JP2021153138A - Upper electrode assembly and substrate processing device - Google Patents

Abstract

To provide an upper electrode assembly and a substrate processing device for improving maintainability.SOLUTION: An upper electrode assembly includes: an upper electrode; a protective member covering the upper electrode; and a fixing member fixing the protective member to the upper electrode by an elastic force of the elastic member.SELECTED DRAWING: Figure 5

Description

The present disclosure relates to an upper electrode assembly and a substrate processing apparatus.

Patent Document 1 describes a hollow shower head body having an open lower end, a shower head lid provided so as to close the open portion at the lower end of the shower head body, and a shower head lid provided at the lower end of the shower head body. A shower head structure of a heat treatment apparatus is disclosed, which includes a collar member for holding a shower head lid, and the collar member is fixed to a lower end of a shower head body with a bolt.

Japanese Unexamined Patent Publication No. 11-11626

On one side, the present disclosure provides top electrode assemblies and substrate processing devices that improve maintainability.

In order to solve the above problems, according to one embodiment, an upper electrode, a protective member that covers the upper electrode, and a fixing member that fixes the protective member to the upper electrode by the elastic force of the elastic member. An upper electrode assembly is provided.

According to one aspect, it is possible to provide an upper electrode assembly and a substrate processing apparatus that improve maintainability.

The schematic cross-sectional view which shows the structure of the substrate processing apparatus which concerns on this embodiment. Bottom view of an example of an upper electrode assembly. An exploded perspective view of an example of a fixing member. A perspective view of an example of a hook member viewed from another direction. The perspective view of an example of the fixing member of the 1st state. The perspective view of an example of the fixing member of the 2nd state. The perspective view of an example of the fixing member of the 3rd state.

Hereinafter, embodiments for carrying out the present disclosure will be described with reference to the drawings. In each drawing, the same components may be designated by the same reference numerals and duplicate description may be omitted.

[Board processing equipment]
FIG. 1 is a schematic cross-sectional view showing the configuration of the substrate processing apparatus 100 according to the present embodiment. The substrate processing apparatus 100 has a chamber 1 that is airtightly configured and has an electrically ground potential. The chamber 1 has a cylindrical shape and is made of, for example, aluminum. A mounting table ST on which the substrate W is mounted is provided in the chamber 1. The mounting base ST has a base 6, a lower electrode 4, and an electrostatic chuck 5. The base 6 and the lower electrode 4 are made of a conductive metal such as aluminum. The base 6 supports the lower electrode 4 and the mounting base ST. The wafer is an example of the substrate W.

An edge ring 7 made of, for example, silicon is provided around the substrate W. The edge ring 7 is also referred to as a focus ring. Around the edge ring 7, the lower electrode 4, and the base 6, for example, a quartz cylindrical inner wall member 9a is provided. The mounting table ST is arranged at the bottom of the chamber 1 via an inner wall member 9a and a support member 9 formed of, for example, quartz.

The electrode 5c in the electrostatic chuck 5 is sandwiched between the dielectrics 5b and connected to the power supply 12. When a voltage is applied from the power supply 12 to the electrode 5c, the substrate W is electrostatically attracted to the electrostatic chuck 5 by Coulomb force.

The mounting table ST has a flow path 2d inside. The heat medium supplied from the chiller unit, for example, water, circulates in the inlet pipe 2b, the flow path 2d, and the outlet pipe 2c. A heat transfer gas supply path 16 and a common gas supply path 17 are formed inside the mounting table ST. The heat transfer gas source 19 supplies the heat transfer gas to the heat transfer gas supply path 16, and introduces the heat transfer gas into the space between the lower surface of the substrate W and the mounting surface of the electrostatic chuck 5. The heat transfer gas to be introduced may be an inert gas such as helium (He) gas or argon (Ar) gas. In the embodiment, an example of introducing helium gas will be described. Not only the heat transfer gas but also the gas used in the process can be applied. Examples of the gas used in the process include oxygen gas (O ₂ ) and nitrogen gas (N ₂ ).

A plurality of, for example, three lifter pins 13 (in FIG. 1, only one lifter pin 13 is shown) penetrate the mounting table ST. The mounting table ST is provided with a pin insertion passage 14. The lifter pin 13 through which the pin insertion passage 14 is inserted is connected to the elevating mechanism 62 and moves up and down by the drive of the elevating mechanism 62.

