JP2021125476A - Perylene derivative compound, organic semiconductor composition using the compound, and organic thin film transistor using the organic semiconductor composition - Google Patents
Perylene derivative compound, organic semiconductor composition using the compound, and organic thin film transistor using the organic semiconductor composition Download PDFInfo
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- JP2021125476A JP2021125476A JP2020015420A JP2020015420A JP2021125476A JP 2021125476 A JP2021125476 A JP 2021125476A JP 2020015420 A JP2020015420 A JP 2020015420A JP 2020015420 A JP2020015420 A JP 2020015420A JP 2021125476 A JP2021125476 A JP 2021125476A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 95
- -1 Perylene derivative compound Chemical class 0.000 title claims abstract description 67
- 239000010409 thin film Substances 0.000 title claims abstract description 43
- 239000000203 mixture Substances 0.000 title claims abstract description 31
- 150000001875 compounds Chemical class 0.000 title description 42
- 125000001424 substituent group Chemical group 0.000 claims description 263
- 125000004432 carbon atom Chemical group C* 0.000 claims description 238
- 125000000217 alkyl group Chemical group 0.000 claims description 39
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 35
- 125000003342 alkenyl group Chemical group 0.000 claims description 32
- 125000004429 atom Chemical group 0.000 claims description 31
- 125000000623 heterocyclic group Chemical group 0.000 claims description 31
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 29
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 22
- 125000003545 alkoxy group Chemical group 0.000 claims description 20
- 125000003277 amino group Chemical group 0.000 claims description 20
- 125000004149 thio group Chemical group *S* 0.000 claims description 19
- 125000002252 acyl group Chemical group 0.000 claims description 15
- 125000002729 alkyl fluoride group Chemical group 0.000 claims description 13
- 125000003832 aryl fluoride group Chemical group 0.000 claims description 13
- 125000000000 cycloalkoxy group Chemical group 0.000 claims description 13
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 13
- 125000005843 halogen group Chemical group 0.000 claims description 12
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 11
- 229910052731 fluorine Inorganic materials 0.000 claims description 9
- 125000001153 fluoro group Chemical group F* 0.000 claims description 9
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 7
- 125000000018 nitroso group Chemical group N(=O)* 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 6
- 239000002635 aromatic organic solvent Substances 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 43
- 239000000463 material Substances 0.000 abstract description 39
- 239000000243 solution Substances 0.000 description 33
- 239000010410 layer Substances 0.000 description 31
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 28
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 20
- 239000002904 solvent Substances 0.000 description 19
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 14
- 239000012043 crude product Substances 0.000 description 14
- 239000010408 film Substances 0.000 description 13
- 239000007787 solid Substances 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 238000005481 NMR spectroscopy Methods 0.000 description 10
- 0 *CN(C(c1ccc(-c(c(O)c2)c(c-3ccc4C(N5C*)=O)c4c2C5=O)c2c-3c(C#N)cc3c12)=O)C3=O Chemical compound *CN(C(c1ccc(-c(c(O)c2)c(c-3ccc4C(N5C*)=O)c4c2C5=O)c2c-3c(C#N)cc3c12)=O)C3=O 0.000 description 9
- 238000005160 1H NMR spectroscopy Methods 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000004440 column chromatography Methods 0.000 description 9
- 229910000071 diazene Inorganic materials 0.000 description 9
- 229910002027 silica gel Inorganic materials 0.000 description 9
- 239000000741 silica gel Substances 0.000 description 9
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- UANLRWDWHCKCHY-UHFFFAOYSA-N BrC1=CC(=C2C(=CC=C3C4=C(C=C(C=5C(=CC=C(C1=C23)C45)C(=O)O)C(=O)O)Br)C(O)=N)C(O)=N Chemical compound BrC1=CC(=C2C(=CC=C3C4=C(C=C(C=5C(=CC=C(C1=C23)C45)C(=O)O)C(=O)O)Br)C(O)=N)C(O)=N UANLRWDWHCKCHY-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 125000003226 pyrazolyl group Chemical group 0.000 description 4
- OZNYBWZLXMPDRK-UHFFFAOYSA-N 1,7-dibromoperylene-3,4,9,10-tetracarboxylic acid Chemical compound C=12C3=C(Br)C=C(C(O)=O)C2=C(C(O)=O)C=CC=1C1=C(Br)C=C(C(O)=O)C2=C1C3=CC=C2C(=O)O OZNYBWZLXMPDRK-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000004407 fluoroaryl group Chemical group 0.000 description 3
- 125000002541 furyl group Chemical group 0.000 description 3
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 125000001544 thienyl group Chemical group 0.000 description 3
- CCZXMDQFIVMWMF-UHFFFAOYSA-N trifluoromethoxyboronic acid Chemical compound OB(O)OC(F)(F)F CCZXMDQFIVMWMF-UHFFFAOYSA-N 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- UBOXGVDOUJQMTN-UHFFFAOYSA-N 1,1,2-trichloroethane Chemical compound ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 2
- PPQJCISYYXZCAE-UHFFFAOYSA-N 1,10-phenanthroline;hydrate Chemical compound O.C1=CN=C2C3=NC=CC=C3C=CC2=C1 PPQJCISYYXZCAE-UHFFFAOYSA-N 0.000 description 2
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 2
- 125000006039 1-hexenyl group Chemical group 0.000 description 2
- 125000006023 1-pentenyl group Chemical group 0.000 description 2
- 125000006017 1-propenyl group Chemical group 0.000 description 2
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- LNMBCRKRCIMQLW-UHFFFAOYSA-N 2-tert-butylsulfanyl-2-methylpropane Chemical group CC(C)(C)SC(C)(C)C LNMBCRKRCIMQLW-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical group C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 2
- 125000000641 acridinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 description 2
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical group C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 2
- 125000000499 benzofuranyl group Chemical group O1C(=CC2=C1C=CC=C2)* 0.000 description 2
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 2
- 125000004196 benzothienyl group Chemical group S1C(=CC2=C1C=CC=C2)* 0.000 description 2
- 125000004541 benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- 125000001246 bromo group Chemical group Br* 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- WDECIBYCCFPHNR-UHFFFAOYSA-N chrysene Chemical compound C1=CC=CC2=CC=C3C4=CC=CC=C4C=CC3=C21 WDECIBYCCFPHNR-UHFFFAOYSA-N 0.000 description 2
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 2
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000000031 ethylamino group Chemical group [H]C([H])([H])C([H])([H])N([H])[*] 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
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- 239000007789 gas Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 125000002883 imidazolyl group Chemical group 0.000 description 2
- 125000001041 indolyl group Chemical group 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 125000005956 isoquinolyl group Chemical group 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 125000002971 oxazolyl group Chemical group 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 125000004625 phenanthrolinyl group Chemical group N1=C(C=CC2=CC=C3C=CC=NC3=C12)* 0.000 description 2
- 125000005561 phenanthryl group Chemical group 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000052 poly(p-xylylene) Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920000123 polythiophene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 125000001725 pyrenyl group Chemical group 0.000 description 2
- 125000004076 pyridyl group Chemical group 0.000 description 2
- 125000000168 pyrrolyl group Chemical group 0.000 description 2
- 125000005493 quinolyl group Chemical group 0.000 description 2
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000000335 thiazolyl group Chemical group 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- 125000004306 triazinyl group Chemical group 0.000 description 2
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Images
Abstract
Description
本発明は、ペリレン誘導体化合物、該化合物を用いた有機半導体用組成物、該有機半導体組成物を用いた有機半導体素子および有機薄膜トランジスタに関する。 The present invention relates to a perylene derivative compound, a composition for an organic semiconductor using the compound, an organic semiconductor device using the organic semiconductor composition, and an organic thin film.
従来、シリコン系の無機材料を無機半導体材料として用いた薄膜トランジスタが広く用いられているが、これらの製膜は高温度下で実施されるため、薄型ディスプレイ化に対応した基板として軽量でフレキシブルであるプラスチック材料などは、耐熱性に乏しく使用できないという難点がある。そこで、近年は、シリコン系の無機材料に代えて、半導体としての性質を示す有機化合物を有機半導体材料として用いた有機薄膜トランジスタの開発が盛んである。 Conventionally, thin film transistors using a silicon-based inorganic material as an inorganic semiconductor material have been widely used, but since these films are formed at a high temperature, they are lightweight and flexible as a substrate compatible with a thin display. Plastic materials and the like have a drawback that they have poor heat resistance and cannot be used. Therefore, in recent years, there has been active development of organic thin film transistors using an organic compound exhibiting properties as a semiconductor as an organic semiconductor material instead of a silicon-based inorganic material.
有機薄膜トランジスタにおける有機半導体材料を含有する有機半導体層の形成においては、真空中高温下で作製する真空蒸着プロセスと比較し、大気中で作製する溶液プロセスにより、製造コストをおさえつつ、有機薄膜トランジスタ素子の大型化が容易となる。さらに、製膜時に必要となる温度を下げることができ、基板にプラスチック材料などを用いることが可能となる。このため、フレキシブルな素子への適応可能な溶液プロセスに対応した有機半導体材料が望まれている。 In the formation of an organic semiconductor layer containing an organic semiconductor material in an organic thin film transistor, a solution process produced in the air is used as compared with a vacuum vapor deposition process produced in a vacuum at a high temperature to reduce the production cost of the organic thin film transistor element. It becomes easy to increase the size. Further, the temperature required for film formation can be lowered, and a plastic material or the like can be used for the substrate. For this reason, there is a demand for organic semiconductor materials that are compatible with solution processes that can be applied to flexible devices.
有機半導体層を形成する有機半導体は、正孔がキャリアとして流れるp型有機半導体材料と電子がキャリアとして流れるn型有機半導体材料に分類される。これまでにp型有機半導体材料が数多く報告されている。 Organic semiconductors that form an organic semiconductor layer are classified into p-type organic semiconductor materials in which holes flow as carriers and n-type organic semiconductor materials in which electrons flow as carriers. Many p-type organic semiconductor materials have been reported so far.
一方、n型有機半導体材料として、ペリレン誘導体やフラーレンなどで材料開発が進んでいるが、溶媒への溶解性が低く、溶液プロセスへの適合性が低い。 On the other hand, as n-type organic semiconductor materials, materials such as perylene derivatives and fullerenes are being developed, but their solubility in solvents is low and their compatibility with solution processes is low.
また、高性能n型有機半導体材料は、pn接合や集積回路構築のために必要であるが、電子電流は正孔電流と比べて大気や不純物を始めとする外的要因の影響を受けやすく、その電子移動度はp型有機半導体材料と比較して未だ低い。 In addition, high-performance n-type organic semiconductor materials are necessary for pn junctions and integrated circuit construction, but electron currents are more susceptible to external factors such as the atmosphere and impurities than hole currents. Its electron mobility is still low compared to p-type organic semiconductor materials.
上述した通り、溶液プロセスに適合する溶媒への高い溶解性と高いキャリア移動度を両立した有機半導体材料の開発が望まれている。 As described above, it is desired to develop an organic semiconductor material having both high solubility in a solvent suitable for a solution process and high carrier mobility.
本発明が解決しようとする課題は、溶液プロセスに対応した高い溶解性を有するn型有機半導体材料を提供し、さらに該n型有機半導体材料を有機半導体用組成物として用いた高電子移動度の有機半導体素子ならびに有機薄膜トランジスタを提供することである。 The problem to be solved by the present invention is to provide an n-type organic semiconductor material having high solubility corresponding to a solution process, and further to use the n-type organic semiconductor material as a composition for an organic semiconductor for high electron mobility. It is to provide an organic semiconductor element and an organic thin film.
上記課題を解決するため、発明者らは、溶液プロセスに対応した溶解性を有するn型有機半導体材料、および電子移動度に優れた有機薄膜トランジスタについて鋭意検討した結果、特定の構造を有することで溶解性が向上した化合物をn型有機半導体材料として用いること、さらに該化合物を有機半導体層に含有させることにより、高移動度な有機薄膜トランジスタが得られることを見出した。すなわち、本発明は以下を要旨とするものである。 In order to solve the above problems, the inventors have diligently studied an n-type organic semiconductor material having solubility corresponding to a solution process and an organic thin film having excellent electron mobility, and as a result, they are dissolved by having a specific structure. It has been found that an organic thin film having high mobility can be obtained by using a compound having improved properties as an n-type organic semiconductor material and further incorporating the compound in an organic semiconductor layer. That is, the gist of the present invention is as follows.
1.下記一般式(1)で表されるペリレン誘導体化合物。 1. 1. A perylene derivative compound represented by the following general formula (1).
[式中、R1およびR4は、同一であり、
水素原子、ハロゲン原子、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、
置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基、
置換基を有していてもよい炭素原子数5〜10のシクロアルキル基、
置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基、
または置換基を有していてもよい環形成原子数5〜36の複素環基を表す。
R2およびR3は、同一でも異なっていてもよく、
水素原子、水酸基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、
置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基、
置換基を有していてもよい炭素原子数5〜10のシクロアルキル基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基、
置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基、
置換基を有していてもよい炭素原子数0〜18のチオ基、
置換基を有していてもよい炭素原子数0〜20のアミノ基、
置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基、
または置換基を有していてもよい環形成原子数5〜36の複素環基を表す。
R5およびR6は、同一でも異なっていてもよく、
水素原子、ハロゲン原子、シアノ基、ニトロ基、ニトロソ基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基、
置換基を有していてもよい炭素原子数6〜36のフッ化アリール基、
置換基を有していてもよい炭素原子数1〜20のアシル基、
または置換基を有していてもよい炭素原子数0〜20のスルホニル基を表し、
R2とR3、R5とR6は互いに結合して環を形成していてもよい。]
[In the formula, R 1 and R 4 are the same,
Hydrogen atom, halogen atom,
A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent,
A linear or branched alkenyl group having 2 to 20 carbon atoms which may have a substituent,
A cycloalkyl group having 5 to 10 carbon atoms, which may have a substituent,
An aromatic hydrocarbon group having 6 to 36 carbon atoms, which may have a substituent,
Alternatively, it represents a heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent.
R 2 and R 3 may be the same or different
Hydrogen atom, hydroxyl group,
A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent,
A linear or branched alkenyl group having 2 to 20 carbon atoms which may have a substituent,
A cycloalkyl group having 5 to 10 carbon atoms, which may have a substituent,
A linear or branched alkoxy group having 1 to 20 carbon atoms which may have a substituent,
A cycloalkoxy group having 5 to 10 carbon atoms, which may have a substituent,
A thio group having 0 to 18 carbon atoms which may have a substituent,
An amino group having 0 to 20 carbon atoms, which may have a substituent,
An aromatic hydrocarbon group having 6 to 36 carbon atoms, which may have a substituent,
Alternatively, it represents a heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent.
R 5 and R 6 may be the same or different.
Hydrogen atom, halogen atom, cyano group, nitro group, nitroso group,
A linear or branched alkyl fluoride group having 1 to 20 carbon atoms, which may have a substituent,
Aryl fluoride group having 6 to 36 carbon atoms, which may have a substituent,
Acyl groups having 1 to 20 carbon atoms, which may have substituents,
Alternatively, it represents a sulfonyl group having 0 to 20 carbon atoms which may have a substituent.
R 2 and R 3 and R 5 and R 6 may be coupled to each other to form a ring. ]
2. 下記一般式(2)で表される、前記記載のペリレン誘導体化合物。 2. The above-mentioned perylene derivative compound represented by the following general formula (2).
