JP2021503926A - How to operate a pasteurizer and pasteurizer - Google Patents

Abstract

The present invention relates to a method of operating a pasteurization device and a pasteurization device for pasteurizing food in a sealed container. The pasteurizer is a transport system for transporting a sealed container filled with food through a treatment area and a treatment area configured to heat the food in a container having at least one heating zone. And irrigation means configured to distribute the temperature controlled treatment liquid into at least one heating zone. The pasteurizer further comprises at least one feed device configured to introduce at least one treatment chemical for container treatment into the treatment area in a gaseous or aerosolized state.

Description

Pasteurization of foods is commonly used in the food manufacturing industry to extend the shelf life of foods. A widely used pasteurization method is to heat food to a high temperature for a predetermined period of time. Often, food is filled into containers prior to pasteurization and the containers are sealed. Food-filled and sealed containers undergo temperature treatment for pasteurization. Typically, this is done by treating the vessel with the temperature controlled treatment in the treatment area, for example by distributing or spraying the temperature controlled aqueous treatment on the vessel in various heating and cooling zones of the treatment area. Will be implemented.

The treated liquid or treated water is usually reused to continuously heat and cool the vessel in order to minimize the need for fresh water and to improve the energy efficiency of the pasteurizer. In such continuous reuse of the treatment liquid, it is not possible to prevent particles and soluble contaminants from being mixed into the treatment liquid. This includes a group of microorganisms that constantly enter and grow in the treatment solution. It is known to mix chemicals into the treatment fluid to keep it usable and to stabilize it. Such chemicals can include, for example, biocides or other chemicals that are useful for keeping the biocide or treatment solution low to keep the microbial community low. Other chemicals are used, for example, to control the hardness of water or the pH value of the treatment solution.

It is also known to use chemicals to process the container itself in the processing area of the pasteurizer. Such chemicals can include, for example, detergents or biocides. Other chemicals can be used to prevent discoloration or fading on the outside of the container during treatment with the treatment solution. As is known, metal surfaces, especially aluminum surfaces, show a marked tendency to discolor or stain when exposed to hot aqueous solutions for extended periods of time. Such fading does not impair the functionality of the container in principle, but customers may be reluctant to purchase such a faded product because it feels unattractive in appearance or of poor quality. There are many. Since many containers for food storage contain metal surfaces such as aluminum cans or bottles with screw lids made of metallic material, such fading can result in large quantities of products with little or no commercial utility. Occurs.

Chemicals for processing the container itself are also mixed into the processing solution today and transported by the processing solution to the processing area of the pasteurizer. Within the treatment area, this type of chemical can be vaporized, for example, by high temperatures in the treatment area or by other chemicals, such as stronger acids used to expel weaker treatment acids from the treatment solution.

However, transporting the treatment chemicals into the treatment area of the pasteurizer using the treatment liquid for container treatment may cause the treatment chemicals to interfere with other chemical compounds in the treatment liquid, etc. , Causes problems related to the chemical composition of the treatment solution itself. Further, the inclusion of a large number and large amounts of chemicals in the pasteurizing fluid also causes problems associated with the components of the pasteurizer or the containers that are temperature treated in the pasteurizer. This is because both the components and containers of the pasteurizer can be harmed by exposure to treatment solutions containing large amounts of chemicals. Overall, the management and handling of chemicals in pasteurizers is difficult with the methods applied today.

An object of the present invention is to provide an improved method for operating a pasteurization device that can more efficiently manage chemicals in the pasteurization device, and to provide a corresponding pasteurization device.

The above objectives are achieved by the method of operating the pasteurizer.

The method of operating the pasteurizer includes a first operating condition. In the first operating condition, the sealed container filled with food is transported through a processing area having at least one heating zone. Under the first operating condition, the food is heated and pasteurized in at least one heating zone by distributing the temperature controlled treatment liquid onto the container. Under the first operating condition, at least most of the treatment liquid from the treatment area is returned to the treatment area in a closed loop circuit for reuse.

The method further comprises introducing at least one treatment agent for container treatment into the treatment area by the feed device in a gaseous or aerosolized state on demand under any operating conditions of the pasteurizer.

With these treatments, at least one treatment chemical for container treatment can be transferred directly to the application site without having to be transported by the treatment liquid. Therefore, the number and amount of chemicals in the treatment liquid can be reduced, which allows better control of the chemical composition of the treatment liquid itself. In particular, it is possible to avoid unwanted interference of the processing chemicals with other chemicals in the processing liquid.

In addition, the components of the container and the pasteurizer itself, especially those within the treatment area, are better protected as they are prevented from long-term contact with treatment liquids containing large numbers of chemicals. As a result, damage to the components is prevented and the intervals between cleaning or maintenance of the components of the pasteurizer are at least extended.

Further, since it is not necessary to mix the processing chemicals in an amount exceeding the amount actually required in the processing liquid, the total amount of the processing chemicals for container processing can be reduced as compared with the prior art. When transported by the treatment liquid to the treatment area according to the prior art, an excessive amount of treatment chemicals is required because only a part of the treatment liquid is in the treatment area at a given time. By introducing at least one treatment solution into the treatment area in a gaseous or aerosolized state with a feed device, the amount of at least one treatment chemical can be better controlled and more precisely adjusted to the actual required amount. In this way, employee health recommendations or requirements, such as maximum permissible concentration (MAC) values or similar recommendations or requirements, can be better met.

By explicit measures, the introduction of at least one treatment chemical into the treatment area can also be carried out under operating conditions of the pasteurizer where the treatment liquid is not distributed to at least one heating zone in the treatment area.