A first RF power supply 10a is connected to the base via a first matching unit 11a, and a second RF power supply 10b is connected via a second matching unit 11b. The first RF power source 10a applies high-frequency power for generating plasma of a predetermined frequency to the lower electrode 4. The second RF power source 10b has a frequency lower than the frequency of the high frequency power for plasma generation, and applies the high frequency power for the bias voltage for attracting ions to the lower electrode 4. However, the high frequency power supplied from the second RF power supply 10b may be used for plasma generation. Above the mounting table ST, an upper electrode assembly 3 facing the mounting table ST is provided. The upper electrode assembly 3 and the mounting table ST function as a pair of electrodes (upper electrode and lower electrode). The upper electrode assembly 3 also functions as a gas shower head.

The upper electrode assembly 3 has an upper electrode 3a and a protective member 3b. An insulating annular member 89 that supports the upper electrode assembly 3 is provided around the upper electrode assembly 3, and the upper opening of the chamber 1 is closed by the upper electrode assembly 3 and the annular member 89. The upper electrode 3a is made of a conductive material, for example, aluminum whose surface has been anodized, and a protective member 3b is detachably supported under the conductive material.

The protective member 3b is arranged on the lower surface of the upper electrode 3a and covers the lower surface of the upper electrode 3a. As a result, the lower surface of the upper electrode 3a is protected from being exposed to the space (processing space) in the chamber 1. The protective member 3b is made of, for example, quartz or the like.

Further, the upper electrode assembly 3 has a fixing member 3c that detachably fixes the protective member 3b to the upper electrode 3a. Further, the upper electrode assembly 3 has a cover member 3d that covers the fixing member 3c. As a result, the fixing member 3c is protected from being exposed to the space (processing space) in the chamber 1. The cover member 3d is selected from, for example, quartz, silicon, etc., depending on the processing of the substrate processing apparatus 100.

The upper electrode 3a is formed with a gas diffusion chamber 3e and a gas introduction port 3h for introducing the processing gas into the gas diffusion chamber 3e. A gas supply pipe 15a is connected to the gas introduction port 3h. The gas supply pipe 15a is connected to the gas supply unit 15, the mass flow controller (MFC) 15b, and the on-off valve 15c in this order, and the processing gas is supplied from the gas supply unit 15 into the upper electrode 3a via the gas supply pipe 15a. The on-off valve 15c and the mass flow controller (MFC) 15b control gas on / off and flow rate.

A large number of gas passage holes 3f are formed in the lower part of the gas diffusion chamber 3e toward the inside of the chamber 1 and penetrate the protective member 3b. The tip of the gas flow hole 3f is a gas introduction hole 3g. The processing gas is supplied in a shower shape from the gas introduction hole 3g through the gas diffusion chamber 3e and the gas flow hole 3f into the chamber 1.

A variable DC power supply 72 is connected to the upper electrode 3a via a low-pass filter (LPF) 71, and a switch 73 turns on / off the power supply of the DC voltage output from the variable DC power supply 72. The DC voltage from the variable DC power supply 72 and the on / off of the switch 73 are controlled by the control unit 90. When high-frequency power is applied to the mounting table ST from the first RF power supply 10a and the second RF power supply 10b to turn the processing gas into plasma, the control unit 90 turns on the switch 73 as necessary, and the upper electrode A predetermined DC voltage is applied to 3a.

A cylindrical ground conductor 1a is provided so as to extend above the height position of the upper electrode assembly 3 from the side wall of the chamber 1. The cylindrical ground conductor 1a has a top wall above it.

An exhaust port 81 is formed at the bottom of the chamber 1, and an exhaust device 83 is connected to the exhaust port 81 via an exhaust pipe 82. The exhaust device 83 has a vacuum pump, and by operating the vacuum pump, the inside of the chamber 1 is depressurized to a predetermined degree of vacuum. A carry-in outlet 84 for the substrate W is provided on the side wall in the chamber 1, and the carry-in outlet 84 can be opened and closed by a gate valve 85.