[式中、R1とR4は、同一であり、
水素原子、ハロゲン原子、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルケニル基、
置換基を有していてもよい炭素原子数5〜10のシクロアルキル基、
置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基、
または置換基を有していてもよい環形成原子数5〜36の複素環基を表す。
R2は、水酸基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、
置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基、
置換基を有していてもよい炭素原子数5〜10のシクロアルキル基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基、
置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基、
置換基を有していてもよい炭素原子数0〜18のチオ基、
置換基を有していてもよい炭素原子数0〜20のアミノ基、
置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基、
または置換基を有していてもよい環形成原子数5〜36の複素環基を表す。
R5は、ハロゲン原子、シアノ基、ニトロ基、ニトロソ基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基、
置換基を有していてもよい炭素原子数6〜36のフッ化アリール基、
置換基を有していてもよい炭素原子数1〜20のアシル基、
または置換基を有していてもよい炭素原子数0〜20のスルホニル基を表す。]
[In the formula, R 1 and R 4 are the same,
Hydrogen atom, halogen atom,
A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent,
A linear or branched alkenyl group having 1 to 20 carbon atoms which may have a substituent,
A cycloalkyl group having 5 to 10 carbon atoms, which may have a substituent,
An aromatic hydrocarbon group having 6 to 36 carbon atoms, which may have a substituent,
Alternatively, it represents a heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent.
R 2 is a hydroxyl group,
A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent,
A linear or branched alkenyl group having 2 to 20 carbon atoms which may have a substituent,
A cycloalkyl group having 5 to 10 carbon atoms, which may have a substituent,
A linear or branched alkoxy group having 1 to 20 carbon atoms which may have a substituent,
A cycloalkoxy group having 5 to 10 carbon atoms, which may have a substituent,
A thio group having 0 to 18 carbon atoms which may have a substituent,
An amino group having 0 to 20 carbon atoms, which may have a substituent,
An aromatic hydrocarbon group having 6 to 36 carbon atoms, which may have a substituent,
Alternatively, it represents a heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent.
R 5 is a halogen atom, a cyano group, a nitro group, a nitroso group,
A linear or branched alkyl fluoride group having 1 to 20 carbon atoms, which may have a substituent,
Aryl fluoride group having 6 to 36 carbon atoms, which may have a substituent,
Acyl groups having 1 to 20 carbon atoms, which may have substituents,
Alternatively, it represents a sulfonyl group having 0 to 20 carbon atoms which may have a substituent. ]
3.前記一般式(1)において、R1およびR4の置換基の少なくとも1個がフッ素原子であるペリレン誘導体化合物。 3. 3. In the general formula (1), a perylene derivative compound in which at least one of the substituents of R 1 and R 4 is a fluorine atom.
4.前記一般式(1)において、R2、R3のうち少なくとも1個が水酸基、置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基、または置換基を有していてもよい炭素原子数0〜18のチオ基であるペリレン誘導体化合物。 4. In the general formula (1), at least one of R 2 and R 3 may have a hydroxyl group or a substituent as a linear or branched alkoxy group having 1 to 20 carbon atoms, or a substituent. A perylene derivative compound which is a thio group having 0 to 18 carbon atoms which may have.
5.前記一般式(1)において、R5、R6のうち少なくとも1つがシアノ基、または置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基であるペリレン誘導体化合物。 5. In the general formula (1), at least one of R 5 and R 6 is a linear or branched alkyl fluoride group having 1 to 20 carbon atoms which may have a cyano group or a substituent. A perylene derivative compound.
6.25±2℃における芳香族系有機溶媒またはハロゲン系有機溶媒への溶解度が0.02〜5質量%濃度である前記記載のペリレン誘導体化合物。 The perylene derivative compound according to the above, which has a solubility in an aromatic organic solvent or a halogen-based organic solvent at 6.25 ± 2 ° C. at a concentration of 0.02 to 5% by mass.
7.前記記載のペリレン誘導体化合物を含有する有機半導体用組成物。 7. A composition for an organic semiconductor containing the above-mentioned perylene derivative compound.
8.前記記載の有機半導体用組成物を用いた有機半導体素子。 8. An organic semiconductor device using the above-described composition for an organic semiconductor.
9.前記記載の有機半導体素子を用いた有機薄膜トランジスタ。 9. An organic thin film transistor using the organic semiconductor device described above.
本発明に係るペリレン誘導体化合物は、溶液プロセスに対応した有機溶媒への溶解性を有するn型有機半導体材料を提供することができ、さらに該有機半導体材料を含有する有機半導体用組成物を用いることにより、電子移動度に優れた有機薄膜トランジスタを得ることができる。 The perylene derivative compound according to the present invention can provide an n-type organic semiconductor material having solubility in an organic solvent corresponding to the solution process, and further, an organic semiconductor composition containing the organic semiconductor material shall be used. Therefore, an organic thin film having excellent electron mobility can be obtained.
以下、本発明の実施の形態について、詳細に説明する。本発明の一般式(1)で表される化合物は、溶媒に溶解させ、該化合物を含有する有機半導体用組成物を用いて有機半導体層を形成し、さらに有機半導体素子として用いる。なお、本願明細書において、有機半導体用組成物および有機半導体層は、一般式(1)で表される化合物の少なくとも1種を含有し、任意選択的に本願発明に属さない他の半導体用材料等を含む組成物をいう。 Hereinafter, embodiments of the present invention will be described in detail. The compound represented by the general formula (1) of the present invention is dissolved in a solvent, an organic semiconductor layer is formed by using a composition for an organic semiconductor containing the compound, and the compound is further used as an organic semiconductor device. In the specification of the present application, the composition for an organic semiconductor and the organic semiconductor layer contain at least one compound represented by the general formula (1), and optionally other materials for semiconductors that do not belong to the present invention. And the like.
以下に、前記一般式(1)で表される化合物について具体的に説明するが、本発明はこれらに限定されるものではない。なお本願明細書において「〜」を用いて表される数値範囲は「〜」前後に記載される数値を下限値および上限値として含む範囲を意味する。 Hereinafter, the compound represented by the general formula (1) will be specifically described, but the present invention is not limited thereto. In the specification of the present application, the numerical range represented by using "~" means a range including the numerical values before and after "~" as the lower limit value and the upper limit value.
本発明において、「ハロゲン原子」としては、フッ素、塩素、臭素およびヨウ素があげられる。 In the present invention, examples of the "halogen atom" include fluorine, chlorine, bromine and iodine.
一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」における「炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」としては、具体的に、メチル基、エチル基、n−プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、イソプロピル基、イソブチル基、s−ブチル基、t−ブチル基、イソオクチル基、t−オクチル基などをあげることができる。 In the general formula (1), the "linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent" represented by R 1 and R 4 has "1 to 1 carbon atoms". Specific examples of the "20 linear or branched alkyl groups" include methyl group, ethyl group, n-propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group and decyl group. , Isobutyl group, isobutyl group, s-butyl group, t-butyl group, isooctyl group, t-octyl group and the like.
一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」における「炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」としては、具体的に、ビニル基、1−プロペニル基、アリル基、1−ブテニル基、2−ブテニル基、1−ペンテニル基、1−ヘキセニル基、イソプロペニル基、イソブテニル基、またはこれらのアルケニル基が複数結合した炭素原子数2〜18の直鎖状もしくは分岐状のアルケニル基などをあげることができる。 In the general formula (1), the "linear or branched alkenyl group having 2 to 20 carbon atoms which may have a substituent" represented by R 1 and R 4 has "2 to 2 carbon atoms". Specific examples of the "20 linear or branched alkenyl groups" include a vinyl group, a 1-propenyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, a 1-pentenyl group and a 1-hexenyl group. Examples thereof include an isopropenyl group, an isobutenyl group, and a linear or branched alkenyl group having 2 to 18 carbon atoms to which a plurality of these alkenyl groups are bonded.
一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」における「炭素原子数5〜10のシクロアルキル基」としては、具体的に、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基、シクロデシル基、シクロドデシル基などをあげることができる。 In the general formula (1), "cycloalkyl group having 5 to 10 carbon atoms" in the "cycloalkyl group substituent may having 5 to 10 carbon atoms which may have a" R 1 and R 4 in the formula Specific examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclodecyl group, a cyclododecyl group and the like.
一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」における「炭素原子数6〜36の芳香族炭化水素基」としては具体的に、フェニル基、ビフェニル基、テルフェニル基、ナフチル基、ビフェニル基、アントラセニル基(アントリル基)、フェナントリル基、フルオレニル基、インデニル基、ピレニル基、ペリレニル基、フルオランテニル基、トリフェニレニル基などをあげることができる。なお、本発明において芳香族炭化水素基には、「縮合多環芳香族基」が含まれるものとする。 In the general formula (1), the "aromatic hydrocarbon group having 6 to 36 carbon atoms" in the "aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a substituent" represented by R 1 and R 4 is used. Specific examples of the "hydrocarbon group" include a phenyl group, a biphenyl group, a terphenyl group, a naphthyl group, a biphenyl group, an anthracenyl group (anthryl group), a phenanthryl group, a fluorenyl group, an indenyl group, a pyrenyl group, a perylenel group, and a fluorane group. Examples include a tenyl group and a triphenylenyl group. In the present invention, the aromatic hydrocarbon group includes a "condensed polycyclic aromatic group".
一般式(1)において、R1およびR4で表される「置換基を有していてもよい環形成原子数5〜36の複素環基」における「環形成原子数5〜36の複素環基」としては具体的に、ピリジル基、ピリミジリニル基、トリアジニル基、チエニル基、フリル基(フラニル基)、ピロリル基、イミダゾリル基、ピラゾリル基、トリアゾリル基、キノリル基、イソキノリル基、ナフチルジニル基、アクリジニル基、フェナントロリニル基、ベンゾフラニル基、ベンゾチエニル基、オキサゾリル基、インドリル基、カルバゾリル基、ベンゾオキサゾリル基、チアゾリル基、ベンゾチアゾリル基、キノキサリニル基、ベンゾイミダゾリル基、ピラゾリル基、ジベンゾフラニル基、ジベンゾチエニル基、カルボニリル基などをあげることができる。 In the general formula (1), the "heterocycle having 5 to 36 ring-forming atoms" in the "heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" represented by R 1 and R 4 is used. Specific examples of the "group" include pyridyl group, pyrimidilinyl group, triazinyl group, thienyl group, furyl group (furanyl group), pyrrolyl group, imidazolyl group, pyrazolyl group, triazolyl group, quinolyl group, isoquinolyl group, naphthyldinyl group and acridinyl group. , Phenanthrolinyl group, benzofuranyl group, benzothienyl group, oxazolyl group, indolyl group, carbazolyl group, benzoxazolyl group, thiazolyl group, benzothiazolyl group, quinoxalinyl group, benzoimidazolyl group, pyrazolyl group, dibenzofuranyl group, dibenzo Examples include a thienyl group and a carbonylyl group.
一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」、「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」、「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」または「置換基を有していてもよい環形成原子数5〜36の複素環基」における「置換基」としては、具体的に、フッ素原子、塩素原子、臭素原子、ヨウ素原子などのハロゲン原子;シアノ基;水酸基;ニトロ基;ニトロソ基;カルボキシル基;
メチルエステル基、エチルエステル基などのカルボン酸エステル基;
メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、s−ブチル基、t−ブチル基、n−ペンチル基、イソペンチル基、n−ヘキシル基、2−エチルヘキシル基、ヘプチル基、オクチル基、イソオクチル基、ノニル基、デシル基などの炭素原子数1〜18の直鎖状もしくは分岐状のアルキル基;
ビニル基、1−プロペニル基、アリル基、1−ブテニル基、2−ブテニル基、1−ペンテニル基、1−ヘキセニル基、イソプロペニル基、イソブテニル基など炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基;
メトキシ基、エトキシ基、プロポキシ基、t−ブトキシ基、ペンチルオキシ基、ヘキシルオキシ基などの炭素原子数1〜18の直鎖状もしくは分岐状のアルコキシ基;
フェニル基、ナフチル基、アントリル基、フェナントリル基、ピレニル基などの炭素原子数6〜30の芳香族炭化水素基;
ピリジル基、ピリミジリニル基、トリアジニル基、チエニル基、フリル基(フラニル基)、ピロリル基、イミダゾリル基、ピラゾリル基、トリアゾリル基、キノリル基、イソキノリル基、ナフチルジニル基、アクリジニル基、フェナントロリニル基、ベンゾフラニル基、ベンゾチエニル基、オキサゾリル基、インドリル基、カルバゾリル基、ベンゾオキサゾリル基、チアゾリル基、ベンゾチアゾリル基、キノキサリニル基、ベンゾイミダゾリル基、ピラゾリル基、ジベンゾフラニル基、ジベンゾチエニル基、カルボニリル基などの環形成原子数2〜30の複素環基;
無置換アミノ基(―NH2)、エチルアミノ基、アセチルアミノ基、フェニルアミノ基などの一置換アミノ基、またはジエチルアミノ基、ジフェニルアミノ基、アセチルフェニルアミノ基などの二置換アミノ基である、炭素原子数0〜18のアミノ基;
無置換チオ基(チオール基:―SH)、メチルチオ基、エタンチオ基、プロピルチオ基、ジ−t−ブチルチオ基、ヘキサ−5−エン−3−チオ基、フェニルチオ基、ビフェニルチオ基などの炭素原子数0〜18のチオ基;
などをあげることができる。これらの「置換基」は、1つのみ含まれてもよく、複数含まれてもよく、複数含まれる場合は互いに同一でも異なっていてもよい。また、これら「置換基」はさらに前記例示した置換基を有していてもよい。
In the general formula (1), "a linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent" and "having a substituent" represented by R 1 and R 4 It may have a linear or branched alkenyl group having 2 to 20 carbon atoms, "a cycloalkyl group having 5 to 10 carbon atoms which may have a substituent", and "having a substituent". The "substituent" in "an aromatic hydrocarbon group having 6 to 36 carbon atoms which may be present" or "a heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" is specific. Halogen atoms such as fluorine atom, chlorine atom, bromine atom, iodine atom; cyano group; hydroxyl group; nitro group; nitroso group; carboxyl group;
Carboxylate ester groups such as methyl ester groups and ethyl ester groups;
Methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, s-butyl group, t-butyl group, n-pentyl group, isopentyl group, n-hexyl group, 2-ethylhexyl group, A linear or branched alkyl group having 1 to 18 carbon atoms such as a heptyl group, an octyl group, an isooctyl group, a nonyl group, and a decyl group;
Linear or branched with 2 to 20 carbon atoms such as vinyl group, 1-propenyl group, allyl group, 1-butenyl group, 2-butenyl group, 1-pentenyl group, 1-hexenyl group, isopropenyl group, isobutenyl group Alkenyl group;
A linear or branched alkoxy group having 1 to 18 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group, a t-butoxy group, a pentyloxy group, and a hexyloxy group;
Aromatic hydrocarbon groups with 6 to 30 carbon atoms such as phenyl group, naphthyl group, anthryl group, phenanthryl group, pyrenyl group;
Pyridyl group, pyrimidilinyl group, triazinyl group, thienyl group, frill group (furanyl group), pyrrolyl group, imidazolyl group, pyrazolyl group, triazolyl group, quinolyl group, isoquinolyl group, naphthyldinyl group, acridinyl group, phenanthrolinyl group, benzofuranyl Rings of groups, benzothienyl groups, oxazolyl groups, indolyl groups, carbazolyl groups, benzoxazolyl groups, thiazolyl groups, benzothiazolyl groups, quinoxalinyl groups, benzoimidazolyl groups, pyrazolyl groups, dibenzofuranyl groups, dibenzothienyl groups, carbonylyl groups, etc. Heterocyclic group with 2 to 30 atoms formed;
Carbon, which is a monosubstituted amino group such as an unsubstituted amino group (-NH 2 ), an ethylamino group, an acetylamino group, or a phenylamino group, or a disubstituted amino group such as a diethylamino group, a diphenylamino group, or an acetylphenylamino group. Amino group with 0 to 18 atoms;
Number of carbon atoms such as unsubstituted thio group (thiol group: -SH), methyl thio group, ethane thio group, propyl thio group, di-t-butyl thio group, hexa-5-en-3-thio group, phenyl thio group, biphenyl thio group, etc. 0-18 thio groups;
And so on. Only one of these "substituents" may be contained, a plurality of these "substituents" may be contained, and when a plurality of these "substituents" are contained, they may be the same or different from each other. In addition, these "substituents" may further have the above-exemplified substituents.
