JP2022039341A - Coloring composition, color filter, liquid crystal display device, and solid-state imaging device - Google Patents
Coloring composition, color filter, liquid crystal display device, and solid-state imaging device Download PDFInfo
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- JP2022039341A JP2022039341A JP2020144320A JP2020144320A JP2022039341A JP 2022039341 A JP2022039341 A JP 2022039341A JP 2020144320 A JP2020144320 A JP 2020144320A JP 2020144320 A JP2020144320 A JP 2020144320A JP 2022039341 A JP2022039341 A JP 2022039341A
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- -1 color filter Substances 0.000 title claims abstract description 253
- 239000000203 mixture Substances 0.000 title claims abstract description 103
- 238000004040 coloring Methods 0.000 title claims abstract description 66
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 17
- 238000003384 imaging method Methods 0.000 title 1
- 239000000049 pigment Substances 0.000 claims abstract description 111
- 229920005989 resin Polymers 0.000 claims abstract description 110
- 239000011347 resin Substances 0.000 claims abstract description 110
- 239000000178 monomer Substances 0.000 claims abstract description 80
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims abstract description 46
- 239000004094 surface-active agent Substances 0.000 claims abstract description 43
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 40
- 229910052751 metal Inorganic materials 0.000 claims abstract description 34
- 239000002184 metal Substances 0.000 claims abstract description 34
- 239000003086 colorant Substances 0.000 claims abstract description 33
- 150000003839 salts Chemical class 0.000 claims abstract description 31
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 claims abstract description 28
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229920001577 copolymer Polymers 0.000 claims abstract description 15
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 12
- 125000001033 ether group Chemical group 0.000 claims abstract description 11
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 8
- 239000011701 zinc Substances 0.000 claims abstract description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052802 copper Inorganic materials 0.000 claims abstract description 7
- 239000010949 copper Substances 0.000 claims abstract description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052742 iron Inorganic materials 0.000 claims abstract description 6
- 229910052709 silver Inorganic materials 0.000 claims abstract description 6
- 239000004332 silver Substances 0.000 claims abstract description 6
- 125000001424 substituent group Chemical group 0.000 claims description 40
- 239000000758 substrate Substances 0.000 claims description 30
- 125000003118 aryl group Chemical group 0.000 claims description 24
- 125000003545 alkoxy group Chemical group 0.000 claims description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- 125000005843 halogen group Chemical group 0.000 claims description 13
- 150000002739 metals Chemical class 0.000 claims description 3
- 230000006866 deterioration Effects 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 83
- 150000001875 compounds Chemical class 0.000 description 73
- 239000000243 solution Substances 0.000 description 70
- 239000000126 substance Substances 0.000 description 56
- 238000006243 chemical reaction Methods 0.000 description 46
- 239000010408 film Substances 0.000 description 43
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 41
- 235000002639 sodium chloride Nutrition 0.000 description 40
- 239000006185 dispersion Substances 0.000 description 35
- 238000000034 method Methods 0.000 description 35
- 239000002253 acid Substances 0.000 description 33
- 239000000047 product Substances 0.000 description 31
- 229910052757 nitrogen Inorganic materials 0.000 description 29
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 22
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 21
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 20
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 20
- 150000001879 copper Chemical class 0.000 description 20
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 20
- 239000003999 initiator Substances 0.000 description 19
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 18
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 18
- 239000003963 antioxidant agent Substances 0.000 description 18
- 235000006708 antioxidants Nutrition 0.000 description 18
- 230000007423 decrease Effects 0.000 description 17
- 238000010438 heat treatment Methods 0.000 description 17
- 239000010410 layer Substances 0.000 description 17
- 239000003960 organic solvent Substances 0.000 description 17
- 125000004432 carbon atom Chemical group C* 0.000 description 16
- 238000006116 polymerization reaction Methods 0.000 description 16
- 230000003078 antioxidant effect Effects 0.000 description 15
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 15
- 239000002904 solvent Substances 0.000 description 15
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 14
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 12
- 230000014759 maintenance of location Effects 0.000 description 12
- 229920001187 thermosetting polymer Polymers 0.000 description 12
- 150000003573 thiols Chemical group 0.000 description 12
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 11
- 239000004593 Epoxy Substances 0.000 description 11
- 239000012986 chain transfer agent Substances 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 11
- 238000001816 cooling Methods 0.000 description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 11
- FNYWFRSQRHGKJT-UHFFFAOYSA-N 3-ethyl-3-[(3-ethyloxetan-3-yl)methoxymethyl]oxetane Chemical compound C1OCC1(CC)COCC1(CC)COC1 FNYWFRSQRHGKJT-UHFFFAOYSA-N 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 9
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 9
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 9
- 150000001412 amines Chemical class 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 150000002989 phenols Chemical class 0.000 description 9
- 229940067265 pigment yellow 138 Drugs 0.000 description 9
- 229920000647 polyepoxide Polymers 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 239000011780 sodium chloride Substances 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 8
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 8
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- 239000007795 chemical reaction product Substances 0.000 description 8
- 239000000975 dye Substances 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 239000003112 inhibitor Substances 0.000 description 8
- 229910017053 inorganic salt Inorganic materials 0.000 description 8
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 8
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 7
- 239000004925 Acrylic resin Substances 0.000 description 7
- 229920000178 Acrylic resin Polymers 0.000 description 7
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 7
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical class OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 7
- 239000002202 Polyethylene glycol Substances 0.000 description 7
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 239000003822 epoxy resin Substances 0.000 description 7
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 7
- 150000002894 organic compounds Chemical class 0.000 description 7
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 7
- 229920001223 polyethylene glycol Polymers 0.000 description 7
- 239000003381 stabilizer Substances 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 6
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- 150000008065 acid anhydrides Chemical class 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 6
- 229910001873 dinitrogen Inorganic materials 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 6
- 238000003801 milling Methods 0.000 description 6
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical class OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- 150000003751 zinc Chemical class 0.000 description 6
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 5
- 239000005977 Ethylene Substances 0.000 description 5
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 5
- 229920000877 Melamine resin Polymers 0.000 description 5
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 5
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 5
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 5
- 239000007983 Tris buffer Substances 0.000 description 5
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 239000012965 benzophenone Substances 0.000 description 5
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 5
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- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 5
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- 238000005259 measurement Methods 0.000 description 5
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 5
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 5
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 5
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 4
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
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- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
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- 230000002378 acidificating effect Effects 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 150000001450 anions Chemical class 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
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- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
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- 125000001153 fluoro group Chemical group F* 0.000 description 4
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- 150000004678 hydrides Chemical class 0.000 description 4
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- 239000012321 sodium triacetoxyborohydride Substances 0.000 description 4
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 4
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- 229910052717 sulfur Inorganic materials 0.000 description 4
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 4
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 4
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 3
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 3
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical class C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 3
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 3
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- SFESXIFARCRODZ-UHFFFAOYSA-N trihydroxy-(8-methylnonyl)-phenyl-$l^{5}-phosphane Chemical compound CC(C)CCCCCCCP(O)(O)(O)C1=CC=CC=C1 SFESXIFARCRODZ-UHFFFAOYSA-N 0.000 description 1
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- 239000010937 tungsten Substances 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
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- 229920002554 vinyl polymer Polymers 0.000 description 1
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- 238000005406 washing Methods 0.000 description 1
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- 238000009736 wetting Methods 0.000 description 1
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- YZYKBQUWMPUVEN-UHFFFAOYSA-N zafuleptine Chemical compound OC(=O)CCCCCC(C(C)C)NCC1=CC=C(F)C=C1 YZYKBQUWMPUVEN-UHFFFAOYSA-N 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Images
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- Liquid Crystal (AREA)
Abstract
Description
本発明は、カラーフィルタ等に使用する着色組成物に関する。 The present invention relates to a coloring composition used for a color filter or the like.
一般的にカラーフィルタは、ガラス等の透明な基板の表面に形成された、赤色フィルタ層(R)、緑色フィルタ層(G)、及び青色フィルタ層(B)からなる微細な帯(ストライプ)状のフィルタセグメント(画素)を平行又は交差して配置したもの、あるいは微細なフィルタセグメントを縦横一定の配列で配置したものからなっている。フィルタセグメントは、数ミクロンから数100ミクロンと微細であり、しかも色相毎に所定の配列で整然と配置されている。 Generally, a color filter has a fine band (striped) shape composed of a red filter layer (R), a green filter layer (G), and a blue filter layer (B) formed on the surface of a transparent substrate such as glass. The filter segments (pixels) of the above are arranged in parallel or crossed each other, or fine filter segments are arranged in a constant vertical and horizontal arrangement. The filter segments are as fine as several microns to several hundreds of microns, and are arranged in a predetermined arrangement for each hue.
カラーフィルタ中の緑色フィルタセグメントには、着色剤として緑色顔料以外に、色を調整する着色剤(調色用着色剤)として黄色顔料が用いられており、C.I.ピグメントイエロー138、C.I.ピグメントイエロー139、C.I.ピグメントイエロー150、C.I.ピグメントイエロー185等が使用されている。そのなかでも、高い透過率が得られる点で、キノフタロン顔料であるC.I.ピグメントイエロー138が用いられることが多い。しかし、キノフタロン顔料であるC.I.ピグメントイエロー138は、230℃以上の熱を加えたときに異物が発生するという課題があった。 In the green filter segment in the color filter, a yellow pigment is used as a color adjusting agent (coloring agent for toning) in addition to the green pigment as a colorant. I. Pigment Yellow 138, C.I. I. Pigment Yellow 139, C.I. I. Pigment Yellow 150, C.I. I. Pigment Yellow 185 and the like are used. Among them, C.I. I. Pigment Yellow 138 is often used. However, the quinophthalone pigment, C.I. I. Pigment Yellow 138 has a problem that foreign matter is generated when heat of 230 ° C. or higher is applied.
さらに、緑色顔料として広く用いられているC.I.ピグメントグリーン7、C.I.ピグメントグリーン36、C.I.ピグメントグリーン58、C.I.ピグメントグリーン59、C.I.ピグメントグリーン62、C.I.ピグメントグリーン63、特開2008-19383号公報、特開2007-320986号公報、特開2004-70342号公報等に記載の亜鉛フタロシアニン顔料、特許第4893859号公報、特開2016-153481号公報、特開2017-197685号公報等のフタロシアニン顔料と、黄色顔料を使用した緑色フィルタセグメントは、バックライトが当たると、明度が低下する問題(例えば、非特許文献1参照)や、電圧保持率の低下が発生し液晶表示装置の駆動に悪影響を及ぼすという問題があった。 Furthermore, C.I., which is widely used as a green pigment. I. Pigment Green 7, C.I. I. Pigment Green 36, C.I. I. Pigment Green 58, C.I. I. Pigment Green 59, C.I. I. Pigment Green 62, C.I. I. Pigment Green 63, Japanese Patent Application Laid-Open No. 2008-13983, Japanese Patent Application Laid-Open No. 2007-320986, Japanese Patent Application Laid-Open No. 2004-070342, etc. The phthalocyanine pigment of Japanese Patent Publication No. 2017-197685 and the green filter segment using the yellow pigment have a problem that the brightness decreases when exposed to a backlight (see, for example, Non-Patent Document 1) and a decrease in the voltage retention rate. There is a problem that it occurs and adversely affects the drive of the liquid crystal display device.
上記の問題を解決するために、様々な取り組みがなされている。例えば、特許文献1には、耐熱性、コントラスト比に優れた緑色カラーペーストとして、C.I.ピグメントイエロー138と、C.I.ピグメントイエロー138のスルホン化誘導体を含む緑色カラーペーストが開示されている。また、特許文献2には、コントラスト、明度の向上した顔料分散組成物として、平均一次粒子径が10~30nmの顔料と、水酸基、カルボン酸基、スルホン酸基、アミノ基及びそれらの塩から選択される基を少なくとも一つ有するキノフタロン化合物を含む顔料分散組成物が開示されている。 Various efforts have been made to solve the above problems. For example, Patent Document 1 describes C.I. as a green color paste having excellent heat resistance and contrast ratio. I. Pigment Yellow 138 and C.I. I. A green color paste containing a sulfonated derivative of Pigment Yellow 138 is disclosed. Further, in Patent Document 2, as a pigment dispersion composition having improved contrast and brightness, a pigment having an average primary particle size of 10 to 30 nm, a hydroxyl group, a carboxylic acid group, a sulfonic acid group, an amino group and salts thereof are selected. A pigment dispersion composition containing a quinophthalone compound having at least one group is disclosed.
また、明度低下を解決する取り組みとして、特許文献3には、着色剤としてフタロシアニン系着色剤、黄色着色剤、及び着色剤とは異なる成分である金属化合物を含む着色性樹脂組成物が開示されている。 Further, as an effort to solve the decrease in brightness, Patent Document 3 discloses a phthalocyanine-based colorant, a yellow colorant, and a colorable resin composition containing a metal compound which is a component different from the colorant. There is.
しかし、引用文献1および2の着色組成物は、異物発生の抑制は満足いくものではなく、また、明度低下、及び電圧保持率の低下に関しては考慮されていなかった。また、引用文献3の着色組成物は、明度低下の抑制は満足できる水準では無かった。また、異物発生の抑制、及び電圧保持率の低下に関しては考慮されていなかった。 However, in the colored compositions of References 1 and 2, the suppression of the generation of foreign substances is not satisfactory, and the decrease in brightness and the decrease in the voltage retention rate are not considered. In addition, the coloring composition of Cited Document 3 was not at a satisfactory level in suppressing the decrease in lightness. In addition, no consideration was given to suppressing the generation of foreign matter and reducing the voltage holding rate.
本発明は、異物の発生が少なく、かつ電圧保持率に優れ、明度低下が少ないカラーフィルタを形成できる着色組成物の提供を目的とする。 An object of the present invention is to provide a coloring composition capable of forming a color filter having less foreign matter, excellent voltage retention, and less decrease in brightness.
本発明の着色組成物は、着色剤(A)、スルホ基を有するキノフタロン化合物の金属塩(B)、アルカリ可溶性樹脂(C)、および界面活性剤(D)を含む着色組成物であって、
前記着色剤(A)が、フタロシアニン顔料(A1)、およびキノフタロン顔料(A2)を含み、
前記スルホ基を有するキノフタロン化合物の金属塩(B)の金属が、銅、銀、亜鉛、鉄、およびアルミニウムからなる群より選ばれる1種以上の金属であり、
前記界面活性剤(D)が、フッ素化アルキル基およびポリ(パーフルオロアルキレンエーテル)鎖のうち1種以上を有する単量体(d1)と、その他単量体(d2)との共重合体である界面活性剤(D1)を含む。
The coloring composition of the present invention is a coloring composition containing a coloring agent (A), a metal salt (B) of a quinophthalone compound having a sulfo group, an alkali-soluble resin (C), and a surfactant (D).
The colorant (A) contains a phthalocyanine pigment (A1) and a quinophthalone pigment (A2).
The metal of the metal salt (B) of the quinophthalone compound having a sulfo group is one or more metals selected from the group consisting of copper, silver, zinc, iron, and aluminum.
The surfactant (D) is a copolymer of a monomer (d1) having at least one of a fluorinated alkyl group and a poly (perfluoroalkylene ether) chain and another monomer (d2). Contains a surfactant (D1).
上記の本発明により、異物の発生が少なく、かつ電圧保持率に優れ、明度低下が少ないカラーフィルタを形成できる着色組成物、カラーフィルタ、液晶表示装置、および固体撮像素子を提供できる。 INDUSTRIAL APPLICABILITY According to the present invention, it is possible to provide a coloring composition, a color filter, a liquid crystal display device, and a solid-state image sensor capable of forming a color filter having less foreign matter generation, excellent voltage retention, and less decrease in brightness.
以下、本発明を実施するための形態について詳細に説明する。なお、本発明は、以下の実施形態に制限されるものではなく、その要旨の範囲内で種々変形して実施することができる。 Hereinafter, embodiments for carrying out the present invention will be described in detail. The present invention is not limited to the following embodiments, and can be variously modified and implemented within the scope of the gist thereof.
本明細書では、「(メタ)アクリロイル」、「(メタ)アクリル」、「(メタ)アクリル酸」、「(メタ)アクリレート」、又は「(メタ)アクリルアミド」と表記した場合には、特に説明がない限り、それぞれ、「アクリロイル及び/又はメタクリロイル」、「アクリル及び/又はメタクリル」、「アクリル酸及び/又はメタクリル酸」、「アクリレート及び/又はメタクリレート」、又は「アクリルアミド及び/又はメタクリルアミド」を表すものとする。「C.I.」は、カラーインデックス(C.I.)を意味する。単量体はエチレン性不飽和基含含有化合物である。 In the present specification, the term "(meth) acryloyl", "(meth) acrylic", "(meth) acrylic acid", "(meth) acrylate", or "(meth) acrylamide" is particularly described. Unless there is an acryloyl and / or methacrylic acid, acrylic and / or methacrylic acid, acrylic acid and / or methacrylic acid, acrylate and / or methacrylate, or acrylamide and / or methacrylamide, respectively. It shall be represented. "CI" means a color index (CI). The monomer is an ethylenically unsaturated group-containing compound.
<着色組成物>
本発明の一実施形態は、着色組成物に係わる。本発明の着色組成物は、着色剤(A)、スルホ基を有するキノフタロン化合物の金属塩(B)、アルカリ可溶性樹脂(C)、および界面活性剤(D)を含む着色組成物であって、
前記着色剤(A)が、フタロシアニン顔料(A1)、およびキノフタロン顔料(A2)を含み、
前記スルホ基を有するキノフタロン化合物の金属塩(B)の金属が、銅、銀、亜鉛、鉄、およびアルミニウムからなる群より選ばれる1種以上の金属であり、
前記界面活性剤(D)が、フッ素化アルキル基およびポリ(パーフルオロアルキレンエーテル)鎖のうち1種以上を有する単量体(d1)(以下、単量体(d1)ともいう)と、その他単量体(d2)との共重合体である界面活性剤(D1)を含む。
<Coloring composition>
One embodiment of the present invention relates to a coloring composition. The coloring composition of the present invention is a coloring composition containing a coloring agent (A), a metal salt (B) of a quinophthalone compound having a sulfo group, an alkali-soluble resin (C), and a surfactant (D).
The colorant (A) contains a phthalocyanine pigment (A1) and a quinophthalone pigment (A2).
The metal of the metal salt (B) of the quinophthalone compound having a sulfo group is one or more metals selected from the group consisting of copper, silver, zinc, iron, and aluminum.
The surfactant (D) is a monomer (d1) having at least one of a fluorinated alkyl group and a poly (perfluoroalkylene ether) chain (hereinafter, also referred to as a monomer (d1)), and others. It contains a surfactant (D1) which is a copolymer with the monomer (d2).
以下、一実施形態の着色組成物に含まれるか、又は含まれ得る成分を詳細に説明する。 Hereinafter, the components contained in or may be contained in the coloring composition of one embodiment will be described in detail.
[着色剤(A)]
(フタロシアニン顔料(A1))
本発明の着色組成物は、着色剤(A)としてフタロシアニン顔料(A1)を含む。
[Colorant (A)]
(Futarusinin pigment (A1))
The coloring composition of the present invention contains a phthalocyanine pigment (A1) as a coloring agent (A).
フタロシアニン顔料(A1)は、具体的には、カラーインデックス(C.I.;The Society of Dyers and Colourists 発行)においてピグメント(Pigment)に分類されている化合物として、C.I.ピグメントグリーン7,10,36,37,58,59,62,63、特開2008-19383号公報、特開2007-320986号公報、特開2004-70342号公報等に記載の亜鉛フタロシアニン顔料、特許第4893859号公報、特開2016-57635号公報、特開2016-153481号公報、特開2017-197685号公報等に記載のアルミニウムフタロシアニン、C.I.ビグメントブルー15,15:1,15:2,15:3,15:4等が挙げられる。これらの中でも、C.I.ピグメントグリーン36,58,59,62,63、特開2016-57635号公報、特開2016-153481号公報、特開2017-197685号公報に記載のフタロシアニン顔料が好ましい。 The phthalocyanine pigment (A1) is specifically classified as a Pigment in the Color Index (CI; The Society of Dyers and Colorists). I. Pigment Green 7,10,36,37,58,59,62,63, Japanese Patent Application Laid-Open No. 2008-19383, Japanese Patent Application Laid-Open No. 2007-320986, Japanese Patent Laid-Open No. 2004-70342, etc. The aluminum phthalocyanines, C.I. I. Bigment blue 15, 15: 1, 15: 2, 15: 3, 15: 4, etc. can be mentioned. Among these, C.I. I. The phthalocyanine pigments described in Pigment Green 36,58,59,62,63, JP-A-2016-57635, JP-A-2016-153481, and JP-A-2017-197685 are preferable.
フタロシアニン顔料(A1)は、単独又は2種類以上を併用して使用できる。 The phthalocyanine pigment (A1) can be used alone or in combination of two or more.
フタロシアニン顔料(A1)の含有量は、着色剤(A)100質量%中、20~90質量%が好ましく、30~80質量%がより好ましい。 The content of the phthalocyanine pigment (A1) is preferably 20 to 90% by mass, more preferably 30 to 80% by mass, based on 100% by mass of the colorant (A).
(キノフタロン顔料(A2))
本発明の着色組成物は、着色剤(A)としてキノフタロン顔料(A2)を含む。
(Kinophthalone pigment (A2))
The coloring composition of the present invention contains a quinophthalone pigment (A2) as a coloring agent (A).
キノフタロン顔料(A2)は、下記一般式(1)で表わされるキノフタロン顔料を含むことが好ましい。 The quinophthalone pigment (A2) preferably contains a quinophthalone pigment represented by the following general formula (1).
一般式(1)
一般式(1)において、R1~R13は、それぞれ独立に、水素原子、ハロゲン原子、置換基を有しても良いアルキル基、置換基を有しても良いアルコキシル基、置換基を有しても良いアリール基を示す。R1~R4、及び/又は、R5~R8の隣接した基は、一体となって、置換基を有してもよい芳香環を形成してもよい。 In the general formula (1), R 1 to R 13 each independently have a hydrogen atom, a halogen atom, an alkyl group which may have a substituent, an alkoxyl group which may have a substituent, and a substituent. Indicates a optionally aryl group. Adjacent groups of R 1 to R 4 and / or R 5 to R 8 may be combined to form an aromatic ring that may have a substituent.
一般式(1)におけるR1~R13の置換基について説明する。 The substituents of R 1 to R 13 in the general formula (1) will be described.
ハロゲン原子としては、フッ素、塩素、臭素、ヨウ素が挙げられる。 Examples of the halogen atom include fluorine, chlorine, bromine and iodine.
また、置換基を有しても良いアルキル基としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ネオペンチル基、n-へキシル基、n-オクチル基、ステアリル基、2-エチルへキシル基等の直鎖又は分岐アルキル基の他、トリクロロメチル基、トリフルオロメチル基、2,2,2-トリフルオロエチル基、2,2-ジブロモエチル基、2,2,3,3-テトラフルオロプロピル基、2-エトキシエチル基、2-ブトキシエチル基、2-ニトロプロピル基、ベンジル基、4-メチルベンジル基、4-tert-ブチルベンジル基、4-メトキシベンジル基、4-ニトロベンジル基、2,4-ジクロロベンジル基等の置換基を有するアルキル基が挙げられる。 Examples of the alkyl group which may have a substituent include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group and an n-octyl group. In addition to linear or branched alkyl groups such as groups, stearyl groups and 2-ethylhexyl groups, trichloromethyl groups, trifluoromethyl groups, 2,2,2-trifluoroethyl groups, 2,2-dibromoethyl groups, 2,2,3,3-tetrafluoropropyl group, 2-ethoxyethyl group, 2-butoxyethyl group, 2-nitropropyl group, benzyl group, 4-methylbenzyl group, 4-tert-butylbenzyl group, 4- Examples thereof include an alkyl group having a substituent such as a methoxybenzyl group, a 4-nitrobenzyl group and a 2,4-dichlorobenzyl group.
また、置換基を有しても良いアルコキシル基としては、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、n-ブトキシ基、イソブチルオキシ基、tert-ブチルオキシ基、ネオペンチルオキシ基、2,3-ジメチル-3-ペントキシ、n-へキシルオキシ基、n-オクチルオキシ基、ステアリルオキシ基、2-エチルへキシルオキシ基等の直鎖又は分岐アルコキシル基の他、トリクロロメトキシ基、トリフルオロメトキシ基、2,2,2-トリフルオロエトキシ基、2,2,3,3-テトラフルオロプロピルオキシ基、2,2-ジトリフルオロメチルプロポキシ基、2-エトキシエトキシ基、2-ブトキシエトキシ基、2-ニトロプロポキシ基、ベンジルオキシ基等の置換基を有するアルコキシル基が挙げられる。 Examples of the alkoxyl group that may have a substituent include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, an n-butoxy group, an isobutyloxy group, a tert-butyloxy group, a neopentyloxy group, and a few. -In addition to linear or branched alkoxyl groups such as dimethyl-3-pentoxy, n-hexyloxy group, n-octyloxy group, stearyloxy group and 2-ethylhexyloxy group, trichloromethoxy group, trifluoromethoxy group, 2 , 2,2-Trifluoroethoxy group, 2,2,3,3-tetrafluoropropyloxy group, 2,2-ditrifluoromethylpropoxy group, 2-ethoxyethoxy group, 2-butoxyethoxy group, 2-nitropropoxy Examples thereof include an alkoxyl group having a substituent such as a group and a benzyloxy group.
また、置換基を有しても良いアリール基としては、フェニル基、ナフチル基、アントラニル基等のアリール基の他、p-メチルフェニル基、p-ブロモフェニル基、p-ニトロフェニル基、p-メトキシフェニル基、2,4-ジクロロフェニル基、ペンタフルオロフェニル基、2-アミノフェニル基、2-メチル-4-クロロフェニル基、4-ヒドロキシ-1-ナフチル基、6-メチル-2-ナフチル基、4,5,8-トリクロロ-2-ナフチル基、アントラキノニル基、2-アミノアントラキノニル基等の置換基を有するアリール基が挙げられる。 Examples of the aryl group which may have a substituent include an aryl group such as a phenyl group, a naphthyl group and an anthranyl group, as well as a p-methylphenyl group, a p-bromophenyl group, a p-nitrophenyl group and p-. Methoxyphenyl group, 2,4-dichlorophenyl group, pentafluorophenyl group, 2-aminophenyl group, 2-methyl-4-chlorophenyl group, 4-hydroxy-1-naphthyl group, 6-methyl-2-naphthyl group, 4 , 5,8-Trichloro-2-naphthyl group, anthraquinonyl group, 2-aminoanthraquinonyl group and other aryl groups having substituents can be mentioned.
一般式(1)のR1~R4、及び/又は、R5~R8の隣接した基は、一体となって、置換基を有してもよい芳香環を形成する。ここでいう芳香環とは、炭化水素芳香環及び複素芳香環が挙げられる。炭化水素芳香環としては、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環等が挙げられる。また、複素芳香環としては、ピリジン環、ピラジン環、ピロール環、キノリン環、キノキサリン環、フラン環、ベンゾフラン環、チオフェン環、ベンゾチオフェン環、オキサゾール環、チアゾール環、イミダゾール環、ピラゾール環、インドール環、カルバゾール環などが挙げられる。 Adjacent groups of R 1 to R 4 and / or R 5 to R 8 of the general formula (1) together form an aromatic ring which may have a substituent. Examples of the aromatic ring here include a hydrocarbon aromatic ring and a complex aromatic ring. Examples of the hydrocarbon aromatic ring include a benzene ring, a naphthalene ring, an anthracene ring, and a phenanthrene ring. Examples of the heteroaromatic ring include a pyridine ring, a pyrazine ring, a pyrrole ring, a quinoline ring, a quinoxalin ring, a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, an oxazole ring, a thiazole ring, an imidazole ring, a pyrazole ring, and an indole ring. , Carbazole ring and the like.
キノフタロン顔料(A2)は、C.I.ピグメントイエロー138、又は下記一般式(2)~(4)で表されるキノフタロン顔料のいずれかであることが好ましい。ここで、R14~R28、R29~R43、R44~R60における、水素原子、ハロゲン原子、置換基を有しても良いアルキル基、置換基を有しても良いアルコキシル基、置換基を有しても良いアリール基は、一般式(1)で説明した基と同義である。 The quinophthalone pigment (A2) is C.I. I. Pigment Yellow 138, or any of the quinophthalone pigments represented by the following general formulas (2) to (4) is preferable. Here, in R 14 to R 28 , R 29 to R 43 , and R 44 to R 60 , a hydrogen atom, a halogen atom, an alkyl group which may have a substituent, an alkoxyl group which may have a substituent, and the like. The aryl group which may have a substituent is synonymous with the group described by the general formula (1).
一般式(4)
General formula (4)
一般式(2)~(4)中、R14~R28、R29~R43、R44~R60は、それぞれ独立に、水素原子、ハロゲン原子、水酸基、置換基を有しても良いアルキル基、置換基を有しても良いアルコキシル基、置換基を有しても良いアリール基を示す。 In the general formulas (2) to (4), R 14 to R 28 , R 29 to R 43 , and R 44 to R 60 may independently have a hydrogen atom, a halogen atom, a hydroxyl group, and a substituent. An alkyl group, an alkoxyl group which may have a substituent, and an aryl group which may have a substituent are shown.
さらに、本発明の着色組成物に用いられるキノフタロン顔料(A2)は、一般式(2)~(4)のR14~R28、R29~R43、R44~R60が、水素原子又はハロゲン原子であることがより好ましい。 Further, in the quinophthalone pigment (A2) used in the coloring composition of the present invention, R 14 to R 28 , R 29 to R 43 , and R 44 to R 60 of the general formulas (2) to (4) are hydrogen atoms or. It is more preferably a halogen atom.
キノフタロン顔料(A2)は、単独又は2種類以上を併用して使用できる。 The quinophthalone pigment (A2) can be used alone or in combination of two or more.
キノフタロン顔料(A2)の含有量は、着色剤(A)100質量%中、10~80質量部%が好ましく、20~70質量%がより好ましい。 The content of the quinophthalone pigment (A2) is preferably 10 to 80 parts by mass, more preferably 20 to 70% by mass, based on 100% by mass of the colorant (A).
[一般式(1)で表わされるキノフタロン顔料(A2)の製造法]
一般式(1)で表わされるキノフタロン顔料(A2)は、例えば、特開平4-226163号公報、特開2012-226110号公報記載の方法で合成できる。
[Manufacturing method of quinophthalone pigment (A2) represented by the general formula (1)]
The quinophthalone pigment (A2) represented by the general formula (1) can be synthesized, for example, by the methods described in JP-A-4-226163 and JP-A-2012-226110.
一般式(1)で表わされるキノフタロン顔料(A2)の具体例として、下記に示すものが挙げられるが、本発明はこれらに限定されるものではない。 Specific examples of the quinophthalone pigment (A2) represented by the general formula (1) include those shown below, but the present invention is not limited thereto.
(その他顔料(A3))
本発明の着色組成物は、課題を解決できる範囲で、フタロシアニン顔料(A1)及びキノフタロン顔料(A2)以外のその他顔料(A3)を含有できる。
(Other pigments (A3))
The coloring composition of the present invention can contain other pigments (A3) other than the phthalocyanine pigment (A1) and the quinophthalone pigment (A2) to the extent that the problem can be solved.
その他顔料(A3)は、例えば、C.I.ピグメントイエロー1,2,3,4,5,6,10,11,12,13,14,15,16,17,18,20,24,31,32,34,35,35:1,36,36:1,37,37:1,40,42,43,53,55,60,61,62,63,65,73,74,77,81,83,86,93,94,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,137,139,147,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,198,199,213,214,218,219,220,221、C.I.ビグメントブルー1,1:2,9,14,17,19,25,27,28,29,33,35,36,56,56:1,60,61,61:1,62,63,64,66,67,68,71,72,73,74,75,76,78,79、C.I.ピグメントレッド1,2,3,4,5,6,7,8,9,12,14,15,16,17,21,22,23,31,32,37,38,41,47,48,48:1,48:2,48:3,48:4,49,49:1,49:2,50:1,52:1,52:2,53,53:1,53:2,53:3,57,57:1,57:2,58:4,60,63,63:1,63:2,64,64:1,68,69,81,81:1,81:2,81:3,81:4,83,88,90:1,101,101:1,104,108,108:1,109,112,113,114,122,123,144,146,147,149,151,166,168,169,170,172,173,174,175,176,177,178,179,181,184,185,187,188,190,193,194,200,202,206,207,208,209,210,214,216,220,221,224,230,231,232,233,235,236,237,238,239,242,243,245,247,249,250,251,253,254,255,256,257,258,259,260,262,263,264,265,266,267,268,269,270,271,272,273,274,275,276,277,278,279,280,281,282,283,284,285,286,287,291,295,296、C.I.ピグメントバイオレット1,1:1,2,2:2,3,3:1,3:3,5,5:1,14,15,16,19,23,25,27,29,31,32,37,39,42,44,47,49,50、C.I.ピグメントオレンジ36,38,43,64,71、73等が挙げられる。
Other pigments (A3) are, for example, C.I. I.
(染料)
着色剤(A)は、染料を含有できる。
染料は、例えば、C.I.ソルベントグリーン1,4,5,7,34,35、C.I.アシッドグリーン1,3,5,9,16,50,58,63,65,80,104,105,106,109、C.I.ダイレクトグリーン25,27,31,32,34,37,63,65,66,67,68,69,72,77,79,82、C.I.モーダントグリーン1,3,4,5,10,15,26,29,33,34,35,41,43,53、C.I.アシッド イエロー2,3,4,5,6,7,8,9,9:1,10,11,11:1,12,13,14,15,16,17,17:1,18,20,21,22,23,25,26,27,29,30,31,33,34,36,38,39,40,40:1,41,42,42:1,43,44,46,48,51,53,55,56,60,63,65,66,67,68,69,72,76,82,83,84,86,87,90,94,105,115,117,122,127,131,132,136,141,142,143,144,145,146,149,153,159,166,168,169,172,174,175,178,180,183,187,188,189,190,191,192,199、C.I.ダイレクトイエロー1,2,4,5,12,13,15,20,24,25,26,32,33,34,35,41,42,44,44:1,45,46,48,49,50,51,61,66,67,69,70,71,72,73,74,81,84,86,90,91,92,95,107,110,117,118,119,120,121,126,127,129,132,133,134、C.I.ベーシックイエロー1,2,5,11,13,14,15,19,21,24,25,28,29,37,40,45,49,51,57,79,87,90,96,103,105,106、C.I.ソルベントイエロー2,7,28,29,30,32,33,34,40,42,43,44,45,47,48,56,62,64,68,69,71,72,73,77,79,81,82,83,85,88,89,90,93,94,98,104,107,114,116,117,124,130,131,133,135,138,141,143,145,146,147,157,160,162,163,167,172,174,175,176,177,179,181,182,183,184,185,186,187,188,190,191,192,194,195、C.I.ディスパーズイエロー1,2,3,5,7,8,10,11,13,13,23,27,33,34,42,45,48,51,54,56,59,60,63,64,67,70,77,79,82,85,88,93,99,114,118,119,122,123,124,126,163,184,184:1,202,211,229,231,232,233,241,245,246,247,248,249,250,251等が挙げられる。
(dye)
The colorant (A) can contain a dye.
The dye is, for example, C.I. I. Solvent Green 1,4,5,7,34,35, C.I. I. Acid Green 1,3,5,9,16,50,58,63,65,80,104,105,106,109, C.I. I.
着色剤(A)の含有量は、着色組成物の不揮発分100質量%中、5~70質量%が好ましく、10~60質量%がより好ましい。 The content of the colorant (A) is preferably 5 to 70% by mass, more preferably 10 to 60% by mass, based on 100% by mass of the non-volatile content of the coloring composition.
(顔料の微細化)
本発明で顔料は、微細化して用いることが好ましい。微細化方法は、特に限定されるものではなく、例えば、湿式磨砕、乾式磨砕、溶解析出法いずれも使用できる。これらの中でも湿式磨砕の1種であるニーダー法によるソルトミリング処理が好ましい。微細化顔料のTEM(透過型電子顕微鏡)により求められる平均一次粒子径は、5~90nmが好ましい。なお、分散性、コントラスト比の観点から、平均一次粒子径は10~70nmがより好ましい。
(Pigment miniaturization)
In the present invention, the pigment is preferably used in a finely divided form. The miniaturization method is not particularly limited, and for example, wet grinding, dry grinding, and dissolution precipitation method can be used. Among these, the salt milling treatment by the kneader method, which is one of the wet grinding methods, is preferable. The average primary particle size determined by the TEM (transmission electron microscope) of the finely divided pigment is preferably 5 to 90 nm. From the viewpoint of dispersibility and contrast ratio, the average primary particle size is more preferably 10 to 70 nm.
ソルトミリング処理とは、顔料と水溶性無機塩と水溶性有機溶剤との混合物を、ニーダー、2本ロールミル、3本ロールミル、ボールミル、アトライター、サンドミル等の混練機を用いて、加熱しながら機械的に混練した後、水洗により水溶性無機塩と水溶性有機溶剤を除去する処理である。水溶性無機塩は、破砕助剤として働くものであり、ソルトミリング時に無機塩の硬度の高さを利用して顔料が破砕される。顔料をソルトミリング処理する際の条件を最適化することにより、一次粒子径が非常に微細であり、また、分布の幅がせまく、シャープな粒度分布をもつ顔料を得ることができる。 Salt milling is a machine that heats a mixture of a pigment, a water-soluble inorganic salt, and a water-soluble organic solvent using a kneader such as a kneader, a 2-roll mill, a 3-roll mill, a ball mill, an attritor, and a sand mill. After kneading, the water-soluble inorganic salt and the water-soluble organic solvent are removed by washing with water. The water-soluble inorganic salt acts as a crushing aid, and the pigment is crushed by utilizing the high hardness of the inorganic salt during salt milling. By optimizing the conditions for the salt milling treatment of the pigment, it is possible to obtain a pigment having a very fine primary particle size, a narrow distribution width, and a sharp particle size distribution.
水溶性無機塩は、塩化ナトリウム、塩化カリウム、硫酸ナトリウム等が挙げられ、価格の点から塩化ナトリウム(食塩)が好ましい。水溶性無機塩の使用量は、処理効率と生産効率の両面から、顔料100質量部に対して、50~2,000質量部が好ましく、300~1,000質量部がより好ましい。 Examples of the water-soluble inorganic salt include sodium chloride, potassium chloride, sodium sulfate and the like, and sodium chloride (salt) is preferable from the viewpoint of price. The amount of the water-soluble inorganic salt used is preferably 50 to 2,000 parts by mass, more preferably 300 to 1,000 parts by mass with respect to 100 parts by mass of the pigment, from the viewpoints of both treatment efficiency and production efficiency.