A depot shield 86 is provided along the inner wall surface inside the side portion of the chamber 1. Further, a depot shield 87 is detachably provided along the inner wall member 9a. The depot shields 86 and 87 prevent the etching by-products (depots) from adhering to the inner wall and the inner wall member 9a of the chamber 1. At a position substantially the same height as the substrate W of the depot shield 86, a conductive member (GND block) 88 to which the potential with respect to the ground is connected in a controllable manner is provided, whereby abnormal discharge is prevented.

The substrate processing device 100 is collectively controlled by the control unit 90. The control unit 90 is provided with a process controller 91 that controls each unit of the substrate processing device 100, a user interface 92, and a storage unit 93.

The user interface 92 includes a keyboard for the process manager to input commands for managing the board processing device 100, a display for visualizing and displaying the operating status of the board processing device 100, and the like.

The storage unit 93 stores a recipe in which a control program (software) for causing the process controller 91 to execute various processes executed by the board processing device 100, processing condition data, and the like are stored. Then, if necessary, an arbitrary recipe is called from the storage unit 93 by an instruction from the user interface 92 or the like and executed by the process controller 91, so that the substrate processing device 100 desires the recipe under the control of the process controller 91. Is processed. In addition, recipes such as control programs and processing condition data may be stored in a computer-readable computer storage medium or the like, or may be transmitted from another device at any time via, for example, a dedicated line. It is also possible to use it online. Examples of the storage medium include hard disks, CDs, flexible disks, semiconductor memories, and the like.

[Upper electrode assembly]
Next, the upper electrode assembly 3 will be further described with reference to FIG. FIG. 2 is a bottom view of an example of the upper electrode assembly 3. Note that, in FIG. 2 (and FIGS. 5 to 7 described later), the upper electrode assembly 3 is shown with the cover member 3d removed.

The upper electrode assembly 3 has an upper electrode 3a, a protective member 3b, a fixing member 3c, and a cover member 3d (see FIG. 1).

The protective member 3b has a top surface portion 3b1, a digging lower portion 3b2, and an outer edge portion 3b3. The top surface portion 3b1 is provided with a gas introduction hole 3g (see FIG. 1, not shown in FIG. 2). The digging lower portion 3b2 is provided in an annular shape on the outer peripheral side of the top surface portion 3b1 and is formed by digging down from the top surface portion 3b1. The inner peripheral side of the cover member 3d (see FIG. 1) is arranged in the digging lower portion 3b2. The outer edge portion 3b3 is provided in an annular shape on the outer peripheral side of the digging lower portion 3b2. A supported portion 3b4 supported by a fixing member 3c is formed on the outer edge portion 3b3. In the example shown in FIG. 2, the supported portion 3b4 is formed by digging one step further than the outer edge portion 3b3. The protective member 3b is supported by the fixed member 3c at the supported portion 3b4.

The upper electrode 3a has a top surface portion 3a1, an upright portion 3a2, a step portion 3a3, and an outer edge portion 3a4. The top surface portion 3a1 is provided with a gas flow hole 3f (see FIG. 1, not shown in FIG. 2). Further, the top surface portion 3a1 is covered with the protective member 3b. The upright portion 3a2 is provided in an annular shape on the outer peripheral side of the top surface portion 3a1 and is formed so as to project from the top surface portion 3a1. The step portion 3a3 is provided in an annular shape on the outer peripheral side of the vertical portion 3a2. The outer peripheral side of the cover member 3d (see FIG. 1, not shown in FIG. 2) is arranged on the step portion 3a3. The outer edge portion 3a4 is provided in an annular shape on the outer peripheral side of the step portion 3a3. The upper electrode 3a is supported by the annular member 89 at the outer edge portion 3a4.

Further, a notch portion 3a5 is formed in the upright portion 3a2. A fixing member 3c is arranged in the notch 3a5.

The cover member 3d is arranged from the digging lower portion 3b2 of the protective member 3b to the step portion 3a3 of the upper electrode 3a. As a result, the outer edge portion 3b3 on which the supported portion 3b4 is formed, the upright portion 3a2, and the fixing member 3c arranged in the notch portion 3a5 are covered with the cover member 3d.

[Fixing member]
Next, the fixing member 3c will be further described with reference to FIGS. 3 and 4. FIG. 3 is an exploded perspective view of an example of the fixing member 3c. FIG. 4 is a perspective view of an example of the hook member 240 viewed from another direction.

