JP2020147624A - Curable composition - Google Patents
Curable composition Download PDFInfo
- Publication number
- JP2020147624A JP2020147624A JP2019043768A JP2019043768A JP2020147624A JP 2020147624 A JP2020147624 A JP 2020147624A JP 2019043768 A JP2019043768 A JP 2019043768A JP 2019043768 A JP2019043768 A JP 2019043768A JP 2020147624 A JP2020147624 A JP 2020147624A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- curable composition
- liquid
- manufactured
- viscosity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 68
- 229920005989 resin Polymers 0.000 claims abstract description 68
- 239000011347 resin Substances 0.000 claims abstract description 68
- 239000007788 liquid Substances 0.000 claims abstract description 61
- 238000002156 mixing Methods 0.000 claims abstract description 32
- 239000000178 monomer Substances 0.000 claims abstract description 21
- 239000011256 inorganic filler Substances 0.000 claims abstract description 16
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 16
- 239000003999 initiator Substances 0.000 claims abstract description 11
- 239000003822 epoxy resin Substances 0.000 claims description 49
- 229920000647 polyepoxide Polymers 0.000 claims description 49
- 150000001875 compounds Chemical class 0.000 claims description 32
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 16
- YRIZYWQGELRKNT-UHFFFAOYSA-N 1,3,5-trichloro-1,3,5-triazinane-2,4,6-trione Chemical compound ClN1C(=O)N(Cl)C(=O)N(Cl)C1=O YRIZYWQGELRKNT-UHFFFAOYSA-N 0.000 claims description 10
- 229950009390 symclosene Drugs 0.000 claims description 10
- 238000007650 screen-printing Methods 0.000 claims description 7
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 abstract description 17
- 238000013019 agitation Methods 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 41
- 229910000679 solder Inorganic materials 0.000 description 24
- 239000000126 substance Substances 0.000 description 18
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 17
- IISBACLAFKSPIT-UHFFFAOYSA-N Bisphenol A Natural products C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 16
- -1 diol compound Chemical class 0.000 description 15
- 239000004593 Epoxy Substances 0.000 description 13
- 239000000047 product Substances 0.000 description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 239000005011 phenolic resin Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 10
- 235000013824 polyphenols Nutrition 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 239000000976 ink Substances 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 9
- 229920005862 polyol Polymers 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 8
- 150000008065 acid anhydrides Chemical class 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- 150000003077 polyols Chemical class 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 7
- 125000002947 alkylene group Chemical group 0.000 description 7
- 239000007795 chemical reaction product Substances 0.000 description 7
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 6
- 230000001588 bifunctional effect Effects 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical class C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- 239000011342 resin composition Substances 0.000 description 6
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 125000005442 diisocyanate group Chemical group 0.000 description 5
- 229920000728 polyester Polymers 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 239000004721 Polyphenylene oxide Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 238000007259 addition reaction Methods 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 229920000570 polyether Polymers 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 150000007519 polyprotic acids Polymers 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000000454 talc Substances 0.000 description 4
- 229910052623 talc Inorganic materials 0.000 description 4
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 4
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 3
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- 150000002009 diols Chemical class 0.000 description 3
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000005562 fading Methods 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 3
- 150000002596 lactones Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 3
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 3
- 239000003208 petroleum Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920005906 polyester polyol Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 description 3
- 150000005846 sugar alcohols Polymers 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 239000003981 vehicle Substances 0.000 description 3
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- PTBDIHRZYDMNKB-UHFFFAOYSA-N 2,2-Bis(hydroxymethyl)propionic acid Chemical group OCC(C)(CO)C(O)=O PTBDIHRZYDMNKB-UHFFFAOYSA-N 0.000 description 2
- JVYDLYGCSIHCMR-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)butanoic acid Chemical compound CCC(CO)(CO)C(O)=O JVYDLYGCSIHCMR-UHFFFAOYSA-N 0.000 description 2
- GIMQKKFOOYOQGB-UHFFFAOYSA-N 2,2-diethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)(OCC)C(=O)C1=CC=CC=C1 GIMQKKFOOYOQGB-UHFFFAOYSA-N 0.000 description 2
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 2
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 2
- SGWZVZZVXOJRAQ-UHFFFAOYSA-N 2,6-Dimethyl-1,4-benzenediol Chemical compound CC1=CC(O)=CC(C)=C1O SGWZVZZVXOJRAQ-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- YCOXTKKNXUZSKD-UHFFFAOYSA-N 3,4-xylenol Chemical compound CC1=CC=C(O)C=C1C YCOXTKKNXUZSKD-UHFFFAOYSA-N 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- QGZHYFIQDSBZCB-UHFFFAOYSA-N (2-ethylphenyl)-(2,4,6-trimethylbenzoyl)phosphinic acid Chemical compound CCC1=CC=CC=C1P(O)(=O)C(=O)C1=C(C)C=C(C)C=C1C QGZHYFIQDSBZCB-UHFFFAOYSA-N 0.000 description 1
- XKSUVRWJZCEYQQ-UHFFFAOYSA-N 1,1-dimethoxyethylbenzene Chemical compound COC(C)(OC)C1=CC=CC=C1 XKSUVRWJZCEYQQ-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- BVEIKFLZWBDLJG-UHFFFAOYSA-N 1-butylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CCCC BVEIKFLZWBDLJG-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- ZIKLJUUTSQYGQI-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxypropoxy)propane Chemical compound CCOCC(C)OCC(C)OCC ZIKLJUUTSQYGQI-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical group C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- CERJZAHSUZVMCH-UHFFFAOYSA-N 2,2-dichloro-1-phenylethanone Chemical compound ClC(Cl)C(=O)C1=CC=CC=C1 CERJZAHSUZVMCH-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- AUFZRCJENRSRLY-UHFFFAOYSA-N 2,3,5-trimethylhydroquinone Chemical compound CC1=CC(O)=C(C)C(C)=C1O AUFZRCJENRSRLY-UHFFFAOYSA-N 0.000 description 1
- IVIDDMGBRCPGLJ-UHFFFAOYSA-N 2,3-bis(oxiran-2-ylmethoxy)propan-1-ol Chemical compound C1OC1COC(CO)COCC1CO1 IVIDDMGBRCPGLJ-UHFFFAOYSA-N 0.000 description 1
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- KUFFULVDNCHOFZ-UHFFFAOYSA-N 2,4-xylenol Chemical compound CC1=CC=C(O)C(C)=C1 KUFFULVDNCHOFZ-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- DRLRGHZJOQGQEC-UHFFFAOYSA-N 2-(2-methoxypropoxy)propyl acetate Chemical compound COC(C)COC(C)COC(C)=O DRLRGHZJOQGQEC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- SYEWHONLFGZGLK-UHFFFAOYSA-N 2-[1,3-bis(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COCC(OCC1OC1)COCC1CO1 SYEWHONLFGZGLK-UHFFFAOYSA-N 0.000 description 1
- YIJYFLXQHDOQGW-UHFFFAOYSA-N 2-[2,4,6-trioxo-3,5-bis(2-prop-2-enoyloxyethyl)-1,3,5-triazinan-1-yl]ethyl prop-2-enoate Chemical class C=CC(=O)OCCN1C(=O)N(CCOC(=O)C=C)C(=O)N(CCOC(=O)C=C)C1=O YIJYFLXQHDOQGW-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- MWDGNKGKLOBESZ-UHFFFAOYSA-N 2-oxooctanal Chemical compound CCCCCCC(=O)C=O MWDGNKGKLOBESZ-UHFFFAOYSA-N 0.000 description 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- BJEMXPVDXFSROA-UHFFFAOYSA-N 3-butylbenzene-1,2-diol Chemical group CCCCC1=CC=CC(O)=C1O BJEMXPVDXFSROA-UHFFFAOYSA-N 0.000 description 1
- UJTRCPVECIHPBG-UHFFFAOYSA-N 3-cyclohexylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C2CCCCC2)=C1 UJTRCPVECIHPBG-UHFFFAOYSA-N 0.000 description 1
- ARXVXVOLXMVYIT-UHFFFAOYSA-N 3-methylbutyl 2-(dimethylamino)benzoate Chemical compound CC(C)CCOC(=O)C1=CC=CC=C1N(C)C ARXVXVOLXMVYIT-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- JRPRCOLKIYRSNH-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) benzene-1,2-dicarboxylate Chemical compound C=1C=CC=C(C(=O)OCC2OC2)C=1C(=O)OCC1CO1 JRPRCOLKIYRSNH-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 239000007822 coupling agent Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002270 dispersing agent Chemical group 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- ORBFAMHUKZLWSD-UHFFFAOYSA-N ethyl 2-(dimethylamino)benzoate Chemical compound CCOC(=O)C1=CC=CC=C1N(C)C ORBFAMHUKZLWSD-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 239000001056 green pigment Substances 0.000 description 1
- WDPIZEKLJKBSOZ-UHFFFAOYSA-M green s Chemical compound [Na+].C1=CC(N(C)C)=CC=C1C(C=1C2=CC=C(C=C2C=C(C=1O)S([O-])(=O)=O)S([O-])(=O)=O)=C1C=CC(=[N+](C)C)C=C1 WDPIZEKLJKBSOZ-UHFFFAOYSA-M 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- ZQKXQUJXLSSJCH-UHFFFAOYSA-N melamine cyanurate Chemical compound NC1=NC(N)=NC(N)=N1.O=C1NC(=O)NC(=O)N1 ZQKXQUJXLSSJCH-UHFFFAOYSA-N 0.000 description 1
- 229940100630 metacresol Drugs 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229940105570 ornex Drugs 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- LXTZRIBXKVRLOA-UHFFFAOYSA-N padimate a Chemical compound CCCCCOC(=O)C1=CC=C(N(C)C)C=C1 LXTZRIBXKVRLOA-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WZESLRDFSNLECD-UHFFFAOYSA-N phenyl prop-2-eneperoxoate Chemical class C=CC(=O)OOC1=CC=CC=C1 WZESLRDFSNLECD-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- CCDXIADKBDSBJU-UHFFFAOYSA-N phenylmethanetriol Chemical compound OC(O)(O)C1=CC=CC=C1 CCDXIADKBDSBJU-UHFFFAOYSA-N 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical class OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000011973 solid acid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- KCNSDMPZCKLTQP-UHFFFAOYSA-N tetraphenylen-1-ol Chemical compound C12=CC=CC=C2C2=CC=CC=C2C2=CC=CC=C2C2=C1C=CC=C2O KCNSDMPZCKLTQP-UHFFFAOYSA-N 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical class O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Printing Methods (AREA)
- Epoxy Resins (AREA)
Abstract
Description
本発明は、アルカリ現像可能な硬化性組成物に関し、特に、イソシアヌル酸トリグリシジルを含むアルカリ現像可能な硬化性組成物に関する。 The present invention relates to an alkali-developable curable composition, and more particularly to an alkali-developable curable composition containing triglycidyl isocyanurate.
従来より、民生用プリント基板や、産業用プリント配線板のソルダーレジストにおいて、高精度、高密度の観点から、紫外線照射後、現像することにより画像形成し、熱及び/又は光照射で仕上げ硬化(本硬化)する液状現像型ソルダーレジストが使用されている。 Conventionally, in the solder resist of consumer printed circuit boards and industrial printed wiring boards, from the viewpoint of high accuracy and high density, an image is formed by developing after irradiation with ultraviolet rays, and finish curing by heat and / or light irradiation ( A liquid-developing solder resist that undergoes main curing) is used.
液状現像型のソルダーレジストの中でも、環境問題への配慮から、現像液としてアルカリ水溶液を用いるアルカリ現像型のフォトソルダーレジストが主流になっている。 Among the liquid development type solder resists, the alkali development type photo solder resist that uses an alkaline aqueous solution as a developing solution has become the mainstream in consideration of environmental problems.
アルカリ現像型のフォトソルダーレジストに対して熱硬化剤としてエポキシ樹脂を配合した場合、保存時に硬化反応が進行してしまうことを防ぐため、アルカリ現像を可能とするカルボキシル基含有樹脂を含有する主剤と、エポキシ樹脂を含有する硬化剤とに分けて保存し、使用時にそれらを混合する、いわゆる二液性の感光性熱硬化性樹脂組成物として用いることが多い。 When an epoxy resin is blended as a thermosetting agent with an alkali-developed photosolder resist, a main agent containing a carboxyl group-containing resin that enables alkaline development is used to prevent the curing reaction from proceeding during storage. , It is often used as a so-called two-component photosensitive thermosetting resin composition, which is stored separately from a curing agent containing an epoxy resin and mixed at the time of use.
