the center O of the light receiving region 20 with respect to the grid portion 24a (particularly the intersection of the grid portions 24a). Located on the directional side.

このように本例においても、格子状部24aによって瞳補正が適切に行われつつ、拡張部24bによって素子分離部25の露出が低減され、素子分離部25の交差部25aにおける光の意図しない反射及び散乱が防がれている。 As described above, also in this example, the pupil correction is appropriately performed by the grid-like portion 24a, the exposure of the element separation portion 25 is reduced by the expansion portion 24b, and the unintended reflection of light at the intersection portion 25a of the element separation portion 25 is performed. And scattering is prevented.

また本例の拡張部24bの平面視形状は対称性を有しており、本例の画素間遮光膜24は、受光領域20の中心Oに対する方向によらずに均一的な瞳補正効果を実現する観点から有利である。 Further, the plan view shape of the expansion portion 24b of this example has symmetry, and the interpixel light-shielding film 24 of this example realizes a uniform pupil correction effect regardless of the direction of the light receiving region 20 with respect to the center O. It is advantageous from the viewpoint of

特に、各拡張部24bが等方的な円形の平面視形状を有する場合には、受光領域20の中心Oに対する方向に応じて各拡張部24bの向きを変えることなく、均一的な瞳補正効果を実現することができる。したがって本例の画素間遮光膜24は、画素間遮光膜24の設計及び製造の点でも有利である。 In particular, when each expansion portion 24b has an isotropic circular planar view shape, a uniform pupil correction effect is obtained without changing the direction of each expansion portion 24b according to the direction of the light receiving region 20 with respect to the center O. Can be realized. Therefore, the inter-pixel light-shielding film 24 of this example is also advantageous in terms of design and manufacture of the inter-pixel light-shielding film 24.

なお画素間遮光膜24が有する複数の拡張部24bは、受光領域20の全体にわたって相互に同じ平面視サイズを有してもよいし、受光領域20の中心Oからの距離に応じて平面視サイズが変わってもよい。 The plurality of expansion portions 24b of the interpixel light-shielding film 24 may have the same plan view size over the entire light receiving region 20, or may have the same plan view size depending on the distance from the center O of the light receiving region 20. May change.

[第4の例の画素間遮光膜]
本例の画素間遮光膜24において、上述の第1~第3の例の画素間遮光膜24と同一又は対応の要素には同一の符号を付し、第1~第3の例の画素間遮光膜24と共通する事項についての詳細な説明は省略する。
[Light-shielding film between pixels in the fourth example]
In the inter-pixel light-shielding film 24 of this example, the same or corresponding elements as the inter-pixel light-shielding film 24 of the first to third examples described above are designated by the same reference numerals, and between the pixels of the first to third examples. Detailed description of matters common to the light-shielding film 24 will be omitted.

図11は、第4の例の画素間遮光膜24及び素子分離部25の平面図である。図11に示される画素間遮光膜24及び素子分離部25は、図4Aにおいて符号「IVB」で示される領域(すなわち第2象限)に位置する。 FIG. 11 is a plan view of the interpixel light-shielding film 24 and the element separation portion 25 of the fourth example. The interpixel light-shielding film 24 and the element separation unit 25 shown in FIG. 11 are located in the region (that is, the second quadrant) indicated by the reference numeral “IVB” in FIG. 4A.

本例の画素間遮光膜24は、受光領域20の全体にわたり、平面視において格子形状を有し、素子分離部25(図11の点線部参照)の全体を覆う。 The interpixel light-shielding film 24 of this example has a grid shape in a plan view over the entire light receiving region 20, and covers the entire element separation portion 25 (see the dotted line portion in FIG. 11).

本例の画素間遮光膜24は、瞳補正のために、受光領域20の中心Oからの距離に応じて素子分離部25からずらされるが、素子分離部25の全体を覆うように拡張する。 The inter-pixel light-shielding film 24 of this example is displaced from the element separation unit 25 according to the distance from the center O of the light-receiving region 20 for pupil correction, but is expanded so as to cover the entire element separation unit 25.

そのため受光領域20の中心Oからの距離が大きくなるに従って、画素間遮光膜24の平面視の格子幅は徐々に大きくなり、画素間遮光膜24により区画される各光透過部27の平面視面積は徐々に小さくなる。 Therefore, as the distance from the center O of the light receiving region 20 increases, the lattice width in the plan view of the interpixel light-shielding film 24 gradually increases, and the planar view area of each light transmitting portion 27 partitioned by the pixel-to-pixel light-shielding film 24. Gradually becomes smaller.

本例の画素間遮光膜24によれば、素子分離部25が露出せず、素子分離部25の露出面での入射光の反射及び散乱に起因する混色を確実に防ぐことができる。 According to the inter-pixel light-shielding film 24 of this example, the element separation portion 25 is not exposed, and it is possible to reliably prevent color mixing due to reflection and scattering of incident light on the exposed surface of the element separation portion 25.

また本例の画素間遮光膜24は全体的に格子状の平面視形状を有するので、画素間遮光膜24の設計及び製造が容易である。 Further, since the inter-pixel light-shielding film 24 of this example has a grid-like plan view shape as a whole, it is easy to design and manufacture the inter-pixel light-shielding film 24.

