JP2020186278A - Photocurable composition and photocurable composition for optical waveguide - Google Patents
Photocurable composition and photocurable composition for optical waveguide Download PDFInfo
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- JP2020186278A JP2020186278A JP2019089269A JP2019089269A JP2020186278A JP 2020186278 A JP2020186278 A JP 2020186278A JP 2019089269 A JP2019089269 A JP 2019089269A JP 2019089269 A JP2019089269 A JP 2019089269A JP 2020186278 A JP2020186278 A JP 2020186278A
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- photocurable composition
- optical waveguide
- photocurable
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- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 125000004985 dialkyl amino alkyl group Chemical group 0.000 description 1
- 125000004984 dialkylaminoalkoxy group Chemical group 0.000 description 1
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000006232 ethoxy propyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- LSHROXHEILXKHM-UHFFFAOYSA-N n'-[2-[2-[2-(2-aminoethylamino)ethylamino]ethylamino]ethyl]ethane-1,2-diamine Chemical compound NCCNCCNCCNCCNCCN LSHROXHEILXKHM-UHFFFAOYSA-N 0.000 description 1
- JDEJGVSZUIJWBM-UHFFFAOYSA-N n,n,2-trimethylaniline Chemical compound CN(C)C1=CC=CC=C1C JDEJGVSZUIJWBM-UHFFFAOYSA-N 0.000 description 1
- YQYUUNRAPYPAPC-UHFFFAOYSA-N n,n-diethyl-2-methylaniline Chemical compound CCN(CC)C1=CC=CC=C1C YQYUUNRAPYPAPC-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N p-toluenesulfonic acid Substances CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- DPBLXKKOBLCELK-UHFFFAOYSA-O pentylazanium Chemical compound CCCCC[NH3+] DPBLXKKOBLCELK-UHFFFAOYSA-O 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- JBCNRNJVFFSPAT-UHFFFAOYSA-N phenyl(tripropyl)azanium Chemical compound CCC[N+](CCC)(CCC)C1=CC=CC=C1 JBCNRNJVFFSPAT-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- FSDNTQSJGHSJBG-UHFFFAOYSA-N piperidine-4-carbonitrile Chemical compound N#CC1CCNCC1 FSDNTQSJGHSJBG-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003458 sulfonic acid derivatives Chemical class 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- XAMMKFSEEQGBIC-UHFFFAOYSA-N tetra(propan-2-yl)azanium Chemical compound CC(C)[N+](C(C)C)(C(C)C)C(C)C XAMMKFSEEQGBIC-UHFFFAOYSA-N 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- GJSGYPDDPQRWPK-UHFFFAOYSA-N tetrapentylammonium Chemical compound CCCCC[N+](CCCCC)(CCCCC)CCCCC GJSGYPDDPQRWPK-UHFFFAOYSA-N 0.000 description 1
- OSBSFAARYOCBHB-UHFFFAOYSA-N tetrapropylammonium Chemical compound CCC[N+](CCC)(CCC)CCC OSBSFAARYOCBHB-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical class [H]S* 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- OKYDCMQQLGECPI-UHFFFAOYSA-N thiopyrylium Chemical compound C1=CC=[S+]C=C1 OKYDCMQQLGECPI-UHFFFAOYSA-N 0.000 description 1
- PYYQAJOWIVOEHV-UHFFFAOYSA-N tributyl(phenyl)azanium Chemical compound CCCC[N+](CCCC)(CCCC)C1=CC=CC=C1 PYYQAJOWIVOEHV-UHFFFAOYSA-N 0.000 description 1
- JJPVWQWOOQYHCB-UHFFFAOYSA-N triethyl(phenyl)azanium Chemical compound CC[N+](CC)(CC)C1=CC=CC=C1 JJPVWQWOOQYHCB-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 1
- ZNEOHLHCKGUAEB-UHFFFAOYSA-N trimethylphenylammonium Chemical compound C[N+](C)(C)C1=CC=CC=C1 ZNEOHLHCKGUAEB-UHFFFAOYSA-N 0.000 description 1
- RSHJVJMBXVATOF-UHFFFAOYSA-N tripentyl(phenyl)azanium Chemical compound CCCCC[N+](CCCCC)(CCCCC)C1=CC=CC=C1 RSHJVJMBXVATOF-UHFFFAOYSA-N 0.000 description 1
- JODJRDDQVZMRIY-UHFFFAOYSA-N trityloxyboronic acid Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(OB(O)O)C1=CC=CC=C1 JODJRDDQVZMRIY-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 235000008979 vitamin B4 Nutrition 0.000 description 1
Abstract
Description
本発明は、光硬化性組成物および光導波路用光硬化性組成物に関する。 The present invention relates to photocurable compositions and photocurable compositions for optical waveguides.
光ファイバを介した光通信システムには、光ファイバの両端に接続され、光と電気信号との相互変換を行う光モジュールが設けられる。近年、光ファイバと同様な機能を有する光伝送媒体としての光導波路を用いる光モジュールの組み付け技術が一般的である。さらに、最近は、光硬化性樹脂溶液に光ファイバを用いてビーム状のUV光や波長450nm程度の青色光(以下、「UV光等」)を照射し、自己形成光導波路を形成する技術が報告されている。ここで、自己形成光導波路とは、光硬化性樹脂中で重合体に閉じ込められながら、連続的に、重合領域を光の進行方向に沿って長尺状に成長させて得られる透明な重合体である。軸ずれのない光導波路が容易に形成できる特徴がある(特許文献1、特許文献2)。 An optical communication system via an optical fiber is provided with an optical module connected to both ends of the optical fiber to perform mutual conversion between optical and electric signals. In recent years, an optical module assembly technique using an optical waveguide as an optical transmission medium having the same function as an optical fiber has become common. Further, recently, a technique for forming a self-forming optical waveguide by irradiating a photocurable resin solution with beam-shaped UV light or blue light having a wavelength of about 450 nm (hereinafter, “UV light or the like”) using an optical fiber has been developed. It has been reported. Here, the self-formed optical waveguide is a transparent polymer obtained by continuously growing a polymerization region in a long shape along the traveling direction of light while being confined in the polymer in a photocurable resin. Is. It has a feature that an optical waveguide without axis deviation can be easily formed (Patent Documents 1 and 2).
ところで、シリコン基板に電気素子と光素子とが形成されたシリコンフォトニクス素子(シリコンチップ)は、近年の光通信速度の飛躍的な増大に加え、益々小型化、精密化が進行している。それに伴い、シリコンチップと光ファイバや光モジュールとの接続に精密アライメント技術が必要となり困難さが増大している。
そこで、シリコンフォトニクスにおいて小型化されるシリコンチップの接続手段として自己形成光導波路技術の適用が想定される。
しかし、シリコンチップを構成するシリコンは、波長(λ)1000nm以上の近赤外線領域において光透過性を有するため、従来、UV光等の照射による光硬化性樹脂の重合によって光導波路を形成している技術は適用が困難である。
By the way, silicon photonics elements (silicon chips) in which electric elements and optical elements are formed on a silicon substrate are becoming smaller and more precise in addition to the dramatic increase in optical communication speed in recent years. As a result, precision alignment technology is required to connect the silicon chip to the optical fiber or optical module, and the difficulty is increasing.
Therefore, the application of self-forming optical waveguide technology is envisioned as a means for connecting silicon chips to be miniaturized in silicon photonics.
However, since the silicon constituting the silicon chip has light transmission in the near infrared region having a wavelength (λ) of 1000 nm or more, conventionally, an optical waveguide is formed by polymerizing a photocurable resin by irradiation with UV light or the like. The technology is difficult to apply.
本発明の目的は、低エネルギの近赤外線を用いる自己形成光導波路の形成が可能な光硬化性組成物を提供することにある。 An object of the present invention is to provide a photocurable composition capable of forming a self-forming optical waveguide using low energy near infrared rays.
