JP2021179597A - Reticle pod provided with optically identifiable marks and method for identifying the same - Google Patents

Abstract

To provide a reticle pod provided with optically identifiable marks so as to allow its disposition to a correct site within a semiconductor processing device.SOLUTION: The invention discloses a reticle pod including a base and a lid mounted to the base. The base has a bottom surface (200) having at least one first mark (201) and at least one second mark (202). The first mark has a first reflectivity relative to a light source (311), and the second mark has a second reflectivity relative to the light source. The first reflectivity is different from the second reflectivity and also different from that of the rest area of the bottom surface.SELECTED DRAWING: Figure 2

Description

The present disclosure (the present invention) relates to a reticle pod, particularly a reticle pod with an optically identifiable mark around it and a method for identifying a mark on the reticle pod.

In terms of opening mechanism, reticle pods can generally be categorized into a type with a front opening mechanism and another type with a top opening mechanism. However, regardless of the type of reticle pod, the reticle pod should be placed within the platform of the processing device (eg, a device that performs a yellow light lithography process) so that there is no path offset or misalignment throughout the process. To be able to open successfully, the reticle pods must be placed correctly and exactly in the platform.

The published patent document issued as Taiwan Utility Model Registration (TWM) No. 496146 discloses an EUV (extreme ultraviolet) reticle pod with a mark, which is the pod and the body of the pod. It has at least one mark provided on the site, and this mark is formed by the laser engraving method. This mark is reflective to the laser beam. Therefore, it is preferable to mount the laser detection means on the platform of the process apparatus, whereby the orientation of the reticle pod with respect to the platform can be identified. Specifically, the platform should be configured to emit a laser beam that hits the mark and receive a reflected laser beam from this mark to see if the reticle pod is in the required position.

Taiwan Utility Model Registration No. 496146

Considering conventional and future semiconductor processing equipment to which such laser detecting means or photodetecting means may be provided, a reticle with an optically identifiable mark to meet or give rise to various requirements in various processes. It is requested to develop a pod.

An object of the present invention is to provide a base and a reticle pod having a lid that engages the base. The base has a bottom surface with at least one first mark and at least one second mark, the first mark has a first reflectivity to a light source, and the second mark has a second mark. , Has a second reflectivity with respect to the light source, the first reflectivity is different from the second reflectivity.

In one embodiment, at least one first mark is located on the central axis of the bottom surface and at least one second mark is located on one side of the bottom surface defined by the central axis.

In one embodiment, the bottom surface is perpendicular to the central axis and has a lateral axis that divides the bottom surface into a first region and a second region, and at least one first mark is lateral to the central axis. Located on the intersection of the axes, the second mark is located within the second region.

In one embodiment, the first mark is a circular mark, the second mark is a circular mark, and the diameter of the first mark is larger than the diameter of the second mark.

In one embodiment, the center of the second mark and the central axis define the lateral offset distance, the center of the second mark and the lateral axis define the vertical offset distance, and the lateral offset distance is the vertical. Shorter than the offset distance.

In one embodiment, the lateral offset distance is 18 mm and the vertical offset distance is 58 mm.

In one embodiment, the light source is a laser beam with a particular wavelength.

In one embodiment, at least one first mark has a first surface roughness and at least one second mark has a second surface roughness different from the first surface roughness. Both the first surface roughness and the second surface roughness are different from the surface roughness of the other regions on the bottom surface.

Another object of the present invention is to provide a method of identifying a reticle pod with a base having a bottom surface with at least one first mark and at least one second mark. The first mark has the first reflectivity to the light source, the second mark has the second reflectivity to the light source, and the first reflectivity is the second reflectivity. Is different. The method comprises placing the reticle pod on a processing platform with a large number of probe lights, projecting the probe lights onto at least one first mark and at least one second mark, respectively, and at least. Receives the first reflected light from one first mark and the second reflected light from at least one second mark, and accordingly at least one first message and at least one second message. The first message, including the step to generate, indicates whether the reticle pod is in the correct location, and at least one second message indicates the identification result of the reticle pod.

In one embodiment, the probe light is a laser beam with a particular wavelength.

