JP2021510438A - Transparent conductive coating for capacitive touch panels and its manufacturing method - Google Patents

Abstract

The multilayer conductive coating is substantially transparent to visible light, includes at least one conductive layer sandwiched between at least a pair of dielectric layers, and includes electrodes and / or conductivity in a capacitive touch panel. It may be used as a sex wiring. The multilayer conductive coating may include a dielectric layer (s) and is used in applications such as capacitive touch panels for controlling showers, appliances, vending machines, electronic devices, and / or electronic devices. May be done. In certain exemplary embodiments, different electrodes on the touch panel may be formed by different silver-based layers of the same or different multilayer coatings. In certain exemplary embodiments, different laser scribe wavelengths may be used to pattern different conductive layers of the same or different multilayer coatings (s) when patterning the electrodes.

Description

(Related application)
This application is a continuation-in-part (CIP) of US Patent Application No. 15 / 678,266 filed on August 16, 2017, which is July 12, 2017. This is a partial continuation application (CIP) of U.S. Patent Application No. 15 / 647,541 filed in, which is U.S. Patent Application No. 15 / 215,908 filed on July 21, 2016 (USA). Patent No. 9,733,779), which is a partial continuation application (CIP) of US Patent Application No. 15 / 146,270 filed on May 4, 2016. This is a continuation of U.S. Patent Application No. 13 / 685,871 (now U.S. Pat. No. 9,354,755) filed on November 27, 2012, all of which are disclosed by reference. The whole is incorporated herein. This application is also a Partial Continuation Application (CIP) of U.S. Patent Application No. 15 / 678,266 filed August 16, 2017, which was filed January 19, 2017 in the United States. This is a partial continuation application (CIP) of Patent Application No. 15 / 409,658, which is a continuation of US Patent Application No. 14 / 681,266 filed on April 8, 2015 (currently). US Pat. No. 9,557,871), all of these disclosures are incorporated herein by reference in their entirety.

(Field of invention)
An exemplary embodiment of the invention relates to a multilayer conductive coating that is substantially transparent to visible light, comprising at least one conductive layer sandwiched between at least a pair of dielectric layers and static. It may be used as an electrode and / or a conductive wiring in a capacitive touch panel. The multilayer conductive coating may include, in certain embodiments, a layer of zirconium oxide (eg, ZrO ₂ ) and / or silicon nitride, including showers, appliances, vending machines, electronics, and / Or may be used in applications such as capacitive touch panels for controlling things such as electronic devices. _{The coating has improved conductivity (eg, smaller sheet resistance R s} or more given similar thickness and / or deposition costs, compared to the typical ITO coating used for touch panels. It may have low emissivity) and / or durability. In certain exemplary embodiments, the different electrodes on the touch panel may be formed by different layers of the same or different multilayer coatings. When patterning the electrodes, in certain exemplary embodiments, different laser scribe wavelengths can be used to pattern different layers of the same or different multilayer coatings (s). Different electrodes may be patterned from the same or different sides of the supporting glass substrate in different exemplary embodiments.

Capacitive touch panels often include an insulator such as glass and are coated with a conductive coating. Since the human body is also an electric conductor, touching the surface of the panel causes, for example, distortion of the electrostatic field of the panel that can be measured as a change in capacitance. The transparent touch panel can be combined with a display such as a liquid crystal display (LCD) or LED panel to form a touch screen. The projected capacitive (PROCAP) touch panel may optionally include an LCD or other display, with finger or other touch contact through a protective layer (s) in front of the conductive coating. Can be detected.

1 (a) to 1 (g) show an example of a projected capacitive touch panel of the related art, eg, US Pat. No. 8,138, the disclosure of which is incorporated herein by reference. , 425. Referring to FIG. 1A, a substrate 11, a row x-axis conductor 12, an insulator 13, a column y-axis conductor 14, and a conductive wiring 15 are provided. The substrate 11 may be a transparent material such as glass. The x-axis conductor 12 and the y-axis conductor 14 are typically transparent conductors, indium tin oxide (ITO). The insulator 13 may be an insulator material (for example, silicon nitride) that suppresses the conductivity between the x-axis conductor 12 and the y-axis conductor 14. The wiring 15 provides electrical conductivity between the plurality of conductors and a signal processor (not shown). The ITO used in the electrodes / wiring of small PROCAP touch panels typically has a sheet resistance of at least about 100 ohms / □, which has been found to be too high for certain applications. Moreover, conventional ITO coatings for touch panels are typically very crystalline, relatively thick and brittle, and therefore in applications involving bending, such ITO coatings are subject to failure. Become.

With reference to FIG. 1 (b), the x-axis conductor 12 (eg, ITO) is formed on the substrate 11. The ITO is coated in a continuous layer on the substrate 11 and then subjected to a first photolithography process to pattern the ITO on the x-axis conductor 12. FIG. 1 (c) shows a cross-sectional view taken along the line AA'of FIG. 1 (b) including the x-axis conductor 12 formed on the substrate 11. With reference to FIG. 1 (d), the insulator 13 is then formed on the x-axis channel of the x-axis conductor 12 on the substrate 11. FIG. 1E shows a cross-sectional view taken along the line BB'of FIG. 1D, including an insulator 13 formed on the substrate 11 and the x-axis conductor 12. In the insulator island 13 shown in FIGS. 1 (d) to 1 (e), a continuous layer of an insulating material (for example, silicon nitride) is deposited on the conductor 12 on the substrate 11, and then in the island 13. It is formed by subjecting the insulating material to a second photolithography, etching, or other patterning process to pattern the insulating material. Referring to FIG. 1 (f), the y-axis conductor 14 is then formed on the insulator island 13 and the x-axis conductor 12 on the substrate. The ITO for the y-axis conductor 14 is coated on 12, 13 on the substrate 11 and then subjected to a third photolithography or other patterning process to pattern the ITO into the y-axis conductor 14. To. Many y-axis conductor materials 14 are formed directly on the substrate 11, and y-axis channels are formed on the insulator 13 to reduce conductivity between the x-axis conductor 12 and the y-axis conductor 14. .. FIG. 1 (g) is a cross-sectional view taken along the line CC'of FIG. 1 (f), including a portion of the ITOy axis conductor 14 formed on the insulator island 13 on the exemplary ITOx axis conductor 12 on the substrate 11. Is. The manufacturing process for the structures shown in FIGS. 1 (a) to 1 (g) requires three separate separate deposition processes and three photolithography type processes, which results in a manufacturing process. It will be understood that it is complex, inefficient and expensive.

FIG. 1H shows another example of the intersection of the ITOx-axis conductor 12 and the ITOy-axis conductor 14 by the projection type capacitive touch panel of the related technology. With reference to FIG. 1 (h), the ITO layer can be formed on the substrate 11 and then patterned in the x-axis conductor 12 and the y-axis conductor 14 in the first photolithography process. An insulating layer is then formed on the substrate and patterned in the insulator island 13 by a second photolithography or etching process. The conductive layer is then formed on 12-14 on the substrate 11 and patterned in the conductive bridge 16 in a third photolithography process. The bridge 16 provides conductivity to the y-axis conductor 14 on the x-axis conductor 12. This manufacturing process also requires at least three vapor deposition processes and at least three different photolithography processes.

The projected capacitive touch panel shown in FIGS. 1 (a) to 1 (h) may be a mutual capacitive device or a self-capacitive device. Within the mutual capacitance device, capacitors are present at all intersections between the x-axis conductor 12 and the y-axis conductor 14 (or metal bridge 16). While the voltage on the y-axis conductor 14 is being measured, a voltage is applied to the x-axis conductor 12 (and / or vice versa). When the user brings a finger or a conductive stylus close to the surface of the device, the local electrostatic field changes and the mutual capacitance decreases. Changes in capacitance at every individual point on the grid can be measured to determine the exact touch position. In self-capacitating devices, the x-axis conductor 12 and the y-axis conductor 14 operate essentially independently. In self-capacitance, the capacitance load of a finger or the like is measured by an ammeter on each of the x-axis conductor 12 and the y-axis conductor 14.

As mentioned above, the transparent conductors 12 and 14 in the prior art touch panel are typically indium tin oxide (ITO), which is problematic for many reasons. First, ITO is expensive. Second, the thin film layer of ITO has a high sheet resistance R _s (typically at least about 100 ohms / □ at a given thickness), in other words, the conductivity of ITO is particularly good. No, its resistivity is high. In order to make the sheet resistance of the ITO layer much lower, the ITO layer needs to be very thick (eg, greater than 300 or 400 nm). However, such a thick ITO layer is very expensive and less transparent. Therefore, the high sheet resistance of the ITO thin film layer places emphasis on large panels and limits its use in layouts that require elongated wiring on the touch panel. Therefore, it will be understood in the art that there is a need for touch panel electrodes made of materials that are small in thickness, expensive, and do not suffer from the combination of ITO's drawbacks of low conductivity.

An exemplary embodiment of the invention relates to a multilayer conductive coating that is substantially transparent to visible light and is at least one conductive layer (eg, silver) sandwiched between at least a pair of dielectric layers. And / or including NiCr), and may be used as an electrode and / or a conductive wiring in a capacitive touch panel. In certain exemplary embodiments, the multilayer conductive coating may _{include a dielectric layer (s) of zirconium oxide (eg, ZrO 2} ) and / or silicon nitride, which may include showers, household appliances, and the like. It can be used for applications such as a capacitive touch panel for controlling vending machines, electronic devices, and / or electronic devices. _{The coating has improved conductivity (eg, smaller sheet resistance R s} or more given similar thickness and / or deposition costs, compared to the typical ITO coating used for touch panels. It may have a small emissivity). The coating may be used as an electrode layer and / or wiring in a capacitive touch panel such as a PROCAP touch panel or any other type of touch panel.

In certain exemplary embodiments, different electrodes on the touch panel may be formed by different silver-based layers of the same or different multilayer coatings. When patterning the electrodes, in certain exemplary embodiments, different laser scribe wavelengths may be used to pattern different silver-based layers of the same or different multilayer coatings (s). For example, when the first electrode and the second electrode of the touch panel overlap each other, the first laser scribing wavelength is used when patterning the first conductive layer on the first electrode (s). Also, a second laser scribing wavelength may be used when patterning the second conductive layer on the second electrode (s). For example, the transmitting electrode may be laser-patterned using a first wavelength and the receiving electrode may be laser-patterned using a different second wavelength. Advantageously, the use of different wavelengths reduces damage to electrodes that are not intended to be patterned in a given procedure.

In certain exemplary embodiments, if different electrodes of the touch panel can be formed by different conductive layers of the same or different multilayer coatings, the first set of electrodes will laser screen from the first side of the supporting glass substrate. On the other hand, the second set of electrodes may be patterned by laser scribing from the second side opposite to the supporting glass substrate. Therefore, since the electrodes are on the same side of the glass substrate, one of the two laser patterning procedures is performed through the supporting glass substrate. For example, the transmitting electrode may be laser-patterned from the first side of the supporting glass substrate, while the receiving electrode may be laser-patterned from the second side opposite the supporting glass substrate. Advantageously, this technique reduces damage to electrodes that are not intended to be patterned in a given laser patterning procedure. Embodiments that include laser patterning different electrodes from both sides of a support glass substrate may or may not be used in combination with embodiments that pattern different electrodes using different wavelengths.

In certain exemplary embodiments, the coating for at least one electrode of the touch panel is compared to the sterling silver layer of the particular coating to allow the silver-based coating to be more suitable for touch panel electrode applications. It may have increased resistance and therefore reduced conductivity. The increased resistance of the conductive layer (s) (eg, Ag-based and / or NiCr) in the coating, and thus the reduced conductivity, can be achieved by any of several techniques. For example, the increased resistance of the conductive layer in the coating, and thus the reduced conductivity (s), can be achieved by doping silver with an impurity such as one or more of Zn, Pt, Pd, Ti, or Al. , And / or by contacting and replacing crystalline zinc oxide directly under silver with another material, such as the use of suitable non-crystalline dielectrics, amorphous semiconductors, or metal alloys (eg, NiCr). May be achieved. Silver with increased resistance may be used for all electrodes and / or wiring in the touch panel (and / or NiCr may be used), or instead, electrodes and / or electrodes in the touch panel. Alternatively, it may be performed only on a part of the wiring.

In certain exemplary embodiments, the different electrodes of the touch panel may have different sheet resistances, and the silver-based structures of the various electrodes are different from each other in order to provide different resistances to the different electrodes. It may be. For example, the transmitting electrode may have a higher sheet resistance (ohm / □) than the receiving electrode in certain exemplary embodiments. Thus, for example, one, some, or all of the transmitting electrodes may have a NiCr layer and / or a silver layer having higher sheet resistance (and thus lower conductivity) compared to pure silver in certain types of coatings. It may be manufactured from a multilayer coating containing, and the higher sheet resistance of the silver-based layer is by doping silver with one or more impurities such as Zn, Pt, Pd, Ti, or Al and / or. To increase the resistance of silver, replace crystalline zinc oxide directly under silver with another material such as a suitable non-crystalline dielectric, amorphous semiconductor, or metal alloy (eg, NiCr). Achieved by doing. The difference in resistance between the transmitting and receiving electrodes is also due to the different thickness of the conductors of these electrodes, the silver doping of the transmitting electrodes, and / or on layers other than the crystalline zinc oxide-based layer. May be achieved by providing silver for the transmit electrode and in direct contact with the layer.

In an exemplary embodiment of the invention, a method of manufacturing a capacitive touch panel comprising a glass substrate is provided, wherein the patterned multilayer transparent conductive coating supported by the substrate is a multilayer transparent conductive coating. A first conductive layer (including, for example, silver and / or NiCr), a dielectric layer located at least between the substrate and the first conductive layer, and zirconium oxide positioned on at least the first conductive layer. , Silicon nitride, and a dielectric layer containing one or more of tin oxide, including a first set of electrodes and a second set of electrodes, the first and second sets of electrodes. The method comprises forming a first set of electrodes, wherein at least some of the electrodes include a multilayer transparent conductive coating, which is configured to allow the touch position to be determined. When laser patterning the first conductive layer at one wavelength and (i) at a second wavelength different from the first wavelength and / or (ii) when laser patterning the first conductive layer of the substrate. Includes forming a second set of electrodes by laser patterning with a laser beam from the side opposite to the laser beam used in. The patterned multilayer transparent conductive coating is a second conductive layer and another dielectric layer (eg, silicon nitride or bell oxide) positioned between at least the first conductive layer and the second conductive layer. The first set of electrodes and the second set of electrodes each contain a multilayer transparent conductive coating, and the second set is formed by laser patterning at a second wavelength different from the first wavelength. Forming the electrodes of the above may further include laser patterning the second conductive layer at the second wavelength. The first conductive layer may be the conductor of the first set of electrodes, and the second conductive layer may be the conductor of the second set of electrodes.