本発明によれば、2官能アクリレート化合物と、ラジカル発生剤と、3級アミン化合物と、近赤外線感光性色素と、を含むことを特徴とする光硬化性組成物が提供される。
ここで、前記ラジカル発生剤は、有機ホウ素塩であることが好ましい。
前記ラジカル発生剤は、有機ホウ素アンモニウム塩であることが好ましい。
前記近赤外線感光性色素は、波長(λ)1000nm以上に吸収極大を有するものであることが好ましい。
前記近赤外線感光性色素は、ジイモニウム色素であるものが好ましい。
さらに、本発明によれば、上記の光硬化性組成物を含むことを特徴とする光導波路用光硬化性組成物が提供される。
According to the present invention, there is provided a photocurable composition comprising a bifunctional acrylate compound, a radical generator, a tertiary amine compound, and a near-infrared photosensitive dye.
Here, the radical generator is preferably an organoboron salt.
The radical generator is preferably an organoboron ammonium salt.
The near-infrared photosensitive dye preferably has an absorption maximum at a wavelength (λ) of 1000 nm or more.
The near-infrared photosensitive dye is preferably a diimonium dye.
Further, according to the present invention, there is provided a photocurable composition for an optical waveguide, which comprises the above-mentioned photocurable composition.
本発明によれば、低エネルギの近赤外線を用いる自己形成光導波路の形成が可能な光硬化性組成物が得られる。 According to the present invention, a photocurable composition capable of forming a self-forming optical waveguide using low-energy near-infrared rays can be obtained.
以下、本発明を実施するための形態について説明する(以下、実施の形態)。尚、本発明は、以下の実施の形態に限定されるものではなく、その要旨の範囲内で種々変形して実施することができる。 Hereinafter, embodiments for carrying out the present invention will be described (hereinafter, embodiments). The present invention is not limited to the following embodiments, and can be variously modified and implemented within the scope of the gist thereof.
(2官能アクリレート化合物)
本実施の形態で使用する2官能アクリレート化合物は、光を照射することにより重合反応を生じ硬化する化合物であって、光硬化性2官能アクリレート化合物、光硬化性2官能メタリレート化合物が挙げられる。
(Bifunctional acrylate compound)
The bifunctional acrylate compound used in the present embodiment is a compound that undergoes a polymerization reaction and is cured by irradiating with light, and examples thereof include a photocurable bifunctional acrylate compound and a photocurable bifunctional metallilate compound.
光硬化性2官能アクリレート化合物の具体例は、例えば、2−ヒドロキシ−3−アクリロイロキシプロピルメタクリレート、ポリエチレングリコールジアクリレート、プロポキシ化エトキシ化ビスフェノールAジアクリレート、エトキシ化ビスフェノールAジアクリレート、9,9−ビス[4−(2−アクリロイルオキシエトキシ)フェニル]フルオレン、プロポキシ化ビスフェノールAジアクリレート、トリシクロデカンジメタノールジアクリレート、1,10−デカンジオールジアクリレート、1,6−ヘキサンジオールジアクリレート、1,9−ノナンジオールジアクリレート、ジプロピレングリコールジアクリレート、トリプロピレングリコールジアクリレート、ポリプロピレングリコールジアクリレート、ポリテトラメチレングリコールジアクリレート等が挙げられる。 Specific examples of the photocurable bifunctional acrylate compound include, for example, 2-hydroxy-3-acryloyloxypropyl methacrylate, polyethylene glycol diacrylate, propoxylated ethoxylated bisphenol A diacrylate, ethoxylated bisphenol A diacrylate, 9,9. -Bis [4- (2-acryloyloxyethoxy) phenyl] fluorene, propoxylated bisphenol A diacrylate, tricyclodecanedimethanol diacrylate, 1,10-decanediol diacrylate, 1,6-hexanediol diacrylate, 1 , 9-Nonandiol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, polypropylene glycol diacrylate, polytetramethylene glycol diacrylate and the like.
光硬化性2官能メタクリレート化合物の具体例は、例えば、エチレングリコールジメタクリレート、ジエチレングリコールジメタクリレート、トリエチレングリコールジメタクリレート、ポリエチレングリコールジメタクリレート、エトキシ化ビスフェノールAジメタクリレート、トリシクロデカンジメタノールジメタクリレート、1.10−デカンジオールジメタクリレート、1,6−ヘキサンジオールジメタクリレート、1,9−ノナンジオールジメタクリレート、ネオペンチルグリコールジメタクリレート、エトキシ化ポリプロピレングリコールジメタクリレート、グリセリンジメタクリレート、ポリプロピレングリコールジメタクリレート等が挙げられる。 Specific examples of the photocurable bifunctional methacrylate compound include, for example, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, polyethylene glycol dimethacrylate, ethoxylated bisphenol A dimethacrylate, tricyclodecanedimethanol dimethacrylate, 1 .10-Decandiol dimethacrylate, 1,6-hexanediol dimethacrylate, 1,9-nonanediol dimethacrylate, neopentyl glycol dimethacrylate, ethoxylated polypropylene glycol dimethacrylate, glycerin dimethacrylate, polypropylene glycol dimethacrylate, etc. Be done.
これらの光硬化性2官能アクリレート化合物、光硬化性2官能メタクリレート化合物は、1種または2種以上を組み合わせて用いることができる。これらの中でも、エトキシ化ビスフェノールAジアクリレート(2,2−ビス[4−(アクリルオキシポリエトキシ)フェニル]プロパン)、エトキシ化ビスフェノールAジメタクリレート(2,2−ビス[4−(メタクリルオキシポリエトキシ)フェニル]プロパン)が好ましい。 These photocurable bifunctional acrylate compounds and photocurable bifunctional methacrylate compounds can be used alone or in combination of two or more. Among these, ethoxylated bisphenol A diacrylate (2,2-bis [4- (acrylicoxypolyethoxy) phenyl] propane) and ethoxylated bisphenol A dimethacrylate (2,2-bis [4- (methacrylicoxypolyethoxy) ethoxy) ) Phenyl] propane) is preferred.
(ラジカル発生剤)
本実施の形態におけるラジカル発生剤としては、例えば、ホウ素化合物、ヨードニウム塩、多ハロゲン化合物、有機過酸化物、ビスイミダゾール、チタノセン、スルホン酸誘導体およびN−フェニルグリシンからなる群から選ばれるいずれか1種以上が挙げられる。これらのラジカル発生剤は1種または2種以上を組み合わせて用いることができる。これらのラジカル発生剤の中でも、ホウ素化合物が好ましい。
ホウ素化合物としては、有機ホウ素塩が好ましく、中でも、下記一般式(1)で表されるアンモニウムカチオンと有機ホウ素アニオンとから構成される有機ホウ素アンモニウム塩が挙げられる。
(Radical generator)
The radical generator in the present embodiment is, for example, any one selected from the group consisting of boron compounds, iodonium salts, polyhalogen compounds, organic peroxides, bisimidazoles, titanosen, sulfonic acid derivatives and N-phenylglycine. More than seeds can be mentioned. These radical generators can be used alone or in combination of two or more. Among these radical generators, boron compounds are preferable.
As the boron compound, an organic boron salt is preferable, and among them, an organic boron ammonium salt composed of an ammonium cation represented by the following general formula (1) and an organic boron anion can be mentioned.
ここで、式(1)中、R1は、それぞれ独立に水素原子、アルキル基、アリール基、アリル基、アラルキル基、アルケニル基、アルキニル基、および脂環基からなる群から選択される。また、R2は、それぞれ独立にアルキル基、アリール基、アリル基、アラルキル基、アルケニル基、アルキニル基、および脂環基からなる群から選択される。
アルキル基の代表的な例として、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、ヘキシル基、オクチル基、デシル基、ステアリル基等が挙げられる。アルキル基は、例えば、1つ以上のハロゲン基、シアノ基、アシルオキシ基、アシル基、アルコキシ基、またはヒドロキシル基で置換されていても良い。
Here, in the formula (1), R 1 is independently selected from the group consisting of a hydrogen atom, an alkyl group, an aryl group, an allyl group, an aralkyl group, an alkenyl group, an alkynyl group, and an alicyclic group. Further, R 2 is independently selected from the group consisting of an alkyl group, an aryl group, an allyl group, an aralkyl group, an alkenyl group, an alkynyl group, and an alicyclic group.
