JP2020183493A - Complex composed of polythiophene-polystyrene sulfonate copolymer, and water dispersion containing the same - Google Patents
Complex composed of polythiophene-polystyrene sulfonate copolymer, and water dispersion containing the same Download PDFInfo
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- JP2020183493A JP2020183493A JP2019088785A JP2019088785A JP2020183493A JP 2020183493 A JP2020183493 A JP 2020183493A JP 2019088785 A JP2019088785 A JP 2019088785A JP 2019088785 A JP2019088785 A JP 2019088785A JP 2020183493 A JP2020183493 A JP 2020183493A
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- sulfonic acid
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- Prior art date
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- 229920001467 poly(styrenesulfonates) Polymers 0.000 title claims abstract description 19
- 229960002796 polystyrene sulfonate Drugs 0.000 title claims abstract description 11
- 239000011970 polystyrene sulfonate Substances 0.000 title claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 36
- 239000006185 dispersion Substances 0.000 title claims description 28
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 claims abstract description 38
- 239000000178 monomer Substances 0.000 claims abstract description 35
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims abstract description 32
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 27
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 22
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 22
- PSBDWGZCVUAZQS-UHFFFAOYSA-N (dimethylsulfonio)acetate Chemical group C[S+](C)CC([O-])=O PSBDWGZCVUAZQS-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229920000123 polythiophene Polymers 0.000 claims abstract description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 11
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 10
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 claims description 76
- 229940005642 polystyrene sulfonic acid Drugs 0.000 claims description 76
- -1 amine compound Chemical class 0.000 claims description 58
- 125000004432 carbon atom Chemical group C* 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 25
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 22
- 239000002131 composite material Substances 0.000 claims description 21
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 16
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 16
- 239000002904 solvent Substances 0.000 claims description 16
- 229920000642 polymer Polymers 0.000 claims description 13
- 229930192474 thiophene Natural products 0.000 claims description 12
- 239000007800 oxidant agent Substances 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 150000002500 ions Chemical class 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 8
- 229910001416 lithium ion Inorganic materials 0.000 claims description 7
- 229910001415 sodium ion Inorganic materials 0.000 claims description 7
- 229910001413 alkali metal ion Inorganic materials 0.000 claims description 6
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 claims description 6
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 6
- 229940006186 sodium polystyrene sulfonate Drugs 0.000 claims description 5
- 150000003462 sulfoxides Chemical class 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 125000000686 lactone group Chemical group 0.000 claims 1
- 229920001940 conductive polymer Polymers 0.000 abstract description 7
- 229920000144 PEDOT:PSS Polymers 0.000 abstract description 2
- 230000000704 physical effect Effects 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 description 44
- 239000007864 aqueous solution Substances 0.000 description 35
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 27
- 229910052757 nitrogen Inorganic materials 0.000 description 26
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical compound O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 23
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 22
- 238000006116 polymerization reaction Methods 0.000 description 20
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 18
- 229940117986 sulfobetaine Drugs 0.000 description 18
- 239000000243 solution Substances 0.000 description 16
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 15
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 14
- 239000010408 film Substances 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- 239000003729 cation exchange resin Substances 0.000 description 11
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 11
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 11
- 239000000758 substrate Substances 0.000 description 10
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 238000005160 1H NMR spectroscopy Methods 0.000 description 8
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000002019 doping agent Substances 0.000 description 6
- 229920001519 homopolymer Polymers 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000011259 mixed solution Substances 0.000 description 6
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 5
- 229910000358 iron sulfate Inorganic materials 0.000 description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 5
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 239000003957 anion exchange resin Substances 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 238000005342 ion exchange Methods 0.000 description 4
- 239000003456 ion exchange resin Substances 0.000 description 4
- 229920003303 ion-exchange polymer Polymers 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- VMEZXMFPKOMWHR-UHFFFAOYSA-N (dimethylamino)methyl prop-2-enoate Chemical compound CN(C)COC(=O)C=C VMEZXMFPKOMWHR-UHFFFAOYSA-N 0.000 description 3
- YMMGRPLNZPTZBS-UHFFFAOYSA-N 2,3-dihydrothieno[2,3-b][1,4]dioxine Chemical compound O1CCOC2=C1C=CS2 YMMGRPLNZPTZBS-UHFFFAOYSA-N 0.000 description 3
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000000265 homogenisation Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 150000002505 iron Chemical class 0.000 description 3
- 159000000014 iron salts Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 239000007870 radical polymerization initiator Substances 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000007784 solid electrolyte Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 150000005846 sugar alcohols Polymers 0.000 description 3
- 125000000542 sulfonic acid group Chemical group 0.000 description 3
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 3
- 238000000108 ultra-filtration Methods 0.000 description 3
- 239000003021 water soluble solvent Substances 0.000 description 3
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- UFQHFMGRRVQFNA-UHFFFAOYSA-N 3-(dimethylamino)propyl prop-2-enoate Chemical compound CN(C)CCCOC(=O)C=C UFQHFMGRRVQFNA-UHFFFAOYSA-N 0.000 description 2
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 2
- QGXMPHBQJFXJCI-UHFFFAOYSA-N 4-(dimethylamino)butyl prop-2-enoate Chemical compound CN(C)CCCCOC(=O)C=C QGXMPHBQJFXJCI-UHFFFAOYSA-N 0.000 description 2
- ZWAPMFBHEQZLGK-UHFFFAOYSA-N 5-(dimethylamino)-2-methylidenepentanamide Chemical compound CN(C)CCCC(=C)C(N)=O ZWAPMFBHEQZLGK-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- 101150096839 Fcmr gene Proteins 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 239000011260 aqueous acid Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- LWMFAFLIWMPZSX-UHFFFAOYSA-N bis[2-(4,5-dihydro-1h-imidazol-2-yl)propan-2-yl]diazene Chemical compound N=1CCNC=1C(C)(C)N=NC(C)(C)C1=NCCN1 LWMFAFLIWMPZSX-UHFFFAOYSA-N 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 229920001429 chelating resin Polymers 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 125000006165 cyclic alkyl group Chemical group 0.000 description 2
- 125000002933 cyclohexyloxy group Chemical group C1(CCCCC1)O* 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000000502 dialysis Methods 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 150000002596 lactones Chemical group 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000006606 n-butoxy group Chemical group 0.000 description 2
- 125000001298 n-hexoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 2
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 2
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 229920005604 random copolymer Polymers 0.000 description 2
- 238000001226 reprecipitation Methods 0.000 description 2
- 125000005920 sec-butoxy group Chemical group 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 2
- MNCGMVDMOKPCSQ-UHFFFAOYSA-M sodium;2-phenylethenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C=CC1=CC=CC=C1 MNCGMVDMOKPCSQ-UHFFFAOYSA-M 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 2
- MCTWTZJPVLRJOU-UHFFFAOYSA-N 1-methyl-1H-imidazole Chemical compound CN1C=CN=C1 MCTWTZJPVLRJOU-UHFFFAOYSA-N 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- UGIJCMNGQCUTPI-UHFFFAOYSA-N 2-aminoethyl prop-2-enoate Chemical compound NCCOC(=O)C=C UGIJCMNGQCUTPI-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
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Landscapes
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Abstract
Description
本発明は新規なポリチオフェン−ポリスチレンスルホン酸共重合体からなる複合体、及びそれを含有する水分散液に関する。 The present invention relates to a novel composite composed of a polythiophene-polystyrene sulfonic acid copolymer and an aqueous dispersion containing the same.
本発明のポリチオフェン−ポリスチレンスルホン酸共重合体からなる新規複合体は、その高い導電性から帯電防止材料、コンデンサ用固体電解質、各種センサー、有機エレクトロルミネセンス材料、導電性繊維、アクチュエーター及び熱電変換材料電極等に応用展開が可能である。 Due to its high conductivity, the novel composite composed of the polythiophene-polystyrene sulfonic acid copolymer of the present invention is an antistatic material, a solid electrolyte for capacitors, various sensors, an organic electroluminescence material, a conductive fiber, an actuator and a thermoelectric conversion material. It can be applied to electrodes and the like.
ポリアセチレン、ポリチオフェン、ポリアニリン、ポリピロール等に代表されるπ共役二重結合を有するポリマーは、アクセプターやドナーによるドーピングにより導電体(導電性ポリマー)となることが知られており、帯電防止剤、コンデンサの固体電解質、導電性塗料、エレクトロクロミック素子、透明電極、透明導電膜、化学センサ、アクチュエータ等への応用が検討されている。中でも、ポリスチレンスルホン酸(PSS)等の水溶性高分子ドーパントの存在下に、3,4−エチレンジオキシチオフェンを重合させた導電性ポリマーであるポリ(3,4−エチレンジオキシチオフェン):ポリ(4−スチレンスルホン酸)複合体(以下、PEDOT:PSSと略す)は、良好な導電性と成型加工性を兼ね備えているため導電性ポリマーの中で最も開発が進んでいる。特に、固体電解コンデンサ用途において、実用化も図られているが、近年の自動車等の電導化・小型化の進展に伴い、更なる高容量化と低ESR化を進めるべく、今尚、高導電化、基板密着性、及び耐熱性に優れる材料開発が行われている。 Polymers having a π-conjugated double bond represented by polyacetylene, polythiophene, polyaniline, polypyrrole, etc. are known to become conductors (conductive polymers) by doping with acceptors and donors, and are used as antistatic agents and capacitors. Applications to solid electrolytes, conductive paints, electrochromic elements, transparent electrodes, transparent conductive films, chemical sensors, actuators, etc. are being studied. Among them, poly (3,4-ethylenedioxythiophene): poly, which is a conductive polymer obtained by polymerizing 3,4-ethylenedioxythiophene in the presence of a water-soluble polymer dopant such as polystyrene sulfonic acid (PSS): poly. The (4-styrene sulfonic acid) composite (hereinafter abbreviated as PEDOT: PSS) is the most advanced conductive polymer because it has both good conductivity and moldability. In particular, it has been put into practical use in solid electrolytic capacitors, but it is still highly conductive in order to further increase the capacity and reduce the ESR with the progress of conductivity and miniaturization of automobiles in recent years. Materials with excellent materials, substrate adhesion, and heat resistance are being developed.
そこで、上記課題に対応すべくホモポリマーであるPSSからPSSを含む共重合体の検討が行われている。例えば、スチレンスルホン酸(塩)と(メタ)アクリルアミドモノマーとの共重合体(特許文献1,2)、スチレンスルホン酸と(メタ)アクリル酸類モノマーとの共重合体(特許文献3)、スチレンスルホン酸(塩)と不飽和炭化水素含有アルコキシシラン化合物との共重合体(特許文献4)が報告されている。 Therefore, in order to deal with the above problems, a copolymer containing PSS to PSS, which is a homopolymer, is being studied. For example, a copolymer of styrene sulfonic acid (salt) and (meth) acrylamide monomer (Patent Documents 1 and 2), a copolymer of styrene sulfonic acid and (meth) acrylic acid monomer (Patent Document 3), and styrene sulfone. A copolymer of an acid (salt) and an unsaturated hydrocarbon-containing alkoxysilane compound (Patent Document 4) has been reported.
しかし、本発明にかかるスチレンスルホン酸(塩)と不飽和炭化水素結合を有するスルホベタイン残基からなるポリスチレンスルホン酸共重合体の具体的記述、及びそれらとポリチオフェンとの複合体の導電性への影響に関する具体的な記述はない。 However, the specific description of the polystyrene sulfonic acid copolymer composed of the styrene sulfonic acid (salt) and the sulfobetaine residue having an unsaturated hydrocarbon bond according to the present invention, and the conductivity of the complex of them and polythiophene. There is no specific description of the impact.
上記特許文献1〜4に記載のチオフェン類は、PSSの共重合体を外部ドーパントとすることにより基板密着性が向上するものの、共重合体中のPSS量の低下に伴い導電率が低下する傾向があった。 The thiophenes described in Patent Documents 1 to 4 have improved substrate adhesion by using a PSS copolymer as an external dopant, but their conductivity tends to decrease as the amount of PSS in the copolymer decreases. was there.
本発明は、上記の背景技術に鑑みてなされたものであり、その目的は、高い導電性と高い密着性を両立する新規なポリチオフェン−ポリスチレンスルホン酸共重合体及びそれを含む水分散液を提供することである。 The present invention has been made in view of the above background techniques, and an object of the present invention is to provide a novel polythiophene-polystyrene sulfonic acid copolymer having both high conductivity and high adhesion, and an aqueous dispersion containing the same. It is to be.
また、本発明は、高い導電性と高い密着性を両立する導電性高分子を提供するための新規なポリスチレンスルホン酸共重合体を提供することを目的とする。 Another object of the present invention is to provide a novel polystyrene sulfonic acid copolymer for providing a conductive polymer having both high conductivity and high adhesion.
本発明者らは、上記課題を解決すべく鋭意検討を重ねた結果、従来公知のポリスチレンスルホン酸ポリマーに代えてスルホベタイン残基を有するビニルモノマーの繰り返し単位を含有するポリスチレンスルホン酸共重合体を用いることによって、ポリチオフェン複合体組成物が高導電化し、密着性が向上するという知見を見出し、本発明を完成するに至った。 As a result of diligent studies to solve the above problems, the present inventors have found a polystyrene sulfonic acid copolymer containing a repeating unit of a vinyl monomer having a sulfobetaine residue instead of a conventionally known polystyrene sulfonic acid polymer. We have found that the polythiophene composite composition becomes highly conductive and the adhesion is improved by using it, and have completed the present invention.
すなわち、本発明はポリチオフェン−ポリスチレンスルホン酸共重合体からなる複合体、及びそれを含有する水分散液に関するものである。
[1] 下記式(1)で表されるチオフェン繰り返し単位、及び下記式(2)で表されるチオフェン繰り返し単位からなる群より選ばれる少なくとも1種のチオフェン繰り返し単位を含むポリチオフェンと、下記式(3)で表されるスチレンスルホン酸の繰り返し単位、および下記式(4)で表されるスルホベタイン残基を有するビニルモノマーの繰り返し単位を含むポリスチレンスルホン酸共重合体との複合体。
That is, the present invention relates to a composite composed of a polythiophene-polystyrene sulfonic acid copolymer and an aqueous dispersion containing the same.
[1] A polythiophene containing at least one thiophene repeating unit selected from the group consisting of a thiophene repeating unit represented by the following formula (1) and a thiophene repeating unit represented by the following formula (2), and the following formula ( A complex with a polystyrene sulfonic acid copolymer containing a repeating unit of styrene sulfonic acid represented by 3) and a repeating unit of a vinyl monomer having a sulfobetaine residue represented by the following formula (4).