An example of the prior art projection type capacitive touch panel is shown. An example of the prior art projection type capacitive touch panel is shown. An example of the prior art projection type capacitive touch panel is shown. An example of the prior art projection type capacitive touch panel is shown. An example of the prior art projection type capacitive touch panel is shown. An example of the prior art projection type capacitive touch panel is shown. An example of the prior art projection type capacitive touch panel is shown. An example of the prior art projection type capacitive touch panel is shown. Projection according to an exemplary embodiment, which may include the coating of FIGS. 4, 6, 7, and / or 8 as the conductive electrode (s) and / or the conductive wiring (s). The plan layout of the top or bottom of the type capacitive touch panel is shown. FIG. 2A, FIG. 9, FIG. 9, and / or a schematic diagram of the circuit of the projection type capacitive touch panel of FIG. 10 are shown. According to another exemplary embodiment, the conductive electrode (s) and / or the conductive wiring (s) may include the coatings of FIGS. 4, 6, 7, and / or 8. A planar layout of the top or bottom of a projected capacitive touch panel is shown. According to another exemplary embodiment, the conductive electrode (s) and / or the conductive wiring (s) may include the coatings of FIGS. 4, 6, 7, and / or 8. A planar layout of the top or bottom of the projected capacitive touch panel electrode arrangement is shown. According to another exemplary embodiment, the conductive electrode (s) and / or the conductive wiring (s) may include the coatings of FIGS. 4, 6, 7, and / or 8. A planar layout of the top or bottom of the projected capacitive touch panel electrode arrangement is shown. FIG. 5 is a partial perspective view of a capacitive touch panel electrode arrangement according to an exemplary embodiment of the present invention, wherein the transmitting electrode has a higher resistance than the receiving electrode has. FIG. 5 is a partial perspective view of a capacitive touch panel electrode arrangement according to an exemplary embodiment of the present invention, wherein the transmitting electrode has a higher resistance than the receiving electrode has. It is a top view of a part of the capacitive touch panel electrode arrangement according to the embodiment of the present invention, in which the transmitting electrode and the receiving electrode overlap each other and are substantially orthogonal to each other on different planes. It is sectional drawing which follows the cross-sectional line AA' of the capacitance type touch panel electrode arrangement of FIG. 3 (f). Various for use in the touch panels of FIGS. 2, 3, 7, 8, 9, 10, 10, 11, 12, 13, and / or 14 according to an exemplary embodiment of the invention. It is sectional drawing of the silver-containing transparent conductive coating. Various for use in the touch panels of FIGS. 2, 3, 7, 8, 9, 10, 10, 11, 12, 13, and / or 14 according to an exemplary embodiment of the invention. It is sectional drawing of the silver-containing transparent conductive coating. Various for use in the touch panels of FIGS. 2, 3, 7, 8, 9, 10, 10, 11, 12, 13, and / or 14 according to an exemplary embodiment of the invention. It is sectional drawing of the silver-containing transparent conductive coating. Various for use in the touch panels of FIGS. 2, 3, 7, 8, 9, 10, 10, 11, 12, 13, and / or 14 according to an exemplary embodiment of the invention. It is sectional drawing of the silver-containing transparent conductive coating. Various for use in the touch panels of FIGS. 2, 3, 7, 8, 9, 10, 10, 11, 12, 13, and / or 14 according to an exemplary embodiment of the invention. It is sectional drawing of the silver-containing transparent conductive coating. Various for use in the touch panels of FIGS. 2, 3, 7, 8, 9, 10, 10, 11, 12, 13, and / or 14 according to an exemplary embodiment of the invention. It is sectional drawing of the silver-containing transparent conductive coating. Various for use in the touch panels of FIGS. 2, 3, 7, 8, 9, 10, 10, 11, 12, 13, and / or 14 according to an exemplary embodiment of the invention. It is sectional drawing of the silver-containing transparent conductive coating. Various for use in the touch panels of FIGS. 2, 3, 7, 8, 9, 10, 10, 11, 12, 13, and / or 14 according to an exemplary embodiment of the invention. It is sectional drawing of the silver-containing transparent conductive coating. The visible transmittance (TR) (%) and the glass side visible reflectance (BRA) (%) of the comparative example (CE) coating on the glass substrate are the same as those of the glass substrate alone (Glass-TR, Glass-BRA). It is a visible transmittance (%) / reflectance pair (%) wavelength (nm) graph which shows in comparison with these values. Visible transmittance (%) / reflectance (%) indicating the visible transmittance (TR) and the glass-side visible reflectance (BRA) of the illustrated coating of FIG. 4 (a) according to the exemplary embodiment of the present invention on a glass substrate. ) Graph against wavelength (nm), demonstrating that it is transparent to visible light and has a glass-side visible reflectance that more closely matches the visible reflectance of the glass substrate compared to the CE of FIG. doing. Similar to FIG. 5, the visible transmittance (Glass-TR) and the visible reflectance (Glass-BRA) of the glass substrate alone without coating on the glass substrate are also shown. Touch panel according to any of FIGS. 2 to 4, 6, 8 to 10 coupled to a liquid crystal panel for use in electronic devices such as mobile phones, mobile pads, computers, and / or such. It is sectional drawing of the touch panel assembly by the Example Embodiment of this invention including. Visible transmittance (%) indicating the visible transmittance (CGN-TR or TR) and the glass-side visible reflectance (CGN-BRA or BRA) of the illustrated coating of FIG. 4 (b) according to another exemplary embodiment of the present invention. ) / Reflectance (%) vs. wavelength (nm) graph, transparent to visible light, and has a glass-side visible reflectance that more closely matches the reflectance of the glass substrate alone compared to CE. It is demonstrating that. The visible transmittance (Glass-TR) and the visible reflectance (Glass-BRA) of only the glass substrate without coating are also shown. Visible transmittance (%) indicating the visible transmittance (CGN-TR or TR) and the glass-side visible reflectance (CGN-BRA or BRA) of the illustrated coating of FIG. 4 (c) according to another exemplary embodiment of the present invention. ) / Reflectance (%) vs. wavelength (nm) graph, transparent to visible light, and having a glass-side visible reflectance that more closely matches the reflectance of the substrate compared to CE. It is demonstrating. Low resolution capacitance according to another exemplary embodiment, wherein the coatings (s) of FIGS. 4, 6, 7, and 8 can be included as conductive electrodes (s) and / or conductive wiring (s). The plan layout of the upper surface or the lower surface of the capacitive touch panel is shown. Low resolution capacitance according to another exemplary embodiment, wherein the substrate supporting the coating of the invention of FIG. 9 can be laminated onto another substrate (eg, glass) via a polymer containing an intermediate layer such as PVB or EVA. It is sectional drawing of the type touch panel. FIG. 2 is a flow chart of a process for manufacturing a transparent conductive coating pattern according to any one of FIGS. 2, 3, 4, 7, 8, 9, or 10 according to an exemplary embodiment of the present invention. is there. A process for producing a transparent conductive coating pattern according to any of FIGS. 2, 3, 4, 7, 8, 9, or 10 according to another exemplary embodiment of the invention. It is a flow chart of. A process for producing a transparent conductive coating pattern according to any of FIGS. 2, 3, 4, 7, 8, 9, or 10 according to another exemplary embodiment of the invention. It is a flow chart. A process for producing a transparent conductive coating pattern according to any of FIGS. 2, 3, 4, 7, 8, 9, or 10 according to another exemplary embodiment of the invention. It is a flow chart. FIG. 5 is a cross-sectional view of wavelength (nm) vs. absorption (%) showing that different silver-based layers in a multilayer coating have different absorption properties based on wavelength. FIG. 2 is a cross-sectional view of a capacitive touch panel according to an exemplary embodiment of the present invention, which is transparent according to any one of FIGS. 2, 3, 3, 4, 7, 8, 9, or 10 on surface # 2. Includes a conductive coating pattern and an additional functional film provided on a surface adapted for user touch. FIG. 2 is a cross-sectional view of a capacitive touch panel according to another exemplary embodiment of the present invention, which is any one of FIGS. 2, 3, 3, 4, 7, 8, 9, or 10 on surface # 3. Includes a transparent conductive coating pattern by, and an additional functional film provided on a surface adapted for user touch. FIG. 2 is a cross-sectional view of a monolithic capacitive touch panel according to another exemplary embodiment of the present invention, according to any of FIGS. 2, 3, 4, 7, 8, 9, or 10 on surface # 2. Includes a transparent conductive coating pattern and an additional functional film provided on a surface adapted for user touch.

A detailed description of the exemplary embodiment is provided with reference to the accompanying drawings. Similar reference numbers throughout the drawing indicate similar parts.

An exemplary embodiment of the invention relates to a multilayer conductive coating 41 that is substantially transparent to visible light and includes at least silver 46 sandwiched between at least a pair of layers, such as a dielectric layer. It may include one conductive layer and be used as an electrode and / or a conductive wiring in a capacitive touch panel. Examples of the multilayer transparent conductive coating 41 are shown in FIGS. 4 (a) to 4 (h). The multilayer conductive coating 41 includes a shower (for example, a water opening / closing control unit, a water temperature control unit, and / or a steam control unit), a home appliance, a vending machine, a music control unit, a thermostat control unit, an electronic device, and the like. / Or can be used for applications such as a capacitive touch panel for controlling an electronic device. The zirconium oxide and / or DLC layers described herein provide scratch resistance as well as resistance to dirt and cleaning chemicals in applications such as shower door / wall touch panel applications. In certain exemplary embodiments, the coating comprises a silver layer (s) 46, resulting in the visible reflectance of the coating on the substrate exactly matching that of the underlying substrate in areas where the coating is absent. And / or conductive wiring (s) so as to provide electrodes (s) that are transparent to visible light but not very visible. May be used as. _{The coating 41 has improved conductivity (eg, smaller sheet resistance R s} or given given similar thickness and / or deposition costs) as compared to the typical ITO coating used for touch panels. It may have a smaller emissivity). The coating may be used as an electrode layer and / or wiring in a capacitive touch panel such as a PROCAP touch panel or any other type of touch panel. The touch panel described herein, including the electrodes and wiring of the multilayer coating 41, preferably has a visible transmittance (Ill.A) of at least 50%, more preferably at least 60%, and most preferably at least 70%. , 2deg.Obs.).

In certain exemplary embodiments, the coating 41 for at least one electrode in the touch panel is with a sterling silver layer of the particular coating to allow the silver-based coating to be more suitable for the particular touch panel electrode application. In comparison, it may have increased resistivity and thus reduced conductivity. The increased sheet resistance and reduced conductivity of the silver layer (s) 46 in the coating 41 can be achieved by any of several techniques. For example, the increased sheet resistance and decreased conductivity of the silver layer (s) 46 in the coating can be achieved by doping silver with one or more impurities such as Zn, Pt, Pd, Ti, or Al. Can be achieved. For example, the silver layer 46 according to any one of FIGS. 4 (a) to 4 (h) is about 0.05 to 3. One or more of Zn, Pt, Pd, Ti, Al, or a combination thereof. It may be doped with 0%, more preferably about 0.1-2.0%, most preferably about 0.1-0.5% (% by weight). The increased sheet resistance of the silver layer (s) 46, and the reduced conductivity, also to increase the resistance of silver, place crystalline zinc oxide 44 directly under silver and silver as a suitable non-crystalline dielectric. , Amorphous semiconductors, or by contacting and substituting with another material such as a metal alloy (eg, NiCr, NiCrMo, etc.) (eg, under silver in FIG. 4 (f)). See NiCr-based layer). The increased sheet resistance and decreased conductivity of the silver-based layer (s) 46 are suitable, for example, to (a) dope silver and / or (b) crystalline zinc oxide 44 directly under silver. It can be achieved by one or both of substitutions with non-crystalline dielectrics, amorphous semiconductors, or metallic alloys. Silver with increased sheet resistance may be used for all electrodes and / or wiring in the touch panel, or may instead be used for only a portion of the electrodes and / or wiring in the touch panel.

In certain exemplary embodiments, the different electrodes 41 of the touch panel may be designed to have different sheet resistances, as each silver-based structure of the various electrodes provides different sheet resistances to the different electrodes. In addition, they may be different from each other. For example, in certain exemplary embodiments, the transmitting electrode (T) may have higher sheet resistance than the receiving electrode (R). Thus, for example, one, some, or all of the transmitting electrodes (T) in any embodiment herein have higher sheet resistance (and thus lower conductivity) compared to pure silver in certain types of coatings. It may be produced from a multilayer coating 41 containing a silver layer 46 having a property), and the higher sheet resistance of the silver-based layer 46 is one or more of Zn, Pt, Pd, Ti, Al, etc. By doping with impurities and / or in order to increase the sheet resistance of the silver-based layer, crystalline zinc oxide is placed directly under silver, such as suitable non-crystalline dielectrics, amorphous semiconductors, or metal alloys. This is achieved by contacting and substituting another material (eg, NiCr). The receiving electrode is not doped with a silver-based receiving electrode and / or the silver-based receiving electrode can be doped with zinc oxide 44 (optionally about 1-10%, more preferably about 1-5% aluminum). It may be designed to have a lower sheet resistance than the transmitting electrode, such as by providing it on a crystalline or substantially crystalline layer containing or containing it and in contact with the layer.

In a particular exemplary embodiment of the invention, a capacitive touch panel comprising a glass substrate 40 and a multilayer transparent conductive coating 41 supported by the glass substrate 40 is provided. The multilayer transparent conductive coating 41 comprises at least one conductive layer containing silver 46, a layer 44 below the conductive layer containing silver 46, and silicon nitride 50 and tin oxide 49 above the conductive layer containing silver 46. , Titanium oxide 48, NiCrO _x 47, and / or a dielectric layer containing one or more of zirconium oxide 75, a plurality of electrodes, and a plurality of conductive wirings, where the touch panel. The electrodes and / or conductive wiring are manufactured from a multilayer transparent conductive coating 41. A processor (including a processing circuit) may be provided to detect the touch position on the touch panel, and the electrodes and conductive wiring are substantially formed in a common plane substantially parallel to the glass substrate 40. The plurality of electrodes may be electrically connected to the processor by conductive wiring. The glass substrate may be heat treated (eg, heat tempered). In the case of one or more electrodes (s) and / or wirings (s), the increased resistance and decreased conductivity of silver in coating 41 as compared to pure silver in a particular coating may be, for example, (A) Dope the conductive silver layer 46 with an impurity such as Zn, Pt, Pd, Ti, Al, or one or more of these combinations, and / or (b) directly under the conductive silver 46. Crystalline zinc oxide of suitable non-crystalline dielectrics [eg, silicon oxide (eg, SiO ₂ ), silicon nitride, silicon nitride (eg, Si ₃ N ₄ ), titanium oxide (eg, TiO ₂ ), Alternatively, it can be achieved by one or both of substitutions with], amorphous semiconductors (eg, a-Si), or metal alloys (eg, NiCr, or NiCrMo, etc.).

The multilayer transparent conductive coating 41 (and thus the silver-based layer 46 in a particular exemplary embodiment) is about 40 ohms / □ or less, more preferably about 20 ohms / □ or less, more preferably about 15 ohms / □. Hereinafter, most preferably, it may have _{a sheet resistance (R s} ) of about 10 ohms / □ or less. The multilayer transparent conductive coating 41, and thus the silver-based layer 46, has a resistivity of 30 × 10 ^{-7 to} 90 × 10 ^-7 Ωcm, more preferably 40 × 10 ^-7 to 80 × 10 ^-7 Ωcm (ohm cm). May have.

2 (a) shows the conductive electrodes (s) x, y and / or the conductive wirings (s) 22 as the multilayer transparent conductive coating of FIGS. 4, 6, 7, and / or 8. A plan layout of the top or bottom of a projected capacitive touch panel according to an exemplary embodiment, which may include 41, is shown. With reference to FIG. 2A, the touch panel 20 is provided. The touch panel 20 includes a matrix of electrodes x, y that includes n columns and m rows, which is provided on a substrate 40, such as a glass substrate. The glass substrate may also include an antireflective (AR) layer in certain exemplary embodiments. The matrix of column electrodes / row electrodes x and y is on the substrate side opposite to the side that a person (s) touch using a touch panel in order to prevent corrosion of the silver coating 41 due to the touch of a human finger. It may be provided on (eg, glass substrate 40). In other words, when the touch panel is touched with a finger or a stylus, the glass substrate 40 is typically between (a) a finger and (b) a matrix of row and column electrodes x and y and the conductive wiring 22. It is positioned in. However, in certain embodiments, the matrix and wiring of row / column electrodes x, y may provide a touch panel, such as in shower door applications and / or in glass wall applications, where only one glass substrate is provided, for example. It may be provided on the side of the substrate (eg, glass substrate 40) that is touched by the user (s). The change in capacitance between the adjacent row and column electrodes in the matrix due to the approach of a finger or the like is detected by an electronic circuit, and therefore the connected circuit detects the position where the panel is touched by a finger or the like. can do. For example, referring to FIG. 2A, row 0 includes row electrodes x _0,0 , x _1,0 , x _{2, 0,} etc. to _{x n, 0} , and columns 0, 1, and 2, respectively. Includes _{~ y n} such as y ₀ , y ₁ , y _2. Optionally, the x-electrodes in the row direction may also be grouped for row detection. The number of row and column electrodes is determined by the size and resolution of the touch panel. In this example, the upper right row electrode is x _{n, m} . Each row electrode x _{0,0 to x n, m} of the touch panel 20 is electrically connected to the interconnection region 21 and the corresponding processing circuit / software by the conductive wiring 22. The row electrodes y _{0 to y n} are also electrically connected to the interconnection zone 21 and the corresponding processing circuit / software either directly or by conductive wiring. The conductive wiring 22 is preferably made of the same transparent conductive material as the row electrode and the column electrode (for example, at least the _{same material as the row electrode x0,0} , _x1,0 , _x2,0 ) (multilayer conductive transparent). It is formed by coating 41). Thus, in certain exemplary embodiments, the matrix of row and column electrodes x, y and the corresponding wiring 22 sputter the coating 41 (eg, the coating 41) by forming a coating 41 on a substrate (eg, a glass substrate) 40. By vapor deposition), a one-time (or up to two) photolithography and / or other patterning process is performed to pattern the coating 41 onto the conductive electrodes x, y and / or the conductive wiring 22. This can be formed on a substrate (eg, a glass substrate) 40. In certain exemplary embodiments, a silver-containing coating (see, eg, exemplary coating 41 in FIGS. 4A-4h) is sputter-deposited onto a glass substrate 40, followed by photolithography and /. or subjected to laser patterning, the silver-containing coating 41 wiring 22, the row electrodes _{x 0,0, x 1,0, x 2,0} , x 0,1, x 0,2, etc. x _{0, 3} ~x _{n ,} M and row electrodes y _{0 to y n} are patterned. Since the row electrodes x _{0,0 to x n, m} , the column electrodes y _{0 to y n} , and the wiring 22 do not overlap when viewed from above / below, the row electrodes x _{0,0 to x n, m} , The row electrodes y _{0 to y n} and the wiring 22 may be formed on the same plane parallel (or substantially parallel) to the glass substrate 40 on which the electrodes and wiring are formed. In certain embodiments, no insulating layer is required between the electrode x and the electrode y. A significant portion of the wiring 22 may also be parallel (or substantially parallel) to the column electrodes in a plane parallel (or substantially parallel) to the substrate 40. Therefore, the touch panel 20 can be formed by a smaller number of photolithography or laser patterning processes to achieve wiring with sufficient transparency and conductivity, thereby reducing manufacturing costs, display assemblies and the like. A more efficient touch panel for use can be obtained.