Typical examples of alkyl groups are methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, hexyl group, octyl group, decyl group and stearyl group. Group etc. can be mentioned. The alkyl group may be substituted with, for example, one or more halogen groups, cyano groups, acyloxy groups, acyl groups, alkoxy groups, or hydroxyl groups.
アリール基の代表的な例としては、フェニル基、p−トリル基、キシリル基、メシチル基、クメニル基、p−メトキシフェニル基、ナフチル基、2,4−ビス(トリフルオロメチル)フェニル基、p−フルオロフェニル基、p−クロロフェニル基、p−ブロモフェニル基等が挙げられる。アラルキル基の代表的な例としては、ベンジル基、p−メチルベンジル、p−メトキシベンジル等がある。アルケニル基の代表的な例としては、ビニル基、1−プロペニル基、1−ブテニル基等が挙げられる。アルキニル基の代表的な例としては、エテニル基、2−tert−ブチルエテニル基、2−フェニルエテニル基等が挙げられる。また、脂環基の代表的な例としては、シクロブチル基、シクロペンチル基、シクロヘキシル基等が挙げられる。 Typical examples of aryl groups are phenyl group, p-tolyl group, xsilyl group, mesityl group, cumenyl group, p-methoxyphenyl group, naphthyl group, 2,4-bis (trifluoromethyl) phenyl group, p. -Fluorophenyl group, p-chlorophenyl group, p-bromophenyl group and the like can be mentioned. Typical examples of the aralkyl group include a benzyl group, p-methylbenzyl, p-methoxybenzyl and the like. Typical examples of the alkenyl group include a vinyl group, a 1-propenyl group, a 1-butenyl group and the like. Typical examples of the alkynyl group include an ethenyl group, a 2-tert-butylethenyl group, a 2-phenylethenyl group and the like. Moreover, typical examples of an alicyclic group include a cyclobutyl group, a cyclopentyl group, a cyclohexyl group and the like.
アンモニウムカチオンの具体例としては、例えば、テトラメチルアンモニウム、テトラエチルアンモニウム、テトラプロピルアンモニウム、テトライソプロピルアンモニウム、テトラブチルアンモニウム、テトラ−sec−ブチルアンモニウム、テトラ−tert−ブチルアンモニウム、テトラペンチルアンモニウム、テトライソペンチルアンモニウム、テトラネオペンチルアンモニウム、テトラ−tert−ペンチルアンモニウム等のアルキル基含有アンモニウムカチオン; Specific examples of the ammonium cation include tetramethylammonium, tetraethylammonium, tetrapropylammonium, tetraisopropylammonium, tetrabutylammonium, tetra-sec-butylammonium, tetra-tert-butylammonium, tetrapentylammonium, and tetraisopentyl. Alkyl group-containing ammonium cations such as ammonium, tetraneopentylammonium, tetra-tert-pentylammonium;
テトラハイドロジェンアンモニウム、トリメチルハイドロジェンアンモニウム、トリエチルハイドロジェンアンモニウム、トリプロピルハイドロジェンアンモニウム、トリプロピルハイドロジェンアンモニウム、トリブチルハイドロジェンアンモニウム、トリペンチルハイドロジェンアンモニウム等の水素含有アンモニウムカチオン; Hydrogen-containing ammonium cations such as tetrahydrogenammonium, trimethylhydrogenammonium, triethylhydrogenammonium, tripropylhydrogenammonium, tripropylhydrogenammonium, tributylhydrogenammonium, tripentylhydrogenammonium;
ベンジルトリメチルアンモニウム、ベンジルトリエチルアンモニウム、ベンジルトリプロピルアンモニウム、ベンジルトリブチルアンモニウム、ベンジルトリペンチルアンモニウム、フェニルトリメチルアンモニウム、フェニルトリエチルアンモニウム、フェニルトリプロピルアンモニウム、フェニルトリブチルアンモニウム、フェニルトリペンチルアンモニウム等のベンジル基含有アンモニウムカチオン; Benzyl group-containing ammonium cations such as benzyltrimethylammonium, benzyltriethylammonium, benzyltripropylammonium, benzyltributylammonium, benzyltripentylammonium, phenyltrimethylammonium, phenyltriethylammonium, phenyltripropylammonium, phenyltributylammonium, phenyltripentylammonium, etc. ;
トリメチルビニルアンモニウム、トリエチルビニルアンモニウム、トリプロピルビニルアンモニウム、トリブチルビニルアンモニウム、トリペンチルビニルアンモニウム等のビニル基含有アンモニウムカチオン; Vinyl group-containing ammonium cations such as trimethylvinylammonium, triethylvinylammonium, tripropylvinylammonium, tributylvinylammonium, and trypentylvinylammonium;
トリメチルアリルアンモニウム、トリエチルアリルアンモニウム、トリプロピルアリルアンモニウム、トリブチルアリルアンモニウム、トリペンチルアリルアンモニウム、ジメチルジアリルアンモニウム、ジエチルジアリルアンモニウム、ジプロピルジアリルアンモニウム、ジブチルジアリルアンモニウム、ジペンチルジアリルアンモニウム等のアリル基含有アンモニウムカチオン; Allyl group-containing ammonium cations such as trimethylallylammonium, triethylallylammonium, tripropylallylammonium, tributylallylammonium, trypentylallylammonium, dimethyldialylammonium, diethyldiallylammonium, dipropyldialylammonium, dibutyldialylammonium, dipentyldiallylammonium;
(2−メトキシエトキシメチル)トリメチルアンモニウム、(2−メトキシエトキシメチル)トリエチルアンモニウム、(2−メトキシエトキシメチル)トリプロピルアンモニウム、(2−メトキシエトキシメチル)トリブチルアンモニウム、(2−メトキシエトキシメチル)トリペンチルアンモニウム等のアルコキシアルキル基含有アンモニウムカチオン;ヘキサメソニウム、デカメソニウム、フェロセニルメチルトリメチルアンモニウム、フェロセニルメチルトリエチルアンモニウム、フェロセニルメチルトリプロピルアンモニウム、フェロセニルメチルトリブチルアンモニウム、フェロセニルメチルトリペンチルアンモニウム等が挙げられる。 (2-methoxyethoxymethyl) trimethylammonium, (2-methoxyethoxymethyl) triethylammonyl, (2-methoxyethoxymethyl) tripropylammonium, (2-methoxyethoxymethyl) tributylammonium, (2-methoxyethoxymethyl) tripentyl Alkyl alkyl group-containing ammonium cations such as ammonium; hexamesonium, decamesonium, ferrocenylmethyltrimethylammonium, ferrocenylmethyltriethylammonium, ferrocenylmethyltripropylammonium, ferrocenylmethyltributylammonium, ferrocenylmethyltri Examples include pentylammonium.
さらに、コリン、クロロコリン、アセチルコリン、アセチルチオコリン、ブチリルコリン、ブチリルチオコリン、ベンゾイルコリン、ベンゾイルチオコリン、メタコリン、メタクロイルコリン、ラウロイルコリン等のコリン類が挙げられる。 Further, cholines such as choline, chlorocholine, acetylcholine, acetylthiocholine, butyrylcholine, butyrylthiocholine, benzoylcholine, benzoylthiocholine, metacholine, metacloylcholine, lauroylcholine and the like can be mentioned.
