JP2020090723A - Hard film coating member and method of manufacturing the same - Google Patents

Abstract

To provide a hard film coating member improved in fatigue life, and a method of manufacturing the same.SOLUTION: The hard film coating member includes: a substrate made of a TiAl intermetallic compound and used under the condition that tension stress is repeatedly applied to the substrate; and a hard film covering the surface of the substrate and made from metal nitride of at least one kind selected from the group comprised of Ti, Al and Cr. In the hard film coating member, hard film residual compression stress measured by an X-ray diffraction method is 7 GPa or more.SELECTED DRAWING: Figure 2

Description

The present invention relates to a hard coating member and a method for manufacturing the same.

BACKGROUND ART Rotating members such as compressor blades and turbine blades of airplane jet engines are required to have high erosion resistance against hard foreign matter flowing from the outside. Therefore, it has been studied to improve the erosion resistance by coating the surface of these rotating members with a hard coating. For example, Patent Document 1 describes that the erosion resistance is enhanced by forming a thermal spray coating on the surface of a moving blade of a gas turbine to cover the surface of the moving blade.

JP, 2005-140073, A

Rotating members such as compressor blades and turbine blades are required to have hardness for enhancing erosion resistance against hard foreign matters, and also to have improved fatigue life. In the rotor blade of the gas turbine described in Patent Document 1, a dense spray coating having high hardness is formed, but there is room for improvement in improving the fatigue life.

The present invention has been made in view of the above problems, and an object thereof is to provide a hard coating member having improved fatigue life and a method for manufacturing the same.

A hard film-coated member according to one aspect of the present invention is a hard film that covers a surface of a base material that is made of a TiAl intermetallic compound and that is used under conditions in which tensile stress is repeatedly applied, , A hard coating made of a nitride of at least one metal selected from the group consisting of Al and Cr. In this hard film-coated member, the residual compressive stress of the hard film measured by the X-ray diffraction method is 7 GPa or more.

A hard film-coated member according to another aspect of the present invention is a base material that is made of a Ti alloy and is used under the condition where tensile stress is repeatedly applied, and a hard film that covers the surface of the base material. And the hard coating film made of a nitride of at least one metal selected from the group consisting of Al and Cr. In this hard film-coated member, the residual compressive stress of the hard film measured by the X-ray diffraction method is 4 GPa or more.

The present inventors have earnestly studied to improve the fatigue life of a hard coating-coated member, and as a result, obtained the following findings and conceived the present invention.

For example, when the surface of a base material such as a compressor blade or a turbine blade to which tensile stress is repeatedly applied is coated with a hard film, the tensile stress is similarly repeatedly applied to the hard film. Due to this, cracks occur on the surface of the hard coating, and the fatigue phenomenon of the hard coating occurs.

On the other hand, as a result of intensive studies, the present inventors set the residual compressive stress of the hard coating to 7 GPa or more on the TiAl intermetallic compound base material and 4 GPa or more on the Ti alloy base material. It was newly found that the fatigue life was remarkably improved. According to the hard film-coated member of the present invention, by coating the surface of the base material with the hard coating having a residual compressive stress of 7 GPa or more or 4 GPa or more, even when the base material is used under the condition where tensile stress is repeatedly applied. It is possible to prevent the occurrence of cracks on the surface of the film and significantly improve the fatigue life.

The "TiAl intermetallic compound" contains Ti and Al as main components, and examples thereof include Ti-48Al-2Cr-2Nb and Ti-45Al-8Nb-0.2C (at %, decimal point). Rounded off below). The “Ti alloy” contains Ti as a main component, and examples thereof include Ti-6Al-4V, Ti-6Al-2Sn-4Zr-6Mo-0.1Si, etc. (mass %, rounded to the nearest whole number). ). Further, the “main component” means a component of 50 at% or more (or mass% or more) of all components.

In the above hard coating member, the composition of the hard coating may be TiAlN. This can increase the oxidation resistance of the hard coating.