アルカリ現像型のフォトソルダーレジストを用いて製造されたプリント基板は、例えば、パソコン、携帯端末、LED照明、IC評価用ボード等に使用されているが、車載用途など高温環境下や繰り返しの振動に曝される状況下では、より高い温度耐性及び剛性を有するフォトソルダーレジストの開発が期待されている。 Printed circuit boards manufactured using alkaline-developed photo solder resists are used, for example, in personal computers, mobile terminals, LED lighting, IC evaluation boards, etc., but are subject to high-temperature environments such as in-vehicle applications and repeated vibrations. Under exposure conditions, the development of photosolder resists with higher temperature resistance and rigidity is expected.
特許文献1は、ポットライフが長く、優れた作業性を持ち、その硬化皮膜は、ハンダ耐熱性、プリント配線基板との密着性、耐薬品性に優れたソルダーレジストインキ樹脂組成物を提供することを目的として、ノボラック型エポキシ樹脂と、不飽和モノカルボン酸と、有機多塩基酸の無水物とを反応させて得られる光重合性不飽和基含有ポリカルボン酸樹脂(A)、光重合開始剤(B)、トリス(2,3−エポキシプロピル)イソシアヌレート(C)及びメラミンシアヌレート(D)を含有するソルダーレジストインキ樹脂組成物を開示する。 Patent Document 1 provides a solder resist ink resin composition having a long pot life and excellent workability, and the cured film having excellent solder heat resistance, adhesion to a printed wiring substrate, and chemical resistance. A photopolymerizable unsaturated group-containing polycarboxylic acid resin (A) obtained by reacting a novolak type epoxy resin, an unsaturated monocarboxylic acid, and an anhydride of an organic polybasic acid, a photopolymerization initiator. Disclosed is a solder resist ink resin composition containing (B), tris (2,3-epoxypropyl) isocyanurate (C) and melamine cyanurate (D).
特許文献1に記載されるソルダーレジストインキ樹脂組成物によれば、得られた硬化物はハンダ耐熱性、プリント配線基板との密着性、耐薬品性に優れるものとなる。 According to the solder resist ink resin composition described in Patent Document 1, the obtained cured product is excellent in solder heat resistance, adhesion to a printed wiring board, and chemical resistance.
しかしながら、イソシアヌル酸トリグリシジル(トリス(2,3−エポキシプロピル)イソシアヌレート)を加えると耐熱性、剛性が向上する反面、組成物中に粗粒が増加してスクリーン等での印刷性に影響が生じるため、細かい精度のろ過が必要となり、そのろ過に時間を要することとなっていた。 However, when triglycidyl isocyanurate (tris (2,3-epoxypropyl) isocyanurate) is added, heat resistance and rigidity are improved, but coarse particles increase in the composition, which affects printability on a screen or the like. Therefore, it is necessary to perform filtration with fine precision, and it takes time for the filtration.
また、二液性の感光性樹脂組成物の場合には、正確な混合比での混合が求められるところ、イソシアヌル酸トリグリシジルはカルボキシル基含有樹脂との相溶性が悪く、撹拌不足による異物を生じやすいという不具合があった。 Further, in the case of a two-component photosensitive resin composition, where mixing at an accurate mixing ratio is required, triglycidyl isocyanurate has poor compatibility with the carboxyl group-containing resin, and foreign matter is generated due to insufficient stirring. There was a problem that it was easy.
本発明は、上記課題に鑑みてなされたものであり、その目的は、2液を混合させて調整される、イソシアヌル酸トリグリシジルを含む硬化性組成物において、撹拌性および印刷性が改善された硬化性組成物を提供することにある。 The present invention has been made in view of the above problems, and an object of the present invention is to improve stirrability and printability in a curable composition containing triglycidyl isocyanurate, which is prepared by mixing two liquids. The purpose is to provide a curable composition.
本発明者らは、上記目的達成に向け鋭意検討を行った。その結果、イソシアヌル酸トリグリシジルを硬化性組成物に配合するにあたり、第2液の粘度及び混合後の硬化性組成物の粘度を所定の範囲とすることで第1液と第2液との相溶性が向上し、硬化性組成物の撹拌性及び印刷性が改善されることを見出し、本発明を完成するに至った。 The present inventors have made diligent studies to achieve the above object. As a result, when triglycidyl isocyanurate is blended into the curable composition, the viscosity of the second liquid and the viscosity of the curable composition after mixing are set within a predetermined range, and the phases of the first liquid and the second liquid are set. They have found that the solubility is improved and the stirring property and printability of the curable composition are improved, and have completed the present invention.
すなわち、本発明の上記目的は、
(A)アルカリ可溶性樹脂と、
(B)光重合開始剤と、
を含む第1液と、
(C)イソシアヌル酸トリグリシジルを含み、25℃、5rpmにおける粘度が10〜100dPa・sの範囲内である第2液と、
を混合してなる、25℃、5rpmにおける粘度が100〜500dPa・sの範囲内である硬化性樹脂組成物であって、
(E)光重合性多官能モノマー及び(F)無機充填剤が、前記混合前の前記第1液及び前記第2液の何れか一方又は双方にそれぞれ含まれていることを特徴とする硬化性組成物により達成されることが見出された。
That is, the above object of the present invention is
(A) Alkali-soluble resin and
(B) Photopolymerization initiator and
1st solution containing
(C) A second solution containing trichloroisocyanuric acid and having a viscosity at 25 ° C. and 5 rpm in the range of 10 to 100 dPa · s.
A curable resin composition having a viscosity at 25 ° C. and 5 rpm in the range of 100 to 500 dPa · s, which is a mixture of the above.
Curability characterized in that (E) a photopolymerizable polyfunctional monomer and (F) an inorganic filler are contained in either or both of the first liquid and the second liquid before mixing, respectively. It has been found that this is achieved with the composition.
本発明の硬化性組成物は、第1液と第2液の混合比が6:4〜9:1であることが好ましい。 In the curable composition of the present invention, the mixing ratio of the first liquid and the second liquid is preferably 6: 4 to 9: 1.
また、(E)光重合性多官能モノマーが、エチレン性不飽和基を含むイソシアヌレート環含有化合物を含むことが好ましい。 Further, it is preferable that the (E) photopolymerizable polyfunctional monomer contains an isocyanurate ring-containing compound containing an ethylenically unsaturated group.
さらに、(D)エポキシ樹脂を含むことが好ましい。 Further, it is preferable to contain (D) epoxy resin.
さらに、本発明の硬化性組成物は、好ましくはスクリーン印刷用のインキとして用いられる。 Further, the curable composition of the present invention is preferably used as an ink for screen printing.
本発明によれば、(C)イソシアヌル酸トリグリシジルを含んでいても、第2液の粘度及び混合後の硬化性組成物の粘度を所定の範囲とすることで第1液と第2液との相溶性が改善して撹拌性が向上するとともに、スクリーン印刷等での連続印刷性を向上させることができる。さらに、硬化性組成物が(C)イソシアヌル酸トリグリシジルを含むことで、得られた硬化物の耐熱性及び剛性が向上する。よって、高い耐熱性及び剛性が要求される車載用端末に組み込まれるプリント基板用フォトソルダーレジストとして使用することができる。 According to the present invention, even if trichloroisocyanuric acid (C) is contained, the viscosity of the second liquid and the viscosity of the curable composition after mixing are set within a predetermined range to obtain the first liquid and the second liquid. The compatibility of the above is improved, the stirring property is improved, and the continuous printability in screen printing or the like can be improved. Further, when the curable composition contains (C) trichloroisocyanuric acid triglycidyl, the heat resistance and rigidity of the obtained cured product are improved. Therefore, it can be used as a photosolder resist for a printed circuit board incorporated in an in-vehicle terminal that requires high heat resistance and rigidity.
<硬化性組成物>
本発明の硬化性組成物は、
(A)アルカリ可溶性樹脂と、
(B)光重合開始剤と、
を含む第1液と、
(C)イソシアヌル酸トリグリシジルを含み、25℃、5rpmにおける粘度が10〜100dPa・sの範囲内である第2液と、
を混合してなる、25℃、5rpmにおける粘度が100〜500dPa・sの範囲内である硬化性組成物であって、
(E)光重合性多官能モノマー及び(F)無機充填剤が、前記混合前の前記第1液及び前記第2液の何れか一方又は双方にそれぞれ含まれている。
<Curable composition>
The curable composition of the present invention is
(A) Alkali-soluble resin and
(B) Photopolymerization initiator and
1st solution containing
(C) A second solution containing trichloroisocyanuric acid and having a viscosity at 25 ° C. and 5 rpm in the range of 10 to 100 dPa · s.
A curable composition having a viscosity at 25 ° C. and 5 rpm in the range of 100 to 500 dPa · s, which is a mixture of the above.
The (E) photopolymerizable polyfunctional monomer and the (F) inorganic filler are contained in either or both of the first liquid and the second liquid before mixing, respectively.
[(A)アルカリ可溶性樹脂]
アルカリ可溶性樹脂は、硬化性組成物のアルカリ現像液への溶解、すなわち、アルカリでの現像を可能とする樹脂であり、第1液に含まれる。
[(A) Alkali-soluble resin]
The alkali-soluble resin is a resin that enables the curable composition to be dissolved in an alkaline developer, that is, developed with an alkali, and is contained in the first liquid.
アルカリ可溶性樹脂としては、カルボキシル基含有樹脂またはフェノール樹脂を用いることが好ましい。特に、カルボキシル基含有樹脂を用いると現像性の面からより好ましい。 As the alkali-soluble resin, it is preferable to use a carboxyl group-containing resin or a phenol resin. In particular, it is more preferable to use a carboxyl group-containing resin from the viewpoint of developability.
カルボキシル基含有樹脂としては、分子中にカルボキシル基を有し、さらにエチレン性不飽和基を有さない(非感光性の)、又はこれを有する(感光性の)従来公知の各種カルボキシル基含有樹脂を使用することができる。 As the carboxyl group-containing resin, various conventionally known carboxyl group-containing resins having a carboxyl group in the molecule and not having an ethylenically unsaturated group (non-photosensitive) or having this (photosensitive) Can be used.
本発明において、エチレン性不飽和基とは、エチレン性不飽和結合を有する置換基であって、例えば、ビニル基、(メタ)アクリロイル基が挙げられ、反応性の観点から、(メタ)アクリロイル基であることが好ましい。ここで、(メタ)アクリロイル基とは、アクリロイル基及びメタアクリロイル基を総称する用語である。 In the present invention, the ethylenically unsaturated group is a substituent having an ethylenically unsaturated bond, and examples thereof include a vinyl group and a (meth) acryloyl group. From the viewpoint of reactivity, a (meth) acryloyl group is used. Is preferable. Here, the (meth) acryloyl group is a general term for an acryloyl group and a meta-acryloyl group.
エチレン性不飽和基を有さないカルボキシル基含有樹脂の具体例としては、以下のような化合物(オリゴマーおよびポリマーのいずれでもよい)を挙げることができる。 Specific examples of the carboxyl group-containing resin having no ethylenically unsaturated group include the following compounds (either oligomer or polymer).
(1)脂肪族ジイソシアネート、分岐脂肪族ジイソシアネート、脂環式ジイソシアネート、芳香族ジイソシアネート等のジイソシアネートと、ジメチロールプロピオン酸、ジメチロールブタン酸等のカルボキシル基を含有する、ジアルコール化合物、ポリカーボネート系ポリオール、ポリエーテル系ポリオール、ポリエステル系ポリオール、ポリオレフィン系ポリオール、ビスフェノールA系アルキレンオキシド付加体ジオール、フェノール性ヒドロキシル基およびアルコール性ヒドロキシル基を有する化合物等のジオール化合物の重付加反応によるカルボキシル基含有ウレタン樹脂。 (1) Dialcohol compounds, polycarbonate-based polyols, which contain diisocyanates such as aliphatic diisocyanates, branched aliphatic diisocyanates, alicyclic diisocyanates and aromatic diisocyanates, and carboxyl groups such as dimethylolpropionic acid and dimethylolbutanoic acid. A carboxyl group-containing urethane resin obtained by a double addition reaction of a diol compound such as a polyether polyol, a polyester polyol, a polyolefin polyol, a bisphenol A alkylene oxide adduct diol, a compound having a phenolic hydroxyl group and an alcoholic hydroxyl group.
(2)ジイソシアネートと、カルボキシル基含有ジアルコール化合物の重付加反応によるカルボキシル基含有ウレタン樹脂。 (2) A carboxyl group-containing urethane resin obtained by a double addition reaction of a diisocyanate and a carboxyl group-containing dialcohol compound.
(3)(メタ)アクリル酸等の不飽和カルボン酸と、スチレン、α−メチルスチレン、低級アルキル(メタ)アクリレート、イソブチレン等の不飽和基含有化合物との共重合により得られるカルボキシル基含有樹脂。 (3) A carboxyl group-containing resin obtained by copolymerizing an unsaturated carboxylic acid such as (meth) acrylic acid with an unsaturated group-containing compound such as styrene, α-methylstyrene, lower alkyl (meth) acrylate, or isobutylene.