有機ホウ素アニオンとしてはトリアリールモノアルキルホウ素アニオンが挙げられる。具体的な化合物としては、例えば、トリフェニルメチルボレート、トリフェニルエチルボレート、トリフェニルプロピルボレート、トリフェニルイソプロピルボレート、トリフェニルブチルボレート、トリフェニルイソブチルボレート、トリフェニル−sec−ブチルボレート、トリフェニル−tert−ブチルボレート、トリス(p−トリル)ブチルボレート、トリメシチルブチルボレート、トリス(p−アニシル)ブチルボレート、トリス(2,4,5−トリフロロフェニル)ブチルボレート、トリス(ペンタフロロフェニル)ブチルボレート等が挙げられる。 Examples of the organoboron anion include triarylmonoalkylboron anions. Specific compounds include, for example, triphenylmethylborate, triphenylethylborate, triphenylpropylborate, triphenylisopropylborate, triphenylbutylborate, triphenylisobutylborate, triphenyl-sec-butylborate, triphenyl-. tert-butylborate, tris (p-tolyl) butylborate, trimesityl butylborate, tris (p-anisyl) butylborate, tris (2,4,5-trifluorophenyl) butylborate, tris (pentafluorophenyl) butyl Butyl and the like can be mentioned.
本実施の形態が適用される光硬化性組成物におけるラジカル発生剤の配合量は、光硬化性組成物中の2官能アクリレート化合物100重量部に対し、ラジカル発生剤0.1重量部以上、好ましくは0.3重量部以上である。但し、通常10重量部以下、好ましくは5重量部以下である。 The amount of the radical generator to be blended in the photocurable composition to which the present embodiment is applied is preferably 0.1 part by weight or more of the radical generator with respect to 100 parts by weight of the bifunctional acrylate compound in the photocurable composition. Is 0.3 parts by weight or more. However, it is usually 10 parts by weight or less, preferably 5 parts by weight or less.
(3級アミン化合物)
本実施の形態における3級アミン化合物は、前述のラジカル発生剤と併用して、光硬化性2官能アクリレート化合物の光重合を促進する化合物である。
3級アミン化合物の具体例としては、例えば、トリエタノールアミン、メチルジエタノールアミン、トリイソプロパノールアミン、ジエチレントリアミン、テトラエチレンペンタミン、ペンタエチレンヘキサミン、アミノエチルエタノールアミン、n−アミノピペラジン、ジアミノジフェニルメタン、ジメチルアニリン、ジエチルアニリン、ジメチルトルイジン、ジエチルトルイジン、ジメチルアミノエチルメタアクリレート、2.4.6−シメチルアミノメチルフエノール、4,4’−ジメチルアミノベンゾフェノン、4,4’−ジエチルアミノベンゾフェノン、2−ジメチルアミノ安息香酸エチル、4−ジメチルアミノ安息香酸エチル、4−ジメチルアミノ安息香酸(n−ブトキシ)エチル、4−ジメチルアミノ安息香酸イソアミル、4−ジメチルアミノ安息香酸2−エチルヘキシル等が挙げられる。
(Primary amine compound)
The tertiary amine compound in the present embodiment is a compound that promotes photopolymerization of a photocurable bifunctional acrylate compound in combination with the above-mentioned radical generator.
Specific examples of the tertiary amine compound include triethanolamine, methyldiethanolamine, triisopropanolamine, diethylenetriamine, tetraethylenepentamine, pentaethylenehexamine, aminoethylethanolamine, n-aminopiperazin, diaminodiphenylmethane, dimethylaniline, and the like. Diethylaniline, dimethyltoluidine, diethyltoluidine, dimethylaminoethyl methacrylate, 2.4.6-simmethylaminomethylphenyl, 4,4'-dimethylaminobenzophenone, 4,4'-diethylaminobenzophenone, 2-dimethylaminobenzoic acid Examples thereof include ethyl, ethyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate (n-butoxy), isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate and the like.
これらの3級アミン化合物は1種または2種以上を組み合わせて用いることができる。これらの中でも、メチルジエタノールアミン、4−ジメチルアミノ安息香酸エチル、4−ジメチルアミノ安息香酸(n−ブトキシ)エチル、4−ジメチルアミノ安息香酸イソアミル、4−ジメチルアミノ安息香酸2−エチルヘキシル等が好ましい。 These tertiary amine compounds can be used alone or in combination of two or more. Among these, methyldiethanolamine, ethyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate (n-butoxy), isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate and the like are preferable.
本実施の形態が適用される光硬化性組成物において、ラジカル発生剤および3級アミン化合物を併用することにより、組成物に含まれる2官能アクリレート化合物の光硬化反応に必要な近赤外線の照射エネルギを、3級アミン化合物を併用しない場合と比較して大幅に低減(約1/5000程度)する。
3級アミン化合物の配合量は、光硬化性組成物中の2官能アクリレート化合物100重量部に対し、3級アミン化合物0.1重量部以上、好ましくは0.3重量部以上である。但し、通常5重量部以下、好ましくは3重量部以下である。3級アミン化合物の配合量が過度に少ないと、2官能アクリレート化合物の重合反応に高エネルギの光照射が必要になる傾向がある。
In the photocurable composition to which the present embodiment is applied, the irradiation energy of near infrared rays required for the photocuring reaction of the bifunctional acrylate compound contained in the composition by using the radical generator and the tertiary amine compound in combination. Is significantly reduced (about 1/5000) as compared with the case where the tertiary amine compound is not used in combination.
The blending amount of the tertiary amine compound is 0.1 part by weight or more, preferably 0.3 part by weight or more, based on 100 parts by weight of the bifunctional acrylate compound in the photocurable composition. However, it is usually 5 parts by weight or less, preferably 3 parts by weight or less. If the amount of the tertiary amine compound is excessively small, high-energy light irradiation tends to be required for the polymerization reaction of the bifunctional acrylate compound.
(近赤外線感光性色素)
本実施の形態において、近赤外線とは、極大吸収波長領域が波長λ700nm〜2500nmの光(電磁波)をいう。本実施の形態で使用する近赤外線感光性色素は、極大吸収波長をλ900nm〜1800nmの範囲に有する色素であることが好ましく、さらに、極大吸収波長を、λ1000nm〜1800nmの範囲に有する色素であることが好ましい。
(Near infrared photosensitive dye)
In the present embodiment, the near infrared ray means light (electromagnetic wave) having a maximum absorption wavelength region of λ700 nm to 2500 nm. The near-infrared photosensitive dye used in the present embodiment is preferably a dye having a maximum absorption wavelength in the range of λ900 nm to 1800 nm, and further, a dye having a maximum absorption wavelength in the range of λ1000 nm to 1800 nm. Is preferable.
近赤外線吸収色素の種類としては、分子内にアニオン部位およびカチオン部位から選ばれる少なくとも1種(イオン部位)を含む色素が挙げられる。具体的には、例えば、シアニン色素、インドシアニン色素、チオシアニン色素、ポリメチン色素、フタロシアニン色素、ピリリウム色素、チオピリリウム色素、アントラキノン色素、アミニウム色素、イミニウム色素、ジインモニウム色素、アズレニウム色素、クロコニウム色素、チオールニッケル錯塩色素、スクアリリウム色素、ナフトキノン色素、フルギド色素、ピロロピロール系色素、ジチオレン系色素、ポルフィリン色素、アゾ色素、トリアリールメタン色素、ペリレン色素等を挙げることができる。これらの近赤外線吸収色素は1種または2種以上を組み合わせて用いることができる。これらの中でも、ジイモニウム色素が好ましい。 Examples of the type of near-infrared absorbing dye include a dye containing at least one type (ion site) selected from an anion site and a cation site in the molecule. Specifically, for example, cyanine pigment, indocyanine pigment, thiocyanine pigment, polymethine pigment, phthalocyanine pigment, pyrylium pigment, thiopyrylium pigment, anthraquinone pigment, aminium pigment, iminium pigment, diimmonium pigment, azulenium pigment, croconium pigment, thiol nickel complex salt. Examples thereof include pigments, squarylium pigments, naphthoquinone pigments, flugide pigments, pyrolopyrrole pigments, dithiolene pigments, porphyrin pigments, azo pigments, triarylmethane pigments, and perylene pigments. These near-infrared absorbing dyes can be used alone or in combination of two or more. Among these, the diimonium pigment is preferable.
