JP2021002639A5 - - Google Patents

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Publication number
JP2021002639A5
JP2021002639A5 JP2019226437A JP2019226437A JP2021002639A5 JP 2021002639 A5 JP2021002639 A5 JP 2021002639A5 JP 2019226437 A JP2019226437 A JP 2019226437A JP 2019226437 A JP2019226437 A JP 2019226437A JP 2021002639 A5 JP2021002639 A5 JP 2021002639A5
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JP
Japan
Prior art keywords
substrate holding
shaft portions
substrate
holding device
shafts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2019226437A
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Japanese (ja)
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JP2021002639A (en
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Publication date
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Priority to US16/898,771 priority Critical patent/US11335588B2/en
Priority to KR1020200071405A priority patent/KR20200144486A/en
Priority to TW109119778A priority patent/TW202104045A/en
Priority to EP20180334.3A priority patent/EP3753674B1/en
Priority to CN202010546521.2A priority patent/CN112103237A/en
Publication of JP2021002639A publication Critical patent/JP2021002639A/en
Publication of JP2021002639A5 publication Critical patent/JP2021002639A5/ja
Priority to JP2024060178A priority patent/JP2024083444A/en
Pending legal-status Critical Current

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Claims (20)

基板を円運動させながら、前記基板をその軸心を中心として回転させる基板保持装置であって、
前記基板の周縁部に接触可能な複数のローラーと、
前記複数のローラーを回転させる複数の電動機と、
予め定められた中心軸線の周りに配列された複数の偏心軸と、
複数のアクチュエータを備え、
前記複数の偏心軸は、複数の第1軸部と、前記複数の第1軸部からそれぞれ偏心した複数の第2軸部を有しており、
前記複数のローラーは前記複数の第2軸部にそれぞれ固定され、前記複数の第1軸部は前記複数の電動機にそれぞれ連結されており、
前記複数の偏心軸は、複数の可動軸および複数の基準軸から構成されており、
前記複数のアクチュエータは、前記複数の可動軸にそれぞれ連結されており、
前記複数のアクチュエータは、前記複数の可動軸を、前記複数の基準軸に近づく方向および前記複数の基準軸から遠ざかる方向に移動させるように構成されている、基板保持装置。
A substrate holding device that rotates the substrate about its axis while circularly moving the substrate,
a plurality of rollers capable of contacting the periphery of the substrate;
a plurality of electric motors for rotating the plurality of rollers;
a plurality of eccentric shafts arranged around a predetermined central axis;
Equipped with multiple actuators,
The plurality of eccentric shafts have a plurality of first shaft portions and a plurality of second shaft portions eccentric from the plurality of first shaft portions,
the plurality of rollers are respectively fixed to the plurality of second shaft portions, the plurality of first shaft portions are respectively connected to the plurality of electric motors,
The plurality of eccentric shafts are composed of a plurality of movable shafts and a plurality of reference shafts,
The plurality of actuators are respectively connected to the plurality of movable shafts,
The substrate holding device, wherein the plurality of actuators are configured to move the plurality of movable axes in a direction toward the plurality of reference axes and a direction away from the plurality of reference axes.
前記複数の偏心軸は、前記複数の第1軸部と前記複数の第2軸部とを接続する複数の中間軸部をさらに有しており、
前記複数の第1軸部は前記複数の中間軸部にそれぞれ固定され、前記複数の第2軸部は前記複数の中間軸部にそれぞれ固定されている、請求項1に記載の基板保持装置。
The plurality of eccentric shafts further have a plurality of intermediate shaft portions connecting the plurality of first shaft portions and the plurality of second shaft portions,
2. The substrate holding device according to claim 1, wherein said plurality of first shafts are respectively fixed to said plurality of intermediate shafts, and said plurality of second shafts are respectively fixed to said plurality of intermediate shafts.
前記複数の電動機を同じ速度かつ同じ位相で回転させる動作制御部をさらに備えている、請求項1または2に記載の基板保持装置。 3. The substrate holding apparatus according to claim 1, further comprising an operation control section that rotates said plurality of electric motors at the same speed and in the same phase. 前記複数の基準軸に近づく方向および前記複数の基準軸から遠ざかる方向は、前記中心軸線に向かう方向および前記中心軸線から遠ざかる方向である、請求項1乃至3のいずれか一項に記載の基板保持装置。 4. The substrate holder according to any one of claims 1 to 3, wherein the direction toward the plurality of reference axes and the direction away from the plurality of reference axes are the direction toward the central axis and the direction away from the central axis. Device. 前記複数のアクチュエータのそれぞれは、