[第5の例の画素間遮光膜]
本例の画素間遮光膜24において、上述の第1~第4の例の画素間遮光膜24と同一又は対応の要素には同一の符号を付し、第1~第4の例の画素間遮光膜24と共通する事項についての詳細な説明は省略する。
[Light-shielding film between pixels in the fifth example]
In the inter-pixel light-shielding film 24 of this example, the same or corresponding elements as the inter-pixel light-shielding film 24 of the first to fourth examples described above are designated by the same reference numerals, and between the pixels of the first to fourth examples. Detailed description of matters common to the light-shielding film 24 will be omitted.

図12は、第5の例の画素間遮光膜24を備える画素アレイ部11の一例の概略構成を示す拡大断面図であり、特に画角周辺部における素子分離部25の交差部25aを通過する断面線(例えば図4Cの符号「IVD」参照)に沿った断面状態を示す。 FIG. 12 is an enlarged cross-sectional view showing a schematic configuration of an example of the pixel array portion 11 provided with the interpixel light-shielding film 24 of the fifth example, and particularly passes through the intersection portion 25a of the element separation portion 25 in the peripheral portion of the angle of view. The cross-sectional state along the cross-sectional line (see, for example, the reference numeral “IVD” in FIG. 4C) is shown.

本例の画素間遮光膜24は、第1遮光部24cと、少なくとも一部が第1遮光部24cに重ねられる第2遮光部24dと、を有する。 The interpixel light-shielding film 24 of this example has a first light-shielding portion 24c and a second light-shielding portion 24d whose at least a part is overlapped with the first light-shielding portion 24c.

図12に示す第1遮光部24cは、全体にわたって、素子分離部25と同じ平面視形状(すなわち格子形状)を有する。すなわち第1遮光部24cは、平面視において、素子分離部25と同じ形状及びサイズを有し、素子分離部25と同じ位置に配置され、素子分離部25(交差部25aを含む)の全体を覆い且つ素子分離部25からはみ出ない。 The first light-shielding portion 24c shown in FIG. 12 has the same plan-view shape (that is, a grid shape) as the element separation portion 25 throughout. That is, the first light-shielding portion 24c has the same shape and size as the element separation portion 25 in a plan view, is arranged at the same position as the element separation portion 25, and covers the entire element separation portion 25 (including the intersection portion 25a). It covers and does not protrude from the element separation portion 25.

一方、第2遮光部24dは、平面視において、一部又は全部が第1遮光部24cと重なる。 On the other hand, the second light-shielding portion 24d partially or completely overlaps with the first light-shielding portion 24c in a plan view.

瞳補正が不要な画角中央部では、第2遮光部24dは、第1遮光部24cと同じ(本例では素子分離部25と同じ)平面視形状及び平面視サイズを有する。すなわち画角中央部における第2遮光部24dは、平面視において、第1遮光部24cと同じ形状及びサイズを有し、第1遮光部24cと同じ位置に配置され、第1遮光部24cの全体を覆い且つ第1遮光部24cからはみ出ない。 In the central portion of the angle of view that does not require pupil correction, the second light-shielding portion 24d has the same plan-view shape and plan-view size as the first light-shielding portion 24c (same as the element separation portion 25 in this example). That is, the second light-shielding portion 24d in the central portion of the angle of view has the same shape and size as the first light-shielding portion 24c in a plan view, is arranged at the same position as the first light-shielding portion 24c, and is the entire first light-shielding portion 24c. And does not protrude from the first light-shielding portion 24c.

一方、画角周辺部では、図12に示すように、第2遮光部24dは、部分的に第1遮光部24cと重なるが、平面視において素子分離部25と重ならない範囲(すなわち光電変換素子26aと重なる範囲)に拡張する。 On the other hand, in the peripheral portion of the angle of view, as shown in FIG. 12, the second light-shielding portion 24d partially overlaps with the first light-shielding portion 24c, but does not overlap with the element separation portion 25 in a plan view (that is, a photoelectric conversion element). Extend to the range that overlaps with 26a).

第1遮光部24cに対する第2遮光部24dの拡張量は、瞳補正の補正量に応じて定まる。したがって受光領域20の中心Oからの距離が大きくなるに従って、平面視における第1遮光部24cからの第2遮光部24dのはみ出し量は大きくなり、第2遮光部24dによって覆われる光電変換素子26aの範囲が大きくなる。 The expansion amount of the second light-shielding portion 24d with respect to the first light-shielding portion 24c is determined according to the correction amount of the pupil correction. Therefore, as the distance from the center O of the light receiving region 20 increases, the amount of protrusion of the second shading portion 24d from the first shading portion 24c in a plan view increases, and the photoelectric conversion element 26a covered by the second shading portion 24d. The range becomes large.

このように画素間遮光膜24のうち、平面視において素子分離部25の複数の交差部25aと重なる部分は、少なくとも部分的に第1遮光部24cを含む。図12に示す具体例では、第1遮光部24cの全体及び第2遮光部24dの一部により、平面視において素子分離部25の複数の交差部25aと重なる画素間遮光膜24の部分が構成されている。 As described above, the portion of the interpixel light-shielding film 24 that overlaps with the plurality of intersections 25a of the element separation portions 25 in a plan view includes at least a first light-shielding portion 24c. In the specific example shown in FIG. 12, the entire first light-shielding portion 24c and a part of the second light-shielding portion 24d form a portion of the inter-pixel light-shielding film 24 that overlaps with the plurality of intersections 25a of the element separation portions 25 in a plan view. Has been done.

