JP2020158993A - Private part washing device - Google Patents

Abstract

To provide a private part washing device that is easy to keep clean.SOLUTION: The private part washing device comprises: a water discharge nozzle configured to be movable between an inner space of a toilet bowl and a cover case through a nozzle passage area; a shutter provided to open and close the nozzle passage area; and a shutter arm 20 with a support part 24 for supporting the shutter. An upper surface 46 of the support part 24 is composed of a smooth surface.SELECTED DRAWING: Figure 5

Description

The present invention relates to a local cleaning device.

Generally, the toilet bowl is provided with a local cleaning device capable of discharging cleaning water toward the local area. The local cleaning device receives a control signal by remote control operation, etc., and uses a water discharge nozzle that can move between the inner space of the toilet bowl and the cleaning function unit provided in the area behind the toilet bowl through the nozzle opening. I have. The local cleaning device is provided with a shutter that can open and close the nozzle opening. The shutter opens when the water discharge nozzle moves from the cleaning function part through the nozzle opening to the inner space of the toilet bowl, and the water discharge nozzle moves from the inner space of the toilet bowl through the nozzle opening to the inner space of the nozzle case. Close when you do.

For example, Patent Document 1 discloses a local cleaning device including a shutter arm in which a shutter is rotatably and detachably attached and the arm portion is supported and arranged so as to be able to move forward and backward in the front-rear direction. ..

Japanese Unexamined Patent Publication No. 2017-408564

However, in the local cleaning device disclosed in Patent Document 1, a recess is formed on the upper surface of the arm portion, and when the cleaning water is discharged from the water discharge nozzle with the shutter open, the water that hits the local area and scatters. There is a problem that dust and the like in the air tend to collect in the recesses, making it difficult to keep the shutter arm clean.

The present invention provides a local cleaning device that is easy to keep clean.

The local cleaning device of the present invention is configured to be movable between the inner space of the toilet bowl and the cover case through the nozzle opening, and has a water discharge nozzle that discharges cleaning water from the tip when located in the inner space. A shutter provided so as to open and close the nozzle opening and a shutter arm having a support portion for supporting the shutter are provided, and the upper surface of the support portion is composed of a continuous surface without unevenness.

According to the above configuration, since the upper surface of the support portion is formed of a continuous surface having no unevenness, even if water or dust reaches the support portion, it is unlikely to stay on the upper surface and the support portion is kept clean. This also keeps the local cleaning device clean.

In the local cleaning device of the present invention, a recess may be formed on the side surface of the support portion.

In the above configuration, by forming the concave portion on the side surface, it becomes easy to manufacture the support portion by using the molding technique. Further, since the recess is formed on the side surface, it is difficult for water and dust to enter the recess, so that the support portion is kept clean.

In the local cleaning device of the present invention, the lower surface of the recess may have a first inclined surface that descends from the inner end to the outer end in the left-right direction. Further, the lower surface of the recess may have a second inclined surface that descends from the rear portion to the front portion.

In the above configuration, since the first inclined surface and the second inclined surface are provided, even if water or dust enters the recess, the water or dust is easily discharged from the recess naturally. As a result, dirt does not easily collect in the recesses, and the support portion is kept clean.

In the local cleaning device of the present invention, the shutter may be provided so as to be rotatable in the vertical direction with respect to the nozzle opening.

In the above configuration, the shutter can be rotated in the vertical direction, so that the amount of rotational movement of the shutter is larger than that in the case where the shutter can be rotated only on the upper side, for example. Therefore, the strength of the shutter arm that supports the shutter is required, and the size of the support portion in the left-right direction and the up-down direction may be increased as compared with the case where the shutter rotates only on the upper side. Even in such a case, according to the above configuration, the effect of keeping the support portion clean is enhanced, and the local cleaning device is kept clean.

According to the local cleaning device of the present invention, it can be kept clean.