ピストンと、
前記ピストンから離れて配置されたハウジングと、
前記ピストンと前記ハウジングとの間に圧力室を形成する隔壁膜とを備えている、請求項1乃至4のいずれか一項に記載の基板保持装置。
each of the plurality of actuators,
a piston;
a housing spaced apart from the piston;
5. The substrate holding device according to claim 1, further comprising a partition film forming a pressure chamber between said piston and said housing.
前記隔壁膜は、
前記ピストンの端部に接触する中央部と、
前記中央部に接続され、かつ前記ピストンの側面に沿って延びる内壁部と、
前記内壁部に接続され、かつ湾曲した断面を有する折り返し部と、
前記折り返し部に接続され、かつ前記内壁部の外側に位置する外壁部とを有する、請求項5に記載の基板保持装置。
The partition membrane is
a central portion contacting the ends of the piston;
an inner wall portion connected to the central portion and extending along the side of the piston;
a folded portion connected to the inner wall portion and having a curved cross section;
6. The substrate holding device according to claim 5, further comprising an outer wall portion connected to said folded portion and located outside said inner wall portion.
前記複数の可動軸のうちの少なくとも1つの移動距離を測定する少なくとも1つの非接触式の距離センサをさらに備えている、請求項1に記載の基板保持装置。 2. The substrate holding apparatus according to claim 1 , further comprising at least one non-contact distance sensor for measuring a travel distance of at least one of said plurality of movable axes. 前記移動距離の測定値、または前記移動距離の複数の測定値から算出された指標値と、予め設定されたしきい値とを比較することによって、前記基板保持装置に異常が生じているか否かを判断するように構成された動作制御部をさらに備えている、請求項7に記載の基板保持装置。 Whether or not an abnormality has occurred in the substrate holding device is determined by comparing the measured value of the movement distance or an index value calculated from a plurality of measured values of the movement distance with a preset threshold value. 8. The substrate holding apparatus of claim 7, further comprising an operation controller configured to determine . 前記指標値は、前記複数のローラーが一回転以上回転しているときの前記複数の可動軸のうちの少なくとも1つの位置の平均値である、請求項8に記載の基板保持装置。 9. The substrate holding apparatus according to claim 8, wherein said index value is an average value of positions of at least one of said plurality of movable shafts when said plurality of rollers rotates one or more rotations. 前記指標値は、前記複数のローラーが一回転以上回転している間の前記複数の可動軸のうちの少なくとも1つの位置の最大値と最小値との差である、請求項8に記載の基板保持装置。 9. The substrate according to claim 8, wherein the index value is a difference between a maximum value and a minimum value of the position of at least one of the plurality of movable axes during one or more rotations of the plurality of rollers. holding device. 基板を円運動させながら、前記基板をその軸心を中心として回転させる基板保持装置であって、
前記基板の周縁部に接触可能な複数のローラーと、
前記複数のローラーを回転させる複数の電動機と、
予め定められた中心軸線の周りに配列された複数の偏心軸と、
アクチュエータを備え、
前記複数の偏心軸は、複数の第1軸部と、前記複数の第1軸部からそれぞれ偏心した複数の第2軸部を有しており、
前記複数のローラーは前記複数の第2軸部にそれぞれ固定され、前記複数の第1軸部は前記複数の電動機にそれぞれ連結されており、
前記複数の偏心軸は、可動軸および複数の基準軸から構成されており、
前記アクチュエータは、前記可動軸に連結されており、
前記アクチュエータは、前記可動軸を、前記複数の基準軸に近づく方向および前記複数の基準軸から遠ざかる方向に移動させるように構成されており、
前記アクチュエータは、
ピストンと、
前記ピストンから離れて配置されたハウジングと、
前記ピストンと前記ハウジングとの間に圧力室を形成する隔壁膜とを備えている、基板保持装置。
A substrate holding device that rotates the substrate about its axis while circularly moving the substrate,
a plurality of rollers capable of contacting the periphery of the substrate;
a plurality of electric motors for rotating the plurality of rollers;
a plurality of eccentric shafts arranged around a predetermined central axis;
with an actuator,
The plurality of eccentric shafts have a plurality of first shaft portions and a plurality of second shaft portions eccentric from the plurality of first shaft portions,
the plurality of rollers are respectively fixed to the plurality of second shaft portions, the plurality of first shaft portions are respectively connected to the plurality of electric motors,
The plurality of eccentric shafts are composed of a movable shaft and a plurality of reference shafts,
The actuator is connected to the movable shaft,
The actuator is configured to move the movable axis in a direction approaching the plurality of reference axes and a direction away from the plurality of reference axes,
The actuator is
a piston;
a housing spaced apart from the piston;
A substrate holding device comprising a partition membrane forming a pressure chamber between the piston and the housing.
前記複数の偏心軸は、前記複数の第1軸部と前記複数の第2軸部とを接続する複数の中間軸部をさらに有しており、
前記複数の第1軸部は前記複数の中間軸部にそれぞれ固定され、前記複数の第2軸部は前記複数の中間軸部にそれぞれ固定されている、請求項11に記載の基板保持装置。