(上記式中、Xは、各々独立して、酸素原子、又は−NH−を表し、R1は、水素原子、炭素数1〜8の鎖状若しくは分岐状のアルキル基(該基は、ヒドロキシ基又は炭素数1〜8のアルコキシ基を有していてもよい)を表し、R4は、水素原子、炭素数1〜8の鎖状若しくは分岐状のアルキル基を表し、R2、及びR3は、各々独立して、炭素数1〜8の鎖状若しくは分岐状のアルキル基を表し、m及びnは、各々独立して、1〜6の整数を表し、M+は、各々独立して、水素イオン、Liイオン、Naイオン及びKイオンからなる群より選ばれるアルカリ金属イオン、又はアミン化合物の共役酸を表す。)
[2] ポリスチレンスルホン酸共重合体中の式(3)で表されるスチレンスルホン酸の繰り返し単位の含有量が、70〜99.99mol%であることを特徴とする[1]に記載の複合体。
[3] ポリスチレンスルホン酸共重合体中の式(3)で表されるスチレンスルホン酸の繰り返し単位の含有量が、90〜99.9mol%であることを特徴とする[1]に記載の複合体。
[4] 式(3)で表されるスチレンスルホン酸繰り返し単位の数が、式(1)で表されるチオフェン繰り返し単位、及び式(2)で表されるチオフェン繰り返し単位の合計の繰り返し単位の数の1.0倍〜3.0倍(mol比)であることを特徴とする[1]乃至[3]のいずれか一項に記載の複合体。
[5] R2、R3及びR4が、各々独立して、メチル基、又はエチル基であることを特徴とする[1]乃至[4]のいずれか一項に記載の複合体。
[6] ポリスチレンスルホン酸共重合体の重量平均分子量が、ポリスチレンスルホン酸ナトリウム標準物質換算で、1万〜30万であることを特徴とする[1]に記載の複合体。
[7] [1]乃至[6]のいずれか一項に記載の複合体を含む水分散液。
[8] 更に、水酸基を有する水溶性化合物、水溶性のスルホキシド、水溶性アミド化合物、ラクトン構造を有する水溶性化合物から選ばれる少なくとも一つの導電性向上剤を含む[7]に記載の水分散液。
[9] 水を含む溶媒中、上記式(3)で表されるスチレンスルホン酸の繰り返し構造単位、および上記式(4)で表されるスルホベタイン残基を有するビニルモノマーの繰り返し単位を含むポリスチレンスルホン酸共重合体存在下、下記式(5)で表されるチオフェン化合物を、酸化剤の存在下に重合させることを特徴とする[1]乃至[5]のいずれか一項に記載の複合体の製造方法。
(In the above formula, X independently represents an oxygen atom or -NH-, and R 1 is a hydrogen atom and a chain or branched alkyl group having 1 to 8 carbon atoms (the group is hydroxy). It may have a group or an alkoxy group having 1 to 8 carbon atoms), where R 4 represents a hydrogen atom, a chain or branched alkyl group having 1 to 8 carbon atoms, and R 2 and R. 3 independently represents a chain or branched alkyl group having 1 to 8 carbon atoms, m and n each independently represent an integer of 1 to 6, and M + are independent of each other. Represents an alkali metal ion selected from the group consisting of hydrogen ion, Li ion, Na ion and K ion, or a conjugated acid of an amine compound.
[2] The composite according to [1], wherein the content of the repeating unit of the styrene sulfonic acid represented by the formula (3) in the polystyrene sulfonic acid copolymer is 70 to 99.99 mol%. body.
[3] The composite according to [1], wherein the content of the repeating unit of the styrene sulfonic acid represented by the formula (3) in the polystyrene sulfonic acid copolymer is 90 to 99.9 mol%. body.
[4] The number of styrene sulfonic acid repeating units represented by the formula (3) is the total repeating unit of the thiophene repeating unit represented by the formula (1) and the thiophene repeating unit represented by the formula (2). The complex according to any one of [1] to [3], which is 1.0 to 3.0 times (mol ratio) the number.
[5] The complex according to any one of [1] to [4], wherein R 2 , R 3 and R 4 are each independently a methyl group or an ethyl group.
[6] The complex according to [1], wherein the polystyrene sulfonate copolymer has a weight average molecular weight of 10,000 to 300,000 in terms of a sodium polystyrene sulfonate standard substance.
[7] An aqueous dispersion containing the complex according to any one of [1] to [6].
[8] The aqueous dispersion according to [7], further containing at least one conductivity improver selected from a water-soluble compound having a hydroxyl group, a water-soluble sulfoxide, a water-soluble amide compound, and a water-soluble compound having a lactone structure. ..
[9] Polystyrene containing a repeating structural unit of styrene sulfonic acid represented by the above formula (3) and a repeating unit of a vinyl monomer having a sulfobetaine residue represented by the above formula (4) in a solvent containing water. The composite according to any one of [1] to [5], wherein the thiophene compound represented by the following formula (5) is polymerized in the presence of a sulfonic acid copolymer in the presence of an oxidizing agent. How to make a body.
(式中、R1は、水素原子、又は炭素数1〜8の鎖状若しくは分岐状のアルキル基(該基は、ヒドロキシ基又は炭素数1〜8のアルコキシ基を有していてもよい)を表す。)
[10] 下記式(3)で表されるスチレンスルホン酸の繰り返し単位、および下記式(4)で表されるスルホベタイン残基を有するビニルモノマーの繰り返し単位を含むポリスチレンスルホン酸共重合体。
(In the formula, R 1 is a hydrogen atom or a chain or branched alkyl group having 1 to 8 carbon atoms (the group may have a hydroxy group or an alkoxy group having 1 to 8 carbon atoms). Represents.)
[10] A polystyrene sulfonic acid copolymer containing a repeating unit of styrene sulfonic acid represented by the following formula (3) and a repeating unit of a vinyl monomer having a sulfobetaine residue represented by the following formula (4).
(上記式中、Xは、各々独立して、酸素原子、又は−NH−を表し、R4は、水素原子、炭素数1〜8の鎖状若しくは分岐状のアルキル基を表し、R2、及びR3は、各々独立して、炭素数1〜8の鎖状若しくは分岐状のアルキル基を表し、mは、各々独立して、1〜6の整数を表し、nは、各々独立して、4、5、又は6を表し、M+は、各々独立して、水素イオン、Liイオン、Naイオン及びKイオンからなる群より選ばれるアルカリ金属イオン、又はアミン化合物の共役酸を表す。) (In the above formula, X independently represents an oxygen atom or -NH-, R 4 represents a hydrogen atom, a chain or branched alkyl group having 1 to 8 carbon atoms, and R 2 , And R 3 each independently represent a chain or branched alkyl group having 1 to 8 carbon atoms, m each independently represents an integer of 1 to 6, and n each independently represents. Represents 4, 5, or 6, and M + independently represents an alkali metal ion selected from the group consisting of hydrogen ion, Li ion, Na ion, and K ion, or a conjugated acid of an amine compound.)
本発明のポリチオフェン−ポリスチレンスルホン酸共重合体からなる複合体は、従来のPEDOT−PSSより高い導電性と基板密着性を有することから、固体電解コンデンサの固体電解質として、更なる高容量化と低ESR化に寄与できることが期待される。又、その他、透明電極、透明導電膜、化学センサ、アクチュエータ等への応用も期待できる。 Since the composite made of the polythiophene-polystyrene sulfonic acid copolymer of the present invention has higher conductivity and substrate adhesion than the conventional PEDOT-PSS, it has a higher capacity and lower capacity as a solid electrolyte of a solid electrolytic capacitor. It is expected that it can contribute to ESR. In addition, it can be expected to be applied to transparent electrodes, transparent conductive films, chemical sensors, actuators and the like.
以下、本発明を詳細に説明する。 Hereinafter, the present invention will be described in detail.
本発明は、上記式(1)で表されるチオフェン繰り返し単位、及び上記式(2)で表されるチオフェン繰り返し単位からなる群より選ばれる少なくとも1種のチオフェン繰り返し単位を含むポリチオフェンと、上記式(3)で表されるスチレンスルホン酸の繰り返し単位、および上記式(4)で表されるスルホベタイン残基を有するビニルモノマーの繰り返し単位を含むポリスチレンスルホン酸共重合体との複合体、それを含有する水分散液、及び上記式(3)で表されるスチレンスルホン酸の繰り返し単位、および上記式(4)で表されるスルホベタイン残基を有するビニルモノマーの繰り返し単位を含むポリスチレンスルホン酸共重合体に係る。 The present invention comprises a polythiophene containing at least one thiophene repeating unit selected from the group consisting of the thiophene repeating unit represented by the above formula (1) and the thiophene repeating unit represented by the above formula (2), and the above formula. A complex with a polystyrene sulfonic acid copolymer containing a repeating unit of styrene sulfonic acid represented by (3) and a repeating unit of a vinyl monomer having a sulfobetaine residue represented by the above formula (4). Copolymerized with an aqueous dispersion, a repeating unit of styrene sulfonic acid represented by the above formula (3), and a repeating unit of a vinyl monomer having a sulfobetaine residue represented by the above formula (4). It relates to a copolymer.
上記式(1)及び(2)において、R1は、水素原子、炭素数1〜8の鎖状若しくは分岐状のアルキル基(該基は、ヒドロキシ基又は炭素数1〜8のアルコキシ基を有していてもよい)を表す。 In the above formulas (1) and (2), R 1 has a hydrogen atom and a chain or branched alkyl group having 1 to 8 carbon atoms (the group has a hydroxy group or an alkoxy group having 1 to 8 carbon atoms). It may be).
前記の炭素数1〜8の鎖状若しくは分岐状のアルキル基としては、特に限定するものではないが、例えば、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、ペンチル基、ネオペンチル基、n−ブチル基、sec−ブチル基、t−ブチル基、n−ヘキシル基、シクロヘキシル基、又は2−エチルヘキシル基等を挙げることができる。 The chain or branched alkyl group having 1 to 8 carbon atoms is not particularly limited, but for example, a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, and the like. Examples thereof include a pentyl group, a neopentyl group, an n-butyl group, a sec-butyl group, a t-butyl group, an n-hexyl group, a cyclohexyl group, a 2-ethylhexyl group and the like.
前記の炭素数1〜8のアルコキシ基としては、特に限定するものではないが、例えば、メトキシ基、エトキシ基、n−プロポキシ基、i−プロポキシ基、n−ブトキシ基、ペンチルオキシ基、ネオペンチルオキシ基、sec−ブトキシ基、t−ブトキシ基、n−ヘキシルオキシ基、シクロヘキシルオキシ基、又は2−エチルヘキシルオキシ基等を挙げることができる。 The alkoxy group having 1 to 8 carbon atoms is not particularly limited, but for example, a methoxy group, an ethoxy group, an n-propoxy group, an i-propoxy group, an n-butoxy group, a pentyloxy group, and a neopentyl group. Examples thereof include an oxy group, a sec-butoxy group, a t-butoxy group, an n-hexyloxy group, a cyclohexyloxy group, a 2-ethylhexyloxy group and the like.
R1は、密着性に優れる点で、水素原子、メチル基、エチル基、n−ブチル基、又はn−ヘキシル基であることが好ましく、水素原子、メチル基、又はエチル基であることが好ましい。 R 1 is preferably a hydrogen atom, a methyl group, an ethyl group, an n-butyl group, or an n-hexyl group, and is preferably a hydrogen atom, a methyl group, or an ethyl group in terms of excellent adhesion. ..
上式(3)中のM+は、各々独立して、水素イオン、Liイオン、Naイオン及びKイオンからなる群より選ばれるアルカリ金属イオン、又はアミン化合物の共役酸を表す。 M + in the above formula (3) independently represents an alkali metal ion selected from the group consisting of hydrogen ion, Li ion, Na ion and K ion, or a conjugate acid of an amine compound.
前記アミン化合物の共役酸は、アミン化合物にプロトンが付加したカチオン化合物を表す。当該アミン化合物としては、特に限定するものではないが、例えば、アンモニア、メチルアミン、ジメチルアミン、トリメチルアミン、エチルアミン、ジエチルアミン、トリエチルアミン、モノエタノールアミン、ジエタノールアミン、トリエタノールアミン等(以上、一般式N(R5)(R6)(R7)で表されるアミン化合物)のsp3混成軌道を有するアミン化合物、ピリジン、2−メチルピリジン、3−メチルピリジン、4−メチルピリジンピリジン(以上、ピリジン類)、イミダゾール、2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、2−フェニル−4−メチルイミダゾール、1−メチルイミダゾール(以上、イミダゾール類)等のsp2混成軌道を有するアミン化合物等が挙げられる。 The conjugate acid of the amine compound represents a cationic compound in which a proton is added to the amine compound. The amine compound is not particularly limited, but for example, ammonia, methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, monoethanolamine, diethanolamine, triethanolamine and the like (the above is the general formula N (R). 5 ) Amine compounds having sp3 mixed orbitals of (amine compounds represented by (R 6 ) and (R 7 )), pyridine, 2-methylpyridine, 3-methylpyridine, 4-methylpyridinepyridine (above, pyridines), Amine compounds having sp2 mixed orbitals such as imidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-methylimidazole (above, imidazoles) and the like. Can be mentioned.
なお、当該R5〜R7は、各々独立して、水素原子、又は置換基を有していてもよい総炭素数1〜18のアルキル基を表わす。このうち、R5〜R7は、各々独立して、水素原子、又は置換基を有していてもよい総炭素数1〜10のアルキル基であることがより好ましく、各々独立して、水素原子、又は炭素数1〜6の直鎖状、分岐状、若しくは環状アルキル基であることがさらに好ましい。 The R 5 to R 7 each independently represent a hydrogen atom or an alkyl group having a total carbon number of 1 to 18 which may have a substituent. Of these, R 5 to R 7 are more preferably hydrogen atoms or alkyl groups having a total carbon number of 1 to 10 which may have a substituent, respectively, and each of them is independently hydrogen. It is more preferably an atom or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms.