一般式(1)において、R1およびR4は、同一でも異なっていてもよいが、同一であることが好ましい。また、置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、置換基を有していてもよい炭素原子数6〜20の芳香族炭化水素基であることが好ましく、さらに少なくとも1以上のフッ素原子を含有していることが好ましい。 In the general formula (1), R 1 and R 4 may be the same or different, but are preferably the same. Further, a linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent and an aromatic hydrocarbon group having 6 to 20 carbon atoms which may have a substituent may be used. It is preferable that it is present, and it is preferable that it further contains at least one fluorine atom.
一般式(1)において、R2およびR3は、同一でも異なっていてもよいが、電子供与性の置換基を含有していることが好ましい。R2およびR3としては、限定はされないが、
水素原子、水酸基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、
置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基、
置換基を有していてもよい炭素原子数5〜10のシクロアルキル基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基、
置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基、
置換基を有していてもよい炭素原子数0〜18のチオ基、
置換基を有していてもよい炭素原子数0〜20のアミノ基、
置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基、
または置換基を有していてもよい環形成原子数5〜36の複素環基などをあげることができる。
In the general formula (1), R 2 and R 3 may be the same or different, but preferably contain an electron-donating substituent. R 2 and R 3 are not limited, but
Hydrogen atom, hydroxyl group,
A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent,
A linear or branched alkenyl group having 2 to 20 carbon atoms which may have a substituent,
A cycloalkyl group having 5 to 10 carbon atoms, which may have a substituent,
A linear or branched alkoxy group having 1 to 20 carbon atoms which may have a substituent,
A cycloalkoxy group having 5 to 10 carbon atoms, which may have a substituent,
A thio group having 0 to 18 carbon atoms which may have a substituent,
An amino group having 0 to 20 carbon atoms, which may have a substituent,
An aromatic hydrocarbon group having 6 to 36 carbon atoms, which may have a substituent,
Alternatively, a heterocyclic group having 5 to 36 ring-forming atoms, which may have a substituent, and the like can be mentioned.
一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」における「炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」としては、一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」と同じものをあげることができる。 In the general formula (1), the "linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent" represented by R 2 and R 3 has "1 to 1 carbon atoms". As the "20 linear or branched alkyl group", in the general formula (1), "a straight chain having 1 to 20 carbon atoms which may have a substituent may have a substituent" represented by R 1 and R 4. The same as the "formal or branched alkyl group" can be mentioned.
一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルケニル基」における「炭素原子数1〜20の直鎖状もしくは分岐状のアルケニル基」としては、一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルケニル基」と同じものをあげることができる。 In the general formula (1), the "linear or branched alkenyl group having 1 to 20 carbon atoms which may have a substituent" represented by R 2 and R 3 has "1 to 1 carbon atoms". As the "20 linear or branched alkenyl group", in the general formula (1), the "linear group having 1 to 20 carbon atoms which may have a substituent may be represented by R 1 and R 4". The same as the "formal or branched alkenyl group" can be mentioned.
一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」における「炭素原子数5〜10のシクロアルキル基」としては、一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」と同じものをあげることができる。 In the general formula (1), the "cycloalkyl group having 5 to 10 carbon atoms" in the "cycloalkyl group having 5 to 10 carbon atoms which may have a substituent" represented by R 2 and R 3. As the general formula (1), the same group as the “cycloalkyl group having 5 to 10 carbon atoms which may have a substituent” represented by R 1 and R 4 can be mentioned.
一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基」における「炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基」としては、具体的に、メトキシ基、エトキシ基、プロポキシ基、n−ブトキシ基、n−ペンチルオキシ基、n−ヘキシルオキシ基、ヘプチルオキシ基、オクチルオキシ基、ノニルオキシ基、デシルオキシ基、イソプロポキシ基、イソブトキシ基、s−ブトキシ基、t−ブトキシ基、イソオクチルオキシ基、t−オクチルオキシ基、フェノキシ基、トリルオキシ基、ビフェニリルオキシ基、ターフェニリルオキシ基、ナフチルオキシ基、アントリルオキシ基、フェナントリルオキシ基、フルオレニルオキシ基、インデニルオキシ基などをあげることができる。 In the general formula (1), the "linear or branched alkoxy group having 1 to 20 carbon atoms which may have a substituent" represented by R 2 and R 3 has "1 to 1 carbon atoms". Specific examples of the "20 linear or branched alkoxy groups" include methoxy group, ethoxy group, propoxy group, n-butoxy group, n-pentyloxy group, n-hexyloxy group, heptyloxy group and octyl. Oxy group, nonyloxy group, decyloxy group, isopropoxy group, isobutoxy group, s-butoxy group, t-butoxy group, isooctyloxy group, t-octyloxy group, phenoxy group, tolyloxy group, biphenylyloxy group, terpheni Examples thereof include a lyloxy group, a naphthyloxy group, an anthryloxy group, a phenanthryloxy group, a fluorenyloxy group, an indenyloxy group and the like.
一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基」における「炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基」としては、具体的に、シクロプロポキシ基、シクロブトキシ基、シクロペンチルオキシ基、シクロヘキシルオキシ基などをあげることができる。 In the general formula (1), "a linear or linear group having 1 to 20 carbon atoms" in "a cycloalkoxy group having 5 to 10 carbon atoms which may have a substituent" represented by R 2 and R 3. Specific examples of the "branched alkoxy group" include a cyclopropoxy group, a cyclobutoxy group, a cyclopentyloxy group, and a cyclohexyloxy group.
一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数0〜18のチオ基」における、「チオ基」(―SR7)は無置換または一置換体であり、R7は炭素原子数0〜18の直鎖状もしくは分岐状のアルキル基、または炭素原子数0〜18の芳香族炭化水素基を表し、「炭素原子数0〜18のチオ基」としては、具体的には、無置換チオ基(チオール基:―SH)、メチルチオ基、エタンチオ基、プロピルチオ基、ジ−t−ブチルチオ基、ヘキサ−5−エン−3−チオ基、フェニルチオ基、ビフェニルチオ基などをあげることができる。R7は、置換基を有していてもよい炭素原子数1〜18の直鎖状もしくは分岐状のアルキル基メチル基、エチル基、n−プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、イソプロピル基、イソブチル基、s−ブチル基、t−ブチル基、イソオクチル基、t−オクチル基などをあげることができる。 In the general formula (1), the "thio group" (-SR 7 ) in the "thio group having 0 to 18 carbon atoms which may have a substituent" represented by R 2 and R 3 is unsubstituted. Alternatively, it is a monosubstituted product, and R 7 represents a linear or branched alkyl group having 0 to 18 carbon atoms or an aromatic hydrocarbon group having 0 to 18 carbon atoms. Specific examples of the "thio group" include an unsubstituted thio group (thiol group: -SH), a methyl thio group, an ethane thio group, a propyl thio group, a di-t-butyl thio group, and a hexa-5-ene-3-thio group. , Phenylthio group, biphenylthio group and the like can be mentioned. R 7 is a linear or branched alkyl group having 1 to 18 carbon atoms which may have a substituent, methyl group, ethyl group, n-propyl group, butyl group, pentyl group, hexyl group and heptyl. Examples thereof include a group, an octyl group, a nonyl group, a decyl group, an isopropyl group, an isobutyl group, an s-butyl group, a t-butyl group, an isooctyl group and a t-octyl group.
一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数0〜20のアミノ基」における「炭素原子数0〜20のアミノ基」としては、具体的に、無置換アミノ基(―NH2)、一置換アミノ基としてエチルアミノ基、アセチルアミノ基、フェニルアミノ基など、また、二置換アミノ基としてジエチルアミノ基、ジフェニルアミノ基、アセチルフェニルアミノ基などをあげることができる。 In the general formula (1), the "amino group having 0 to 20 carbon atoms" in the "amino group having 0 to 20 carbon atoms which may have a substituent" represented by R 2 and R 3 is used. , Specifically, an unsubstituted amino group (-NH 2 ), an ethylamino group, an acetylamino group, a phenylamino group, etc. as a monosubstituted amino group, and a diethylamino group, a diphenylamino group, an acetylphenylamino as a disubstituted amino group. You can give a base.
一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」における「炭素原子数6〜20の芳香族炭化水素基」としては、一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」と同じものをあげることができる。 In the general formula (1), the "aromatic hydrocarbon group having 6 to 36 carbon atoms" in the "aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a substituent" represented by R 2 and R 3 is used. The "hydrocarbon group" is the same as the "aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a substituent" represented by R 1 and R 4 in the general formula (1). I can give it.
一般式(1)において、R2およびR3で表される「置換基を有していてもよい環形成原子数5〜36の複素環基」における「環形成原子数5〜36の複素環基」としては一般式(1)において、R1およびR4で表される「置換基を有していてもよい環形成原子数5〜36の複素環基」と同じものをあげることができる。 In the general formula (1), the "heterocycle having 5 to 36 ring-forming atoms" in the "heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" represented by R 2 and R 3 is used. As the "group", the same group as the "heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" represented by R 1 and R 4 can be mentioned in the general formula (1). ..
一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」、「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」、「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基」、「置換基を有していてもよい炭素原子数0〜18のチオ基」、「置換基を有していてもよい炭素原子数0〜20のアミノ基」、「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」、または「置換基を有していてもよい環形成原子数5〜36の複素環基」の「置換基」としては、前記一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」、「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」、「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」または「置換基を有していてもよい環形成原子数5〜36の複素環基」における「置換基」と同じものをあげることができる。 In the general formula (1), "a linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent" and "having a substituent" represented by R 2 and R 3 It may have a linear or branched alkenyl group having 2 to 20 carbon atoms, "a cycloalkyl group having 5 to 10 carbon atoms which may have a substituent", and "having a substituent". It may have a linear or branched alkoxy group having 1 to 20 carbon atoms, "a cycloalkoxy group having 5 to 10 carbon atoms which may have a substituent", and "having a substituent". A thio group having 0 to 18 carbon atoms which may be present, an amino group having 0 to 20 carbon atoms which may have a substituent, and 6 carbon atoms which may have a substituent. The "substituent" of the "aromatic hydrocarbon group of ~ 36" or the "heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" is R in the above general formula (1). "A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent" and " 2 which may have a substituent" represented by 1 and R4. ~ 20 linear or branched alkenyl groups ”,“ cycloalkyl groups having 5 to 10 carbon atoms which may have substituents ”,“ 6 carbon atoms which may have substituents ” The same as the "substituent" in "the aromatic hydrocarbon group of ~ 36" or "the heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" can be mentioned.
一般式(1)において、R2およびR3は、同一でも異なっていてもよく、水酸基、置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基、置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基、または置換基を有していてもよい環形成原子数5〜36の複素環基であることが好ましい。 In the general formula (1), R 2 and R 3 may be the same or different, and may have a hydroxyl group or a substituent, and may have a linear or branched alkoxy group having 1 to 20 carbon atoms. It is preferably a cycloalkoxy group having 5 to 10 carbon atoms which may have a substituent, or a heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent.
一般式(1) において、R5およびR6は、同一でも異なっていてもよいが、電子求引性の置換基であることが好ましい。R5およびR6としては、限定はされないが、
水素原子、ハロゲン原子、シアノ基、ニトロ基、ニトロソ基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基、
置換基を有していてもよい炭素原子数6〜36のフッ化アリール基、
置換基を有していてもよい炭素原子数1〜20のアシル基、
または置換基を有していてもよい炭素原子数0〜20のスルホニル基などをあげることができる。
In the general formula (1), R 5 and R 6 may be the same or different, but are preferably electron-attracting substituents. R 5 and R 6 are not limited, but
Hydrogen atom, halogen atom, cyano group, nitro group, nitroso group,
A linear or branched alkyl fluoride group having 1 to 20 carbon atoms, which may have a substituent,
Aryl fluoride group having 6 to 36 carbon atoms, which may have a substituent,
Acyl groups having 1 to 20 carbon atoms, which may have substituents,
Alternatively, a sulfonyl group having 0 to 20 carbon atoms which may have a substituent may be mentioned.
一般式(1)において、R5およびR6で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基」における「炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基」としては、具体的に、トリフルオロメチル基、ジフルオロメチル基、ペルフルオロエチル基、2,2,2−トリフルオロエチル基、1,1,2,2−テトラフルオロエチル基、ペルフルオロプロピル基、2,2,3,3,3−ペンタフルオロプロピル基、ペルフルオロブチル基、1,1,2,2,3,3,4,4−オクタフルオロブチル基、ペルフルオロペンチル基などをあげることができ、「フッ化アルキル基」は、アルキル基の水素原子の一部又は全部がフッ素原子で置換された基であり、パーフルオロアルキル基(またはペルフルオロアルキル基)を含むものとする。 In the general formula (1), "number of carbon atoms in the" linear or branched fluorinated alkyl group which may having 1 to 20 carbon atoms optionally having a substituent "represented by R 5 and R 6 Specific examples of the "1 to 20 linear or branched alkyl fluorinated groups" include trifluoromethyl group, difluoromethyl group, perfluoroethyl group, 2,2,2-trifluoroethyl group, and 1,1. , 2,2-Tetrafluoroethyl group, perfluoropropyl group, 2,2,3,3,3-pentafluoropropyl group, perfluorobutyl group, 1,1,2,2,3,3,4,4-octa Fluorobutyl group, perfluoropentyl group and the like can be mentioned. The "fluorinated alkyl group" is a group in which a part or all of the hydrogen atom of the alkyl group is substituted with a fluorine atom, and is a perfluoroalkyl group (or perfluoroalkyl group). Alkyl group) shall be included.