ここで、ジイモニウム色素は、式(2)で表わされる化合物であることが好ましい。 Here, the diimonium dye is preferably a compound represented by the formula (2).
ここで、式(2)中、X−は対アニオンである。R3はそれぞれ独立に炭素数1〜7のアルキル基又は炭素数1〜5のアルコキシアルキル基を表す。 Here, in equation (2), X − is a counter anion. R 3 independently represents an alkyl group having 1 to 7 carbon atoms or an alkoxyalkyl group having 1 to 5 carbon atoms.
対アニオンの例としては、ハロゲンイオン(Cl−、Br−、I−)、p−トルエンスルホン酸イオン、エチル硫酸イオン、SO4 2−、SbF6 −、PF6 −、BF4 −、B(C6F5)4 −、ClO4 −、トリス(ハロゲノアルキルスルホニル)メチドアニオン(例えば、(CF3SO2)3C−)、ジ(ハロゲノアルキルスルホニル)イミドアニオン(例えば(CF3SO2)2N−)、テトラシアノボレートアニオン等が挙げられる。これらの中でも、トリス(トリフルオロメタンスルホニル)メチドアニオンが好ましい。 Examples of counter anions include halogen ions (Cl − , Br − , I − ), p-toluenesulfonic acid ions, ethyl sulfate ions, SO 4 2- , SbF 6 − , PF 6 − , BF 4 − , B ( C 6 F 5) 4 -, ClO 4 -, tris (halogenoalkyl alkylsulfonyl) methide anion (e.g., (CF 3 SO 2) 3 C -), di (halogenoalkyl) imide anion (e.g. (CF 3 SO 2) 2 N − ), tetracyanoborate anion and the like can be mentioned. Among these, tris (trifluoromethanesulfonyl) methideanion is preferable.
式(2)のR3における炭素数1〜7のアルキル基の具体例としては、例えば、メチル基、エチル基、n−プロピル基、iso−プロピル基、n−ブチル基、iso−ブチル基、sec−ブチル基、t−ブチル基、n−ペンチル基、iso−ペンチル基、neo−ペンチル基、1,2−ジメチル−プロピル基、n−ヘキシル基、シクロヘキシル基、1,3−ジメチル−ブチル基、1−iso−プロピルプロピル基、1,2−ジメチルブチル基、n−ヘプチル基、1,4−ジメチルペンチル基、2−メチ−1−iso−プロピルプロピル基、1−エチル−3−メチルブチル基、n−オクチル基、2−エチルヘキシル基、3−メチル1−iso−プロピルブチル基、2−メチル−1−iso−プロピル基等が挙げられる。これらの中でも、エチル基、n−ブチル基、イソブチル基が好ましい。 Specific examples of the alkyl group having 1 to 7 carbon atoms in R 3 of formula (2), for example, a methyl group, an ethyl group, n- propyl group, iso- propyl, n- butyl, iso- butyl group, sec-butyl group, t-butyl group, n-pentyl group, iso-pentyl group, neo-pentyl group, 1,2-dimethyl-propyl group, n-hexyl group, cyclohexyl group, 1,3-dimethyl-butyl group , 1-iso-propylpropyl group, 1,2-dimethylbutyl group, n-heptyl group, 1,4-dimethylpentyl group, 2-methi-1-iso-propylpropyl group, 1-ethyl-3-methylbutyl group , N-octyl group, 2-ethylhexyl group, 3-methyl1-iso-propylbutyl group, 2-methyl-1-iso-propyl group and the like. Among these, an ethyl group, an n-butyl group and an isobutyl group are preferable.
式(2)のR3における炭素数1〜5のアルコキシアルキル基としては、メトキシメチル基、メトキシエチル基、エトキシエチル基、プロポキシエチル基、n−ブトキシエチル基、3−メトキシプロピル基、3−エトキシプロピル基、メトキシエトキシメチル基、エトキシエトキシエチル基、ジメトキシメチル基、ジエトチキシメチル基、ジメトキシエチル基、ジエトキシエチル基等が挙げられ、ハロゲン化アルキル基としては、クロロメチル基、2,2,2−トリクロロエチル基、トリフルオロメチル基、1,1,1,3,3,3−ヘキサフルオロ2−プロピル基等が挙げられる。好ましくはメトキシエチル基、エトキシエチル基、プロポキシエチル、n−ブトキシエチル基であり、特に好ましくはメトキシエチル基である。 As the alkoxyalkyl group having 1 to 5 carbon atoms in R 3 of formula (2), methoxymethyl group, methoxyethyl group, ethoxyethyl group, propoxyethyl group, n- butoxyethyl, 3-methoxypropyl group, 3- Examples thereof include an ethoxypropyl group, a methoxyethoxymethyl group, an ethoxyethoxyethyl group, a dimethoxymethyl group, a dietoxymethyl group, a dimethoxyethyl group and a diethoxyethyl group, and examples of the alkyl halide group include a chloromethyl group and 2, Examples thereof include 2,2-trichloroethyl group, trifluoromethyl group and 1,1,1,3,3,3-hexafluoro2-propyl group. It is preferably a methoxyethyl group, an ethoxyethyl group, a propoxyethyl, an n-butoxyethyl group, and particularly preferably a methoxyethyl group.
式(2)のR3における炭素数1〜7のアルキル基が有してもよい置換基としては、例えば、上記の未置換のアルキル基の水素原子がアルコキシ基に置換されたアルコキシアルキル基、アルコキシアルコキシ基に置換されたアルコキシアルコキシアルキル基、アルコキシアルコキシアルコキシ基に置換されたアルコキシアルコキシアルコキシアルキル基等が挙げられ、未置換のアルキル基の水素原子がハロンゲンに置換されたハロゲン化アルキル基、アミノ基に置換されたアミノアルキル基、アルキルアミノ基に置換されたアルキルアミノアルキル基やジアルキルアミノアルキル基、その他アルコキシカルボニルアルキル基、アルキルアミノカルボニルアルキル基、アルコキシスルホニルアルキル基、シアノアルキル基等が挙げられる。 Examples of the substituent which may have an alkyl group having 1 to 7 carbon atoms in R 3 of formula (2), for example, an alkoxyalkyl group in which the hydrogen atom of unsubstituted alkyl group described above is substituted with an alkoxy group, Examples thereof include an alkoxyalkoxyalkyl group substituted with an alkoxyalkoxy group, an alkoxyalkoxyalkoxyalkyl group substituted with an alkoxyalkoxyalkoxy group, and an alkyl halide group in which the hydrogen atom of the unsubstituted alkyl group is substituted with halongen, amino. Examples thereof include an aminoalkyl group substituted with a group, an alkylaminoalkyl group or a dialkylaminoalkyl group substituted with an alkylamino group, an alkoxycarbonylalkyl group, an alkylaminocarbonylalkyl group, an alkoxysulfonylalkyl group, a cyanoalkyl group and the like. ..
式(2)のR3における炭素数1〜5のアルコキシアルキル基が有してもよい置換基としては、例えば、上記の未置換のアルコキシ基の水素原子がアルコキシ基に置換されたアルコキシアルコキシ基、アルコキシアルコキシ基に置換されたアルコキシアルコキシアルコキシ基、アルコキシアルコキシアルコキシ基に置換されたアルコキシアルコキシアルコキシアルコキシ基等が挙げられ、未置換のアルキル基の水素原子がハロンゲンに置換されたハロゲン化アルコキシ基、アミノ基に置換されたアミノアルコキシ基、アルキルアミノ基に置換されたアルキルアミノアルコキシ基やジアルキルアミノアルコキシ基、その他アルコキシカルボニルアルコキシ基、アルキルアミノカルボニルアルコキシ基、アルコキシスルホニルアルコキシ基等が挙げられる。 Formula Examples of the substituent which may have an alkoxyalkyl group having 1 to 5 carbon atoms for R 3 in (2), for example, alkoxyalkoxy groups in which the hydrogen atom of the unsubstituted alkoxy group described above is substituted in the alkoxy group , Alkoxyalkoxyalkoxy group substituted with alkoxyalkoxy group, alkoxyalkoxyalkoxyalkoxy group substituted with alkoxyalkoxyalkoxy group, etc., and a halogenated alkoxy group in which the hydrogen atom of the unsubstituted alkyl group is substituted with halongen, Examples thereof include an aminoalkoxy group substituted with an amino group, an alkylaminoalkoxy group or a dialkylaminoalkoxy group substituted with an alkylamino group, an alkoxycarbonylalkoxy group, an alkylaminocarbonylalkoxy group, and an alkoxysulfonylalkoxy group.