一方、画素間遮光膜24のうち、平面視において素子分離部25の複数の交差部25aと重ならない部分は、少なくとも部分的に第2遮光部24dを含む。図12に示す具体例では、第2遮光部24dの一部により、平面視において素子分離部25の複数の交差部25aと重ならない画素間遮光膜24の部分が構成されている。 On the other hand, the portion of the interpixel light-shielding film 24 that does not overlap with the plurality of intersections 25a of the element separation portions 25 in a plan view includes at least a second light-shielding portion 24d. In the specific example shown in FIG. 12, a part of the second light-shielding portion 24d constitutes a portion of the inter-pixel light-shielding film 24 that does not overlap with the plurality of intersections 25a of the element separation portions 25 in a plan view.

そして画素間遮光膜24のうち、平面視において素子分離部25の複数の交差部25aと重なる部分の最小高さは、平面視において素子分離部25の複数の交差部25aと重ならない部分の最大高さよりも小さい。 The minimum height of the portion of the interpixel light-shielding film 24 that overlaps with the plurality of intersections 25a of the element separation portions 25 in a plan view is the maximum of the portion that does not overlap with the plurality of intersections 25a of the element separation portions 25 in a plan view. Less than height.

図12に示す具体例では、平面視において素子分離部25の複数の交差部25aと重なる部分の最小高さは、第1遮光部24cの高さに対応する。一方、平面視において素子分離部25の複数の交差部25aと重ならない部分の最大高さは、第2遮光部24dの高さに対応する。 In the specific example shown in FIG. 12, the minimum height of the portion of the element separating portion 25 that overlaps with the plurality of intersecting portions 25a in a plan view corresponds to the height of the first light-shielding portion 24c. On the other hand, the maximum height of the portion of the element separating portion 25 that does not overlap with the plurality of intersecting portions 25a in a plan view corresponds to the height of the second light-shielding portion 24d.

上述のように、本例では、画素間遮光膜24が複数の層体(すなわち第1遮光部24c及び第2遮光部24d)を含み、これらの層体間の相対位置及び重なり状態を調整することによって、瞳補正を行いつつ、素子分離部25の露出が抑えられている。 As described above, in this example, the interpixel light-shielding film 24 includes a plurality of layers (that is, the first light-shielding portion 24c and the second light-shielding portion 24d), and adjusts the relative position and the overlapping state between these layers. As a result, the exposure of the element separation unit 25 is suppressed while performing pupil correction.

特に、本例の画素間遮光膜24のように、高さが異なる複数の遮光部を組み合わせて画素間遮光膜24を構成することにより、画素感度を向上させることが可能である。すなわち、第1遮光部24cの高さ位置を第2遮光部24dの高さ位置よりも低く設定することによって、第1遮光部24cによる入射光の遮断を低減することができ、より多量の光を対応の光電変換素子26aに入射させることができる。 In particular, it is possible to improve the pixel sensitivity by forming the inter-pixel light-shielding film 24 by combining a plurality of light-shielding portions having different heights as in the inter-pixel light-shielding film 24 of this example. That is, by setting the height position of the first light-shielding portion 24c lower than the height position of the second light-shielding portion 24d, it is possible to reduce the blocking of incident light by the first light-shielding portion 24c, and a larger amount of light can be obtained. Can be incident on the corresponding photoelectric conversion element 26a.

なお図12には、画素間遮光膜24が2層構造を有する例が示されているが、画素間遮光膜24は3以上の層構造(すなわち3以上の遮光部)を有してもよい。 Although FIG. 12 shows an example in which the inter-pixel light-shielding film 24 has a two-layer structure, the inter-pixel light-shielding film 24 may have three or more layer structures (that is, three or more light-shielding portions). ..

また画素間遮光膜24に含まれる複数の層(すなわち複数の遮光部(第1遮光部24c及び第2遮光部24d))は、互いに同じ組成を有してもよいし、互いに異なる組成を有してもよい。 Further, the plurality of layers included in the interpixel light-shielding film 24 (that is, the plurality of light-shielding portions (first light-shielding portion 24c and the second light-shielding portion 24d)) may have the same composition or different compositions from each other. You may.

[第6の例の画素間遮光膜]
本例の画素間遮光膜24において、上述の第1~第5の例の画素間遮光膜24と同一又は対応の要素には同一の符号を付し、第1~第5の例の画素間遮光膜24と共通する事項についての詳細な説明は省略する。
[Light-shielding film between pixels in the sixth example]
In the inter-pixel light-shielding film 24 of this example, the same or corresponding elements as those of the above-mentioned inter-pixel light-shielding film 24 of the first to fifth examples are designated by the same reference numerals, and between the pixels of the first to fifth examples. Detailed description of matters common to the light-shielding film 24 will be omitted.

図13Aは、第6の例の画素間遮光膜24を備える画素アレイ部11の一例の概略構成を示す拡大断面図であり、特に画角中央部における素子分離部25の交差部25aを通過する断面線(例えば図4Cの符号「IVD」参照)に沿った断面状態を示す。 FIG. 13A is an enlarged cross-sectional view showing a schematic configuration of an example of the pixel array portion 11 provided with the inter-pixel light-shielding film 24 of the sixth example, and particularly passes through the intersection portion 25a of the element separation portion 25 in the central portion of the angle of view. The cross-sectional state along the cross-sectional line (see, for example, the reference numeral “IVD” in FIG. 4C) is shown.