Therefore, the introduction of treatment chemicals into the treatment area is possible under any operating conditions of the pasteurization plant. This is useful in operating conditions where, for example, due to a failure, the transport means for transporting the container through the treatment area and the distribution of the treatment liquid to the treatment area have stopped. In such a case, the container staying in the environment in the treatment area for a long time may cause unfavorable changes to the container such as fading of the metal surface. With the treatment given, such undesired changes can be prevented under any operating conditions of the pasteurization plant. At least one treatment chemical dissolves in the treatment liquid in the treatment area after container treatment.

In one embodiment of the method of operating a pasteurizer, at least one treatment agent is introduced into the treatment area by a carrier gas stream. This measure provides a convenient mode for introducing at least one treatment agent into the treatment area. The carrier gas allows at least one treatment agent to be distributed in the treatment area in a diluted form.

In another embodiment, it may be convenient for at least one treatment agent to be vaporized prior to introduction into the treatment area. This procedure also allows non-gaseous treatment chemicals under standard temperature and pressure conditions (STP) to be introduced into the treatment area in a vaporized state.

In one embodiment of the method, at least one treatment agent can be vaporized into the carrier gas prior to introduction into the treatment area and then introduced into the treatment area by the carrier gas. This embodiment makes it possible to introduce particularly small amounts of treatment chemicals into the treatment area. Further, the amount of the processing chemical introduced into the processing area can be controlled with high accuracy.

It may also be convenient for the vaporization to be carried out or supported by a heating device. In this way, a larger amount of processing chemicals can be introduced into the processing area more quickly.

In one embodiment of the method, vaporization is carried out or supported by applying a vacuum. Carrying out or supporting vaporization by applying a vacuum is an efficient mode for vaporizing the treating chemicals or supporting the vaporization of the treating chemicals. In general, this variant makes it possible to better control the amount of processing chemicals introduced into the processing area, allowing a very small amount to be vaporized and introduced into the processing area of the pasteurizer. Further, high temperature sensitive treatment chemicals can be efficiently vaporized in this way and the decomposition of this type of chemical can be prevented.

In another embodiment, at least one treatment agent may be atomized into the treatment area, or at least one treatment agent may be atomized by an aerosolizer prior to introduction into the treatment area. it can. In this way, at least one treatment chemical can be introduced into the treatment area with high energy efficiency.

In a preferred embodiment, the amount of at least one treatment agent introduced into the treatment area can be controlled by at least one weighing device. This makes it possible to precisely control the amount of processing chemicals introduced into the processing area. The at least one weighing device can be, for example, positive displacement, and the weighing of the treated chemicals can be performed, for example, by controlling the flow rate of the treated chemicals or by measuring the absolute volume of the treated chemicals for introduction into the treated area. ..

In another embodiment, at least one treatment agent can be introduced into the treatment area under the second operating condition, under the second operating condition the transport of the container and the distribution of the temperature controlled liquid onto the container are stopped. Has been or has been stopped. This embodiment is particularly useful for preventing unwanted changes to the container, such as fading or stains on the container, for example in the event of termination of pasteurization due to failure. Advantageously, at least one treatment agent can be introduced into the treatment area even if the distribution of the treatment liquid onto the container in the treatment area is stopped.

In one embodiment of the method, a sealed container containing a metallic material outside the container is transported through the treatment area under first operating conditions. In a more specific embodiment, a container containing aluminum on the outside can be transported through the treatment area.

In another embodiment, the at least one treatment agent introduced into the treatment area can contain a volatile carboxylate.

In a more specific embodiment, the at least one treatment agent introduced into the treatment area may include formic acid or acetic acid. These treatment chemicals have proven to be effective in preventing fading or stains on metallic materials, especially aluminum, including containers in pasteurizers.

In another embodiment of the method, at least in the first operating condition, a portion of the treatment fluid is continuously withdrawn from the closed loop circuit every unit time and by a thin film filtration device and then by an ion exchange device and / or Purified by the absorber, the purified treatment liquid is returned to the treatment area. Such a procedure is particularly useful for keeping the treatment solution free of particles containing microorganisms and removing soluble chemicals from the treatment solution. In this way, the amount of particles, microorganisms and soluble chemicals in the treatment can be kept low, thereby protecting the components of the container and pasteurizer. The removal of soluble chemicals does not interfere with the addition of treatment chemicals, as the method involves introducing the treatment chemicals into the treatment area in a gaseous or aerosolized state by means of a feed device. The dissolved soluble chemicals removed may contain treatment chemicals dissolved in the treatment liquid after container treatment, with dissolution occurring in the temperature treatment zone, especially when the treatment liquid is at relatively low temperatures. Advantageously, removing the particles prior to removal of the soluble chemicals protects the ion exchanger and / or absorption device from contamination by the particles.

An object of the present invention is also solved by providing a pasteurization apparatus for pasteurizing food in a sealed container.

The pasteurizer comprises a treatment area configured to temperature-treat the container in at least one heating zone and a transport system for transporting the sealed container filled with food through the treatment area. The pasteurizer further includes irrigation means configured to distribute the temperature-controlled treatment liquid into at least one heating zone and the treatment liquid returned from the treatment area to the treatment area for reuse. It comprises a configured closed loop circuit.

In addition, the pasteurizer comprises at least one feed device configured to introduce at least one treatment chemical for container treatment into the treatment area in a gaseous or aerosolized state.

These features allow the processing chemicals for container processing to be introduced into the processing area on demand under any operating conditions. The processing chemicals for container processing can be directly transferred to the place of application without the need for transportation by the processing liquid.

This makes it possible to better protect the container when the pasteurizer is in operation, as it can prevent long-term contact with treatment solutions containing large numbers of chemicals when the pasteurizer is in operation. And it makes it possible to better protect the components of the pasteurizer itself.