FIG. 2B shows a schematic diagram of the circuit of the touch panel 20 shown in FIG. 2A according to an exemplary embodiment. In the touch panel 20, there is a capacitance between each row electrode and the adjacent column electrode (for example, between the row electrode x _0,0 and the column electrode y _0). This capacitance can be measured by applying a voltage to the column electrode (for example, the column electrode y ₀ ) and measuring the voltage of the adjacent row electrode (for example, the row electrode x _0,0). When the user brings a finger or a conductive stylus close to the touch panel 20, the local electrostatic field changes and the mutual capacitance decreases. Therefore, one can be regarded as the _{transmitting electrode y 0} and the other as the receiving electrode x _0,0. The change in capacitance at individual points on the surface can be measured by sequentially measuring each pair of row and column electrodes. The wiring 22 of each row electrode in the same row (for example, the wiring 22 of row electrodes x ₀ , 0, x ₁ , 0, x _{2, 0,} etc. to _{x n, 0} in row 0) is shown in FIG. 2 (b). They may be electrically connected to each other. The interconnection of the first row segment with each other, the interconnection of the second row segment with each other, etc. can be manufactured on a flexible circuit (s) mounted around the touch panel in the interconnection area. It can be done and does not require a crossover to the glass substrate 40. In that case, the voltage in each row is measured in sequence before repeating the process of applying voltage to the column electrodes and applying voltage to another column. Alternatively, each wire 22 may be connected to the signal processor 25 and the voltage of each wire 22 may be measured individually. The same capacitance can be measured by applying a voltage to the row electrodes, measuring the voltage of the adjacent column electrodes without applying a voltage to the column electrodes, and measuring the voltage of the adjacent row electrodes. it can. Signal processing (eg, applying and measuring voltage, measuring capacitance between adjacent electrodes, measuring changes in capacitance over time, outputting a signal corresponding to user input) is performed by the signal processor 25. You may. The signal processor 25 may be one or more hardware processors, may include volatile or non-volatile memory, and may include computer-readable instructions for performing signal processing. The signal processor 25 is _{electrically connected to the column electrodes y 0 to y n} and electrically connected to the row electrodes x _{0, 0 to x n, m} through the wiring 22. The signal processor 25 is _{positioned on the same plane as the row electrodes x 0,0 to x n, m} , the column electrodes y _{0 to y n} , and the wiring 22 (for example, in the interconnection region 21 of FIG. 2A). It does not have to be positioned.

3 (a) shows FIGS. 4 (a) to 4 (h), 6 in which the conductive electrodes (s) x, y and / or the conductive wiring (s) 22 are patterned. , And / or a planar layout of the top or bottom of a projected capacitive touch panel according to another exemplary embodiment, including the coating 41 of FIG. Referring to FIG. 3A, the touch panel 30 is the touch panel 30 except that the touch panel 30 is divided into an upper portion 31 and a lower portion 32, each containing a matrix of electrodes x, y including n columns and m rows. , Similar to the touch panel 20 of FIG. 2 (a). For example, row 0 of the upper portion 31 includes row electrodes x _0,0 , x _1,0 , x _{2, 0,} etc. ~ _{x n, 0} . The upper portion 31 also includes column electrodes y ₀ , y ₁ , y _2, etc. ~ _{y n} . Similarly, the lower portion 32 also row electrodes, and the column electrodes y ₀ ~y _n electrically be separated column electrodes y of the upper part 31 ₀ ~y _n will also be included. Therefore, the lower portion 32 also includes a matrix of row electrodes and n-column electrodes including n-columns and m-rows. The lower portion 32 may have more or fewer rows than the upper portion 31 in different exemplary embodiments. The number of row electrodes and column electrodes of the touch panel 30 is determined by the size and resolution of the touch panel. Each column electrode of the upper portion 31 is electrically connected to the interconnection region 21, and each row electrode of the upper portion 31 is electrically connected to the interconnection region 21 by wiring 22. Similar to the embodiment of FIG. 2, the wiring may or may not be used to connect the row electrodes of the upper portion 31 to the interconnection zone. Each column electrode of the lower portion 32 is electrically connected to the interconnection region 21', and each row electrode of the lower portion 32 is electrically connected to the interconnection region 21'by wiring 22. Further, the wiring may or may not be used to connect the row electrodes of the lower portion 32 to the interconnection region 2. Continuing with reference to FIG. 3A, the touch panel 30 applies a voltage to the column electrodes to measure the voltage of the adjacent row electrodes (or, instead, applies a voltage to the row electrodes to the adjacent columns. It is similar to the touch panel 20 in that there is a capacitance between each row electrode and the adjacent column electrode that can be measured (by measuring the voltage of the electrodes). When the user brings a finger or a conductive stylus close to the touch panel 30, the local electrostatic field changes and the mutual capacitance decreases. The change in capacitance at individual points on the surface can be measured by sequentially measuring the mutual capacitance of each pair of row and column electrodes.

3 (b) and 3 (c) are patterned to form conductive electrodes (s) x, y and / or conductive wiring (s) 22. FIGS. 4 (a) -4. FIG. 6 shows a planar layout of an upper or lower portion of a projected capacitive touch panel according to a further exemplary embodiment, including the coating 41 of any of FIGS. 6, 7, and / or 8. An exemplary electrode configuration of a PROCAP sensor utilizes a single transparent conductive coating 41 patterned in the form of parallel electrode stripes, as shown in any of FIG. 3 (b) of FIG. 3 (c). May be good. In FIG. 3 (b), the electrode stripes are fairly linear, but in FIG. 3 (c), one or more of the electrode stripes may have a zigzag shape. These electrode stripes correspond to alternating receiving electrodes (R) and transmitting electrodes (T) connected to the driver. The driver charges the transmitting / transmitting electrode (T) with alternating current. The position of the receiving / receiving electrode (R) allows the detection of the X coordinate with a touch from the finger, while the output voltage from the transmitting electrode (T) allows the detection of the Y coordinate, and thus simply. Allows position identification of one touch or multiple touches. A set of receiving electrodes (R) is made of a low sheet resistance (R _{s ) material such as silver (eg, lower R s} than ITO of similar thickness) and is along each electrode. It is desirable that the voltage drop be minimized / reduced. At the same time, the transmitting electrode (T) has a higher sheet resistance compared to sterling silver of a particular coating so that there is a substantial voltage gradient along each transmitting electrode to increase the noise-to-noise ratio. It is desirable to have (reduced conductivity). Therefore, there is competing interest in the sheet resistance of the two sets of electrodes, i.e. the receiving electrode (R) and the transmitting electrode (T). For the receiving and transmitting electrodes, a silver-based layer 46 in the coating 41 as an alternative to the commonly used indium-tin-oxide (ITO) is desirable for more conductive electrode materials. The silver layer 46 may be sandwiched between at least two dielectric layers and due to better crystal orientation, a lower layer (eg, crystalline oxidation that can be doped with Al) to obtain higher silver conductivity. Zinc 44) may be used. In this case, the low sheet resistance of silver allows for large forms of touch screens, but may be too low for effective use of the transmitting electrodes. To address this discrepancy, one of the transmitting electrode (s) architectures uses a zigzag pattern as shown in FIG. 3 (c) to reduce the width of each electrode while reducing its width. The effective length can be increased and therefore its sheet resistance can be increased. However, such a reduction in width is prone to defects such as scratches, microparticles, macro inclusions and the like. Thus, in a particular exemplary embodiment of the invention, the embodiment reduces the conductivity of the silver layer 46 to form sufficient conductivity in the receiving electrode and at the same time sufficient for the effective use of the transmitting electrode. Provides good resistance. Therefore, in certain exemplary embodiments, the same silver structure may be used for both the transmit and receive electrodes (s) 46. The sheet resistance of the silver layer 46 can be increased by one of the following methods or a combination thereof: (a) The conductive silver layer 46 is made of Zn, Pt, Pd, Ti, Al, Alternatively, doping with an impurity such as one or more of these combinations and / or (b) crystalline zinc oxide underneath conductive silver 46, a suitable non-crystalline dielectric [eg, silicon oxide (eg, silicon oxide (eg, silicon oxide). For example, SiO ₂ ), silicon nitride, silicon nitride (eg Si ₃ N ₄ ), titanium oxide (eg TiO ₂ ), or zinc nitrate], amorphous semiconductors (eg a-Si), or metals. Substitution with an alloy (eg, NiCr, NiCrMo, etc.)]. A dope with some impurities can make the silver layer 46 more resistant to oxidation and / or environmental degradation.

Since the row electrodes and column electrodes x and y shown in FIGS. 3 (a) to 3 (c) do not overlap in a specific exemplary embodiment, the row electrodes and column electrodes are related to FIG. It may (or may not be) formed on the same plane by the patterned transparent conductive coating 41 by the method described above. Therefore, the electrode structures x and y of the touch panel 30 according to any one of FIGS. 3A to 3C may be essentially thin, and may be one process (for example, one photolithography process or one It may be patterned by a laser patterning process), which reduces the production cost of the projected capacitive touch panel.

However, in certain exemplary embodiments, the receiving electrode may use a different silver structure as compared to that used for the transmitting electrode of the touch panel. This is applicable to any embodiment of the specification. As described herein, for example, with reference to FIGS. 3 (b) to 3 (g), a set of receiving electrodes (R) has a low sheet resistivity (R _s ) such as silver, and are manufactured from a material having a low resistivity (e.g. similar lower than the thickness of the ITO R _s and low resistivity), as a result, the voltage drop along each electrode minimized becomes / is reduced, at the same time, Since it is desirable that the transmitting electrode (T) have a higher sheet resistance and a higher resistivity (reduced conductivity) as compared to the sterling silver of a particular coating, in order to increase the noise-to-signal ratio, There is a substantial voltage gradient along each transmit electrode (T). Therefore, there is competing interest in the sheet resistance of the two sets of electrodes, namely the electrode (R) and the transmitting electrode (T). Therefore, in certain exemplary embodiments, the different electrodes 41 of the touch panel may be designed to have different sheet resistances.

For example, referring to any of FIGS. 3 (b) to 3 (g), for example, in a particular exemplary embodiment, the transmitting electrode (T) has a higher sheet resistance than the receiving electrode (R). You may. For example, the transmitting electrode (T) may have a sheet resistance of about 15-50 ohms / □, more preferably about 20-50 ohms / □, most preferably about 20-40 ohms / □. Further, the receiving electrode (R) may have a sheet resistance of about 1 to 14 ohms / □, more preferably about 2 to 12 ohms / □, and most preferably about 2 to 10 ohms / □. In certain exemplary embodiments, the transmitting electrode (T) is at least 1 ohm / □ or more, more preferably at least 5 ohms / □ (more preferably at least 10,) than the sheet resistance of the receiving electrode (R). 15 or 20 ohms / □) may have high sheet resistance. It can also be applied to any other embodiment herein, and to some or all transmit and receive electrodes. For example, one, some, or all of the transmitting electrodes (T) in any embodiment of the specification have higher sheet resistance (and thus lower conductivity) compared to pure silver in certain types of coatings. It may be manufactured from a multilayer coating 41 containing a silver layer 46 having a silver layer 46, and the higher sheet resistance of the silver-based layer 46 of the transmitting electrode (T) is such that silver has Zn, Pt, Pd, Ti, or Al. Suitable non-crystalline dielectrics, amorphous semiconductors, with crystalline zinc oxide beneath silver, by doping with one or more impurities and / or to increase the resistance of silver as described above. , Or by contacting and substituting another material such as a metal alloy (eg, NiCr). The receiving electrode (R) does not dope the silver-based layer 46 of the coating 41 of the receiving electrode, and / or the silver-based layer 46 is made of zinc oxide 44 (optionally about 1 to 10%, more preferably about 1 to 1). Designed to have lower sheet resistance than the transmit electrode, such as by providing it on a crystalline or substantially crystalline layer containing (which can be doped with 5% aluminum) and in contact with the layer. May be done.

In other exemplary embodiments, different resistances of the transmitting electrode (T) and the receiving electrode (R) may be achieved, in order to adjust the respective sheet resistance of each electrode based on the thickness. The silver-based conductive layer 46 of each electrode may have a different thickness (with the same or different structure / material). The different thicknesses of the silver-based layers 46 of the different electrodes (T) and (R) may be used in combination with other techniques such as doping and conditioning of the layer directly beneath silver as described herein ( However, it is not necessary).

FIG. 3D shows an exemplary embodiment in which the transmitting electrode (T) and the receiving electrode (R) having different sheet resistances are parallel to each other and overlap each other. Therefore, the (T) and (R) electrodes are on different planes in the embodiment of FIG. 3 (d). In the embodiment of FIG. 3D, the (T) and (R) electrodes may be formed using different multilayer coatings 41, or alternative, two different silver-based layers with different resistances. A single multilayer coating 41 having 46 may be used to form overlapping (T) and (R) electrodes. In an embodiment in which the (T) and (R) electrodes are formed using a single multilayer coating 41 having two different silver-based layers 46, the double-silver multilayer coating is, for example, two silver-based. It may be formed by repeating the layer lamination of any one of FIGS. 4 (a) to 4 (h) on the illustrated coating so as to provide a coating containing the layer 46. For example, referring to FIG. 4A, the double silver coating 41 is a glass substrate 40: 40/43/44/46/47/48/49/50/43/44/46/47/48/49 / It may be manufactured from the following layers that move outward from 50. Referring to FIG. 4 (f), the double silver coating 41 is oriented away from the glass substrate 40: 40/61/101/46/47/50/61/101/46/47/50, as another example. It may be formed of the following moving layers. In each of the double silver coatings of these examples, the bottom conductive silver layer 46 may be used for one of the electrodes (transmission or reception) and the top silver layer 46 is the other of the electrodes. It may be used in, which is particularly useful in embodiments such as FIG. 3 (d), where the T and R electrodes are parallel to each other and overlap each other and are directly above each other.

FIG. 3 (e) shows an exemplary embodiment in which the transmitting electrode (T) and the receiving electrode (R) having different sheet resistances are parallel to each other and do not overlap each other. Therefore, the (T) electrode and the (R) electrode may be in the same plane or on different planes in the embodiment of FIG. 3 (d). In the embodiment of FIG. 3 (e), since the transmitting electrode and the receiving electrode do not overlap each other, the (T) electrode and the (R) electrode may be formed by using different multilayer coatings 41. For example, in FIGS. 3 (d) to 3 (e), in certain exemplary embodiments, the transmit and receive electrodes may generally have the same shape and are formed through the same or different patterning processes. You may. In FIGS. 3 (d) to 3 (e), the transmitting electrode and the receiving electrode are parallel or substantially parallel to each other, but in another exemplary embodiment, the transmitting electrode and the receiving electrode of the touch panel are perpendicular to each other. Yes, and may overlap each other.