図13Bは、第6の例の画素間遮光膜24を備える画素アレイ部11の一例の概略構成を示す拡大断面図であり、特に画角周辺部における素子分離部25の交差部25aを通過する断面線(例えば図4Cの符号「IVD」参照)に沿った断面状態を示す。 FIG. 13B is an enlarged cross-sectional view showing a schematic configuration of an example of the pixel array portion 11 provided with the interpixel light-shielding film 24 of the sixth example, and particularly passes through the intersection portion 25a of the element separation portion 25 in the peripheral portion of the angle of view. The cross-sectional state along the cross-sectional line (see, for example, the reference numeral “IVD” in FIG. 4C) is shown.

本例では、各光透過部27が透過区画部31により区画されている。透過区画部31は、お互いに重ねられた複数の区画積層部31a、31bを有し、これらの区画積層部31a、31bのうちの少なくとも1以上が画素間遮光膜24を構成する。 In this example, each light transmitting portion 27 is partitioned by a transmitting partition portion 31. The transmission partition portion 31 has a plurality of compartment stacking portions 31a and 31b stacked on each other, and at least one or more of these compartment stacking portions 31a and 31b constitutes the inter-pixel light-shielding film 24.

図12に示す例では、透過区画部31は、カラーフィルター層23を貫通するように設けられており、第1区画積層部31a及び第2区画積層部31bを有する。 In the example shown in FIG. 12, the transmission section 31 is provided so as to penetrate the color filter layer 23, and has a first section stacking section 31a and a second section stacking section 31b.

第1区画積層部31aは素子分離部25側に位置し、第2区画積層部31bは、素子分離部25とは反対側において第1区画積層部31aに重ねられる。 The first section stacking portion 31a is located on the element separation section 25 side, and the second section stacking section 31b is stacked on the first section stacking section 31a on the side opposite to the element separation section 25.

第1区画積層部31aは、画素間遮光膜24として設けられ、平面視において素子分離部25の複数の交差部25aと重なる。第1区画積層部31aの具体的な形状及びサイズは限定されず、例えば上述の第1の例の画素間遮光膜24(図3A~図4D参照)と同様の形状及びサイズを有してもよい。 The first section laminated portion 31a is provided as an interpixel light-shielding film 24, and overlaps with a plurality of intersecting portions 25a of the element separating portions 25 in a plan view. The specific shape and size of the first section laminated portion 31a are not limited, and for example, even if they have the same shape and size as the interpixel light-shielding film 24 (see FIGS. 3A to 4D) of the first example described above. good.

第1区画積層部31a(すなわち画素間遮光膜24)は、上述の第1~第5の例の画素間遮光膜24と同様に、瞳補正のために受光領域20の中心Oからの距離に応じて素子分離部25からずれた範囲に位置しつつ、素子分離部25の複数の交差部25aを覆う。これにより素子分離部25の交差部25aにおける光の意図しない反射及び散乱に起因する混色を防ぎつつ、瞳補正を行うことができる。 The first section laminated portion 31a (that is, the inter-pixel light-shielding film 24) is located at a distance from the center O of the light-receiving region 20 for pupil correction, similarly to the inter-pixel light-shielding film 24 of the first to fifth examples described above. Correspondingly, it covers a plurality of intersecting portions 25a of the element separating portion 25 while being located in a range deviated from the element separating portion 25. As a result, it is possible to perform pupil correction while preventing color mixing due to unintended reflection and scattering of light at the intersection 25a of the element separation unit 25.

また複数の区画積層部31a、31bのうち最も素子分離部25側に位置する区画積層部31aを画素間遮光膜24として設けることによって、画素間遮光膜24の高さ範囲を抑えることができる。これにより、第1遮光部24cによる入射光の遮断を抑え、より多くの量の光を対応の光電変換素子26aに入射させて画素感度を向上させうる。 Further, by providing the partition stacking portion 31a located on the element separation portion 25 side of the plurality of compartment stacking portions 31a and 31b as the inter-pixel light-shielding film 24, the height range of the inter-pixel light-shielding film 24 can be suppressed. As a result, the blocking of the incident light by the first light-shielding portion 24c can be suppressed, and a larger amount of light can be incident on the corresponding photoelectric conversion element 26a to improve the pixel sensitivity.

一方、第2区画積層部31bは、任意の機能層として設けられる。 On the other hand, the second section laminated portion 31b is provided as an arbitrary functional layer.

したがって第2区画積層部31bは、遮光性を持つ層(すなわち画素間遮光膜24)として設けられてもよいし、遮光性を持たない層として設けられてもよい。 Therefore, the second section laminated portion 31b may be provided as a layer having a light-shielding property (that is, an inter-pixel light-shielding film 24), or may be provided as a layer having no light-shielding property.

例えば、第2区画積層部31bは、第1区画積層部31a(すなわち画素間遮光膜24)よりも低い屈折率を有する低屈折率層として設けられてもよい。この場合、より一層効果的に、混色を抑制しつつ、画素感度を向上させることができる。 For example, the second compartment laminated portion 31b may be provided as a low refractive index layer having a lower refractive index than the first compartment laminated portion 31a (that is, the interpixel light-shielding film 24). In this case, the pixel sensitivity can be improved more effectively while suppressing the color mixing.