It is a perspective view of the toilet bowl provided with the local cleaning apparatus of one Embodiment of this invention. It is a perspective view of the state which the rear cover of the toilet bowl shown in FIG. 1 is removed. It is a side view of the main part of the local cleaning apparatus of the toilet bowl shown in FIG. 1, and is the figure which shows the state which the water discharge nozzle is located inside the cover case. It is a side view of the main part of the local cleaning apparatus of the toilet bowl shown in FIG. 1, and is the figure which shows the state which at least a part of the water discharge nozzle is located in the inner space of a toilet bowl. It is a perspective view of the shutter arm of the toilet bowl shown in FIG. FIG. 5 is a perspective view of a part of the shutter arm shown in FIG. 5 when viewed from an angle close to a substantially side view.

Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

As shown in FIG. 1, the toilet bowl 100 of the present embodiment includes a toilet bowl main body 1, a cleaning function unit 2, a toilet seat 3, and a toilet lid 5. Hereinafter, when the user of the toilet bowl 100 sits on the toilet seat 3, the relative position on the left when viewed from the user is the left side, the relative position on the right when viewed from the user is the right side, and the direction connecting the left side and the right side is the left-right direction. Let it be T1. When the user sits on the toilet seat 3, the relative position in front of the user is the front side, the relative position behind the user is the rear side, and the direction connecting the front side and the rear side is the front-rear direction T2. When the user sits on the toilet seat 3, the relative position above the user is the upper side, the relative position below the user is the lower side, and the direction connecting the upper side and the lower side is the vertical direction T3. ..

The cleaning function unit 2 is provided inside the cover case 6 provided in the area on the rear side of the toilet bowl body 1. The cleaning function unit 2 detects, for example, a control signal corresponding to a remote control operation by the user, and discharges cleaning water to the inner peripheral surface 27 of the toilet bowl 21 of the toilet body 1. A rim 25 projecting toward the inner space 23 is provided on the upper portion of the toilet bowl 21. The cleaning function unit 2 adjusts the amount of cleaning water flowing on the inner peripheral surface 27. In the lower part of the inner space 23, the washing water 26 that seals the communication port between the toilet bowl 21 and the drain pipe (not shown) is stored.

The toilet seat 3 and the toilet lid 5 are detachably connected to the cover case 6 and are rotatable around a rotation shaft O1 extending in the left-right direction T1. The toilet lid 5 can open and close the openings of the toilet body 1 and the toilet seat 3.

As shown in FIG. 2, the cover case 6 includes a base plate 7 and a cover 8. The base plate 7 is provided in the area on the rear side of the toilet bowl main body 1 and serves as a base for the cleaning function unit 2 and the local cleaning device 4. The cover 8 is assembled to the base plate 7 and forms a storage space for the cleaning function unit 2 and the local cleaning device 4 together with the base plate 7.

As shown in FIG. 2, the local cleaning device 4 is housed in the cover case 6 together with the cleaning function unit 2. Specifically, the local cleaning device 4 includes a nozzle operating mechanism 11, a hot water supply mechanism, a hot air drying mechanism 12, and a deodorizing mechanism 13.

The nozzle operating mechanism 11 is provided on the front side of the base plate 7 in the front-rear direction T2 and at a substantially central portion in the left-right direction T1. The hot water supply mechanism supplies hot water for cleaning the local area to the nozzle operation mechanism 11.

The nozzle operating mechanism 11 includes a water discharge nozzle 17 for cleaning the anus, a water discharge nozzle 18 for a bidet, a nozzle cover 15 containing the water discharge nozzles 17 and 18, and a nozzle movable mechanism 14. Each of the water discharge nozzles 17 and 18 is formed in a substantially cylindrical rod shape. The water discharge nozzles 17 and 18 and the nozzle cover 15 are arranged in an inclined state in which the tip portions of the water discharge nozzles 17 and 18 are gradually lowered as the tip portions move forward. Therefore, the water discharge nozzles 17 and 18 gradually descend as they move forward. Hereinafter, the moving direction of the axes of the water discharge nozzles 17 and 18 is referred to as the moving direction T5. The axes of the water discharge nozzles 17 and 18 are parallel to each other in the same direction. Discharge holes for discharging wash water are formed at the tips of the water discharge nozzles 17 and 18. The washing water is supplied from the rear ends of the water discharge nozzles 17 and 18 to the inside of the water discharge nozzles 17 and 18 and circulates inside, and is discharged from the above-mentioned discharge holes in a predetermined direction.