In one embodiment, the method receives at least one first voltage value corresponding to at least one first reflected light and at least one second voltage value corresponding to at least one second reflected light. Further including a step, at least one first voltage value is different from at least one second voltage value.

In one embodiment, at least one first voltage value is 4.8 to 5.2 V and at least one second voltage value is less than 4.0 V.

In one embodiment, the identification result comprises a reticle pod or a model or version of the reticle.

Yet another object of the present invention is to provide a method for identifying a reticle pod. The method comprises the step of preparing at least one first mark and at least one second mark on the bottom surface of the base of the reticle pod, where the first mark provides first reflectivity to the light source. The second mark has a second reflectivity to the light source, the first reflectivity is different from the second reflectivity, and the second reflectivity is of the reticle pod. Related to the identification results, the method involves placing the reticle pod on a processing platform with a large number of probe lights and placing the probe lights on at least one first mark and at least one second mark. To receive the first reflected light from at least one first mark and the second reflected light from at least one second mark, and at least one first message and at least one. Further including the step of generating a second message, at least one message indicates whether the reticle pod is placed in the correct place, while at least one second message indicates the identification result of the reticle pod. show.

In one embodiment, the at least one first mark and the at least one second mark are formed on the bottom surface of the base by laser engraving.

The present invention can be more fully understood with reference to the accompanying drawings and the description given below. With reference to the drawings, various embodiments that are not intended to be limiting and are not intended to be exhaustive will be described. The elements shown in the figure are not necessarily drawn to actual scale to explain the structural and related principles.

It is an exploded view of the reticle pod. It is a bottom view of the reticle pod which concerns on this invention. It is a figure which shows the reticle pod which concerns on this invention located on the platform of the processing apparatus equipped with a plurality of marks and corresponding detection light sources of these. It is a figure which shows the reticle pod which concerns on this invention located on the platform of the processing apparatus equipped with a plurality of marks and corresponding detection light sources of these.

A more complete description of the invention is given below with reference to the accompanying drawings, and examples are provided to demonstrate exemplary embodiments. Nevertheless, the claimed subject matter of the present invention can be embodied in various forms, and thus the composition of the claimed subject matter included in the scope of rights is exemplified herein. It should not be limited to any of the embodiments, and the exemplary embodiments are provided only as examples. Similarly, the invention is intended to provide a reasonably broad scope with respect to the subject matter claimed or included in the scope of rights. Further, for example, the claimed subject matter can be embodied as a method, device, or system. Thus, a particular embodiment may take the form of, for example, hardware, software, firmware, or any combination thereof (referred to as non-software).

The term "embodiment" as used herein does not necessarily refer to the same embodiment itself, but the term "other (several / certain) embodiments" as used herein. Does not necessarily refer to different embodiments. It is an object of the present specification to illustrate the claimed subject matter with examples including all or a combination of all or part of the exemplary embodiments.

FIG. 1 is an exploded view of a reticle pod with an outer pod (100) and an inner pod (110), which reticle pod is preferably an EUV reticle pod. The outer pod (100) has a lid (101) and a base (102) that can be combined with each other to accommodate the inner pod (110). The inner pod (110) has a lid (111) and a base (112) and is configured to receive the reticle (120).

The outer pod (100) and the inner pod (110) can have many details omitted, but only the content related to the present invention will be described. Although not specifically shown and described, those skilled in the art will preferably have a plurality of limiting pins inside the lid (101) of the outer pod (100) in some embodiments. It can be expected that the base (102) should be equipped with an exhaust valve and the inner pod (110) lid (111) should be equipped with a filter channel.

FIG. 2 is a bottom view of the reticle pod according to the present invention. Specifically, this figure is a bottom view of the inner pod of the reticle pod simplified to show the bottom of the inner pod (200) and a pair of holding members (210) that are part of the corresponding lid. be. A pair of holding members (210) can be held by hand and lifted from the lid, thereby exposing the reticle. If the reticle pod is placed on the platform of the processing device, the bottom surface (200) will contact or connect to the platform's hauling interface. Several types of platforms provide a large number of probe light sources and corresponding reading units, which are used to achieve optical utilization measurements and identification.