一般に、画素間遮光膜24を高く設けることによって、隣接画素間における光の漏出に起因する混色を低減できるが、画素感度も低減する。一方、画素間遮光膜24(第1区画積層部31a)上に低屈折率層(第2区画積層部31b)を積層させることにより、混色を抑制しつつ、画素感度を向上させることができる。 Generally, by providing the inter-pixel light-shielding film 24 high, it is possible to reduce color mixing due to light leakage between adjacent pixels, but it also reduces pixel sensitivity. On the other hand, by laminating the low refractive index layer (second compartment laminated portion 31b) on the inter-pixel light-shielding film 24 (first compartment laminated portion 31a), it is possible to improve the pixel sensitivity while suppressing color mixing.

なお図13A及び図13Bに示す例では第1区画積層部31a上に一層の第2区画積層部31bが設けられているが、第1区画積層部31a上に2以上の層が積層されてもよい。 In the examples shown in FIGS. 13A and 13B, one layer of the second compartment laminated portion 31b is provided on the first compartment laminated portion 31a, but even if two or more layers are laminated on the first compartment laminated portion 31a. good.

例えば、第1区画積層部31a(すなわち画素間遮光膜24)よりも低い屈折率を有する第1低屈折率層及び第2低屈折率層(図示省略)が、区画積層部として、第1区画積層部31a上に積層されてもよい。第1低屈折率層を第1区画積層部31a上に積層し、第1低屈折率層よりも低い屈折率を有する第2低屈折率層を第1低屈折率層上に積層することで、透過区画部31の屈折率は素子分離部25に向かうに従って順次高くなる。 For example, the first low-refractive index layer and the second low-refractive index layer (not shown) having a refractive index lower than that of the first compartment laminated portion 31a (that is, the interpixel light-shielding film 24) are used as the first compartment laminated portion. It may be laminated on the laminated portion 31a. By laminating the first low refractive index layer on the first section laminated portion 31a and laminating the second low refractive index layer having a refractive index lower than that of the first low refractive index layer on the first low refractive index layer. The refractive index of the transmission section 31 gradually increases toward the element separation section 25.

この場合、混色の抑制及び画素感度の向上を、バランス良く両立することができる。 In this case, it is possible to achieve both suppression of color mixing and improvement of pixel sensitivity in a well-balanced manner.

なお、低屈折率層として設けられる上述の区画積層部は、任意の無機材料(例えばSiN、SiO及びSiON)及び有機材料(例えばスチレン系樹脂、アクリル系樹脂、スチレン-アクリル共重合系樹脂及びシクロキサン系樹脂)により構成可能である。 The above-mentioned compartmentalized laminated portion provided as the low refractive index layer includes any inorganic material (for example, SiN, SiO 2 and SiON) and an organic material (for example, styrene resin, acrylic resin, styrene-acrylic copolymer resin and styrene resin). It can be composed of a cycloxane resin).

また低屈折率層として設けられる上述の区画積層部の屈折率は、例えば1.00~1.70程度の範囲で適宜設定されてもよい。この場合、オンチップレンズ21は、例えば1.50~2.0程度の範囲で適宜設定されてもよい。 Further, the refractive index of the above-mentioned compartmentalized laminated portion provided as the low refractive index layer may be appropriately set in the range of, for example, about 1.00 to 1.70. In this case, the on-chip lens 21 may be appropriately set in the range of, for example, about 1.50 to 2.0.

以上説明したように上述の画素間遮光膜24を具備する本実施形態の固体撮像装置1によれば、瞳補正を行いつつ、素子分離部25の露出を抑え、素子分離部25の露出面での光の反射及び散乱により生じうる混色を低減し、撮影画像の画質を向上できる。 As described above, according to the solid-state imaging device 1 of the present embodiment provided with the above-mentioned interpixel light-shielding film 24, the exposure of the element separation unit 25 is suppressed while performing pupil correction, and the exposed surface of the element separation unit 25 is used. It is possible to reduce the color mixing that may occur due to the reflection and scattering of light and improve the image quality of the captured image.

本明細書で開示されている実施形態及び変形例はすべての点で例示に過ぎず限定的には解釈されないことに留意されるべきである。上述の実施形態及び変形例は、添付の特許請求の範囲及びその趣旨を逸脱することなく、様々な形態での省略、置換及び変更が可能である。例えば上述の実施形態及び変形例が全体的に又は部分的に組み合わされてもよく、また上述以外の実施形態が上述の実施形態又は変形例と組み合わされてもよい。また、本明細書に記載された本開示の効果は例示に過ぎず、その他の効果がもたらされてもよい。 It should be noted that the embodiments and variations disclosed herein are merely exemplary in all respects and are not to be construed in a limited way. The above-described embodiments and modifications can be omitted, replaced or modified in various forms without departing from the scope and purpose of the attached claims. For example, the above-described embodiments and modifications may be combined in whole or in part, and embodiments other than the above may be combined with the above-mentioned embodiments or modifications. Moreover, the effects of the present disclosure described herein are merely examples, and other effects may be brought about.