The hot air drying mechanism 12 supplies hot air to a nozzle or the like for supplying hot air for locally drying, or directly supplies warm air to the inner space 23.

The deodorizing mechanism 13 includes, for example, a deodorizing cartridge (not shown), sucks air in the inner space 23, and deodorizes with the deodorizing cartridge.

The nozzle movable mechanism 14 is composed of a rack and pinion mechanism (see FIGS. 3 and 4). That is, the water discharge nozzles 17 and 18 are individually moved along the above-mentioned axis by the rack and pinion mechanism.

When the motor 19 and the pinion rotate in one direction in response to remote control operation or the like, the water discharge nozzles 17 and 18 move forward along each axis, pass through the nozzle passage area (nozzle opening) 9, and inside the toilet bowl 21. It protrudes into the space 23. On the other hand, when the motor 19 and the pinion rotate in the direction opposite to the above-mentioned one direction in response to the remote control operation or the like, the water discharge nozzles 17 and 18 move backward along the respective axis lines and pass through the nozzle passage region 9 It is housed in the cover 15. That is, the water discharge nozzles 17 and 18 are configured to be movable in the moving direction T5 between the inner space 23 and the inner space of the cover case 6 through the nozzle passing region 9. When the water discharge nozzles 17 and 18 are located in the inner space 23, the washing water is discharged from the above-mentioned water discharge holes.

The local cleaning device 4 includes a shutter base 30, a shutter 10, and a shutter arm 20 in addition to the above-mentioned water discharge nozzles 17 and 18, the nozzle cover 15, and the nozzle movable mechanism 14.

As shown in FIG. 2, the shutter base 30 includes a first base main body 32 and a second base main body 34. The first base body 32 is formed with an insertion port or an insertion recess (not shown) into which the tip end portion of the nozzle cover 15, that is, the front end portion can be inserted and fixed. The first base body 32 is fixed in the vicinity of the tip of the nozzle cover 15 by inserting the tip of the nozzle cover 15 into the above-mentioned insertion port or insertion recess. Arm holding portions 36 are provided at both ends of the first base main body 32 in the left-right direction T1.

The second base main body 34 is arranged on the front side of the first base main body 32, and is configured to be able to hold a predetermined relative position with the first base main body 32. Arm insertion portions 38 are provided at both ends of the second base main body 34 in the left-right direction T1. The axis of the arm insertion portion 38 is located on the same line as the axis of the arm holding portion 36. The first base main body 32 and the second base main body 34 are connected to each other in a detachable state by a common screw in the front-rear direction T2. A female screw hole 39 is formed at the upper end of the arm insertion portion 38. The shutter base 30 is fixed at a predetermined position on the base plate 7 by inserting a screw (not shown) screwed into the female screw hole 39 into the screw insertion hole formed in the base plate 7.

The shutter 10 is provided so that the nozzle passing region 9 can be opened and closed. The shutter 10 opens the nozzle passage region 9 in response to the operation of the water discharge nozzles 17 and 18 advancing from the internal space of the cover case 6 to the inner space 23 during local cleaning.

When viewed along the moving direction T5 with the shutter closed, the shutter 10 is formed in a shape extending in the left-right direction T1. The size of the upper end or the lower end of the shutter 10 in the left-right direction T1 is smaller than the size of the left-right direction T1 of the central shutter 10 in the vertical direction T3. When viewed from the front, the size of the vertical direction T3 is substantially uniform on the inside excluding the end portion of the shutter 10, and is smaller than the size of the upper end or the lower end of the shutter 10 in the horizontal direction T1. When viewed along the left-right direction T1, the shutter 10 bulges so that the central portion of the shutter 10 in the vertical direction T3 is located diagonally forward from the upper and lower ends of the shutter 10.

As shown in FIGS. 3 to 5, the shutter arm 20 includes a shaft portion 22 and a support portion 24. A shutter 10 is attached to the shaft portion 22 via a shutter receiver 40. The shaft portion 22 is composed of a rod-shaped member 33 having a substantially circular cross section. A protrusion 28 that protrudes outward in the radial direction is provided on the peripheral surface of the rod-shaped member 33. The shutter receiver 40 is held by the shaft portion 22 by locking the shutter receiver 40 to the protrusion 28. In addition, in FIG. 3 and FIG. 4, the shutter base 30 is omitted.

