JP2021063240A - Partial plating device and partial plating method - Google Patents

Partial plating device and partial plating method Download PDF

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JP2021063240A
JP2021063240A JP2019186466A JP2019186466A JP2021063240A JP 2021063240 A JP2021063240 A JP 2021063240A JP 2019186466 A JP2019186466 A JP 2019186466A JP 2019186466 A JP2019186466 A JP 2019186466A JP 2021063240 A JP2021063240 A JP 2021063240A
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shaped member
strip
plating
masking
masking jig
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JP7266876B2 (en
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中島 弘
Hiroshi Nakajima
弘 中島
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IDEYA KK
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Abstract

To provide a partial plating device and a partial plating method capable of efficiently performing high-precision partial plating on a surface to be plated of a strip-shaped member.SOLUTION: A partial plating device 10 comprises: a moving table 24 that moves forward in synchronization with a transport direction of a strip-shaped member 12 and moves backward to an initial position; a first masking jig 41 that is mounted on the moving table 24 so as to move closer to and away from the strip-shaped member 12 and is pressed against one surface T1 to be plated of the strip-shaped member 12; and a second masking jig 42 that is pressed against the other surface T2 to be plated, wherein a masking plate 51a in which communication holes having a shape corresponding to a region requiring plating applied to the surface T1 to be plated are formed is provided on the first masking jig 41, two masking jigs 41, 42 are pressed and sandwiched by the strip-shaped member 12, and the region requiring plating on the surface to be plated is plated while transporting the strip-shaped member.SELECTED DRAWING: Figure 3

Description

本発明は、帯状部材を搬送しながら、その被処理面に部分めっきを施すための部分めっき技術に関する。 The present invention relates to a partial plating technique for partially plating a surface to be treated while transporting a strip-shaped member.

電子部品を形成するフープ材や電子部品実装用フィルムキャリアテープ等の帯状部材を搬送しながら、帯状部材の被処理面に部分的にめっき処理を施すための部分めっき装置が特許文献1、2に記載されている。 Patent Documents 1 and 2 provide a partial plating apparatus for partially plating a surface to be processed of a band-shaped member while transporting a band-shaped member such as a hoop material forming an electronic component or a film carrier tape for mounting the electronic component. Are listed.

特許文献1に記載される連続部分めっき装置は、それぞれ円板形状の上蓋と下蓋との間に取り付けられる円筒形状の側板を備えた電極構造体のドラムを有し、ドラムの側板との間に隙間を介してドラムの径方向外方には円筒形状のマスキング材が回転自在に配置されている。帯状部材であるキャリアテープは陰極に帯電されてマスキング材に接触して搬送される。キャリアテープの被処理面のうち、めっき必要部分が側板に露出され、めっき不要部分はマスキング材により覆われる。ドラムの側板に形成された電極ノズル孔からめっき必要部分に、陽極に帯電されためっき液が塗布される。 The continuous partial plating apparatus described in Patent Document 1 has a drum of an electrode structure having a cylindrical side plate attached between a disk-shaped upper lid and a lower lid, and between the drum side plates. A cylindrical masking material is rotatably arranged on the outer side of the drum in the radial direction through a gap. The carrier tape, which is a strip-shaped member, is charged on the cathode and is conveyed in contact with the masking material. Of the surface to be treated of the carrier tape, the portion requiring plating is exposed on the side plate, and the portion not requiring plating is covered with a masking material. The plating solution charged in the anode is applied to the portion requiring plating from the electrode nozzle hole formed in the side plate of the drum.

特許文献2に記載される連続部分めっき装置は、径方向の電極ノズルが設けられて陽極端子が接続された電極構造体と、これの外側に回転自在に装着された回転体とを有している。回転体に設けられた搬送ガイド面にリードフレーム等の帯状長尺物が接触して搬送される。帯状長尺物は陰極端子に接続され、電極ノズルから噴射されためっき液が帯状長尺物のめっき必要部分に吹き付けられる。 The continuous partial plating apparatus described in Patent Document 2 has an electrode structure provided with radial electrode nozzles and connected to anode terminals, and a rotating body rotatably mounted on the outside of the electrode structure. There is. A strip-shaped long object such as a lead frame comes into contact with the transport guide surface provided on the rotating body and is transported. The strip-shaped long object is connected to the cathode terminal, and the plating solution sprayed from the electrode nozzle is sprayed on the plating-required portion of the strip-shaped long object.

特開2011−21226号公報Japanese Unexamined Patent Publication No. 2011-21226 特開2006−225677号公報Japanese Unexamined Patent Publication No. 2006-225677

従来の部分めっき装置においては、円筒形状の回転体の外周面に帯状部材の片面を接触させ、帯状部材の片面のうち、めっき不要部分を回転体の外周面でマスキングするようにしている。帯状部材の回転体の外周面に対する押付力を強くするには限度があり、帯状部材と回転体のマスキング面との間からめっき液が漏出し、帯状部材の反対側の面にめっきが付着することがある。このため、不要なめっきを後工程において除去しなければならず、高品質のめっき処理を効率的に行うことができなかった。 In the conventional partial plating apparatus, one side of the strip-shaped member is brought into contact with the outer peripheral surface of the cylindrical rotating body, and the portion of the one side of the strip-shaped member that does not require plating is masked by the outer peripheral surface of the rotating body. There is a limit to increasing the pressing force of the strip-shaped member against the outer peripheral surface of the rotating body, and the plating solution leaks from between the strip-shaped member and the masking surface of the rotating body, and the plating adheres to the surface opposite to the strip-shaped member. Sometimes. Therefore, unnecessary plating must be removed in a post-process, and high-quality plating cannot be efficiently performed.

従来のように、めっき必要部分とめっき不要部分との境目であるマスキングパターンを、マスキング材の円筒面に加工するには、加工精度を出すことが困難である。このため、マスキングする部位にめっき液が漏出することがあり、部分めっき部品の製造歩留まりを高めることができなかった。 It is difficult to obtain processing accuracy in order to process the masking pattern, which is the boundary between the plating-required portion and the plating-unnecessary portion, into the cylindrical surface of the masking material as in the conventional case. For this reason, the plating solution may leak to the masked portion, and the manufacturing yield of the partially plated parts could not be increased.