一般式(1)において、R5およびR6で表される「置換基を有していてもよい炭素原子数6〜36のフッ化アリール基」における「炭素原子数6〜36のフッ化アリール基」としては、具体的に、ペンタフルオロフェニル基、ヘプタフルオロ−2−ナフチル基などがあげられ、「フッ化アリール基」とは、アリール基の水素原子の一部又は全部がフッ素原子、または前述の「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基」が1個以上置換されたものも含まれる。「フッ化アリール基」は、アリール基(芳香族炭化水素基)に含まれる水素原子の全部がフッ素原子により置換されたパーフルオロアリール基(または、ペルフルオロアリール基)が含まれるものとする。 In the general formula (1), fluorinated aryl R 5 and the number "carbon atoms in the" fluoroaryl group which may carbon atoms 6 to 36 which may have a substituent "represented by R 6 6-36 Specific examples of the "group" include a pentafluorophenyl group and a heptafluoro-2-naphthyl group. The "arylfluoride group" is a fluorine atom or a whole of hydrogen atoms of an aryl group. It also includes those in which one or more of the above-mentioned "linear or branched alkyl fluoride groups having 1 to 20 carbon atoms which may have a substituent" are substituted. The "arylfluoride group" is assumed to include a perfluoroaryl group (or a perfluoroaryl group) in which all the hydrogen atoms contained in the aryl group (aromatic hydrocarbon group) are substituted with fluorine atoms.
一般式(1)において、R5およびR6で表される「置換基を有していてもよい炭素原子数1〜20のアシル基」における「炭素原子数1〜20のアシル基」としては、具体的に、ホルミル基、アセチル基、プロピオニル基、アクリリル基、ベンゾイル基などをあげることができる。 In the general formula (1), the "acyl group having 1 to 20 carbon atoms" in the "acyl group having 1 to 20 carbon atoms which may have a substituent" represented by R 5 and R 6 is used as the "acyl group having 1 to 20 carbon atoms". Specifically, a formyl group, an acetyl group, a propionyl group, an acryryl group, a benzoyl group and the like can be mentioned.
一般式(1)において、R5およびR6で表される「置換基を有していてもよい炭素原子数0〜20のスルホニル基」における「炭素原子数0〜20のスルホニル基」としては、具体的に、スルホンアミド基(―S(=O)2―NH2)、メシル基、トシル基などをあげることができる。 In the general formula (1), the "sulfonyl group having 0 to 20 carbon atoms" in the "sulfonyl group having 0 to 20 carbon atoms which may have a substituent" represented by R 5 and R 6 is Specifically, a sulfonamide group (-S (= O) 2- NH 2 ), a mesyl group, a tosyl group, and the like can be mentioned.
一般式(1)において、R5およびR6で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基」、「置換基を有していてもよい炭素原子数6〜36のフッ化アリール基」、「置換基を有していてもよい炭素原子数1〜20のアシル基」、または「置換基を有していてもよい炭素原子数0〜20のスルホニル基」の「置換基」としては、前記一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」、「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」、「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」または「置換基を有していてもよい環形成原子数5〜36の複素環基」における「置換基」と同じものをあげることができる。 In the general formula (1), "a linear or branched alkyl fluoride group having 1 to 20 carbon atoms which may have a substituent" and "a substituent may be represented by R 5 and R 6". It may have an aryl fluoride group having 6 to 36 carbon atoms, an acyl group having 1 to 20 carbon atoms which may have a substituent, or an acyl group having a substituent. As the "substituent" of the "sulfonyl group having a good number of carbon atoms 0 to 20," the "substituted group may have a substituent" represented by R 1 and R 4 in the general formula (1). ~ 20 linear or branched alkyl group ”,“ linear or branched alkenyl group having 2 to 20 carbon atoms which may have a substituent ”,“ having a substituent It may have a cycloalkyl group having 5 to 10 carbon atoms, an aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a substituent, or a ring formation which may have a substituent. The same as the "substituent" in the "heterocyclic group having 5 to 36 atoms" can be mentioned.
一般式(1)において、R5およびR6は、同一でも異なっていてもよく、水素原子、シアノ基、置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基、または置換基を有していてもよい炭素原子数6〜36のフッ化アリール基であることが好ましい。 In the general formula (1), R 5 and R 6 may be the same or different, and may have a hydrogen atom, a cyano group, and a substituent, and may have 1 to 20 carbon atoms in a linear or branched form. It is preferably an alkyl fluoride group or an aryl fluoride group having 6 to 36 carbon atoms which may have a substituent.
一般式(1)において、R2、R3、R5、R6は上記で述べたとおりの置換基を表すが、R2およびR3、R5およびR6は、単結合、硫黄原子を介した結合もしくは窒素原子を介した結合によって互いに結合して環を形成していてもよい。 In the general formula (1), R 2 , R 3 , R 5 , and R 6 represent the substituents as described above, whereas R 2 and R 3 , R 5 and R 6 are single bonds and sulfur atoms. The rings may be formed by bonding with each other by a bond via a bond or a bond via a nitrogen atom.
一般式(1)は前記一般式(2)で表されることが好ましい。 The general formula (1) is preferably represented by the general formula (2).
一般式(2)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」、「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」、「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」、または「置換基を有していてもよい環形成原子数5〜36の複素環基」としては、一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」、「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」、「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」、または「置換基を有していてもよい環形成原子数5〜36の複素環基」と同じものをあげることができる。 In the general formula (2), "a linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent" and "having a substituent" represented by R 1 and R 4 It may have a linear or branched alkenyl group having 2 to 20 carbon atoms, "a cycloalkyl group having 5 to 10 carbon atoms which may have a substituent", and "having a substituent". The "aromatic hydrocarbon group having 6 to 36 carbon atoms which may be present" or the "heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" is given in the general formula (1). , R 1 and R 4 "a linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent", "a carbon atom which may have a substituent". "Linear or branched alkenyl group of number 2 to 20,""cycloalkyl group having 5 to 10 carbon atoms which may have a substituent", "carbon atom which may have a substituent" The same as "aromatic hydrocarbon group of number 6 to 36" or "heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" can be mentioned.
一般式(2)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」、「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」、「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」または「置換基を有していてもよい環形成原子数5〜36の複素環基」における「置換基」としては、前記一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」、「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」、「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」または「置換基を有していてもよい環形成原子数5〜36の複素環基」における「置換基」と同じものをあげることができる。 In the general formula (2), "a linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent" and "having a substituent" represented by R 1 and R 4 It may have a linear or branched alkenyl group having 2 to 20 carbon atoms, "a cycloalkyl group having 5 to 10 carbon atoms which may have a substituent", and "having a substituent". The "substituent" in "an aromatic hydrocarbon group having 6 to 36 carbon atoms which may be present" or "a heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" is generally used. In the formula (1), it has "a linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent" and "a substituent" represented by R 1 and R 4. It may have a linear or branched alkenyl group having 2 to 20 carbon atoms, a cycloalkyl group having 5 to 10 carbon atoms which may have a substituent, and a substituent. The same as the "substituent" in the "aromatic hydrocarbon group having 6 to 36 carbon atoms" or the "heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" is given. Can be done.
一般式(2)において、R1およびR4は、同一でも異なっていてもよいが、同一であることが好ましく、置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基であることが好ましく、さらに少なくとも1個以上のフッ素原子を含有していることが好ましい。 In the general formula (2), R 1 and R 4 may be the same or different, but are preferably the same, and may have a substituent and are linear or linear with 1 to 20 carbon atoms. It is preferably an aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a branched alkyl group or substituent, and more preferably contains at least one fluorine atom.
一般式(2)においてR2は電子供与性の置換基であることが好ましい。電子供与性の置換基としては、限定はされないが、
水酸基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、
置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基、
置換基を有していてもよい炭素原子数5〜10のシクロアルキル基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基、
置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基、
置換基を有していてもよい炭素原子数0〜18のチオ基、
置換基を有していてもよい炭素原子数0〜20のアミノ基、
置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基、
または置換基を有していてもよい環形成原子数5〜36の複素環基などをあげることができる。
In the general formula (2), R 2 is preferably an electron-donating substituent. The electron-donating substituent is not limited, but is limited.
Hydroxy group,
A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent,
A linear or branched alkenyl group having 2 to 20 carbon atoms which may have a substituent,
A cycloalkyl group having 5 to 10 carbon atoms, which may have a substituent,
A linear or branched alkoxy group having 1 to 20 carbon atoms which may have a substituent,
A cycloalkoxy group having 5 to 10 carbon atoms, which may have a substituent,
A thio group having 0 to 18 carbon atoms which may have a substituent,
An amino group having 0 to 20 carbon atoms, which may have a substituent,
An aromatic hydrocarbon group having 6 to 36 carbon atoms, which may have a substituent,
Alternatively, a heterocyclic group having 5 to 36 ring-forming atoms, which may have a substituent, and the like can be mentioned.
一般式(2)において、R2で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」における「炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」としては、一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」と同じものをあげることができる。 In the general formula (2), the "linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent" represented by R 2 is "directly having 1 to 20 carbon atoms". The chain or branched alkyl group is a linear or branched group having 1 to 20 carbon atoms which may have a substituent and is represented by R 1 and R 4 in the general formula (1). The same as the "alkane group" can be mentioned.
一般式(2)において、R2で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルケニル基」における「炭素原子数1〜20の直鎖状もしくは分岐状のアルケニル基」としては、一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルケニル基」と同じものをあげることができる。 In the general formula (2), the "linear or branched alkenyl group having 1 to 20 carbon atoms which may have a substituent" represented by R 2 is "directly having 1 to 20 carbon atoms". The chain or branched alkenyl group is a linear or branched group having 1 to 20 carbon atoms which may have a substituent and is represented by R 1 and R 4 in the general formula (1). The same as the "alkenyl group in the form" can be mentioned.
一般式(2)において、R2で表される「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」における「炭素原子数5〜10のシクロアルキル基」としては、一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」と同じものをあげることができる。 In the general formula (2), the "cycloalkyl group having 5 to 10 carbon atoms" in the "cycloalkyl group having 5 to 10 carbon atoms which may have a substituent" represented by R 2 is defined as. In the general formula (1), the same group as the "cycloalkyl group having 5 to 10 carbon atoms which may have a substituent" represented by R 1 and R 4 can be mentioned.
一般式(2)において、R2で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基」における「炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基」としては、一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基」と同じものをあげることができる。 In the general formula (2), the "linear or branched alkoxy group having 1 to 20 carbon atoms which may have a substituent" represented by R 2 is "directly having 1 to 20 carbon atoms". The chain or branched alkoxy group is a linear or branched group having 1 to 20 carbon atoms which may have a substituent and is represented by R 2 and R 3 in the general formula (1). The same as the "alkoxy group in the form" can be mentioned.
一般式(2)において、R2で表される「置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基」における「炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基」としては、一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基」と同じものをあげることができる。 In the general formula (2), represented by R 2 of "1 to 20 carbon atoms in the" cycloalkoxy group which may having 5 to 10 carbon atoms which may have a substituent "linear or branched The "alkoxy group" may be the same as the “cycloalkoxy group having 5 to 10 carbon atoms which may have a substituent” represented by R 2 and R 3 in the general formula (1). can.
一般式(2)において、R2で表される「置換基を有していてもよい炭素原子数0〜18のチオ基」における「炭素原子数0〜18のチオ基」としては、一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数0〜18のチオ基」と同じものをあげることができる。 In the general formula (2), the "thio group having 0 to 18 carbon atoms" in the "thio group having 0 to 18 carbon atoms which may have a substituent" represented by R 2 is a general formula. In (1), the same group as the “thio group having 0 to 18 carbon atoms which may have a substituent” represented by R 2 and R 3 can be mentioned.
一般式(2)において、R2で表される「置換基を有していてもよい炭素原子数0〜20のアミノ基」における「炭素原子数0〜20のアミノ基」としては、一般式(1)において、R2およびR3で表される「置換基を有していてもよい炭素原子数0〜20のアミノ基」と同じものをあげることができる。 In the general formula (2), the "amino group having 0 to 20 carbon atoms" in the "amino group having 0 to 20 carbon atoms which may have a substituent" represented by R 2 is a general formula. In (1), the same as "amino group having 0 to 20 carbon atoms which may have a substituent" represented by R 2 and R 3 can be mentioned.
一般式(2)において、R2で表される「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」における「炭素原子数6〜36の芳香族炭化水素基」としては、一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」と同じものをあげることができる。 In the general formula (2), an aromatic hydrocarbon group of the "6-36 carbon atoms in the" aromatic hydrocarbon group with carbon atoms which may 6-36 have a substituent "represented by R 2 Is the same as the "aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a substituent" represented by R 1 and R 4 in the general formula (1). can.
一般式(2)において、R2で表される「置換基を有していてもよい環形成原子数5〜36の複素環基」における「環形成原子数5〜36の複素環基」としては一般式(1)において、R1およびR4で表される「置換基を有していてもよい環形成原子数5〜36の複素環基」と同じものをあげることができる。 In the general formula (2), as the "heterocyclic group ring atoms 5 to 36" in "heterocyclic group which may have a substituent ring atoms 5 to 36" represented by R 2 Can be the same as the "heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" represented by R 1 and R 4 in the general formula (1).
一般式(2)において、R2で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」、「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」、「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基」、「置換基を有していてもよい炭素原子数0〜18のチオ基」、「置換基を有していてもよい炭素原子数0〜20のアミノ基」、「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」、または「置換基を有していてもよい環形成原子数5〜36の複素環基」の「置換基」としては、前記一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」、「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」、「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」または「置換基を有していてもよい環形成原子数5〜36の複素環基」における「置換基」と同じものをあげることができる。 In the general formula (2), "linear or branched alkyl group substituents carbon atoms which may have from 1 to 20" where R 2 represented by, have a "substituent A good linear or branched alkenyl group having 2 to 20 carbon atoms "," a cycloalkyl group having 5 to 10 carbon atoms which may have a substituent "," even if it has a substituent " A good linear or branched alkoxy group having 1 to 20 carbon atoms "," a cycloalkoxy group having 5 to 10 carbon atoms which may have a substituent "," even if it has a substituent " A good thio group having 0 to 18 carbon atoms, an amino group having 0 to 20 carbon atoms which may have a substituent, and a 6 to 36 carbon atoms which may have a substituent. As the "substituent" of the "aromatic hydrocarbon group" or the "heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent", in the above general formula (1), R 1 and R "A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent" and "2 to 20 carbon atoms which may have a substituent" represented by 4. A linear or branched alkenyl group, "a cycloalkyl group having 5 to 10 carbon atoms which may have a substituent", and "a cycloalkyl group having 6 to 36 carbon atoms which may have a substituent". The same as the "substituent" in the "aromatic hydrocarbon group" or the "heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent" can be mentioned.
一般式(2)におけるR2は、水酸基、置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基、置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基、または置換基を有していてもよい環形成原子数5〜36の複素環であることが好ましい。 R 2 in the general formula (2) has a hydroxyl group and a linear or branched alkoxy group having 1 to 20 carbon atoms which may have a substituent and may have a substituent. It is preferably a heterocycle having 5 to 10 cycloalkoxy groups or a ring-forming atom number of 5 to 36 which may have a substituent.
一般式(2)におけるR5は、電子求引性の置換基であることが好ましい。電子求引性の置換基としては、限定はされないが、
ハロゲン原子、シアノ基、ニトロ基、ニトロソ基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基、
置換基を有していてもよい炭素原子数6〜36のフッ化アリール基、
置換基を有していてもよい炭素原子数1〜20のアシル基、
または置換基を有していてもよい炭素原子数0〜20のスルホニル基、
などがあげられる。
R 5 in the general formula (2) is preferably an electron-attracting substituent. The electron-attracting substituent is not limited, but
Halogen atom, cyano group, nitro group, nitroso group,
A linear or branched alkyl fluoride group having 1 to 20 carbon atoms, which may have a substituent,
Aryl fluoride group having 6 to 36 carbon atoms, which may have a substituent,
Acyl groups having 1 to 20 carbon atoms, which may have substituents,
Alternatively, a sulfonyl group having 0 to 20 carbon atoms, which may have a substituent,
And so on.