In a side view, a recess recessed in the rear side is formed on the front surface of the shutter receiver 40 near the center in the vertical direction T3. This recess extends from the left end to the right end of the shutter receiver 40. The upper end edge and the lower end edge of the above-mentioned recess on the front surface of the shutter receiver 40 are provided with protrusions protruding inward of the recess. Protrusions 35 protruding from both ends along the left-right direction T1 are provided at both ends of the shutter receiver 40 in the left-right direction T1. By fitting the recessed portion into the shaft portion 22, the shutter receiver 40 and the shutter 10 attached to the shutter receiver 40 can rotate around the rotation shaft O22 of the shaft portion 22.

The support portion 24 is composed of a pair of support arms 41 and 42. As shown in FIG. 5, the support arms 41 and 42 extend rearward from both ends of the shaft portion 22 in the left-right direction T1. The arm portion 44 connecting the front end portions and the rear end portions of the support arms 41 and 42 has a substantially rectangular cross section.

The rear end portions of the support arms 41 and 42 are provided with a rotating portion 50 that bulges from the rear end portion in a side view. The rotating portion 50 includes a rotating side surface 56, a rotating upper portion 52, a rotating lower portion 54, and a spring connecting protrusion 58. The rotating side surface 56 bulges in the vertical direction T3 from the rear end portions of the support arms 41 and 42 as described above in a side view along the left-right direction T1, and is formed in a substantially crescent shape. In a side view, the rotation upper portion 52 extends upward from the rear end of the arm portion 44 along the outer peripheral upper end of the rotation side surface 56. The rotating lower portion 54 extends from the rear end of the arm portion 44 along the outer peripheral lower end of the rotating side surface 56. In the front view along the front-rear direction T2, the rotation upper part 52 and the rotation lower part 54 project from the rotation side surface 56 to the outer region along the left-right direction T1.

The arm insertion portion 38 shown in FIG. 2 is formed with a hollow region (not shown) along the axis. The tip of the peripheral wall of the arm insertion portion 38 surrounding the hollow region is slightly narrowed inward in the radial direction about the axis. The upper surface of the rotating upper portion 52 and the lower surface of the rotating lower portion 54 shown in FIG. 5 abut on the peripheral wall surface at the front end of the hollow region of the arm insertion portion 38 shown in FIG. In other words, the radius of curvature of the upper surface of the rotating upper portion 52 and the lower surface of the rotating lower portion 54 is substantially the same as the radius of curvature of the inner peripheral surface of the front end of the arm insertion portion 38.

The spring connection protrusion 58 projects outward in the left-right direction T1 from the upper surface of the rotation upper portion 52 and the rotation side surface 56 in the radial direction from the rotation lower portion 54 in the side view. The spring connecting protrusion 58 and the predetermined position of the base plate 7 are connected by a spring member (not shown) passing through an opening formed at the rear end of the arm holding portion 36. As a result, the shutter arm 20 is urged to the rear portion of the internal space of the cover case 6.

The upper surface 46 of the arm portion (support portion) 44 is composed of a smooth surface (continuous surface) without unevenness. Here, "no unevenness" means that, for example, the change in the absolute value of the inclination of the average line of the upper surface 46 or the tangent line of the average line of the upper surface 46 is within a predetermined value as the upper surface 46 advances in an arbitrary direction at a predetermined interval. It means that the positive / negative change of the inclination of the tangent line of the upper surface 46 or the upper surface 46 is within one time, and the arithmetic mean roughness of the surface roughness is Ra 1.6 or less. The above condition is an example showing the smoothness of the upper surface 46. As long as the upper surface 46 has no undulations or waviness and is smooth, the above conditions are not limited. Recesses 60-1 and 60-2 are formed on the side surface 47 of the arm portion 44. The recesses 60-1 and 60-2 are formed for so-called "lightening" when the shutter arm 20 is manufactured by using a molding technique such as injection molding.