さらに、ドラムや円筒部材の外周面に帯状部材を接触させて、めっき不要部分をマスキングすると、帯状部材のうち外周面に接触している片面しかめっき処理することができない。このため、両面に連続的にめっき処理する場合には、少なくとも2台の部分めっき装置が必要であり、1台目のめっき装置により帯状部材の一方面をめっき処理してから、2台目のめっき装置により反対側面つまり他方面をめっき処理する必要がある。このため、帯状部材の両面に効率的にめっき処理をすることができなかった。 Further, if the strip-shaped member is brought into contact with the outer peripheral surface of the drum or the cylindrical member to mask the portion that does not require plating, only one side of the strip-shaped member that is in contact with the outer peripheral surface can be plated. For this reason, when plating on both sides continuously, at least two partial plating devices are required, and after plating one side of the strip-shaped member with the first plating device, the second device is used. It is necessary to plate the opposite side, that is, the other side with a plating device. Therefore, it was not possible to efficiently plate both sides of the strip-shaped member.

本発明の目的は、帯状部材のめっき被処理面に対して高精度の部分めっきを効率的に行いうるようにすることにある。 An object of the present invention is to enable high-precision partial plating to be efficiently performed on a surface to be plated of a strip-shaped member.

本発明の部分めっき装置は、帯状部材を当該帯状部材に真っ直ぐに伸びたストレート部を形成して搬送する搬送機構と、帯状部材の前記ストレート部の搬送方向に帯状部材に同期して前進移動し、前進限位置から初期位置まで後退移動する移動台と、前記移動台に帯状部材に向けて接近離反移動自在に装着され、帯状部材の一方の面に押圧する第1のマスキング治具と、前記移動台に帯状部材に向けて接近離反移動自在に装着され、帯状部材の他方の面に押圧する第2のマスキング治具と、を有し、被処理面に開口する開口部に連通する液室を前記第1のマスキング治具に設け、被処理面に施されるめっき必要領域に対応する形状の連通孔が形成されたマスキング板を前記第1のマスキング治具の前記開口部に設け、前記第1のマスキング治具と前記第2のマスキング治具を帯状部材に押圧して帯状部材を挟持し、かつ帯状部材を搬送しながら前記移動台を前進移動し、被処理面のめっき必要領域をめっき処理する。 The partial plating apparatus of the present invention has a transport mechanism for transporting a strip-shaped member by forming a straight portion extending straight to the strip-shaped member, and moving forward in synchronization with the strip-shaped member in the transport direction of the straight portion of the strip-shaped member. A moving table that moves backward from the forward limit position to the initial position, and a first masking jig that is mounted on the moving table so as to move away from and away from the band-shaped member and presses against one surface of the band-shaped member. A liquid chamber that has a second masking jig that is mounted on a moving table so that it can move closer to and away from the strip-shaped member and presses against the other surface of the strip-shaped member, and communicates with an opening that opens to the surface to be processed. Is provided in the first masking jig, and a masking plate having a shape corresponding to the area requiring plating applied to the surface to be treated is provided in the opening of the first masking jig. The first masking jig and the second masking jig are pressed against the band-shaped member to sandwich the band-shaped member, and the moving table is moved forward while transporting the band-shaped member to obtain a plating-required area of the surface to be processed. Plating process.

本発明の部分めっき方法は、上記部分めっき装置を用いて、帯状部材の被処理面の必要領域のみにめっき処理する部分めっき方法であって、前記第1のマスキング治具と前記第2のマスキング治具を帯状部材に押圧して帯状部材を挟持する挟持工程と、帯状部材が2つのマスキング治具により挟持された状態のもとで、帯状部材を搬送し、かつ前記移動台を前進移動しながら、被処理面のめっき必要領域をめっき処理する処理工程と、前記移動台が前進限位置に到達したら、帯状部材の搬送を停止し、前記第1のマスキング治具と前記第2のマスキング治具を帯状部材から離反させる離反工程と、前記移動台を前進限位置から初期位置に後退移動させてマスキング治具を後退移動させる後退工程と、を有する。 The partial plating method of the present invention is a partial plating method in which only a necessary region of a surface to be treated of a strip-shaped member is plated by using the partial plating apparatus, and the first masking jig and the second masking are performed. In the sandwiching process in which the jig is pressed against the band-shaped member to sandwich the band-shaped member, and in the state where the band-shaped member is sandwiched by the two masking jigs, the band-shaped member is conveyed and the moving table is moved forward. However, in the processing step of plating the required area for plating on the surface to be processed, and when the moving table reaches the advancing limit position, the transportation of the strip-shaped member is stopped, and the first masking jig and the second masking treatment are performed. It has a separation step of separating the tool from the band-shaped member, and a retreat step of retreating the moving table from the advancing limit position to the initial position to retreat the masking jig.

帯状部材のストレート部に同期して前進後退移動する移動台には、2つのマスキング治具がそれぞれ帯状部材に向けて接近離反移動自在に配置されており、2つのマスキング治具の少なくとも一方には、被処理面に施されるめっき必要領域に対応する形状の連通孔が形成されたマスキング板が設けられている。帯状部材は両面が押圧されて挟持されるので、帯状部材とマスキング板との間からめっき液が漏出することが防止され、高品質のめっき製品を製造することができるとともに、不要なめっきを後工程において除去することがなく、効率的にめっき処理を行うことができる。 Two masking jigs are arranged on the moving table that moves forward and backward in synchronization with the straight portion of the strip-shaped member so that they can move closer to each other toward the strip-shaped member. , A masking plate is provided in which communication holes having a shape corresponding to the area requiring plating applied to the surface to be treated are formed. Since both sides of the strip-shaped member are pressed and sandwiched, the plating solution is prevented from leaking from between the strip-shaped member and the masking plate, a high-quality plating product can be manufactured, and unnecessary plating is performed later. The plating process can be performed efficiently without removing it in the process.

マスキング材は帯状部材のストレート部に押圧されるので、円筒形状に湾曲させることなく、平坦な形状とすることができる。これにより、めっき必要部分とめっき不要部分との境目であるマスキングパターンを平坦なマスキング板に加工することができるので、マスキングパターンの加工精度を高めることができ、高品質の部分めっき部品を歩留まり良く製造することができる。 Since the masking material is pressed against the straight portion of the strip-shaped member, it can be made into a flat shape without being curved into a cylindrical shape. As a result, the masking pattern, which is the boundary between the parts requiring plating and the parts not requiring plating, can be processed into a flat masking plate, so that the processing accuracy of the masking pattern can be improved and the yield of high-quality partially plated parts can be improved. Can be manufactured.

