JP2021095935A - Manufacturing method of vibration isolation structure and vibration isolator - Google Patents

Abstract

To provide a manufacturing method of a vibration isolation structure and a vibration isolator by which the vibration isolation structure in which a hard material layer and a rubber layer are alternately superimposed on one another, and integrally formed can be obtained by simple work.SOLUTION: A manufacturing method of a vibration isolation structure for manufacturing the vibration isolation structure in which a hard material layer and a rubber layer are alternately superimposed on one another in an axial direction, and integrally formed includes; a lamination block preparation process for preparing a plurality of lamination blocks B1 to B3 in each of which the hard material layer and the rubber layer are alternately superimposed on one another, and the rubber layer is vulcanized; and a lamination block adhesion process for manufacturing the vibration isolation structure by making end faces of the lamination blocks B1 to 3 in an axial direction adhere to one another. A vibration isolation device can be obtained by including a plate 20 in the lamination block B2.SELECTED DRAWING: Figure 2

Description

The present invention relates to a method for manufacturing a seismic isolation structure and a seismic isolation device.

As a conventional method for manufacturing a seismic isolation structure, there is a method of injecting unvulcanized rubber between a plurality of hard plates and heat vulcanizing (see, for example, Patent Document 1). Further, as another conventional method for manufacturing a seismic isolation structure, there is a method of adhering a hard layer and a rubber layer with an adhesive sheet (see, for example, Patent Document 2).

Japanese Unexamined Patent Publication No. 2001-171544 Japanese Unexamined Patent Publication No. 2015-226990

However, in any of the above-mentioned conventional manufacturing methods, for example, when the diameter of the hard material layer or the like differs depending on the stacking position of the seismic isolation structure, it may be difficult to incorporate the hard material layer or the like. Therefore, there is room for improvement in workability in the above-mentioned conventional manufacturing method.

An object of the present invention is a method for manufacturing a seismic isolation structure and a seismic isolation device, which can obtain a seismic isolation structure integrally formed by alternately stacking hard material layers and rubber layers by a simple operation. Is to provide.

The method for manufacturing a seismic isolation structure according to the present invention is a seismic isolation structure for manufacturing a seismic isolation structure in which hard material layers and rubber layers are alternately laminated in the axial direction and integrally formed. In the manufacturing method of the above, a laminated block preparation step of preparing a plurality of laminated blocks in which the hard material layer and the rubber layer are alternately laminated and the rubber layer is vulcanized and molded, and the laminated block. Includes a laminated block bonding step of manufacturing the seismic isolation structure by bonding the axial end faces of the rubber. According to the method for manufacturing a seismic isolation structure according to the present invention, a seismic isolation structure in which hard material layers and rubber layers are alternately laminated and integrally formed can be obtained by a simple operation.

In the method for manufacturing a seismic isolation structure according to the present invention, a columnar laminated block and two frustum-shaped laminated blocks are prepared in the laminated block preparation step, and the columnar laminated block is prepared in the laminated block bonding step. Of the two frustum-shaped laminated blocks, the small axial end face of the one-side frustum-shaped laminated block is adhered to the axial one-sided end surface of the columnar laminated block, and the above-mentioned 2 is attached to the axially opposite end surface of the columnar laminated block. Of the three frustum-shaped laminated blocks, the axially small end faces of the other side frustum-shaped laminated block can be bonded. In this case, a seismic isolation structure with a clear outline can be obtained.

In the method for manufacturing a seismic isolation structure according to the present invention, two convex frustum-shaped laminated blocks are prepared in the laminated block preparation step, and the two convex frustum-shaped laminated blocks are prepared in the laminated block bonding step. The convex side axial small end faces of the block can be bonded to each other. In this case, the seismic isolation structure can be obtained by a simpler operation.

In the method for manufacturing a seismic isolation structure according to the present invention, the hard material layers of the laminated blocks can be bonded to each other in the laminated block bonding step. In this case, a seismic isolation structure having excellent durability can be obtained.

The method for manufacturing a seismic isolation device according to the present invention includes the laminated block preparation step and the laminated block bonding step described in any of the above, and the laminated block includes a plate. According to the method for manufacturing a seismic isolation device according to the present invention, a seismic isolation device having a seismic isolation structure in which hard material layers and rubber layers are alternately laminated and integrally formed can be obtained by a simple operation. Can be done.

According to the present invention, a method for manufacturing a seismic isolation structure and a seismic isolation device capable of obtaining a seismic isolation structure integrally formed by alternately stacking hard material layers and rubber layers by a simple operation. Can be provided.

It is sectional drawing which shows typically an example of the seismic isolation device which can be manufactured by using the manufacturing method of the seismic isolation device which concerns on this invention. It is sectional drawing which shows typically the manufacturing method of the seismic isolation device which concerns on 1st Embodiment of this invention. It is sectional drawing which shows typically the manufacturing method of the seismic isolation device which concerns on 2nd Embodiment of this invention. It is a figure which shows typically the relationship between the state when the cylindrical seismic isolation structure is displaced in the axial direction, and the shear strain which occurs in the seismic isolation structure in the displacement state. It is a figure which shows typically the relationship between the state when the seismic isolation structure having a constricted part is displaced in the axial direction, and the shear strain generated in the seismic isolation structure in the displacement state. It is a hardening characteristic figure which shows the general hardening characteristic of rubber by the relationship between a shear strain and a shear stress. It is a graph which calculated the shear strain generated in each rubber layer of the seismic isolation structure when the seismic isolation structure having a constricted part was displaced in the axial direction, and plotted the calculated value. A graph in which the shear strain ratio Rδ of a seismic isolation structure having a constricted portion and a cylindrical seismic isolation structure when the hardening characteristics of the rubber layers are the same is calculated and the calculated values are plotted. is there.

Hereinafter, a method for manufacturing a seismic isolation structure and a method for manufacturing a seismic isolation device according to the present invention will be described with reference to the drawings. In the following description, the axial direction refers to the direction in which the central axis O of the seismic isolation structure extends, and in the present embodiment, the vertical direction (vertical direction) is also included. Further, the axial direction means a direction orthogonal to the axial direction, and in the present embodiment, the meaning of the width direction (diameter direction) is also included. Substantially the same matters will be omitted by using the same reference numerals.