一般式(2)において、R5で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基」における「炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」としては、一般式(1)において、R5およびR6で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基」と同じものをあげることができる。 In the general formula (2), the number "carbon atoms in the represented" linear or branched fluoroalkyl group optionally carbon atoms which may 20 have a substituent "in R 5 to 20 The linear or branched alkyl group of the above is a linear alkyl group having 1 to 20 carbon atoms which may have a substituent and is represented by R 5 and R 6 in the general formula (1). Alternatively, the same group as the "branched alkyl fluoride group" can be mentioned.
一般式(2)において、R5で表される「置換基を有していてもよい炭素原子数6〜36のフッ化アリール基」における「炭素原子数6〜36のフッ化アリール基」としては、一般式(1)において、R5およびR6で表される「置換基を有していてもよい炭素原子数6〜36のフッ化アリール基」と同じものをあげることができる。 In the general formula (2), as "fluoroaryl group having a carbon number of 6 to 36," in the "optionally substituted fluoroaryl group having a carbon number of 6 to 36" represented by R 5 Can be the same as the "aryl fluoride group having 6 to 36 carbon atoms which may have a substituent" represented by R 5 and R 6 in the general formula (1).
一般式(2)において、R5で表される「置換基を有していてもよい炭素原子数1〜20のアシル基」における「炭素原子数1〜20のアシル基」としては、一般式(1)において、R5およびR6で表される「置換基を有していてもよい炭素原子数1〜20のアシル基」と同じものをあげることができる。 In the general formula (2), "acyl group having 1 to 20 carbon atoms" in the "acyl group which has carbon atoms which may 20 have a substituent" represented by R 5 has the general formula In (1), the same “acyl groups having 1 to 20 carbon atoms which may have a substituent” represented by R 5 and R 6 can be mentioned.
一般式(2)において、R5で表される「置換基を有していてもよい炭素原子数0〜20のスルホニル基」における「炭素原子数0〜20のスルホニル基」としては、一般式(1)において、R5およびR6で表される「置換基を有していてもよい炭素原子数0〜20のスルホニル基」と同じものをあげることができる。 In the general formula (2), as "sulfonyl group having a carbon number of 0 to 20" in the "sulfonyl group which may carbon atoms 0 to 20 which may have a substituent" represented by R 5 has the general formula In (1), the same group as the “sulfonyl group having 0 to 20 carbon atoms which may have a substituent” represented by R 5 and R 6 can be mentioned.
一般式(2)において、R5で表される「置換基を有していてもよい炭素原子数1〜10の直鎖状もしくは分岐状のフッ化アルキル基」、「置換基を有していてもよい炭素原子数6〜36のフッ化アリール基」、「置換基を有していてもよい炭素原子数1〜20のアシル基」、または「置換基を有していてもよい炭素原子数0〜20のスルホニル基」の「置換基」としては、前記一般式(1)において、R1およびR4で表される「置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基」、「置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基」、「置換基を有していてもよい炭素原子数5〜10のシクロアルキル基」、「置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基」または「置換基を有していてもよい環形成原子数5〜36の複素環基」における「置換基」と同じものをあげることができる。 In the general formula (2), "linear or branched fluoroalkyl group optionally having 1 to 10 carbon atoms which may have a substituent" represented by R 5, have a "substituent It may have an aryl fluoride group having 6 to 36 carbon atoms, an acyl group having 1 to 20 carbon atoms which may have a substituent, or a carbon atom which may have a substituent. As the "substituent" of the "sulfonyl group of several to 20", in the above general formula (1), the "substituted group may have a substituent having 1 to 20 carbon atoms represented by R 1 and R 4". "Linear or branched alkyl group", "Linear or branched alkenyl group having 2 to 20 carbon atoms which may have a substituent", "Carbon which may have a substituent" A cycloalkyl group having 5 to 10 atoms, an aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a substituent, or a ring-forming atomic group which may have a substituent 5 The same as the "substituent" in "~ 36 heterocyclic groups" can be mentioned.
一般式(2)において、R5は、シアノ基、置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基、または置換基を有していてもよい炭素原子数6〜36のフッ化アリール基であることが好ましい。 In the general formula (2), R 5 has a cyano group, a linear or branched alkyl fluoride group having 1 to 20 carbon atoms which may have a substituent, or a substituent. It is preferably an aryl fluoride group having 6 to 36 carbon atoms.
一般式(1)で表される本発明の化合物の具体例を以下に示すが、本発明はこれらに限定されるものではない。また、以下の例示化合物は水素原子、炭素原子等を一部省略して記載しており、存在し得る異性体のうちの一例を示したものであり、その他すべての異性体を包含するものとする。また、それぞれ2種以上の異性体の混合物であってもよい。 Specific examples of the compound of the present invention represented by the general formula (1) are shown below, but the present invention is not limited thereto. In addition, the following exemplified compounds are described by omitting some hydrogen atoms, carbon atoms, etc., and show an example of possible isomers, and include all other isomers. do. Further, it may be a mixture of two or more kinds of isomers.
前記一般式(1)で表される本発明のペリレン誘導体化合物は、J.Org.Chem.,2004,69,P.7933−7939(非特許文献2)等公知の方法によって合成することができる。3,4,9,10−テトラカルボン酸ジ無水物を臭素化し、該当するアミン類と反応させ、さらに、当該臭素部位に電子求引性基を置換し、もう一方の臭素部位に電子供与性基を置換することで前記一般式(1)に表されるペリレン誘導体を得ることができる。電子求引性基および電子供与性基の置換基の導入順は特に限定されない。 The perylene derivative compound of the present invention represented by the general formula (1) is J.I. Org. Chem. , 2004,69, P.M. It can be synthesized by a known method such as 7933-7939 (Non-Patent Document 2). The 3,4,9,10-tetracarboxylic acid dianhydride is brominated, reacted with the relevant amines, further substituted with an electron-attracting group at the bromine moiety, and electron-donating to the other bromine moiety. By substituting the group, the perylene derivative represented by the general formula (1) can be obtained. The order of introduction of the substituents of the electron attracting group and the electron donating group is not particularly limited.
前記一般式(1)で表されるペリレン誘導体化合物の精製方法としては、カラムクロマトグラフィーによる精製、シリカゲル、活性炭、活性白土等による吸着精製、溶媒による再結晶や晶析等により行うことができる。或いはこれらの方法を併用して、純度を高めた化合物を使用することが有効である。
また、これらの化合物の同定は、核磁気共鳴分析(NMR)により行うことができる。
The method for purifying the perylene derivative compound represented by the general formula (1) can be carried out by purification by column chromatography, adsorption purification with silica gel, activated charcoal, active white clay or the like, recrystallization or crystallization with a solvent. Alternatively, it is effective to use a compound having an increased purity by using these methods in combination.
In addition, these compounds can be identified by nuclear magnetic resonance spectroscopy (NMR).
本発明において、R2またはR3の少なくとも一方を電子供与性基とし、R5またはR6の少なくとも一方を電子求引性基とした前記一般式(1)で表される化合物は、溶媒への溶解性が向上する傾向にある。本発明による前記一般式(1)で表される化合物の溶解性は、前記一般式(1)で表される化合物を透明サンプルチューブに秤量し、有機溶媒を添加し、20〜60℃の温度下にて振盪後、数時間室温にて放置した後室温下(20〜27℃)目視にて溶解度(または飽和溶解度)を評価している。本願実施例の溶解度測定は、トルエン溶媒では濃度0.2質量%、クロロホルム溶媒では濃度0.5質量%、モノクロロベンゼン溶媒では濃度0.3質量%、さらに1,2−ジクロロベンゼン溶媒では濃度0.3質量%での溶解度を評価している。溶解度は0.01〜10質量%濃度であることが好ましく、0.02〜5質量%濃度であることがさらに好ましい。 In the present invention, the compound represented by the general formula (1) in which at least one of R 2 or R 3 is an electron donating group and at least one of R 5 or R 6 is an electron attracting group is used as a solvent. Tends to improve the solubility of. The solubility of the compound represented by the general formula (1) according to the present invention is such that the compound represented by the general formula (1) is weighed in a transparent sample tube, an organic solvent is added, and the temperature is 20 to 60 ° C. After shaking underneath, the mixture is left at room temperature for several hours, and then the solubility (or saturated solubility) is visually evaluated at room temperature (20 to 27 ° C.). The solubility of the examples of the present application was measured in a toluene solvent having a concentration of 0.2% by mass, a chloroform solvent having a concentration of 0.5% by mass, a monochlorobenzene solvent having a concentration of 0.3% by mass, and a 1,2-dichlorobenzene solvent having a concentration of 0. The solubility at 3% by mass is evaluated. The solubility is preferably 0.01 to 10% by mass, more preferably 0.02 to 5% by mass.
本発明のペリレン誘導体化合物は有機半導体材料として用いることができる。本発明において、上記有機半導体材料と溶媒を含有する組成物を、有機半導体用組成物という。有機半導体用組成物は、前記一般式(1)で表される化合物の1種または2種以上を含み、任意選択的に本発明に属さない他の化合物を含んでいてもよい。また、溶媒に溶解した溶液であっても、上記有機半導体材料が分散した分散液であってもよく、分散液中に上記有機半導体材料が部分的に残存している状態も含むものとする。本発明の有機半導体用組成物としては、溶液であることが好ましい。 The perylene derivative compound of the present invention can be used as an organic semiconductor material. In the present invention, the composition containing the organic semiconductor material and the solvent is referred to as a composition for an organic semiconductor. The composition for an organic semiconductor contains one or more of the compounds represented by the general formula (1), and may optionally contain other compounds not belonging to the present invention. Further, it may be a solution dissolved in a solvent or a dispersion liquid in which the organic semiconductor material is dispersed, and includes a state in which the organic semiconductor material partially remains in the dispersion liquid. The composition for organic semiconductors of the present invention is preferably a solution.
以上説明した本発明のペリレン誘導体化合物は、例えば薄膜化することで、電界効果型トランジスタ、発光ダイオードなどのダイオード、光電変換素子、有機薄膜太陽電池等の有機半導体素子の有機半導体層を構成する有機半導体材料として好適に用いることができる。本発明においては、有機薄膜トランジスタとして用いることが好ましい。 The perylene derivative compound of the present invention described above can be thinned, for example, to form an organic semiconductor layer of an electric field effect transistor, a diode such as a light emitting diode, a photoelectric conversion element, or an organic semiconductor element such as an organic thin-film solar cell. It can be suitably used as a semiconductor material. In the present invention, it is preferable to use it as an organic thin film transistor.
本発明のペリレン誘導体化合物による有機半導体材料を含む薄膜は、真空蒸着法等のドライプロセスにより形成することもできるが、溶液プロセスによっても安定かつ均一な薄膜を形成することができる。本発明での溶液プロセスによる製膜とは、上記有機半導体と溶媒からなる有機半導体用組成物を用いて製膜する方法をさす。具体的には、ドロップキャスト法、ディップコート法、ダイコーター法、ロールコーター法、バーコーター法、スピンコート法などの塗布法、インクジェット法、スクリーン印刷法、グラビア印刷法、フレキソグラフィー印刷法、オフセット印刷法、マイクロコンタクト印刷法などの各種印刷法、Langmuir−Blodgett(LB)法などの方法である。上記のように製膜後、加熱して溶媒を除去することによっても薄膜を形成することができる。本発明の有機半導体薄膜はドロップキャスト法またはスピンコート法、インクジェト法での形成が好ましい。 The thin film containing the organic semiconductor material based on the perylene derivative compound of the present invention can be formed by a dry process such as a vacuum vapor deposition method, but a stable and uniform thin film can also be formed by a solution process. The film forming by the solution process in the present invention refers to a method of forming a film using the composition for an organic semiconductor composed of the above organic semiconductor and a solvent. Specifically, coating methods such as drop casting method, dip coating method, die coater method, roll coater method, bar coater method, spin coating method, inkjet method, screen printing method, gravure printing method, flexography printing method, offset Various printing methods such as a printing method and a microcontact printing method, and a method such as the Langmuir-Blodgett (LB) method. A thin film can also be formed by removing the solvent by heating after forming the film as described above. The organic semiconductor thin film of the present invention is preferably formed by a drop casting method, a spin coating method, or an ink jet method.
本発明において、上記有機半導体用組成物に用いる溶媒としては、ベンゼン、トルエン、キシレン、メシチレン、テトラリン(1,2,3,4‐テトラヒドロナフタレン)、モノクロロベンゼン、o−ジクロロベンゼン、m−ジクロロベンゼン、p−ジクロロベンゼン、ニトロベンゼン等の芳香族系有機溶媒;ジクロロメタン、クロロホルム、1,2−ジクロロエタン、1,1,2−トリクロロエタン、ジクロロメタン等のハロゲン系有機溶媒;ベンゾニトリル、アセトニトリル等のニトリル系溶媒;2−ブタノン等のケトン系溶媒;テトラヒドロフラン、ジオキサン、ジイソプロピルエーテル、c−プロピルメチルエーテル、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、プロピレングリコールモノメチルエーテル等のエーテル系溶媒;酢酸エチル、プロピレングリコールモノメチルエーテルアセテート等のエステル系溶媒;メタノール、イソプロパノール、n−ブタノール、プロピレングリコール、1,3−ブタンジオール、1,4−ブタンジオール、2,3−ブタンジオール、シクロヘキサノール、2−n−ブトキシエタノール等のアルコール系溶媒;ジメチルホルムアミド、ジメチルアセトアミド、ジメチルスルホキシド等の非プロトン性極性溶媒等があげられるが、これらに限定されない。また、上記溶媒は、単独でも2種以上を混合して使用してもよく、構造により使用する溶媒を選択することができる。特に、芳香族系有機溶媒およびハロゲン系有機溶媒を使用することが好ましい。 In the present invention, the solvents used in the composition for organic semiconductors include benzene, toluene, xylene, mesitylene, tetralin (1,2,3,4-tetrahydronaphthalene), monochlorobenzene, o-dichlorobenzene, and m-dichlorobenzene. , P-Dichlorobenzene, nitrobenzene and other aromatic organic solvents; dichloromethane, chloroform, 1,2-dichloroethane, 1,1,2-trichloroethane, dichloromethane and other halogen-based organic solvents; benzonitrile, acetonitrile and other nitrile-based solvents Ketone solvents such as 2-butanone; ether solvents such as tetrahydrofuran, dioxane, diisopropyl ether, c-propylmethyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, propylene glycol monomethyl ether; ethyl acetate, propylene glycol monomethyl ether acetate Ester solvents such as: Methanol, isopropanol, n-butanol, propylene glycol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, cyclohexanol, 2-n-butoxyethanol and other alcohols. System solvent: Aprotonic polar solvents such as dimethylformamide, dimethylacetamide, and dimethylsulfoxide can be mentioned, but the solvent is not limited thereto. Further, the solvent may be used alone or in combination of two or more, and the solvent to be used can be selected depending on the structure. In particular, it is preferable to use an aromatic organic solvent and a halogen-based organic solvent.