水溶性有機溶剤は、顔料、及び水溶性無機塩を湿潤する働きをするものであり、水に溶解(混和)し、かつ用いる無機塩を実質的に溶解しないものであれば特に限定されない。ただし、ソルトミリング時に温度が上昇し、溶剤が蒸発し易い状態になるため、安全性の点から、沸点120℃以上の高沸点溶剤が好ましい。例えば、2-メトキシエタノール、2-ブトキシエタノール、2-(イソペンチルオキシ)エタノール、2-(ヘキシルオキシ)エタノール、ジエチレングリコール、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、トリエチレングリコール、トリエチレングリコールモノメチルエーテル、液状のポリエチレングリコール、1-メトキシ-2-プロパノール、1-エトキシ-2-プロパノール、ジプロピレングリコール、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、液状のポリプロピレングリコール等が用いられる。水溶性有機溶剤の使用量は、顔料100質量部に対して、5~1,000質量部が好ましく、50~500質量部がより好ましい。 The water-soluble organic solvent has a function of wetting the pigment and the water-soluble inorganic salt, and is not particularly limited as long as it dissolves (mixes) in water and does not substantially dissolve the inorganic salt used. However, since the temperature rises during salt milling and the solvent easily evaporates, a high boiling point solvent having a boiling point of 120 ° C. or higher is preferable from the viewpoint of safety. For example, 2-methoxyethanol, 2-butoxyethanol, 2- (isopentyloxy) ethanol, 2- (hexyloxy) ethanol, diethylene glycol, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, triethylene glycol, triethylene glycol monomethyl ether, Liquid polyethylene glycol, 1-methoxy-2-propanol, 1-ethoxy-2-propanol, dipropylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, liquid polypropylene glycol and the like are used. The amount of the water-soluble organic solvent used is preferably 5 to 1,000 parts by mass, more preferably 50 to 500 parts by mass with respect to 100 parts by mass of the pigment.
ソルトミリング処理には、必要に応じて樹脂を変化してもよい。前記樹脂の種類は特に限定されず、天然樹脂、変性天然樹脂、合成樹脂、天然樹脂で変性された合成樹脂等が挙げられる。これらの中でも、室温で固体であり、水不溶性であることが好ましく、かつ上記有機溶剤に一部可溶であることが好ましい。樹脂の使用量は、顔料100質量部に対して、2~200質量部が好ましい。 For the salt milling treatment, the resin may be changed if necessary. The type of the resin is not particularly limited, and examples thereof include a natural resin, a modified natural resin, a synthetic resin, and a synthetic resin modified with a natural resin. Among these, it is preferable that it is solid at room temperature, is insoluble in water, and is partially soluble in the above organic solvent. The amount of the resin used is preferably 2 to 200 parts by mass with respect to 100 parts by mass of the pigment.
[スルホ基を有するキノフタロン化合物の金属塩(B)]
本発明の着色組成物は、金属が銅、銀、亜鉛、鉄、及びアルミニウムからなる群より選ばれる1種以上であるスルホ基を有するキノフタロン化合物の金属塩(B)を含む。
スルホ基を有するキノフタロン化合物と金属塩(B)を使用することにより、異物の発生が少なく、かつ電圧保持率に優れ、明度低下が少ない着色組成物が得られる。
[Metal salt of quinophthalone compound having a sulfo group (B)]
The coloring composition of the present invention contains a metal salt (B) of a quinophthalone compound having a sulfo group, wherein the metal is one or more selected from the group consisting of copper, silver, zinc, iron, and aluminum.
By using the quinophthalone compound having a sulfo group and the metal salt (B), a colored composition with less foreign matter generation, excellent voltage retention, and less decrease in brightness can be obtained.
キノフタロン化合物とは、下記化学式(2)で表される構造を有する化合物である。具体的には、C.I.アシッドイエロー3、5等の市販されている染料、及びC.I.ピグメントイエロー138、C.I.ソルベントイエロー33,114,157、C.I.ディスパースイエロー54,64,67等の市販されている顔料及び染料が挙げられる。 The quinophthalone compound is a compound having a structure represented by the following chemical formula (2). Specifically, C.I. I. Commercially available dyes such as Acid Yellow 3, 5 and C.I. I. Pigment Yellow 138, C.I. I. Solvent Yellow 33,114,157, C.I. I. Examples include commercially available pigments and dyes such as Disperse Yellow 54, 64, 67.
化学式(2)
スルホ基を有するキノフタロン化合物は、化学式(2)で表される構造を有する化合物を公知の方法を用いてスルホン化した化合物であり、具体的に、下記に示すものが挙げられるが、本発明はこれらに限定されるものではない。 The quinophthalone compound having a sulfo group is a compound obtained by sulfonated a compound having a structure represented by the chemical formula (2) by a known method, and specific examples thereof include those shown below. It is not limited to these.
スルホ基を有するキノフタロン化合物の金属塩(B)は、上述した例示化合物の-SO3Hを、公知の方法で金属塩にカウンター交換することで得られる。 The metal salt (B) of the quinophthalone compound having a sulfo group can be obtained by counter-exchange of −SO 3 H of the above-mentioned exemplary compound with a metal salt by a known method.
金属塩を構成する金属は、銅、銀、亜鉛、鉄、及びアルミニウムからなる群より選ばれる1種以上である。これらのなかでも、金属が、銅である場合、明度低下をより効果的に抑制できる。また、金属が、亜鉛、又はアルミニウムのいずれかである場合、電圧保持率に優れ、異物発生をより効果的に抑制できる。 The metal constituting the metal salt is one or more selected from the group consisting of copper, silver, zinc, iron, and aluminum. Among these, when the metal is copper, the decrease in brightness can be suppressed more effectively. Further, when the metal is either zinc or aluminum, the voltage retention rate is excellent and the generation of foreign matter can be suppressed more effectively.
スルホ基を有するキノフタロン化合物の金属塩(B)は、2種類以上を併用することが好ましい。これらのなかでも、少なくともスルホ基を有するキノフタロン化合物の銅塩を使用することが好ましく、スルホ基を有するキノフタロン化合物の銅塩およびアルミニウム塩、または前記銅塩および亜鉛塩がより好ましい。 It is preferable to use two or more kinds of the metal salt (B) of the quinophthalone compound having a sulfo group in combination. Among these, it is preferable to use at least a copper salt of a quinophthalone compound having a sulfo group, and more preferably a copper salt and an aluminum salt of a quinophthalone compound having a sulfo group, or the copper salt and zinc salt.
スルホ基を有するキノフタロン化合物の金属塩(B)の含有量は、異物発生の抑制、電圧保持率、及び明度低下の抑制の観点から、フタロシアニン顔料(A1)100質量部に対して、1~40質量部が好ましく、5~30質量部がより好ましい。 The content of the metal salt (B) of the quinophthalone compound having a sulfo group is 1 to 40 with respect to 100 parts by mass of the phthalocyanine pigment (A1) from the viewpoint of suppressing the generation of foreign substances, the voltage retention rate, and the suppression of the decrease in brightness. By mass is preferable, and 5 to 30 parts by mass is more preferable.
スルホ基を有するキノフタロン化合物の銅塩の含有量は、スルホ基を有するキノフタロン化合物の金属塩(B)100質量%中、20~100質量%が好ましく、20~80質量%がより好ましく、20~60質量%がさらに好ましい。 The content of the copper salt of the quinophthalone compound having a sulfo group is preferably 20 to 100% by mass, more preferably 20 to 80% by mass, and 20 to 80% by mass of 100% by mass of the metal salt (B) of the quinophthalone compound having a sulfo group. 60% by mass is more preferable.
[分散樹脂(F)]
本発明の着色組成物は、必要に応じて分散樹脂(F)を含有できる。
分散樹脂(F)は、顔料に親和性が高い吸着基を有している。吸着基は、カチオン性基、及びアニオン性基のうち1種以上が好ましい。
[Dispersed resin (F)]
The coloring composition of the present invention may contain a dispersion resin (F), if necessary.
The dispersed resin (F) has an adsorbing group having a high affinity for the pigment. The adsorbing group is preferably one or more of a cationic group and an anionic group.
カチオン性基を有する樹脂は、例えば、カチオン性基として、1級アミノ基、2級アミノ基、3級アミノ基、4級アンモニア塩基、及び含窒素複素環など窒素原子を含有する基等が挙げられる。 Examples of the resin having a cationic group include a primary amino group, a secondary amino group, a tertiary amino group, a quaternary ammonia base, and a group containing a nitrogen atom such as a nitrogen-containing heterocycle as the cationic group. Will be.
アニオン性基を有する樹脂は、例えば、アニオン性基として、カルボキシル基、リン酸基、スルホン酸基等が挙げられる。なかでも、顔料への吸着性の観点からカルボキシル基、リン酸基であることが好ましい。 Examples of the resin having an anionic group include a carboxyl group, a phosphoric acid group, a sulfonic acid group and the like as anionic groups. Of these, a carboxyl group and a phosphoric acid group are preferable from the viewpoint of adsorptivity to pigments.
分散樹脂(F)の樹脂種は、例えば、ウレタン樹脂、ポリアクリレート等のポリカルボン酸エステル、不飽和ポリアミド、ポリカルボン酸、ポリカルボン酸(部分)アミン塩、ポリカルボン酸アンモニウム塩、ポリカルボン酸アルキルアミン塩、ポリシロキサン、長鎖ポリアミノアマイドリン酸塩、水酸基含有ポリカルボン酸エステルや、これらの変性物、ポリ(低級アルキレンイミン)と遊離のカルボキシル基を有するポリエステルとの反応により形成されたアミドやその塩等、(メタ)アクリル酸-スチレン共重合体、(メタ)アクリル酸-(メタ)アクリル酸エステル共重合体、スチレン-マレイン酸共重合体、ポリビニルアルコ-ル、ポリビニルピロリドン等の水溶性樹脂や水溶性高分子化合物、ポリエステル系、変性ポリアクリレート系、エチレンオキサイド/プロピレンオキサイド付加化合物、リン酸エステル系等が挙げられる。 The resin type of the dispersed resin (F) is, for example, a urethane resin, a polycarboxylic acid ester such as polyacrylate, an unsaturated polyamide, a polycarboxylic acid, a polycarboxylic acid (partial) amine salt, a polycarboxylic acid ammonium salt, or a polycarboxylic acid. Alkylamine salts, polysiloxanes, long-chain polyaminoamidophosphates, hydroxyl group-containing polycarboxylic acid esters and modified products thereof, amides formed by the reaction of poly (lower alkyleneimine) with polyesters having free carboxyl groups. Water-soluble such as (meth) acrylic acid-styrene copolymer, (meth) acrylic acid- (meth) acrylic acid ester copolymer, styrene-maleic acid copolymer, polyvinyl alcohol, polyvinylpyrrolidone, etc. Examples thereof include sex resins, water-soluble polymer compounds, polyester-based materials, modified polyacrylate-based compounds, ethylene oxide / propylene oxide-added compounds, and phosphoric acid ester-based compounds.
分散樹脂(F)の構造は、例えば、ランダム構造、ブロック構造、グラフト構造、くし型構造、及び星型構造等が挙げられる。これらの中でも、分散安定性の観点から、ブロック構造、又はくし型構造が好ましい。 Examples of the structure of the dispersed resin (F) include a random structure, a block structure, a graft structure, a comb-shaped structure, and a star-shaped structure. Among these, a block structure or a comb-shaped structure is preferable from the viewpoint of dispersion stability.
分散樹脂(F)の市販品は、例えば、ビックケミー・ジャパン社製のDisperbyk-101, 103, 107, 108, 110,111,116,130,140,154,161,162,163,164,165,166,167,168,170,171,174,180,181,182,183,184,185,190,2000,2001,2009,2010,2020,2025,2050,2070,2095,2150,2155,2163,2164、又はAnti-Terra-U203,204、又はBYK-P104,P104S,220S、又はLactimon、Lactimon-WS、又はBykumen等、日本ルーブリゾール社製のSOLSPERSE-3000,9000,13000,13240,13650,13940,16000,17000,18000,20000,21000,24000,26000,27000,28000,31845,32000,32500,32550,33500,32600,34750,35100,36600,38500,41000,41090,53095,55000,56000,76500等、BASFジャパン社製のEFKA-46,47,48,452,4008,4009,4010,4015,4020,4047,4050,4055,4060,4080,4400,4401,4402,4403,4406,4408,4300,4310,4320,4330,4340,450,451,453,4540,4550,4560,4800,5010,5065,5066,5070,7500,7554,1101,120,150,1501,1502,1503等、味の素ファインテクノ社製のアジスーパーPA111,PB711,PB821,PB822,PB824等、特開2008-029901号公報、特開2009-155406号公報、特開2010-185934号公報、特開2011-157416号公報等に記載の樹脂が挙げられる。 Commercially available products of the dispersed resin (F) include, for example, Disperbyk-101, 103, 107, 108, 110, 111, 116, 130, 140, 154, 161, 162, 163, 164, 165, manufactured by Big Chemie Japan. 166, 167, 168, 170, 171, 174, 180, 181, 182, 183, 184, 185, 190, 2000, 2001, 2009, 2010, 2020, 2025, 2050, 2070, 2095, 2150, 2155, 2163 2164, or Anti-Terra-U203,204, or BYK-P104, P104S, 220S, or Lactimon, Lactimon-WS, or Bykuman, etc. , 16000, 17000, 18000, 20000, 21000, 24000, 26000, 27000, 28000, 31845, 32000, 32500, 32550, 33500, 32600, 34750, 35100, 36600, 38500, 41000, 41090, 53095, 55000, 56000, 76500 Etc., EFKA-46, 47, 48, 452, 4008, 4009, 4010, 4015, 4020, 4047, 4050, 4055, 4060, 4080, 4400, 4401, 4402, 4403, 4406, 4408, 4300 manufactured by BASF Japan Ltd. , 4310, 4320, 4330, 4340, 450, 451, 453, 4540, 4550, 4560, 4800, 5010, 5065, 5066, 5070, 7500, 7554, 1101, 120, 150, 1501, 1502, 1503, etc. In JP-A-2008-029901, JP-A-2009-155406, JP-A-2010-185934, JP-A-2011-157416, etc. The resin described is mentioned.
分散樹脂(F)は、単独又は2種類以上を併用して使用できる。 The dispersed resin (F) can be used alone or in combination of two or more.
分散樹脂(F)の含有量は、分散安定性の観点から、着色剤(A)100質量部に対して、3~200質量部が好ましく、5~100質量部がより好ましい。 The content of the dispersion resin (F) is preferably 3 to 200 parts by mass, more preferably 5 to 100 parts by mass with respect to 100 parts by mass of the colorant (A) from the viewpoint of dispersion stability.
[分散助剤(G)]
本発明の着色組成物は、必要に応じて分散助剤(G)を含有できる。
[Dispersion aid (G)]
The coloring composition of the present invention may contain a dispersion aid (G), if necessary.
分散助剤(G)は、特に制限はなく、例えば、有機色素残基に酸性基、塩基性基、中性基などを有する化合物が挙げられる。分散助剤(G)は、具体的には、スルホ基、カルボキシ基、リン酸基などの酸性置換基を有する化合物、およびこれらのアミン塩や、スルホンアミド基や末端に3級アミノ基などの塩基性置換基を有する化合物、フェニル基やフタルイミドアルキル基などの中性置換基を有する化合物が挙げられる。
有機色素は、例えば、ジケトピロロピロール顔料、アントラキノーン顔料、キナクリドン顔料、ジオキサジン顔料、ペリノーン系顔料、ペリレン系顔料、チアジンインジゴ顔料、トリアジン顔料、ベンズイミダゾロン顔料、ベンゾイソインドール等のインドール顔料、イソインドリン系顔料、イソインドリノーン顔料、ナフトール顔料、スレン顔料、金属錯体系顔料、アゾ、ジスアゾ、ポリアゾ等のアゾ系顔料等が挙げられる。
The dispersion aid (G) is not particularly limited, and examples thereof include compounds having an acidic group, a basic group, a neutral group, or the like in the organic dye residue. The dispersion aid (G) is specifically a compound having an acidic substituent such as a sulfo group, a carboxy group or a phosphate group, an amine salt thereof, a sulfonamide group or a tertiary amino group at the terminal. Examples thereof include a compound having a basic substituent and a compound having a neutral substituent such as a phenyl group and a phthalimidealkyl group.
Organic dyes include, for example, diketopyrrolopyrrole pigments, anthracinone pigments, quinacridone pigments, dioxazine pigments, perinone pigments, perylene pigments, thiazine indigo pigments, triazine pigments, benzimidazolone pigments, benzoisoindole and the like. Examples thereof include pigments, isoindolin-based pigments, isoindolinone pigments, naphthol pigments, slene pigments, metal complex-based pigments, and azo-based pigments such as azo, disazo, and polyazo.
分散助剤(G))は、単独または2種類以上を併用して使用できる。 The dispersion aid (G)) can be used alone or in combination of two or more.
分散助剤(G)の含有量は、着色剤(A)100質量部に対して、1~15質量部が好ましく、2~10質量部がより好ましい。 The content of the dispersion aid (G) is preferably 1 to 15 parts by mass, more preferably 2 to 10 parts by mass with respect to 100 parts by mass of the colorant (A).
[アルカリ可溶性樹脂(C)]
本発明の着色組成物は、アルカリ可溶性樹脂(C)を含む。
アルカリ可溶性樹脂(C)は、アルカリ現像液に溶解する樹脂であり、厚さ2μmの被膜形成時に400~700nmの全波長領域において透過率が80%以上の樹脂が好ましい。なお、透過率は、95%以上が好ましい。
アルカリ可溶性樹脂(C)は、非感光性アルカリ可溶性樹脂、感光性アルカリ可溶性樹脂に分類できる。アルカリ可溶性基は、例えば、カルボキシル基、リン酸基、スルホン酸基、ヒドロキシル基、フェノール性ヒドロキシル基などが挙げられる。これらの中でも、カルボキシル基が好ましい。また、アルカリ可溶性樹脂(C)は、エポキシ基やオキセタニル基等の熱硬化性基を含有できる。
[Alkali-soluble resin (C)]
The coloring composition of the present invention contains an alkali-soluble resin (C).
The alkali-soluble resin (C) is a resin that dissolves in an alkaline developer, and a resin having a transmittance of 80% or more in the entire wavelength region of 400 to 700 nm when a film having a thickness of 2 μm is formed is preferable. The transmittance is preferably 95% or more.
The alkali-soluble resin (C) can be classified into a non-photosensitive alkali-soluble resin and a photosensitive alkali-soluble resin. Examples of the alkali-soluble group include a carboxyl group, a phosphoric acid group, a sulfonic acid group, a hydroxyl group, and a phenolic hydroxyl group. Among these, a carboxyl group is preferable. Further, the alkali-soluble resin (C) can contain a thermosetting group such as an epoxy group or an oxetanyl group.
(非感光性アルカリ可溶性樹脂)
非感光性アルカリ可溶性樹脂は、例えば、酸性基を有するアクリル樹脂、α-オレフィン/(無水)マレイン酸共重合体、スチレン/スチレンスルホン酸共重合体、エチレン/(メタ)アクリル酸共重合体、又はイソブチレン/(無水)マレイン酸共重合体等が挙げられる。これらの中でも、酸性基を有するアクリル樹脂、スチレン/スチレンスルホン酸共重合体が好ましい。
(Non-photosensitive alkali-soluble resin)
The non-photosensitive alkali-soluble resin is, for example, an acrylic resin having an acidic group, an α-olefin / (anhydrous) maleic acid copolymer, a styrene / styrene sulfonic acid copolymer, an ethylene / (meth) acrylic acid copolymer, and the like. Alternatively, isobutylene / (anhydrous) maleic acid copolymer and the like can be mentioned. Among these, an acrylic resin having an acidic group and a styrene / styrene sulfonic acid copolymer are preferable.
(感光性アルカリ可溶性樹脂)
感光性アルカリ可溶性樹脂は、重合性不飽和基を有するため感光性を有する。感光性アルカリ可溶性樹脂は、アルカリ可溶性があり、感光性を有すれば良く、公知の樹脂を使用できるところ、以下の方法 (i) (ii)で合成した樹脂が好ましい。アルカリ可溶性感光性樹脂は、を使用すると光照射で3次元架橋して架橋密度が上がるため、被膜の薬品耐性が向上する。
(Photosensitive alkali-soluble resin)
The photosensitive alkali-soluble resin has a photosensitive unsaturated group because it has a polymerizable unsaturated group. The photosensitive alkali-soluble resin may be alkali-soluble and may have photosensitivity, and a known resin can be used. Therefore, the resin synthesized by the following methods (i) and (ii) is preferable. When the alkali-soluble photosensitive resin is used, it is three-dimensionally crosslinked by light irradiation to increase the crosslink density, so that the chemical resistance of the coating film is improved.
[方法(i)]
方法(i)は、例えば、まず、エポキシ基含有単量体、およびその他単量体の重合体を合成する。次いで、前記重合体のエポキシ基に、モノカルボキシル基含有単量体を付加し、生成した水酸基に、多塩基酸無水物を反応させてアルカリ可溶性感光性樹脂を得る方法が挙げられる。なお、モノカルボキシル基含有単量体は、カルボキシル基を1有する単量体である。
[Method (i)]
In method (i), for example, first, an epoxy group-containing monomer and a polymer of other monomers are synthesized. Next, a method of adding a monocarboxyl group-containing monomer to the epoxy group of the polymer and reacting the generated hydroxyl group with a polybasic acid anhydride to obtain an alkali-soluble photosensitive resin can be mentioned. The monocarboxyl group-containing monomer is a monomer having one carboxyl group.
エポキシ基含有単量体は、例えば、グリシジル(メタ)アクリレート、メチルグリシジル(メタ)アクリレート、2-グリシドキシエチル(メタ)アクリレート、3,4-エポキシブチル(メタ)アクリレート、及び3,4-エポキシシクロヘキシル(メタ)アクリレートが挙げられる。これらの中でも、反応性の観点で、グリシジル(メタ)アクリレートが好ましい Epoxy group-containing monomers include, for example, glycidyl (meth) acrylate, methylglycidyl (meth) acrylate, 2-glycidoxyethyl (meth) acrylate, 3,4-epoxybutyl (meth) acrylate, and 3,4-. Epoxycyclohexyl (meth) acrylate can be mentioned. Among these, glycidyl (meth) acrylate is preferable from the viewpoint of reactivity.
モノカルボキシル基含有単量体は、例えば、(メタ)アクリル酸、クロトン酸、o-、m-、p-ビニル安息香酸、(メタ)アクリル酸のα位ハロアルキル、アルコキシル、ハロゲン、ニトロ、シアノ置換体等のモノカルボン酸等が挙げられる。 The monocarboxyl group-containing monomer is, for example, (meth) acrylic acid, crotonic acid, o-, m-, p-vinylbenzoic acid, α-position haloalkyl of (meth) acrylic acid, alkoxyl, halogen, nitro, cyano substituted. Examples thereof include monocarboxylic acids such as the body.
多塩基酸無水物は、例えば、テトラヒドロ無水フタル酸、無水フタル酸、ヘキサヒドロ無水フタル酸、無水マレイン酸等が挙げられる。なお、多塩基酸無水物は、酸無水物を形成しないカルボキシル基を有しても良い。 Examples of the polybasic acid anhydride include tetrahydrophthalic anhydride, phthalic anhydride, hexahydrophthalic anhydride, maleic anhydride and the like. The polybasic acid anhydride may have a carboxyl group that does not form an acid anhydride.
その他単量体は、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、n-ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、t-ブチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、ステアリル(メタ)アクリレート、ラウリル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、イソボルニル(メタ)アクリレート、フェニル(メタ)アクリレート、ベンジル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、フェノキシジエチレングリコール(メタ)アクリレート、メトキシポリプロピレングリコール(メタ)アクリレート、又はエトキシポリエチレングリコール(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、ジシクロペンテニル(メタ)アクリレート、ジシクロペンタニルオキシエチル(メタ)アクリレート、ジシクロペンテニルオキシエチル(メタ)アクリレート、EO変性クレゾールアクリレート、n-ノニルフェノキシポリエチレングリコールアクリレート、フェノキシエチルアクリレート、エトキシ化フェニルアクリレート、フェノールのエチレンオキサイド(EO)変性(メタ)アクリレート、パラクミルフェノールのEO又はプロピレンオキサイド(PO)変性(メタ)アクリレート、ノニルフェノールのEO変性(メタ)アクリレート、ノニルフェノールのPO変性(メタ)アクリレート等の(メタ)アクリレート類、
あるいは、(メタ)アクリルアミド、N,N-ジメチル(メタ)アクリルアミド、N,N-ジエチル(メタ)アクリルアミド、N-イソプロピル(メタ)アクリルアミド、ダイアセトン(メタ)アクリルアミド、又はアクリロイルモルホリン等の(メタ)アクリルアミド類スチレン、又はα-メチルスチレン等のスチレン類、エチルビニルエーテル、n-プロピルビニルエーテル、イソプロピルビニルエーテル、n-ブチルビニルエーテル、又はイソブチルビニルエーテル等のビニルエーテル類、酢酸ビニル、又はプロピオン酸ビニル等の脂肪酸ビニル類等が挙げられる。
Other monomers include, for example, methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, and t-. Butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexyl (meth) acrylate, stearyl (meth) acrylate, lauryl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, isobornyl (meth) acrylate, phenyl (meth) Acrylate, benzyl (meth) acrylate, phenoxyethyl (meth) acrylate, phenoxydiethylene glycol (meth) acrylate, methoxypolypropylene glycol (meth) acrylate, or ethoxypolyethylene glycol (meth) acrylate, dicyclopentanyl (meth) acrylate, dicyclo Penthenyl (meth) acrylate, dicyclopentanyloxyethyl (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, EO-modified cresol acrylate, n-nonylphenoxypolyethylene glycol acrylate, phenoxyethyl acrylate, ethoxylated phenyl acrylate, phenol Ethylene oxide (EO) modified (meth) acrylate, EO of paracumylphenol or propylene oxide (PO) modified (meth) acrylate, EO-modified (meth) acrylate of nonylphenol, PO-modified (meth) acrylate of nonylphenol, etc. (meth) ) Acrylate,
Alternatively, (meth) such as (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N-diethyl (meth) acrylamide, N-isopropyl (meth) acrylamide, diacetone (meth) acrylamide, or acryloylmorpholin. Acrylamides styrene or styrenes such as α-methyl styrene, vinyl ethers such as ethyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, or isobutyl vinyl ether, vinyl acetate, fatty acid vinyls such as vinyl propionate. And so on.
また、シクロヘキシルマレイミド、フェニルマレイミド、メチルマレイミド、エチルマレイミド、1,2-ビスマレイミドエタン1,6-ビスマレイミドヘキサン、3-マレイミドプロピオン酸、6,7-メチレンジオキシ-4-メチル-3-マレイミドクマリン、4,4’-ビスマレイミドジフェニルメタン、ビス(3-エチル-5-メチル-4-マレイミドフェニル)メタン、N,N’-1,3-フェニレンジマレイミド、N,N’-1,4-フェニレンジマレイミド、N-(1-ピレニル)マレイミド、N-(2,4,6-トリクロロフェニル)マレイミド、N-(4-アミノフェニル)マレイミド、N-(4-ニトロフェニル)マレイミド、N-ベンジルマレイミド、N-ブロモメチル-2,3-ジクロロマレイミド、N-スクシンイミジル-3-マレイミドベンゾエート、N-スクシンイミジル-3-マレイミドプロピオナート、N-スクシンイミジル-4-マレイミドブチラート、N-スクシンイミジル-6-マレイミドヘキサノアート、N-[4-(2-ベンゾイミダゾリル)フェニル]マレイミド、9-マレイミドアクリジン等のN-置換マレイミド類等が挙げられる。 Also, cyclohexylmaleimide, phenylmaleimide, methylmaleimide, ethylmaleimide, 1,2-bismaleimideethane 1,6-bismaleimidehexane, 3-maleimidepropionic acid, 6,7-methylenedioxy-4-methyl-3-maleimide. Kumarin, 4,4'-bismaleimidediphenylmethane, bis (3-ethyl-5-methyl-4-maleimidephenyl) methane, N, N'-1,3-phenylenedimaleimide, N, N'-1,4- Phenylened maleimide, N- (1-pyrenyl) maleimide, N- (2,4,6-trichlorophenyl) maleimide, N- (4-aminophenyl) maleimide, N- (4-nitrophenyl) maleimide, N-benzyl Maleimide, N-bromomethyl-2,3-dichloromaleimide, N-succinimidyl-3-maleimidebenzoate, N-succinimidyl-3-maleimidepropionate, N-succinimidyl-4-maleimidebutyrate, N-succinimidyl-6-maleimide Examples thereof include N-substituted maleimides such as hexanoate, N- [4- (2-benzoimidazolyl) phenyl] maleimide, and 9-maleimide acrydin.
また、2-(メタ)アクリロイルオキシエチルアシッドフォスフェート、後述する水酸基含有単量体の水酸基に、たとえば5酸化リンやポリリン酸等のリン酸エステル化剤を反応させた化合物等のリン酸エステル基含有単量体等が挙げられ Further, 2- (meth) acryloyloxyethyl acid phosphate, a phosphoric acid ester group such as a compound obtained by reacting a hydroxyl group of a hydroxyl group-containing monomer described later with a phosphoric acid esterifying agent such as phosphorus pentoxide or polyphosphoric acid, for example. Examples include contained monomers
[方法(ii)]
方法(ii)は、例えば、水酸基含有単量体、カルボキシル基含有単量体、およびその他単量体の重合体を合成する。次いで、前記重合体の水酸基に、イソシアネート基含有単量体のイソシアネート基を反応させてアルカリ可溶性感光性樹脂を合成する方法が挙げられる。
[Method (ii)]
The method (ii) synthesizes, for example, a polymer of a hydroxyl group-containing monomer, a carboxyl group-containing monomer, and other monomers. Next, a method of reacting the hydroxyl group of the polymer with the isocyanate group of the isocyanate group-containing monomer to synthesize an alkali-soluble photosensitive resin can be mentioned.
水酸基含有単量体は、例えば、2-ヒドロキシエチル(メタ)アクリレート、2-若しくは3-ヒドロキシプロピル(メタ)アクリレート、2-若しくは3-若しくは4-ヒドロキシブチル(メタ)アクリレート、グリセロールモノ(メタ)アクリレート、又はシクロヘキサンジメタノールモノ(メタ)アクリレート等のヒドロキシアルキルメタアクリレート類が挙げられる。また、ヒドロキシアルキル(メタ)アクリレートに、エチレンオキシド、プロピレンオキシド、及び/又はブチレンオキシド等を付加重合させたポリエーテルモノ(メタ)アクリレートや、ポリγ-バレロラクトン、ポリε-カプロラクトン、及び/又はポリ12-ヒドロキシステアリン酸等を付加したポリエステルモノ(メタ)アクリレートも挙げられる。これらの中でも2-ヒドロキシエチルメタアクリレート、グリセロールモノ(メタ)アクリレートが好ましく、グリセロールモノ(メタ)アクリレートがより好ましい。 The hydroxyl group-containing monomer is, for example, 2-hydroxyethyl (meth) acrylate, 2- or 3-hydroxypropyl (meth) acrylate, 2- or 3- or 4-hydroxybutyl (meth) acrylate, glycerol mono (meth). Examples thereof include hydroxyalkyl methacrylates such as acrylates and cyclohexanedimethanol mono (meth) acrylates. Further, a polyether mono (meth) acrylate obtained by superpolymerizing hydroxyalkyl (meth) acrylate with ethylene oxide, propylene oxide, and / or butylene oxide, poly γ-valerolactone, poly ε-caprolactone, and / or poly. Polyester mono (meth) acrylate to which 12-hydroxystearic acid or the like is added can also be mentioned. Among these, 2-hydroxyethyl methacrylate and glycerol mono (meth) acrylate are preferable, and glycerol mono (meth) acrylate is more preferable.
イソシアネート基含有単量体は、例えば、2-(メタ)アクリロイルエチルイソシアネート、2-(メタ)アクリロイルオキシエチルイソシアネート、又は1,1-ビス〔メタアクリロイルオキシ〕エチルイソシアネート等が挙げられる。 Examples of the isocyanate group-containing monomer include 2- (meth) acryloylethyl isocyanate, 2- (meth) acryloyloxyethyl isocyanate, and 1,1-bis [methacryloyloxy] ethyl isocyanate.
カルボキシル基含有単量体、およびその他単量体は、既に説明した単量体を使用できる。 As the carboxyl group-containing monomer and other monomers, the monomers already described can be used.
アルカリ可溶性樹脂(C)は、単独又は2種類以上を併用して使用できる。 The alkali-soluble resin (C) can be used alone or in combination of two or more.
アルカリ可溶性樹脂(C)の重量平均分子量(Mw)は、現像性の観点から、2,000~40,000であり、3,000~300,00が好ましく、4,000~20,000がより好ましい。また、Mw/Mnの値は10以下が好ましい。適度な重量平均分子量(Mw)により基板に対する密着性、及びアルカリ現像溶解性が向上する。 The weight average molecular weight (Mw) of the alkali-soluble resin (C) is 2,000 to 40,000, preferably 3,000 to 3,000, and more preferably 4,000 to 20,000 from the viewpoint of developability. preferable. Further, the value of Mw / Mn is preferably 10 or less. Adhesion to the substrate and alkali development solubility are improved by an appropriate weight average molecular weight (Mw).
アルカリ可溶性樹脂(C)の酸価は、50~200mgKOH/gが好ましく、70~180mgKOH/gがより好ましく、90~170mgKOH/gがさらに好ましい。適度な酸価により基板に対する密着性、及びアルカリ現像溶解性が向上する。 The acid value of the alkali-soluble resin (C) is preferably 50 to 200 mgKOH / g, more preferably 70 to 180 mgKOH / g, and even more preferably 90 to 170 mgKOH / g. Adhesion to the substrate and alkali development solubility are improved by an appropriate acid value.
アルカリ可溶性樹脂(C)の含有量は、着色剤(A)100質量部に対して、20~400質量部が好ましく、50~250質量部がより好ましい。 The content of the alkali-soluble resin (C) is preferably 20 to 400 parts by mass, more preferably 50 to 250 parts by mass with respect to 100 parts by mass of the colorant (A).
[界面活性剤(D)]
(界面活性剤(D1))
本発明の着色組成物は、界面活性剤(D)としてフッ素化アルキル基およびポリ(パーフルオロアルキレンエーテル)鎖のうち1種以上を有する単量体(d1)と、その他エチレン性不飽和基含有単量体(d2)との共重合体である界面活性剤(D1)を含む。
界面活性剤(D1)、及び前記スルホ基を有するキノフタロン化合物の金属塩(B)を併用することにより、異物の発生を大きく抑制できる。
[Surfactant (D)]
(Surfactant (D1))
The coloring composition of the present invention contains a monomer (d1) having at least one of a fluorinated alkyl group and a poly (perfluoroalkylene ether) chain as a surfactant (D), and other ethylenically unsaturated groups. It contains a surfactant (D1) which is a copolymer with the monomer (d2).
By using the surfactant (D1) and the metal salt (B) of the quinophthalone compound having a sulfo group in combination, the generation of foreign substances can be greatly suppressed.
前記単量体(d1)の含有量は、界面活性剤(D1)を構成する全単量体単位中、5~95質量%が好ましく、10~50質量%がより好ましい。 The content of the monomer (d1) is preferably 5 to 95% by mass, more preferably 10 to 50% by mass, based on all the monomer units constituting the surfactant (D1).
界面活性剤(D1)の製造方法は、例えば、重合開始剤を使用して溶液重合させる方法が挙げられる。溶液重合に使用する溶剤は、ケトン類、エステル類、アミド類、スルホキシド類、エーテル類、炭化水素類が好ましい。具体的には、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、酢酸エチル、酢酸ブチル、プロピレングリコールモノメチルエーテルアセテート、ジメチルホルムアミド、ジメチルアセトアミド、N-メチルピロリドン、ジメチルスルホキシド、ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン、ジオキサン、トルエン、キシレン等が挙げられる。これらは、沸点、相溶性、重合性を考慮して適宜選択できる。重合開始剤は、例えば過酸化ベンゾイル等の過酸化物、アゾビスイソブチロニトリル等のアゾ化合物等が例示できる。さらに必要に応じてラウリルメルカプタン、2-メルカプトエタノ-ル、チオグリセロール、エチルチオグリコ-ル酸、オクチルチオグリコ-ル酸等の連鎖移動剤を使用することができる。 Examples of the method for producing the surfactant (D1) include a method of solution polymerization using a polymerization initiator. The solvent used for solution polymerization is preferably ketones, esters, amides, sulfoxides, ethers, and hydrocarbons. Specifically, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl acetate, butyl acetate, propylene glycol monomethyl ether acetate, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, diethyl ether, diisopropyl ether, tetrahydrofuran, dioxane. , Toluene, xylene and the like. These can be appropriately selected in consideration of boiling point, compatibility and polymerizable property. Examples of the polymerization initiator include peroxides such as benzoyl peroxide and azo compounds such as azobisisobutyronitrile. Further, if necessary, chain transfer agents such as lauryl mercaptan, 2-mercaptoethanol, thioglycerol, ethylthioglyco-lic acid, and octylthioglyco-lic acid can be used.
界面活性剤(D1)を構成するフッ素化アルキル基を有する単量体(d1)は、例えば、下記一般式(5)で表される単量体が挙げられる。 Examples of the monomer (d1) having a fluorinated alkyl group constituting the surfactant (D1) include a monomer represented by the following general formula (5).
一般式(5)
一般式(5)中、Rは、水素原子又はメチル基を表し、Xは、下記式(X-1)~(X-10)のいずれか1つの基を表し、Zは下記式(Z-1)~(Z-7)のいずれか1つの基を表す。 In the general formula (5), R represents a hydrogen atom or a methyl group, X represents any one group of the following formulas (X-1) to (X-10), and Z represents the following formula (Z-). 1) Represents any one group of (Z-7).
