JP2021062328A - Coating method and coating device - Google Patents

Abstract

To provide a coating method where a liquid is applied while restraining the remaining of bubbles to a base material with grooves formed on a surface.SOLUTION: In a coating method, a liquid is applied on the surface 8 of a base material 7 with grooves 9 formed on the surface 8 by a coater 12 having a slit 42 long in one direction and capable of discharging the liquid from the opening 42a of the slit 42. The method includes a coating step to discharge the liquid from the opening 42a to the surface 8 while relatively moving the base material 7 and the coater 12 in a state where the opening 42a and the surface 8 are close. In the coating step, the liquid is discharged to the base material 7 from the coater 12 while relatively moving the base material 7 and the coater 12 in a state where the longitudinal direction of the opening 42a projected when projecting the opening 42a on the surface 8 and the longitudinal direction of the grooves 9 are inclined.SELECTED DRAWING: Figure 2

Description

The present invention relates to a coating method and a coating apparatus.

For example, in a semiconductor manufacturing process, a liquid functional material is applied to a semiconductor wafer. Conventionally, spin coating is used as a means of coating. As shown in FIG. 8, as a substrate to which a liquid such as a functional material is applied, there is a substrate 90 in which a plurality of grooves 92 are formed on the surface 91. According to the spin coating, the liquid 99 given to the center of the substrate 90 immediately spreads in the radial direction from the center. Therefore, as shown in FIG. 9, there is a portion in the groove 92 where there is no escape place for gas, and bubbles 93 tend to remain between the substrate 90 and the applied liquid 99. When a film made of a functional material is formed on the substrate 90, the remaining bubbles 93 become defects.

Therefore, Patent Document 1 discloses a technique in which a substrate having grooves formed on its surface is coated with a liquid by spin coating, and then the atmosphere of the substrate is set to a pressure exceeding atmospheric pressure.

Japanese Unexamined Patent Publication No. 2014-143341

According to the method disclosed in Patent Document 1, it is possible to eliminate the bubbles remaining in the groove after the application of the liquid. However, in this case, after applying the liquid to the substrate, equipment for increasing the pressure of the atmosphere of the substrate is required, and processing for eliminating the air bubbles in the grooves after application is required, which increases the cost. It causes. As a member (base material) having grooves formed on the surface to which the liquid is applied, in addition to a substrate such as a wafer, there is also a sheet-shaped member that is long in one direction.

Therefore, an object of the present disclosure is to provide a new technical means capable of applying a liquid by suppressing the residual bubbles to a base material having grooves formed on the surface.

The coating method of the present disclosure is a method of applying a liquid to the surface of a base material having a groove on the surface by a coating device having a long slit in one direction and capable of discharging the liquid from the opening of the slit. The coating step includes a coating step of discharging the liquid from the opening to the surface while relatively moving the base material and the coating device in a state where the opening and the surface are close to each other. Then, when the opening is projected onto the surface, the base material and the coating device are relatively moved in a state where the longitudinal direction of the projected opening and the longitudinal direction of the groove are inclined. The liquid is discharged from the applicator onto the substrate.

According to the coating method of the present disclosure, when the opening of the slit is projected on the surface of the base material, the longitudinal direction of the projected opening and the longitudinal direction of the groove are in an inclined relationship, so that the slit is discharged from the coating device. The liquid is applied to the surface of the substrate so as to expel air bubbles along the grooves. Therefore, it is possible to suppress the residual bubbles and apply the liquid to the surface of the base material.

Further, preferably, the longitudinal direction of the projected opening and the relative moving direction of the base material and the coating device are orthogonal to each other, and the longitudinal direction of the projected opening and the moving direction of the projected opening are respectively. , Inclined with respect to the longitudinal direction of the groove.
In this case, the liquid discharged from the applicator can easily expel air bubbles along the groove.

Further, preferably, the method of applying the liquid to the surface of the base material forms a liquid pool between the coating device and the surface when the liquid is relatively moved between the coating device and the base material. At the same time, it is a capillary coating in which the liquid in the coating device is applied as a negative pressure with respect to the atmospheric pressure.
In the case of capillary coating, the liquid is applied as the liquid is wetted and spread along the groove surface of the base material. Therefore, the liquid has a high effect of pushing out air bubbles along the groove. Therefore, it is possible to further suppress the residual bubbles and apply the liquid.