ここで、置換基を有していてもよい総炭素数1〜18のアルキル基としては、特に限定するものではないが、例えば、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、t−ブチル基、n−ヘキシル基、シクロヘキシル基、2−ヒドロキシエチル基、3−ヒドロキシプロピル基、2−ヒドロキシプロピル基、2,3−ジヒドロキシプロピル基、メトキシメチル基、エトキシメチル基、ヒドロキシエトキシエチル基、ヒドロキシエトキシエトキシエチル基、ベンジル基、フェネチル基、又はアミノエチル基等が挙げられる。 Here, the alkyl group having a total carbon number of 1 to 18 which may have a substituent is not particularly limited, but for example, a methyl group, an ethyl group, an n-propyl group, an i-propyl group, and the like. n-butyl group, t-butyl group, n-hexyl group, cyclohexyl group, 2-hydroxyethyl group, 3-hydroxypropyl group, 2-hydroxypropyl group, 2,3-dihydroxypropyl group, methoxymethyl group, ethoxymethyl Examples thereof include a group, a hydroxyethoxyethyl group, a hydroxyethoxyethoxyethyl group, a benzyl group, a phenethyl group, an aminoethyl group and the like.
前記炭素数1〜6の直鎖状、分岐状、若しくは環状アルキル基としては、特に限定するものではないが、例えば、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、t−ブチル基、n−ヘキシル基、又はシクロヘキシル基等が挙げられる。 The linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms is not particularly limited, and is, for example, a methyl group, an ethyl group, an n-propyl group, an i-propyl group, or an n-butyl group. Examples include a group, a t-butyl group, an n-hexyl group, a cyclohexyl group and the like.
このうち、置換基R5〜R7として、より好ましくは、各々独立して、水素原子、メチル基、エチル基又は、2−ヒドロキシエチル基、3−ヒドロキシプロピル基、2−ヒドロキシプロピル基、2,3−ジヒドロキシプロピル基等のヒドロキシ基を有するアルキル基が挙げられる。 Among them, as the substituent R 5 to R 7, more preferably, each independently, a hydrogen atom, a methyl group, or ethyl group, 2-hydroxyethyl group, 3-hydroxypropyl group, 2-hydroxypropyl group, 2 , An alkyl group having a hydroxy group such as a 3-dihydroxypropyl group can be mentioned.
M+については、密着性に優れる点で、各々独立して、水素イオン、Liイオン、Naイオン及びKイオンからなる群より選ばれるアルカリ金属イオン、又はR5〜R7が、水素原子、メチル基、エチル基又は、2−ヒドロキシエチル基、3−ヒドロキシプロピル基、2−ヒドロキシプロピル基、及び2,3−ジヒドロキシプロピル基から選ばれる基であるN+(R5)(R6)(R7)で表されるアンモニウムイオンであることが好ましく、各々独立して、水素イオン、Liイオン、Naイオン、Kイオン、アンモニウムイオン、メチルアンモニウムイオン、ジメチルアンモニウムイオン、トリメチルアンモニウムイオン、エチルアンモニウムイオン、ジエチルアンモニウムイオン、トリエチルアンモニウムイオン、モノエタノールアンモニウムイオン、ジエタノールアンモニウムイオン、又はトリエタノールアンモニウムイオンであることが好ましい。 Regarding M + , alkali metal ions selected from the group consisting of hydrogen ions, Li ions, Na ions and K ions, or R 5 to R 7 are independently hydrogen atoms and methyls in terms of excellent adhesion. N + (R 5 ) (R 6 ) (R), which is a group selected from a group, an ethyl group, or a 2-hydroxyethyl group, a 3-hydroxypropyl group, a 2-hydroxypropyl group, and a 2,3-dihydroxypropyl group. It is preferably an ammonium ion represented by 7 ), and independently, hydrogen ion, Li ion, Na ion, K ion, ammonium ion, methyl ammonium ion, dimethyl ammonium ion, trimethyl ammonium ion, ethyl ammonium ion, It is preferably diethylammonium ion, triethylammonium ion, monoethanolammonium ion, diethanolammonium ion, or triethanolammonium ion.
上記式(4)中、Xは、各々独立して、酸素原子、又は−NH−を表す。これらのうち、密着性に優れる点で酸素原子であることが好ましい。 In the above formula (4), X independently represents an oxygen atom or -NH-. Of these, an oxygen atom is preferable because it has excellent adhesion.
上記式(4)中のR2、R3は、各々独立して、炭素数1〜8の鎖状若しくは分岐状のアルキル基を表す。 R 2 and R 3 in the above formula (4) each independently represent a chain or branched alkyl group having 1 to 8 carbon atoms.
前記炭素数1〜8の鎖状若しくは分岐状のアルキル基としては、特に限定するものではないが、例えば、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、ペンチル基、ネオペンチル基、n−ブチル基、sec−ブチル基、t−ブチル基、n−ヘキシル基、シクロヘキシル基、又は2−エチルヘキシル基等を挙げることができる。 The chain or branched alkyl group having 1 to 8 carbon atoms is not particularly limited, and is, for example, a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, or a pentyl. Groups, neopentyl groups, n-butyl groups, sec-butyl groups, t-butyl groups, n-hexyl groups, cyclohexyl groups, 2-ethylhexyl groups and the like can be mentioned.
R2、及びR3は、合成、及び入手の容易性から、各々独立して、水素原子、メチル基、エチル基、n−ブチル基、又はn−ヘキシル基であることが好ましく、各々独立して、水素原子、メチル基、又はエチル基であることが好ましい。 From the viewpoint of ease of synthesis and availability, R 2 and R 3 are preferably hydrogen atoms, methyl groups, ethyl groups, n-butyl groups, or n-hexyl groups, respectively, and are independent of each other. It is preferably a hydrogen atom, a methyl group, or an ethyl group.
又、上記式(4)中のR4は、各々独立して、水素原子、又は炭素数1〜8の鎖状若しくは分岐状のアルキル基を表す。 Further, R 4 in the above formula (4) independently represents a hydrogen atom or a chain or branched alkyl group having 1 to 8 carbon atoms.
当該炭素数1〜8の鎖状若しくは分岐状のアルキル基については、例えば、上述のR2、R3で例示した炭素数1〜8の鎖状若しくは分岐状のアルキル基と同じ基を挙げることができる。 Regarding the chain or branched alkyl group having 1 to 8 carbon atoms, for example, the same group as the chain or branched alkyl group having 1 to 8 carbon atoms exemplified in R 2 and R 3 described above may be mentioned. Can be done.
R4は、合成、及び入手の容易性から、各々独立して、水素原子、メチル基、エチル基、n−ブチル基、又はn−ヘキシル基であることが好ましく、各々独立して、水素原子、メチル基、又はエチル基であることが好ましい。 R 4 is synthesized, and the ease of availability, each independently, a hydrogen atom, a methyl group, an ethyl group, preferably an n- butyl group, or n- hexyl group, each independently, a hydrogen atom , Methyl group, or ethyl group is preferable.
上記式(4)中、m及びnは、各々独立して、1〜6の整数を表す。 In the above equation (4), m and n each independently represent an integer of 1 to 6.
mについては、合成、及び入手の容易性から、2〜5であることが好ましく、2、3、又は4であることがより好ましく、3であることがより好ましい。 Regarding m, from the viewpoint of ease of synthesis and availability, it is preferably 2 to 5, more preferably 2, 3 or 4, and even more preferably 3.
nについては、合成、及び入手の容易性から、3〜6であることが好ましく、3、4、又は5であることがより好ましく、3又は4であることがより好ましい。 Regarding n, from the viewpoint of ease of synthesis and availability, it is preferably 3 to 6, more preferably 3, 4, or 5, and even more preferably 3 or 4.
なお、本発明のポリスチレンスルホン酸共重合体につては、新規性の観点から、nが、4、5、又は6であることが好ましく、4、又は5であることがより好ましく、4であることがより好ましい。 From the viewpoint of novelty, the polystyrene sulfonic acid copolymer of the present invention preferably has n of 4, 5, or 6, more preferably 4, or 5. Is more preferable.
上記式(3)で表されるスチレンスルホン酸の繰り返し単位、および上記式(4)で表されるスルホベタイン残基を有するビニルモノマーの繰り返し単位を含むポリスチレンスルホン酸共重合体については、特に限定するものではないが、例えば、下記式(8)で表される共重合物を例示することができる。 The polystyrene sulfonic acid copolymer containing the repeating unit of styrene sulfonic acid represented by the above formula (3) and the repeating unit of vinyl monomer having a sulfobetaine residue represented by the above formula (4) is particularly limited. However, for example, a copolymer represented by the following formula (8) can be exemplified.
(式中、R2、R3、R4、m、及びnについては、上記式(4)におけるR2、R3、R4、m、及びnと同義である。a及びbは、任意の正の実数を表す。)
なお、当該式(8)で表される共重合体については、ランダム共重合体であってもよいし、ブロック共重合体であってもよい。
(Wherein, R 2, R 3, R 4, m, and for n is, R 2, R 3 in the formula (4), R 4, m, and n is as defined above .a and b, optionally Represents a positive real number of.)
The copolymer represented by the formula (8) may be a random copolymer or a block copolymer.
当該共重合物については、特に限定するものではないが、例えば、以下の式(8−1)〜(8−48)で表されるものを具体的に例示することができる。なお、当該共重合体については、ランダム共重合体であってもよいし、ブロック共重合体であってもよく、下記a及びbについては、任意の正の実数を表す。 The copolymer is not particularly limited, but for example, those represented by the following formulas (8-1) to (8-48) can be specifically exemplified. The copolymer may be a random copolymer or a block copolymer, and the following a and b represent arbitrary positive real numbers.
なお、式(8)及び式(8−1)〜(8−48)において、aとbの関係は、密着性及び導電率向上の観点から、{a÷(a+b)}×100が70〜0.01であることが好ましく、{a÷(a+b)}×100が80〜0.1であることがより好ましく、{a÷(a+b)}×100が90〜0.1であることがより好ましい。 In the formulas (8) and (8-1) to (8-48), the relationship between a and b is such that {a ÷ (a + b)} × 100 is 70 to 70 from the viewpoint of improving adhesion and conductivity. It is preferably 0.01, more preferably {a ÷ (a + b)} × 100 is 80 to 0.1, and preferably {a ÷ (a + b)} × 100 is 90 to 0.1. More preferred.
上記式(3)で表されるスチレンスルホン酸の繰り返し単位、および上記式(4)で表されるスルホベタイン残基を有するビニルモノマーの繰り返し単位を含むポリスチレンスルホン酸共重合体は、下記式(6)で表されるスチレンスルホン酸モノマー及び下記式(7)で表されるスルホベタイン残基を有するビニルモノマーを、共重合することで製造することができる。 A polystyrene sulfonic acid copolymer containing a repeating unit of styrene sulfonic acid represented by the above formula (3) and a repeating unit of a vinyl monomer having a sulfobetaine residue represented by the above formula (4) is obtained by the following formula ( It can be produced by copolymerizing a styrene sulfonic acid monomer represented by 6) and a vinyl monomer having a sulfobetaine residue represented by the following formula (7).
(式中、X、M+、R2、R3、R4、m、及びnは、上式(3)及び(4)と同じ定義である。また、好ましい範囲についても同様である。)
上記式(6)で表されるスチレンスルホン酸モノマーとしては、特に限定するものではないが、例えば、p−スチレンスルホン酸リチウム、p−スチレンスルホン酸ナトリウム、又はp−スチレンスルホン酸カリウム等が挙げられ、市販品を用いることができる。
(Wherein, X, M +, R 2 , R 3, R 4, m, and n are the same as defined above formula (3) and (4). The same applies to the preferred ranges.)
The styrene sulfonic acid monomer represented by the above formula (6) is not particularly limited, and examples thereof include lithium p-styrene sulfonate, sodium p-styrene sulfonate, potassium p-styrene sulfonate, and the like. A commercially available product can be used.
上記式(7)で表されるスルホベタイン残基を有するビニルモノマーとしては、特に限定するものではないが、例えば、N−(メタ)アクリロイルオキシアルキル−N,N−ジメチルアンモニウムアルキル−α−スルホベタイン類、N−(メタ)アクリルアミドアルキル−N,N−ジアルキルアンモニウムアルキル−α−スルホベタイン類が挙げられる。 The vinyl monomer having a sulfobetaine residue represented by the above formula (7) is not particularly limited, but for example, N- (meth) acryloyloxyalkyl-N, N-dimethylammoniumalkyl-α-sulfo. Betaines, N- (meth) acrylamidealkyl-N, N-dialkylammonium alkyl-α-sulfobetaines can be mentioned.
N−(メタ)アクリロイルオキシアルキル−N,N−ジメチルアンモニウムアルキル−α−スルホベタイン類としては、N−(メタ)アクリロイルオキシメチル−N,N−ジメチルアンモニウムメチル−α−スルホベタイン、N−(メタ)アクリロイルオキシメチル−N,N−ジメチルアンモニウムエチル−α−スルホベタイン、N−(メタ)アクリロイルオキシメチル−N,N−ジメチルアンモニウムプロピル−α−スルホベタイン、N−(メタ)アクリロイルオキシメチル−N,N−ジメチルアンモニウムブチル−α−スルホベタイン、N−(メタ)アクリロイルオキシエチル−N,N−ジメチルアンモニウムメチル−α−スルホベタイン、N−(メタ)アクリロイルオキシエチル−N,N−ジメチルアンモニウムエチル−α−スルホベタイン、N−(メタ)アクリロイルオキシエチル−N,N−ジメチルアンモニウムプロピル−α−スルホベタイン、N−(メタ)アクリロイルオキシエチル−N,N−ジメチルアンモニウムブチル−α−スルホベタイン、N−(メタ)アクリロイルオキシプロピル−N,N−ジメチルアンモニウムメチル−α−スルホベタイン、N−(メタ)アクリロイルオキシプロピル−N,N−ジメチルアンモニウムエチル−α−スルホベタイン、N−(メタ)アクリロイルオキシプロピル−N,N−ジメチルアンモニウムプロピル−α−スルホベタイン、N−(メタ)アクリロイルオキシプロピル−N,N−ジメチルアンモニウムブチル−α−スルホベタイン、N−(メタ)アクリロイルオキシブチル−N,N−ジメチルアンモニウムメチル−α−スルホベタイン、N−(メタ)アクリロイルオキシブチル−N,N−ジメチルアンモニウムエチル−α−スルホベタイン、N−(メタ)アクリロイルオキシブチル−N,N−ジメチルアンモニウムプロピル−α−スルホベタイン、N−(メタ)アクリロイルオキシブチル−N,N−ジメチルアンモニウムブチル−α−スルホベタインが挙げられる。 Examples of N- (meth) acryloyloxyalkyl-N and N-dimethylammonium alkyl-α-sulfobetaines include N- (meth) acryloyloxymethyl-N, N-dimethylammonium methyl-α-sulfobetaine and N- ( Meta) acryloyloxymethyl-N, N-dimethylammonium ethyl-α-sulfobetaine, N- (meth) acryloyloxymethyl-N, N-dimethylammoniumpropyl-α-sulfobetaine, N- (meth) acryloyloxymethyl- N, N-dimethylammonium butyl-α-sulfobetaine, N- (meth) acryloyloxyethyl-N, N-dimethylammonium methyl-α-sulfobetaine, N- (meth) acryloyloxyethyl-N, N-dimethylammonium Ethyl-α-sulfobetaine, N- (meth) acryloyloxyethyl-N, N-dimethylammoniumpropyl-α-sulfobetaine, N- (meth) acryloyloxyethyl-N, N-dimethylammonium butyl-α-sulfobetaine , N- (meth) acryloyloxypropyl-N, N-dimethylammonium methyl-α-sulfobetaine, N- (meth) acryloyloxypropyl-N, N-dimethylammonium ethyl-α-sulfobetaine, N- (meth) Acryloyloxypropyl-N, N-dimethylammoniumpropyl-α-sulfobetaine, N- (meth) acryloyloxypropyl-N, N-dimethylammoniumbutyl-α-sulfobetaine, N- (meth) acryloyloxybutyl-N, N-Dimethylammonium Methyl-α-sulfobetaine, N- (meth) acryloyloxybutyl-N, N-dimethylammonium ethyl-α-sulfobetaine, N- (meth) acryloyloxybutyl-N, N-dimethylammoniumpropyl- Examples thereof include α-sulfobetaine, N- (meth) acryloyloxybutyl-N, and N-dimethylammonium butyl-α-sulfobetaine.
