JP2020161332A5 - - Google Patents
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- JP2020161332A5 JP2020161332A5 JP2019059561A JP2019059561A JP2020161332A5 JP 2020161332 A5 JP2020161332 A5 JP 2020161332A5 JP 2019059561 A JP2019059561 A JP 2019059561A JP 2019059561 A JP2019059561 A JP 2019059561A JP 2020161332 A5 JP2020161332 A5 JP 2020161332A5
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- JP
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- Prior art keywords
- irradiation window
- plasma processing
- electrode
- processing apparatus
- dielectric
- Prior art date
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- 239000002245 particle Substances 0.000 claims 2
- 239000004020 conductor Substances 0.000 claims 1
- 238000010891 electric arc Methods 0.000 claims 1
- 239000012212 insulator Substances 0.000 claims 1
Claims (10)
前記電極板の接地電極側表面に配置される誘電体と、
前記誘電体に対して前記接地電極側に間隔を空けて配置されており、開口が互いに間隔を空けて複数形成された、照射窓と、
放電に供されるガスを、少なくとも前記誘電体と前記照射窓との間に供給するためのガス供給路と、
を備えており、
前記照射窓に対して前記ガスの下流側に接地電極が配置される場合において、前記電極板に高電圧を印加することで前記開口において大気圧近傍で放電を発生させ、前記放電で生じた活性粒子を含む放電ガスを、前記照射窓に形成された複数の前記開口から前記接地電極に向けて噴出させるプラズマ処理装置。 An electrode plate to which voltage is applied as a high-voltage electrode,
A dielectric placed on the surface of the electrode plate on the ground electrode side and
An irradiation window, which is arranged at a distance on the ground electrode side with respect to the dielectric and has a plurality of openings formed at a distance from each other.
A gas supply path for supplying at least the gas to be discharged between the dielectric and the irradiation window, and
Equipped with
When the ground electrode is arranged on the downstream side of the gas with respect to the irradiation window, by applying a high voltage to the electrode plate, a discharge is generated in the vicinity of the atmospheric pressure at the opening, and the activity generated by the discharge is generated. A plasma processing device that ejects a discharge gas containing particles from a plurality of openings formed in the irradiation window toward the ground electrode.
前記電極板の接地電極側表面に配置される誘電体と、
前記誘電体に対して前記接地電極側に間隔を空けて配置されており、少なくとも１つのスリット状の開口が形成された、照射窓と、
放電に供されるガスを、少なくとも前記誘電体と前記照射窓との間に供給するためのガス供給路と、
を備えており、
前記照射窓に対して前記ガスの下流側に接地電極が配置される場合において、前記電極板に高電圧を印加することで前記開口において大気圧近傍で放電を発生させ、前記放電で生じた活性粒子を含む放電ガスを、前記照射窓に形成された前記開口から前記接地電極に向けてスリット状に噴出させるプラズマ処理装置。 An electrode plate to which voltage is applied as a high-voltage electrode,
A dielectric placed on the surface of the electrode plate on the ground electrode side and
An irradiation window, which is arranged at a distance on the ground electrode side with respect to the dielectric and has at least one slit-shaped opening formed therein.
A gas supply path for supplying at least the gas to be discharged between the dielectric and the irradiation window, and
Equipped with
When the ground electrode is arranged on the downstream side of the gas with respect to the irradiation window, by applying a high voltage to the electrode plate, a discharge is generated in the vicinity of the atmospheric pressure at the opening, and the activity generated by the discharge is generated. A plasma processing device that ejects a discharge gas containing particles from the opening formed in the irradiation window toward the ground electrode in a slit shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019059561A JP7328500B2 (en) | 2019-03-27 | 2019-03-27 | Atmospheric plasma processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019059561A JP7328500B2 (en) | 2019-03-27 | 2019-03-27 | Atmospheric plasma processing equipment |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020161332A JP2020161332A (en) | 2020-10-01 |
| JP2020161332A5 true JP2020161332A5 (en) | 2022-03-07 |
| JP7328500B2 JP7328500B2 (en) | 2023-08-17 |
Family
ID=72639765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019059561A Active JP7328500B2 (en) | 2019-03-27 | 2019-03-27 | Atmospheric plasma processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7328500B2 (en) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004342331A (en) * | 2003-05-12 | 2004-12-02 | Sekisui Chem Co Ltd | Plasma discharge electrode and plasma discharge treatment method |
| JP2005149761A (en) * | 2003-11-11 | 2005-06-09 | Sony Corp | Power supply device for generating plasma |
| CN101658076A (en) * | 2007-03-27 | 2010-02-24 | 积水化学工业株式会社 | Plasma processing apparatus |
| JP5328685B2 (en) * | 2010-01-28 | 2013-10-30 | 三菱電機株式会社 | Plasma processing apparatus and plasma processing method |
| JP5775932B2 (en) * | 2011-08-29 | 2015-09-09 | 京セラ株式会社 | Plasma generator and plasma generator |
| GR1009432B (en) * | 2015-09-09 | 2019-01-15 | Εθνικο Κεντρο Ερευνας Φυσικων Επιστημων "Δημοκριτος" | Atmospheric plasma device for uniform treatment of large surfaces |
| JP2018018609A (en) * | 2016-07-26 | 2018-02-01 | 株式会社ケイテックリサーチ | Plasma processing device |
-
2019
- 2019-03-27 JP JP2019059561A patent/JP7328500B2/en active Active
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