In FIG. 1, reference numeral 1 is an example of a seismic isolation device that can be manufactured by using the method for manufacturing a seismic isolation device according to the present invention. The seismic isolation device 1 includes a seismic isolation structure 10 and plates 20 arranged at both ends of the seismic isolation structure 10.

In the present embodiment, the seismic isolation device 1 has a central axis O extending in the vertical direction, and the central axis O can be erected along the vertical axis.

In this embodiment, the plate 20 includes a plate 20a arranged at one axial (lower) end and a plate 20b arranged at the other (upper) end in the axial direction. In this embodiment, the plate 20a is a lower plate. The plate 20a can be fixed to, for example, a foundation (not shown) that supports the structure. It can be fixed to structures such as buildings, bridges, and houses (not shown). Further, in the present embodiment, the plate 20b is an upper plate. The plate 20b can be fixed to a structure (not shown) such as a building, a bridge, or a house. In this embodiment, the plate 20 is made of a circular steel plate. In the present embodiment, the central axis of the plate 20 is coaxial with the central axis O of the seismic isolation device 1.

The seismic isolation structure 10 is formed by alternately arranging hard material layers 11 and rubber layers 12.

The hard material layer 11 is a layer having rigidity. In the present embodiment, the hard material layer 11 is made of a circular metal plate, specifically, a circular steel plate. In the present embodiment, the central axis of the hard material layer 11 is coaxial with the central axis O of the seismic isolation device 1.

Further, in the present embodiment, the rubber layer 12 is a layer having elasticity. In the present embodiment, it is a circular elastic plate, specifically, a circular rubber plate. In the present embodiment, the central axis of the rubber layer 12 is coaxial with the central axis O of the seismic isolation device 1.

In the present embodiment, the hard material layer 11 and the rubber layer 12 have the same thickness. However, the thicknesses of the hard material layer 11 and the rubber layer 12 can be changed as appropriate. Further, in the present embodiment, the outer edge 11e in the width direction of the hard material layer 11 is covered with the outer layer 13 together with the rubber layer 12. The outer layer 13 is a cylindrical rubber plate. However, the outer layer 13 can be omitted.

The seismic isolation structure 10 has a constricted portion R2.

In the present embodiment, as shown by the alternate long and short dash line in FIG. 1, the seismic isolation structure 10 is partitioned by a constriction portion R2 and two end portions R3 located above and below the constriction portion R2. There is. Specifically, the end portion R3 is partitioned by a lower end portion R3a arranged adjacent to the lower end of the constricted portion R2 and an upper end portion R3b arranged adjacent to the upper end of the constricted portion R2. ing. Here, the constricted portion R2 refers to a virtual region located at the center of the seismic isolation structure 10 in the vertical direction. Further, the lower end portion R3a refers to a virtual region continuous upward from the lower end of the seismic isolation structure 10. Further, the upper end portion R3b refers to a virtual region continuous downward from the upper end of the seismic isolation structure 10.

Here, an example of the compartments of the constricted portion R2 and the terminal portion R3 will be described with reference to the virtual boundary lines L1 and L2.

The boundary line L1 is a boundary line between the plate 20 and the seismic isolation structure 10. In the present embodiment, the boundary line L1 is a line passing through the fixed surface of the plate 20 and the rubber layer 12 adjacent to the plate 20. In the present embodiment, the boundary line L1 is the boundary line L1A between the lower end of the seismic isolation structure 10 (the lower end of the lowermost rubber layer 12) and the upper end of the plate 20a, and the upper end of the seismic isolation structure 10 (the uppermost side). The boundary line L1B between the upper end of the rubber layer 12 and the lower end of the plate 20b is included.

The boundary line L2 is a boundary line between the constricted portion R2 and the terminal portion R3. In the present embodiment, the boundary line L2 is fixed to the rubber layer 12 of the terminal portion R3 farthest in the axial direction from the plate 20 and the hard material layer 11 of the constricted portion R2 adjacent to the rubber layer 12 of the terminal portion R3. A line that passes through a surface. In the present embodiment, the boundary line L2 is the boundary line L2A between the lower end of the constricted portion R2 (the lower end of the lowermost hard material layer 11) and the upper end of the lower end portion R3a (the upper end of the uppermost rubber layer 12). And the boundary line L2B between the upper end of the constricted portion R2 (the upper end of the uppermost hard material layer 11) and the lower end of the upper end portion R3b (the lower end of the lowermost rubber layer 12).

The constricted portion R2 is partitioned by two boundary lines L2 (boundary line L2A and boundary line L2B) in the axial direction. Further, the terminal portion R3 is partitioned by a boundary line L1 and a boundary line L2 in the axial direction. In the present embodiment, the lower end portion R3a is partitioned by the boundary line L1A and the boundary line L2A in the axial direction. Further, in the present embodiment, the upper end portion R3b is partitioned by the boundary line L1B and the boundary line L2B in the axial direction.

Further, at least one hard material layer 112 is arranged in the constricted portion R2. In the present embodiment, the constricted portion R2 has a plurality of (10 in this embodiment) hard material layers 112. In this embodiment, the hard material layer 112 has the same axial width W12. In the present embodiment, the hard material layer 112 is a steel plate having a diameter of φ12. In the present embodiment, the hard material layer 112 is arranged coaxially with the central axis O of the seismic isolation device 1. Therefore, in the present embodiment, the outer edges 12e in the width direction of the hard material layer 112 have the same distance in the axial direction (diameter direction) to the central axis O, respectively.

Further, at least one hard material layer 113 is arranged at the terminal portion R3. In the present embodiment, the terminal portion R3 has a plurality of (two in the present embodiment) hard material layers 113. In the present embodiment, the hard material layer 113 has an axial width W13. In the present embodiment, the hard material layer 113 is a steel plate having a diameter of φ13. In the present embodiment, the axial width W13 (diameter φ13) of the hard material layer 113 becomes smaller as it approaches the constricted portion R2. In the present embodiment, the hard material layer 113 is arranged coaxially with the central axis O of the seismic isolation device 1. Therefore, in the present embodiment, the outer edge 113e in the width direction of the hard material layer 113 becomes closer in the axial direction (diameter direction) to the central axis O toward the constricted portion R2.

In other words, the axial width W12 of the hard material layer 112 of the constricted portion R2 is the same in the axial direction, and the axial width W13 of the hard material layer 113 of the end portion R3 is the plate from the constricted portion R2 in the axial direction. It spreads toward 20.