また、N−(メタ)アクリルアミドアルキル−N,N−ジアルキルアンモニウムアルキル−α−スルホベタイン類としては、N−(メタ)アクリルアミドプロピル−N,N−ジメチルアンモニウムプロピル−α−スルホベタイン、又はN−(メタ)アクリルアミドプロピル−N,N−ジメチルアンモニウムブチル−α−スルホベタイン等が挙げられる。 Examples of N- (meth) acrylamidealkyl-N and N-dialkylammoniumalkyl-α-sulfobetaines include N- (meth) acrylamidepropyl-N, N-dimethylammoniumpropyl-α-sulfobetaine, or N-. Examples thereof include (meth) acrylamidepropyl-N and N-dimethylammonium butyl-α-sulfobetaine.
上記式(7)で表されるスルホベタイン残基を有するビニルモノマーとしては、市販品を用いることもできるし、一般公知の製造方法に基づいて製造したものを用いることもできる。 As the vinyl monomer having a sulfobetaine residue represented by the above formula (7), a commercially available product can be used, or a vinyl monomer produced based on a generally known production method can be used.
上記式(3)で表されるスチレンスルホン酸の繰り返し単位、および上記式(4)で表されるスルホベタイン残基を有するビニルモノマーの繰り返し単位を含むポリスチレンスルホン酸共重合体は、上記式(6)で表されるスチレンスルホン酸モノマー及び上記式(7)で表されるスルホベタイン残基を有するビニルモノマーを、溶媒中、ラジカル開始剤存在下に共重合することで製造することが好ましい。 A polystyrene sulfonic acid copolymer containing a repeating unit of styrene sulfonic acid represented by the above formula (3) and a repeating unit of a vinyl monomer having a sulfobetaine residue represented by the above formula (4) is described in the above formula (4). It is preferable to produce by copolymerizing a styrene sulfonic acid monomer represented by 6) and a vinyl monomer having a sulfobetaine residue represented by the above formula (7) in a solvent in the presence of a radical initiator.
尚、本発明のポリスチレンスルホン酸共重合体については、上記式(6)で表されるスチレンスルホン酸モノマー及び上記式(7)で表されるスルホベタイン残基を有するビニルモノマー以外のモノマー(第三ビニルモノマー)の繰り返し単位を含んだ共重合体であってもよい。 Regarding the polystyrene sulfonic acid copolymer of the present invention, a monomer other than the styrene sulfonic acid monomer represented by the above formula (6) and the vinyl monomer having a sulfobetaine residue represented by the above formula (7) (No. 1). It may be a copolymer containing a repeating unit of (trivinyl monomer).
前記の第三ビニルモノマーとしては、特に限定するものではないが、例えば、アクリル酸メチル、アクリル酸エチル、アクリル酸ブチル、アクリル酸アミノエチル、N−ビニルカルバゾール、フェノキシエチルアクリレート、メタクリル酸メチル、メタクリル酸エチル、ジメチルアクリルアミド、ジメチルアミノプロピルアクリルアミド、アクリロイルモルフォリン、ヒドロキシエチルアクリルアミド、イソプロピルアクリルアミド、4−t−ブチルシクロヘキシルアクリレート、ジメチルアミノプロピルアクリルアミド塩化メチル4級塩、ジメチルアミノエチルアクリレートベンジルクロライド4級塩等が挙げられる。 The tertiary vinyl monomer is not particularly limited, but for example, methyl acrylate, ethyl acrylate, butyl acrylate, aminoethyl acrylate, N-vinylcarbazole, phenoxyethyl acrylate, methyl methacrylate, and methacrylic. Ethyl acrylate, dimethyl acrylamide, dimethyl aminopropyl acrylamide, acryloyl morpholine, hydroxyethyl acrylamide, isopropyl acrylamide, 4-t-butyl cyclohexyl acrylate, dimethyl aminopropyl acrylamide methyl chloride quaternary salt, dimethyl aminoethyl acrylate benzyl chloride quaternary salt, etc. Can be mentioned.
前記のラジカル重合開始剤については、水溶性ラジカル重合開始剤であることが好ましく、特に限定するものではないが、例えば、過酸化水素、過硫酸カリウム、過硫酸ナトリウム、過硫酸アンモニウム等の過硫酸塩、4,4’−アゾビス(4−シアノバレリックアシッド)、2,2’−アゾビス[2−(2−イミダゾリンー2−イル)プロパン]、2,2’−アゾビス[2−メチル−N−(2−ヒドロキシエチル)プロピオンアミド]、2,2’−アゾビス{2−(2−イミダゾリン−2−イル)プロパン]ジハイドロクロライド、2,2’−アゾビス{2−(2−イミダゾリン−2−イル)プロパン]ジサルフェートジハイドレート、2,2’−アゾビス(2−メチルプロピオンアミジン)ジハイドロクロライド、2,2’−アゾビス[N−(2−カルボキシエチル)−2−メチルプロピオンアミジン]テトラハイドレート、2,2’−アゾビス(N,N’−ジメチレンイソブチルアミジン)ジハイドロクロライド、2,2’−アゾビス{2−メチル−N−〔1,1−ビス(ヒドロキシメチル)−2−ヒドロキシエチル〕プロピオンアミド}等のアゾ系開始剤が挙げられる。 The radical polymerization initiator is preferably a water-soluble radical polymerization initiator and is not particularly limited, but for example, persulfates such as hydrogen peroxide, potassium persulfate, sodium persulfate, and ammonium persulfate. , 4,4'-azobis (4-cyanovaleric acid), 2,2'-azobis [2- (2-imidazolin-2-yl) propane], 2,2'-azobis [2-methyl-N- ( 2-Hydroxyethyl) propionamide], 2,2'-azobis {2- (2-imidazolin-2-yl) propane] dihydrochloride, 2,2'-azobis {2- (2-imidazolin-2-yl) ) Propane] disulfate dihydrate, 2,2'-azobis (2-methylpropion amidine) dihydrochloride, 2,2'-azobis [N- (2-carboxyethyl) -2-methylpropion amidine] tetrahydrate Rate, 2,2'-azobis (N, N'-dimethyleneisobutyramidine) dihydrochloride, 2,2'-azobis {2-methyl-N- [1,1-bis (hydroxymethyl) -2-hydroxy Examples thereof include azo-based initiators such as ethyl] propionamide}.
前記のラジカル開始剤の使用量は、上記式(6)及び(7)で表されるモノマーの総量に対して、通常、0.001〜10mol%の範囲であることが好ましく、より好ましくは0.01〜5mol%の範囲である。 The amount of the radical initiator used is usually preferably in the range of 0.001 to 10 mol%, more preferably 0, with respect to the total amount of the monomers represented by the above formulas (6) and (7). It is in the range of 0.01 to 5 mol%.
前記の溶媒は、水を含む溶媒であることが好ましく、特に限定するものではないが、水のみであってもよいし、水と水溶性有機溶媒との混合物、水と水溶性固形物の水溶液であってもよい。 The solvent is preferably a solvent containing water, and is not particularly limited, but may be water alone, a mixture of water and a water-soluble organic solvent, or an aqueous solution of water and a water-soluble solid. It may be.
前記の水溶液有機溶媒については、水に溶解可能なものであれば特に制限はないが、アルコール、エーテル化合物、エステル化合物、アミド化合物等が挙げられ、好適にはアルコールである。アルコールとしては、例えば、メタノール、エタノール、プロパノール、イソプロパノール、ブタノール、tert−ブタノール、sec−ブタノール等の低級アルコール、エチレングリコール、プロピレングリコール、ジエチレングリコール、ジプロピレングリコール等のグリコールを上げることができる。 The aqueous organic solvent is not particularly limited as long as it is soluble in water, and examples thereof include alcohols, ether compounds, ester compounds, and amide compounds, and alcohols are preferable. Examples of the alcohol include lower alcohols such as methanol, ethanol, propanol, isopropanol, butanol, tert-butanol and sec-butanol, and glycols such as ethylene glycol, propylene glycol, diethylene glycol and dipropylene glycol.
前記の溶媒が、水と水溶性有機溶媒との混合物である場合、水溶性有機溶媒の含有量は、0.1〜30wt%であることが好ましく、より好ましくは、1〜20wt%である。 When the solvent is a mixture of water and a water-soluble organic solvent, the content of the water-soluble organic solvent is preferably 0.1 to 30 wt%, more preferably 1 to 20 wt%.
重合条件は、特に制限するものではないが、不活性ガス雰囲気下、20〜150℃で、4〜50時間加熱することが好ましく、重合溶媒、モノマー組成、及び水溶性ラジカル重合開始剤種によって適宜調整することが好ましい。 The polymerization conditions are not particularly limited, but it is preferable to heat at 20 to 150 ° C. for 4 to 50 hours in an inert gas atmosphere, and appropriately depending on the polymerization solvent, monomer composition, and water-soluble radical polymerization initiator species. It is preferable to adjust.
ポリスチレンスルホン酸共重合体中において、上式(6)で表されるスチレンスルホン酸モノマーの繰り返し単位の仕込み量は、特に限定するものではないが、仕込みモノマーの全量に対して、70〜99.99mol%であることが好ましく、密着性及び導電率向上の観点から80〜99.9mol%であることがより好ましく、90〜0.1mol%であることがより好ましい。 The amount of the repeating unit of the styrene sulfonic acid monomer represented by the above formula (6) in the polystyrene sulfonic acid copolymer is not particularly limited, but is 70 to 99. With respect to the total amount of the charged monomers. It is preferably 99 mol%, more preferably 80 to 99.9 mol%, and even more preferably 90 to 0.1 mol% from the viewpoint of improving adhesion and conductivity.
このように得られたポリスチレンスルホン酸共重合体の重量平均分子量は、ポリスチレンスルホン酸ナトリウム標準物質換算で、数千〜50万であることが好ましく、より好ましくは、1万〜30万である。更に好ましくは、1万〜10万である。 The weight average molecular weight of the polystyrene sulfonate copolymer thus obtained is preferably several thousand to 500,000, more preferably 10,000 to 300,000 in terms of sodium polystyrene sulfonate standard substance. More preferably, it is 10,000 to 100,000.
さらに、ポリスチレンスルホン酸共重合体は、ポリチオフェンの外部ドーパント及び分散剤として作用させるためには、陽イオン交換樹脂に接触させて酸型に変換するほうが好ましい。ポリスチレンスルホン酸共重合体と陽イオン交換樹脂の接触方法は、カラム法又はバッチ法の何れであってもよい。陽イオン交換樹脂としては、特に制限はないが、強酸性陽イオン交換樹脂が好ましく、更に、スルホン酸型強酸性陽イオン交換樹脂がより好ましい。当該イオン交換樹脂は、市販品を使用することができ、例えば、ダイヤイオン(登録商標)UBK−550、ダイヤイオン(登録商標)SK1B(三菱化学社製)、アンバーライト(登録商標)IR120B、アンバーライト(登録商標)200C、ダウエックス(登録商標)MSC−1(ダウ社製)、デュオライトC26(ローム&ハース社製)、LEWATIT(登録商標)S108H、SP−112(ランクセス社製)等が好適に使用され得る。 Further, in order for the polystyrene sulfonic acid copolymer to act as an external dopant and a dispersant for polythiophene, it is preferable to bring it into contact with a cation exchange resin to convert it into an acid form. The contact method between the polystyrene sulfonic acid copolymer and the cation exchange resin may be either a column method or a batch method. The cation exchange resin is not particularly limited, but a strongly acidic cation exchange resin is preferable, and a sulfonic acid type strongly acidic cation exchange resin is more preferable. Commercially available products can be used as the ion exchange resin, for example, Diaion (registered trademark) UBK-550, Diaion (registered trademark) SK1B (manufactured by Mitsubishi Chemical Corporation), Amberlite (registered trademark) IR120B, Amber. Light (registered trademark) 200C, Dowex (registered trademark) MSC-1 (manufactured by Dow), Duolite C26 (manufactured by Roam & Haas), LEWATTI (registered trademark) S108H, SP-112 (manufactured by Rankses) It can be preferably used.
本発明のポリスチレンスルホン酸共重合体は、ブロック重合体、交互重合体、ランダム重合体、グラフト重合体など、いずれの重合体であってもよい。 The polystyrene sulfonic acid copolymer of the present invention may be any polymer such as a block polymer, an alternating polymer, a random polymer, and a graft polymer.
又、本発明のポリスチレンスルホン酸共重合体は、再沈法、限外ろ過等の分離操作により更に精製してもよい。 Further, the polystyrene sulfonic acid copolymer of the present invention may be further purified by a separation operation such as a reprecipitation method or ultrafiltration.
本発明のポリスチレンスルホン酸共重合体は、密着性に優れる点で、ポリスチレンスルホン酸共重合体中の式(3)で表されるスチレンスルホン酸の繰り返し単位の含有量が、70〜99.99mol%であることが好ましく、80〜99.9mol%であることがより好ましく、90〜99.9mol%であることがより好ましい。 The polystyrene sulfonic acid copolymer of the present invention is excellent in adhesion, and the content of the repeating unit of styrene sulfonic acid represented by the formula (3) in the polystyrene sulfonic acid copolymer is 70 to 99.99 mol. %, More preferably 80 to 99.9 mol%, and even more preferably 90 to 99.9 mol%.