(4)2官能エポキシ樹脂または2官能オキセタン樹脂にアジピン酸、フタル酸、ヘキサヒドロフタル酸等のジカルボン酸を反応させ、生じた水酸基に無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸等の2塩基酸無水物を付加させたカルボキシル基含有ポリエステル樹脂。 (4) A dicarboxylic acid such as adipic acid, phthalic acid, or hexahydrophthalic acid is reacted with a bifunctional epoxy resin or a bifunctional oxetane resin, and the generated hydroxyl group is subjected to phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, or the like. A carboxyl group-containing polyester resin to which a dibasic acid anhydride is added.
(5)エポキシ樹脂またはオキセタン樹脂を開環させ、生成した水酸基に多塩基酸無水物を反応させて得られるカルボキシル基含有樹脂。 (5) A carboxyl group-containing resin obtained by opening an epoxy resin or an oxetane resin and reacting the generated hydroxyl group with a polybasic anhydride.
(6)1分子中に複数のフェノール性水酸基を有する化合物、すなわちポリフェノール化合物を、エチレンオキシド、プロピレンオキシド等のアルキレンオキシドと反応させて得られるポリアルコール樹脂等の反応生成物に、多塩基酸無水物を反応させて得られるカルボキシル基含有樹脂。 (6) A polybasic acid anhydride is added to a reaction product such as a polyalcohol resin obtained by reacting a compound having a plurality of phenolic hydroxyl groups in one molecule, that is, a polyphenol compound, with an alkylene oxide such as ethylene oxide or propylene oxide. A carboxyl group-containing resin obtained by reacting with.
また、エチレン性不飽和基を有するカルボキシル基含有樹脂の具体例としては、以下のような化合物(オリゴマーおよびポリマーのいずれでもよい)を挙げることができる。なお、カルボキシル基含有樹脂におけるエチレン性不飽和結合は、アクリル酸もしくはメタクリル酸またはそれらの誘導体由来であることが好ましい。 In addition, specific examples of the carboxyl group-containing resin having an ethylenically unsaturated group include the following compounds (either oligomer or polymer). The ethylenically unsaturated bond in the carboxyl group-containing resin is preferably derived from acrylic acid, methacrylic acid, or a derivative thereof.
(7)脂肪族ジイソシアネート、分岐脂肪族ジイソシアネート、脂環式ジイソシアネート、芳香族ジイソシアネート等のジイソシアネートと、ジメチロールプロピオン酸、ジメチロールブタン酸等のカルボキシル基を含有する、ジアルコール化合物、ポリカーボネート系ポリオール、ポリエーテル系ポリオール、ポリエステル系ポリオール、ポリオレフィン系ポリオール、アクリル系ポリオール、ビスフェノールA系アルキレンオキシド付加体ジオール、フェノール性ヒドロキシル基およびアルコール性ヒドロキシル基を有する化合物等のジオール化合物の重付加反応によるカルボキシル基含有感光性ウレタン樹脂。 (7) Dialcohol compounds, polycarbonate-based polyols, which contain diisocyanates such as aliphatic diisocyanates, branched aliphatic diisocyanates, alicyclic diisocyanates and aromatic diisocyanates, and carboxyl groups such as dimethylolpropionic acid and dimethylolbutanoic acid. Containing carboxyl group by multiple addition reaction of diol compound such as polyether polyol, polyester polyol, polyolefin polyol, acrylic polyol, bisphenol A alkylene oxide adduct diol, compound having phenolic hydroxyl group and alcoholic hydroxyl group Photosensitive urethane resin.
(8)ジイソシアネートと、ビスフェノールA型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビキシレノール型エポキシ樹脂、ビフェノール型エポキシ樹脂等の2官能エポキシ樹脂の(メタ)アクリレートもしくはその部分酸無水物変性物と、カルボキシル基含有ジアルコール化合物の重付加反応によるカルボキシル基含有感光性ウレタン樹脂。 (8) Diisocyanate and bifunctional epoxy resin such as bisphenol A type epoxy resin, hydrogenated bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bixylenol type epoxy resin, biphenol type epoxy resin ( Meta) A carboxyl group-containing photosensitive urethane resin obtained by a double addition reaction of an acrylate or a partially acid anhydride modified product thereof and a carboxyl group-containing dialcohol compound.
(9)上述の(7)または(8)の樹脂の合成中に、ヒドロキシアルキル(メタ)アクリレート等の分子内に1つの水酸基と1つ以上の(メタ)アクリロイル基を有する化合物を加え、末端(メタ)アクリル化したカルボキシル基含有感光性ウレタン樹脂。 (9) During the synthesis of the resin of (7) or (8) described above, a compound having one hydroxyl group and one or more (meth) acryloyl groups in a molecule such as hydroxyalkyl (meth) acrylate is added, and the terminal is added. (Meta) Acryloylated carboxyl group-containing photosensitive urethane resin.
(10)上述の(8)または(9)の樹脂の合成中に、イソホロンジイソシアネートとペンタエリスリトールトリアクリレートの等モル反応物など、分子内に1つのイソシアネート基と1つ以上の(メタ)アクリロイル基を有する化合物を加え末端(メタ)アクリル化したカルボキシル基含有感光性ウレタン樹脂。 (10) During the synthesis of the resin according to (8) or (9) above, one isocyanate group and one or more (meth) acryloyl groups in the molecule, such as an isophorone diisocyanate and pentaerythritol triacrylate isomorphic reaction product. A carboxyl group-containing photosensitive urethane resin that is terminally (meth) acrylicized by adding a compound having.
(11)2官能またはそれ以上の多官能(固形)エポキシ樹脂に(メタ)アクリル酸を反応させ、側鎖に存在する水酸基に2塩基酸無水物を付加させたカルボキシル基含有感光性樹脂。 (11) A carboxyl group-containing photosensitive resin obtained by reacting a bifunctional or higher polyfunctional (solid) epoxy resin with (meth) acrylic acid and adding a dibasic acid anhydride to a hydroxyl group existing in a side chain.
(12)2官能(固形)エポキシ樹脂の水酸基をさらにエピクロロヒドリンでエポキシ化した多官能エポキシ樹脂に(メタ)アクリル酸を反応させ、生じた水酸基に2塩基酸無水物を付加させたカルボキシル基含有感光性樹脂。 (12) Carboxylic acid obtained by reacting (meth) acrylic acid with a polyfunctional epoxy resin obtained by further epoxidizing the hydroxyl groups of a bifunctional (solid) epoxy resin with epichlorohydrin, and adding a dibasic acid anhydride to the generated hydroxyl groups. Group-containing photosensitive resin.
(13)2官能オキセタン樹脂にアジピン酸、フタル酸、ヘキサヒドロフタル酸等のジカルボン酸を反応させ、生じた1級の水酸基に無水フタル酸、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸等の2塩基酸無水物を付加させたカルボキシル基含有ポリエステル感光性樹脂。 (13) A dicarboxylic acid such as adipic acid, phthalic acid, or hexahydrophthalic acid is reacted with a bifunctional oxetane resin, and the generated primary hydroxyl group is subjected to two bases such as phthalic anhydride, tetrahydrophthalic anhydride, and hexahydrophthalic anhydride. A carboxyl group-containing polyester photosensitive resin to which an acid anhydride is added.
(14)1分子中に複数のフェノール性水酸基を有する化合物、すなわちポリフェノール化合物を、エチレンオキシド、プロピレンオキシド等のアルキレンオキシドと反応させて得られるポリアルコール樹脂等の反応生成物に、(メタ)アクリル酸等の不飽和基含有モノカルボン酸を反応させ、得られる反応生成物に、更に多塩基酸無水物を反応させて得られるカルボキシル基含有感光性樹脂。 (14) A (meth) acrylic acid is added to a reaction product such as a polyalcohol resin obtained by reacting a compound having a plurality of phenolic hydroxyl groups in one molecule, that is, a polyphenol compound, with an alkylene oxide such as ethylene oxide or propylene oxide. A carboxyl group-containing photosensitive resin obtained by reacting an unsaturated group-containing monocarboxylic acid such as the above with a reaction product obtained by further reacting a polybasic acid anhydride.
(15)1分子中に複数のフェノール性水酸基を有する化合物とエチレンカーボネート、プロピレンカーボネート等の環状カーボネート化合物とを反応させて得られる反応生成物に不飽和基含有モノカルボン酸を反応させ、得られる反応生成物に多塩基酸無水物を反応させて得られるカルボキシル基含有感光性樹脂。 (15) Obtained by reacting an unsaturated group-containing monocarboxylic acid with a reaction product obtained by reacting a compound having a plurality of phenolic hydroxyl groups in one molecule with a cyclic carbonate compound such as ethylene carbonate or propylene carbonate. A carboxyl group-containing photosensitive resin obtained by reacting a reaction product with a polybasic acid anhydride.
(16)上述の(7)〜(15)の樹脂にさらに1分子内に1つのエポキシ基と1つ以上の(メタ)アクリロイル基を有する化合物を付加してなるカルボキシル基含有感光性樹脂。 (16) A carboxyl group-containing photosensitive resin obtained by further adding a compound having one epoxy group and one or more (meth) acryloyl groups in one molecule to the above-mentioned resins (7) to (15).
これら感光性カルボキシル基含有樹脂は、(7)〜(16)として述べた以外のものも使用することができ、1種類を単独で用いてもよく、複数種を混合して用いてもよい。特にカルボキシル基含有樹脂の中で芳香環を有している樹脂が好ましい。 As these photosensitive carboxyl group-containing resins, those other than those described in (7) to (16) can be used, and one type may be used alone or a plurality of types may be mixed and used. Among the carboxyl group-containing resins, a resin having an aromatic ring is particularly preferable.
上述のカルボキシル基含有樹脂は、感光性、非感光性問わず、以下のことが言える。すなわち、バックボーン・ポリマーの側鎖に多数のカルボキシル基を有するため、希アルカリ水溶液による現像が可能になる。 The above-mentioned carboxyl group-containing resin can be said to be as follows regardless of whether it is photosensitive or non-photosensitive. That is, since the backbone polymer has a large number of carboxyl groups in the side chain, it can be developed with a dilute alkaline aqueous solution.
また、カルボキシル基含有樹脂の酸価は、40〜200mgKOH/gの範囲が適当であり、より好ましくは45〜120mgKOH/gの範囲である。カルボキシル基含有樹脂の酸価がこのような範囲内であれば、アルカリ現像が容易となり、現像液による露光部の溶解が抑制され、必要以上にラインが痩せることなく、現像液による溶解剥離のない正常なパターンの描画が可能となる。 The acid value of the carboxyl group-containing resin is preferably in the range of 40 to 200 mgKOH / g, more preferably in the range of 45 to 120 mgKOH / g. When the acid value of the carboxyl group-containing resin is within such a range, alkaline development becomes easy, dissolution of the exposed part by the developer is suppressed, the line is not thinned more than necessary, and there is no dissolution peeling by the developer. It is possible to draw a normal pattern.
また、上述のカルボキシル基含有樹脂の重量平均分子量は、樹脂骨格により異なるが、一般的に2,000〜150,000、さらには5,000〜100,000の範囲にあるものが好ましい。重量平均分子量がこのような範囲内であれば、タックフリー性能に優れ、露光後の塗膜の耐湿性が良好であり、解像度や現像性、貯蔵安定性に優れる。 The weight average molecular weight of the above-mentioned carboxyl group-containing resin varies depending on the resin skeleton, but is generally preferably in the range of 2,000 to 150,000, more preferably 5,000 to 100,000. When the weight average molecular weight is within such a range, the tack-free performance is excellent, the moisture resistance of the coating film after exposure is good, and the resolution, developability, and storage stability are excellent.
このようなカルボキシル基含有樹脂の配合量は、硬化性組成物(固形分)中に、20〜80質量%、好ましくは30〜70質量%の範囲が適当である。カルボキシル基含有樹脂の配合量がこのような範囲内であれば、塗膜強度が低下せず、増粘や、作業性の低下が起こらない。 The blending amount of such a carboxyl group-containing resin is appropriately in the range of 20 to 80% by mass, preferably 30 to 70% by mass in the curable composition (solid content). When the blending amount of the carboxyl group-containing resin is within such a range, the strength of the coating film does not decrease, and the thickening and the workability do not decrease.
また、本発明においては、(A)アルカリ可溶性樹脂として、感光性カルボキシル基含有樹脂、および、感光性を有しないカルボキシル基含有樹脂のいずれか一方を用いることも、これらを混合して用いることも可能である。 Further, in the present invention, as the alkali-soluble resin (A), either a photosensitive carboxyl group-containing resin or a non-photosensitive carboxyl group-containing resin may be used, or these may be mixed and used. It is possible.