帯状部材の搬送方向両側に配置した2つのマスキング治具により、同時に帯状部材の両面に部分めっきを施すことができるので、部分めっき処理を効率的に行うことができる。 Since the two masking jigs arranged on both sides of the strip-shaped member in the transport direction can simultaneously perform partial plating on both sides of the strip-shaped member, the partial plating process can be efficiently performed.

一実施の形態である部分めっき装置を示す一部切り欠き平面図である。It is a partial notch plan view which shows the partial plating apparatus which is one Embodiment. 図1の要部の拡大平面図である。It is an enlarged plan view of the main part of FIG. 図2におけA−A線断面図である。FIG. 2 is a cross-sectional view taken along the line AA. 図3のB部拡大断面図である。It is the B part enlarged sectional view of FIG. 帯状部材としてのフープ材の一例を示す正面図である。It is a front view which shows an example of the hoop material as a band-shaped member. めっき手順を示す工程図であり、(A)はめっき開始時を示し、(B)は2つのマスキング治具を帯状部材に押圧させた状態を示す。It is a process drawing which shows the plating procedure, (A) shows the start of plating, (B) shows the state which pressed two masking jigs against a band-shaped member. めっき手順を示す工程図であり、(A)はめっき終了時を示し、(B)は2つのマスキング治具を帯状部材から離反させた状態を示す。It is a process drawing which shows the plating procedure, (A) shows the time at the end of plating, (B) shows the state which separated two masking jigs from a band-shaped member.

以下、本発明の実施の形態を図面に基づいて詳細に説明する。図1に示されるように、部分めっき装置10は水平方向に設置される装置台座11を有し、フープまたはフープ材とも言われる帯状部材12にめっき処理を施す。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. As shown in FIG. 1, the partial plating apparatus 10 has an apparatus pedestal 11 installed in the horizontal direction, and a band-shaped member 12 also called a hoop or a hoop material is plated.

装置台座11の一端部にはテンションローラ13が回転自在に設けられており、その回転中心軸は装置台座11に対して垂直方向である。テンションローラ13の外周面には帯状部材12が掛け渡され、テンションローラ13には帯状部材12を介して押圧ローラ14が押し付けられている。テンションローラ13は、図示しない電源ユニットの陰極端子に接続されている。装置台座11の他端部には駆動ローラ15が回転自在に設けられており、その回転中心軸は装置台座11に対して垂直方向である。駆動ローラ15の外周面には帯状部材12が掛け渡されており、駆動ローラ15には帯状部材12を介して押圧ローラ16が押し付けられている。 A tension roller 13 is rotatably provided at one end of the device pedestal 11, and its rotation center axis is perpendicular to the device pedestal 11. A strip-shaped member 12 is hung on the outer peripheral surface of the tension roller 13, and the pressing roller 14 is pressed against the tension roller 13 via the strip-shaped member 12. The tension roller 13 is connected to a cathode terminal of a power supply unit (not shown). A drive roller 15 is rotatably provided at the other end of the device pedestal 11, and its rotation center axis is perpendicular to the device pedestal 11. A strip-shaped member 12 is hung on the outer peripheral surface of the drive roller 15, and the pressing roller 16 is pressed against the drive roller 15 via the strip-shaped member 12.

駆動ローラ15は図示しない電動モータ等の駆動源により回転駆動され、帯状部材12は駆動ローラ15により一定の速度で、矢印で示される搬送方向に搬送される。テンションローラ13には回転方向に制動力が加えられており、駆動ローラ15により搬送される帯状部材12には一定のテンション、つまり張力がテンションローラ13により加えられる。テンションローラ13の繰り出し端部13aと、駆動ローラ15の巻付け開始端部15aとの間においては、帯状部材12は真っ直ぐに伸びており、これらの間はストレート部17を形成している。このように、ストレート部17の搬送方向の上流側に配置される上流側のローラであるテンションローラ13と、ストレート部17の搬送方向の下流側に配置される下流側のローラである駆動ローラ15とにより、帯状部材12にストレート部17を形成してこれを搬送する搬送機構18が構成される。 The drive roller 15 is rotationally driven by a drive source such as an electric motor (not shown), and the strip-shaped member 12 is conveyed by the drive roller 15 at a constant speed in the transfer direction indicated by the arrow. A braking force is applied to the tension roller 13 in the rotational direction, and a constant tension, that is, tension is applied to the band-shaped member 12 conveyed by the drive roller 15 by the tension roller 13. The strip-shaped member 12 extends straight between the feeding end portion 13a of the tension roller 13 and the winding start end portion 15a of the drive roller 15, and a straight portion 17 is formed between them. As described above, the tension roller 13 which is an upstream roller arranged on the upstream side of the straight portion 17 in the transport direction and the drive roller 15 which is a downstream roller arranged on the downstream side of the straight portion 17 in the transport direction. As a result, a transport mechanism 18 for forming a straight portion 17 on the strip-shaped member 12 and transporting the straight portion 17 is configured.

装置台座11には支持台21が設けられ、図2および図3に示されるように、支持台21には、ストレート部17に平行に2本のガイドレール22が取り付けられている。それぞれのガイドレール22には、図3に示されるように、移動ブロック23が装着されており、移動台24は移動ブロック23に取り付けられている。移動台24はガイドレール22に案内されて、ストレート部17に沿って前進移動と後退移動とを繰り返す。 The device pedestal 11 is provided with a support pedestal 21, and as shown in FIGS. 2 and 3, two guide rails 22 are attached to the support pedestal 21 in parallel with the straight portion 17. As shown in FIG. 3, each guide rail 22 is equipped with a moving block 23, and the moving base 24 is attached to the moving block 23. The moving table 24 is guided by the guide rail 22 and repeats forward movement and backward movement along the straight portion 17.

移動台24を前進後退移動するために、移動台24には搬送部材25が取り付けられ、搬送部材25を介して移動台24を駆動する駆動機構26が支持台21に取り付けられている。駆動機構26は、搬送部材にねじ結合される送りねじ軸を回転駆動する電動モータであり、移動台24は、駆動機構26により、図2に実線で示される後退限位置つまり初期位置と前進限位置との間のストロークSの範囲で往復動する。 In order to move the moving table 24 forward and backward, a transport member 25 is attached to the moving table 24, and a drive mechanism 26 for driving the moving table 24 via the transport member 25 is attached to the support table 21. The drive mechanism 26 is an electric motor that rotationally drives the feed screw shaft that is screwed to the transport member, and the moving table 24 is moved by the drive mechanism 26 to the backward limit position, that is, the initial position and the forward limit shown by the solid line in FIG. It reciprocates within the range of stroke S between the position and the position.