本実施の形態が適用される光硬化性組成物における近赤外線感光性色素の配合量は、光硬化性組成物中の2官能アクリレート化合物100重量部に対し、近赤外線感光性色素0.1重量部以上、好ましくは0.3重量部以上である。但し、通常10重量部以下、好ましくは5重量部以下である。 The blending amount of the near-infrared photosensitive dye in the photocurable composition to which the present embodiment is applied is 0.1 weight by weight of the near-infrared photosensitive dye with respect to 100 parts by weight of the bifunctional acrylate compound in the photocurable composition. Parts or more, preferably 0.3 parts by weight or more. However, it is usually 10 parts by weight or less, preferably 5 parts by weight or less.
<その他の配合剤>
本実施の形態が適用される光硬化性組成物には、必要に応じて、溶剤、重合禁止剤、紫外線吸収剤、光安定剤、酸化防止剤その他の添加剤を配合することができる。
<Other compounding agents>
A solvent, a polymerization inhibitor, an ultraviolet absorber, a light stabilizer, an antioxidant and other additives can be added to the photocurable composition to which this embodiment is applied, if necessary.
本実施の形態が適用される光硬化性組成物は、2官能アクリレート化合物と、ラジカル発生剤、3級アミン化合物及び近赤外線感光性色素からなる組み合わせ系開始剤とを含み、波長(λ)1000nm以上の低エネルギの近赤外光照射による自己形成光導波路の形成が可能である。すなわち、これまでUV光等を使用していた自己形成光導波路の形成技術と比較して、光硬化の閾値が低下し、光通信に使用する低出力光により光導波路が形成できる。
そして、波長(λ)1000nm以上の近赤外光を用いることにより、この波長領域の透過性を有するシリコンを利用するシリコンフォトニクスにおけるインターコネクション形成等が可能となる。
また、近赤外領域の連続レーザ光(CW)の使用は、例えば、小径のシングルモード光ファイバと入力/出力用シリコン製ナノワイヤ導波路とのインターコネクションを形成する際にも、高出力のパルスレーザ光を用いる場合に比較して、シリコン製ナノワイヤが被るダメージを避けることができる。
The photocurable composition to which the present embodiment is applied contains a bifunctional acrylate compound, a radical generator, a tertiary amine compound, and a combination initiator composed of a near-infrared photosensitive dye, and has a wavelength (λ) of 1000 nm. It is possible to form a self-forming optical waveguide by irradiating the above low-energy near-infrared light. That is, the threshold value of photocuring is lowered as compared with the technique for forming a self-formed optical waveguide that has conventionally used UV light or the like, and the optical waveguide can be formed by the low output light used for optical communication.
Then, by using near-infrared light having a wavelength (λ) of 1000 nm or more, it becomes possible to form an interconnection in silicon photonics using silicon having transparency in this wavelength region.
The use of continuous laser light (CW) in the near-infrared region also makes high-power pulses, for example, when forming an interconnection between a small-diameter single-mode optical fiber and an input / output silicon nanowire waveguide. Compared with the case of using laser light, damage to silicon nanowires can be avoided.
以下に、実施例に基づき本発明をさらに詳細に説明するが、本発明は実施例に限定されるものではない。尚、実施例及び比較例中の部及び%は、総て重量基準である。 Hereinafter, the present invention will be described in more detail based on Examples, but the present invention is not limited to Examples. In addition, all parts and% in Examples and Comparative Examples are based on weight.
[実施例1]
以下の操作により光硬化性組成物Iを調製し、次いで、調製した光硬化性組成物Iに近赤外線を照射して自己形成光導波路を形成する。
<光硬化性組成物の調製>
下記の2官能アクリレート化合物(成分1)、ラジカル発生剤(成分2)、3級アミン化合物(成分3)および近赤外線感光性色素(成分4)を配合し、光硬化性組成物Iを調製する。
[Example 1]
The photocurable composition I is prepared by the following operation, and then the prepared photocurable composition I is irradiated with near infrared rays to form a self-forming optical waveguide.
<Preparation of photocurable composition>
The following bifunctional acrylate compound (component 1), radical generator (component 2), tertiary amine compound (component 3) and near-infrared photosensitive dye (component 4) are blended to prepare a photocurable composition I. ..
(光硬化性組成物I)
(成分1)光硬化性2官能アクリレート化合物(2官能アクリレート化合物)
2,2−bis[4−(アクリルオキシジエトキシ)フェニル]プロパン(新中村化学工業株式会社製エトキシ化ビスフェノールAジアクリレート:A−BPE−4)100部
(成分2)ラジカル発生剤
テトラ−n−ブチルアンモニウムトリフェニル−n−ブチルボレート(昭和電工株式会社製有機ホウ素アンモニウム錯体:P3B)0.6部
(成分3)3級アミン化合物
N−メチルジエタノールアミン(Sigma−Aldrich社製:MDEA)0.8部
(成分4)近赤外線感光性色素
ジイモニウム系色素(日本カーリット株式会社製:CIR−960)0.7部
(Photocurable Composition I)
(Component 1) Photocurable bifunctional acrylate compound (bifunctional acrylate compound)
2,2-bis [4- (acrylic oxydiethoxy) phenyl] propane (Nichumura Chemical Industry Co., Ltd. ethoxylated bisphenol A diacrylate: A-BPE-4) 100 parts (component 2) Radical generator tetra-n -Butylammonium triphenyl-n-butylborate (organic boron ammonium complex manufactured by Showa Denko Co., Ltd .: P3B) 0.6 part (component 3) tertiary amine compound N-methyldiethanolamine (manufactured by Sigma-Aldrich: MDEA) 0. 8 parts (component 4) Near infrared photosensitive dye Diimonium dye (manufactured by Nippon Carlit Co., Ltd .: CIR-960) 0.7 parts
<調製手順>
下記手順に従い、光硬化性組成物Iを調製する。
(手順1)
光硬化性2官能アクリレート化合物(A−BPE−4)、ラジカル発生剤(P3B)、ジイモニウム系色素(CIR−960)をサンプル管瓶に入れ、混合液を作製する。このとき、混合液中の光硬化性2官能アクリレート化合物(A−BPE−4)の重量が1,000mg程度の量で作製する。
なお、使用したサンプル管瓶として、アズワン株式会社製ラボランサンプル管瓶No.2(5cc,品番9−851−04)を使用する。
(手順2)
次に、サンプル管瓶中に攪拌子(15mm×φ5mm)を入れ、上記の混合液を室温下で500rpmの条件で12時間以上攪拌する。
(手順3)
続いて、12時間以上攪拌後、サンプル管瓶中の混合液に3級アミン化合物(MDEA)を添加し、さらに室温下で500rpmの条件で混合液を3時間〜4時間攪拌する。
(手順4)
次いで、攪拌を停止し、真空デシケーターおよび真空ポンプを用いて、混合液を減圧下に静置し脱泡を行う。
<Preparation procedure>
The photocurable composition I is prepared according to the following procedure.
(Procedure 1)
A photocurable bifunctional acrylate compound (A-BPE-4), a radical generator (P3B), and a diimonium-based dye (CIR-960) are placed in a sample tube bottle to prepare a mixed solution. At this time, the weight of the photocurable bifunctional acrylate compound (A-BPE-4) in the mixed solution is about 1,000 mg.
As the sample tube bottle used, Labran Sample Tube Bottle No. 1 manufactured by AS ONE Corporation. 2 (5 cc, product number 9-851-04) is used.