本発明の複合体は、上記式(1)で表されるチオフェン繰り返し単位、及び上記式(2)で表されるチオフェン繰り返し単位からなる群より選ばれる少なくとも1種のチオフェン繰り返し単位を含むポリチオフェンと、上記式(3)で表されるスチレンスルホン酸の繰り返し単位、および上記式(4)で表されるスルホベタイン残基を有するビニルモノマーの繰り返し単位を含むポリスチレンスルホン酸共重合体との複合体であるが、当該複合体については、密着性及び導電性に優れる点で、式(3)で表されるスチレンスルホン酸繰り返し単位の数が、式(1)で表されるチオフェン繰り返し単位、及び式(2)で表されるチオフェン繰り返し単位の合計の繰り返し単位の数の1.0倍〜3.0倍(mol比)であるという関係を満たす複合体であることが好ましく、同1.5倍〜2.5倍(mol比)であるという関係を満たす複合体であることがより好ましい。 The complex of the present invention comprises a polythiophene containing at least one thiophene repeating unit selected from the group consisting of the thiophene repeating unit represented by the above formula (1) and the thiophene repeating unit represented by the above formula (2). , A complex with a polystyrene sulfonic acid copolymer containing a repeating unit of styrene sulfonic acid represented by the above formula (3) and a repeating unit of a vinyl monomer having a sulfobetaine residue represented by the above formula (4). However, with respect to the complex, the number of styrene sulfonic acid repeating units represented by the formula (3) is the thiophene repeating unit represented by the formula (1) and the thiophene repeating unit represented by the formula (1) in that the composite is excellent in adhesion and conductivity. It is preferable that the complex satisfies the relationship that the total number of repeating units of the thiophene repeating unit represented by the formula (2) is 1.0 to 3.0 times (mol ratio). It is more preferable that the complex satisfies the relationship of fold to 2.5 times (mol ratio).
本発明の複合体は、水を含む溶媒中、上記式(3)で表されるスチレンスルホン酸の繰り返し構造単位、および上記式(4)で表されるスルホベタイン残基を有するビニルモノマーの繰り返し単位を含むポリスチレンスルホン酸共重合体存在下、下記式(5)で表されるチオフェン化合物を、酸化剤の存在下に重合させる(以下、「本重合反応」とする)ことにより製造することができる。 The complex of the present invention is a repeating structural unit of styrene sulfonic acid represented by the above formula (3) and a repeating vinyl monomer having a sulfobetaine residue represented by the above formula (4) in a solvent containing water. It can be produced by polymerizing a thiophene compound represented by the following formula (5) in the presence of a polystyrene sulfonic acid copolymer containing a unit in the presence of an oxidizing agent (hereinafter referred to as "the main polymerization reaction"). it can.
(式中、R1は、水素原子、又は炭素数1〜8の鎖状若しくは分岐状のアルキル基(該基は、ヒドロキシ基又は炭素数1〜8のアルコキシ基を有していてもよい)を表す。)
上式(5)中のR1は、水素原子、炭素数1〜8の鎖状若しくは分岐状のアルキル基(該基は、ヒドロキシ基又は炭素数1〜8のアルコキシ基を有していてもよい)を表す。
(In the formula, R 1 is a hydrogen atom or a chain or branched alkyl group having 1 to 8 carbon atoms (the group may have a hydroxy group or an alkoxy group having 1 to 8 carbon atoms). Represents.)
R 1 in the above formula (5) is a hydrogen atom, a chain or branched alkyl group having 1 to 8 carbon atoms (even if the group has a hydroxy group or an alkoxy group having 1 to 8 carbon atoms). Good).
前記の炭素数1〜8の鎖状若しくは分岐状のアルキル基としては、特に限定するものではないが、例えば、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、ペンチル基、ネオペンチル基、n−ブチル基、sec−ブチル基、t−ブチル基、n−ヘキシル基、シクロヘキシル基、2−エチルヘキシル基等を挙げることができる。 The chain or branched alkyl group having 1 to 8 carbon atoms is not particularly limited, but for example, a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, and the like. Examples thereof include a pentyl group, a neopentyl group, an n-butyl group, a sec-butyl group, a t-butyl group, an n-hexyl group, a cyclohexyl group, and a 2-ethylhexyl group.
前記の炭素数1〜8のアルコキシ基としては、特に限定するものではないが、例えば、メトキシ基、エトキシ基、n−プロポキシ基、i−プロポキシ基、n−ブトキシ基、ペンチルオキシ基、ネオペンチルオキシ基、sec−ブトキシ基、t−ブトキシ基、n−ヘキシルオキシ基、シクロヘキシルオキシ基、2−エチルヘキシルオキシ基等を挙げることができる。 The alkoxy group having 1 to 8 carbon atoms is not particularly limited, but for example, a methoxy group, an ethoxy group, an n-propoxy group, an i-propoxy group, an n-butoxy group, a pentyloxy group, and a neopentyl group. Examples thereof include an oxy group, a sec-butoxy group, a t-butoxy group, an n-hexyloxy group, a cyclohexyloxy group, a 2-ethylhexyloxy group and the like.
本重合反応に用いる溶媒は、水を含む溶媒であり、特に限定するものではないが、水又は水と水溶性溶剤からなる混合物を上げることができる。水としては、例えば、純水が挙げられ、蒸留水、イオン交換水でもよい。水溶性溶剤としては、メタノール、エタノール、プロパノール、n−ブタノール等の1価のアルコール類、エチレングリコール、プロピレングリコール等の多価アルコール類、ジメチルホルムアミド、ジメチルスルホキシド、N−メチルピロリドン等の非極性溶媒が挙げられる。 The solvent used in this polymerization reaction is a solvent containing water, and is not particularly limited, but water or a mixture of water and a water-soluble solvent can be used. Examples of water include pure water, and distilled water and ion-exchanged water may be used. Examples of the water-soluble solvent include monohydric alcohols such as methanol, ethanol, propanol and n-butanol, polyhydric alcohols such as ethylene glycol and propylene glycol, and non-polar solvents such as dimethylformamide, dimethyl sulfoxide and N-methylpyrrolidone. Can be mentioned.
なお当該溶媒については、脱気して用いてもよいし、窒素等の不活性ガスで置換して用いてもよい。 The solvent may be degassed or replaced with an inert gas such as nitrogen.
本重合反応に用いる溶媒量は、上記式(5)で表されるチオフェン化合物が溶解又は均一分散できる量であれば、特に限定するものではないが、例えば、上記式(5)で表されるチオフェン化合物の仕込量に対して10〜1000重量倍の範囲が好ましく、100〜500重量倍の範囲がより好ましい。 The amount of the solvent used in this polymerization reaction is not particularly limited as long as the thiophene compound represented by the above formula (5) can be dissolved or uniformly dispersed, but is represented by, for example, the above formula (5). The range of 10 to 1000 times by weight is preferable, and the range of 100 to 500 times by weight is more preferable with respect to the charged amount of the thiophene compound.
本重合反応に用いる酸化剤は、酸化的脱水素化反応による酸化重合を進行させるものであることが好ましく、特に限定するものではないが、例えば、過硫酸類、鉄塩(III)、鉄塩(II)、過酸化水素、過マンガン酸塩、重クロム酸塩、硫酸セリウム(IV)、又は酸素等が挙げられ、これらを単独で使用しても良いし、二種以上を混合して使用しても良い。 The oxidizing agent used in this polymerization reaction is preferably one that promotes oxidative polymerization by an oxidative dehydrogenation reaction, and is not particularly limited, but for example, persulfates, iron salts (III), and iron salts. Examples thereof include (II), hydrogen peroxide, permanganate, bicarbonate, cerium (IV) sulfate, oxygen and the like, and these may be used alone or in combination of two or more. You may.
ここで、過硫酸類としては、特に限定するものではないが、具体的には、過硫酸、過硫酸アンモニウム、過硫酸ナトリウム、又は過硫酸カリウム等が例示される。 Here, the persulfates are not particularly limited, and specific examples thereof include persulfate, ammonium persulfate, sodium persulfate, and potassium persulfate.
また、鉄塩(III)としては、特に限定するものではないが、具体的には、FeCl3、Fe2(SO4)3、過塩素酸鉄、又はパラ−トルエンスルホン酸鉄(III)等が例示される。また、鉄塩(II)としては、特に限定するものではないが、具体的には、FeCl2、FeSO4、又は酢酸鉄(II)等が例示される。これらの鉄塩は、無水物を使用しても、水和物を使用してもよい。 The iron salt (III) is not particularly limited, but specifically, FeCl 3 , Fe 2 (SO 4 ) 3 , iron perchlorate, iron para-toluenesulfonate (III), or the like. Is exemplified. The iron salt (II) is not particularly limited, and specific examples thereof include FeCl 2 , FeSO 4 , iron acetate (II), and the like. These iron salts may use anhydrides or hydrates.
また、過マンガン酸塩としては、特に限定するものではないが、具体的には、過マンガン酸ナトリウム、過マンガン酸カリウム、又は過マンガン酸マグネシウム等が例示される。 The permanganate is not particularly limited, and specific examples thereof include sodium permanganate, potassium permanganate, and magnesium permanganate.
また、重クロム酸塩としては、特に限定するものではないが、具体的には、重クロム酸アンモニウム、又は重クロム酸カリウム等が例示される。 The dichromate is not particularly limited, and specific examples thereof include ammonium dichromate and potassium dichromate.
これらの酸化剤のうち、FeSO4、及びFe2(SO4)3のいずれかと過硫酸類との併用系が特に好ましい。 Of these oxidizing agents, a combination system of either FeSO 4 or Fe 2 (SO 4 ) 3 and persulfates is particularly preferable.
本重合反応に用いる酸化剤の量としては、特に限定するものではないが、上記式(5)で表されるチオフェン化合物の仕込モル数に対して、0.5〜10倍モルであることが好ましい。より好ましくは、0.8〜5.0倍モルである。更に好ましくは、1.0〜2.0倍モルである。 The amount of the oxidizing agent used in this polymerization reaction is not particularly limited, but may be 0.5 to 10 times the number of moles of the thiophene compound represented by the above formula (5). preferable. More preferably, it is 0.8 to 5.0 times the molar amount. More preferably, it is 1.0 to 2.0 times the molar amount.
本重合反応に用いるポリスチレンスルホン酸共重合体の量としては、上式(5)で表されるチオフェン化合物に対して、共重合体中のスチレンスルホン酸残基が0.5〜5.0倍モルの範囲となる量であることが好ましく、更に、1.0〜3.0倍モルの範囲となる量であることがより好ましい。 The amount of the polystyrene sulfonic acid copolymer used in this polymerization reaction is 0.5 to 5.0 times that of the thiophene compound represented by the above formula (5) in the styrene sulfonic acid residue in the copolymer. The amount is preferably in the range of molars, and more preferably in the range of 1.0 to 3.0 times the molar amount.
本重合反応の圧力は、常圧、減圧、加圧のいずれであってもよい。 The pressure of this polymerization reaction may be normal pressure, reduced pressure, or pressurized.
本重合反応の反応雰囲気は、大気中であっても、窒素やアルゴン等の不活性ガス中であってもよい。より好ましくは不活性ガス中である。 The reaction atmosphere of the present polymerization reaction may be in the atmosphere or in an inert gas such as nitrogen or argon. More preferably, it is in an inert gas.
本重合反応の反応温度は、例えば、上記式(5)で表されるチオフェン化合物を酸化重合できる温度であり、特に限定するものではないが、−10〜100℃の範囲が好ましく、10〜60℃の範囲が更に好ましい。 The reaction temperature of this polymerization reaction is, for example, a temperature at which the thiophene compound represented by the above formula (5) can be oxidatively polymerized, and is not particularly limited, but is preferably in the range of −10 to 100 ° C., preferably 10 to 60. The ° C range is more preferred.
本重合反応の反応時間は、例えば、上記式(5)で表されるチオフェン化合物の酸化重合が十分進行する時間であり、特に限定するものではないが、0.5〜200時間の範囲が好ましく、0.5〜80時間の範囲が更に好ましい。 The reaction time of this polymerization reaction is, for example, the time during which the oxidative polymerization of the thiophene compound represented by the above formula (5) sufficiently proceeds, and is not particularly limited, but is preferably in the range of 0.5 to 200 hours. , 0.5-80 hours is more preferred.
本重合反応の反応方法は、特に限定するものではないが、例えば、上記式(5)で表されるチオフェン化合物を、あらかじめ水、又は水と水溶性溶剤からなる混合物に溶解させ、これに酸化剤を一度に又はゆっくりと滴下してもよく、逆に酸化剤の水溶液に上記式(5)で表されるチオフェン化合物の水溶液を一度に又はゆっくりと滴下してもよい。また、2種以上の酸化剤を用いる場合には、各酸化剤を順次添加してもよい。 The reaction method of this polymerization reaction is not particularly limited, but for example, the thiophene compound represented by the above formula (5) is previously dissolved in water or a mixture of water and a water-soluble solvent, and the compound is oxidized. The agent may be added dropwise at once or slowly, and conversely, an aqueous solution of the thiophene compound represented by the above formula (5) may be added dropwise to the aqueous solution of the oxidizing agent at once or slowly. When two or more kinds of oxidizing agents are used, each oxidizing agent may be added in sequence.
尚、本重合反応は、酸化剤の添加に伴い液粘度が上昇する傾向があるため、液全体を均一に撹拌する必要がある。撹拌翼については、プロペラ翼、パドル翼、マックスブレンド(登録商標)翼(住友重機械プロセス機器社製)、フルゾーン(登録商標)翼(神鋼環境ソリューション社製)、ディスクタービン翼が使用でき、反応容器内をより均一に混合するために、複数枚のバッフルを反応釜の内側に装備してもよい。その他として、乳化や分散に使用されるホモミキサー、ホモジナイザー等も組み合わせて使用してもよい。 In this polymerization reaction, the viscosity of the liquid tends to increase with the addition of the oxidizing agent, so it is necessary to uniformly stir the entire liquid. For the stirring blades, propeller blades, paddle blades, Max Blend (registered trademark) blades (manufactured by Sumitomo Heavy Industries Process Equipment Co., Ltd.), full zone (registered trademark) blades (manufactured by Shinko Environmental Solutions Co., Ltd.), and disc turbine blades can be used and react. A plurality of baffles may be installed inside the reaction vessel in order to mix the inside of the container more uniformly. In addition, a homomixer, a homogenizer, etc. used for emulsification and dispersion may also be used in combination.