フェノール樹脂としては、フェノール性水酸基を有する化合物、例えば、ビフェニル骨格若しくはフェニレン骨格またはその両方の骨格を有する化合物、または、フェノール性水酸基含有化合物、例えば、フェノール、オルソクレゾール、パラクレゾール、メタクレゾール、2,3−キシレノール、2,4−キシレノール、2,5−キシレノール、2,6−キシレノール、3,4−キシレノール、3,5−キシレノール、カテコール、レゾルシノール、ハイドロキノン、メチルハイドロキノン、2,6−ジメチルハイドロキノン、トリメチルハイドロキノン、ピロガロール、フロログルシノール等を用いて合成した、様々な骨格を有するフェノール樹脂を用いてもよい。 Examples of the phenol resin include compounds having a phenolic hydroxyl group, for example, a compound having a biphenyl skeleton and / or a phenylene skeleton, or a phenolic hydroxyl group-containing compound, for example, phenol, orthocresol, paracresol, metacresol, 2 , 3-Xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4-xylenol, 3,5-xylenol, catechol, cresolsinol, hydroquinone, methylhydroquinone, 2,6-dimethylhydroquinone , Trimethylhydroquinone, pyrogallol, fluoroxylenol and the like, and phenolic resins having various skeletons may be used.
例えば、フェノールノボラック樹脂、アルキルフェノールボラック樹脂、ビスフェノールAノボラック樹脂、ジシクロペンタジエン型フェノール樹脂、Xylok型フェノール樹脂、テルペン変性フェノール樹脂、ポリビニルフェノール類、ビスフェノールF、ビスフェノールS型フェノール樹脂、ポリ−p−ヒドロキシスチレン、ナフトールとアルデヒド類の縮合物、ジヒドロキシナフタレンとアルデヒド類との縮合物など公知慣用のフェノール樹脂を用いることができる。 For example, phenol novolac resin, alkylphenol volac resin, bisphenol A novolak resin, dicyclopentadiene type phenol resin, Xyloc type phenol resin, terpene modified phenol resin, polyvinylphenols, bisphenol F, bisphenol S type phenol resin, poly-p- Known and commonly used phenolic resins such as hydroxystyrene, a condensate of naphthol and aldehydes, and a condensate of dihydroxynaphthalene and aldehydes can be used.
これらは、単独でまたは2種以上を組み合わせて使用することができる。 These can be used alone or in combination of two or more.
かかるフェノール樹脂の市販品としては、HF−1M(明和化成社製)、フェノライトTD−2090、フェノライトTD−2131(DIC社製)、ベスモールCZ−256−A(DIC社製)、シヨウノールBRG−555、シヨウノールBRG−556(アイカ工業社製)、CGR−951(丸善石油社製)、または、ポリビニルフェノールのCST70、CST90、S−1P、S−2P(丸善石油社製)等を挙げることができる。これらのフェノール樹脂は、単独で、あるいは2種類以上を適宜組合せて用いることができる。 Commercially available products of such phenolic resins include HF-1M (manufactured by Meiwa Kasei Co., Ltd.), Phenolite TD-2090, Phenolite TD-2131 (manufactured by DIC Corporation), Vesmol CZ-256-A (manufactured by DIC Corporation), and Cyonol BRG. -555, Cyonor BRG-556 (manufactured by Aica Kogyo Co., Ltd.), CGR-951 (manufactured by Maruzen Petroleum Co., Ltd.), or polyvinylphenols CST70, CST90, S-1P, S-2P (manufactured by Maruzen Petroleum Co., Ltd.), etc. Can be done. These phenolic resins can be used alone or in combination of two or more.
[(B)光重合開始剤]
(B)光重合開始剤は、エネルギー線の照射により、(メタ)アクリレートを重合させるために第1液に添加される。
[(B) Photopolymerization Initiator]
(B) The photopolymerization initiator is added to the first liquid in order to polymerize the (meth) acrylate by irradiation with energy rays.
(B)光重合開始剤は、例えば、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル等のベンゾインとベンゾインアルキルエーテル類;アセトフェノン、2,2−ジメトキシ−2−フェニルアセトフェノン、2,2−ジエトキシ−2−フェニルアセトフェノン、2,2−ジエトキシ−2−フェニルアセトフェノン、1,1−ジクロロアセトフェノン等のアセトフェノン類;2−メチル−1−[4−(メチルチオ)フェニル]−2−モルホリノプロパン−1−オン、2−ベンジル−2−ジメチルアミノ−1−(4−モルフォリノフェニル)−ブタノン−1、2−(ジメチルアミノ)−2−[(4−メチルフェニル)メチル]−1−[4−(4−モルフォリニル)フェニル]−1−ブタノン等のアミノアルキルフェノン類;2−メチルアントラキノン、2−エチルアントラキノン、2−ターシャリーブチルアントラキノン、1−クロロアントラキノン等のアントラキノン類;2,4−ジメチルチオキサントン、2,4−ジエチルチオキサントン、2−クロロチオキサントン、2,4−ジイソプロピルチオキサントン等のチオキサントン類;アセトフェノンジメチルケタール、ベンジルジメチルケタール等のケタール類;4,4’−ビス(ジエチルアミノ)ベンゾフェノン等のベンゾフェノン類;(2,6−ジメトキシベンゾイル)−2,4,4−ペンチルホスフィンオキサイド、ビス(2,4,6−トリメチルベンゾイル)−フェニルフォスフィンオキサイド、2,4,6−トリメチルベンゾイルジフェニルフォスフィンオキサイド、エチル−2,4,6−トリメチルベンゾイルフェニルフォスフィネイト等のフォスフィンオキサイド類;1,2−オクタンジオン,1−[4−(フェニルチオ)−,2−(O−ベンゾイルオキシム)]、エタノン,1−[9−エチル−6−(2−メチルベンゾイル)−9H−カルバゾール−3−イル]−,1−(O−アセチルオキシム)等のオキシムエステル類;各種パーオキサイド類、チタノセン系開始剤などが挙げられる。これらは、N,N−ジメチルアミノ安息香酸エチルエステル、N,N−ジメチルアミノ安息香酸イソアミルエステル、ペンチル−4−ジメチルアミノベンゾエート、トリエチルアミン、トリエタノールアミン等の三級アミン類のような光増感剤等と併用してもよい。これらの光重合開始剤は単独で、または2種以上を組み合わせて用いることができる。 (B) The photopolymerization initiator is, for example, benzoin such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether and benzoin alkyl ethers; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-. Acetphenones such as diethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 1,1-dichloroacetophenone; 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1 -On, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1,2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] Aminoalkylphenones such as -1-butanone; anthraquinones such as 2-methylanthraquinone, 2-ethylanthraquinone, 2-terriary butyl anthraquinone, 1-chloroanthraquinone; 2,4-dimethylthioxanthone , 2,4-Diethylthioxanthone, 2-chlorothioxanthone, 2,4-diisopropylthioxanthone and other thioxanthones; acetophenone dimethyl ketal, benzyl dimethyl ketal and other ketals; 4,4'-bis (diethylamino) benzophenone and other benzophenones (2,6-dimethoxybenzoyl) -2,4,4-pentylphosphine oxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, Phosphine oxides such as ethyl-2,4,6-trimethylbenzoylphenylphosphinate; 1,2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)], ethanone, Oxim esters such as 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-3-yl]-, 1- (O-acetyloxime); various peroxides, titanosen-based initiators, etc. Can be mentioned. These are photosensitized like tertiary amines such as N, N-dimethylaminobenzoic acid ethyl ester, N, N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylaminobenzoate, triethylamine, triethanolamine and the like. It may be used in combination with an agent or the like. These photopolymerization initiators can be used alone or in combination of two or more.
(B)光重合開始剤の配合量は、本発明の硬化性組成物中、(A)アルカリ可溶性樹脂100質量部(固形分)に対して0.01質量部以上30質量部以下の範囲で、好ましくは0.5〜15質量部以下の範囲で配合される。 The amount of the (B) photopolymerization initiator compounded in the curable composition of the present invention is in the range of 0.01 part by mass or more and 30 parts by mass or less with respect to 100 parts by mass (solid content) of the (A) alkali-soluble resin. , Preferably blended in the range of 0.5 to 15 parts by mass or less.
[(C)イソシアヌル酸トリグリシジル]
(C)イソシアヌル酸トリグリシジルは、本発明の硬化性組成物を熱硬化させ、硬化物の耐熱性及び剛性を向上させるために添加される化合物であって、第2液に配合される。
[(C) Trichloroisocyanuric acid]
(C) Trichloroisocyanuric acid is a compound added to thermoset the curable composition of the present invention to improve the heat resistance and rigidity of the cured product, and is added to the second liquid.
そして、(C)イソシアヌル酸トリグリシジルは、エポキシ基を含み、イソシアヌレート環を熱硬化反応により硬化物の高分子中に組み込ませる。 Then, (C) triglycidyl isocyanurate contains an epoxy group, and the isocyanurate ring is incorporated into the polymer of the cured product by a thermosetting reaction.
(C)イソシアヌル酸トリグリシジルの市販品としては、TEPIC−S、TEPIC−L、TEPIC−HP(日産化学工業社製)等が挙げられる。 Examples of commercially available products of triglycidyl isocyanurate (C) include TEPIC-S, TEPIC-L, and TEPIC-HP (manufactured by Nissan Chemical Industries, Ltd.).
(C)イソシアヌル酸トリグリシジルは、本発明の硬化性組成物中、(A)アルカリ可溶性樹脂100質量部(固形分)に対して10質量部以上50質量部以下の範囲で、好ましくは10質量部以上35質量部以下の範囲で配合される。(C)イソシアヌル酸トリグリシジルの配合量がこのような範囲内であれば、耐熱性、電気特性、柔軟性に優れた硬化物が得られる。 In the curable composition of the present invention, the amount of (C) triglycidyl isocyanurate is 10 parts by mass or more and 50 parts by mass or less, preferably 10 parts by mass, based on 100 parts by mass (solid content) of the (A) alkali-soluble resin. It is blended in the range of parts or more and 35 parts by mass or less. When the blending amount of triglycidyl isocyanurate (C) is within such a range, a cured product having excellent heat resistance, electrical characteristics, and flexibility can be obtained.
[(D)エポキシ樹脂]
(D)エポキシ樹脂((C)イソシアヌル酸トリグリシジルを除く)は、本発明の硬化性組成物を熱硬化させるために添加される化合物であって、さらに、第2液に配合されてもよい。
[(D) Epoxy resin]
The epoxy resin (D) (excluding (C) trichloroisocyanuric acid triglycidyl) is a compound added for thermosetting the curable composition of the present invention, and may be further added to the second liquid. ..