本発明においては、前記有機半導体用組成物中の前記一般式(1)で表される化合物の含有量は、特に限定されないが、0.01〜20質量%濃度であることが好ましく、0.02〜10質量%濃度であることがさらに好ましい。 In the present invention, the content of the compound represented by the general formula (1) in the composition for organic semiconductor is not particularly limited, but is preferably 0.01 to 20% by mass, and 0. The concentration is more preferably 02 to 10% by mass.
本発明の有機半導体素子の一例として、有機薄膜トランジスタについて説明する。
有機薄膜トランジスタは、一般的に、基板と、有機半導体層と、この有機半導体層にゲート絶縁層を介して積層されたゲート電極と、有機半導体層を介して対向配置されたソース電極及びドレイン電極とを備えて構成されている。本発明においては、前記有機半導体層として、前記一般式(1)で表されるペリレン誘導体化合物を含む有機半導体薄膜を用いる。有機薄膜トランジスタの形態は特に限定されるものではなく、ボトムゲート・ボトムコンタクト型、ボトムゲート・トップコンタクト型、トップゲート・ボトムコンタクト型、トップゲート・トップコンタクト型のいずれの形態を用いてもよく、それぞれの形態に応じて上記ゲート電極、ゲート絶縁層、ソース電極、ドレイン電極及び有機半導体層を適宜配置すればよい。
An organic thin film transistor will be described as an example of the organic semiconductor device of the present invention.
The organic thin film transistor generally includes a substrate, an organic semiconductor layer, a gate electrode laminated on the organic semiconductor layer via a gate insulating layer, and a source electrode and a drain electrode arranged to face each other via the organic semiconductor layer. It is configured with. In the present invention, as the organic semiconductor layer, an organic semiconductor thin film containing the perylene derivative compound represented by the general formula (1) is used. The form of the organic thin film transistor is not particularly limited, and any form of bottom gate / bottom contact type, bottom gate / top contact type, top gate / bottom contact type, and top gate / top contact type may be used. The gate electrode, the gate insulating layer, the source electrode, the drain electrode, and the organic semiconductor layer may be appropriately arranged according to each form.
本発明の有機薄膜トランジスタの形態について、図面の説明をする。
図1は有機薄膜トランジスタの一形態を示す模式的断面図であり、ボトムゲート・ボトムコンタクト構造をとる。この有機薄膜トランジスタの形態においては、基板1上にゲート電極2が設けられ、そのゲート電極上にゲート絶縁膜3が積層されており、その上に所定の間隔で形成されたソース電極6およびドレイン電極4が形成されており、さらにその上に有機半導体層5が積層されている。
Drawings will be described for the form of the organic thin film transistor of the present invention.
FIG. 1 is a schematic cross-sectional view showing one form of an organic thin film transistor, which has a bottom gate / bottom contact structure. In the form of this organic thin film transistor, a gate electrode 2 is provided on a substrate 1, a gate insulating film 3 is laminated on the gate electrode, and a source electrode 6 and a drain electrode are formed on the gate electrode 6 at predetermined intervals. 4 is formed, and an organic semiconductor layer 5 is laminated on the organic semiconductor layer 5.
上記構成の有機薄膜トランジスタの素子では、有機半導体層がチャネル領域を形成しており、ゲート電極の電圧によって、ソース電極とドレイン電極間に流れる電流が制御され、オンオフ動作をする。 In the element of the organic thin film transistor having the above configuration, the organic semiconductor layer forms a channel region, and the current flowing between the source electrode and the drain electrode is controlled by the voltage of the gate electrode to perform on / off operation.
移動度とは、本発明の素子において、電子または正孔のキャリアの移動のし易さを示し、電子移動度とは固体物質中の電子の移動のし易さを示す量である。電界Eにおけるキャリア速度vは下式(a−1)で表され、
v=μE (a−1)
比例係数μが移動度(cm2/V・s)である。半導体において移動度は抵抗率に反比例するため、移動度は物質の電気的特性を決める重要なパラメータである。
The mobility is a quantity indicating the ease of movement of electron or hole carriers in the element of the present invention, and the electron mobility is a quantity indicating the ease of movement of electrons in a solid substance. The carrier velocity v in the electric field E is expressed by the following equation (a-1).
v = μE (a-1)
The proportional coefficient μ is the mobility (cm 2 / V · s). Since mobility is inversely proportional to resistivity in semiconductors, mobility is an important parameter that determines the electrical properties of a substance.
本発明の有機半導体素子または有機薄膜トランジスタは、電子移動度により伝達特性を評価できる。電子移動度は有機薄膜トランジスタにおいて、大きな電流を得られるなど、大きな値であることが重要である。電子移動度は0.0001cm2/V・s以上であることが望ましい。 The organic semiconductor device or the organic thin film transistor of the present invention can evaluate the transfer characteristics by the electron mobility. It is important that the electron mobility is a large value such that a large current can be obtained in an organic thin film transistor. The electron mobility is preferably 0.0001 cm 2 / V · s or more.
本発明において有機半導体層を溶液プロセスで形成する場合は、上記有機半導体用組成物を用いる。有機半導体層を溶液プロセスにより形成後、ホットプレートやオーブン等の熱処理を行うことが好ましい場合がある。熱処理温度に関しては、特に制限するものではないが、室温(20〜27℃)〜200℃程度で実施する。 When the organic semiconductor layer is formed by a solution process in the present invention, the above composition for organic semiconductor is used. After forming the organic semiconductor layer by a solution process, it may be preferable to perform heat treatment on a hot plate, an oven, or the like. The heat treatment temperature is not particularly limited, but is carried out at room temperature (20 to 27 ° C.) to about 200 ° C.
〈基板〉
本発明の有機薄膜トランジスタなどの有機半導体素子に使用する基板としては、特に限定するものではないが、一般にはガラス、石英、シリコン、ポリイミド、ポリエステル、ポリエチレン、ポリスチレン、ポリプロピレンおよびポリカーボネートなどのプラスチック基板などを用いることができる。
<substrate>
The substrate used for the organic semiconductor element such as the organic thin film of the present invention is not particularly limited, but generally, a plastic substrate such as glass, quartz, silicon, polyimide, polyester, polyethylene, polystyrene, polypropylene and polycarbonate is used. Can be used.
〈電極〉
有機薄膜トランジスタの電極に用いる材料としては、導電性の材料であれば用いることができる。好ましくは有機半導体材料への電子注入障壁が小さい材料が望ましい。
<electrode>
As the material used for the electrode of the organic thin film transistor, any conductive material can be used. A material having a small electron injection barrier into the organic semiconductor material is preferable.
各電極の形成方法としては、特に限定するものではないが、蒸着やスパッタリングなどのドライ製膜、印刷による方法を用いて形成することができ、ドライ製膜の場合はフォトリソグラフィーやエッチング処理により、所望の形状にパターニングでき、メタルマスクを用いてパターニングすることもできる。 The method for forming each electrode is not particularly limited, but it can be formed by using a dry film forming method such as thin film deposition or sputtering, or a printing method. In the case of dry film forming, photolithography or etching treatment is performed. It can be patterned into a desired shape, and can also be patterned using a metal mask.
ソースおよびドレイン電極の膜厚は、特に限定するものではないが、数nm〜数μmの範囲に設定することが好ましい。なお、ソースおよびドレイン電極の間隔は、数百nm〜数百μmの範囲に設定することが好ましい。 The film thicknesses of the source and drain electrodes are not particularly limited, but are preferably set in the range of several nm to several μm. The distance between the source and drain electrodes is preferably set in the range of several hundred nm to several hundred μm.
〈ゲート電極〉
ゲート電極を構成する材料としては、例えば、pドープシリコン、nドープシリコン、インジウム・錫酸化物(ITO)、ドーピングしたポリチオフェンやポリアニリン系等の導電性高分子、金,銀,白金,アルミニウム、クロム等の金属等があげられ、本発明においては、アルミニウムを用いるのが好ましい。
<Gate electrode>
Materials constituting the gate electrode include, for example, p-doped silicon, n-doped silicon, indium tin oxide (ITO), doped conductive polymers such as polythiophene and polyaniline, gold, silver, platinum, aluminum, and chromium. In the present invention, it is preferable to use aluminum.
〈絶縁層〉
ゲート絶縁層を構成する材料としては、例えば、酸化シリコン,窒化シリコン,酸化アルミニウム,窒化アルミニウム,酸化タンタル等の無機化合物、ポリビニルアルコール、ポリビニルフェノール、ポリメチルメタクリレート、シアノエチルプルラン、パリレン(日本パリレン合同会社 登録商標)など有機高分子化合物を用いることができる。
<Insulation layer>
Examples of the material constituting the gate insulating layer include inorganic compounds such as silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, and tantalum oxide, polyvinyl alcohol, polyvinylphenol, polymethylmethacrylate, cyanoethylpurrane, and parylene (Japan Parylene LLC). Organic polymer compounds such as (registered trademark) can be used.
ゲート絶縁膜の膜厚は、特に限定するものではないが、数nm〜数μmの範囲に設定することが好ましい。 The film thickness of the gate insulating film is not particularly limited, but is preferably set in the range of several nm to several μm.
〈ソース電極、ドレイン電極〉
ソース電極及びおよびドレイン電極を構成する材料としては、例えば、金、銀、白金、クロム、アルミニウム、インジウム、アルカリ金属(Li,Na,K,Rb,Cs)、アルカリ土類金属(Mg,Ca,Sr,Ba)等があげられる。本発明においては金を用いるのが好ましい。
<Source electrode, drain electrode>
Materials constituting the source electrode and the drain electrode include, for example, gold, silver, platinum, chromium, aluminum, indium, alkali metals (Li, Na, K, Rb, Cs), alkaline earth metals (Mg, Ca, Sr, Ba) and the like. It is preferable to use gold in the present invention.
〈有機半導体層〉
本発明の有機薄膜トランジスタは、有機半導体層に前記一般式(1)で表される化合物を含有してなるものである。
有機半導体層には、本発明のペリレン誘導体化合物に加え、例えば、フラーレンおよびその誘導体や、フッ素やニトリル等の電子吸引基で置換された、ナフタレン、ナフタレンジイミド、アントラセン、テトラセン、ペリレン、ペンタセン、ピレン、コロネン、クリセン、デカシクレン、ビオランスレン等の多環芳香族分子およびこれらの誘導体、トリフェニレン、チオフェンオリゴマー、ポリチオフェン等の芳香環オリゴマー、ポリマーおよびこれらの誘導体、フタロシアニン、テトラチアフルバレン、テトラチオテトラセンおよびこれらの誘導体等の、電子欠乏性の有機半導体材料を適切な量で併用してもよい。また、ポリスチレン、ポリビニルフェノールなどのポリマー材料を適切な量添加しても良い。
<Organic semiconductor layer>
The organic thin film transistor of the present invention is formed by containing the compound represented by the general formula (1) in the organic semiconductor layer.
In addition to the perylene derivative compound of the present invention, the organic semiconductor layer contains, for example, fullerene and its derivatives, naphthalene, naphthalenediimide, anthracene, tetracene, perylene, pentacene, and pyrene substituted with electron-withdrawing groups such as fluorine and nitrile. , Coronen, chrysene, decacyclene, biolanthrene and other polycyclic aromatic molecules and their derivatives, triphenylene, thiophene oligomers, polythiophene and other aromatic ring oligomers, polymers and their derivatives, phthalocyanine, tetrathiafluvalene, tetrathiotetracene and their derivatives. An electron-deficient organic semiconductor material such as a derivative may be used in combination in an appropriate amount. Further, an appropriate amount of a polymer material such as polystyrene or polyvinylphenol may be added.
〈封止〉
本発明の有機薄膜トランジスタは、大気中の酸素や水分などの影響を軽減する目的で、有機薄膜トランジスタの外周面の全面または一部にガスバリア層を設けることができる。ガスバリア層を形成する材料としては、ポリビニルアルコール、エチレン−ビニルアルコール、共重合体、ポリ塩化ビニル、ポリテトラフルオロエチレンなどがあげられる。
<Sealing>
In the organic thin film transistor of the present invention, a gas barrier layer can be provided on the entire surface or a part of the outer peripheral surface of the organic thin film transistor for the purpose of reducing the influence of oxygen, moisture, etc. in the atmosphere. Examples of the material forming the gas barrier layer include polyvinyl alcohol, ethylene-vinyl alcohol, copolymers, polyvinyl chloride, and polytetrafluoroethylene.
以下、本発明を実施例により具体的に説明するが、本発明は以下の実施例に限定されるものではない。なお、合成実施例において得られた化合物の同定は、1H−NMR(1H−NMR(日本電子株式会社製核磁気共鳴装置、JNM−ECZ400S/L1型)により行った。 Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited to the following Examples. The compound obtained in the synthesis example was identified by 1 H-NMR (1 H-NMR (Nuclear Magnetic Resonance Device manufactured by JEOL Ltd., JNM-ECZ400S / L1 type)).
[合成実施例1]化合物(A-2)の合成
1,7−ジブロモペリレン−3,4,9,10−テトラカルボン酸ジ無水物の合成をJ.Org.Chem.,2004,69,P.7933−7939に記載の方法にて行い、下記式(3)で表される1,7−ジブロモペリレン−3,4,9,10−テトラカルボン酸ジ無水物を20g得た。(工程1)
[Synthesis Example 1] Synthesis of compound (A-2) Synthesis of 1,7-dibromoperylene-3,4,9,10-tetracarboxylic dianhydride was carried out by J. Mol. Org. Chem. , 2004,69, P.M. By the method described in 7933-7939, 20 g of 1,7-dibromoperylene-3,4,9,10-tetracarboxylic dianhydride represented by the following formula (3) was obtained. (Step 1)
窒素置換した反応容器に上記式(3)で表される1,7−ジブロモペリレン−3,4,9,10−テトラカルボン酸ジ無水物(13.8g)、ヘプタフルオロブチルアミン(15.0g)、酢酸(7.5g)のN−メチル−2−ピロリドン溶液(345mL)を窒素気流下65℃にて77時間攪拌した。反応液を室温まで放冷後、水(1L)に注加し、30分攪拌後、濾過して粗生成物を得た。粗生成物をカラムクロマトグラフィー(担体:シリカゲル、展開溶液:トルエン)で精製後、減圧乾燥を行い、下記式(4)で表される1,7−ジブロモペリレン−3,4,9,10−テトラカルボン酸ジイミド(収量:16.9g、収率:74%)を得た。(工程2) 1,7-Dibromoperylene-3,4,9,10-tetracarboxylic dianhydride (13.8 g) and heptafluorobutylamine (15.0 g) represented by the above formula (3) are placed in a nitrogen-substituted reaction vessel. , N-Methyl-2-pyrrolidone solution (345 mL) of acetic acid (7.5 g) was stirred at 65 ° C. for 77 hours under a nitrogen stream. The reaction mixture was allowed to cool to room temperature, poured into water (1 L), stirred for 30 minutes, and filtered to obtain a crude product. The crude product is purified by column chromatography (carrier: silica gel, developing solution: toluene), dried under reduced pressure, and represented by the following formula (4): 1,7-dibromoperylene-3,4,9,10- Diimide tetracarboxylic acid (yield: 16.9 g, yield: 74%) was obtained. (Step 2)
得られた赤紫色固体のNMR分析を行い、以下の10個の水素のシグナルを検出し、下記式(4)で表される構造と同定した。 The obtained red-purple solid was subjected to NMR analysis, and the following 10 hydrogen signals were detected and identified as a structure represented by the following formula (4).
