JP2020094269A - Additive manufacturing apparatus - Google Patents

Additive manufacturing apparatus Download PDF

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JP2020094269A
JP2020094269A JP2019124359A JP2019124359A JP2020094269A JP 2020094269 A JP2020094269 A JP 2020094269A JP 2019124359 A JP2019124359 A JP 2019124359A JP 2019124359 A JP2019124359 A JP 2019124359A JP 2020094269 A JP2020094269 A JP 2020094269A
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light beam
scanning
base
central
powder material
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誠 田野
Makoto Tano
誠 田野
貴也 長濱
Takaya Nagahama
貴也 長濱
好一 椎葉
Koichi Shiiba
好一 椎葉
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JTEKT Corp
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JTEKT Corp
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Priority to PCT/JP2019/047814 priority Critical patent/WO2020116609A1/en
Priority to DE112019006101.1T priority patent/DE112019006101T5/en
Priority to US17/311,050 priority patent/US20220023950A1/en
Publication of JP2020094269A publication Critical patent/JP2020094269A/en
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

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Abstract

To provide an additive manufacturing apparatus capable of adding a high-accuracy molded article.SOLUTION: An additive manufacturing apparatus 100 adds a molded article to a base B by using a powder material or a linear material, and the apparatus includes: an additive material supply unit 110; a light irradiation unit 120; and a control unit 130 that controls the supply of a first powder material P1 and relative scanning of a light beam with respect to the base B. The light irradiation unit 120 has a central light beam irradiation unit 121 and an outside light beam irradiation unit 123. The control unit 130 independently controls the output conditions for the central light beam irradiation unit 121 and the output conditions for the outside light beam irradiation unit 123, and thereby increases a peak LCP3 in the beam profile of the power density of a central light beam LC than a peak LSP3 in the beam profile of the power density of an outside light beam LS so as to add a molded article FF.SELECTED DRAWING: Figure 1

Description

本発明は、付加製造装置に関する。 The present invention relates to an additive manufacturing device.

特許文献1に記載のように、付加製造装置に適用されるLMD(Laser Metal Deposition)法は、金属の基台に対し同種や異種の金属の粉末材料を噴射して供給するとともにレーザ光を照射し、粉末材料を溶融させた後、凝固させて基台に造形物を付加する肉盛技術(物性の部分制御加工)として利用されている。LMD法は、SLM(Selective Laser Melting)法では困難な複数の粉末材料の成分比を調整して供給でき、SLM法に比べて形状自由度が高く、約5−10倍の高速造形が可能である。 As described in Patent Document 1, the LMD (Laser Metal Deposition) method applied to an additive manufacturing apparatus irradiates a laser beam while spraying and supplying a powder material of the same kind or different kinds of metal to a metal base. Then, it is used as a build-up technique (partial control of physical properties) in which a powder material is melted and then solidified to add a modeled object to a base. The LMD method can adjust and supply the component ratios of a plurality of powder materials, which is difficult with the SLM (Selective Laser Melting) method, has a high degree of freedom in shape as compared with the SLM method, and is capable of approximately 5-10 times high-speed modeling. is there.

特開2015−196265号公報JP, 2005-196265, A

LMD法では、例えば、炭素鋼(S45C)で成る基台に炭化タングステン(WC)などで成る硬質の造形物を付加する場合、急加熱時にスパッタが発生するおそれがあり、また急冷凝固時に割れが発生するおそれがあり、硬質の造形物の品質が低下する。 In the LMD method, for example, when a hard shaped article made of tungsten carbide (WC) or the like is added to a base made of carbon steel (S45C), spatter may occur during rapid heating, and cracks may occur during rapid solidification. This may occur, and the quality of the hard shaped object deteriorates.

本発明は、高品質な造形物を付加できる付加製造装置を提供することを目的とする。 It is an object of the present invention to provide an additional manufacturing apparatus that can add a high-quality shaped object.

(1.付加製造装置の第一態様)
本発明に係る第一態様の付加製造装置は、粉末材料又は線形材料を用いて基台に造形物を付加する付加製造装置であって、前記基台に対し前記粉末材料を噴射して供給する、又は前記線形材料を供給する付加材料供給装置と、前記基台における前記粉末材料又は前記線形材料の供給部に対し光ビームを照射する光照射装置と、前記付加材料供給装置の粉末供給又は前記線形材料の供給、及び前記光照射装置の光照射を制御するとともに、前記基台に対する前記光ビームの相対的な走査を制御する制御装置とを備える。
(1. First mode of additional manufacturing apparatus)
An additional manufacturing apparatus according to a first aspect of the present invention is an additional manufacturing apparatus that adds a modeled object to a base using a powder material or a linear material, and jets and supplies the powder material to the base. Or, an additional material supply device for supplying the linear material, a light irradiation device for irradiating a light beam to the powder material or the linear material supply portion of the base, and the powder supply of the additional material supply device or the And a controller that controls the supply of the linear material and the light irradiation of the light irradiation device, and controls the relative scanning of the light beam with respect to the base.

前記光照射装置は、前記粉末材料の供給部又は前記線形材料の供給部の中央に前記光ビームとして中央光ビームを照射する中央光ビーム照射部及び前記中央光ビームの外側に前記光ビームとして外側光ビームを照射する外側光ビーム照射部を有し、前記制御装置は、前記中央光ビーム照射部の出力条件と前記外側光ビーム照射部の出力条件を独立して制御することで、前記中央光ビームのパワー密度のビームプロファイルにおけるピークを前記外側光ビームのパワー密度のビームプロファイルにおけるピークより増加させて前記造形物を付加する。 The light irradiation device includes a central light beam irradiation unit that irradiates a central light beam as the light beam to the center of the powder material supply unit or the linear material supply unit, and an outside of the central light beam as the light beam. An outer light beam irradiation unit for irradiating a light beam is provided, and the control device controls the output condition of the central light beam irradiation unit and the output condition of the outer light beam irradiation unit independently, so that the central light beam is emitted. The shape is added by increasing the peak in the beam density profile of the beam from the peak in the beam profile of the power density of the outer light beam.

これにより、外側光ビームで造形物の付加処理の前処理として予熱処理を行うことができるので、中央光ビームのパワー密度のレーザビームプロファイルにおけるピークを大きく高める必要はない。これにより、中央光ビームによる急加熱を低減でき、スパッタの発生を抑制できる。また、外側光ビームで造形物の付加処理の後処理として保温処理を行うことができるので、造形物の急冷凝固を抑制でき、割れの発生を防止できる。よって、基台に対し高品質な造形物を付加できる。 Thus, the preheat treatment can be performed with the outer light beam as a pretreatment for the additional treatment of the modeled object, so that it is not necessary to greatly increase the peak in the laser beam profile of the power density of the central light beam. As a result, rapid heating by the central light beam can be reduced and spatter can be suppressed. In addition, since the heat retaining process can be performed as a post-treatment of the additional process of the shaped object with the outer light beam, rapid solidification of the shaped object can be suppressed and cracking can be prevented. Therefore, a high-quality molded object can be added to the base.

(2.付加製造装置の第二態様)
本発明に係る第二態様の付加製造装置は、複数種の粉末材料を用いて基台に造形物を付加する付加製造装置であって、前記複数種の粉末材料の成分比を調整する成分比調整装置を有し、前記基台に対し前記成分比が調整済の粉末材料を噴射して供給する付加材料供給装置と、前記基台における前記成分比が調整済の粉末材料の供給部に対し光ビームを照射する光照射装置と、前記付加材料供給装置の粉末供給及び前記光照射装置の光照射を制御するとともに、前記基台に対する前記光ビームの相対的な走査を制御する制御装置とを備える。
(2. Second mode of additional manufacturing apparatus)
An additional manufacturing apparatus according to a second aspect of the present invention is an additional manufacturing apparatus for adding a modeled product to a base using a plurality of types of powder materials, and a component ratio for adjusting a component ratio of the plurality of types of powder materials. With respect to the additional material supply device that has an adjusting device and supplies the powder material with the component ratio adjusted to the base by jetting it, and the powder material supply unit with the component ratio adjusted in the base. A light irradiation device that irradiates a light beam, and a control device that controls the powder supply of the additional material supply device and the light irradiation of the light irradiation device, and controls the relative scanning of the light beam with respect to the base. Prepare

前記光照射装置は、前記成分比が調整済の粉末材料の供給部の中央に前記光ビームとして中央光ビームを照射する中央光ビーム照射部及び前記中央光ビームの外側に前記光ビームとして外側光ビームを照射する外側光ビーム照射部を有し、前記制御装置は、前記基台の表面に前記成分比が厚さ方向に徐変する中間造形物を付加し、前記中間造形物を形成する際、前記成分比の変化に応じて前記中央光ビーム照射部の出力条件と前記外側光ビーム照射部の出力条件を独立して制御する。 The light irradiation device includes a central light beam irradiation unit that irradiates a central light beam as the light beam at the center of the powder material supply unit whose component ratio has been adjusted, and outside light as the light beam outside the central light beam. An outer light beam irradiating unit for irradiating a beam, and the control device adds an intermediate shaped object whose component ratio gradually changes in the thickness direction to the surface of the base to form the intermediate shaped object. The output condition of the central light beam irradiation unit and the output condition of the outer light beam irradiation unit are independently controlled according to the change in the component ratio.

このような構成により、基台の周面と中間造形物との熱膨張率差は、基台の周面と中間造形物との境界に近付くほど徐々に減少するよう形成できる。また、中間造形物と造形物との熱膨張率差は、中間造形物FCと造形物FFの境界に近付くほど徐々に減少するよう形成できる。これにより、基台Bに中間造形物FCを付加し、中間造形物FCに造形物FFを付加することで、熱膨張率差による割れの発生を大幅に抑制できる。 With such a configuration, the difference in the coefficient of thermal expansion between the peripheral surface of the base and the intermediate shaped article can be formed to gradually decrease as it approaches the boundary between the peripheral surface of the base and the intermediate shaped article. Further, the difference in coefficient of thermal expansion between the intermediate shaped article and the shaped article can be formed so as to gradually decrease as it approaches the boundary between the intermediate shaped article FC and the shaped article FF. Accordingly, by adding the intermediate shaped article FC to the base B and the shaped article FF to the intermediate shaped article FC, it is possible to significantly suppress the occurrence of cracks due to the difference in thermal expansion coefficient.

本発明の第一、第二実施形態に係る付加製造装置の概要図である。It is a schematic diagram of the additional manufacturing device which concerns on 1st, 2nd embodiment of this invention. 図1の付加製造装置で造形物を付加する基台を示す斜視図である。It is a perspective view which shows the base which adds a modeling thing with the addition manufacturing apparatus of FIG. 造形物を付加した図2Aの基台を中心軸線方向から見た図である。It is the figure which looked at the base of Drawing 2A which added a model thing from the direction of a central axis. 図1の付加製造装置で基台に造形物を付加する場合の第一段階(基台の周面の初期の予熱処理)におけるパワー密度とレーザ光照射範囲との関係を示す図である。It is a figure which shows the relationship between the power density and the laser beam irradiation range in the 1st step (initial preheat treatment of the peripheral surface of a base) when adding a molded article to a base with the additional manufacturing apparatus of FIG. 図1の付加製造装置で基台に造形物を付加する場合の第二段階(造形物の付加処理)におけるパワー密度とレーザ光照射範囲との関係を示す図である。It is a figure which shows the relationship between the power density and the laser beam irradiation range in the 2nd step (addition process of a modeling object) at the time of adding a modeling object to a base with the additional manufacturing apparatus of FIG. 第一実施形態に係る付加製造装置で造形物を付加する際の基台に付加した造形物の初期状態を示す断面図である。It is sectional drawing which shows the initial state of the molded article added to the base when adding a molded article with the additional manufacturing apparatus which concerns on 1st embodiment. 図4Aの状態から走査が進んだときの基台に付加した造形物の途中状態及び付加状態を示す断面図である。FIG. 4B is a cross-sectional view showing an intermediate state and an added state of the shaped article added to the base when the scanning progresses from the state of FIG. 4A. 第一実施形態に係る付加製造装置の動作を説明するためのフローチャートである。It is a flow chart for explaining operation of the additional manufacturing device concerning a first embodiment. 第二実施形態に係る付加製造装置の作動における光ビームの各走査状態を説明する第一図である。It is a 1st figure explaining each scanning state of the light beam in operation|movement of the additional manufacturing apparatus which concerns on 2nd embodiment. 第二実施形態に係る付加製造装置の作動における光ビームの各走査状態を説明する第二図である。It is a 2nd figure explaining each scanning state of the light beam in operation|movement of the additional manufacturing apparatus which concerns on 2nd embodiment. 第二実施形態に係る付加製造装置の作動における光ビームの各走査状態を説明する第三図である。It is a 3rd figure explaining each scanning state of the light beam in operation|movement of the additional manufacturing apparatus which concerns on 2nd embodiment. 図6A−図6Cの状態における基台の周面上のJ部の温度変化を示すグラフである。It is a graph which shows the temperature change of J section on the peripheral surface of a base in the state of FIG. 6A-FIG. 6C. 本発明の第三実施形態に係る付加製造装置の概要図である。It is a schematic diagram of an additional manufacturing device concerning a third embodiment of the present invention. 図2Bに対応する図であり、第三実施形態の付加製造装置で造形物を付加した基台を中心軸線方向から見た図である。It is a figure corresponding to FIG. 2B, and is the figure which looked at the base to which the modeled object was added by the additional manufacturing apparatus of 3rd embodiment from the central axis line direction. 図8の付加製造装置で基台に造形物を付加する場合の第一段階(基台の周面の初期の予熱処理)におけるパワー密度とレーザ光照射範囲の関係を示す図である。FIG. 9 is a diagram showing the relationship between the power density and the laser light irradiation range in the first stage (initial preheat treatment of the peripheral surface of the base) when adding a shaped article to the base with the additional manufacturing apparatus of FIG. 8. 図8の付加製造装置で基台に造形物を付加する場合の第二段階(中間造形物の付加処理)におけるパワー密度とレーザ光照射範囲の関係を示す図である。It is a figure which shows the relationship between the power density and the laser beam irradiation range in the 2nd step (addition process of an intermediate|middle shaped object) at the time of adding a shaped object to a base with the additional manufacturing apparatus of FIG. 図8の付加製造装置で基台に造形物を付加する場合の第三段階(造形物の付加処理)におけるパワー密度とレーザ光照射範囲の関係を示す図である。FIG. 9 is a diagram showing a relationship between a power density and a laser light irradiation range in a third stage (model addition processing) when a model is added to the base by the additive manufacturing apparatus in FIG. 8. 第三実施形態に係る付加製造装置で造形物を付加する際の中間造形物FCに付加した造形物の初期状態を示す断面図である。It is sectional drawing which shows the initial state of the molded article added to the intermediate molded article FC at the time of adding a molded article with the additional manufacturing apparatus which concerns on 3rd embodiment. 図11Aの状態から走査が進んだときの中間造形物FCに付加した造形物の途中状態及び付加状態を示す断面図である。FIG. 11B is a cross-sectional view showing an intermediate state and an added state of a model added to the intermediate model FC when the scanning progresses from the state of FIG. 11A. 第三実施形態に係る付加製造装置の動作を説明するためのフローチャートである。It is a flow chart for explaining operation of an additional manufacturing device concerning a third embodiment. 付加製造装置の光照射装置の別例を示す概要図である。It is a schematic diagram showing another example of the light irradiation device of an additional manufacturing device.

<1.第一実施形態>
(1−1.付加製造装置の概要)
本発明の第一実施形態に係る付加製造装置の概要について説明する。第一実施形態に係る付加製造装置は、LMD法により1種の粉末材料を用いて基台に造形物を付加する。粉末材料と基台は、異なる種類の材料でもよく、同一種類の材料でもよい。
<1. First embodiment>
(1-1. Outline of additional manufacturing device)
The outline of the additional manufacturing apparatus according to the first embodiment of the present invention will be described. The additive manufacturing apparatus according to the first embodiment adds a modeled object to a base using one type of powder material by the LMD method. The powder material and the base may be different types of materials or the same type of materials.

本例では、炭化タングステン(WC)の粉末材料(以下、第一粉末材料という)で成る造形物を、炭素鋼(S45C)で成る基台Bに付加する場合について説明する。なお、この付加製造の際には、第一粉末材料の他に第一粉末材料のバインダの役割を担うニッケル(Ni)、コバルト(Co)等の粉末材料(以下、結合粉末材料という)も用いる。 In this example, a case where a shaped article made of a powder material of tungsten carbide (WC) (hereinafter, referred to as a first powder material) is added to a base B made of carbon steel (S45C) will be described. In addition to the first powder material, a powder material such as nickel (Ni) and cobalt (Co) that plays a role of a binder for the first powder material (hereinafter referred to as a binding powder material) is also used in the additional manufacturing. ..