上記式(X-1)、(X-3)~(X-7)中のnは1~8の整数を表す。上記式(X-8)~(X-10)中のmは1~8の整数を表し、nは0~8の整数を表す。上記式(X-6)、及び(X-7)中のZ’’は下記式(Z-1)~(Z-7)のいずれか1つの基を表す。 In the above equations (X-1) and (X-3) to (X-7), n represents an integer of 1 to 8. In the above equations (X-8) to (X-10), m represents an integer of 1 to 8, and n represents an integer of 0 to 8. Z ″ in the above formula (X-6) and (X-7) represents any one group of the following formulas (Z-1) to (Z-7).
上記式(Z-1)~(Z-4)中のnは、例えば1~6の整数であり、好ましくは4~6の整数である。上記式(Z-5)中のmは、例えば1~18の整数であり、nは0~5の整数であり、かつm及びnの合計は1~23である。好ましくは、mは1~5の整数であり、nは0~4の整数であり、かつm及びnの合計は4~5である。上記式(Z-6)中のmは例えば1~6の整数であり、nは1~3の整数であり、lは1~20の整数であり、pは0~5の整数であり、かつ、m、p及びnとlとの積の合計は2~71である。好ましくは、mは1~3の整数であり、nは1~3の整数であり、lは1~6の整数であり、pは0~2の整数であり、かつ、m、p及びnとlとの積の合計は2~23である。 N in the above equations (Z-1) to (Z-4) is, for example, an integer of 1 to 6, preferably an integer of 4 to 6. In the above equation (Z-5), m is, for example, an integer of 1 to 18, n is an integer of 0 to 5, and the sum of m and n is 1 to 23. Preferably, m is an integer of 1 to 5, n is an integer of 0 to 4, and the sum of m and n is 4 to 5. In the above equation (Z-6), m is, for example, an integer of 1 to 6, n is an integer of 1 to 3, l is an integer of 1 to 20, and p is an integer of 0 to 5. Moreover, the total product of m, p and n and l is 2 to 71. Preferably, m is an integer of 1 to 3, n is an integer of 1 to 3, l is an integer of 1 to 6, p is an integer of 0 to 2, and m, p and n. The sum of the products of and l is 2 to 23.
フッ素化アルキル基を有する単量体(d1)の中で、異物発生の抑制の観点から、フッ素原子が直接結合した炭素原子の数が1~6のフッ素化アルキル基を有する単量体が好ましく、フッ素原子が直接結合した炭素原子の数が4~6のフッ素化アルキル基を有する単量体がより好ましい。 Among the monomers having a fluorinated alkyl group (d1), from the viewpoint of suppressing the generation of foreign substances, a monomer having a fluorinated alkyl group having 1 to 6 carbon atoms to which a fluorine atom is directly bonded is preferable. , A monomer having a fluorinated alkyl group having 4 to 6 carbon atoms to which a fluorine atom is directly bonded is more preferable.
界面活性剤(D1)を構成するポリ(パーフルオロアルキレンエーテル)鎖を有する単量体(d1)としては、炭素原子数1~3の2価フッ化炭素基と酸素原子が交互に連結した構造を有する単量体が挙げられる。炭素原子数1~3の2価フッ化炭素基は、一種類であっても良いし複数種の混合であっても良く、具体的には、下記式(Y)で表される連結基が挙げられる。 The monomer (d1) having a poly (perfluoroalkylene ether) chain constituting the surfactant (D1) has a structure in which divalent fluorocarbon groups having 1 to 3 carbon atoms and oxygen atoms are alternately linked. Examples thereof include monomers having. The divalent fluorocarbon group having 1 to 3 carbon atoms may be one kind or a mixture of a plurality of kinds, and specifically, the linking group represented by the following formula (Y) is used. Can be mentioned.
上記式(Y)中、Aは下記式(Y-1)~(Y-5)であり、式(Y)中の全てのAが同一構造のものであってもよいし、また、複数の構造がランダムに又はブロック状に存在していてもよい。また、nは繰り返し単位を表す1以上の整数である。 In the above formula (Y), A is the following formulas (Y-1) to (Y-5), and all A in the formula (Y) may have the same structure, or a plurality of A may have the same structure. The structure may be randomly or in blocks. Further, n is an integer of 1 or more representing a repeating unit.
これらの中でも異物発生の抑制の観点から、前記式(Y-1)で表されるパーフルオロメチレン構造と、前記式(Y-2)で表されるパーフルオロエチレン構造とが共存するものがとりわけ好ましい。また、前記式(Y)中のnの値は、3~100の範囲が好ましく、6~70の範囲がより好ましく、12~50の範囲がより好ましい。 Among these, from the viewpoint of suppressing the generation of foreign matter, the one in which the perfluoromethylene structure represented by the above formula (Y-1) and the perfluoroethylene structure represented by the above formula (Y-2) coexist is particularly the one. preferable. The value of n in the formula (Y) is preferably in the range of 3 to 100, more preferably in the range of 6 to 70, and even more preferably in the range of 12 to 50.
界面活性剤(D1)を構成するその他単量体(d2)は、フッ素化アルキル基およびポリ(パーフルオロアルキレンエーテル)鎖のうち1種以上を有する単量体(d1)と共重合可能な単量体(例えば、感光性アルカリ可溶性樹脂で説明した各種単量体)あればよく、制限されない。なかでも、異物発生の抑制の観点から、多環脂環式構造含有単量体が好ましい。 The other monomer (d2) constituting the surfactant (D1) is a monomer capable of copolymerizing with a monomer (d1) having at least one of a fluorinated alkyl group and a poly (perfluoroalkylene ether) chain. It may be a quantity (for example, various monomers described in the photosensitive alkali-soluble resin) and is not limited. Of these, a polycyclic alicyclic structure-containing monomer is preferable from the viewpoint of suppressing the generation of foreign substances.
多環脂環式構造含有単量体は、例えば、アダマンチル基含有単量体、ジシクロペンタニル基含有単量体等が挙げられる。これらの中でも異物発生の抑制の面でアダマンチル基含有単量体が好ましい。 Examples of the polycyclic alicyclic structure-containing monomer include an adamantyl group-containing monomer and a dicyclopentanyl group-containing monomer. Among these, the adamantyl group-containing monomer is preferable in terms of suppressing the generation of foreign substances.
アダマンチル基を有する単量体は、下記一般式(6)に示すアダマンタン構造と(メタ)アクリロイル基を有する化合物である。(メタ)アクリロイル基は、アダマンタン構造中のどの炭素原子に結合していてもよい。また、アダマンタン構造を構成する炭素原子に結合している水素原子は、その一部又は全部が水酸基又はアルキル基等に置換されていても構わない。 The monomer having an adamantyl group is a compound having an adamantane structure represented by the following general formula (6) and a (meth) acryloyl group. The (meth) acryloyl group may be attached to any carbon atom in the adamantane structure. Further, the hydrogen atom bonded to the carbon atom constituting the adamantane structure may be partially or wholly substituted with a hydroxyl group, an alkyl group or the like.
一般式(6)
一般式(6)中、Rは水素原子、メチル基を表す。 In the general formula (6), R represents a hydrogen atom and a methyl group.
界面活性剤(D1)の市販品は、AGCセイミケミカル社製サーフロンS-242、S-243、S-420、S-611、S-651、S-386、DIC社製メガファックF-253、F-477、F-551、F-552、F-555、F-558、F-560、F-570、F-575,F-576、R-40-LM、R-41、RS-72-K、DS-21、住友スリーエム社製FC-4430、FC-4432、三菱マテリアル電子化成社製EF-PP31N09、EF-PP33G1、EF-PP32C1、ネオス社製フタージェント602A等が挙げられる。 Commercially available products of the surfactant (D1) are AGC Seimi Chemical's Surflon S-242, S-243, S-420, S-611, S-651, S-386, DIC's Megafuck F-253, F-477, F-551, F-552, F-555, F-558, F-560, F-570, F-575, F-576, R-40-LM, R-41, RS-72- Examples thereof include K, DS-21, FC-4430 and FC-4432 manufactured by Sumitomo 3M, EF-PP31N09, EF-PP33G1, EF-PP32C1 manufactured by Mitsubishi Materials Electronics Chemicals, and Futergent 602A manufactured by Neos.
界面活性剤(D1)は、単独又は2種以上を併用して使用できる。 The surfactant (D1) can be used alone or in combination of two or more.
界面活性剤(D1)の含有量は、異物発生の抑制の観点から、着色剤(A)100質量部に対して、0.01~2質量部が好ましく、0.1~1質量部がより好ましい。 The content of the surfactant (D1) is preferably 0.01 to 2 parts by mass, more preferably 0.1 to 1 part by mass with respect to 100 parts by mass of the colorant (A) from the viewpoint of suppressing the generation of foreign substances. preferable.
(その他界面活性剤(D2))
界面活性剤(D)は、界面活性剤(D1)以外のその他界面活性剤(D2)を含有できる。その他界面活性剤(D2)は、例えば、シリコ-ン系界面活性剤、ノニオン性界面活性剤、カチオン性界面活性剤、アニオン性界面活性剤等が挙げられる。
(Other surfactant (D2))
The surfactant (D) can contain other surfactants (D2) other than the surfactant (D1). Examples of the other surfactant (D2) include a silicone-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant and the like.
シリコ-ン系界面活性剤は、例えば、シロキサン結合からなる直鎖状ポリマーや、側鎖や末端に有機基を導入した変性シロキサンポリマーが挙げられる。市販品は、ビックケミー社製BYK-300,306,310,313,315N,320,322,323,330,331,333,342,345,346,347,348,349,370,377,378,3455,UV3510,3570、東レ・ダウコ-ニング社製FZ-7002,2110,2122,2123,2191,5609、信越化学工業社製X-22-4952、X-22-4272、X-22-6266、KF-351A、KF-354L、KF-355A、KF-945、KF-640、KF-642、KF-643、X-22-4515、KF-6004、KP-341等が挙げられる。 Examples of the silicone-based surfactant include a linear polymer composed of a siloxane bond and a modified siloxane polymer having an organic group introduced into a side chain or a terminal. Commercially available products are BYK-300, 306, 310, 313,315N, 320,322,323,330,331,333,342,345,346,347,348,349,370,377,378,3455 manufactured by Big Chemie. , UV3510, 3570, FZ-7002, 2110, 2122, 2123, 2191, 5609, manufactured by Toray Industries, Inc., X-22-4952, X-22-4272, X-22-6266, KF manufactured by Shin-Etsu Chemical Co., Ltd. Examples thereof include -351A, KF-354L, KF-355A, KF-945, KF-640, KF-642, KF-643, X-22-4515, KF-6004, KP-341 and the like.
ノニオン性界面活性剤は、例えば、ポリオキシエチレンラウリルエーテル、ポリオキシエチレンセチルエーテル、ポリオキシエチレンステアリルエーテル、ポリオキシエチレンオレイルエーテル、ポリオキシエチレンアルキルエーテル、ポリオキシエチレンミリステルエーテル、ポリオキシエチレンオクチルドデシルエーテル、ポリオキシアルキレンアルキルエーテル、ポリオキシフェニレンジスチレン化フェニルエーテル、ポリオキシエチレントリベンジルフェニルエーテル、ポリオキシエチレンポリオキシプロピレングリコール、ポリオキシアルキレンアルケニルエーテル、ポリオキシエチレンノニルフェニルエーテル、ポリオキシエチレンアルキルエーテルリン酸エステル、ソルビタンモノラウレート、ソルビタンモノパルミテ-ト、ソルビタンモノステアレート、ソルビタンジステアレート、ソルビタントリステアレート、ソルビタンモノオレート、ソルビタントリオレート、ソルビタンセスキオレート、ポリオキシエチレンソルビタンモノラウレート、ポリオキシエチレンソルビタンモノパルミテ-ト、ポリオキシエチレンソルビタンモノステアレート、ポリオキシエチレンソルビタントリステアレート、ポリオキシエチレンソルビタンモノオレート、ポリオキシエチレンソルビタントリイソステアレート、テトラオレイン酸ポリオキシエチレンソルビット、グリセロ-ルモノステアレート、グリセロ-ルモノオレート、ポリエチレングリコールモノラウレート、ポリエチレングリコールモノステアレート、ポリエチレングリコールジステアレート、ポリエチレングリコールモノオレート、ポリオキシエチレン硬化ヒマシ油、ポリオキシエチレンアルキルアミン、アルキルアルカノールアミド、アルキルイミダゾリン等が挙げられる。市販品は、花王社製エマルゲン103,104P,106,108,109P,120,123P,130K,147,150,210P,220,306P,320P,350,404,408,409PV,420,430,705,707,709,1108,1118S-70,1135S-70,1150S-60,2020G-HA,2025G,LS-106,LS-110,LS-114,MS-110,A-60,A-90,B-66,PP-290、ラテムルPD-420,PD-430,PD-430S,PD-450、レオドールSP-L10,SP-P10,SP-S10V,SP-S20,SP-S30V,SP-O10V,SP-O30V、スーパーSP-L10,AS-10V,AO-10V,AO-15V,TW-L120,TW-L106,TW-P120,TW-S120V,TW-S320V,TW-O120V,TW-O106V,TW-IS399C、スーパーTW-L120,430V,440V,460V,MS-50,MS-60,MO-60,MS-165V、エマノーン1112,3199V,3299V,3299RV,4110,CH-25,CH-40,CH-60(K),アミ-ト102,105,105A,302,320、アミノーンPK-02S、L-02、ホモゲノールL-95、ADEKA社製アデカプルロニック(登録商標)L-23,31,44,61,62,64,71,72,101,121、TR-701,702,704,913R、共栄社化学社製(メタ)アクリル酸系(共)重合体ポリフローNo.75,No.90,No.95等が挙げられる。
Nonionic surfactants include, for example, polyoxyethylene lauryl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene alkyl ether, polyoxyethylene myristel ether, and polyoxyethylene octyl. Dodecyl ether, polyoxyalkylene alkyl ether, polyoxyphenylenedistyrene phenyl ether, polyoxyethylene tribenzylphenyl ether, polyoxyethylene polyoxypropylene glycol, polyoxyalkylene alkenyl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene Alkyl ether phosphate ester, sorbitan monolaurate, sorbitan monopalmitate, sorbitan monostearate, sorbitan distearate, sorbitan tristearate, sorbitan monoolate, sorbitan triolate, sorbitan sesquiolate, polyoxyethylene sorbitan mono Laurate, Polyoxyethylene sorbitan monopalmitate, Polyoxyethylene sorbitan monostearate, Polyoxyethylene sorbitan tristearate, Polyoxyethylene sorbitan monoolate, Polyoxyethylene sorbitan triisostearate, Polyoxytetraoleate Ethylene sorbit, glycerol monostearate, glycerol monooleate, polyethylene glycol monolaurate, polyethylene glycol monostearate, polyethylene glycol distearate, polyethylene glycol monostearate, polyoxyethylene hydrogenated castor oil, polyoxyethylene alkylamine, alkyl Examples thereof include alkanolamide and alkylimidazolin. Commercially available products are
カチオン性界面活性剤は、例えば、アルキルアミン塩やラウリルトリメチルアンモニウムクロライド、ステアリルトリメチルアンモニウムクロライド、セチルトリメチルアンモニウムクロライドなどのアルキル4級アンモニウム塩やそれらのエチレンオキサイド付加物が挙げられる。市販品は、花王社製アセタミン24、コータミン24P、60W、86Pコンク等が挙げられる。
Examples of the cationic surfactant include alkylquaternary ammonium salts such as alkylamine salts, lauryltrimethylammonium chlorides, stearyltrimethylammonium chlorides, and cetyltrimethylammonium chlorides, and ethylene oxide adducts thereof. Examples of commercially available products include Kao Corporation's
アニオン性界面活性剤は、例えば、ポリオキシエチレンアルキルエーテル硫酸塩、ドデシルベンゼンスルホン酸ナトリウム、スチレン-アクリル酸共重合体のアルカリ塩、アルキルナフタレンスルホン酸ナトリウム、アルキルジフェニルエーテルジスルホン酸ナトリウム、ラウリル硫酸モノエタノールアミン、ラウリル硫酸トリエタノールアミン、ラウリル硫酸アンモニウム、ステアリン酸モノエタノールアミン、ステアリン酸ナトリウム、ラウリル硫酸ナトリウム、スチレン-アクリル酸共重合体のモノエタノールアミン、ポリオキシエチレンアルキルエーテルリン酸エステル等が挙げられる。市販品は、ネオス社製フタージェント100,150、ADEKA社製アデカホープYES-25、アデカコールTS-230E,PS-440E,EC-8600等が挙げられる。 Anionic surfactants include, for example, polyoxyethylene alkyl ether sulfate, sodium dodecylbenzene sulfonate, alkali salt of styrene-acrylic acid copolymer, sodium alkylnaphthalene sulfonate, sodium alkyldiphenyl ether disulfonate, monoethanol lauryl sulfate. Examples thereof include amine, triethanolamine lauryl sulfate, ammonium lauryl sulfate, monoethanolamine stearate, sodium stearate, sodium lauryl sulfate, monoethanolamine of styrene-acrylic acid copolymer, polyoxyethylene alkyl ether phosphate and the like. Examples of commercially available products include Husqent 100, 150 manufactured by Neos, Adeka Hope YES-25 manufactured by ADEKA, Adecacol TS-230E, PS-440E, EC-8600 and the like.
両性界面活性剤は、例えば、ラウリン酸アミドプロピルベタイン、ラウリルベタイン、コカミドプロピルベタイン、ステアリルベタイン、アルキルジメチルアミノ酢酸ベタイン等のアルキルベタイン、ラウリルジメチルアミンオキサイド等のアルキルアミンオキサイド等が挙げられる。市販品は、花王社製アンヒトール20AB,20BS,24B,55AB,86B,20Y-B,20N等が挙げられる。 Examples of the amphoteric tenside include alkyl betaines such as lauric acid amidopropyl betaine, lauryl betaine, cocamidopropyl betaine, stearyl betaine and alkyldimethylaminoacetic acid betaine, and alkylamine oxides such as lauryldimethylamine oxide. Examples of commercially available products include Anhitor 20AB, 20BS, 24B, 55AB, 86B, 20Y-B, 20N manufactured by Kao Corporation.
[トリアリールスルホニウム化合物(E)]
本発明の着色組成物は、トリアリールスルホニウム化合物(E)を含有することが好ましい。スルホ基を有するキノフタロン化合物の金属塩(B)とトリアリールスルホニウム化合物(E)を併用することにより、電圧保持率がより優れ、明度低下がより抑制できる被膜を形成できる。
[Triarylsulfonium compound (E)]
The coloring composition of the present invention preferably contains the triarylsulfonium compound (E). By using the metal salt (B) of the quinophthalone compound having a sulfo group and the triarylsulfonium compound (E) in combination, it is possible to form a film having a better voltage retention rate and more suppressing the decrease in brightness.
トリアリールスルホニウム化合物(E)は、下記一般式(7)で表される化合物を含む。 The triarylsulfonium compound (E) includes a compound represented by the following general formula (7).
一般式(7)
一般式(7)中、R1~R3は、それぞれ独立に、水素原子、ハロゲン原子、水酸基、シアノ基、ニトロ基、置換基を有してよいアルキル基、置換基を有してよいアルコキシル基、置換基を有してよいアリール基を示す。X-は、一価の対アニオンを示す。 In the general formula (7), R 1 to R 3 independently have a hydrogen atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an alkyl group which may have a substituent, and an alkoxyl which may have a substituent. The aryl group which may have a group and a substituent is shown. X - represents a monovalent counter anion.
一般式(7)におけるにR1~R3、及びX-ついて説明する。 R 1 to R 3 and X - in the general formula (7) will be described.
一般式(7)中、R1~R3は、それぞれ独立に、水素原子、ハロゲン原子、水酸基、シアノ基、ニトロ基、置換基を有してよいアルキル基、置換基を有してよいアルコキシル基、置換基を有してよいアリール基を示す。 In the general formula (7), R 1 to R 3 independently have a hydrogen atom, a halogen atom, a hydroxyl group, a cyano group, a nitro group, an alkyl group which may have a substituent, and an alkoxyl which may have a substituent. The aryl group which may have a group and a substituent is shown.
ハロゲン原子としては、フッ素、塩素、臭素、ヨウ素が挙げられる。 Examples of the halogen atom include fluorine, chlorine, bromine and iodine.
置換基を有してよいアルキル基は、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ネオペンチル基、n-へキシル基、n-オクチル基、ステアリル基、2-エチルへキシル基等の直鎖アルキル基、又は分岐アルキル基、及びシクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等の環状アルキル基の他、トリクロロメチル基、トリフルオロメチル基、2,2,2-トリフルオロエチル基、2,2-ジブロモエチル基、2,2,3,3-テトラフルオロプロピル基、2-エトキシエチル基、2-ブトキシエチル基、2-ニトロプロピル基、ベンジル基、4-メチルベンジル基、4-tert-ブチルベンジル基、4-メトキシベンジル基、4-ニトロベンジル基、2,4-ジクロロベンジル基等の置換基を有するアルキル基が挙げられる。 The alkyl group which may have a substituent is, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, an n-octyl group, and the like. Linear alkyl groups such as stearyl group and 2-ethylhexyl group, or branched alkyl groups, cyclic alkyl groups such as cyclopropyl group, cyclobutyl group, cyclopentyl group and cyclohexyl group, as well as trichloromethyl group and trifluoromethyl group. , 2,2,2-Trifluoroethyl group, 2,2-dibromoethyl group, 2,2,3,3-tetrafluoropropyl group, 2-ethoxyethyl group, 2-butoxyethyl group, 2-nitropropyl group , Benzyl group, 4-methylbenzyl group, 4-tert-butylbenzyl group, 4-methoxybenzyl group, 4-nitrobenzyl group, 2,4-dichlorobenzyl group and other alkyl groups having substituents.
置換基を有してもよいアルコキシル基は、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、n-ブトキシ基、イソブチルオキシ基、tert-ブチルオキシ基、ネオペンチルオキシ基、2,3-ジメチル-3-ペントキシ、n-へキシルオキシ基、n-オクチルオキシ基、ステアリルオキシ基、2-エチルへキシルオキシ基等の直鎖アルコキシル基、又は分岐アルコキシル基、及びシクロプロピルオキシ基、シクロブチルオキシ基、シクロペンチルオキシ基、シクロヘキシルオキシ基等の環状アルコキシル基の他、トリクロロメトキシ基、トリフルオロメトキシ基、2,2,2-トリフルオロエトキシ基、2,2,3,3-テトラフルオロプロピルオキシ基、2,2-ジトリフルオロメチルプロポキシ基、2-エトキシエトキシ基、2-ブトキシエトキシ基、2-ニトロプロポキシ基、ベンジルオキシ基等の置換基を有するアルコキシル基が挙げられる。 The alkoxyl group which may have a substituent is a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, an n-butoxy group, an isobutyloxy group, a tert-butyloxy group, a neopentyloxy group, a 2,3-dimethyl-. A linear alkoxyl group such as 3-pentoxy, n-hexyloxy group, n-octyloxy group, stearyloxy group, 2-ethylhexyloxy group, or a branched alkoxyl group, and cyclopropyloxy group, cyclobutyloxy group, cyclopentyl. In addition to cyclic alkoxyl groups such as oxy group and cyclohexyloxy group, trichloromethoxy group, trifluoromethoxy group, 2,2,2-trifluoroethoxy group, 2,2,3,3-tetrafluoropropyloxy group, 2, Examples thereof include an alkoxyl group having a substituent such as a 2-ditrifluoromethylpropoxy group, a 2-ethoxyethoxy group, a 2-butoxyethoxy group, a 2-nitropropoxy group and a benzyloxy group.
置換基を有してもよいアリール基は、フェニル基、ナフチル基、アントラニル基等のアリール基の他、p-メチルフェニル基、p-ブロモフェニル基、p-ニトロフェニル基、p-メトキシフェニル基、2,4-ジクロロフェニル基、ペンタフルオロフェニル基、2-アミノフェニル基、2-メチル-4-クロロフェニル基、4-ヒドロキシ-1-ナフチル基、6-メチル-2-ナフチル基、4,5,8-トリクロロ-2-ナフチル基、アントラキノニル基、2-アミノアントラキノニル基等の置換基を有するアリール基が挙げられる。 The aryl group which may have a substituent includes an aryl group such as a phenyl group, a naphthyl group and an anthranyl group, as well as a p-methylphenyl group, a p-bromophenyl group, a p-nitrophenyl group and a p-methoxyphenyl group. , 2,4-Dichlorophenyl group, pentafluorophenyl group, 2-aminophenyl group, 2-methyl-4-chlorophenyl group, 4-hydroxy-1-naphthyl group, 6-methyl-2-naphthyl group, 4,5 Examples thereof include an aryl group having a substituent such as a 8-trichloro-2-naphthyl group, an anthraquinonyl group and a 2-aminoanthraquinonyl group.
これらの中でも、明度低下の抑制の観点から、R1~R3のうち少なくとも2つが水素原子であることが好ましく、全てが水素原子であることがより好ましい。 Among these, from the viewpoint of suppressing the decrease in brightness, it is preferable that at least two of R 1 to R 3 are hydrogen atoms, and it is more preferable that all of them are hydrogen atoms.
一般式(7)中、X-は、一価の対アニオンを示す。X-は、例えば、F-、Cl-、Br-、I-、下記一般式(8)~(13)で表される化合物等が挙げられる。 In the general formula (7), X − represents a monovalent counter anion. Examples of X- include F- , Cl- , Br- , I- , compounds represented by the following general formulas (8) to (13), and the like.
一般式(8) MYa
-
一般式(8)中、Mはリン原子、ホウ素原子、又はアンチモン原子を表す。Yはハロゲン原子を表し、aは4~6の整数を表す。
General formula (8 ) MY a-
In the general formula (8), M represents a phosphorus atom, a boron atom, or an antimony atom. Y represents a halogen atom and a represents an integer of 4 to 6.
一般式(8)で表される化合物は、例えばPF6 -、BF6 -、SbF6 -が挙げられる。なかでも、PF6が好ましい。 Examples of the compound represented by the general formula (8) include PF 6 − , BF 6 − , and SbF 6 − . Of these, PF 6 is preferable.
一般式(9) (Rf)bPF6-b
-
一般式(9)中、Rfは水素原子の80モル%以上がフッ素原子で置換された炭素数1~8のアルキル基を表す。アルキル基は、直鎖、分岐又は環状のいずれでもよい。bは1~5の整数を表す。
General formula (9) (Rf) b PF 6- b-
In the general formula (9), Rf represents an alkyl group having 1 to 8 carbon atoms in which 80 mol% or more of hydrogen atoms are substituted with fluorine atoms. The alkyl group may be linear, branched or cyclic. b represents an integer of 1 to 5.
一般式(9)で表される化合物は、例えば(CF3CF2)2PF- 4、(CF3CF2)3PF3 -、(CF3CF2CF2)2PF4 -、((CF3)2CF)3PF3 -、(CF3CF2CF2)2PF4 -等が挙げられる。 The compounds represented by the general formula (9) are, for example, (CF 3 CF 2 ) 2 PF - 4 , (CF 3 CF 2 ) 3 PF 3- , (CF 3 CF 2 CF 2 ) 2 PF 4- , (((CF 3 CF 2)) CF 3 ) 2 CF) 3 PF 3- , (CF 3 CF 2 CF 2 ) 2 PF 4 -and the like.
一般式(10) R4
cLYc
-
一般式(10)中、R4は少なくとも水素原子の1個がハロゲン原子で置換されたフェニル基を表す。Lはホウ素原子、ガリウム原子を表し、cは1~4の整数を表す。
General formula (10 ) R 4 c LY c-
In the general formula (10), R 4 represents a phenyl group in which at least one hydrogen atom is substituted with a halogen atom. L represents a boron atom and a gallium atom, and c represents an integer of 1 to 4.
一般式(10)で表される化合物は、例えば(C6F5)B-、((CF3)2C6H3)B-、(CF3C6H4)4B-、(C6F5)4Ga-、(C6H3F2)4Ga-などが挙げられる。 The compounds represented by the general formula (10) are, for example, (C 6 F 5 ) B- , ((CF 3 ) 2 C 6 H 3 ) B- , (CF 3 C 6 H 4 ) 4 B- , (C). 6 F 5 ) 4 Ga-, (C 6 H 3 F 2 ) 4 Ga - and the like.
一般式(11) R5SO3
-
一般式(11)中、R5は、炭素数1~12のアルキル基、炭素数1~20のパーフルオルアルキル基、又は炭素数6~20のアリール基を表し、アルキル基及びパーフルオルアルキル基は、直鎖、分岐又は環状のいずれでもよく、アリール基は無置換であっても、置換基を有してもよい。
General formula (11 ) R 5 SO 3-
In the general formula (11), R 5 represents an alkyl group having 1 to 12 carbon atoms, a perfluolalkyl group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms, and represents an alkyl group and a perfluolol group. The alkyl group may be linear, branched or cyclic, and the aryl group may be unsubstituted or having a substituent.
一般式(11)で表される化合物は、例えばトリフルオロメタンスルホン酸アニオン、ペンタフルオロエタンスルホン酸アニオン、ヘプタフルオロプロパンスルホン酸アニオン、ナノフルオルブタンスルホン酸アニオン、ペンタフルオロフェニルスルホン酸アニオン、p-トルエンスルホン酸アニオン、ベンゼンスルホン酸アニオン、カンファースルホン酸アニオン、ブタンスルホン酸アニオン等が挙げられる。 The compound represented by the general formula (11) is, for example, trifluoromethanesulfonic acid anion, pentafluoroethanesulfonic acid anion, heptafluoropropanesulfonic acid anion, nanofluorbutane sulfonic acid anion, pentafluorophenylsulfonic acid anion, p-toluene. Examples thereof include sulfonic acid anion, benzene sulfonic acid anion, camphor sulfonic acid anion, butane sulfonic acid anion.
一般式(12) (R6SO2)3C-
一般式(12)中、R6は炭素数1~20のアルキル基、炭素数1~20のパーフルオロアルキル基、又は炭素数6~20のアリール基を表し、アルキル基及びパーフルオルアルキル基は直鎖、分岐又は環状のいずれでもよく、アリール基は無置換であっても、置換基を有してもよい。
General formula (12) (R 6 SO 2 ) 3 C-
In the general formula (12), R 6 represents an alkyl group having 1 to 20 carbon atoms, a perfluoroalkyl group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms, and an alkyl group and a perfluoroalkyl group. May be linear, branched or cyclic, and the aryl group may be unsubstituted or having a substituent.
一般式(12)で表される化合物は、例えば(CF3SO2)3C-、(C2F5SO2)3C-、(C3F7SO2)3C-、(C4F9SO2)3C-等が挙げられる。 The compounds represented by the general formula (12) are, for example, (CF 3 SO 2 ) 3 C- , (C 2 F 5 SO 2 ) 3 C- , (C 3 F 7 SO 2 ) 3 C- , (C 4 ). F 9 SO 2 ) 3 C - etc.
一般式(13) (R7SO2)2N-
一般式(13)中、R7は炭素数1~20のアルキル基、炭素数1~20のパーフルオロアルキル基、又は炭素数6~20のアリール基を表し、アルキル基及びパーフルオルアルキル基は直鎖、分岐又は環状のいずれでもよく、アリール基は置換基を有してもよい。
General formula (13) (R 7 SO 2 ) 2 N-
In the general formula (13), R 7 represents an alkyl group having 1 to 20 carbon atoms, a perfluoroalkyl group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms, and an alkyl group and a perfluoroalkyl group. May be linear, branched or cyclic, and the aryl group may have a substituent.
一般式(13)で表される化合物は、例えば(CF3SO2)2N-、(C2F5SO2)2N-、(C3F7SO2)2N-、(C4F9SO2)2N-等が挙げられる。 The compounds represented by the general formula (13) are, for example, (CF 3 SO 2 ) 2 N- , (C 2 F 5 SO 2 ) 2 N- , (C 3 F 7 SO 2 ) 2 N- , (C 4 ). F 9 SO 2 ) 2 N - etc.
また、上記アニオン以外に、過ハロゲン酸イオン(Cl04 -、BrO4 -等)、ハロゲン化スルホン酸イオン(FSO3 -、ClSO3 -等)、硫酸イオン(CH3SO4 -、CF3SO4 -、HSO4 -等)、炭酸イオン(HCO3 -、CH3CO3 -等)、アルミン酸イオン(AlCl4 -、AlF4 -等)、カルボン酸イオン(CHCOO-、CF3COO-、C6H5COO-、CH3C6H4COO-、C6F5COO-等)、アリールホウ酸イオン(B(C6H5)4 -等)、特開2013-092657号公報、特開2013-080245号公報、特開2013-080240号公報、特開2013-047211号公報、特開2013-033161号公報等に記載のアニオンが挙げられる。 In addition to the above anions, perhalochloride ion (Cl0 4- , BrO 4- , etc.), halogenated sulfonic acid ion (FSO 3- , ClSO 3- , etc.), sulfate ion (CH 3 SO 4- , CF 3 SO, etc.) 4- , HSO 4- , etc.), Carbonate ion (HCO 3- , CH 3 CO 3- , etc.), Aluminate ion (AlCl 4- , AlF 4- , etc.), Carboxylic acid ion (CHCOO- , CF 3 COO- , etc.), C 6 H 5 COO- , CH 3 C 6 H 4 COO- , C 6 F 5 COO- , etc.), Arylborate ion (B (C 6 H 5 ) 4- , etc.), JP2013-092657, p. Examples thereof include the anions described in Japanese Patent Application Laid-Open No. 2013-080245, Japanese Patent Application Laid-Open No. 2013-080240, Japanese Patent Application Laid-Open No. 2013-047211, Japanese Patent Application Laid-Open No. 2013-033161 and the like.
これらの中でも、明度低下の抑制の観点から、X-は、Cl-、Br-、PF6 -、BF6 -、トリフルオロメタンスルホン酸アニオン、ノナフルオロブタンスルホン酸アニオンが好ましい。 Among these, Cl − , Br − , PF 6 − , BF 6 − , trifluoromethanesulfonate anion, and nonafluorobutane sulfonate anion are preferable as X − from the viewpoint of suppressing the decrease in brightness.
一般式(7)で表されるトリアリールスルホニウム化合物(E)は、例えば、下記の化合物が挙げられる。 Examples of the triarylsulfonium compound (E) represented by the general formula (7) include the following compounds.
トリアリールスルホニウム化合物(E)の市販品は、例えば、WPAG-336,367,370,469,638(いずれも富士フィルム和光純薬社製)、SP-056,066(ADEKA社製)、TS-91(三和ケミカル社製)、T1608,1609(いずれも東京化成工業社製)等が挙げられる。 Commercially available products of the triarylsulfonium compound (E) include, for example, WPAG-336, 367, 370, 469, 638 (all manufactured by Fuji Film Wako Pure Chemical Industries, Ltd.), SP-056,066 (manufactured by ADEKA), TS- 91 (manufactured by Sanwa Chemical Industries, Ltd.), T1608, 1609 (all manufactured by Tokyo Chemical Industry Co., Ltd.) and the like can be mentioned.
トリアリールスルホニウム化合物(E)は、単独又は2種以上を併用して使用できる。 The triarylsulfonium compound (E) can be used alone or in combination of two or more.
トリアリールスルホニウム化合物(E)の含有量は、電圧保持率、明度低下の抑制の観点から、フタロシアニン顔料(A1)100質量部に対して、0.1~15質量部が好ましく、1~12質量部がより好ましく、2~10質量%が特に好ましい。 The content of the triarylsulfonium compound (E) is preferably 0.1 to 15 parts by mass and 1 to 12 parts by mass with respect to 100 parts by mass of the phthalocyanine pigment (A1) from the viewpoint of voltage retention and suppression of decrease in brightness. The portion is more preferable, and 2 to 10% by mass is particularly preferable.
[重合性化合物(H)]
本発明の着色組成物は、重合性化合物(H)を含有できる。重合性化合物(H)は、重合性不飽和基を含有する単量体およびオリゴマーである。重合性不飽和基は、例えば、ビニル基、(メタ)アリル基、(メタ)アクリロイル基、(メタ)アクリロイルオキシ基等が挙げられる。重合性化合物(H)は、例えば、酸基含有単量体(H1)、ウレタン結合含有単量体、その他単量体が挙げられる。
[Polymerizable compound (H)]
The coloring composition of the present invention can contain a polymerizable compound (H). The polymerizable compound (H) is a monomer and an oligomer containing a polymerizable unsaturated group. Examples of the polymerizable unsaturated group include a vinyl group, a (meth) allyl group, a (meth) acryloyl group, a (meth) acryloyloxy group and the like. Examples of the polymerizable compound (H) include an acid group-containing monomer (H1), a urethane bond-containing monomer, and other monomers.
(酸基含有単量体(H1))
酸基含有単量体(H1)の酸基は、スルホン酸基、カルボキシル基、リン酸基等が挙げられる。酸基含有単量体(H1)を使用する、フォトリソグラフィー法でパターン形成する際に現像残渣を抑制できる。
(Acid group-containing monomer (H1))
Examples of the acid group of the acid group-containing monomer (H1) include a sulfonic acid group, a carboxyl group, and a phosphoric acid group. Development residue can be suppressed when pattern formation is performed by a photolithography method using an acid group-containing monomer (H1).
酸基含有単量体(H1)は、例えば、多価アルコールと(メタ)アクリル酸との遊離水酸基含有ポリ(メタ)アクリレート類と、ジカルボン酸類とのエステル化物;多価カルボン酸と、モノヒドロキシアルキル(メタ)アクリレート類とのエステル化物等が挙げられる。具体例は、トリメチロールプロパンジアクリレート、トリメチロールプロパンジメタクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールトリメタクリレート、ジペンタエリスリトールペンタアクリレート、ジペンタエリスリトールペンタメタクリレート等のモノヒドロキシオリゴアクリレート又はモノヒドロキシオリゴメタクリレート類と、マロン酸、コハク酸、グルタル酸、フタル酸等のジカルボン酸類との遊離カルボキシル基含有モノエステル化物;プロパン-1,2,3-トリカルボン酸(トリカルバリル酸)、ブタン-1,2,4-トリカルボン酸、ベンゼン-1,2,3-トリカルボン酸、ベンゼン-1,3,4-トリカルボン酸、ベンゼン-1,3,5-トリカルボン酸等のトリカルボン酸類と、2-ヒドロキシエチルアクリレート、2-ヒドロキシエチルメタクリレート、2-ヒドロキシプロピルアクリレート、2-ヒドロキシプロピルメタクリレート等のモノヒドロキシモノアクリレート又はモノヒドロキシモノメタクリレート類との遊離カルボキシル基含有オリゴエステル化物等が挙げられる。 The acid group-containing monomer (H1) is, for example, an esterified product of free hydroxyl group-containing poly (meth) acrylates of polyvalent alcohol and (meth) acrylic acid; and dicarboxylic acids; polyvalent carboxylic acid and monohydroxy. Examples thereof include esterified products with alkyl (meth) acrylates. Specific examples include monohydroxyoligoacrylates such as trimethylolpropanediacrylate, trimethylolpropanedimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol pentamethacrylate, or monohydroxyoligomethacrylates. , Free carboxyl group-containing monoesteride with dicarboxylic acids such as malonic acid, succinic acid, glutaric acid, phthalic acid; propane-1,2,3-tricarboxylic acid (tricarboxylic acid), butane-1,2,4- Tricarboxylic acids such as tricarboxylic acid, benzene-1,2,3-tricarboxylic acid, benzene-1,3,4-tricarboxylic acid, benzene-1,3,5-tricarboxylic acid, 2-hydroxyethyl acrylate, 2-hydroxy Examples thereof include monohydroxymonoacrylates such as ethyl methacrylate, 2-hydroxypropyl acrylate and 2-hydroxypropyl methacrylate, and oligoesterides containing a free carboxyl group with monohydroxymonomethacrylates.