The possibility of introducing at least one treatment agent into the treatment area in a gaseous or aerosolized state by the feed device allows better control over the amount of at least one treatment agent introduced and is a real need. Allows for more precise adjustment to suit. In this way, recommendations or requirements regarding employee health, such as maximum permissible concentration (MAC) values or similar recommendations or requirements, can be better met.

In one embodiment of the pasteurizer, the feed device may be provided with means for generating carrier gas so that the feed device transports at least one treatment agent into the treatment area by a carrier gas stream. It is composed of.

This feature allows the processing chemicals to be introduced into the processing area by a carrier gas stream.

Another embodiment of the pasteurizer may include the feed device being configured to pass a vaporization space containing at least one treatment agent and then guide the carrier gas into the treatment area. The vaporization space accommodating at least one chemical may be, for example, a vaporizer provided with means for assisting the vaporization of at least one treatment agent, or simply a reservoir accommodating at least one treatment agent. In this way, at least one treatment chemical can be vaporized into the carrier gas prior to introduction into the treatment area and then introduced into the treatment area by the carrier gas.

In yet another embodiment, the feed device may include a heating device configured to vaporize at least one treatment agent or to assist in the vaporization of the treatment agent. Due to these characteristics, at least one treatment chemical is vaporized and introduced directly into the treatment area in a gaseous state, or, for example, the vaporization of at least one treatment chemical into a carrier gas is carried out by using a heating device. Can be supported.

In another embodiment of the pasteurizer, the feed device may include a vacuum device configured to vaporize at least one treatment agent or to assist in vaporization of at least one treatment agent. This feature makes it possible to vaporize or assist vaporization of at least one treatment agent by providing a vacuum. In particular, higher temperature sensitive treatment chemicals can be efficiently vaporized in this way and prevent decomposition of the treatment chemicals.

It is also useful to have at least an aerosolizing means in which the feeding device is configured to atomize at least one treatment agent into the treatment area. Such aerosolizing means can be, for example, spray nozzles arranged in or within the treatment area. By such an aerosolizing means, the processing chemicals can be atomized directly into the processing area of the pasteurizer.

In a variant of the pasteurizer, the feed device may include an aerosolizing device configured to atomize at least one treatment agent prior to introduction into the treatment area. Such an aerosolizing device can be, for example, a vibrating or rotary or ultrasonic atomizer.

In a preferred embodiment of the pasteurizer, the feed device may include at least one weighing device configured to control the amount of processing chemicals introduced into the processing area. This feature makes it possible to precisely control the amount of processing chemicals introduced into the processing area. The at least one weighing device can be, for example, a positive displacement type, and weighing of the processing chemical can be performed, for example, by controlling the flow rate of the processing chemical or by measuring the absolute volume of the processing chemical for introduction into the processing area. .. The weighing device may be configured to weigh a liquid processing chemical or a gas already vaporized processing chemical. If the weighing device is configured to weigh the gaseous processing chemicals, the weighing device can be, for example, a mass flow controller.

In another embodiment, the feed device may include feed holes arranged in different temperature treatment zones of the treatment area. These features allow at least one treatment agent to be introduced into different temperature treatment zones, such as heating zones, pasteurization zones and cooling zones, on demand.

In addition, it may be useful to associate at least one blocking device with one feed hole or a group of feed holes. These features allow at least one treatment agent to be introduced into the specific zone of the pasteurizer on demand. One treatment agent may be introduced, for example, into a zone of potential fading of a container containing a metallic material, and the other temperature treatment zone of pasteurization may not be supplied with the corresponding treatment agent.

In another embodiment of the cryosterizer, the thermosterilizer is configured with at least one removal means configured to remove a portion of the treatment liquid from the closed loop circuit every unit time and a portion of the treatment liquid removed. A purification device including a thin film filtration device configured to purify the amount, an ion exchange device and / or an absorption device downstream of the thin film filtration device, and a purification device configured to return the purified treatment liquid into the treatment area. And at least one return means can be provided. During normal operation of the pasteurizer, a portion of the treatment liquid is continuously removed from the closed loop circuit and purified by a thin film filtration device and then by an ion exchange device and / or an absorption device, and the purified treatment liquid is It can be returned to the processing area.

For better understanding, the invention will be described in more detail below with reference to the accompanying drawings.

The accompanying drawings are simplified schematic views.

It is one exemplary embodiment of a pasteurizer. It is one exemplary embodiment of a feed device configured to introduce at least one treatment agent in a gaseous state into the treatment area of the pasteurizer. It is another exemplary embodiment of a feed device configured to introduce at least one treatment agent in a gaseous state into the treatment area of the pasteurizer. It is another exemplary embodiment of a feed device configured to introduce at least one treatment agent in a gaseous state into the treatment area of the pasteurizer. Another exemplary embodiment of a feed device comprising an aerosolizing means. Another exemplary embodiment of a feed device comprising an aerosolizing means.

First, the same parts described in different embodiments are given the same reference number and the same component name, and the disclosure made throughout the description is semantically replaced with the same part having the same reference number or the same component name. it can. Further, the positions selected for illustration, such as top, bottom, sides, etc., are relevant to the drawing and can be replaced with new positions in terms of meaning when another position is described.

FIG. 1 schematically shows an exemplary embodiment of a pasteurization apparatus 1 for pasteurizing food in a sealed container 2. The pasteurization apparatus 1 is configured as a so-called tunnel type pasteurizer, and includes a processing area 3 configured to temperature-treat the container in at least one heating zone 4. The processing area 3 of the pasteurization apparatus 1 shown as an example in FIG. 1 includes a second heating zone 5 for further heating food, two heating zones 6 and 7 for pasteurizing the food in the container 2, and It has two cooling zones 8 and 9 for cooling food. Of course, depending on the need or purpose, the pasteurizer 1 can include more or less zones 3, 4, 5, 6, 7, 8 and 9 as compared to the exemplary embodiment shown in FIG. is there. Similarly, it is possible to set up a further processing zone in the processing area 3. For example, a zone for drying the outer surface of the container 2 can be installed after the final cooling zone 9. For the sake of clarity, another design of such a pasteurizer will not be described. Those skilled in the art will appreciate that the present invention embraces another design of such a pasteurizer or treatment area.