In the present embodiment, the outer edge 113e in the width direction of the hard material layer 113 at the end portion R3 is located outside the outer edge 112e in the width direction of the hard material layer 112 at the constricted portion R2. Therefore, even when the seismic isolation structure 10 is greatly elastically deformed in the axial direction, the hard material layer 113 at the end portion R3 supports the hard material layer 112 at the constricted portion R2, so that the seat of the seismic isolation structure 10 is seated. Bending can be suppressed.

Next, a method for manufacturing a seismic isolation structure according to the present invention will be described.

According to the present invention, the method for manufacturing a seismic isolation structure can manufacture a seismic isolation structure 10 in which a hard material layer 11 and a rubber layer 12 are alternately laminated in the axial direction and integrally formed.

In the method for manufacturing a seismic isolation structure according to the present invention, a plurality of the laminated blocks B in which the hard material layers 11 and the rubber layers 12 are alternately laminated and the rubber layers 12 are vulcanized are prepared. Includes a laminated block preparation step.

In the laminated block preparation step, the hard material layer 11 and the rubber layer 12 are alternately laminated on the laminated block B. In the laminated block B, the rubber layer 12 is vulcanized. In the rubber layer 12, a plurality of hard material layers 11 are arranged in a molding mold at intervals, and unvulcanized rubber is injected (injected) between the plurality of hard material layers 11 to heat vulcanize. Can be done. Alternatively, the rubber layer 12 can be vulcanized and molded in advance. In this case, the hard material layer 11 and the rubber layer 12 can be adhered with an adhesive sheet or the like.

Further, the method for manufacturing a seismic isolation structure according to the present invention includes a laminated block bonding step of manufacturing the seismic isolation structure 10 by adhering the axial end faces of the laminated blocks B to each other.

The axial end face of the laminated block B can be bonded with, for example, a room temperature curing type adhesive or a heat curing type adhesive (including "vulcanization bonding). The axial end face of the laminated block B is hard. The material layer 11 or the rubber layer 12 can be used. According to the room temperature curable adhesive, the laminated block B can bond the hard material layers 11 to each other. Further, the room temperature curable adhesive or the heat curable type can be used. According to the adhesive, the laminated block B can bond the rubber layers 12 to each other. Further, according to the room temperature curing type adhesive or the heat curing type adhesive, the laminated block B is the hard material layer 11 and the rubber. It can be adhered to the layer 12.

According to the method for manufacturing a seismic isolation structure according to the present invention, for example, when the axial width W11 of a plurality of hard material layers 11 differs depending on the stacking position (axial position) of the seismic isolation structure 10, the rigid material layer 11 is said to be rigid. The seismic isolation structure 10 can be divided into a plurality of laminated blocks B so that the material layer 11 can be easily incorporated. As a result, even if the axial width W11 of the plurality of hard material layers 11 differs depending on the stacking position of the seismic isolation structure 10, the simple work of adhering the axial end faces of the plurality of laminated blocks B is sufficient. The seismic structure 10 can be manufactured.

Therefore, according to the method for manufacturing a seismic isolation structure according to the present invention, the seismic isolation structure 10 in which the hard material layer 11 and the rubber layer 12 are alternately overlapped and integrally formed can be obtained by a simple operation. be able to.

Further, according to the method for manufacturing a seismic isolation structure according to the present invention, for example, a plurality of hard material layers 11 are axially narrowed so that the axial width W11 of the hard material layer 11 is narrowed along the axial direction. The laminated block B can be configured so that it can be incorporated in the rigid material layer 11 in the order of increasing axial width W11 in the axial direction. This facilitates the manufacture of the laminated block B itself.

Next, with reference to FIG. 2, the manufacturing method of the seismic isolation structure 10 according to the first embodiment of the present invention will be described together with the manufacturing method of the seismic isolation device 1.

Referring to FIG. 2, in the method of manufacturing the seismic isolation structure 10 according to the present embodiment, first, in the laminated block preparation step, a columnar laminated block B1 and two frustum-shaped laminated blocks B2 are prepared. ..

As shown in FIG. 2, in the present embodiment, the columnar laminated block B1 extends in the same axial width Wb1 along the axial direction in the axial cross-sectional view. In the present embodiment, the columnar laminated block B1 corresponds to the constricted portion R2 of the seismic isolation structure 10. Therefore, the axial width Wb1 of the columnar laminated block B1 coincides with the axial width W2 of the constricted portion R2. In the present embodiment, the axial width W2 of the constricted portion R2 has a diameter of φ2. That is, in the present embodiment, the columnar laminated block B1 is a columnar block. However, according to the present invention, the columnar laminated block B1 can be a prismatic block. In this embodiment, the central axis of the columnar laminated block B1 coincides with the central axis O of the seismic isolation device 1.

Next, as shown in FIG. 2, in the present embodiment, in the axial cross-sectional view, the width Wb2 in the axial direction of the cone-shaped laminated block B2 is reduced (enlarged) from one side in the axial direction toward the other side in the axial direction. )doing. In the present embodiment, the frustum-shaped laminated block B2 corresponds to the terminal portion R3 of the seismic isolation structure 10. Therefore, the axial width Wb21 of the axial small end surface fb21 of the frustum-shaped laminated block B2 coincides with the axial width W2 of the constricted portion R2. In the present embodiment, the axial width W2 of the constricted portion R2 has a diameter of φ2. That is, in the present embodiment, the axial width Wb21 of the axial small end surface fb21 of the frustum-shaped laminated block B2 has a diameter of φ2. Further, the axial width Wb22 of the axial large end surface fb22 of the frustum-shaped laminated block B2 coincides with the axial width W1 of the seismic isolation structure 10. In the present embodiment, the axial width W1 of the seismic isolation structure 10 has a diameter of φ1. That is, in the present embodiment, the axial width Wb22 of the axial large end surface fb22 of the frustum-shaped laminated block B2 has a diameter of φ1. Therefore, in the present embodiment, the frustum-shaped laminated block B2 is a conical block having a small axial end surface fb21 as an upper bottom surface and a large axial end surface fb22 as a lower bottom surface. However, according to the present invention, the cone-shaped laminated block B2 can be a pyramid block. In the present embodiment, the central axis of the conical laminated block B2 coincides with the central axis O of the seismic isolation device 1.