The fixing member 3c includes a base member 210, a shaft member 220, a spring (stretchable member) 230, a hook member 240, and bolts 251 to 253.

The base member 210 has a shaft hole 211 through which the shaft portion 221 of the shaft member 220 is inserted. A spring receiving portion 212 for receiving the spring 230 is formed around the shaft hole 211 on the back surface side of the base member 210.

Further, a key groove 213 that fits with the key 244 of the hook member 240 is formed on the first surface 216 on the surface side of the base member 210. Further, on the surface side of the base member 210, a relief portion 214 is formed to prevent interference between the locking portion 245 of the hook member 240 and the base member 210 when the key 244 is fitted into the key groove 213. .. Further, on the surface side of the base member 210, a locking portion 215 that engages with the locking portion 245 of the hook member 240 is provided.

Further, in order to facilitate the pulling down of the hook member 240, the base member 210 is formed with a digging portion 217 that is dug down from the first surface 216.

The base member 210 is fixed to the upper electrode 3a. Specifically, the base member 210 is provided with through holes 218 and 219. Bolts 252 and 253 are inserted into the through holes 218 and 219. The base member 210 is fixed to the upper electrode 3a by screwing the bolts 252 and 253 into the screw holes (not shown) formed in the notch 3a5 of the upper electrode 3a.

The shaft member 220 has a shaft portion 221 and a flange portion 222. The shaft portion 221 is inserted into the shaft hole 211. As a result, the shaft member 220 is configured to be movable and rotatable with respect to the shaft hole 211 in the insertion / removal direction. A flange portion 222 having a diameter larger than that of the shaft portion 221 is formed at one end of the shaft portion 221. A screw hole 223 is formed at the other end of the shaft portion 221 and is fixed by the hook member 240 and the bolt 251. As a result, the hook member 240 is configured to be movable in the vertical direction and in the rotational direction with respect to the base member 210.

The spring 230 is a coil spring, and the shaft portion 221 is inserted into the center thereof. The spring 230 is a compression spring sandwiched between the spring receiving portion 212 of the base member 210 and the flange portion 222 of the shaft member 220. As a result, the spring 230 is urged in the direction of lifting the shaft member 220 (the direction of pulling out the shaft member 220 from the shaft hole 211 of the base member 210). That is, the spring 230 is urged in the direction of lifting the hook member 240 fixed to the shaft member 220 (the direction of pressing the hook member 240 toward the protective member 3b).

The notch 3a5 of the upper electrode 3a is provided with a bottomed hole (not shown) in which the shaft member 220 and the spring 230 are arranged. As a result, the shaft member 220 is configured to be movable and rotatable in the insertion / extraction direction without interfering with the upper electrode 3a.

The hook member 240 has a base portion 241 and a support portion 242. A counterbore 243 is provided in the base 241 of the hook member 240. A bolt 251 is inserted into the counterbore 243. The hook member 240 is fixed to the shaft member 220 by screwing the bolt 251 into the screw hole 223 formed in the shaft portion 221 of the shaft member 220. The support portion 242 is formed so as to extend from the base portion 241 toward the direction away from the axis of the counterbore 243.

Further, as shown in FIG. 4, a key 244 is provided on the second surface 246, which is the back surface side of the base portion 241 of the hook member 240. The key 244 is formed so as to project from the second surface 246. Further, a locking portion 245 is provided on the back surface side of the hook member 240. The locking portion 245 is formed so as to project from the second surface 246. Further, the back surface side of the support portion 242 of the hook member 240 has a third surface 247 that comes into contact with the protective member 3b when it is fixed.

Next, the operation of the fixing member 3c will be further described with reference to FIGS. 5 to 7. Here, the operation of the fixing member 3c from the state in which the protective member 3b is fixed to the upper electrode 3a to the state in which the protective member 3b is detachable from the upper electrode 3a by releasing the fixing will be described as an example.

FIG. 5 is a perspective view of an example of the fixing member 3c in the first state. Here, the first state means a fixed state in which the protective member 3b is fixed to the upper electrode 3a by the fixing member 3c.