The plurality of eccentric shafts further have a plurality of intermediate shaft portions connecting the plurality of first shaft portions and the plurality of second shaft portions,
12. The substrate holding device according to claim 11, wherein the plurality of first shaft portions are respectively fixed to the plurality of intermediate shaft portions, and the plurality of second shaft portions are respectively fixed to the plurality of intermediate shaft portions.
前記複数の電動機を同じ速度かつ同じ位相で回転させる動作制御部をさらに備えている、請求項11または12に記載の基板保持装置。 13. The substrate holding apparatus according to claim 11, further comprising an operation control section that rotates said plurality of electric motors at the same speed and in the same phase. 前記複数の基準軸に近づく方向および前記複数の基準軸から遠ざかる方向は、前記中心軸線に向かう方向および前記中心軸線から遠ざかる方向である、請求項11乃至13のいずれか一項に記載の基板保持装置。 14. The substrate holder according to any one of claims 11 to 13, wherein the direction toward the plurality of reference axes and the direction away from the plurality of reference axes are the direction toward the central axis and the direction away from the central axis. Device. 前記隔壁膜は、
前記ピストンの端部に接触する中央部と、
前記中央部に接続され、かつ前記ピストンの側面に沿って延びる内壁部と、
前記内壁部に接続され、かつ湾曲した断面を有する折り返し部と、
前記折り返し部に接続され、かつ前記内壁部の外側に位置する外壁部とを有する、請求項11乃至14のいずれか一項に記載の基板保持装置。
The partition membrane is
a central portion contacting the ends of the piston;
an inner wall portion connected to the central portion and extending along the side of the piston;
a folded portion connected to the inner wall portion and having a curved cross section;
15. The substrate holding device according to claim 11, further comprising an outer wall portion connected to said folded portion and located outside said inner wall portion.
前記可動軸の移動距離を測定する非接触式の距離センサをさらに備えている、請求項11に記載の基板保持装置。 12. The substrate holding device according to claim 11 , further comprising a non-contact distance sensor that measures the moving distance of said movable axis. 前記移動距離の測定値、または前記移動距離の複数の測定値から算出された指標値と、予め設定されたしきい値とを比較することによって、前記基板保持装置に異常が生じているか否かを判断するように構成された動作制御部をさらに備えている、請求項16に記載の基板保持装置。 Whether or not an abnormality has occurred in the substrate holding device is determined by comparing the measured value of the movement distance or an index value calculated from a plurality of measured values of the movement distance with a preset threshold value. 17. The substrate holding apparatus of claim 16, further comprising a motion controller configured to determine . 前記指標値は、前記複数のローラーが一回転以上回転しているときの前記可動軸の位置の平均値である、請求項17に記載の基板保持装置。 18. The substrate holding device according to claim 17, wherein said index value is an average value of positions of said movable shaft when said plurality of rollers rotates one or more times. 前記指標値は、前記複数のローラーが一回転以上回転している間の前記可動軸の位置の最大値と最小値との差である、請求項17に記載の基板保持装置。 18. The substrate holding apparatus according to claim 17, wherein said index value is a difference between a maximum value and a minimum value of positions of said movable shaft while said plurality of rollers are rotating one or more times. 請求項1乃至19のいずれか一項に記載の基板保持装置と、
処理具を基板の第1の面に接触させて該第1の面を処理する処理ヘッドとを備えている、基板処理装置。
A substrate holding device according to any one of claims 1 to 19;
A substrate processing apparatus comprising a processing head for processing a first surface of a substrate by bringing a processing tool into contact with the first surface.
JP2019226437A 2019-06-18 2019-12-16 Substrate holding device and substrate processing device Pending JP2021002639A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
US16/898,771 US11335588B2 (en) 2019-06-18 2020-06-11 Substrate holding apparatus and substrate processing apparatus
KR1020200071405A KR20200144486A (en) 2019-06-18 2020-06-12 Substrate holding apparatus and substrate processing apparatus
TW109119778A TW202104045A (en) 2019-06-18 2020-06-12 Substrate holding apparatus and substrate processing apparatus
EP20180334.3A EP3753674B1 (en) 2019-06-18 2020-06-16 Substrate holding apparatus and substrate processing apparatus
CN202010546521.2A CN112103237A (en) 2019-06-18 2020-06-16 Substrate holding apparatus and substrate processing apparatus
JP2024060178A JP2024083444A (en) 2019-06-18 2024-04-03 SUBSTRATE HOLDING DEVICE AND SUBSTRATE PROCESSING APPARATUS