図1に示すように、付加製造装置100は、付加材料供給装置110、光照射装置120及び制御装置130等を備える。ここでは、付加製造装置100が、図2Aに示すように、大径の円盤部材B1の両側面に小径の円筒部材B2,B2が同軸で一体化された形状の基台Bにおける、円筒部材B2,B2の開放端部側の網線で示す周面(軸受(図示省略)の支持部)B2S,B2Sに造形物FFを付加する場合について説明する。 As shown in FIG. 1, the additional manufacturing apparatus 100 includes an additional material supply device 110, a light irradiation device 120, a control device 130, and the like. Here, as shown in FIG. 2A, the additional manufacturing apparatus 100 includes a cylindrical member B2 in a base B having a shape in which small-diameter cylindrical members B2 and B2 are coaxially integrated on both side surfaces of a large-diameter disk member B1. , B2 on the open end side of the peripheral surface (supporting portions of bearings (not shown)) B2S, B2S indicated by mesh lines, the case where the modeled object FF is added will be described.

この付加製造の際、図1に示すように、付加製造装置100は、基台Bを、モータM1により中心軸線C回りに回転させるとともに、モータM2により中心軸線C方向に移動させる。これにより、円筒部材B2,B2の開放端部側の周面B2S,B2S全体に造形物を付加できる。詳細は後述するが、造形物は、造形物FF(図2B参照)による1層構造となっている。 At the time of this additional manufacturing, as shown in FIG. 1, the additional manufacturing apparatus 100 rotates the base B around the central axis C by the motor M1 and moves it in the central axis C direction by the motor M2. As a result, a modeled object can be added to the entire peripheral surfaces B2S, B2S on the open end side of the cylindrical members B2, B2. Although details will be described later, the modeled object has a one-layer structure of the modeled object FF (see FIG. 2B).

図1に示す付加材料供給装置110は、第1ホッパ111、ガスボンベ114及び噴射ノズル115を備える。第1ホッパ111は、結合粉末材料が混合された第一粉末材料P1を貯蔵する。本例では、造形物FFは、大量の第一粉末材料P1と少量の結合粉末材料で成るため、第一粉末材料P1に混合する結合粉末材料の量は、造形物FFにおける結合粉末材料の量に対応した量とする。 The additional material supply device 110 shown in FIG. 1 includes a first hopper 111, a gas cylinder 114, and an injection nozzle 115. The first hopper 111 stores the first powder material P1 in which the combined powder material is mixed. In this example, the modeled object FF is composed of a large amount of the first powder material P1 and a small amount of the combined powder material, and therefore the amount of the combined powder material mixed with the first powder material P1 is the amount of the combined powder material in the modeled object FF. The amount corresponds to.

粉末導入バルブ113aは、第1ホッパ111と配管111aで接続される。粉末供給バルブ113cは、噴射ノズル115と配管115aで接続される。また、ガス導入バルブ113dは、ガスボンベ114に配管114aで接続される。 The powder introduction valve 113a is connected to the first hopper 111 by a pipe 111a. The powder supply valve 113c is connected to the injection nozzle 115 by a pipe 115a. The gas introduction valve 113d is connected to the gas cylinder 114 by a pipe 114a.

噴射ノズル115は、例えば、ガスボンベ114から供給される高圧の窒素により、第一粉末材料P1を、基台Bの円筒部材B2の周面B2Sに対し噴射して供給する。噴射ノズル115は、本例では、2本を180度隔てて配置した場合を示すが、一本もしくは等角度間隔で配置される三本以上の噴射ノズルを備える構成としてもよい。また、第一粉末材料P1の供給用のガスは、窒素に限定されるものではなく、アルゴン等の不活性ガスでもよい。 The injection nozzle 115 injects the first powder material P1 onto the peripheral surface B2S of the cylindrical member B2 of the base B by using high-pressure nitrogen supplied from the gas cylinder 114, for example. In this example, the two injection nozzles 115 are arranged 180 degrees apart, but one injection nozzle or three or more injection nozzles arranged at equal angular intervals may be provided. The gas for supplying the first powder material P1 is not limited to nitrogen, but may be an inert gas such as argon.

光照射装置120は、中央光ビーム照射部121、中央光ビーム光源122、外側光ビーム照射部123及び外側光ビーム光源124を備える。光照射装置120は、基台Bの円筒部材B2の周面B2S(第一粉末材料P1の供給部)に対し、中央光ビーム光源122から中央光ビーム照射部121を通して中央光ビームLCを照射するとともに、外側光ビーム光源124から外側光ビーム照射部123を通して外側光ビームLSを照射する。 The light irradiation device 120 includes a central light beam irradiation unit 121, a central light beam light source 122, an outer light beam irradiation unit 123, and an outer light beam light source 124. The light irradiation device 120 irradiates the central surface light beam LC from the central light beam light source 122 to the peripheral surface B2S (supplying portion of the first powder material P1) of the cylindrical member B2 of the base B through the central light beam irradiation portion 121. At the same time, the outer light beam LS is irradiated from the outer light beam light source 124 through the outer light beam irradiation unit 123.

本例では、中央光ビーム照射部121は、円形状の照射形状(中央光照射範囲CS)となる中央光ビームLCを照射する。また、外側光ビーム照射部123は、中央光ビームLCの外周を囲うリング状の照射形状(外側光照射範囲SS)となる外側光ビームLSを照射する。中央光ビームLCは、基台Bの円筒部材B2の周面B2Sにおいて造形物FFを付加する役割を担う。外側光ビームLSの役割は後述する。なお、中央光ビームLC及び外側光ビームLSとしては、レーザ光を用いているが、レーザ光に限定されず、電磁波であれば例えば電子ビームでもよい。 In this example, the central light beam irradiation unit 121 irradiates the central light beam LC having a circular irradiation shape (central light irradiation range CS). Further, the outer light beam irradiation unit 123 irradiates the outer light beam LS having a ring-shaped irradiation shape (outer light irradiation range SS) surrounding the outer periphery of the central light beam LC. The central light beam LC plays a role of adding the modeled object FF on the peripheral surface B2S of the cylindrical member B2 of the base B. The role of the outer light beam LS will be described later. Although laser light is used as the central light beam LC and the outer light beam LS, it is not limited to laser light and may be an electron beam as long as it is an electromagnetic wave.

制御装置130は、付加材料供給装置110の粉末供給、及び光照射装置120の光照射を制御するとともに、基台Bの円筒部材B2の周面B2Sに対する中央光ビームLC及び外側光ビームLSの相対的な走査を制御する。すなわち、制御装置130は、粉末供給バルブ113c及びガス導入バルブ113dの開閉を制御して、噴射ノズル115からの第一粉末材料P1の噴射供給を制御する。 The control device 130 controls the powder supply of the additional material supply device 110 and the light irradiation of the light irradiation device 120, and the relative of the central light beam LC and the outer light beam LS to the peripheral surface B2S of the cylindrical member B2 of the base B. Control scanning. That is, the controller 130 controls the opening and closing of the powder supply valve 113c and the gas introduction valve 113d to control the injection and supply of the first powder material P1 from the injection nozzle 115.

また、制御装置130は、中央光ビーム光源122及び外側光ビーム光源124の動作をそれぞれ制御して、中央光ビームLC及び外側光ビームLSの各出力条件、すなわち中央光ビームLC及び外側光ビームLSの各レーザ出力や、中央光照射範囲CS及び外側光照射範囲SSの各単位面積当たりのレーザ出力(パワー密度)の分布形状(レーザビームプロファイル)をそれぞれ独立して制御する。 Further, the control device 130 controls the operations of the central light beam light source 122 and the outer light beam light source 124 to output the respective central light beam LC and outer light beam LS, that is, the central light beam LC and outer light beam LS. And the distribution shape (laser beam profile) of the laser output (power density) per unit area of the central light irradiation range CS and the outer light irradiation range SS are independently controlled.

また、制御装置130は、モータM1の回転を制御して基台Bを中心軸線C回りに回転させるとともに、モータM2の回転を制御して基台Bを中心軸線C方向に移動させることで、基台Bの円筒部材B2の周面B2Sに対する中央光ビームLC及び外側光ビームLSの相対的な走査を制御する。 Further, the control device 130 controls the rotation of the motor M1 to rotate the base B around the central axis C, and controls the rotation of the motor M2 to move the base B in the central axis C direction. The relative scanning of the central light beam LC and the outer light beam LS with respect to the peripheral surface B2S of the cylindrical member B2 of the base B is controlled.

(1−2.造形物の付加方法)
次に、造形物の付加方法について説明する。ここで、発明の解決課題で述べたように、LMD法では、基台に硬質の造形物を付加する場合、急加熱時にスパッタが発生するおそれがあり、また急冷凝固時に割れが発生するおそれがあり、造形物の精度が低下する問題がある。
(1-2. Method of adding shaped article)
Next, a method of adding a modeled object will be described. Here, as described in the problem to be solved by the invention, in the LMD method, when a hard shaped object is added to the base, spatter may occur during rapid heating, and cracks may occur during rapid solidification. However, there is a problem that the accuracy of the modeled object is reduced.

本発明者は、中央光ビームLC及び外側光ビームLSの各レーザ出力や各パワー密度のレーザビームプロファイルをそれぞれ独立して制御することで、スパッタ及び割れの発生を抑制できることを見出した。具体的には、図2Bに示すように、基台Bの円筒部材B2の周面B2Sに造形物FFを付加する。 The present inventor has found that the generation of spatters and cracks can be suppressed by independently controlling the laser output of each of the central light beam LC and the outer light beam LS and the laser beam profile of each power density. Specifically, as shown in FIG. 2B, the modeled object FF is added to the peripheral surface B2S of the cylindrical member B2 of the base B.

造形物FFの付加方法では、第一段階として、外側光ビームLSにより、造形物FFの付加処理における前処理として初期の予熱処理を行う。このとき、本発明に係る造形物FFの付加処理は、第二段階における処理である。基台Bの周面B2Sの温度が低い状態では、レーザ照射による熱エネルギが基台Bに逃げ易く、第二段階で行う造形物FFの付加処理において、溶融の不良要因となり易いため、第一段階で基台Bの周面B2Sを予熱するものである。このとき、初期の予熱処理における中央光ビームLC及び外側光ビームLSのレーザ出力は、基台Bの周面B2Sが溶融せずに所定の温度となるように制御される。 In the method of adding the modeled object FF, as a first step, an initial preheat treatment is performed by the outside light beam LS as a pretreatment in the process of adding the modeled object FF. At this time, the addition process of the modeled object FF according to the present invention is a process in the second stage. When the temperature of the peripheral surface B2S of the base B is low, thermal energy due to laser irradiation easily escapes to the base B, which easily causes a melting defect in the additional process of the model FF performed in the second stage. The peripheral surface B2S of the base B is preheated at a stage. At this time, the laser outputs of the central light beam LC and the outer light beam LS in the initial preheat treatment are controlled so that the peripheral surface B2S of the base B does not melt and reaches a predetermined temperature.

すなわち、第一段階では、制御装置130は、第一粉末材料P1の供給は行わず、図略の温度測定器からの中央光ビームLCの中央光照射範囲CS及び外側光ビームLSの外側光照射範囲SSの測定温度を監視しつつ、図3Aのパワー密度のグラフに示すように、中央光ビームLCのパワー密度のレーザビームプロファイルにおけるピークLCP1を、外側光ビームLSのパワー密度のレーザビームプロファイルにおけるピークLSP1より減少させる制御を行う。 That is, in the first stage, the control device 130 does not supply the first powder material P1, and the central light irradiation range CS of the central light beam LC and the outer light irradiation of the outer light beam LS from the temperature measuring device (not shown). While monitoring the measurement temperature in the range SS, as shown in the power density graph of FIG. 3A, the peak LCP1 in the laser beam profile of the power density of the central light beam LC is changed to the laser beam profile of the power density of the outer light beam LS. Control is performed to reduce the peak LSP1.

中央光ビームLCのパワー密度のピークLCP1を、外側光ビームLSのパワー密度のピークLSP1より減少させる理由としては、中央光ビームLCは外側光ビームLSに囲まれるため、中央光ビームLCによる熱はこもり易く、外側光ビームLSによる熱は外方へ逃げ易いためである。このように、中央光ビームLCのパワー密度は低いため、中央光ビームLCの過入熱によるスパッタの発生を抑制できる。また、ピークLCP1を抑制しつつもレーザ出力全体として大きなエネルギを投入できるので、スパッタの発生を抑制しつつ効率良く予熱ができる。 The reason for reducing the power density peak LCP1 of the central light beam LC from the power density peak LSP1 of the outer light beam LS is that the central light beam LC is surrounded by the outer light beam LS, and therefore the heat generated by the central light beam LC is This is because it is easy to get trapped and the heat generated by the outer light beam LS easily escapes to the outside. In this way, since the power density of the central light beam LC is low, it is possible to suppress the generation of spatter due to the excessive heat input of the central light beam LC. Further, since a large amount of energy can be input as the entire laser output while suppressing the peak LCP1, it is possible to efficiently preheat while suppressing the generation of spatter.

次に、第二段階として、図4Aに示すように、中央光ビームLCを照射することにより、中央光照射範囲CSにおいて、基台Bの周面B2S及び第一粉末材料P1を溶融して溶融池MP(第一溶融池に相当する)を形成する溶融処理(第1溶融処理に相当する)を行う。また、このとき同時に、外側光ビームLSの外側光照射範囲SSの走査の方向SD(図4A参照)における前側の照射範囲SSFで、外側光ビームLSの一部である第一光ビームBe1により溶融池MPの形成処理(第一形成処理に相当する)の前処理としての予熱処理(第一予熱処理に相当する)を行う。 Next, as a second step, as shown in FIG. 4A, by irradiating the central light beam LC, the peripheral surface B2S of the base B and the first powder material P1 are melted and melted in the central light irradiation range CS. A melting process (corresponding to the first melting process) for forming a pond MP (corresponding to the first melting pool) is performed. At the same time, the outer light beam LS is melted by the first light beam Be1 which is a part of the outer light beam LS in the front irradiation range SSF in the scanning direction SD (see FIG. 4A) of the outer light irradiation range SS. A preheat treatment (corresponding to the first preheat treatment) is performed as a pretreatment of the pond MP forming treatment (corresponding to the first pretreatment).

そして、図4Bに示すように、中央光ビームLCを走査の方向SD(走査方向SD)に走査(本例では、基台Bが回転して走査するが、図4Bでは便宜上、中央光ビームLCを走査すると記載)することで溶融池MPを拡大させ、基台Bに第一粉末材料P1から成る造形物FFを付加する。 Then, as shown in FIG. 4B, the central light beam LC is scanned in the scanning direction SD (scanning direction SD) (in this example, the pedestal B rotates and scans. The molten pool MP is expanded by adding the shape of the first powder material P1 to the base B.

そして、このとき同時に、外側光ビームLSの外側光照射範囲SSの走査方向SDにおける前側の照射範囲SSFで第一光ビームBe1(外側光ビームLS)が、溶融池MPの形成処理の前処理としての予熱処理を行うとともに、外側光ビームLSの外側光照射範囲SSの走査方向SDにおける後側の照射範囲SSBで外側光ビームLSの一部である第二光ビームBe2が、造形物FFの付加処理の後処理としての保温処理(第一保温処理に相当する)を行う。 Then, at this time, at the same time, the first light beam Be1 (outer light beam LS) in the irradiation range SSF on the front side in the scanning direction SD of the outer light irradiation range SS of the outer light beam LS is used as a pre-process for forming the molten pool MP. And the second light beam Be2 which is a part of the outer light beam LS in the rear irradiation range SSB of the outer light beam LS in the scanning direction SD of the outer light beam LS is added to the modeling object FF. A heat retention process (corresponding to the first heat retention process) is performed as a post-process of the process.

このとき、制御装置130は、図3Bに示すように、中央光ビームLCのパワー密度のレーザビームプロファイルにおけるピークLCP3を、外側光ビームLSのパワー密度のレーザビームプロファイルにおけるピークLSP3より増加させる制御を行う。中央光ビームLCのレーザ出力は、第一粉末材料P1を溶融して溶融池MPを形成できる温度となるように制御される。また、外側光ビームLS(第一光ビームBe1、第二光ビームBe2)のレーザ出力は、第一粉末材料P1及び造形物FFが溶融せずに所定の温度となるように制御される。 At this time, the control device 130 controls to increase the peak LCP3 in the laser beam profile of the power density of the central light beam LC from the peak LSP3 in the laser beam profile of the power density of the outer light beam LS, as shown in FIG. 3B. To do. The laser output of the central light beam LC is controlled to a temperature at which the first powder material P1 can be melted to form the molten pool MP. The laser output of the outer light beam LS (first light beam Be1, second light beam Be2) is controlled so that the first powder material P1 and the modeled object FF do not melt and reach a predetermined temperature.

以上のように、外側光ビームLSの外側光照射範囲SSの走査方向SDにおける前側の照射範囲SSFで、第一光ビームBe1(外側光ビームLS)が、溶融池MPの形成処理の前処理として予熱処理を行うことで、基台Bの周面B2Sは、高温状態となる。このため、中央光ビームLCのパワー密度のレーザビームプロファイルにおけるピークLCP3を大きく高める必要はない。 As described above, in the irradiation range SSF on the front side in the scanning direction SD of the outside light irradiation range SS of the outside light beam LS, the first light beam Be1 (outside light beam LS) is used as a pre-process for forming the molten pool MP. By performing the preheat treatment, the peripheral surface B2S of the base B becomes a high temperature state. Therefore, it is not necessary to greatly increase the peak LCP3 in the laser beam profile of the power density of the central light beam LC.