A method for producing a hard coating member according to yet another aspect of the present invention is a method for producing a hard coating member by forming a hard coating on the surface of a base material. This method comprises a base material installation step of installing the base material, which is made of a TiAl intermetallic compound and is used under conditions in which tensile stress is repeatedly applied, on a stage of a film forming apparatus, and a group consisting of Ti, Al and Cr. By a target setting step of setting a target containing at least one metal selected from the above in the film forming apparatus, and evaporating the target in a state where the film forming apparatus is in an atmosphere containing nitrogen gas. And a film forming step of forming the hard film made of a nitride of the at least one metal on the surface of the base material. In the film forming step, the hard film is formed from the stage while applying a bias voltage of −60 V or a negative value larger than −60 V to the base material.

A method for producing a hard coating member according to yet another aspect of the present invention is a method for producing a hard coating member by forming a hard coating on the surface of a base material. This method is selected from the group consisting of Ti, Al and Cr, in which the substrate made of a Ti alloy and used under the condition where tensile stress is repeatedly applied is placed on a stage of a film forming apparatus. A target containing step of installing a target containing at least one kind of metal to be installed in the film forming apparatus; and by evaporating the target in a state where the film forming apparatus is in an atmosphere containing nitrogen gas, A film forming step of forming the hard film made of at least one kind of metal nitride on the surface of the base material. In the film forming step, the hard film is formed from the stage while applying a bias voltage of -40V or a negative value larger than -40V to the base material.

As a result of intensive studies by the present inventors, by adjusting the bias voltage applied to the substrate in the film-forming process to an appropriate range, it is possible to form a hard film to which residual compressive stress is applied in an appropriate range. It became clear. Therefore, according to this method, it becomes possible to manufacture a hard coating member having an improved fatigue life.

In the method for manufacturing a hard film-coated member, in the target setting step, the target containing Ti and Al may be set in the film forming apparatus. In the film forming step, the hard film having a composition of TiAlN may be formed. As a result, a hard coating having excellent oxidation resistance can be formed on the surface of the base material.

In the method for manufacturing a hard coating-coated member, the hard coating may be formed by an arc ion plating method. When the sputtering method is used, the ionization rate of vapor deposition particles is lower than when the arc ion plating method is used, and the effect of applying a compressive stress by applying a bias voltage is hard to work. On the other hand, according to the arc ion plating method, since the ionization rate of the vapor deposition particles can be increased, it is possible to form a hard film to which an appropriate residual compressive stress is applied. Therefore, the arc ion plating method is more effective in improving the fatigue life than the sputtering method.

As is clear from the above description, according to the present invention, it is possible to provide a hard coating member with improved fatigue life and a method for manufacturing the same.

It is a figure which shows typically the structure of the hard film coating member which concerns on embodiment of this invention. It is a flow chart for explaining the manufacturing method of the hard membrane covering member concerning the embodiment of the present invention. It is a figure which shows typically the structure of the film-forming apparatus used in the manufacturing method of the hard film coating member which concerns on embodiment of this invention. It is a figure which shows a fatigue test piece typically. FIG. 5 is a cross-sectional view of the fatigue test piece along line VV in FIG. 4. It is a graph which shows the relationship between the bias voltage and the fatigue life in Example 1 of the present invention. 5 is a graph showing the relationship between bias voltage and residual stress in Example 1 of the present invention. It is a graph which shows the relationship between the bias voltage and the fatigue life in Example 2 of the present invention. It is a graph which shows the relationship between the bias voltage and the residual stress in Example 2 of this invention.

Hereinafter, the hard coating member and the method for manufacturing the same according to the embodiment of the present invention will be described in detail.

(Embodiment 1)
First, the hard coating member 1 according to the first embodiment of the present invention will be described. As shown in FIG. 1, the hard coating member 1 according to the present embodiment mainly includes a base material 10 made of a TiAl intermetallic compound and a hard coating 20 that covers a surface 11 of the base material 10. ing.