移動台24にはめっき処理槽30が取り付けられており、めっき処理槽30は、図2および図3に示されるように、底板31と、前後の端板32a、32bと、左右の側板33a、33bと、天板34とを有し、直方体形状である。めっき処理槽30は移動台24により前進後退移動する。前後の端板32a、32bには帯状部材12が貫通するスリットが形成されており、帯状部材12のストレート部17は、めっき処理槽30を貫通している。 A plating treatment tank 30 is attached to the moving table 24, and the plating treatment tank 30 includes a bottom plate 31, front and rear end plates 32a and 32b, and left and right side plates 33a, as shown in FIGS. 2 and 3. It has a 33b and a top plate 34, and has a rectangular parallelepiped shape. The plating treatment tank 30 moves forward and backward by the moving table 24. Slits through which the strip-shaped member 12 penetrates are formed in the front and rear end plates 32a and 32b, and the straight portion 17 of the strip-shaped member 12 penetrates the plating treatment tank 30.

支持台21の搬送方向上流側にはガイドローラ35が設けられ、支持台21の搬送方向下流側にはガイドローラ36が設けられている。それぞれのガイドローラ35、36は、帯状部材12の搬送方向を横切る方向の位置と上下方向の位置を規制する。装置台座11にはガイドローラ36の下流側に位置させて、洗浄ボックス37が配置されており、洗浄ボックス37には、帯状部材12の被処理面を洗浄するシャワー水洗機38と、洗浄時の帯状部材12に付着した液体を払拭する液切り機39とが設けられている。 A guide roller 35 is provided on the upstream side of the support base 21 in the transport direction, and a guide roller 36 is provided on the downstream side of the support base 21 in the transport direction. The guide rollers 35 and 36 regulate the position of the strip-shaped member 12 in the direction crossing the transport direction and the position in the vertical direction. A cleaning box 37 is arranged on the device pedestal 11 on the downstream side of the guide roller 36, and the cleaning box 37 includes a shower water washing machine 38 for cleaning the surface to be treated of the strip-shaped member 12 and a washing machine 38 for cleaning. A liquid drainer 39 is provided to wipe off the liquid adhering to the strip-shaped member 12.

ガイドローラ35とめっき処理槽30との間には、帯状部材12の基準位置を検出するための位置検出センサ40が設けられている。位置検出センサ40は、発光素子と受光素子とを有し、帯状部材12の搬送方向の基準位置を検出する。 A position detection sensor 40 for detecting the reference position of the strip-shaped member 12 is provided between the guide roller 35 and the plating treatment tank 30. The position detection sensor 40 has a light emitting element and a light receiving element, and detects a reference position in the transport direction of the strip-shaped member 12.

図2〜図4に示されるように、めっき処理槽30の内部には、第1のマスキング治具41と、第2のマスキング治具42が設けられており、2つのマスキング治具41、42のうち、帯状部材12の搬送方向右側のものを、便宜的に第1のマスキング治具41とし、左側のものを第2のマスキング治具42とする。 As shown in FIGS. 2 to 4, a first masking jig 41 and a second masking jig 42 are provided inside the plating treatment tank 30, and the two masking jigs 41 and 42 are provided. Of these, the one on the right side in the transport direction of the strip-shaped member 12 is referred to as the first masking jig 41, and the one on the left side is referred to as the second masking jig 42.

それぞれのマスキング治具41、42のうち帯状部材12側の側面は、平坦面となっている。両方のマスキング治具41、42は、それぞれ帯状部材12の搬送方向に対して直角方向であって帯状部材12に向けて接近離反移動自在にめっき処理槽30に設けられている。マスキング治具41が帯状部材12に接近すると、マスキング治具41は帯状部材12の一方の被処理面T1に押圧される。一方、マスキング治具42が帯状部材12に接近すると、マスキング治具42は帯状部材12の反対側つまり他方の被処理面T2に押圧される。このように、帯状部材12は、両方の被処理面が両方のマスキング治具41、42により押圧されて挟持、つまり挟んだ状態で支持されるので、強く押圧されても、帯状部材12は変形することがない。 Of the masking jigs 41 and 42, the side surface on the strip-shaped member 12 side is a flat surface. Both the masking jigs 41 and 42 are provided in the plating treatment tank 30 in a direction perpendicular to the transport direction of the strip-shaped member 12, respectively, so as to be movable toward and away from the strip-shaped member 12. When the masking jig 41 approaches the strip-shaped member 12, the masking jig 41 is pressed against one surface T1 of the strip-shaped member 12. On the other hand, when the masking jig 42 approaches the strip-shaped member 12, the masking jig 42 is pressed against the opposite side of the strip-shaped member 12, that is, the other surface to be processed T2. As described above, in the strip-shaped member 12, both surfaces to be processed are pressed by both masking jigs 41 and 42 and sandwiched, that is, supported in a sandwiched state. Therefore, even if the strip-shaped member 12 is strongly pressed, the strip-shaped member 12 is deformed. There is nothing to do.

第1のマスキング治具41は、図4に示されるように、水平方向に帯状部材12に沿って延びる上壁部43aと、これと平行な下壁部44aと、両方の壁部を連結する垂直方向の側壁部45aとを有し、両端部は、図2に示されるように、前壁部46aと後壁部47aにより閉じられている。マスキング治具41の内部にはめっき液が注入される液室48aが設けられている。マスキング治具41の内側の側面、つまり帯状部材12の被処理面T1に対向する側面には、被処理面T1に向けて開口し、液室48aに連通する開口部49aが設けられ、開口部49aには支持枠体50aが設けられている。 As shown in FIG. 4, the first masking jig 41 connects both the upper wall portion 43a extending horizontally along the strip-shaped member 12 and the lower wall portion 44a parallel thereto, and both wall portions. It has a side wall portion 45a in the vertical direction, and both ends thereof are closed by a front wall portion 46a and a rear wall portion 47a as shown in FIG. A liquid chamber 48a into which the plating solution is injected is provided inside the masking jig 41. The inner side surface of the masking jig 41, that is, the side surface of the strip-shaped member 12 facing the surface to be processed T1, is provided with an opening 49a that opens toward the surface to be processed T1 and communicates with the liquid chamber 48a. A support frame body 50a is provided on the 49a.