更に、本重合反応は、外部ドーパントとしてポリスチレンスルホン酸共重合体を使用するが、よりポリチオフェンのキャリア密度を増大させ導電性を向上させるために、アクセプター性のドーパントを更に添加して本重合反応を行ってもよい。 Further, in this polymerization reaction, a polystyrene sulfonic acid copolymer is used as an external dopant, but in order to further increase the carrier density of polythiophene and improve the conductivity, an acceptor-type dopant is further added to carry out the main polymerization reaction. You may go.
アクセプター性ドーパントしては、特に限定するものではないが、例えば、塩酸、硝酸、硫酸等の無機酸、ギ酸、酢酸、シュウ酸、トリフルオロ酢酸等の有機カルボン酸、メタンスルホン酸、エタンスルホン酸、ベンゼンスルホン酸、p−トルエンスルホン酸、ドデシルベンゼンスルホン酸、ナフタレンスルホン酸等の有機スルホン酸を例示することができる。 The accepting dopant is not particularly limited, but for example, inorganic acids such as hydrochloric acid, nitrate and sulfuric acid, organic carboxylic acids such as formic acid, acetic acid, oxalic acid and trifluoroacetic acid, methanesulfonic acid and ethanesulfonic acid. , Benzenesulfonic acid, p-toluenesulfonic acid, dodecylbenzenesulfonic acid, naphthalenesulfonic acid and other organic sulfonic acids can be exemplified.
本重合反応で得られた本発明の複合体は任意の方法で精製することができる。当該精製の方法としては、特に限定するものではないが、例えば、溶媒洗浄、再沈殿、遠心沈降、限外ろ過、透析、イオン交換樹脂処理等が挙げられる。それぞれ単独で行っても又は組み合わせても良い。 The composite of the present invention obtained by this polymerization reaction can be purified by any method. The purification method is not particularly limited, and examples thereof include solvent washing, reprecipitation, centrifugal sedimentation, ultrafiltration, dialysis, and ion exchange resin treatment. Each may be performed alone or in combination.
本発明の複合体の典型的な単離精製方法は、例えば、重合反応後の水分散液を、そのまま、陽イオン及び/又は陰イオン交換樹脂に接触させる方法、更に必要に応じて、限外ろ過、透析等の膜分離法を用いて脱塩精製すること方法を例示できる。陽イオン交換樹脂としては、先に挙げたスルホン酸型強酸性陽イオン交換樹脂、陰イオン交換樹脂としては、アンバーライト(登録商標) IRA93(オルガノ)、アンバーリスト(登録商標)A21(ダウ・ケミカル)、LEWATIT(登録商標)35A、LEWATIT(登録商標)MP62、LEWATIT(登録商標)MP62WS(LANXESS社製)等を例示できる。 A typical isolation and purification method for the complex of the present invention is, for example, a method in which the aqueous dispersion after the polymerization reaction is directly contacted with a cation and / or an anion exchange resin, and if necessary, ultrafiltration. An example of a method of desalting and purification using a membrane separation method such as filtration or dialysis can be exemplified. As the cation exchange resin, the sulfonic acid type strongly acidic cation exchange resin mentioned above, and as the anion exchange resin, Amberlite (registered trademark) IRA93 (organo), Amberlist (registered trademark) A21 (Dow Chemical). ), LEWATTI (registered trademark) 35A, LEWATTI (registered trademark) MP62, LEWATTI (registered trademark) MP62WS (manufactured by LANXESS) and the like can be exemplified.
本発明の複合体を含む水分散液は、各種用途への成型加工が可能である。 The aqueous dispersion containing the composite of the present invention can be molded into various uses.
上記の水分散液は、必要に応じて、超音波照射、ホモジナイズ処理(例えば、メカニカルホモジナイザー、超音波ホモジナイザ−、高圧ホモジナイザー等の使用)を行ってもよい。ホモジナイズ処理する場合には、ポリマーの熱劣化を防ぐため、冷温しながら行うことが好ましい。 The above aqueous dispersion may be subjected to ultrasonic irradiation and homogenization treatment (for example, use of a mechanical homogenizer, an ultrasonic homogenizer, a high-pressure homogenizer, etc.), if necessary. When the homogenization treatment is performed, it is preferable to carry out the homogenization treatment while cooling the polymer in order to prevent thermal deterioration.
又、得られた水分散液を粗濃縮し、アセトン等の貧溶媒に添加して沈殿させることにより粉末としてポリチオフェン−ポリスチレンスルホン酸共重合体を得ることもできる。 Further, a polythiophene-polystyrene sulfonic acid copolymer can also be obtained as a powder by crudely concentrating the obtained aqueous dispersion and adding it to a poor solvent such as acetone to precipitate it.
更に、各種アンモニウム塩との塩を形成させる場合には、例えば、上記酸型のポリチオフェン−ポリスチレンスルホン酸共重合体の水分散液に、各種アミン化合物又はアンモニウム塩の原液若しくはその水溶液又はその他適当な溶媒で希釈したものを加えることで容易にM+がNH4 +やN+(R5)(R6)(R7)であるアンモニウム塩型光学活性ポリチオフェンに変換することができる。必要に応じて、得られた上記水溶液をアセトン等の貧溶媒に添加して粉末状のアンモニウム塩型ポリチオフェン−ポリスチレンスルホン酸共重合体を得ることもできる。 Further, when forming a salt with various ammonium salts, for example, in an aqueous dispersion of the above acid type polythiophene-polystyrene sulfonic acid copolymer, a stock solution of various amine compounds or ammonium salts, an aqueous solution thereof, or other suitable solution. by adding those diluted with a solvent can be easily M + converts NH 4 + or N + (R 5) (R 6) to (R 7) a is an ammonium salt type optically active polythiophenes. If necessary, the obtained aqueous solution can be added to a poor solvent such as acetone to obtain a powdered ammonium salt-type polythiophene-polystyrene sulfonic acid copolymer.
本発明の複合体は、操作性に優れる点で、水を含むものであることが好ましく、水を含んで、水分散液となっていることが好ましい。 The composite of the present invention preferably contains water in terms of excellent operability, and preferably contains water and is an aqueous dispersion.
水分散液中の、本発明の複合体を含む水分散物における複合体の濃度は、特に限定するものではないが、通常20重量%以下であることが好ましく、より好ましくは10重量%以下、粘性の観点からより好ましくは5重量%以下である。 The concentration of the complex in the aqueous dispersion containing the complex of the present invention in the aqueous dispersion is not particularly limited, but is usually preferably 20% by weight or less, more preferably 10% by weight or less. From the viewpoint of viscosity, it is more preferably 5% by weight or less.
また、本発明の複合体の水分散液については、更に、水溶性化合物、水溶性のスルホキシド、水溶性アミド化合物、ラクトン構造を有する水溶性化合物から選ばれる少なくとも一つの導電性向上剤を含むことが好ましい。 Further, the aqueous dispersion of the complex of the present invention further contains at least one conductivity improver selected from a water-soluble compound, a water-soluble sulfoxide, a water-soluble amide compound, and a water-soluble compound having a lactone structure. Is preferable.
当該導電性向上剤としては、公知のものが使用できる。例えば、N,N−ジメチルアセトアミド、N−メチルアセトアミド、N,N−ジメチルホルムアミド、N−メチルホルムアミド、N−メチルホルムアニリド、N−メチルピロリドン、ピロリドン等のアミド類;テトラメチレンスルホン、ジメチルスルホキシド等のスルホン化合物又はスルホキシド化合物;ソルビトール、マンニトール等の糖アルコール類;エチレングリコール、プロピレングリコール、グリセリン、ジエチレングリコール、トリエチレングリコール等の多価アルコールが挙げられる。 As the conductivity improver, known ones can be used. For example, amides such as N, N-dimethylacetamide, N-methylacetamide, N, N-dimethylformamide, N-methylformamide, N-methylformanilide, N-methylpyrrolidone, pyrrolidone; tetramethylene sulfone, dimethyl sulfoxide, etc. Sulfone compounds or sulfoxide compounds; sugar alcohols such as sorbitol and mannitol; polyhydric alcohols such as ethylene glycol, propylene glycol, glycerin, diethylene glycol and triethylene glycol can be mentioned.
導電性向上剤の添加量は、水分散液に対して、0.5〜20wt%、好ましくは1.0〜10wt%である。 The amount of the conductivity improver added is 0.5 to 20 wt%, preferably 1.0 to 10 wt% with respect to the aqueous dispersion.
本発明の水分散液を用いて導電性被膜を製造することができる。例えば、水分散液を、基材に塗布・乾燥することで導電性被膜が簡単に得られる。基材としては、例えば、ガラス、プラスチック、ポリエステル、ポリアクリレート、ポリカーボネート、レジスト基板等が挙げられる。塗布方法としては、例えば、キャスティング法、ディッピング法、バーコード法、ロールコート法、グラビアコート法、フレキソ印刷法、スプレーコート法、インクジェット印刷法等が挙げられる。 A conductive coating can be produced using the aqueous dispersion of the present invention. For example, a conductive film can be easily obtained by applying and drying an aqueous dispersion on a base material. Examples of the base material include glass, plastic, polyester, polyacrylate, polycarbonate, resist substrate and the like. Examples of the coating method include a casting method, a dipping method, a barcode method, a roll coating method, a gravure coating method, a flexographic printing method, a spray coating method, an inkjet printing method and the like.
本発明を以下の実施例により更に詳細に説明するが、本発明はこれらに限定して解釈されるものではない。なお、本実施例で用いた分析機器及び測定方法を以下に列記する。
[NMR測定]
装置:日本電子製 JNM−ECZ400S
[表面抵抗率測定]
装置:三菱化学社製ロレスタGP MCP−T600。
[膜厚測定]
装置:BRUKER社製 DEKTAK XT。
[粒子径測定]
装置:日機装社製 Microtrac Nanotrac UPA−UT151。
[GPC測定]
装置:東ソー社製GPC8020
カラム:G6000PWXL+G3000PWXL (7.8×3000)+ガードカラムPWH
検出器:RI−8020
溶離液:0.2M燐酸緩衝液(pH=6.8)/CH3CN=9/1体積比
流 速:0.6mL/min
注入量:50μL(約0.1wt%)
温 度:40℃
標準試料:ポリスチレンスルホン酸ナトリウム(PolymerStandards
Service GmbH)
[粘度測定]
コンプリート型粘度計/BROOKFIELD VISCOMETER DV−1 Prime
[導電率測定]
ポリチオフェン−ポリスチレンスルホン酸共重合体複合体を含む水分散液 1.0mLを30mm角の無アルカリガラス板に塗布し、室温で一晩乾燥した後、ホットプレート上で150℃にて30分加熱して導電性高分子膜を得た。膜厚及び表面抵抗値から、以下の式に基づき算出した。
The present invention will be described in more detail with reference to the following examples, but the present invention is not construed as being limited thereto. The analytical instruments and measurement methods used in this example are listed below.
[NMR measurement]
Equipment: JEM-ECZ400S manufactured by JEOL Ltd.
[Measurement of surface resistivity]
Equipment: Mitsubishi Chemical Corporation Loresta GP MCP-T600.
[Film thickness measurement]
Equipment: DEKTAK XT manufactured by BRUKER.
[Particle size measurement]
Equipment: Microtrac Nanotrac UPA-UT151 manufactured by Nikkiso Co., Ltd.
[GPC measurement]
Equipment: Tosoh GPC8020
Column: G6000PWXL + G3000PWXL (7.8 × 3000) + Guard column PWH
Detector: RI-8020
Eluent: 0.2M phosphate buffer (pH = 6.8) / CH 3 CN = 9/1 Volume ratio Flow rate: 0.6mL / min
Injection volume: 50 μL (about 0.1 wt%)
Temperature: 40 ° C
Standard sample: Sodium polystyrene sulfonate (Polymer Standards)
Service GmbH)
[Viscosity measurement]
Complete Viscometer / BROOKFIELD VISCOMETER DV-1 Prime
[Conductivity measurement]
1.0 mL of an aqueous dispersion containing a polythiophene-polystyrene sulfonic acid copolymer complex is applied to a 30 mm square non-alkali glass plate, dried overnight at room temperature, and then heated at 150 ° C. for 30 minutes on a hot plate. Obtained a conductive polymer film. It was calculated from the film thickness and surface resistance value based on the following formula.
導電率[S/cm]=104/(表面抵抗率[Ω/□]×膜厚[μm])
[密着性試験]
導電率測定と同じ条件で作製した導電性高分子膜について、クロスカット法(JIS K 5600−5−6)による密着性試験を行った。尚、分類0〜2を良好判定、分類3〜5を不良判定とした。
Conductivity [S / cm] = 10 4 / (Surface resistivity [Ω / □] x Film thickness [μm])
[Adhesion test]
An adhesion test was carried out by a cross-cut method (JIS K 5600-5-6) on a conductive polymer film prepared under the same conditions as the conductivity measurement. Classifications 0 to 2 were good judgments, and classifications 3 to 5 were bad judgments.