A plurality of marks configured for the above-mentioned optical identification orientation are provided on the bottom surface (200) of the base according to the present invention. In the illustrated embodiment, the bottom surface (200) comprises three first marks (201) and a second mark (202). The first mark (201) is used to check the levelness of the base (112) when placed on the platform. The second mark (202) is used to check upwards (eg, version) for the reticle pod. One of these first marks (201) generally extends at the center of the bottom surface (200), more specifically along the Y direction, and extends the bottom surface (200) into two symmetric halves (200). It is located at the central axis (203) that divides into 200A and 200B).

The first mark (201) on the central axis (203) further defines the lateral axis (204) along the X direction, and the lateral axis (204) is perpendicular to the central axis (203). The horizontal axis (204) further divides the bottom surface (200) into a first region (200 ′) and a second region (200 ″). The first mark (201) on the central axis (203). ), The other two first marks (201) are both located within the first region (200'), but are located within half (200A, 200B), respectively. As such, the lateral offset distance is determined by the first mark (201) and the central axis (203) located within each half (200A, 200B), while the vertical offset distance is, respectively. The lateral offset distance is longer than the vertical offset distance, as defined by the first mark (201) and the lateral axis located within the half (200A, 200B) of the. The first mark (201) arranged in (200A, 200B) is located adjacent to the horizontal axis (204) rather than the vertical axis (203).

The second mark (202) is located within the half portion (200A) of the second region (200 ″) of the bottom surface (200); the center of the second mark (202) and the central axis (203). Defines the lateral offset distance (D1). The center of the second mark (202) and the vertical axis (204) define the vertical offset distance (D2). D1 is smaller than D2. Therefore, the second mark is located relatively adjacent to the central axis (203), and the second mark (202) is relatively located on the first mark (201) of the central axis (203). It is located adjacent to each other.

In the illustrated embodiment, the first mark (201) and the second mark (202) have a circular shape as a whole, and the diameter of the second mark (202) is the diameter of the first mark (201). ) Is smaller than the diameter. It should be understood that the bottom surface (200) is not really a perfectly flat surface. The first mark (201) and the second mark (202) may be cut into an incomplete circular shape so as not to be structurally confusing. As a modification, the first mark (201) and the second mark (202) may be located at different height positions due to the surface with incomplete flatness, but as seen from the bottom view. It is good to be able to observe it in a circular shape.

In one embodiment, the first mark (201) on the central axis (203) has the central axis (203) and the lateral axis (204) passing through the first mark (201) equal to each other on the bottom surface (200). It is preferably located at the center of the bottom surface (200) so as to divide it into half (200A, 200B) and equal regions of the first region (200') and the second region (200 ″). The second mark (202) is in the shape of a circle with a diameter of 16 mm or more. The lateral offset distance (203) between the center of the second mark (202) and the central axis (203). D1) is 18 mm, and the vertical offset distance (D2) between the center of the second mark (202) and the lateral axis (204) is 58 mm.

Nevertheless, the shape and coverage of the second mark (202) is not limited by the drawings. In a conceivable embodiment, the coverage of the second mark (202) may include two halves (200A, 200B) of the second region (200 ″), or the first and second regions (200A, 200B). 200 ′, 200 ″) may be included.

The first mark (201) and the second mark (202) are formed on the bottom surface (200) by a specific surface treatment, and this surface treatment is performed on the first mark (201) and the second mark (202). ) Is given a first optical reflectivity and a second optical reflectivity, respectively. It should be understood that the term "reflective" in the present invention means light reflectivity to a particular light source (eg, a laser beam having a particular wavelength). If the base of the inner pod is made of metal, the first mark (201) and second mark (202) are formed by laser surface treatment or by a chemical reaction applied to the metal surface. Furthermore, in order to make the first mark (201) and the second mark (202), a film of another substance may be attached to the metal surface. Therefore, the first reflectivity of the first mark (201) and the second reflectivity of the second mark (202) are different from the reflectivity of the bottom surface (200) of the base.

Specifically, the mark may be TLSM (silver matt pet label stock) or other stickers of other substances and colors. As a variant, metallic materials such as silver, aluminum or copper are attached to a given area of the mark in a manner such as electroplating, vapor deposition, electroless plating, brazing, embedding and ultrasonic fusion to be relatively high or relatively high. It may produce low reflectivity. A film containing carbon nanotubes may be applied to the target surface to obtain reduced mark reflectivity.