Next, referring to FIG. 2, the method for manufacturing the seismic isolation structure 10 according to the present embodiment is that in the laminated block bonding step, two frustums are formed on one axial end surface fb11 of the columnar laminated block B2. Of the laminated blocks B2, the small axial end surface fb21 of the one-side frustum-shaped laminated block B2 is adhered, and the axially opposite end surface fb12 of the columnar laminated block B1 is of the two frustum-shaped laminated blocks B2. The axial small end surface fb21 of the other side frustum-shaped laminated block B2 is adhered. As a result, the seismic isolation structure 10 having the constricted portion R2 can be obtained by a simple operation of just adhering the three laminated blocks B.

In particular, according to the manufacturing method according to the present embodiment, since the columnar laminated block B1 and the frustum-shaped laminated block B2 formed with a linear contour are used as the laminated block B, the contour is clear. The seismic isolation structure 10 can be obtained.

Further, in the present embodiment, the frustum-shaped laminated block B2 further includes a plate 20. In this case, as a method of manufacturing the seismic isolation device, the seismic isolation device 1 can be obtained by a simple operation by adhering the two frustum-shaped laminated blocks B2 to the tubular laminated block B1. The frustum-shaped laminated block B2 can be adhered to the plate 20 with, for example, a room temperature curing type adhesive or a heat curing type adhesive.

Next, with reference to FIG. 3, the manufacturing method of the seismic isolation structure 10 according to the second embodiment of the present invention will be described together with the manufacturing method of the seismic isolation device 1.

Referring to FIG. 3, in the method of manufacturing the seismic isolation structure 10 according to the present embodiment, first, two convex frustum-shaped laminated blocks B3 are prepared in the laminated block preparation step.

As shown in FIG. 3, in the present embodiment, in the axial cross-sectional view of the convex frustum laminated block B3, the axial width Wb2 is reduced (enlarged) from one side in the axial direction toward the other side in the axial direction. ) Has a frustum portion B32. In the present embodiment, the frustum portion B32 corresponds to the terminal portion R3 of the seismic isolation structure 10. Further, in the present embodiment, the convex frustum-shaped laminated block B3 has a column portion B31 extending along the axial direction with the same axial width Wb1 in the axial cross-sectional view. In the present embodiment, the pillar portion B31 corresponds to a part of the constricted portion R2 of the seismic isolation structure 10.

The convex frustum-shaped laminated block B3 is formed by a column portion B31 and a frustum portion B32. The large axial end surface of the frustum portion B32 coincides with the large axial end surface fb32 of the convex frustum-shaped laminated block B3. Therefore, the axial width Wb32 of the axial large end surface fb32 of the convex frustum laminated block B3 coincides with the axial width W1 of the seismic isolation structure 10. That is, in the present embodiment, the axial width Wb32 of the axial large end surface fb32 of the convex frustum laminated block B3 has a diameter of φ1. Therefore, the pillar portion B31 protrudes from the axially small end surface (upper bottom surface) of the frustum portion B32. The axial one-sided end surface of the column portion B31 coincides with the axial small end surface of the frustum portion B32. Therefore, the axially opposite end surface of the column portion B31 coincides with the axially small end surface fb31 of the convex frustum-shaped laminated block B3. In the present embodiment, the axial width Wb31 of the axial small end surface fb31 of the convex frustum laminated block B3 coincides with the axial width W2 of the constricted portion R2. That is, in the present embodiment, the axial width Wb31 of the axial small end surface fb31 of the convex frustum laminated block B3 has a diameter of φ2. Therefore, in the present embodiment, the convex frustum laminated block B3 is a convex conical block having a small axial end surface fb31 as an upper bottom surface and a large axial end surface fb32 as a lower bottom surface. However, according to the present invention, the convex pyramid laminated block B3 can be a convex pyramid block. In the present embodiment, the central axis of the convex conical laminated block B3 coincides with the central axis O of the seismic isolation device 1.

Next, referring to FIG. 3, in the method of manufacturing the seismic isolation structure 10 according to the present embodiment, in the laminated block bonding step, the axial small end faces fb31 of the two convex frustum-shaped laminated blocks B3 are connected to each other. Glue. As a result, the seismic isolation structure 10 having the constricted portion R2 can be obtained by a simple operation of just adhering the two laminated blocks B.

In particular, according to the manufacturing method according to the present embodiment, the seismic isolation structure 10 can be obtained by the two convex frustum laminated blocks B3. Therefore, in this case, the seismic isolation structure 10 can be obtained by a simpler operation.

In the convex frustum-shaped laminated block B3, the axial height h31 of the column portion B31 can be halved of the constricted portion R2. That is, in the present embodiment, the heights of the two pillar portions B31 in the axial direction are the same. However, according to the present invention, the axial heights h31 of the two pillar portions B31 can be made different.

Further, in the present embodiment, the convex frustum-shaped laminated block B3 further includes a plate 20. In this case, the seismic isolation device 1 can be obtained by a simple operation by adhering the two convex frustum-shaped laminated blocks B3. The convex frustum-shaped laminated block B3 can be adhered to the plate 20 with, for example, a room temperature curing type adhesive or a heat curing type adhesive, as in the first embodiment.

Further, in the method for manufacturing a seismic isolation structure according to each of the above-described embodiments, the hard material layers 11 of the laminated block B can be bonded to each other in the laminated block bonding step. In this case, the laminated blocks B3 can be firmly bonded to each other. Therefore, in this case, the seismic isolation structure 10 having excellent durability can be obtained.

For bonding the hard material layers 11 to each other, for example, a room temperature curable adhesive can be used. In this case, the hard material layers 11 forming the axial end faces of the laminated block B3 are half hard in the axial direction so that when they are adhered to each other, they have the same axial thickness as the other hard material layers 11. It can be a material layer.

By the way, when focusing on the shear strain when the upper and lower ends of the seismic isolation structure 10 of FIG. 1 are displaced in the opposite direction in the axial direction, as shown in FIG. 4A, the shear generated in the cylindrical seismic isolation structure 50 The strain ε0 has a uniform magnitude in the axial direction, but as shown in FIG. 4B, the shear strain ε1 generated in the seismic isolation structure 10 having the constricted portion R2 is concentrated in the constricted portion R2.