The depth of the recesses 60-1 and 60-2 from the side surface 47 is set to the size of the arm portion 44 in the horizontal direction T1 and the size of the vertical direction T3 within a range in which the strength of the arm portion 44 satisfies a predetermined reference value. It is set as appropriate. As shown in FIG. 6, the lower surface 62 of the recess 60-1 has an inclined surface (first inclined surface) 64. The inclined surface 64 descends from the inner end 63 in the left-right direction T1 toward the outer end 65. The lower surface 66 of the recess 60-2 has an inclined surface (first inclined surface, second inclined surface) 68. The inclined surface 68 descends from the inner end 71 in the left-right direction T1 toward the outer end 72, and descends from the rear end portion (rear portion) 73 to the front end portion (front portion) 74.

In the above-described configuration of the shutter base 30, the shutter 10, and the shutter arm 20, the upper surface of the rotating upper portion 52 and the lower surface of the rotating lower portion 54 abut against the peripheral wall surface surrounding the hollow region of the arm insertion portion 38 and the arm holding portion 36. .. As a result, the support portion 24 is held in the hollow region of the arm holding portion 36 and the arm insertion portion 38 in a movable state in the moving direction T5. Further, the support portion 24 can rotate in the vertical direction because the upper surface of the rotation upper portion 52 and the lower surface of the rotation lower portion 54 can slide while being in contact with the peripheral wall surface of the front end of the hollow region of the arm insertion portion 38. It is held in a state of being. As shown in FIG. 4, the shutter 10 supported by the shutter arm 20 provided with the support portion 24 moves in the moving direction T5 with respect to the nozzle passing region 9 in response to the movement of the water discharge nozzles 17 and 18. It is rotatably provided in the vertical direction T3. In FIG. 4, the state in which the shutter 10 is rotated above the water discharge nozzle 18 is shown by a solid line, and the state in which the shutter 10 is rotated below the water discharge nozzle 18 is shown by a chain double-dashed line.

The local cleaning device 4 of the present embodiment described above includes the above-mentioned water discharge nozzles 17 and 18, a shutter 10, and a shutter arm 20. The upper surface 46 of the support portion 24 of the shutter arm 20 is formed of a smooth surface. When at least the tips of the water discharge nozzles 17 and 18 are located in the inner space 23 of the toilet bowl 21, the shutter 10 is open and the support portion 24 is mainly exposed in the inner space 23. According to the local cleaning device 4, since the upper surface 46 is composed of a smooth surface and the upper surface 46 has no unevenness, even if water, dust, or dirt reaches the support portion 24, it is difficult for water, dust, or dirt to stay on the upper surface 46, and the support portion 24 It is kept clean. In addition, the upper surface 46 can be easily cleaned, and the local cleaning device 4 can be kept clean.

According to the local cleaning device 4 of the present embodiment, the recesses 60-1 and 60-2 for lightening when the shutter arm 20 is manufactured by the molding technique are formed on the side surface 47 of the support portion 24. The side surface 47 is a side surface opposite to the side surface facing the water discharge nozzles 17 and 18 in the left-right direction T1, and is a surface located on the outermost side of the arm portion 44 and along the vertical direction T3. As described above, the side surface 47 is a surface of the arm portion 44 that is difficult for water, dust, and dirt to reach. As a result, it is possible to prevent water, dust and dirt from entering the recesses 60-1 and 60-2 as much as possible. Further, according to the local cleaning device 4, the recesses 60-1 and 60-2 for lightening can be formed in the support portion 24 while maintaining the smooth surface of the upper surface 46. Therefore, when the shutter arm 20 is manufactured by injection molding or the like, the thickening of the shutter arm 20 is suppressed, the shutter arm 20 having the designed dimensions is manufactured, and the strength of the shutter arm 20 is maintained. It is possible to reduce the weight. If the shutter arm 20 can be manufactured with the dimensions as designed, the shutter arm 20 can be installed in the minimum area or the like in the internal space of the cover case 6, and the occurrence of deviation in the relative arrangement with the shutter base 30 can be prevented.

According to the local cleaning device 4 of the present embodiment, the lower surface 62 of the recesses 60-1 and 60-2 has the above-mentioned inclined surfaces 64 and 68. As a result, even if water, dust, or dirt enters the recesses 60-1, 60-2, the natural discharge of water, dust, or dirt from the recesses 60-1, 60-2 is promoted, and the recesses 60-1, 60-2, Accumulation of dirt in 60-2 can be prevented. As a result, the support portion 24 can be kept clean and the local cleaning device 4 can be kept clean.