1H−NMR(400MHz、CDCl3):δ(ppm)=4.99−5.06(4H)、8.76−8.78(2H)、8.98(2H)、9.52−9.54(2H)。 1 1 H-NMR (400 MHz, CDCl 3 ): δ (ppm) = 4.99-5.06 (4H), 8.76-8.78 (2H), 8.98 (2H), 9.52-9 .54 (2H).
アルゴン置換した反応容器に、上記式(4)表される1,7−ジブロモペリレン−3,4,9,10−テトラカルボン酸ジイミド(1000mg)、シアン化銅(97mg)のN,N−ジメチルホルムアルデヒド溶液(50mL)アルゴン気流下90℃にて5時間攪拌した。反応液を室温まで冷却後、水(200mL)に注加し30分攪拌後、濾過して粗生成物を得た。クロロホルム溶解分をカラムクロマトグラフィー(担体:シリカゲル、展開溶液:クロロホルム)で精製後、減圧乾燥を行い、下記式(5)で表される1−シアノ−7−ブロモペリレン−3,4,9,10−テトラカルボン酸ジイミド(収量:164mg、収率:18%)を得た。(工程3) N, N-dimethyl of 1,7-dibromoperylene-3,4,9,10-tetracarboxylic acid diimide (1000 mg) and copper cyanide (97 mg) represented by the above formula (4) in an argon-substituted reaction vessel. Formaldehyde solution (50 mL) was stirred at 90 ° C. for 5 hours under an argon stream. The reaction mixture was cooled to room temperature, poured into water (200 mL), stirred for 30 minutes, and filtered to obtain a crude product. The dissolved chloroform is purified by column chromatography (carrier: silica gel, developing solution: chloroform), dried under reduced pressure, and 1-cyano-7-bromoperylene-3,4,9, represented by the following formula (5). Diimide 10-tetracarboxylic acid (yield: 164 mg, yield: 18%) was obtained. (Step 3)
得られた赤紫色固体のNMR分析を行い、以下の10個の水素のシグナルを検出し、下記式(5)で表される構造と同定した。 The obtained red-purple solid was subjected to NMR analysis, and the following 10 hydrogen signals were detected and identified as a structure represented by the following formula (5).
1H−NMR(400MHz、CDCl3):δ(ppm)=4.99−5.07(4H)、8.87−8.91(2H)、8.99(1H)、9.05(1H)、9.49−9.51(1H)、9.72−9.75(1H)。 1 1 H-NMR (400 MHz, CDCl 3 ): δ (ppm) = 4.99-5.07 (4H), 8.87-8.91 (2H), 8.99 (1H), 9.05 (1H) ), 9.49-9.51 (1H), 9.72-9.75 (1H).
アルゴン置換した反応容器に、上記式(5)で表される1−シアノ−7−ブロモペリレン−3,4,9,10−テトラカルボン酸ジイミド(137mg)のメタノール溶液(100mL)に、28%NaOMe/MeOH溶液(1000mg)を滴下後、室温にて6時間攪拌を行った。反応液に1N塩酸(50mL)加え、30分攪拌後、濾過して粗生成物を得た。粗生成物をクロロホルム溶解し、カラムクロマトグラフィー(担体:シリカゲル、展開溶液:トルエン)で精製後、減圧乾燥を行い、目的の化合物である1−シアノ−7−メトキシ−3,4,9,10−テトラカルボン酸ジイミド(収量:53mg、収率:41%)を赤紫色固体として得た。(工程4) 28% in a methanol solution (100 mL) of 1-cyano-7-bromoperylene-3,4,9,10-tetracarboxylic acid diimide (137 mg) represented by the above formula (5) in an argon-substituted reaction vessel. After dropping the NaOMe / MeOH solution (1000 mg), the mixture was stirred at room temperature for 6 hours. 1N Hydrochloric acid (50 mL) was added to the reaction mixture, the mixture was stirred for 30 minutes, and then filtered to obtain a crude product. The crude product is dissolved in chloroform, purified by column chromatography (carrier: silica gel, developing solution: toluene), dried under reduced pressure, and the target compound, 1-cyano-7-methoxy-3,4,9,10. -Tetracarboxylic acid diimide (yield: 53 mg, yield: 41%) was obtained as a magenta solid. (Step 4)
得られた赤紫色固体のNMR分析を行い以下の13個の水素のシグナルを検出し、下記式(A−2)で表される構造と同定した。 The obtained red-purple solid was subjected to NMR analysis to detect the following 13 hydrogen signals, and identified as a structure represented by the following formula (A-2).
1H−NMR(400MHz、CDCl3):δ(ppm)=4.40(3H)、4.99−5.07(4H)、8.62(1H)、8.75−8.77(1H)、8.85−8.87(1H)、8.96(1H)、9.60−9.66(2H)。 1 1 H-NMR (400 MHz, CDCl 3 ): δ (ppm) = 4.40 (3H), 4.99-5.07 (4H), 8.62 (1H), 8.75-8.77 (1H) ), 8.85-8.87 (1H), 8.96 (1H), 9.60-9.66 (2H).
[合成実施例2]化合物(A-3)の合成
アルゴン置換した反応容器に、上記式(5)で表される1−シアノ−7−ブロモペリレン−3,4,9,10−テトラカルボン酸ジイミド(300mL)、フェノール(50mg)、18−Crown−6−Ether(555mg)、炭酸カリウム(145mg)のトルエン溶液(60mL)をアルゴン気流下、室温にて2時間攪拌した。反応液を濃縮し、粗生成物を得た。粗生成物を水(20mL)で洗浄し、その後メタノール(20mL)で洗浄した。洗浄後の粗生成物をクロロホルム溶解し、カラムクロマトグラフィー(担体:シリカゲル、展開溶液:クロロホルム)で精製後、減圧乾燥を行った。得られた精製物にトルエン(20mL)を加え、加熱還流攪拌を1時間実施した。溶解後、室温へ冷却し、1時間攪拌後、析出固体を濾過して得た。濾取物を減圧乾燥し、目的の化合物である1−シアノ−7−フェノキシ−3,4,9,10−テトラカルボン酸ジイミド(収量:67mg、収率:21%)を赤紫色固体として得た。
[Synthesis Example 2] Synthesis of compound (A-3) 1-cyano-7-bromoperylene-3,4,9,10-tetracarboxylic acid represented by the above formula (5) is placed in an argon-substituted reaction vessel. A toluene solution (60 mL) of diimide (300 mL), phenol (50 mg), 18-Crown-6-Ether (555 mg) and potassium carbonate (145 mg) was stirred at room temperature for 2 hours under an argon stream. The reaction solution was concentrated to obtain a crude product. The crude product was washed with water (20 mL) and then with methanol (20 mL). The crude product after washing was dissolved in chloroform, purified by column chromatography (carrier: silica gel, developing solution: chloroform), and dried under reduced pressure. Toluene (20 mL) was added to the obtained purified product, and heating / reflux stirring was carried out for 1 hour. After dissolution, the mixture was cooled to room temperature, stirred for 1 hour, and the precipitated solid was filtered. The sample was dried under reduced pressure to obtain the target compound 1-cyano-7-phenoxy-3,4,9,10-tetracarboxylic dianimide (yield: 67 mg, yield: 21%) as a purplish red solid. rice field.
得られた赤紫色固体のNMR分析を行い以下の15個の水素のシグナルを検出し下記式(A−3)で表わされる構造と同定した。 The obtained red-purple solid was subjected to NMR analysis to detect the following 15 hydrogen signals and identified as a structure represented by the following formula (A-3).
1H−NMR(400MHz、CDCl3):δ(ppm)=4.93−5.06(4H)、7.20−7.25(2H)、7.35−7.38(1H)、7.51−7.55(2H)、8.36(1H)、8.77−8.89(2H)、8.99(1H)、9.65−9.70(2H)。 1 1 H-NMR (400 MHz, CDCl 3 ): δ (ppm) = 4.93-5.06 (4H), 7.20-7.25 (2H), 7.35-7.38 (1H), 7 .51-7.55 (2H), 8.36 (1H), 8.77-8.89 (2H), 8.99 (1H), 9.65-9.70 (2H).
[合成実施例3]化合物(6)の合成
アルゴン置換した反応容器に、上記式(5)で表される1,7−ジブロモペリレン−3,4,9,10−テトラカルボン酸ジイミド(912mg)、ヨウ化銅(38mg)、1,10−フェナントロリン水和物(39mg)、カリウムトリメトキシ(トリフルオロメチル)ボラート(222mg)のジメチルスルホキシド溶液(10mL)をアルゴン気流下60℃にて7時間攪拌した。反応液を室温まで冷却後、酢酸エチル(200mL)に注加し30分攪拌後、濾過して不溶解分を除去した。得られた濾液を水(150mL)で2回洗浄し、飽和食塩水(150mL)で1回洗浄し、有機層を濃縮して粗生成物を得た。粗生成物のカラムクロマトグラフィー(担体:シリカゲル、展開溶液:ヘキサン/酢酸エチル)で精製後、減圧乾燥を行い、下記式(6)で表される1−ブロモ−7−トリフルオロメチル−3,4,9,10−テトラカルボン酸ジイミド(収量:450mg、収率:50%)を得た。
[Synthesis Example 3] Synthesis of compound (6) Diimide 1,7-dibromoperylene-3,4,9,10-tetracarboxylic acid diimide (912 mg) represented by the above formula (5) was placed in an argon-substituted reaction vessel. , Copper iodide (38 mg), 1,10-phenanthroline hydrate (39 mg), potassium trimethoxy (trifluoromethyl) borate (222 mg) in a dimethylsulfoxide solution (10 mL) was stirred at 60 ° C. for 7 hours under an argon stream. bottom. The reaction mixture was cooled to room temperature, poured into ethyl acetate (200 mL), stirred for 30 minutes, and filtered to remove insoluble matter. The obtained filtrate was washed twice with water (150 mL) and once with saturated brine (150 mL), and the organic layer was concentrated to obtain a crude product. The crude product was purified by column chromatography (carrier: silica gel, developing solution: hexane / ethyl acetate), dried under reduced pressure, and 1-bromo-7-trifluoromethyl-3, represented by the following formula (6). Diimide 4,9,10-tetracarboxylic acid (yield: 450 mg, yield: 50%) was obtained.
得られた赤紫色固体のNMR分析を行い、以下の10個の水素のシグナルを検出し、下記式(6)で表される構造と同定した。 The obtained red-purple solid was subjected to NMR analysis, and the following 10 hydrogen signals were detected and identified as a structure represented by the following formula (6).
1H−NMR(400MHz、CDCl3):δ(ppm)=5.04−5.09(4H)、8.61−8.63(2H)、8.87−8.88(2H)、8.99(1H)、9.15(1H)。 1 1 H-NMR (400 MHz, CDCl 3 ): δ (ppm) = 5.04-5.09 (4H), 8.61-8.63 (2H), 8.87-8.88 (2H), 8 .99 (1H), 9.15 (1H).
[合成実施例4]化合物(A-9)の合成
アルゴン置換した反応容器に、上記式(6)で表される1−トリフルオロメチル−7−ブロモペリレン−3,4,9,10−テトラカルボン酸ジイミド(450mg)のメタノール溶液(100mL)に、28%NaOMe/MeOH溶液(2000mg)を滴下後、室温にて6時間攪拌を行った。反応液に1N塩酸(50mL)加え、30分攪拌後、濾過して粗生成物を得た。粗生成物をクロロホルム溶解し、カラムクロマトグラフィー(担体:シリカゲル、展開溶液:トルエン)で精製後、減圧乾燥を行い、目的の化合物である1−シアノ−7−メトキシ−3,4,9,10−テトラカルボン酸ジイミド(収量:170mg、収率:40%)を赤紫色固体として得た。
[Synthesis Example 4] Synthesis of compound (A-9) 1-trifluoromethyl-7-bromoperylene-3,4,9,10-tetra represented by the above formula (6) is placed in an argon-substituted reaction vessel. A 28% NaOMe / MeOH solution (2000 mg) was added dropwise to a methanol solution (100 mL) of diimide carboxylate (450 mg), and the mixture was stirred at room temperature for 6 hours. 1N Hydrochloric acid (50 mL) was added to the reaction mixture, the mixture was stirred for 30 minutes, and then filtered to obtain a crude product. The crude product is dissolved in chloroform, purified by column chromatography (carrier: silica gel, developing solution: toluene), dried under reduced pressure, and the target compound, 1-cyano-7-methoxy-3,4,9,10. -Diimide tetracarboxylic acid (yield: 170 mg, yield: 40%) was obtained as a magenta solid.
得られた赤紫色固体のNMR分析を行い以下の13個の水素のシグナルを検出し、下記式(A−9)で表される構造と同定した。 The obtained red-purple solid was subjected to NMR analysis to detect the following 13 hydrogen signals, and identified as a structure represented by the following formula (A-9).
1H−NMR(400MHz、CDCl3):δ(ppm)=4.40(3H)、5.04−5.09(4H)、8.61−8.63(2H)、8.87−8.88(2H)、8.50(1H)、9.15(1H)。 1 1 H-NMR (400 MHz, CDCl 3 ): δ (ppm) = 4.40 (3H), 5.04-5.09 (4H), 8.61-8.63 (2H), 8.87-8 .88 (2H), 8.50 (1H), 9.15 (1H).
[比較化合物]化合物(B−1)の合成
Angew.Chem.Int.Ed.2004,43,6363−6366に記載の方法にて行い、下記式(B−1)で表される1,7−ジシアノペリレン−3,4,9,10−テトラカルボン酸ジイミドを得た。
[Comparative Compound] Synthesis of Compound (B-1) Angew. Chem. Int. Ed. By the method described in 2004,43,6363-6366, 1,7-dicyanoperylene-3,4,9,10-tetracarboxylic dianimide represented by the following formula (B-1) was obtained.
実験番号EC234
[比較化合物]化合物(B−2)の合成
アルゴン置換した反応容器に、上記式(4)表される1,7−ジブロモペリレン−3,4,9,10−テトラカルボン酸ジイミド(912mg)、ヨウ化銅(76mg)、1,10−フェナントロリン水和物(79mg)、カリウムトリメトキシ(トリフルオロメチル)ボラート(1270mg)のジメチルスルホキシド溶液(10mL)をアルゴン気流下60℃にて7時間攪拌した。反応液を室温まで冷却後、酢酸エチル(200mL)に注加し30分攪拌後、濾過して不溶解分を除去した。得られた濾液を水(150mL)で2回洗浄し、飽和食塩水(150mL)で1回洗浄し、有機層を濃縮して粗生成物を得た。粗生成物のカラムクロマトグラフィー(担体:シリカゲル、展開溶液:ヘキサン/酢酸エチル)で精製後、再度カラムクロマトグラフィー(担体:シリカゲル、展開溶液:トルエン)を行い精製後、減圧乾燥を行い、下記式(5)で表される1,7−ジトリフロメチルペリレン−3,4,9,10−テトラカルボン酸ジイミド(収量:180mg、収率:20%)を得た。
Experiment number EC234
[Comparative Compound] Synthesis of Compound (B-2) In an argon-substituted reaction vessel, 1,7-dibromoperylene-3,4,9,10-tetracarboxylic acid diimide (912 mg) represented by the above formula (4), A dimethylsulfoxide solution (10 mL) of copper iodide (76 mg), 1,10-phenanthroline hydrate (79 mg) and potassium trimethoxy (trifluoromethyl) borate (1270 mg) was stirred at 60 ° C. for 7 hours under an argon stream. .. The reaction mixture was cooled to room temperature, poured into ethyl acetate (200 mL), stirred for 30 minutes, and filtered to remove insoluble matter. The obtained filtrate was washed twice with water (150 mL) and once with saturated brine (150 mL), and the organic layer was concentrated to obtain a crude product. The crude product is purified by column chromatography (carrier: silica gel, developing solution: hexane / ethyl acetate), then column chromatography (carrier: silica gel, developing solution: toluene) is performed again to purify, and then dried under reduced pressure. Diimide 1,7-ditrifluoromethylperylene-3,4,9,10-tetracarboxylic acid represented by (5) (yield: 180 mg, yield: 20%) was obtained.