支持枠体50aには、平板形状のフラットなマスキング板51aが取り付けられている。マスキング板51aは、ゴムシートや軟質のプラスチックシートからなり、弾性を有している。マスキング治具41が帯状部材12に突き当てられると、マスキング板51aは被処理面T1に押圧されて密着する。マスキング板51aには、被処理面T1に施されるめっき必要領域に対応した形状の連通孔が形成されており、めっき不要領域はマスキング板51aにより覆われる。 A flat masking plate 51a having a flat plate shape is attached to the support frame body 50a. The masking plate 51a is made of a rubber sheet or a soft plastic sheet and has elasticity. When the masking jig 41 is abutted against the strip-shaped member 12, the masking plate 51a is pressed against the surface to be processed T1 and comes into close contact with the masking plate 51a. The masking plate 51a is formed with communication holes having a shape corresponding to the area requiring plating applied to the surface T1 to be processed, and the area not requiring plating is covered by the masking plate 51a.

マスキング治具41の上壁部43aには、めっき液供給部材52aが取り付けられており、図示しないホース等の供給管により外部から供給されためっき液は、めっき液供給部材52aから液室48aの内部に注入される。液室48a内には整流板53aが設けられており、整流板53aには多数の貫通孔が設けられ、液室48a内に注入されためっき液は、整流されてマスキング板51aの内面全体に均一に供給される。また、メッシュ状の陽極板54aが液室48a内に設けられており、陽極板54aは図示しない電源ユニットの陽極端子に接続される。これにより、給電手段としての電源ユニットによりめっき液は陽極電位に印加給電される。一方、帯状部材12はテンションローラ13を介して電源ユニットの陰極端子に接続されており、帯状部材12は陰極電位に印加給電される。 A plating solution supply member 52a is attached to the upper wall portion 43a of the masking jig 41, and the plating solution supplied from the outside by a supply pipe such as a hose (not shown) is supplied from the plating solution supply member 52a to the liquid chamber 48a. It is injected inside. A straightening vane 53a is provided in the liquid chamber 48a, a large number of through holes are provided in the straightening vane 53a, and the plating solution injected into the liquid chamber 48a is rectified and is rectified on the entire inner surface of the masking plate 51a. It is supplied evenly. Further, a mesh-shaped anode plate 54a is provided in the liquid chamber 48a, and the anode plate 54a is connected to an anode terminal of a power supply unit (not shown). As a result, the plating solution is applied and fed to the anode potential by the power supply unit as the power feeding means. On the other hand, the strip-shaped member 12 is connected to the cathode terminal of the power supply unit via the tension roller 13, and the strip-shaped member 12 is applied and fed to the cathode potential.

支持枠体50aには排出口55aが設けられており、排出口55aから排出されためっき液は、めっき処理槽30の底板31に設けられた排出継手56に接続される排出管により外部のめっきサブタンクに送られる。めっきサブタンクに送られためっき液は、フィルタで浄化されて再循環利用される。移動台24には側板33bに隣接させてスライドテーブル付きのエアシリンダ61aが取り付けられ、エアシリンダ61aのスライドテーブル62aに取り付けられた駆動ブロック63aには2本の駆動ロッド64aが取り付けられており、駆動ロッド64aは、側板33bを貫通してマスキング治具41に連結されている。このエアシリンダ61aによって、マスキング治具41は帯状部材12に向けて接近移動する方向と、帯状部材12から離れる方向とに駆動され、マスキング板51aの帯状部材12に対する押圧力が加えられる。 The support frame body 50a is provided with a discharge port 55a, and the plating solution discharged from the discharge port 55a is externally plated by a discharge pipe connected to a discharge joint 56 provided on the bottom plate 31 of the plating treatment tank 30. It is sent to the sub tank. The plating solution sent to the plating sub-tank is purified by a filter and reused for recycling. An air cylinder 61a with a slide table is attached to the moving table 24 adjacent to the side plate 33b, and two drive rods 64a are attached to the drive block 63a attached to the slide table 62a of the air cylinder 61a. The drive rod 64a penetrates the side plate 33b and is connected to the masking jig 41. The air cylinder 61a drives the masking jig 41 in a direction of approaching and moving toward the band-shaped member 12 and in a direction away from the band-shaped member 12, and exerts a pressing force on the band-shaped member 12 of the masking plate 51a.

第2のマスキング治具42は、第1のマスキング治具41と同様の構造であり、マスキング治具42を構成する部材には、マスキング治具41を構成する部材における符号aに代えて符号bが付されており、詳細な説明を省略する。 The second masking jig 42 has the same structure as the first masking jig 41, and the member constituting the masking jig 42 has a reference numeral b instead of the reference numeral a in the member constituting the masking jig 41. Is attached, and detailed description is omitted.

マスキング治具42の内部にはめっき液が注入される液室48bが設けられており、マスキング治具42内側の側面、つまり帯状部材12の被処理面T2に対向する側面には、被処理面T2に向けて開口し、液室48bに連通する開口部49bが設けられ、開口部49bには支持枠体50bが設けられている。 A liquid chamber 48b into which the plating solution is injected is provided inside the masking jig 42, and the surface to be processed is provided on the inner side surface of the masking jig 42, that is, the side surface of the strip-shaped member 12 facing the surface to be processed T2. An opening 49b that opens toward T2 and communicates with the liquid chamber 48b is provided, and a support frame body 50b is provided in the opening 49b.

マスキング治具42の支持枠体50bには、マスキング板51bが取り付けられており、マスキング板51bは、マスキング治具42が帯状部材12に突き当てられると、被処理面T2に押圧される。マスキング板51bには、被処理面T2に施されるめっき必要領域に対応した形状の連通孔が形成されており、めっき不要領域はマスキング板51bにより覆われる。 A masking plate 51b is attached to the support frame body 50b of the masking jig 42, and the masking plate 51b is pressed against the surface to be processed T2 when the masking jig 42 is abutted against the strip-shaped member 12. The masking plate 51b is formed with communication holes having a shape corresponding to the area requiring plating applied to the surface T2 to be processed, and the area not requiring plating is covered by the masking plate 51b.