The coating device of the present disclosure is a device for applying a liquid to the surface of a base material having a groove on the surface, and is a coating device having a long slit in one direction and capable of discharging the liquid from the opening of the slit. And a moving mechanism that relatively moves the base material and the coating device, and when the opening of the slit is projected on the surface, the longitudinal direction of the groove is inclined with respect to the longitudinal direction of the projected opening. As described above, a stage for holding the base material is provided.
The coating device enables the coating method. Therefore, it is possible to apply the liquid while suppressing the residual bubbles.

Further, preferably, the coating device further includes an adjusting mechanism for adjusting the orientation of the base material to be held on the stage.
The adjusting mechanism may be installed outside the stage or inside the stage. When the adjusting mechanism is installed outside the stage, the coating apparatus further comprises a conveying device that conveys the substrate whose orientation has been adjusted by the adjusting mechanism to the stage. According to the adjustment mechanism, the base material was held on the stage so that the longitudinal direction of the groove was inclined with respect to the longitudinal direction of the opening projected on the surface of the base material when the coating liquid was applied to the base material. It becomes a state.

According to the invention of the present disclosure, it is possible to apply the liquid to the base material having grooves formed on the surface while suppressing the residual bubbles.

It is a schematic block diagram which looked at the coating apparatus from the side. It is a perspective view which shows a part of a coating apparatus. It is a top view which shows the base material on a stage, and a coater. It is a top view which shows the schematic structure of the whole of a coating apparatus. It is a figure for demonstrating the modification of the coating method, and is the top view which shows the base material on a stage, and a coating device. It is a figure for demonstrating the case where the base material is rectangular, and is the top view which shows the base material on a stage, and a coater. It is a figure explaining another example of the groove provided in the base material. It is a top view explaining the coating method by spin coating. It is sectional drawing which looked at the base material from the side in the case of the coating method by spin coating.

[Structure of coating device]
FIG. 1 is a schematic configuration diagram of the coating apparatus viewed from the side. FIG. 2 is a perspective view showing a part of the coating device. The coating device 10 shown in FIGS. 1 and 2 is a device for applying a liquid (hereinafter, referred to as “coating liquid”) to the base material 7. Therefore, the coating device 10 connects the coating device 12, the stage 14 holding the base material 7, the moving mechanism 16 for relatively moving the coating device 12 and the stage 14, and the coating device 12 to apply the coating liquid. A supply mechanism 18 for supplying to the vessel 12 is provided. The applicator 12 is also called a slit die.

The base material 7 of the present disclosure is a circular substrate such as a semiconductor wafer. FIG. 3 is a plan view showing the base material 7 on the stage 14 and the coater 12. A plurality of grooves 9 are formed on the surface 8 of the base material 7. As the groove 9, a linear first groove 9a long in one direction and a linear second groove 9b long in the other direction are formed on the surface 8. The coating liquid is applied to the surface 8 by the coating device 10. The first groove 9a and the second groove 9b intersect to form a grid-like groove 9. The angle at which the first groove 9a and the second groove 9b shown in FIG. 3 intersect is 90 degrees, but the angle may be other than that. The longitudinal direction of the first groove 9a is referred to as the "L direction", and the longitudinal direction of the second groove 9b is referred to as the "M direction". The L direction and the M direction are orthogonal on the surface 8. In each figure, the "L direction" is indicated by an arrow (L), and the "M direction" is indicated by an arrow (M).

The base material 7 may be a square or rectangular substrate, or may be a continuous sheet-like member, in addition to the circular substrate. As shown in FIG. 6, the base material 7 may be a rectangular (or square) substrate, in which case the first groove 9a is formed parallel to one side thereof and parallel to the other side. A second groove 9b is formed.

In FIGS. 1 and 2, the applicator 12 is a member that is long in one direction, and a liquid storage space 40 for collecting the coating liquid and a slit 42 are formed inside the member. One side of the slit 42 is connected to the liquid storage space 40, and the other side is open to the outside. The liquid reservoir space 40 and the slit 42 are also formed long and linearly along the longitudinal direction of the applicator 12. The slit 42 is opened at the front end surface (lower end surface) 13 of the applicator 12. The sign of the opening of the slit 42 on the tip surface 13 is “42a”. The coating liquid in the liquid reservoir space 40 is discharged to the outside through the slit 42.

The dimension of the slit 42 in the longitudinal direction is larger than the diameter (width dimension) of the base material 7. The direction orthogonal to the longitudinal direction of the applicator 12 is the relative moving direction between the applicator 12 and the stage 14, and this direction is the coating direction. The longitudinal direction of the applicator 12 is referred to as "X direction", and the coating direction is referred to as "Y direction". In each figure, the "X direction" is indicated by an arrow (X), and the "Y direction" is indicated by an arrow (Y). As described above, the applicator 12 of the present disclosure is provided with a linear slit 42 that is long in one direction (X direction), and the coating liquid can be discharged from the opening 42a of the slit 42.