良好:分類0〜2
不良:分類3〜5
実施例1(ポリスチレンスルホン酸共重合体の合成)
Good: Classification 0-2
Defective: Classification 3-5
Example 1 (Synthesis of polystyrene sulfonic acid copolymer)
還流冷却管、バドル型攪拌機を取り付けた200mlガラスフラスコに、純水 50.0g、スチレンスルホン酸ナトリウム 3.45g(14.8mmol、東ソー・ファインケム製、以下NaSSと略す)及び3−(メタクリロイルアミノ)プロピルジメチル(4−スルホブチル)アンモニウムハイドロオキシド 4.53g(14.8mmol、X=−NH−、m=3、n=4、R2=R3=R4=メチル基である式(4)で表される繰り返し単位のモノマー、以下コモノマーAと略す)を加えた後、窒素雰囲気下、過硫酸アンモニウム 65.8mgを添加して70℃のオイルバスで20時間加熱した。得られた水溶液 1gをアセトン 40mlに再沈させたところ白色ポリマー(ポリスチレンスルホン酸共重合体)が析出した。当該ポリスチレンスルホン酸共重合体について、濾過・乾燥ののち、GPCで重量平均分子量を測定したところ、Mw=20.1万、多分散度PDIは1.9であった。更に、1H−NMRによりポリスチレンスルホン酸共重合体中のスチレンスルホン酸繰り返し単位の比率は、51.6mol%であった。ポリスチレンスルホン酸共重合体中のスチレンスルホン酸繰り返し単位の比率は、1H−NMR(図1参照)上の芳香族プロトン(図1中のA部分)とメチレンプロトン(図1中のB部分)の比率から以下の式により算出した。 In a 200 ml glass flask equipped with a reflux condenser and a paddle type stirrer, 50.0 g of pure water, 3.45 g of sodium styrene sulfonate (14.8 mmol, manufactured by Toso Finechem, hereinafter abbreviated as NaSS) and 3- (methacryloylamino). In formula (4), 4.53 g (14.8 mmol, X = -NH-, m = 3, n = 4, R 2 = R 3 = R 4 = methyl group) of propyl dimethyl (4-sulfobutyl) ammonium hydrooxide. After adding the represented repeating unit monomer (hereinafter abbreviated as comonomer A), 65.8 mg of ammonium persulfate was added under a nitrogen atmosphere, and the mixture was heated in an oil bath at 70 ° C. for 20 hours. When 1 g of the obtained aqueous solution was reprecipitated in 40 ml of acetone, a white polymer (polystyrene sulfonic acid copolymer) was precipitated. The polystyrene sulfonic acid copolymer was filtered and dried, and then the weight average molecular weight was measured by GPC. As a result, Mw = 201,000 and the polydispersity PDI was 1.9. Further, the ratio of the styrene sulfonic acid repeating unit in the polystyrene sulfonic acid copolymer was 51.6 mol% by 1H-NMR. The ratio of styrene sulfonic acid repeating units in the polystyrene sulfonic acid copolymer is 1 H-NMR (see FIG. 1) for aromatic protons (part A in FIG. 1) and methylene protons (part B in FIG. 1). It was calculated by the following formula from the ratio of.
スチレンスルホン酸繰り返し単位の比率(mol%)=12×[A積分値]/(4×[B積分値]+12×[A積分値])×100
次に、得られた反応液に水を加えて111gの希釈液を調製した後、陽イオン交換樹脂35ml(LANXESS(株)製 商品名Lewatit S108H)に通液した。その結果、5.2wt%のポリスチレンスルホン酸共重合体(共重合体Aと略す)水溶液を128g(共重合体中のスチレンスルホン酸繰り返し単位の含量=39.1重量%)合成した。
Ratio of styrene sulfonic acid repeating unit (mol%) = 12 x [A integral value] / (4 x [B integral value] + 12 x [A integral value]) x 100
Next, water was added to the obtained reaction solution to prepare a diluted solution of 111 g, and then the solution was passed through 35 ml of a cation exchange resin (trade name: Lewatti S108H manufactured by LANXESS Co., Ltd.). As a result, 128 g (content of styrene sulfonic acid repeating unit in the copolymer = 39.1% by weight) of a 5.2 wt% polystyrene sulfonic acid copolymer (abbreviated as copolymer A) aqueous solution was synthesized.
実施例2 (ポリスチレンスルホン酸共重合体の合成)
NaSS、及びコモノマーAを、各々、6.56g(28.1mmol)、及び0.95g(3.11mmol)に変更した以外は、実施例1と同様な操作を行い、4.51wt%のポリスチレンスルホン酸共重合体(共重合体Bと略す)水溶液を128g合成した。
Example 2 (Synthesis of polystyrene sulfonic acid copolymer)
The same operation as in Example 1 was carried out except that NaSS and copolymer A were changed to 6.56 g (28.1 mmol) and 0.95 g (3.11 mmol), respectively, and 4.51 wt% polystyrene sulfonate was performed. 128 g of an aqueous acid copolymer (abbreviated as copolymer B) aqueous solution was synthesized.
尚、GPCで共重合体の重量平均分子量を測定したところ、Mw=23.9万、多分散度PDIは2.4であった。更に、1H−NMR(図2)によりポリマー中のスチレンスルホン酸繰り返し単位の比率は、91.4mol%であった(共重合体中のポリスチレンスルホン酸繰り返し単位の含量=86.5重量%)。 When the weight average molecular weight of the copolymer was measured by GPC, Mw = 239,000 and the polydispersity PDI was 2.4. Further, by 1H-NMR (FIG. 2), the ratio of the polystyrene sulfonic acid repeating unit in the polymer was 91.4 mol% (content of the polystyrene sulfonic acid repeating unit in the copolymer = 86.5% by weight).
実施例3 (ポリスチレンスルホン酸共重合体の合成)
NaSS、及びコモノマーAを、各々、7.5g(32.1mmol)、及び0.52g(1.69mmol)に変更した以外は、実施例1と同様な操作を行い、4.51wt%のポリスチレンスルホン酸共重合体(共重合体Cと略す)水溶液を114g合成した。
Example 3 (Synthesis of polystyrene sulfonic acid copolymer)
The same operation as in Example 1 was carried out except that NaSS and copolymer A were changed to 7.5 g (32.1 mmol) and 0.52 g (1.69 mmol), respectively, and 4.51 wt% polystyrene sulfone was used. 114 g of an aqueous acid copolymer (abbreviated as copolymer C) aqueous solution was synthesized.
得られたポリスチレンスルホン共重合体の重量平均分子量をGPC測定したところ、Mw=23.9万、多分散度PDIは2.4であった。更に、1H−NMR(図3)によりポリマー中のスチレンスルホン酸繰り返し単位の比率を測定したところ、その比率は95.9mol%であった(共重合体中のポリスチレンスルホン酸繰り返し単位の含量=93.4重量%)。 When the weight average molecular weight of the obtained polystyrene sulfone copolymer was measured by GPC, Mw = 239,000 and the polydispersity PDI was 2.4. Further, when the ratio of the styrene sulfonic acid repeating unit in the polymer was measured by 1H-NMR (FIG. 3), the ratio was 95.9 mol% (content of polystyrene sulfonic acid repeating unit in the copolymer = 93). .4% by weight).
実施例4(ポリチオフェン−ポリスチレンスルホン酸共重合体の合成)
窒素導入管、メカニカルスターラーを装着した200mlナス型フラスコに、実施例2で合成した共重合体Bを含む水溶液 20.5g(共重合体B固形分量=0.92g、共重合体B(重量)/3,4−エチレンジオキシチオフェン(重量)=2.31)、ジメチルスルホキシド 0.22g(2.82mmol)、硫酸鉄(III)・nH2O 32mg(3,4−エチレンジオキシチオフェンに対して2mol%)、3,4−エチレンジオキシチオフェン 0.40g(2.82mmol、3,4−エチレンジオキシチオフェンは、以下、EDOTと略す)及び水 39.39gを加えた後、系内を窒素置換した。次に、過硫酸アンモニウム 648mg(2.83mmol)及び水 18.8gからなる混合溶液をシリンジにて室温下滴下したのち、20時間、室温下、撹拌した(当該反応液中のEDOT濃度=0.5wt%)。
Example 4 (Synthesis of Polythiophene-Polystyrene Sulfonic Acid Copolymer)
20.5 g of an aqueous solution containing the copolymer B synthesized in Example 2 in a 200 ml eggplant-shaped flask equipped with a nitrogen introduction tube and a mechanical stirrer (copolymer B solid content = 0.92 g, copolymer B (weight)) / 3,4-ethylenedioxythiophene (weight) = 2.31), dimethyl sulfoxide 0.22 g (2.82 mmol), to iron sulfate (III) · nH 2 O 32mg (3,4- ethylene dioxythiophene 2 mol%), 0.40 g of 3,4-ethylenedioxythiophene (2.82 mmol, 3,4-ethylenedioxythiophene is hereinafter abbreviated as EDOT) and 39.39 g of water, and then the inside of the system is added. Nitrogen substitution. Next, a mixed solution consisting of 648 mg (2.83 mmol) of ammonium persulfate and 18.8 g of water was added dropwise at room temperature with a syringe, and then stirred for 20 hours at room temperature (EDOT concentration in the reaction solution = 0.5 wt). %).
次いで、陽イオン交換樹脂(LANXESS(株)製 商品名Lewatit S108H) 6g、及び陰イオン交換樹脂(LANXESS(株)製 商品名Lewatit MP62WS) 6gを加えて1時間撹拌した。イオン交換樹脂をNo.2濾紙にて濾過したのち、超音波ホモジナイザー(日本精機(株)製US−300T)にて分散処理することにより、0.81wt%のポリチオフェン−ポリスチレンスルホン酸共重合体複合体を含む分散水溶液を148.8g得た。分散水溶液のポリチオフェン−ポリスチレンスルホン酸共重合体複合体の粒径D50は、13.5nmであった。 Next, 6 g of a cation exchange resin (trade name Lewatt S108H manufactured by LANXESS Co., Ltd.) and 6 g of an anion exchange resin (trade name Lewatt MP62WS manufactured by LANXESS Co., Ltd.) were added and stirred for 1 hour. The ion exchange resin is No. After filtering with 2 filter papers, the dispersion treatment is carried out with an ultrasonic homogenizer (US-300T manufactured by Nippon Seiki Co., Ltd.) to obtain a dispersed aqueous solution containing 0.81 wt% of a polythiophene-polystyrene sulfonic acid copolymer complex. 148.8 g was obtained. The particle size D50 of the polythiophene-polystyrene sulfonic acid copolymer composite of the dispersed aqueous solution was 13.5 nm.
得られた分散水溶液 3gに、エチレングリコール 90mgを添加した液を、33mm角のガラス基板にキヤスト法により塗布して得られた薄膜の導電率測定と密着性試験を行った。導電率は434S/cmであった(膜厚=4.9μm,表面抵抗=4.7Ω/□)。密着性は良好であった。結果を表1に纏める。 A solution obtained by adding 90 mg of ethylene glycol to 3 g of the obtained dispersed aqueous solution was applied to a 33 mm square glass substrate by the cast method, and the conductivity of the obtained thin film was measured and the adhesion test was performed. The conductivity was 434 S / cm (film thickness = 4.9 μm, surface resistance = 4.7 Ω / □). Adhesion was good. The results are summarized in Table 1.
実施例5 (ポリチオフェン−ポリスチレンスルホン酸共重合体の合成)
窒素導入管、メカニカルスターラーを装着した200mlナス型フラスコに、実施例3で合成した共重合体Cを含む水溶液 18.8g(共重合体C固形分量=0.85g、共重合体C(重量)/EDOT(重量)=2.1)、ジメチルスルホキシド 0.22g(2.82mmol)、硫酸鉄(III)・nH2O 32mg(3,4−エチレンジオキシチオフェンに対して2mol%)、3,4−エチレンジオキシチオフェン 0.40g(2.82mmol)及び水53.9gを加えた後、系内を窒素置換した。次に、過硫酸アンモニウム 648mg(2.83mmol)及び水6.0gからなる混合溶液をシリンジにて室温下滴下したのち、20時間、室温下、撹拌した(当該反応液中のEDOT濃度=0.5wt%)。
Example 5 (Synthesis of Polythiophene-Polystyrene Sulfonic Acid Copolymer)
18.8 g of an aqueous solution containing the copolymer C synthesized in Example 3 in a 200 ml eggplant-shaped flask equipped with a nitrogen introduction tube and a mechanical stirrer (copolymer C solid content = 0.85 g, copolymer C (weight)) / EDOT (wt) = 2.1), 2 mol% relative to dimethyl sulfoxide 0.22 g (2.82 mmol), iron sulfate (III) · nH 2 O 32mg (3,4- ethylenedioxythiophene), 3, After adding 0.40 g (2.82 mmol) of 4-ethylenedioxythiophene and 53.9 g of water, the inside of the system was replaced with nitrogen. Next, a mixed solution consisting of 648 mg (2.83 mmol) of ammonium persulfate and 6.0 g of water was added dropwise at room temperature with a syringe, and then stirred for 20 hours at room temperature (EDOT concentration in the reaction solution = 0.5 wt). %).
実施例4と同様にイオン交換処理及び分散処理することにより、0.64wt%のポリチオフェン−ポリスチレンスルホン酸共重合体複合体を含む分散水溶液を168.59g得た。分散水溶液のポリチオフェン−ポリスチレンスルホン酸共重合体複合体の粒径D50は、13.4nmであった。 By ion exchange treatment and dispersion treatment in the same manner as in Example 4, 168.59 g of a dispersed aqueous solution containing a 0.64 wt% polythiophene-polystyrene sulfonic acid copolymer complex was obtained. The particle size D50 of the polythiophene-polystyrene sulfonic acid copolymer composite of the dispersed aqueous solution was 13.4 nm.
得られた分散水溶液 3gに、エチレングリコール 90mgを添加した液を、33mm角のガラス基板にキヤスト法により塗布して得られた薄膜の導電率測定と密着性試験を行った。導電率は578S/cmであった(膜厚=4.36μm,表面抵抗=3.97Ω/□)。密着性は良好であった。結果を表1に纏める。 A solution obtained by adding 90 mg of ethylene glycol to 3 g of the obtained dispersed aqueous solution was applied to a 33 mm square glass substrate by the cast method, and the conductivity of the obtained thin film was measured and the adhesion test was performed. The conductivity was 578 S / cm (film thickness = 4.36 μm, surface resistance = 3.97 Ω / □). Adhesion was good. The results are summarized in Table 1.
実施例6(ポリチオフェン−ポリスチレンスルホン酸共重合体の合成)
窒素導入管、メカニカルスターラーを装着した200mlナス型フラスコに、実施例3で合成した共重合体Cを含む水溶液 21.31g(共重合体C固形分量=0.96g、共重合体C(重量)/EDOT(重量)=2.4)、ジメチルスルホキシド 0.22g(2.82mmol)、硫酸鉄(III)・nH2O 32mg(3,4−エチレンジオキシチオフェンに対して2mol%)、3,4−エチレンジオキシチオフェン 0.40g(2.82mmol)及び水51.4gを加えた後、系内を窒素置換した。次に、過硫酸アンモニウム 648mg(2.83mmol)及び水6.0gからなる混合溶液をシリンジにて室温下滴下したのち、20時間、室温下、撹拌した(当該反応液中のEDOT濃度=0.5wt%)。
Example 6 (Synthesis of Polythiophene-Polystyrene Sulfonic Acid Copolymer)
21.31 g of an aqueous solution containing the copolymer C synthesized in Example 3 in a 200 ml eggplant-shaped flask equipped with a nitrogen introduction tube and a mechanical stirrer (copolymer C solid content = 0.96 g, copolymer C (weight)) / EDOT (wt) = 2.4), 2 mol% relative to dimethyl sulfoxide 0.22 g (2.82 mmol), iron sulfate (III) · nH 2 O 32mg (3,4- ethylenedioxythiophene), 3, After adding 0.40 g (2.82 mmol) of 4-ethylenedioxythiophene and 51.4 g of water, the inside of the system was replaced with nitrogen. Next, a mixed solution consisting of 648 mg (2.83 mmol) of ammonium persulfate and 6.0 g of water was added dropwise at room temperature with a syringe, and then stirred for 20 hours at room temperature (EDOT concentration in the reaction solution = 0.5 wt). %).