マスキング治具42の液室48bには、めっき液供給部材52bからめっき液が注入される。液室48b内には、多数の貫通孔が設けられた整流板53bが設けられ、メッシュ状の陽極板54bが設けられており、陽極板54bは図示しない電源ユニットの陽極端子に接続される。 The plating solution is injected into the liquid chamber 48b of the masking jig 42 from the plating solution supply member 52b. A straightening vane 53b provided with a large number of through holes is provided in the liquid chamber 48b, and a mesh-shaped anode plate 54b is provided, and the anode plate 54b is connected to an anode terminal of a power supply unit (not shown).

移動台24には側板33bに隣接させてエアシリンダ61bが取り付けられ、駆動ブロック63bには2本の駆動ロッド64bが取り付けられており、駆動ロッド64bは、側板33bを貫通してマスキング治具42に連結されている。このエアシリンダ61bにより、マスキング治具42は帯状部材12に向けて接近移動する方向と、帯状部材12から離れる方向とに駆動される。 An air cylinder 61b is attached to the moving table 24 adjacent to the side plate 33b, two drive rods 64b are attached to the drive block 63b, and the drive rod 64b penetrates the side plate 33b and is a masking jig 42. Is connected to. The air cylinder 61b drives the masking jig 42 in a direction of approaching the band-shaped member 12 and in a direction away from the band-shaped member 12.

図5は帯状部材12に施される部分めっきパターンの一例を示す図であり、長尺の帯状部材の一部が示されている。 FIG. 5 is a diagram showing an example of a partial plating pattern applied to the strip-shaped member 12, and shows a part of a long strip-shaped member.

帯状部材12の両側には一定の間隔を隔てて送り穴65が設けられている。この送り穴65の位置を位置検出センサ40で検出することにより、マスキング板51a、51bの帯状部材12に対する搬送方向の基準位置を検出することができる。ただし、送り穴65の位置を基準位置とすることなく、他の部分を基準位置としても良い。 Feed holes 65 are provided on both sides of the strip-shaped member 12 at regular intervals. By detecting the position of the feed hole 65 with the position detection sensor 40, it is possible to detect the reference position of the masking plates 51a and 51b with respect to the strip-shaped member 12 in the transport direction. However, instead of using the position of the feed hole 65 as the reference position, another portion may be used as the reference position.

図5においてハッチングを付した円形部66と長方形状部67が部分めっきされる部分であり、他の部分にはめっき処理は施されない。この場合には、円形部66と長方形状部67とに対応する領域をめっき必要領域とし、そのめっき必要領域に対応した形状の連通孔が、フラットなマスキング板に形成される。 In FIG. 5, the hatched circular portion 66 and the rectangular portion 67 are partially plated, and the other portions are not plated. In this case, the region corresponding to the circular portion 66 and the rectangular portion 67 is set as a plating required region, and a communication hole having a shape corresponding to the plating required region is formed in the flat masking plate.

図5は一方面の被処理面に施される部分めっきの部分を示しており、両面を被処理面とする場合には、両方のマスキング板にめっき必要領域に対応した形状の連通孔が形成される。 FIG. 5 shows a portion of partial plating applied to the surface to be treated on one side, and when both sides are to be treated, communication holes having a shape corresponding to the required area for plating are formed on both masking plates. Will be done.

めっき必要領域が形成されるフラットなマスキング板51a、51bは、弾性に富んだ部材により形成され、真っ直ぐに伸びたストレート部の帯状部材12に押圧されるので、従来のように、マスキング部材の円筒面にマスキングパターンを形成する場合よりも、高い加工精度でマスキングパターンを形成することができる。これにより、高精度のパターンでめっき処理を行うことができるとともに、マスキング板からのめっき液の漏出を防止することができ、部分めっき製品の製造歩留まりを固めることができる。 The flat masking plates 51a and 51b on which the plating required region is formed are formed of highly elastic members and are pressed by the straight strip-shaped member 12 which extends straight, so that the masking member has a cylinder as in the conventional case. The masking pattern can be formed with higher processing accuracy than when the masking pattern is formed on the surface. As a result, the plating process can be performed with a high-precision pattern, leakage of the plating solution from the masking plate can be prevented, and the manufacturing yield of the partially plated product can be solidified.

上述した部分めっき装置10は、第1のマスキング治具41と第2のマスキング治具42とを備えており、フープ材つまり帯状部材12の両面を被処理面としてこれらに同時にめっき処理を施すことができる。ただし、2つのマスキング治具41、42の一方のマスキング治具のみにめっき液を供給することにより、帯状部材12の一方面つまり片面のみを被処理面としてめっき処理を行うことができる。その場合には、他のマスキング治具のマスキング板としては、めっき必要領域に対応した形状の連通孔が形成されておらず、全体がめっき不要領域となった弾性を有するフラットな板が使用される。弾性を有する板がめっき処理を行わない面に押圧されるので、めっき処理が行われる被処理面からめっき液が漏出することを防止できる。これにより、帯状部材12のめっき処理を行わない面にめっきが付着することを防止することができ、不要なめっきを後工程において除去する必要がなくなり、高品質のめっき処理を歩留まり良く、効率的に行うことが可能となる。 The above-mentioned partial plating apparatus 10 includes a first masking jig 41 and a second masking jig 42, and the hoop material, that is, both sides of the strip-shaped member 12 are used as surfaces to be processed, and these are simultaneously plated. Can be done. However, by supplying the plating solution to only one of the two masking jigs 41 and 42, the plating process can be performed using only one surface, that is, one surface of the strip-shaped member 12 as the surface to be processed. In that case, as the masking plate of the other masking jig, a flat plate having elasticity is used in which the communication holes having a shape corresponding to the plating-required region are not formed and the entire region is the plating-unnecessary region. To. Since the elastic plate is pressed against the surface to be plated, it is possible to prevent the plating solution from leaking from the surface to be plated. As a result, it is possible to prevent the plating from adhering to the surface of the strip-shaped member 12 that is not plated, and it is not necessary to remove unnecessary plating in the subsequent process, so that the high-quality plating treatment can be carried out with good yield and efficiency. It becomes possible to do it.

次に、図6および図7を参照して、部分めっき装置10により帯状部材12の両面を被処理面T1、T2としてそれぞれに部分めっきを施すためのめっき方法について説明する。 Next, with reference to FIGS. 6 and 7, a plating method for partially plating both surfaces of the strip-shaped member 12 as surfaces to be processed T1 and T2 by the partial plating apparatus 10 will be described.