The stage 14 holds the base material 7 by, for example, suctioning air. The base material 7 is held on the stage 14 so as to face in a fixed direction. More specifically (see FIG. 2), as will be described later, when the opening 42a of the slit 42 is projected onto the surface 8 of the base material 7, a groove is formed with respect to the longitudinal direction of the projected opening (42a). The base material 7 is held on the stage 14 so that the longitudinal direction of (9a, 9b) is inclined.

FIG. 4 is a plan view showing an overall schematic configuration of the coating apparatus 10. The coating device 10 of the present disclosure further includes an adjusting mechanism 20 for adjusting the orientation of the base material 7. A plurality of base materials 7 are stacked and stored in a storage place. The adjusting mechanism 20 adjusts the orientation of the base material 7 taken out from the storage place. An alignment mark Q is provided on the base material 7. In the present disclosure, the base material 7 is provided with a notch as an alignment mark Q. The alignment mark Q may be another or a straight portion called an orientation flat.

The adjustment mechanism 20 includes a detection unit 22 such as a camera that recognizes the alignment mark Q, and a rotation mechanism 24 that rotates the base material 7. The orientation of the base material 7 is adjusted by the detection result of the detection unit 22 and the rotation of the base material 7 by the rotation mechanism 24. In this way, the adjusting mechanism 20 adjusts the orientation of the base material 7 based on the alignment mark Q. In the adjusted orientation, the base material 7 is held on the stage 14.

In the form shown in FIG. 4, the adjusting mechanism 20 is installed outside the stage 14, that is, in an area different from the stage 14, but may be installed inside the stage 14. In the present disclosure, since the adjusting mechanism 20 is installed in a region different from that of the stage 14, the coating device 10 uses a transport device 26 for transporting the base material 7 whose orientation has been adjusted by the adjusting mechanism 20 to the stage 14. Further prepare. In the present embodiment, the case where the adjusting mechanism 20 is installed in a region different from that of the stage 14 will be described. However, the adjusting mechanism 20 may be provided in the stage 14, and in this case, the adjusting mechanism 20 is based on the transfer device 26. After the material 7 is arranged in the stage 14, the orientation of the base material 7 is adjusted by the adjusting mechanism 20. As shown in FIG. 4, by the adjusting mechanism 20 (and the transport device 26), all the base materials 7 (four in the example) are held on the stage 14 with the alignment mark Q in a fixed orientation. It becomes. That is, the first groove 9a of one base material 7 and the first groove 9a of the other base material 7 are parallel to each other, and the second groove 9b of one base material 7 and the second groove 9b of the other base material 7 are parallel to each other. It is parallel to the groove 9b of. In the illustrated example, the number of base materials 7 is four, but this is an example, and the number of base materials 7 may be one or a plurality.

In FIG. 1, the moving mechanism 16 of the present disclosure includes a configuration in which the applicator 12 is moved with respect to the stage 14 in a fixed state. More specifically, the moving mechanism 16 includes a moving body 46 on which the applicator 12 is mounted and an actuator 47 for moving the moving body 46. The actuator 47 is, for example, a linear actuator.

By the moving mechanism 16, the coater 12 mounted on the moving body 46 moves in a direction parallel to the surface 8 of the base material 7 (that is, the direction indicated by the arrow (Y)). Further, the moving mechanism 16 directs the coating device 12 in a direction orthogonal to the surface 8 in order to adjust the distance (gap G) between the tip surface 13 of the coating device 12 and the surface 8 of the base material 7 on the stage 14. Can be moved. Contrary to the case of the present disclosure, the stage 14 may move while the coater 12 is in a fixed state. That is, the moving mechanism 16 may have a configuration in which the base material 7 and the coating device 12 are relatively moved. From the above, the coating device 12 discharges the coating liquid from the slit 42 while moving relative to the surface 8 of the base material 7, and as will be described later, capillary coating can be performed.

The supply mechanism 18 can supply the coating liquid to the coating device 12. The supply mechanism 18 has a tank 32 that stores the coating liquid, and a pipe 34 that connects the tank 32 and the coating device 12. When the coating liquid is discharged from the coating device 12, that is, when the coating liquid is consumed, the coating liquid is supplied (replenished) from the tank 32 to the coating device 12. The coating of the coating liquid on the base material 7 performed by the coating apparatus 10 of the present disclosure is capillary coating, which will be described later. For this purpose, the supply mechanism 18 has an adjusting unit 36 that adjusts the pressure of the coating liquid stored in the tank 32.