(D)エポキシ樹脂((C)イソシアヌル酸トリグリシジルを除く)は、1分子中に少なくとも2つのエポキシ基を有する公知慣用の多官能エポキシ樹脂が使用できる。(D)エポキシ樹脂((C)イソシアヌル酸トリグリシジルを除く)としては、例えば、三菱ケミカル社製のjER828、jER834、jER1001、jER1004、DIC社製のEPICLON840、EPICLON850、EPICLON850−S、EPICLON1050、EPICLON2055、東都化成社製のエポトートYD−011、YD−013、YD−127、YD−128、ダウケミカル社製のD.E.R.317、D.E.R.331、D.E.R.661、D.E.R.664、住友化学工業社製のスミ−エポキシESA−011、ESA−014、ELA−115、ELA−128等(何れも商品名)のビスフェノールA型エポキシ樹脂;三菱ケミカル社製のjER YL903、DIC社製のEPICLON152、EPICLON165、東都化成社製のエポトートYDB−400、YDB−500、ダウケミカル社製のD.E.R.542、住友化学工業社製のスミ−エポキシESB−400、ESB−700等(何れも商品名)のブロム化エポキシ樹脂;三菱ケミカル社製のjER152、jER154、ダウケミカル社製のD.E.N.431、D.E.N.438、DIC社製のEPICLON N−730、EPICLON N−770、EPICLON N−865、東都化成社製のエポトートYDCN−701、YDCN−704、日本化薬社製のEPPN−201、EOCN−1025、EOCN−1020、EOCN−104S、RE−306、NC−3000、住友化学工業社製のスミ−エポキシESCN−195X、ESCN−220、新日鐵化学社製のYDCN−700−2、YDCN−700−3、YDCN−700−5,YDCN−700−7、YDCN−700−10、YDCN−704 YDCN−704A、DIC社製のEPICLON N−680、EPICLON N−690、EPICLON N−695(いずれも商品名)等のノボラック型エポキシ樹脂;DIC社製のEPICLON830、三菱ケミカル社製jER807、東都化成社製のエポトートYDF−170、YDF−175、YDF−2004等(何れも商品名)のビスフェノールF型エポキシ樹脂;東都化成社製のエポトートST−2004、ST−2007、ST−3000(商品名)、三菱ケミカル社製のYX8034等の水添ビスフェノールA型エポキシ樹脂;三菱ケミカル社製のjER604、東都化成社製のエポトートYH−434、住友化学工業社製のスミ−エポキシELM−120等(何れも商品名)のグリシジルアミン型エポキシ樹脂;ヒダントイン型エポキシ樹脂;ダイセル化学工業社製のセロキサイド2021等(何れも商品名)の脂環式エポキシ樹脂;三菱ケミカル社製のYL−933、日本化薬社製のEPPN−501、EPPN−502等(何れも商品名)のトリヒドロキシフェニルメタン型エポキシ樹脂;三菱ケミカル社製のYL−6056、YX−4000、YL−6121(何れも商品名)等のビキシレノール型もしくはビフェノール型エポキシ樹脂又はそれらの混合物;日本化薬社製EBPS−200、ADEKA社製EPX−30、DIC社製のEXA−1514(商品名)等のビスフェノールS型エポキシ樹脂;三菱ケミカル社製のjER157S(商品名)等のビスフェノールAノボラック型エポキシ樹脂;三菱ケミカル社製のjER YL−931等(何れも商品名)のテトラフェニロールエタン型エポキシ樹脂;日本油脂社製ブレンマーDGT等のジグリシジルフタレート樹脂;東都化成社製ZX−1063等のテトラグリシジルキシレノイルエタン樹脂;新日鐵化学社製ESN−190、ESN−360、DIC社製HP−4032、EXA−4750、EXA−4700等のナフタレン基含有エポキシ樹脂;DIC社製HP−7200、HP−7200H等のジシクロペンタジエン骨格を有するエポキシ樹脂;日本油脂社製CP−50S、CP−50M等のグリシジルメタアクリレート共重合系エポキシ樹脂;さらにシクロヘキシルマレイミドとグリシジルメタアクリレートの共重合エポキシ樹脂;CTBN変性エポキシ樹脂(例えば東都化成社製のYR−102、YR−450等)等が挙げられるが、これらに限られるものではない。 As the (D) epoxy resin (excluding (C) triglycidyl isocyanurate), a known and commonly used polyfunctional epoxy resin having at least two epoxy groups in one molecule can be used. Examples of the epoxy resin (excluding (C) triglycidyl isocyanurate) include jER828, jER834, jER1001, jER1004 manufactured by Mitsubishi Chemical Corporation, EPICLON840, EPICLON850, EPICLON850-S, EPICLON1050, EPICLON2055, manufactured by DIC Corporation. Epototo YD-011, YD-013, YD-127, YD-128 manufactured by Toto Kasei Co., Ltd., and D.D. E. R. 317, D.I. E. R. 331, D. E. R. 661, D.I. E. R. 664, Sumitomo Chemical Co., Ltd. Sumi-Epoxy ESA-011, ESA-014, ELA-115, ELA-128, etc. (all trade names) bisphenol A type epoxy resin; Mitsubishi Chemical Co., Ltd. jER YL903, DIC Corporation EPICLON152, EPICLON165, Epototo YDB-400, YDB-500 manufactured by Toto Kasei Co., Ltd., D.D. E. R. 542, Sumitomo Chemical's Sumi-Epoxy ESB-400, ESB-700, etc. (all trade names) brominated epoxy resins; Mitsubishi Chemical's jER152, jER154, Dow Chemical's D.D. E. N. 431, D.I. E. N. 438, EPICLON N-730 manufactured by DIC, EPICLON N-770, EPICLON N-865, Epototo YDCN-701, YDCN-704 manufactured by Toto Kasei Co., Ltd. -1020, EOCN-104S, RE-306, NC-3000, Sumitomo Chemical Co., Ltd. Sumi-Epoxy ESCN-195X, ESCN-220, Nippon Steel Chemical Co., Ltd. YDCN-700-2, YDCN-700-3 , YDCN-700-5, YDCN-700-7, YDCN-700-10, YDCN-704 YDCN-704A, EPICLON N-680, EPICLON N-690, EPICLON N-695 manufactured by DIC (all trade names) Novolak type epoxy resin such as DIC; EPICLON 830 manufactured by DIC, jER807 manufactured by Mitsubishi Chemical Co., Ltd., Epototo YDF-170, YDF-175, YDF-2004 manufactured by Toto Kasei Co., Ltd., etc. (all trade names) bisphenol F type epoxy resin; Hydrophobic bisphenol A type epoxy resin such as Epototo ST-2004, ST-2007, ST-3000 (trade name) manufactured by Toto Kasei Co., Ltd., YX8034 manufactured by Mitsubishi Chemical Co., Ltd .; jER604 manufactured by Mitsubishi Chemical Co., Ltd., manufactured by Toto Kasei Co., Ltd. Epototo YH-434, Sumie Epoxy ELM-120 manufactured by Sumitomo Chemical Co., Ltd. (both trade names) glycidylamine type epoxy resin; Hidant-in type epoxy resin; Celoxide 2021 etc. manufactured by Daicel Chemical Industry Co., Ltd. (both trade names) ) Alicyclic epoxy resin; YL-933 manufactured by Mitsubishi Chemical Co., Ltd., EPPN-501, EPPN-502 manufactured by Nippon Kayaku Co., Ltd., etc. (all trade names) trihydroxyphenylmethane type epoxy resin; manufactured by Mitsubishi Chemical Co., Ltd. YL-6056, YX-4000, YL-6121 (all trade names) and other bixilenol type or biphenol type epoxy resins or mixtures thereof; EBPS-200 manufactured by Nippon Kayaku Co., Ltd., EPX-30 manufactured by ADEKA, DIC Bisphenol S type epoxy resin such as EXA-1514 (trade name) manufactured by Mitsubishi Chemical Co., Ltd .; Bisphenol A novolac type epoxy resin such as jER157S (trade name) manufactured by Mitsubishi Chemical Co., Ltd .; jER YL-931 etc. manufactured by Mitsubishi Chemical Co., Ltd. Tetraphenylol ethane type epoxy resin (trade name); Diglycidyl phthalate resin such as Blemmer DGT manufactured by Nippon Oil & Fats Co., Ltd .; ZX-1063 manufactured by Toto Kasei Co., Ltd. Traglycidyl xylenoyl ethane resin; Naphthalene group-containing epoxy resin such as ESN-190, ESN-360 manufactured by Nippon Steel Chemical Co., Ltd., HP-4032, EXA-4750, EXA-4700 manufactured by DIC Co., Ltd .; HP-7200 manufactured by DIC Co., Ltd. , HP-7200H and other epoxy resins having a dicyclopentadiene skeleton; glycidyl methacrylate copolymerized epoxy resins such as CP-50S and CP-50M manufactured by Nippon Oil & Fats Co., Ltd .; and cyclohexyl maleimide and glycidyl methacrylate copolymer epoxy resins; Examples thereof include, but are not limited to, CTBN-modified epoxy resins (for example, YR-102 and YR-450 manufactured by Toto Kasei Co., Ltd.).
(D)エポキシ樹脂((C)イソシアヌル酸トリグリシジルを除く)を配合する場合は、(A)アルカリ可溶性樹脂のカルボン酸当量に対して、0.8エポキシ当量以上2.0エポキシ当量以下となる量で配合される。ここで、カルボン酸当量とは、カルボキシル基1mol量を得るのに必要な(A)アルカリ可溶性樹脂の重量を表し、単位はg/molである。また、エポキシ当量とは、エポキシ基1mol量を得るのに必要な(D)エポキシ樹脂の重量を表し、単位はg/molである。(D)エポキシ樹脂の質量が、(A)アルカリ可溶性樹脂のカルボン酸当量に対して0.8エポキシ当量〜2.0エポキシ当量である。エポキシ当量が、このような範囲内にあると耐熱性や電気特性、クラック耐性に優れた硬化物を得ることが出来る。 When (D) epoxy resin (excluding (C) triglycidyl isocyanurate) is blended, it is 0.8 epoxy equivalent or more and 2.0 epoxy equivalent or less with respect to the carboxylic acid equivalent of (A) alkali-soluble resin. Formulated in quantity. Here, the carboxylic acid equivalent represents the weight of the (A) alkali-soluble resin required to obtain 1 mol of the carboxyl group, and the unit is g / mol. The epoxy equivalent represents the weight of the (D) epoxy resin required to obtain 1 mol of epoxy groups, and the unit is g / mol. The mass of the (D) epoxy resin is 0.8 epoxy equivalent to 2.0 epoxy equivalent with respect to the carboxylic acid equivalent of the (A) alkali-soluble resin. When the epoxy equivalent is within such a range, a cured product having excellent heat resistance, electrical characteristics, and crack resistance can be obtained.
[(E)光重合性多官能モノマー]
(E)光重合性多官能モノマーは、1分子中に2個以上のエチレン性不飽和基を有する化合物であって、((A)アルカリ可溶性樹脂にエチレン性不飽和基が含まれる場合には、)活性エネルギー線照射による(A)アルカリ可溶性樹脂の光硬化を助け、硬化性組成物を光硬化させるとともに、第2液の粘度と第1液及び第2液の混合後の硬化性組成物の粘度とを低下する方向に調節するために用いられる。
[(E) Photopolymerizable polyfunctional monomer]
The (E) photopolymerizable polyfunctional monomer is a compound having two or more ethylenically unsaturated groups in one molecule, and ((A) when the alkali-soluble resin contains an ethylenically unsaturated group) ,) Helps photocuring of (A) alkali-soluble resin by irradiation with active energy rays, photocures the curable composition, and the curable composition after mixing the viscosity of the second liquid and the first and second liquids. It is used to adjust the viscosity of ethylene in a decreasing direction.
前記(E)光重合性多官能モノマーとして用いられる化合物としては、例えば、慣用公知のポリエステル(メタ)アクリレート、ポリエーテル(メタ)アクリレート、ウレタン(メタ)アクリレート、カーボネート(メタ)アクリレート、エポキシ(メタ)アクリレートなどが挙げられる。具体的には、ヘキサンジオール、トリメチロールプロパン、ペンタエリスリトール、ジペンタエリスリトール、トリス−ヒドロキシエチルイソシアヌレートなどの多価アルコール又はこれらのエチレオキサイド付加物、プロピレンオキサイド付加物、もしくはε−カプロラクトン付加物などの多価アクリレート類;フェノキシアクリレート、ビスフェノールAジアクリレート、及びこれらのフェノール類のエチレンオキサイド付加物もしくはプロピレンオキサイド付加物などの多価アクリレート類;グリセリンジグリシジルエーテル、グリセリントリグリシジルエーテル、トリメチロールプロパントリグリシジルエーテル、トリグリシジルイソシアヌレートなどのグリシジルエーテルの多価アクリレート類;前記に限らず、ポリエーテルポリオール、ポリカーボネートジオール、水酸基末端ポリブタジエン、ポリエステルポリオールなどのポリオールを直接アクリレート化、もしくは、ジイソシアネートを介してウレタンアクリレート化したアクリレート類及びメラミンアクリレート、及び前記アクリレートに対応する各メタクリレート類の少なくとも何れか一種などが挙げられる。 Examples of the compound used as the (E) photopolymerizable polyfunctional monomer include commonly known polyester (meth) acrylate, polyether (meth) acrylate, urethane (meth) acrylate, carbonate (meth) acrylate, and epoxy (meth). ) Acrylate and the like can be mentioned. Specifically, polyhydric alcohols such as hexanediol, trimethylolpropane, pentaerythritol, dipentaerythritol, tris-hydroxyethyl isocyanurate, or ethyleoxyside adducts, propylene oxide adducts, or ε-caprolactone adducts thereof, etc. Polyvalent acrylates; phenoxy acrylates, bisphenol A diacrylates, and polyvalent acrylates such as ethylene oxide adducts or propylene oxide adducts of these phenols; glycerin diglycidyl ether, glycerin triglycidyl ether, trimethyl propantri. Polyvalent acrylates of glycidyl ethers such as glycidyl ethers and triglycidyl isocyanurates; not limited to the above, polyols such as polyether polyols, polycarbonate diols, hydroxyl group terminal polybutadienes, polyester polyols are directly acrylated, or urethanes are made through diisocyanates. Examples thereof include acrylated acrylates and melamine acrylates, and at least one of each methacrylate corresponding to the acrylate.
本発明では、耐熱性をより向上させるため、(E)光重合性多官能モノマーとして、エチレン性不飽和基を含むイソシアヌレート環含有化合物を用いることが好ましい。エチレン性不飽和基を含むイソシアヌレート環含有化合物は、耐熱性及び剛性向上の観点から、分子内に少なくとも2個のエチレン性不飽和基を含む。エチレン性不飽和基は、3個〜6個の範囲であることが好ましい。 In the present invention, in order to further improve the heat resistance, it is preferable to use an isocyanurate ring-containing compound containing an ethylenically unsaturated group as the (E) photopolymerizable polyfunctional monomer. The isocyanurate ring-containing compound containing an ethylenically unsaturated group contains at least two ethylenically unsaturated groups in the molecule from the viewpoint of improving heat resistance and rigidity. The ethylenically unsaturated group is preferably in the range of 3 to 6.