これにより、中央光ビームLCによる周面B2Sの急加熱を低減でき、スパッタの発生を抑制できる。また、外側光ビームLSの外側光照射範囲SSの走査方向SDにおける後側の照射範囲SSBにおいて、第二光ビームBe2が、溶融池MPの形成処理の後処理として保温処理を行うことで、造形物FFの急冷凝固を抑制でき、割れの発生を防止できる。 Thereby, the rapid heating of the peripheral surface B2S by the central light beam LC can be reduced, and the generation of spatter can be suppressed. Further, in the irradiation range SSB on the rear side in the scanning direction SD of the outside light irradiation range SS of the outside light beam LS, the second light beam Be2 performs the heat retention process as the post-treatment of the formation process of the molten pool MP, so that the modeling is performed. The rapid solidification of the product FF can be suppressed, and the occurrence of cracks can be prevented.

(1−3.付加製造装置の動作)
次に、付加製造装置100により、基台Bの一方の円筒部材B2の周面B2Sに造形物FFを付加する動作について図5のフローチャートを参照して説明する。なお、第1ホッパ111には、結合粉末材料が混合された第一粉末材料P1が貯蔵されているものとする。
(1-3. Operation of additional manufacturing device)
Next, the operation of adding the modeled object FF to the peripheral surface B2S of the one cylindrical member B2 of the base B by the additional manufacturing apparatus 100 will be described with reference to the flowchart of FIG. It is assumed that the first hopper 111 stores the first powder material P1 mixed with the combined powder material.

また、基台Bの一方の円筒部材B2の周面B2Sの一端は、付加製造装置100における所定の付加位置に位置決めされているものとする。また、制御装置130には、上述の第一、第二段階における中央光ビームLC及び外側光ビームLSの各レーザ出力や各パワー密度のレーザビームプロファイルの各ピークLCP3、LSP3等、第一粉末材料P1の供給量、基台Bの回転速度及び移動速度のデータ等が予め記憶されている。 Further, it is assumed that one end of the peripheral surface B2S of the one cylindrical member B2 of the base B is positioned at a predetermined addition position in the addition manufacturing apparatus 100. In addition, the control device 130 includes the first powder material such as the respective laser outputs of the central light beam LC and the outer light beam LS and the respective peaks LCP3 and LSP3 of the laser beam profile of each power density in the above-mentioned first and second stages. Data such as the supply amount of P1, the rotation speed and the moving speed of the base B, and the like are stored in advance.

先ず、制御装置130は、上述の第一段階(基台Bの周面B2Sに対する初期の予熱処理)を実行するため、基台Bの回転及び移動を開始すると同時に、光照射装置120をオンにする(図5のステップS1)。具体的には、制御装置130は、モータM1,M2を駆動して基台Bを中心軸線C回りに回転させるとともに中心軸線C方向(周面B2Sの他端方向)に移動させる。 First, the control device 130 starts the rotation and movement of the base B to simultaneously turn on the light irradiation device 120 in order to execute the above-described first step (initial preheat treatment for the peripheral surface B2S of the base B). (Step S1 in FIG. 5). Specifically, the control device 130 drives the motors M1 and M2 to rotate the base B about the central axis C and move it in the central axis C direction (the other end direction of the peripheral surface B2S).

同時に、制御装置130は、中央光ビーム光源122をオンにして中央光ビーム照射部121から中央光ビームLCを基台Bの周面B2Sに照射するとともに、外側光ビーム光源124をオンにして外側光ビーム照射部123から外側光ビームLSを基台Bの周面B2Sに照射し、基台Bの周面B2Sに対する初期の予熱処理を実行する。 At the same time, the control device 130 turns on the central light beam light source 122 to irradiate the central light beam LC from the central light beam irradiation unit 121 to the peripheral surface B2S of the base B, and also turns on the outer light beam light source 124 to turn the outer light beam source 124 on. The peripheral surface B2S of the base B is irradiated with the outer light beam LS from the light beam irradiation unit 123, and the initial preheat treatment is performed on the peripheral surface B2S of the base B.

そして、制御装置130は、基台Bの周面B2Sに対し初期の予熱処理が完了したか否かを判断し(図5のステップS2)、初期の予熱処理が完了したら、光照射装置120をオフにして基台Bを第一段階の開始位置に戻し、基台Bの回転及び移動を停止する(図5のステップS3)。 Then, the control device 130 determines whether or not the initial preheat treatment for the peripheral surface B2S of the base B is completed (step S2 in FIG. 5), and when the initial preheat treatment is completed, the light irradiation device 120 is turned on. It is turned off and the base B is returned to the start position of the first stage, and the rotation and movement of the base B are stopped (step S3 in FIG. 5).

次に、制御装置130は、上述の第二段階(造形物FFの付加処理)を実行するため、付加材料供給装置110をオンにし、基台Bの回転及び移動を開始すると同時に、光照射装置120をオンにする(図5のステップS4)。具体的には、制御装置130は、ガス導入バルブ113d及び粉末供給バルブ113cを開いて、ガスボンベ114からの高圧の窒素により第一粉末材料P1を噴射ノズル115から基台Bの周面B2Sに噴射して供給する。また、制御装置130は、中央光ビーム光源122をオンにして中央光ビーム照射部121から中央光ビームLCを基台Bの周面B2Sに照射するとともに、外側光ビーム光源124をオンにして外側光ビーム照射部123から外側光ビームLSを基台Bの周面B2Sに照射する。 Next, the control device 130 turns on the additional material supply device 110 to start the rotation and movement of the base B in order to execute the above-described second step (addition processing of the modeled object FF), and at the same time, the light irradiation device. 120 is turned on (step S4 in FIG. 5). Specifically, the control device 130 opens the gas introduction valve 113d and the powder supply valve 113c, and injects the first powder material P1 from the injection nozzle 115 to the peripheral surface B2S of the base B with the high-pressure nitrogen from the gas cylinder 114. And supply. Further, the control device 130 turns on the central light beam light source 122 to irradiate the central light beam LC from the central light beam irradiating section 121 to the peripheral surface B2S of the base B, and also turns on the outer light beam light source 124 to the outside. The outer light beam LS is irradiated from the light beam irradiation unit 123 onto the peripheral surface B2S of the base B.

そして、制御装置130は、モータM1,M2を駆動して基台Bを中心軸線C回りに回転するとともに中心軸線C方向(周面B2Sの他端方向)に移動させる。このとき、上述したように、外側光ビームLSの走査方向SDにおける前側の照射範囲SSFに照射される外側光ビームLS(第一光ビームBe1)によって、溶融池MPの形成処理に対する前処理としての予熱処理が行われる。また、同時に、外側光ビームLSの走査方向SDにおける後側の照射範囲SSBに照射される外側光ビームLS(第二光ビームBe2)によって、造形物FFの付加処理に対する後処理として保温処理が行なわれる。 Then, the control device 130 drives the motors M1 and M2 to rotate the base B around the central axis C and move it in the central axis C direction (the other end direction of the peripheral surface B2S). At this time, as described above, the outer light beam LS (first light beam Be1) irradiated to the front irradiation range SSF of the outer light beam LS in the scanning direction SD serves as a pretreatment for the formation processing of the molten pool MP. A preheat treatment is performed. At the same time, the outside light beam LS (second light beam Be2) emitted to the irradiation area SSB on the rear side of the outside light beam LS in the scanning direction SD performs heat retention as a post-treatment for the addition of the modeled object FF. Be done.

これにより、第一光ビームBe1(中央光ビームLC)が照射される中央光照射範囲CSでは、予熱処理が行われた状態で、走査方向SDへの走査に応じて順次、溶融池MPが良好に形成できる。また、第二光ビームBe2(外側光ビームLS)が照射される外側光照射範囲SSでは、走査方向SDへの走査に応じ、形成後の溶融池MPが順次良好に保温される。これにより、スパッタがなく、割れもない造形物FFが形成される。 As a result, in the central light irradiation range CS where the first light beam Be1 (central light beam LC) is irradiated, the molten pool MP is sequentially improved in accordance with the scanning in the scanning direction SD in the state where the preheat treatment is performed. Can be formed into Further, in the outer light irradiation range SS where the second light beam Be2 (outer light beam LS) is irradiated, the formed molten pool MP is sequentially kept in good temperature in accordance with the scanning in the scanning direction SD. As a result, the modeled object FF having no spatter and no crack is formed.

そして、制御装置130は、基台Bの周面B2Sに付加した造形物FFの付加処理が完了したか否かを判断する(図5のステップS5)。そして、造形物FFの付加処理が完了したら、付加材料供給装置110及び光照射装置120をオフにし、基台Bの回転及び移動を停止して(図5のステップS6)、全ての処理を終了する。 Then, the control device 130 determines whether or not the adding process of the modeling object FF added to the peripheral surface B2S of the base B is completed (step S5 in FIG. 5). Then, when the addition process of the modeled object FF is completed, the additional material supply device 110 and the light irradiation device 120 are turned off, the rotation and movement of the base B are stopped (step S6 in FIG. 5), and all the processes are completed. To do.

(1−4.第一実施形態による効果)
上記第一実施形態によれば、付加製造装置100は、粉末材料を用いて基台Bに造形物を付加する装置である。付加製造装置100は、基台Bに対し第一粉末材料P1を噴射して供給する付加材料供給装置110と、基台Bにおける第一粉末材料P1の供給部(周面B2S)に対し光ビームを照射する光照射装置120と、付加材料供給装置110の第一粉末材料P1の供給、及び光照射装置120の光照射を制御するとともに、基台Bに対する光ビームの相対的な走査を制御する制御装置130とを備える。
(1-4. Effects of the first embodiment)
According to the first embodiment, the additive manufacturing apparatus 100 is an apparatus that adds a modeled object to the base B using a powder material. The additional manufacturing apparatus 100 includes an additional material supply device 110 for injecting and supplying the first powder material P1 to the base B, and a light beam for the supply portion (peripheral surface B2S) of the first powder material P1 on the base B. The light irradiating device 120 for irradiating the light, the supply of the first powder material P1 of the additional material supplying device 110, and the light irradiation of the light irradiating device 120 are controlled, and the relative scanning of the light beam with respect to the base B is controlled. And a control device 130.

光照射装置120は、第一粉末材料P1の供給部(周面B2S)の中央に中央光ビームLCを照射する中央光ビーム照射部121、及び中央光ビームLCの外側に外側光ビームLSを照射する外側光ビーム照射部123を有する。そして、制御装置130は、中央光ビーム照射部121の出力条件と外側光ビーム照射部123の出力条件を独立して制御することで、中央光ビームLCのパワー密度のビームプロファイルにおけるピークLCP3を外側光ビームLSのパワー密度のビームプロファイルにおけるピークLSP3より増加させて造形物FFを付加する。 The light irradiation device 120 irradiates the central light beam irradiation unit 121 that irradiates the central light beam LC to the center of the supply unit (peripheral surface B2S) of the first powder material P1 and the outer light beam LS to the outside of the central light beam LC. The outer light beam irradiating section 123 is provided. Then, the control device 130 independently controls the output condition of the central light beam irradiation unit 121 and the output condition of the outer light beam irradiation unit 123 so that the peak LCP3 in the beam profile of the power density of the central light beam LC is outside. The modeled object FF is added by increasing it from the peak LSP3 in the beam profile of the power density of the light beam LS.

このように、第一光ビームBe1(外側光ビームLS)によって、造形物FFの付加処理の前処理としての予熱処理(第一予熱処理)を行うことができるので、中央光ビームLCのパワー密度のレーザビームプロファイルにおけるピークLCP3を大きくする必要はない。これにより、中央光ビームLCの照射による基台Bの周面B2Sの急加熱を低減でき、スパッタの発生を抑制できる。また、第二光ビームBe2(外側光ビームLS)によって、造形物FFの付加処理の後処理として保温処理を行うことができるので、造形物FFの急冷凝固を抑制でき、割れの発生を防止できる。よって、基台Bに対し高品質な造形物FFを付加できる。 In this way, since the first light beam Be1 (outer light beam LS) can perform the pre-heat treatment (first pre-heat treatment) as the pre-treatment for the additional treatment of the modeled object FF, the power density of the central light beam LC is increased. It is not necessary to increase the peak LCP3 in the laser beam profile of. Thereby, the rapid heating of the peripheral surface B2S of the base B due to the irradiation of the central light beam LC can be reduced, and the generation of spatter can be suppressed. In addition, since the second light beam Be2 (outer light beam LS) can perform the heat retention process as the post-treatment of the additional process of the model FF, rapid solidification of the model FF can be suppressed and the occurrence of cracks can be prevented. .. Therefore, the high-quality molded object FF can be added to the base B.

また、上記第一実施形態によれば、制御装置130は、中央光ビームLCと外側光ビームLSとを同一の走査方向SDに走査し、中央光ビームLCで基台Bの中央光照射範囲CSにおける溶融池MP(第一溶融池)の形成処理(第一形成処理)及び第一粉末材料P1の溶融処理(第一溶融処理)を行う。また、制御装置130は、外側光ビームLSの走査方向SDにおける前側の第一光ビームBe1で溶融池MPの形成処理に対する前処理として予熱処理(第一予熱処理)を行い、外側光ビームLSにおける走査方向SDにおける後側の第二光ビームBe2で溶融池MPの形成処理に対する後処理として保温処理(第一保温処理)を行う。 Further, according to the first embodiment, the control device 130 scans the central light beam LC and the outer light beam LS in the same scanning direction SD, and the central light beam LC causes the central light irradiation range CS of the base B to be scanned. Of the molten pool MP (first molten pool) (first forming process) and the melting process of the first powder material P1 (first melting process). Further, the control device 130 performs a pre-heat treatment (first pre-heat treatment) as a pre-treatment for the formation process of the molten pool MP with the first light beam Be1 on the front side in the scanning direction SD of the outer light beam LS, so that the outer light beam LS is affected. With the second light beam Be2 on the rear side in the scanning direction SD, a heat retention process (first heat retention process) is performed as a post-process for the formation process of the molten pool MP.

このように、一回の光ビームの走査方向SDへの走査によって溶融池MP形成のための予熱処理が同時にできるので、効率的に急加熱を低減でき、スパッタの発生を抑制できる。また、このとき同時に、外側光ビームLSの外側光照射範囲SSの走査方向SDにおける後側の照射範囲SSBで、溶融池MPの形成処理の後処理としての保温処理を行う。これについても、一度の光ビームの走査によって、溶融池MPの保温処理ができるため、効率的に、造形物FFの急冷凝固を抑制でき、割れの発生を防止できる。 In this way, since the preheat treatment for forming the molten pool MP can be simultaneously performed by scanning the light beam in the scanning direction SD once, rapid heating can be efficiently reduced, and generation of spatter can be suppressed. At this time, at the same time, in the irradiation range SSB on the rear side in the scanning direction SD of the outside light irradiation range SS of the outside light beam LS, a heat retention process is performed as a post-process for forming the molten pool MP. Also in this case, since the heat treatment of the molten pool MP can be performed by scanning the light beam once, it is possible to efficiently suppress the rapid solidification of the modeled object FF and prevent the occurrence of cracks.

<2.第二実施形態>
(2−1.付加製造装置200の概要)
次に、第二実施形態に係る付加製造装置200(図1参照)の概要について説明する。第二実施形態の付加製造装置200は、第一実施形態の付加製造装置100に対して、基台Bの周面B2Sに対して行なう予熱処理及び保温処理の方法が異なり、それ以外の部分については同様である。従って、異なる部分についてのみ詳細に説明し、同様の部分についての説明は省略する。また、同じ構成品には同じ符号を付して説明する。
<2. Second embodiment>
(2-1. Overview of additional manufacturing apparatus 200)
Next, an outline of the additional manufacturing apparatus 200 (see FIG. 1) according to the second embodiment will be described. The additional manufacturing apparatus 200 according to the second embodiment is different from the additional manufacturing apparatus 100 according to the first embodiment in the method of preheat treatment and heat retention processing performed on the peripheral surface B2S of the base B, and the other portions are different. Is the same. Therefore, only different parts will be described in detail, and description of similar parts will be omitted. Also, the same components will be described with the same reference numerals.

図1に示すように、第二実施形態の付加製造装置200は、付加材料供給装置110、光照射装置120及び制御装置230等を備える。付加製造装置200は、第一実施形態と同様、図2Aに示す大径の円盤部材B1の両側面に小径の円筒部材B2,B2が同軸で一体化された形状の基台Bにおいて、円筒部材B2,B2の開放端部側の網線で示す周面(軸受(図示省略)の支持部)B2S,B2Sに造形物を付加するものである。 As shown in FIG. 1, the additional manufacturing apparatus 200 of the second embodiment includes an additional material supply device 110, a light irradiation device 120, a control device 230, and the like. Similar to the first embodiment, the additional manufacturing apparatus 200 includes a cylindrical member B in a shape in which cylindrical members B2 and B2 having a small diameter are coaxially integrated with both side surfaces of a disk member B1 having a large diameter shown in FIG. 2A. A molded article is added to the peripheral surfaces (supporting portions of bearings (not shown)) B2S and B2S indicated by the mesh lines on the open end side of B2 and B2.