The adjusting unit 36 has a pump (vacuum pump) for sucking air and a regulator. The adjusting unit 36 sets the coating liquid in the tank 32 to a negative pressure with respect to the atmospheric pressure. As a result, the coating liquid in the coating device 12 also has a negative pressure with respect to the atmospheric pressure. The regulator of the adjusting unit 36 adjusts the pressure of the coating liquid stored in the tank 32 so that the pressure of the coating liquid in the coating device 12 is maintained at a predetermined value (negative pressure). With this configuration, capillary coating by the coating device 12 becomes possible.

[About capillary application]
The applicator 12 discharges the coating liquid from the slit 42 while moving with respect to the surface 8 of the base material 7 on the stage 14. Capillary coating is performed by the coating device 12. The coating method of the present disclosure is a downward capillary coating method.

Capillary application will be further described. Before the start of coating, the adjusting unit 36 adjusts the pressure of the coating liquid in the tank 32 so that the pressure is lower than the atmospheric pressure. Therefore, the pressure of the coating liquid in the coating device 12 is also negative, and the coating liquid is not discharged from the slit 42. The tip surface 13 of the applicator 12 and the surface 8 of the base material 7 on the stage 14 are brought close to each other. The adjusting unit 36 adjusts the pressure of the coating liquid in the tank 32 so that the pressure is slightly higher than the atmospheric pressure. Then, the coating liquid is supplied from the tank 32 to the coating device 12, and the coating liquid is discharged from the opening 42a of the slit 42. When the coating liquid discharged from the coating device 12 comes into contact with the surface 8 of the base material 7, a liquid pool B (“bead”) of the coating liquid is formed in the gap G between the tip surface 13 and the surface 8 as shown in the enlarged view of FIG. B ”) is formed. This process is called a liquiding step. In the liquidation step, the coater 12 is located directly above a part of the base material 7 (the start position of coating), and the coater 12 is in a stopped state.

Immediately after the liquid pool B is formed in the gap G, the adjusting unit 36 adjusts the pressure of the coating liquid in the tank 32 so that the pressure is lower than the atmospheric pressure. As a result, the discharge of the coating liquid from the slit 42 is temporarily stopped. After that, the adjusting unit 36 adjusts the pressure of the coating liquid in the coating device 12 so that it becomes a predetermined pressure lower than the atmospheric pressure. Then, the moving mechanism 16 moves the coating device 12 with respect to the base material 7. Along with this movement, in order to continuously form the liquid pool B (bead B), the coating liquid is drawn out from the coating device 12 so as to fill the gap G, and is continuous with respect to the surface 8 of the base material 7. The coating liquid is applied to. During coating, the consumed amount of coating liquid is replenished from the supply mechanism 18 to the coating device 12.

In this way, in the capillary coating, after the coating liquid from the coating device 12 adheres to the surface 8 of the base material 7, the coating liquid causes a capillary phenomenon (surface tension) between the tip surface 13 and the surface 8 and is being applied. It is pulled out from the applicator 12 by the shearing force acting on the liquid pool B of the above. As a result, the coating liquid is applied to the surface 8 of the base material 7. In the case of FIG. 1, the moving direction of the applicator 12 during the coating operation is from right to left, and the direction indicated by the arrow (Y) from right to left is the “coating direction”.

[Orientation of base material 7 in stage 14]
Here, the alternate long and short dash line shown in FIG. 3 is projected when the coating device 12 is positioned on the base material 7 and the opening 42a of the slit 42 of the coating device 12 is projected onto the surface 8 of the base material 7. It is a virtual line K along the longitudinal direction of the opened opening 42a.

As described above, the base material 7 is held on the stage 14 by the adjusting mechanism 20 with the alignment mark Q in a fixed direction. The orientation is as described below. That is, as shown in FIG. 3, the base material 7 is placed on the stage 14 so that the longitudinal direction of the groove 9 is inclined with respect to the virtual line K which is the longitudinal direction of the opening 42a projected on the surface 8 of the base material 7. Be retained.
In the case of the present disclosure, the groove 9 includes an intersecting first groove 9a and a second groove 9b. The base material 7 is held on the stage 14 so that each of the first groove 9a and the second groove 9b is inclined with respect to the virtual line K. The longitudinal direction of the first groove 9a is inclined at 45 degrees with respect to the virtual line K, and the longitudinal direction of the second groove 9b is inclined at 45 degrees with respect to the virtual line K.