部分めっき装置10は、帯状部材12の被処理面T1、T2に図5においてハッチングを付した部分に金めっきを施すために使用することができる。帯状部材12の被処理面には、予め、ニッケル等が下地めっき処理されている。 The partial plating apparatus 10 can be used to perform gold plating on the hatched portions of the strip-shaped member 12 to be processed, T1 and T2 in FIG. 5. The surface to be treated of the strip-shaped member 12 is pre-plated with nickel or the like.

めっき処理を行うには、図1および図2に示されるように、マスキング治具41、42を帯状部材12から離反させた状態のもとで、駆動ローラ15を駆動源により駆動して帯状部材12の搬送を開始する。位置検出センサ40からの信号により帯状部材12が基準位置まで搬送されたことが検出されたら、駆動機構26により移動台24を駆動してめっき処理槽30を、図1に示される初期位置つまり後退限位置から、図6(A)に示すように、前進移動させる。そのときの前進移動速度は、帯状部材12の搬送速度と同一であり、めっき処理槽30は帯状部材12の搬送に同期して前進駆動される。 In order to perform the plating process, as shown in FIGS. 1 and 2, the masking jigs 41 and 42 are separated from the strip-shaped member 12, and the drive roller 15 is driven by the drive source to perform the strip-shaped member. 12 transport is started. When it is detected by the signal from the position detection sensor 40 that the strip-shaped member 12 has been conveyed to the reference position, the moving table 24 is driven by the drive mechanism 26 to move the plating processing tank 30 to the initial position shown in FIG. 1, that is, to retract. From the limited position, move forward as shown in FIG. 6 (A). The forward moving speed at that time is the same as the transport speed of the strip-shaped member 12, and the plating treatment tank 30 is driven forward in synchronization with the transport of the strip-shaped member 12.

めっき処理槽30と帯状部材12とが同期した状態のもとで、図6(B)に示されるように、第1のマスキング治具41をエアシリンダ61aにより帯状部材12に向けて接近移動させるとともに、第2のマスキング治具42をエアシリンダ61bにより帯状部材12に向けて接近移動させる。これにより、マスキング治具41のマスキング板51aが帯状部材12の被処理面T1に押圧され、マスキング治具42のマスキング板51bが帯状部材12の被処理面T2に押圧され、帯状部材12はマスキング治具41、42により挟持される。図6(B)は挟持工程が終了した状態を示す。 Under the state where the plating treatment tank 30 and the strip-shaped member 12 are synchronized, as shown in FIG. 6B, the first masking jig 41 is moved closer to the strip-shaped member 12 by the air cylinder 61a. At the same time, the second masking jig 42 is moved closer to the band-shaped member 12 by the air cylinder 61b. As a result, the masking plate 51a of the masking jig 41 is pressed against the surface T1 to be processed of the band-shaped member 12, the masking plate 51b of the masking jig 42 is pressed against the surface T2 to be processed of the band-shaped member 12, and the band-shaped member 12 is masked. It is sandwiched by jigs 41 and 42. FIG. 6B shows a state in which the pinching process is completed.

このように、帯状部材12が2つのマスキング治具41、42により挟持された状態のもとで、帯状部材12を搬送するとともに移動台24を前進移動しながら、めっき処理を行う。この処理工程においては、液室48a、48bに充填されためっき液が被処理面T1、T2に吹き付けられるとともに、電源ユニットがオンされる。図7(A)は、めっき処理を行いながら、移動台24によりめっき処理槽30が前進限位置にまで到達し、めっき処理槽30の前進移動が停止された状態を示す。 In this way, under the state where the band-shaped member 12 is sandwiched between the two masking jigs 41 and 42, the plating process is performed while the band-shaped member 12 is conveyed and the moving table 24 is moved forward. In this processing step, the plating solutions filled in the liquid chambers 48a and 48b are sprayed onto the surfaces T1 and T2 to be processed, and the power supply unit is turned on. FIG. 7A shows a state in which the plating treatment tank 30 reaches the forward limit position by the moving table 24 and the forward movement of the plating treatment tank 30 is stopped while performing the plating treatment.

移動台24が前進限位置に到達し、めっき処理が終了したら、帯状部材12の搬送を停止し、2つのマスキング治具41、42を、図7(B)に示されるように、帯状部材12から離反させる。離反工程が終了したら、移動台24によりめっき処理槽30を図7(B)に示される前進限位置から、図1に示した初期位置まで後退移動させる。この後退工程が終了したら、上述しためっき処理工程が繰り返される。 When the moving table 24 reaches the forward limit position and the plating process is completed, the transport of the strip-shaped member 12 is stopped, and the two masking jigs 41 and 42 are attached to the strip-shaped member 12 as shown in FIG. 7 (B). Separate from. When the separation step is completed, the moving table 24 moves the plating treatment tank 30 backward from the forward limit position shown in FIG. 7 (B) to the initial position shown in FIG. When this retreat step is completed, the plating treatment step described above is repeated.

従来のように、両面に部分めっき処理を行う場合には、少なくとも2台の部分めっき装置が必要であったが、この部分めっき装置10においては、2つのマスキング治具41、42を備えており、帯状部材12の両面に同時に部分めっき処理を行うことができるので、両面に部分めっき処理を行う場合においても、効率的にめっき処理を行うことができる。この部分めっき装置10は、帯状部材12にめっきされる金属の種類としては、金以外に、パラジウム、ロジウム、ルテニウムなどの高額な金属を部分めっき処理する場合に好適である。めっき処理後には、部分めっきされた部分を含めて帯状部材から切り出されて、曲げ加工等の加工により、最終製品が製造される。 As in the past, when performing partial plating on both sides, at least two partial plating devices were required, but this partial plating device 10 is provided with two masking jigs 41 and 42. Since both sides of the strip-shaped member 12 can be partially plated at the same time, the plating can be efficiently performed even when the partial plating is performed on both sides. The partial plating apparatus 10 is suitable for partial plating of expensive metals such as palladium, rhodium, and ruthenium in addition to gold as the type of metal to be plated on the strip-shaped member 12. After the plating treatment, the strip-shaped member including the partially plated portion is cut out, and a final product is manufactured by processing such as bending.