On the other hand, in the elastic material (soft material), the shear stress σ rapidly increases when the shear strain ε reaches a predetermined value, as in the general rubber shown in FIG. That is, the rigidity K (= σ / ε) of the rubber sharply increases when the shear strain ε reaches a predetermined value. With reference to FIG. 5, the hardening property of the elastic material is represented by the ratio Rk (= K2 / K1) of the secondary rigidity K2 to the primary rigidity (initial rigidity) K1. This hardening property is a property peculiar to elastic materials.

Therefore, in the seismic isolation structure 10 having the constricted portion R2, if the hardening characteristics of the rubber layer 12 are controlled, the shear strain ε generated in the constricted portion R2 has a uniform magnitude in the axial direction as shown in FIG. 4A. It can be made.

FIG. 6 calculates the shear strain ε generated in each rubber layer 12 of the seismic isolation structure 10 when the upper and lower ends of the seismic isolation structure 10 having the constricted portion R2 are displaced in the opposite direction in the axial direction. , It is a graph which plotted the calculated value.

In FIG. 6, the upper and lower ends of the vertical axis correspond to the lower end to the upper end of the seismic isolation structure 10. In FIG. 5, □ (white square) is a shear strain generated in each rubber layer 12 of the seismic isolation structure 10 when Rk = 1. (3) (black square) is a shear strain generated in each rubber layer 12 of the seismic isolation structure 10 when Rk = 2. ◯ (white circle) is a shear strain generated in each rubber layer 12 of the seismic isolation structure 10 when Rk = 4. ● (black circle) is a shear strain generated in each rubber layer 12 of the seismic isolation structure 10 when Rk = 8.

With reference to FIG. 6, it can be seen that if the rubber layer 12 has a large hardening characteristic of Rk, the difference in shear strain ε generated between the constricted portion R2 and the terminal portion R3 can be reduced. The characteristics of the shear strain ε shown in FIG. 5 are the same for the number of layers n = 30 (sheets), 40 (sheets), and 50 (sheets) of the rubber layer 12. Therefore, it is considered that the number n of the rubber layers 12 does not significantly affect the characteristics of the shear strain ε shown in FIG.

_{On the other hand, FIG. 7 shows the shear strain ratio Rε (= δ S} / δ) of the seismic isolation structure having a constricted portion and the cylindrical seismic isolation structure when the hardening characteristics of the rubber layers are the same. _{It is a graph which calculated o} ) and plotted the calculated value.

In the present embodiment, δ _S is the amount of shear deformation of the seismic isolation structure 10 (necked portion R2). Further, in the present embodiment, δ _o is the amount of shear deformation of the cylindrical seismic isolation structure 50. In the present embodiment, the shear deformation amount is the deformation limit of the fracture limit.

With reference to FIG. 7, when the rubber layer 12 has a hardening characteristic of Rk = 2 or more, the shear strain ratio Rε (= δ _S / δ _o ) is stable at around 0.9. In FIG. 5, ● (black circle) is the case where the number of layers n = 30 (sheets) of the rubber layer 12. Further, (1) (black square) is a case where the number of layers n = 40 (sheets) of the rubber layer 12. Further, ▲ (black triangle) is a case where the number of layers n = 50 (sheets) of the rubber layer 12. With reference to these, it is considered that the number n of the rubber layers 12 does not significantly affect the characteristics of the shear strain ratio Rδ with respect to Rk.

By the way, referring to FIG. 1, the width W1 of the seismic isolation structure 10 is the maximum width W1max of the seismic isolation structure 10. In the present embodiment, the width W1 of the seismic isolation structure 10 is the axial width of the seismic isolation structure 10 at the boundary line L1. That is, in the present embodiment, the width W1 of the seismic isolation structure 10 is defined by the axial width of the axial end of the seismic isolation structure 10. In the present embodiment, the axial end of the seismic isolation structure 10 includes the lower end e1 of the seismic isolation structure 10 and the lower end e2 of the seismic isolation structure 10. In the present embodiment, the axial width of the lower end e1 of the seismic isolation structure 10 and the axial vertical width of the lower end e2 of the seismic isolation structure 10 are the same width W1. In the present embodiment, the width W1 of the seismic isolation structure 10 is the axial width of the rubber layer 12 on the outermost axial direction of the seismic isolation structure 10.

Further, referring to FIG. 1, the width W2 of the constricted portion R2 is the minimum width W1min of the seismic isolation structure 10. In the present embodiment, the width W2 of the constricted portion R2 is the axial width of the seismic isolation structure 10 at the boundary line L2. That is, in the present embodiment, the width W2 of the constricted portion R2 is defined by the axial width of the axial end of the constricted portion R2. In the present embodiment, the width W2 of the constricted portion R2 is a width including the axial width of the rubber layer 12 of the constricted portion R2 and the axial width of the outer layer 13 made of rubber. In the present embodiment, the axial width of the constricted portion R2 is the same width W2 along the axial direction.

Further, referring to FIG. 1, the height of the seismic isolation structure 10 is defined by H1. Further, in the present embodiment, the height of the constricted portion R2 is defined by H2. Further, in the present embodiment, the height of the terminal portion R3 is defined by H3. Further, in the present embodiment, the height of the lower end portion R3a of the two end portions R3 is defined by H3a. Further, in the present embodiment, the height of the upper terminal portion R3b of the two terminal portions R3 is defined by H3b. That is, the height H1 of the seismic isolation structure 10 in FIG. 1 is the sum of the height H2 of the constricted portion R2, the height H3a of the lower end portion R3a, and the height H3b of the upper end portion R3b (H1 =). H2 + H3a + H3b). In the seismic isolation structure 10 of FIG. 1, the height H3a of the lower end portion R3a and the height H3b of the upper end portion R3b are the same height.

Further, referring to FIG. 1, the height H1 of the seismic isolation structure 10 is defined by the height between the two axial ends of the seismic isolation structure 10. In the present embodiment, the height H1 of the seismic isolation structure 10 is the height between the lower end e1 (boundary line L1A) of the seismic isolation structure 10 and the lower end e2 (boundary line L1B) of the seismic isolation structure 10. is there. In the present embodiment, the height H1 of the seismic isolation structure 10 is the height between the axially outer ends of the two rubber layers 12 arranged on the outermost axial direction of the seismic isolation structure 10.

Further, referring to FIG. 1, the height H2 of the constricted portion R2 is the height between the two boundary lines L2 (boundary line L2A and boundary line L2B). In the present embodiment, the constricted portion R2 height H2 is the height between the axially outer ends of the outermost rigid material layer 11 in the constricted portion R2.