FIG. 3 (f) is a top view of a part of the capacitive touch panel electrode arrangement according to the exemplary embodiment of the present invention, in which the transmitting electrode (T) and the receiving electrode (R) overlap each other and are on different planes. Are substantially orthogonal to each other. FIG. 3 (g) is a cross-sectional view of the capacitance type touch panel electrode arrangement along the cross-sectional line aa'of FIG. 3 (f), in which the transmitting electrode and the receiving electrode overlap each other and are on different planes. They are substantially orthogonal to each other. The supporting glass substrate 40 that supports the electrodes is not shown in FIGS. 3 (f) to 3 (g) for simplicity.

Referring to FIGS. 3 (f) to 3 (g), for example, the transmitting electrode (T) and the receiving electrode (R) are different silver-based layers of the same multilayer coating 41 in a specific exemplary embodiment of the present invention. It may be formed from 46 (see, for example, the double silver coated laminate described herein in connection with any of FIGS. 4 (h) or 4 (a) to 4 (g)). .. For example, the transmission electrode (T) of FIGS. 3 (f) to 3 (g) may be formed between the support glass substrate 40 and the reception electrode (R) on the support glass substrate 40, and the transmission electrode (T) may be formed. The conductor of FIG. 4 (h) may be formed using the lower silver-based layer 46 in the double silver coating of FIG. 4 (h), while the conductor of the receiving electrode (R) above it is of FIG. 4 (h). ) May be formed using the upper silver-based layer 46 in the double silver coating. The double silver coating of FIG. 4 (h) is used for exemplary purposes, and other double silver coatings are used for this purpose, whether or not disclosed herein. You may. Therefore, in such an embodiment, the transmitting electrode (T) and the receiving electrode (R) may be formed from different silver-based layers 46 of the same multilayer coating 41. In such an exemplary embodiment, the transmitting electrode (T) and the receiving electrode (R) are patterned in different processes so that they are patterned into different forms, for example, in FIG. 3 (f), the transmitting electrode (T). Is patterned on the column electrodes extending in the y direction, while the receiving electrode (R) is patterned on the row electrodes extending in the x direction. For example, the transmitting electrode (T) may be patterned into a row electrode extending in the y direction by laser scribing / ablation in the first patterning process, and the receiving electrode (R) may be laser scribing in the second patterning process. It may be patterned on the row electrode extending in the x direction by / ablation. Laser scribes are used, for example, to cut at least the desired silver-based layer (s) during patterning.

Mutual capacitance sensors, such as those described herein, use the principle of applying alternating current to at least some electrodes and interpreting changes in their capacitance as touch. It is described herein that thin silver (Ag) is used as a substitute for ITO because at least silver has excellent conductivity and high visible light transmittance as compared to ITO. However, silver is more vulnerable to damage than ITO when exposed to certain chemicals. Therefore, it may be desirable to use laser patterning techniques to pattern silver, as opposed to traditional photolithography. In a specific exemplary embodiment as shown in FIGS. 3 (f) to 3 (g), the transmitting electrode (T) and the receiving electrode (R) of the silver-based mutual capacitance touch sensor are respectively. It would be desirable to arrange the sets in an XY configuration using a patterning process on the completed layer stack (see, eg, multilayer coating in FIG. 4 (h)), preferably by laser scribing. .. The problem is that defining two sets of XY electrodes (transmit and receive) provided in two parallel planes as an orthogonal matrix allows the electrodes in the X direction without damaging the base electrodes oriented along the Y direction. Is facing the challenge of scribbling or vice versa. Therefore, in an exemplary embodiment, the two sets of electrodes (T and R) are independently patterned using different wavelengths. In another exemplary embodiment, the two sets of electrodes are patterned from different sides of the supporting glass substrate 40, either using the same wavelength or using at least two different wavelengths.

In certain exemplary embodiments, different electrodes on the touch panel may be formed by different silver-based layers 46 with the same or different multilayer coatings. When patterning the electrodes (T) and (R), in certain exemplary embodiments, different laser scribe wavelengths are used to apply different silver-based layers 46 of the same or different multilayer coatings (s) 41. It may be patterned. For example, when the first (for example, transmitting) electrode and the second (for example, receiving) electrode of the touch panel are overlapped with each other (see, for example, FIGS. 3 (f) to 3 (g)), the first When patterning the silver-based layer 46 on the first electrode (s), the first laser scribing wavelength may be used, and the second silver-based layer 46 is patterned on the second electrode (s). A second laser screen wavelength may be used in doing so. For example, the transmission electrode (T) of FIGS. 3 (f) to 3 (g) is laser-patterned using the first wavelength (s) and receives the reception of FIGS. 3 (f) to 3 (g). The electrode (R) may be laser patterned using a different second wavelength (s). Advantageously, the use of different wavelengths reduces damage to electrodes that are not intended to be patterned in a given procedure.

In certain exemplary embodiments, the first set of electrodes (eg, T) is on the supporting glass substrate 40, where different electrodes on the touch panel can be formed by different silver-based layers 46 of the same or different multilayer coatings 41. The second set of electrodes (eg, R) may be patterned by laser scribe from the first side, while the second set of electrodes (eg, R) may be patterned by laser scribe from the second side opposite to the supporting glass substrate 40. .. Therefore, since the transmit and receive electrodes are on the same side of the glass substrate 40, one of the two laser patterning procedures is performed through the support glass substrate 40. For example, referring to FIGS. 3 (f) to 3 (g) and FIG. 4 (h), the transmitting electrode (T) may be laser-patterned from the first side of the supporting glass substrate 40, while receiving. The electrode (R) may be laser-patterned by forming a second surface on the opposite side of the support glass substrate 40 so that the laser beam for patterning the receiving electrode (R) passes through the glass substrate 40. .. Advantageously, this technique reduces damage to electrodes that are not intended to be patterned in a given laser patterning procedure. Embodiments that include laser patterning different electrodes from both sides of a supporting glass substrate may or may not be used in combination with embodiments that pattern different electrodes using different wavelengths.

As described in connection with FIGS. 14 (a) to 14 (b), the upper Ag layer 46 in the double silver coating as shown in FIG. 4 (h) is more in the wavelength range of 800 to 900 nm. It was found that the absorption was optically high, while the maximum absorption of the bottom silver layer 46 was shifted to shorter wavelengths. By optimizing the double silver layer laminate, the absorption maximum values of the two silver layers 46 can be further distinguished. FIG. 14 (b) shows a much larger difference in optical absorption between the top and bottom silver layers of the coated laminate of FIG. 4 (h) at about 770 nm, and a much smaller difference at about 580 nm. Shown. This distinction allows selective laser scribes of the two conductive silver layers 46 to be applied from one side (eg, above the laminate) or from both sides (eg, the laminate side for top silver and the bottom silver layer). Allows you to do it from either (from the glass side).

Separated by at least one non-Ag layer, sandwiched between at least two dielectric layers supported by the substrate, forming two independent sets of transmitting and receiving electrodes that are substantially parallel to each other and substantially parallel to the substrate. In a capacitive touch sensor containing two Ags patterned in such a manner, the receiving electrode and the transmitting electrode are formed in different Ag layers, and the two sets of electrodes are orthogonal to each other, and the two sets are orthogonal to each other. The electrodes of are formed by scribing with a laser (s) having at least two different wavelengths selected to be preferentially absorbed by each of the Ag layers. For example, the bottom silver-based layer 46 in the coating of FIG. 4 (h) is a transmission electrode (shown in FIGS. 3 (f) to 3 (g) or any other embodiment herein. Laser scribing may be performed using a laser wavelength of about 400-620 nm (more preferably about 500-600 nm) for patterning to T). The laser patterning of the bottom silver layer 46 of FIG. 4 (h) for forming the transmission electrode (T) shown in FIGS. 3 (f) to 3 (g) directly irradiates the laser beam through the glass substrate 40. It may be done by. On the other hand, the upper silver-based layer 46 in the coating of FIG. 4 (h) is the receiving electrode (the layer 46 shown in FIGS. 3 (f) to 3 (g) or any other embodiment of the present specification. Laser scribing may be performed using a laser wavelength of about 630-1200 nm (more preferably about 650-1100 nm, most preferably about 700-1000 nm) for patterning to R). In the laser patterning of the upper silver layer 46 of FIG. 4 (h) for forming the upper receiving electrode (R) shown in FIGS. 3 (f) to 3 (g), the laser beam is a glass substrate 40. This may be done by directing the laser beam over the coating 41 so that it reaches the silver layer 46 in front of it. The use of different wavelengths, as well as the use of lasers from both sides of the glass substrate, can be advantageous in reducing damage to the silver layer that is not intended to be patterned in a given patterning procedure. In certain exemplary embodiments, each of the two obtained electrodes may have a sheet resistance of about 2-40 ohms / □, more preferably about 2-20 ohms / □.

As will be recognized by those skilled in the art, the described touch panels 20 and 30 are not limited to the orientations shown in FIGS. 2 and 3 described above. In other words, the terms "row", "column", "x-axis", and "y-axis" used in this application do not mean a particular direction. For example, the touch panel 20 of FIG. 2A may be modified or rotated so that the interconnection region 21 is positioned at any portion of the touch panel 20.

In the embodiments of FIGS. 2 and 3, the narrow transparent conductive wiring (eg, 22) may be guided to electrically connect the electrodes to the interconnection zone 21 (and the interconnection zone 21'). Due to the large resistance of the narrow ITO wiring, the narrow ITO wiring may only be used in small touch panels such as for smartphones. One of the layouts shown in FIGS. 2 (a) and 3 can be used for use with a larger touch panel (eg, diagonal measurement dimensions greater than 10 inches), or otherwise. In order to do so, a transparent conductive coating 41 having a lower sheet resistance (compared to ITO of similar thickness) is used. The silver-containing coating 41 shown in FIG. 4 (any of FIGS. 4 (a) to 4 (h)) for use in forming the electrodes and wiring of FIGS. 2 and 3 is a typical conventional conventional. It has a much lower sheet resistance than ITO wiring / electrodes (and thus has higher conductivity), which is an advantage in this regard.

Example of transparent conductive coatings (TCC) 41 having low sheet resistance for forming any and / or all of the conductive electrodes and / or conductive wiring of FIGS. 2 and 3. Is shown in FIG. 4 (FIGS. 4 (a) to 4 (h)) according to an exemplary embodiment of the present invention. The low sheet resistance and high transparency of the TCC 41 allows the TCC to form, for example, elongated wiring 22, as well as row and column electrodes x, y and / or transmit / receive electrodes.

With reference to FIG. 4A, the multilayer transparent conductive coating 41 in the exemplary embodiment is provided directly or indirectly on the substrate 40. The substrate 40 may be, for example, glass. In an alternative embodiment described below, an antireflection (AR) coating may be provided between the substrate 40 and the coating 41. The coating 41 is composed of, for example, _{a material such as titanium oxide or niobium oxide that may contain titanium oxide (eg, TiO 2} or other suitable chemical theory), or a dielectric high refractive index layer 43 containing the same, and a silver-based coating 41. A dielectric layer of or containing zinc oxide 44 optionally doped with aluminum so as to contact the layer, a silver-based conductive layer 46 on the zinc oxide-based layer 44 that comes into direct contact with it, and silver. On the system conductive layer 46, an upper contact layer 47 containing nickel and / or chromium in contact with it, or other suitable material that can be oxidized and / or nitrided, and titanium oxide (eg, TiO ₂ or other suitable). Dielectric high refractive index layer 48 of a material such as titanium oxide or niobium oxide containing the same, and a dielectric layer 49 of _{tin oxide (for example, SnO 2) or containing the same.} For example, it may contain a dielectric layer 50 of, for example, silicon nitride and / or silicon oxynitride which can be doped with 1-8% Al. Each layer within the coating 41 is designed to be substantially transparent to visible light (eg, at least 70% or at least 80% transparent). The dielectric high refractive index layer 43 may be completely oxidized or quasi-stoichiometric in different exemplary embodiments. The silver layer 46 may be doped with other materials (eg, Pd, Pt, Zn, Ti, and / or Al) in certain exemplary embodiments, as described herein. It does not have to be done. Alternatively, the zinc oxide layer 44 may or may include an upper contact layer 47, such as NiCr, NiCrO _x , NiCrN _x , NiCrON _x , NiCrMo, MiCrMoO _x , or TiO _x. Or may include these. The zinc oxide in the layer 44 immediately below the conductive silver 46 is amorphous or substantially amorphous as the layer 44 in order to adjust the conductivity of the silver-based layer 46 as described herein. Ingredients [eg, silicon oxide (eg, SiO ₂ ), silicon nitride, silicon nitride (eg, Si ₃ N ₄ ), titanium oxide (eg, TiO ₂ ), or zinc nitrate], amorphous semiconductors (eg, Zinc) For example, it may be replaced with a—Si) or a metal alloy (for example, NiCr, NiCrMo, etc.).

The coating 41 supports a visible reflectance (glass-side visible reflectance and / or film-side visible reflectance) at the same time, optionally at the same time, so as to achieve good conductivity through the conductive silver-based layer 46. It is designed to reduce visibility by more closely matching it with the visible reflectance of 40. The visible reflectance on the glass side is measured from the side of the coated glass substrate on the opposite side of the coating, while the visible reflectance on the film side is measured from the side of the coated glass substrate with the coating. Please note. Substantial matching between the visible reflectance of the coating 41 and the visible reflectance of the supporting glass substrate 40 reduces the visibility of the electrodes and wiring formed of the coating material 41. Surprisingly and unexpectedly, adjusting the particular dielectric thickness of the coating of FIG. 4 (a) can surprisingly improve (decrease) the visibility of the coating 41 and thus. It has been found that the patterned electrodes and wiring of the touch panel can be made invisible to the user and thus more aesthetically pleasing.

In different embodiments of the invention, different thicknesses and materials can be used for the layers, but are exemplary for each sputter-deposited layer of coating 41 on the glass substrate 40 in embodiment (a). The thickness and material of the glass substrate are as follows from the glass substrate to the outside.

The above materials for the coating 41 in the embodiment of FIG. 4 (a) are exemplary and therefore other materials (s) may be used instead, omitting specific layers. Please note that it is also good. This coating has both low sheet resistance and has a layer designed to reduce the visibility of the coating 41 on the supporting glass substrate 40. In certain exemplary embodiments, the glass substrate 40 with the coating 41 on top may be heat treated (eg, heat strengthened) or chemically strengthened, eg, after or before coating. Good.

In FIGS. 4 (a) to 4 (h), the silver-containing coating 41 is not expensive and has low sheet resistance (preferably less than 40 ohms / □, more preferably less than 20 ohms / □, even more preferably about. Has (less than 15 or 10 ohms / □) and maintains high visible transmission (preferably at least 60%, more preferably at least 70%, more preferably at least 80%, most preferably at least 84%). .. The coating 41 is preferably deposited over substantially the entire main surface of the glass substrate 40 and then patterned to form electrodes and / or wiring. For example, the exemplary display assembly shown in FIG. 7 includes a touch panel (20 or 30 or 50) mounted on a liquid crystal display panel (100-300). In the embodiment of FIG. 7, one or more of the row electrodes, column electrodes, and wiring may be formed from a coating 41 on the surface of the glass substrate 40 on the opposite side of the finger, the touch panel (20, 30, or 50) may be adhered to the LCD panel via the refractive index matching adhesive layer 85. The LCD panel includes first and second substrates (eg, glass substrates) 100, 200 in which the liquid crystal layer 300 is provided between them. To form the touch screen, the touch panels 20 and 30 may optionally be mounted on an LCD panel with small voids or bonded to the display with a refractive index matching adhesive 85. Therefore, reference numeral 85 in FIG. 7 represents either the void between the display and the touch panel or the index-matching adhesive. It should be noted that in the measurements made for FIGS. 5-6 and 8 (a) to 8 (b), the void 85 was assumed so that the coating 41 was adjacent to the void 85. In the void embodiment, the periphery of the substrate 40 supporting the coating 41 may be bonded to the liquid crystal panel via an adhesive or any other suitable type of edge sealing material.

The pixel pitch of the projected capacitive touch panel may be, for example, in the range of about 6 to 7 mm. The touch position can be more accurately determined by signal processing and interpolation, for example up to about 1 mm. When the line width / spacing of the wiring 22 is about 10 pm to 20 pm, a projected capacitive touch panel of at least 20 inches (measured diagonally) is possible for a TCC sheet resistance of about 4 ohms / □. It can be calculated that there is. Further optimization of routing, signal processing, and / or noise suppression allows the production of even larger touch panels (eg, up to 40 or 50 inches diagonally). The present invention is also applicable to smaller touch panels in certain presentation embodiments.