According to the local cleaning device 4 of the present embodiment, the shutter 10 is rotatably provided in the vertical direction T3 with respect to the nozzle passing region 9. As a result, for example, the amount of rotational movement of the shutter 10 is larger than that in the case where the shutter 10 can rotate only on the upper side. Therefore, the strength of the support portion 24 of the shutter arm 20 that supports the shutter 10 is particularly required, and the size of the support portion 24 in the left-right direction T1 and the vertical direction T3 is larger than that in the case where the shutter 10 rotates only on the upper side. It is thought that it will be done. Even in such a case, since the upper surface 46 is a smooth surface as described above, the effect of keeping the support portion 24 clean can be enhanced, and the local cleaning device 4 can be kept clean. When the shutter arm 20 is manufactured by injection molding or the like, the support portion 24 is kept clean by forming a recess for lightening on the side surface 47 and further providing the above-mentioned inclined surface on the lower surface of the recess. The local cleaning device 4 can be kept clean.

Although the preferred embodiment of the present invention has been described in detail above, the present invention is not limited to the above-described embodiment. The present invention can be modified within the scope of the gist of the present invention described in the claims.

For example, the arm portion 44 of the above-described embodiment is formed linearly along the axial direction, and the upper surface 46 is formed of a smooth surface. However, the shutter arm of the present invention only needs to have a support portion for supporting the shutter, and the shape of the shutter arm of the present invention is not limited to the shape of the shutter arm 20 of the above-described embodiment. The axial direction of the support portion may be curved. That is, the upper surface of the support portion may be formed of a curved surface (continuous surface) having no unevenness. From the viewpoint of surely preventing the accumulation of dirt, the upper surface of the support portion is preferably any one of a horizontal smooth surface, a linear inclined surface, and a convex curved surface protruding upward.

Further, the shutter arm 20 of the above-described embodiment is assumed to be manufactured of resin, but if the strength of the shutter arm 20 can be maintained as a predetermined value, the size of the support portion 24 in the horizontal direction T1 and the vertical direction T3 Is set freely as appropriate. If the sizes of the support portion 24 in the horizontal direction T1 and the vertical direction T3 are suppressed to such a size that the lightening is not required, the upper surface 46 is composed of a smooth surface, and the side surfaces 47 have recesses 60-1, 60-2. May not be formed.

The shapes of the recesses 60-1 and 60-2 are not limited to the shapes illustrated in FIGS. 5 and 6, but the water, dust, and filth that have entered are discharged to the outside, such as having the above-mentioned inclined surfaces 64 and 68. It is preferable to have an easy shape.

2 Cleaning function unit 4 Local cleaning device 9 Nozzle passage area (nozzle opening)
10 Shutter 17, 18 Water discharge nozzle 20 Shutter arm 21 Toilet bowl 23 Inner space 24 Support part 46 Upper surface 60-1, 60-2 Recessed 63, 71 Inner end 64, 68 Inclined surface (first inclined surface)
65, 72 Outer end 68 Inclined surface (2nd inclined surface)
73 Rear end (rear)
74 Front end (front)

Claims (5)

A water discharge nozzle that is configured to be movable between the inner space of the toilet bowl and the cover case through the nozzle opening and discharges cleaning water from the tip when located in the inner space.
A shutter provided to open and close the nozzle opening, and
A shutter arm having a support portion for supporting the shutter,
With
The upper surface of the support portion is composed of a continuous surface without unevenness.
Local cleaning device. A recess is formed on the side surface of the support portion.
The local cleaning device according to claim 1. The lower surface of the recess has a first inclined surface that descends from the inner end to the outer end in the left-right direction.
The local cleaning device according to claim 2. The lower surface of the recess has a second inclined surface that descends from the rear to the front.
The local cleaning device according to claim 2 or 3. The shutter is provided so as to be rotatable in the vertical direction with respect to the nozzle opening.
The local cleaning device according to any one of claims 1 to 4.

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