As described above, according to the adjusting mechanism 20, when the opening 42a of the slit 42 is projected onto the surface 8 of the base material 7 when the coating liquid is applied to the base material 7, the projected opening is projected in the longitudinal direction. The orientation of the base material 7 is adjusted in advance so that the longitudinal direction of the grooves (9a, 9b) is inclined. Then, the base material 7 whose orientation has been adjusted is held in the stage 14 in a fixed orientation.

[Applying method]
The coating method performed by the coating apparatus 10 having the above configuration will be described. The coating method includes a preparatory step in which the base material 7 is held on the stage 14, and a coating step in which the coating liquid is applied to the base material 7. In the preparation step, the adjustment mechanism 20 functions. In the coating step, as shown in FIGS. 1 and 2, the coating device 12 is moved with respect to the base material 7 in a state where the opening 42a of the slit 42 of the coating device 12 and the surface 8 of the base material 7 are close to each other. This is a step of discharging the coating liquid from the opening 42a to the surface 8 while allowing the coating liquid to be discharged.

Further, in the coating step, the substrate 7 is in a state where the longitudinal direction of the projected opening 42a, which is the direction along the virtual line K (see FIG. 3), and the longitudinal direction of each of the grooves (9a, 9b) are inclined. On the other hand, the coating liquid is discharged from the coating device 12 to the base material 7 while moving the coating device 12 in the direction indicated by the arrow (Y).

In this coating method, as described above, when the opening 42a of the slit 42 is projected onto the surface 8 of the base material 7, the longitudinal direction of the projected opening 42a and the longitudinal direction of each of the grooves 9a and 9b are inclined. It is in. Therefore, the coating liquid discharged from the coating device 12 is applied to the surface 8 of the base material 7 so as to expel air bubbles along the grooves 9a and 9b, respectively. Therefore, it is possible to suppress the residual air bubbles and apply the coating liquid to the surface 8 of the base material 7. The directions in which air bubbles are expelled along the grooves 9a and 9b are indicated by arrows G in FIG.

In particular, in the method shown in FIG. 3, the longitudinal direction of the opening 42a projected onto the surface 8 of the base material 7 and the moving direction of the coater 12 on the surface 8 of the base material 7 are orthogonal to each other. That is, the direction along the virtual line K (see FIG. 3) and the direction indicated by the arrow (Y), which is the coating direction, are orthogonal to each other in a plan view. Then, the longitudinal direction (direction along the virtual line K) of the opening 42a projected on the surface 8 of the base material 7 and the movement direction (direction indicated by the arrow (Y)) on the surface 8 are grooves (9a, 9b), respectively. ) Is inclined with respect to the longitudinal direction. Therefore, the coating liquid discharged from the coating device 12 can easily expel air bubbles along the grooves (9a, 9b).

As shown in FIG. 5, the longitudinal direction of the opening 42a does not have to be orthogonal to the coating direction indicated by the arrow (Y), that is, the moving direction of the coating device 12. However, even in this case, the longitudinal direction (virtual line K) of the opening 42a projected on the surface 8 of the base material 7 and the longitudinal direction of each of the grooves (9a, 9b) are in an inclined relationship. The coater 12 moves while maintaining the above.
Also in this case, when the opening 42a of the slit 42 is projected onto the surface 8 of the base material 7, the longitudinal direction of the projected opening 42a and the longitudinal direction of the grooves (9a, 9b) are in an inclined relationship. Then, the coating liquid discharged from the coating device 12 is applied to the surface 8 of the base material 7 so as to expel air bubbles along the grooves (9a, 9b). Therefore, it is possible to suppress the residual air bubbles and apply the coating liquid to the surface 8 of the base material 7.

Further, in the present disclosure, the method of applying the coating liquid to the surface 8 of the base material 7 is capillary coating. In the capillary coating, when the coating device 12 and the base material 7 are relatively moved, a liquid pool B (see the enlarged view of FIG. 1) is formed between the coating device 12 and the surface 8 of the base material 7, while forming a liquid pool B (see the enlarged view of FIG. 1). This is a method in which the coating liquid in the coating device 12 is applied as a negative pressure with respect to the atmospheric pressure. According to such capillary coating, the coating liquid is applied by the wet spreading of the coating liquid on the surface 8 of the base material 7 so as to travel along the surfaces of the grooves 9a and 9b of the base material 7. Therefore, the coating liquid has a high effect of pushing out air bubbles along the grooves 9a and 9b. Therefore, it is possible to further suppress the residual bubbles and apply the coating liquid.

