JP2022102960A5 - - Google Patents

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JP2022102960A5
JP2022102960A5 JP2020218051A JP2020218051A JP2022102960A5 JP 2022102960 A5 JP2022102960 A5 JP 2022102960A5 JP 2020218051 A JP2020218051 A JP 2020218051A JP 2020218051 A JP2020218051 A JP 2020218051A JP 2022102960 A5 JP2022102960 A5 JP 2022102960A5
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plasma processing
plasma
processing apparatus
processed
processing chamber
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JP2020218051A
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JP2022102960A (en
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Priority to JP2020218051A priority Critical patent/JP2022102960A/en
Priority claimed from JP2020218051A external-priority patent/JP2022102960A/en
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上記目的を達成するために、本発明に係るプラズマ処理装置は、被処理物を殺菌処理するプラズマ処理装置であって、供給された誘導ガスから大気圧においてプラズマを生成するプラズマ生成部と、定の搬送方向に沿って前記被処理物を通過させるプラズマ処理室と、を備え、前記プラズマ生成部と前記プラズマ処理室とは、隔離壁により隔てられており、前記隔離壁には、前記プラズマ生成部と前記プラズマ処理室とを連通する1又は複数の貫通孔が形成され、前記プラズマ生成部において生成されたプラズマは、前記貫通孔を介して前記プラズマ処理室に導入されて前記被処理物を殺菌処理する。 In order to achieve the above object, a plasma processing apparatus according to the present invention is a plasma processing apparatus for sterilizing an object to be processed, comprising: a plasma generation unit for generating plasma at atmospheric pressure from a supplied induction gas ; a plasma processing chamber through which the object to be processed passes along a predetermined transport direction, wherein the plasma generation unit and the plasma processing chamber are separated by a partition wall, and the partition wall includes the plasma One or a plurality of through-holes are formed to communicate between the generation unit and the plasma processing chamber, and plasma generated in the plasma generation unit is introduced into the plasma processing chamber through the through-holes to the object to be processed. be sterilized.

本発明は、プラズマ生成部とプラズマ処理室とが隔離され、大気圧においてプラズマが安定して生成されることにより、被処理物がプラズマ処理室内を搬送される間に、被処理物の全面が大気圧プラズマに晒されるため、被処理物を高速で殺菌することができる。 According to the present invention, the plasma generating section and the plasma processing chamber are separated from each other, and the plasma is stably generated at atmospheric pressure. Since it is exposed to atmospheric pressure plasma, the object to be treated can be sterilized at high speed.

Claims (8)