Comparison between Example 1 and Comparative Example (CE)

Surprisingly and unexpectedly, adjusting the particular dielectric thickness of the coating of FIG. 4 (a) can surprisingly reduce the visibility of the coating 41 of the support substrate 40, as a result. It has been found that the electrodes and wiring of the touch panel can be made invisible to the user and thus the entire panel can be made more aesthetically pleasing. This is demonstrated, for example, by comparing Comparative Example (CE) of the present invention with Example 1, the coating comprising from the glass substrate outwards:

From Table 2 above, it can be seen that the only difference between Example 1 of the present invention and Comparative Example (CE) is the thickness of the dielectric layers 43 and 50. Surprisingly and unexpectedly, adjusting the thickness of layers 43 and 50 can be seen as the visible reflectance of the coating 41 on the glass substrate 40 (eg, the visible reflectance on the glass side) and the visibility of the glass substrate 40 alone. By more closely matching the reflectance, the visibility of the area of the coating 41 on the supporting glass substrate 40 can be surprisingly reduced, thus making the touch panel electrodes and wiring invisible to the user. Therefore, it has been found that it can be aesthetically more satisfying. This is shown in FIGS. 5-6 and also in the table below.

FIG. 5 shows the visible transmittance (TR) (%) and the glass side visible reflectance (BRA) (%) of the comparative example (CE) coating on the glass substrate as the glass substrate alone (Glass-TR, Glass-BRA). It is a transmittance (%) / reflectance vs. wavelength (nm) graph shown in comparison with these values of. Note that FIG. 5 includes not only the visible spectrum but also some wavelengths outside the visible spectrum. The line graph marked with “x” in FIG. 5 is the glass-side visible reflectance of the CE coating on the glass substrate 40 (that is, the reflectance obtained from the finger side in FIG. 7), and is represented by the triangle in FIG. The line graph marked is the visible reflectance of the glass substrate 40 alone in the region where the coating 41 does not exist. The differences between these two lines are (a) the region of the glass substrate 40 without the CE coating (ie, the non-electrode and non-wiring regions) and (b) the region of the glass substrate 40 with the CE coating (ie). That is, it is meaningful because it shows the difference in visible reflectance on the glass side between the electrode and the wiring region). Therefore, the greater the difference between these two lines (the two lines below the graph in FIG. 5), the more visible the electrodes and wiring will be to the viewer when viewed from the finger side of FIG. 7. .. In FIG. 5, there is a considerable gap between the two lines around the visible wavelength of 600 nm (including both sides) (the difference in reflectance (%) is greater than 2.0), which is the CE material. The electrodes and wiring on the touch panel manufactured in the above are very visible, which means that the touch panel and the like may be aesthetically unsatisfactory.

In contrast, FIG. 6 shows the visible transmittance (CGN-TR or TR) and the glass-side visible reflectance (CGN) of the coating of Example 1 of FIG. 4 (a) according to an exemplary embodiment of the invention on a glass substrate. It is a visible transmittance (%) / reflectance (%) vs. wavelength (nm) graph showing −BRA or BRA), and the coating of Example 1 is transparent to visible light, as compared with CE in FIG. This demonstrates that it has a visible reflectance on the glass side that more closely matches the visible reflectance on the glass side of the glass substrate. FIG. 6 shows the visible transmittance (Glass-TR) and the visible reflectance (Glass-BRA) of the glass substrate alone in the region of the glass substrate without coating, as in FIG. The line graph marked with “x” in FIG. 6 is the visible reflectance on the glass side of Example 1 coating 41 on the glass substrate 40, and the line graph marked with a triangle in FIG. 6 is a glass substrate without coating 41. 40 is the visible reflectance of a single substance. The differences between the two lines are (a) the glass substrate and touch panel area where the coating 41 is absent (ie, the non-electrode and non-wiring areas) and (b) the glass substrate and touch panel area where the coating 41 is present (ie). It is meaningful because it shows the difference in visible reflectance (from the point of view of the finger in FIG. 7) between the electrode and the wiring region. Therefore, the greater the difference between these two lines (the two lines below the graph in FIG. 6), the more visible the electrodes and wiring will be to the viewer. The smaller the difference between these two lines (the two lines below the graph in FIG. 6), the less visible the electrodes and wiring will be to the viewer. Comparing FIGS. 5 and 6 with each other, in FIG. 6, the gap between these two lines at visible light wavelengths of about 550 nm to about 650 nm is (existing) compared to the large CE gap shown in FIG. Smaller than the case), this makes the electrodes and wiring (FIG. 6) on the touch panel constructed of the material of Example 1 much less visible (compared to the CE material of FIG. 5), which makes the touch panel much less visible. It means to be more aesthetically pleasing. In other words, compared to CE, Example 1 more closely matches the visible reflectance of the glass substrate 40 in the region where no coating is present with the visible reflectance of the coating 41 on the glass substrate 40 on the glass side. Therefore, the electrodes and wiring of the touch panel are not visible to the user, making them more aesthetically pleasing.

The table below shows the optical difference between Comparative Example (CE) and Example 1, where TR is visible light transmittance at 550 nm and RA visually recognizes the glass / coating combination from the coating side. BRA is the visible reflectance on the glass side, which is measured by visually recognizing the combination of glass / coating from the glass side. As will be appreciated by those skilled in the art, a ^* and b ^* have a transmitted color [a ^* (TR) and b ^* (TR)] and a glass-side reflected color [a ^* (BRA and b ^* (BRA)]]. On the other hand, it is a measured color value.

The glass-side visible reflectance (BRA) of the coating 41 on the glass substrate 40 of Example 1 is more rigorous than the visible reflectance of the glass substrate 40 alone (5.8% vs. 8.11%) compared to CE. Match (8.20% vs. 8.11%). Therefore, the patterned coating 41 on the glass substrate 40 is less visible in Example 1 as compared to CE.

In certain exemplary embodiments of the invention (eg, FIGS. 2-7), the coating 41 (different from CE) on the glass substrate 40 has a film-side visible reflectance (RA) 7-at 550-600 nm. It is 10%, more preferably 7.5 to 8.5%. In certain exemplary embodiments of the invention, the coating 41 (different from CE) on the glass substrate 40 has a glass-side visible reflectance (BRA) of 7-13%, more preferably 7-, at 550-600 nm. 9%, and even more preferably 7.25-8.75% (as mentioned above, the BRA of CE is only 5.8%). In certain exemplary embodiments of the invention, unlike CE, (a) the film-side and / or glass-side visible reflectance of the coated product containing the coating 41 on the glass substrate 40 (in the region where the coating 41 is present). Difference (more than 2.0) between (%) and (b) the visible reflectance (%) of the glass substrate alone in the region where the coating 41 does not exist in the range of 550 nm and / or 600 nm, or 550 to 600 nm. Preferably, there is a difference of 1.5 or less or 1.0 or less). This can be seen, for example, in FIG. 6 (see also FIGS. 8 (a) to 8 (b)). In contrast, for example, with respect to CE, (a) the visible reflectance (%) on the glass side of the coating product containing the CE coating on the glass substrate 40 in the region where the coating 41 is present, and (b) the glass substrate. It was found that the difference from the single visible reflectance (%) was 2.31 (8.11% -5.8% = 2.31), which is a considerable difference, as shown in FIG. When the device is visually recognized from the side of the indicated finger, the electrodes and wiring are easily visible to the viewer. An exemplary embodiment of the invention reduces this difference to 2.0 or less, more preferably 1.5 or less, and most preferably 1.0 or less.

Comparative Example (CE) has been described above in connection with comparison with Example 1, but both coatings of CE and Example 1 are electrodes and / or electrodes in a touch panel according to an exemplary embodiment of the invention. Note that it may be used as wiring.

In certain exemplary embodiments, the antireflection (AR) coating more closely matches the visible reflectance (glass side and / or film side) of the coating with the visible reflectance of the supporting substrate (glass and AR coating). It may be provided between the coating 41 of any one of FIGS. 4 (a) to 4 (h) and the glass substrate 40. The AR coating can be applied to the entire main surface or substantially the entire surface of the glass substrate 40, and unlike the transparent conductive coating 41, it is not necessary to pattern the AR coating in a specific exemplary embodiment. Alternatively, the AR coating may actually be provided as a bottom portion of the coating 41 to add an AR effect to the coating 41.

FIG. 4B shows a multilayer transparent conductive coating 41 according to another exemplary embodiment that can be directly or indirectly provided to the substrate 40 with any one of the devices or products described herein. (See, for example, FIGS. 2 to 3, 7, and 9 to 17). The substrate 40 may be, for example, glass or glass coated with an AR coating. Coating 41 of the embodiment of FIG. 4 (b), for example, Al and / or oxygen doped good silicon nitride or may not doped of (eg, Si ₃ N ₄ or other suitable stoichiometry) , Or a base dielectric layer 61 containing it, and silicon oxide (eg, SiO ₂ or other suitable chemical theory) that may or may not be doped with Al and / or nitrogen. A low refractive index dielectric layer 62 and a dielectric high refractive index layer 43 of a material such as titanium oxide or niobium oxide which may contain _{titanium oxide (eg, TiO 2 or other suitable chemical theory), or a dielectric high refractive index layer 43 containing the same.} A dielectric layer comprising either zinc oxide (optionally Al-doped) or any of the other materials described herein in connection with layer 44 so as to contact the silver-based layer. 44, a silver-based conductive layer 46 that is in direct contact with the zinc oxide-based layer 44, and nickel and / or chromium that can be oxidized and / or nitrided on the silver-based conductive layer 46. An upper contact layer 47 containing, and a dielectric high refractive index layer 48 containing or containing a material such as titanium oxide or niobium oxide which may contain a titanium oxide (eg, TiO _{2 or other suitable chemical quantification theory) and oxidation.} Includes a dielectric layer 49 of tin (eg, SnO ₂ ) or containing it, and an outermost protective dielectric layer 50 of or containing silicon nitride and / or silicon oxynitride. Each of the layers in the coating 41 is designed to be substantially transparent to visible light (eg, at least 70% or at least 80% transparent). In certain embodiments, the silver layer 46 may or may not be doped with other materials as described herein.

The coating 41 of FIGS. 4A to 4C achieves excellent conductivity, and at the same time, the visible reflectance (visible reflectance on the glass side and / or the film side) is defined as the visible reflectance of the support substrate 40. A tighter match is designed to reduce visibility. Substantially matching the visible reflectance of the coating 41 with the visible reflectance of the supporting glass substrate 40 reduces the visibility of the electrodes and wiring formed of the coating material 41. In different embodiments of the invention, different thicknesses and materials can be used for the layers, exemplifying each sputter-deposited layer of the coating 41 on the glass substrate 40 in the embodiment of FIG. 4 (b). The thickness and material of is present on the outside of the glass substrate as follows.

The material for coating 41 in FIG. 4 (b) is exemplary, and in certain exemplary embodiments, other materials (s) may be used instead, omitting specific layers. Please note that it may be done. This coating has low sheet resistance and has a layer designed to reduce the visibility of the coating 41 on the supporting glass substrate 40. In certain exemplary embodiments, the glass substrate 40 with the coating 41 on it may, for example, be heat treated (eg, thermally tempered) after coating, or chemically strengthened prior to coating. May be good. Similar to the embodiment of FIG. 4 (a), the silver-based coating 41 of the embodiment of FIG. 4 (b) is not expensive and has low sheet resistance (preferably less than 15 ohms / □, more preferably about 10). Or less than 5 ohms / □, for example about 4 ohms / □) and high visible light transmittance (preferably at least 60%, more preferably at least 70%, more preferably at least 80%, most. Preferably, it retains at least 84%). The coating 41 is preferably deposited over substantially the entire main surface of the glass substrate 40 and then patterned to form the electrodes and / or wiring described herein.

Example 2 vs. Comparative Example (CE)

Example 2 utilizes the coating according to the embodiment of FIG. 4 (b). Surprisingly and unexpectedly, the coating of FIG. 4B can surprisingly reduce the visibility of the coating 41 on the support substrate 40, thus allowing the user to see the electrodes and wiring of the touch panel. It has been found that it is not possible and therefore the entire panel can be made more aesthetically pleasing compared to the CE described above. This is clarified, for example, by the following comparison between Example 2 of the present invention and Comparative Example (CE), the coating comprising:

FIG. 5 is the one described above and shows the characteristics of CE.

In contrast, FIG. 8 (a) shows the visible light transmittance (CGN-TR or TR) of Example 2 of the present invention and the visible light transmittance (%) showing the glass-side visible reflectance (CGN-BRA or BRA). ) / Reflectance (%) vs. wavelength (nm), the second embodiment of the present invention is transparent to visible light, and the reflectance (%) of the glass substrate alone is higher than that of CE in FIG. It has been demonstrated to have a more closely matched glass-side visible reflectance. FIG. 8A also shows the visible light transmittance (Glass-TR) and the visible reflectance (Glass-BRA) of only the glass substrate having no coating. The line graph marked with “x” in FIG. 8 (a) is the visible reflectance on the glass side of Example 2 coating 41 on the glass substrate 40, and the line graph marked with a triangle in FIG. 8 (a) is the coating. It is the visible reflectance of the glass substrate 40 alone in the region where 41 does not exist. The differences between these two lines are (a) the area of the glass substrate and touch panel where the coating 41 is absent (ie, the non-electrode and non-wiring areas) and (b) the area of the glass substrate and the touch panel where the coating 41 is present. It is important because it shows the difference in visible reflectance (as viewed from the finger perspective in FIG. 7) between the regions (ie, the electrode and wiring regions). Therefore, the greater the difference between these two lines (the two lines below the graph in FIG. 8A), the more visible the electrodes and wiring will be to the viewer. The smaller the difference between these two lines (the two lines below the graph in FIG. 8A), the less visible the electrodes and wiring will be to the viewer. Comparing FIG. 5 and FIG. 8 (a) with each other, in FIG. 8 (a), the gap between these two lines at the visible light wavelength of about 550 nm to about 650 nm is the large gap of CE shown in FIG. Compared to, smaller (if present), this made the electrodes and wiring on the touch panel made of the material of Example 2 much less visible (compared to the CE material of FIG. 5). Means to make the touch panel more aesthetically pleasing. In other words, compared to CE, Example 2 more closely matches the visible reflectance of the glass substrate 40 in the region where no coating is present with the visible reflectance of the coating 41 on the glass substrate 40 on the glass side. Therefore, the electrodes and wiring of the touch panel are not visible to the user and are therefore more aesthetically pleasing.

The table below shows the optical difference between Comparative Example (CE) and Example 2, where TR is visible light transmittance at 550 nm and RA visually recognizes the glass / coating combination from the coating side. BRA is the visible reflectance on the glass side, which is measured by visually recognizing the combination of glass / coating from the glass side. As will be appreciated by those skilled in the art, a ^* and b ^* have a transmitted color [a ^* (TR) and b ^* (TR)] and a glass-side reflected color [a ^* (BRA and b ^* (BRA)]]. On the other hand, it is a measured color value.

The visible reflectance (BRA) on the glass side of the coating 41 on the glass substrate 40 of Example 2 is the visible reflectance (%) of the glass substrate 40 alone as compared with CE (5.8% vs. 8.11%). It makes sense to have a tighter match (7.86% vs. 8.11%). Therefore, the patterned coating 41 on the glass substrate 40 is less visible in Example 2 as compared to CE. As mentioned above, in certain exemplary embodiments of the invention (eg, FIGS. 2-7), the coating 41 (different from CE) on the glass substrate 40 has a film-side visible reflectance at 550-600 nm. (RA) is 7 to 10%, more preferably 7.5 to 8.5%. In certain exemplary embodiments of the invention, the coating 41 (different from CE) on the glass substrate 40 has a glass-side visible reflectance (BRA) of 7-13%, more preferably 7-, at 550-600 nm. 9%, and even more preferably 7.25-8.75% (as mentioned above, the BRA of CE is only 5.8%). Also, as described above, in certain exemplary embodiments of the invention, (a) film-side and / or glass-side visible of a coated product containing the coating 41 on the glass substrate 40 (in the region where the coating 41 is present). Difference of 2.0 or less in the range of 550 nm and / or 600 nm, or 550 to 600 nm between the reflectance (%) and the visible reflectance (%) of the glass substrate alone in the region where (b) the coating 41 does not exist. (More preferably, there is a difference of 1.5 or less or 1.0 or less). This can be seen, for example, in FIG. 8 (a) (see also FIGS. 6 and 8 (b)). In contrast, for example, with respect to CE, (a) the visible reflectance (%) on the glass side of the coating product containing the CE coating on the glass substrate 40 in the region where the coating 41 is present, and (b) the glass substrate. It was found that the difference from the single visible reflectance (%) was 2.31 (8.11% -5.8% = 2.31), which is a considerable difference, as shown in FIG. When the device is viewed from the side of the indicated finger, the electrodes and wiring are easily visible to the viewer. An exemplary embodiment of the invention reduces this difference to 2.0 or less, more preferably 1.5 or less, and most preferably 1.0 or less.