Further, according to capillary coating, it is advantageous in the case of the base material 7 in which the coating width of the coating liquid changes. That is, as shown in FIG. 3, when the base material 7 is circular and the coating width to be coated changes, the capillary coating is preferable. As shown in FIG. 6, the base material 7 is rectangular, one side of the base material 7 and the longitudinal direction of the first groove 9a are parallel, and the other side of the base material 7 and the second groove 9b When and are parallel to each other, it is preferable to apply the capillary.

In the case of the base material 7 shown in FIG. 6, the base material 7 is held on the stage 14 by inclining the direction of the base material 7 (long side) with respect to the coating direction indicated by the arrow (Y). The longitudinal direction of the opening 42a projected onto the surface 8 of the base material 7 and the longitudinal direction of the grooves 9a and 9b are inclined. In this relationship, the coating liquid can be discharged from the coating device 12 to the base material 7 while the base material 7 and the coating device 12 are relatively moved.

Moreover, in each of the above-mentioned forms, it is possible to make the thickness of the coating film uniform by applying the capillary. Further, since the capillary coating is used, it is not necessary to waste the coating liquid as in the case of spin coating.

In the above-described embodiment, the case where the base material 7 is provided with the grid-like grooves 9 has been described. The form of the groove 9 may be other. For example, as shown in FIG. 7A, a plurality of grooves 9 extending in one direction may be arranged side by side (without intersecting). In FIG. 7A, the region where the hatch is attached is the convex portion 6, and the region other than that region is the groove 9. Alternatively, although not shown, the number of grooves 9 may not be plural, and only one may extend in one direction and be formed on the base material 7.
Further, as shown in FIG. 7B, the region with the hatch may be a linear convex portion (convex 5), and the region other than that region may be a groove 9. That is, a plurality of ridges 5 extending in one direction are formed side by side on the base material 7, and a groove 9 is formed between the ridges 5.
Further, as shown in FIG. 7C, the region with the hatch may be the convex portion 4, and the region other than the convex portion 4 may be the groove 9. The groove 9 shown in FIG. 7C is not a groove intentionally formed, but rather a plurality of convex portions 4 are provided on the base material 7 in a grid pattern, and the grooves are between the convex portions 4. It is 9.

The embodiments disclosed this time are exemplary in all respects and are not restrictive. The scope of rights of the present invention is not limited to the above-described embodiment, and includes all modifications within a range equivalent to the configuration described in the scope of claims.

7: Base material 8: Surface 9: Groove 9a: First groove 9b: Second groove 10: Coating device 12: Coating device 14: Stage 16: Moving mechanism 20: Adjustment mechanism 42: Slit 42a: Opening B: Liquid Puddle

Claims (5)

It is a method of applying a liquid to the surface of a base material having a groove on the surface by a coating device having a long slit in one direction and capable of discharging the liquid from the opening of the slit.
Including a coating step of discharging a liquid from the opening to the surface while relatively moving the base material and the coating device in a state where the opening and the surface are close to each other.
In the coating step, when the opening is projected onto the surface, the base material and the coating device are relatively moved in a state where the longitudinal direction of the projected opening and the longitudinal direction of the groove are inclined. However, a coating method in which a liquid is discharged from the coating device onto the base material. The longitudinal direction of the projected opening and the relative moving direction of the base material and the coating device are orthogonal to each other.
Each of the longitudinal direction and the moving direction of the projected opening is inclined with respect to the longitudinal direction of the groove.
The coating method according to claim 1. In the method of applying the liquid to the surface of the base material, when the liquid is relatively moved between the coating device and the base material, the coating device is formed while forming a liquid pool between the coating device and the surface. Capillary application in which the liquid inside is applied as a negative pressure with respect to atmospheric pressure.
The coating method according to claim 1 or 2. A device for applying a liquid to the surface of a base material having a groove on the surface.
An applicator that has a long slit in one direction and can discharge liquid from the opening of the slit.
A moving mechanism that relatively moves the base material and the coating device, and
A coating device including a stage that holds the base material so that the longitudinal direction of the groove is inclined with respect to the longitudinal direction of the projected opening when the opening of the slit is projected onto the surface. The coating apparatus according to claim 4, further comprising an adjusting mechanism for adjusting the orientation of the base material to be held on the stage.

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