被処理物を殺菌処理するプラズマ処理装置であって、
供給された誘導ガスから大気圧においてプラズマを生成するプラズマ生成部と、
定の搬送方向に沿って前記被処理物を通過させるプラズマ処理室と、
を備え、
前記プラズマ生成部と前記プラズマ処理室とは、隔離壁により隔てられており、
前記隔離壁には、前記プラズマ生成部と前記プラズマ処理室とを連通する1又は複数の貫通孔が形成され、
前記プラズマ生成部において生成されたプラズマは、前記貫通孔を介して前記プラズマ処理室に導入されて前記被処理物を殺菌処理することを特徴とするプラズマ処理装置。
A plasma processing apparatus for sterilizing an object to be processed,
a plasma generator that generates plasma at atmospheric pressure from the supplied induction gas ;
a plasma processing chamber through which the object to be processed passes along a predetermined transport direction;
with
The plasma generation unit and the plasma processing chamber are separated by a partition wall,
one or a plurality of through-holes are formed in the isolation wall to communicate the plasma generation unit and the plasma processing chamber;
A plasma processing apparatus, wherein the plasma generated in the plasma generation unit is introduced into the plasma processing chamber through the through hole to sterilize the object to be processed.
前記貫通孔には、前記誘導ガスの流れ方向を前記搬送方向の排出側に向かうように案内するガイド部が設けられていることを特徴とする請求項に記載のプラズマ処理装置。 2. The plasma processing apparatus according to claim 1 , wherein the through hole is provided with a guide portion for guiding the flow direction of the induction gas toward the discharge side in the transport direction. 前記貫通孔の開口面積は、前記誘導ガスの流れ方向の上流側から下流側に向かって拡大するように設定されていることを特徴とする請求項又はに記載のプラズマ処理装置。 3. The plasma processing apparatus according to claim 1 , wherein the opening area of said through-hole is set so as to expand from upstream to downstream in the flow direction of said induction gas. 前記貫通孔は、前記誘導ガスの流れ方向の上流側から下流側に向かって前記搬送方向と直交する幅方向の外側に傾斜していることを特徴とする請求項乃至の何れか1項に記載のプラズマ処理装置。 4. The through hole is inclined outward in a width direction orthogonal to the conveying direction from upstream to downstream in a flow direction of the induction gas. 3. The plasma processing apparatus according to . 前記プラズマ処理室内を通過する前記被処理物を支持する支持部をさらに備え、further comprising a support for supporting the object to be processed passing through the plasma processing chamber;
前記プラズマ処理室内には、通過する前記被処理物を支持する支持部が設けられており、A support is provided in the plasma processing chamber for supporting the passing object to be processed,
前記被処理物の表面において前記支持部により支持されない非支持範囲は、前記被処理物の通過に伴って変更され、前記プラズマ処理室内の前記被処理物の通過が完了した時点で、前記被処理物の表面の全ての領域に及ぶように設定されていることを特徴とする請求項1に記載のプラズマ処理装置。A non-supported area of the surface of the object to be processed that is not supported by the supporting portion is changed as the object to be processed passes through the plasma processing chamber. 2. The plasma processing apparatus according to claim 1, wherein the plasma processing apparatus is set so as to cover the entire surface area of the object.
前記誘導ガスは、水蒸気を含むことを特徴とする請求項乃至5の何れか1項に記載のプラズマ処理装置。 6. The plasma processing apparatus according to any one of claims 1 to 5, wherein the induction gas contains water vapor. 請求項1乃至6の何れか1項に記載のプラズマ処理装置を内部に備えた貨幣処理装置であって、
前記被処理物は、貨幣であり、
前記プラズマ処理装置は、外部から投入された前記貨幣を殺菌処理することを特徴とする貨幣処理装置。
A money processing apparatus having therein the plasma processing apparatus according to any one of claims 1 to 6,
The object to be processed is money,
A money processing device, wherein the plasma processing device sterilizes the money inserted from the outside .
被処理物を殺菌処理するプラズマ処理装置を用いたプラズマ処理方法であって、A plasma processing method using a plasma processing apparatus for sterilizing an object to be processed,
前記プラズマ処理装置は、The plasma processing apparatus is
供給された誘導ガスから大気圧においてプラズマを生成するプラズマ生成部と、a plasma generator that generates plasma at atmospheric pressure from the supplied induction gas;
所定の搬送方向に沿って前記被処理物を通過させるプラズマ処理室と、a plasma processing chamber through which the object to be processed passes along a predetermined transport direction;
を備え、with
前記プラズマ生成部と前記プラズマ処理室とは、隔離壁により隔てられており、The plasma generation unit and the plasma processing chamber are separated by a partition wall,
前記隔離壁には、前記プラズマ生成部と前記プラズマ処理室とを連通する1又は複数の貫通孔が形成され、one or a plurality of through-holes are formed in the isolation wall to communicate the plasma generation unit and the plasma processing chamber;
前記プラズマ生成部において生成されたプラズマは、前記貫通孔を介して前記プラズマ処理室に導入されて前記被処理物を殺菌処理することを特徴とするプラズマ処理方法。A plasma processing method, wherein the plasma generated in the plasma generation unit is introduced into the plasma processing chamber through the through hole to sterilize the object to be processed.
JP2020218051A 2020-12-25 2020-12-25 Plasma treatment apparatus and coin treatment apparatus Pending JP2022102960A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2020218051A JP2022102960A (en) 2020-12-25 2020-12-25 Plasma treatment apparatus and coin treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020218051A JP2022102960A (en) 2020-12-25 2020-12-25 Plasma treatment apparatus and coin treatment apparatus

Publications (2)

Publication Number Publication Date
JP2022102960A JP2022102960A (en) 2022-07-07
JP2022102960A5 true JP2022102960A5 (en) 2023-07-07

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JP2020218051A Pending JP2022102960A (en) 2020-12-25 2020-12-25 Plasma treatment apparatus and coin treatment apparatus

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JP (1) JP2022102960A (en)

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