制御装置230は、付加材料供給装置110の粉末供給、及び光照射装置120の光照射を制御するとともに、基台Bの円筒部材B2の周面B2Sに対する中央光ビームLC及び外側光ビームLSの相対的な走査を制御する。詳細については、後述する。なお、本実施形態においても、第一実施形態と同様、第一段階における初期の予熱処理も行なうが、詳細な説明については省略する。 The control device 230 controls the powder supply of the additional material supply device 110 and the light irradiation of the light irradiation device 120, and makes the center light beam LC and the outer light beam LS relative to the peripheral surface B2S of the cylindrical member B2 of the base B. Control scanning. Details will be described later. In the present embodiment as well, similar to the first embodiment, the initial preheat treatment in the first stage is also performed, but the detailed description will be omitted.

(2−2.造形物の付加方法)
次に、造形物の付加方法について説明する。具体的には、第一実施形態と同様、図2Bに示すように、基台Bの円筒部材B2の周面B2Sに一層構造の造形物FFを付加する。本実施形態に係る造形物FFの付加方法では、第二段階において、制御装置230が、中央光ビームLCと外側光ビームLSとを同一方向に所定の距離L1だけ、周面B2Sの周方向に複数回走査し造形物FFを付加する。このとき、1回の走査は、周面B2Sにおいて、円筒部材B2の中心軸線C周りに向かう走査であり、複数回走査するとは、円筒部材B2の中心軸線C方向に移動しながら各走査を複数回行なうという意味である。
(2-2. Method of adding shaped article)
Next, a method of adding a modeled object will be described. Specifically, as in the first embodiment, as shown in FIG. 2B, a model FF having a one-layer structure is added to the peripheral surface B2S of the cylindrical member B2 of the base B. In the method of adding the modeled object FF according to the present embodiment, in the second step, the control device 230 causes the central light beam LC and the outer light beam LS to move in the same direction by a predetermined distance L1 in the circumferential direction of the circumferential surface B2S. The model FF is added by scanning a plurality of times. At this time, one scan is a scan on the peripheral surface B2S around the central axis C of the cylindrical member B2, and a plurality of scans means a plurality of scans while moving in the central axis C direction of the cylindrical member B2. It means to do it once.

以下において、詳細に説明する。説明を行なうにあたり、各走査SC1−SC3を定義する。周面B2Sを周方向に展開した図6A−図6Cに示すように、光ビームの一回分の走査セットQ1において、中心軸線C方向中央に位置する、走査を第二走査SC2と定義する。第二走査SC2は、中央光ビームLCによる走査である。また、中央光ビームLCの走査の方向における左右両側のうち一方側(図6Aにおいて右側)の外側光ビームLS(第三光ビームBe3に相当する)による走査を第一走査SC1と定義する。さらに、中央光ビームLCの走査の方向における左右両側のうち他方側(図6Aにおいて左側)の外側光ビーム(第四光ビームBe4に相当する)による走査を第三走査SC3と定義する。 The details will be described below. In the explanation, each scan SC1-SC3 will be defined. As shown in FIGS. 6A to 6C in which the circumferential surface B2S is developed in the circumferential direction, the scanning located at the center in the central axis C direction in the scanning set Q1 for one light beam is defined as the second scanning SC2. The second scan SC2 is a scan with the central light beam LC. Further, the scanning by the outer light beam LS (corresponding to the third light beam Be3) on one side (the right side in FIG. 6A) of the left and right sides in the scanning direction of the central light beam LC is defined as the first scan SC1. Further, the scanning by the outer light beam (corresponding to the fourth light beam Be4) on the other side (the left side in FIG. 6A) of the left and right sides in the scanning direction of the central light beam LC is defined as the third scan SC3.

中央光ビームLCの第二走査SC2は、基台Bの中央光照射範囲CSにおける溶融池MP(第二溶融池に相当する)の形成処理(第二形成処理に相当)、及び第一粉末材料P1の溶融処理(第二溶融処理に相当する)を行う。また、第三光ビームBe3(一方側の外側光ビームLS)による第一走査SC1は、溶融池MPを形成する形成処理に対する前処理としての予熱処理(第二予熱処理に相当する)を行なう(図6AのJ部)。さらに、第四光ビームBe4(他方側の外側光ビームLS)による第三走査SC3は、溶融池MPの形成処理に対する後処理としての保温処理(第二保温処理に相当する)を行う(図6AのK部)。 The second scan SC2 of the central light beam LC is a formation process (corresponding to the second formation process) of the molten pool MP (corresponding to the second molten pool) in the central light irradiation range CS of the base B, and the first powder material. The P1 melting process (corresponding to the second melting process) is performed. Further, the first scanning SC1 by the third light beam Be3 (the outer light beam LS on the one side) performs a preheat treatment (corresponding to a second preheat treatment) as a pretreatment for the forming treatment for forming the molten pool MP (corresponding to the second preheat treatment). Part J of FIG. 6A). Further, the third scanning SC3 by the fourth light beam Be4 (the outer light beam LS on the other side) performs a heat retention process (corresponding to the second heat retention process) as a post-process for the formation process of the molten pool MP (FIG. 6A). Part K).

つまり、中央光ビームLCと外側光ビームLS(第三光ビームBe3、第四光ビームBe4)とを同一方向に所定の距離L1だけ同時に走査することにより、第二走査SC2(第二溶融池MPの第二形成処理)、第一走査SC1(第二予熱処理)、及び第三走査SC3(第二保温処理)が同時に処理される(図6A、図6B、図6Cの各Q1参照)。このとき、中央光ビームLCが行なう第二走査SC2を基準として視た場合、中央光ビームLCによって次回走査される図6Bの第二走査SC2が、図6Aに示す、中央光ビームLCが今回走査した第二走査SC2と一方側(図6A、図6Bにおいて右側)において隣り合うよう、中央光ビームLC及び外側光ビームLS(第三光ビームBe3、第四光ビームBe4)が、複数回同一方向に所定の距離L1だけ走査する。 That is, the central light beam LC and the outer light beam LS (third light beam Be3, fourth light beam Be4) are simultaneously scanned in the same direction by a predetermined distance L1, so that the second scan SC2 (second molten pool MP No. 2 second formation process), the first scan SC1 (second preheat treatment), and the third scan SC3 (second heat retention process) are simultaneously performed (see Q1 in FIGS. 6A, 6B, and 6C). At this time, when viewed with the second scanning SC2 performed by the central light beam LC as a reference, the second scanning SC2 of FIG. 6B to be scanned next time by the central light beam LC is the current scanning of the central light beam LC shown in FIG. 6A. The central light beam LC and the outer light beam LS (third light beam Be3, fourth light beam Be4) are so arranged as to be adjacent to the second scanning SC2 on one side (right side in FIGS. 6A and 6B) a plurality of times in the same direction. Then, a predetermined distance L1 is scanned.

また、上記において、周面B2S上に造形物FFを付加する際、制御装置230は、図3Bに示すように、中央光ビームLCのパワー密度のレーザビームプロファイルにおけるピークLCP3を、外側光ビームLSのパワー密度のレーザビームプロファイルにおけるピークLSP3より増加させるよう制御する。このとき、中央光ビームLCのレーザ出力は、前述したように、周面B2S及び第一粉末材料P1を溶融して溶融池MPが形成できる温度となるように制御される。また、外側光ビームLSのレーザ出力は、第一粉末材料P1及び基台の周面B2Sが溶融せずに所定の温度となるように制御される。 Further, in the above, when adding the modeled object FF on the peripheral surface B2S, the control device 230 sets the peak LCP3 in the laser beam profile of the power density of the central light beam LC to the outer light beam LS, as shown in FIG. 3B. The control is performed so that the power density is increased from the peak LSP3 in the laser beam profile. At this time, the laser output of the central light beam LC is controlled to a temperature at which the peripheral surface B2S and the first powder material P1 are melted to form the molten pool MP, as described above. Further, the laser output of the outer light beam LS is controlled so that the first powder material P1 and the peripheral surface B2S of the base are not melted and reach a predetermined temperature.

そして、前述したように、所定の距離L1だけ周面B2Sの周方向に行なう走査を周面B2Sの中心軸線C方向における一方側(図6Aにおいて右側)に向かって複数回繰り返すことにより、周面B2Sに造形物FFの一部を付加する。このとき、今回の中央光ビームLC及び外側光ビームLSの走査の方向SD(走査方向)と、次回の中央光ビームLC及び外側光ビームLSの走査方向SDとは前述したとおり同一である。つまり、各走査において始点Rの位置は常に同じ側である。 Then, as described above, the scanning performed in the circumferential direction of the circumferential surface B2S by the predetermined distance L1 is repeated a plurality of times toward one side (the right side in FIG. 6A) in the central axis C direction of the circumferential surface B2S. A part of the modeled object FF is added to B2S. At this time, the scanning direction SD (scanning direction) of the present central light beam LC and outer light beam LS and the next scanning direction SD of the central light beam LC and outer light beam LS are the same as described above. That is, the position of the starting point R is always on the same side in each scan.

ここで、図6A−図6CにおけるJ部の温度変化について説明する。J部の温度変化は、図7のグラフに示すように変化する。図7は、横軸に時間をとり、縦軸に温度をとったときのJ部における各走査SC1、SC2、SC3の始点Rでの温度変化を示したグラフである。図6Aにおいて、J部は予熱処理がされる部位である。図6Bにおいて、J部は溶融池MPの形成処理がされる部位である。また、図6Cにおいて、J部は溶融池MPが保温処理される部位である。 Here, the temperature change of the J portion in FIGS. 6A to 6C will be described. The temperature change of the J portion changes as shown in the graph of FIG. 7. FIG. 7 is a graph showing the temperature change at the starting point R of each of the scans SC1, SC2, SC3 in the J section when the horizontal axis represents time and the vertical axis represents temperature. In FIG. 6A, the J portion is a portion to be preheated. In FIG. 6B, the J portion is a portion where the molten pool MP is formed. Further, in FIG. 6C, the J portion is a portion where the molten pool MP is subjected to heat retention processing.

図7を見て分かるように、予熱処理では、第一走査SC1の開始によって、周面B2Sにおける第三光ビームBe3(外側光ビームLS)による第一走査SC1の始点R部分が加熱される(図7中、V1参照)。このとき、V1における温度は、基台Bの周面B2Sの溶融点(凝固点)を超えないよう制御される。その後、第三光ビームBe3の第一走査SC1が始点Rから離間する方向に所定の距離L1だけ走査されることにより、始点Rにおける温度が低下する(図7、矢印Ar1参照)。 As can be seen from FIG. 7, in the preheat treatment, the start point R of the first scan SC1 by the third light beam Be3 (outer light beam LS) on the peripheral surface B2S is heated by the start of the first scan SC1 ( (See V1 in FIG. 7). At this time, the temperature at V1 is controlled so as not to exceed the melting point (freezing point) of the peripheral surface B2S of the base B. After that, the first scan SC1 of the third light beam Be3 is scanned by a predetermined distance L1 in the direction away from the starting point R, so that the temperature at the starting point R decreases (see arrow Ar1 in FIG. 7).

その後、J部では中央光ビームLCによる第二走査SC2が、走査の始点Rから開始される。これにより、J部の温度は再び上昇(図7、矢印Ar2参照)し、凝固点(溶融点)を越え、周面B2Sが溶融し溶融池MP(第二溶融池)を形成する。このとき、J部は第一走査SC1によって予熱された状態をベースとして、中央光ビームLCによる加熱が開始されるため、周面B2Sは急加熱されることなく、安定して溶融でき、スパッタの発生が良好に抑制される。 Then, in the J section, the second scanning SC2 by the central light beam LC is started from the scanning start point R. As a result, the temperature of the J portion again rises (see arrow Ar2 in FIG. 7), exceeds the freezing point (melting point), and the peripheral surface B2S is melted to form the molten pool MP (second molten pool). At this time, the J portion is heated by the central light beam LC on the basis of the state preheated by the first scanning SC1, so that the peripheral surface B2S can be stably melted without being rapidly heated and spatter of Occurrence is well suppressed.

その後、中央光ビームLCによる第二走査SC2が始点から離間する方向に所定の距離L1だけ走査されることにより、始点Rから遠ざかるため、始点Rにおける温度が低下する(図7、矢印Ar3参照)。しかし、このとき、溶融池MPを形成する溶融金属の温度が、凝固点以下になる前に、次回の走査であり保温処理を行う第四光ビームBe4(外側光ビームLS)による第三走査SC3がJ部における走査の始点Rから開始される。このため、急冷され始めていた溶融金属の温度低下勾配は、保温処理が開始された図7中における点Wの位置から緩やかになり、その後、凝固点を下回ることにより溶融金属が固化し造形物FFが形成される。このように、急冷ではなく、緩やかな冷却によって造形物FFが形成されるため、割れの発生が良好に抑制される。 After that, the second scan SC2 by the central light beam LC is moved by a predetermined distance L1 in the direction away from the starting point, so that the second scanning SC2 moves away from the starting point R, and the temperature at the starting point R decreases (see arrow Ar3 in FIG. 7). .. However, at this time, before the temperature of the molten metal forming the molten pool MP falls below the freezing point, the third scanning SC3 by the fourth light beam Be4 (outer light beam LS) which is the next scanning and performs heat retention processing is performed. It starts from the starting point R of the scanning in the J section. Therefore, the temperature decrease gradient of the molten metal that has begun to be rapidly cooled becomes gentle from the position of point W in FIG. 7 where the heat retention process is started, and thereafter, the molten metal is solidified by falling below the freezing point and It is formed. As described above, since the modeled object FF is formed by gentle cooling, not by rapid cooling, the occurrence of cracks is favorably suppressed.

つまり、本実施形態においては、溶融池MPを形成する溶融金属の温度が凝固点以下になる前に、第四光ビームBe4(外側光ビームLS)による第三走査SC3がJ部における走査の始点Rから開始されるよう、各走査SC1、SC2、SC3を行なう所定の距離L1が設定される。そして、本実施形態においては、所定の距離L1は、円筒部材B2の周面B2S上において中心軸線C周りにおける周長以下の長さである。このとき、所定の距離L1は、周面B2Sの周長と等しい、又は周長を等分する長さであることが好ましい。これにより、周面B2S上において、周面B2S上の周方向に一回、又は、中心軸線C方向への一部の造形物FFの付加が終了したのちに整数回、走査を行なうことにより、周面B2Sの周方向における全周に、スパッタがなく割れのない造形物FFを付加できる。 That is, in the present embodiment, the third scanning SC3 by the fourth light beam Be4 (outer light beam LS) causes the starting point R of the scanning in the J portion before the temperature of the molten metal forming the molten pool MP becomes equal to or lower than the freezing point. A predetermined distance L1 for performing each of the scans SC1, SC2, SC3 is set so as to start from. Further, in the present embodiment, the predetermined distance L1 is a length equal to or less than the circumferential length around the central axis C on the circumferential surface B2S of the cylindrical member B2. At this time, it is preferable that the predetermined distance L1 is equal to or equal to the circumferential length of the circumferential surface B2S. As a result, on the peripheral surface B2S, scanning is performed once in the peripheral direction on the peripheral surface B2S, or an integral number of times after the addition of a part of the modeled object FF in the central axis C direction is completed. It is possible to add the modeled object FF which is free from spatter and has no cracks to the entire circumference of the circumferential surface B2S in the circumferential direction.

(2−3.第二実施形態による効果)
上記第二実施形態によれば、制御装置230は、中央光ビームLCと外側光ビームLSとを同一方向に所定の距離L1だけ走査する。つまり、第二走査SC2における中央光ビームLCで基台Bの中央光照射範囲CSにおける溶融池MP(第二溶融池)の形成処理(第二形成処理)、及び第一粉末材料P1の溶融処理(第二溶融処理)を行う。また、第一走査SC1における第三光ビームBe3によって溶融池MPの形成処理に対する前処理としての予熱処理(第二予熱処理)を行う。さらに、第三走査SC3における第四光ビームBe4によって、溶融池MPの形成処理に対する後処理として保温処理(第二保温処理)を行う。そしてその後、中央光ビームLCが次回行なう第二走査SC2が、今回行った第二走査SC2と一方側において隣り合うよう、中央光ビームLCと外側光ビームLSとを同一方向に所定の距離L1だけ走査する。
(2-3. Effects of Second Embodiment)
According to the second embodiment, the control device 230 scans the central light beam LC and the outer light beam LS in the same direction for a predetermined distance L1. That is, the formation process (second formation process) of the molten pool MP (second molten pool) in the central light irradiation range CS of the base B by the central light beam LC in the second scan SC2 and the melting process of the first powder material P1. (Second melting process) is performed. Further, a preheat treatment (second preheat treatment) as a pretreatment for the treatment for forming the molten pool MP is performed by the third light beam Be3 in the first scan SC1. Further, the fourth light beam Be4 in the third scan SC3 performs a heat retention process (second heat retention process) as a post-process for the formation process of the molten pool MP. Then, thereafter, the central light beam LC and the outer light beam LS are separated by a predetermined distance L1 in the same direction so that the second scanning SC2 performed next time by the central light beam LC is adjacent to the second scanning SC2 performed this time on one side. To scan.