In Table 1 below, Rk (= K2 / K1) is the ratio Rw (α = W2 / W1) of the width W2 of the constricted portion R2 to the width W1 of the seismic isolation structure 10 and the height of the seismic isolation structure 10. It is specified by the relationship with the ratio Rh (β = H2 / H1) of the height H2 of the constricted portion R2 with respect to the height H1.

Referring to Table 1, in the area shown in light gray, if the difference between the width W1 of the seismic isolation structure 10 and the width W2 of the constricted portion R2 is too large, in other words, the seismic isolation structure 10 is too constricted. If there is. In this case, even if the difference in shear strain ε is reduced by hardening the rubber layer 12, a large effect cannot be obtained. Further, the region shown in dark gray is a case where the difference between the width W1 of the seismic isolation structure 10 and the width W2 of the constricted portion R2 is too small, in other words, the seismic isolation structure 10 is hardly constricted. In this case, it is almost the same as the cylindrical seismic isolation structure 50, and it is not necessary to harden the rubber layer 12.

Therefore, referring to Table 1, the optimum hardening condition required by providing the constricted portion R2 is that the rigidity ratio Rk of the rubber layer 12 satisfies the following relationship.

2 ≦ Rk ≦ 8 ... (1)

With reference to Table 1, when the rigidity ratio Rk of the rubber layer 12 satisfies the above range (1), the width W1 of the seismic isolation structure 10 and the width W2 of the constricted portion R2 satisfy the following relationship. Is preferable.

0.7 ≤ (W2 / W1) ≤ 0.825 ... (2)

Further, referring to Table 1, when the rigidity ratio Rk of the rubber layer 12 satisfies the above range (1), the height H1 of the seismic isolation structure 10 and the height H2 of the constricted portion R2 are as follows. It is preferable to satisfy the relationship.

0.6 ≤ (H2 / H1) ≤ 0.8 ... (3)

That is, referring to Table 1, in the seismic isolation structure 10 having the constricted portion R2, in order to obtain the optimum hardening conditions required by the constricted portion R2, the seismic isolation structure 10 is set. The ratio α of the width W2 of the constricted portion R2 to the width W1 of the seismic isolation structure 10 is within the range of 0.7 ≦ α ≦ 0.825, and the ratio α with respect to the height H1 of the seismic isolation structure 10 The ratio β of the height H2 of the constricted portion R2 is preferably formed so as to be within the range of 0.6 ≦ β ≦ 0.8.

The seismic isolation structure 10 of FIG. 1 is formed so as to satisfy both the above conditions (2) and (3). In this case, as described above, it is possible to suppress the local concentration of the shear strain ε that may occur in the constricted portion R2 when the seismic isolation structure 10 is displaced in the axial direction. Therefore, according to the seismic isolation structure 10 of FIG. 1, it is possible to obtain the optimum hardening conditions required by providing the constricted portion R2.

In the present embodiment, the seismic isolation structure 10 is provided with a constricted portion R2 in a cylinder centered on the central axis O. In the present embodiment, the width W1 of the seismic isolation structure 10 is the diameter φ1 of the seismic isolation structure 10. Further, the width W2 of the constricted portion R2 is the diameter φ2 of the seismic isolation structure 10. That is, in the present embodiment, the ratio α of the width W2 of the constricted portion R2 to the width W1 of the seismic isolation structure 10 is the ratio of the diameter φ2 of the seismic isolation structure 10 to the diameter φ1 of the seismic isolation structure 10 (φ2). It can be replaced with / φ1).

However, the seismic isolation structure 10 is not limited to the one in which the constricted portion R2 is provided in the cylinder, and a structure in which the constricted portion R2 is provided in a rectangular cylinder having a deformed shape such as a polygon can be adopted. In this case, the width W1 of the seismic isolation structure 10 and the width W2 of the constricted portion R2 can be the diameter of the circumscribed circle of the seismic isolation structure 10.

The width W1 of the seismic isolation structure 10 can be replaced with the axial width W13 (= φ13) of the hard material layer 113 closest to the plate 20 among the plurality of hard material layers 113. That is, the width W1 of the seismic isolation structure 10 can be the axial width W13 of the hard material layer 113 having the largest width W13 among the plurality of hard material layers 113. Further, the width W2 of the constricted portion R2 can be replaced with the axial width W12 (= φ12) of the hard material 112 of the constricted portion R2. The reason these replacements are possible is that they are the parts that most affect the shear strain ε.

As described above, the seismic isolation structure 10 of FIG. 1 has a constricted portion R2 to suppress buckling that may occur when the upper and lower ends of the seismic isolation structure 10 are displaced in the opposite direction in the axial direction. Can be done. In addition, the seismic isolation structure 10 of FIG. 1 is shaped so that α satisfies the above range (2) and β satisfies the above range (3). In this case, as shown in Table 1, if the rigidity ratio Rk is within the range of (1) above, it occurs in the constricted portion R2 when the upper and lower ends of the seismic isolation structure 10 are displaced in the opposite direction in the axial direction. The local concentration of the obtained shear strain ε can be suppressed.

Therefore, in the seismic isolation structure 10 of FIG. 1, the rigidity ratio Rk of the rubber layer 12 is preferably 2 ≦ Rk ≦ 8. In this case, it is possible to suppress the buckling that may occur when the upper and lower ends of the seismic isolation structure 10 are displaced in the opposite direction in the axial direction, and to suppress the local concentration of the shear strain ε that may occur in the constricted portion R2. it can. Therefore, in this case, the durability can be easily improved.

Further, in the seismic isolation structure 10 of FIG. 1, the rigidity ratio Rk is more preferably 4 <Rk ≦ 8. In this case, in this case, the durability of the seismic isolation structure 10 can be further improved. In particular, when the rigidity ratio Rk = 8, the durability of the seismic isolation structure 10 can be further improved.

Further, the seismic isolation device 1 of FIG. 1 includes the seismic isolation structure 10 and two plates 20 arranged at the upper end and the lower end of the seismic isolation structure 10. According to such a seismic isolation device 1, it is possible to obtain the optimum hardening conditions required by providing the constricted portion R2.

As described above, according to the present invention, it is possible to provide a seismic isolation structure and a seismic isolation device capable of obtaining the optimum hardening conditions required by providing the constricted portion R2.