The example of the pasteurization apparatus 1 shown in FIG. 1 includes a transport system 10 for transporting a sealed container 2 filled with food through a processing area 3 in a transport direction 11. The transport system can include, for example, a conveyor belt that allows liquids and gases to permeate. The pasteurization apparatus 1 further includes an irrigation means 12 configured to distribute the temperature-controlled treatment liquid into the temperature treatment zones 4, 5, 6, 7, 8 and 9 of the treatment area 3. The irrigation means 12 can be, for example, a technically known sprinkler or shower device configured to distribute each temperature control treatment liquid onto the container 2.

Under the first or normal operating conditions of the exemplary pasteurizer 1 shown in FIG. 1, the food-filled sealed container 2 comprises a processing area 3 including heating zones 4, 5, 6, 7 and cooling zones 8, 9. It is transported through. In the embodiment shown in FIG. 1, the food is heated and pasteurized in the two heating zones 6 and 7 by distributing the temperature-controlled treatment liquid onto the container 2. A sufficiently high temperature is selected for the treatment liquid distributed on the container 2 in the heating zones 6 and 7 for pasteurizing the food. These heating zones 6 and 7 can also be referred to as pasteurization zones 6 and 7. In an exemplary embodiment of the pasteurization apparatus 1 shown in FIG. 1, the food in the container 2 is heated under control in heating zones 4 and 5 prior to pasteurization in heating zones 6 and 7. Typically, the temperature of the treatment liquid distributed to the preheating zones 4 and 5 rises from the heating zone 4 toward the heating zone 5. After the temperature treatment in the heating zones 4, 5, 6 and 7, the food in the container 2 is controlled by distributing a treatment liquid at a temperature sufficiently low to cool the container 2 in the cooling zones 8 and 9. Cooled under.

After crossing the respective temperature treatment zones 4, 5, 6, 7, 8 and 9, the treatment liquid can be collected in the bottom area 13 of the treatment zones 4, 5, 6, 7, 8 and 9 and the treatment area. At least most of the treatment liquid from 3 is returned to the treatment area 3 for reuse. To this end, the pasteurizer 1 includes a closed loop circuit 14 configured to return the treatment liquid from the treatment area 3 to the treatment area 3 for reuse. In order to reuse the treatment liquid, the pasteurization device 1 is a treatment liquid collected in the bottom area 13 of the temperature treatment zones 4, 5, 8 and 9, as shown as an example of the pasteurization device 1 shown in FIG. Can be provided with a recovery line 54 arranged to transport directly to different pasteurization zones 4, 5, 8 and 9. Under the first operating condition, at least a part of the treatment liquid from the bottom area 13 of the final cooling zone 9 can be transferred to, for example, the first heating zone 4 and vice versa. Such recovery of the treatment liquid is an example shown in FIG. 1, since the temperature of the treatment liquid decreases when the container 2 is heated in the heating zones 4 and 5, and increases when the container 2 is cooled in the cooling zones 8 and 9. In the case of the pasteurization apparatus 1 shown as, it is particularly significant. A circulation device 15, such as a circulation pump, can be used to deliver the treatment fluid in the closed loop circuit 14 as shown in FIG.

The portion of the relatively high temperature treatment liquid collected in the bottom area 13 can be transferred to, for example, the high temperature collection tank 16 of the pasteurization apparatus 1. The portion of the relatively low temperature treatment liquid collected in the bottom area 13 can be transported to the low temperature collection tank 17. The treatment liquids in the hot and cold collection tanks 16 and 17 are used to set or adjust the temperature of the treatment liquids supplied into the individual temperature treatment zones 4, 5, 6, 7, 8 and 9. it can. For this purpose, on the input side, each of the circulation devices 15 can be connected to the high temperature and low temperature collection tanks 16 and 17 via the throttle valve 18 as shown in the embodiment of FIG. In this way, the treatment liquids from the high temperature collection tank 16 and the low temperature collection tank 17 are controlled from the high temperature and low temperature collection tanks 16 and 17 in the closed loop circuit 14 in order to control the temperature of the flow of the treatment liquid. By adding a predetermined amount of treatment liquid, it can be used to supply one of the individual temperature treatment zones 4, 5, 6, 7, 8 and 9 of the pasteurizer 1.

In the pasteurization apparatus 1, a heating means 19 can be installed to heat the treatment liquid, and a cooling means 20 can be installed to cool the treatment liquid. Both the heating means 19 and the cooling means 20 can be, for example, a heat exchanger, in which case the primary sides of the heat exchangers 19 and 20 are a heating device (not shown) and a cooling device (not shown), respectively. Can be connected with. For example, a steam generator can be used as a heating device and an air or water cooling tower can be used as a cooling device. Alternatively or in addition, heat pumps can be used as heating and cooling devices.

As shown in FIG. 1, the pasteurizer 1 comprises at least one feed device 21 configured to introduce at least one treatment chemical for container treatment into the treatment area 3 in a gaseous or aerosolized state. Be prepared. The feed device 21 allows at least one processing chemical for container processing to be introduced into the processing area 3 in a gaseous or aerosolized state. The introduction of the treatment chemicals into the treatment area 3 is irrelevant to whether or not the treatment liquid is distributed to the temperature treatment zones 4, 5, 6, 7, 8 and 9 of the treatment area 3, so that the temperature is low based on the requirement. It can be carried out under any operating conditions of the sterilizer 1.