The base material 10 is a member used under conditions in which tensile stress is repeatedly (periodically) applied, and is, for example, a high-speed rotating member such as a compressor blade of an airplane jet engine or a blade of a steam turbine for power generation. .. In these rotating members, a large tensile stress due to the centrifugal force due to the high speed rotation is applied particularly at the root portion of the blade. This tensile stress fluctuates with time as the rotational speed of the blade changes. Note that the base material 10 is not limited to the rotating member, and tensile stress is repeatedly applied to, for example, a member that vibrates at a high speed, and thus the base material 10 can be used as the base material 10.

The hard coating 20 is formed so as to cover the surface 11 of the base material 10 by a physical vapor deposition (PVD) method such as a cathode-type arc ion plating (AIP) method. The method of forming the hard film 20 will be described in detail later.

The hard film 20 is made of a nitride of at least one metal selected from the group consisting of Ti, Al and Cr. More specifically, the hard coating 20 has a composition such as TiN, TiAlN, AlN, CrN, AlCrN, or TiCrAlN. The atomic ratio of each metal element in the hard coating 20 is not particularly limited.

The base material 10, which is a compressor blade of a jet engine for airplanes or a blade of a steam turbine for power generation, is required to have erosion resistance against hard foreign matter flowing from the outside during high speed rotation. On the other hand, by coating the surface 11 of the base material 10 with the hard coating 20 having the above-described composition, damage to the base material 10 due to erosion can be prevented.

Further, from the viewpoint of enhancing the oxidation resistance of the hard coating 20, it is particularly preferable that the component composition of the hard coating 20 is TiAlN. Furthermore, the hard coating 20 may further contain an element such as Si, C, or B as an element other than Ti, Al, Cr, and N.

The hard coating 20 has a residual compressive stress of 7 GPa or more. This suppresses the occurrence of cracks on the coating surface due to the tensile stress when the blade (base material 10) rotates, and significantly improves the fatigue life of the hard coating 20 as compared with the case where the residual compressive stress is less than 7 GPa. can do. This is because the residual compressive stress of 7 GPa or more is generated in the hard coating 20 and the compressive stress is applied to the surface 21 of the hard coating 20 to the extent that the generation of cracks can be suppressed. Therefore, it is possible to obtain the effect of improving the fatigue life by setting the residual compressive stress of the hard coating 20 within the above range irrespective of the component composition of the hard coating 20 and the type of the base material 10.

The residual compressive stress of the hard coating 20 is preferably 8 GPa or more, and more preferably 9 GPa or more. Although the upper limit of the residual compressive stress is not particularly limited, the residual compressive stress of the hard coating 20 in this embodiment is, for example, 10 GPa or less.

The residual compressive stress of the hard coating 20 is measured by the X-ray diffraction method. The specific measuring method is as described in the examples below.

Next, a method for manufacturing the hard coating member according to the embodiment of the present invention will be described with reference to the flowchart shown in FIG. This method is a method of manufacturing the hard coating member 1 by forming the hard coating 20 on the surface 11 of the base material 10 by the arc ion plating method. First, the configuration of the film forming apparatus 2 used for forming the hard film 20 in the method will be described with reference to FIG. As shown in FIG. 3, the film forming apparatus 2 mainly includes a chamber 31, an arc power source 32, a stage 34, a bias power source 35, a heater, a discharge power source 37, and a filament heating power source 38. ing.

A space for forming the hard film 20 is formed inside the chamber 31, and a gas exhaust port 31A for evacuating the inside of the chamber 31 and a inside of the chamber 31 are formed on a wall portion thereof. And a gas supply port 31B for supplying a film-forming gas (such as nitrogen gas) and an argon gas. As shown in FIG. 3, a nitrogen gas supply source 39A and an argon gas supply source 39B are arranged outside the chamber 31, respectively, and these are connected to the gas supply port 31B via a gas introduction path 36. .. The positive bias side of the arc power source 32 is connected to the chamber 31.