上述の技術的思想を具現化する技術的カテゴリーは限定されない。例えば上述の装置を製造する方法或いは使用する方法に含まれる1又は複数の手順(ステップ)をコンピュータに実行させるためのコンピュータプログラムによって、上述の技術的思想が具現化されてもよい。またそのようなコンピュータプログラムが記録されたコンピュータが読み取り可能な非一時的(non-transitory)な記録媒体によって、上述の技術的思想が具現化されてもよい。 The technical categories that embody the above-mentioned technical ideas are not limited. For example, the above-mentioned technical idea may be embodied by a computer program for causing a computer to execute one or a plurality of procedures (steps) included in the method of manufacturing or using the above-mentioned device. Further, the above-mentioned technical idea may be embodied by a computer-readable non-transitory recording medium in which such a computer program is recorded.

[付記]
本開示は以下の構成を取ることもできる。
[Additional Notes]
The present disclosure may also have the following structure.

[項目1]
二次元配置されて受光領域を形成する複数の光電変換素子と、
隣り合う光電変換素子の間に設けられる素子分離部と、
前記複数の光電変換素子のそれぞれに対応する複数の光透過部を区画する画素間遮光膜と、
を備え、
各光透過部の中心位置の、対応の光電変換素子の中心位置からのずれ量及びずれ方向は、前記受光領域の中心からの各光透過部の距離及び方向に応じて定まっており、
前記複数の光透過部のうちの少なくとも一部の平面視における形状及びサイズは、対応の光電変換素子の平面視における形状及びサイズとは異なっており、
前記画素間遮光膜は、平面視において、前記素子分離部の複数の交差部と重なるように設けられている
光検出装置。
[Item 1]
Multiple photoelectric conversion elements arranged two-dimensionally to form a light receiving region,
An element separation unit provided between adjacent photoelectric conversion elements and
An interpixel light-shielding film that partitions a plurality of light transmitting portions corresponding to each of the plurality of photoelectric conversion elements,
Equipped with
The amount and direction of deviation of the center position of each light transmitting portion from the center position of the corresponding photoelectric conversion element are determined according to the distance and direction of each light transmitting portion from the center of the light receiving region.
The shape and size of at least a part of the plurality of light transmitting portions in a plan view are different from the shape and size of the corresponding photoelectric conversion element in a plan view.
The interpixel light-shielding film is a photodetector provided so as to overlap a plurality of intersections of the element separation portions in a plan view.

[項目2]
前記画素間遮光膜は、平面視において、前記素子分離部の前記複数の交差部の全体と重なるように設けられている項目1に記載の光検出装置。
[Item 2]
The photodetector according to item 1, wherein the inter-pixel light-shielding film is provided so as to overlap the entire of the plurality of intersections of the element separation portion in a plan view.

[項目3]
各光透過部の平面視面積は、前記受光領域の中心からの各光透過部の距離が増大するに従って減少する項目1又は2に記載の光検出装置。
[Item 3]
The photodetector according to item 1 or 2, wherein the planar viewing area of each light transmitting portion decreases as the distance of each light transmitting portion from the center of the light receiving region increases.

[項目4]
前記画素間遮光膜は、
格子状部と、
前記格子状部と一体化し、平面視において前記素子分離部の前記複数の交差部と重なる複数の拡張部と、
を有する項目1~3のいずれかに記載の光検出装置。
[Item 4]
The interpixel light-shielding film is
Lattice part and
A plurality of expansion portions that are integrated with the grid-like portion and overlap with the plurality of intersections of the element separation portion in a plan view.
The photodetector according to any one of items 1 to 3.

[項目5]
前記複数の拡張部の各々は、三角形の平面視形状を有する項目4に記載の光検出装置。
[Item 5]
The photodetector according to item 4, wherein each of the plurality of expansion portions has a triangular planar view shape.

[項目6]
前記複数の拡張部の各々は、四角形の平面視形状を有する項目4に記載の光検出装置。
[Item 6]
The photodetector according to item 4, wherein each of the plurality of expansion portions has a quadrangular plan view shape.

[項目7]
前記複数の拡張部の各々は、円形又は楕円形の平面視形状を有する項目4に記載の光検出装置。
[Item 7]
The photodetector according to item 4, wherein each of the plurality of expansion portions has a circular or elliptical plan view shape.

[項目8]
前記画素間遮光膜は、平面視において格子形状を有する項目1~4のいずれかに記載の光検出装置。
[Item 8]
The photodetector according to any one of items 1 to 4, wherein the interpixel light-shielding film has a grid shape in a plan view.

[項目9]
前記画素間遮光膜のうち、平面視において前記素子分離部の前記複数の交差部と重なる部分の最小高さは、平面視において前記素子分離部の前記複数の交差部と重ならない部分の最大高さよりも小さい項目1~8のいずれかに記載の光検出装置。
[Item 9]
The minimum height of the portion of the interpixel light-shielding film that overlaps the plurality of intersections of the element separation portion in a plan view is the maximum height of the portion that does not overlap the plurality of intersections of the element separation portion in a plan view. The photodetector according to any one of items 1 to 8, which is smaller than the above.

[項目10]
前記画素間遮光膜は、
第1遮光部と、
少なくとも一部が前記第1遮光部に重ねられる第2遮光部と、を有する項目1~9のいずれかに記載の光検出装置。
[Item 10]
The interpixel light-shielding film is
The first shading part and
Item 6. The photodetector according to any one of Items 1 to 9, wherein the photodetector has a second light-shielding portion whose at least a part thereof is overlapped with the first light-shielding portion.