得られた赤紫色固体のNMR分析を行い、以下の10個の水素のシグナルを検出し、下記式(B−2)で表される構造と同定した。 The obtained red-purple solid was subjected to NMR analysis, and the following 10 hydrogen signals were detected and identified as a structure represented by the following formula (B-2).
1H−NMR(400MHz、CDCl3):δ(ppm)=5.04−5.09(4H)、8.61−8.63(2H)、8.87−8.88(2H)、9.13(2H)。 1 1 H-NMR (400 MHz, CDCl 3 ): δ (ppm) = 5.04-5.09 (4H), 8.61-8.63 (2H), 8.87-8.88 (2H), 9 .13 (2H).
[実施例1](A−2)の溶解度測定
化合物(A−2)を透明サンプルチューブに秤量し、濃度が0.2質量%となるようにトルエンに添加し、50℃に加熱下にて振盪後、室温(25±2℃)まで冷却し、数時間後に溶解性を目視にて評価した。同様に、クロロホルム0.5質量%、モノクロロベンゼン0.3質量%、1,2−ジクロロベンゼン0.3質量%にて評価した。結果を表1に示す。判定条件は完全溶解(25±2℃)を○、濁る程度に析出(25±2℃)を△、不溶解または室温まで冷却後全て析出(25±2℃)を×と表記した。
[Example 1] Solubility measurement of (A-2) Compound (A-2) was weighed in a transparent sample tube, added to toluene so that the concentration was 0.2% by mass, and heated to 50 ° C. under heating. After shaking, the mixture was cooled to room temperature (25 ± 2 ° C.), and after several hours, the solubility was visually evaluated. Similarly, evaluation was made with 0.5% by mass of chloroform, 0.3% by mass of monochlorobenzene, and 0.3% by mass of 1,2-dichlorobenzene. The results are shown in Table 1. As the judgment conditions, complete dissolution (25 ± 2 ° C.) was indicated by ◯, precipitation (25 ± 2 ° C.) to the extent of turbidity was indicated by Δ, and insoluble or all precipitation after cooling to room temperature (25 ± 2 ° C.) was indicated by ×.
[実施例2](A−3)の溶解度測定
化合物(A−2)の代わりに(A−3)を用いて実施例1と同様に溶解度測定を行った。結果を表1に示す。
[Example 2] Measurement of solubility of (A-3) Solubility was measured in the same manner as in Example 1 using (A-3) instead of compound (A-2). The results are shown in Table 1.
[比較例1]
化合物(A−2)の代わりに比較化合物(B−1)を用いて実施例1と同様に溶解度測定を行った。結果を表1に示す。
[Comparative Example 1]
The solubility was measured in the same manner as in Example 1 using the comparative compound (B-1) instead of the compound (A-2). The results are shown in Table 1.
表1より、実施例で表される化合物は、有機半導体組成物に用いられる溶媒に対して、比較例以上の溶解性を有することが明らかである。 From Table 1, it is clear that the compounds represented by Examples have more solubility than Comparative Examples with respect to the solvent used in the organic semiconductor composition.
[実施例3]有機薄膜トランジスタの伝達特性の測定
ガラス基板を中性洗剤で10分間、水で10分間、アセトンで10分間、イソプロピルアルコールで10分間、超音波洗浄を行った後、100℃のオーブンにて1時間乾燥を行った。基板表面に、ゲート電極となるアルミを、メタルマスクを用いて50nmの厚さに蒸着した。その後、ポリビニルフェノールとメラミンの混合溶液をスピンコート法により塗布し、ホットプレートにて100℃で10分間、150℃で1時間加熱し、400nmの厚さに絶縁層を形成した。続いて、絶縁層の上に、ソースおよびドレイン電極となる金を50nmの厚さに蒸着し、フォトリソグラフィー法により、チャネル幅500μm、チャネル長5μmのソースおよびドレイン電極を形成した。
[Example 3] Measurement of transfer characteristics of organic thin film The glass substrate is ultrasonically washed with a neutral detergent for 10 minutes, water for 10 minutes, acetone for 10 minutes, and isopropyl alcohol for 10 minutes, and then in an oven at 100 ° C. Was dried for 1 hour. Aluminum to be a gate electrode was deposited on the surface of the substrate to a thickness of 50 nm using a metal mask. Then, a mixed solution of polyvinylphenol and melamine was applied by a spin coating method, and heated on a hot plate at 100 ° C. for 10 minutes and at 150 ° C. for 1 hour to form an insulating layer to a thickness of 400 nm. Subsequently, gold to be a source and drain electrodes was deposited on the insulating layer to a thickness of 50 nm, and a source and drain electrodes having a channel width of 500 μm and a channel length of 5 μm were formed by a photolithography method.
化合物(A−2)に濃度が0.1質量%となるようにテトラリンを加え、有機半導体溶液を調製した。基板に対して、UVオゾン処理を7分間行った後、有機半導体溶液をチャネル上にドロップキャスト法により塗布し、ホットプレートにて150℃で10分間加熱し、有機半導体層を形成した。 Tetralin was added to compound (A-2) so as to have a concentration of 0.1% by mass to prepare an organic semiconductor solution. After UV ozone treatment was performed on the substrate for 7 minutes, an organic semiconductor solution was applied onto the channel by a drop casting method and heated on a hot plate at 150 ° C. for 10 minutes to form an organic semiconductor layer.
作成した有機薄膜トランジスタを、半導体アナライザー(ケースレー社製、4200-SCS型)を用いて、大気中遮光下、ゲート電圧が−40V〜80Vの範囲で有機薄膜トランジスタの伝達特性の測定行った。 The prepared organic thin film transistor was measured for transmission characteristics of the organic thin film transistor using a semiconductor analyzer (manufactured by Keithley, 4200-SCS type) in a gate voltage range of -40V to 80V under light shielding in the atmosphere.
測定値より、移動度μ(cm2/Vs)は、下記式(a−2)および(a−3)を用いて算出を行った。この測定より求めた移動度の結果を表2に示す。 From the measured values, the mobility μ (cm 2 / Vs) was calculated using the following formulas (a-2) and (a-3). Table 2 shows the results of mobility obtained from this measurement.
εox=真空の誘電率、ε0=絶縁膜の誘電率
W=チャネル幅、L=チャネル長
Id=ドレイン電流、Vg=ゲート電圧
[実施例4]有機薄膜トランジスタの伝達特性の測定
化合物(A−2)の代わりに化合物(A−3)を用い、濃度が0.1質量%となるようにクロロホルムに溶解した以外は実施例3と同様に作製した有機薄膜トランジスタの伝達特性の測定行った。この測定より求めた移動度の結果を表2に示す。
[Example 4] Measurement of transfer characteristics of organic thin film transistor Example 3 except that compound (A-3) was used instead of compound (A-2) and dissolved in chloroform so as to have a concentration of 0.1% by mass. The transfer characteristics of the organic thin film transistor prepared in the same manner as above were measured. Table 2 shows the results of mobility obtained from this measurement.
[比較例2]
化合物として、(A−2)の代わりに本発明に属さない(B−2)を用い、濃度が0.1質量%となるようにトルエンに溶解した以外は実施例10と同様に作製した有機薄膜トランジスタの伝達特性の測定行った。この測定より求めた移動度の結果を表2に示す。
[Comparative Example 2]
As the compound, (B-2) which does not belong to the present invention was used instead of (A-2), and the organic compound was prepared in the same manner as in Example 10 except that it was dissolved in toluene so as to have a concentration of 0.1% by mass. The transfer characteristics of the thin film transistor were measured. Table 2 shows the results of mobility obtained from this measurement.
表2より、実施例で表される化合物を有機半導体層に用いた有機薄膜トランジスタは、比較例よりも高い電子移動度を有することが明らかである。 From Table 2, it is clear that the organic thin film transistor using the compound represented by the examples in the organic semiconductor layer has higher electron mobility than that of the comparative example.
本発明によるペリレン誘導体化合物は、溶液プロセスに対応した溶解性を有するn型有機半導体材料を提供することができる。さらに該有機半導体材料を含有する有機半導体用組成物を用いることにより、電子輸送性に優れた有機薄膜トランジスタを提供することができる。 The perylene derivative compound according to the present invention can provide an n-type organic semiconductor material having solubility corresponding to a solution process. Further, by using a composition for an organic semiconductor containing the organic semiconductor material, it is possible to provide an organic thin film transistor having excellent electron transportability.
1:基板
2:ゲート電極
3:ゲート絶縁層
4:ドレイン電極
5:有機半導体層
6:ソース電極
1: Substrate 2: Gate electrode 3: Gate insulating layer 4: Drain electrode 5: Organic semiconductor layer 6: Source electrode
Claims (9)
水素原子、ハロゲン原子、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、
置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基、
置換基を有していてもよい炭素原子数5〜10のシクロアルキル基、
置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基、
または置換基を有していてもよい環形成原子数5〜36の複素環基を表す。
R2およびR3は、同一でも異なっていてもよく、
水素原子、水酸基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、
置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基、
置換基を有していてもよい炭素原子数5〜10のシクロアルキル基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基、
置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基、
置換基を有していてもよい炭素原子数0〜18のチオ基、
置換基を有していてもよい炭素原子数0〜20のアミノ基、
置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基、
または置換基を有していてもよい環形成原子数5〜36の複素環基を表す。
R5およびR6は、同一でも異なっていてもよく、
水素原子、ハロゲン原子、シアノ基、ニトロ基、ニトロソ基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基、
置換基を有していてもよい炭素原子数6〜36のフッ化アリール基、
置換基を有していてもよい炭素原子数1〜20のアシル基、
または置換基を有していてもよい炭素原子数0〜20のスルホニル基を表し、
R2とR3、R5とR6は互いに結合して環を形成していてもよい。] A perylene derivative compound represented by the following general formula (1).
Hydrogen atom, halogen atom,
A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent,
A linear or branched alkenyl group having 2 to 20 carbon atoms which may have a substituent,
A cycloalkyl group having 5 to 10 carbon atoms, which may have a substituent,
An aromatic hydrocarbon group having 6 to 36 carbon atoms, which may have a substituent,
Alternatively, it represents a heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent.
R 2 and R 3 may be the same or different
Hydrogen atom, hydroxyl group,
A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent,
A linear or branched alkenyl group having 2 to 20 carbon atoms which may have a substituent,
A cycloalkyl group having 5 to 10 carbon atoms, which may have a substituent,
A linear or branched alkoxy group having 1 to 20 carbon atoms which may have a substituent,
A cycloalkoxy group having 5 to 10 carbon atoms, which may have a substituent,
A thio group having 0 to 18 carbon atoms which may have a substituent,
An amino group having 0 to 20 carbon atoms, which may have a substituent,
An aromatic hydrocarbon group having 6 to 36 carbon atoms, which may have a substituent,
Alternatively, it represents a heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent.
R 5 and R 6 may be the same or different.
Hydrogen atom, halogen atom, cyano group, nitro group, nitroso group,
A linear or branched alkyl fluoride group having 1 to 20 carbon atoms, which may have a substituent,
Aryl fluoride group having 6 to 36 carbon atoms, which may have a substituent,
Acyl groups having 1 to 20 carbon atoms, which may have substituents,
Alternatively, it represents a sulfonyl group having 0 to 20 carbon atoms which may have a substituent.
R 2 and R 3 and R 5 and R 6 may be coupled to each other to form a ring. ]
水素原子、ハロゲン原子、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルケニル基、
置換基を有していてもよい炭素原子数5〜10のシクロアルキル基、
置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基、
または置換基を有していてもよい環形成原子数5〜36の複素環基を表す。
R2は、水酸基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルキル基、
置換基を有していてもよい炭素原子数2〜20の直鎖状もしくは分岐状のアルケニル基、
置換基を有していてもよい炭素原子数5〜10のシクロアルキル基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のアルコキシ基、
置換基を有していてもよい炭素原子数5〜10のシクロアルコキシ基、
置換基を有していてもよい炭素原子数0〜18のチオ基、
置換基を有していてもよい炭素原子数0〜20のアミノ基、
置換基を有していてもよい炭素原子数6〜36の芳香族炭化水素基、
または置換基を有していてもよい環形成原子数5〜36の複素環基を表す。
R5は、ハロゲン原子、シアノ基、ニトロ基、ニトロソ基、
置換基を有していてもよい炭素原子数1〜20の直鎖状もしくは分岐状のフッ化アルキル基、
置換基を有していてもよい炭素原子数6〜36のフッ化アリール基、
置換基を有していてもよい炭素原子数1〜20のアシル基、
または置換基を有していてもよい炭素原子数0〜20のスルホニル基を表す。] The perylene derivative compound according to claim 1, which is represented by the following general formula (2).
Hydrogen atom, halogen atom,
A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent,
A linear or branched alkenyl group having 1 to 20 carbon atoms which may have a substituent,
A cycloalkyl group having 5 to 10 carbon atoms, which may have a substituent,
An aromatic hydrocarbon group having 6 to 36 carbon atoms, which may have a substituent,
Alternatively, it represents a heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent.
R 2 is a hydroxyl group,
A linear or branched alkyl group having 1 to 20 carbon atoms which may have a substituent,
A linear or branched alkenyl group having 2 to 20 carbon atoms which may have a substituent,
A cycloalkyl group having 5 to 10 carbon atoms, which may have a substituent,
A linear or branched alkoxy group having 1 to 20 carbon atoms which may have a substituent,
A cycloalkoxy group having 5 to 10 carbon atoms, which may have a substituent,
A thio group having 0 to 18 carbon atoms which may have a substituent,
An amino group having 0 to 20 carbon atoms, which may have a substituent,
An aromatic hydrocarbon group having 6 to 36 carbon atoms, which may have a substituent,
Alternatively, it represents a heterocyclic group having 5 to 36 ring-forming atoms which may have a substituent.
R 5 is a halogen atom, a cyano group, a nitro group, a nitroso group,
A linear or branched alkyl fluoride group having 1 to 20 carbon atoms, which may have a substituent,
Aryl fluoride group having 6 to 36 carbon atoms, which may have a substituent,
Acyl groups having 1 to 20 carbon atoms, which may have substituents,
Alternatively, it represents a sulfonyl group having 0 to 20 carbon atoms which may have a substituent. ]
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