The stage 34 is arranged in the center of the chamber 31 and is rotatable. The stage 34 has a support surface for supporting the base material 10 that is a film formation target. The negative side of the bias power supply 35 is connected to the stage 34, and applies a negative bias voltage to the substrate 10 through the stage 34 during film formation. The positive side of the bias power source 35 is connected to the chamber 31.

Next, the procedure of the method for manufacturing the hard coating member according to the present embodiment will be described. In this method, first, step S10 of setting the base material 10 on the stage 34 of the film forming apparatus 2 is performed (base material setting step). In this step S10, first, the base material 10 is washed with a washing liquid such as ethanol. Then, the cleaned base material 10 is introduced into the chamber 31 and placed on the stage 34.

Next, step S20 of setting the target in the film forming apparatus 2 (in the chamber 31) is performed (target setting step). In this step S20, a target having the component of the metal element of the hard coating 20 is prepared, and in order to make it act as a cathode, it is set in the evaporation source connected to the negative bias side of the arc power source 32.

The target contains at least one metal selected from the group consisting of Ti, Al and Cr, and specifically, a Ti target, a TiAl target, an Al target, a Cr target, an AlCr target, a TiCrAl target, or the like. is there. When the target contains two or more kinds of metal elements, the content ratio of each metal element in the target is adjusted according to the atomic ratio of each metal element in the hard coating 20.

Next, step S30 of etching the base material 10 is performed (base material etching step). In this step S30, first, the inside of the chamber 31 is depressurized to a predetermined pressure by exhausting the inside of the chamber 31 from the gas exhaust port 31A, and the inside of the chamber 31 is brought into a vacuum state. Next, Ar gas is introduced into the chamber 31 from the gas supply port 31B, and the heater heats the substrate 10 to a predetermined temperature. Then, the surface 11 (deposition surface) of the base material 10 is etched by Ar ions for a predetermined time. As a result, the oxide film and the like formed on the surface 11 of the base material 10 are removed. The base material etching step S30 is not an essential step in the method for manufacturing a hard coating member of the present invention and may be omitted.

Next, step S40 of forming the hard coating 20 on the surface 11 of the base material 10 is performed (film forming step). In this step S40, first, nitrogen (N ₂ ) gas is introduced into the chamber 31 from the gas supply port 31B to adjust the inside of the chamber 31 to a predetermined film forming pressure. Then, the target is vaporized by applying a predetermined arc current in a state where the chamber 31 is in an atmosphere containing nitrogen gas. As a result, the vaporized and ionized vapor deposition particles react with the nitrogen in the chamber 31 and are deposited on the surface 11 of the substrate 10. As a result, the hard coating 20 having a composition such as TiN, TiAlN, AlN, CrN, AlCrN, or TiCrAlN is formed on the base material 10.

In this film forming step S40, the hard film 20 is formed while applying a negative bias voltage (DC voltage) from the stage 34 to the substrate 10. The energy of the vapor deposition particles incident on the surface 11 of the substrate 10 changes during film formation depending on the magnitude of this bias voltage, and as a result, the residual compressive stress of the hard coating 20 can be adjusted. Specifically, in the present embodiment, the hard coating 20 having a residual compressive stress of 7 GPa or more is formed by evaporating the target while applying a bias voltage of −60 V or a negative value larger than −60 V to the base material 10. can do. The bias voltage is preferably a negative value larger than −70V or −70V, more preferably a negative large value greater than −80V or −80V, and a negative value larger than −90V or −90V. A value is more preferable. The bias voltage is set to -100V or a negative value smaller than -100V.