[項目11]
前記画素間遮光膜のうち、平面視において前記素子分離部の前記複数の交差部と重なる部分の最小高さは、平面視において前記素子分離部の前記複数の交差部と重ならない部分の最大高さよりも小さく、
前記画素間遮光膜のうち、平面視において前記素子分離部の前記複数の交差部と重なる部分は、少なくとも部分的に前記第1遮光部を含み、
前記画素間遮光膜のうち、平面視において前記素子分離部の前記複数の交差部と重ならない部分は、少なくとも部分的に前記第2遮光部を含む項目10に記載の光検出装置。
[Item 11]
The minimum height of the portion of the interpixel light-shielding film that overlaps the plurality of intersections of the element separation portion in a plan view is the maximum height of the portion that does not overlap the plurality of intersections of the element separation portion in a plan view. Smaller than that
The portion of the interpixel light-shielding film that overlaps the plurality of intersections of the element separation portion in a plan view includes at least a part of the first light-shielding portion.
The photodetector according to item 10, wherein the portion of the interpixel light-shielding film that does not overlap with the plurality of intersections of the element separation portion in a plan view is at least partially including the second light-shielding portion.

[項目12]
前記複数の光透過部は、透過区画部により区画されており、
前記透過区画部は、お互いに重ねられた複数の区画積層部を有し、
前記複数の区画積層部のうちの少なくとも1以上が前記画素間遮光膜である項目1~11のいずれかに記載の光検出装置。
[Item 12]
The plurality of light transmitting portions are partitioned by a transmitting partition portion, and the plurality of light transmitting portions are partitioned by a transmitting partition portion.
The transmission compartment has a plurality of compartments stacked on top of each other.
Item 6. The photodetector according to any one of Items 1 to 11, wherein at least one of the plurality of compartments and laminated portions is the interpixel light-shielding film.

[項目13]
前記複数の区画積層部のうち最も前記素子分離部側に位置する区画積層部は、平面視において、前記素子分離部の前記複数の交差部と重なる前記画素間遮光膜である項目12に記載の光検出装置。
[Item 13]
Item 12. The item 12 is the inter-pixel light-shielding film in which the partition stacking portion located closest to the element separation portion among the plurality of compartment stacking portions is a light-shielding film between pixels that overlaps with the plurality of intersections of the element separation portions in a plan view. Photodetector.

[項目14]
前記素子分離部は、絶縁材料を含む項目1~13に記載の光検出装置。
[Item 14]
The photodetector according to items 1 to 13, wherein the element separating portion includes an insulating material.

1 固体撮像装置
10 画素
11 画素アレイ部
12 垂直駆動部
13 AD変換部
14 水平駆動部
15 システム制御部
16 データ格納部
17 信号処理部
18 画素駆動線
19 出力信号線
20 受光領域
21 オンチップレンズ
22 平坦化層
23 カラーフィルター層
24 画素間遮光膜
24a 格子状部
24b 拡張部
24c 第1遮光部
24d 第2遮光部
25 素子分離部
25a 交差部
26 半導体層
26a 光電変換素子
27 光透過部
31 透過区画部
31a 第1区画積層部
31b 第2区画積層部
O 受光領域の中心
1 Solid-state image sensor 10 Pixel 11 Pixel array unit 12 Vertical drive unit 13 AD conversion unit 14 Horizontal drive unit 15 System control unit 16 Data storage unit 17 Signal processing unit 18 Pixel drive line 19 Output signal line 20 Light receiving area 21 On-chip lens 22 Flattening layer 23 Color filter layer 24 Inter-pixel light-shielding film 24a Pixel-like part 24b Expansion part 24c First light-shielding part 24d Second light-shielding part 25 Element separation part 25a Crossing part 26 Semiconductor layer 26a Photoelectric conversion element 27 Light transmission part 31 Transmission section Part 31a First section laminated section 31b Second section laminated section O Center of light receiving area

Claims (14)