酸基含有単量体(H1)の市販品は、大阪有機社製のビスコート#2500P、東亞合成社製アロニックスM-5300,M-5400,M-5700,M-510,M-520,M-521等が挙げられる。 Commercially available acid group-containing monomers (H1) are Viscoat # 2500P manufactured by Osaka Organic Co., Ltd., Aronix M-5300, M-5400, M-5700, M-510, M-520, M- of Toagosei Co., Ltd. 521 and the like can be mentioned.
(ウレタン結合含有単量体(H2))
ウレタン結合含有単量体(H2)は、例えば、水酸基を有する(メタ)アクリレートに多官能イソシアネートを反応させて得られる多官能ウレタンアクリレート、アルコールに多官能イソシアネートを反応させ、さらに水酸基を有する(メタ)アクリレートを反応させて得られる多官能ウレタンアクリレート等が挙げられる。
(Urethane bond-containing monomer (H2))
The urethane bond-containing monomer (H2) is, for example, a polyfunctional urethane acrylate obtained by reacting a (meth) acrylate having a hydroxyl group with a polyfunctional isocyanate, or reacting an alcohol with a polyfunctional isocyanate and further having a hydroxyl group (meth). ) Polyfunctional urethane acrylate obtained by reacting acrylate and the like can be mentioned.
水酸基を有する(メタ)アクリレートは、2-ヒドロキシエチル(メタ)アクリレート、4-ヒドロキシブチル(メタ)アクリレート、トリメチロールプロパンジ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジトリメチロールプロパントリ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールエチレンオキサイド変性ペンタ(メタ)アクリレート、ジペンタエリスリトールプロピレンオキサイド変性ペンタ(メタ)アクリレート、ジペンタエリスリトールカプロラクトン変性ペンタ(メタ)アクリレート、グリセロールアクリレートメタクリレート、グリセロールジメタクリレート、2-ヒドロキシ-3-アクリロイルプロピルメタクリレート、エポキシ基含有化合物とカルボキシ(メタ)アクリレートの反応物、水酸基含有ポリオールポリアクリレート等が挙げられる。 The (meth) acrylate having a hydroxyl group includes 2-hydroxyethyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, trimethylolpropane di (meth) acrylate, pentaerythritol tri (meth) acrylate, and ditrimethylol propanetri (meth). ) Acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol ethylene oxide-modified penta (meth) acrylate, dipentaerythritol propylene oxide-modified penta (meth) acrylate, dipentaerythritol caprolactone-modified penta (meth) acrylate, glycerol acrylate methacrylate , Gloxydimethacrylate, 2-hydroxy-3-acryloylpropylmethacrylate, a reaction product of an epoxy group-containing compound and a carboxy (meth) acrylate, a hydroxyl group-containing polyol polyacrylate and the like.
多官能イソシアネートは、トリレンジイソシアネート、ヘキサメチレンジイソシアネート、ジフェニルメチレンジイソシアネート、イソホロンジイソシアネート、ポリイソシアネート等が挙げられる。 Examples of the polyfunctional isocyanate include tolylene diisocyanate, hexamethylene diisocyanate, diphenylmethylene diisocyanate, isophorone diisocyanate, polyisocyanate and the like.
ウレタン結合含有単量体(H2)の市販品は、共栄社化学社製のAH-600、AT-600、UA-306H、UA-306T、UA-306I、UA-510H、UF-8001G、DAUA-167、新中村化学工業社製のUA-160TM,1100H、大阪有機化学工業社製のUV-4108F、UV-4117F等が挙げられる。
Commercially available products of the urethane bond-containing monomer (H2) are AH-600, AT-600, UA-306H, UA-306T, UA-306I, UA-510H, UF-8001G, and DAUA-167 manufactured by Kyoeisha Chemical Co., Ltd. , UA-160TM, 1100H manufactured by Shin-Nakamura Chemical Industry Co., Ltd., UV-4108F, UV-4117F manufactured by Osaka Organic Chemical Industry Co., Ltd., and the like.
(その他単量体)
その他単量体は、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、β-カルボキシエチル(メタ)アクリレート、ポリエチレングリコールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、ポリプロピレングリコールジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、フェノキシテトラエチレングリコール(メタ)アクリレート、フェノキシヘキサエチレングリコール(メタ)アクリレート、トリメチロールプロパンPO変性トリ(メタ)アクリレート、トリメチロールプロパンEO変性トリ(メタ)アクリレート、イソシアヌル酸EO変性ジ(メタ)アクリレート、イソシアヌル酸EO変性トリ(メタ)アクリレート、ジトリメチロールプロパンテトラ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、1,6-ヘキサンジオールジグリシジルエーテルジ(メタ)アクリレート、ビスフェノールAジグリシジルエーテルジ(メタ)アクリレート、ネオペンチルグリコールジグリシジルエーテルジ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、トリシクロデカニル(メタ)アクリレート、メチロール化メラミンの(メタ)アクリル酸エステル、エポキシ(メタ)アクリレート、ウレタンアクリレート等の各種アクリル酸エステル及びメタクリル酸エステル、(メタ)アクリル酸、スチレン、酢酸ビニル、ヒドロキシエチルビニルエーテル、エチレングリコールジビニルエーテル、ペンタエリスリトールトリビニルエーテル、(メタ)アクリルアミド、N-ヒドロキシメチル(メタ)アクリルアミド、N-ビニルホルムアミド、アクリロニトリル等が挙げられる。
(Other monomers)
Other monomers include, for example, methyl (meth) acrylate, ethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, cyclohexyl (meth) acrylate, β-carboxyethyl (meth). ) Acrylate, Polyethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, Triethylene glycol di (meth) acrylate, Polypropylene glycol di (meth) acrylate, Trimethylol propanthry (meth) acrylate, Phenoxy Tetraethylene glycol (meth) acrylate, phenoxyhexaethylene glycol (meth) acrylate, trimethylolpropane PO-modified tri (meth) acrylate, trimethylolpropane EO-modified tri (meth) acrylate, isocyanuric acid EO-modified di (meth) acrylate, isocianul Acid EO modified tri (meth) acrylate, ditrimethylol propanetetra (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, 1,6-hexanediol diglycidyl ether di (meth) acrylate, bisphenol A Diglycidyl ether di (meth) acrylate, neopentyl glycol diglycidyl ether di (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, tricyclodecanyl (meth) acrylate, methylol Various acrylic acid esters such as (meth) acrylic acid ester, epoxy (meth) acrylate, and urethane acrylate of melamine and methacrylic acid ester, (meth) acrylic acid, styrene, vinyl acetate, hydroxyethyl vinyl ether, ethylene glycol divinyl ether, penta. Examples thereof include erythritol trivinyl ether, (meth) acrylamide, N-hydroxymethyl (meth) acrylamide, N-vinylformamide, acrylonitrile and the like.
その他単量体の市販品は、例えば、日本化薬社製のKAYARAD R-128H、R526、PEG400DA、MAND、NPGDA、R-167、HX-220、R-551、R712、R-604、R-684、GPO-303、TMPTA、DPHA、DPEA-12、DPHA-2C、D-310、D-330、DPCA-20、DPCA-30、DPCA-60、DPCA-120、及び東亞合成社製のアロニックスM-303、M-305、M-306、M-309、M-310、M-321、M-325、M-350、M-360、M-313、M-315、M-400、M-402、M-403、M-404、M-405、M-406、M-450、M-452、M-408、M-211B、M-101A、大阪有機社製のビスコート#310HP、#335HP、#700、#295、#330、#360、#GPT、#400、#405、新中村化学社製のNKエステルA-9300等が挙げられる。 Commercially available products of other monomers include, for example, KAYARAD R-128H, R526, PEG400DA, MAND, NPGDA, R-167, HX-220, R-551, R712, R-604, R- manufactured by Nippon Kayaku Co., Ltd. 684, GPO-303, TPPTA, DPHA, DPEA-12, DPHA-2C, D-310, D-330, DPCA-20, DPCA-30, DPCA-60, DPCA-120, and Aronix M manufactured by Toagosei Co., Ltd. -303, M-305, M-306, M-309, M-310, M-321, M-325, M-350, M-360, M-313, M-315, M-400, M-402 , M-403, M-404, M-405, M-406, M-450, M-452, M-408, M-211B, M-101A, Viscoat # 310HP, # 335HP, # manufactured by Osaka Organic Co., Ltd. Examples thereof include 700, # 295, # 330, # 360, #GPT, # 400, # 405, and NK ester A-9300 manufactured by Shin-Nakamura Chemical Co., Ltd.
重合性化合物(H)は、単独又は2種類以上を併用して使用できる。 The polymerizable compound (H) can be used alone or in combination of two or more.
重合性化合物(H)の含有量は、着色組成物の不揮発分100質量%中、1~60質量%が好ましく、2~50質量%がより好ましい。 The content of the polymerizable compound (H) is preferably 1 to 60% by mass, more preferably 2 to 50% by mass, based on 100% by mass of the non-volatile content of the coloring composition.
[光重合開始剤(I)]
本発明の着色組成物は、光重合開始剤(I)を含有できる。光重合開始剤(I)を含むことで、着色組成物を紫外線照射により硬化させ、フォトリソグラフィー法によりフィルタセグメントを形成することができる。
[Photopolymerization Initiator (I)]
The coloring composition of the present invention can contain a photopolymerization initiator (I). By including the photopolymerization initiator (I), the colored composition can be cured by ultraviolet irradiation and a filter segment can be formed by a photolithography method.
光重合開始剤(I)は、例えば、4-フェノキシジクロロアセトフェノーン、4-t-ブチル-ジクロロアセトフェノーン、ジエトキシアセトフェノーン、1-(4-イソプロピルフェニル)-2-ヒドロキシ-2-メチルプロパン-1-オン、1-ヒドロキシシクロヘキシルフェニルケトン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルフォリノプロパン-1-オン、2-(ジメチルアミノ)-1-[4-(4-モルホリノ)フェニル]-2-(フェニルメチル)-1-ブタノーン、又は2-(ジメチルアミノ)-2-[(4-メチルフェニル)メチル]-1-[4-(4-モルホリニル)フェニル]-1-ブタノーン等のアセトフェノーン系化合物;
ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、又はベンジルジメチルケタ-ル等のベンゾイン系化合物;
ベンゾフェノーン、ベンゾイル安息香酸、ベンゾイル安息香酸メチル、4-フェニルベンゾフェノーン、ヒドロキシベンゾフェノーン、アクリル化ベンゾフェノーン、4-ベンゾイル-4’-メチルジフェニルサルファイド、又は3,3’,4,4’-テトラ(t-ブチルパーオキシカルボニル)ベンゾフェノーン等のベンゾフェノーン系化合物;
チオキサントン、2-クロルチオキサントン、2-メチルチオキサントン、イソプロピルチオキサントン、2,4-ジイソプロピルチオキサントン、又は2,4-ジエチルチオキサントン等のチオキサントン系化合物;
2,4,6-トリクロロ-s-トリアジン、2-フェニル-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(p-メトキシフェニル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(p-トリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-ピペロニル-4,6-ビス(トリクロロメチル)-s-トリアジン、2,4-ビス(トリクロロメチル)-6-スチリル-s-トリアジン、2-(ナフト-1-イル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(4-メトキシ-ナフト-1-イル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2,4-トリクロロメチル-(ピペロニル)-6-トリアジン、又は2,4-トリクロロメチル-(4’-メトキシスチリル)-6-トリアジン等のトリアジン系化合物;
1,2-オクタンジオン,1-〔4-(フェニルチオ)フェニル-,2-(O-ベンゾイルオキシム)〕、又はエタノーン,1-〔9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール3-イル〕-,1-(O-アセチルオキシム)等のオキシムエステル系化合物;
ビス(2,4,6-トリメチルベンゾイル)フェニルホスフィンオキサイド、又はジフェニル-2,4,6-トリメチルベンゾイルホスフィンオキサイド等のホスフィン系化合物;
9,10-フェナンスレンキノーン、カンファ-キノーン、エチルアントラキノーン等のキノーン系化合物;ボレート系化合物;カルバゾール系化合物;イミダゾール系化合物;あるいは、チタノセン系化合物等が挙げられる。
The photopolymerization initiator (I) is, for example, 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, diethoxyacetophenone, 1- (4-isopropylphenyl) -2-hydroxy-2. -Methylpropane-1-one, 1-hydroxycyclohexylphenylketone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2- (dimethylamino) -1-[ 4- (4-Molholino) phenyl] -2- (phenylmethyl) -1-butanone, or 2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) ) Phenyl] -1-butanone and other acetophenone compounds;
Benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, or benzyl dimethyl ketal;
Benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylicized benzophenone, 4-benzoyl-4'-methyldiphenylsulfide, or 3,3', 4, Benzophenone compounds such as 4'-tetra (t-butylperoxycarbonyl) benzophenone;
Thioxanthone compounds such as thioxanthone, 2-chlorthioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diisopropylthioxanthone, or 2,4-diethylthioxanthone;
2,4,6-Trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -s -Triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2-piperonyl-4,6-bis (trichloromethyl) -s-triazine, 2,4-bis (trichloromethyl) Methyl) -6-styryl-s-triazine, 2- (naphtho-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxy-naphtho-1-yl) -4 , 6-Bis (trichloromethyl) -s-triazine, 2,4-trichloromethyl- (piperonyl) -6-triazine, or 2,4-trichloromethyl- (4'-methoxystyryl) -6-triazine. System compounds;
1,2-octanedione, 1- [4- (phenylthio) phenyl-, 2- (O-benzoyloxime)], or ester, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole 3-Il]-, 1- (O-acetyloxime) and other oxime ester compounds;
Phosphine compounds such as bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide or diphenyl-2,4,6-trimethylbenzoylphosphine oxide;
Examples thereof include quinone compounds such as 9,10-phenanslenquinone, camphor-quinone, and ethylanthraquinone; borate compounds; carbazole compounds; imidazole compounds; and titanosen compounds.
光重合開始剤(I)の市販品は、アセトフェノーン系化合物として、「Omnirad 907」(2-メチル-1-[4-(メチルチオ)フェニル]-2-モルフォリノプロパン-1-オン)、「Omnirad 369E」(2-(ジメチルアミノ)-1-[4-(4-モルホリノ)フェニル]-2-(フェニルメチル)-1-ブタノーン)、「Omnirad 379EG」(2-(ジメチルアミノ)-2-[(4-メチルフェニル)メチル]-1-[4-(4-モルホリニル)フェニル]-1-ブタノーン)(いずれもIGM Resins社製)、ホスフィン系化合物として、「Omnirad 819」(ビス(2,4,6-トリメチルベンゾイル)-フェニルホスフィンオキサイド)、「Omnirad TPO」(ジフェニル-2,4,6-トリメチルベンゾイルホスフィンオキサイド)(いずれもIGM Resins社製)、オキシム系化合物として、1,2-オクタンジオン,1-[4-(フェニルチオ)フェニル-,2-(O-ベンゾイルオキシム)](IRGACURE OXE-01)、エタノーン,1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール3-イル]-,1-(O-アセチルオキシム)(IRGACURE OXE 02)、IRGACURE OXE 04(いずれもBASFジャパン社製)、N-1919、NCI-730、NCI-831、NCI-930(いずれもADEKA社製)、TRONLY TR-PBG-304、TRONLY TR-PBG-305、TRONLY TR-PBG-309、TRONLY TR-PBG-3054(いずれも常州強力新材料社製)等が挙げられる。また、特開2007-210991号公報、特開2009-179619号公報、特開2010-037223号公報、特開2010-215575号公報、特開2011-020998号公報等に記載のオキシムエステル系光重合開始剤も挙げられる。 Commercially available products of the photopolymerization initiator (I) include "Omnirad 907" (2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one) as an acetophenone-based compound. "Omnirad 369E" (2- (dimethylamino) -1- [4- (4-morpholino) phenyl] -2- (phenylmethyl) -1-butanone), "Omnirad 379EG" (2- (dimethylamino) -2 -[(4-Methylphenyl) Methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone) (both manufactured by IGM Resins), as a phosphine-based compound, "Omnirad 819" (bis (2) , 4,6-trimethylbenzoyl) -phenylphosphinoxide), "Omnirad TPO" (diphenyl-2,4,6-trimethylbenzoylphosphinoxide) (both manufactured by IGM Resins), 1,2- as an oxime compound. Octanedione, 1- [4- (Phenylthio) Phenyl-, 2- (O-benzoyloxime)] (IRGACURE OXE-01), Ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H- Carbazole 3-yl]-, 1- (O-acetyloxime) (IRGACURE OXE 02), IRGACURE OXE 04 (all manufactured by BASF Japan), N-1919, NCI-730, NCI-831, NCI-930 (all) Also manufactured by ADEKA), TRONLY TR-PBG-304, TRONLY TR-PBG-305, TRONLY TR-PBG-309, TRONLY TR-PBG-3054 (all manufactured by Joshu Strong New Materials Co., Ltd.) and the like. Further, the oxime ester-based photopolymerization described in JP-A-2007-210991, JP-A-2009-179619, JP-A-2010-037223, JP-A-2010-215575, JP-A-2011-02998, etc. Initiators can also be mentioned.
光重合開始剤(I)は、単独又は2種類以上を併用して使用できる。 The photopolymerization initiator (I) can be used alone or in combination of two or more.
光重合開始剤(I)の含有量は、着色剤(A)100質量部に対して、光硬化性、現像性の観点から、2~50質量部が好ましく、2~30質量部がより好ましい。 The content of the photopolymerization initiator (I) is preferably 2 to 50 parts by mass, more preferably 2 to 30 parts by mass with respect to 100 parts by mass of the colorant (A) from the viewpoint of photocurability and developability. ..
[増感剤(J)]
本発明の着色組成物は、増感剤(J)を含有できる。
[Sensitizer (J)]
The coloring composition of the present invention can contain a sensitizer (J).
増感剤(J)は、例えば、カルコン誘導体、ジベンザルアセトン等に代表される不飽和ケトン類、ベンジルやカンファ-キノーン等に代表される1,2-ジケトン誘導体、ベンゾイン誘導体、フルオレン誘導体、ナフトキノーン誘導体、アントラキノーン誘導体、キサンテン誘導体、チオキサンテン誘導体、キサントン誘導体、チオキサントン誘導体、クマリン誘導体、ケトクマリン誘導体、シアニン誘導体、メロシアニン誘導体、オキソノール誘導体等のポリメチン色素、アクリジン誘導体、アジン誘導体、チアジン誘導体、オキサジン誘導体、インドリン誘導体、アズレン誘導体、アズレニウム誘導体、スクアリリウム誘導体、ポルフィリン誘導体、テトラフェニルポルフィリン誘導体、トリアリ-ルメタン誘導体、テトラベンゾポルフィリン誘導体、テトラピラジノポルフィラジン誘導体、フタロシアニン誘導体、テトラアザポルフィラジン誘導体、テトラキノキサリロポルフィラジン誘導体、ナフタロシアニン誘導体、サブフタロシアニン誘導体、ピリリウム誘導体、チオピリリウム誘導体、テトラフィリン誘導体、アヌレン誘導体、スピロピラン誘導体、スピロオキサジン誘導体、チオスピロピラン誘導体、金属アレ-ン錯体、有機ルテニウム錯体、又はミヒラ-ケトン誘導体、α-アシロキシエステル、アシルオキサイド、メチルフェニルグリオキシレート、ベンジル、9,10-フェナンスレンキノーン、カンファ-キノーン、エチルアンスラキノーン、4,4’-ジエチルイソフタロフェノーン、3,3’又は4,4’-テトラ(t-ブチルパーオキシカルボニル)ベンゾフェノーン、4,4’-ビス(ジエチルアミノ)ベンゾフェノーン等が挙げられる。 The sensitizer (J) is, for example, a chalcone derivative, unsaturated ketones typified by dibenzalacetone, 1,2-diketone derivative typified by benzyl, camphorquinone, etc., benzoin derivative, fluorene derivative, etc. Polymethine dyes such as naphthoquinone derivatives, anthraquinone derivatives, xanthene derivatives, thioxanthene derivatives, xanthone derivatives, thioxanthone derivatives, coumarin derivatives, ketocoumarin derivatives, cyanine derivatives, merocyanine derivatives, oxonol derivatives, acridin derivatives, azine derivatives, thiazine derivatives, oxadins. Derivatives, indolin derivatives, azulene derivatives, azurenium derivatives, squarylium derivatives, porphyrin derivatives, tetraphenylporphyrin derivatives, triallylmethane derivatives, tetrabenzoporphyrin derivatives, tetrapyrazinoporphyrazine derivatives, phthalocyanine derivatives, tetraazaporphyrazine derivatives, tetraquino Xalilloporphyrazine derivative, naphthalocyanine derivative, subphthalocyanine derivative, pyrylium derivative, thiopyrilium derivative, tetraphyllin derivative, anurene derivative, spiropyran derivative, spiroxazine derivative, thiospiropyrane derivative, metal allene complex, organic ruthenium complex, or Mihira -Ketone derivatives, α-acyloxyesters, acyloxides, methylphenylglycilate, benzyls, 9,10-phenanthrenquinones, kanfa-quinones, ethyl anthracinones, 4,4'-diethylisophthalofenone, Examples thereof include 3,3'or 4,4'-tetra (t-butylperoxycarbonyl) benzophenone, and 4,4'-bis (diethylamino) benzophenone.
これらの中でも、チオキサントン誘導体、ミヒラ-ケトン誘導体、カルバゾール誘導体が好ましい。具体的な化合物は、2,4-ジエチルチオキサントン、2-クロロチオキサントン、2,4-ジクロロチオキサントン、2-イソプロピルチオキサントン、4-イソプロピルチオキサントン、1-クロロ-4-プロポキシチオキサントン、4,4’-ビス(ジメチルアミノ)ベンゾフェノーン、4,4’-ビス(ジエチルアミノ)ベンゾフェノーン、4,4’-ビス(エチルメチルアミノ)ベンゾフェノーン、N-エチルカルバゾール、3-ベンゾイル-N-エチルカルバゾール、3,6-ジベンゾイル-N-エチルカルバゾール等が好ましい。 Among these, a thioxanthone derivative, a Mihira-ketone derivative, and a carbazole derivative are preferable. Specific compounds include 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-dichlorothioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 1-chloro-4-propoxythioxanthone, 4,4'-bis. (Dimethylamino) benzophenone, 4,4'-bis (diethylamino) benzophenone, 4,4'-bis (ethylmethylamino) benzophenone, N-ethylcarbazole, 3-benzoyl-N-ethylcarbazole, 3,6-Dibenzoyl-N-ethylcarbazole and the like are preferable.
増感剤(J)は、単独又は2種類以上を併用して使用できる。 The sensitizer (J) can be used alone or in combination of two or more.
増感剤(J)の含有量は、光重合開始剤(I)100質量部に対し、3~60質量部が好ましく、5~50質量部がより好ましい。適量含有すると光硬化性、現像性が向上する。 The content of the sensitizer (J) is preferably 3 to 60 parts by mass, more preferably 5 to 50 parts by mass with respect to 100 parts by mass of the photopolymerization initiator (I). When an appropriate amount is contained, photocurability and developability are improved.
[熱硬化性化合物(K)]
本発明の着色組成物は、熱硬化性化合物(K)を含有できる。これにより被膜形成後の加熱工程で熱硬化性化合物(K)反応し架橋密度が高まるため耐熱性が向上する。
[Thermosetting compound (K)]
The coloring composition of the present invention can contain a thermosetting compound (K). As a result, the thermosetting compound (K) reacts in the heating step after the film is formed, and the crosslink density is increased, so that the heat resistance is improved.
熱硬化性化合物(K)は、低分子化合物や、樹脂のような高分子量化合物でもよい。熱硬化性化合物(K)は、例えば、エポキシ化合物、オキセタン化合物、ベンゾグアナミン化合物、ロジン変性マレイン酸化合物、ロジン変性フマル酸化合物、メラミン化合物、尿素化合物、及びフェノール化合物が挙げられる。これらの中でもエポキシ化合物及びオキセタン化合物が好ましい。 The thermosetting compound (K) may be a low molecular weight compound or a high molecular weight compound such as a resin. Examples of the thermosetting compound (K) include an epoxy compound, an oxetane compound, a benzoguanamine compound, a rosin-modified maleic acid compound, a rosin-modified fumaric acid compound, a melamine compound, a urea compound, and a phenol compound. Among these, epoxy compounds and oxetane compounds are preferable.
(エポキシ化合物(K1))
エポキシ化合物(K1)は、例えば、ビスフェノール類(ビスフェノールA、ビスフェノールF、ビスフェノールS、ビフェノール、ビスフェノールAD等)、フェノール類(フェノール、アルキル置換フェノール、芳香族置換フェノール、ナフトール、アルキル置換ナフトール、ジヒドロキシベンゼン、アルキル置換ジヒドロキシベンゼン、ジヒドロキシナフタレン等)と各種アルデヒド(ホルムアルデヒド、アセトアルデヒド、アルキルアルデヒド、ベンズアルデヒド、アルキル置換ベンズアルデヒド、ヒドロキシベンズアルデヒド、ナフトアルデヒド、グルタルアルデヒド、フタルアルデヒド、クロトンアルデヒド、シンナムアルデヒド等)との重縮合物、フェノール類と各種ジエン化合物(ジシクロペンタジエン、テルペン類、ビニルシクロヘキセン、ノールボルナジエン、ビニルノールボルネン、テトラヒドロインデン、ジビニルベンゼン、ジビニルビフェニル、ジイソプロペニルビフェニル、ブタジエン、イソプレン等)との重合物、フェノール類とケトン類(アセトン、メチルエチルケトン、メチルイソブチルケトン、アセトフェノーン、ベンゾフェノーン等)との重縮合物、フェノール類と芳香族ジメタノール類(ベンゼンジメタノール、α,α,α’,α’-ベンゼンジメタノール、ビフェニルジメタノール、α,α,α’,α’-ビフェニルジメタノール等)との重縮合物、フェノール類と芳香族ジクロロメチル類(α,α’-ジクロロキシレン、ビスクロロメチルビフェニル等)との重縮合物、ビスフェノール類と各種アルデヒドの重縮合物、アルコール類等をグリシジル化したグリシジルエーテル系エポキシ樹脂、脂環式エポキシ樹脂、複素環式エポキシ樹脂、脂肪族エポキシ樹脂、グリシジルアミン系エポキシ樹脂、グリシジルエステル系エポキシ樹脂等が挙げられる。
(Epoxy compound (K1))
The epoxy compound (K1) includes, for example, bisphenols (bisphenol A, bisphenol F, bisphenol S, biphenol, bisphenol AD, etc.), phenols (phenol, alkyl-substituted phenol, aromatic-substituted phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene). , Alkyl-substituted dihydroxybenzene, dihydroxynaphthalene, etc.) and various aldehydes (formaldehyde, acetaldehyde, alkylaldehyde, benzaldehyde, alkyl-substituted benzaldehyde, hydroxybenzaldehyde, naphthoaldehyde, glutaaldehyde, phthalaldehyde, crotonaldehyde, cinnamaldehyde, etc.) Polymerization of substances, phenols and various diene compounds (dicyclopentadiene, terpenes, vinylcyclohexene, norbornadiene, vinylnolbornene, tetrahydroinden, divinylbenzene, divinylbiphenyl, diisopropenylbiphenyl, butadiene, isoprene, etc.) Phenols and polycondensates of phenols and ketones (acetone, methylethylketone, methylisobutylketone, acetophenone, benzophenone, etc.), phenols and aromatic dimethanols (benzenedimethanol, α, α, α' , Α'-benzenedimethanol, biphenyldimethanol, α, α, α', α'-biphenyldimethanol, etc.), phenols and aromatic dichloromethyls (α, α'-dichloroxylene, etc. Polycondensate with (bischloromethylbiphenyl, etc.), polycondensate of bisphenols and various aldehydes, glycidyl ether-based epoxy resin obtained by glycidylizing alcohols, alicyclic epoxy resin, heterocyclic epoxy resin, aliphatic epoxy Examples thereof include resins, glycidylamine-based epoxy resins, and glycidyl ester-based epoxy resins.
市販品は、例えば、エピコート807,815,825,827,828,190P,191P(以上は商品名;油化シェルエポキシ社製)、エピコート1004,1256(以上は商品名;ジャパンエポキシレジン社製)、TECHMORE VG3101L(商品名;三井化学社製)、EPPN-501H、502H(商品名;日本化薬社製)、JER 1032H60(商品名;ジャパンエポキシレジン社製)、JER 157S65,157S70(商品名;ジャパンエポキシレジン社製)、EPPN-201(商品名;日本化薬社製)、JER152,154(以上は商品名;ジャパンエポキシレジン社製)、EOCN-102S,103S,104S,1020(以上は商品名;日本化薬社製)、セロキサイド2021、EHPE-3150(以上商品名;ダイセル化学工業社製)、デナコールEX-211,212,252,313,314,321,411,421,512,521,611,612,614,614B,622,711,721(以上は商品名;ナガセケムテックス社製)、TEPIC-L,H,S(日産化学工業社製)等が挙げられる。 Commercially available products include, for example, Epicoat 807,815,825,827,828,190P, 191P (trade name; manufactured by Yuka Shell Epoxy), Epicoat 1004, 1256 (trade name; manufactured by Japan Epoxy Resin). , TECHMORE VG3101L (trade name; manufactured by Mitsui Chemicals, Inc.), EPPN-501H, 502H (trade name; manufactured by Nippon Kayaku Co., Ltd.), JER 1032H60 (trade name; manufactured by Japan Epoxy Resin), JER 157S65, 157S70 (trade name; Japan Epoxy Resin Co., Ltd.), EPPN-201 (trade name; manufactured by Nippon Kayaku Co., Ltd.), JER152, 154 (the above are product names; manufactured by Japan Epoxy Resin Co., Ltd.), EOCN-102S, 103S, 104S, 1020 (the above are products). Name; manufactured by Nippon Kayaku Co., Ltd.), Serokiside 2021, EHPE-3150 (trade name; manufactured by Daicel Chemical Industry Co., Ltd.), Denacol EX-21,212,252,313,314,321,411,421,512,5211 611, 612, 614, 614B, 622, 711,721 (the above are trade names; manufactured by Nagase ChemteX Corporation), TEPIC-L, H, S (manufactured by Nissan Chemical Industry Co., Ltd.) and the like can be mentioned.
エポキシ化合物(K1)の含有量は、被膜の耐熱性の観点から、着色剤(A)100質量部に対して、0.5~300質量部が好ましく、1.0~50質量部がより好ましい。 The content of the epoxy compound (K1) is preferably 0.5 to 300 parts by mass, more preferably 1.0 to 50 parts by mass with respect to 100 parts by mass of the colorant (A) from the viewpoint of heat resistance of the coating film. ..
(オキセタン化合物(K2))
オキセタン化合物(K2)は、オキセタン基を有する公知の化合物である。オキセタン化合物は、1官能オキセタン化合物、2官能オキセタン化合物、3官能以上のオキセタン化合物が挙げられる。
(Oxetane compound (K2))
The oxetane compound (K2) is a known compound having an oxetane group. Examples of the oxetane compound include a monofunctional oxetane compound, a bifunctional oxetane compound, and a trifunctional or higher functional oxetane compound.
1官能オキセタン化合物は、例えば、(3-エチルオキセタン-3-イル)メチルアクリレート、(3-エチルオキセタン-3-イル)メチルメタクリレート、3-エチル-3-ヒドロキシメチルオキセタン、3-エチル-3-(2-エチルヘキシロキシメチル)オキセタン、3-エチル-3-(フェノキシメチル)オキセタン、3-エチル-3-(2-メタクリロキシメチル)オキセタン、3-エチル-3-{[3-(トリエトキシシリル)プロポキシ]メチル}オキセタン等が挙げられる。
市販品は、大阪有機化学工業社製OXE-10,30、東亞合成社製OXT-101,212等が挙げられる。
The monofunctional oxetane compound is, for example, (3-ethyloxetane-3-yl) methyl acrylate, (3-ethyloxetane-3-yl) methylmethacrylate, 3-ethyl-3-hydroxymethyloxetane, 3-ethyl-3-. (2-Ethylhexyloxymethyl) oxetane, 3-ethyl-3- (phenoxymethyl) oxetane, 3-ethyl-3- (2-methacryloxymethyl) oxetane, 3-ethyl-3-{[3- (triethoxy) Cyril) propoxy] methyl} oxetane and the like.
Examples of commercially available products include OXE-10,30 manufactured by Osaka Organic Chemical Industry Co., Ltd., OXT-101,212 manufactured by Toagosei Co., Ltd., and the like.
2官能オキセタン化合物は、例えば、4,4’-ビス[(3-エチル-3-オキセタニル)メトキシメチル]ビフェニル)、1,4-ビス[(3-エチル-3-オキセタニル)メトキシメチル]ベンゼン、1,4-ビス{[(3-エチル-3-オキセタニル)メトキシ]メチル}ベンゼン、ジ[1-エチル(3-オキセタニル)]メチルエーテル、ジ[1-エチル(3-オキセタニル)]メチルエーテル3-エチル-3-ヒドロキシメチルオキセタン、3-エチル-3-(2-エチルヘキシロキシメチル)オキセタン、3-エチル-3-(2-フェノキシメチル)オキセタン、3,7-ビス(3-オキセタニル)-5-オキサ-ノナン、1,2-ビス[(3-エチル-3-オキセタニルメトキシ)メチル]エタン、1,3-ビス[(3-エチル-3-オキセタニルメトキシ)メチル]プロパン、エチレングリコ-スビス(3-エチル-3-オキセタニルメチル)エーテル、ジシクロペンテニルビス(3-エチル-3-オキセタニルメチル)エーテル、トリエチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、テトラエチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、1,4-ビス(3-エチル-3-オキセタニルメトキシ)ブタン、1,6-ビス(3-エチル-3-オキセタニルメトキシ)ヘキサン、ポリエチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、エチレンオキシド(EO)変性ビスフェノールAビス(3-エチル-3-オキセタニルメチル)エーテル、プロピレンオキシド(PO)変性ビスフェノールAビス(3-エチル-3-オキセタニルメチル)エーテル、EO変性水添ビスフェノールAビス(3-エチル-3-オキセタニルメチル)エーテル、PO変性水添ビスフェノールAビス(3-エチル-3-オキセタニルメチル)エーテル、EO変性ビスフェノールF(3-エチル-3-オキセタニルメチル)エーテル等が挙げられる。
市販品は、宇部興産社製、OXBP、OXTP、東亞合成社製OXT-121,221等が挙げられる。
Bifunctional oxetane compounds include, for example, 4,4'-bis [(3-ethyl-3-oxetanyl) methoxymethyl] biphenyl), 1,4-bis [(3-ethyl-3-oxetanyl) methoxymethyl] benzene, 1,4-Bis {[(3-ethyl-3-oxetanyl) methoxy] methyl} benzene, di [1-ethyl (3-oxetanyl)] methyl ether, di [1-ethyl (3-oxetanyl)] methyl ether 3 -Ethyl-3-hydroxymethyloxetane, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3- (2-phenoxymethyl) oxetane, 3,7-bis (3-oxetanyl)- 5-oxa-nonane, 1,2-bis [(3-ethyl-3-oxetanylmethoxy) methyl] ethane, 1,3-bis [(3-ethyl-3-oxetanylmethoxy) methyl] propane, ethylene glyco-subis (3-Ethyl-3-oxetanylmethyl) ether, dicyclopentenylbis (3-ethyl-3-oxetanylmethyl) ether, triethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, tetraethyleneglycolbis (3) -Ethyl-3-oxetanylmethyl) ether, 1,4-bis (3-ethyl-3-oxetanylmethoxy) butane, 1,6-bis (3-ethyl-3-oxetanylmethoxy) hexane, polyethylene glycol bis (3-) Ethyl-3-oxetanylmethyl) ether, ethylene oxide (EO) modified bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, propylene oxide (PO) modified bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, EO-modified hydrogenated bisphenol A bis (3-ethyl-3-oxetanylmethyl) ether, PO-modified hydrogenated bisphenol A-bis (3-ethyl-3-oxetanylmethyl) ether, EO-modified bisphenol F (3-ethyl-3-oxetanyl) Methyl) ether and the like can be mentioned.
Examples of commercially available products include OXBP and OXTP manufactured by Ube Industries, Ltd., and OXT-121,221 manufactured by Toagosei Co., Ltd.