FIG. 4 (c) shows a multilayer transparent conductive coating according to another exemplary embodiment that can be directly or indirectly provided to the substrate 40 with any one of the devices or products described herein. 41'or 41', both of which may also be referred to as 41) (see, for example, FIGS. 2 to 3, 7, and 9 to 17). The substrate 40 is, for example, glass. The coating 41'of the embodiment of FIG. 4 (c) may include, for example, a material such as titanium oxide or niobium oxide, which may contain _{titanium oxide (eg, TiO 2 or other suitable chemical theory).} Or a dielectric high refractive index layer 71 containing the same, and silicon oxide (eg, SiO ₂ or other suitable chemical theory) which may or may not be doped with Al and / or nitrogen, or contains the same. A low refractive index dielectric layer 72, a dielectric high refractive index layer 73 made of a material such as titanium oxide or niobium oxide, or a dielectric high refractive index layer 73 containing the same, and silicon oxide which may or may not be doped with Al and / or nitrogen ( For example, SiO ₂ or other suitable chemical theory), or another low refractive dielectric layer 74 containing it, and zirconium oxide (eg, ZrO ₂ or other suitable chemical theory), or this. The dielectric layer 75 containing the above may include an antireflection (AR) portion 70 including the AR portion 70 of the coating 41'in the embodiment of FIG. 4C, wherein the AR portion 70 of the coating 41'is the remainder of the coating 41'. Since it does not need to be patterned together with the portion of the coating, it can be regarded as the AR portion 70 and the glass 40 of the coating, in which case the transparent conductive coating of the embodiment of FIG. 4 (c) is the layer 61. It can be considered that only 44, 46, 47, and 50 are manufactured. In other words, in the embodiment of FIG. 4 (c), the multilayer transparent conductive coating can be regarded as the layer 41 "manufactured by the layers 61, 44, 46, 47, and 50, and the" substrate "is. It can be considered as a combination of glass 40 and AR coating 70.

The coating 41 of the embodiment of FIG. 4 (c), as the portion 41 ", is silicon nitride (eg, Si ₃ N ₄ or other suitable chemical amount) which may or may not be doped with Al and / or oxygen. (Discussion), or the dielectric layer 61 containing it, as described herein in connection with zinc oxide (optionally Al-doped), or layer 44, so as to contact the silver-based layer. On the dielectric layer 44 containing any of the materials of the above, or on the zinc oxide-based layer 44, in direct contact with the silver-based conductive layer 46, and on the silver-based conductive layer 46, in contact with the silver-based conductive layer 46. Top contact layer 47 containing nickel and / or chromium which can be oxidized and / or nitrided, and optionally titanium oxide _{or niobium oxide which may contain a titanium oxide (eg, TiO 2} or other suitable chemical theory). A dielectric high-refractive-index layer 48 of the material of the above, or a dielectric high refractive index layer 48 containing the same, and an outermost protective dielectric layer 50 of silicon nitride and / or silicon oxynitride, or containing the same, are further included. Each of the layers in the coating 41 of embodiment 4 (c) is designed to be substantially transparent to visible light (eg, at least 70% or at least 80% transparent). , It may or may not be doped as described herein.

The coating 41 of FIG. 4C achieves excellent conductivity and at the same time more closely matches the visible reflectance (the visible reflectance on the glass side and / or the film side) with the visible reflectance of the supporting substrate. , Designed to reduce visibility. Substantially matching the visible reflectance of the coating 41 with the visible reflectance of the support substrate reduces the visibility of the electrodes and wiring formed of the coating material 41. In different embodiments of the invention, different thicknesses and materials can be used for the layers, exemplifying the respective sputter-deposited layers of the coating 41 on the glass 40 in the embodiment of FIG. 4 (c). The thickness and material are present on the outside of the glass as follows.

The material for coating 41 in FIG. 4 (c) is exemplary, and in certain exemplary embodiments, other materials (s) may be used instead, omitting specific layers. Please note that it may be done. This coating has both low sheet resistance and has a layer designed to reduce the visibility of the coating 41 on the support substrate. In certain exemplary embodiments, the glass substrate 40 with the coating 41 on it may, for example, be heat treated (eg, thermally tempered) after coating, or chemically strengthened prior to coating. May be good. Similar to the embodiments of FIGS. 4 (a) to 4 (b), the silver-based coating 41 of the embodiment of FIG. 4 (c) is not expensive and has low sheet resistance (preferably less than 15 ohms / □). More preferably, it has less than about 10 or 5 ohms / □, for example, about 4 ohms / □) and has a high visible light transmittance (preferably at least 60%, more preferably at least 70%, more preferably. , At least 80%, most preferably at least 84%). The coating 41 is preferably deposited over substantially the entire main surface of the glass substrate 40 and then patterned to form the electrodes and / or wiring described herein.

Example 3 vs. Comparative Example (CE)

Example 3 utilizes the coating according to the embodiment of FIG. 4 (c). Surprisingly and unexpectedly, the coating of FIG. 4C can surprisingly reduce the visibility of the coating 41 on the support substrate, thus making the electrodes and wiring of the touch panel visible to the user. It was found that the entire panel could therefore be aesthetically more satisfying compared to the CE described above. This is clarified, for example, by the following comparison between Example 3 of the present invention and Comparative Example (CE), the coating comprising:

FIG. 5 is the one described above and shows the characteristics of CE.

In contrast, FIG. 8 (b) shows the visible light transmittance (CGN-TR or TR) and the glass-side visible reflectance (CGN-BRA or BRA) of Example 3 according to another exemplary embodiment of the present invention. It is a visible light transmittance (%) / reflectance (%) vs. wavelength (nm) graph showing, and Example 3 is transparent to visible light and is more transparent to visible light than CE. Demonstrate having exactly matching glass-side visible reflectance. FIG. 8 (b) also shows the visible light transmittance (Glass-TR) and visible reflectance of only the AR portions 71-75 and the glass substrate without the other layers 61, 44, 46, 47, and 50 of the coating. (Glass-BRA) is also shown. The line graph marked with “x” in FIG. 8 (b) is the visible reflectance on the glass side of Example 3 coating 41 on the glass substrate 40, and the line graph marked with a triangle in FIG. 8 (b) is the line graph. It is the visible reflectance of the glass substrate 40 having only the AR portion (70 to 75) on the top. The differences between the two lines are (a) the area of the glass substrate and touch panel (ie, the non-electrode and non-wiring area) where only the AR portion of the coating is present, and (b) the area of the glass substrate and touch panel where the entire coating 41 is present. It is meaningful because it shows the difference in visible reflectance (new shite from the viewpoint of the finger in FIG. 7) with the region (that is, the electrode and wiring region). Therefore, the greater the difference between these two lines (the two lines below the graph in FIG. 8B), the more visible the electrodes and wiring will be to the viewer. The smaller the difference between these two lines (the two lines below the graph in FIG. 8B), the less visible the electrodes and wiring will be to the viewer. Comparing FIG. 5 and FIG. 8 (b) with each other, in FIG. 8 (b), the gap between these three lines at the visible light wavelength of about 550 nm to about 650 nm is the large gap of CE shown in FIG. Compared to, smaller (if present), this made the electrodes and wiring on the touch panel made of the material of Example 2 much less visible (compared to the CE material of FIG. 5). Means to make the touch panel more aesthetically pleasing. In other words, compared to CE, Example 3 more closely matches the glass-side visible reflectance of the coating 41 on the glass substrate 40 with the visible reflectance of the supporting substrate (glass and AR layer), thus. Make the electrodes and wiring of the touch panel invisible to the user and therefore more aesthetically pleasing.

The table below shows the optical properties of Example 3, where TR is the visible light transmittance at 550 nm and RA is the film-side visible reflectance measured by visually recognizing the glass / coating combination from the coating side. Yes, BRA is the glass-side visible reflectance measured by visually recognizing the glass / coating combination from the glass-side. As will be appreciated by those skilled in the art, a ^* and b ^* have a transmitted color [a ^* (TR) and b ^* (TR)] and a glass-side reflected color [a ^* (BRA and b ^* (BRA)]]. It is a color value measured with respect to. In the table of Example 3 below, the glass substrate parameters are for a glass substrate having only AR layers 71 to 75 over the entire substrate 40, and the parameters of Example 3 are. For the entire coating 41 on the glass substrate 40 (ie, AR layers 71-75 can be provided substantially across the substrate, while layers 61, 44, 46, 47, and 50 are patterned electrodes. And form the wiring).

The glass-side visible reflectance (BRA) of the coating 41 on the glass substrate 40 of Example 3 is exactly the same as the visible reflectance (%) of the glass substrate 40 having only the AR layers 71-75 on it (4). .99% vs. 4.51%). Therefore, the patterned coating portions 61, 44, 46, 47, and 50 on the substrate are much less visible in Example 3 as compared to CE. In certain exemplary embodiments of the invention, the coating 41 on the glass substrate 40 (unlike CE) has a glass-side visible reflectance (BRA) of 4-13%, more preferably 4.5, at 550-600 nm. It is ~ 9%, and even more preferably 4.5-8.75%. Also, as described above, in certain exemplary embodiments of the invention (FIGS. 2-14), (a) a coating comprising an overall coating 41 on a glass substrate 40 (in the region where the coating 41 is present throughout) 550 nm and / or 600 nm between the visible reflectance (%) on the film side and / or the glass side of the product and (b) the visible reflectance (%) in the glass substrate region where only the glass 40 and the AR layers 71-75 are present. Or, there is a difference of 2.0 or less (more preferably 1.5 or less or 1.0 or less) in the range of 550 to 600 nm. This can be seen, for example, in FIG. 8 (b). In contrast, for example, with respect to CE, (a) the visible reflectance (%) on the glass side of the coating product containing the CE coating on the glass substrate 40 in the region where the coating 41 is present, and (b) the glass substrate. It was found that the difference from the single visible reflectance (%) was 2.31 (8.11% -5.8% = 2.31), which is a considerable difference, as shown in FIG. When the device is visually recognized from the side of the indicated finger, the electrodes and wiring are easily visible to the viewer. An exemplary embodiment of the invention reduces this difference to 2.0 or less, more preferably 1.5 or less, and most preferably 1.0 or less.

FIG. 4D shows a multilayer transparent conductive coating 41 according to another exemplary embodiment that can be directly or indirectly provided to the substrate 40 with any one of the devices or products described herein. (See, for example, FIGS. 2 to 3, 7, and 9 to 17). The substrate 40 may be, for example, glass or glass coated with an AR coating. 4 coating 41 of the embodiment of (d) are, for example, Al and / or oxygen doped good silicon nitride or may not doped (eg, Si ₃ N ₄ or other suitable stoichiometry), It can be doped with silicon nitride, or other suitable dielectric material, or a base dielectric layer 61 containing it, with about 1-8% Al, or described herein in connection with layer 44. The lower contact layer 44 of zinc oxide in contact with the silver-based layer, or the lower contact layer 44 containing the same, and the lower contact layer 44, which may have or include any of the other materials obtained. A silver-based conductive layer 46 that is in direct contact with the silicon-based conductive layer 46, an upper contact layer 47 containing nickel and / or chromium that can be oxidized and / or nitrided on the silver-based conductive layer 46, and silicon nitride and / or silicon nitride. Or silicon nitride, or other suitable material, _{a dielectric layer of zirconium oxide (eg, ZrO 2} ) 75, and optionally a protective layer of diamond-like carbon (DLC) 120, or comprising. The dielectric layer 50 and the like may be included. The DLC for layer 120 is, for example, U.S. Pat. Nos. 6,261,693, 6,303,225, 6,447,891, 7,622, incorporated herein by reference. It may be any of the DLC materials described in any of 161 and / or 8,277,946 of the same. Each of the layers in the coating 41 is designed to be substantially transparent to visible light (eg, at least 70% or at least 80% transparent). In certain embodiments, the silver layer 46 may or may not be doped with other materials as described herein. The upper contact layer 47 may or may contain materials such as _{NiCr, NiCrO x} , NiCrN _x , NiCrON _x , NiCrMo, MiCrMoO _x , or TiO _x.

In different embodiments of the invention, different thicknesses and materials can be used as layers, exemplification of each sputter-deposited layer of coating 41 on glass 40 in embodiment (d). The thickness and material are present on the outside of the glass as follows.

FIG. 4 (e) shows a multilayer transparent conductive coating 41 according to another exemplary embodiment that can be directly or indirectly provided to the substrate 40 in any of the devices or products described herein. (See, for example, FIGS. 2 to 3, 7, and 9 to 17). The coating of FIG. 4 (e) is the same as the coating of FIG. 4 (d), except that layer 120 is not present in the coating of FIG. 4 (e).

FIG. 4 (f) shows a multilayer transparent conductive coating 41 according to another exemplary embodiment that can be directly or indirectly provided to the substrate 40 in any of the devices or products described herein. (See, for example, FIGS. 2 to 3, 7, and 9 to 17). The substrate 40 may be, for example, glass or glass coated with an AR coating. Coating 41 of the embodiment of FIG. 4 (f) for example, Al and / or oxygen doped good silicon nitride or may not doped of (eg, Si ₃ N ₄ or other suitable stoichiometry) , Or a base dielectric layer 61 containing it, a lower contact layer 101 capable of contacting a silver-based layer and containing nickel and / or chromium that can be oxidized and / or nitrided, and this on the lower contact layer 101. A silver-based conductive layer 46 in direct contact, an upper contact layer 47 containing nickel and / or chromium that can be oxidized and / or nitrided on the silver-based conductive layer 46, and silicon nitride and / or oxynitride. It may also include a protective dielectric layer 50 of silicon or containing it. Each of the layers in the coating 41 is designed to be substantially transparent to visible light (eg, at least 70% or at least 80% transparent). The silver layer 46 may or may not be doped as described herein. The upper contact layer 47 and the lower contact layer 101 may or may be made of a material such as _{NiCr, NiCrO x} , NiCrN _x , NiCrON _x , NiCrMo, MiCrMoO _x , or TiO _x. Optionally, a layer of diamond-like carbon (DLC) or zirconium oxide (eg, ZrO ₂ ) may be provided as a protective overcoat within the coating 41 on layer 50 in the embodiment of FIG. 4 (f). The zirconium oxide and / or DLC layers described herein provide scratch resistance as well as resistance to dirt and cleaning chemicals in applications such as shower door / wall touch panel applications. _{It is described herein that one or more of NiCr, NiCrO x} , NiCrN _x , NiCrON _x , NiCrMo, and / or MiCrMoO is used in the lower contact layer 101 instead of the crystalline zinc oxide layer 44. As such, the conductivity of the silver layer 46 can sometimes be reduced in a desirable manner.

In different embodiments of the invention, different thicknesses and materials can be used as layers, exemplification of each sputter-deposited layer of coating 41 on glass 40 in the embodiment of FIG. 4 (f). The thickness and material are present on the outside of the glass as follows.

FIG. 4 (g) shows a multilayer transparent conductive coating 41 according to another exemplary embodiment that can be directly or indirectly provided to the substrate 40 in any of the devices or products described herein. (See, for example, FIGS. 2 to 3, 7, and 9 to 17). The substrate 40 may be, for example, glass or glass coated with an AR coating. Coating 41 of the embodiment of FIG. 4 (g), for example, Al and / or oxygen doped good silicon nitride or may not doped of (eg, Si ₃ N ₄ or other suitable stoichiometry) , Or the base dielectric layer 61 containing it, the lower contact layer 44 as described above in connection with other figures, and the silver conductive layer 46 which is in direct contact with the lower contact layer 44. On the silver-based conductive layer 46, even if it is doped with an upper contact layer 47 containing nickel and / or chromium that can be oxidized and / or nitrided in contact with the silver conductive layer 46 with about 1 to 8% (atomic%) of Al. A good silicon nitride and / or silicon nitride oxynitride, or a dielectric layer 50 containing the same, and a protective overcoat of _{zirconium oxide (eg, ZrO 2) 75 may be included.} Each of the layers in the coating 41 is designed to be substantially transparent to visible light (eg, at least 70% or at least 80% transparent). In certain embodiments, the silver layer 46 may or may not be doped with other materials as described herein. The upper contact layer 47 may be made _{of a material such as NiCr, NiCrO x} , NiCrN _x , NiCrON _x , NiCrMo, MiCrMoO _x , or TiO _x , or may contain these. Optionally, the layer of diamond-like carbon (DLC) may be provided as a protective overcoat within the coating 41 on the layer 75 in the embodiment of FIG. 4 (g). It should be noted that layer 47 may be optionally omitted from the embodiment of FIG. 4 (g) in certain exemplary embodiments of the invention.