また、エチレン性不飽和基を含むイソシアヌレート環含有化合物は、アルキレンオキサイド変性されていても良く、ラクトン変性されていても良い。 Further, the isocyanurate ring-containing compound containing an ethylenically unsaturated group may be alkylene oxide-modified or lactone-modified.
アルキレンオキサイド変性されたエチレン性不飽和基を含むイソシアヌレート環含有化合物としては、イソシアヌル酸のアクリレートのアルキレンオキサイド付加物が挙げられる。 Examples of the isocyanurate ring-containing compound containing an alkylene oxide-modified ethylenically unsaturated group include an alkylene oxide adduct of an acrylate of isocyanuric acid.
アルキレンオキサイドとしては、例えば、エチレンオキサイド、プロピレンオキサイド、ブチレンオキサイドが挙げられ、エチレンオキサイドおよびプロピレンオキサイドの少なくとも1種によって変性されていることが好ましい。 Examples of the alkylene oxide include ethylene oxide, propylene oxide, and butylene oxide, and it is preferable that the alkylene oxide is modified with at least one of ethylene oxide and propylene oxide.
ラクトン変性されたエチレン性不飽和基を含むイソシアヌレート環含有化合物としては、イソシアヌル酸のアクリレートにラクトンを開環重合して得られる。 The isocyanurate ring-containing compound containing a lactone-modified ethylenically unsaturated group is obtained by ring-opening polymerization of lactone with an acrylate of isocyanuric acid.
ラクトンとしては、例えば、5〜8員環のラクトンを好ましく用いることができる。 As the lactone, for example, a lactone having a 5- to 8-membered ring can be preferably used.
エチレン性不飽和基を含むイソシアヌレート環含有化合物の市販品としては、イソシアヌル酸EO変性ジアクリレート(アロニックス(登録商標)M−215:東亞合成社製)、エトキシ化イソシアヌル酸トリアクリレート(A−9300:新中村化学工業社製)、ε−カプロラクトン変性トリス−(2−アクリロキシエチル)イソシアヌレート(A−9300−1CL:新中村化学工業社製)が挙げられる。 Commercially available products of isocyanurate ring-containing compounds containing ethylenically unsaturated groups include isocyanuric acid EO-modified diacrylate (Aronix (registered trademark) M-215: manufactured by Toagosei Co., Ltd.) and ethoxylated isocyanurate triacrylate (A-9300). : Shin-Nakamura Chemical Industry Co., Ltd.), ε-caprolactone-modified tris- (2-acryloxyethyl) isocyanurate (A-9300-1CL: New Nakamura Chemical Industry Co., Ltd.).
また、(E)光重合性多官能モノマーは、第2液の粘度と硬化性組成物の粘度とを低下させる観点から、25℃、5rpmにおける粘度が10dPa・s以下の光重合性多官能モノマーであることが好ましい。 Further, the photopolymerizable polyfunctional monomer (E) is a photopolymerizable polyfunctional monomer having a viscosity of 10 dPa · s or less at 25 ° C. and 5 rpm from the viewpoint of lowering the viscosity of the second liquid and the viscosity of the curable composition. Is preferable.
(E)光重合性多官能モノマーの配合量は、本発明の硬化性組成物中、(A)アルカリ可溶性樹脂100質量部(固形分)に対して10質量部以上50質量部以下の範囲で、好ましくは10質量部以上35質量部以下の範囲で配合される。(E)光重合性多官能モノマーの配合量が、このような範囲内であれば、アンダーカットやハレーションの少ない硬化物が得られる。 The blending amount of the (E) photopolymerizable polyfunctional monomer is in the range of 10 parts by mass or more and 50 parts by mass or less with respect to 100 parts by mass (solid content) of the (A) alkali-soluble resin in the curable composition of the present invention. , Preferably blended in the range of 10 parts by mass or more and 35 parts by mass or less. When the blending amount of the photopolymerizable polyfunctional monomer (E) is within such a range, a cured product with less undercut and halation can be obtained.
[(F)無機充填剤]
(F)無機充填剤は、本発明の硬化性組成物の硬化物の物理的強度を高めるとともに、第2液の粘度と第1液及び第2液の混合後の硬化性組成物の粘度とを増大する方向に調節するために用いられる。
[(F) Inorganic filler]
(F) The inorganic filler enhances the physical strength of the cured product of the curable composition of the present invention, and also determines the viscosity of the second liquid and the viscosity of the curable composition after mixing the first liquid and the second liquid. Is used to adjust in the direction of increasing.
(F)無機充填剤は、例えば、シリカ、硫酸バリウム、チタン酸バリウム、ノイブルグ珪土、タルク、クレー、炭酸マグネシウム、炭酸カルシウム、酸化アルミニウム、酸化チタン、水酸化アルミニウム、窒化ケイ素、窒化アルミニウム等が挙げられる。(F)無機充填剤の市販品としては、例えば、タルク(LMP−100:富士タルク工業社製)、シリカ充填剤(Imsil(登録商標)A−8:UNIMIN社製)、水酸化アルミニウム(B−30:巴工業社製)、ルチル型酸化チタン(CR−58:石原産業社製)、硫酸バリウム(B−30:堺化学工業社製)等が挙げられる。 Examples of the inorganic filler (F) include silica, barium sulfate, barium titanate, Neuburg silica soil, talc, clay, magnesium carbonate, calcium carbonate, aluminum oxide, titanium oxide, aluminum hydroxide, silicon nitride, and aluminum nitride. Can be mentioned. Examples of commercially available inorganic fillers include talc (LMP-100: manufactured by Fuji Tarku Kogyo Co., Ltd.), silica filler (Imsil® A-8: manufactured by UNIMIN), and aluminum hydroxide (B). -30: Rutile type titanium oxide (CR-58: manufactured by Ishihara Sangyo Co., Ltd.), barium sulfate (B-30: manufactured by Sakai Chemical Industry Co., Ltd.) and the like.
(F)無機充填剤の配合量は、本発明の硬化性組成物中、(A)アルカリ可溶性樹脂100質量部(固形分)に対して30質量部以上200質量部以下の範囲で、好ましくは50質量部以上110質量部以下の範囲で配合される。(F)無機充填剤の配合量が、このような範囲内であれば、硬化物が脆くならず、物理的強度の向上効果が得られる。 The blending amount of the inorganic filler (F) is preferably in the range of 30 parts by mass or more and 200 parts by mass or less with respect to 100 parts by mass (solid content) of the (A) alkali-soluble resin in the curable composition of the present invention. It is blended in the range of 50 parts by mass or more and 110 parts by mass or less. When the blending amount of the inorganic filler (F) is within such a range, the cured product does not become brittle and the effect of improving the physical strength can be obtained.
第2液の粘度と、第1液及び第2液の混合後の硬化性組成物の粘度とは、具体的には、第1液及び第2液の何れか一方又は双方にそれぞれ含まれる(E)光重合性多官能モノマー及び(F)無機充填剤の量により調整することができる。第1液及び第2液の何れか一方又は双方にそれぞれ含まれる(E)光重合性多官能モノマー及び(F)無機充填剤の量は、上記本発明の硬化性組成物に含まれる(E)光重合性多官能モノマー及び(F)無機充填剤の配合量の範囲であれば特に制限はない。 The viscosity of the second liquid and the viscosity of the curable composition after mixing the first liquid and the second liquid are specifically contained in either one or both of the first liquid and the second liquid (respectively). It can be adjusted by the amount of E) photopolymerizable polyfunctional monomer and (F) inorganic filler. The amounts of the (E) photopolymerizable polyfunctional monomer and (F) inorganic filler contained in either or both of the first liquid and the second liquid are contained in the curable composition of the present invention (E). ) There is no particular limitation as long as the blending amount of the photopolymerizable polyfunctional monomer and the (F) inorganic filler is within the range.
調整される第2液の粘度は、25℃、5rpmにおいて10〜100dPa・sの範囲であり、好ましくは50〜70dPa・sの範囲である。また、調整される硬化性組成物の粘度は、25℃、5rpmにおいて100〜500dPa・sの範囲であり、好ましくは100〜200dPa・sの範囲である。 The viscosity of the second liquid to be adjusted is in the range of 10 to 100 dPa · s at 25 ° C. and 5 rpm, preferably in the range of 50 to 70 dPa · s. The viscosity of the curable composition to be adjusted is in the range of 100 to 500 dPa · s, preferably in the range of 100 to 200 dPa · s at 25 ° C. and 5 rpm.
さらに、本発明の硬化性組成物には、組成物の調製や、基材に塗布する際の粘度調整等の目的で、有機溶剤を含有させてもよい。有機溶剤としては、メチルエチルケトン、シクロヘキサノン等のケトン類;トルエン、キシレン、テトラメチルベンゼン等の芳香族炭化水素類;セロソルブ、メチルセロソルブ、ブチルセロソルブ、カルビトール、メチルカルビトール、ブチルカルビトール、プロピレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールジエチルエーテル、ジエチレングリコールモノメチルエーテルアセテート、トリプロピレングリコールモノメチルエーテル等のグリコールエーテル類;酢酸エチル、酢酸ブチル、乳酸ブチル、セロソルブアセテート、ブチルセロソルブアセテート、カルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールモノメチルエーテルアセテート、ジプロピレングリコールモノメチルエーテルアセテート、炭酸プロピレン等のエステル類;オクタン、デカン等の脂肪族炭化水素類;石油エーテル、石油ナフサ、ソルベントナフサ等の石油系溶剤など、公知慣用の有機溶剤が使用できる。これらの有機溶剤は、1種を単独または2種以上を組み合わせて用いることができる。 Further, the curable composition of the present invention may contain an organic solvent for the purpose of preparing the composition, adjusting the viscosity when applied to the substrate, and the like. Examples of the organic solvent include ketones such as methyl ethyl ketone and cyclohexanone; aromatic hydrocarbons such as toluene, xylene and tetramethyl benzene; cellosolve, methyl cellosolve, butyl cellosolve, carbitol, methyl carbitol, butyl carbitol and propylene glycol monomethyl ether. , Dipropylene glycol monomethyl ether, dipropylene glycol diethyl ether, diethylene glycol monomethyl ether acetate, tripropylene glycol monomethyl ether and other glycol ethers; ethyl acetate, butyl acetate, butyl lactate, cellosolve acetate, butyl cellosolve acetate, carbitol acetate, butyl carbi Esters such as tall acetate, propylene glycol monomethyl ether acetate, dipropylene glycol monomethyl ether acetate, and propylene carbonate; aliphatic hydrocarbons such as octane and decane; petroleum solvents such as petroleum ether, petroleum naphtha, and solvent naphtha are known. Conventional organic solvents can be used. These organic solvents may be used alone or in combination of two or more.
有機溶剤の配合量は、(A)アルカリ可溶性樹脂100質量部(固形分)に対して10質量部以上100質量部以下の範囲で配合される。 The amount of the organic solvent blended is in the range of 10 parts by mass or more and 100 parts by mass or less with respect to 100 parts by mass (solid content) of the (A) alkali-soluble resin.
第2液の粘度と、第1液及び第2液の混合後の硬化性組成物の粘度とは、具体的には、有機溶剤を含有する場合、第1液及び第2液の何れか一方又は双方にそれぞれ含まれる(E)光重合性多官能モノマー、(F)無機充填剤及び有機溶剤の配合量により調整することができる。第1液及び第2液の何れか一方又は双方にそれぞれ含まれる(E)光重合性多官能モノマー、(F)無機充填剤及び有機溶剤の量は、上記本発明の硬化性組成物に含まれる(E)光重合性多官能モノマー及び(F)無機充填剤の配合量の範囲と、上記有機溶剤の配合量の範囲であれば特に制限はない。 The viscosity of the second liquid and the viscosity of the curable composition after mixing the first liquid and the second liquid are specifically, when an organic solvent is contained, either one of the first liquid and the second liquid. Alternatively, it can be adjusted by the amount of (E) photopolymerizable polyfunctional monomer, (F) inorganic filler and organic solvent contained in both of them. The amounts of (E) photopolymerizable polyfunctional monomer, (F) inorganic filler and organic solvent contained in either one or both of the first liquid and the second liquid are included in the curable composition of the present invention. There is no particular limitation as long as it is within the range of the blending amounts of the (E) photopolymerizable polyfunctional monomer and the (F) inorganic filler and the blending amount of the organic solvent.
[他の成分]
本発明の硬化性組成物には、さらに、必要に応じて、フタロシアニン・ブルー、フタロシアニン・グリーン、カーボンブラックなどの公知慣用の着色顔料を含ませることができる。
[Other ingredients]
The curable composition of the present invention may further contain a known and commonly used coloring pigment such as phthalocyanine blue, phthalocyanine green, and carbon black, if necessary.