3官能以上のオキセタン化合物は、例えば、ペンタエリスリトールトリス(3-エチル-3-オキセタニルメチル)エーテル、ペンタエリスリトールテトラキス(3-エチル-3-オキセタニルメチル)エーテル、ジペンタエリスリトールヘキサ(3-エチル-3-オキセタニルメチル)エーテル、ジペンタエリスリトールペンタキス(3-エチル-3-オキセタニルメチル)エーテル、ジペンタエリスリトールテトラキス(3-エチル-3-オキセタニルメチル)エーテル、カプロラクトン変性ジペンタエリスリトールヘキサ(3-エチル-3-オキセタニルメチル)エーテル、カプロラクトン変性ジペンタエリスリトールペンタキス(3-エチル-3-オキセタニルメチル)エーテル、ジトリメチロ-ルプロパンテトラキス(3-エチル-3-オキセタニルメチル)エーテル、オキセタン基を含有する樹脂(例えば、特許第3783462号記載のオキセタン変性フェノールノボラック樹脂等)や前述のOXE-30のような(メタ)アクリルモノマーをラジカル重合させて得られる重合体が挙げられる。 Examples of the trifunctional or higher functional oxetane compound include pentaerythritol tris (3-ethyl-3-oxetanylmethyl) ether, pentaerythritol tetrakis (3-ethyl-3-oxetanylmethyl) ether, and dipentaerythritol hexa (3-ethyl-3). -Oxetanylmethyl) ether, dipentaerythritol pentax (3-ethyl-3-oxetanylmethyl) ether, dipentaerythritol tetrakis (3-ethyl-3-oxetanylmethyl) ether, caprolactone-modified dipentaerythritol hexa (3-ethyl-) 3-Oxetanylmethyl) ether, caprolactone-modified dipentaerythritol pentaxe (3-ethyl-3-oxetanylmethyl) ether, ditrimethylolpropanetetrakis (3-ethyl-3-oxetanylmethyl) ether, resin containing oxetane group (3-ethyl-3-oxetanylmethyl) ether For example, a polymer obtained by radically polymerizing a (meth) acrylic monomer such as the oxetane-modified phenol novolac resin described in Patent No. 3783462 and the above-mentioned OXE-30 can be mentioned.
オキセタン化合物(K2)の含有量は、着色組成物の不揮発分100質量%中、0.5~50質量%が好ましく、1~40質量%がより好ましい。 The content of the oxetane compound (K2) is preferably 0.5 to 50% by mass, more preferably 1 to 40% by mass, based on 100% by mass of the non-volatile content of the coloring composition.
メラミン化合物は、メラミン環構造を有する化合物である。メラミン化合物は、メチロ-ル型やエーテル型の化合物が好ましく、メラミン環1個当たりのメチロ-ル基及び/又はエーテル基数が平均5.0以上のメラミン化合物がより好ましい。適度にメチロ-ル基やエーテル基数を有すると過不足ない耐熱性が得やすい。 The melamine compound is a compound having a melamine ring structure. The melamine compound is preferably a methylol-type or ether-type compound, and more preferably a melamine compound having an average number of methylol groups and / or ether groups of 5.0 or more per melamine ring. If the number of methylol groups and ether groups is appropriate, it is easy to obtain heat resistance that is not excessive or insufficient.
市販品は、例えば、二カラックMW-30HM、MW-390、MW-100LM、MX-750LM、MW-30M、MW-30、MW-22、MS-21、MS-11、MW-24X、MS-001、MX-002、MX-730、MX-750、MX-708、MX-706、MX-042、MX-45、MX-500、MX-520、MX-43、MX-417、MX-410(三和ケミカル社製)、サイメル232,235,236,238,285,300,301,303,350,370(日本サイテックインダストリ-ズ社製)等が挙げられる。 Commercially available products include, for example, Nikarak MW-30HM, MW-390, MW-100LM, MX-750LM, MW-30M, MW-30, MW-22, MS-21, MS-11, MW-24X, MS- 001, MX-002, MX-730, MX-750, MX-708, MX-706, MX-042, MX-45, MX-500, MX-520, MX-43, MX-417, MX-410 ( Sanwa Chemical Co., Ltd.), Cymel 223, 235, 236,238, 285, 300, 301, 303, 350, 370 (manufactured by Nippon Cytec Industries Co., Ltd.) and the like.
これらの中でもメラミン環1個当たりのメチロ-ル基及び/又はエーテル基数が平均5.0以上である、二カラックMW-30HM、MW-390、MW-100LM、MX-750LM、MW-30M、MW-30、MW-22、MS-21、MS-11、MW-24X、MX-45(三和ケミカル社製)サイメル232,235,236,238,300,301,303,350(日本サイテックインダストリ-ズ社製)等は、架橋密度を高められる面で好ましい。 Among these, Nikarak MW-30HM, MW-390, MW-100LM, MX-750LM, MW-30M, MW, which have an average number of methylol groups and / or ether groups of 5.0 or more per melamine ring. -30, MW-22, MS-21, MS-11, MW-24X, MX-45 (manufactured by Sanwa Chemical Co., Ltd.) Cymel 232,235,236,238,300,301,303,350 (Nippon Cytec Industry) -Z) and the like are preferable in terms of increasing the crosslink density.
熱硬化性化合物(K)は、単独又は2種類以上を併用して使用できる。 The thermosetting compound (K) can be used alone or in combination of two or more.
本発明の着色組成物は、熱硬化性化合物の硬化を補助するため、硬化剤(硬化促進剤)を併用できる。硬化剤は、例えば、アミン系化合物、酸無水物、活性エステル、カルボン酸系化合物、スルホン酸系化合物等が挙げられる。硬化剤は、例えば、アミン化合物(例えば、ジシアンジアミド、ベンジルジメチルアミン、4-(ジメチルアミノ)-N,N-ジメチルベンジルアミン、4-メトキシ-N,N-ジメチルベンジルアミン、4-メチル-N,N-ジメチルベンジルアミン等)、4級アンモニウム塩化合物(例えば、トリエチルベンジルアンモニウムクロリド等)、ブロックイソシアネート化合物(例えば、ジメチルアミン等)、イミダゾール誘導体二環式アミジン化合物及びその塩(例えば、イミダゾール、2-メチルイミダゾール、2-エチルイミダゾール、2-エチル-4-メチルイミダゾール、2-フェニルイミダゾール、4-フェニルイミダゾール、1-シアノエチル-2-フェニルイミダゾール、1-(2-シアノエチル)-2-エチル-4-メチルイミダゾール等)、リン化合物(例えば、トリフェニルホスフィン等)、S-トリアジン誘導体(例えば、2,4-ジアミノ-6-メタクリロイルオキシエチル-S-トリアジン、2-ビニル-2,4-ジアミノ-S-トリアジン、2-ビニル-4,6-ジアミノ-S-トリアジン・イソシアヌル酸付加物、2,4-ジアミノ-6-メタクリロイルオキシエチル-S-トリアジン・イソシアヌル酸付加物等)等が挙げられる。 In the coloring composition of the present invention, a curing agent (curing accelerator) can be used in combination to assist the curing of the thermosetting compound. Examples of the curing agent include amine compounds, acid anhydrides, active esters, carboxylic acid compounds, sulfonic acid compounds and the like. The curing agent is, for example, an amine compound (for example, dicyandiamide, benzyldimethylamine, 4- (dimethylamino) -N, N-dimethylbenzylamine, 4-methoxy-N, N-dimethylbenzylamine, 4-methyl-N, N-dimethylbenzylamine, etc.), quaternary ammonium salt compounds (eg, triethylbenzylammonium chloride, etc.), blocked isocyanate compounds (eg, dimethylamine, etc.), imidazole derivative bicyclic amidin compounds and salts thereof (eg, imidazole, 2). -Methyl imidazole, 2-ethyl imidazole, 2-ethyl-4-methyl imidazole, 2-phenyl imidazole, 4-phenyl imidazole, 1-cyanoethyl-2-phenyl imidazole, 1- (2-cyanoethyl) -2-ethyl-4 -Methylimidazole, etc.), phosphorus compounds (eg, triphenylphosphine, etc.), S-triazine derivatives (eg, 2,4-diamino-6-methacryloyloxyethyl-S-triazine, 2-vinyl-2,4-diamino- Examples thereof include S-triazine, 2-vinyl-4,6-diamino-S-triazine / isocyanuric acid adduct, 2,4-diamino-6-methacryloyloxyethyl-S-triazine / isocyanuric acid adduct, etc.).
硬化剤は、単独又は2種類以上を併用して使用できる。 The curing agent can be used alone or in combination of two or more.
硬化剤の含有量は、熱硬化性化合物(K)100質量部に対して、0.01~15質量部が好ましい。 The content of the curing agent is preferably 0.01 to 15 parts by mass with respect to 100 parts by mass of the thermosetting compound (K).
[チオール系連鎖移動剤(L)]
本発明の着色組成物は、チオール系連鎖移動剤(L)を含有できる。チオール系連鎖移動剤(L)は、光重合開始剤(I)と併用すると光照射後のラジカル重合の際、酸素による重合阻害を受けにくいチイルラジカルが発生し、着色組成物の光感度が向上する。
[Thiol chain transfer agent (L)]
The coloring composition of the present invention can contain a thiol-based chain transfer agent (L). When the thiol-based chain transfer agent (L) is used in combination with the photopolymerization initiator (I), chiyl radicals that are less susceptible to polymerization inhibition by oxygen are generated during radical polymerization after light irradiation, and the photosensitivity of the coloring composition is improved. ..
チオール系連鎖移動剤(L)は、チオール基(SH基)2以上有る多官能チオールが好ましい。なお、チオール系連鎖移動剤(L)は、SH基を4以上有することがより好ましい。官能基数が増えると被膜の表面から最深部まで光硬化し易くなる。 The thiol-based chain transfer agent (L) is preferably a polyfunctional thiol having two or more thiol groups (SH groups). It is more preferable that the thiol-based chain transfer agent (L) has 4 or more SH groups. As the number of functional groups increases, it becomes easier to photo-cure from the surface of the film to the deepest part.
多官能チオールは、例えば、ヘキサンジチオール、デカンジチオール、1,4-ブタンジオ-ルビスチオプロピオネート、1,4-ブタンジオ-ルビスチオグリコレート、エチレングリコールビスチオグリコレート、エチレングリコールビスチオプロピオネート、トリメチロ-ルプロパントリスチオグリコレート、トリメチロ-ルプロパントリスチオプロピオネート、トリメチロ-ルプロパントリス(3-メルカプトブチレート)、ペンタエリスリトールテトラキスチオグリコレート、ペンタエリスリトールテトラキスチオプロピオネート、トリメルカプトプロピオン酸トリス(2-ヒドロキシエチル)イソシアヌレート、1,4-ジメチルメルカプトベンゼン、2、4、6-トリメルカプト-s-トリアジン、2-(N,N-ジブチルアミノ)-4,6-ジメルカプト-s-トリアジンなどが挙げられ、好ましくは、エチレングリコールビスチオプロピオネート、トリメチロ-ルプロパントリスチオプロピオネート、ペンタエリスリトールテトラキスチオプロピオネート等が挙げられる。 Polyfunctional thiols include, for example, hexanedithiol, decandithiol, 1,4-butandio-rubistiopropionate, 1,4-butandio-rubistioglycolate, ethylene glycol bisthioglycolate, ethylene glycol bisthiopropionate. , Trimethylol Propanetristhioglycolate, Trimethylol Propantristhiopropionate, Trimethylol Propantris (3-mercaptobutyrate), Pentaerythritol Tetrakissthioglycolate, Pentaerythritol Tetrakissthiopropionate, Trimercapto Tris (2-hydroxyethyl) propionate isocyanurate, 1,4-dimethylmercaptobenzene, 2,4,6-trimercapto-s-triazine, 2- (N, N-dibutylamino) -4,6-dimercapto- Examples thereof include s-triazine, and preferred examples include ethylene glycol bisthiopropionate, trimethylol propanthithiopropionate, pentaerythritol tetrakisthiopropionate and the like.
チオール系連鎖移動剤(L)は、単独又は2種類以上を併用して使用できる。 The thiol-based chain transfer agent (L) can be used alone or in combination of two or more.
チオール系連鎖移動剤(L)の含有量は、着色組成物の不揮発分100質量%中、0.1~10質量%が好ましく、0.5~5質量%がより好ましい。適量含有すると光感度が向上し、被膜表面にシワが発生し難くなる。 The content of the thiol-based chain transfer agent (L) is preferably 0.1 to 10% by mass, more preferably 0.5 to 5% by mass, based on 100% by mass of the non-volatile content of the coloring composition. When an appropriate amount is contained, the light sensitivity is improved and wrinkles are less likely to occur on the surface of the coating film.
[重合禁止剤(M)]
本発明の着色組成物は、重合禁止剤(M)を含有できる。
重合禁止剤(M)は、例えば、カテコール、レゾールシノール、1,4-ヒドロキノーン、2-メチルカテコール、3-メチルカテコール、4-メチルカテコール、2-エチルカテコール、3-エチルカテコール、4-エチルカテコール、2-プロピルカテコール、3-プロピルカテコール、4-プロピルカテコール、2-n-ブチルカテコール、3-n-ブチルカテコール、4-n-ブチルカテコール、2-t-ブチルカテコール、3-t-ブチルカテコール、4-t-ブチルカテコール、3,5-ジ-t-ブチルカテコール等のアルキルカテコール系化合物、2-メチルレゾールシノール、4-メチルレゾールシノール、2-エチルレゾールシノール、4-エチルレゾールシノール、2-プロピルレゾールシノール、4-プロピルレゾールシノール、2-n-ブチルレゾールシノール、4-n-ブチルレゾールシノール、2-t-ブチルレゾールシノール、4-t-ブチルレゾールシノール等のアルキルレゾールシノール系化合物、メチルヒドロキノーン、エチルヒドロキノーン、プロピルヒドロキノーン、t-ブチルヒドロキノーン、2,5-ジ-t-ブチルヒドロキノーン等のアルキルヒドロキノーン系化合物、トリブチルホスフィン、トリオクチルホスフィン、トリシクロヘキシルホスフィン、トリフェニルホスフィン、トリベンジルホスフィン等のホスフィン化合物、トリオクチルホスフィンオキサイド、トリフェニルホスフィンオキサイドなどのホスフィンオキサイド化合物、トリフェニルホスファイト、トリスノニルフェニルホスファイト等のホスファイト化合物、ピロガロ-ル、フロログルシン等が挙げられる。
[Polymerization inhibitor (M)]
The coloring composition of the present invention can contain a polymerization inhibitor (M).
The polymerization inhibitor (M) is, for example, catechol, resorcinol, 1,4-hydroquinone, 2-methylcatechol, 3-methylcatechol, 4-methylcatechol, 2-ethylcatechol, 3-ethylcatechol, 4-ethylcatechol. , 2-propyl catechol, 3-propyl catechol, 4-propyl catechol, 2-n-butyl catechol, 3-n-butyl catechol, 4-n-butyl catechol, 2-t-butyl catechol, 3-t-butyl catechol , 4-t-butylcatechol, alkylcatechol compounds such as 3,5-di-t-butylcatechol, 2-methylresorcinol, 4-methylresorcinol, 2-ethylresorsinol, 4-ethylresorsinol, 2 -Alkylresolsinol compounds such as propylresorsinol, 4-propylresorsinol, 2-n-butylresorsinol, 4-n-butylresorsinol, 2-t-butylresorsinol, 4-t-butylresorsinol, etc. Alkylhydroquinone compounds such as methylhydroquinone, ethylhydroquinone, propylhydroquinone, t-butylhydroquinone, 2,5-di-t-butylhydroquinone, tributylphosphine, trioctylphosphine, tricyclohexylphosphine, triphenyl Examples thereof include phosphine compounds such as phosphine and tribenzylphosphine, phosphine oxide compounds such as trioctylphosphine oxide and triphenylphosphine oxide, phosphite compounds such as triphenylphosphite and trisnonylphenylphosphite, pyrogallol and fluoroglucin. ..
重合禁止剤(M)の含有量は、着色組成物の不揮発分100質量%中、0.01~0.4質量中が好ましい。 The content of the polymerization inhibitor (M) is preferably 0.01 to 0.4% by mass in 100% by mass of the non-volatile content of the coloring composition.
[紫外線吸収剤(N)]
本発明の着色組成物は、紫外線吸収剤(N)を含有できる。紫外線吸収剤(N)は、紫外線吸収機能を有する有機化合物であり、ベンゾトリアゾール系有機化合物、トリアジン系有機化合物、ベンゾフェノーン系有機化合物、サリチル酸エステル系有機化合物、シアノアクリレート系有機化合物、及びサリシレート系有機化合物等が挙げられる。
[Ultraviolet absorber (N)]
The coloring composition of the present invention can contain an ultraviolet absorber (N). The ultraviolet absorber (N) is an organic compound having an ultraviolet absorbing function, and is a benzotriazole-based organic compound, a triazine-based organic compound, a benzophenone-based organic compound, a salicylic acid ester-based organic compound, a cyanoacrylate-based organic compound, and salicylate. Examples include system organic compounds.
ベンゾトリアゾール系化合物は、例えば、2-(5メチル-2-ヒドロキシフェニル)ベンゾトリアゾール、2-(2-ヒドロキシ-5-t-ブチルフェニル)-2H-ベンゾトリアゾール、2-[2-ヒドロキシ-3,5-ビス(α, α-ジメチルベンジル)フェニル]-2H-ベンゾトリアゾール、2-(3-tブチル-5-メチル-2-ヒドロキシフェニル)-5-クロロベンゾトリアゾール、2-(2'-ヒドロキシ-5'-t-オクチルフェニル)ベンゾトリアゾール、5%の2-メトキシ-1-メチルエチルアセテートと95%のベンゼンプロパン酸,3-(2H-ベンゾトリアゾール2-イル)-(1,1-ジメチルエチル)-4-ヒドロキシ,C7-9側鎖及び直鎖アルキルエステルの混合物、2-(2H-ベンゾトリアゾール2-イル)-4,6-ビス(1-メチル-1-フェニルエチル)フェノール、2-(2H-ベンゾトリアゾール2-イル)-6-(1-メチル-1-フェニルエチル)-4-(1,1,3,3-テトラメチルブチル)フェノール、メチル 3-(3-(2H-ベンゾトリアゾール2-イル)-5-t-ブチル-4-ヒドロキシフェニル)プロピオネート/ポリエチレングリコール300の反応生成物、2-(2H-ベンゾトリアゾール2-イル)-4-(1,1,3,3-テトラメチルブチル)フェノール、2,2’-メチレンビス[6-(2H-ベンゾトリアゾール2-イル)-4-(1,1,3,3-テトラメチルブチル)フェノール]、2-(2H-ベンゾトリアゾール2-イル)-p-クレゾール、2-(5-クロロ-2H-ベンゾトリアゾール2-イル)-6-t-ブチル-4-メチルフェノール、2-(3,5-ジ-t-アミル-2-ヒドロキシフェニル)ベンゾトリアゾール、2-[2-ヒドロキシ-5-[2-(メタクリロイルオキシ)エチル]フェニル]-2H-ベンゾトリアゾール、オクチル-3-[3-tert-ブチル-4-ヒドロキシ-5-(5-クロロ-2H-ベンゾトリアゾール2-イル)フェニル]プロピオネート、2-エチルヘキシル-3-[3-tert-ブチル-4-ヒドロキシ-5-(5-クロロ-2H-ベンゾトリアゾール2-イル)フェニル]プロピオネートが挙げられる。 Benzotriazole compounds include, for example, 2- (5-methyl-2-hydroxyphenyl) benzotriazole, 2- (2-hydroxy-5-t-butylphenyl) -2H-benzotriazole, 2- [2-hydroxy-3. , 5-bis (α, α-dimethylbenzyl) phenyl] -2H-benzotriazole, 2- (3-t butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole, 2- (2'- Hydroxy-5'-t-octylphenyl) benzotriazole, 5% 2-methoxy-1-methylethyl acetate and 95% benzenepropanoic acid, 3- (2H-benzotriazole 2-yl)-(1,1- Dimethylethyl) -4-hydroxy, C7-9 side chain and linear alkyl ester mixture, 2- (2H-benzotriazole 2-yl) -4,6-bis (1-methyl-1-phenylethyl) phenol, 2- (2H-benzotriazole 2-yl) -6- (1-methyl-1-phenylethyl) -4- (1,1,3,3-tetramethylbutyl) phenol, methyl 3- (3- (2H) -Reaction product of -benzotriazole 2-yl) -5-t-butyl-4-hydroxyphenyl) propionate / polyethylene glycol 300, 2- (2H-benzotriazole 2-yl) -4- (1,1,3) 3-Tetramethylbutyl) Phenol, 2,2'-Methylenebis [6- (2H-benzotriazole2-yl) -4- (1,1,3,3-tetramethylbutyl) phenol], 2- (2H-) Benzotriazole 2-yl) -p-cresol, 2- (5-chloro-2H-benzotriazole 2-yl) -6-t-butyl-4-methylphenol, 2- (3,5-di-t-amyl) -2-Hydroxyphenyl) benzotriazole, 2- [2-hydroxy-5- [2- (methacryloyloxy) ethyl] phenyl] -2H-benzotriazole, octyl-3- [3-tert-butyl-4-hydroxy- 5- (5-Chloro-2H-benzotriazole2-yl) phenyl] propionate, 2-ethylhexyl-3- [3-tert-butyl-4-hydroxy-5- (5-chloro-2H-benzotriazole2-yl) ) Phenol] propionate.
市販品は、BASFジャパン社製TINUVIN P、PS、234、326、329、384-2、900、928、99-2、1130、ADEKA社製アデカスタブLA-29、LA-31RG、LA-32、LA-36、ケミプロ化成社製KEMISORB71、73、74、79、279、大塚化学社製RUVA-93等が挙げられる。 Commercially available products are BASF Japan's TINUVIN P, PS, 234, 326, 329, 384-2, 900, 928, 99-2, 1130, ADEKA's ADEKA STAB LA-29, LA-31RG, LA-32, LA. -36, KEMISORB71, 73, 74, 79, 279 manufactured by Chemipro Kasei Co., Ltd., RUVA-93 manufactured by Otsuka Chemical Co., Ltd., and the like.
トリアジン系化合物は、例えば、2,4-ビス(2,4-ジメチルフェニル)-6-(2-ヒドロキシ-4-n-オクチルオキシフェニル)-1,3,5-トリアジン、2-[4,6-ビス(2,4-ジメチルフェニル)-1,3,5-トリアジン-2-イル]-5-[3-(ドデシルオキシ)-2-ヒドロキシプロポキシ]フェノール、2-(2,4-ジヒドロキシフェニル)-4,6-ビス(2,4-ジメチルフェニル)-1,3,5-トリアジンと(2-エチルヘキシル)-グリシド酸エステルの反応生成物、2,4-ビス「2-ヒドロキシ-4-ブトキシフェニル」-6-(2,4-ジブトキシフェニル)-1,3,5-トリアジン、2-(4,6-ジフェニル-1,3,5-トリアジン-2-イル)-5-(ヘキシルオキシ)フェノール、2-(4,6-ジフェニル-1,3,5-トリアジン-2-イル)-5-[2-(2-エチルヘキサノイルオキシ)エトキシ]フェノール、2,4,6-トリス(2-ヒドロキシ-4-ヘキシルオキシ-3-メチルフェニル)-1,3,5-トリアジン等が挙げられる。 The triazine compounds include, for example, 2,4-bis (2,4-dimethylphenyl) -6- (2-hydroxy-4-n-octyloxyphenyl) -1,3,5-triazine, 2- [4. 6-bis (2,4-dimethylphenyl) -1,3,5-triazine-2-yl] -5- [3- (dodecyloxy) -2-hydroxypropoxy] phenol, 2- (2,4-dihydroxy) Phenyl) -4,6-bis (2,4-dimethylphenyl) -1,3,5-triazine and (2-ethylhexyl) -glycidate ester reaction product, 2,4-bis "2-hydroxy-4 -Butoxyphenyl "-6- (2,4-dibutoxyphenyl) -1,3,5-triazine, 2- (4,6-diphenyl-1,3,5-triazine-2-yl) -5-( Hexyloxy) phenol, 2- (4,6-diphenyl-1,3,5-triazine-2-yl) -5- [2- (2-ethylhexanoyloxy) ethoxy] phenol, 2,4,6- Examples thereof include tris (2-hydroxy-4-hexyloxy-3-methylphenyl) -1,3,5-triazine.
市販品は、ケミプロ化成社製KEMISORB 102、BASFジャパン社製TINUVIN 400、405、460、477、479、1577ED、ADEKA社アデカスタブLA-46、LA-F70、サンケミカル社製CYASORB UV-1164等が挙げられる。 Examples of commercially available products include KEMIPROB 102 manufactured by Chemipro Kasei Co., Ltd., TINUVIN 400, 405, 460, 477, 479, 1577ED manufactured by BASF Japan, ADEKA Adecaster LA-46, LA-F70 manufactured by ADEKA, and CYASORB UV-1164 manufactured by Sun Chemical Co., Ltd. Be done.
ベンゾフェノーン系化合物は、例えば、2,4-ジ-ヒドロキシベンゾフェノーン、2-ヒドロキシ-4-メトキシベンゾフェノーン、2-ヒドロキシ-4-メトキシベンゾフェノーン5-スルホン酸-3水温、2-ヒドロキシ-4-n-オクトキシベンゾフェノーン、2,2’-ジ-ヒドロキシ-4-メトキシベンゾフェノーン、2,2’-ジヒドロキシ-4,4’-ジメトキシベンゾフェノーン、4-ドデシロキシ-2-ヒドロキシベンゾフェノーン、2-ヒドロキシ-4-オクタデシロキシベンゾフェノーン、2,2’ジヒドロキシ-4,4’-ジメトキシベンゾフェノーン、2,2’,4,4’-テトラヒドロキシベンゾフェノーン、2-ヒドロキシ-4-メトキシ-2’-カルボキシベンゾフェノーン等が挙げられる。 Examples of the benzophenone compound include 2,4-di-hydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-methoxybenzophenone 5-sulfonic acid-3 water temperature, 2 -Hydroxy-4-n-octoxybenzophenone, 2,2'-di-hydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone, 4-dodecyloxy- 2-Hydroxybenzophenone, 2-hydroxy-4-octadecyloxybenzophenone, 2,2'dihydroxy-4,4'-dimethoxybenzophenone, 2,2', 4,4'-tetrahydroxybenzopheno , 2-Hydroxy-4-methoxy-2'-carboxybenzophenone and the like.
市販品は、ケミプロ化成社製KEMISORB 10、11、11S、12、111、シプロ化成社製SEESORB 101、107、ADEKA社製アデカスタブ1413、サンケミカル社製UV-12等が挙げられる。 Examples of commercially available products include KEMIPROB 10, 11, 11S, 12, 111 manufactured by Chemipro Kasei Co., Ltd., SEESORB 101, 107 manufactured by Sipro Kasei Co., Ltd., ADEKA STAB 1413 manufactured by ADEKA Co., Ltd., UV-12 manufactured by Sun Chemical Co., Ltd. and the like.
サリチル酸エステル系化合物は、例えば、サリチル酸フェニル、サリチル酸p-オクチルフェニル、サリチル酸p-tertブチルフェニル等が挙げられる。 Examples of the salicylic acid ester compound include phenyl salicylate, p-octylphenyl salicylate, and p-tert-butyl phenyl salicylate.
紫外線吸収剤(N)の含有量は、光重合開始剤と紫外線吸収剤との合計100質量%中、5~70質量%が好ましい。 The content of the ultraviolet absorber (N) is preferably 5 to 70% by mass based on 100% by mass of the total of the photopolymerization initiator and the ultraviolet absorber.
[酸化防止剤(O)]
本発明の着色組成物は、酸化防止剤(O)を含有できる。酸化防止剤(O)は、着色組成物に含まれる光重合開始剤や熱硬化性化合物が、熱硬化やITOアニ-ル時の熱工程によって酸化による黄変を防ぎ、被膜の透過率の低下を抑制できる。特に、感光性組成物の顔料濃度が高い場合、相対的に光重合性化合物の含有量が減少するため、光重合開始剤の増量や、熱硬化性化合物の配合で対応すると被膜が黄変し易い。そのため、酸化防止剤を含むことで、加熱工程時の酸化による黄変を防止し、被膜の透過率の低下を抑制できる。
[Antioxidant (O)]
The coloring composition of the present invention may contain an antioxidant (O). As the antioxidant (O), the photopolymerization initiator and the thermosetting compound contained in the coloring composition prevent yellowing due to oxidation by the thermosetting and the thermal process at the time of ITO annealing, and the transmittance of the film is lowered. Can be suppressed. In particular, when the pigment concentration of the photosensitive composition is high, the content of the photopolymerizable compound decreases relatively, so if the amount of the photopolymerization initiator is increased or the thermosetting compound is blended, the film will turn yellow. easy. Therefore, by including an antioxidant, it is possible to prevent yellowing due to oxidation during the heating step and suppress a decrease in the transmittance of the coating film.
酸化防止剤(O)は、例えば、ヒンダ-ドフェノール系、ヒンダ-ドアミン系、リン系、イオウ系、及びヒドロキシルアミン系の化合物が挙げられる。なお、本明細書で酸化防止剤は、ハロゲン原子を含有しない化合物が好ましい。 Examples of the antioxidant (O) include hydride-based phenol-based, hydride-based amine-based, phosphorus-based, sulfur-based, and hydroxylamine-based compounds. In the present specification, the antioxidant is preferably a compound containing no halogen atom.
これらの中でも、塗膜の透過率と感度の両立の観点から、ヒンダ-ドフェノール系酸化防止剤、ヒンダ-ドアミン系酸化防止剤、リン系酸化防止剤、イオウ系酸化防止剤が好ましい。 Among these, from the viewpoint of achieving both the transmittance and the sensitivity of the coating film, a hydride-based phenol-based antioxidant, a hydride-based amine-based antioxidant, a phosphorus-based antioxidant, and a sulfur-based antioxidant are preferable.
ヒンダ-ドフェノール系酸化防止剤は、例えば、1,3,5-トリス(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオン、1,1,3-トリス-(2’-メチル-4’-ヒドロキシ-5’-t-ブチルフェニル)-ブタン、4,4’-ブチリデン-ビス-(2-t-ブチル-5-メチルフェノール)、3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオン酸ステアリル、ペンタエリスリトールテトラキス[3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート、3,9-ビス[2-[3-(3-t-ブチル-4-ヒドロキシ-5-メチルフェニル)プロピオニルオキシ]-1,1-ジメチルエチル]-2,4,8,10-テトラオキサスピロ[5.5]ウンデカン、1,3,5-トリス(3,5-ジ-t-ブチル-4-ヒドロキシフェニルメチル)-2,4,6-トリメチルベンゼン、1,3,5-トリス(3-ヒドロキシ-4-t-ブチル-2,6-ジメチルベンジル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオン、2,2’-メチレンビス(6-t-ブチル-4-エチルフェノール)、2,2’-チオジエチルビス-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)-プロピオネート、N,N-ヘキサメチレンビス(3,5-ジ-t-ブチル-4-ヒドロキシ-ヒドロシンナムアミド)、i-オクチル-3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート、4,6-ビス(ドデシルチオメチル)-o-クレゾール、3,5-ジ-t-ブチル-4-ヒドロキシベンジルホスホン酸モノエチルエステルのカルシウム塩、4,6-ビス(オクチルチオメチル)-o-クレゾール、ビス[3-(3-メチル-4-ヒドロキシ-5-t-ブチルフェニル)プロピオン酸]エチレンビスオキシビスエチレン、1,6-ヘキサンジオ-ルビス[3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート、2,4-ビス-(n-オクチルチオ)-6-(4-ヒドロキシ-3,5-ジ-t-ブチルアニリノ)-1,3,5-トリアジン、2,2’-チオ-ビス-(6-t-ブチル-4-メチルフェノール)、2,5-ジ-t-アミル-ヒドロキノーン、2,6-ジ-t-ブチル-4-ノニルフェノール、2,2’-イソブチリデン-ビス-(4,6-ジメチル-フェノール)、2,2’-メチレン-ビス-(6-(1-メチル-シクロヘキシル)-p-クレゾール)、2,4-ジメチル-6-(1-メチル-シクロヘキシル)-フェノール等が挙げられる。 Hindered phenolic antioxidants include, for example, 1,3,5-tris (3,5-di-t-butyl-4-hydroxybenzyl) -1,3,5-triazine-2,4,6 ( 1H, 3H, 5H) -trion, 1,1,3-tris- (2'-methyl-4'-hydroxy-5'-t-butylphenyl) -butane, 4,4'-butylidene-bis- (2' -T-butyl-5-methylphenol), 3- (3,5-di-t-butyl-4-hydroxyphenyl) stearyl propionate, pentaerythritol tetrakis [3- (3,5-di-t-butyl-) 4-Hydroxyphenyl) propionate, 3,9-bis [2- [3- (3-t-butyl-4-hydroxy-5-methylphenyl) propionyloxy] -1,1-dimethylethyl] -2,4 8,10-Tetraoxaspiro [5.5] undecane, 1,3,5-tris (3,5-di-t-butyl-4-hydroxyphenylmethyl) -2,4,6-trimethylbenzene, 1, 3,5-Tris (3-hydroxy-4-t-butyl-2,6-dimethylbenzyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, 2,2 '-Methylenebis (6-t-butyl-4-ethylphenol), 2,2'-thiodiethylbis- (3,5-di-t-butyl-4-hydroxyphenyl) -propionate, N, N-hexamethylene Bis (3,5-di-t-butyl-4-hydroxy-hydrocinnamamide), i-octyl-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate, 4,6- Bis (dodecylthiomethyl) -o-cresol, calcium salt of 3,5-di-t-butyl-4-hydroxybenzylphosphonic acid monoethyl ester, 4,6-bis (octylthiomethyl) -o-cresol, bis [3- (3-Methyl-4-hydroxy-5-t-butylphenyl) propionic acid] ethylenebisoxybisethylene, 1,6-hexanediolbis [3- (3,5-di-t-butyl-4) -Hydroxyphenyl) propionate, 2,4-bis- (n-octylthio) -6- (4-hydroxy-3,5-di-t-butylanilino) -1,3,5-triazine, 2,2'-thio -Bis- (6-t-butyl-4-methylphenol), 2,5-di-t-amyl-hydroquinone, 2,6-di-t-butyl-4-nonylphenol, 2,2'-isobutylidene-bis -(4) , 6-dimethyl-phenol), 2,2'-methylene-bis- (6- (1-methyl-cyclohexyl) -p-cresol), 2,4-dimethyl-6- (1-methyl-cyclohexyl) -phenol And so on.
市販品は、ADEKA社製アデカスタブAO-20、AO-30、AO-40,AO-50、AO-60、AO-80、AO-330、ケミプロ社製KEMINOX101、179、76、9425、BASFジャパン社製IRGANOX1010,1035,1076,1098,1135,1330,1726,1425WL,1520L,245,259,3114,5057,565、サンケミカル社製サイアノックスCY-1790、CY-2777等が挙げられる。 Commercially available products are ADEKA's ADEKA STUB AO-20, AO-30, AO-40, AO-50, AO-60, AO-80, AO-330, Chemipro's KEMINOX 101, 179, 76, 9425, BASF Japan. Examples thereof include IRGANOX 1010, 1035, 1076, 1098, 1135, 1330, 1726, 1425WL, 1520L, 245, 259, 3114, 5057, 565, and Sianox CY-1790 and CY-2777 manufactured by Sun Chemical.
ヒンダ-ドアミン系酸化防止剤は、例えば、テトラキス(1,2,2,6,6-ペンタメチル-4-ピペリジル)-1,2,3,4-ブタンテトラカルボキシレート、テトラキス(2,2,6,6-テトラメチル-4-ピペリジル)1,2,3,4-ブタンテトラカルボキシレート、ビス(1,2,2,6,6-ペンタメチル-4-ピペリジル)セバケート、ビス(2,2,6,6-テトラメチル-4-ピペリジル)セバケート、ビス(1-ウンデカノキシ-2,2,6,6-テトラメチルピペリジン-4-イル)カルボネート、1,2,2,6,6-ペンタメチル-4-ピペリジルメタクリレート、2,2,6,6-テトラメチル-4-ピペリジルメタクリレート、コハク酸ジメチルと1-(2-ヒドロキシエチル)-4-ヒドロキシ-2,2,6,6-テトラメチルピペリジンとの重縮合物、ポリ[[6-[(1,1,3,3-テトラメチルブチル)アミノ]-s-トリアジン-2,4-ジイル]-[(2,2,6,6-テトラメチル-4-ピペリジル)イミノ]-ヘキサメチレン-[(2,2,6,6-テトラメチル-4-ピペリジル)イミノ]]、4-ヒドロキシ-2,2,6,6-テトラメチル-1-ピペリジンエタノールと3,5,5-トリメチルヘキサン酸のエステル、N,N’-4,7-テトラキス〔4,6-ビス{N-ブチル-N-(1,2,2,6,6-ペンタメチル-4-ピペリジル)アミノ}-1,3,5-トリアジン-2-イル〕-4,7-ジアザデカン-1,10-ジアミン、デカン二酸ビス(2,2,6,6-テトラメチル-1-(オクチルオキシ)-4-ピペリジニル)エステル,1,1-ジメチルエチルヒドロペルオキシドとオクタンの反応生成物、ビス(1,2,2,6,6-ペンタメチル-4-ピリペリジル)[[3,5-ビス(1,1ジメチルエチル)-4-ヒドロキシフェニル]メチル]ブチルマロネートメチル1,2,2,6,6-ペンタメチル-4-ピリペリジルセバケート、ポリ[[6-モルホリノ-s-トリアジン-2,4-ジイル]-[(2,2,6,6-テトラメチル-4-ピペリジル)イミノ]-ヘキサメチレン-[(2,2,6,6-テトラメチル-4-ピペリジル)イミノ]]、2,2,6,6-テトラメチル-4-ピペリジル-C12-21及びC18不飽和脂肪酸エステル、N,N’-ビス(2,2,6,6-テトラメチル-4-ピペリジル)-1,6-ヘキサメチレンジアミン、2-メチル-2-(2,2,6,6-テトラメチル-4-ピペリジル)アミノ-N-(2,2,6,6-テトラメチル-4-ピペリジル)プロピオンアミド等が挙げられる。 Examples of the hindered amine antioxidants include tetrakis (1,2,2,6,6-pentamethyl-4-piperidyl) -1,2,3,4-butanetetracarboxylate and tetrakis (2,2,6). , 6-Tetramethyl-4-piperidyl) 1,2,3,4-butanetetracarboxylate, bis (1,2,2,6,6-pentamethyl-4-piperidyl) sebacate, bis (2,2,6) , 6-Tetramethyl-4-piperidyl) sebacate, bis (1-undecanoxy-2,2,6,6-tetramethylpiperidine-4-yl) carbonate, 1,2,2,6,6-pentamethyl-4-yl Weights of piperidyl methacrylate, 2,2,6,6-tetramethyl-4-piperidylmethacrylate, dimethyl succinate and 1- (2-hydroxyethyl) -4-hydroxy-2,2,6,6-tetramethylpiperidine Condensate, poly [[6-[(1,1,3,3-tetramethylbutyl) amino] -s-triazine-2,4-diyl]-[(2,2,6,6-tetramethyl-4) -Piperidyl) imino] -hexamethylene-[(2,2,6,6-tetramethyl-4-piperidyl) imino]], 4-hydroxy-2,2,6,6-tetramethyl-1-piperidinethanol Ester of 3,5,5-trimethylhexanoic acid, N, N'-4,7-tetrakis [4,6-bis {N-butyl-N- (1,2,2,6,6-pentamethyl-4-) Piperidine) amino} -1,3,5-triazine-2-yl] -4,7-diazadecan-1,10-diamine, bisdecanediate (2,2,6,6-tetramethyl-1- (octyl) Oxy) -4-piperidinyl) ester, reaction product of 1,1-dimethylethylhydroperoxide and octane, bis (1,2,2,6,6-pentamethyl-4-piperidyl) [[3,5-bis (3,5-bis (3,5-bis) 1,1 dimethylethyl) -4-hydroxyphenyl] methyl] butyl malonate methyl 1,2,2,6,6-pentamethyl-4-piperidylsevakate, poly [[6-morpholino-s-triazine-2 , 4-Diyl]-[(2,2,6,6-tetramethyl-4-piperidyl) imino] -hexamethylene-[(2,2,6,6-tetramethyl-4-piperidyl) imino]], 2,2,6,6-tetramethyl-4-piperidyl-C12-21 and C18 unsaturated fatty acid ester, N, N'-bis (2,2,6,6-tetramethyl-4-piperidyl) -1, 6 -Hexamethylenediamine, 2-methyl-2- (2,2,6,6-tetramethyl-4-piperidyl) amino-N- (2,2,6,6-tetramethyl-4-piperidyl) propionamide, etc. Can be mentioned.