二次元配置されて受光領域を形成する複数の光電変換素子と、
隣り合う光電変換素子の間に設けられる素子分離部と、
前記複数の光電変換素子のそれぞれに対応する複数の光透過部を区画する画素間遮光膜と、
を備え、
各光透過部の中心位置の、対応の光電変換素子の中心位置からのずれ量及びずれ方向は、前記受光領域の中心からの各光透過部の距離及び方向に応じて定まっており、
前記複数の光透過部のうちの少なくとも一部の平面視における形状及びサイズは、対応の光電変換素子の平面視における形状及びサイズとは異なっており、
前記画素間遮光膜は、平面視において、前記素子分離部の複数の交差部と重なるように設けられている
光検出装置。
Multiple photoelectric conversion elements arranged two-dimensionally to form a light receiving region,
An element separation unit provided between adjacent photoelectric conversion elements and
An interpixel light-shielding film that partitions a plurality of light transmitting portions corresponding to each of the plurality of photoelectric conversion elements,
Equipped with
The amount and direction of deviation of the center position of each light transmitting portion from the center position of the corresponding photoelectric conversion element are determined according to the distance and direction of each light transmitting portion from the center of the light receiving region.
The shape and size of at least a part of the plurality of light transmitting portions in a plan view are different from the shape and size of the corresponding photoelectric conversion element in a plan view.
The interpixel light-shielding film is a photodetector provided so as to overlap a plurality of intersections of the element separation portions in a plan view.
前記画素間遮光膜は、平面視において、前記素子分離部の前記複数の交差部の全体と重なるように設けられている請求項1に記載の光検出装置。 The photodetector according to claim 1, wherein the inter-pixel light-shielding film is provided so as to overlap the entire of the plurality of intersections of the element separation portion in a plan view. 各光透過部の平面視面積は、前記受光領域の中心からの各光透過部の距離が増大するに従って減少する請求項1に記載の光検出装置。 The light detection device according to claim 1, wherein the planar viewing area of each light transmitting portion decreases as the distance of each light transmitting portion from the center of the light receiving region increases. 前記画素間遮光膜は、
格子状部と、
前記格子状部と一体化し、平面視において前記素子分離部の前記複数の交差部と重なる複数の拡張部と、
を有する請求項1に記載の光検出装置。
The interpixel light-shielding film is
Lattice part and
A plurality of expansion portions that are integrated with the grid-like portion and overlap with the plurality of intersections of the element separation portion in a plan view.
The photodetector according to claim 1.
前記複数の拡張部の各々は、三角形の平面視形状を有する請求項4に記載の光検出装置。 The photodetector according to claim 4, wherein each of the plurality of expansion portions has a triangular planar view shape. 前記複数の拡張部の各々は、四角形の平面視形状を有する請求項4に記載の光検出装置。 The photodetector according to claim 4, wherein each of the plurality of expansion portions has a quadrangular plan view shape. 前記複数の拡張部の各々は、円形又は楕円形の平面視形状を有する請求項4に記載の光検出装置。 The photodetector according to claim 4, wherein each of the plurality of expansion portions has a circular or elliptical plan view shape. 前記画素間遮光膜は、平面視において格子形状を有する請求項1に記載の光検出装置。 The photodetector according to claim 1, wherein the interpixel light-shielding film has a grid shape in a plan view. 前記画素間遮光膜のうち、平面視において前記素子分離部の前記複数の交差部と重なる部分の最小高さは、平面視において前記素子分離部の前記複数の交差部と重ならない部分の最大高さよりも小さい請求項1に記載の光検出装置。 The minimum height of the portion of the interpixel light-shielding film that overlaps the plurality of intersections of the element separation portion in a plan view is the maximum height of the portion that does not overlap the plurality of intersections of the element separation portion in a plan view. The photodetector according to claim 1, which is smaller than the above. 前記画素間遮光膜は、
第1遮光部と、
少なくとも一部が前記第1遮光部に重ねられる第2遮光部と、を有する請求項1に記載の光検出装置。
The interpixel light-shielding film is
The first shading part and
The photodetector according to claim 1, further comprising a second light-shielding portion having at least a part thereof overlapped with the first light-shielding portion.
前記画素間遮光膜のうち、平面視において前記素子分離部の前記複数の交差部と重なる部分の最小高さは、平面視において前記素子分離部の前記複数の交差部と重ならない部分の最大高さよりも小さく、
前記画素間遮光膜のうち、平面視において前記素子分離部の前記複数の交差部と重なる部分は、少なくとも部分的に前記第1遮光部を含み、
前記画素間遮光膜のうち、平面視において前記素子分離部の前記複数の交差部と重ならない部分は、少なくとも部分的に前記第2遮光部を含む請求項10に記載の光検出装置。
The minimum height of the portion of the interpixel light-shielding film that overlaps the plurality of intersections of the element separation portion in a plan view is the maximum height of the portion that does not overlap the plurality of intersections of the element separation portion in a plan view. Smaller than that
The portion of the interpixel light-shielding film that overlaps the plurality of intersections of the element separation portion in a plan view includes at least a part of the first light-shielding portion.
The photodetector according to claim 10, wherein a portion of the interpixel light-shielding film that does not overlap with the plurality of intersections of the element separation portion in a plan view includes at least a part of the second light-shielding portion.
前記複数の光透過部は、透過区画部により区画されており、
前記透過区画部は、お互いに重ねられた複数の区画積層部を有し、
前記複数の区画積層部のうちの少なくとも1以上が前記画素間遮光膜である請求項1に記載の光検出装置。
The plurality of light transmitting portions are partitioned by a transmitting partition portion, and the plurality of light transmitting portions are partitioned by a transmitting partition portion.
The transmission compartment has a plurality of compartments stacked on top of each other.
The photodetector according to claim 1, wherein at least one of the plurality of compartments and laminated portions is the interpixel light-shielding film.
前記複数の区画積層部のうち最も前記素子分離部側に位置する区画積層部は、平面視において、前記素子分離部の前記複数の交差部と重なる前記画素間遮光膜である請求項12に記載の光検出装置。 12. The interpixel light-shielding film, wherein the partition stacking portion located closest to the element separation portion among the plurality of compartment stacking portions is an interpixel light-shielding film that overlaps with the plurality of intersections of the element separation portions in a plan view. Photodetector. 前記素子分離部は、絶縁材料を含む請求項1に記載の光検出装置。 The photodetector according to claim 1, wherein the element separating portion includes an insulating material.
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