これにより、たとえば図6AのJ部における温度変化は、図7に示すようになる。つまり、外側光ビームLSの外側光照射範囲SSにおける走査方向SDの一方側における照射範囲SSFで、溶融池MPの形成処理の前処理として予熱処理を行うことで、基台Bの周面B2Sは、高温状態になっている。このため、中央光ビームLCのパワー密度のレーザビームプロファイルにおけるピークLCP3を大きく高める必要はない。 Thereby, for example, the temperature change in the J portion of FIG. 6A becomes as shown in FIG. That is, the peripheral surface B2S of the pedestal B is formed by performing the preheat treatment as the pretreatment for the formation process of the molten pool MP in the irradiation range SSF on the one side of the scanning direction SD in the outside light irradiation range SS of the outside light beam LS. The temperature is high. Therefore, it is not necessary to greatly increase the peak LCP3 in the laser beam profile of the power density of the central light beam LC.

従って、中央光ビームLCによる急加熱を低減でき、スパッタの発生を抑制できる。また、外側光ビームLSの外側光照射範囲SSにおける走査方向SDの他方側の照射範囲SSBにおいて、溶融池MPの形成処理に対する後処理としての保温処理を行うことで、造形物FFの急冷凝固を抑制でき、割れの発生を防止できる。 Therefore, the rapid heating by the central light beam LC can be reduced and the generation of spatter can be suppressed. Further, in the irradiation range SSB on the other side in the scanning direction SD in the outside light irradiation range SS of the outside light beam LS, a heat retention process as a post-process for the formation process of the molten pool MP is performed to rapidly solidify the modeled object FF. It can be suppressed and cracking can be prevented.

また、上記第二実施形態によれば、今回走査した中央光ビームLC及び外側光ビームLSの走査方向SDと、次回走査する中央光ビームLC及び外側光ビームLSの走査方向SDは同一である。これにより、溶融池MPにおける溶融金属の温度のうち最も低くなった温度の位置を始点Rとして保温が開始できるので、造形物FFの急冷凝固を抑制でき、割れの発生を防止できる。 Further, according to the second embodiment, the scanning direction SD of the central light beam LC and the outer light beam LS scanned this time and the scanning direction SD of the central light beam LC and the outer light beam LS scanned next time are the same. As a result, heat retention can be started with the position of the lowest temperature of the molten metal in the molten pool MP as the starting point R, so that rapid solidification of the model FF can be suppressed and cracking can be prevented.

また、上記第二実施形態によれば、溶融池MPの温度は、確実に所定の温度以上の状態で保温が開始できるので、造形物FFの急冷凝固を抑制でき、割れの発生を防止できる。また、上記第二実施形態によれば、所定の温度は、溶融池MPに溶融される溶融金属の凝固温度である。これにより、所定の距離L1も、溶融池MPに溶融される溶融金属の凝固温度に応じて容易に設定できる。 Further, according to the second embodiment, since the temperature of the molten pool MP can be reliably maintained at a predetermined temperature or higher, rapid solidification of the model FF can be suppressed, and cracking can be prevented. Further, according to the second embodiment, the predetermined temperature is the solidification temperature of the molten metal melted in the molten pool MP. Thereby, the predetermined distance L1 can also be easily set according to the solidification temperature of the molten metal melted in the molten pool MP.

なお、上記第二実施形態の付加製造装置200では、予熱処理を第三光ビームBe3(一方側の外側光ビームLS)による第一走査SC1によって行い、保温処理を第四光ビームBe4(他方側の外側光ビームLS)による第三走査SC3によって行なう態様について説明した。しかしながら、実際には、外側光ビームLSは、リング状に形成されている。このため、第一実施形態における第一光ビームBe1(前側)及び第二光ビームBe2(後側)も予熱処理及び保温処理に寄与する。この場合、中央光ビームLC及び外側光ビームLSの走査はさらに低いエネルギで制御すればよいため効率が良い。 In the additional manufacturing apparatus 200 of the second embodiment, the pre-heat treatment is performed by the first scanning SC1 by the third light beam Be3 (outer light beam LS on one side), and the heat retention process is performed by the fourth light beam Be4 (on the other side). The aspect of performing the third scanning SC3 by the outer light beam LS) has been described. However, actually, the outer light beam LS is formed in a ring shape. Therefore, the first light beam Be1 (front side) and the second light beam Be2 (rear side) in the first embodiment also contribute to the preheat treatment and the heat retention treatment. In this case, since the scanning of the central light beam LC and the outer light beam LS may be controlled with lower energy, the efficiency is high.

ただし、この態様には限らず、第一光ビームBe1(前側)及び第二光ビームBe2(後側)の影響を排除したい場合には、外側光ビームLSは、リング状ではなく、第三光ビームBe3及び第四光ビームBe4をそれぞれ単独で照射できるよう光照射装置を構成すればよい。これによっても、十分な効果が得られる。 However, the present invention is not limited to this aspect, and when it is desired to eliminate the influence of the first light beam Be1 (front side) and the second light beam Be2 (rear side), the outer light beam LS is not ring-shaped, and the third light beam LS is not. The light irradiation device may be configured so that the beam Be3 and the fourth light beam Be4 can be individually irradiated. This also provides a sufficient effect.

<3.第三実施形態>
(3−1.付加製造装置300の概要)
次に、本発明の第三実施形態に係る付加製造装置300の概要について説明する。なお、詳細は後述するが、この付加製造の際には、第一粉末材料P1の他に炭素鋼(S45C)の粉末材料(以下、第二粉末材料という)及び第一粉末材料のバインダの役割を担うニッケル(Ni)、コバルト(Co)等の粉末材料(以下、結合粉末材料という)も用いる。
<3. Third embodiment>
(3-1. Outline of additional manufacturing apparatus 300)
Next, an outline of the additional manufacturing apparatus 300 according to the third embodiment of the present invention will be described. In addition, as will be described later in detail, the role of the powder material of carbon steel (S45C) (hereinafter referred to as the second powder material) and the binder of the first powder material in addition to the first powder material P1 at the time of this additional manufacturing. A powder material such as nickel (Ni) or cobalt (Co) that plays a role in the above (hereinafter referred to as a binding powder material) is also used.

付加製造装置300は、第一、第二実施形態の付加製造装置100、200に対して、付加製造装置300が付加する造形物が、中間造形物FC及び造形物FFの2層構造となっている(図9参照)。付加製造装置300は、LMD法により1種又は複数種の粉末材料を用いて基台Bに造形物を付加する。このとき、粉末材料と基台Bとは、異なる種類の材料でもよく、同一種類の材料でもよい。なお、以降においては、主に、第一実施形態と異なる部分について詳細に説明し、同様部分については、説明を省略する。また、同じ構成の場合、同じ符号を付して図面に記載する場合がある。 In the additive manufacturing apparatus 300, the modeled object added by the additive manufacturing apparatus 300 to the additive manufacturing apparatuses 100 and 200 of the first and second embodiments has a two-layer structure of an intermediate modeled object FC and a modeled object FF. (See Figure 9). The additional manufacturing apparatus 300 adds a modeled object to the base B using one or more kinds of powder materials by the LMD method. At this time, the powder material and the base B may be different types of materials or the same type of materials. It should be noted that in the following, mainly, portions different from the first embodiment will be described in detail, and description of similar portions will be omitted. Further, in the case of the same configuration, the same reference numeral may be attached and described in the drawings.

本例では、第一実施形態と同様、炭化タングステン(WC)の粉末材料(以下、第一粉末材料という)で成る造形物を、炭素鋼(S45C)で成る基台Bに付加する場合について説明する。図8に示すように、付加製造装置300は、付加材料供給装置310、光照射装置120及び制御装置330等を備える。 In this example, similar to the first embodiment, a case where a shaped article made of a powdered material of tungsten carbide (WC) (hereinafter referred to as a first powdered material) is added to a base B made of carbon steel (S45C) will be described. To do. As shown in FIG. 8, the additional manufacturing apparatus 300 includes an additional material supply device 310, a light irradiation device 120, a control device 330, and the like.

付加製造の際、付加製造装置300は、基台Bを、モータM1により中心軸線C回りに回転するとともに、モータM2により中心軸線C方向に移動する。これにより、円筒部材B2,B2の開放端部側の周面B2S,B2S全体に造形物を付加できる。詳細は後述するが、造形物は、中間造形物FC及び造形物FFの2層構造となっている(図9参照)。 In the additional manufacturing, the additional manufacturing apparatus 300 rotates the base B around the central axis C by the motor M1 and moves the base B in the central axis C direction by the motor M2. As a result, a modeled object can be added to the entire peripheral surfaces B2S, B2S on the open end side of the cylindrical members B2, B2. Although details will be described later, the modeled article has a two-layer structure of an intermediate modeled article FC and a modeled article FF (see FIG. 9 ).

付加材料供給装置310は、第1ホッパ111、第2ホッパ112、成分比調整装置113、ガスボンベ114及び噴射ノズル115を備える。第1ホッパ111及び第2ホッパ112は、結合粉末材料が混合された第一粉末材料P1及び結合粉末材料が混合された第二粉末材料P2をそれぞれ貯蔵する。本例では、造形物FFは、大量の第一粉末材料P1と少量の結合粉末材料で成るため、第一粉末材料P1に混合する結合粉末材料の量は、造形物FFにおける結合粉末材料の量に対応した量とする。 The additional material supply device 310 includes a first hopper 111, a second hopper 112, a component ratio adjusting device 113, a gas cylinder 114, and an injection nozzle 115. The first hopper 111 and the second hopper 112 store the first powder material P1 mixed with the combined powder material and the second powder material P2 mixed with the combined powder material, respectively. In this example, the modeled object FF is composed of a large amount of the first powder material P1 and a small amount of the combined powder material, and therefore the amount of the combined powder material mixed with the first powder material P1 is the amount of the combined powder material in the modeled object FF. The amount corresponds to.

また、中間造形物FCは、厚さが厚くなるにつれて結合粉末材料及び第二粉末材料P2の量が減少し、第一粉末材料P1の量が増加する材料で成るため、第二粉末材料P2に混合する結合粉末材料の量は、中間造形物FCにおける第一粉末材料P1の量に対応した量とする。なお、1種のみもしくは3種以上の粉末材料を貯蔵可能なホッパを備える構成としてもよい。 Further, since the intermediate molded article FC is made of a material in which the amounts of the binding powder material and the second powder material P2 decrease and the amount of the first powder material P1 increases as the thickness increases, the intermediate powder product FC becomes the second powder material P2. The amount of the combined powder material to be mixed is an amount corresponding to the amount of the first powder material P1 in the intermediate shaped product FC. It should be noted that the configuration may be such that a hopper capable of storing only one type or three or more types of powder materials is provided.

成分比調整装置113は、第1ホッパ111からの結合粉末材料が混合された第一粉末材料P1と第2ホッパ112からの結合粉末材料が混合された第二粉末材料P2の成分比を調整する。成分比調整装置113は、粉末導入バルブ113a,113b、粉末供給バルブ113c及びガス導入バルブ113dが接続される粉末攪拌機113eを備える。 The component ratio adjusting device 113 adjusts the component ratio of the first powder material P1 mixed with the combined powder material from the first hopper 111 and the second powder material P2 mixed with the combined powder material from the second hopper 112. .. The component ratio adjusting device 113 includes a powder agitator 113e to which the powder introduction valves 113a and 113b, the powder supply valve 113c, and the gas introduction valve 113d are connected.

粉末導入バルブ113a,113bは、第1ホッパ111及び第2ホッパ112と配管111a,112aでそれぞれ接続され、粉末供給バルブ113cは、噴射ノズル115と配管115aで接続され、また、ガス導入バルブ113dは、ガスボンベ114に配管114aで接続される。 The powder introduction valves 113a and 113b are connected to the first hopper 111 and the second hopper 112 by pipes 111a and 112a, respectively, the powder supply valve 113c is connected to the injection nozzle 115 and pipe 115a, and the gas introduction valve 113d is The pipe 114a is connected to the gas cylinder 114.

噴射ノズル115は、例えば、ガスボンベ114から供給される高圧の窒素により、成分比調整装置113から送られてくる成分比が調整済の粉末材料(以下、第三粉末材料という)P3を、基台Bの円筒部材B2の周面B2Sに対し噴射して供給する。光照射装置120は、第一実施形態の光照射装置120と同様の構成であるため、説明を省略する。 The injection nozzle 115 uses, for example, a powder material (hereinafter, referred to as a third powder material) P3, whose component ratio is adjusted, sent from the component ratio adjusting device 113 by high-pressure nitrogen supplied from the gas cylinder 114, as a base. It is jetted and supplied to the peripheral surface B2S of the cylindrical member B2 of B. The light irradiation device 120 has the same configuration as the light irradiation device 120 of the first embodiment, and thus the description thereof will be omitted.

制御装置330は、付加材料供給装置310の粉末供給及び光照射装置120の光照射を制御するとともに、基台Bの円筒部材B2の周面B2Sに対する中央光ビームLC及び外側光ビームLSの相対的な走査を制御する。すなわち、制御装置330は、粉末導入バルブ113a,113bの回転を制御して、結合粉末材料が混合された第一粉末材料P1と結合粉末材料が混合された第二粉末材料P2の成分比を調整し、粉末供給バルブ113c及びガス導入バルブ113dの開閉を制御して、噴射ノズル115からの第三粉末材料P3の噴射供給を制御する。 The control device 330 controls the powder supply of the additional material supply device 310 and the light irradiation of the light irradiation device 120, and the relative of the central light beam LC and the outer light beam LS to the peripheral surface B2S of the cylindrical member B2 of the base B. Control scanning. That is, the control device 330 controls the rotation of the powder introduction valves 113a and 113b to adjust the component ratio of the first powder material P1 in which the binding powder material is mixed and the second powder material P2 in which the binding powder material is mixed. Then, the opening and closing of the powder supply valve 113c and the gas introduction valve 113d are controlled to control the injection and supply of the third powder material P3 from the injection nozzle 115.

また、制御装置330は、中央光ビーム光源122及び外側光ビーム光源124の動作をそれぞれ制御して、中央光ビームLC及び外側光ビームLSの各出力条件、すなわち中央光ビームLC及び外側光ビームLSの各レーザ出力や、中央光照射範囲CS及び外側光照射範囲SSの各単位面積当たりのレーザ出力(パワー密度)の分布形状(レーザビームプロファイル)をそれぞれ独立して制御する。 In addition, the control device 330 controls the operations of the central light beam light source 122 and the outer light beam light source 124, respectively, to output conditions of the central light beam LC and the outer light beam LS, that is, the central light beam LC and the outer light beam LS. And the distribution shape (laser beam profile) of the laser output (power density) per unit area of the central light irradiation range CS and the outer light irradiation range SS are independently controlled.

また、制御装置330は、モータM1の回転を制御して基台Bを中心軸線C回りに回転し、モータM2の回転を制御して基台Bを中心軸線C方向に移動することで、基台Bの円筒部材B2の周面B2Sに対する中央光ビームLC及び外側光ビームLSの相対的な走査を制御する。 Further, the control device 330 controls the rotation of the motor M1 to rotate the base B around the central axis C, and controls the rotation of the motor M2 to move the base B in the direction of the central axis C. The relative scanning of the central light beam LC and the outer light beam LS with respect to the peripheral surface B2S of the cylindrical member B2 of the table B is controlled.

(3−2.造形物の付加方法)
次に、造形物の付加方法について説明する。図9に示すように、基台Bの円筒部材B2の周面B2Sには、2層構造の造形物、すなわち、基台Bの円筒部材B2の表面に中間造形物FCを付加し、中間造形物FCの表面に造形物FFを付加する。中間造形物FCは、結合粉末材料が混合された第一粉末材料P1と結合粉末材料が混合された第二粉末材料P2の成分比が段階的に異なる(徐変する)ように付加される。
(3-2. Method of adding shaped article)
Next, a method of adding a modeled object will be described. As shown in FIG. 9, on the peripheral surface B2S of the cylindrical member B2 of the base B, a three-layered structure, that is, an intermediate molded product FC is added to the surface of the cylindrical member B2 of the base B to form an intermediate molding. The object FF is added to the surface of the object FC. The intermediate shaped object FC is added such that the component ratios of the first powder material P1 in which the binding powder material is mixed and the second powder material P2 in which the binding powder material is mixed are different in stages (gradual change).