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019112675 2019-06-18
JP2019112675 2019-06-18

Related Child Applications (1)

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JP2024060178A Division JP2024083444A (en) 2019-06-18 2024-04-03 SUBSTRATE HOLDING DEVICE AND SUBSTRATE PROCESSING APPARATUS

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JP2021002639A JP2021002639A (en) 2021-01-07
JP2021002639A5 true JP2021002639A5 (en) 2022-10-13

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KR (1) KR20200144486A (en)
TW (1) TW202104045A (en)

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Publication number Priority date Publication date Assignee Title
JP2023095345A (en) * 2021-12-24 2023-07-06 株式会社荏原製作所 Substrate processing method and substrate processing apparatus
CN114619308B (en) * 2022-03-29 2023-05-16 杭州众硅电子科技有限公司 Wafer polishing system, loading method and using method thereof
CN117260515B (en) * 2023-11-22 2024-02-13 北京特思迪半导体设备有限公司 Dynamic linkage control method of polishing machine

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US4621459A (en) * 1984-04-23 1986-11-11 Timesavers, Inc. Segmented platen with diaphragm cylinder control
JP2007250783A (en) * 2006-03-15 2007-09-27 Dainippon Screen Mfg Co Ltd Substrate holding and rotating apparatus
JP6144531B2 (en) * 2013-04-23 2017-06-07 株式会社荏原製作所 Substrate processing apparatus and manufacturing method of processing substrate
JP6974116B2 (en) * 2017-10-27 2021-12-01 株式会社荏原製作所 A board processing device and a board processing method provided with a board holding device and a board holding device.

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