本発明は前記実施の形態に限定されるものではなく、その要旨を逸脱しない範囲で種々変更可能である。例えば、帯状部材12としては、図5に示したように、全体的に平坦となったものが示されているが、めっき処理前に、一部を打ち抜き加工した部材に対しても、めっき処理を行うことができる。 The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the gist thereof. For example, as the strip-shaped member 12, as shown in FIG. 5, a member that is flat as a whole is shown, but a member that has been partially punched before the plating process is also plated. It can be performed.

12 帯状部材
13 テンションローラ
15 駆動ローラ
17 ストレート部
18 搬送機構
21 支持台
24 移動台
26 駆動機構
30 めっき処理槽
37 洗浄ボックス
40 位置検出センサ
41 第1のマスキング治具
42 第2のマスキング治具
48a、48b 液室
49a、49b 開口部
51a、51b マスキング板
61a、61b エアシリンダ
T1、T2 被処理面
12 Band-shaped member 13 Tension roller 15 Drive roller 17 Straight part 18 Conveyance mechanism 21 Support base 24 Moving base 26 Drive mechanism 30 Plating processing tank 37 Cleaning box 40 Position detection sensor 41 First masking jig 42 Second masking jig 48a , 48b Liquid chambers 49a, 49b Openings 51a, 51b Masking plates 61a, 61b Air cylinders T1, T2 Surfaces to be treated

Claims (4)

帯状部材を当該帯状部材に真っ直ぐに伸びたストレート部を形成して搬送する搬送機構と、
帯状部材の前記ストレート部の搬送方向に帯状部材に同期して前進移動し、前進限位置から初期位置まで後退移動する移動台と、
前記移動台に帯状部材に向けて接近離反移動自在に装着され、帯状部材の一方の面に押圧する第1のマスキング治具と、
前記移動台に帯状部材に向けて接近離反移動自在に装着され、帯状部材の他方の面に押圧する第2のマスキング治具と、を有し、
被処理面に開口する開口部に連通する液室を前記第1のマスキング治具に設け、
被処理面に施されるめっき必要領域に対応する形状の連通孔が形成されたマスキング板を前記第1のマスキング治具の前記開口部に設け、
前記第1のマスキング治具と前記第2のマスキング治具を帯状部材に押圧して帯状部材を挟持し、かつ帯状部材を搬送しながら前記移動台を前進移動し、被処理面のめっき必要領域をめっき処理する、部分めっき装置。
A transport mechanism for transporting a strip-shaped member by forming a straight portion extending straight on the strip-shaped member.
A moving table that moves forward in synchronization with the strip member in the transport direction of the straight portion of the strip member and moves backward from the forward limit position to the initial position.
A first masking jig that is mounted on the moving table so as to move closer to and away from the strip-shaped member and presses against one surface of the strip-shaped member.
It has a second masking jig that is mounted on the moving table so as to be movable close to and away from the strip-shaped member and presses against the other surface of the strip-shaped member.
The first masking jig is provided with a liquid chamber that communicates with the opening that opens to the surface to be processed.
A masking plate having communication holes having a shape corresponding to the area requiring plating applied to the surface to be processed is provided in the opening of the first masking jig.
The first masking jig and the second masking jig are pressed against the strip-shaped member to sandwich the strip-shaped member, and the moving table is moved forward while transporting the strip-shaped member, so that the area to be plated on the surface to be processed is required. Plating process, partial plating equipment.
請求項1記載の部分めっき装置において、
被処理面に開口する開口部に連通する液室を前記第2のマスキング治具に設け、
被処理面に施されるめっき必要領域に対応する形状の連通孔が形成されたマスキング板を前記第2のマスキング治具の前記開口部に設け、
前記第1のマスキング治具と前記第2のマスキング治具を帯状部材に押圧して帯状部材を挟持し、かつ帯状部材を搬送しながら、帯状部材の両方の被処理面のめっき必要領域を同時にめっき処理する、部分めっき装置。
In the partial plating apparatus according to claim 1,
The second masking jig is provided with a liquid chamber that communicates with the opening that opens to the surface to be processed.
A masking plate having a communication hole having a shape corresponding to the area requiring plating applied to the surface to be processed is provided in the opening of the second masking jig.
The first masking jig and the second masking jig are pressed against the strip-shaped member to sandwich the strip-shaped member, and while transporting the strip-shaped member, the areas required for plating on both surfaces of the strip-shaped member are simultaneously covered. Partial plating equipment for plating.
請求項1または2記載の部分めっき装置において、
前記搬送機構は、前記ストレート部の上流側に配置されて帯状部材に張力を加えるテンションローラと、前記ストレート部の下流側に配置され帯状部材を搬送方向に駆動する駆動ローラとを有する、部分めっき装置。
In the partial plating apparatus according to claim 1 or 2.
The transport mechanism is partially plated, having a tension roller arranged on the upstream side of the straight portion to apply tension to the strip-shaped member, and a drive roller arranged on the downstream side of the straight portion to drive the strip-shaped member in the transport direction. apparatus.
請求項1〜3のいずれか1項に記載の部分めっき装置を用いて、帯状部材の被処理面の必要領域のみにめっき処理する部分めっき方法であって、
前記第1のマスキング治具と前記第2のマスキング治具を帯状部材に押圧して帯状部材を挟持する挟持工程と、
帯状部材が2つのマスキング治具により挟持された状態のもとで、帯状部材を搬送し、かつ前記移動台を前進移動しながら、被処理面のめっき必要領域をめっき処理する処理工程と、
前記移動台が前進限位置に到達したら、帯状部材の搬送を停止し、前記第1のマスキング治具と前記第2のマスキング治具を帯状部材から離反させる離反工程と、
前記移動台を前進限位置から初期位置に後退移動させてマスキング治具を後退移動させる後退工程と、
を有する、部分めっき方法。
A partial plating method for plating only a required region of a surface to be treated of a strip-shaped member using the partial plating apparatus according to any one of claims 1 to 3.
A sandwiching step of pressing the first masking jig and the second masking jig against the band-shaped member to sandwich the band-shaped member, and
A processing process in which the strip-shaped member is sandwiched between two masking jigs, the strip-shaped member is conveyed, and the strip-shaped member is moved forward while moving forward, and the plating-required region of the surface to be treated is plated.
When the moving table reaches the forward limit position, the transfer of the strip-shaped member is stopped, and the separation step of separating the first masking jig and the second masking jig from the strip-shaped member is performed.
A retreat step of moving the moving table backward from the forward limit position to the initial position and moving the masking jig backward.
A partial plating method.
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