In different embodiments of the invention, different thicknesses and materials can be used as layers, exemplification of each sputter-deposited layer of coating 41 on glass 40 in the embodiment of FIG. 4 (g). The thickness and material are present on the outside of the glass as follows.

FIG. 4 (h) shows another double silver multilayer transparent conductor according to another exemplary embodiment that can be provided directly or indirectly to the substrate 40 in any of the devices or products described herein. The sex coating 41 is shown (see, for example, FIGS. 2 to 3, 7 and 9 to 17). The substrate 40 may be, for example, glass or glass coated with an AR coating. Coating 41 of the embodiment of FIG. 4 (h), for example, Al and / or oxygen doped good silicon nitride or may not doped of (eg, Si ₃ N ₄ or other suitable stoichiometry) , Or the base dielectric layer 61 containing it, the lower contact layer 44 as described above in connection with other figures, and the silver conductive layer 46 which is in direct contact with these on the lower contact layer 44. And on each of the silver-based conductive layers 46, an upper contact layer 47 containing nickel and / or silicon that can be oxidized and / or nitrided in contact with them, and doped with about 1 to 8% (atomic%) of Al. It may include a dielectric layer 50 of silicon nitride and / or silicon oxide that may be made, or a dielectric layer 50 containing the same, and, for example, a dielectric layer 49 containing tin oxide or zinc tin oxide. Each of the layers in the coating 41 is designed to be substantially transparent to visible light (eg, at least 70% or at least 80% transparent). In certain embodiments, the silver layer 46 may or may not be doped with other materials as described herein. The upper contact layer 47 may or may contain materials such as _{NiCr, NiCrO x} , NiCrN _x , NiCrON _x , NiCrMo, MiCrMoO _x , or TiO _x. Optionally, a layer of diamond-like carbon (DLC) may be provided as a protective overcoat in the coating 41 over the top layer 50 in the embodiment of FIG. 4 (h), or, optionally, the top layer 50. May be replaced with an overcoat of zirconium oxide. It should be noted that from the embodiment of FIG. 4 (h), the specific layer (s) may be optionally omitted and / or another layer (s) may be arbitrarily added.

In different embodiments of the invention, different thicknesses and materials can be used as layers, exemplification of each sputter-deposited layer of coating 41 on glass 40 in embodiment (h). The thickness and material are present on the outside of the glass as follows.

In FIG. 4 (h), as with the other double silver coatings described herein, the lower silver layer 46 may be used as a conductor for a set of electrodes on a touch panel, the upper silver. Layer 46 may be used as a conductor for another set of electrodes. For example, in any embodiment of the present specification, the lower silver layer 46 may be used as a conductor of the transmitting electrode (T) of the touch panel, and the upper silver layer 46 may be used as the conductor of the receiving electrode (R) of the touch panel. It may be used as, or vice versa. In such a scenario, the transmit and receive electrodes may be on different surfaces.

Shown in any of FIGS. 4-6 of parent case 13 / 685,871 (current US Pat. No. 9,354,755, which is incorporated herein by reference) and / or parent case 13. The coatings described elsewhere in / 685,871 are also as multilayer transparent conductive coatings 41 in touch panels for electrodes and / or wiring in any of the various embodiments described herein. May also be used.

The patterned low sheet resistance coating 41 (eg, of any of the embodiments of FIGS. 2-8) herein can be used in low resolution touch panel applications (see, eg, FIG. 9). ). An exemplary use of the touch panel described herein is in an interactive store, preferably stand-alone, but in some cases a projected image on a glass assembly, or a direct-view display, a glass-based shower door. Alternatively, it is combined with a shower control unit on a glass-based shower wall, an optical control unit on a glass wall in an office building, a control unit for electric appliances such as an oven, a stove, and a refrigerator. The glass substrate 40 may be flat or curved (eg, thermally bent) in different embodiments of the present invention. The silver-based coating 41 described herein is advantageous for bent substrates, which means that conventional ITO coatings for touch panels are typically very crystalline when bent. Is high, relatively thick, and brittle, as it can easily lead to ITO failure. In bent glass applications, the glass or plastic substrate 40 may be bent via, for example, thermal bending, cold lamination, or any other suitable technique, and curvature after bending at about 0.05-100 nm. It may be terminated by a radius. The low resolution touch panel on the glass allows the user to select information or otherwise interact with the surface of the glass while simultaneously looking at the back of the glass. In the stand-alone configuration, the touch panel can be operated from both sides of the glass panel. The low-resolution capacitive touch panels may, for example, have an array of 5 x 5 touch buttons, each approximately 1 square inch and approximately 0.5 inches apart, as shown in FIG. The touch principle of operation may be self-capacitance capable of detecting not only bare fingers but also gloved fingers. Since the interconnect flex circuit is connected to the touch controller in FIG. 9, the function of each button can be reconfigured by software or firmware. A low resolution touch interface is easier to manufacture than a multifunctional touch panel on a high resolution LCD, but the minimum feature size of the patterning coating 41 by laser, photolithography or other methods can be much larger. For example, the minimum feature size of the wiring may be about 1 mm, which greatly reduces the requirement for pinholes, scratches, and other defects in glass and coatings. In other words, standard soda-lime glass 40 and coating 41 manufactured with a horizontal building coater may be used. Certain low resolution touch applications do not require premium clean room equipment that facilitates the manufacture of high resolution multi-touch panels for commonly used mobile phones, tablets, laptops, and large multi-touch panels. Wider wiring (eg, about 1 mm) also reduces resistance and signal delay from the touch electrodes.

With reference to the laminated embodiment of FIG. 10 (any of the coatings of FIGS. 2 to 8 can be used in the embodiments of FIG. 10 and the laminate of FIG. 7), a stand-alone application. To further protect the patterned silver-based coating 41 from corrosion in, the touch panel substrate 40 (with or without an AR coating between 40 and 41) is PVB, EVA, or other polymer inclusion laminate. The material 52 is used and laminated on another glass substrate 45. The PVB 52 based on the laminated layer encapsulates the patterned coating 41, for example, to further suppress corrosion. Of course, as described herein, the touch panel need not include a second substrate or laminate in a particular example, from the glass substrate 40 and electrodes / wiring / circuits described herein. It may be manufactured.

15 to 17 are cross-sectional views of a capacitive touch panel according to various embodiments of the present invention, including an additional functional film 300. FIG. 15 is a cross-sectional view of a capacitive touch panel according to an exemplary embodiment of the present invention, which is any of FIGS. 2, 3, and 4 (FIGS. 4 (a) to 4 (h)) on the surface # 2. , A transparent conductive coating pattern 41 according to any of FIGS. 7, 8, 9, or 10, and an additional functional film 300 provided on a surface adapted to be touched by the user. Including. Note the user's finger shown in FIG. On the other hand, FIG. 16 is a cross-sectional view of a capacitive touch panel according to another exemplary embodiment of the present invention, which is FIG. 2, FIG. 3, FIG. 4, FIG. 7, FIG. 8, FIG. Alternatively, it includes a transparent conductive coating pattern 41 according to any of FIG. 10 and an additional functional film 300 provided on a surface adapted to be touched by the user. In the laminated embodiment of FIGS. 15 and 16, the touch panel substrate 40 (glass or plastic, with an AR coating between 40 and 41 is provided to further protect the patterned silver-based coating 41 from corrosion. Does not have) is laminated on another glass substrate 45 (or 200) using PVB or another polymer inclusion laminate material 52. The laminated material (eg EVA or PVB) 52 encapsulates the patterned coating 41 so that corrosion is further suppressed. FIG. 17 is a cross-sectional view of a monolithic capacitive touch panel according to another exemplary embodiment of the present invention, which is FIG. 2, FIG. 3, FIG. 4, FIG. 7, FIG. 8, FIG. 9, or FIG. 10 on the surface # 2. Includes a transparent conductive coating pattern 41 according to any of the above and additional functional films 300 and 301. The monolithic embodiment of FIG. 17 may be designed so that the user touches any of the main surfaces of the touch panel. An interconnect unit 400, such as a flexible circuit, is provided to allow the electrodes 41 of the touch panel to communicate with a processing circuit, such as the processor described above.

The functional films 300 and / or 301 of FIGS. 15-17 may be made from one or more layers, including refractive index matching films, antiglare films, antifingerprint films, and antibacterial films, scratch resistant films, and / Or it may be one or more of the antireflection film (AR) films. Unlike the electrode / wiring coating 41, the functional films 300 and 301 do not need to be patterned and may be applied substantially throughout the substrate 40 (or 45).

If the functional films 300 and / or 301 are index matched (see also index matched film 85 in FIG. 7), this is to reduce visible reflection and make the touch panel more aesthetically pleasing. Refractive index matching films are provided to reduce different refractive indexes between adjacent regions / surfaces on either side of the film. The laminated layer 52 of FIGS. 15 and 16 may also be a refractive index matching film. The refractive index matching film may or may not be an adhesive type in different embodiments of the present invention. Therefore, the refractive index matching film has a refractive index value having a value between the respective refractive index values of the regions / surfaces on both sides of the refractive index matching film. For example, in FIG. 7, the refractive index matching film 85 has a refractive index value between the refractive index values of the coating 41 and the substrate 200. Similarly, in FIG. 15, the refractive index matching film 300 has a refractive index value between the refractive index value of the substrate 40 and air. Similarly, in FIG. 17, the refractive index matching film 301 has a refractive index value between the refractive index value of the coating 41 and air. The exemplary refractive index matching film comprises an optically transparent adhesive and a refractive index matching laminated material.

When the functional film 300 of FIGS. 15 to 17 is an antiglare film, it is provided to reduce glare from the front surface of the touch panel in order to make the touch panel more aesthetically pleasing. Illustrative antiglare films that may be used are described in US Pat. Nos. 8,114,472 and 8,974,066, which are incorporated herein by reference. Further, the antiglare surface of the surface # 1 of the touch panel can be obtained by short acid etching or weak acid etching of the surface # 1 (the surface shown to be touched in FIGS. 15 to 17).

In the case of the functional film 300 anti-fingerprint film of FIGS. 15-17, this is provided to reduce the visibility of the fingerprint on the touch panel and make the touch panel more aesthetically pleasing. An exemplary anti-fingerprint film that may be used is described in US Pat. No. 8,968,831 which is incorporated herein by reference. Anti-fingerprint films or antifouling films can be obtained, for example, using oleophobic coatings and / or rough surfaces. Spray-on anti-fingerprint coatings such as fluorocarbon compounds with limited durability may also be used. Such a film can increase the initial contact angle of the touch panel surface # 1 to a value of at least 90 degrees, more preferably at least 100 degrees, and most preferably at least 110 degrees.

When the functional film 300 of FIGS. 15-17 is an antibacterial film, it is provided for sterilization in front of the touch panel in order to make the touch panel healthier and more attractive. Exemplary antibacterial films that may be used include silver colloid, crude titanium oxide, porous titanium oxide, doped titanium oxide, all of which are incorporated herein by reference in US Pat. No. 8,647,652. No. 8,545,899, No. 7,846,866, No. 8,802,589, No. 2010/0062032, No. 7,892,662, No. 8,092,912 , And No. 8,221,833 of the same.

When the functional film 300 of FIGS. 15 to 17 is a scratch resistant film, it is provided to reduce scratches on the touch panel and improve durability. The exemplary scratch resistant film may be made of ZrO ₂ or DLC. If the functional film 300 has or contains DLC, the DLC will be, for example, US Pat. Nos. 6,261,693, 6,303,225, 6, incorporated herein by reference. , 447,891, 7,622,161, and / or any of the DLC materials described in 8,277,946.

When the functional film 300 of FIGS. 15-17 is an augmented reality (AR) film, it is provided to reduce visible reflection from the front of the touch panel in order to make the panel more aesthetically pleasing. Will be done. Examples of AR films that can be used are US Pat. Nos. 9,556,066, 9,109,121, 8,693,097, 7,767,253, 6, 6. 337,124, and 5,891,556 of the same, the disclosures of which are incorporated herein by reference. In certain exemplary embodiments, the AR film may be part of a multilayer transparent conductive coating (see, eg, AR film 70, which is part of the coating 41'in FIG. 4 (c)).

It should be noted that in various embodiments of the invention, electrode patterns other than the rectangular arrangement of buttons can be expected to include patterns that allow swiping, circular patterns for dials, and the like. Potential applications include store, commercial refrigerators, home appliances, glass walls in offices or other environments, transportation, dynamic glazing, and vending machines, where see-through low-resolution touch panels are useful as user interfaces.

The sputter-deposited coating 41 described above in connection with FIGS. 2-10 may be formed and patterned by any of a variety of methods. For example, the sputter-deposited coating 41 can be inkjet printed and lifted off (see FIG. 11), metal shadow mask patterning (see FIG. 12), photolithography (see FIG. 13), or laser patterning (see FIG. 14). ) May be formed.

As mentioned above, it may be desirable to use laser patterning techniques to pattern silver, including coatings on the electrodes, as opposed to conventional photolithography (see, eg, FIG. 14A). is there. In certain exemplary embodiments as shown in FIGS. 3 (f) to 3 (g), the transmitting electrode (T) and the receiving electrode (R) of the silver-based mutual capacitive touch sensor, respectively. It would be desirable to arrange the sets in an XY configuration using a patterning process on the completed layer stack (see, eg, multilayer coating in FIG. 4 (h)), preferably by laser scribing. .. The problem is that defining two sets of XY electrodes (transmit and receive) provided in two parallel planes as orthogonal matrices is an electrode in the X direction without damaging the base electrodes oriented along the Y direction. Is facing the challenge of scribbling or vice versa. Therefore, in an exemplary embodiment, the two sets of electrodes (T and R) are independently patterned using different wavelengths. In another exemplary embodiment, the two sets of electrodes are patterned from different sides of the supporting glass substrate 40 using the same wavelength or at least two different wavelengths.

In certain exemplary embodiments, different electrodes on the touch panel may be formed by different silver-based layers 46 with the same or different multilayer coatings. When patterning the electrodes (T) and (R), in certain exemplary embodiments, different laser scribe wavelengths are used to apply different silver-based layers 46 of the same or different multilayer coatings (s) 41. It may be patterned. For example, when the first (for example, transmitting) electrode and the second (for example, receiving) electrode of the touch panel are overlapped with each other (see, for example, FIGS. 3 (f) to 3 (g)), the first When patterning the silver-based layer 46 on the first electrode (s), the first laser scribing wavelength may be used, and the second silver-based layer 46 is patterned on the second electrode (s). A second laser screen wavelength may be used in doing so. For example, the transmission electrode (T) of FIGS. 3 (f) to 3 (g) is laser-patterned using the first wavelength (s) and receives the reception of FIGS. 3 (f) to 3 (g). The electrode (R) may be laser patterned using a different second wavelength (s). Advantageously, the use of different wavelengths reduces damage to electrodes that are not intended to be patterned in a given procedure.

In certain exemplary embodiments, the first set of electrodes (eg, T) is on the supporting glass substrate 40, where different electrodes on the touch panel can be formed by different silver-based layers 46 of the same or different multilayer coatings 41. The second set of electrodes (eg, R) may be patterned by laser scribe from the first side, while the second set of electrodes (eg, R) may be patterned by laser scribe from the second side opposite to the supporting glass substrate 40. .. Therefore, since the transmit and receive electrodes are on the same side of the glass substrate 40, one of the two laser patterning procedures is performed through the support glass substrate 40. For example, referring to FIGS. 3 (f) to 3 (g) and FIG. 4 (h), the transmitting electrode (T) may be laser-patterned from the first side of the supporting glass substrate 40, while receiving. The electrode (R) may be laser-patterned by forming a second surface on the opposite side of the support glass substrate 40 so that the laser beam for patterning the receiving electrode (R) passes through the glass substrate 40. .. Advantageously, this technique reduces damage to electrodes that are not intended to be patterned in a given laser patterning procedure. Embodiments that include laser patterning different electrodes from both sides of a supporting glass substrate may or may not be used in combination with embodiments that pattern different electrodes using different wavelengths.