The difference in reflectivity projects a laser beam with a specific wavelength onto the other regions of the first mark (201), second mark (202) and bottom surface (200), respectively, and reflects in the corresponding reflection direction. It can be observed by receiving the value. For example, when a laser beam with a specific power value is projected onto the first mark (201) and the power value of the reflected laser beam in the reflection direction is measured and the measured power value is 60% of the projection laser. The first mark (201) has 60% reflectivity with respect to the light source. The processing device can convert the reading of the reflected light into a voltage value that depends on different mark reflectivity.

In one embodiment, the reflectivity of a mark is calculated by its surface roughness. The laser surface treatment described above is to roughen the original surface of the base, which is not possible when the probe light source provided on the platform hits the rough surface and reduces its reflectivity towards its reflection direction. Produces regular reflectivity. For example, the first mark (201) and the second mark (202) have a first surface roughness and a second surface roughness, respectively, and the first surface roughness and the second surface roughness are. , Each other, and significantly different from the other areas on the bottom. In order to prevent the reflected light from the first mark (201) and the second mark (202) from interfering with each other or adversely affecting the reading, the first on the central axis (203) according to the present invention. The second mark (202) and the first mark (201) have a specific relationship that prevents the reflected light from interfering with each other when read by the platform.

In some embodiments, additional third marks (205) are preferably provided on the downward surface of the pair of holding members (210), which have a lid above the base. It can help identify whether it is located or the orientation of the lid.

The present invention further provides a method of identifying the reticle pod, in which case the reticle pod comprises a first mark (201) and a second mark (202). With reference to FIGS. 3A and 3B, which schematically show the reticle pod, the reticle pod is located above the transport surface of the processing platform (310). The method comprises placing the reticle pod on a processing platform (310) with a large number of probe light sources (311, 312, 313, 314), in which case the probe light source is a laser light source with a specific wavelength. And each of the probe light sources further includes a photodetector.

The method comprises projecting probe light from a probe light source (311, 312, 313, 314) onto the first mark (201) and the second mark (202), respectively. As shown, the probe light sources (311, 312, 313, 314) are arranged to correspond to the first mark (201) and the second mark (202). In practice, the probe light should be configured to hit the mark at an angle, in which case the reflected light should also be at an angle. In some embodiments, the probe light source (311, 312, 313, 314) projects the probe light onto these marks via the light guide assembly. These probe light sources (311, 312, 313, 314) may have the same optical parameters. As a modification, the probe light source (311, 312, 313) corresponding to the first mark (201) has a different form from the probe light source (314) corresponding to the second mark (202). Is also good.

The method receives the first reflected light from the first mark (201) and the second reflected light from the second mark (202) by the platform (310), and accordingly the first message and the first message. Includes a step to generate a second message. For example, the platform can convert the reflected light into a voltage value, whereby the first reflected light corresponds to the first voltage value and the second reflected light corresponds to the second voltage value. do. The first voltage value is generally different from the second voltage value due to the difference in reflectivity between the first mark (201) and the second mark (202).

If the photodetector reads each first voltage value for the first mark (201) and each first voltage value falls within a predetermined range, the first message is that the reticle pod is in the correct place. Instruct that it is placed. If the photodetector reads the second voltage value for the second mark (202) and the second voltage value is within a predetermined range, the second message indicates the identification result of the reticle pod. be able to. For example, the predetermined range of the first voltage value for the first mark (201) is 4.8 to 5.2V, and the predetermined range of the second voltage value for the second mark (202) is. It is less than 4.0V (not zero). A "message" is a detection result sent by the platform.

Identification results include identification of the reticle pod model or version. For example, the platform stores the detected second voltage value in a storage device accessible by the platform and contains information about the reticle pod (eg, model or version) or information about the reticle for the second voltage value. Can be associated with the reticle pod identification list.

In view of the above description of embodiments, the present invention discloses a reticle pod whose information is identifiable by a machine platform and a method of identifying such reticle pods, resulting in a processing apparatus comprising a laser detection scheme. Can further provide reticle pod information identification, which improves data manipulation in the manufacturing process.