市販品は、ADEKA社製アデカスタブLA-52、LA-57、LA-63P、LA-68、LA-72、LA-77Y、LA-77G、LA-81、LA-82、LA-87、LA-402F、LA-502XP、ケミプロ化成社製KAMISTAB29、62、77、94、BASFジャパン社製Tinuvin249、TINUVIN111FDL、123、144、292、5100、サンケミカル社製サイアソ-ブUV-3346、UV-3529、UV-3853等が挙げられる。 Commercially available products are ADEKA's ADEKA STAB LA-52, LA-57, LA-63P, LA-68, LA-72, LA-77Y, LA-77G, LA-81, LA-82, LA-87, LA- 402F, LA-502XP, KAMISTAB29, 62, 77, 94 manufactured by Chemipro Kasei Co., Ltd., Tinuvin249 manufactured by BASF Japan, TINUVIN111FDL, 123, 144, 292, 5100, Siasorb UV-3346, UV-3349 manufactured by Sun Chemical Co., Ltd., UV -3853 and the like can be mentioned.
リン系酸化防止剤は、例えば、ジ(2,6-ジ-t-ブチル-4-メチルフェニル)ペンタエリスリトールジホスファイト、ジステアリルペンタエリスリトールジホスファイト、2,2’-メチレンビス(4,6-ジ-t-ブチルフェニル)2-エチルヘキシルホスファイト、トリス(2,4-ジ-t-ブチルフェニル)ホスファイト、トリス(ノニルフェニル)ホスファイト、テトラ(C12~C15アルキル)-4,4’-イソプロピリデンジフェニルジホスファイト、ジフェニルモノ(2-エチルヘキシル)ホスファイト、ジフェニルイソデシルホスファイト、トリス(イソデシル)ホスファイト、トリフェニルホスファイト、テトラキス(2,4-ジ-t-ブチルフェニル)-4,4-ビフェニルジフォスホニト、トリス(トリデシル)ホスファイト、フェニルイソオクチルホスファイト、フェニルイソデシルホスファイト、フェニルジ(トリデシル)ホスファイト、ジフェニルイソオクチルホスファイト、ジフェニルトリデシルホスファイト、4,4’-イソプロピリデンジフェノールアルキルホスファイト、トリスノニルフェニルホスファイト、トリスジノニルフェニルホスファイト、トリス(ビフェニル)ホスファイト、ジ(2,4-ジ-t-ブチルフェニル)ペンタエリスリトールジホスファイト、ジ(ノニルフェニル)ペンタエリスリトールジホスファイト、フェニルビスフェノールAペンタエリスリトールジホスファイト、テトラトリデシル4,4’-ブチリデンビス(3-メチル-6-t-ブチルフェノール)ジホスファイト、ヘキサトリデシル1,1,3-トリス(2-メチル-4-ヒドロキシ-5-t-ブチルフェニル)ブタントリホスファイト、3,5-ジ-t-ブチル-4-ヒドロキシベンジルホスファイトジエチルエステル、ソジウムビス(4-t-ブチルフェニル)ホスファイト、ソジウム-2,2-メチレン-ビス(4,6-ジ-t-ブチルフェニル)-ホスファイト、1,3-ビス(ジフェノキシフォスフォニロキシ)-ベンゼン、亜リン酸エチルビス(2,4-ジt-ブチル-6-メチルフェニル)等が挙げられる。 Phylline antioxidants include, for example, di (2,6-di-t-butyl-4-methylphenyl) pentaerythritol diphosphite, distearyl pentaerythritol diphosphite, 2,2'-methylenebis (4,6). -Di-t-butylphenyl) 2-ethylhexyl phosphite, tris (2,4-di-t-butylphenyl) phosphite, tris (nonylphenyl) phosphite, tetra (C12-C15 alkyl) -4,4' -Isopropyridene diphenyl diphosphite, diphenylmono (2-ethylhexyl) phosphite, diphenylisodecylphosphite, tris (isodecyl) phosphite, triphenylphosphite, tetrakis (2,4-di-t-butylphenyl)- 4,4-Biphenyldiphoshonito, Tris (tridecyl) phosphite, phenylisooctylphosphite, phenylisodecylphosphite, phenyldi (tridecyl) phosphite, diphenylisooctylphosphite, diphenyltridecylphosphite, 4,4 '-Isopropyridene diphenol alkyl phosphite, trisnonylphenyl phosphite, trisdinonylphenyl phosphite, tris (biphenyl) phosphite, di (2,4-di-t-butylphenyl) pentaerythritol diphosphite, di (Nonylphenyl) Pentaerythritol diphosphite, Phenylbisphenol A Pentaerythritol diphosphite, tetratridecyl 4,4'-butylidenebis (3-methyl-6-t-butylphenol) diphosphite, hexatridecyl 1,1,3- Tris (2-methyl-4-hydroxy-5-t-butylphenyl) butanetriphosphite, 3,5-di-t-butyl-4-hydroxybenzylphosphite diethyl ester, sodiumbis (4-t-butylphenyl) phos Fight, Sodium-2,2-Methylene-bis (4,6-di-t-butylphenyl) -phosphite, 1,3-bis (diphenoxyphosphonyloxy) -benzene, ethylbis phosphite (2,4) -Dit-butyl-6-methylphenyl) and the like.
市販品は、ADEKA社製アデカスタブPEP-36、PEP-8、HP-10、2112、1178、1500、C、135A、3010、TPP、BASFジャパン社製IRGAFOS168、クラリアントケミカルズ社製HostanoxP-EPQ等が挙げられる。 Examples of commercially available products include ADEKA's ADEKA STAB PEP-36, PEP-8, HP-10, 2112, 1178, 1500, C, 135A, 3010, TPP, BASF Japan's IRGAFOS168, and Clariant Chemicals' HostanoxP-EPQ. Be done.
イオウ系酸化防止剤は、例えば、2,2-ビス{〔3-(ドデシルチオ)-1-オキソプロポキシ〕メチル}プロパン-1,3-ジイルビス〔3-(ドデシルチオ)プロピオネート〕、3,3’-チオビスプロピオン酸ジトリデシル、2,2-チオ-ジエチレンビス〔3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート〕、2,4-ビス〔(オクチルチオ)メチル〕-o-クレゾール、2,4-ビス〔(ラウリルチオ)メチル〕-o-クレゾール等が挙げられる。 Sulfur-based antioxidants include, for example, 2,2-bis {[3- (dodecylthio) -1-oxopropoxy] methyl} propane-1,3-diylbis [3- (dodecylthio) propionate], 3,3'-. Ditridecyl thiobispropionate, 2,2-thio-diethylenebis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], 2,4-bis [(octylthio) methyl] -o- Cresol, 2,4-bis [(laurylthio) methyl] -o-cresol and the like can be mentioned.
市販品は、ADEKA社製アデカスタブAO-412S、AO-503、ケミプロ化成社製KEMINOXPLS等が挙げられる。 Examples of commercially available products include ADEKA Stab AO-412S and AO-503 manufactured by ADEKA, and KEMINOXPLS manufactured by Chemipro Kasei Co., Ltd.
酸化防止剤(O)は、単独又は2種類以上を併用して使用できる。 The antioxidant (O) can be used alone or in combination of two or more.
酸化防止剤(O)の含有量は、着色組成物の不揮発分100質量%中、0.5~5.0質量%が好ましい。適量含有すると透過率、分光特性、及び感度が向上する。 The content of the antioxidant (O) is preferably 0.5 to 5.0% by mass based on 100% by mass of the non-volatile content of the coloring composition. When an appropriate amount is contained, the transmittance, spectral characteristics, and sensitivity are improved.
[貯蔵安定剤(P)]
本発明の着色組成物は、貯蔵安定剤(P)を含有できる。これにより、着色組成物の経時粘度が安定化する。貯蔵安定剤(P)は、例えば、ベンジルトリメチルクロライド、ジエチルヒドロキシアミンなどの4級アンモニウムクロライド、乳酸、シュウ酸などの有機酸及びそのメチルエーテル、t-ブチルピロカテコール、テトラエチルホスフィン、テトラフェニルなどの有機ホスフィン、亜リン酸塩等が挙げられる。
[Storage stabilizer (P)]
The coloring composition of the present invention can contain a storage stabilizer (P). This stabilizes the viscosity of the coloring composition over time. The storage stabilizer (P) includes, for example, quaternary ammonium chloride such as benzyltrimethyl chloride and diethylhydroxyamine, organic acids such as lactic acid and phosphorous acid and their methyl ethers, t-butylpyrocatechol, tetraethylphosphin and tetraphenyl. Examples thereof include organic phosphine and phosphite.
貯蔵安定剤(P)の含有量は、着色剤(A)100質量部に対して、0.1~10質量部が好ましい。 The content of the storage stabilizer (P) is preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the colorant (A).
[密着向上剤(Q)]
本発明の着色組成物は、密着向上剤(Q)を含有できる。これにより被膜と基材の密着性が向上する。また、フォトリソグラフィー法で幅が狭いパターンを形成し易くなる。
[Adhesion improver (Q)]
The coloring composition of the present invention can contain an adhesion improver (Q). This improves the adhesion between the coating and the base material. In addition, the photolithography method facilitates the formation of narrow patterns.
密着向上剤(Q)は、例えば、シランカップリング剤等が挙げられる。シランカップリング剤は、例えば、ビニルトリメトキシシラン、ビニルトリエトキシシラン等のビニルシラン類、3-メタクリロキシプロピルメチルジメトキシシラン、3-メタクリロキシプロピルトリメトキシシラン、3-メタクリロキシプロピルメチルジエトキシシラン、3-メタクリロキシプロピルトリエトキシシラン、3-アクリロキシプロピルトリメトキシシラン等の(メタ)アクリルシラン類、2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、3-グリシドキシプロピルメチルジメトキシシラン、3-グリシドキシプロピルトリメトキシシラン、3-グリシドキシプロピルメチルジエトキシシラン、3-グリシドキシプロピルトリエトキシシラン等のエポキシシラン類、N-2-(アミノエチル)-3-アミノプロピルメチルジメトキシシラン、N-2-(アミノエチル)-3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、3-トリエトキシシリル-N-(1,3-ジメチル-ブチリデン)プロピルアミン、N-フェニル-3-アミノプロピルトリメトキシシラン、N-(ビニルベンジル)-2-アミノエチル-3-アミノプロピルトリメトキシシランの塩酸塩等のアミノシラン類、3-メルカプトプロピルメチルジメトキシシラン、3-メルカプトプロピルトリメトキシシラン等のメルカプト類、p-スチリルトリメトキシシラン等のスチリル類、3-ウレイドプロピルトリエトキシシラン等のウレイド類、ビス(トリエトキシシリルプロピル)テトラスルフィド等のスルフィド類、3-イソシアネートプロピルトリエトキシシラン等のイソシアネート類などのシランカップリング剤が挙げられる。 Examples of the adhesion improver (Q) include a silane coupling agent and the like. Examples of the silane coupling agent include vinylsilanes such as vinyltrimethoxysilane and vinyltriethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, and 3-methacryloxypropylmethyldiethoxysilane. (Meta) acrylic silanes such as 3-methacryloxypropyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane , 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane and other epoxysilanes, N-2- (aminoethyl) -3-aminopropyl Methyldimethoxysilane, N-2- (aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-triethoxysilyl-N- (1,3-) Aminosilanes such as dimethyl-butylidene) propylamine, N-phenyl-3-aminopropyltrimethoxysilane, N- (vinylbenzyl) -2-aminoethyl-3-aminopropyltrimethoxysilane hydrochloride, 3-mercaptopropyl Melcaptos such as methyldimethoxysilane and 3-mercaptopropyltrimethoxysilane, styryls such as p-styryltrimethoxysilane, ureids such as 3-ureidopropyltriethoxysilane, bis (triethoxysilylpropyl) tetrasulfide and the like. Examples thereof include silane coupling agents such as sulfides and isocyanates such as 3-isocyanuspropyltriethoxysilane.
密着向上剤(Q)は、単独又は2種類以上を併用して使用できる。 The adhesion improver (Q) can be used alone or in combination of two or more.
密着向上剤(Q)の含有量は、着色剤(A)100質量部に対して、0.01~10質量部が好ましく、0.05~5質量部がより好ましい。 The content of the adhesion improver (Q) is preferably 0.01 to 10 parts by mass, more preferably 0.05 to 5 parts by mass with respect to 100 parts by mass of the colorant (A).
[有機溶剤(R)]
本発明の着色組成物は、有機溶剤(R)を含有できる。
[Organic solvent (R)]
The coloring composition of the present invention can contain an organic solvent (R).
有機溶剤(R)は、例えば、1,2,3-トリクロロプロパン、1-メトキシ-2-プロパノール、乳酸エチル、1,3-ブタンジオ-ル、1,3-ブチレングリコール、1,3-ブチレングリコールジアセテート、1,4-ジオキサン、2-ヘプタノーン、2-メチル-1,3-プロパンジオ-ル、3,5,5-トリメチル-2-シクロヘキセン-1-オン、3,3,5-トリメチルシクロヘキサノーン、3-エトキシプロピオン酸エチル、3-メチル-1,3-ブタンジオ-ル、3-メトキシ-3-メチル-1-ブタノール、3-メトキシ-3-メチルブチルアセテート、3-メトキシブタノール、3-メトキシブチルアセテート、4-ヘプタノーン、m-キシレン、m-ジエチルベンゼン、m-ジクロロベンゼン、N,N-ジメチルアセトアミド、N,N-ジメチルホルムアミド、n-ブチルアルコール、n-ブチルベンゼン、n-プロピルアセテート、N-メチルピロリドン、o-キシレン、o-クロロトールエン、o-ジエチルベンゼン、o-ジクロロベンゼン、p-クロロトールエン、p-ジエチルベンゼン、sec-ブチルベンゼン、tert-ブチルベンゼン、γ-ブチロラクトン、イソブチルアルコール、イソホロン、エチレングリコールジエチルエーテル、エチレングリコールジブチルエーテル、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノエチルエーテルアセテート、エチレングリコールモノタ-シャリ-ブチルエーテル、エチレングリコールモノブチルエーテル、エチレングリコールモノブチルエーテルアセテート、エチレングリコールモノプロピルエーテル、エチレングリコールモノヘキシルエーテル、エチレングリコールモノメチルエーテル、エチレングリコールモノメチルエーテルアセテート、ジイソブチルケトン、ジエチレングリコールジエチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールモノイソプロピルエーテル、ジエチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノブチルエーテル、ジエチレングリコールモノブチルエーテルアセテート、ジエチレングリコールモノメチルエーテル、シクロヘキサノール、シクロヘキサノールアセテート、シクロヘキサノーン、ジプロピレングリコールジメチルエーテル、ジプロピレングリコールメチルエーテルアセテート、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノブチルエーテル、ジプロピレングリコールモノプロピルエーテル、ジプロピレングリコールモノメチルエーテル、ダイアセトンアルコール、トリアセチン、トリプロピレングリコールモノブチルエーテル、トリプロピレングリコールモノメチルエーテル、プロピレングリコールジアセテート、プロピレングリコールフェニルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノエチルエーテルアセテート、プロピレングリコールモノブチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノメチルエーテルプロピオネート、ベンジルアルコール、メチルイソブチルケトン、メチルシクロヘキサノール、酢酸n-アミル、酢酸n-ブチル、酢酸イソアミル、酢酸イソブチル、酢酸プロピル、二塩基酸エステル等が挙げられる。これらの中でも、顔料の分散性、アルカリ可溶樹脂の溶解性の観点から、乳酸エチル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート等のグリコールアセテート類、ベンジルアルコール、ダイアセトンアルコール等のアルコール類やシクロヘキサノーン等のケトン類が好ましい。 The organic solvent (R) is, for example, 1,2,3-trichloropropane, 1-methoxy-2-propanol, ethyl lactate, 1,3-butandiole, 1,3-butylene glycol, 1,3-butylene glycol. Diacetate, 1,4-dioxane, 2-heptanone, 2-methyl-1,3-propanediol, 3,5,5-trimethyl-2-cyclohexene-1-one, 3,3,5-trimethylcyclohexyl Sanone, ethyl 3-ethoxypropionate, 3-methyl-1,3-butandiol, 3-methoxy-3-methyl-1-butanol, 3-methoxy-3-methylbutyl acetate, 3-methoxybutanol, 3 -Methoxybutyl acetate, 4-heptanone, m-xylene, m-diethylbenzene, m-dichlorobenzene, N, N-dimethylacetamide, N, N-dimethylformamide, n-butyl alcohol, n-butylbenzene, n-propyl acetate , N-Methylpyrrolidone, o-xylene, o-chlorotoluene, o-diethylbenzene, o-dichlorobenzene, p-chlorotoluene, p-diethylbenzene, sec-butylbenzene, tert-butylbenzene, γ-butyrolactone, isobutyl Alcohol, Isophoron, Ethylene Glycol Diethyl Ether, Ethylene Glycol Dibutyl Ether, Ethylene Glycol Monoisopropyl Ether, Ethylene Glycol Monoethyl Ether, Ethylene Glycol Monoethyl Ether Acetate, Ethylene Glycol Monoter Shari-Butyl Ether, Ethylene Glycol Monobutyl Ether, Ethylene Glycol Mono Butyl ether acetate, ethylene glycol monopropyl ether, ethylene glycol monohexyl ether, ethylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, diisobutyl ketone, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether , Diethylene glycol monobutyl ether acetate, diethylene glycol monomethyl ether, cyclohexanol, cyclohexanol acetate, cyclohexanone, dipropylene glycol dimethyl ether, dipropylene glycol methyl ether ace Tate, Dipropylene Glycol Monoethyl Ether, Dipropylene Glycol Monobutyl Ether, Dipropylene Glycol Monopropyl Ether, Dipropylene Glycol Monomethyl Ether, Diacetone Alcohol, Triacetin, Tripropylene Glycol Monobutyl Ether, Tripropylene Glycol Monomethyl Ether, Propylene Glycol Diacetate , Propylene glycol phenyl ether, propylene glycol monoethyl ether, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether, propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, benzyl Examples thereof include alcohol, methylisobutylketone, methylcyclohexanol, n-amyl acetate, n-butyl acetate, isoamyl acetate, isobutyl acetate, propyl acetate, dibasic acid ester and the like. Among these, from the viewpoint of dispersibility of pigments and solubility of alkali-soluble resins, ethyl lactate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate and the like Alcohols such as glycol acetates, benzyl alcohols and diacetone alcohols and ketones such as cyclohexanone are preferable.
有機溶剤(R)は、単独又は2種類以上を併用して使用できる。 The organic solvent (R) can be used alone or in combination of two or more.
<着色組成物の製造方法>
本発明の着色組成物は、例えば、着色剤(A)、スルホ基を有するキノフタロン化合物の金属塩(B)、アルカリ可溶樹脂(C)、トリアリールスルホニウム化合物(E)、及び必要に応じて分散樹脂(F)、有機溶剤(P)等を加えて分散処理を行うことで、分散体を製造する。前記分散体は、2種以上の着色剤を同時に加えて分散処理を行っても良いし、別々に分散処理を行ったものを混合しても良い。
その後、前記分散体に、界面活性剤(D)、及び必要に応じて重合性化合物(H)、光重合開始剤(I)を配合し混合することで製造できる。なお、各材料を配合するタイミングは、任意である。また、分散工程を複数回行うこともできる。
<Manufacturing method of coloring composition>
The coloring composition of the present invention is, for example, a colorant (A), a metal salt (B) of a quinophthalone compound having a sulfo group, an alkali-soluble resin (C), a triarylsulfonium compound (E), and if necessary. A dispersion is produced by adding a dispersion resin (F), an organic solvent (P), and the like to carry out a dispersion treatment. The dispersion may be subjected to the dispersion treatment by adding two or more kinds of colorants at the same time, or may be mixed separately subjected to the dispersion treatment.
Then, it can be produced by mixing the surfactant (D), the polymerizable compound (H), and the photopolymerization initiator (I), if necessary, with the dispersion. The timing of blending each material is arbitrary. Further, the dispersion step can be performed a plurality of times.
分散処理を行う分散機は、例えば、2本ロ-ルミル、3本ロールミル、ボ-ルミル、横型サンドミル、縦型サンドミル、アニュラー型ビ-ズミル、又はアトライター等が挙げられる。 Examples of the disperser for performing the dispersion treatment include a two-roll mill, a three-roll mill, a ball mill, a horizontal sand mill, a vertical sand mill, an annual bead mill, and an attritor.
分散体中の着色剤(A)の平均分散粒子径(二次粒子径)は、30~200nmが好ましく、40~200nmがより好ましい。適度な粒子径を有すると分散安定性が高い着色組成物が得やすい。 The average dispersed particle size (secondary particle size) of the colorant (A) in the dispersion is preferably 30 to 200 nm, more preferably 40 to 200 nm. When the particle size is appropriate, it is easy to obtain a colored composition having high dispersion stability.
平均分散粒子径(二次粒子径)の測定方法は、例えば、動的光散乱法(FFTパワ-スペクトール法)を採用した日機装社のマイクロトラックUPA-EX150を用い、粒子透過性を吸収モ-ド、粒子形状を非球形とし、D50粒子径を平均径とする。測定用の希釈溶剤は分散に使用した有機溶剤をそれぞれ用い、超音波で処理したサンプルについてサンプル調整直後に測定するとバラツキが少ない結果が得られやすく好ましい。 As a method for measuring the average dispersed particle size (secondary particle size), for example, Nikkiso's Microtrack UPA-EX150, which employs a dynamic light scattering method (FFT power-spector method), is used to absorb particle permeability. The particle shape is non-spherical, and the D50 particle diameter is the average diameter. As the diluting solvent for measurement, the organic solvent used for dispersion is used, and it is preferable to measure the sample treated by ultrasonic waves immediately after sample preparation because it is easy to obtain results with little variation.
着色組成物は、遠心分離、焼結フィルタやメンブレンフィルタによる濾過等の手段にて、5μm以上の粗大粒子、好ましくは1μm以上の粗大粒子、さらに好ましくは0.5μm以上の粗大粒子、及び混入した塵の除去を行うことが好ましい。本発明の着色組成物は、実質的に0.5μm以上の粒子を含まないことが好ましく、0.3μm以下の粒子を含まないことがより好ましい。 The coloring composition was mixed with coarse particles of 5 μm or more, preferably coarse particles of 1 μm or more, more preferably 0.5 μm or more, by means such as centrifugation, filtration with a sintering filter or a membrane filter. It is preferable to remove dust. The coloring composition of the present invention preferably contains substantially no particles of 0.5 μm or more, and more preferably does not contain particles of 0.3 μm or less.
<カラーフィルタ>
本発明のカラーフィルタは、基板、及び本発明の着色組成物を用いて形成されてなるフィルタセグメントを備える。
<Color filter>
The color filter of the present invention includes a substrate and a filter segment formed by using the coloring composition of the present invention.
[カラーフィルタの製造方法]
カラーフィルタは、基板上にブラックマトリックスを形成し、次いでフィルタセグメントを形成することが好ましい。
ブラックマトリックスは、例えば、クロムやクロム/酸化クロムの多層膜、窒化チタニウムなどの無機膜や、遮光剤を分散した樹脂膜が挙げられる。
[Manufacturing method of color filter]
The color filter preferably forms a black matrix on the substrate and then forms a filter segment.
Examples of the black matrix include a multilayer film of chromium and chromium / chromium oxide, an inorganic film such as titanium nitride, and a resin film in which a light-shielding agent is dispersed.
フィルタセグメントの形成は、例えば、印刷法、電着法、転写法、インクジェット法、フォトリソグラフィー法等で作製できる。これらの中でも精度の高いカラーフィルタを作製できる面でフォトリソグラフィー法が好ましい。
フォトリソグラフィー法は、例えば、ある色調の着色剤を含有する感光性着色組成物を、透明基板上に、乾燥膜厚が0.2~5μm程度になるように塗布し被膜を形成する。得られた被膜(以下、第一の被膜という)は、所定のパターンを有するマスクを通して露光(光照射)を行う。次いで、溶剤又はアルカリ現像液に浸漬するか又はスプレーなどにより現像液を噴霧し現像を行い、未硬化部分を除去して所望のパターンを得る。この工程を他の色調の着色剤を有する感光性着色組成物を使用して同様に行うことで、各色のフィルタセグメントを有するカラーフィルタを製造できる。また、露光前の第一の被膜上にさらにポリビニルアルコールや水溶性アクリル樹脂を使用して第二の被膜(酸素遮断膜)を形成できる。これにより第一の被膜は、酸素に接しないため露光感度がより向上する。また、カラーフィルタは、フィルタセグメント中に未硬化の光重合性化合物を硬化させるために加熱を行うことができる。
The formation of the filter segment can be produced by, for example, a printing method, an electrodeposition method, a transfer method, an inkjet method, a photolithography method, or the like. Among these, the photolithography method is preferable in terms of being able to produce a highly accurate color filter.
In the photolithography method, for example, a photosensitive coloring composition containing a colorant having a certain color tone is applied onto a transparent substrate so that the dry film thickness is about 0.2 to 5 μm to form a film. The obtained film (hereinafter referred to as the first film) is exposed (light irradiation) through a mask having a predetermined pattern. Then, the developer is immersed in a solvent or an alkaline developer, or the developer is sprayed with a spray or the like for development, and the uncured portion is removed to obtain a desired pattern. By performing this step in the same manner using a photosensitive coloring composition having a colorant having another color tone, a color filter having filter segments of each color can be produced. Further, a second film (oxygen blocking film) can be further formed on the first film before exposure by using polyvinyl alcohol or a water-soluble acrylic resin. As a result, the first film does not come into contact with oxygen, so that the exposure sensitivity is further improved. In addition, the color filter can be heated to cure the uncured photopolymerizable compound in the filter segment.
塗布装置は、例えば、スプレーコートやスピンコート、スリットコート、ロールコート等が挙げられる。塗工に際し、乾燥工程を行うことができる。乾燥装置は、例えば、熱風オーブン、赤外線ヒーター等が挙げられる。 Examples of the coating device include a spray coat, a spin coat, a slit coat, a roll coat and the like. A drying process can be performed during coating. Examples of the drying device include a hot air oven and an infrared heater.
前記現像液は、アルカリ現像液として、例えば、炭酸ナトリウム、水酸化ナトリウム等の無機アルカリ;ジメチルベンジルアミン、トリエタノールアミン等の有機アルカリが挙げられる。また、現像液は、消泡剤や界面活性剤を添加できる。 Examples of the alkaline developer include inorganic alkalis such as sodium carbonate and sodium hydroxide; and organic alkalis such as dimethylbenzylamine and triethanolamine. Further, a defoaming agent or a surfactant can be added to the developing solution.
<液晶表示装置>
本発明の液晶表示装置は、本発明のカラーフィルタを備える。
液晶表示装置は、カラーフィルタは、フィルタセグメント形成後のカラーフィルタについて、シール剤を用いて対向基板と貼り合わせ、シール部に設けられた注入口から液晶を注入したのち注入口を封止する。また、必要に応じて偏光膜や位相差膜を基板の外側に貼り合わせて、液晶表示装置を作製できる。
<Liquid crystal display device>
The liquid crystal display device of the present invention includes the color filter of the present invention.
In the liquid crystal display device, the color filter is attached to the facing substrate by using a sealing agent for the color filter after the filter segment is formed, and the liquid crystal is injected from the injection port provided in the seal portion, and then the injection port is sealed. Further, a liquid crystal display device can be manufactured by laminating a polarizing film or a retardation film on the outside of a substrate as needed.
本発明の液晶表示装置は、本発明のカラーフィルタと、光源とを具備する。光源としては、冷陰極管(CCFL),白色LEDが挙げられるが、本発明においては赤の再現領域が広がるという点で、白色LEDを使用することが好ましい。図1は、本発明のカラーフィルタを備えた液晶表示装置10の概略断面図である。図1に示す装置10は、離間対向して配置された一対の透明基板11及び21を備え、それらの間には、液晶LCが封入されている。
The liquid crystal display device of the present invention includes the color filter of the present invention and a light source. Examples of the light source include a cold cathode fluorescent lamp (CCFL) and a white LED, but in the present invention, it is preferable to use a white LED because the red reproduction region is widened. FIG. 1 is a schematic cross-sectional view of a liquid
液晶LCは、TN(Twisted Nematic)、STN(Super Twisted Nematic)、IPS(In-Plane switching)、VA(Vertical Alignment)、OCB(Optically Compensated Birefringence)等の駆動モードに応じて配向される。第1の透明基板11の内面には、TFT(薄膜トランジスター)アレイ12が形成されており、その上には例えばITOからなる透明電極層13が形成されている。透明電極層13の上には、配向層14が設けられている。また、透明基板11の外面には、偏光板15が形成されている。
The liquid crystal LC is driven by TN (Twisted Nematic), STN (Super Twisted Nematic), IPS (In-Plane switching), VA (Vertical Alignment), OCB (Optical Aligned Mode), etc. A TFT (thin film transistor)
他方、第2の透明基板21の内面には、本発明のカラーフィルタ22が形成されている。カラーフィルタ22を構成する赤色、緑色及び青色のフィルタセグメントは、ブラックマトリックス(図示せず)により分離されている。
On the other hand, the
カラーフィルタ22を覆って、必要に応じて透明保護膜(図示せず)が形成され、さらにその上に、例えばITOからなる透明電極層23が形成され、透明電極層23を覆って配向層24が設けられている。
A transparent protective film (not shown) is formed over the
また、透明基板21の外面には、偏光板25が形成されている。なお、偏光板15の下方には、バックライトユニット30が設けられている。
Further, a
白色LED光源としては、青色LEDの表面に蛍光フィルタを形成したものや、青色LEDの樹脂パッケージに蛍光体を含有させたものがあり、430nm~485nmの範囲内で発光強度が極大となる波長(λ3)を有し、530nm~580nmの範囲内で発光強度が極大となる波長(λ4)を有し、600nm~650nmの範囲内で発光強度が極大となる波長(λ5)を有し、かつ波長λ3における発光強度I3と波長λ4における発光強度I4の比(I4/I3)が0.2以上0.4以下であり、波長λ3における発光強度I3と波長λ5における発光強度I5の比(I5/I3)が0.1以上1.3以下である分光特性を持つ白色LED光源(LED1)や、430nm~485nmの範囲内に発光強度が最大となる波長(λ1)を有し、530nm~580nmの範囲内に第2の発光強度のピーク波長(λ2)を有し、波長λ1における発光強度I1と波長λ2における発光強度I2の比(I2/I1)が0.2以上0.7以下である分光特性を持つ白色LED光源(LED2)が好ましい。 White LED light sources include those in which a fluorescent filter is formed on the surface of a blue LED and those in which a phosphor is contained in a resin package of a blue LED, and the wavelength at which the emission intensity becomes maximum in the range of 430 nm to 485 nm ( It has λ3), has a wavelength (λ4) that maximizes the emission intensity in the range of 530 nm to 580 nm, has a wavelength (λ5) that maximizes the emission intensity in the range of 600 nm to 650 nm, and has a wavelength. The ratio (I4 / I3) of the emission intensity I3 at the wavelength λ3 and the emission intensity I4 at the wavelength λ4 is 0.2 or more and 0.4 or less, and the ratio of the emission intensity I3 at the wavelength λ3 and the emission intensity I5 at the wavelength λ5 (I5 / I3). ) Is 0.1 or more and 1.3 or less, and has a white LED light source (LED1) having a spectral characteristic and a wavelength (λ1) having the maximum emission intensity in the range of 430 nm to 485 nm, and is in the range of 530 nm to 580 nm. Spectral characteristics having a peak wavelength (λ2) of the second emission intensity within, and the ratio (I2 / I1) of the emission intensity I1 at the wavelength λ1 and the emission intensity I2 at the wavelength λ2 is 0.2 or more and 0.7 or less. A white LED light source (LED2) having a wavelength of 2 is preferable.
LED1としては、例えばはNSSW306D-HG-V1(日亜化学社製)、NSSW304D-HG-V1(日亜化学社製)等が挙げられる。 Examples of the LED1 include NSSW306D-HG-V1 (manufactured by Nichia Corporation), NSSW304D-HG-V1 (manufactured by Nichia Corporation), and the like.
LED2としては、例えばはNSSW440(日亜化学社製)、NSSW304D(日亜化学社製)等が挙げられる。 Examples of the LED 2 include NSSW440 (manufactured by Nichia Corporation) and NSSW304D (manufactured by Nichia Corporation).
<固体撮像素子>
本発明の固体撮像素子は、本発明のカラーフィルタを備える。固体撮像素子の構成は、固体撮像素子として機能すればよく限定されない。例えば、以下の構成が挙げられる。
<Solid image sensor>
The solid-state image sensor of the present invention includes the color filter of the present invention. The configuration of the solid-state image sensor is not limited as long as it functions as a solid-state image sensor. For example, the following configuration can be mentioned.
基板上に、固体撮像素子(CCD センサ、CMOSセンサ、有機CMOSセンサ等)の受光エリアを構成する複数のフォトダイオード及びポリシリコン等からなる転送電極を有し、前記フォトダイオード及び前記転送電極上にフォトダイオードの受光部のみ開口したタングステン等からなる遮光膜を有し、遮光膜上に遮光膜全面及びフォトダイオード受光 部を覆うように形成された窒化シリコン等からなるデバイス保護膜を有し、前記デバイス保護膜上に、本発明のカラーフィルタを有する構成である。
更に、前記デバイス保護層上であってカラーフィルタの下(基板に近い側)に集光手段(例えば、マイクロレンズ等。以下同じ)を有する構成や、カラーフィルタ上に集光手段を有する構成等であってもよい。
なお、有機CMOSセンサは、光電変換層として薄膜のパンクロ感光性有機光電変換膜とCMOS信号読み出し基板を含んで構成され、光を捕捉しそれを電気信号に変換する役割を有機材料が担い、電気信号を外部に取り出す役割を無機材料が担う2層構成のハイブリッド構造であり、原理的には入射光に対して開口率を100%にすることができる。有機光電変換膜は構造フリーの連続膜でCMOS信号読みだし基板上に敷設できるので、高価な微細加工プロセスを必要とせず、フィルタセグメントの微細化に適している。
A transfer electrode made of a plurality of photodiodes, polycarbonate, etc. constituting a light receiving area of a solid-state image sensor (CCD sensor, CMOS sensor, organic CMOS sensor, etc.) is provided on a substrate, and the photodiode and the transfer electrode are on the transfer electrode. It has a light-shielding film made of tungsten or the like in which only the light-receiving part of the photodiode is open, and has a device protective film made of silicon nitride or the like formed on the light-shielding film so as to cover the entire surface of the light-shielding film and the light-receiving part of the photodiode. It is a configuration having the color filter of the present invention on the device protective film.
Further, a configuration having a condensing means (for example, a microlens or the like; the same applies hereinafter) on the device protective layer under the color filter (near the substrate), a configuration having a condensing means on the color filter, and the like. May be.
The organic CMOS sensor is composed of a thin-film panchromatic photosensitive organic photoelectric conversion film and a CMOS signal readout substrate as a photoelectric conversion layer, and the organic material plays a role of capturing light and converting it into an electric signal. It is a two-layer hybrid structure in which the inorganic material plays the role of extracting the signal to the outside, and in principle, the aperture ratio can be set to 100% with respect to the incident light. Since the organic photoelectric conversion film is a structure-free continuous film and can be laid on a CMOS signal reading substrate, it does not require an expensive microfabrication process and is suitable for miniaturization of filter segments.
以下、実施例で本発明をより具体的に説明する。ただし、本発明はこれらに限定されない。なお、「部」は「質量部」、「%」は「質量%」である。 Hereinafter, the present invention will be described in more detail with reference to Examples. However, the present invention is not limited to these. In addition, "part" is "mass part", and "%" is "mass%".
実施例に先立ち、各測定方法について説明する。 Prior to the embodiment, each measurement method will be described.
樹脂の重量平均分子量(Mw)、数平均分子量(Mn)、酸価(mgKOH/g)、アミン価(mgKOH/g)は以下の通りである。 The weight average molecular weight (Mw), number average molecular weight (Mn), acid value (mgKOH / g), and amine value (mgKOH / g) of the resin are as follows.
(アルカリ可溶性樹脂、及び分散樹脂の平均分子量)
アルカリ可溶性樹脂、及び分散樹脂の数平均分子量(Mn)、重量平均分子量(Mw)は、RI検出器を装備したゲルパーミエーションクロマトグラフィー(GPC)で測定した。装置としてHLC-8220GPC(東ソー社製)を用い、分離カラムを2本直列に繋ぎ、両方の充填剤には「TSK-GEL SUPER HZM-N」を2連でつなげて使用し、オーブン温度40℃、溶離液としてテトラヒドロフラン(THF)溶液を用い、流速0.35ml/minで測定した。サンプルは1wt%の上記溶離液からなる溶剤に溶解し、20マイクロリットール注入した。分子量は、ポリスチレン換算値である。
(Average molecular weight of alkali-soluble resin and dispersed resin)
The number average molecular weight (Mn) and weight average molecular weight (Mw) of the alkali-soluble resin and the dispersed resin were measured by gel permeation chromatography (GPC) equipped with an RI detector. Using HLC-8220GPC (manufactured by Tosoh Co., Ltd.) as an apparatus, two separation columns are connected in series, and "TSK-GEL SUPER HZM-N" is connected in two for both fillers, and the oven temperature is 40 ° C. , Tetrahydrofuran (THF) solution was used as an eluent, and the measurement was performed at a flow rate of 0.35 ml / min. The sample was dissolved in a solvent consisting of 1 wt% of the above eluent and injected with 20 microliters. The molecular weight is a polystyrene-equivalent value.