(Embodiment 2)
Next, a hard coating member and a method for manufacturing the same according to Embodiment 2 of the present invention will be described. The hard coating member according to the second embodiment basically has the same configuration as the hard coating member 1 according to the first embodiment and has the same effect, but the base material 10 is made of a Ti alloy. It is different from the hard coating member 1 according to the first embodiment in the point. The method for manufacturing the hard coating member according to the second embodiment is basically the same as the method for manufacturing the hard coating member according to the first embodiment and has the same effects. The base material 10 is used as an object to be film-formed, and the condition of the bias voltage applied to the base material 10 in the film-forming step S40 is different from the method for manufacturing the hard coating member according to the first embodiment. Only the points different from the first embodiment will be described below.

The hard coating member according to the second embodiment has the base material 10 and the hard coating 20 that covers the surface 11 of the base material 10 as in the first embodiment (FIG. 1). The base material 10 is made of a Ti alloy. Further, the hard coating 20 formed on the base material 10 is a coating having a residual compressive stress of 4 GPa or more measured by an X-ray diffraction method.

The method for manufacturing a hard coating member according to the second embodiment is carried out according to the flowchart shown in FIG. 2, as in the first embodiment. Here, in the second embodiment, the base material 10 made of a Ti alloy is installed on the stage 34 in the base material installation step S10, and −40 V from the stage 34 to the base material 10 is more negative than −40 V in the film forming step S40. The hard film 20 is formed while applying a bias voltage of a large value. As a result, the hard coating film 20 having a residual compressive stress adjusted to an appropriate range (4 GPa or more) can be formed, and a hard coating member having an improved fatigue life can be obtained.

Next, the present invention will be described in more detail based on examples. However, the present invention is not limited to the following examples, and it is also possible to make appropriate modifications and implement them within a range that is compatible with the gist of the preceding and following, and all of them are techniques of the present invention. It is included in the target range.

(Example 1)
<Hard film formation>
A hard coating made of TiAlN was formed on the substrate by the arc ion plating method described in the first embodiment using a film forming apparatus (AIPSS002 manufactured by Kobe Steel, Ltd.) having the configuration shown in FIG. ..

As the base material, the fatigue test piece 3 processed into the shape shown in FIG. 4 was used. Further, FIG. 5 shows a cross section of the fatigue test piece 3 along the line segment VV in FIG.

The fatigue test piece 3 has a total length L1 of 100 mm and a diameter D1 of 12 mm, and has a test part 41 and holding parts 42 connected to both ends of the test part 41. The holding portion 42 has a length L2 of 25 mm and a diameter D1 of 12 mm. The test portion 41 has a length L3 of 20 mm and a diameter D2 of 3.5 mm, and is mirror-finished. Further, as shown in FIG. 4, the fatigue test piece 3 is tapered so that the diameter decreases from the holding portion 42 toward the test portion 41. The fatigue test piece 3 is made of a TiAl intermetallic compound (Ti-48Al-Cr2-Nb2 (at %, rounded off to the right of the decimal point)).

The target used was a TiAl intermetallic compound having a diameter of 100 mm prepared by a melting method. The atomic ratio of Ti and Al in the target was 50%.

The fatigue test piece 3 was introduced into the chamber 31 and installed on the stage 34, and the TiAl target was set to the evaporation source connected to the negative bias side of the arc power source 32. Then, nitrogen gas was introduced into the chamber 31 to set the pressure in the chamber 31 to 4 Pa, and the heater was operated to set the temperature in the chamber 31 to 500°C. Then, the target was evaporated by passing an arc current of 150 A, and a hard coating made of TiAlN was formed on the surface of the fatigue test piece 3 to a thickness of 3 to 5 μm. During the film formation, the bias voltage (DC voltage) applied to the fatigue test piece 3 from the stage 34 was changed in the range of -20 to -100V.