詳しくは、中間造形物FCは、基台Bの周面B2Sに対し厚さ方向(径方向)に最も近い部分から最も遠い部分において、結合粉末材料が混合された第二粉末材料P2が100%から0%に直線的(段階的)に減少し、結合粉末材料が混合された第一粉末材料P1が0%から100%に直線的(段階的)に増加する、いわゆる傾斜層となっている。そして、造形物FFは、結合粉末材料が混合された第一粉末材料P1が100%、結合粉末材料が混合された第二粉末材料P2が0%の層となっている。 Specifically, in the intermediate molded article FC, the second powder material P2 mixed with the bonding powder material is 100% at the portion farthest from the portion closest to the peripheral surface B2S of the base B in the thickness direction (radial direction). From 0% to 0% linearly (stepwise), and the first powder material P1 mixed with the binding powder material increases linearly (stepwise) from 0% to 100%, which is a so-called graded layer. .. The modeled object FF is a layer in which the first powder material P1 mixed with the combined powder material is 100% and the second powder material P2 mixed with the combined powder material is 0%.

中間造形物FCにおける基台Bの周面B2Sに近い部分は、第二粉末材料P2(炭素鋼(S45C))を多く含むことになる。従って、基台Bの周面B2S(炭素鋼(S45C))と中間造形物FCとの間の熱膨張率差は、基台Bの周面B2Sと中間造形物FCとの境界に近付くほど徐々に減少することになる。一方、中間造形物FCにおける造形物FFに近い部分は、第一粉末材料(炭化タングステン(WC))を多く含むことになる。従って、中間造形物FCと造形物FF(炭化タングステン(WC))との間の熱膨張率差は、中間造形物FCと造形物FFとの境界に近付くほど徐々に減少することになる。 A portion of the intermediate shaped article FC near the peripheral surface B2S of the base B contains a large amount of the second powder material P2 (carbon steel (S45C)). Therefore, the difference in the coefficient of thermal expansion between the peripheral surface B2S (carbon steel (S45C)) of the base B and the intermediate shaped object FC gradually becomes closer to the boundary between the peripheral surface B2S of the base B and the intermediate shaped object FC. Will be reduced to. On the other hand, the portion of the intermediate shaped article FC near the shaped article FF contains a large amount of the first powder material (tungsten carbide (WC)). Therefore, the difference in coefficient of thermal expansion between the intermediate shaped article FC and the shaped article FF (tungsten carbide (WC)) gradually decreases as it approaches the boundary between the intermediate shaped article FC and the shaped article FF.

よって、基台Bに中間造形物FCを付加し、中間造形物FCに造形物FFを付加することで、熱膨張率差による割れの発生を大幅に抑制できる。中間造形物FC及び造形物FFの付加方法は、第一段階として、中央光ビームLC及び外側光ビームLSにより、第二段階で行う中間造形物FCの付加処理の前処理として初期の予熱処理を行う。基台Bの周面B2Sの温度が低い状態では、レーザ照射による熱エネルギが基台Bに逃げ易く、第二段階で行う溶融の不良要因となり易いため、第一段階で基台Bの周面B2Sを予熱する。このときの中央光ビームLC及び外側光ビームLSのレーザ出力は、基台Bの周面B2Sが溶融せずに所定の温度となるように制御される。 Therefore, by adding the intermediate model FC to the base B and the model FF to the intermediate model FC, it is possible to significantly suppress the occurrence of cracks due to the difference in thermal expansion coefficient. As a first step, the method for adding the intermediate shaped object FC and the shaped object FF is to perform an initial preheat treatment as a pretreatment for the addition processing of the intermediate shaped object FC performed in the second step by the central light beam LC and the outer light beam LS. To do. When the temperature of the peripheral surface B2S of the base B is low, thermal energy due to laser irradiation easily escapes to the base B, which is likely to cause a failure in the melting performed in the second stage. Preheat B2S. The laser outputs of the central light beam LC and the outer light beam LS at this time are controlled so that the peripheral surface B2S of the base B does not melt and reaches a predetermined temperature.

すなわち、制御装置330は、第一段階では第三粉末材料P3の供給は行わず、図略の温度測定器からの中央光ビームLCの中央光照射範囲CS及び外側光ビームLSの外側光照射範囲SSの測定温度を監視しつつ、図10Aに示すように、中央光ビームLCのパワー密度のレーザビームプロファイルにおけるピークLCP4を、外側光ビームLSのパワー密度のレーザビームプロファイルにおけるピークLSP4より減少させる制御を行う。 That is, the control device 330 does not supply the third powder material P3 in the first stage, and the central light irradiation range CS of the central light beam LC and the outer light irradiation range of the outer light beam LS from the temperature measuring device (not shown). Control for monitoring the measured temperature of SS and reducing the peak LCP4 in the laser beam profile of the power density of the central light beam LC from the peak LSP4 in the laser beam profile of the power density of the outer light beam LS, as shown in FIG. 10A. I do.

中央光ビームLCのパワー密度のピークLCP4を、外側光ビームLSのパワー密度のピークLSP4より減少させる理由は、第一実施形態で述べた理由と同様である。そして、中央光ビームLCのパワー密度が低いことから、中央光ビームLCの過入熱によるスパッタの発生を抑制できる。また、ピークLCP1を抑制しつつもレーザ出力全体として大きなエネルギを投入できるので、スパッタの発生を抑制しつつ効率良く予熱ができる。 The reason for reducing the power density peak LCP4 of the central light beam LC from the power density peak LSP4 of the outer light beam LS is the same as the reason described in the first embodiment. Further, since the power density of the central light beam LC is low, it is possible to suppress the generation of spatter due to excessive heat input of the central light beam LC. Further, since a large amount of energy can be input as the entire laser output while suppressing the peak LCP1, it is possible to efficiently preheat while suppressing the generation of spatter.

次に、第二段階として、第一粉末材料P1は溶融させず、第二粉末材料P2を溶融させて中間造形物FCを付加する。すなわち、制御装置330は、上述した成分比が調整された第三粉末材料P3を供給しつつ、図略の温度測定器からの中央光ビームLCの中央光照射範囲CS及び外側光ビームLSの外側光照射範囲SSの測定温度を監視する。そして、この監視により中央光ビームLCのパワー密度のレーザビームプロファイルにおけるピークLCP5を、図10Bに示すように、外側光ビームLSのパワー密度のレーザビームプロファイルにおけるピークLSP5より減少させる制御を行う。 Next, as a second step, the first powder material P1 is not melted, but the second powder material P2 is melted and the intermediate shaped article FC is added. That is, the control device 330 supplies the third powder material P3 whose component ratio is adjusted as described above, and outside the central light irradiation range CS and the outer light beam LS of the central light beam LC from the temperature measuring device (not shown). The measurement temperature of the light irradiation range SS is monitored. Then, by this monitoring, control is performed to reduce the peak LCP5 in the laser beam profile of the power density of the central light beam LC from the peak LSP5 in the laser beam profile of the power density of the outer light beam LS, as shown in FIG. 10B.

第二段階の中央光ビームLC及び外側光ビームLSのピークLCP5,LSP5は、第二粉末材料P2を溶融させる必要があるため、第一段階の中央光ビームLC及び外側光ビームLSのピークLCP4,LSP4よりも高い値となる。さらに、中間造形物FCは、厚さが増加するにつれて成分比が異なるため、制御装置330は、図略の温度測定器による中央光ビームLCの中央光照射範囲CS及び外側光ビームLSの外側光照射範囲SSの測定温度を監視しつつ、中央光ビームLC及び外側光ビームLSのレーザ出力を変動させるフィードバック制御を行う。なお、成分比の違いによる温度とレーザ出力の関係は、予めデータベースとして構築しておく。 The peaks LCP5 and LSP5 of the central light beam LC and the outer light beam LS in the second stage need to melt the second powder material P2, and therefore the peaks LCP4 and LCP4 of the central light beam LC and the outer light beam LS in the first stage. The value is higher than that of LSP4. Furthermore, since the component ratio of the intermediate shaped object FC changes as the thickness increases, the control device 330 controls the central light irradiation range CS of the central light beam LC by the temperature measuring device (not shown) and the outside light of the outside light beam LS. Feedback control for varying the laser output of the central light beam LC and the outer light beam LS is performed while monitoring the measured temperature of the irradiation range SS. The relationship between the temperature and the laser output due to the difference in the component ratio is constructed in advance as a database.

第二段階においても第一段階と同様の理由により、中央光ビームLCのパワー密度のピークLCP5を、外側光ビームLSのパワー密度のピークLSP5より減少させている。そして、中央光ビームLCのパワー密度が低いことから、中央光ビームLCの過入熱によるスパッタの発生を抑制できる。また、ピークLCP5を抑制しつつもレーザ出力全体として大きなエネルギを投入できるので、スパッタの発生を抑制しつつ高速で中間造形物FCを付加できる。 In the second stage, for the same reason as in the first stage, the power density peak LCP5 of the central light beam LC is made smaller than the power density peak LSP5 of the outer light beam LS. Further, since the power density of the central light beam LC is low, it is possible to suppress the generation of spatter due to excessive heat input of the central light beam LC. Further, since a large amount of energy can be input as the entire laser output while suppressing the peak LCP5, it is possible to add the intermediate shaped object FC at high speed while suppressing the generation of spatter.

次に、第三段階として、中央光ビームLCの照射により、中間造形物FCの中央光照射範囲CSにおいて、中間造形物FC及び第三粉末材料P3(実際は結合粉末材料が混合された第一粉末材料のみ)を溶融して溶融池MPを形成する溶融処理を行う(図11A参照)。同時に、中央光照射範囲CSに対する、外側光ビームLSの外側光照射範囲SSにおける走査方向SD(図11A参照)の前側の照射範囲SSFで、溶融池MPの形成処理に対する前処理としての予熱処理を行う。 Next, as a third step, by irradiation with the central light beam LC, in the central light irradiation range CS of the intermediate shaped object FC, the intermediate shaped object FC and the third powder material P3 (actually, the first powder in which the combined powder material is mixed). A melting process is performed to melt (material only) to form a molten pool MP (see FIG. 11A). At the same time, a preheat treatment as a pretreatment for the formation process of the molten pool MP is performed in the irradiation range SSF on the front side in the scanning direction SD (see FIG. 11A) in the outer light irradiation range SS of the outer light beam LS with respect to the central light irradiation range CS. To do.

そして、図11Bに示すように、中央光ビームLCを走査することで溶融池MPを拡大させ、中間造形物FCに第三粉末材料P3(実際は結合粉末材料が混合された第一粉末材料のみ)で成る造形物FFを付加する。 Then, as shown in FIG. 11B, the molten pool MP is enlarged by scanning the central light beam LC, and the third powder material P3 (actually only the first powder material in which the combined powder material is mixed) is added to the intermediate modeling object FC. The modeled object FF consisting of is added.

同時に、外側光ビームLSの外側光照射範囲SSにおける走査方向SDの前側の照射範囲SSFで、溶融池MPの形成処理の前処理として予熱処理を行うとともに、外側光ビームLSの外側光照射範囲SSにおける走査方向SDの後側の照射範囲SSBで、造形物FFの付加処理の後処理として保温処理を行う。 At the same time, in the irradiation range SSF on the front side in the scanning direction SD in the outside light irradiation range SS of the outside light beam LS, preheat treatment is performed as a pretreatment for the formation process of the molten pool MP, and the outside light irradiation range SS of the outside light beam LS is also performed. In the irradiation range SSB on the rear side in the scanning direction SD in, the heat retention process is performed as the post-process of the additional process of the modeled object FF.

すなわち、図10Cに示すように、制御装置330は、中央光ビームLCのパワー密度のレーザビームプロファイルにおけるピークLCP6を、外側光ビームLSのパワー密度のレーザビームプロファイルにおけるピークLSP6より増加させる制御を行う。中央光ビームLCのレーザ出力は、第三粉末材料P3(結合粉末材料が混合された第一粉末材料P1)を溶融して溶融池MPが形成できる温度となるように制御される。外側光ビームLSのレーザ出力は、第三粉末材料P3(結合粉末材料が混合された第一粉末材料)及び造形物FFが溶融せずに所定の温度となるように制御される。 That is, as shown in FIG. 10C, the control device 330 performs control to increase the peak LCP6 in the laser beam profile of the power density of the central light beam LC from the peak LSP6 in the laser beam profile of the power density of the outer light beam LS. .. The laser output of the central light beam LC is controlled to a temperature at which the third powder material P3 (the first powder material P1 mixed with the bonding powder material) is melted to form the molten pool MP. The laser output of the outer light beam LS is controlled so that the third powder material P3 (the first powder material mixed with the binding powder material) and the modeled object FF do not melt and reach a predetermined temperature.

以上のように、外側光ビームLSの外側光照射範囲SSにおける走査方向SDの前側の照射範囲SSFで、溶融池MPの形成処理の前処理として予熱処理を行うことで、中間造形物FCは高温状態になっているので、中央光ビームLCのパワー密度のレーザビームプロファイルにおけるピークLCP6を大きく高める必要はない。 As described above, in the irradiation range SSF on the front side in the scanning direction SD in the outside light irradiation range SS of the outside light beam LS, the preheat treatment is performed as the pretreatment for the formation process of the molten pool MP, so that the intermediate shaped object FC has a high temperature. Since it is in the state, it is not necessary to greatly increase the peak LCP6 in the laser beam profile of the power density of the central light beam LC.

よって、中央光ビームLCによる急加熱を低減でき、スパッタの発生を抑制できる。また、外側光ビームLSの外側光照射範囲SSにおける走査方向SDの後側の照射範囲SSBで、溶融池MPの形成処理の後処理として保温処理を行うことで、造形物FFの急冷凝固を抑制でき、割れの発生を防止できる。 Therefore, rapid heating by the central light beam LC can be reduced, and generation of spatter can be suppressed. Further, in the irradiation range SSB on the rear side of the scanning direction SD in the outside light irradiation range SS of the outside light beam LS, the heat retention process is performed as the post-treatment of the formation process of the molten pool MP, thereby suppressing rapid solidification of the modeled object FF. It is possible to prevent cracking.

(3−3.付加製造装置の動作)
次に、付加製造装置300により基台Bの一方の円筒部材B2の周面B2Sに中間造形物FC及び造形物FFを付加する動作について図12のフローチャートを参照して説明する。制御装置330には、上述の第一、第二、第三段階における中央光ビームLC及び外側光ビームLSの各レーザ出力や各パワー密度のレーザビームプロファイルのピーク、第一−第三粉末材料P1−P3の供給量、基台Bの回転速度及び移動速度のデータ等は予め記憶されているものとする。
(3-3. Operation of additional manufacturing device)
Next, the operation of adding the intermediate modeling object FC and the modeling object FF to the peripheral surface B2S of the one cylindrical member B2 of the base B by the additional manufacturing apparatus 300 will be described with reference to the flowchart of FIG. The controller 330 includes the peaks of the laser beam profiles of the central light beam LC and the outer light beam LS and the laser beam profiles of the respective power densities in the above-mentioned first, second, and third stages, the first-third powder material P1. -The supply amount of P3, the rotation speed and the movement speed of the base B, and the like are stored in advance.

先ず、制御装置330は、上述の第一段階(基台Bの周面B2Sの予熱処理)を実行するため、基台Bの回転及び移動を開始すると同時に、光照射装置120をオンにする(図12のステップS101)。具体的には、制御装置330は、モータM1,M2を駆動して基台Bを中心軸線C回りに回転するとともに中心軸線C方向(周面B2Sの他端方向)に移動する。 First, since the control device 330 executes the above-described first step (preheat treatment of the peripheral surface B2S of the base B), the rotation and movement of the base B are started, and at the same time, the light irradiation device 120 is turned on ( Step S101 of FIG. 12). Specifically, the control device 330 drives the motors M1 and M2 to rotate the base B around the central axis C and moves in the central axis C direction (the other end direction of the peripheral surface B2S).

同時に、制御装置330は、中央光ビーム光源122をオンにして中央光ビーム照射部121から中央光ビームLCを基台Bの周面B2Sに照射するとともに、外側光ビーム光源124をオンにして外側光ビーム照射部123から外側光ビームLSを基台Bの周面B2Sに照射し、基台Bの周面B2Sの初期に予熱処理を実行する。 At the same time, the control device 330 turns on the central light beam light source 122 to irradiate the central light beam LC from the central light beam irradiation unit 121 to the peripheral surface B2S of the base B, and also turns on the outer light beam light source 124 to the outside. The outer light beam LS is irradiated from the light beam irradiation unit 123 onto the peripheral surface B2S of the base B, and preheat treatment is performed at the initial stage of the peripheral surface B2S of the base B.

そして、制御装置330は、基台Bの周面B2Sに対し初期の予熱処理が完了したか否かを判断し(ステップS102)、初期の予熱処理が完了したら、光照射装置120をオフにして基台Bを第一段階の開始位置に戻し、基台Bの回転及び移動を停止する(ステップS103)。次に、制御装置330は、上述の第二段階(中間造形物FCの付加処理)を実行するため、付加材料供給装置310をオンにし、基台Bの回転及び移動を開始すると同時に、光照射装置120をオンにする(ステップS104)。 Then, the control device 330 determines whether or not the initial preheat treatment for the peripheral surface B2S of the base B is completed (step S102), and when the initial preheat treatment is completed, the light irradiation device 120 is turned off. The base B is returned to the start position of the first stage, and the rotation and movement of the base B are stopped (step S103). Next, the control device 330 turns on the additional material supply device 310 to start the rotation and movement of the base B, and at the same time, performs the light irradiation in order to execute the above-described second step (addition processing of the intermediate modeling object FC). The device 120 is turned on (step S104).