(アルカリ可溶性樹脂、及び分散樹脂の酸価)
アルカリ可溶性樹脂、及び分散樹脂溶液0.5~1gに、アセトン80ml及び水10mlを加えて攪拌して均一に溶解させ、0.1mol/LのKOH水溶液を滴定液として、自動滴定装置(「COM-555」平沼産業社製)を用いて滴定し、酸価(mgKOH/g)を測定した。そして、樹脂溶液の酸価と樹脂溶液の不揮発分濃度から、樹脂の不揮発分あたりの酸価を算出した。
(Acid value of alkali-soluble resin and dispersed resin)
80 ml of acetone and 10 ml of water are added to 0.5 to 1 g of an alkali-soluble resin and a dispersed resin solution, and the mixture is stirred to uniformly dissolve the solution. -555 ”manufactured by Hiranuma Sangyo Co., Ltd.) was used for titration, and the acid value (mgKOH / g) was measured. Then, the acid value per non-volatile component of the resin was calculated from the acid value of the resin solution and the non-volatile content concentration of the resin solution.
(分散樹脂のアミン価)
分散樹脂のアミン価は、ASTM D 2074の方法に準拠し、測定した全アミン価(mgKOH/g)を固形分換算した値である。
(Amine value of dispersed resin)
The amine value of the dispersed resin is a value obtained by converting the measured total amine value (mgKOH / g) into a solid content according to the method of ASTM D 2074.
<微細化フタロシアニン顔料(A1)の製造例>
(微細化フタロシアニン顔料(A1-1~3))
特開2017-111398号公報の実施例に従って、下記化学式2~4で表される微細化フタロシアニン顔料(A1-1~3)を得た。以下に、構造を示す。
<Production example of miniaturized phthalocyanine pigment (A1)>
(Miniaturized phthalocyanine pigment (A1-1 to 3))
According to the examples of JP-A-2017-11138, refined phthalocyanine pigments (A1-1 to 3) represented by the following chemical formulas 2 to 4 were obtained. The structure is shown below.
(微細化フタロシアニン顔料(A1-4)
C.I.ピグメントグリーン58(DIC社製「FASTGEN GREEN A110」)を100部、塩化ナトリウム1200部、及びジエチレングリコール120部をステンレス製1ガロンニーダー(井上製作所製)に仕込み、70℃で6時間混練した。この混練物を3000部の温水に投入し、70℃に加熱しながら1時間撹拌してスラリー状とし、濾過、水洗を繰り返して塩化ナトリウム及びジエチレングリコールを除いた後、80℃で一昼夜乾燥し、97部の微細化フタロシアニン顔料(A1-4)を得た。
(Miniaturized phthalocyanine pigment (A1-4)
C. I. 100 parts of Pigment Green 58 (“FASTGEN GREEN A110” manufactured by DIC Corporation), 1200 parts of sodium chloride, and 120 parts of diethylene glycol were charged in a stainless steel 1-gallon kneader (manufactured by Inoue Seisakusho) and kneaded at 70 ° C. for 6 hours. This kneaded product was put into 3000 parts of warm water, stirred for 1 hour while heating at 70 ° C. to form a slurry, filtered and washed with water repeatedly to remove sodium chloride and diethylene glycol, and then dried at 80 ° C. overnight and 97. A finely divided phthalocyanine pigment (A1-4) was obtained.
(微細化フタロシアニン顔料(A1-5))
C.I.ピグメントグリーン36(トーヨーカラー社製「リオノールグリーン6YK」)を200部、塩化ナトリウム1400部、及びジエチレングリコール360部をステンレス製1ガロンニーダー(井上製作所製)に仕込み、80℃で6時間混練した。次にこの混練物を8リットルの温水に投入し、80℃に加熱しながら2時間攪拌してスラリー状とし、濾過、水洗を繰り返して塩化ナトリウム及びジエチレングリコールを除いた後、85℃で一昼夜乾燥し、190部の微細化フタロシアニン顔料(A1-5)を得た。
(Miniaturized phthalocyanine pigment (A1-5))
C. I. 200 parts of Pigment Green 36 (“Rionol Green 6YK” manufactured by Toyo Color Co., Ltd.), 1400 parts of sodium chloride, and 360 parts of diethylene glycol were charged in a stainless steel 1-gallon kneader (manufactured by Inoue Seisakusho) and kneaded at 80 ° C. for 6 hours. Next, this kneaded product was put into 8 liters of warm water, stirred for 2 hours while heating at 80 ° C. to form a slurry, filtered and washed with water repeatedly to remove sodium chloride and diethylene glycol, and then dried at 85 ° C. for 24 hours. , 190 parts of a finely divided phthalocyanine pigment (A1-5) was obtained.
(微細化フタロシアニン顔料(A1-6))
300mLフラスコに、塩化スルフリル91部、塩化アルミニウム109部、塩化ナトリウム15部、亜鉛フタロシアニン30部、臭素44部を仕込んだ。130℃まで40時間かけて昇温し、水に取り出した後、ろ過することにより緑色粗顔料を得た。得られた緑色粗顔料20部、粉砕した塩化ナトリウム140部、ジエチレングリコール32部、キシレン1.8部を1L双腕型ニーダーに仕込み、100℃で6時間混練した。混練後80℃の水2kgに取り出し、1時間攪拌後、ろ過、湯洗、乾燥、粉砕することにより、微細化フタロシアニン顔料(A1-6)を得た。得られた微細化フタロシアニン顔料(A1-6)は、蛍光X線分析から、1分子中のハロゲン原子数が平均11.98個であり、そのうち臭素原子数が平均9.00個、塩素原子数が平均2.98個であるハロゲン化亜鉛フタロシアニン顔料であった。
(Miniaturized phthalocyanine pigment (A1-6))
A 300 mL flask was charged with 91 parts of sulfuryl chloride, 109 parts of aluminum chloride, 15 parts of sodium chloride, 30 parts of zinc phthalocyanine, and 44 parts of bromine. The temperature was raised to 130 ° C. over 40 hours, taken out into water, and then filtered to obtain a green crude pigment. 20 parts of the obtained green crude pigment, 140 parts of crushed sodium chloride, 32 parts of diethylene glycol, and 1.8 parts of xylene were charged in a 1 L double-armed kneader and kneaded at 100 ° C. for 6 hours. After kneading, the mixture was taken out into 2 kg of water at 80 ° C., stirred for 1 hour, filtered, washed with hot water, dried and pulverized to obtain a finely divided phthalocyanine pigment (A1-6). The obtained finely divided phthalocyanine pigment (A1-6) has an average of 11.98 halogen atoms in one molecule from fluorescent X-ray analysis, of which an average of 9.00 bromine atoms and a chlorine atom number. Was an average of 2.98 halogenated zinc phthalocyanine pigments.
<微細化キノフタロン顔料(A2)の製造>
(微細化キノフタロン顔料(A2-1))
C.I.ピグメントイエロー138(BASFジャパン社製「パリオトールイエローK0960-HD」)100部、塩化ナトリウム700部、及びジエチレングリコール180部をステンレス製1ガロンニーダー(井上製作所製)に仕込み、80℃で6時間混練した。この混合物を温水2,000部に投入し、80℃に加熱しながら1時間攪拌してスラリー状とし、濾過、水洗をくりかえして食塩及び溶剤を除いた後、80℃で一昼夜乾燥し、95部の微細化キノフタロン顔料(A2-1)を得た。
<Manufacturing of miniaturized quinophthalone pigment (A2)>
(Miniaturized quinophthalone pigment (A2-1))
C. I. 100 parts of Pigment Yellow 138 (BASF Japan's "Paliotor Yellow K0960-HD"), 700 parts of sodium chloride, and 180 parts of diethylene glycol were charged in a stainless steel 1-gallon kneader (manufactured by Inoue Seisakusho) and kneaded at 80 ° C. for 6 hours. .. This mixture was poured into 2,000 parts of warm water, stirred for 1 hour while heating at 80 ° C. to form a slurry, filtered and washed with water repeatedly to remove salt and solvent, and then dried at 80 ° C. for 24 hours and 95 parts. The finely divided quinophthalone pigment (A2-1) was obtained.
(微細化キノフタロン顔料(A2-2))
特開2012-226110号公報の実施例1に従って下記化学式(5)で表される微細化キノフタロン顔料(A2-2)を得た。以下に、その構造を示す。
(Miniaturized quinophthalone pigment (A2-2))
According to Example 1 of JP2012-226110A, a miniaturized quinophthalone pigment (A2-2) represented by the following chemical formula (5) was obtained. The structure is shown below.
化学式(5)
(微細化キノフタロン顔料(A2-3))
特許第6432076号公報に記載の黄色着色剤の製造に従って下記式(6)で表される微細化キノフタロン顔料(A2-3)を得た。以下に、その構造を示す。
(Miniaturized quinophthalone pigment (A2-3))
According to the production of the yellow colorant described in Japanese Patent No. 6432076, a miniaturized quinophthalone pigment (A2-3) represented by the following formula (6) was obtained. The structure is shown below.
化学式(6)
<スルホ基を有するキノフタロン化合物の金属塩(B)の製造>
(スルホ基を有するキノフタロン化合物の銅塩(B-1))
キノフタロン化合物であるC.I.ピグメントイエロー138(BASFジャパン社製「パリオトールイエロー K0960-HD」)30部を101%硫酸300部中に溶解し、70℃にて8時間攪拌し、スルホン化反応を行った。反応の終点は、硫酸溶液の分光スペクトルを測定し、スペクトルの変化が見られなくなる点とした。次いで、この反応溶液を氷水3000部中に注入し、析出物を濾別、水洗後、80℃で乾燥し、下記化学式(7)で表されるスルホ基を有するキノフタロン化合物(b-1)を得た。
<Production of metal salt (B) of quinophthalone compound having a sulfo group>
(Copper salt of quinophthalone compound having a sulfo group (B-1))
C. quinophthalone compound. I. 30 parts of Pigment Yellow 138 (“Paliotoll Yellow K0960-HD” manufactured by BASF Japan, Inc.) was dissolved in 300 parts of 101% sulfuric acid, and the mixture was stirred at 70 ° C. for 8 hours to carry out a sulfonate reaction. The end point of the reaction was the point where the spectral spectrum of the sulfuric acid solution was measured and no change in the spectrum was observed. Next, this reaction solution was poured into 3000 parts of ice water, the precipitate was filtered off, washed with water, dried at 80 ° C., and the quinophthalone compound (b-1) having a sulfo group represented by the following chemical formula (7) was obtained. Obtained.
化学式(7)
次に、スルホ基を有するキノフタロン化合物(b-1)10gを、水500部に加え25℃で2時間撹拌し再分散させた。次いで、この溶液に硫酸銅(II)5水和物4.8部を徐々に添加し、60℃で2時間反応させた。反応物を濾別、水洗後、80℃で乾燥し、下記化学式(8)で表されるスルホ基を有するキノフタロン化合物の銅塩(B-1)を得た。 Next, 10 g of the quinophthalone compound (b-1) having a sulfo group was added to 500 parts of water, and the mixture was stirred at 25 ° C. for 2 hours and redispersed. Then, 4.8 parts of copper (II) sulfate pentahydrate was gradually added to this solution, and the mixture was reacted at 60 ° C. for 2 hours. The reaction product was separated by filtration, washed with water, and dried at 80 ° C. to obtain a copper salt (B-1) of a quinophthalone compound having a sulfo group represented by the following chemical formula (8).
化学式(8)
(スルホ基を有するキノフタロン化合物の銀塩(B-2))
スルホ基を有するキノフタロン化合物の銅塩(B-1)の製造で使用した硫酸銅(II)五水和物の代わりに、硝酸銀(I)6.6部を使用した以外は、同様の方法で、下記化学式(9)で表されるスルホ基を有するキノフタロン化合物の銀塩(B-2)を得た。
(Silver salt of quinophthalone compound having a sulfo group (B-2))
In the same manner, except that 6.6 parts of silver nitrate (I) was used in place of the copper (II) sulfate pentahydrate used in the production of the copper salt (B-1) of the quinophthalone compound having a sulfo group. , A silver salt (B-2) of a quinophthalone compound having a sulfo group represented by the following chemical formula (9) was obtained.
化学式(9)
(スルホ基を有するキノフタロン化合物の亜鉛塩(B-3))
スルホ基を有するキノフタロン化合物の銅塩(B-1)の製造で使用した硫酸銅(II)五水和物の代わりに、酢酸亜鉛二水和物4.3部を使用した以外は、同様の方法で、下記化学式(10)で表されるスルホ基を有するキノフタロン化合物の亜鉛塩(B-3))を得た。
(Zinc salt of quinophthalone compound having a sulfo group (B-3))
Similar except that 4.3 parts of zinc acetate dihydrate was used in place of the copper (II) sulfate pentahydrate used in the production of the copper salt (B-1) of the quinophthalone compound having a sulfo group. By the method, a zinc salt (B-3) of a quinophthalone compound having a sulfo group represented by the following chemical formula (10) was obtained.
化学式(10)
(スルホ基を有するキノフタロン化合物の鉄塩(B-4))
スルホ基を有するキノフタロン化合物の銅塩(B-1)の製造で使用した硫酸銅(II)五水和物の代わりに、塩化鉄(III)六水和物5.2部を使用した以外は、同様の方法で、下記化学式(11)で表されるスルホ基を有するキノフタロン化合物の鉄塩(B-4))を得た。
(Iron salt of quinophthalone compound having a sulfo group (B-4))
Except for using 5.2 parts of iron (III) chloride hexahydrate instead of the copper (II) sulfate pentahydrate used in the production of the copper salt (B-1) of the quinophthalone compound having a sulfo group. , An iron salt (B-4) of a quinophthalone compound having a sulfo group represented by the following chemical formula (11) was obtained by the same method.
化学式(11)
(スルホ基を有するキノフタロン化合物のアルミニウム塩(B-5))
特許第4585781号公報に記載の合成方法に従い、下記化学式(12)で表されるスルホ基を有するキノフタロン化合物のアルミニウム塩(B-5))を得た。
(Aluminum salt of quinophthalone compound having a sulfo group (B-5))
An aluminum salt (B-5) of a quinophthalone compound having a sulfo group represented by the following chemical formula (12) was obtained according to the synthesis method described in Japanese Patent No. 4585781.
化学式(12)
(スルホ基を有するキノフタロン化合物の銅塩(B-6))
特開2015-172732号公報の実施例に記載のキノフタロン化合物(QL-c-1)と同様の製造方法で、下記化学式(13)で表されるスルホ基を有するキノフタロン化合物(b-2)を得た。
(Copper salt of quinophthalone compound having a sulfo group (B-6))
A quinophthalone compound (b-2) having a sulfo group represented by the following chemical formula (13) can be obtained by the same production method as that of the quinophthalone compound (QL-c-1) described in Examples of JP-A-2015-172732. Obtained.
化学式(13)
次に、スルホ基を有するキノフタロン化合物(b-2)10gを、水500部に加え25℃で2時間撹拌し再分散させた。次いで、この溶液に硫酸銅(II)5水和物5.5部を徐々に添加し、60℃で2時間反応させた。反応物を濾別、水洗後、80℃で乾燥し、下記化学式(14)で表されるスルホ基を有するキノフタロン化合物の銅塩(B-6)を得た。 Next, 10 g of the quinophthalone compound (b-2) having a sulfo group was added to 500 parts of water, and the mixture was stirred at 25 ° C. for 2 hours and redispersed. Then, 5.5 parts of copper (II) sulfate pentahydrate was gradually added to this solution, and the mixture was reacted at 60 ° C. for 2 hours. The reaction product was separated by filtration, washed with water, and dried at 80 ° C. to obtain a copper salt (B-6) of a quinophthalone compound having a sulfo group represented by the following chemical formula (14).
化学式(14)
(スルホ基を有するキノフタロン化合物のアルミニウム塩(B-7))
スルホ基を有するキノフタロン化合物の銅塩(B-6)の製造で使用した硫酸銅(II)5水和物5.5部の代わりに、硫酸アルミニウム5部を使用した以外は、同様の方法で、下記化学式(15)で表されるスルホ基を有するキノフタロン化合物のアルミニウム塩(B-7)を得た。
(Aluminum salt of quinophthalone compound having a sulfo group (B-7))
In the same manner, except that 5 parts of aluminum sulfate was used instead of 5.5 parts of copper (II) sulfate pentahydrate used in the production of the copper salt (B-6) of the quinophthalone compound having a sulfo group. , An aluminum salt (B-7) of a quinophthalone compound having a sulfo group represented by the following chemical formula (15) was obtained.
化学式(15)
<アルカリ可溶性樹脂(C)の製造>
(アルカリ可溶性樹脂(C-1)溶液)
セパラブル4口フラスコに温度計、冷却管、窒素ガス導入管、滴下管及び撹拌装置を取り付けた反応容器にシクロヘキサノーン196部を仕込み、80℃に昇温し、反応容器内を窒素置換した後、滴下管より、n-ブチルメタクリレート37.2部、2-ヒドロキシエチルメタクリレート12.9部、メタクリル酸12.0部、パラクミルフェノールエチレンオキサイド変性アクリレート(東亞合成社製「アロニックスM110」)20.7部、2,2’-アゾビスイソブチロニトリル1.1部の混合物を2時間かけて滴下した。滴下終了後、更に3時間反応を継続し、アクリル樹脂の溶液を得た。室温まで冷却した後、樹脂溶液約2部をサンプリングして180℃、20分間加熱乾燥して不揮発分を測定し、先に合成した樹脂溶液に不揮発分が20%になるようにプロピレングリコールモノメチルエーテルアセテート(以下、PGMAcとも言う)を添加してアルカリ可溶性樹脂(C-1)溶液を調製した。重量平均分子量(Mw)は26,000であった。
<Manufacturing of alkali-soluble resin (C)>
(Alkali-soluble resin (C-1) solution)
196 parts of cyclohexanone was placed in a reaction vessel equipped with a thermometer, a cooling tube, a nitrogen gas introduction tube, a dropping tube and a stirrer in a separable 4-neck flask, the temperature was raised to 80 ° C., and the inside of the reaction vessel was replaced with nitrogen. , 37.2 parts of n-butyl methacrylate, 12.9 parts of 2-hydroxyethyl methacrylate, 12.0 parts of methacrylic acid, paracumylphenol ethylene oxide-modified acrylate (“Aronix M110” manufactured by Toa Synthetic Co., Ltd.) 20. A mixture of 7 parts and 1.1 parts of 2,2'-azobisisobutyronitrile was added dropwise over 2 hours. After completion of the dropping, the reaction was continued for another 3 hours to obtain a solution of acrylic resin. After cooling to room temperature, about 2 parts of the resin solution is sampled and dried by heating at 180 ° C. for 20 minutes to measure the non-volatile content. Propylene glycol monomethyl ether so that the non-volatile content is 20% in the previously synthesized resin solution. Acetate (hereinafter, also referred to as PGMAc) was added to prepare an alkali-soluble resin (C-1) solution. The weight average molecular weight (Mw) was 26,000.
(アルカリ可溶性樹脂(C-2)溶液)
セパラブル4口フラスコに温度計、冷却管、窒素ガス導入管、滴下管及び撹拌装置を取り付けた反応容器にシクロヘキサノーン207部を仕込み、80℃に昇温し、反応容器内を窒素置換した後、滴下管より、メタクリル酸20部、パラクミルフェノールエチレンオキサイド変性アクリレート(東亞合成社製アロニックスM110)20部、メタクリル酸メチル45部、2-ヒドロキシエチルメタクリレート8.5部、及び2,2'-アゾビスイソブチロニトリル1.33部の混合物を2時間かけて滴下した。滴下終了後、更に3時間反応を継続し、共重合体樹脂溶液を得た。次に得られた共重合体溶液全量に対して、窒素ガスを停止し乾燥空気を1時間注入しながら攪拌したのちに、室温まで冷却した後、2-メタクリロイルオキシエチルイソシアネート(昭和電工社製カレンズMOI)6.5部、ラウリン酸ジブチル錫0.08部、シクロヘキサノーン26部の混合物を70℃で3時間かけて滴下した。滴下終了後、更に1時間反応を継続し、アクリル樹脂の溶液を得た。室温まで冷却した後、樹脂溶液約2部をサンプリングして180℃、20分間加熱乾燥して不揮発分を測定し、先に合成した樹脂溶液に不揮発分が20%になるようにシクロヘキサノーンを添加してアルカリ可溶性樹脂(C-2)溶液を調製した。重量平均分子量(Mw)は18,000であった。
(Alkali-soluble resin (C-2) solution)
207 parts of cyclohexanone was placed in a reaction vessel equipped with a thermometer, a cooling tube, a nitrogen gas introduction tube, a dropping tube and a stirrer in a separable 4-neck flask, the temperature was raised to 80 ° C., and the inside of the reaction vessel was replaced with nitrogen. , 20 parts of methacrylic acid, 20 parts of paracumylphenol ethylene oxide modified acrylate (Aronix M110 manufactured by Toa Synthetic Co., Ltd.), 45 parts of methyl methacrylate, 8.5 parts of 2-hydroxyethyl methacrylate, and 2,2'-from the dropping tube. A mixture of 1.33 parts of azobisisobutyronitrile was added dropwise over 2 hours. After completion of the dropping, the reaction was continued for another 3 hours to obtain a copolymer resin solution. Next, for the entire amount of the obtained copolymer solution, nitrogen gas was stopped, dry air was injected for 1 hour, and the mixture was stirred, cooled to room temperature, and then 2-methacryloyloxyethyl isocyanate (Showa Denko's Karenz). A mixture of 6.5 parts of MOI), 0.08 part of dibutyltin laurate and 26 parts of cyclohexanone was added dropwise at 70 ° C. over 3 hours. After completion of the dropping, the reaction was continued for another 1 hour to obtain a solution of acrylic resin. After cooling to room temperature, about 2 parts of the resin solution is sampled and dried by heating at 180 ° C. for 20 minutes to measure the non-volatile content, and cyclohexanone is added to the previously synthesized resin solution so that the non-volatile content is 20%. Addition was made to prepare an alkali-soluble resin (C-2) solution. The weight average molecular weight (Mw) was 18,000.
(アルカリ可溶性樹脂(C-3)溶液)
温度計、冷却管、窒素ガス導入管、滴下管及び撹拌装置を備えたセパラブル4口フラスコにシクロヘキサノーン370部を仕込み、80℃に昇温し、フラスコ内を窒素置換した後、滴下管より、パラクミルフェノールエチレンオキサイド変性アクリレート(東亞合成社製アロニックスM110)18部、ベンジルメタクリレート10部、グリシジルメタクリレート18.2部、メタクリル酸メチル25部、及び2,2'-アゾビスイソブチロニトリル2.0部の混合物を2時間かけて滴下した。滴下後、更に100℃で3時間反応させた後、アゾビスイソブチロニトリル1.0部をシクロヘキサノーン50部で溶解させたものを添加し、更に100℃で1時間反応を続けた。次に、容器内を空気置換に替エアークリル酸9.3部(グリシジル基の100%)にトリスジメチルアミノフェノール0.5部及びハイドロキノーン0.1部を上記容器内に投入し、120℃で6時間反応を続け不揮発分酸価0.5となったところで反応を終了し、アクリル樹脂の溶液を得た。更に、引き続きテトラヒドロ無水フタル酸19.5部(生成した水酸基の100%)、トリエチルアミン0.5部を加え120℃で3.5時間反応させアクリル樹脂の溶液を得た。室温まで冷却した後、樹脂溶液約2gをサンプリングして180℃、20分加熱乾燥して不揮発分を測定し、先に合成した樹脂溶液に不揮発分が20質量%になるようにPGMAcを添加してアルカリ可溶性樹脂(C-3)溶液を調製した。重量平均分子量(Mw)は19,000であった。
(Alkali-soluble resin (C-3) solution)
370 parts of cyclohexanone was placed in a separable 4-necked flask equipped with a thermometer, a cooling tube, a nitrogen gas introduction tube, a dropping tube and a stirrer, the temperature was raised to 80 ° C., the inside of the flask was replaced with nitrogen, and then the dropping tube was used. , Paracumylphenol Ethylene Oxide Modified Acrylate (Aronix M110 manufactured by Toa Synthetic Co., Ltd.) 18 parts,
(アルカリ可溶性樹脂(C-4)溶液)
反応槽として冷却管を付けたセパラブルフラスコを準備し、他方、モノマー滴下槽として、ジメチル-2,2’-[オキシビス(メチレン)]ビス-2-プロペノエート40部、メタクリル酸40部、メタクリル酸メチル120部、t-ブチルパーオキシ2-エチルヘキサノエート( 日本油脂製「パーブチルO」)4部、PGMAc40部をよく攪拌混合したものを準備し、連鎖移動剤滴下槽として、n-ドデカンチオール8部、PGMAc32部をよく攪拌混合したものを準備した。
反応槽にPGMAc395部を仕込み、窒素置換した後、攪拌しながらオイルバスで加熱して反応槽の温度を90℃ まで昇温した。反応槽の温度が90℃ に安定してから、モノマー滴下槽及び連鎖移動剤滴下槽から滴下を開始した。滴下は、温度を90℃ に保ちながら、それぞれ135分間かけて行った。滴下が終了してから60分後に昇温を開始して反応槽を110 ℃ にした。3時間110℃を維持した後、セパラブルフラスコにガス導入管を付け、酸素/窒素=5/95(体積比)混合ガスのバブリングを開始した。次いで、反応槽に、メタクリル酸グリシジル7 0 部、2,2’-メチレンビス(4-メチル-6-t-ブチルフェノール)0.4部、トリエチルアミン0.8部を仕込み、そのまま110℃ で12時間反応させた。その後、PGMAc150部を加えて室温まで冷却し、樹脂溶液約2gをサンプリングして180℃、20分加熱乾燥して不揮発分を測定し、先に合成した樹脂溶液に不揮発分が20質量%になるようにPGMAcを添加してアルカリ可溶性樹脂(C-4)溶液を得た。樹脂の重量平均分子量は18,000 、不揮発分当たりの酸価は2mgKOH/gであった。
(Alkali-soluble resin (C-4) solution)
A separable flask with a cooling tube was prepared as a reaction tank, while 40 parts of dimethyl-2,2'-[oxybis (methylene)] bis-2-propenoate, 40 parts of methacrylic acid, and methacrylic acid were prepared as a monomer dropping tank. Prepare a well-stirred mixture of 120 parts of methyl, 4 parts of t-butylperoxy2-ethylhexanoate (“Perbutyl O” manufactured by Nippon Oil & Fats), and 40 parts of PGMAc. Eight parts and 32 parts of PGMAc were well mixed and mixed.
After charging 395 parts of PGMAc in the reaction vessel and substituting with nitrogen, the temperature of the reaction vessel was raised to 90 ° C. by heating with an oil bath while stirring. After the temperature of the reaction tank became stable at 90 ° C., dropping was started from the monomer dropping tank and the chain transfer agent dropping tank. The dropping was carried out over 135 minutes while keeping the temperature at 90 ° C. 60 minutes after the dropping was completed, the temperature was raised to 110 ° C. in the reaction vessel. After maintaining 110 ° C. for 3 hours, a gas introduction tube was attached to the separable flask, and bubbling of the oxygen / nitrogen = 5/95 (volume ratio) mixed gas was started. Next, 70 parts of glycidyl methacrylate, 0.4 parts of 2,2'-methylenebis (4-methyl-6-t-butylphenol), and 0.8 part of triethylamine were charged in the reaction vessel, and the reaction was carried out at 110 ° C. for 12 hours. I let you. After that, 150 parts of PGMAc is added and cooled to room temperature, about 2 g of the resin solution is sampled and dried by heating at 180 ° C. for 20 minutes to measure the non-volatile content, and the non-volatile content becomes 20% by mass in the previously synthesized resin solution. As described above, PGMAc was added to obtain an alkali-soluble resin (C-4) solution. The weight average molecular weight of the resin was 18,000, and the acid value per non-volatile component was 2 mgKOH / g.
(アルカリ可溶性樹脂(C-5)溶液)
撹拌機、温度計、還流冷却管、滴下ロ-ト及び窒素導入管を備えたフラスコに、PGMAc333部を導入し、フラスコ内雰囲気を空気から窒素にした後、100℃に昇温後、ベンジルメタクリレート70.5部(0.40モル)、グリシジルメタクリレート71.1部(0.50モル)、トリシクロデカン骨格のモノメタクリレート(日立化成社製FA-513M)22.0部(0.10モル)及び、PGMAc164部からなる混合物にアゾビスイソブチロニトリル3.6部を添加した溶液を滴下ロ-トから2時間かけてフラスコに滴下し、さらに100℃で5時間撹拌し続けた。次に、フラスコ内雰囲気を窒素から空気にし、メタクリル酸43.0部[0.5モル、(本反応に用いたグリシジルメタクリレートのグリシジル基に対して100モル%)]、トリスジメチルアミノメチルフェノール0.9部及びハイドロキノーン0.145部をフラスコ内に投入し、110℃で6時間反応を続け不揮発分酸価が1mgKOH/gとなったところで反応を終了した。次に、テトラヒドロフタル無水フタル酸60.9部(0.40モル)、トリエチルアミン0.8部を加え、120℃で3.5時間反応させ酸価80mgKOH/gの感光性透明樹脂溶液を得た。室温まで冷却した後、感光性透明樹脂溶液約2部をサンプリングして180℃、20分加熱乾燥して不揮発分を測定し、先に合成した感光性透明樹脂溶液に不揮発分が20質量%になるようにPGMAcを添加してアルカリ可溶性樹脂(C-5)溶液を調製した。質量平均分子量(Mw)は12,000であった。
(Alkali-soluble resin (C-5) solution)
Introduce 333 parts of PGMAc into a flask equipped with a stirrer, thermometer, reflux condenser, dropping rotor and nitrogen introduction tube, change the atmosphere inside the flask from air to nitrogen, raise the temperature to 100 ° C, and then benzyl methacrylate. 70.5 parts (0.40 mol), 71.1 parts (0.50 mol) of glycidyl methacrylate, monomethacrylate of tricyclodecane skeleton (FA-513M manufactured by Hitachi Chemical Co., Ltd.) 22.0 parts (0.10 mol) A solution prepared by adding 3.6 parts of azobisisobutyronitrile to a mixture consisting of 164 parts of PGMAc was added dropwise to the flask over 2 hours from the dropping rotor, and stirring was continued at 100 ° C. for 5 hours. Next, the atmosphere in the flask was changed from nitrogen to air, and 43.0 parts of methacrylic acid [0.5 mol, (100 mol% with respect to the glycidyl group of glycidyl methacrylate used in this reaction)], trisdimethylaminomethylphenol 0. 9. 9 parts and 0.145 parts of hydroquinone were put into a flask, and the reaction was continued at 110 ° C. for 6 hours, and the reaction was terminated when the non-volatile acid value reached 1 mgKOH / g. Next, 60.9 parts (0.40 mol) of tetrahydrophthalic anhydride and 0.8 part of triethylamine were added and reacted at 120 ° C. for 3.5 hours to obtain a photosensitive transparent resin solution having an acid value of 80 mgKOH / g. .. After cooling to room temperature, about 2 parts of the photosensitive transparent resin solution was sampled and dried by heating at 180 ° C. for 20 minutes to measure the non-volatile content. PGMAc was added so as to prepare an alkali-soluble resin (C-5) solution. The mass average molecular weight (Mw) was 12,000.
(アルカリ可溶性樹脂(C-6)溶液)
撹拌機、温度計、還流冷却管、滴下ロ-ト及び窒素導入管を備えたフラスコに、PGMAc182部を導入し、フラスコ内雰囲気を空気から窒素にした後、100℃に昇温後、ベンジルメタクリレート70.5部(0.40モル)、メタクリル酸43.0部(0.5モル)、トリシクロデカン骨格のモノメタクリレート(日立化成社製FA-513M)22.0部(0.10モル)及びPGMAc136部からなる混合物にアゾビスイソブチロニトリル3.6部を添加した溶液を滴下ロ-トから2時間かけてフラスコに滴下し、さらに100℃で5時間撹拌し続けた。次に、フラスコ内雰囲気を窒素から空気にし、グリシジルメタクリレート35.5部[0.25モル、(本反応に用いたメタクリル酸のカルボキシル基に対して50モル%)]、トリスジメチルアミノメチルフェノール0.9部及びハイドロキノーン0.145部をフラスコ内に投入し、110℃で6時間反応を続け、酸価が79mgKOH/gの感光性透明樹脂溶液を得た。室温まで冷却した後、感光性透明樹脂溶液約2部をサンプリングして180℃、20分加熱乾燥して不揮発分を測定し、先に合成した感光性透明樹脂溶液に不揮発分が20質量%になるようにPGMAcを添加してアルカリ可溶性樹脂(C-6)溶液を調製した。質量平均分子量(Mw)は13,000であった。
(Alkali-soluble resin (C-6) solution)
Introduce 182 parts of PGMAc into a flask equipped with a stirrer, thermometer, reflux condenser, dropping rotor and nitrogen introduction tube, change the atmosphere inside the flask from air to nitrogen, raise the temperature to 100 ° C, and then benzyl methacrylate. 70.5 parts (0.40 mol), 43.0 parts of methacrylic acid (0.5 mol), monomethacrylate of tricyclodecane skeleton (FA-513M manufactured by Hitachi Kasei Co., Ltd.) 22.0 parts (0.10 mol) A solution prepared by adding 3.6 parts of azobisisobutyronitrile to a mixture consisting of 136 parts of PGMac was added dropwise to the flask over 2 hours from the dropping rotor, and stirring was continued at 100 ° C. for 5 hours. Next, the atmosphere in the flask was changed from nitrogen to air, and 35.5 parts of glycidyl methacrylate [0.25 mol, (50 mol% with respect to the carboxyl group of methacrylic acid used in this reaction)], trisdimethylaminomethylphenol 0. 9. 9 parts and 0.145 parts of hydroquinone were put into a flask, and the reaction was continued at 110 ° C. for 6 hours to obtain a photosensitive transparent resin solution having an acid value of 79 mgKOH / g. After cooling to room temperature, about 2 parts of the photosensitive transparent resin solution was sampled and dried by heating at 180 ° C. for 20 minutes to measure the non-volatile content. PGMAc was added so as to prepare an alkali-soluble resin (C-6) solution. The mass average molecular weight (Mw) was 13,000.
<界面活性剤(D1)の製造>
(界面活性剤(D1-1)溶液)
窒素置換したフラスコに、溶剤としてメチルエチルケトン65質量部、その他単量体(d2)として、ジシクロペンタニルメタクリレート25.6質量部を仕込み、窒素気流下にて撹拌しながら60℃に昇温した。次いで、2,2’-ビピリジル3.1質量部、塩化第一銅1.1質量部を仕込み、フラスコ内を60℃に保ちながら30分撹拌した。その後、2-ブロモイソ酢酸エチル2.0質量部を加え、窒素気流下、40℃で2時間反応させた。次いで、フッ素化アルキル基を有する単量体(d1)として、2-(ノナフルオロブチル)エチルメタクリレート10.5質量部を加え、60℃で8時間反応させ反応物を得た。得られた反応物に、活性アルミナ30質量部を加えて撹拌した。活性アルミナ濾過後、溶媒を減圧蒸留で除去後、不揮発分が2質量%になるようにPGMAcを添加し、界面活性剤(D1-1)溶液を得た。
<Manufacturing of surfactant (D1)>
(Surfactant (D1-1) solution)
65 parts by mass of methyl ethyl ketone as a solvent and 25.6 parts by mass of dicyclopentanyl methacrylate as another monomer (d2) were charged in a nitrogen-substituted flask, and the temperature was raised to 60 ° C. with stirring under a nitrogen stream. Next, 3.1 parts by mass of 2,2'-bipyridyl and 1.1 parts by mass of cuprous chloride were charged, and the inside of the flask was stirred for 30 minutes while keeping the temperature at 60 ° C. Then, 2.0 parts by mass of ethyl 2-bromoisoacetate was added, and the mixture was reacted at 40 ° C. for 2 hours under a nitrogen stream. Next, 10.5 parts by mass of 2- (nonafluorobutyl) ethyl methacrylate was added as a monomer (d1) having a fluorinated alkyl group, and the mixture was reacted at 60 ° C. for 8 hours to obtain a reaction product. To the obtained reaction product, 30 parts by mass of activated alumina was added and stirred. After filtering the activated alumina, the solvent was removed by vacuum distillation, and PGMAc was added so that the non-volatile content was 2% by mass to obtain a surfactant (D1-1) solution.
(界面活性剤(D1-2~7)溶液)
界面活性剤(D1-1)の製造で使用したフッ素化アルキル基を有する単量体(d1)、及びその他単量体(d2)を表1に記載の化合物を使用した以外は、同様の方法で界面活性剤(D1-2~7)溶液を得た。
(Surfactant (D1-2-7) solution)
The same method except that the monomer (d1) having a fluorinated alkyl group used in the production of the surfactant (D1-1) and the other monomer (d2) used the compounds shown in Table 1 was used. A surfactant (D1-2-7) solution was obtained in.