<Residual stress measurement>
The residual stress of the hard film formed as described above was measured by the X-ray diffraction method as follows. By fixing the incident angle of the X-ray beam at 5° and scanning 2θ, (111), (200), (220), (311), (222), (331) and (420) of the TiAlN film. The diffraction line peaks derived from the respective crystal planes were measured, and the deviation from the standard diffraction position of each measured peak was calculated as the strain. The standard diffraction position is based on each lattice constant (0.424 nm, 0.412 nm) of TiN and cubic AlN and each atomic ratio of Ti and Al (50 at%), assuming TiAlN as a mixture of TiN and AlN. Then, the lattice constant of TiAlN was calculated (0.418 nm), and the lattice constant was calculated from the calculated lattice constant. Then, the strain was plotted together with the ψ angle from each diffraction line, and the residual stress of the TiAlN film was calculated by the multiple hkl method (see Nezu et al., Rigaku Journal, Vol. 45, No. 1, 2014). The X-ray source was CuKα (1.54059Å), the excitation voltage was 40 kV-40 mA, and the scan speed was 2°/min. The Young's modulus and the Poisson's ratio of the TiAlN film at the time of calculating the residual stress were 500 GPa and 0.22, respectively.

<Fatigue life measurement>
Using the fatigue test piece 3 after the film formation, a fatigue test was performed at room temperature under conditions of a stress ratio of 0.1, a stress width of 190 MPa, and a frequency of 20 Hz, and the number of cycles until fracture was measured as the fatigue life. Specifically, tensile stress that changes sinusoidally was applied to the fatigue test piece 3, and the cycle was set to one cycle. "Stress ratio" is the ratio of the minimum value of tensile stress to the maximum value of tensile stress, and "stress width" is "((maximum value of tensile stress)-(minimum value of tensile stress))/2". It is a value. When the fatigue test did not occur even after the number of cycles in the fatigue test reached 10 ⁷ , the test was terminated at that point. Further, the fatigue test was similarly performed on the fatigue test piece 3 without film formation.

FIG. 6 shows the relationship between the bias voltage (V, horizontal axis) and the fatigue life (cycle, vertical axis) during film formation in Example 1. FIG. 7 shows the relationship between the bias voltage (V, horizontal axis) during film formation and the residual stress (GPa, vertical axis) of the hard film in Example 1. In addition, the negative (minus) residual stress value in FIG. 7 indicates that it is the residual stress on the compression side.

As shown in FIG. 6, the fatigue life was shorter when the film was formed at a bias voltage smaller than −60 V and smaller than that when the film was not formed. On the other hand, when the film was formed under the condition that the bias voltage was -60V or a value larger negative than -60V, the fatigue life was significantly improved. Specifically, the fatigue life was 137452 cycles without film formation, whereas the fatigue life was extended to 1084971 cycles with film formation at a bias voltage of -75V, and film formation was performed at a bias voltage of -100V. In some cases, fatigue fracture did not occur even at 10,000,000 cycles.

On the other hand, as shown in FIG. 7, under the condition that the bias voltage in which the improvement of the fatigue life is recognized is −60 V or a large negative value than −60 V, the residual stress of the hard coating is −7 GPa or less, that is, the residual compressive stress is It became 7 GPa or more. Specifically, the residual compressive stress was 7.5 GPa when the film was formed at a bias voltage of −75 V, and the residual compressive stress was about 9.5 GPa when the film was formed at a bias voltage of −100 V. From the above results, when the TiAl intermetallic compound is used as the substrate, the bias voltage during film formation is set to −60 V or a negative value larger than −60 V, whereby a hard coating with residual compressive stress of 7 GPa or more is formed. It was found that the fatigue life was significantly improved in this case.

(Example 2)
A fatigue test piece 3 made of a Ti alloy (Ti-6Al-2Sn-4Zr-2Mo-0.1Si) was used, and the fatigue test conditions were: stress ratio 0.1, stress width 234 MPa or 400 MPa, frequency 20 Hz. The same as Example 1 except for the above.

FIG. 8 shows the relationship between the bias voltage (V, horizontal axis) during film formation and the fatigue life (cycle, vertical axis) in Example 2. FIG. 9 shows the relationship between the bias voltage (V, horizontal axis) during film formation and the residual stress (GPa, vertical axis) of the hard film in Example 2. The white circle plots in FIG. 8 show the data when the stress width in the fatigue test is 400 MPa, while the black circle plots show the data when the stress width is 234 MPa.