(Procedure 2)
Next, a stirrer (15 mm × φ5 mm) is placed in a sample tube bottle, and the above mixed solution is stirred at room temperature at 500 rpm for 12 hours or more.
(Procedure 3)
Subsequently, after stirring for 12 hours or more, the tertiary amine compound (MDEA) is added to the mixed solution in the sample tube bottle, and the mixed solution is further stirred at room temperature at 500 rpm for 3 hours to 4 hours.
(Procedure 4)
Then, the stirring is stopped, and the mixed solution is allowed to stand under reduced pressure using a vacuum desiccator and a vacuum pump to defoam.
<自己形成光導波路の作製>
(光導波路形成用基板)
図1は、光導波路形成用基板10を調製する工程を説明する図である。
先ず、図1(a)に示すように、スライドガラス11(幅26mm×長さ76mm)の片側に光ファイバ12を接着剤14により固定する。次いで、光ファイバ12の先端部13を、粘着テープ15を使用してスライドガラス11の上面に固定する。
スライドガラス11は、松浪硝子工業株式会社製S1112(白縁磨No.2)を用いる。接着剤14は、2液硬化型エポキシ系接着剤(コニシ株式会社製クイック5)、粘着テープ15は、カプトンテープ(日東電工株式会社P−221AMB)を使用する。光ファイバ12については後述する。
<Manufacturing of self-formed optical waveguide>
(Substrate for forming optical waveguide)
FIG. 1 is a diagram illustrating a step of preparing a substrate 10 for forming an optical waveguide.
First, as shown in FIG. 1A, the optical fiber 12 is fixed to one side of the slide glass 11 (width 26 mm × length 76 mm) with the adhesive 14. Next, the tip portion 13 of the optical fiber 12 is fixed to the upper surface of the slide glass 11 using the adhesive tape 15.
As the slide glass 11, S1112 (white edge polishing No. 2) manufactured by Matsunami Glass Industry Co., Ltd. is used. The adhesive 14 uses a two-component curable epoxy adhesive (Quick 5 manufactured by Konishi Co., Ltd.), and the adhesive tape 15 uses Capton tape (Nitto Denko Co., Ltd. P-221AMB). The optical fiber 12 will be described later.
次に、図1(b)に示すように、スライドガラス11の上面に固定した光ファイバ12の先端部13の両側に、先端部13と平行になるように2枚の短冊状カバーガラス16,16を接着剤によりそれぞれ固定する。短冊状カバーガラス16,16(武藤化学株式会社製)は、幅5mm×長さ18mmのものを使用し、スライドガラス11上に隙間ができるように所定の厚さ(0.12mm〜0.17mm)を有している。 Next, as shown in FIG. 1B, two strip-shaped cover glasses 16 and so as to be parallel to the tip 13 on both sides of the tip 13 of the optical fiber 12 fixed to the upper surface of the slide glass 11. Each of 16 is fixed with an adhesive. The strip-shaped cover glasses 16, 16 (manufactured by Muto Chemical Co., Ltd.) are 5 mm wide and 18 mm long, and have a predetermined thickness (0.12 mm to 0.17 mm) so that a gap is formed on the slide glass 11. )have.
続いて、図1(c)に示すように、スライドガラス11の両端に固定した2枚の短冊状カバーガラス16,16の上に、これらを覆うようにカバーガラス17(幅18mm×長さ18mm、厚さ0.12mm〜0.17mm)を被せて固定する。これにより、スライドガラス11と2枚の短冊状カバーガラス16,16とカバーガラス17の間に隙間(セルライク領域)が形成され、後述するように、この隙間に、予め調製した光硬化性組成物Iの混合液が注入される。 Subsequently, as shown in FIG. 1 (c), the cover glass 17 (width 18 mm × length 18 mm) is placed on the two strip-shaped cover glasses 16 and 16 fixed to both ends of the slide glass 11 so as to cover them. , Thickness 0.12 mm to 0.17 mm) and fix. As a result, a gap (cell-like region) is formed between the slide glass 11 and the two strip-shaped cover glasses 16, 16 and the cover glass 17, and as will be described later, a photocurable composition prepared in advance is formed in this gap. A mixture of I is injected.
(自己形成光導波路の形成工程)
図2は、自己形成光導波路(LISW)30の形成工程を説明する図である。尚、ここでは、接着剤14と粘着テープ15の表示を省略している。
図2(a)に示すように、スライドガラス11と2枚の短冊状カバーガラス16,16とカバーガラス17の間に形成されたセルライク領域20(隙間)に、毛細効果によって光硬化性組成物Iの溶液を満たし、光ファイバ12の先端部13を十分に浸漬する。さらに、光硬化性組成物Iの溶液にUV照射(Pre−UV照射:強度40mW/cm2、60秒間〜120秒間、本実施例では80秒間)を行い、光硬化性組成物Iを部分的に重合し、溶液の粘度を高める。UV照射に用いるUV照射器は、ウシオ電機株式会社製スポットキュアSP−9(照射ユニットAF−102NQ−X)である。UV照度計は、ウシオ電機株式会社製UIT−250を使用する。
(Self-forming optical waveguide forming process)
FIG. 2 is a diagram illustrating a step of forming a self-forming optical waveguide (LISW) 30. Here, the display of the adhesive 14 and the adhesive tape 15 is omitted.
As shown in FIG. 2A, a photocurable composition is formed in a cell-like region 20 (gap) formed between the slide glass 11 and the two strip-shaped cover glasses 16, 16 and the cover glass 17 by a capillary effect. Fill the solution of I and fully immerse the tip 13 of the optical fiber 12. Further, the solution of the photocurable composition I is subjected to UV irradiation (Pre-UV irradiation: intensity 40 mW / cm 2 , 60 seconds to 120 seconds, 80 seconds in this example) to partially apply the photocurable composition I. Polymerizes to increase the viscosity of the solution. The UV irradiator used for UV irradiation is Spot Cure SP-9 (irradiation unit AF-102NQ-X) manufactured by Ushio, Inc. As the UV illuminometer, UIT-250 manufactured by Ushio, Inc. is used.
続いて、図2(b)に示すように、光硬化性組成物Iの溶液に、光ファイバ12の先端部13から近赤外線レーザ光を所定時間出射する。光硬化性組成物Iは、出射されるレーザ光により徐々に硬化し、軸状の自己形成光導波路30が形成される。このとき、予めUV照射によって光硬化性組成物Iの溶液の粘度が高められているので、自己形成光導波路30の屈曲が防止される。 Subsequently, as shown in FIG. 2B, near-infrared laser light is emitted from the tip portion 13 of the optical fiber 12 into the solution of the photocurable composition I for a predetermined time. The photocurable composition I is gradually cured by the emitted laser light to form an axial self-forming optical waveguide 30. At this time, since the viscosity of the solution of the photocurable composition I is increased in advance by UV irradiation, bending of the self-formed optical waveguide 30 is prevented.
(レーザ光源)
本実施例では、波長(λ)の異なる3種類(1070nm、1311nm、1550nm)の近赤外線レーザ光を照射し、自己形成光導波路30を形成する。使用するレーザ光源は以下の通りである。
(a)中心波長(λ)1070nm:プレサイスゲージ株式会社製LDS1003シリ−ズ
(b)中心波長(λ)1311nm:プレサイスゲージ株式会社製LDS1003シリ−ズ
(c)波長(λ)1550nm:キーサイト・テクノロジ社製N7711A−210(波長可変)
尚、光導波路形成用基板10のスライドガラス11に固定する光ファイバ12は、片端FC/PCコネクタ付シングルモード光ファイバ(Thorlabs社製SMF−28−J9)を用いる。レーザ光源と光ファイバ12は、FC/PCコネクタで接続する。
(Laser light source)
In this embodiment, the self-formed optical waveguide 30 is formed by irradiating three types (1070 nm, 1311 nm, 1550 nm) of near-infrared laser light having different wavelengths (λ). The laser light sources used are as follows.