The feed device 21 may include, for example, a reservoir 22 that houses the processing chemicals. The treatment chemical can be a gas that is under standard temperature and pressure (STP). In such cases, the gas treatment chemicals can be introduced directly from the corresponding reservoir 22 into the treatment area 3, for example in pure form or diluted with carrier gas. However, in many cases, the suitable treatment chemicals are not gases under STP conditions, so the feed device 21 can be provided with means for vaporizing or aerosolizing the treatment chemicals. Such an embodiment of the feed device 21 provided with means for vaporizing or aerosolizing such processing chemicals will be described below with reference to the drawings.

Regardless of this, the feed device 21 has the feed holes 23 arranged in or in the various temperature treatment zones 4, 5, 6, 7, 8, 9 of the treatment area 3 and the respective temperatures of the treatment area 3. A feed line 24 for supplying at least one treatment chemical to the feed hole 23 for introducing at least one treatment chemical into the treatment zones 4, 5, 6, 7, 8 and 9 can be provided. .. Further, at least one shutoff device 25 is provided with one feed hole so that at least one treatment chemical is introduced only into, for example, predetermined temperature treatment zones 4, 5, 6, 7, 8 and 9 of the pasteurizer 1. It can be combined with 23 or a group of feed holes 23. The shutoff device 25 shown in FIG. 1 can be, for example, an on-off valve or a throttle valve.

In the embodiment shown in FIG. 1, the feed holes 23 are arranged in all or in all of the temperature treatment zones 4, 5, 6, 7, 8 and 9 so that the treatment chemicals can be supplied to the entire treatment area 3. To. In another embodiment, the feed holes 23 can be arranged only in or within the predetermined temperature treatment zones 4, 5, 6, 7, 8, 9. The feed holes 23 can be arranged below the permeable conveyor belt 10 in the treatment area 3, for example, to introduce the gas or aerosolization treatment chemicals into the area below the container 2. Other arrangements of the feed holes 23 (eg, arrangements that allow at least one treatment agent to be added to the container 2 from multiple sides) are also possible.

FIG. 2 is a schematic view showing in more detail an embodiment of a feed device 21 for introducing at least one processing chemical in a gaseous state into the processing area 3. The same reference numbers and component names are used in FIG. 2 to refer to the same parts described above in connection with FIG. In order to avoid unnecessary repetition, the more detailed description of FIG. 1 shown above can be referred to. As shown in FIG. 2, the feed device 21 can include means 26 for generating a carrier gas flow. In the exemplary embodiment shown in FIG. 2, the feed device 21 is configured to transport at least one treatment chemical into the treatment area 3 by a carrier gas stream.

The means 26 for generating the carrier gas flow can be, for example, a pressure vessel 27 filled with carrier gas and provided with a throttle valve 28. The carrier gas in the pressure vessel can be air or an inert gas such as nitrogen or argon. Alternatively, as shown by the dashed line in FIG. 2, a small electric fan 29 or any other air flow generating means can be used to generate the carrier gas flow. Due to the characteristics of the exemplary embodiment of the feed device 21 shown in FIG. 2, at least one treatment chemical can be introduced into the treatment area 3 by a carrier gas stream.

If at least one treatment agent is not a gas under STP conditions, at least one treatment agent can be vaporized prior to introduction into the treatment area 3. For example, at least one treatment chemical can be vaporized into the carrier gas before being introduced into the treatment area 3, and then can be introduced into the treatment area 3 by the carrier gas. An embodiment of the feed device 21 shown in FIG. 2 is configured to pass through a vaporization space 30 containing at least one processing chemical and then guide the carrier gas into the processing area 3.

For this purpose, at least one processing chemical can be pumped from the reservoir 22 into the vaporization space 30 of the vaporizer 31 by, for example, the liquid pump 32. The feed device 21 can be configured to guide the carrier gas through the liquid processing chemicals so that the vaporizer 31 is configured as a once-through vaporizer in this case. Alternatively, the feed device 21 can be configured to guide the carrier gas through the gas space and above the liquid processing chemicals so that the vaporizer 31 is configured as a surface vaporizer. As shown in FIG. 2, the feed device 21 may include a heating device 33 to support the vaporization of at least one chemical into the carrier gas.

In another embodiment, shown by the dashed line in FIG. 2, the feed device 21 can be configured to pass the vaporization space 30 of the reservoir 22 containing the processing chemicals and directly guide the carrier gas. In this case, the reservoir 21 is configured as the vaporizer 31 itself. In any case, the carrier gas is guided through the vaporization space 30, at least one processing chemical is vaporized into the carrier gas, and the carrier gas saturated with the processing chemical is then transferred to the feed line 24 and It is introduced into the processing area 3 through the feed hole 23.

In the case of the exemplary embodiment of the feed device 21 shown in FIG. 2, the amount of processing chemicals introduced into the processing area 3 is, in principle, by engaging with the liquid pump 32 for a predetermined time and / or carrier gas. It can be controlled manually or automatically by engaging with the flow. Preferably, the amount of processing chemicals introduced into the processing area 3 is automatically controlled by at least one weighing device 34. As an example, the feed device 21 shown in FIG. 2 includes at least one weighing device 34 configured to control the amount of processing chemicals introduced into the processing area 3.

In the exemplary embodiment shown in FIG. 2, at least one weighing device 34 can be, for example, a mass or volumetric gas flow controller 35. In this case, the concentration of the processing chemical in the carrier gas stream after passing through the vaporization space 30 can be measured by an appropriate measuring device in principle, or the carrier gas passing through the vaporizer 31 is known. It can be calculated in advance by using the temperature and known throughput. With such a gas flow controller 35, the amount of processing chemicals introduced into the processing area 3 can be controlled by the amount of carrier gas introduced into the processing area 3.