As shown in FIG. 8, even when the fatigue test is performed under any stress width condition, when the bias voltage is formed to be a negative value smaller than −40 V, the fatigue life is longer than that in the case where the film is not formed. However, the fatigue life was improved when the film was formed under the condition that the bias voltage was −40 V or a value larger negative than −40 V. Further, as shown in FIG. 9, under the condition that the bias voltage in which the improvement of fatigue life is recognized is −40 V or a large negative value than −40 V, the residual stress of the hard coating is −4 GPa or less, that is, the residual compressive stress is 4 GPa. That's it. From the above results, when the Ti alloy is used as the base material, the bias voltage at the time of film formation is set to -40 V or a negative value larger than -40 V to form a hard film having a residual compressive stress of 4 GPa or more. , In that case, it was found that the fatigue life was significantly improved.

It should be understood that the embodiments and examples disclosed this time are illustrative in all points and not restrictive. The scope of the present invention is shown not by the above description but by the scope of the claims, and is intended to include meanings equivalent to the scope of the claims and all modifications within the scope.

DESCRIPTION OF SYMBOLS 1 Hard film coating member 2 Film forming apparatus 10 Base material 11 Surface 20 Hard film 34 Stage

Claims (7)

A base material made of TiAl intermetallic compound and used under the condition where tensile stress is repeatedly applied,
A hard coating for coating the surface of the base material, wherein the hard coating comprises a nitride of at least one metal selected from the group consisting of Ti, Al and Cr, and
A hard coating material, characterized in that the residual compressive stress of the hard coating measured by X-ray diffraction is 7 GPa or more. A base material that is made of a Ti alloy and is used under conditions in which tensile stress is repeatedly applied,
A hard coating for coating the surface of the base material, wherein the hard coating comprises a nitride of at least one metal selected from the group consisting of Ti, Al and Cr, and
A hard film-coated member, characterized in that the residual compressive stress of the hard film measured by X-ray diffractometry is 4 GPa or more. The hard coating member according to claim 1, wherein the composition of the hard coating is TiAlN. A method for producing a hard coating member by forming a hard coating on the surface of a base material,
A base material installation step of installing the base material, which is made of a TiAl intermetallic compound and is used under conditions in which tensile stress is repeatedly applied, on a stage of a film forming apparatus;
A target setting step of setting a target containing at least one metal selected from the group consisting of Ti, Al and Cr in the film forming apparatus;
A film forming step of forming the hard film made of the nitride of the at least one metal on the surface of the substrate by evaporating the target in a state where the film forming apparatus is in an atmosphere containing nitrogen gas. Including,
In the film forming step, the hard film is formed while applying a bias voltage of −60 V or a value larger than −60 V to the base material from the stage, and a method for manufacturing a hard film-coated member, comprising: .. A method for producing a hard coating member by forming a hard coating on the surface of a base material,
A base material installation step of installing the base material, which is made of a Ti alloy and is used under conditions in which tensile stress is repeatedly applied, on a stage of a film forming apparatus;
A target setting step of setting a target containing at least one metal selected from the group consisting of Ti, Al and Cr in the film forming apparatus;
A film forming step of forming the hard film made of the nitride of the at least one metal on the surface of the substrate by evaporating the target in a state where the film forming apparatus is in an atmosphere containing nitrogen gas. Including,
In the film forming step, the hard film is formed from the stage while applying a bias voltage of -40 V or a value larger than -40 V to the base material, and the hard film is formed. .. In the target setting step, the target containing Ti and Al is set in the film forming apparatus,
The method for producing a hard coating member according to claim 4 or 5, wherein in the film forming step, the hard coating having a component composition of TiAlN is formed. The hard coating film-forming member according to any one of claims 4 to 6, wherein the hard coating film is formed by an arc ion plating method.

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