具体的には、制御装置330は、成分比調整装置113の粉末導入バルブ113a,113bを適宜開閉して、第一粉末材料P1及び第二粉末材料P2の成分比を調整して第三粉末材料P3とする。そして、ガス導入バルブ113d及び粉末供給バルブ113cを開いて、ガスボンベ114からの高圧の窒素により第三粉末材料P3を噴射ノズル115から基台Bの周面B2Sに噴射して供給する。 Specifically, the control device 330 appropriately opens and closes the powder introduction valves 113a and 113b of the component ratio adjusting device 113 to adjust the component ratio of the first powder material P1 and the second powder material P2 to adjust the third powder material. P3. Then, the gas introduction valve 113d and the powder supply valve 113c are opened, and the third powder material P3 is injected from the injection nozzle 115 to the peripheral surface B2S of the base B by the high pressure nitrogen from the gas cylinder 114 and is supplied.

そして、制御装置330は、モータM1,M2を駆動して基台Bを中心軸線C回りに回転するとともに中心軸線C方向(周面B2Sの他端方向)に移動する。同時に、中央光ビーム光源122をオンにして中央光ビーム照射部121から中央光ビームLCを基台Bの周面B2Sに照射するとともに、外側光ビーム光源124をオンにして外側光ビーム照射部123から外側光ビームLSを基台Bの周面B2Sに照射し、中間造形物FCの付加処理を実行する。 Then, the control device 330 drives the motors M1 and M2 to rotate the base B around the central axis C and moves in the central axis C direction (the other end direction of the peripheral surface B2S). At the same time, the central light beam light source 122 is turned on to irradiate the central light beam LC from the central light beam irradiation unit 121 to the peripheral surface B2S of the base B, and the outer light beam light source 124 is turned on to the outer light beam irradiation unit 123. The outer light beam LS is irradiated onto the peripheral surface B2S of the base B to execute the addition processing of the intermediate modeling object FC.

そして、制御装置330は、基台Bの周面B2Sに対し中間造形物FCの付加処理が完了したか否かを判断し(ステップS105)、中間造形物FCの付加処理が完了したら、光照射装置120をオフにして基台Bを第二段階の開始位置に戻し、基台Bの回転及び移動を停止する(ステップS106)。 Then, the control device 330 determines whether or not the addition processing of the intermediate shaped object FC to the peripheral surface B2S of the base B is completed (step S105), and when the addition processing of the intermediate shaped object FC is completed, the light irradiation is performed. The device 120 is turned off, the base B is returned to the start position of the second stage, and the rotation and movement of the base B are stopped (step S106).

次に、制御装置330は、上述の第三段階(造形物FFの付加処理)を実行するため、付加材料供給装置310をオンにし、基台Bの回転及び移動を開始すると同時に、光照射装置120をオンにする(ステップS107)。具体的には、制御装置330は、成分比調整装置113の粉末導入バルブ113bを閉じたままで、粉末導入バルブ113aを適宜開閉して、第一粉末材料P1のみを第三粉末材料P3とする。そして、ガス導入バルブ113d及び粉末供給バルブ113cを開いて、ガスボンベ114からの高圧の窒素により第三粉末材料P3を噴射ノズル115から基台Bの周面B2Sに噴射して供給する。 Next, the control device 330 turns on the additional material supply device 310 to start the rotation and movement of the base B in order to execute the above-mentioned third step (addition processing of the modeled object FF), and at the same time, the light irradiation device. 120 is turned on (step S107). Specifically, the control device 330 appropriately opens and closes the powder introduction valve 113a while keeping the powder introduction valve 113b of the component ratio adjusting device 113 closed to make only the first powder material P1 the third powder material P3. Then, the gas introduction valve 113d and the powder supply valve 113c are opened, and the third powder material P3 is injected from the injection nozzle 115 to the peripheral surface B2S of the base B by the high pressure nitrogen from the gas cylinder 114 and is supplied.

そして、制御装置330は、モータM1,M2を駆動して基台Bを中心軸線C回りに回転するとともに中心軸線C方向(周面B2Sの他端方向)に移動する。同時に、中央光ビーム光源122をオンにして中央光ビーム照射部121から中央光ビームLCを基台Bの周面B2Sに照射するとともに、外側光ビーム光源124をオンにして外側光ビーム照射部123から外側光ビームLSを基台Bの周面B2Sに照射し、造形物FFの付加処理を実行する。 Then, the control device 330 drives the motors M1 and M2 to rotate the base B around the central axis C and moves in the central axis C direction (the other end direction of the peripheral surface B2S). At the same time, the central light beam light source 122 is turned on to irradiate the central light beam LC from the central light beam irradiation unit 121 to the peripheral surface B2S of the base B, and the outer light beam light source 124 is turned on to the outer light beam irradiation unit 123. Then, the outer light beam LS is irradiated onto the peripheral surface B2S of the base B, and the addition process of the modeled object FF is executed.

そして、制御装置330は、基台Bの周面B2Sに付加した中間造形物FCに対する造形物FFの付加処理が完了したか否かを判断し(ステップS108)、造形物FFの付加処理が完了したら、付加材料供給装置310及び光照射装置120をオフにし、基台Bの回転及び移動を停止して(ステップS109)、全ての処理を終了する。 Then, the control device 330 determines whether the process of adding the model FF to the intermediate model FC added to the peripheral surface B2S of the base B is completed (step S108), and the process of adding the model FF is completed. Then, the additional material supply device 310 and the light irradiation device 120 are turned off, the rotation and movement of the base B are stopped (step S109), and all the processes are ended.

(3−4.第三実施形態による効果)
上記第三実施形態によれば、付加材料供給装置310は、複数種の粉末材料の成分比を調整する成分比調整装置113を有する。これにより、径方向において成分が調整された傾斜層としての中間造形物FCが容易に形成できる。
(3-4. Effect of the third embodiment)
According to the third embodiment described above, the additional material supply device 310 has the component ratio adjusting device 113 that adjusts the component ratios of the plurality of types of powder materials. This makes it possible to easily form the intermediate shaped article FC as a graded layer whose components are adjusted in the radial direction.

また、上記第三実施形態の付加製造装置300によれば、複数種の粉末材料の成分比を調整する成分比調整装置113を有し、基台Bに対し成分比が調整済の粉末材料を噴射して供給する付加材料供給装置310と、基台Bにおける成分比が調整済の粉末材料の供給部に対し光ビームを照射する光照射装置120と、付加材料供給装置310の粉末供給及び光照射装置120の光照射を制御するとともに、基台Bに対する光ビームの相対的な走査を制御する制御装置330とを備える。 Further, according to the additive manufacturing apparatus 300 of the third embodiment, the powder material of which the component ratio has been adjusted with respect to the base B has the component ratio adjusting device 113 which adjusts the component ratio of plural kinds of powder materials. An additional material supply device 310 for spraying and supplying, a light irradiation device 120 for irradiating a light beam to a powder material supply portion whose component ratio in the base B has been adjusted, and a powder supply and light supply for the additional material supply device 310. The controller 330 controls the light irradiation of the irradiation device 120 and controls the relative scanning of the light beam with respect to the base B.

光照射装置120は、成分比が調整済の粉末材料の供給部の中央に光ビームとして中央光ビームLCを照射する中央光ビーム照射部121及び中央光ビームLCの外側に光ビームとして外側光ビームLSを照射する外側光ビーム照射部123を有する。そして、制御装置330は、基台Bの表面に成分比が厚さ方向に徐変する中間造形物FCを付加し、中間造形物FCを形成する際、成分比の変化に応じて中央光ビーム照射部121の出力条件と外側光ビーム照射部123の出力条件を独立して制御する。 The light irradiation device 120 includes a central light beam irradiation unit 121 that irradiates a central light beam LC as a light beam to the center of a powder material supply unit whose component ratio has been adjusted, and an outer light beam as a light beam outside the central light beam LC. It has an outer light beam irradiation unit 123 that irradiates LS. Then, the control device 330 adds the intermediate shaped object FC whose component ratio gradually changes in the thickness direction to the surface of the base B, and when forming the intermediate shaped object FC, the central light beam is changed according to the change of the component ratio. The output condition of the irradiation unit 121 and the output condition of the outer light beam irradiation unit 123 are independently controlled.

このような構成により、基台Bの周面B2S(炭素鋼(S45C))と中間造形物FCとの間の熱膨張率差が、基台Bの周面B2Sと中間造形物FCとの境界に近付くほど徐々に減少するよう形成できる。また、中間造形物FCにおける造形物FFに近い部分は、第一粉末材料(炭化タングステン(WC))を多く含ませることができる。このため、中間造形物FCと造形物FF(炭化タングステン(WC))との間の熱膨張率差は、中間造形物FCと造形物FFとの境界に近付くほど徐々に減少させることができる。これにより、基台Bに中間造形物FCを付加し、中間造形物FCに造形物FFを付加することで、熱膨張率差による割れの発生を大幅に抑制できる。 With such a configuration, the difference in the coefficient of thermal expansion between the peripheral surface B2S (carbon steel (S45C)) of the base B and the intermediate shaped article FC causes the boundary between the peripheral surface B2S of the base B and the intermediate shaped article FC to be the same. It can be formed so as to gradually decrease as it approaches. Further, the portion of the intermediate shaped article FC near the shaped article FF can contain a large amount of the first powder material (tungsten carbide (WC)). Therefore, the difference in the coefficient of thermal expansion between the intermediate shaped article FC and the shaped article FF (tungsten carbide (WC)) can be gradually reduced as it approaches the boundary between the intermediate shaped article FC and the shaped article FF. Accordingly, by adding the intermediate shaped article FC to the base B and the shaped article FF to the intermediate shaped article FC, it is possible to significantly suppress the occurrence of cracks due to the difference in thermal expansion coefficient.

また、上記第三実施形態によれば、制御装置330は、中間造形物FCを付加する際、外側光ビームLSのパワー密度のビームプロファイルにおけるピークLSP5を中央光ビームLCのパワー密度のビームプロファイルにおけるピークよりLCP5よりも増加させる。このように、中間造形物FCの付加時には、中央光ビームLCのパワー密度が低いことから、中央光ビームLCの過入熱によるスパッタの発生を抑制できる。また、ピークLCP5を抑制しつつもレーザ出力全体として大きなエネルギを投入できるので、スパッタの発生を抑制しつつ高速で中間造形物FCを付加できる。 Further, according to the third embodiment, when adding the intermediate shaped object FC, the control device 330 sets the peak LSP5 in the beam profile of the power density of the outer light beam LS to the beam profile of the power density of the central light beam LC. Increase above LCP5 from peak. As described above, when the intermediate shaped object FC is added, the power density of the central light beam LC is low, so that it is possible to suppress the occurrence of spatter due to excessive heat input of the central light beam LC. Further, since a large amount of energy can be input as the entire laser output while suppressing the peak LCP5, it is possible to add the intermediate shaped object FC at high speed while suppressing the generation of spatter.

また、上記第三実施形態によれば、制御装置330は、造形物FF(上部造形物)を付加する際、中央光ビームLCのパワー密度のビームプロファイルにおけるピークLCP6を外側光ビームLSのパワー密度のビームプロファイルにおけるピークLSP6よりも増加させ、中央光ビームLCで中央光照射範囲CSにおける基台Bの溶融池MPの形成処理及び分比が調整済の粉末材料の溶融処理を行い、且つ外側光ビームLSにおける走査の方向の前側で溶融池MPの形成処理に対する前処理として予熱処理を行うとともに、外側光ビームLSにおける走査の方向の後側で溶融池MPの形成処理に対する後処理として保温処理を行う。これにより、外側光ビームLS及び中央光ビームLCの走査の方向において、予熱処理、溶融池MPの形成及び溶融池MPに対する保温処理が容易且つ効率的に行なえる。 Further, according to the third embodiment, when adding the modeled object FF (upper modeled object), the control device 330 sets the peak LCP6 in the beam profile of the power density of the central light beam LC to the power density of the outer light beam LS. The peak LSP6 in the beam profile of No. 2 is increased by the central light beam LC to perform the formation process of the molten pool MP of the base B in the central light irradiation range CS and the melting process of the powder material whose ratio has been adjusted, and the outside light. Pre-heat treatment is performed as a pretreatment for the formation process of the molten pool MP on the front side in the scanning direction of the beam LS, and heat retention treatment is performed as a post-treatment for the formation process of the molten pool MP on the rear side in the scanning direction of the outer light beam LS. To do. Accordingly, preheat treatment, formation of the molten pool MP, and heat retention treatment for the molten pool MP can be easily and efficiently performed in the scanning direction of the outer light beam LS and the central light beam LC.

<4.その他>
上記第一、第二、第三実施形態によれば、外側光ビーム照射部123は、外側光ビームLSとしてリング状の光ビームを照射する。これにより、中央光ビームLCに対して前後左右に容易に等間隔で配置でき低コスト化に寄与する。
<4. Other>
According to the first, second, and third embodiments, the outer light beam irradiation unit 123 irradiates a ring-shaped light beam as the outer light beam LS. As a result, the central light beam LC can be easily arranged in front, rear, left, and right at equal intervals, which contributes to cost reduction.

また、上記第一実施形態では、光照射装置120は、中央光ビーム照射部121、中央光ビーム光源122、外側光ビーム照射部123及び外側光ビーム光源124を備える構成とした。しかし、図13に示すように、光照射装置120は、外側光ビーム照射部123及び外側光ビーム光源124の代わりに、前側光ビーム照射部(外側光ビーム照射部)125、前側光ビーム光源126、後側光ビーム照射部(外側光ビーム照射部)127、後側光ビーム光源128を備える構成としてもよい。 In addition, in the first embodiment, the light irradiation device 120 is configured to include the central light beam irradiation unit 121, the central light beam light source 122, the outer light beam irradiation unit 123, and the outer light beam light source 124. However, as shown in FIG. 13, the light irradiation device 120 includes a front light beam irradiation unit (outer light beam irradiation unit) 125 and a front light beam light source 126 instead of the outer light beam irradiation unit 123 and the outer light beam light source 124. A rear light beam irradiation unit (outer light beam irradiation unit) 127 and a rear light beam light source 128 may be provided.

前側光ビーム照射部125は、中央光ビームLCの走査方向SDの前側に円形状の照射形状(前側光照射範囲FSS)となる前側光ビームFLS(外側光ビーム、第一光ビームBe1)を照射する。後側光ビーム照射部127は、中央光ビームLCの走査方向SDの後側に円形状の照射形状(後側光照射範囲BSS)となる後側光ビームBLS(外側光ビーム、第二光ビームBe2)を照射する。そして、前側光ビームFLSの前側光照射範囲FSSで、溶融池MPの形成処理の前処理として予熱処理を行い、後側光ビームBLSの後側光照射範囲BSSで、造形物FFの付加処理の後処理として保温処理を行う。なお、第二、第三実施形態においても、上記と同様、第一光ビームBe1〜第四光ビームBe4をそれぞれ別々に照射する照射部を設けても良い。 The front light beam irradiation unit 125 irradiates the front light beam FLS (outer light beam, first light beam Be1) having a circular irradiation shape (front light irradiation range FSS) on the front side of the central light beam LC in the scanning direction SD. To do. The rear side light beam irradiation unit 127 has a rear side light beam BLS (outside light beam, second light beam) that has a circular irradiation shape (rear side light irradiation range BSS) on the rear side in the scanning direction SD of the central light beam LC. Be2) is irradiated. Then, in the front side light irradiation range FSS of the front side light beam FLS, preheat treatment is performed as a pre-treatment of the formation process of the molten pool MP, and in the rear side light irradiation range BSS of the rear side light beam BLS, the additional processing of the modeled object FF is performed. A heat retention process is performed as a post-process. In the second and third embodiments as well, similar to the above, it is possible to provide an irradiation unit that respectively irradiates the first light beam Be1 to the fourth light beam Be4 separately.

また、上記第一〜第三実施形態では、造形物FFは、大量の第一粉末材料P1と少量の結合粉末材料で成る場合を説明したが、結合粉末材料を含まない第一粉末材料P1のみで成る場合も本例と同様に付加できる。また、軟質の材料で成る基台Bに対して炭化タングステン(WC)以外の硬質の材料で成る造形物を付加する場合、結合粉末材料を含めずに上記軟質の材料及び上記硬質の材料の成分比を第三実施形態と同様に調整して中間造形物を付加し、結合粉末材料を含めずに上記硬質の材料のみで成る造形物を付加する場合も第三実施形態と同様に可能である。 In the first to third embodiments described above, the case where the modeled object FF is composed of a large amount of the first powder material P1 and a small amount of the combined powder material has been described, but only the first powder material P1 that does not include the combined powder material. Also in the case of, it can be added as in the present example. In addition, when a molded object made of a hard material other than tungsten carbide (WC) is added to the base B made of a soft material, the soft material and the hard material components are not included without including the binding powder material. It is also possible in the same manner as in the third embodiment to adjust the ratio in the same manner as in the third embodiment, add the intermediate shaped article, and add the shaped article made of only the hard material without including the binding powder material. ..