FIG. 3 shows another embodiment of a feed device 21 configured to introduce at least one processing chemical for container processing into the processing area 3 in a gaseous state. The same reference numbers and component names are used in FIG. 3 to refer to the same parts as described above in connection with FIGS. 1 and 2. More detailed description of FIGS. 1 and 2 above can be referred to in order to avoid unnecessary repetition.

The embodiment shown in FIG. 3 also includes a reservoir 22 and means 26 for generating a carrier gas stream. The exemplary feed device 21 shown in FIG. 3 includes a vaporizer 36 for vaporizing at least one processing chemical. In the embodiment shown in FIG. 3, a limited amount of liquid processing chemicals is supplied from the reservoir 22 into the vaporizer 36 by the weighing device 34. The weighing device 34 can be a liquid weighing pump 37 such as a small piston weighing pump or a peristaltic pump. The liquid treatment chemical is vaporized in the vaporizer 36 by, for example, the heating device 33, or the heating means 33 is the carrier gas flow in the vaporizer 36 before being introduced into the treatment area 3 by the carrier gas stream. It can be used to support the vaporization of the processing chemicals inside.

As shown in FIG. 3, the feed device 21 can include a vacuum device 38 configured to vaporize at least one treatment chemical or to assist in vaporizing at least one treatment chemical. Vaporization of at least one treatment agent can be performed or assisted by providing a vacuum in this way. The feed device 21 may include a shutoff device 25 to allow or prevent carrier gas from flowing through the vaporizer 36. As can be seen from FIG. 3, the vaporizer 36 can be cut off from the means 26 for generating the carrier gas and from the treatment area 3. When the shutoff device 25 is in the closed position, a predetermined amount of liquid processing chemicals can be introduced from the reservoir 21 into the vaporizer 36. The liquid treatment chemicals can then be vaporized in the vaporizer 36 by the vacuum device 38 or by the heating device 33, or by both the vacuum device 38 and the heating device 33.

After vaporizing the processing chemicals, the shutoff device 25 can be opened so that the carrier gas can flow through the vaporizer 36 and carry the vaporized processing chemicals to the processing area 3. The shutoff device 25 can also be configured as a gas flow controller 35 to provide means for controlling the amount of carrier gas and treatment chemicals introduced into the treatment area 3 per unit time.

FIG. 4 shows another example of a feed device 21 configured to introduce at least one processing chemical for container processing into the processing area 3 in a gaseous state. The same reference numbers and component names are used in FIG. 4 to refer to the same parts as described above in connection with FIGS. 1-3. In order to avoid unnecessary repetition, the more detailed description of FIGS. 1 to 3 shown above can be referred to.

FIG. 4 shows an embodiment suitable for introducing a relatively large amount of a treatment chemical in a gaseous state into the treatment area 3 per unit time. The feed device 21 includes a storage device 22 for liquid processing chemicals and a vaporizer 36 having a heating device 33 for vaporizing the liquid processing chemicals. In the embodiment shown in FIG. 4, no carrier gas stream is used to introduce the treatment chemical into the treatment area 3. The processing chemical is directly vaporized in the vaporizer 36 and enters the processing area 3 in a gaseous state due to the high pressure generated by the vaporizer 36.

FIG. 5 shows an example of a feed device 21 configured to introduce at least one processing chemical for container processing into the processing area 3 in an aerosolized state. The same reference numbers and component names are used in FIG. 5 to refer to the same parts as described above in connection with FIGS. 1-4. In order to avoid unnecessary repetition, the more detailed description of FIGS. 1 to 4 shown above can be referred to.

As shown in FIG. 5, the feed device 21 can include at least one aerosolizing means 39 configured to atomize at least one treatment chemical into the treatment area 3. The aerosolizing means 39 can include a spray or spray nozzle 40. A controlled amount of processing chemicals can be pumped from the reservoir 22 into the buffer reservoir 41, for example, by a weighing device 34 (eg, a liquid weighing pump 37). The treatment chemicals can then be supplied, for example, by a high pressure pump 42 through a spray or spray nozzle 40 and atomized into the treatment area 3. Alternatively or additionally, the spray nozzle 40 can be connected to a pressurized gas or air source such as the compressor 43 shown in FIG. Aerosolation can be carried out or supported by pressurized gas or air. In the design of the feed device 21 shown in FIG. 5, at least one treatment chemical can be atomized into the treatment area 3.

As also shown in FIG. 5, the feed device 21 may also include a reservoir 44 for auxiliary substances to assist in atomization of the processing chemicals. In this case, the buffer vault 41 can be configured as a mixing unit 45 for mixing the treatment chemicals with an auxiliary substance and then atomizing the mixture into the treatment area 3 by spraying or spray nozzle 40. The auxiliary substance can be, for example, water.

FIG. 6 shows another example of a feed device 21 configured to introduce at least one processing chemical for container processing into the processing area 3 in an aerosolized state. The same reference numbers and component names are used in FIG. 6 to refer to the same parts as described above in connection with FIGS. 1-5. In order to avoid unnecessary repetition, the more detailed description of FIGS. 1 to 5 shown above can be referred to.

As shown in FIG. 6, the feed device 21 may include an aerosolizing device 46 configured to atomize at least one treatment chemical prior to introduction into the treatment area 3. The liquid processing chemicals from the reservoir 22 can be pumped into the aerosolizing device 46 by the weighing device 34 (for example, the liquid measuring pump 37 shown in FIG. 6). The treatment chemical is then aerosolized in the aerosolizing apparatus 46 and can be introduced into the treatment area 3 in an aerosolized state by, for example, the carrier gas flow generated by the carrier gas flow generating means 26. The aerosolizing device 46 can be, for example, a vibrating or rotary or ultrasonic atomizer. In the design of the feed device 21 shown in FIG. 6, at least one treatment chemical can be atomized by the aerosolizing device 46 prior to introduction into the treatment area 3.