100 Outer pod 101,111 Lid 102,112 Base 110 Inner pod 120 Reticle 201 First mark 202 Second mark 203 Central axis 204 Horizontal axis 205 Third mark 210 Retaining member 200 Bottom 200A, 200B Half 200' First region 200 ″ Second region 300,310 Processing platform 311, 312, 313 Probe light source

Claims (15)

A reticle pod with a base and a lid engaged to the base.
The base has a bottom surface with at least one first mark and at least one second mark, the first mark having a first reflectivity to a light source and a second mark. Is a reticle pod that has a second reflectivity with respect to the light source, the first reflectivity being different from the second reflectivity. Claimed that the at least one first mark is located on the central axis of the bottom surface and the at least one second mark is located on one side of the bottom surface defined by the central axis. 1 The reticle pod described. The bottom surface is perpendicular to the central axis and has a lateral axis that divides the bottom surface into a first region and a second region, and the at least one first mark is the central axis and the lateral axis. The reticle pod according to claim 2, which is located on the intersection of the directional axes, and the second mark is located in the second region. 3. The third mark, wherein the first mark is a circular mark, the second mark is a circular mark, and the diameter of the first mark is larger than the diameter of the second mark. Reticle pod. The center of the second mark and the central axis define a lateral offset distance, the center of the second mark and the lateral axis define a vertical offset distance, and the lateral offset distance is the above. The reticle pod according to claim 4, which is shorter than the vertical offset distance. The reticle pod according to claim 5, wherein the lateral offset distance is 18 mm and the vertical offset distance is 58 mm. The reticle pod according to claim 1, wherein the light source is a laser beam having a specific wavelength. The at least one first mark has a first surface roughness, and the at least one second mark has a second surface roughness different from the first surface roughness, said first. The reticle pod according to claim 1, wherein both the surface roughness of 1 and the surface roughness of the second surface are different from the surface roughness of other regions on the bottom surface. A method of identifying a reticle pod with a base having a bottom surface with at least one first mark and at least one second mark, wherein the first mark is the first reflectivity to a light source. In a method, wherein the second mark has a second reflectivity with respect to the light source, and the first reflectivity is different from the second reflectivity.
The step of placing the reticle pod on a processing platform with a large number of probe lights,
A step of projecting the probe light onto the at least one first mark and the at least one second mark, respectively.
It receives the first reflected light from the at least one first mark and the second reflected light from the at least one second mark, and accordingly at least one first message and at least one second. Including steps to generate a message for
The method, wherein the first message indicates whether the reticle pod is placed in the correct place, and the at least one second message indicates the identification result of the reticle pod. The method according to claim 9, wherein the probe light is a laser beam having a specific wavelength. The step further comprises receiving at least one first voltage value corresponding to the at least one first reflected light and at least one second voltage value corresponding to the at least one second reflected light, said at least. The method of claim 9, wherein the one first voltage value is different from the at least one second voltage value. 11. The method of claim 11, wherein the at least one first voltage value is 4.8 to 5.2 V and the at least one second voltage value is less than 4.0 V. 9. The method of claim 9, wherein the identification result comprises a model or version of the reticle pod or reticle. A way to identify reticle pods
It comprises the step of preparing at least one first mark and at least one second mark on the bottom surface of the base of the reticle pod, wherein the first mark has a first reflectivity to a light source. The second mark has a second reflectivity with respect to the light source, the first reflectivity is different from the second reflectivity, and the second reflectivity is the second reflectivity. It is related to the identification result of the reticle pod and
Including the step of placing the reticle pod on a processing platform with a large number of probe lights.
It comprises the step of projecting the probe light onto the at least one first mark and the at least one second mark.
It receives the first reflected light from the at least one first mark and the second reflected light from the at least one second mark, and at least one first message and at least one second message. The at least one message indicates whether the reticle pod is placed in the correct place, while the at least one second message indicates the identification result of the reticle pod. ,Method. 14. The method of claim 14, wherein the at least one first mark and the at least one second mark are formed on the bottom surface of the base by a laser engraving method.

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