(A) Center wavelength (λ) 1070 nm: LDS1003 series manufactured by Precise Gauge Co., Ltd. (b) Center wavelength (λ) 1311 nm: LDS1003 series manufactured by Precise Gauge Co., Ltd. (c) Wavelength (λ) 1550 nm: Key Site Technology N7711A-210 (tunable wavelength)
As the optical fiber 12 fixed to the slide glass 11 of the optical waveguide forming substrate 10, a single-mode optical fiber with a single-ended FC / PC connector (SMF-28-J9 manufactured by Thorlabs) is used. The laser light source and the optical fiber 12 are connected by an FC / PC connector.
図3は、自己形成光導波路(LISW)の形成結果である。図3(a)は、中心波長(λ)1070nm、出力1μWの近赤外線レーザ光の1分間照射により、光ファイバの先端部13から長尺状の自己形成光導波路(LISW)が形成されている。形成されている自己形成光導波路(LISW)は、径10μm、長さ0.86mmである。
図3(b)は、中心波長(λ)1310nm、出力3mWの近赤外線レーザ光の1分間照射により、光ファイバの先端部13から長尺状の自己形成光導波路(LISW)が形成されている。形成されている自己形成光導波路(LISW)は、径10μm、長さ1.7mmである。
図3(c)は、中心波長(λ)1550nm、出力20mWの近赤外線レーザ光の2.5分間照射により、光ファイバの先端部13から長尺状の自己形成光導波路(LISW)が形成されている。形成されている自己形成光導波路(LISW)は、径20μm、長さ2.5mmである。
FIG. 3 shows the result of forming a self-formed optical waveguide (LISW). In FIG. 3A, a long self-formed optical waveguide (LISW) is formed from the tip portion 13 of the optical fiber by irradiation with a near-infrared laser beam having a center wavelength (λ) of 1070 nm and an output of 1 μW for 1 minute. .. The self-formed optical waveguide (LISW) formed has a diameter of 10 μm and a length of 0.86 mm.
In FIG. 3B, a long self-formed optical waveguide (LISW) is formed from the tip portion 13 of the optical fiber by irradiation with a near-infrared laser beam having a center wavelength (λ) of 1310 nm and an output of 3 mW for 1 minute. .. The self-formed optical waveguide (LISW) formed has a diameter of 10 μm and a length of 1.7 mm.
In FIG. 3C, a long self-formed optical waveguide (LISW) is formed from the tip portion 13 of the optical fiber by irradiating with a near-infrared laser beam having a center wavelength (λ) of 1550 nm and an output of 20 mW for 2.5 minutes. ing. The self-formed optical waveguide (LISW) formed has a diameter of 20 μm and a length of 2.5 mm.
[比較例]
下記の光硬化性組成物IIを調製し、図1(c)で調製した光導波路形成用基板10を用いて、光硬化性組成物IIに近赤外線レーザ光を照射し、自己形成光導波路を形成する。
(成分a)2官能アクリレート化合物 100部
2,2−bis[4−(アクリルオキシジエトキシ)フェニル]プロパン(新中村化学工業株式会社製エトキシ化ビスフェノールAジアクリレート:A−BPE−4)
(成分b)ラジカル発生剤 0.6部
テトラ−n−ブチルアンモニウムトリフェニル−n−ブチルボレート(昭和電工株式会社製有機ホウ素アンモニウム錯体:P3B)
(成分c)ジイモニウム系色素(日本カーリット株式会社製:CIR−960)0.7部
[Comparison example]
The following photocurable composition II is prepared, and the photocurable composition II is irradiated with near-infrared laser light using the optical waveguide forming substrate 10 prepared in FIG. 1 (c) to obtain a self-forming optical waveguide. Form.
(Component a) 100 parts of bifunctional acrylate compound 2,2-bis [4- (acrylic oxydiethoxy) phenyl] propane (Ethoxylated bisphenol A diacrylate manufactured by Shin Nakamura Chemical Industry Co., Ltd .: A-BPE-4)
(Component b) Radical generator 0.6 part Tetra-n-butylammonium triphenyl-n-butylborate (Organoboron ammonium complex manufactured by Showa Denko KK: P3B)
(Component c) 0.7 parts of diimonium dye (manufactured by Japan Carlit Co., Ltd .: CIR-960)
光硬化性組成物IIに、中心波長(λ)1070nmの近赤外線レーザ光を1分間照射する場合、実施例1(図3(a))と同程度の長尺状の自己形成光導波路を形成するためには、出力5mWのレーザ光が必要であった。
この結果から、本実施の形態が適用される光硬化性組成物I(実施例1)は、比較例で調製した光硬化性組成物IIと比較して、(1/5000)程度の低出力の近赤外線レーザ光により自己形成光導波路が形成されることが分かる。
When the photocurable composition II is irradiated with a near-infrared laser light having a center wavelength (λ) of 1070 nm for 1 minute, a long self-formed optical waveguide similar to that in Example 1 (FIG. 3A) is formed. In order to do so, a laser beam having an output of 5 mW was required.
From this result, the photocurable composition I (Example 1) to which the present embodiment is applied has a low output of about (1/5000) as compared with the photocurable composition II prepared in Comparative Example. It can be seen that a self-forming optical waveguide is formed by the near-infrared laser light of.
10…光導波路形成用基板、11…スライドガラス、12…光ファイバ、13…先端部、14…接着剤、15…粘着テープ、16…短冊状カバーガラス、17…カバーガラス、20…セルライク領域、30…自己形成光導波路 10 ... Optical waveguide forming substrate, 11 ... Slide glass, 12 ... Optical fiber, 13 ... Tip, 14 ... Adhesive, 15 ... Adhesive tape, 16 ... Strip-shaped cover glass, 17 ... Cover glass, 20 ... Cell-like region, 30 ... Self-formed optical waveguide
Claims (6)
ラジカル発生剤と、
3級アミン化合物と、
近赤外線感光性色素と、
を含むことを特徴とする光硬化性組成物。 With a bifunctional acrylate compound
Radical generator and
With a tertiary amine compound
Near-infrared photosensitive dye and
A photocurable composition comprising.
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JPH04146905A (en) * | 1990-10-11 | 1992-05-20 | Showa Denko Kk | Photopolymerization initiator |
JPH05194619A (en) * | 1990-01-16 | 1993-08-03 | Showa Denko Kk | Near-infrared photopolymerization initiator |
JPH107707A (en) * | 1996-06-25 | 1998-01-13 | Showa Denko Kk | Photocuring method |
JPH1152127A (en) * | 1997-08-07 | 1999-02-26 | Kyoritsu Kagaku Sangyo Kk | Near infrared ray absorbing material, method for synthesizing same and near infrared ray absorbing resin composition |
JP2005068348A (en) * | 2003-08-27 | 2005-03-17 | Nippon Kayaku Co Ltd | Adhesive composition for optical disc and article using cured product |
JP2018150426A (en) * | 2017-03-10 | 2018-09-27 | 三洋化成工業株式会社 | Active energy ray-curable composition |
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JPH05194619A (en) * | 1990-01-16 | 1993-08-03 | Showa Denko Kk | Near-infrared photopolymerization initiator |
JPH04146905A (en) * | 1990-10-11 | 1992-05-20 | Showa Denko Kk | Photopolymerization initiator |
JPH107707A (en) * | 1996-06-25 | 1998-01-13 | Showa Denko Kk | Photocuring method |
JPH1152127A (en) * | 1997-08-07 | 1999-02-26 | Kyoritsu Kagaku Sangyo Kk | Near infrared ray absorbing material, method for synthesizing same and near infrared ray absorbing resin composition |
JP2005068348A (en) * | 2003-08-27 | 2005-03-17 | Nippon Kayaku Co Ltd | Adhesive composition for optical disc and article using cured product |
JP2018150426A (en) * | 2017-03-10 | 2018-09-27 | 三洋化成工業株式会社 | Active energy ray-curable composition |
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