In the seismic isolation structure 10 of FIG. 1, the virtual ridge line L formed by connecting the outer edge 113e in the width direction of the hard material 113 and the outer edge 112e in the width direction of the hard material 113 is a seismic isolation device as shown in FIG. In the axial cross-sectional view of No. 1, the angle A on the acute angle side with respect to the vertical direction can be assumed to be 45 ° to 80 °. When the angle A is less than 45 °, the effect of suppressing buckling is small. When the angle A exceeds 80 °, the effect of suppressing buckling is small, and local peeling is likely to occur on the compression side of the outer edge 113e in the width direction of the hard material 113. In the seismic isolation structure 10 of FIG. 1, the virtual ridge line L has an acute-angled angle A of 45 ° to 80 ° with respect to the vertical direction in the axial cross-sectional view of the seismic isolation device 1. Therefore, according to the present embodiment, the buckling improvement effect is particularly high.

Further, the ratio α1 (= W12 / W13) of the axial width W12 of the hard material 112 of the constricted portion R2 to the axial width W13 of the hard material 113 of the terminal portion R3 satisfies the following relationship (4). Is preferable.

0.6 ≤ (W12 / W13) ≤ 0.97 ... (4)

In this embodiment, the hard material 11 is a circular plate. Further, in the present embodiment, the hard material 11 is arranged coaxially on the central axis O. In the present embodiment, the axial width W13 of the hard material 13 and the axial width W12 of the hard material 112 are the diameters of the hard material 11. That is, in the present embodiment, the ratio α1 of the axial width W12 of the hard material 112 of the constricted portion R2 to the axial width W13 of the hard material 113 of the end portion R3 is the hard material with respect to the diameter φ13 of the hard material 113. It can be replaced with the ratio of diameter φ12 of 112 (φ12 / φ13).

The hard material 11 is not limited to a circular plate, and an irregularly shaped plate such as a polygon can be adopted. In this case, the axial width W13 of the hard material 113 and the axial width W12 of the hard material 112 can be the diameter of the circumscribed circle of the hard material 11. Further, the ratio α1 (= W12 / W13) is preferably 0.6 or more. More preferably, it is a value of α1 = 0.7 to 0.92. In this case, sufficient seismic isolation performance can be ensured. When there are a plurality of hard materials 11, W13 is the maximum width of the hard materials 113, and W12 is the minimum width of the hard materials 112.

Further, specific examples of the axial width W13 of the hard material 113 of the terminal portion R3 and the axial vertical width W12 of the hard material 112 of the constricted portion R1 include W12 / W13 = 0.6 to 0.97.

In the above case, since the hard material 113 at the end portion R3 has a width direction outer edge 113e located outside the width direction outer edge 112e of the hard material 112 at the constricted portion R2, the seismic isolation structure 10 has a seismic isolation structure 10. Even when elastically deformed suddenly, the compression side portion (end region R1) that causes buckling of the seismic isolation structure 10 by supporting the hard material 112 of the constricted portion R2 by the hard material 113 of the end portion R3. ) Can suppress the local stress concentration.

On the other hand, when only the axial width W13 of the hard material 113 at the end portion R3 is simply secured to be large, the buckling characteristic is improved. However, there is a problem that the original seismic isolation performance cannot be exhibited because the natural vibration cycle of a structure such as a building is shortened simply by increasing the W13. Therefore, when a large axial width W13 of the hard material 113 at the end portion R3 is secured, a phenomenon in which the natural vibration cycle of the structure is shortened by reducing the axial longitudinal width W12 of the hard material 112 at the constricted portion R2. Can be suppressed. Specifically, when the ratio α1 of the axial width W12 of the hard material 112 of the constricted portion R2 to the axial width W13 of the hard material 113 of the terminal portion R3 is 0.97 or less, the structure. Improves buckling characteristics while maintaining the natural vibration cycle for a long time. Therefore, if α1 is set to 0.97 or less in the seismic isolation structure 10, the buckling performance is improved and the required seismic isolation performance is not impaired. Further, when the ratio α1 is set to less than 0.6, the axial width W12 of the hard material 112 of the constricted portion R2 becomes small, and the buckling performance and the load bearing capacity deteriorate. On the other hand, when α1 is set to 0.6 or more, the buckling performance improving effect can be obtained and the load bearing capacity does not decrease.

In addition, in the present embodiment, a plurality of hard material layers 113 are arranged at the terminal portion R3, and the widthwise outer edge 113e of the plurality of hard material layers 113 is the widthwise outer edge of the hard material 112 of the constricted portion R2. Since it is outside the width direction of 112e and the width W13 of the hard material layer 113 expands toward the axial end of the seismic isolation structure 10, even when the seismic isolation structure 10 is significantly elastically deformed. Local peeling does not occur on the compression side of the outer edge 113e in the width direction of the hard material 113 at the end portion R3.

In short, the seismic isolation structure 10 according to the present embodiment has improved buckling resistance when compared with a seismic isolation structure having the same horizontal rigidity and an α1 of more than 0.97. Further, when compared with a seismic isolation structure in which the terminal portion R3 hard material 113 has the same axial width W13 and α1 exceeds 0.97, the present embodiment can have a longer natural vibration cycle. Further, when compared with a seismic isolation structure in which the axial width W12 of the hard material 112 of the constricted portion R2 is the same and α1 exceeds 0.97, the present embodiment is in the width direction of the hard material 113 of the terminal portion R3. Local peeling that occurs on the compression side of the outer edge 113e can be suppressed.

Therefore, if the hard material layers 11 are arranged as described above, the seismic isolation structure and the seismic isolation structure having excellent buckling resistance and durability while maintaining the load bearing capacity without impairing the required seismic isolation performance and It becomes a seismic isolation device.

The above has only disclosed some embodiments of the present invention, and various modifications can be made according to the claims. For example, according to the present invention, the seismic isolation structure and the seismic isolation device may include a plug (core material). Specifically, in the present embodiment, a plug extending along the central axis O can be penetrated through the central portion of the seismic isolation structure 10. The plug is preferably made of a metal such as lead or tin.

(analysis)
In order to confirm the effect on the arrangement of the hard material layer 11, FEM (Finite Element Method) analysis based on W12 / W13 (hereinafter, also referred to as "FEM analysis based on width ratio") and the angle A of the virtual ridge line L are used. Two types of analysis were performed: FEM analysis (hereinafter, also referred to as "angle-based FEM analysis"). In the FEM analysis, buckling strain, fracture strain and natural vibration period were verified. Marc analysis software manufactured by MSC Software was used for the FEM analysis.