(界面活性剤(D1-8)溶液)
撹拌装置、温度計、冷却管、滴下装置を備えたガラスフラスコに、溶媒としてメチルイソブチルケトン63質量部を仕込み、窒素気流下にて撹拌しながら105℃に昇温した。次いで、ポリ(パーフルオロアルキレンエーテル)鎖を有する単量体(d1)として、表1に記載の化合物21.5質量部、その他単量体(d2)として、表1に記載の化合物41.3質量部、ラジカル重合開始剤としてt-ブチルペルオキシ-2-エチルヘキサノート9.4質量部と溶媒としてメチルイソブチルケトン126質量部を混合した開始剤溶液135.4質量部をそれぞれ別の滴下装置にセットし、フラスコ内を105℃に保ちながら同時に2時間かけて滴下した。滴下終了後、105℃で10時間撹拌した後、減圧蒸留により溶媒を除去した。次いで、溶媒としてメチルエチルケトン74.7質量部、重合禁止剤としてp-メトキシフェノール0.1質量部、ウレタン化触媒としてジブチル錫ジラウレート0.06質量部を仕込み、60℃で撹拌しながら2-アクリロイルオキシエチルイソシアネート44.8質量部を1時間かけて滴下した。滴下終了後、60℃で1時間撹拌した後、80℃に昇温して10時間撹拌し反応させた。不揮発分が2質量%になるようにPGMAcを添加し、界面活性剤(D1-8)溶液を得た。
(Surfactant (D1-8) solution)
63 parts by mass of methyl isobutyl ketone was charged as a solvent into a glass flask equipped with a stirrer, a thermometer, a cooling tube, and a dropping device, and the temperature was raised to 105 ° C. while stirring under a nitrogen stream. Next, 21.5 parts by mass of the compound shown in Table 1 as the monomer (d1) having a poly (perfluoroalkylene ether) chain, and the compound 41.3 shown in Table 1 as the other monomer (d2). 135.4 parts by mass of the initiator solution, which is a mixture of 9.4 parts by mass of t-butylperoxy-2-ethylhexanote as a radical polymerization initiator and 126 parts by mass of methylisobutylketone as a solvent, is placed in a separate dropping device. The mixture was set and dropped simultaneously over 2 hours while keeping the inside of the flask at 105 ° C. After completion of the dropping, the mixture was stirred at 105 ° C. for 10 hours, and then the solvent was removed by vacuum distillation. Next, 74.7 parts by mass of methyl ethyl ketone as a solvent, 0.1 part by mass of p-methoxyphenol as a polymerization inhibitor, and 0.06 parts by mass of dibutyltin dilaurate as a urethanization catalyst were charged, and 2-acryloyloxy was charged with stirring at 60 ° C. 44.8 parts by mass of ethyl isocyanate was added dropwise over 1 hour. After completion of the dropping, the mixture was stirred at 60 ° C. for 1 hour, then heated to 80 ° C. and stirred for 10 hours for reaction. PGMAc was added so that the non-volatile content was 2% by mass to obtain a surfactant (D1-8) solution.
表1中のd1、d2の化合物について以下に示す。
(式(d1-3)中、Aはパーフルオロメチレン基、及びパーフルオロエチレン基であり、1分子あたりパーフルオロメチレン基が平均7個、パーフルオロエチレン基が平均8個存在し、フッ素原子の数が平均46個である。) (In the formula (d1-3), A is a perfluoromethylene group and a perfluoroethylene group, and each molecule has an average of 7 perfluoromethylene groups and an average of 8 perfluoroethylene groups, and is a fluorine atom. The average number is 46.)
(d2-3)
(D2-3)
<分散樹脂(F)の製造>
(分散樹脂(F-1)溶液)
ガス導入管、温度、コンデンサー、攪拌機を備えた反応容器に、メタクリル酸10部、メチルメタクリレート100部、i-ブチルメタクリレート70部、ベンジルメタクリレート20部、PGMAc50部を仕込み、窒素ガスで置換した。反応容器内を50℃に加熱撹拌し、3-メルカプト-1,2-プロパンジオール12部を添加した。90℃に昇温し、2,2’-アゾビスイソブチロニトリル0.1部をPGMAc90部に加えた溶液を添加しながら7時間反応した。不揮発分測定により95%が反応したことを確認した。ピロメリット酸無水物19部、PGMAc50部、シクロヘキサノン50部、触媒として1,8-ジアザビシクロ-[5.4.0]-7-ウンデセン0.4部を追加し、100℃で7時間反応させた。酸価の測定で98%以上の酸無水物がハーフエステル化していることを確認し反応を終了し、不揮発分測定で不揮発分30%となるようPGMAcを加えて希釈し、酸価70mgKOH/g、重量平均分子量8,500の分散樹脂(F-1)溶液を得た。
<Manufacturing of dispersed resin (F)>
(Dispersed resin (F-1) solution)
A reaction vessel equipped with a gas introduction tube, a temperature, a condenser, and a stirrer was charged with 10 parts of methacrylic acid, 100 parts of methyl methacrylate, 70 parts of i-butyl methacrylate, 20 parts of benzyl methacrylate, and 50 parts of PGMAc, and replaced with nitrogen gas. The inside of the reaction vessel was heated and stirred at 50 ° C., and 12 parts of 3-mercapto-1,2-propanediol was added. The temperature was raised to 90 ° C., and the reaction was carried out for 7 hours while adding a solution in which 0.1 part of 2,2'-azobisisobutyronitrile was added to 90 parts of PGMAc. It was confirmed that 95% of the reaction occurred by measuring the non-volatile content. 19 parts of pyromellitic acid anhydride, 50 parts of PGMAc, 50 parts of cyclohexanone, and 0.4 part of 1,8-diazabicyclo- [5.4.0] -7-undecene as a catalyst were added and reacted at 100 ° C. for 7 hours. .. After confirming that 98% or more of the acid anhydride was half-esterified by measuring the acid value, the reaction was terminated, and PGMAc was added and diluted so that the non-volatile content was 30% by measuring the non-volatile content, and the acid value was 70 mgKOH / g. , A dispersion resin (F-1) solution having a weight average molecular weight of 8,500 was obtained.
(分散樹脂(F-2)溶液)
ガス導入管、コンデンサー、攪拌翼、及び温度計を備え付けた反応槽に、無水トリメリット酸3部、3-メルカプト-1,2-プロパンジオール1部、PGMAc50部、ジメチルベンジルアミン0.1部を仕込んだ。窒素ガスで置換した後、反応容器内を120℃に加熱し4時間反応させ、次いで80℃で2時間反応させた。さらにターシャリーブチルアクリレート30部、ETERNACOLL OXMA(メタクリル酸(3-エチルオキセタン-3-イル)メチル 、宇部興産社製)20部、メタクリル酸5部、エチルアクリレート40部、PGMAc10部を仕込み、反応容器内を80℃に保ちながら2,2’-アゾビスイソブチロニトリル0.2部を15回に分けて30分ごとに添加した。最終添加から1時間後に不揮発分測定を行い、モノマーの95%が反応したことを確認した。不揮発分測定で不揮発分30%となるようPGMAcを加えて希釈し、不揮発分当たりの酸価51mgKOH/g、重量平均分子量(Mw)24,000の分散樹脂(F-2)溶液を得た。
(Dispersed resin (F-2) solution)
In a reaction vessel equipped with a gas introduction tube, a condenser, a stirring blade, and a thermometer, 3 parts of trimellitic anhydride, 1 part of 3-mercapto-1,2-propanediol, 50 parts of PGMAc, and 0.1 part of dimethylbenzylamine were added. I prepared it. After replacement with nitrogen gas, the inside of the reaction vessel was heated to 120 ° C. and reacted at 120 ° C. for 4 hours, and then reacted at 80 ° C. for 2 hours. Further, 30 parts of tertiary butyl acrylate, 20 parts of ETERNACOLL OXMA (methyl methacrylate (3-ethyloxetane-3-yl), manufactured by Ube Industries, Ltd.), 5 parts of methacrylic acid, 40 parts of ethyl acrylate, and 10 parts of PGMAc are charged, and a reaction vessel is charged. While keeping the inside at 80 ° C., 0.2 part of 2,2'-azobisisobutyronitrile was added in 15 portions every 30 minutes. The non-volatile content was measured 1 hour after the final addition, and it was confirmed that 95% of the monomers reacted. PGMAc was added and diluted so as to have a non-volatile content of 30% in the non-volatile content measurement to obtain a dispersed resin (F-2) solution having an acid value of 51 mgKOH / g per non-volatile content and a weight average molecular weight (Mw) of 24,000.
(分散樹脂(F-3)溶液)
ガス導入管、コンデンサー、攪拌翼、及び温度計を備え付けた反応装置に、メチルメタクリレート30部、nーブチルメタクリレート30部、ヒドロキシエチルメタクリレート20部、テトラメチルエチレンジアミン13.2部を仕込み、窒素を流しながら50℃で1時間撹拌し、系内を窒素置換した。次に、ブロモイソ酪酸エチル9.3部、塩化第一銅5.6部、PGMAc133部を仕込み、窒素気流下で、110℃まで昇温して第一ブロック(Bブロック)の重合を開始した。4時間重合後、重合溶液をサンプリングして不揮発分測定を行い、不揮発分から換算して重合転化率が98%以上であることを確認した。
次に、この反応装置に、PGMAc61部、第二ブロック(Aブロック)モノマーとして1,2,2,6,6-ペンタメチルピペリジルメタクリレート20部(日立化成工業社製、ファンクリルFA-711MM)を投入し、110℃・窒素雰囲気下を保持したまま撹拌し、反応を継続した。1,2,2,6,6-ペンタメチルピペリジルメタクリレート投入から2時間後、重合溶液をサンプリングして不揮発分測定を行い、不揮発分から換算して第二ブロック(Aブロック)の重合転化率が98%以上であることを確認し、反応溶液を室温まで冷却して重合を停止した。不揮発分測定で不揮発分30%となるようPGMAcを加えて希釈し、不揮発分当たりのアミン価が57mgKOH/g、数平均分子量4,500(Mn)のピペリジル骨格を有する分散樹脂(F-3)溶液を得た。
(Dispersed resin (F-3) solution)
A reactor equipped with a gas introduction tube, a condenser, a stirring blade, and a thermometer was charged with 30 parts of methyl methacrylate, 30 parts of n-butyl methacrylate, 20 parts of hydroxyethyl methacrylate, and 13.2 parts of tetramethylethylenediamine, and nitrogen was poured. While stirring at 50 ° C. for 1 hour, the inside of the system was replaced with nitrogen. Next, 9.3 parts of ethyl bromoisobutyrate, 5.6 parts of cuprous chloride, and 133 parts of PGMAc were charged, and the temperature was raised to 110 ° C. under a nitrogen stream to start the polymerization of the first block (B block). After polymerization for 4 hours, the polymerization solution was sampled and the non-volatile content was measured, and it was confirmed that the polymerization conversion rate was 98% or more in terms of the non-volatile content.
Next, 61 parts of PGMAc and 20 parts of 1,2,2,6,6-pentamethylpiperidylmethacrylate (manufactured by Hitachi Kasei Kogyo Co., Ltd., Funkryl FA-711MM) as a second block (A block) monomer were added to this reactor. The mixture was charged and stirred while maintaining the atmosphere of 110 ° C. and nitrogen, and the reaction was continued. Two hours after the addition of 1,2,2,6,6-pentamethylpiperidylmethacrylate, the polymerization solution was sampled to measure the non-volatile content, and the polymerization conversion rate of the second block (A block) was 98 when converted from the non-volatile content. % Or more, and the reaction solution was cooled to room temperature to terminate the polymerization. A dispersion resin (F-3) having a piperidine skeleton having an amine value of 57 mgKOH / g and a number average molecular weight of 4,500 (Mn), diluted by adding PGMAc so as to have a non-volatile content of 30% in the non-volatile content measurement. A solution was obtained.
(分散樹脂(F-4)溶液)
冷却管、添加用ロート、窒素用インレット、機械的攪拌機、デジタル温度計を備えた500mL丸底4口セパラブルフラスコに、テトラヒドロフラン(THF)250質量部及び開始剤のジメチルケテンメチルトリメチルシリルアセタール5.81質量部を、添加用ロートを介して加え、充分に窒素置換を行った。触媒のテトラブチルアンモニウムm-クロロベンゾエートの1モル/Lアセトニトリル溶液0.5質量部を、シリンジを用いて注入し、親溶剤性を有するブロック用モノマーのメタクリル酸2-ヒドロキシエチル19.7質量部、メタクリル酸2-エチルヘキシル7.5質量部、メタクリル酸n-ブチル12.9質量部、メタクリル酸ベンジル10.7質量部、メタクリル酸メチル30.9質量部を、添加用ロートを用いて60分かけて滴下した。反応フラスコを氷浴で冷却することにより、温度を40℃未満に保った。1時間後、色材吸着機能ブロック用モノマーであるジメチルアミノプロピルメタクリルアミド18.3質量部を20分かけて滴下した。1時間反応させた後、メタノール1質量部を加えて反応を停止させた。得られたブロック共重合体THF溶液はヘキサン中で再沈殿させ、濾過、真空乾燥により精製を行った。
続いて、100mL丸底フラスコ中でPGMAc35質量部に、得られたブロック共重合体15.0質量部を溶解させ、塩形成成分であるフェニルホスフィン酸1.1質量部(ジメチルアミノプロピルメタクリルアミドに対し、0.5モル等量)加え、反応温度30℃で20時間攪拌し、PGMAcを添加して調整し、不揮発分30%の分散樹脂(F-4)溶液を得た。
(Dispersed resin (F-4) solution)
In a 500 mL round bottom 4-port separable flask equipped with a condenser, an addition funnel, an inlet for nitrogen, a mechanical stirrer, and a digital thermometer, 250 parts by mass of tetrahydrofuran (THF) and the initiator dimethylketenemethyltrimethylsilylacetal 5.81 A mass portion was added via the addition funnel and sufficient nitrogen substitution was performed. 0.5 part by mass of 1 mol / L acetonitrile solution of tetrabutylammonium m-chlorobenzoate as a catalyst is injected using a syringe, and 19.7 parts by mass of 2-hydroxyethyl methacrylate, which is a solvent-friendly blocking monomer, is injected. , 7.5 parts by mass of 2-ethylhexyl methacrylate, 12.9 parts by mass of n-butyl methacrylate, 10.7 parts by mass of benzyl methacrylate, 30.9 parts by mass of methyl methacrylate for 60 minutes using an addition funnel. Dropped over. The temperature was kept below 40 ° C. by cooling the reaction flask in an ice bath. After 1 hour, 18.3 parts by mass of dimethylaminopropylmethacrylamide, which is a monomer for blocking the colorant adsorption function, was added dropwise over 20 minutes. After reacting for 1 hour, 1 part by mass of methanol was added to stop the reaction. The obtained block copolymer THF solution was reprecipitated in hexane, and purified by filtration and vacuum drying.
Subsequently, 15.0 parts by mass of the obtained block copolymer was dissolved in 35 parts by mass of PGMAc in a 100 mL round bottom flask, and 1.1 parts by mass of phenylphosphinic acid (dimethylaminopropylmethacrylamide), which is a salt-forming component, was dissolved. On the other hand, 0.5 mol equal amount) was added, and the mixture was stirred at a reaction temperature of 30 ° C. for 20 hours, and PGMAc was added for adjustment to obtain a dispersed resin (F-4) solution having a non-volatile content of 30%.
<分散体の製造>
(分散体1)
下記の原料を均一になるように攪拌混合した後、直径0.5mmのジルコニアビ-ズを用いて、アイガーミル(アイガージャパン社製「ミニモデルM-250 MKII」)で3時間分散した後、孔径1.0μmのフィルタで濾過し、分散体1を作製した。有機溶剤(R-1)は、PGMAcである。
微細化フタロシアニン顔料(A1-1) :10.0部
分散樹脂(F-2)溶液 :10.0部
分散樹脂(F-3)溶液 :7.0部
アルカリ可溶性樹脂(C-1)溶液 :10.0部
有機溶剤(R-1) :63.0部
<Manufacturing of dispersion>
(Dispersion 1)
The following raw materials are stirred and mixed so as to be uniform, and then dispersed for 3 hours with an Eiger mill (“Mini Model M-250 MKII” manufactured by Eiger Japan Co., Ltd.) using a zirconia bead having a diameter of 0.5 mm, and then the pore diameter. The dispersion 1 was prepared by filtering with a 1.0 μm filter. The organic solvent (R-1) is PGMAc.
Miniaturized phthalocyanine pigment (A1-1): 10.0 parts Dispersed resin (F-2) solution: 10.0 parts Dispersed resin (F-3) solution: 7.0 parts Alkali-soluble resin (C-1) solution: 10.0 parts Organic solvent (R-1): 63.0 parts
(分散体2~27)
表2に記載した原料、量を変えた以外は、分散体1と同様にして分散体2~27を作製した。
(Dispersion 2-27)
Dispersions 2 to 27 were prepared in the same manner as in Dispersion 1 except that the raw materials and amounts shown in Table 2 were changed.
なお、表2に記載したそれぞれの原料については、以下の通りである。 The raw materials listed in Table 2 are as follows.
[トリアリールスルホニウム化合物(E)]
(E-1):T1609(東京化成工業社製:トリフェニルスルホニウムブロミド)
(E-2):SP-066(ADEKA社製:トリフェニルスルホニウムトリフルオロメタンスルホナート
(E-3):WPAG-336(富士フィルム和光純薬社製:ジフェニル-4-メチルフェニルスルホニウムトリフルオロメタンスルホナート
(E-4):TS-01(三和ケミカル社:トリス(4-メチルフェニル)スルホニウムトリフルオロメタンスルホナート
(E-5):WPAG-370(富士フィルム和光純薬社製:ジフェニル(4-メトキシフェニル)スルホニウムトリフルオロメタンスルホナート
(E-6):SP-056(ADEKA社製:トリフェニルスルホニウムノナフルオロブタンスルホナート
(E-7):TS-91(三和ケミカル社:トリス(4-メチルフェニル)スルホニウムヘキサフルオロフォスファート
[Triarylsulfonium compound (E)]
(E-1): T1609 (manufactured by Tokyo Chemical Industry Co., Ltd .: triphenylsulfonium bromide)
(E-2): SP-066 (made by ADEKA: triphenylsulfonium trifluoromethanesulfonate (E-3): WPAG-336 (manufactured by Fuji Film Wako Junyaku Co., Ltd .: diphenyl-4-methylphenylsulfonium trifluoromethanesulfonate) (E-4): TS-01 (Sanwa Chemical Co., Ltd .: Tris (4-methylphenyl) Sulfonium Trifluoromethanesulfonate (E-5): WPAG-370 (Fuji Film Wako Junyaku Co., Ltd .: Diphenyl (4-methoxy) Phenyl) Sulfonium Trifluoromethane Sulfonate (E-6): SP-056 (ADEKA: Triphenyl Sulfonium Nonaflate Butane Sulfonium (E-7): TS-91 (Sanwa Chemical Co., Ltd .: Tris (4-Methylphenyl) ) Sulfonium Hexafluorophosphate
<着色組成物の製造>
[実施例1]
(着色組成物1)
下記の原料を均一になるように撹拌混合した後、孔径1.0μmのフィルタで濾過して着色組成物1を得た。
分散体2 :30.0部
分散体7 :6.25部
分散体18 :18.75部
アルカリ可溶性樹脂(C) :5.0部
界面活性剤(D1-1) :1.5部
重合性化合物(H) :2.0部
光重合開始剤(I) :1.0部
増感剤(J) :0.2部
エポキシ化合物(K1) :1.0部
チオール系連鎖移動剤(L) :0.1部
重合性禁止剤(M) :0.1部
紫外線吸収剤(N) :0.1部
酸化防止剤(O) :0.1部
貯蔵安定剤(P) :0.1部
有機溶剤(R) :33.8部
<Manufacturing of coloring composition>
[Example 1]
(Coloring Composition 1)
The following raw materials were stirred and mixed so as to be uniform, and then filtered through a filter having a pore size of 1.0 μm to obtain a colored composition 1.
Dispersion 2: 30.0 parts Dispersion 7: 6.25 parts Dispersion 18: 18.75 parts Alkaline-soluble resin (C): 5.0 parts Polymerizer (D1-1): 1.5 parts Polymerizable Compound (H): 2.0 parts Photopolymerization initiator (I): 1.0 part Sensitizer (J): 0.2 parts Epoxy compound (K1): 1.0 part Thiol-based chain transfer agent (L) : 0.1 part Polymerizable inhibitor (M): 0.1 part Ultraviolet absorber (N): 0.1 part Antioxidant (O): 0.1 part Storage stabilizer (P): 0.1 part Organic solvent (R): 33.8 parts
[実施例2~41、比較例1~4]
(着色組成物2~45)
表3に記載した原料、量を変えた以外は、実施例1の着色組成物1と同様にして着色組成物2~45を作製した。
[Examples 2 to 41, Comparative Examples 1 to 4]
(Coloring Compositions 2-45)
Colored compositions 2 to 45 were prepared in the same manner as in Colored Composition 1 of Example 1 except that the raw materials and amounts shown in Table 3 were changed.
なお、表3-1~に表3-1記載したそれぞれの原料については、以下の通りである。 The raw materials listed in Tables 3-1 to 3-1 are as follows.
[アルカリ可溶性樹脂(C)溶液]
アルカリ可溶性樹脂(C-2)~(C-6)溶液をそれぞれ同量にて混合し、アルカリ可溶性樹脂(C)溶液とした。
[Alkali-soluble resin (C) solution]
Alkali-soluble resin (C-2) to (C-6) solutions were mixed in equal amounts to prepare an alkali-soluble resin (C) solution.
[界面活性剤(D)]
(D2-1):BYK-330(ビックケミー社製)2部を、PGMAc98部に溶解。
[Surfactant (D)]
(D2-1): 2 parts of BYK-330 (manufactured by Big Chemie) are dissolved in 98 parts of PGMAc.
[重合性化合物(H)]
(H-1):アロニックスM309(東亞合成社製)
(H-2):アロニックスM402(東亞合成社製)
(H-3):アロニックスM520(東亞合成社製)
(H-4):KAYARAD DPCA-30(日本化薬社製)
以上、(H-1)~(H-4)をそれぞれ同量にて混合し、重合性化合物(H)とした。
[Polymerizable compound (H)]
(H-1): Aronix M309 (manufactured by Toagosei Co., Ltd.)
(H-2): Aronix M402 (manufactured by Toagosei Co., Ltd.)
(H-3): Aronix M520 (manufactured by Toagosei Co., Ltd.)
(H-4): KAYARAD DPCA-30 (manufactured by Nippon Kayaku Co., Ltd.)
As described above, (H-1) to (H-4) were mixed in the same amount to obtain the polymerizable compound (H).
[光重合開始剤(I)]
(I-1):イルガキュア907(BASFジャパン社製)
(I-2):イルガキュア379(BASFジャパン社製)
(I-3):イルガキュアOXE01(BASFジャパン社製)
(I-4):イルガキュアOXE02(BASFジャパン社製)
(I-5):イルガキュアOXE04(BASFジャパン社製)
以上、(I-1)~(I-5)をそれぞれ同量混合し、光重合開始剤(I)とした。
[Photopolymerization Initiator (I)]
(I-1): Irgacure 907 (manufactured by BASF Japan Ltd.)
(I-2): Irgacure 379 (manufactured by BASF Japan Ltd.)
(I-3): Irgacure OXE01 (manufactured by BASF Japan Ltd.)
(I-4): Irgacure OXE02 (manufactured by BASF Japan Ltd.)
(I-5): Irgacure OXE04 (manufactured by BASF Japan Ltd.)
As described above, the same amounts of (I-1) to (I-5) were mixed to obtain a photopolymerization initiator (I).
[増感剤(J)]
(J-1):カヤキュアDETX-S(日本化薬社製)
(J-2):4,4CHEMARK DEABP(Chemark Chemical社製)
以上、(J-1)、(J-2)をそれぞれ同量にて混合し、増感剤(I)とした。
[Sensitizer (J)]
(J-1): Kayacure DETX-S (manufactured by Nippon Kayaku Co., Ltd.)
(J-2): 4,4 CHEMARK DEABP (manufactured by Chemark Chemical)
As described above, (J-1) and (J-2) were mixed in the same amount to prepare the sensitizer (I).
[エポキシ化合物(K1)]
(K1-1):EHPE-3150(ダイセル社製)
(K1-2): デナコールEX611(ナガセケムテックス社製)
(K1-3):イソシアヌル酸トリグリシジル
以上、(K1-1)~(K1-3)をそれぞれ同量混合し、エポキシ化合物(K1)とした。
[Epoxy compound (K1)]
(K1-1): EHPE-3150 (manufactured by Daicel)
(K1-2): Denacol EX611 (manufactured by Nagase ChemteX)
(K1-3): Triglycidyl isocyanurate and above, (K1-1) to (K1-3) were mixed in equal amounts to prepare an epoxy compound (K1).
[チオール系連鎖移動剤(L)]
(L-1):トリメチロ-ルエタントリス(3-メルカプトブチレート)
(L-2):トリメチロ-ルプロパントリス(3-メルカプトブチレート)
(L-3):ペンタエリスリトールテトラキス(3-メルカプトプロピオネート)
(L-4):トリメチロ-ルプロパントリス(3-メルカプトプロピオネート)
(L-5):トリス[(3-メルカプトプロピオニルオキシ)-エチル]-イソシアヌレート
以上、(L-1)~(L-5)をそれぞれ同量にて混合し、チオール系連鎖移動剤(L)とした。
[Thiol chain transfer agent (L)]
(L-1): Trimethylol etanthris (3-mercaptobutyrate)
(L-2): Trimethylol propanthris (3-mercaptobutyrate)
(L-3): Pentaerythritol tetrakis (3-mercaptopropionate)
(L-4): Trimethylol propanthris (3-mercaptopropionate)
(L-5): Tris [(3-mercaptopropionyloxy) -ethyl] -isocyanurate or more, (L-1) to (L-5) are mixed in equal amounts, and a thiol chain transfer agent (L) is used. ).
[重合禁止剤(M)]
(M-1):4-メチルカテコール
(M-2):メチルヒドロキノーン
(M-3):t-ブチルヒドロキノーン
以上、(M-1)~(M-3)をそれぞれ同量にて混合し、重合禁止剤(M)とした。
[Polymerization inhibitor (M)]
(M-1): 4-Methylcatechol (M-2): Methylhydroquinone (M-3): t-butylhydroquinone or more, (M-1) to (M-3) are mixed in the same amount. Then, it was used as a polymerization inhibitor (M).
[紫外線吸収剤(N)]
(N-1):TINUVIN400(BASFジャパン社製)
(N-2):TINUVIN900(BASFジャパン社製)
以上、(N-1)、(N-2)をそれぞれ同量にて混合し、紫外線吸収剤(N)とした。
[Ultraviolet absorber (N)]
(N-1): TINUVIN400 (manufactured by BASF Japan Ltd.)
(N-2): TINUVIN900 (manufactured by BASF Japan Ltd.)
As described above, (N-1) and (N-2) were mixed in the same amount to obtain an ultraviolet absorber (N).
[酸化防止剤(O)]
(O-1):ペンタエリスリトールテトラキス[3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート
(O-2):3,3'-チオジプロパン酸ジオクタデシル
(O-3):トリス[2,4-ジ-(t)-ブチルフェニル]ホスフィン
(O-4):ビス(2,2,6,6-テトラメチル-4-ピペリジル)セバケート
(O-5):サリチル酸p-オクチルフェニル
以上、(O-1)~(O-5)をそれぞれ同量にて混合し、酸化防止剤(N)とした。
[Antioxidant (O)]
(O-1): Pentaerythritol tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate (O-2): 3,3'-dioctadecylthiodipropanoate (O-3): Tris [2,4-di- (t) -butylphenyl] phosphine (O-4): bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate (O-5): p-octyl salicylate Phenyl and above, (O-1) to (O-5) were mixed in the same amount to prepare an antioxidant (N).
[貯蔵安定剤(P)]
(P-1):2,6-ビス(1,1-ジメチルエチル)-4-メチルフェノール
(P-2):トリフェニルホスフィン
以上、(P-1)、(P-2)をそれぞれ同量にて混合し、貯蔵安定剤(P)とした。
[Storage stabilizer (P)]
(P-1): 2,6-bis (1,1-dimethylethyl) -4-methylphenol (P-2): Triphenylphosphine or more, (P-1), (P-2) in equal amounts, respectively To obtain a storage stabilizer (P).
[有機溶剤(R) ]
(R-1):プロピレングリコールモノメチルエーテルアセテート 30部
(R-2):シクロヘキサノーン 30部
(R-3):3-エトキシプロピオン酸エチル 10部
(R-4):プロピレングリコールモノメチルエーテル 10部
(R-5):シクロヘキサノールアセテート 10部
(R-6):ジプロプレングリコールメチルエーテルアセテート 10部
以上、(R-1)~(R-6)をそれぞれ上記質量部にて混合し、有機溶剤(R)とした。
[Organic solvent (R)]
(R-1): Propylene glycol monomethyl
<着色組成物の評価>
各試験を下記の方法で行った。評価結果は、表3に示す。
<Evaluation of coloring composition>
Each test was performed by the following method. The evaluation results are shown in Table 3.
[異物評価]
得られた着色組成物をガラス基板上に、熱処理後の塗膜の色度値がC光源でy=0.60となるようにスピンコーターを用いて塗布した。次に、70℃20分乾燥させ、所定のマスクと超高圧水銀ランプを用いて積算光量50mJ/cm2で紫外線露光を行い、23℃の炭酸ナトリウム水溶液でスプレー現像した後、イオン交換水で洗浄、風乾しパターン画素を形成した。
その後、オーブンで230℃40分間の熱処理を行い、パターン画素の間のガラス基板上の異物の数を計測した。評価は、金属顕微鏡「BX60」(オリンパスシステム社製)を用いて表面観察を行った。倍率は500倍とし、透過にて任意の5視野で観測可能な異物の数を積算で計測した。3以上が実用可能である。
5:異物の数が5個未満
4:異物の数が5個以上、10個未満
3:異物の数が10個以上、20個未満
2:異物の数が20個以上、50個未満
1:異物の数が50個以上
[Foreign matter evaluation]
The obtained coloring composition was applied onto a glass substrate using a spin coater so that the chromaticity value of the coating film after the heat treatment was y = 0.60 with a C light source. Next, it was dried at 70 ° C. for 20 minutes, exposed to ultraviolet rays at an integrated light intensity of 50 mJ / cm 2 using a predetermined mask and an ultrahigh pressure mercury lamp, spray-developed with a sodium carbonate aqueous solution at 23 ° C., and then washed with ion-exchanged water. , Air-dried to form pattern pixels.
Then, heat treatment was performed at 230 ° C. for 40 minutes in an oven, and the number of foreign substances on the glass substrate between the pattern pixels was measured. For the evaluation, surface observation was performed using a metallurgical microscope "BX60" (manufactured by Olympus System Corporation). The magnification was set to 500 times, and the number of foreign substances observable in any five fields of view by transmission was measured by integration. 3 or more is practical.
5: The number of foreign substances is less than 5
4: The number of foreign substances is 5 or more and less than 10 3: The number of foreign substances is 10 or more and less than 20 2: The number of foreign substances is 20 or more and less than 50 1: The number of foreign substances is 50 or more
[明度評価]
得られた着色組成物をガラス基板上に、熱処理後の塗膜の色度値がC光源でy=0.60となるようにスピンコーターを用いて塗布し、70℃20分乾燥させた。次いで、超高圧水銀ランプを用いて積算光量紫外線50mJ/cm2で紫外線露光を行い、23℃の炭酸ナトリウム水溶液でスプレー現像した後、イオン交換水で洗浄・風乾し、オーブンで230℃40分間熱処理を行い、ガラス基板上に着色組成物層を形成した。
次いで、着色組成物層上に、スピンコーターを用いてオーバーコート剤を塗布し、減圧乾燥機で有機溶剤を除去した。その後、ホットプレートで90℃2分間焼成後、230℃60分間熱処理を行い、明度評価用基板を得た。
得られた明度評価用基板のXYZ表色系における初期明度を、LVmicroZ(ラムダビジョン社製)で測定した。その後、LED照明を用いて紫外線を200時間照射した後、再度明度を測定した。下記式より、明度変化率を求めた。3以上が実用可能である。
明度変化率=|200時間後明度-初期明度|/初期明度×100
5:3%未満
4:3%以上、5%未満
3:5%以上、10%未満
2:10%以上、15%未満
1:15%以上
[Brightness evaluation]
The obtained coloring composition was applied onto a glass substrate using a spin coater so that the chromaticity value of the coating film after heat treatment was y = 0.60 with a C light source, and dried at 70 ° C. for 20 minutes. Next, ultraviolet exposure was performed with an integrated light amount of ultraviolet rays of 50 mJ / cm 2 using an ultra-high pressure mercury lamp, spray-developed with an aqueous sodium carbonate solution at 23 ° C, washed with ion-exchanged water, air-dried, and heat-treated at 230 ° C for 40 minutes in an oven. To form a colored composition layer on a glass substrate.
Next, an overcoat agent was applied onto the coloring composition layer using a spin coater, and the organic solvent was removed by a vacuum drier. Then, after firing on a hot plate at 90 ° C. for 2 minutes, heat treatment was performed at 230 ° C. for 60 minutes to obtain a substrate for lightness evaluation.
The initial brightness of the obtained lightness evaluation substrate in the XYZ color system was measured by LVmicroZ (manufactured by Lambda Vision). Then, after irradiating with ultraviolet rays for 200 hours using LED lighting, the brightness was measured again. The rate of change in brightness was calculated from the following formula. 3 or more is practical.
Brightness change rate = | 200 hours later brightness-initial brightness | / initial brightness x 100
Less than 5: 3% 4: 3% or more and less than 5% 3: 5% or more and less than 10% 2: 10% or more, less than 15% 1: 15% or more
[電圧保持率評価]
得られた着色組成物を有効電極サイズ10mm×10mmのITO透明電極を有するガラス基板上に、スピンコーターを用いて、乾燥・熱処理後の塗膜が2.0μmになるように塗布し、電極部の塗膜を溶剤で拭き取りした後、積算光量50mJ/cm2で紫外線露光を行い、23℃のアルカリ現像液で現像し、塗膜基板を得た。次いで、230℃で20分間加熱、放冷後、測定用のサンプル塗布基板を各二枚作製した。
上記サンプル塗布済ガラス基板2枚を、ITO透明電極面同士が向かい合うように対向配置し、セルギャップが9μm になるようにシール剤を用いて小型セルを作製した。この小型セルに液晶液をセルギャップ間に注入して、50℃において、電圧5Vで60μ秒間電圧を印加し、電圧解放後16.67m秒経過後のセル電圧[V1]を、東陽テクニカ製VHR-1Sにて測定した。測定されたセル電圧を平均化し、得られたセル電圧を用いて、下記式より初期VHR(%)を求めた。
VHR(電圧保持率)(%)=([V1]/5)×100
上記初期VHR測定済セルサンプルを、LED照明15万nit、3時間照射し再度照射後のVHR(%)の測定し、下記式よりΔVHR(電圧保持率変化率)を求め、下記の基準にて評価した。3以上を実用レベルとした。
ΔVHR=|初期VHR-露光後VHR|
5:2%未満
4:2%以上、5%未満
3:5%以上、10%未満
2:10%以上、15%未満
1:15%以上
[Voltage retention rate evaluation]
The obtained coloring composition was applied onto a glass substrate having an ITO transparent electrode having an effective electrode size of 10 mm × 10 mm using a spin coater so that the coating film after drying and heat treatment was 2.0 μm, and the electrode portion was formed. After wiping off the coating film of No. 1 with a solvent, the film was exposed to ultraviolet rays at an integrated light amount of 50 mJ / cm 2 and developed with an alkaline developer at 23 ° C. to obtain a coating film substrate. Then, after heating at 230 ° C. for 20 minutes and allowing to cool, two sample-coated substrates for measurement were prepared.
The two sample-coated glass substrates were placed facing each other so that the ITO transparent electrode surfaces faced each other, and a small cell was prepared using a sealant so that the cell gap was 9 μm. A liquid crystal liquid is injected into this small cell between the cell gaps, a voltage is applied at a voltage of 5 V for 60 μsec at 50 ° C., and the cell voltage [V1] after 16.67 msec after the voltage is released is set to VHR manufactured by Toyo Corporation. Measured at -1S. The measured cell voltage was averaged, and the obtained cell voltage was used to obtain the initial VHR (%) from the following formula.
VHR (voltage retention rate) (%) = ([V1] / 5) × 100
The above initial VHR measured cell sample is irradiated with LED lighting of 150,000 nits for 3 hours, VHR (%) is measured again, and ΔVHR (voltage retention rate change rate) is obtained from the following formula. evaluated. 3 or more was set as a practical level.
ΔVHR = | Initial VHR-VHR after exposure |
Less than 5: 2% 4: 2% or more and less than 5% 3: 5% or more and less than 10% 2: 10% or more, less than 15% 1: 15% or more
10 液晶表示装置
11 透明基板
12 TFTアレイ
13 透明電極層
14 配向層
15 偏光板
21 透明基板
22 カラーフィルタ
23 透明電極層
24 配向層
25 偏光板
30 バックライトユニット
31 白色LED光源
LC 液晶
10 Liquid crystal display 11
Claims (7)
前記着色剤(A)が、フタロシアニン顔料(A1)、およびキノフタロン顔料(A2)を含み、
前記スルホ基を有するキノフタロン化合物の金属塩(B)の金属が、銅、銀、亜鉛、鉄、およびアルミニウムからなる群より選ばれる1種以上の金属であり、
前記界面活性剤(D)が、フッ素化アルキル基およびポリ(パーフルオロアルキレンエーテル)鎖のうち1種以上を有する単量体(d1)と、その他単量体(d2)との共重合体である界面活性剤(D1)を含む、着色組成物。 A coloring composition comprising a colorant (A), a metal salt (B) of a quinophthalone compound having a sulfo group, an alkali-soluble resin (C), and a surfactant (D).
The colorant (A) contains a phthalocyanine pigment (A1) and a quinophthalone pigment (A2).
The metal of the metal salt (B) of the quinophthalone compound having a sulfo group is one or more metals selected from the group consisting of copper, silver, zinc, iron, and aluminum.
The surfactant (D) is a copolymer of a monomer (d1) having at least one of a fluorinated alkyl group and a poly (perfluoroalkylene ether) chain and another monomer (d2). A coloring composition comprising a surfactant (D1).
一般式(1)
(一般式(1)において、R1~R13は、それぞれ独立に、水素原子、ハロゲン原子、置換基を有しても良いアルキル基、置換基を有しても良いアルコキシル基、置換基を有しても良いアリール基を示す。R1~R4、及び/又は、R5~R8の隣接した基は、一体となって、置換基を有してもよい芳香環を形成してもよい。) The coloring composition according to claim 1 or 2, wherein the quinophthalone pigment (A2) contains a quinophthalone pigment represented by the following general formula (1).
General formula (1)
(In the general formula (1), R 1 to R 13 independently have a hydrogen atom, a halogen atom, an alkyl group which may have a substituent, an alkoxyl group which may have a substituent, and a substituent. Indicates an aryl group that may have. R 1 to R 4 and / or adjacent groups of R 5 to R 8 together form an aromatic ring that may have a substituent. May be good.)
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