With reference to FIGS. 14 (a) to 14 (b), the upper silver layer 46 (solid line in FIG. 14 (b)) in the double silver coating as shown in FIG. 4 (h) is 800 to It was found that the absorption was more optically higher in the wavelength range of 900 nm, while the maximum absorption of the bottom silver layer 46 (dotted line in FIG. 14B) was shifted to a shorter wavelength. This distinction allows selective laser scribes of the two conductive silver layers 46 to be applied from one side (eg, above the laminate) or from both sides (eg, the upper silver is on the laminate side, bottom side). For silver, it is possible to do it from either (from the glass side). In certain exemplary embodiments, the two sets of electrodes are scribed using a laser (s) with at least two different wavelengths selected to be preferentially absorbed by each of the silver layers. It is formed. For example, the bottom silver-based layer 46 in the coating of FIG. 4 (h) is a transmission electrode of which the layer 46 is shown in FIGS. 3 (f) to 3 (g) or any other embodiment herein. Laser scribe / patterning may be performed using a laser wavelength of about 400-620 nm (more preferably about 500-600 nm) for patterning to (T). The laser patterning of the lower silver layer 46 of FIG. 4 (h) for forming the transmission electrode (T) shown in FIGS. 3 (f) to 3 (g) directly irradiates the laser beam through the glass substrate 40. It may be done by doing. On the other hand, the upper silver-based layer 46 in the coating of FIG. 4 (h) is the receiving electrode (the layer 46 shown in FIGS. 3 (f) to 3 (g) or any other embodiment of the present specification. Laser scribe / patterning may be performed using a laser wavelength of about 630-1200 nm (more preferably about 650-1100 nm, most preferably about 700-1000 nm) for patterning to R). In the laser patterning of the upper silver layer 46 of FIG. 4 (h) for forming the upper receiving electrode (R) shown in FIGS. 3 (f) to 3 (g), the laser beam is a glass substrate 40. This may be done by directing the laser beam over the coating 41 so that it reaches the silver layer 46 in front of it. Patterning different silver-based layers using different wavelengths can be advantageous in reducing damage to silver layers that are not intended to be patterned in a given patterning procedure.

In an exemplary embodiment of the invention, a method of manufacturing a capacitive touch panel is provided, wherein the capacitive touch panel is a glass substrate and a patterned multilayer transparent conductive coating supported by the substrate. The multilayer transparent conductive coating is a first conductive layer (including, for example, silver and / or NiCr), a dielectric layer positioned at least between the substrate and the first conductive layer, and at least the first conductive layer. Each of the layers of the multilayer transparent conductive coating contains a dielectric layer containing one or more of zirconium oxide, silicon nitride, and tin oxide positioned above, and is patterned in the same shape. A multilayer transparent conductive coating, a first set of electrodes, and a second set of electrodes are included, so that the first and second sets of electrodes allow the touch position to be determined. Constructed, at least some of the electrodes include a multilayer transparent conductive coating, and the method lasers a first conductive layer containing silver at a first wavelength when forming the first set of electrodes. From the side opposite to the laser beam used for patterning and (i) at a second wavelength different from the first wavelength and / or (ii) laser patterning the first conductive layer of the substrate. It involves forming a second set of electrodes by laser patterning with a laser beam.

In the method of the preceding paragraph, the patterned multilayer transparent conductive coating was positioned separately between the second conductive layer containing silver and at least the first conductive layer and the second conductive layer containing silver. The first set of electrodes and the second set of electrodes each contain a multilayer transparent conductive coating, which is different from the first wavelength. Forming the second set of electrodes by laser patterning at the second wavelength may further include laser patterning the second conductive layer containing silver at the second wavelength. The first conductive layer containing silver of the patterned multilayer transparent conductive coating may be the conductor of the first set of electrodes, and the second conductive layer containing silver of the patterned multilayer transparent conductive coating. However, it may be the conductor of the second set of electrodes.

In any of the preceding two paragraphs, the electrodes of the first set of electrodes are substantially perpendicular (vertical plus / minus 10) to the electrodes of the second set of electrodes when viewed from above. Degree) It may be oriented.

In any of the preceding three paragraphs, the first set of electrodes may be receiving electrodes and the second set of electrodes may be transmitting electrodes.

In any of the preceding four paragraphs, the transmitting electrode may have a higher sheet resistance (R _s ) than the receiving electrode, and the transmitting electrode is at least 1 ohm / □ higher than the sheet resistance of the receiving electrode. It may have sheet resistance (R _s). The transmitting electrode may have a _{sheet resistance (R s} ) that is at least 5 ohms / □ higher than the sheet resistance of the receiving electrode.

In any of the preceding five paragraphs, the method may further comprise doping the conductive layer (s) containing silver. Doping comprises doping the conductive layer (s) containing silver with one or more of about 0.05-3.0% (% by weight) Zn, Pt, Pd, Ti, and Al. But it may be.

In any of the preceding six paragraphs, the coating may further include a layer containing Ni and / or Cr in contact with the conductive layer, which is placed on top of the conductive layer containing silver.

In any of the preceding seven paragraphs, the dielectric layer containing one or more of zirconium oxide, silicon nitride, and tin oxide can optionally be doped with oxygen and / or aluminum. It may be included.

In any of the preceding eight paragraphs, the dielectric layer located at least between the glass substrate and the conductive layer containing silver may optionally contain silicon nitride which can be doped with aluminum and / or oxygen. ..

In any of the preceding nine paragraphs, the glass substrate may further support the functional film, the functional fdm being one or more of the antiglare film, the antibacterial film, and the anti-fingerprint film. It may be positioned on the opposite side of the transparent conductive coating of the glass substrate.

In any of the preceding ten paragraphs, the touch panel containing the electrodes may have a visible transmission of at least 70%.

In any of the preceding 11 paragraphs, the first wavelength may be 400-620 nm (more preferably 500-600 nm) and the second wavelength 630-1200 nm (more preferably). It may be 650 to 1100 nm).

The illustrated embodiments described above are intended to provide one of ordinary skill in the art with an understanding of the present disclosure. The above description is not intended to limit the concept of the invention described in this application, the scope of which is defined in the claims below.

Claims (49)

Capacitive touch panel
With the board
A patterned multilayer transparent conductive coating supported by the substrate, wherein the multilayer transparent conductive coating is a dielectric positioned on a first conductive layer, at least between the substrate and the first conductive layer. Each of the layers of the multilayer transparent conductive coating comprising a body layer and a dielectric layer containing at least one of zirconium oxide, silicon nitride, and tin oxide located on the first conductive layer. However, with a patterned multilayer transparent conductive coating that is patterned in the same shape,
The first set of electrodes and
The second set of electrodes,
The first and second pairs of electrodes are configured to allow the touch position to be determined, and at least some of the electrodes include the multilayer transparent conductive coating. With a set of electrodes
A processor configured to determine a touch position on the touch panel.
The processor is electrically conductive with at least some of the electrodes to determine the touch position on the touch panel.
A capacitive touch panel in which the plurality of electrodes are supported by the substrate. The patterned multilayer transparent conductive coating further comprises a second conductive layer and at least another dielectric layer positioned between the first conductive layer and the second conductive layer. The capacitive touch panel according to claim 1, wherein the first set of electrodes and the second set of electrodes each include the multilayer transparent conductive coating. The first conductive layer contains silver and / or NiCr and is the conductor of the first set of electrodes, and the second conductive layer contains silver and / or NiCr and the second. The capacitive touch panel according to claim 2, which is a conductor of a set of electrodes. Any of claims 1 to 3, wherein the electrodes of the first set of electrodes are oriented substantially at right angles to the electrodes of the second set of electrodes when viewed from above. The capacitive touch panel described in item 1. The capacitive touch panel according to any one of claims 1 to 4, wherein the electrodes in the first set are receiving electrodes, and the electrodes in the second set are transmitting electrodes. The transmission electrode has a sheet resistance (R _s) is higher than with said receiving electrode, the transmitting electrodes has at least 1 ohm / □ high sheet resistance than the sheet resistance of the receiving electrodes (R _s) , The capacitance type touch panel according to claim 5. The capacitive touch panel according to claim 6, _{wherein the transmitting electrode has a sheet resistance (R s} ) that is at least 5 ohms / □ higher than the sheet resistance of the receiving electrode. The capacitive touch panel according to claim 6, _{wherein the transmitting electrode has a sheet resistance (R s} ) that is at least 10 ohms / □ higher than the sheet resistance of the receiving electrode. The capacitive touch panel according to any one of claims 1 to 8, wherein the conductive layer contains silver and is doped. The static layer according to claim 9, wherein the conductive layer containing silver is doped with one or more of Zn, Pt, Pd, Ti, and Al of about 0.05 to 3.0% (% by weight). Capacitive touch panel. The ninth aspect of claim 9, wherein the conductive layer containing silver is doped with one or more of Zn, Pt, Pd, Ti, and Al of about 0.1 to 2.0% (% by weight). Capacitive touch panel. The capacitive touch panel according to any one of claims 1 to 11, wherein the conductive layer contains Ni and / or Cr. The capacitive touch panel according to any one of claims 1 to 12, wherein the transparent conductive coating has a sheet resistance of about 40 ohms / □ or less. The capacitive touch panel according to any one of claims 1 to 13, wherein the dielectric layer containing one or more of zirconium oxide, silicon nitride, and tin oxide contains ZrO _2. The capacitive touch panel according to any one of claims 1 to 14, wherein the dielectric layer containing one or more of zirconium oxide, silicon nitride, and tin oxide contains silicon nitride. The capacitance according to any one of claims 1 to 15, wherein the dielectric layer containing one or more of zirconium oxide, silicon nitride, and tin oxide contains silicon nitride and further contains oxygen. Type touch panel. The capacitive touch panel according to any one of claims 1 to 16, wherein the dielectric layer positioned between at least the substrate and the conductive layer contains an oxide of titanium. The capacitive touch panel according to any one of claims 1 to 17, wherein the dielectric layer positioned between at least the substrate and the conductive layer contains silicon nitride. The capacitive touch panel according to any one of claims 1 to 18, wherein the touch panel is provided on a glass door. The capacitive touch panel according to claim 19, wherein the glass door is a shower door. The capacitive touch panel according to any one of claims 1 to 20, wherein the touch panel is configured to control a shower function. The capacitive touch panel according to any one of claims 1 to 21, wherein the substrate is a heat-reinforced glass substrate. The capacitive touch panel according to any one of claims 1 to 22, wherein the glass substrate further supports a functional film. 23. The functional film is one or more of an antiglare film, an antibacterial film, and an anti-fingerprint film, and is positioned on the opposite side of the glass substrate from the transparent conductive coating. Capacitive touch panel. The capacitive touch panel according to any one of claims 1 to 24, wherein the touch panel including the electrodes has a visible transmittance of at least 70%. A method of manufacturing a capacitive touch panel, wherein a glass substrate and a patterned multilayer transparent conductive coating supported by the substrate, wherein the multilayer transparent conductive coating is a first conductive layer, at least. Includes a dielectric layer located between the substrate and the first conductive layer, and at least one or more of zirconium oxide, silicon nitride, and tin oxide located on the first conductive layer. A patterned multilayer transparent conductive coating in which each of the layers of the multilayer transparent conductive coating, including a dielectric layer, is patterned in the same shape, a first set of electrodes, and a second set of electrodes. The first and second pairs of electrodes, including the electrodes, are configured to allow the touch position to be determined, and at least some of the electrodes have the multilayer transparent conductive coating. The above-mentioned method includes
When the first set of electrodes is formed, the first conductive layer is laser-patterned with a first laser beam having a first wavelength.
A method comprising forming the second set of electrodes by laser patterning with a second laser beam having a second wavelength different from the first wavelength. The patterned multilayer transparent conductive coating further comprises a second conductive layer and at least another dielectric layer positioned between the first conductive layer and the second conductive layer. The second set of electrodes, each containing the multilayer transparent conductive coating, are laser-patterned at the second wavelength different from the first wavelength. 26. The method of claim 26, wherein the formation of the electrodes of the above comprises laser patterning the second conductive layer at the second wavelength. The first conductive layer contains silver and / or NiCr and is the conductor of the first set of electrodes, and the second conductive layer contains silver and / or NiCr and the second. 27. The method of claim 27, which is the conductor of the set of electrodes. Any of claims 26-28, wherein the electrodes of the first set of electrodes are oriented substantially at right angles to the electrodes of the second set of electrodes when viewed from above. The method described in paragraph 1. The method according to any one of claims 26 to 29, wherein the electrode in the first set is a receiving electrode and the electrode in the second set is a transmitting electrode. The transmission electrode has a sheet resistance (R _s) is higher than with said receiving electrode, the transmitting electrodes has at least 1 ohm / □ high sheet resistance than the sheet resistance of the receiving electrodes (R _s) , The method of claim 30. 30. The method of claim 30, _{wherein the transmitting electrode has a sheet resistance (R s} ) that is at least 5 ohms / □ higher than the sheet resistance of the receiving electrode. The method according to any one of claims 26 to 32, wherein the first conductive layer contains NiCr. Claimed that the first conductive layer comprises silver doped with silver having one or more of Zn, Pt, Pd, Ti, and Al of about 0.05 to 3.0% (% by weight). Item 6. The method according to any one of Items 26 to 32. The method according to any one of claims 26 to 32, wherein the first conductive layer contains doped silver. The method according to any one of claims 26 to 35, wherein the dielectric layer contains one or more of zirconium oxide, silicon nitride, and tin oxide, and also contains silicon nitride. The method according to any one of claims 26 to 36, wherein the dielectric layer containing one or more of zirconium oxide, silicon nitride, and tin oxide contains silicon nitride and further contains oxygen. The method according to any one of claims 26 to 37, wherein at least the dielectric layer positioned between the glass substrate and the conductive layer contains an oxide of titanium. The method according to any one of claims 26 to 37, wherein at least the dielectric layer positioned between the glass substrate and the conductive layer contains silicon nitride. The glass substrate further supports the functional film, the functional film being one or more of an antiglare film, an antibacterial film, and an anti-fingerprint film, as opposed to the transparent conductive coating on the glass substrate. The method according to any one of claims 26 to 39, which is positioned on the side. The method according to any one of claims 26 to 40, wherein the touch panel including the electrodes has a visible transmittance of at least 70%. The method according to any one of claims 26 to 41, wherein the first wavelength is 400 to 620 nm and the second wavelength is 630 to 1200 nm. The method according to any one of claims 26 to 42, wherein the first wavelength is 500 to 600 nm and / or the second wavelength is 650 to 1100 nm. A method of manufacturing a capacitive touch panel, wherein a glass substrate and a patterned multilayer transparent conductive coating supported by the substrate, wherein the multilayer transparent conductive coating is a first conductive layer, at least. Includes a dielectric layer located between the substrate and the first conductive layer, and at least one or more of zirconium oxide, silicon nitride, and tin oxide located on the first conductive layer. A patterned multilayer transparent conductive coating in which each of the layers of the multilayer transparent conductive coating, including a dielectric layer, is patterned in the same shape, a first set of electrodes, and a second set of electrodes. The first and second pairs of electrodes, including the electrodes, are configured to allow the touch position to be determined, and at least some of the electrodes have the multilayer transparent conductive coating. The above-mentioned method includes
Laser patterning of the first conductive layer with a first laser beam directed from the first side of the substrate, and
The second set of electrodes is formed by laser patterning from the second side of the substrate with a second laser beam, and the first and second sides of the substrate are opposite to each other. A method, including forming and forming. 44. The method of claim 44, wherein the first and second laser beams have different wavelengths. The patterned multilayer transparent conductive coating further comprises a second conductive layer and at least another dielectric layer positioned between the first conductive layer and the second conductive layer. The second set of electrodes can form the second set of electrodes by laser patterning, wherein each of the first set of electrodes and the second set of electrodes contains the multilayer transparent conductive coating. 43 or 44. The method of claim 43 or 44, comprising laser patterning the. The first conductive layer of the patterned multilayer transparent conductive coating is the conductor of the first set of electrodes, and the second conductive layer of the patterned multilayer transparent conductive coating is the first. 46. The method of claim 46, which is a conductor of two sets of electrodes. Any of claims 44-47, wherein the electrodes of the first set of electrodes are oriented substantially at right angles to the electrodes of the second set of electrodes when viewed from above. The method described in paragraph 1. 48. The method of claim 48, wherein the first set of electrodes is a receiving electrode and the second set of electrodes is a transmitting electrode.

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