また、上記第三実施形態では、基台Bに付加する中間造形物FC及び造形物FFは、異種材料で成る場合について説明したが、同一材料で成る場合でも同様に適用できる。その場合、中間造形物FCの付加は不要である。また、同一材料でなくても熱膨張係数が近い材料同士の場合も、中間造形物FCの付加は不要である。 Further, in the third embodiment described above, the intermediate model FC and the model FF added to the base B are made of different materials, but the same applies to the case of the same material. In that case, it is not necessary to add the intermediate shaped article FC. Further, even if the materials are not the same material but have similar thermal expansion coefficients, it is not necessary to add the intermediate modeling object FC.

また、上記第一〜第三実施形態では、付加材料供給装置110,310によって、基台Bに対し粉末材料を噴射して供給したが、この態様には限らず、金属製の線形材料からなる、たとえばワイヤなどを付加材料供給装置により供給して基台Bに造形物FFを付加しても良い。これによっても、上記実施形態と同様の効果が期待できる。 Further, in the first to third embodiments described above, the powder material is jetted and supplied to the base B by the additional material supply devices 110 and 310, but the present invention is not limited to this mode, and is made of a linear metal material. For example, the modeling object FF may be added to the base B by supplying a wire or the like with an additional material supply device. With this, the same effect as that of the above embodiment can be expected.

100,200,300;付加製造装置、 110,310;付加材料供給装置、 113;成分比調整装置、 120;光照射装置、 121;中央光ビーム照射部、 123;外側光ビーム照射部、 130,230,330;制御装置、 B;基台、 P1;第一粉末材料、 P2;第二粉末材料、 P3;第三粉末材料、 Be1;第一光ビーム、 Be2;第二光ビーム、 Be3;第三光ビーム、 Be4;第四光ビーム、 FC;中間造形物、 FF;造形物、 L1;所定の距離、 LC;中央光ビーム、 SC1;第一走査、 SC2;第二走査、 SC3;第三走査。 100, 200, 300; additional manufacturing device, 110, 310; additional material supply device, 113; component ratio adjusting device, 120; light irradiation device, 121; central light beam irradiation unit, 123; outer light beam irradiation unit, 130, 230, 330; control device, B; base, P1; first powder material, P2; second powder material, P3; third powder material, Be1; first light beam, Be2; second light beam, Be3; Three light beams, Be4; Fourth light beam, FC; Intermediate modeling object, FF; Modeling object, L1; Predetermined distance, LC; Central light beam, SC1; First scan, SC2; Second scan, SC3; Third scanning.

Claims (11)

粉末材料又は線形材料を用いて基台に造形物を付加する付加製造装置であって、
前記基台に対し前記粉末材料を噴射して供給する、又は前記線形材料を供給する付加材料供給装置と、
前記基台における前記粉末材料又は前記線形材料の供給部に対し光ビームを照射する光照射装置と、
前記付加材料供給装置の粉末供給又は前記線形材料の供給、及び前記光照射装置の光照射を制御するとともに、前記基台に対する前記光ビームの相対的な走査を制御する制御装置と、
を備え、
前記光照射装置は、前記粉末材料の供給部又は前記線形材料の供給部の中央に前記光ビームとして中央光ビームを照射する中央光ビーム照射部及び前記中央光ビームの外側に前記光ビームとして外側光ビームを照射する外側光ビーム照射部を有し、
前記制御装置は、前記中央光ビーム照射部の出力条件と前記外側光ビーム照射部の出力条件を独立して制御することで、前記中央光ビームのパワー密度のビームプロファイルにおけるピークを前記外側光ビームのパワー密度のビームプロファイルにおけるピークより増加させて前記造形物を付加する、付加製造装置。
An additional manufacturing apparatus for adding a shaped article to a base using powder material or linear material,
An additional material supply device that sprays and supplies the powder material to the base, or supplies the linear material,
A light irradiation device for irradiating a light beam to the powder material or the linear material supply portion in the base,
A controller for controlling the powder supply of the additional material supply device or the supply of the linear material, and the light irradiation of the light irradiation device, and controlling the relative scanning of the light beam with respect to the base.
Equipped with
The light irradiation device includes a central light beam irradiation unit that irradiates a central light beam as the light beam to the center of the powder material supply unit or the linear material supply unit, and an outside of the central light beam as the light beam. It has an outer light beam irradiation unit that irradiates a light beam,
The control device controls the output condition of the central light beam irradiation unit and the output condition of the outer light beam irradiation unit independently to determine the peak in the beam profile of the power density of the central light beam to the outer light beam. An additional manufacturing apparatus for adding the shaped article above the peak of the power density beam profile.
前記制御装置は、
前記中央光ビームで前記基台の中央光照射範囲における第一溶融池の第一形成処理及び前記粉末材料又は前記線形材料の第一溶融処理を行い、
前記外側光ビームにおける前記走査の方向における前側の第一光ビームで前記第一溶融池の第一形成処理に対する前処理として第一予熱処理を行い、
前記外側光ビームにおける前記走査の方向における後側の第二光ビームで前記第一溶融池の前記第一形成処理に対する後処理として第一保温処理を行う、請求項1に記載の付加製造装置。
The control device is
Performing the first forming treatment of the first molten pool and the first melting treatment of the powder material or the linear material in the central light irradiation range of the base with the central light beam,
Performing a first preheat treatment as a pretreatment for the first forming treatment of the first molten pool with the first light beam on the front side in the direction of the scanning of the outer light beam,
The additional manufacturing apparatus according to claim 1, wherein a first heat retention process is performed as a post-process for the first formation process of the first molten pool with the second light beam on the rear side in the scanning direction of the outer light beam.
前記光ビームの前記走査において、
前記中央光ビームによる前記走査を第二走査と定義し、
前記中央光ビームの前記走査の方向における左右両側のうち一方側の前記外側光ビームである第三光ビームによる前記走査を第一走査と定義し、
前記中央光ビームの前記走査の方向における前記左右両側のうち他方側の前記外側光ビームである第四光ビームによる前記走査を第三走査と定義した場合、
前記制御装置は、
前記中央光ビームと前記外側光ビームとを同一方向に所定の距離だけ走査し、
前記第二走査における前記中央光ビームで前記基台の中央光照射範囲における第二溶融池の第二形成処理、及び前記粉末材料又は前記線形材料の第二溶融処理を行い、
前記第一走査における前記第三光ビームで前記第二溶融池の前記第二形成処理に対する前処理として第二予熱処理を行い、且つ、
前記第三走査における前記第四光ビームで前記第二溶融池の前記第二形成処理に対する後処理として第二保温処理を行った後、
前記中央光ビームが次回に行なう前記第二走査が、今回、行った前記第二走査と前記一方側において、隣り合うよう前記中央光ビームと前記外側光ビームとを前記同一方向に前記所定の距離だけ走査する、請求項1又は2に記載の付加製造装置。
In the scanning of the light beam,
The scanning by the central light beam is defined as the second scanning,
The scanning by the third light beam, which is the outer light beam on one side of the left and right sides in the scanning direction of the central light beam, is defined as the first scanning,
When the scanning by the fourth light beam, which is the outer light beam on the other side of the left and right sides in the scanning direction of the central light beam, is defined as the third scanning,
The control device is
Scanning the central light beam and the outer light beam in the same direction by a predetermined distance,
The second forming process of the second molten pool in the central light irradiation range of the base with the central light beam in the second scanning, and the second melting process of the powder material or the linear material,
Performing a second preheat treatment as a pretreatment for the second formation treatment of the second molten pool with the third light beam in the first scan, and
After performing a second heat retention treatment as a post-treatment for the second formation treatment of the second molten pool with the fourth light beam in the third scan,
The second scanning performed by the central light beam next time is such that the central light beam and the outer light beam are adjacent to each other in the same direction on the one side with the second scanning performed this time. The additional manufacturing apparatus according to claim 1 or 2, which scans only.
前記今回の前記中央光ビーム及び前記外側光ビームの走査方向と、次回の前記中央光ビーム及び前記外側光ビームの前記走査方向は同一である、請求項3に記載の付加製造装置。 The additional manufacturing apparatus according to claim 3, wherein the scanning directions of the central light beam and the outer light beam this time are the same as the scanning directions of the central light beam and the outer light beam next time. 前記所定の距離は、
前記所定の距離の間において、前記中央光ビームが、前記今回の前記第二走査によって前記第二溶融池の前記第二形成処理及び前記第二溶融処理を行なった後、前記次回の前記第二走査のため、前記今回の前記第三光ビームによる前記第一走査によって前記第二予熱処理が完了した前記基台の前記一方側に前記走査が移動し、且つ、
前記所定の距離の間において、前記第四光ビームが、前記今回の前記第三走査によって前記基台の前記他方側を走査し前記第二保温処理を行なった後、前記次回の前記第三走査のため、前記今回の前記中央光ビームによる前記第二走査によって前記第二溶融池が形成された範囲に前記走査が移動したとき、
前記第二溶融池における溶融金属の温度が、所定の温度以上となる距離に設定される、請求項3又は4に記載の付加製造装置。
The predetermined distance is
During the predetermined distance, the central light beam performs the second forming process and the second melting process of the second molten pool by the second scanning of this time, and then the second beam of the next time. For the scanning, the scanning is moved to the one side of the base on which the second preheat treatment has been completed by the first scanning by the third light beam this time, and,
During the predetermined distance, the fourth light beam scans the other side of the base by the third scan of this time to perform the second heat retention process, and then the third scan of the next time. Therefore, when the scanning is moved to the range where the second molten pool is formed by the second scanning by the central light beam this time,
The additional manufacturing apparatus according to claim 3 or 4, wherein the temperature of the molten metal in the second molten pool is set to a distance that is equal to or higher than a predetermined temperature.
前記所定の温度は、前記第二溶融池に溶融される溶融金属の凝固温度である、請求項5に記載の付加製造装置。 The additional manufacturing apparatus according to claim 5, wherein the predetermined temperature is a solidification temperature of a molten metal melted in the second molten pool. 前記付加材料供給装置は、複数種の前記粉末材料の成分比を調整する成分比調整装置を有する、請求項1−6の何れか1項に記載の付加製造装置。 The additive manufacturing apparatus according to any one of claims 1 to 6, wherein the additional material supply device includes a component ratio adjusting device that adjusts a component ratio of a plurality of types of powder materials. 複数種の粉末材料を用いて基台に造形物を付加する付加製造装置であって、
前記複数種の粉末材料の成分比を調整する成分比調整装置を有し、前記基台に対し前記成分比が調整済の粉末材料を噴射して供給する付加材料供給装置と、
前記基台における前記成分比が調整済の粉末材料の供給部に対し光ビームを照射する光照射装置と、
前記付加材料供給装置の粉末供給及び前記光照射装置の光照射を制御するとともに、前記基台に対する前記光ビームの相対的な走査を制御する制御装置と、
を備え、
前記光照射装置は、前記成分比が調整済の粉末材料の供給部の中央に前記光ビームとして中央光ビームを照射する中央光ビーム照射部及び前記中央光ビームの外側に前記光ビームとして外側光ビームを照射する外側光ビーム照射部を有し、
前記制御装置は、前記基台の表面に前記成分比が厚さ方向に徐変する中間造形物を付加し、前記中間造形物を形成する際、前記成分比の変化に応じて前記中央光ビーム照射部の出力条件と前記外側光ビーム照射部の出力条件を独立して制御する、付加製造装置。
An additional manufacturing apparatus for adding a molded article to a base using a plurality of types of powder materials,
An additional material supply device that has a component ratio adjusting device that adjusts the component ratio of the plurality of types of powder materials, and that supplies the powder material with the component ratio adjusted to the base by spraying.
A light irradiation device for irradiating a light beam to the supply portion of the powder material in which the component ratio in the base has been adjusted,
A control device for controlling the powder supply of the additional material supply device and the light irradiation of the light irradiation device, and controlling the relative scanning of the light beam with respect to the base.
Equipped with
The light irradiation device includes a central light beam irradiation unit that irradiates a central light beam as the light beam at the center of the powder material supply unit whose component ratio has been adjusted, and outside light as the light beam outside the central light beam. Having an outer light beam irradiation unit for irradiating a beam,
The control device adds an intermediate shaped object in which the component ratio gradually changes in the thickness direction to the surface of the base, and when forming the intermediate shaped object, the central light beam is changed according to the change in the component ratio. An additional manufacturing apparatus for independently controlling an output condition of an irradiation unit and an output condition of the outer light beam irradiation unit.
前記制御装置は、前記中間造形物を付加する際、前記外側光ビームのパワー密度のビームプロファイルにおけるピークを前記中央光ビームのパワー密度のビームプロファイルにおけるピークよりも増加させる、請求項8に記載の付加製造装置。 The control device increases the peak in the beam profile of the power density of the outer light beam more than the peak in the beam profile of the power density of the central light beam when adding the intermediate modeling object. Additional manufacturing equipment. 前記制御装置は、造形物を付加する際、前記中央光ビームのパワー密度のビームプロファイルにおけるピークを前記外側光ビームのパワー密度のビームプロファイルにおけるピークよりも増加させ、前記中央光ビームで中央光照射範囲における前記基台の溶融池の形成処理及び前記成分比が調整済の粉末材料の溶融処理を行い、且つ前記外側光ビームにおける前記走査の方向の前側で前記溶融池の形成処理の前処理として予熱処理を行うとともに、前記外側光ビームにおける前記走査の方向の後側で前記溶融池の形成処理の後処理として保温処理を行う、請求項8又は9に記載の付加製造装置。 The control device increases the peak in the beam profile of the power density of the central light beam more than the peak in the beam profile of the power density of the outer light beam when adding a modeled object, and irradiates the central light beam with the central light. As a pretreatment of the formation process of the molten pool on the front side of the scanning direction in the outer light beam, the formation process of the molten pool of the base in the range and the melting process of the powder material whose component ratio has been adjusted. The additional manufacturing apparatus according to claim 8 or 9, which performs a preheat treatment and a heat retention treatment as a post-treatment of the molten pool formation treatment on the rear side in the scanning direction of the outer light beam. 前記外側光ビーム照射部は、前記外側光ビームとしてリング状の光ビームを照射する、請求項1−10の何れか一項に記載の付加製造装置。 The additional manufacturing apparatus according to claim 1, wherein the outer light beam irradiation unit irradiates a ring-shaped light beam as the outer light beam.
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CN115283870A (en) * 2022-09-14 2022-11-04 西安优弧智熔增材制造有限公司 Composite heat source additive manufacturing method and device
KR102480139B1 (en) * 2021-06-25 2022-12-21 조선대학교산학협력단 Equivalent volume deposition method using variable control of the powder feeding region and Deposition device using high energy beam for the same
EP4104962A1 (en) * 2021-06-17 2022-12-21 Rolls-Royce plc Electron beam welding
CN117047130A (en) * 2023-10-11 2023-11-14 杭州爱新凯科技有限公司 Metal 3D printing method with preheating and heat preservation

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016172893A (en) * 2015-03-17 2016-09-29 セイコーエプソン株式会社 Three-dimensional formation device and three-dimensional formation method
JP2017179575A (en) * 2016-03-31 2017-10-05 キヤノン株式会社 Three-dimensional molding device and three-dimensional molding method
JP2017530260A (en) * 2014-06-09 2017-10-12 ハイブリッド マニュファクチュアリング テクノロジーズ リミテッド Material processing method and related apparatus
KR101787718B1 (en) * 2016-06-21 2017-11-16 한국기계연구원 3-dimensional laser printing apparatus and method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017530260A (en) * 2014-06-09 2017-10-12 ハイブリッド マニュファクチュアリング テクノロジーズ リミテッド Material processing method and related apparatus
JP2016172893A (en) * 2015-03-17 2016-09-29 セイコーエプソン株式会社 Three-dimensional formation device and three-dimensional formation method
JP2017179575A (en) * 2016-03-31 2017-10-05 キヤノン株式会社 Three-dimensional molding device and three-dimensional molding method
KR101787718B1 (en) * 2016-06-21 2017-11-16 한국기계연구원 3-dimensional laser printing apparatus and method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4104962A1 (en) * 2021-06-17 2022-12-21 Rolls-Royce plc Electron beam welding
KR102480139B1 (en) * 2021-06-25 2022-12-21 조선대학교산학협력단 Equivalent volume deposition method using variable control of the powder feeding region and Deposition device using high energy beam for the same
CN115283870A (en) * 2022-09-14 2022-11-04 西安优弧智熔增材制造有限公司 Composite heat source additive manufacturing method and device
CN115283870B (en) * 2022-09-14 2024-02-02 西安优弧智熔增材制造有限公司 Composite heat source additive manufacturing method and device
CN117047130A (en) * 2023-10-11 2023-11-14 杭州爱新凯科技有限公司 Metal 3D printing method with preheating and heat preservation
CN117047130B (en) * 2023-10-11 2024-02-02 杭州爱新凯科技有限公司 Metal 3D printing method with preheating and heat preservation

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