In the above FEM analysis, an analysis model that reproduces the contour shape of the seismic isolation structure 10 according to the present embodiment was used. In the FEM analysis based on the width ratio, six analysis models were created. Moreover, in the FEM analysis based on the angle, five analysis models were created. The input load used in these FEM analyzes is 1300 kN.

The mesh of the hard material was a tetrahedron having a side of about 50 to 120 mm per layer, and the number of meshes was 54. The mesh of the soft material was a tetrahedron having a side of 50 to 120 mm per layer, and the number of meshes was 54. In addition, the parameters of the analysis model are shown in [Table 2] below.

The following [Table 3] shows the buckling performance, durability performance (breaking performance), and seismic isolation performance evaluated based on the results of FEM analysis based on the width ratio. Here, the "buckling strain" is a strain (%) when buckling occurs in the analysis model, and the strain mainly occurs in the terminal region. Further, the "improved buckling strain" is a conventional seismic isolation structure that does not include the numerical range of the seismic isolation structure 10 according to the present embodiment (in this analysis, a seismic isolation structure having a related performance of R = 1). ) Is the ratio of the buckling strain (%) of the analysis model to be analyzed when the buckling strain of) is set to 100. Therefore, in this evaluation, it is determined that the larger the value of the improved buckling strain, the less likely the buckling occurs and the better the buckling performance. Further, the "breaking strain" is a strain (%) when the rubber layer is broken, and the strain mainly occurs at the terminal portion R3. Therefore, in this evaluation, it is determined that the larger the value of the breaking strain, the less likely it is to break and the better the breaking performance is. In addition, "NA" is an unusable value. Further, the "100% equivalent period" T is calculated as follows. When the displacement (x) -load (y) graph of the seismic isolation structure is drawn, it usually becomes a loop shape. Here, let k be the slope of this straight line when the position of the most + (plus) displacement x on the loop and the position of the most − (minus) displacement x are connected by a straight line. Then, it is calculated by T = 2π√ (m / k) (m is the mass of the seismic isolation structure). Therefore, in this evaluation, it is determined that the larger the value of the 100% equivalent period, the better the seismic isolation performance. In [Table 3], when the buckling strain is 400% or more, it is ⊚, which is evaluated as good. In addition, when the structure is improved by 15% or more from the conventional structure, it is evaluated as ◯, which is generally good. Furthermore, x is an evaluation that there is room for improvement other than that.

With reference to Table 3, in the analysis model of W12 / W13 = 0.55, there is room for improvement in the evaluation of durability performance and seismic isolation performance, while in the analysis model of 0.6 ≦ W12 / W13, durability is recognized. It was confirmed that the performance and seismic isolation performance were good. Further, in the analysis model of W12 / W13 = 0.98 or more, there is room for improvement in the evaluation of the buckling performance, while in the analysis model of W12 / W13 ≤ 0.97, the buckling performance is good. It was recognized that there was. Therefore, from these evaluation results, if the analysis model is in the range of 0.6 ≤ W12 / W13 ≤ 0.97, the buckling performance, durability performance (breaking performance), and seismic isolation performance are all good. It is clear that there is.

Further, the following [Table 4] shows the buckling performance evaluated based on the result of the FEM analysis based on the angle. Here, the "buckling strain" and the "improved buckling strain" are the same as in [Table 3]. Further, the "end tensile strain" refers to a strain applied to the rubber layer 12 in contact with the widthwise end portion of the hard material layer 113 adjacent to the plate 20 of the terminal portion R3. The smaller this value, the better. Further, in [Table 4], the evaluations indicated by ⊚, ◯ and × are the same as in [Table 3].

With reference to Table 4, in the analysis model in which the angle A of the virtual ridge line L is 40 ° or less and the analysis model in which the angle A is 85 °, there is room for improvement in the evaluation of the buckling performance and the curling performance. In the analysis model in which the angle A of the virtual ridge line L was 45 ° to 80 °, it was confirmed that the buckling performance and the curling performance were good. Therefore, from these evaluation results, it is clear that the buckling performance is good if the angle A of the virtual ridge line L is an analysis model in the range of 40 ° to 85 °.

1: Seismic isolation device, 10: Seismic isolation structure, 11: Hard material layer, 20: Plate, 112: Hard material layer at the constriction, 113: Hard material layer at the end, 112e: Hard material layer at the constriction Width outer edge, 113e: Width outer edge of hard material at the end, 12: rubber layer, A: angle, H1: height of seismic isolation structure, H2: height of constriction, L: virtual ridge, R2: Constriction, R3: End, W1: Width of seismic isolation structure, W2: Width of constriction

Claims (5)

A method for manufacturing a seismic isolation structure for manufacturing a seismic isolation structure in which hard material layers and rubber layers are alternately laminated in the axial direction and integrally formed.
A laminated block preparation step of preparing a plurality of laminated blocks in which the hard material layer and the rubber layer are alternately laminated and the rubber layer is vulcanized.
A laminated block bonding step of manufacturing the seismic isolation structure by adhering the axial end faces of the laminated blocks to each other.
Manufacturing method of seismic isolation structure including. In the laminated block preparation step, a columnar laminated block and two frustum-shaped laminated blocks are prepared.
In the laminated block bonding step, the axial small end surface of the one-side frustum-shaped laminated block of the two frustum-shaped laminated blocks is adhered to the axial one-sided end surface of the columnar laminated block, and the columnar lamination is performed. The seismic isolation structure according to claim 1, wherein the axially small end surface of the other side frustum-shaped laminated block of the two frustum-shaped laminated blocks is adhered to the axially opposite end surface of the block. Production method. In the laminated block preparation step, two convex frustum-shaped laminated blocks are prepared, and
The method for manufacturing a seismic isolation structure according to claim 1, wherein in the laminated block bonding step, the convex side axial small end faces of the two convex frustum-shaped laminated blocks are bonded to each other. The method for manufacturing a seismic isolation structure according to any one of claims 1 to 3, wherein in the laminated block bonding step, the hard material layers of the laminated block are bonded to each other. The method for manufacturing a seismic isolation device, which comprises the laminated block preparation step and the laminated block bonding step according to any one of claims 1 to 4, wherein the laminated block includes a plate.

Images