実施例4と同様にイオン交換処理及び分散処理することにより、0.79wt%のポリチオフェン−ポリスチレンスルホン酸共重合体複合体を含む分散水溶液を159.5g得た。分散水溶液のポリチオフェン−ポリスチレンスルホン酸共重合体複合体の粒径D50は、9.4nmであった。 By ion exchange treatment and dispersion treatment in the same manner as in Example 4, 159.5 g of a dispersed aqueous solution containing 0.79 wt% of a polythiophene-polystyrene sulfonic acid copolymer complex was obtained. The particle size D50 of the polythiophene-polystyrene sulfonic acid copolymer composite of the dispersed aqueous solution was 9.4 nm.
得られた分散水溶液 3gに、エチレングリコール 90mgを添加した液を、33mm角のガラス基板にキヤスト法により塗布して得られた薄膜の導電率測定と密着性試験を行った。導電率は557S/cmであった(膜厚=4.53μm,表面抵抗=3.97Ω/□)。密着性は良好であった。結果を表1に纏める。 A solution obtained by adding 90 mg of ethylene glycol to 3 g of the obtained dispersed aqueous solution was applied to a 33 mm square glass substrate by the cast method, and the conductivity of the obtained thin film was measured and the adhesion test was performed. The conductivity was 557 S / cm (film thickness = 4.53 μm, surface resistance = 3.97 Ω / □). Adhesion was good. The results are summarized in Table 1.
実施例7(ポリチオフェン−ポリスチレンスルホン酸共重合体の合成)
窒素導入管、メカニカルスターラーを装着した200mlナス型フラスコに、実施例3で合成した共重合体Cを含む水溶液 23.18g(共重合体C固形分量=1.05g、共重合体C(重量)/EDOT(重量)=2.6)、ジメチルスルホキシド 0.22g(2.82mmol)、硫酸鉄(III)・nH2O 32mg(3,4−エチレンジオキシチオフェンに対して2mol%)、3,4−エチレンジオキシチオフェン 0.40g(2.82mmol)及び水 49.5gを加えた後、系内を窒素置換した。次に、過硫酸アンモニウム 648mg(2.83mmol)及び水6.0gからなる混合溶液をシリンジにて室温下滴下したのち、20時間、室温下、撹拌した(当該反応液中のEDOT濃度=0.5wt%)。
Example 7 (Synthesis of Polythiophene-Polystyrene Sulfonic Acid Copolymer)
23.18 g of an aqueous solution containing the copolymer C synthesized in Example 3 in a 200 ml eggplant-shaped flask equipped with a nitrogen introduction tube and a mechanical stirrer (copolymer C solid content = 1.05 g, copolymer C (weight)) / EDOT (wt) = 2.6), 2 mol% relative to dimethyl sulfoxide 0.22 g (2.82 mmol), iron sulfate (III) · nH 2 O 32mg (3,4- ethylenedioxythiophene), 3, After adding 0.40 g (2.82 mmol) of 4-ethylenedioxythiophene and 49.5 g of water, the inside of the system was replaced with nitrogen. Next, a mixed solution consisting of 648 mg (2.83 mmol) of ammonium persulfate and 6.0 g of water was added dropwise at room temperature with a syringe, and then stirred for 20 hours at room temperature (EDOT concentration in the reaction solution = 0.5 wt). %).
実施例4と同様にイオン交換処理及び分散処理することにより、0.81wt%のポリチオフェン−ポリスチレンスルホン酸共重合体複合体を含む分散水溶液を162.04g得た。分散水溶液のポリチオフェン−ポリスチレンスルホン酸共重合体複合体の粒径D50は、13.7nmであった。 By ion exchange treatment and dispersion treatment in the same manner as in Example 4, 162.04 g of a dispersed aqueous solution containing 0.81 wt% of a polythiophene-polystyrene sulfonic acid copolymer complex was obtained. The particle size D50 of the polythiophene-polystyrene sulfonic acid copolymer composite of the dispersed aqueous solution was 13.7 nm.
得られた分散水溶液 3gに、エチレングリコール 90mgを添加した液を、33mm角のガラス基板にキヤスト法により塗布して得られた薄膜の導電率測定と密着性試験を行った。導電率は517S/cmであった(膜厚=4.52μm,表面抵抗=4.28Ω/□)。密着性は良好であった。結果を表1に纏める。 A solution obtained by adding 90 mg of ethylene glycol to 3 g of the obtained dispersed aqueous solution was applied to a 33 mm square glass substrate by the cast method, and the conductivity of the obtained thin film was measured and the adhesion test was performed. The conductivity was 517 S / cm (film thickness = 4.52 μm, surface resistance = 4.28 Ω / □). Adhesion was good. The results are summarized in Table 1.
比較例1 (PEDOT−PSSの合成)
ポリスチレンスルホン酸ナトリウム 50g(東ソーファインケム(株)製、商品名ポリナスPS−50、重量平均分子量:約230,000,22質量%水溶液)を水で5倍希釈した水溶液を、陽イオン交換樹脂(LANXESS(株)製 商品名Lewatit S108H) 160mLに通液し、3.4wt%のポリスチレンスルホン酸ホモポリマー水溶液 220gを得た。
Comparative Example 1 (Synthesis of PEDOT-PSS)
An aqueous solution obtained by diluting 50 g of sodium polystyrene sulfonate (manufactured by Toso Finechem Co., Ltd., trade name Polynas PS-50, weight average molecular weight: about 230,000, 22% by mass) with water 5 times is used as a cation exchange resin (LANXESS). Made by Co., Ltd. Trade name Lewattit S108H) A liquid was passed through 160 mL to obtain 220 g of a 3.4 wt% polystyrene sulfonate homopolymer aqueous solution.
窒素導入管、メカニカルスターラーを装着した200mlナス型フラスコに、3.4wt%のポリスチレンスルホン酸ホモポリマー水溶液 23.5g(ポリスチレンスルホン酸ホモポリマー(重量)/EDOT(重量)=2.0)、硫酸鉄(III)・nH2O 32mg(EDOTに対して2mol%)、EDOT 0.40g(2.82mmol)及び水36.6gを加えた後、系内を窒素置換した。次に、過硫酸アンモニウム 648mg(2.83mmol)及び水 18.8gからなる混合溶液をシリンジにて室温下滴下したのち、20時間、室温下、撹拌した(当該反応液中のEDOT濃度=0.5wt%)。 In a 200 ml eggplant-shaped flask equipped with a nitrogen introduction tube and a mechanical stirrer, 23.5 g of a 3.4 wt% polystyrene sulfonate homopolymer aqueous solution (polystyrene sulfonate homopolymer (weight) / EDOT (weight) = 2.0), sulfuric acid. After adding 32 mg of iron (III) and nH 2 O (2 mol% with respect to EDOT), 0.40 g (2.82 mmol) of EDOT and 36.6 g of water, the inside of the system was replaced with nitrogen. Next, a mixed solution consisting of 648 mg (2.83 mmol) of ammonium persulfate and 18.8 g of water was added dropwise at room temperature with a syringe, and then stirred for 20 hours at room temperature (EDOT concentration in the reaction solution = 0.5 wt). %).
実施例4と同様にイオン交換処理及び分散処理することにより、0.54wt%のポリチオフェン−ポリスチレンスルホン酸ホモポリマー複合体を含む分散水溶液を157.6g得た。分散水溶液のポリチオフェン−ポリスチレンスルホン酸ホモ重合体複合体の粒径D50は、17.1nmであった。 By ion exchange treatment and dispersion treatment in the same manner as in Example 4, 157.6 g of a dispersed aqueous solution containing a 0.54 wt% polythiophene-polystyrene sulfonate homopolymer complex was obtained. The particle size D50 of the polythiophene-polystyrene sulfonic acid homopolymer complex of the dispersed aqueous solution was 17.1 nm.
得られた分散水溶液 3gに、エチレングリコール 90mgを添加した液を、33mm角のガラス基板にキヤスト法により塗布して得られた薄膜の導電率測定を行った。導電率は325S/cmであった(膜厚=5.1μm,表面抵抗=6.0Ω/□)。結果を表1に纏める。 A solution prepared by adding 90 mg of ethylene glycol to 3 g of the obtained dispersed aqueous solution was applied to a 33 mm square glass substrate by the cast method, and the conductivity of the obtained thin film was measured. The conductivity was 325 S / cm (film thickness = 5.1 μm, surface resistance = 6.0 Ω / □). The results are summarized in Table 1.
比較例2 (ポリスチレンスルホン酸−メタクリルアミド共重合体、及びポリチオフェンの合成) Comparative Example 2 (Synthesis of polystyrene sulfonic acid-methacrylamide copolymer and polythiophene)
実施例1において、スチレンスルホン酸ナトリウム 3.45g(14.8mmol)及び3−(メタクリロイルアミノ)プロピルジメチル(4−スルホブチル)アンモニウムハイドロオキシド 4.53g(14.8mmol)を用いる代わりに、スチレンスルホン酸ナトリウム 6.56g(28.1mmol)、及びN−イソプロピルメタクリルアミド 0.40g(3.11mmol)を用いた以外は、実施例1と同様な操作を行い、5.1wt%のポリスチレンスルホン酸共重合体(共重合体Dと略す)を112.9g合成した。尚、GPCで共重合体の重量平均分子量を測定したところ、Mw=18.3万、多分散度PDIは2.0であった。1H−NMR(図2)によりポリマー中のポリスチレンスルホン酸のモノマー比率は、90.8mol%であった(共重合体中のスチレンスルホン酸繰り返し単位の含量=93.4重量%)。 In Example 1, instead of using 3.45 g (14.8 mmol) of sodium styrene sulfonate and 4.53 g (14.8 mmol) of 3- (methacryloylamino) propyldimethyl (4-sulfobutyl) ammonium hydrooxide, styrene sulfonic acid. The same procedure as in Example 1 was carried out except that 6.56 g (28.1 mmol) of sodium and 0.40 g (3.11 mmol) of N-isopropylmethacrylate were used, and 5.1 wt% polystyrene sulfonic acid copolymer weight was carried out. 112.9 g of a coalescence (abbreviated as copolymer D) was synthesized. When the weight average molecular weight of the copolymer was measured by GPC, Mw = 183,000 and the polydispersity PDI was 2.0. According to 1H-NMR (FIG. 2), the monomer ratio of polystyrene sulfonic acid in the polymer was 90.8 mol% (content of styrene sulfonic acid repeating unit in copolymer = 93.4% by weight).
窒素導入管、メカニカルスターラーを装着した200mlナス型フラスコに、上述の共重合体Dを含む水溶液 16.8g(共重合体D固形分量=1.99g、共重合体D(重量)/EDOT(重量)=2.1)、ジメチルスルホキシド 0.22g(2.82mmol)、硫酸鉄(III)・nH2O 32mg(3,4−エチレンジオキシチオフェンに対して2mol%)、3,4−エチレンジオキシチオフェン 0.40g(2.82mmol)及び水 43.1gを加えた後、系内を窒素置換した。次に、過硫酸アンモニウム 648mg(2.83mmol)及び水 18.8gからなる混合溶液をシリンジにて室温下滴下したのち、20時間、室温下、撹拌した(当該反応液中のEDOT濃度=0.5wt%)。 16.8 g of an aqueous solution containing the above-mentioned copolymer D (copolymer D solid content = 1.99 g, copolymer D (weight) / EDOT (weight) in a 200 ml eggplant-shaped flask equipped with a nitrogen introduction tube and a mechanical stirrer. ) = 2.1), 2 mol% relative to dimethyl sulfoxide 0.22 g (2.82 mmol), iron sulfate (III) · nH 2 O 32mg (3,4- ethylenedioxythiophene), 3,4-ethylene di After adding 0.40 g (2.82 mmol) of oxythiophene and 43.1 g of water, the inside of the system was replaced with nitrogen. Next, a mixed solution consisting of 648 mg (2.83 mmol) of ammonium persulfate and 18.8 g of water was added dropwise at room temperature with a syringe, and then stirred for 20 hours at room temperature (EDOT concentration in the reaction solution = 0.5 wt). %).
陽イオン交換樹脂(LANXESS(株)製 商品名Lewatit S108H) 6g、陰イオン交換樹脂(LANXESS(株)製 商品名Lewatit MP62WS) 6gを加えて1時間撹拌した。イオン交換樹脂をNo.2濾紙にて濾過したのち、超音波ホモジナイザー(日本精機(株)製US−300T)にて分散処理することにより、ポリチオフェン−ポリスチレンスルホン酸共重合体複合体を含む分散水溶液を得た。 6 g of a cation exchange resin (trade name Lewatt S108H manufactured by LANXESS Co., Ltd.) and 6 g of an anion exchange resin (trade name Lewatt MP62WS manufactured by LANXESS Co., Ltd.) were added and stirred for 1 hour. The ion exchange resin is No. After filtering with 2 filter papers, it was dispersed with an ultrasonic homogenizer (US-300T manufactured by Nippon Seiki Co., Ltd.) to obtain a dispersed aqueous solution containing a polythiophene-polystyrene sulfonic acid copolymer complex.
分散水溶液のポリチオフェン−ポリスチレンスルホン酸共重合体複合体の粒径D50は、18.1nmであった。 The particle size D50 of the polythiophene-polystyrene sulfonic acid copolymer composite of the dispersed aqueous solution was 18.1 nm.
得られた分散水溶液 3gに、エチレングリコール 90mgを添加した液を、33mm角のガラス基板にキヤスト法により塗布して得られた薄膜の導電率測定を行った。導電率は223S/cmであった(膜厚=5.2μm,表面抵抗=8.6Ω/□)。結果を表1に纏める。 A solution prepared by adding 90 mg of ethylene glycol to 3 g of the obtained dispersed aqueous solution was applied to a 33 mm square glass substrate by the cast method, and the conductivity of the obtained thin film was measured. The conductivity was 223 S / cm (film thickness = 5.2 μm, surface resistance = 8.6 Ω / □). The results are summarized in Table 1.
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