In the first state, the support portion 242 of the hook member 240 is arranged toward the protective member 3b. Further, in a plan view, the support portion 242 is arranged so as to overlap the supported portion 3b4 of the protective member 3b. Further, the key 244 of the hook member 240 fits with the key groove 213 of the base member 210. That is, the base member 210 having the key groove 213 functions as an alignment member that aligns the position of the hook member 240 with the first position (fixed position) for fixing the protective member 3b to the upper electrode 3a. Further, the key groove 213 of the base member 210 and the key 244 of the hook member 240 form a rotation regulation unit that regulates the rotation of the hook member 240 in the first state. That is, the key 244 is inserted into the key groove 213 by the urging force of the spring 230, and the key 244 fits into the key groove 213 to regulate the rotation of the hook member 240.

Further, the spring 230 urges the hook member 240 in the pressing direction. Here, the second surface 246 is separated from the first surface 216, and the supported portion 3b4 is pressed by the third surface 247. As a result, the fixing member 3c presses the supported portion 3b4 of the protective member 3b on the third surface 247 of the hook member 240, thereby pressing the protective member 3b against the top surface portion 3a1 of the upper electrode 3a and pushing the protective member 3b upward. It can be fixed to the electrode 3a.

FIG. 6 is a perspective view of an example of the fixing member 3c in the second state. Here, the second state means a state in which the protection member 3b is released from being fixed by the fixing member 3c.

Here, the maintenance worker pulls down the hook member 240 against the urging force of the spring 230. At this time, since the base member 210 is provided with the digging portion 217, the hook member 240 can be easily gripped and the workability is improved. By pulling down the hook member 240, the key 244 and the key groove 213 are released from the fitting, and the hook member 240 can be rotated with the shaft portion 221 as the rotation axis. As a result, by rotating the hook member 240, the support portion 242 is retracted to the outside in the radial direction of the protective member 3b.

Further, in the second state, the key 244 is in contact with the first surface 216, and the third surface 247 and the supported portion 3b4 are separated from each other. As a result, the maintenance worker can easily determine whether or not the fixing member 3c is in the fixed state (first state).

FIG. 7 is a perspective view of an example of the fixing member 3c in the third state. Here, the third state means a retracted state in which the support portion 242 of the hook member 240 is retracted from the protective member 3b by the maintenance worker. In other words, the third state means a state when the protective member 3b is removed from the upper electrode 3a.

The locking portion 245 of the hook member 240 is in contact with the locking portion 215 of the base member 210. That is, the base member 210 having the locking portion 215 aligns the position of the hook member 240 with the second position (retracted position) where the support portion 242 of the hook member 240 retracts from the protective member 3b. Functions as. Further, the locking portion 215 of the base member 210 and the locking portion 245 of the hook member 240 form a rotation limiting portion that limits the rotation of the hook member 240. Here, when the maintenance worker further rotates the hook member 240, the locking portion 245 of the hook member 240 comes into contact with the locking portion 215 of the base member 210, and the fixing member 3c is brought into the third state. can. In this state, the support portion 242 of the hook member 240 is retracted from the protective member 3b. As a result, the maintenance worker can easily determine whether or not the hook member 240 is in the retracted state by bringing the locking portion 245 into contact with the locking portion 215.

When changing from the third state (retracted state) to the first state (fixed state), the hook member 240 is rotated so that the support portion 242 of the hook member 240 faces the protective member 3b. As a result, the key 244 is inserted into the key groove 213 by the urging force of the spring 230, and the rotation of the hook member 240 is restricted. Further, by pressing the supported portion 3b4 of the protective member 3b on the third surface 247 of the hook member 240 by the urging force of the spring 230, the protective member 3b is pressed against the top surface portion 3a1 of the upper electrode 3a, and the protective member 3b is pressed. It is fixed to the upper electrode 3a.

According to the upper electrode assembly 3 of the substrate processing apparatus 100 according to the present embodiment, the upper electrode 3a and the protective member 3b when the protective member 3b is attached to the upper electrode 3a or the protective member 3b is removed from the upper electrode 3a. It can be easily fixed or released. Further, the working time can be shortened as compared with the case where the protective member 3b is bolted to the upper electrode 3a. In other words, the non-operating time of the substrate processing apparatus 100 can be shortened and the operating time can be extended, so that the productivity of the substrate processing apparatus 100 can be improved.