Regardless of the structural and technical design of the feed device 21, at least one treatment agent can be introduced into the treatment area 3 under the second operating condition. The second operating condition is a condition in which the transportation of the container 2 and the distribution of the temperature-controlled liquid to the container 2 are stopped or stopped. In the second operating condition, the vessel 2 has a long residence time in the treatment area 3, which can cause undesired changes to the vessel 2. This is because the container 2 is exposed to the vapor of the treatment liquid and the condensate for a long time.

In the reservoir 22, at least one treatment agent can be prepared in pure form or dissolved in a solvent. In principle, the treatment chemicals can be prepared in the reservoir 22 in a diluted or concentrated solution. Different solvents can be used depending on the type of chemical to be treated. The solvent can be, for example, water so that an aqueous solution of the treatment chemical can be prepared in the reservoir 22. When the treatment chemical is prepared by dissolving it in a solvent, at least a part of the solvent can be introduced into the treatment area 3 in a gas or aerosolized state. Preferably, at least one treatment agent is prepared in the reservoir 22 in pure form or in concentrated solution.

Under the first operating condition, the sealed container 2 containing the metal material outside the container 2 is transported, for example, through the processing area 3. In particular, there is a possibility that the container 2 containing aluminum outside may be transported through the processing area 3. In such a case, fading or stains on the outer surface of the container 2 may occur when the transportation of the container 2 passing through the processing area 3 is stopped or stopped under the second operating condition. The transportation of the container 2 may be stopped due to, for example, a failure of the transportation system 10.

In order to prevent such fading of the metal surface, it is useful that at least one treatment chemical introduced into the treatment area 3 contains a volatile carboxyl acid. Such a volatile organic acid can be introduced into the treatment area 3 in a gas or aerosolized state by the feed device 21 according to the embodiment shown in FIGS. 2 to 6 and described above. At least one treatment chemical introduced into the treatment area 3 to prevent fading of the metal surface can include formic acid or acetic acid. This is because these treatments have proven to be effective for this purpose.

FIG. 1 shows another embodiment of the present invention. As can be seen from FIG. 1, the pasteurizer 1 can include at least one removing means 47 configured to remove a partial amount of the treatment liquid from the closed loop circuit 14 every unit time. Such a removing means 47 may include, for example, a T-shaped connecting portion and a liquid flow rate control valve 48, as shown in FIG. Further, as shown in FIG. 1, the low temperature sterilizer 1 includes a thin film filtration device 50 configured to purify a partial amount of the removed treatment liquid, and an ion exchange device 51 downstream of the thin film filtration device 50. / Or a purification device 49 including an absorption device 52 can be provided. The pasteurization apparatus 1 can further include at least one regression means 53 configured to return the purified treatment liquid to the treatment area 3, where the regression means 53 is, for example, a temperature treatment zone of the treatment area 3. It can be a simple regression line leading to one of 4, 5, 6, 7, 8 and 9.

In the case of such a pasteurization device 1 design, at least under the first operating condition, a partial amount of the treatment liquid is continuously taken out from the closed loop circuit 14 every unit time, and the thin film filtration device 50 and the subsequent ion exchange device The treatment liquid purified by the 51 and / or the absorption device 52 and then purified can be returned to the treatment area 3. Preferably, the purified treatment liquid is returned into temperature treatment zones 4, 5, 6, 7, 8 and 9, where the temperature of the treatment liquid is at least substantially equal to the temperature of the purified treatment liquid.

In this way, the amount of particles, microorganisms and soluble chemicals in the treatment can be kept low, thereby protecting the components of the container 2 and the pasteurizer 1. The removal of soluble chemicals does not interfere with the addition of treatment chemicals, as the method comprises introducing the treatment chemicals into the treatment area 3 in a gaseous or aerosolized state by the feed device 21. The dissolved soluble chemicals removed contained the treatment chemicals dissolved into the treatment liquid after container treatment, and the dissolution was in the temperature treatment zones 4, 5, 6, 7, 8, 9 of the treatment liquid at a particularly low temperature. Can occur in. Advantageously, the removal of particles prior to the removal of soluble chemicals protects the ion exchange device 51 and / or the absorption device 52 from contamination with particles.

The embodiments shown as examples are representative of possible modifications, and the present invention is not limited to the modifications specifically exemplified, and individual modifications can be used in various combinations with each other, and these possible modifications can be used. At this stage it should be pointed out that is within the scope of those skilled in the art in the technical field of teaching to be disclosed.

The scope of protection is defined by the scope of claims. However, the specification and drawings can be referred to to interpret the claims. The individual features or combinations of features of the various examples of embodiments described and illustrated can also be interpreted as independent embodiments of the solutions proposed by the present invention. The underlying objectives of the individual solutions proposed by the present invention can be found herein.

It should be pointed out for the sake of organization that the elements are illustrated not to scale and / or scaled up or down so that the structure can be better understood.

1. 1. Pasteurizer 2. Container 3. Processing area 4. Heating zone 5. Heating zone 6. Pasteurization zone 7. Pasteurization zone 8. Cooling zone 9. Cooling zone 10. Transport system 11. Transport direction 12. Irrigation means 13. Bottom area 14. Closed loop circuit 15. Circulation device 16. High temperature collection tank 17. Low temperature collection tank 18. Throttle valve 19. Heating means 20. Cooling means 21. Feed device 22. Reservoir 23. Feed hole 24. Feedline 25. Breaker 26. Means 27. Pressure vessel 28. Throttle valve 29. Fan 30. Vaporization space 31. Vaporizer 32. Liquid pump 33. Heating device 34. Weighing device 35. Gas flow controller 36. Vaporizer 37. Liquid weighing pump 38. Vacuum device 39. Aerosolization means 40. Nozzle 41. Buffer vault 42. High pressure pump 43. Compressor 44. Reservoir 45. Mixing unit 46. Aerosolizer 47. Removal means 48. Flow control valve 49. Purification device 50. Thin film filtration device 51. Ion exchange device 52. Absorber 53. Regression means 54. Recovery line

