JP2020520534A - 大気圧プラズマ装置 - Google Patents
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Abstract
【選択図】図5A
Description
Claims (15)
- 高周波電源が印加され、第1方向に延びた導電体を含む電圧電極と、
前記電圧電極に対向し、前記電圧電極と所定距離離隔した接地電極と、
前記接地電極と前記電圧電極との間に位置し、前記電圧電極の端部を遮蔽する誘電体バリアとを含み、
前記誘電体バリアと前記接地電極は、大気圧プラズマが生成される空間及び反応ガスが供給される反応ガス流路を定義し、
前記接地電極は、前記大気圧プラズマを噴出する複数の噴射口を有し、前記複数の噴射口のうち少なくとも1つは、前記電圧電極の中心軸と一致しない中心を有する、大気圧プラズマ装置。 - 前記電圧電極は、第1方向に長く延びたロッドと、ロッドの先端にロッドと一体に形成されたディスクとを含み、
前記誘電体バリアは、前記ディスクの少なくとも一面を遮蔽する遮蔽板を含む、請求項1に記載の大気圧プラズマ装置。 - 前記ディスク及び前記遮蔽板は、実質的に前記第1方向と垂直に配置された、請求項2に記載の大気圧プラズマ装置。
- 前記接地電極は、前記誘電体バリアと離隔したハウジングと、前記大気圧プラズマを噴出する前記複数の噴射口を有する接地板とを含む、請求項3に記載の大気圧プラズマ装置。
- 前記複数の噴射口は、前記ディスクの直径の1/20〜1/3の範囲の直径を有する、請求項4に記載の大気圧プラズマ装置。
- 前記遮蔽板は前記電圧電極と直接接触し、前記遮蔽板は前記接地板と所定距離離隔した、請求項4に記載の大気圧プラズマ装置。
- 前記接地板は、前記遮蔽板と実質的に平行である、請求項6に記載の大気圧プラズマ装置。
- 前記接地板及び前記ディスクは、それぞれ、平面視において円形、楕円形及び多角形のいずれか1つの形状を有する、請求項4に記載の大気圧プラズマ装置。
- 前記接地板は、前記ハウジングと一体に形成された、請求項4に記載の大気圧プラズマ装置。
- プラズマ発生電力を供給する高周波電源と、
反応ガスを貯蔵及び供給するガス供給器とをさらに含む、請求項1に記載の大気圧プラズマ装置。 - ガス圧力調節器及びガス圧力表示器をさらに含む、請求項10に記載の大気圧プラズマ装置。
- ガス流量調節器及びガス流量表示器をさらに含む、請求項10に記載の大気圧プラズマ装置。
- 反応ガスによって生成された大気圧プラズマは、全て前記複数の噴射口を介して噴射される、請求項1に記載の大気圧プラズマ装置。
- 前記電圧電極は、第1方向に長く延びたロッドと、ロッドの先端にロッドと連結されたディスクとを含み、
前記ロッドは、電力ケーブルを内蔵した非絶縁物質からなり、前記ディスクは導電性物質からなる、請求項1に記載の大気圧プラズマ装置。 - 前記誘電体バリアは、円筒状のボディーと、前記ボディーの先端に連結された遮蔽板と、前記ボディーの後端に連結された後面遮蔽板とを含み、
前記電圧電極は前記後面遮蔽板を貫通する、請求項1に記載の大気圧プラズマ装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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KR10-2017-0060330 | 2017-05-16 | ||
KR1020170060330A KR101880852B1 (ko) | 2017-05-16 | 2017-05-16 | 대기압 플라즈마 장치 |
PCT/KR2018/005496 WO2018212527A1 (ko) | 2017-05-16 | 2018-05-14 | 대기압 플라즈마 장치 |
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JP2020520534A true JP2020520534A (ja) | 2020-07-09 |
JP7080252B2 JP7080252B2 (ja) | 2022-06-03 |
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US (1) | US11051389B2 (ja) |
JP (1) | JP7080252B2 (ja) |
KR (1) | KR101880852B1 (ja) |
CN (1) | CN110574140B (ja) |
WO (1) | WO2018212527A1 (ja) |
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CN111886934A (zh) * | 2018-03-20 | 2020-11-03 | 株式会社富士 | 等离子体装置、等离子体生成方法 |
KR102108261B1 (ko) * | 2018-12-21 | 2020-05-11 | 세메스 주식회사 | 기판 처리 장치 |
KR102264120B1 (ko) | 2019-10-25 | 2021-06-14 | 주식회사 지티지웰니스 | 피부 치료용 플라즈마 발생장치 |
JP7351245B2 (ja) * | 2020-03-13 | 2023-09-27 | ウシオ電機株式会社 | 誘電体バリア式プラズマ発生装置、及び、誘電体バリア式プラズマ発生装置のプラズマ放電開始方法 |
WO2022204484A1 (en) * | 2021-03-25 | 2022-09-29 | Aesthetics Biomedical, Inc. | Plasma fractionation device for skin rejuvenation |
KR102342038B1 (ko) * | 2021-05-21 | 2021-12-23 | 에이치케이엠엔에스(주) | 오존흡입 구조를 구비한 플라즈마 피부치료 장치 |
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CN115317793A (zh) * | 2022-09-05 | 2022-11-11 | 深圳市利孚医疗技术有限公司 | 一种低温惰性气体等离子的皮肤治疗装置 |
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JP2010536131A (ja) * | 2007-08-08 | 2010-11-25 | ネオプラス ゲゼルシャフト ミット ベシュレンクテル ハフツング | プラズマ支援式の表面処理のための方法及び装置 |
JP2013145719A (ja) * | 2012-01-16 | 2013-07-25 | Mitsubishi Electric Corp | プラズマ処理装置及びプラズマ処理方法 |
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CN110574140B (zh) | 2022-02-22 |
KR101880852B1 (ko) | 2018-07-20 |
CN110574140A (zh) | 2019-12-13 |
US11051389B2 (en) | 2021-06-29 |
US20200205277A1 (en) | 2020-06-25 |
WO2018212527A1 (ko) | 2018-11-22 |
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