Further, when the fixing member 3c is in the fixed state (first state), the hook member 240 cannot rotate. Further, in the non-fixed state (second state, third state), the hook member 240 is rotatable, and the support portion 242 is raised from the supported portion 3b4 of the protective member 3b. Thereby, the maintenance worker can easily determine whether the fixing member 3c is in the fixed state (first state) or the non-fixed state (second state, third state).

Although the embodiments of the substrate processing apparatus 100 have been described above, the present disclosure is not limited to the above embodiments and the like, and various modifications are made within the scope of the gist of the present disclosure described in the claims. , Improvement is possible.

In the second and third states, the hook member 240 may be configured to be positioned so as to protrude from the standing portion 3a2 of the upper electrode 3a. As a result, when the cover member 3d is attached, the cover member 3d interferes with the hook member 240 in the second or third state. As a result, the maintenance worker can easily determine whether or not the fixing member 3c is in the fixed state (first state).

The base member 210 has been described as having a keyway 213 for aligning the hook member 240 with the first position, but the present invention is not limited to this. The base member 210 may have a plurality of keyways (not shown). For example, the base member 210 may have a keyway for aligning the hook member 240 with the second position (retracted position). As a result, the hook member 240 can be stopped at the retracted position, so that workability when attaching / detaching the protective member 3b from the upper electrode 3a is improved. Further, although the hook member 240 has been described as having one key 244, the present invention is not limited to this. The hook member 240 may have a plurality of keys (not shown). Further, although the description has been made assuming that the base member 210 is provided with the key groove 213 and the hook member 240 is provided with the key 244, the present invention is not limited to this, and the base member 210 is provided with the key and the hook member 240 is provided with the key groove. It may be a configuration.

3 Upper electrode assembly 3a Upper electrode 3b Protective member 3c Fixing member 3d Cover member 3a1 Top surface part 3a2 Standing part 3a3 Step part 3a4 Outer edge part 3a5 Notch part 3b1 Top surface part 3b2 Excavation lower part 3b3 Outer edge part 3b4 Supported part 100 Substrate processing device 210 Base member (alignment member)
211 Shaft hole 212 Spring receiving part 213 Key groove (groove)
214 Relief part 215 Locking part 216 First surface 217 Digging part 218, 219 Through hole 220 Shaft member 221 Shaft part 222 Flange part 223 Screw hole 230 Spring (stretchable member)
240 Hook member 241 Base 242 Support 243 Counterbore 244 Key (protruding part)
245 Locking part 246 2nd surface 247 3rd surface 251 to 253 bolts

Claims (10)

With the upper electrode
A protective member that covers the upper electrode and
An upper electrode assembly comprising a fixing member that fixes the protective member to the upper electrode by the elastic force of the elastic member. The fixing member is
A hook member for fixing the protective member and
It has a positioning member for aligning the position of the hook member with a first position for fixing the protective member to the upper electrode.
The upper electrode assembly according to claim 1. The alignment member has a groove and has a groove.
The hook member has a protruding portion and has a protruding portion.
The alignment member aligns the position of the hook member with the first position by fitting the protruding portion into the groove.
The upper electrode assembly according to claim 2. The fixing member is
It has a shaft member that is fixed to the hook member and is inserted into the shaft hole of the alignment member.
The hook member is configured to be movable in the insertion / removal direction and the rotation direction of the shaft member.
The alignment member regulates the movement of the hook member in the rotational direction when the hook member is located at the first position.
The upper electrode assembly according to claim 2 or 3. The elastic member urges the hook member in the insertion / removal direction of the shaft member.
The upper electrode assembly according to claim 4. The alignment member is
Align the position of the hook member with the second position retracted from the protective member.
The upper electrode assembly according to any one of claims 2 to 5. The elastic member is a spring.
The upper electrode assembly according to any one of claims 1 to 6. The protective member is quartz.
The upper electrode assembly according to any one of claims 1 to 7. A cover member that covers the fixing member is further provided.
The upper electrode assembly according to any one of claims 1 to 8. A substrate processing apparatus comprising the upper electrode assembly according to any one of claims 1 to 9.

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