Claims (25)

A method of operating the pasteurizer (1) including the first operating condition.
Under the first operating condition, the sealed container (2) filled with food is transported through the processing area (3) having at least one heating zone (6, 7).
The food is heated and pasteurized in at least one zone by distributing a temperature controlled treatment solution onto the container (2).
At least most of the treatment liquid from the treatment area (3) is returned to the treatment area (3) by a closed loop circuit (14) for reuse.
Based on the requirements, at least one processing chemical for container processing is introduced into the processing area (3) in a gas or aerosolized state by the feed device (21) under any operating conditions of the pasteurizing device (1). Introduced, characterized by
Method. The method according to claim 1, wherein the at least one processing chemical is introduced into the processing area (3) by a carrier gas stream. The method according to claim 1 or 2, wherein the at least one treatment chemical is vaporized before being introduced into the treatment area (3). The feature is that the at least one processing chemical is vaporized into the carrier gas before being introduced into the processing area (3), and then introduced into the processing area (3) by the carrier gas. The method according to claim 3. The method of claim 3, wherein the vaporization is carried out or supported by a heating device (33). The method of claim 3 or 5, wherein the vaporization is carried out or supported by applying a vacuum. The at least one treatment chemical is atomized into the treatment area (3), or the at least one treatment chemical is introduced into the treatment area (3) by an aerosolizer (46). The method according to claim 1, wherein the method is atomized. The invention according to any one of claims 1 to 7, wherein the amount of the at least one processing chemical introduced into the processing area (3) is controlled by at least one measuring device (34). the method of. The at least one processing chemical is introduced into the processing area (3) under the second operating condition, and under the second operating condition, the transportation of the container (2) and the temperature on the container (2). The method according to any one of claims 1 to 8, wherein the distribution of the controlled liquid is stopped or stopped. Claims 1 to 9 are characterized in that, under the first operating condition, the sealed container (2) containing a metal material outside the container (2) is transported through the processing area (3). The method according to any one of the above. The method according to claim 10, wherein the container (2) containing aluminum on the outside is transported through the processing area (3). The method according to claim 10 or 11, wherein the at least one treatment chemical introduced into the treatment area (3) contains a volatile carboxylic acid. 12. The method of claim 12, wherein the at least one treatment agent introduced into the treatment area (3) comprises formic acid or acetic acid. At least under the first operating condition, a partial amount of the treatment liquid is continuously withdrawn from the closed loop circuit (14) every unit time and by the thin film filtration device (50) and then by the ion exchange device (51) and / Or the method according to any one of claims 1 to 13, wherein the purified treatment liquid is purified by the absorption device (52) and returned to the treatment area (3). A pasteurization device (1) for pasteurizing food in a sealed container (2).
A treatment area (3) having at least one heating zone (6, 7) configured to temperature-treat the food in the container (2).
A transport system (10) for transporting the sealed container (2) filled with food through the processing area (3), and
An irrigation means (12) configured to distribute the temperature-controlled treatment liquid into at least one heating zone (6, 7).
A closed loop circuit (14) configured to return the treatment liquid from the treatment area (3) to the treatment area (3) for reuse.
With
The pasteurizer (1) provides at least one feed device (21) configured to introduce at least one treatment chemical for container treatment into the treatment area (3) in a gaseous or aerosolized state. A pasteurizer characterized by being equipped. The feed device (21) comprises means (26) for generating a carrier gas stream, and the feed device (21) is subjected to the at least one process into the process area (3) by the carrier gas stream. The pasteurization apparatus according to claim 15, characterized in that it is configured to transport a drug. The feed device (21) is configured to pass through a vaporization space (30) accommodating the at least one processing chemical and then guide the carrier gas into the processing area (3). The pasteurization apparatus according to claim 16. 15. 17 of claims 15-17, wherein the feed device (21) includes a heating device (33) configured to vaporize at least one of the treated chemicals or assist in vaporizing the treated chemicals. The pasteurizer according to any one item. 15. A. 15. The feed device (21) comprises a vacuum device (38) configured to vaporize at least one of the treating chemicals or assist in vaporizing the at least one treating chemical. The pasteurization apparatus according to any one of 18. 15. The fifteenth aspect of claim 15, wherein the feeding device includes at least one aerosolizing means (39) configured to atomize the at least one processing chemical into the processing area (3). The described pasteurizer. The claim is characterized in that the feed device (21) comprises an aerosolizing device (46) configured to atomize at least one of the treatment chemicals prior to introduction into the treatment area (3). 15. The pasteurizer according to 15. Claimed, wherein the feed device (21) comprises at least one weighing device (34) configured to control the amount of processing chemicals introduced into the processing area (3). Item 6. The pasteurizer according to any one of Items 15 to 21. The feed device (21) comprises feed holes (23) arranged in or in different temperature treatment zones (4, 5, 6, 7, 8, 9) in the treatment area (3). The pasteurizing apparatus according to any one of claims 15 to 22. 23. The pasteurizer according to claim 23, wherein at least one blocking device (25) is associated with one feed hole (23) or a group of feed holes (23). At least one removing means (47) configured to remove a partial amount of the treatment liquid from the closed loop circuit (14) every unit time and to clean the partial amount of the removed treatment liquid. A purification device (49) including a thin film filtration device (50) configured in the above, an ion exchange device (51) and / or an absorption device (52) downstream of the thin film filtration device (50), and the purified treatment. The cryosterizer according to any one of claims 15 to 24, comprising at least one return means (53) configured to return the liquid to the treatment area (3).

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