さらに、消泡剤、密着性付与剤またはレベリング剤などの各種添加剤類、ハイドロキノン、ハイドロキノンモノメチルエーテル、ピロガロール、ターシャリーブチルカテコール、フェノチアジンなどの公知慣用の重合禁止剤、カップリング剤、分散剤、難燃剤等の添加剤を含ませることができる。 In addition, various additives such as antifoaming agents, adhesion imparting agents or leveling agents, known and commonly used polymerization inhibitors such as hydroquinone, hydroquinone monomethyl ether, pyrogallol, tertiary butylcatechol, phenothiazine, coupling agents, dispersants, etc. Additives such as flame retardants can be included.
本発明の硬化性組成物は、第1液と第2液とが6:4〜9:1、好ましくは7:3〜8:2の混合比(質量比)で混合、撹拌されて得られる。それぞれ計量した第1液及び第2液を一つの容器中で混合・撹拌してもよく、公知の2液混合吐出装置を使用しても良い。2液混合吐出装置は、例えば、三習工業株式会社、株式会社レクシー、トミタエンジニアリング株式会社、兵神装備株式会社等より市販されている。 The curable composition of the present invention is obtained by mixing and stirring the first liquid and the second liquid at a mixing ratio (mass ratio) of 6: 4 to 9: 1, preferably 7: 3 to 8: 2. .. The first liquid and the second liquid, which are weighed respectively, may be mixed and stirred in one container, or a known two-liquid mixing / discharging device may be used. The two-component mixing / discharging device is commercially available, for example, from Sanshu Kogyo Co., Ltd., Lexie Co., Ltd., Tomita Engineering Co., Ltd., Hyojin Equipment Co., Ltd., and the like.
本発明の硬化性組成物は、スクリーン印刷法により基材上に印刷される。スクリーン印刷に適用しうる粘度は、25℃、5rpmにおける粘度が、例えば、100〜500dPa・sの範囲であり、好ましくは、150〜350dPa・sの範囲である。 The curable composition of the present invention is printed on a substrate by a screen printing method. The viscosity applicable to screen printing is, for example, a viscosity at 25 ° C. and 5 rpm in the range of 100 to 500 dPa · s, preferably in the range of 150 to 350 dPa · s.
基材は、予め回路形成されたプリント配線板やフレキシブルプリント配線板の他、紙+フェノール樹脂、紙+エポキシ樹脂、紙+ガラス布+エポキシ樹脂、ガラス不織布+エポキシ樹脂、ガラス織布+エポキシ樹脂、ガラス繊維+ポリイミド樹脂等の銅張積層板、ポリイミドフィルム、PETフィルム、ガラス基板、セラミック基板、ウエハ板等を挙げることができる。 In addition to pre-circuit-formed printed wiring boards and flexible printed wiring boards, the base material is paper + phenol resin, paper + epoxy resin, paper + glass cloth + epoxy resin, glass non-woven fabric + epoxy resin, glass woven cloth + epoxy resin. , Copper-clad laminate such as glass fiber + polyimide resin, polyimide film, PET film, glass substrate, ceramic substrate, wafer plate and the like.
本発明の硬化性組成物の塗布後の乾燥は、熱風循環式乾燥炉、IR炉、ホットプレート、コンベクションオーブンなどを用いて行うことができる。 Drying after application of the curable composition of the present invention can be carried out using a hot air circulation type drying furnace, an IR furnace, a hot plate, a convection oven or the like.
本発明の硬化性組成物を、例えば約140〜180℃の温度に加熱して熱硬化させることにより、耐熱性及び剛性に優れた硬化塗膜に形成することができる。 By heating the curable composition of the present invention to a temperature of, for example, about 140 to 180 ° C. and thermosetting it, a cured coating film having excellent heat resistance and rigidity can be formed.
本発明の硬化性組成物を塗布し、溶剤を揮発乾燥した後に得られた塗膜に対し、露光(活性エネルギー線の照射)を行うことにより、露光部(活性エネルギー線により照射された部分)が硬化する。また、接触式(または非接触方式)により、パターンを形成したフォトマスクを通して選択的に活性エネルギー線により露光もしくはレーザーダイレクト露光機により直接パターン露光し、未露光部を希アルカリ水溶液(例えば0.3〜3wt%炭酸ソーダ水溶液)により現像してレジストパターンが形成される。 The coating film obtained after applying the curable composition of the present invention and volatilizing and drying the solvent is exposed (irradiated with active energy rays) to expose an exposed portion (a portion irradiated with active energy rays). Hardens. Further, by the contact method (or non-contact method), the unexposed portion is selectively exposed to active energy rays or the pattern is directly exposed by a laser direct exposure machine through a photomask in which a pattern is formed, and the unexposed portion is exposed to a dilute alkaline aqueous solution (for example, 0.3). A resist pattern is formed by developing with (~ 3 wt% sodium carbonate aqueous solution).
上記活性エネルギー線照射に用いられる露光機としては、高圧水銀灯ランプ、超高圧水銀灯ランプ、メタルハライドランプ、水銀ショートアークランプ等を搭載し、350〜450nmの範囲で紫外線を照射する装置であればよく、さらに、直接描画装置(例えばコンピューターからのCADデータにより直接レーザーで画像を描くレーザーダイレクトイメージング装置)も用いることができる。画像形成のための露光量は膜厚等によって異なるが、一般には100〜1000mJ/cm2、好ましくは200〜800mJ/cm2の範囲内とすることができる。 The exposure machine used for the above-mentioned active energy ray irradiation may be a device equipped with a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, a mercury short arc lamp, etc., and irradiates ultraviolet rays in the range of 350 to 450 nm. Further, a direct drawing device (for example, a laser direct imaging device that directly draws an image with a laser based on CAD data from a computer) can also be used. The amount of exposure for image formation varies depending on the film thickness and the like, but is generally in the range of 100 to 1000 mJ / cm 2 , preferably 200 to 800 mJ / cm 2 .
上記現像方法としては、ディッピング法、シャワー法、スプレー法、ブラシ法等によることができ、現像液としては、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、リン酸ナトリウム、ケイ酸ナトリウム、アンモニア、アミン類などのアルカリ水溶液が使用できる。 The developing method can be a dipping method, a shower method, a spray method, a brush method, etc., and the developing solution includes potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium phosphate, sodium silicate, etc. Alkaline aqueous solutions such as ammonia and amines can be used.
本発明の硬化性組成物は、耐熱性、剛性、基材への密着性、絶縁性に優れることから種々の用途に適用可能であり、適用対象に特に制限はない。例えば、プリント配線板のエッチングレジスト、ソルダーレジスト、マーキングレジストの作成等に用いることができ、中でも、高い耐熱性が要求されるソルダーレジスト、特に、高い剛性及び耐熱性が要求される車載用の端末に組み込まれるプリント基板用のソルダーレジストとして好適に用いることができる。 Since the curable composition of the present invention is excellent in heat resistance, rigidity, adhesion to a substrate, and insulating property, it can be applied to various uses, and the application target is not particularly limited. For example, it can be used for making etching resists, solder resists, marking resists, etc. for printed wiring boards. Among them, solder resists that require high heat resistance, especially in-vehicle terminals that require high rigidity and heat resistance. It can be suitably used as a solder resist for a printed circuit board incorporated in.
以下、実施例を示して本発明について具体的に説明するが、本発明はこれらの実施例のみに限定されるものではない。なお、以下において特に断りのない限り、「部」は質量部を意味するものとする。 Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited to these Examples. In the following, unless otherwise specified, "parts" shall mean parts by mass.
((A)アルカリ可溶性樹脂の合成)
クレゾールノボラック型エポキシ樹脂(日本化薬社製、EOCN−104S、エポキシ当量220g/eq)220部(1当量)、カルビトールアセテート140.1部、及びソルベントナフサ60.3部をフラスコに仕込み、90℃に加熱・攪拌し、溶解した。得られた溶液を一旦60℃まで冷却し、アクリル酸72部(1モル)、メチルハイドロキノン0.5部、トリフェニルホスフィン2部を加え、100℃に加熱し、約12時間反応させ、酸価が0.2mgKOH/gの反応物を得た。これにテトラヒドロ無水フタル酸80.6部(0.53モル)を加え、90℃に加熱し、約6時間反応させ、固形分酸価が85mgKOH/g、固形分濃度64.9%の樹脂溶液((A)アルカリ可溶性樹脂)を得た。
((A) Synthesis of alkali-soluble resin)
Cresol novolac type epoxy resin (manufactured by Nippon Kayaku Co., Ltd., EOCN-104S, epoxy equivalent 220 g / eq) 220 parts (1 equivalent), carbitol acetate 140.1 parts, and solvent naphtha 60.3 parts were charged into a flask and 90 parts. Heated and stirred at ° C to dissolve. The obtained solution was once cooled to 60 ° C., 72 parts (1 mol) of acrylic acid, 0.5 part of methylhydroquinone and 2 parts of triphenylphosphine were added, heated to 100 ° C., reacted for about 12 hours, and the acid value was increased. Obtained a reaction product of 0.2 mgKOH / g. 80.6 parts (0.53 mol) of tetrahydrophthalic anhydride was added thereto, and the mixture was heated to 90 ° C. and reacted for about 6 hours. A resin solution having a solid acid value of 85 mgKOH / g and a solid content concentration of 64.9%. ((A) Alkali-soluble resin) was obtained.
<1.実施例1〜3および比較例1〜2の硬化性組成物の調製>
表1に示す各材料を配合し、撹拌機にて予備混合し、次いで3本ロールミルにより混練して第1液を調製し、同じく表1に示す各材料を配合し、撹拌機にて予備混合し、次いで3本ロールミルにより混練して第2液を調製した。その後、第1液及び第2液を混合・撹拌することで硬化性組成物を調製した。表1中、ワニスAについては、溶媒を含む樹脂溶液の質量を示す。
<1. Preparation of curable compositions of Examples 1-3 and Comparative Examples 1-2>
Each material shown in Table 1 is mixed and premixed with a stirrer, then kneaded with a 3-roll mill to prepare the first liquid, and each material also shown in Table 1 is mixed and premixed with a stirrer. Then, the second liquid was prepared by kneading with a three-roll mill. Then, the first liquid and the second liquid were mixed and stirred to prepare a curable composition. In Table 1, for varnish A, the mass of the resin solution containing the solvent is shown.
*1:2−メチル−1−[4−(メチルチオ)フェニル]−2−モルホリノプロパン−1−オン(Omnirad 907:IGM Resins B.V.社製)
*2:2,4−ジエチルチオキサントン(KAYACURE DETX−S:日本化薬社製)
*3:4,4’−ビス(ジエチルアミノ)ベンゾフェノン(EAB:保土谷化学社製)
*4:2,4,6−トリメチルベンゾイルジフェニルホスフィンオキシド(Omnirad TPO H:IGM Resins B.V.社製)
*5:ジペンタエリスリトールヘキサアクリレート(DPHA:ダイセル・オルネクス社製)
*6:トリメチロールプロパンEO変性(n≒1)トリアクリレート(M−350:東亞合成社製)
*7:タルク(LMP−100:富士タルク工業社製)
*8:シリカ充填剤(Imsil(登録商標)A−8:UNIMIN社製)
*9:硫酸バリウム(B−30:堺化学工業社製)
*10:緑系顔料(FASTOGEN GREEN S:DIC社製)
*11:ジエチレングリコールモノエチルエーテルアセテート(D0500:東京化成工業社製)
*12:高沸点芳香族溶剤(T−SOL(登録商標)150:JXTGエネルギー社製)
*13:イソシアヌル酸トリグリシジル(TEPIC−S:日産化学工業社製)
*14:クレゾールノボラック型多官能エポキシ樹脂 エポキシ当量209−219(g/eq)(EPICLON N−695:DIC社製)
*15:フェノールノボラック型エポキシ樹脂(RE−306:日本化薬社製)
*16:ビスフェノールA型エポキシ樹脂(JER(登録商標)−834:三菱ケミカル社製)
*17:エトキシ化イソシアヌル酸トリアクリレ-ト(A−9300:新中村化学工業社製)
*18:粘度は、回転式粘度計(東機産業 VISCOMETER TV−33 コーンプレート型)を用いて、25℃における5回転毎分(rpm)の粘度を測定した。硬化性組成物の粘度についても同様である。なお、第2液(硬化剤)及び硬化性組成物の双方とも、調整直後の粘度(単位:dPa・s)を測定した。
* 1: 2-Methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one (Omnirad 907: manufactured by IGM Resins BV)
* 2: 2,4-diethylthioxanthone (KAYACURE DETX-S: manufactured by Nippon Kayaku Co., Ltd.)
* 3: 4,4'-bis (diethylamino) benzophenone (EAB: manufactured by Hodogaya Chemical Co., Ltd.)
* 4: 2,4,6-trimethylbenzoyldiphenylphosphine oxide (Omnirad TPO H: manufactured by IGM Resins BV)
* 5: Dipentaerythritol hexaacrylate (DPHA: manufactured by Daicel Ornex)
* 6: Trimethylolpropane EO-modified (n≈1) triacrylate (M-350: manufactured by Toagosei Co., Ltd.)
* 7: Talc (LMP-100: manufactured by Fuji Talc Industry Co., Ltd.)
* 8: Silica filler (Imsil® A-8: manufactured by UNIMIN)
* 9: Barium sulfate (B-30: manufactured by Sakai Chemical Industry Co., Ltd.)
* 10: Green pigment (FASTOGEN GREEN S: manufactured by DIC Corporation)
* 11: Diethylene glycol monoethyl ether acetate (D0500: manufactured by Tokyo Chemical Industry Co., Ltd.)
* 12: High boiling point aromatic solvent (T-SOL (registered trademark) 150: manufactured by JXTG Energy Co., Ltd.)
* 13: Trichloroisocyanuric acid (TEPIC-S: manufactured by Nissan Chemical Industries, Ltd.)
* 14: Cresol novolac type polyfunctional epoxy resin Epoxy equivalent 209-219 (g / eq) (EPICLON N-695: manufactured by DIC Corporation)
* 15: Phenolic novolac type epoxy resin (RE-306: manufactured by Nippon Kayaku Co., Ltd.)
* 16: Bisphenol A type epoxy resin (JER (registered trademark) -834: manufactured by Mitsubishi Chemical Corporation)
* 17: Trichloroisocyanuric acid ethoxylated (A-9300: manufactured by Shin-Nakamura Chemical Industry Co., Ltd.)
* 18: The viscosity was measured at 5 rpm (rpm) at 25 ° C. using a rotary viscometer (Toki Sangyo VISCOMETER TV-33 cone plate type). The same applies to the viscosity of the curable composition. The viscosity (unit: dPa · s) immediately after adjustment was measured for both the second liquid (hardener) and the curable composition.
<2.評価>
2−1.はんだ耐熱性
2−1−1.試験基板の作製
100mm×150mmの大きさで1.6mmの厚さのFR−4銅張り積層板(銅厚70μm)を用いて、エッチング工法により幅1mm、長さ100mmのライン、スペース5mmのパターンを作製し、試験基板とした。
<2. Evaluation >
2-1. Solder heat resistance 2-1-1. Preparation of test substrate Using a FR-4 copper-clad laminate (copper thickness 70 μm) with a size of 100 mm × 150 mm and a thickness of 1.6 mm, a pattern with a width of 1 mm, a length of 100 mm, and a space of 5 mm was obtained by an etching method. Was prepared and used as a test substrate.
2−1−2.試験片の作製
100mm×150mmの大きさで1.6mmの厚さのFR−4銅張り積層板(銅厚70μm)に実施例1〜3および比較例1〜2の硬化性組成物をスクリーン印刷法にて100メッシュポリエステルバイアス版を用いて全面に印刷し、熱風循環式乾燥炉にて80℃で30分間乾燥させた。次に、全てのラインがカバーできるネガパターンを用いて、プリント配線板用露光機HMW−680GW((株)オーク製作所製)で700mJ/cm2の積算光量で露光し、30℃で1%の炭酸ナトリウム水溶液を現像液として、プリント配線板用現像機にて60秒間現像し、続いて150℃で60分間、熱風循環式乾燥炉で熱硬化を行ない、試験片を作製した。
2-1-2. Preparation of test piece The curable compositions of Examples 1 to 3 and Comparative Examples 1 and 2 were screen-printed on a FR-4 copper-clad laminate (copper thickness 70 μm) having a size of 100 mm × 150 mm and a thickness of 1.6 mm. It was printed on the entire surface using a 100 mesh polyester bias plate by the method, and dried in a hot air circulation type drying oven at 80 ° C. for 30 minutes. Next, using a negative pattern that can cover all lines, exposure was performed with an exposure machine for printed wiring boards HMW-680GW (manufactured by ORC Manufacturing Co., Ltd.) with an integrated light amount of 700 mJ / cm 2 , and 1% at 30 ° C. Using an aqueous sodium carbonate developer as a developing solution, the test piece was developed in a developing machine for a printed wiring board for 60 seconds, and then heat-cured in a hot air circulation drying furnace for 60 minutes at 150 ° C. to prepare a test piece.
2−1−3.はんだ耐熱性試験
ロジン系フラックスを塗布した各試験片を、あらかじめ260℃に設定したはんだ槽に1回30秒間で浸漬させ、変性アルコールで洗浄してフラックスを洗浄し、乾燥した後、目視により硬化膜の剥がれについて評価した。
2-1-3. Solder heat resistance test Each test piece coated with rosin-based flux is immersed in a solder bath set at 260 ° C for 30 seconds once, washed with modified alcohol to wash the flux, dried, and then visually cured. The peeling of the film was evaluated.
はんだ耐熱性
◎:3回はんだ耐熱性試験を繰り返しても剥がれなかったもの
○:1回のはんだ耐熱性試験で剥がれなかったもの
△:1回のはんだ耐熱性試験で若干剥がれが生じたもの
×:1回のはんだ耐熱性試験で著しい剥がれが生じたもの
Solder heat resistance ◎: Those that did not peel off even after repeating the solder heat resistance test three times ○: Those that did not peel off in one solder heat resistance test △: Those that did slightly peel off in one solder heat resistance test × 1: Significant peeling occurred in one solder heat resistance test
2−2.印刷性
100mm×150mmの大きさで1.6mmの厚さのFR−4銅張り積層板(銅厚70μm)に、実施例1〜3および比較例1〜2の硬化性組成物(インキ)をスクリーン印刷法にて200メッシュポリエステルバイアス版を用いて全面に印刷した。各硬化性組成物について、銅張り積層板に100枚目まで連続して印刷を行い、100枚目の銅張り積層板上に印刷されたインキの状態で印刷性を評価した。
2-2. Printability The curable compositions (inks) of Examples 1 to 3 and Comparative Examples 1 and 2 were applied to a FR-4 copper-clad laminate (copper thickness 70 μm) having a size of 100 mm × 150 mm and a thickness of 1.6 mm. The entire surface was printed using a 200 mesh polyester bias plate by a screen printing method. Each curable composition was continuously printed up to the 100th sheet on the copper-clad laminate, and the printability was evaluated in the state of the ink printed on the 100th copper-clad laminate.
印刷性
○:インキのかすれ無し
△:若干のインキのかすれ有り
×:インキのかすれ有り
Printability ○: No ink fading △: Some ink fading ×: Ink fading
2−3.撹拌後の異物
第1液及び第2液の混合直後の実施例1〜3および比較例1〜2の硬化性組成物100gをボール盤にて5分間撹拌した。撹拌後の各硬化性組成物を、100mm×150mmの大きさで1.6mmの厚さのFR−4銅張り積層板(銅厚70μm)にスクリーン印刷法にて100メッシュポリエステルバイアス版を用いて全面に印刷し、熱風循環式乾燥炉にて80℃で30分間乾燥させた。次に、プリント配線板用露光機HMW−680GW((株)オーク製作所製)で500mJ/cm2の積算光量で露光し、続いて150℃で60分間、ボックス炉(KBF848N2:光洋サーモシステム社製)で熱硬化を行ない、試験片を得た。この試験片について光学顕微鏡(倍率:100倍)で観察し、異物の評価をおこなった。
2-3. Foreign matter after stirring 100 g of the curable compositions of Examples 1 to 3 and Comparative Examples 1 and 2 immediately after mixing the first liquid and the second liquid were stirred with a drilling machine for 5 minutes. Each curable composition after stirring is applied to a FR-4 copper-clad laminate (copper thickness 70 μm) having a size of 100 mm × 150 mm and a thickness of 1.6 mm by a screen printing method using a 100 mesh polyester bias plate. It was printed on the entire surface and dried in a hot air circulation type drying furnace at 80 ° C. for 30 minutes. Next, the printed wiring board exposure machine HMW-680GW (manufactured by ORC Manufacturing Co., Ltd.) was used to expose with an integrated light intensity of 500 mJ / cm 2 , followed by a box furnace (KBF848N2: manufactured by Koyo Thermo System Co., Ltd.) at 150 ° C. for 60 minutes. ) Was heat-cured to obtain a test piece. This test piece was observed with an optical microscope (magnification: 100 times) to evaluate foreign substances.
撹拌後の異物
○:異物無し
△:所々異物有り
×:全面に異物有り
以下、表2にはんだ耐熱性、印刷性、撹拌後の異物の評価結果を示す。
Foreign matter after stirring ○: No foreign matter Δ: Foreign matter in some places ×: Foreign matter on the entire surface Table 2 below shows the evaluation results of solder heat resistance, printability, and foreign matter after stirring.
表2の実施例1〜3と比較例1〜2との対比から示されるように、アルカリ現像型の硬化性組成物に(C)イソシアヌル酸トリグリシジルを含む化合物を配合した場合に、第2液の粘度及び硬化性組成物の粘度を本発明の範囲とすることで、印刷性、撹拌後の異物の発生を改善しつつ、得られた硬化膜のはんだ耐熱性を向上させることが可能となった。また、実施例1〜2と実施例3との対比から、(E)光重合性多官能モノマーとしてエチレン性不飽和基を含むイソシアヌレート環含有化合物を用いることで、さらにはんだ耐熱性を向上させることができることがわかった。 As shown in the comparison between Examples 1 to 3 and Comparative Examples 1 and 2 in Table 2, when the compound containing (C) triglycidyl isocyanurate was blended in the alkali-developing curable composition, the second By setting the viscosity of the liquid and the viscosity of the curable composition within the scope of the present invention, it is possible to improve the printability and the generation of foreign substances after stirring, and to improve the solder heat resistance of the obtained cured film. became. Further, from the comparison between Examples 1 and 2 and Example 3, the solder heat resistance is further improved by using (E) an isocyanurate ring-containing compound containing an ethylenically unsaturated group as the photopolymerizable polyfunctional monomer. I found that I could do it.
Claims (5)
(B)光重合開始剤と、
を含む第1液と、
(C)イソシアヌル酸トリグリシジルを含み、25℃、5rpmにおける粘度が10〜100dPa・sの範囲内である第2液と、
を混合してなる、25℃、5rpmにおける粘度が100〜500dPa・sの範囲内である硬化性組成物であって、
(E)光重合性多官能モノマー及び(F)無機充填剤が、前記混合前の前記第1液及び前記第2液の何れか一方又は双方にそれぞれ含まれていることを特徴とする硬化性組成物。 (A) Alkali-soluble resin and
(B) Photopolymerization initiator and
1st solution containing
(C) A second solution containing trichloroisocyanuric acid and having a viscosity at 25 ° C. and 5 rpm in the range of 10 to 100 dPa · s.
A curable composition having a viscosity at 25 ° C. and 5 rpm in the range of 100 to 500 dPa · s, which is a mixture of the above.
Curability characterized in that (E) a photopolymerizable polyfunctional monomer and (F) an inorganic filler are contained in either or both of the first liquid and the second liquid before mixing, respectively. Composition.
エチレン性不飽和基を含むイソシアヌレート環含有化合物を含むことを特徴とする請求項1又は2に記載の硬化性組成物。 (E) The photopolymerizable polyfunctional monomer
The curable composition according to claim 1 or 2, which comprises an isocyanurate ring-containing compound containing an ethylenically unsaturated group.
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JP2005241977A (en) * | 2004-02-26 | 2005-09-08 | Taiyo Ink Mfg Ltd | Photosetting/thermosetting resin composition and printed wiring board using the same |
JP2010055125A (en) * | 2003-08-25 | 2010-03-11 | Hitachi Chem Co Ltd | Photosensitive resin composition for permanent resist, photosensitive film for permanent resist, method for forming resist pattern, and printed wiring board |
JP2014186266A (en) * | 2013-03-25 | 2014-10-02 | Goo Chemical Co Ltd | Resin composition for solder resist and printed wiring board |
JP2018513568A (en) * | 2015-08-06 | 2018-05-24 | ドゥドゥ テック カンパニー リミテッドDodo Tech Co.,Ltd. | Method for manufacturing a multilayer printed circuit board for Bluetooth |
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JP2010055125A (en) * | 2003-08-25 | 2010-03-11 | Hitachi Chem Co Ltd | Photosensitive resin composition for permanent resist, photosensitive film for permanent resist, method for forming resist pattern, and printed wiring board |
JP2005241977A (en) * | 2004-02-26 | 2005-09-08 | Taiyo Ink Mfg Ltd | Photosetting/thermosetting resin composition and printed wiring board using the same |
JP2014186266A (en) * | 2013-03-25 | 2014-10-02 | Goo Chemical Co Ltd | Resin composition for solder resist and printed wiring board |
JP2018513568A (en) * | 2015-08-06 | 2018-05-24 | ドゥドゥ テック カンパニー リミテッドDodo Tech Co.,Ltd. | Method for manufacturing a multilayer printed circuit board for Bluetooth |
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